Remote plasma source water vapor supply system and method of controlling the same

Abstract

The application belongs to the technical field of plasma, and provides a remote plasma source water vapor supply system and a control method thereof. The supply system comprises: a water vapor plasma generator comprising a cathode, an intermediate stage and an anode; a water vapor supply assembly comprising a water pump, a heated water tank, a gas outlet of the heated water tank being in communication with the intermediate stage and the anode, and a heating disc being arranged in the heated water tank; a sensor assembly comprising a liquid level sensor arranged in the heated water tank, a temperature sensor and a water vapor gas flow meter arranged at the gas outlet of the heated water tank; and a control unit acquiring real-time data of the sensor assembly, predicting a liquid level height and a temperature in the heated water tank at a next time, and dynamically adjusting switch states of the heating disc and the water pump according to the liquid level height and the temperature. The supply system predicts the liquid level height and the water temperature at a next period according to the real-time data, so that the opening and closing time of the heating disc and the water pump is accurately controlled, the water vapor vaporization efficiency is improved, and the performance stability of an aluminum oxide layer film is improved.

Description

Technical Field

[0001] This invention relates to the field of plasma technology, specifically to a remote plasma source water vapor supply system and its control method. Background Technology

[0002] Plasma technology, as a novel technology utilizing high-energy plasma for material processing, has long been widely applied in fields such as integrated circuit manufacturing, biomedicine, and food and environmental protection. Due to its high efficiency, high flexibility, and sustainability, remote plasma sources are increasingly being used in surface cleaning, modification, and deposition processes for various materials, and their application prospects are becoming increasingly broad.

[0003] Among them, the vapor on demand module (VoDM) is a technology widely used in integrated circuit manufacturing processes, especially in back-end integrated circuit processes (BEOL), where photoresist and etching residues need to be removed by a dry stripping process after metal etching.

[0004] By heating H2O to a high temperature and converting it into a vapor state in a vacuum environment, it is then deposited onto the surface of a substrate material to form a uniform, dense alumina film. First, a water vapor generator effectively raises the temperature of liquid water to produce the desired water vapor. Second, VoDM allows for precise control of product performance by adjusting the deposition rate through temperature and pressure control. Furthermore, VoDM assists in the removal of Cl2 residues by providing water vapor; compared to O2 / N2 alone, H2O exhibits higher Cl2 removal efficiency. Therefore, VoDM has broad application prospects in the semiconductor industry and other fields involving thin film preparation.

[0005] Furthermore, this method offers advantages such as high growth rate and low cost, making it suitable for large-scale production. Therefore, water vapor generator VoDM has broad application prospects in the semiconductor industry and other fields involving thin film preparation. Summary of the Invention

[0006] In view of this, embodiments of the present invention provide a remote plasma source water vapor supply system and its control method to solve or partially solve the above problems.

[0007] In a first aspect, embodiments of the present invention provide a remote plasma source water vapor supply system, comprising the following steps:

[0008] A water vapor plasma generator includes a cathode, an intermediate stage, and an anode, with the three electrodes insulated from each other;

[0009] A steam supply assembly includes a water pump and a heating water tank. The inlet of the heating water tank is connected to the water pump, and the outlet of the heating water tank is connected to the intermediate stage and anode of the steam plasma generator. A heating plate is provided inside the heating water tank.

[0010] The sensor assembly includes a liquid level sensor, a temperature sensor, and a steam flow meter. The liquid level sensor and the temperature sensor are installed inside the heating water tank, and the steam flow meter is installed at the outlet of the heating water tank.

[0011] The control unit acquires real-time data from the liquid level sensor, temperature sensor, and water vapor flow meter, predicts the liquid level and temperature in the heating water tank at the next moment, and dynamically adjusts the on / off state of the heating plate and water pump accordingly.

[0012] The basic working process of the above embodiment is as follows: the water inlet of the heating water tank of the supply system is adjusted by the water pump switch and the water flow rate, and then the water is heated and evaporated in the heating chamber of the heating water tank to generate water vapor. The water vapor generated in the heating chamber is controlled by the water vapor mass flow meter and continuously heated and output to the intermediate stage and anode of the water vapor plasma generator.

