Nickel plate cleaning method

Abstract

The invention relates to the technical field of nickel plate processing, in particular to a nickel plate cleaning method. The nickel plate cleaning method comprises the following steps that the nickel plate is subjected to shot blasting treatment, and then ultrasonic cleaning, spraying treatment, bubbling rinsing and drying are sequentially carried out; a cleaning solution adopted in the ultrasonic cleaning comprises the following components in percentage by mass: 15%-26% of malic acid, 10%-20% of lauryl alcohol polyoxyethylene ether, 5%-10% of fatty alcohol-polyoxyethylene ether, 5%-10% of citric acid, 1%-5% of tartaric acid and 48%-64% of water. The cleaning liquid is matched with ultrasonic waves, so that the nickel plate surface and permeation oxides can be efficiently and uniformly removed, and the Fe impurity content is not increased; and surface cleaning liquid can be effectively removed through spraying treatment and bubbling rinsing, and residues are avoided. The cleaning method is suitable for industrial application.

Description

Technical Field

[0001] The present invention relates to the technical field of nickel plate processing, and in particular to a cleaning method for nickel plates. Background Art

[0002] With the increasingly strict control standards for the content of impurity elements in the master alloy for superalloys, higher requirements are put forward for the production of the master alloy. At present, the impurity control of the master alloy for superalloys mainly adopts the combination of hierarchical use of metal raw materials and melting processes. However, for impurity elements such as As, Sn, Sb, etc., it is difficult to effectively remove them under conventional melting conditions. Coupled with the reaction problem between the alloy melt and the refractory material under high temperature for a long time, there are significant limitations in achieving deep purification solely through the melting process. Therefore, for different grade requirements of impurity content, reasonably selecting the grade of raw materials is the key control link for product quality.

[0003] Currently, nickel raw materials for superalloys mainly use electrolytic nickel plates, but there are multiple links in the production, transportation, and subsequent processing processes that may introduce impurities: First, the electrolysis process itself will form an oxide layer on the surface of the nickel plate, and if the cleaning process is not properly controlled, electrolyte crystals may remain. Second, in the transportation and storage links, the iron components of the bundling belts on the surface of the nickel plate may produce rust contamination, and at the same time, the surface is prone to adsorb environmental floating dust. In addition, during the cutting and processing process, the contact between the nickel plate and the iron components of the shearing equipment may produce rust contamination, and if there is a risk of leakage in the hydraulic system of the shearing machine, it will also cause oil pollution. These adverse factors jointly affect the final purity of the electrolytic nickel plate.

[0004] Superalloy manufacturing enterprises have paid attention to the possible surface contamination problems of electrolytic nickel plates and adopted shot peening or tumbling processes to solve the surface contamination problems of nickel plates. During the shot peening process, the steel shots are in full contact with the surface of the nickel plate, and impurities such as the oxide layer and electrolyte crystals on the surface of the nickel plate can be removed, but the iron content on the surface of the nickel plate will inevitably increase during the shot peening process. The tumbling process uses a drum equipment, and the nickel plates are in contact and friction with each other by their own self-weight to remove impurities such as the oxide layer and electrolyte crystals. However, several technical limitations have also been exposed in the actual application of the tumbling process: First, the tumbling process mainly targets macroscopic surface contaminants, and the removal effect on the permeable oxide layer formed during the electrolysis process is limited. Second, abrasive wear during the tumbling process may lead to new inclusion sources. In addition, the efficiency of the tumbling process is low. These factors have restricted the application of the tumbling process in the processing of electrolytic nickel plates to a certain extent.

[0005] In view of this, the present invention is specifically proposed. Summary of the Invention

[0006] The object of the present invention is to provide a cleaning method for nickel plates, which can fully remove Fe increased on the surface of nickel plates due to shot peening treatment, significantly improve the purity of nickel plates, and improve the cleaning efficiency.

