Waste gas treatment mechanism for photoresist production

Abstract

The invention relates to the technical field of waste gas filtration and adsorption treatment, in particular to a waste gas treatment mechanism for photoresist production, which comprises a photoresist production waste gas treatment box group, and has the beneficial effects that three independent waste gas treatment units are formed by designing a heat insulation adsorption bin assembly in the photoresist production waste gas treatment box group; an adsorption bed mounting assembly is designed in each group of heat insulation adsorption bin assembly to be matched with an adsorption filter bed assembly, so that waste gas is continuously captured, adsorbed and filtered by a triangular adsorption bed during adsorption and sequentially passes through three waste gas treatment units, and the adsorption filter path of the waste gas is prolonged; during desorption, the triangular adsorption bed keeps rotating opposite to that during adsorption, so that an originally compact adsorption material in the triangular adsorption bed is loosened due to increase of a filling space, and the adsorption effect of organic compounds contained in the waste gas is improved; steam is introduced through the steam dispersing pipe, so that the adsorbed organic compounds are more easily thermally desorbed by the steam, and the desorption efficiency is improved.

Description

Technical Field

[0001] The present invention belongs to the technical field of waste gas filtration and adsorption treatment, and particularly relates to a waste gas treatment mechanism for photoresist production. Background Art

[0002] Photoresist is a key material used in the semiconductor manufacturing process, especially for pattern transfer in the fields of microelectronics and nanotechnology. In the formulation of photoresist, various organic solvents such as acetone and isopropanol are often used. These solvents may form volatile organic compounds (VOCs) during mixing, coating, and subsequent processing. The direct emission of such organic waste gas will cause serious pollution to the environment. At present, in the existing technologies, the purification methods for such organic waste gas include catalytic combustion method, absorption method, condensation recovery method, and adsorption recovery method, etc. Among them, the activated carbon fiber adsorption used in the adsorption recovery method has a high purification efficiency for organic waste gas, is particularly suitable for organic waste gas with a large air volume and low concentration, and the treatment cost is also relatively low.

[0003] The Chinese patent document with the publication number CN103055657B proposes an organic waste gas purification and treatment device, which solves the above technical problems by adopting the desorption method of activated carbon fiber adsorption and mechanical extrusion. However, activated carbon fiber is a material with a porous structure, and its adsorption performance depends on these tiny pores. Mechanical extrusion may cause physical damage to the fiber, resulting in the collapse or blockage of the pore structure, and its adsorption capacity will greatly decrease under the state of repeatedly applying mechanical pressure.

[0004] Therefore, the present invention proposes a waste gas treatment mechanism for photoresist production, which solves the problem that the physical damage to the activated carbon fiber may be caused by mechanical extrusion during the desorption of activated carbon adsorption in the prior art, resulting in the collapse or blockage of the pore structure and thus damaging its adsorption capacity. The adsorption filter bed is improved, and an adsorption bed that can be telescoped and moved is designed, which is filled with adsorption particles to adsorb, filter, and intercept the organic waste gas when the waste gas from photoresist production is introduced. A steam pipeline is designed inside the adsorption filter bed, and steam is used to desorb the organic waste gas and then centralized for recovery. Summary of the Invention

[0005] Aiming at the deficiencies existing in the prior art, the purpose of the present invention is to provide a waste gas treatment mechanism for photoresist production to solve the problems proposed in the above background art.

[0006] To achieve the above object, the present invention provides the following technical solution: An exhaust gas treatment mechanism for photoresist production, including a photoresist production exhaust gas treatment box group. A steam input device is arranged below the photoresist production exhaust gas treatment box group. The output pipe end of the steam input device is fixedly installed with a steam delivery pipe. The branch pipe end of the steam delivery pipe penetrates through the lower side wall of the photoresist production exhaust gas treatment box group. A VOCs gas recovery pipe is fixedly installed on the upper side wall of the photoresist production exhaust gas treatment box group. An insulation adsorption bin assembly is arranged inside the photoresist production exhaust gas treatment box group. The insulation adsorption bin assembly includes a fixed adsorption bin, a sealed bin cover, and a diversion grid. The fixed adsorption bin is fixedly installed in the middle of the inner surface of the photoresist production exhaust gas treatment box group. An adsorption and filtration bed assembly is arranged inside the fixed adsorption bin. The adsorption and filtration bed assembly includes a base, a steam dispersion pipe, and a triangular adsorption bed. An adsorption bed installation assembly is arranged below the fixed adsorption bin. The adsorption bed installation assembly includes a rotating tray and a mounting seat.

[0007] Preferably, a circular installation groove adapted to the base is provided on the bottom inner wall of the fixed adsorption bin, and an installation through hole adapted to the steam dispersion pipe is provided in the middle of the installation groove.

[0008] Preferably, the steam dispersion pipe is fixedly installed in the middle of the inner wall of the base. Triangular adsorption beds are evenly distributed on the outer surface of the steam dispersion pipe. The lower surface of the triangular adsorption bed is fixedly connected to the upper surface of the base.

[0009] Preferably, one end of the triangular adsorption bed is fixedly connected to the outer surface of the steam dispersion pipe. Steam output grooves are provided at positions corresponding to the triangular adsorption beds on the side wall of the steam dispersion pipe. A spiral limiting rod is fixedly installed at the top of the inner surface of the steam dispersion pipe.

[0010] Preferably, a blade wheel is arranged above the inside of the steam dispersion pipe. A chute adapted to the spiral limiting rod is provided at the center of the inner wall of the blade wheel. A sealed baffle is fixedly installed on the outside of the blade wheel.

