Copper plate developing machine

Abstract

The invention discloses a copper plate developing machine, which relates to the technical field of film developing, and comprises: a developing machine shell, in which an accommodating cavity is defined; the rotary operation platform is arranged in the accommodating cavity and is driven by a driving mechanism to rotate; a copper plate can be fixed on the rotary operation platform; and the spraying mechanism is provided with an ultrasonic atomization nozzle and is used for spraying a developing solution or deionized water to the copper plate. Compared with the prior art, the problems of non-uniform coating of a developing solution, generation of bubbles and the like can be avoided, primary spin-drying can be performed by rotating the operation platform after water washing is finished, and the drying efficiency is improved; the magnetic suspension base can generate magnetic force to enable the permanent magnet disc and the copper plate to suspend on the magnetic suspension base, the copper plate can rotate in a suspended state and be in full contact with air to complete drying by combining with the fan, drying is more sufficient, water residues are avoided, and the developing quality is improved.

Description

Technical Field

[0001] The present invention relates to the technical field of film development, and particularly to a copper plate developing machine. Background Art

[0002] During the film development process, the copper plate serves as the carrier of the film. After coating with the developing solution, washing with water, and drying, the film development is completed. The existing film development methods have the following deficiencies:

[0003] 1. The developing solution is coated manually, which has a high labor intensity and is prone to problems such as uneven coating of the developing solution and generation of bubbles.

[0004] 2. The drying step uses air drying or absorption with blotting paper, which is prone to water residue, resulting in insufficient development.

[0005] In view of this, how to provide a developing device that can partially or completely solve the above technical problems is an urgent problem for those skilled in the art. Summary of the Invention

[0006] The purpose of the present invention is to provide a copper plate developing machine to solve the problems existing in the prior art.

[0007] To achieve the above purpose, the present invention provides a copper plate developing machine, including:

[0008] A developing machine housing that defines an accommodation cavity inside;

[0009] A rotating operation platform disposed in the accommodation cavity and driven by a driving mechanism to rotate; the copper plate can be fixed on the rotating operation platform;

[0010] A spraying mechanism having an ultrasonic atomizing nozzle for spraying the developing solution or deionized water onto the copper plate.

[0011] Further, a drain port communicating with the accommodation cavity is opened at the bottom of the developing machine housing. An inclined plate is provided at the bottom of the accommodation cavity, and the lower end of the inclined plate corresponds to the drain port. A baffle is provided near the inner wall of the accommodation cavity, and the baffle is used to drain the developing solution or deionized water to the upper surface of the inclined plate.

[0012] Further, the spraying mechanism includes:

[0013] A bracket, one end of which is fixedly connected to the inner wall of the accommodation cavity;

[0014] A rotating frame rotatably disposed at the other end of the bracket. The ultrasonic atomizing nozzle is disposed on the rotating frame, and the rotating frame can rotate horizontally; the ultrasonic atomizing nozzle is communicated with a developing solution cylinder or a deionized water cylinder.

[0015] Further, it further includes:

[0016] A fan, disposed at the top of the accommodation cavity, and its air outlet end faces the copper plate.

[0017] Further, it further includes:

[0018] A magnetic levitation base, made of conductive material and electrically connected to a power source;

[0019] A permanent magnet disk, disposed on the magnetic levitation base. When the magnetic levitation base is powered on, the magnetic levitation base generates an upward supporting magnetic force on the permanent magnet disk and makes the permanent magnet disk levitate above the magnetic levitation base; the copper plate can be fixed on the permanent magnet disk;

[0020] A limiting cavity is formed by downward depression in the middle of the rotary operation platform. When the magnetic levitation base is powered off, the magnetic levitation base and the permanent magnet disk can be placed in the limiting cavity.

[0021] Further, a bionic nano mushroom array made of PDMS material is arranged on the upper surface of the permanent magnet disk, and the bionic nano mushroom array can adsorb on the lower surface of the copper plate.

[0022] Further, the upper surface of the magnetic levitation base has a central region and an outer ring region. A plurality of Hall elements are arranged along the circumferential direction in the central region, and a plurality of electromagnets are arranged along the circumferential direction in the outer ring region. The electromagnet includes a copper wire coil and a plurality of magnet pieces. One side of the magnet piece is recessed inward to form a recessed portion, and a plurality of magnet pieces are stacked in the up and down direction. The copper wire coil is arranged in the recessed portion of the plurality of magnet pieces.