[0007] In order to achieve the above object of the present invention, the following technical solutions are specifically adopted:

[0008] A cleaning method for nickel plates, comprising the following steps: subjecting the nickel plates to shot peening treatment, and then successively performing ultrasonic cleaning, spray treatment, bubbling rinsing and drying;

[0009] The cleaning liquid used in the ultrasonic cleaning comprises the following components in terms of mass percentage:

[0010] 15% - 26% of malic acid, 10% - 20% of lauryl alcohol polyoxyethylene ether, 5% - 10% of fatty alcohol polyoxyethylene ether, 5% - 10% of citric acid, 1% - 5% of tartaric acid and 48% - 64% of water;

[0011] The nickel plates include any one of electrolytic nickel plates and electrowon nickel plates.

[0012] In a specific embodiment of the present invention, in the cleaning liquid, the mass ratio of the lauryl alcohol polyoxyethylene ether to the fatty alcohol polyoxyethylene ether is (1.5 - 2):1.

[0013] In a specific embodiment of the present invention, in the ultrasonic cleaning, the temperature of the cleaning liquid is 50 - 80 °C. Further, the time of the ultrasonic cleaning is 3 - 10 min.

[0014] In a specific embodiment of the present invention, water is used for the spray treatment, and the temperature of the water is 60 - 90 °C.

[0015] In a specific embodiment of the present invention, the time of the spray treatment is 1 - 5 min.

[0016] In a specific embodiment of the present invention, in the spray treatment, the spray pressure is 0.2 - 0.4 MPa, and the spray flow rate is 6 - 8 m 3 / h.

[0017] In a specific embodiment of the present invention, the spray treatment includes a first-stage spray treatment and a second-stage spray treatment; the time of the first-stage spray treatment is 0.5 - 2.5 min, and the time of the second-stage spray treatment is 0.5 - 2.5 min.

[0018] In a specific embodiment of the present invention, the spray pressures of the first-stage spray treatment and the second-stage spray treatment are P1 and P2 respectively, and the water temperatures are T1 and T2 respectively, and satisfy: P1 < P2, T1 < T2.

[0019] In a specific embodiment of the present invention, P1 is 0.2 to 0.3 MPa, and P2 is 0.3 to 0.4 MPa; T1 is 70 to 75 °C, and T2 is 80 to 85 °C.

[0020] In a specific embodiment of the present invention, in the bubbling rinsing, the water temperature is 70 to 90 °C. Further, the time of the bubbling rinsing is 3 to 6 min.

[0021] In a specific embodiment of the present invention, the drying method is drying by baking. Further, the temperature of the drying by baking is 80 to 100 °C, the air pressure of the drying by baking is 0.02 to 0.04 MPa, and the time of the drying by baking is 2 to 6 min.

[0022] Compared with the prior art, the beneficial effects of the present invention are as follows:

[0023] (1) The present invention adopts a cleaning solution prepared by compounding an organic acid and a polyoxyethylene ether surfactant, and cooperates with ultrasonic waves, which can efficiently and uniformly remove Fe increased on the surface of the nickel plate due to shot blasting treatment; and through spray treatment and bubbling rinsing, the surface cleaning solution can be effectively removed to avoid residues.

[0024] (2) The present invention further optimizes the processes such as spray treatment, bubbling rinsing and drying, and further optimizes and balances the purity of the obtained nickel plate and the process efficiency. Specific Embodiment

[0025] The technical solutions of the present invention will be clearly and completely described below in conjunction with specific embodiments. However, those skilled in the art will understand that the following described embodiments are some embodiments of the present invention, rather than all embodiments, and are only used to illustrate the present invention and should not be construed as limiting the scope of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the scope of protection of the present invention. For those conditions not specified in the embodiments, they are carried out according to conventional conditions or conditions recommended by the manufacturer. Those reagents or instruments not specified by the manufacturer can be obtained as conventional products through commercial purchase.