[0013] The beneficial effects of the above embodiments are as follows: the supply system adopts a liquid level sensor, a temperature sensor, and a steam flow meter, which can accurately control the inlet water flow rate and key parameters of the vaporization process (temperature inside the heating water tank) to achieve precise regulation of the outlet steam; the supply system predicts the liquid level height and water temperature changes in the next cycle based on real-time data, thereby accurately controlling the start-up and shut-off times of the heating plate and water pump, improving the steam vaporization efficiency and enhancing the performance stability of the alumina film.

[0014] According to a specific implementation of the present invention, the method for predicting the liquid level and temperature in the heating water tank at the next moment is as follows:

[0015] ;

[0016] Where T(k+1) is the predicted temperature inside the heating water tank at time k+1, T k Let t be the actual temperature inside the heating water tank at time k. k+1 Let t be the cumulative sampling time at time k+1. k Let k be the cumulative sampling time, A be the time-varying temperature factor, and B be the factor affecting the rate of change of the internal cavity temperature.

[0017] ;

[0018] ;

[0019] Where L(k+1) is the predicted liquid level in the heating water tank at time k+1, L(k) is the actual liquid level in the heating water tank at time k, P is the power of the heating plate (1kW-1.2kW), and t s The sampling period is , The density of water is kg / m 3 S is the bottom area of ​​the heating chamber, and C is the specific heat capacity of water, with a value of [value missing]. J / kg·℃. This implementation method fits the temperature change trend through an arctangent function and dynamically corrects the predicted value by combining real-time sampling data. It can predict liquid level and temperature fluctuations in advance, avoid control lag caused by sensor delay, and improve the stability of water vapor output rate.

[0020] According to a specific implementation of an embodiment of the present invention, the steam supply assembly further includes a preheater, which is disposed between the water pump and the heating water tank. Before the water flows into the heating water tank, it is preheated by passing it through the preheater. By adding a preheater to preheat the incoming water, the initial water temperature can be increased, reducing the heat load on the heating plate. Simultaneously, it avoids a sudden drop in localized temperature caused by cold water directly entering the heating chamber, ensuring the uniformity of the vaporization process and further improving the density of the alumina film.

[0021] According to a specific implementation of an embodiment of the present invention, the supply system further includes: an air supply component, comprising an air compressor and a one-way valve, wherein the air inlet of the one-way valve is connected to the air outlet of the air compressor, and the air outlet of the one-way valve is connected to a heating water tank. Air supply is required before steam supply. Preheating the air using the air compressor establishes a stable chamber temperature field before steam supply, preventing pressure fluctuations caused by steam condensation. The one-way valve prevents gas backflow from contaminating the pipeline, reducing equipment maintenance frequency.

[0022] According to a specific implementation of an embodiment of the present invention, the sensor assembly further includes: a pressure sensor disposed inside the water vapor plasma generator to monitor the pressure inside the water vapor plasma generator and prevent damage to the water vapor plasma generator due to excessive pressure.

[0023] According to one specific implementation of the present invention, the sensor assembly further includes an air mass flow meter, which is disposed between the air compressor and the check valve to adjust the air flow accordingly.

[0024] According to one specific implementation of the present invention, the supply system further includes a nitrogen supply assembly, which supplies nitrogen gas to the cathode of the water vapor plasma generator via a gas cylinder. The nitrogen flow rate is controlled by a flow meter.

[0025] According to one specific implementation of the present invention, the supply system further includes: a cooling pipe disposed inside the water vapor plasma generator for dissipating heat from the water vapor plasma generator. Specifically, the cooling pipe is connected in series between the intermediate stage and the anode of the water vapor plasma generator to cool the large amount of heat generated during the operation of the water vapor plasma generator, thereby ensuring the stable operation of the plasma generator.