[0011] Preferably, an adsorption groove is provided on one side wall of the triangular adsorption bed. A movable frame is movably installed on the other side wall of the adsorption groove. Spring telescopic connecting rods are fixedly installed on the upper and lower sides of the movable frame respectively.

[0012] Preferably, one end of the spring telescopic connecting rod is fixedly connected to the inner side surface of the triangular adsorption bed. A through groove is provided on the inner wall of the side of the movable frame close to the adsorption groove. The through groove and the adsorption groove are staggered.

[0013] Preferably, a ventilation plate is fixedly installed on the other side of the movable frame. A folding support side plate is fixedly installed between the inner surface of the ventilation plate and the outer surface of the adsorption groove. A ventilation partition net is fixedly installed between the side surface of the movable frame and the inner surface of the triangular adsorption bed. The ventilation partition net is arranged on both sides of the adsorption groove.

[0014] Preferably, the rotating tray is rotatably installed above the bottom partition of the photoresist production waste gas treatment tank group. The mounting seat is fixedly installed in the middle of the upper surface of the rotating tray. An installation groove adapted to the steam dispersion pipe is arranged inside the mounting seat. Locking pins are symmetrically and rotatably installed on the side wall of the mounting seat. A sealing gasket is snap-fitted inside the installation groove of the mounting seat.

[0015] Preferably, a sealing sleeve is fixedly installed in the middle of the inner wall of the mounting seat. The upper outer surface of the sealing sleeve is sleeved with the lower inner surface of the steam dispersion pipe. A Y-shaped steam input pipe is fixedly installed below the bottom partition of the photoresist production waste gas treatment tank group. The lower outer surface of the sealing sleeve is movably sleeved with the upper inner surface of the Y-shaped steam input pipe. The lower end of the Y-shaped steam input pipe is fixedly connected to the output pipe end of the VOCs gas recovery pipe. A rotation drive assembly is arranged on one side of the bottom partition of the photoresist production waste gas treatment tank group.

[0016] Preferably, a sealing cover is arranged above the fixed adsorption bin. A limiting strip is fixedly installed on the outer side of the lower surface of the sealing cover. A limiting groove adapted to the limiting strip is arranged inside the sealing cover. A converging cover is fixedly installed below the inner surface of the limiting strip. Movable closing pages are evenly distributed above the sealing cover. One side of the movable closing page is hinged to the inner wall of the sealing cover.

[0017] Preferably, a flow guiding grid is arranged above the sealing cover. Vertical flow guiding plates adapted to the movable closing pages are evenly distributed inside the flow guiding grid. An inclined flow guiding plate is obliquely and fixedly installed above the inner surface of the photoresist production waste gas treatment tank group. Inclined flow guiding fins are evenly distributed on the lower surface of the inclined flow guiding plate. A lifting drive assembly is arranged at the top of the photoresist production waste gas treatment tank group.

[0018] Compared with the prior art, the beneficial effects of the present invention are: By designing a heat-insulating adsorption bin assembly inside the waste gas treatment box group for photoresist production, three independent waste gas treatment units are formed. And inside each heat-insulating adsorption bin assembly, an adsorption bed installation assembly is designed to cooperate with the adsorption and filtration bed assembly. When the waste gas is adsorbed, it is continuously captured, adsorbed, and filtered by the triangular adsorption bed and passes through the three waste gas treatment units in turn, extending the adsorption and filtration path of the waste gas and improving the adsorption treatment effect on the organic compounds contained in the waste gas. When desorption is carried out, the triangular adsorption bed rotates in the opposite direction to that during adsorption, causing the originally tightly packed adsorption material inside the triangular adsorption bed to become loose due to the increased filling space. Then, steam is introduced through the steam dispersion pipe to make the adsorbed organic compounds more easily desorbed by steam heat, improving the desorption efficiency. Description of the Drawings

[0019] Figure 1 Structural schematic diagram of one side of the whole of the present invention; Figure 2 Structural schematic diagram of the other side of the whole of the present invention; Figure 3 Structural schematic diagram after the maintenance door of the waste gas treatment box group for photoresist production of the present invention is opened; Figure 4 Structural schematic diagram of the overall interior of the waste gas treatment box group for photoresist production of the present invention in the desorption state when viewed from above; Figure 5 Structural schematic diagram of the overall interior of the waste gas treatment box group for photoresist production of the present invention in the adsorption state when viewed from above; Figure 6 Structural schematic diagram of the interior of the waste gas treatment box group for photoresist production of the present invention in the adsorption state; Figure 7 Structural schematic diagram of the whole of the sealing bin cover of the present invention in the closed state; Figure 8 Structural schematic diagram of the adsorption and filtration bed assembly of the present invention in the adsorption state; Figure 9 Structural schematic diagram of the interior of the waste gas treatment box group for photoresist production of the present invention in the desorption state; Figure 10 Structural schematic diagram of the interior above the waste gas treatment box group for photoresist production of the present invention; Figure 11 Structural schematic diagram of the whole of the sealing bin cover of the present invention in the open state; Figure 12 Structural schematic diagram of the adsorption and filtration bed assembly of the present invention in the desorption state; Figure 13 Structural schematic diagram of the installation and connection state of the adsorption bed installation assembly and the adsorption and filtration bed assembly of the present invention; Figure 14It is a schematic structural diagram of the disassembly state of the adsorption and filtration bed assembly of the present invention; Figure 15 It is a schematic structural diagram for comparing the open and closed states of the impeller of the present invention inside the steam dispersion pipe; Figure 16 It is a schematic structural diagram of the triangular adsorption bed of the present invention in the desorption state; Figure 17 It is a schematic structural diagram for comparing the adsorption and desorption states of the triangular adsorption bed of the present invention; Figure 18 It is a schematic structural diagram of the triangular adsorption bed of the present invention in the adsorption state; Figure 19 For the present invention Figure 13 An enlarged schematic structural diagram at position A.