[0026] The present invention provides a method for cleaning a nickel plate, comprising the following steps: subjecting the nickel plate to shot blasting treatment, and then successively performing ultrasonic cleaning, spray treatment, bubbling rinsing and drying;

[0027] The cleaning solution used in the ultrasonic cleaning comprises the following components in mass percentages: 15% to 26% of malic acid, 10% to 20% of lauryl polyoxyethylene ether, 5% to 10% of fatty alcohol polyoxyethylene ether, 5% to 10% of citric acid, 1% to 5% of tartaric acid, and 48% to 64% of water;

[0028] The nickel plate includes any one of electrolytic nickel plates and electrowinning nickel plates.

[0029] The present invention uses a cleaning solution prepared by compounding an organic acid and a polyoxyethylene ether surfactant. Combined with ultrasonic waves, it can efficiently and uniformly remove contaminants and infiltrating contaminants on the surface of nickel plates without increasing the Fe impurity content. Moreover, through spraying treatment and bubbling rinsing, the surface cleaning solution can be effectively removed to avoid residues.

[0030] Among them, the pH value of the cleaning solution obtained according to the above ratio is ≤3. The acidic condition formed by malic acid, citric acid, and tartaric acid is more conducive to removing oil stains on the surface of nickel plates and Fe and the like increased due to shot blasting treatment. Combined with a polyoxyethylene ether surfactant, the surface tension of the cleaning solution promotes the wetting and penetration of the cleaning solution on the nickel plate. Combined with the cavitation effect of ultrasonic waves, it can efficiently remove contaminants on the surface of nickel plates, infiltrating contaminants in gaps, and electrolyte residues, etc., while taking into account a low nickel loss rate.

[0031] In different embodiments, by mass percentage, the amounts of each component in the cleaning solution used for ultrasonic cleaning can be as follows:

[0032] The amount of malic acid can be 15%, 18%, 20%, 22%, 24%, 26% or the range composed of any two of them;

[0033] The amount of lauryl alcohol polyoxyethylene ether can be 10%, 12%, 15%, 18%, 20% or the range composed of any two of them;

[0034] The amount of fatty alcohol polyoxyethylene ether can be 5%, 6%, 8%, 9%, 10% or the range composed of any two of them;

[0035] The amount of citric acid can be 5%, 6%, 8%, 9%, 10% or the range composed of any two of them;

[0036] The amount of tartaric acid can be 1%, 2%, 3%, 4%, 5% or the range composed of any two of them;

[0037] The amount of water can be 48%, 50%, 52%, 55%, 58%, 60%, 62%, 64% or the range composed of any two of them.

[0038] In a specific embodiment of the present invention, in the cleaning solution, the mass ratio of lauryl alcohol polyoxyethylene ether to fatty alcohol polyoxyethylene ether is (1.5 - 2)﹕1. For example, it can be 1.5﹕1, 1.6﹕1, 1.7﹕1, 1.8﹕1, 1.9﹕1, 2﹕1 or the range composed of any two of them, so as to further improve the impurity removal rate and reduce the residue situation of the cleaning solution.

[0039] In a specific embodiment of the present invention, during ultrasonic cleaning, the temperature of the cleaning liquid is 50 to 80 °C, for example, it can be 50 °C, 55 °C, 60 °C, 65 °C, 70 °C, 75 °C, 80 °C or the range composed of any two of them, so as to balance the removal rate and efficiency of impurities. Further, the time of ultrasonic cleaning is 3 to 10 min, for example, it can be 3 min, 4 min, 6 min, 8 min, 10 min or the range composed of any two of them.

[0040] In actual operation, ultrasonic cleaning can be carried out in an ultrasonic cleaning machine. Place the cleaning liquid in the water tank of the ultrasonic cleaning machine and set the heating temperature of the water tank so that the temperature of the cleaning liquid reaches 50 to 80 °C. Further, a crawler through-type ultrasonic cleaning machine can be used for ultrasonic cleaning operation; among them, the ultrasonic frequency can be a conventional frequency such as 28 to 40 kHz, but it is not limited to this.