[0026] Secondly, embodiments of the present invention provide a control method for a remote plasma source water vapor supply system, comprising:

[0027] S1: Real-time acquisition of data from liquid level sensor, temperature sensor and steam flow meter to obtain real-time liquid level height L(k) and temperature Tk in the heating water tank, and steam output rate v;

[0028] S2: Calculate the predicted liquid level L(k+1) and temperature T(k+1) for the next moment based on the real-time liquid level height L(k) and temperature Tk. Calculate the total steam P based on the steam output rate v and the cumulative output time t, P=vt;

[0029] S3: If P≥P set If the temperature is too high, the heating plate and water pump will be turned off simultaneously. Otherwise, the on / off status of the heating plate and water pump will be dynamically adjusted based on the predicted liquid level L(k+1) and temperature T(k+1), as shown below:

[0030] ;

[0031] ;

[0032] Among them, S T S indicates the on / off state of the heating plate. L This indicates the on / off status of the water pump; "1" represents on, and "0" represents off. max T min L max L min All are set values, and T max >T min L max >L min .

[0033] According to a specific implementation of the present invention, when dynamically adjusting the on / off state of the heating plate and the water pump, the method further includes: if T(k+1)≥T smax At that time, T smax For the set value, and T smax >T maxIf the heating plate and water pump are both shut down, an alarm will be reported on the control unit. To prevent excessive heating power from the heating plate, which could cause water temperature overshoot and affect vaporization efficiency, an over-temperature alarm temperature T is set. smax When the temperature at time k+1 is T(k+1) ≥ T smax When the temperature reaches a certain level, the heating plate and water pump stop working simultaneously, and the system displays an over-temperature alarm signal on the upper control panel; otherwise, it continues to execute the original dynamic adjustment method.

[0034] According to a specific implementation of the present invention, when dynamically adjusting the on / off state of the heating plate and the water pump, the method further includes: if L(k+1)=0, then simultaneously turning off the heating plate and the water pump, and reporting an alarm on the control unit; if L(k+1)≥L smax At that time, L smax As a set value, and L smax >L max If this occurs, both the heating plate and water pump will be shut down, and an alarm will be reported on the control unit. To prevent excessive heating power from the heating plate, which could lead to a significant drop in liquid level and dry burning, a minimum liquid level height L is set for dry burning. smin and takes the value 0; when L(k+1) < L min When L(k+1)=0, the heating plate is in a dry-burning state, and both the heating plate and the water pump are turned off; a dry-burning alarm is displayed. To prevent the water pump flow meter from adjusting the flow rate too high, causing a rapid rise in liquid level and resulting in increased water pressure, which in turn raises the boiling point of water and affects vaporization efficiency, a high liquid level alarm parameter L needs to be set. smin When the liquid level at time k+1 is L(k+1)≥L smax At that time, L smax When set to 0.95H, both the heating plate and the water pump need to be turned off simultaneously. smax The maximum alarm liquid level height is set; the system displays an alarm indicating that the liquid level is too high; otherwise, the original dynamic adjustment method continues. Attached Figure Description

[0035] To more clearly illustrate the specific embodiments of the present invention or the technical solutions in the prior art, the accompanying drawings used in the description of the specific embodiments or the prior art will be briefly introduced below. In all the drawings, similar elements or parts are generally identified by similar reference numerals. In the drawings, the elements or parts are not necessarily drawn to scale.

[0036] Figure 1 This diagram illustrates a structural block diagram of a remote plasma source steam supply system provided in an embodiment of the present invention.

[0037] Figure 2 A flowchart of a dynamic control method for a remote plasma source steam supply system provided in an embodiment of the present invention is shown;

[0038] Figure 3 A schematic diagram of the dynamic control process of the heating plate and water pump in an embodiment of the present invention is shown; Detailed Implementation

[0039] The embodiments of the technical solution of the present invention will now be described in detail with reference to the accompanying drawings. These embodiments are only used to more clearly illustrate the technical solution of the present invention and are therefore merely examples, and should not be construed as limiting the scope of protection of the present invention.

[0040] It should be noted that, unless otherwise stated, the technical or scientific terms used in this application should have the ordinary meaning as understood by one of ordinary skill in the art to which this invention pertains.

[0041] Figure 1 This is a structural block diagram of a remote plasma source water vapor supply system according to an embodiment of the present invention. The system includes:

[0042] The water vapor plasma generator adopts a three-stage structure, including a cathode, an intermediate stage, and an anode. The three electrodes are insulated from each other and water-cooled. Its gas supply system includes three parts: a water vapor supply component, an air supply component, and a nitrogen supply component.