[0020] In the figure: 1. Photoresist production waste gas treatment box group; 11. Waste gas inlet pipe; 12. Waste gas outlet pipe; 2. Steam input device; 3. Steam delivery pipe; 4. VOCs gas recovery pipe; 5. Heat insulation adsorption bin assembly; 51. Fixed adsorption bin; 511. Toggle baffle; 512. Reset pad; 52. Sealing bin cover; 521. Limit strip; 522. Converging cover; 523. Movable closing page; 53. Flow guide grid; 531. Vertical flow guide plate; 54. Inclined flow guide plate; 541. Inclined flow guide fin; 55. Lifting drive assembly; 6. Adsorption bed installation assembly; 61. Rotating tray; 62. Mounting seat; 621. Locking pin; 622. Sealing gasket; 623. Sealing sleeve; 63. Y-shaped steam input pipe; 64. Rotating drive assembly; 7. Adsorption and filtration bed assembly; 71. Base; 72. Steam dispersion pipe; 721. Steam output groove; 722. Impeller; 7221. Sealing flap; 723. Spiral limiting rod; 73. Triangular adsorption bed; 731. Adsorption groove; 732. Ventilation plate; 7321. Folding support side plate; 733. Movable frame; 7331. Spring telescopic connecting rod; 7332. Through groove; 7333. Ventilation partition net. Detailed implementation manners

[0021] In order to clearly and completely describe the purpose, technical solution of the present invention, and make the advantages more clear, the following further details the embodiments of the present invention with reference to the accompanying drawings. It should be understood that the specific embodiments described herein are part of the embodiments of the present invention, rather than all of the embodiments, and are only used to explain the embodiments of the present invention, not to limit the embodiments of the present invention. All other embodiments obtained by those of ordinary skill in the art without creative efforts fall within the scope of protection of the present invention. Embodiment 1