[0041] In a specific embodiment of the present invention, water is used for spray treatment, and the temperature of the water is 60 to 90 °C, for example, it can be 60 °C, 65 °C, 70 °C, 75 °C, 80 °C, 85 °C, 90 °C or the range composed of any two of them.

[0042] In a specific embodiment of the present invention, during spray treatment, the spray pressure is 0.2 to 0.4 MPa, for example, it can be 0.2 MPa, 0.25 MPa, 0.3 MPa, 0.35 MPa, 0.4 MPa or the range composed of any two of them; the spray flow rate is 6 to 8 m 3 / h, for example, it can be 6 m 3 / h, 6.5 m 3 / h, 7 m 3 / h, 7.5 m 3 / h, 8 m 3 / h or the range composed of any two of them. Controlling the spray pressure and spray flow rate in the above range during spray treatment is more conducive to cleaning and removing the impurities peeled off during ultrasonic cleaning and the cleaning liquid residue, while taking into account low water consumption and reducing the burden of wastewater treatment.

[0043] In a specific embodiment of the present invention, the time of spray treatment is 1 to 5 min, for example, it can be 1 min, 2 min, 3 min, 4 min, 5 min or the range composed of any two of them.

[0044] In a specific embodiment of the present invention, the spray treatment includes a first-stage spray treatment and a second-stage spray treatment; the time of the first-stage spray treatment is 0.5 to 2.5 min, and the time of the second-stage spray treatment is 0.5 to 2.5 min.

[0045] In the specific embodiments of the present invention, the spray pressures of the first-stage spray treatment and the second-stage spray treatment are P1 and P2 respectively, and the water temperatures are T1 and T2 respectively, and the following conditions are satisfied: P1 < P2, T1 < T2.

[0046] In the first-stage spray treatment of the present invention, a relatively low spray pressure and a relatively low water temperature are adopted to ensure uniform flushing of the entire nickel plate and avoid re-sputtering of the peeled impurities onto the nickel plate surface due to too high spray pressure; in the second-stage spray treatment, since the surface impurities have been basically flushed away, increasing the spray pressure and water temperature helps to flush and remove the impurities remaining in the gaps.

[0047] In the specific embodiments of the present invention, P1 is 0.2 to 0.3 MPa, for example, it can be 0.2 MPa, 0.22 MPa, 0.25 MPa, 0.28 MPa, 0.3 MPa or the range composed of any two of them, P2 is 0.3 to 0.4 MPa, for example, it can be 0.3 MPa, 0.32 MPa, 0.35 MPa, 0.38 MPa, 0.4 MPa or the range composed of any two of them; T1 is 70 to 75 °C, and T2 is 80 to 85 °C.

[0048] In actual operation, the first-stage spray treatment and the second-stage spray treatment of the present invention can be carried out by using a conventional water spray device.

[0049] In the specific embodiments of the present invention, during the bubbling rinsing, the water temperature is 70 to 90 °C, for example, it can be 70 °C, 75 °C, 80 °C, 85 °C, 90 °C or the range composed of any two of them. Further, the time of the bubbling rinsing is 3 to 6 min, for example, it can be 3 min, 4 min, 5 min, 6 min or the range composed of any two of them.

[0050] During the bubbling rinsing process, the turbulence generated when the bubbles rise in the liquid can penetrate into the fine grooves or holes on the nickel plate surface to avoid cleaning blind spots; at the same time, the micro-jet generated by the bubble rupture can physically peel off the adsorbed particles or organic residues, further improving the removal rate of impurities and cleaning liquid residues. In actual operation, the bubbling rinsing of the present invention can be carried out by using a conventional bubbling rinsing device. During the bubbling rinsing process, an inert gas is preferably used to avoid oxidation and the like.