[0043] The steam supply assembly includes a water pump, a preheater, and a heating water tank connected in sequence. Before entering the heating water tank, the water is preheated by the preheater. The heating water tank generates steam and supplies it between the intermediate stage and the anode of the steam plasma generator through the outlet. A heating plate is installed inside the heating water tank.

[0044] The air supply assembly includes an air compressor and a one-way valve. The air inlet of the one-way valve is connected to the air outlet of the air compressor, and the air outlet of the one-way valve is connected to the heating water tank. Before the steam is supplied, air needs to be supplied first. The air is preheated by the air compressor and then heated by the heating water tank before being introduced between the intermediate stage and the anode of the steam plasma generator to ensure a suitable temperature inside the generator. The one-way valve is used to prevent gas backflow.

[0045] The nitrogen supply assembly supplies nitrogen gas to the cathode of the water vapor plasma generator via a gas cylinder; the nitrogen flow rate is controlled by a corresponding flow meter. The nitrogen supply assembly can supply process dissociation gases, such as nitrogen and oxygen.

[0046] The sensor assembly includes a liquid level sensor, a temperature sensor, and a steam flow meter. The liquid level sensor and the temperature sensor are installed inside the heating water tank, and the steam flow meter is installed at the outlet of the heating water tank.

[0047] The control unit acquires real-time data from the level sensor, temperature sensor, and steam flow meter to predict the liquid level and temperature in the heating water tank at the next moment, and dynamically adjusts the on / off state of the heating plate and water pump accordingly.

[0048] The steam supply component operates as follows: Water enters the water tank and is preheated by a water pump that adjusts the flow rate. The water then passes through the heating chamber in the water tank to evaporate and generate steam. During heating, a level sensor monitors the water level in the heating chamber in real time, providing low-level protection to prevent dry burning and damage to the heating equipment. If the water supply stops, the steam generator automatically shuts down to prevent dry burning and damage to the heating elements. Finally, the steam generated in the water tank is controlled by a steam mass flow meter and continuously heated before being output to the intermediate stage and anode of the steam plasma generator. This heat tracing reduces heat loss during steam transmission and prevents condensation.

[0049] Furthermore, the sensor assembly also includes: a pressure sensor and an air mass flow meter. The pressure sensor is located inside the steam plasma generator to monitor the pressure inside the steam plasma generator, and the air mass flow meter is located between the air compressor and the check valve to adjust the air flow accordingly.

[0050] Furthermore, the supply system also includes cooling pipes, installed inside the steam plasma generator, for dissipating heat from the steam plasma generator. Specifically, the cooling pipes are connected in series between the intermediate stage and the anode of the steam plasma generator to cool the large amount of heat generated during operation, ensuring the stable operation of the plasma generator.

[0051] Figure 2 The flowchart of the control method for the remote plasma source water vapor supply system provided in the embodiments of the present invention is shown below. Figure 2 The method includes the following steps:

[0052] S1: Real-time acquisition of data from the liquid level sensor, temperature sensor, and steam flow meter to obtain the real-time liquid level height L(k) and temperature Tk in the heating water tank, the steam output rate v, and to accumulate the steam output time;

[0053] S2: Calculate the predicted liquid level L(k+1) and temperature T(k+1) for the next moment based on the real-time liquid level height L(k) and temperature Tk. Calculate the total steam P based on the steam output rate v and the cumulative output time t, P=vt;

[0054] The method for predicting the liquid level and temperature in the heating water tank at the next moment is as follows:

[0055] (1);

[0056] Where T(k+1) is the predicted temperature inside the heating water tank at time k+1, T k Let t be the actual temperature inside the heating water tank at time k. k+1 Let t be the cumulative sampling time at time k+1. k is the cumulative sampling time at time k, A is the time-varying temperature factor, B is the influence factor of the rate of change of internal cavity temperature, and A / B is a constant, which is set according to the actual situation.