[0023] Further, a plurality of rotors are arranged on the outer side surface of the permanent magnet disk. When the permanent magnet disk levitates, the fan can drive the permanent magnet disk to rotate.

[0024] Further, it further includes a clamping mechanism, and the clamping mechanism includes:

[0025] Moving tracks are opened on the upper surface of the rotary operation platform, and there are a plurality of moving tracks and they are arranged along the circumferential direction of the limiting cavity;

[0026] A horizontal telescopic mechanism is disposed in the moving track;

[0027] A vertical telescopic mechanism is disposed in the moving track and is connected to the output end of the horizontal telescopic mechanism;

[0028] The clamping block is arranged at the output end of the vertical telescopic mechanism; the horizontal telescopic mechanism can drive the clamping block to approach or move away from the copper plate. When the clamping block contacts the copper plate, a plurality of the clamping blocks clamp and fix the copper plate. A three-dimensional force sensor is arranged on the side of the clamping block in contact with the copper plate, and the clamping block and the rotor are arranged at intervals.

[0029] Further, one side of the clamping block corresponding to the copper plate has an arc surface, and the arc surface is recessed inward to form a right-angle clamping surface.

[0030] The present invention discloses the following technical effects:

[0031] 1. The copper plate is arranged on the rotary operation platform and sprayed with a developing solution by an ultrasonic atomizing nozzle. The developing solution can be evenly coated on the copper plate when the copper plate is rotating. Compared with the prior art, problems such as uneven coating of the developing solution and generation of bubbles can be avoided.

[0032] 2. Deionized water can also be sprayed on the copper plate through the ultrasonic atomizing nozzle when the copper plate is rotating. After the water washing is completed, preliminary centrifugal drying can be carried out through the rotary operation platform, which improves the drying efficiency.

[0033] 3. The magnetic levitation base can generate a magnetic force to suspend the permanent magnet disk and the copper plate on the magnetic levitation base. Combined with a blower, the copper plate can rotate in a suspended state and be in full contact with the air to complete drying; in addition, the bottom of the copper plate is adsorbed on the permanent magnet disk through a bionic nano mushroom array. Therefore, there is a gap between the bottom of the copper plate and the permanent magnet disk, and ventilation drying can also be carried out. Compared with the prior art, the drying is more thorough, moisture residue is avoided, and the developing quality is improved. BRIEF DESCRIPTION OF THE DRAWINGS

[0034] In order to more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the following will briefly introduce the drawings required to be used in the embodiments. Obviously, the drawings in the following description are only some embodiments of the present invention. For those of ordinary skill in the art, without creative efforts, other drawings can be obtained based on these drawings.

[0035] Figure 1 It is a schematic structural diagram of the present invention;

[0036] Figure 2 It is a schematic diagram of the vertical telescopic mechanism driving the copper plate to rise;

[0037] Figure 3 It is a schematic diagram of the copper plate suspended;

[0038] Figure 4 It is a top view of the magnetic levitation base;

[0039] Figure 5 It is a schematic diagram of the structure of the electromagnet;

[0040] Figure 6 It is a top view of the permanent magnet disk;

[0041] Figure 7 It is a top view of the clamping block fixing the copper plate;

[0042] Figure 8 It is a schematic diagram of the horizontal and vertical telescopic mechanisms;

[0043] Among them, 1. The housing of the developing machine; 2. The rotating operation platform; 3. The driving shaft; 4. The ultrasonic atomizing nozzle; 5. The liquid discharge port; 6. The inclined plate; 7. The baffle; 8. The bracket; 9. The rotating frame; 10. The fan; 11. The magnetic levitation base; 12. The permanent magnet disk; 13. The bionic nano mushroom array; 14. The Hall element; 15. The copper wire coil; 16. The magnet sheet; 17. The rotor; 18. The moving track; 19. The horizontal telescopic mechanism; 20. The vertical telescopic mechanism; 21. The clamping block; 22. The arc surface; 23. The right-angle clamping surface; 24. The copper plate. Specific embodiments

[0044] Next, the technical solutions in the embodiments of the present invention will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

[0045] In order to make the above objects, features, and advantages of the present invention more obvious and understandable, the present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments.