[0022] Please refer to Figures 1 to 19, the present invention provides a technical solution: an exhaust gas treatment mechanism for photoresist production, including a photoresist production exhaust gas treatment tank group 1. A steam input device 2 is arranged below the photoresist production exhaust gas treatment tank group 1. The output pipe end of the steam input device 2 is fixedly installed with a steam delivery pipe 3. The branch pipe end of the steam delivery pipe 3 penetrates through the lower side wall of the photoresist production exhaust gas treatment tank group 1. A VOCs gas recovery pipe 4 is fixedly installed on the upper side wall of the photoresist production exhaust gas treatment tank group 1. An insulated adsorption chamber assembly 5 is arranged inside the photoresist production exhaust gas treatment tank group 1. The insulated adsorption chamber assembly 5 includes a fixed adsorption chamber 51, a sealed chamber cover 52 and a diversion grid 53. The fixed adsorption chamber 51 is fixedly installed in the middle of the inner surface of the photoresist production exhaust gas treatment tank group 1. An adsorption and filtration bed assembly 7 is arranged inside the fixed adsorption chamber 51; in this embodiment, the photoresist production exhaust gas treatment tank group 1 is mainly composed of three treatment tanks arranged side by side. An exhaust gas inlet pipe 11 is arranged on one side of the photoresist production exhaust gas treatment tank group 1, and an exhaust gas outlet pipe 12 is arranged on the other side of the photoresist production exhaust gas treatment tank group 1. An insulated adsorption chamber assembly 5 is arranged inside each treatment tank, and two adsorption and filtration bed assemblies 7 are arranged inside each insulated adsorption chamber assembly 5. The adjacent two treatment tanks and the fixed adsorption chamber 51 are in a through state to facilitate the flow of exhaust gas. A maintenance door is arranged on the front side of each treatment tank, and an insulated sealing plate adapted to the fixed adsorption chamber 51 is installed inside the maintenance door. The purpose of designing the maintenance door is not only to facilitate the maintenance of the inside of the treatment tank, but also to take out the adsorption and filtration bed assembly 7 through the maintenance door to replace the adsorption material as a whole. The exhaust gas generated by photoresist production enters the photoresist production exhaust gas treatment tank group 1 through the exhaust gas inlet pipe 11, and the organic compound VOCs is adsorbed and filtered by the adsorption and filtration bed assembly 7. The preliminarily filtered exhaust gas is discharged through the exhaust gas outlet pipe 12 and can be further treated by pickling, etc. The main function of the steam input device 2 is to generate steam and deliver it to the inside of the photoresist production exhaust gas treatment tank group 1 through the steam delivery pipe 3, and use the steam to desorb the volatile organic compound VOCs adsorbed by the adsorption and filtration bed assembly 7. The desorbed volatile organic compound VOCs will be discharged through the VOCs gas recovery pipe 4 and transported to the condensation recovery workshop for subsequent condensation recovery treatment. The desorbed adsorption and filtration bed assembly 7 can continue to adsorb and filter the exhaust gas. Such a design can not only preliminarily filter the exhaust gas generated by photoresist production, but also effectively recover the organic compound VOCs, save resources and reduce environmental pollution; the adsorption and filtration bed assembly 7 includes a base 71, a steam dispersion pipe 72 and a triangular adsorption bed 73. An adsorption bed installation assembly 6 is arranged below the fixed adsorption chamber 51. The adsorption bed installation assembly 6 includes a rotating tray 61 and a mounting seat 62. The rotating tray 61 is rotatably installed above the bottom partition of the photoresist production exhaust gas treatment tank group 1. Two rotating trays 61 are arranged below each fixed adsorption chamber 51,The positions of the two groups of rotating trays 61 are respectively adapted to the installation positions of the adsorption and filtration bed assemblies 7 above them. The mounting base 62 is fixedly installed in the middle of the upper surface of the rotating tray 61. An installation groove adapted to the steam dispersion pipe 72 is provided inside the mounting base 62. Locking pins 621 are symmetrically and rotatably installed on the side walls of the mounting base 62. A sealing gasket 622 is snap-fitted inside the installation groove of the mounting base 62. A sealing sleeve 623 is fixedly installed in the middle of the inner wall of the mounting base 62. The upper outer surface of the sealing sleeve 623 is sleeved with the lower inner surface of the steam dispersion pipe 72. The mounting base 62 mainly serves to install the steam dispersion pipe 72. It should be noted that trapezoidal protrusions are symmetrically arranged on the outer side below the steam dispersion pipe 72 for engaging with the mounting base 62, so that the steam dispersion pipe 72 and the base 71 can be fixed on the rotating tray 61 and rotate synchronously with the rotation of the rotating tray 61. The specific installation method between the mounting base 62 and the steam dispersion pipe 72 is as follows: by pulling the locking pin 621 outward, the pressing of the locking pin 621 on the sealing gasket 622 is cancelled. At this time, the steam dispersion pipe 72 can be pulled out, and the entire adsorption and filtration bed assembly 7 can be disassembled to replace the adsorption material. Then, the steam dispersion pipe 72 is aligned with the mounting base 62 and inserted again, ensuring that the sealing sleeve 623 is inserted into the steam dispersion pipe 72. Then, the locking pin 621 is pulled back to press the sealing gasket 622 again. The sealing gasket 622 not only increases the stability of the connection between the steam dispersion pipe 72 and the mounting base 62 but also increases the sealing performance. The sealing sleeve 623 mainly serves to be sleeved with the upper end of the Y-shaped steam input pipe 63. The sealing sleeve 623 will not be interfered when rotating. High-temperature resistant sealing rings that engage with each other are provided outside the socket of the sealing sleeve 623 and the Y-shaped steam input pipe 63 to ensure the sealing performance. The Y-shaped steam input pipe 63 is fixedly installed below the bottom partition of the photoresist production waste gas treatment tank group 1. The lower outer surface of the sealing sleeve 623 is movably sleeved with the upper inner surface of the Y-shaped steam input pipe 63. The lower end of the Y-shaped steam input pipe 63 is fixedly connected to the output pipe end of the steam delivery pipe 3. The main function of the Y-shaped steam input pipe 63 is to connect with the steam delivery pipe 3 and disperse and input the steam conveyed by the steam delivery pipe 3 into the steam dispersion pipe 72 through the sealing sleeve 623. A rotation driving assembly 64 is provided on one side of the bottom partition of the photoresist production waste gas treatment tank group 1. In this embodiment, the rotation driving assembly 64 mainly consists of a first driving motor, a first rotating shaft, and a gear. The first driving motor is fixedly installed at the bottom of the rear side of each treatment tank. The first rotating shaft is rotatably installed on the bottom partition of the photoresist production waste gas treatment tank group 1. The gear is fixedly installed at the upper end of the first rotating shaft. The lower end of the first rotating shaft is fixedly connected to the output shaft of the first driving motor. Outer gear rings are fixedly installed on the outer surfaces of each group of rotating trays 61, and the outer gear rings of adjacent two groups of rotating trays 61 engage with each other. The gear engages with the side surface of one of the outer gear rings. The main function of the rotation driving assembly 64 is to drive one of the rotating trays 61 to rotate through the gear.This set of rotating trays 61 drives another set of rotating trays 61 to rotate in the opposite direction through the external gear ring. Embodiment 2