[0057] (2);

[0058] (3);

[0059] Where L(k+1) is the predicted liquid level in the heating water tank at time k+1, L(k) is the actual liquid level in the heating water tank at time k, P is the power of the heating plate (1kW-1.2kW), and t s The sampling period is , The density of water is kg / m 3 S is the bottom area of ​​the heating chamber, and C is the specific heat capacity of water, with a value of [value missing]. J / kg·℃.

[0060] S3: If P≥P set P set If the preset value is met, both the heating plate and the water pump will be turned off simultaneously. Otherwise, the on / off state of the heating plate and the water pump will be dynamically adjusted based on the predicted liquid level L(k+1) and temperature T(k+1). The dynamic adjustment method is as follows:

[0061] (4);

[0062] (5);

[0063] Among them, S T S indicates the on / off state of the heating plate. L This indicates the on / off status of the water pump; "1" represents on, and "0" represents off. max T min L max L min All are set values, and T max >T min L max >L min .

[0064] That is, when k Temperature at time +1 hour, The heating plate stops working when the maximum warning temperature is reached; when hour, The heating plate restarts when the boiling point of water vapor is reached; when At that time, the heating plate maintains the working state of the previous moment, that is... k The heating plate is always working, so... k The heating plate is also in working order at +1 o'clock; k When the heating plate stops working, then k At +1, the heating plate is also in a stopped state; similarly, when k Liquid level height at time +1 When the water pump is turned off, The maximum liquid level is set at this height. If too much water enters the heating chamber, the resulting steam pressure after boiling will be too high, potentially damaging the steam plasma equipment. Therefore, a suitable maximum liquid level is required. To ensure efficient water inflow and outflow, [the following is implied:] ... Values ,in H The height of the water tank in the cavity; when The water pump restarts, in which To prevent the heating plate from drying out, a minimum liquid level height also needs to be set. ;when At that time, the water pump maintains the working state of the previous moment.

[0065] Furthermore, in step S3 above, to prevent the heating plate from overheating and causing water temperature overshoot, thus affecting vaporization efficiency, an over-temperature alarm temperature T is set. smax When the temperature at time k+1 is T(k+1) ≥ T smax At that time, T smax For the set value, and T smax >T max If the temperature is too high, the heating plate and water pump will be shut down simultaneously, and the system will display an over-temperature alarm signal on the upper control panel. Otherwise, the original dynamic adjustment method will continue until the total steam output reaches the set value.

[0066] Furthermore, in step S3 above, to prevent the heating plate from overheating and causing a significant drop in liquid level leading to dry burning, a minimum liquid level height L is set for dry burning. smin and takes the value 0; when L(k+1) < L minWhen L(k+1)=0, the heating plate is in a dry-burning state, and both the heating plate and the water pump are turned off; a dry-burning alarm is displayed. To prevent the water pump flow meter from adjusting the flow rate too high, causing a rapid rise in liquid level and resulting in increased water pressure, which in turn raises the boiling point of water and affects vaporization efficiency, a high liquid level alarm parameter L needs to be set. smin When the liquid level at time k+1 is L(k+1)≥L smax At that time, L smax As a set value, and L smax >L max The heating plate and water pump need to be turned off simultaneously. smax The maximum alarm liquid level height, such as L smax Set to 0.95H; the system will display an alarm indicating that the liquid level is too high; otherwise, continue to execute the original dynamic adjustment method until the total water vapor output reaches the set value.

[0067] The above dynamic control process is as follows: Figure 3 As shown, from 0 to At any time, the heating plate will be moved from ambient temperature. Preheat to Then the water pump started supplying water; The moment, the predicted k Liquid level at +1 Exceeding the maximum liquid level height Therefore, the water pump was shut off; to The water pump remains off at all times; for the heating plate, due to the predicted... k Water temperature at time +1 The temperature remains below or equal to the boiling point, therefore the heating plate is always in operation; At any given moment, if the water temperature exceeds the warning temperature, the heating plate will stop working and... to Maintain this level at all times; when the liquid level falls below the minimum liquid level height, the water pump starts working and... to Maintain a working state at all times; At any time, if the water temperature is below the boiling point, the heating plate restarts; if the liquid level is above the maximum liquid level, the water pump stops working; At that moment, the water vapor reaches the required total amount of steam. The system simultaneously stops the heating plate and water pump; this ensures that the water temperature remains between the boiling point and the maximum warning temperature, and that VoDM continuously and stably outputs steam; the liquid level also remains between the set maximum and minimum liquid level heights, preventing the heating plate from burning dry while ensuring the steam heating efficiency.