[0046] The embodiment of the present invention provides a copper plate developing machine, including:

[0047] The housing 1 of the developing machine, which defines an accommodation cavity inside;

[0048] The rotating operation platform 2 is arranged in the accommodation cavity and is driven to rotate by a driving mechanism. The driving mechanism is composed of a rotating motor and a driving shaft 3, and the driving shaft 3 is connected to the lower surface of the rotating operation platform 2; the copper plate 24 can be fixed on the rotating operation platform 2;

[0049] The spraying mechanism has an ultrasonic atomizing nozzle 4 for spraying the developing solution or deionized water onto the copper plate 24.

[0050] In this embodiment, a liquid discharge port 5 communicating with the accommodation cavity is opened at the bottom of the housing 1 of the developing machine. An inclined plate 6 is arranged at the bottom of the accommodation cavity, and the lower end of the inclined plate 6 corresponds to the liquid discharge port 5. A baffle 7 is arranged near the inner side wall of the accommodation cavity, and the baffle 7 is used to drain the developing solution or deionized water to the upper surface of the inclined plate 6.

[0051] In this embodiment, the spraying mechanism includes:

[0052] A bracket 8, one end of which is fixedly connected to the inner side wall of the accommodation cavity;

[0053] A rotating frame 9 is rotatably arranged at the other end of the bracket 8. The ultrasonic atomizing nozzle 4 is arranged on the rotating frame 9, and the rotating frame 9 can rotate along the horizontal direction; the ultrasonic atomizing nozzle 4 is communicated with the developing solution cylinder or the deionized water cylinder.

[0054] The rotating frame 9 can drive the ultrasonic atomizing nozzle 4 to rotate 180° along the horizontal direction. When it is necessary to spray the developing solution or deionized water, the ultrasonic atomizing nozzle 4 is rotated to directly above the copper plate 24. When performing the following drying step, the ultrasonic atomizing nozzle 4 can be rotated to the side away from the copper plate 24, without affecting the blowing of the blower 10 and the lifting of the copper plate 24.

[0055] In this embodiment, it further includes:

[0056] A blower 10 is arranged at the top of the accommodation cavity, and its air outlet end faces the copper plate 24.

[0057] In this embodiment, it further includes:

[0058] A magnetic levitation base 11, which is made of a conductive material and electrically connected to a power source;

[0059] A permanent magnet disk 12 is arranged on the magnetic levitation base 11. When the magnetic levitation base 11 is powered on, the magnetic levitation base 11 generates an upward supporting magnetic force on the permanent magnet disk 12 and makes the permanent magnet disk 12 float above the magnetic levitation base 11; the copper plate 24 can be fixed on the permanent magnet disk 12;

[0060] The middle part of the rotating operation platform 2 is recessed downward to form a limiting cavity. When the magnetic levitation base 11 is powered off, the magnetic levitation base 11 and the permanent magnet disk 12 can be placed in the limiting cavity.

[0061] In this embodiment, a bionic nano mushroom array 13 made of PDMS (polydimethylsiloxane) material is arranged on the upper surface of the permanent magnet disk 12, and the bionic nano mushroom array 13 can adsorb on the lower surface of the copper plate 24.

[0062] In this embodiment, the upper surface of the magnetic levitation base 11 has a central region and an outer ring region. A plurality of Hall elements 14 are arranged circumferentially in the central region, and a plurality of energized electromagnets are arranged circumferentially in the outer ring region. The energized electromagnet includes a copper wire coil 15 and a plurality of magnet sheets 16. One side of the magnet sheet 16 is recessed inward to form a recess. The plurality of magnet sheets 16 are stacked in the up-and-down direction, and the copper wire coil 15 is arranged in the recesses of the plurality of magnet sheets 16. Among them, the Hall element 14 is used to adjust the magnitude of the energized current of the magnetic levitation base 11, and the energized electromagnet can provide a comprehensive and stable magnetic field to stably support the permanent magnet disk 12 and the copper plate 24.

[0063] In this embodiment, a plurality of rotors 17 are arranged on the outer side surface of the permanent magnet disk 12. When the permanent magnet disk 12 is levitated, the fan 10 can drive the permanent magnet disk 12 to rotate.