[0023] Please refer to Figures 1 to 19 , on the basis of Embodiment 1, this embodiment further proposes that a circular installation groove adapted to the base 71 is provided on the inner wall of the bottom of the fixed adsorption chamber 51, and an installation through hole adapted to the steam dispersion pipe 72 is provided in the middle of the installation groove. The steam dispersion pipe 72 is fixedly installed in the middle of the inner wall of the base 71. The steam dispersion pipe 72 penetrates through the middle of the base 71. Triangular adsorption beds 73 are evenly distributed on the outer surface of the steam dispersion pipe 72. The lower surface of the triangular adsorption bed 73 is fixedly connected to the upper surface of the base 71. One end of the triangular adsorption bed 73 is fixedly connected to the outer surface of the steam dispersion pipe 72. Steam output grooves 721 are provided at positions corresponding to the triangular adsorption beds 73 on the side wall of the steam dispersion pipe 72. A spiral limiting rod 723 is fixedly installed at the top of the inner surface of the steam dispersion pipe 72. A blade wheel 722 is provided above the inside of the steam dispersion pipe 72. A sliding groove adapted to the spiral limiting rod 723 is provided at the center of the inner wall of the blade wheel 722. A sealing flap 7221 is fixedly installed on the outside of the blade wheel 722, and six groups of sealing flaps 7221 are evenly arranged; In this embodiment, in addition to installing and fixing the triangular adsorption bed 73, the steam dispersion pipe 72 also serves to connect with the mounting seat 62 to facilitate the disassembly and replacement of the adsorption material of the overall adsorption filtration bed assembly 7. It also serves to sleeve with the sealing sleeve 623 to evenly introduce steam into the triangular adsorption bed 73 to desorb the organic compounds adsorbed by the triangular adsorption bed 73. In this embodiment, the heat insulation adsorption bin assemblies 5, adsorption bed mounting assemblies 6, and adsorption filtration bed assemblies 7 installed inside the three treatment bins of the photoresist production waste gas treatment box group 1 are all the same. Taking the treatment bin of the photoresist production waste gas treatment box group 1 where the waste gas inlet pipe 11 is installed as an example, the steam introduction and desorption process is specifically described as follows: The rotation drive assembly 64 operates to drive the rotation tray 61 on the side close to the waste gas inlet pipe 11 to rotate clockwise through the gear, and the other rotation tray 61 rotates counterclockwise under the cooperation of the external gear ring, so that the overall steam dispersion pipe 72 installed above the two rotation trays 61 rotates in opposite directions. At this time, the steam input device 2 inputs steam into the two steam dispersion pipes 72 through the steam delivery pipe 3 and the sealing sleeve 623 respectively. The vertically upward steam will directly lift the vane wheel 722. At the same time, in cooperation with the rotation action of the steam dispersion pipe 72, the vane wheel 722 twists during the lifting process under the limiting action of the spiral limiting rod 723, so that the sealing flap 7221 deflects away from the steam output groove 721, canceling the closure of the steam output groove 721, and enabling the steam to enter the triangular adsorption bed 73 through the steam output groove 721 to desorb the organic compounds adsorbed by the triangular adsorption bed 73. After the desorption is completed and it returns to the adsorption state, at this time, the steam delivery pipe 3 closes the steam input. The rotation drive assembly 64 operates to drive the rotation tray 61 on the side close to the waste gas inlet pipe 11 to rotate counterclockwise through the gear, and the other rotation tray 61 rotates clockwise under the cooperation of the external gear ring. Under the action of gravity, the vane wheel 722 cooperates with the rotation of the steam dispersion pipe 72 to reverse twist under the limiting action of the spiral limiting rod 723, causing the sealing flap 7221 to reset and cover the steam output groove 721 again. It should be noted that the length of the spiral limiting rod 723 is limited, and the spiral directions of the spiral limiting rods 723 inside the two adjacent steam dispersion pipes 72 should match the rotation directions of the two steam dispersion pipes 72. For example, when the steam dispersion pipe 72 on the side close to the waste gas inlet pipe 11 rotates clockwise, the spiral limiting rod 723 inside it should cooperate with the steam to lift and twist the vane wheel 722 upward. When it rotates counterclockwise, the spiral limiting rod 723 inside it should cooperate with gravity to twist the vane wheel 722 downward. The steam dispersion pipe 72 on the other side is the opposite. Such a design is mainly to open the steam output groove 721 in cooperation with the rotation of the steam dispersion pipe 72 during steam input and desorption, so that the steam evenly enters the triangular adsorption bed 73 through the steam output groove 721. When performing waste gas adsorption treatment, the steam output groove 721 is closed in cooperation with the reverse rotation of the steam dispersion pipe 72.At this time, the waste gas can only be adsorbed and treated through the triangular adsorption bed 73, reducing the influence of the waste gas entering the steam dispersion pipe 72 on the adsorption treatment effect. Embodiment III