[0068] Furthermore, the system requires air supply before steam supply to ensure a suitable temperature inside the generator, and the ambient temperature of the heating water tank needs to be raised to a certain temperature by a heating plate before the water pump supplies water.

[0069] It should be further explained that the principle behind predicting the liquid level and temperature in the heating water tank at the next moment is as follows:

[0070] Based on the current state of the tested object k Sampling temperature T at time k And the pre-fitted temperature-time relationship is used to calculate k The fitted temperature T(k+1) at time +1 is obtained; the temperature inside the heating chamber at the current time is compensated using predictive control to obtain the compensated temperature.

[0071] k The chamber temperature T(k+1) of the reaction heating chamber at time +1 can be obtained by fitting the arctangent function:

[0072] (6);

[0073] Among them, t k+1 for k The cumulative sampling time at time +1 The initial sampling time, The initial temperature of the heating chamber during measurement; A is the time-varying temperature factor, and B is the factor influencing the rate of temperature change in the chamber; furthermore, k The chamber temperature T(k+1) of the heating chamber at time +1 can be obtained using... k Temperature T in the cavity at any given time k To indicate:

[0074] (7);

[0075] Therefore, the temperature change per unit sampling period is:

[0076] (8);

[0077] k The liquid level in the reaction heating chamber at time +1 L ( k +1) can be obtained from equation (9):

[0078] (9);

[0079] in, L ( k () is the current level collected by the liquid level sensor. k The liquid level height at any given time. The change in liquid level height per unit sampling period;

[0080] According to thermodynamic principles, the amount of heat dissipated per unit sampling period can be determined. Q Satisfying equation (10)

[0081] (10);

[0082] in, C Let be the specific heat capacity of water, and take a value of . J / kg·℃, This represents the weight lost due to water evaporation per unit sampling time. The temperature change over one cycle; the heat dissipated per unit sampling period. Q You can also use formulas To indicate, among which P The power of the heating plate should be between 1kW and 1.2kW. The sampling period is Then, combining with equation (10), we can obtain equation (10). That is ;

[0083] The weight of water lost per unit time can be expressed as:

[0084] (11);

[0085] in, The density of water is kg / m 3 , The volume of water lost per unit time. S To determine the bottom area of ​​the heating chamber; then It can also be expressed as equation (12);

[0086] (12);

[0087] k The liquid level in the reaction heating chamber at time +1 L ( k +1) can also be obtained from equation (9), where We can obtain:

[0088] (13).

[0089] The embodiments of the present invention provide a remote plasma source water vapor supply system and its control method, which have the following technical effects:

[0090] First, the supply system uses a liquid level sensor, a temperature sensor, and a steam flow meter, which can accurately control the inlet water flow rate and key parameters of the vaporization process (temperature inside the heating water tank) to achieve precise regulation of the outlet steam.

[0091] Secondly, the supply system predicts the changes in liquid level and water temperature for the next cycle based on real-time data, thereby precisely controlling the on / off times of the heating plate and water pump. This improves the efficiency of water vaporization and enhances the stability of the alumina film performance.

[0092] Third, the supply system is equipped with an overheat alarm temperature T. smax Minimum liquid level height L smin High liquid level alarm parameter L smin It effectively avoids abnormal situations such as dry burning and excessive water pressure that could affect equipment safety and vaporization efficiency.

[0093] The above description is merely a specific embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Any variations or substitutions that can be easily conceived by those skilled in the art within the technical scope disclosed in the present invention should be included within the scope of protection of the present invention. Therefore, the scope of protection of the present invention should be determined by the scope of the claims.