[0064] In this embodiment, a clamping mechanism is further included. The clamping mechanism includes:

[0065] A moving track 18 is opened on the upper surface of the rotary operation platform 2. There are a plurality of moving tracks 18 and they are arranged circumferentially along the limiting cavity (specifically four groups);

[0066] A horizontal telescopic mechanism 19 is arranged in the moving track 18;

[0067] A vertical telescopic mechanism 20 is arranged in the moving track 18 and is connected to the output end of the horizontal telescopic mechanism 19;

[0068] A clamping block 21 is made of silica gel material and is arranged on the output end of the vertical telescopic mechanism 20; the horizontal telescopic mechanism 19 can drive the clamping block 21 to approach or move away from the copper plate 24. When the clamping block 21 contacts the copper plate 24, the plurality of clamping blocks 21 clamp and fix the copper plate 24. A three-dimensional force sensor is arranged on the side of the clamping block 21 in contact with the copper plate 24, and the clamping block 21 and the rotor 17 are arranged at intervals.

[0069] In this embodiment, one side of the clamping block 21 corresponding to the copper plate 24 has an arc surface 22, and the arc surface 22 is recessed inward to form a right-angle clamping surface 23. The arc surface 22 can clamp the disc-shaped copper plate 24, and the right-angle clamping surface 23 can clamp the rectangular copper plate 24, improving the applicable range of the equipment.

[0070] The specific working process is as follows:

[0071] S1: Adsorb the copper plate 24 on the permanent magnet disk 12, start the horizontal telescopic mechanism 19, use the clamping block 21 to clamp the outer edge of the copper plate 24, and judge the clamping effect through the induction data fed back by the three-dimensional force sensor. When the induction data fed back by the three-dimensional force sensor reaches a stable state, confirm that the copper plate 24 is fixed by the clamping block 21.

[0072] S2: Rotate the operating platform 2, set the rotation speed to 300 rpm. The magnetic levitation base 11 and the permanent magnet disk 12 are limited by the limiting cavity. The copper plate 24 is fixed by the clamping block 21, and all structures rotate together. At the same time, spray the developer solution onto the upper surface of the copper plate 24 through the ultrasonic atomizing nozzle 4. After the developer solution is sprayed sufficiently, stop the rotation of the operating platform 2 and let it stand for development. The standing time is about 5 minutes.

[0073] S3: After the development is completed, rotate the operating platform 2, set the rotation speed to more than 2000 rpm. At the same time, spray deionized water onto the copper plate 24 through the ultrasonic atomizing nozzle 4 to wash the developer solution and initially spin-dry the deionized water.

[0074] S4: After the deionized water is initially spin-dried, horizontally rotate the ultrasonic atomizing nozzle 4 to the other side, stop the rotation of the operating platform 2, start the vertical telescopic mechanism 20. The clamping block 21 maintains the state of clamping the copper plate 24, and drives the copper plate 24 and the permanent magnet disk 12 to rise together to the preset levitation height. The magnetic levitation base 11 is powered on, and judge the force conditions of the copper plate 24 and the permanent magnet disk 12 according to the induction data fed back by the three-dimensional force sensor. When the force is stable, reset the clamping block 21 to the initial position. At this time, the permanent magnet disk 12 and the copper plate 24 are in a levitated state.

[0075] S5: Start the blower 10. The blower 10 conveys air to the copper plate 24 to dry the copper plate 24, and the wind speed is 7 - 8 m / s. The permanent magnet disk 12 starts to rotate under the coordinated action of the blower 10 and the rotor 17, and the copper plate 24 rotates together with the permanent magnet disk 12 to achieve rotary air-drying.

[0076] S6: After drying is completed, stop the blower 10, and the permanent magnet disk 12 and the copper plate 24 stop rotating. Through the coordinated action of the horizontal telescopic mechanism 19, the vertical telescopic mechanism 20 and the clamping block 21, move the permanent magnet disk 12 and the copper plate 24 to the initial position (the working process is similar to the foregoing and the principle is the same), and complete the development.

[0077] In the description of the present invention, it should be understood that the orientation or positional relationship indicated by the terms "longitudinal", "transverse", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc. is based on the orientation or positional relationship shown in the drawings, and is only for the convenience of describing the present invention, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of the present invention.

[0078] The embodiments described above are only descriptions of the preferred embodiments of the present invention, and do not limit the scope of the present invention. Without departing from the design spirit of the present invention, various deformations and improvements made by those of ordinary skill in the art to the technical solutions of the present invention shall fall within the protection scope determined by the claims of the present invention.