[0024] Please refer to Figures 1 to 19 , on the basis of Embodiment II, this embodiment further proposes that an adsorption groove 731 is formed on one side wall of the triangular adsorption bed 73. A movable frame 733 is movably installed on the other side wall of the adsorption groove 731. Spring telescopic connecting rods 7331 are respectively fixedly installed on the upper and lower sides of the movable frame 733. One end of the spring telescopic connecting rod 7331 is fixedly connected to the inner surface of the triangular adsorption bed 73. A through groove 7332 is formed on the inner wall of the movable frame 733 close to the adsorption groove 731. The through groove 7332 and the adsorption groove 731 are staggeredly distributed. A ventilation plate 732 is fixedly installed on the other side of the movable frame 733. A folding support side plate 7321 is fixedly installed between the inner surface of the ventilation plate 732 and the outer surface of the adsorption groove 731. A ventilation partition net 7333 is fixedly installed between the side surface of the movable frame 733 and the inner surface of the triangular adsorption bed 73. The ventilation partition net 7333 is arranged on both sides of the adsorption groove 731; In this embodiment, first, the triangular adsorption beds 73 are evenly distributed and installed on the side of the steam dispersion pipe 72. The base 71 mainly supports the triangular adsorption beds 73 so that the triangular adsorption beds 73 and the steam dispersion pipe 72 form an integral adsorption bed. The opening position of the triangular adsorption bed 73 corresponds to the position of the steam output groove 721. Such a design is to enable the steam to directly enter the triangular adsorption bed 73 through the steam output groove 721 during desorption, better thermally desorb the organic compounds adsorbed by the adsorption material, improve the utilization efficiency of the steam and the desorption efficiency. The ventilation plate 732 and the movable frame 733 form a foldable and extendable mesh cover, which is movably installed on one side of the triangular adsorption bed 73 through the folding support side plate 7321. As the steam dispersion pipe 72 rotates, under the action of centrifugal force, the ventilation plate 732 and the movable frame 733 as a whole can deform, from attachment Figure 5 and attachment Figure 4It can be seen that in order to cooperate with the rotation directions of the two groups of steam dispersion pipes 72 installed inside a group of treatment boxes, the rotation directions of the triangular adsorption beds 73 installed outside the two groups of steam dispersion pipes 72 are opposite. The present embodiment takes a group of steam dispersion pipes 72 close to the exhaust gas inlet pipe 11 as an example to specifically illustrate the different effects of the triangular adsorption bed 73 in different forms of desorption and adsorption states. First, in the adsorption state, the adsorption bed composed of the steam dispersion pipe 72 close to the exhaust gas inlet pipe 11 and the triangular adsorption bed 73 will rotate counterclockwise as a whole. The movable frame 733 and the air-permeable plate 732 installed on one side of the triangular adsorption bed 73 will shrink and fit the overall frame of the triangular adsorption bed 73 under the cooperation of the centrifugal force. The spring telescopic connecting rod 7331 is in a normal state, and the folding support side plate 7321 is in a folded state. The through grooves 7332 and the adsorption grooves 731 are staggered and separated by the air-permeable partition net 7333 in the middle, which not only increases the filling space of the adsorption material, but also forms independent adsorption small compartments after the adsorption material is filled. As the steam dispersion pipe 72 rotates counterclockwise, the exhaust gas enters the pipe through the exhaust gas. 11 enters, the triangular adsorption bed 73 automatically captures the exhaust gas through the adsorption tank 731 and enters the adsorption compartment inside the triangular adsorption bed 73 when rotating, maximally extending the adsorption and filtration treatment area of ​​the exhaust gas, and at this time, the air permeable plate 732 and the movable frame 733 fit the overall frame of the triangular adsorption bed 73, so that the adsorption material maintains a certain degree of tightness, and improves the adsorption and filtration effect of organic compounds. After a period of adsorption, when desorption is required, the adsorption bed composed of the steam dispersion pipe 72 and the triangular adsorption bed 73 will rotate clockwise as a whole, and at this time, the adsorption bed installed in The movable frame 733 and the breathable plate 732 on one side of the triangular adsorption bed 73 will protrude under the cooperation of centrifugal force and detach from the frame of the triangular adsorption bed 73. The spring telescopic connecting rod 7331 is in a compressed state, and the folding support side plate 7321 is in an extended state. The breathable partition net 7333 will remain stretched to increase the area in direct contact with the steam. At this time, the originally tight adsorption material will become loose due to the increase in the filling space, and then steam will be introduced through the steam output groove 721. At this time, the adsorbed organic compounds will be more easily desorbed by steam. In this embodiment, the adsorption material Figure 4It can be seen that a reset pad 512 is further provided on the side wall of the fixed adsorption chamber 51, and a toggle baffle 511 is rotatably installed on the upper surface of the bottom of the fixed adsorption chamber 51. The reset pad 512 has an elastic limiting effect on the toggle baffle 511. When desorbing during the clockwise rotation of the steam dispersion pipe 72, the air-permeable plate 732 will break away under the action of centrifugal force and collide with the toggle baffle 511 during the rotation. During the extrusion, it will return to the recovery state, and then miss the toggle baffle 511 and break away from the extension again due to centrifugal force. This design is to squeeze the adsorption material with a smaller force during the desorption process, increase the activity between the adsorption materials and the interaction with the steam, make the adsorbed organic compounds easier to desorb, and improve the desorption efficiency. Embodiment 4