Claims

1. A remote plasma source water vapor supply system, characterized in that, include: A water vapor plasma generator includes a cathode, an intermediate stage, and an anode, with the three electrodes insulated from each other; A steam supply assembly includes a water pump and a heating water tank. The inlet of the heating water tank is connected to the water pump, and the outlet of the heating water tank is connected to the intermediate stage and the anode of the steam plasma generator. A heating plate is provided inside the heating water tank. The sensor assembly includes a liquid level sensor, a temperature sensor, and a steam flow meter. The liquid level sensor and the temperature sensor are disposed inside the heating water tank, and the steam flow meter is disposed at the outlet of the heating water tank. The control unit acquires real-time data from the liquid level sensor, temperature sensor, and water vapor flow meter, predicts the liquid level and temperature in the heating water tank at the next moment, and dynamically adjusts the on / off state of the heating plate and water pump accordingly. The method for predicting the liquid level and temperature in the heating water tank at the next moment is as follows: ； Where T(k+1) is the predicted temperature inside the heating water tank at time k+1, T k Let t be the actual temperature inside the heating water tank at time k. k+1 Let t be the cumulative sampling time at time k+1. k Let k be the cumulative sampling time, A be the time-varying temperature factor, and B be the factor affecting the rate of change of the internal cavity temperature. ； ； Where L(k+1) is the predicted liquid level in the heating water tank at time k+1, L(k) is the actual liquid level in the heating water tank at time k, P is the power of the heating plate, and t s The sampling period time. Let S be the density of water, S be the bottom area of ​​the heating chamber, and C be the specific heat capacity of water.

2. The remote plasma source steam supply system according to claim 1, characterized in that: The steam supply assembly also includes a preheater, which is disposed between the water pump and the heating water tank.

3. The remote plasma source steam supply system according to claim 1, characterized in that: Also includes: An air supply assembly includes an air compressor and a one-way valve. The air inlet of the one-way valve is connected to the air outlet of the air compressor, and the air outlet of the one-way valve is connected to the heating water tank. The sensor assembly further includes an air flow meter, which is disposed between the air compressor and the one-way valve to adjust the air flow.

4. The remote plasma source steam supply system according to claim 1, characterized in that: The sensor assembly further includes a pressure sensor disposed within the water vapor plasma generator to monitor the pressure within the water vapor plasma generator.

5. The remote plasma source steam supply system according to claim 1, characterized in that: The supply system also includes a nitrogen supply component, which supplies nitrogen gas to the cathode of the water vapor plasma generator via a gas cylinder.

6. The remote plasma source steam supply system according to claim 1, characterized in that, Also includes: Cooling pipes are installed inside the water vapor plasma generator to dissipate heat from the water vapor plasma generator.

7. A control method for a remote plasma source water vapor supply system, characterized in that, The remote plasma source steam supply system as described in any one of claims 1-6 includes the following steps: S1: Real-time acquisition of data from the liquid level sensor, temperature sensor, and steam flow meter to obtain the real-time liquid level height L(k), temperature Tk, and steam output rate v in the heating water tank; S2: Calculate the predicted liquid level L(k+1) and temperature T(k+1) for the next moment based on the real-time liquid level height L(k) and temperature Tk. Calculate the total steam P based on the steam output rate v and the cumulative output time t, P=vt; S3: If P≥P set P set If the preset value is met, both the heating plate and the water pump will be turned off simultaneously. Otherwise, the on / off state of the heating plate and the water pump will be dynamically adjusted based on the predicted liquid level height L(k+1) and temperature T(k+1), as shown below: ； ； Among them, S T S represents the on / off state of the heating plate. L This refers to the on / off state of the water pump; T max T min L max L min All are set values, and T max >T min L max >L min .

8. The control method according to claim 7, characterized in that, The dynamic adjustment of the on / off states of the heating plate and water pump also includes: if T(k+1)≥T smax At that time, T smax For the set value, and T smax >T max If the heating plate and water pump are shut down simultaneously, the control unit will report an alarm.

9. The control method according to claim 7, characterized in that, The method for dynamically adjusting the on / off states of the heating plate and water pump further includes: if L(k+1)=0, then simultaneously turning off the heating plate and water pump, and the control unit reporting an alarm; if L(k+1)≥L smax At that time, L smax As a set value, and L smax >L max If the heating plate and water pump are shut down simultaneously, the control unit will report an alarm.

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