[0051] In the specific embodiments of the present invention, the drying method is drying by baking. Further, the drying temperature is 80 to 100 °C, the drying air pressure is 0.02 to 0.04 MPa, and the drying time is 2 to 6 min.

[0052] In actual operation, a conventional dryer can be used for the drying operation.

[0053] The cleaning process of the present invention takes a short time and can be completed within 10 - 27 minutes, such as within 10 - 20 minutes. If a conveyor belt is used for transmission and corresponding cleaning processes are carried out, due to the short time consumption, the length of the corresponding working section is short, which helps to reduce the floor area of the equipment.

[0054] In a specific embodiment of the present invention, the shot peening time is 30 - 40 minutes. The shot peening of the present invention can be carried out according to the conventional shot peening operation of nickel plates. Further, before shot peening, a shearing machine can be used to cut the nickel plate to obtain a nickel plate with dimensions not exceeding 150 mm × 150 mm × 10 mm, and then the processes of shot peening, ultrasonic cleaning, spray treatment, bubbling rinsing, and drying are carried out.

[0055] The original electrolytic nickel plates used in the following specific embodiments are all conventional commercially available electrolytic nickel plates of the same batch.

[0056] Example 1

[0057] This embodiment provides a cleaning method for electrolytic nickel plates, including the following steps:

[0058] (1) Cut the original electrolytic nickel plate through a shearing machine to obtain a nickel plate with dimensions of 150 mm × 150 mm × 10 mm, and then carry out shot peening for 35 minutes.

[0059] (2) Prepare a cleaning solution and place it in an ultrasonic cleaner. Set the heating temperature of the ultrasonic cleaner to 65°C, and then place the nickel plate after shot peening into the cleaning solution of the ultrasonic cleaner and turn on the ultrasonic wave for 5.5 minutes. Among them, the cleaning solution includes the following components by mass percentage: 20% malic acid, 13% lauryl polyoxyethylene ether, 7% fatty alcohol polyoxyethylene ether, 6% citric acid, 3% tartaric acid, and 51% water. The preparation method of the cleaning solution is to weigh the above components in proportion and stir and mix them evenly.

[0060] (3) Place the nickel plate processed in step (2) into the first water spray device, set the water temperature to 70°C, the spray pressure to 0.25 MPa, and the spray flow rate to 7 m 3 / h, and carry out spray treatment for 1.4 minutes; then place the nickel plate into the second water spray device, set the water temperature to 80°C, the spray pressure to 0.35 MPa, and the spray flow rate to 7 m 3 / h, and carry out spray treatment for 1.4 minutes.

[0061] (4) Place the nickel plate processed in step (3) into a bubbling rinsing device, set the water temperature to 80°C, and carry out bubbling rinsing for 4.8 minutes.

[0062] (5) Place the nickel plate processed in step (4) in a dryer, set the drying temperature at 90 °C, the air pressure of the fan at 0.03 MPa, and conduct the drying treatment for 4.1 min to obtain the processed electrolytic nickel plate.

[0063] Example 2

[0064] This example refers to the cleaning method of the electrolytic nickel plate in Example 1, with the only difference being the composition of the cleaning solution in step (2).

[0065] The cleaning solution in this example includes the following components by mass percentage: 20% malic acid, 10% lauryl alcohol polyoxyethylene ether, 10% fatty alcohol polyoxyethylene ether, 6% citric acid, 3% tartaric acid, and 51% water.

[0066] Example 3

[0067] This example refers to the cleaning method of the electrolytic nickel plate in Example 1, with the only difference being the composition of the cleaning solution in step (2).

[0068] The cleaning solution in this example includes the following components by mass percentage: 20% malic acid, 15% lauryl alcohol polyoxyethylene ether, 5% fatty alcohol polyoxyethylene ether, 6% citric acid, 3% tartaric acid, and 51% water.