[0025] Please refer to Figures 1 to 19 , on the basis of Embodiment 3, this embodiment further proposes that a sealed cover 52 is provided above the fixed adsorption chamber 51. A limiting strip 521 is fixedly installed on the outer side of the lower surface of the sealed cover 52. A limiting groove adapted to the limiting strip 521 is provided inside the sealed cover 52. A converging cover 522 is fixedly installed below the inner surface of the limiting strip 521. Movable closing pages 523 are evenly distributed above the sealed cover 52. One side of the movable closing page 523 is hinged to the inner wall of the sealed cover 52. A diversion grid 53 is provided above the sealed cover 52. Vertical diversion plates 531 adapted to the movable closing pages 523 are evenly distributed inside the diversion grid 53. An inclined diversion plate 54 is fixedly installed obliquely above the inner surface of the photoresist production waste gas treatment tank group 1. Inclined diversion fins 541 are evenly distributed on the lower surface of the inclined diversion plate 54. A lifting drive assembly 55 is provided at the top of the photoresist production waste gas treatment tank group 1; In this embodiment, the fixed adsorption chamber 51 and the sealed cover 52 mainly form a heat insulation cover. When the adsorption and filtration bed assembly 7 performs adsorption, the sealed cover 52 closes the upper part of the fixed adsorption chamber 51, so that after the waste gas enters through the waste gas inlet pipe 11, it can only pass through the three treatment tanks in sequence and be adsorbed and filtered by the six adsorption and filtration bed assemblies 7 in sequence. Figure 5, the exhaust gas enters the first group of treatment boxes through the exhaust gas inlet pipe 11. At this time, the steam dispersion pipe 72 closest to the exhaust gas inlet pipe 11 rotates counterclockwise first, and the following groups of steam dispersion pipes 72 rotate clockwise and counterclockwise respectively, so that the exhaust gas is continuously captured by the triangular adsorption bed 73 for absorption and filtration, and passes through the three treatment boxes in turn and is finally discharged through the exhaust gas discharge pipe 12. This design not only disperses and extends the treatment path of the exhaust gas, improves the effect of adsorption treatment, but also avoids the problem of uneven exhaust gas adsorption and filtration treatment. In this embodiment, The lifting drive assembly 55 is mainly composed of a second drive motor and a threaded rod. The second drive motor is installed on the top of the treatment box of the photoresist production waste gas treatment box group 1. The threaded rod is mainly rotatably installed above the middle of the fixed adsorption bin 51. The upper end of the threaded rod is fixedly connected to the output shaft of the second drive motor. When the adsorption filter bed assembly 7 is desorbed, the second drive motor of the lifting drive assembly 55 drives the threaded rod to rotate, so that the sealing bin cover 52 rises under the limit cooperation of the limit bar 521. When it rises to contact with the guide grid 53, the vertical guide plate 53 1 will produce resistance to the movable closing page 523, causing the movable closing page 523 to flip open. At this time, the control valves of the exhaust gas inlet pipe 11 and the exhaust gas outlet pipe 12 need to be closed. The steam input device 2 inputs steam into the steam dispersion pipe 72 through the steam delivery pipe 3 to thermally desorb the triangular adsorption bed 73. The desorbed organic compounds will rise, overflow through the movable closing page 523 and the vertical guide plate 531, and be guided by the oblique guide plate 54 and the oblique guide fin 541, and finally discharged and recovered through the VOCs gas recovery pipe 4. The gathering hood 522 mainly gathers the rising area of ​​the upper air flow, and when the triangular adsorption bed 73 is desorbed, taking the treatment box close to the exhaust gas inlet pipe 11 as an example, the steam dispersion pipe 72 close to the exhaust gas inlet pipe 11 rotates clockwise, and the other set of steam dispersion pipes 72 rotates counterclockwise. With the thermal desorption of steam, volatile organic compounds will be mainly concentrated in the middle area of ​​the treatment box with the cooperation of the gathering hood 522, and it is easier to be discharged through the VOCs gas recovery pipe 4, thereby improving the recovery efficiency of organic compounds. Embodiment 5

[0026] See also Figures 1 to 19 Based on the fourth embodiment, this embodiment further proposes a method for using an exhaust gas treatment mechanism for photoresist production, comprising the following steps: Step 1: exhaust gas from photoresist production is discharged, and the exhaust gas inlet pipe 11 is connected to the exhaust gas pipeline of photoresist production through a pipeline so that the exhaust gas enters the exhaust gas treatment box group 1 of photoresist production through the exhaust gas inlet pipe 11; Step 2: Adsorb and filter organic compounds. The waste gas enters the first group of treatment tanks through the waste gas inlet pipe 11. At this time, the steam dispersion pipe 72 closest to the waste gas inlet pipe 11 rotates counterclockwise first, and the subsequent groups of steam dispersion pipes 72 rotate in a clockwise-counterclockwise staggered manner, enabling the waste gas to be continuously captured, adsorbed, and filtered by the triangular adsorption bed 73 and discharged through the waste gas outlet pipe 12 after passing through the three treatment tanks in sequence; Step 3: Conduct desorption. Close the control valves of the waste gas inlet pipe 11 and the waste gas outlet pipe 12, and open the steam input device 2 and the steam delivery pipe 3. At this time, the steam dispersion pipe 72 rotates in the opposite direction to that during adsorption, causing the originally tightly packed adsorption material inside the triangular adsorption bed 73 to become loose due to the increased filling space. Then, steam is introduced through the steam output tank 721. At this time, the adsorbed organic compounds are thermally desorbed by the steam; Step 4: Recover organic compounds. The lifting drive assembly 55 causes the sealed hatch cover 52 to rise under the limiting cooperation of the limiting strip 521. When it rises to contact the diversion grid 53, the movable closing flap 523 flips open. During the desorption of the triangular adsorption bed 73, along with the thermal desorption of the steam, the volatile organic compounds will mainly rise and concentrate in the middle area of the treatment tank under the gathering effect of the gathering hood 522. The desorbed organic compounds will rise and overflow through the movable closing flap 523 and the vertical diversion plate 531, and be diverted by the inclined diversion plate 54 and the inclined diversion fins 541, and finally be discharged through the VOCs gas recovery pipe 4 and enter the subsequent workshop for condensation and recovery.

[0027] Although the embodiments of the present invention have been shown and described, for those of ordinary skill in the art, it can be understood that various changes, modifications, substitutions, and variations can be made to these embodiments without departing from the principles and spirit of the present invention. The scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. An exhaust gas treatment mechanism for photoresist production, including a photoresist production exhaust gas treatment box group (1), a steam input device (2) is arranged below the photoresist production exhaust gas treatment box group (1), a steam delivery pipe (3) is fixedly installed at the output pipe end of the steam input device (2), the branch pipe end of the steam delivery pipe (3) penetrates through the lower side wall of the photoresist production exhaust gas treatment box group (1), and a VOCs gas recovery pipe (4) is fixedly installed on the upper side wall of the photoresist production exhaust gas treatment box group (1), characterized in that: Inside the photoresist production waste gas treatment box group (1), there is a heat insulation adsorption bin assembly (5). The heat insulation adsorption bin assembly (5) includes a fixed adsorption bin (51), a sealed bin cover (52), and a diversion grid (53). The fixed adsorption bin (51) is fixedly installed in the middle of the inner surface of the photoresist production waste gas treatment box group (1). Inside the fixed adsorption bin (51), there is an adsorption filter bed assembly (7). The adsorption filter bed assembly (7) includes a base (71), a steam dispersion pipe (72), and a triangular adsorption bed (73). Below the fixed adsorption bin (51), there is an adsorption bed installation assembly (6). The adsorption bed installation assembly (6) includes a rotating tray (61) and a mounting seat (62).