Claims

1. A copper plate developing machine, characterized in that, Comprising: A developing machine housing (1) with an accommodation cavity defined inside; A rotating operation platform (2) arranged inside the accommodation cavity and driven to rotate by a driving mechanism; a copper plate (24) can be fixed on the rotating operation platform (2); A spraying mechanism having an ultrasonic atomizing nozzle (4) for spraying a developing solution or deionized water onto the copper plate (24).

2. The copper plate developing machine according to claim 1, wherein, A drain port (5) communicating with the accommodation cavity is formed at the bottom of the developing machine housing (1). An inclined plate (6) is arranged at the bottom of the accommodation cavity, and the lower end of the inclined plate (6) corresponds to the drain port (5). A baffle (7) is arranged near the inner side wall of the accommodation cavity, and the baffle (7) is used to drain the developing solution or deionized water to the upper surface of the inclined plate (6).

3. A copper plate developing machine according to claim 1, characterized in that, The spraying mechanism includes: A bracket (8) with one end fixedly connected to the inner side wall of the accommodation cavity; A rotating frame (9) rotatably arranged at the other end of the bracket (8). The ultrasonic atomizing nozzle (4) is arranged on the rotating frame (9), and the rotating frame (9) can rotate horizontally; the ultrasonic atomizing nozzle (4) is communicated with a developing solution cylinder or a deionized water cylinder.

4. A copper plate developing machine according to claim 1, characterized in that, It further includes: A blower (10) arranged at the top of the accommodation cavity, and its air outlet end faces the copper plate (24).

5. The copper plate developing machine according to claim 4, characterized in that, It further includes: A magnetic levitation base (11) made of a conductive material and electrically connected to a power source; A permanent magnet disk (12) arranged on the magnetic levitation base (11). When the magnetic levitation base (11) is powered on, the magnetic levitation base (11) generates an upward supporting magnetic force on the permanent magnet disk (12) and makes the permanent magnet disk (12) levitate above the magnetic levitation base (11); the copper plate (24) can be fixed on the permanent magnet disk (12); A limiting cavity is formed by the middle part of the rotating operation platform (2) recessing downward. When the magnetic levitation base (11) is powered off, the magnetic levitation base (11) and the permanent magnet disk (12) can be placed in the limiting cavity.

6. A copper plate developing machine according to claim 5, characterized in that, A bionic nano mushroom array (13) made of PDMS material is arranged on the upper surface of the permanent magnet disk (12), and the bionic nano mushroom array (13) can adsorb on the lower surface of the copper plate (24).

7. A copper plate developing machine according to claim 5, characterized in that, The upper surface of the magnetic levitation base (11) has a central area and an outer ring area. A plurality of Hall elements (14) are arranged along the circumferential direction in the central area, and a plurality of energized electromagnets are arranged along the circumferential direction in the outer ring area. The energized electromagnet includes a copper wire coil (15) and a plurality of magnet sheets (16). One side of the magnet sheet (16) is recessed inward to form a recessed part, and a plurality of magnet sheets (16) are stacked in the up and down direction. The copper wire coil (15) is arranged in the recessed parts of the plurality of magnet sheets (16).

8. A copper plate developing machine according to claim 5, characterized in that, A plurality of rotors (17) are arranged on the outer side surface of the permanent magnet disk (12). When the permanent magnet disk (12) levitates, the blower (10) can drive the permanent magnet disk (12) to rotate.

9. A copper plate developing machine according to claim 8, wherein, It further includes a clamping mechanism, and the clamping mechanism includes: The moving track (18) is opened on the upper surface of the rotary operation platform (2), and there are a plurality of the moving tracks (18) arranged circumferentially along the limiting cavity; The horizontal telescopic mechanism (19) is arranged in the moving track (18); The vertical telescopic mechanism (20) is arranged in the moving track (18) and is connected to the output end of the horizontal telescopic mechanism (19); The clamping block (21) is arranged on the output end of the vertical telescopic mechanism (20); the horizontal telescopic mechanism (19) can drive the clamping block (21) to approach or move away from the copper plate (24). When the clamping block (21) contacts the copper plate (24), a plurality of the clamping blocks (21) clamp and fix the copper plate (24). A three-dimensional force sensor is arranged on the side of the clamping block (21) in contact with the copper plate (24), and the clamping block (21) is arranged at an interval from the rotor (17).

10. A copper plate developing machine according to claim 9, characterized in that, One side of the clamping block (21) corresponding to the copper plate (24) has an arc surface (22), and the arc surface (22) is recessed inward to form a right-angle clamping surface (23).

Images