[0069] Example 4

[0070] This example refers to the cleaning method of the electrolytic nickel plate in Example 1, with the only difference being the heating temperature of the ultrasonic cleaner in step (2).

[0071] In step (2) of this example, the heating temperature of the ultrasonic cleaner is 50 °C.

[0072] Example 5

[0073] This example refers to the cleaning method of the electrolytic nickel plate in Example 1, with the only difference being the heating temperature of the ultrasonic cleaner in step (2).

[0074] In step (2) of this example, the heating temperature of the ultrasonic cleaner is 80 °C.

[0075] Example 6

[0076] This example refers to the cleaning method of the electrolytic nickel plate in Example 1, with the only difference being the spray treatment in step (3).

[0077] Step (3) of this example includes: placing the nickel plate processed in step (2) in the first water spray device, setting the water temperature at 80 °C, the spray pressure at 0.35 MPa, the spray flow rate at 7 m 3 / h, and conducting the spray treatment for 1.4 min.

[0078] Example 7

[0079] This example refers to the cleaning method of electrolytic nickel plates in Example 1, with the only difference being the spray treatment in step (3).

[0080] Step (3) of this example includes: placing the nickel plate treated in step (2) in the first water spray device, setting the water temperature to 30 °C, the spray pressure to 0.1 MPa, and the spray flow rate to 7 m 3 / h, and performing spray treatment for 1.4 min; then placing the nickel plate in the second water spray device, setting the water temperature to 80 °C, the spray pressure to 0.35 MPa, and the spray flow rate to 7 m 3 / h, and performing spray treatment for 1.4 min.

[0081] Comparative Example 1

[0082] Comparative Example 1 refers to the cleaning method of electrolytic nickel plates in Example 1, with the difference being the composition of the cleaning solution in step (2).

[0083] The cleaning solution in Comparative Example 1 includes the following components by mass percentage: 20% malic acid, 20% lauryl polyoxyethylene ether, 6% citric acid, 3% tartaric acid, and 51% water.

[0084] Comparative Example 2

[0085] Comparative Example 2 refers to the cleaning method of electrolytic nickel plates in Example 1, with the difference being the composition of the cleaning solution in step (2).

[0086] The cleaning solution in Comparative Example 2 includes the following components by mass percentage: 20% malic acid, 20% fatty alcohol polyoxyethylene ether, 6% citric acid, 3% tartaric acid, and 51% water.

[0087] Comparative Example 3

[0088] Comparative Example 3 refers to the cleaning method of electrolytic nickel plates in Example 1, with the difference being the composition of the cleaning solution in step (2).

[0089] The cleaning solution in Comparative Example 3 includes the following components by mass percentage: 20% malic acid, 13% lauryl polyoxyethylene ether, 7% fatty alcohol polyoxyethylene ether, 9% citric acid, and 51% water.

[0090] Comparative Example 4

[0091] Comparative Example 4 refers to the cleaning method of electrolytic nickel plates in Example 1, with the difference being the composition of the cleaning solution in step (2).

[0092] The cleaning solution in Comparative Example 4 comprises the following components by mass percentage: 20% malic acid, 13% lauryl polyoxyethylene ether, 7% fatty alcohol polyoxyethylene ether, 9% tartaric acid, and 51% water.

[0093] Experimental Example

[0094] In order to compare and illustrate the cleaning effects of the cleaning methods of different Examples and Comparative Examples on electrolytic nickel plates, the purity of the electrolytic nickel plates finally obtained in different Examples and Comparative Examples was detected, and the results are shown in Table 1. The detection method refers to GB / T8647 Methods for Chemical Analysis of Nickel. The test object is the surface layer of the nickel plate, and the sampling depth ≤ 0.5 mm; and the color of the nickel plate surface was visually detected. If the nickel plate surface is the natural color of the metal, it indicates that there is no residue of the cleaning solution; if the nickel plate surface is dull, it indicates that there is residue of the cleaning solution.