2. The waste gas treatment mechanism for the production of photoresist according to claim 1, characterized in that: On the bottom inner wall of the fixed adsorption bin (51), there is a circular installation groove adapted to the base (71), and in the middle of the installation groove, there is an installation through hole adapted to the steam dispersion pipe (72).

3. The waste gas treatment mechanism for photoresist production according to claim 2, wherein: The steam dispersion pipe (72) is fixedly installed in the middle of the inner wall of the base (71). On the outer surface of the steam dispersion pipe (72), triangular adsorption beds (73) are evenly distributed. The lower surface of the triangular adsorption bed (73) is fixedly connected to the upper surface of the base (71).

4. An exhaust gas treatment mechanism for photoresist production according to claim 3, characterized in that: One end of the triangular adsorption bed (73) is fixedly connected to the outer surface of the steam dispersion pipe (72). At the position corresponding to the triangular adsorption bed (73) on the side wall of the steam dispersion pipe (72), there is a steam output groove (721). At the top of the inner surface of the steam dispersion pipe (72), there is a spiral limiting rod (723) fixedly installed.

5. An exhaust gas treatment mechanism for photoresist production according to claim 4, characterized in that: Above the inside of the steam dispersion pipe (72), there is a blade wheel (722). In the center of the inner wall of the blade wheel (722), there is a chute adapted to the spiral limiting rod (723). On the outside of the blade wheel (722), there is a sealed baffle (7221) fixedly installed.

6. An exhaust gas treatment mechanism for photoresist production according to claim 4, characterized in that: On one side wall of the triangular adsorption bed (73), there is an adsorption groove (731). On the other side wall of the adsorption groove (731), there is a movable frame (733) movably installed. On the upper and lower sides of the movable frame (733), there are spring telescopic connecting rods (7331) fixedly installed respectively.

7. An exhaust gas treatment mechanism for photoresist production according to claim 6, characterized in that: One end of the spring telescopic connecting rod (7331) is fixedly connected to the inner surface of the triangular adsorption bed (73). On the inner wall of the side of the movable frame (733) close to the adsorption groove (731), there is a through groove (7332), and the through groove (7332) and the adsorption groove (731) are staggered.

8. An exhaust gas treatment mechanism for photoresist production according to claim 7, characterized in that: On the other side of the movable frame (733), there is a breathable plate (732) fixedly installed. Between the inner surface of the breathable plate (732) and the outer surface of the adsorption groove (731), there is a folding support side plate (7321) fixedly installed. Between the side surface of the movable frame (733) and the inner surface of the triangular adsorption bed (73), there is a breathable partition net (7333) fixedly installed, and the breathable partition net (7333) is arranged on both sides of the adsorption groove (731).

9. An exhaust gas treatment mechanism for photoresist production according to claim 1, characterized in that: The rotating tray (61) is rotatably installed above the bottom partition of the photoresist production waste gas treatment tank group (1). The mounting seat (62) is fixedly installed in the middle of the upper surface of the rotating tray (61). An installation groove adapted to the steam dispersion pipe (72) is provided inside the mounting seat (62). Locking pins (621) are symmetrically and rotatably installed on the side wall of the mounting seat (62). A sealing gasket (622) is snap-fitted inside the installation groove of the mounting seat (62).

10. An exhaust gas treatment mechanism for photoresist production according to claim 9, characterized in that: A sealing sleeve (623) is fixedly installed in the middle of the inner wall of the mounting seat (62). The upper part of the outer surface of the sealing sleeve (623) is sleeved with the lower part of the inner surface of the steam dispersion pipe (72). A Y-shaped steam input pipe (63) is fixedly installed below the bottom partition of the photoresist production waste gas treatment tank group (1). The lower part of the outer surface of the sealing sleeve (623) is movably sleeved with the upper part of the inner surface of the Y-shaped steam input pipe (63). The lower end of the Y-shaped steam input pipe (63) is fixedly connected to the output pipe end of the VOCs gas recovery pipe (4). A rotation driving assembly (64) is provided on one side of the bottom partition of the photoresist production waste gas treatment tank group (1).

11. An exhaust gas treatment mechanism for the production of photoresist according to claim 1, characterized in that: A sealing cover (52) is provided above the fixed adsorption chamber (51). A limiting strip (521) is fixedly installed on the outer side of the lower surface of the sealing cover (52). A limiting groove adapted to the limiting strip (521) is provided inside the sealing cover (52). A converging cover (522) is fixedly installed on the lower part of the inner surface of the limiting strip (521). Movable closing pages (523) are evenly distributed above the sealing cover (52). One side of the movable closing page (523) is hinged to the inner wall of the sealing cover (52).

12. An exhaust gas treatment mechanism for photoresist production according to claim 11, characterized in that: A diversion grid (53) is provided above the sealing cover (52). Vertical diversion plates (531) adapted to the movable closing pages (523) are evenly distributed inside the diversion grid (53). An inclined diversion plate (54) is inclined and fixedly installed above the inner surface of the photoresist production waste gas treatment tank group (1). Inclined diversion fins (541) are evenly distributed on the lower surface of the inclined diversion plate (54). A lifting driving assembly (55) is provided at the top of the photoresist production waste gas treatment tank group (1).

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