[0095] Table 1 Test Results of Electrolytic Nickel Plates Obtained by Different Methods

[0096]

[0097]

[0098] From the above test results, it can be seen that for the cleaning method of the electrolytic nickel plate of the present invention, a cleaning solution prepared by compounding an organic acid and a polyoxyethylene ether surfactant, in combination with ultrasonic waves, can efficiently and uniformly remove the surface and infiltrated oxides of the electrolytic nickel plate, and clean and remove impurities such as Fe and O increased due to shot peening, and avoid chemical contamination of the Ni plate itself; and through spray treatment and bubbling rinsing, the surface cleaning solution can be effectively removed, avoiding the residue of organic substances.

[0099] Finally, it should be noted that: the above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit it; although the present invention has been described in detail with reference to the foregoing embodiments, those of ordinary skill in the art should understand that: they can still modify the technical solutions described in the foregoing embodiments, or perform equivalent replacements on some or all of the technical features; and these modifications or replacements do not make the essence of the corresponding technical solutions deviate from the scope of the technical solutions of the embodiments of the present invention.

Claims

1. A cleaning method for nickel plates, characterized in that, It includes the following steps: shot-blast the nickel plate, and then successively carry out ultrasonic cleaning, spray treatment, bubbling rinsing and drying; The cleaning liquid used for the ultrasonic cleaning includes the following components by mass percentage: malic acid 15% - 26%, lauryl polyoxyethylene ether 10% - 20%, fatty alcohol polyoxyethylene ether 5% - 10%, citric acid 5% - 10%, tartaric acid 1% - 5% and water 48% - 64%; The nickel plate includes any one of electrolytic nickel plates and electrowon nickel plates.

2. The cleaning method of the nickel plate according to claim 1, characterized in that In the cleaning liquid, the mass ratio of the lauryl polyoxyethylene ether to the fatty alcohol polyoxyethylene ether is (1.5 - 2):

1.

3. The cleaning method of the nickel plate according to claim 1, wherein, In the ultrasonic cleaning, the temperature of the cleaning liquid is 50 - 80°C; Preferably, the time for the ultrasonic cleaning is 3 - 10 min.

4. The cleaning method of the nickel plate according to claim 1, characterized in that, Water is used for the spray treatment, and the temperature of the water is 60 - 90°C; Preferably, the time for the spray treatment is 1 - 5 min.

5. The cleaning method of the nickel plate according to claim 1, characterized in that In the spray treatment, the spray pressure is 0.2 - 0.4 MPa, and the spray flow rate is 6 - 8 m 3 / h.

6. The cleaning method of the nickel plate according to claim 1, wherein, The spray treatment includes a first-stage spray treatment and a second-stage spray treatment; the time for the first-stage spray treatment is 0.5 - 2.5 min, and the time for the second-stage spray treatment is 0.5 - 2.5 min.

7. The cleaning method of the nickel plate according to claim 6, wherein, The spray pressures for the first-stage spray treatment and the second-stage spray treatment are P1 and P2 respectively, and the water temperatures are T1 and T2 respectively, and they satisfy: P1 < P2, T1 < T2.

8. The cleaning method of the nickel plate according to claim 7, wherein P1 is 0.2 - 0.3 MPa, P2 is 0.3 - 0.4 MPa; T1 is 70 - 75°C, T2 is 80 - 85°C.

9. The cleaning method of the nickel plate according to claim 1, characterized in that, In the bubbling rinsing, the water temperature is 70 - 90°C; Preferably, the time for the bubbling rinsing is 3 - 6 min.

10. The cleaning method of the nickel plate according to claim 1, characterized in that, The drying method is drying by baking; Preferably, the temperature for drying by baking is 80 - 100°C, the air pressure for drying by baking is 0.02 - 0.04 MPa, and the time for drying by baking is 2 - 6 min.

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