Single crystal grinding fluid coarse grinding device

Abstract

The invention belongs to the technical field of grinding equipment, and particularly relates to a single crystal grinding fluid coarse grinding device which comprises a main body mechanism, a lifting column is mounted on one side of the top of the main body mechanism, a mounting seat is arranged on the top of the lifting column and can flexibly drive a grinding mechanism to move, and the bottom of the lifting column is rotationally connected with the top of the main body mechanism; the protection mechanism is mounted at a middle shaft of the top of the main body mechanism; according to the grinding device, the grinding mechanism is arranged, the working space is sealed in cooperation with the protection mechanism during grinding, the situation that grinding liquid splashes outwards, and consequently cleaning is difficult is avoided, the grinding liquid is scraped away through the pretreatment assembly, and the grinding efficiency is improved; the protection assembly cleans the surface of the rotating table under the centrifugal force of the rotating table, waste liquid on the surface of the rotating table is cleared away every time new silicon carbide is ground, and it is avoided that silicon carbide makes contact with the waste liquid, so that cross infection is caused, and the grinding precision is affected.

Description

Technical Field

[0001] The present invention belongs to the technical field of grinding equipment, and specifically relates to a rough grinding device for single crystal grinding fluid. Background Art

[0002] Currently, the common processing procedures for silicon carbide are slicing - chamfering - rough grinding - fine grinding - rough polishing - fine polishing. Each manufacturer will choose different consumables according to different processing dimensions, machines, etc. The commonly used rough grinding fluid is boron carbide liquid, which is used in a circulating manner with a cast iron disc. During the process, new liquid is continuously compensated to maintain a constant rate. The cast iron disc needs to be trimmed regularly to maintain flatness.

[0003] In this process, the following problems exist: The rough grinding fluid pollutes the machine and the environment, resulting in additional cleaning work for workers, and the cleaning difficulty is relatively large, increasing additional costs. Summary of the Invention

[0004] In view of the deficiencies of the prior art, the technical solution adopted by the present invention to solve its technical problems is: A rough grinding device for single crystal grinding fluid, comprising:

[0005] A main body mechanism, on one side of the top of the main body mechanism, a lifting column is installed. At the top of the lifting column, there is an installation seat, and the installation seat can flexibly drive the grinding mechanism to move. The bottom of the lifting column is rotatably connected to the top of the main body mechanism;

[0006] A protection mechanism, which is installed at the central axis of the top of the main body mechanism;

[0007] A grinding mechanism, the outer wall of which is rotatably connected to the outer wall of the installation seat;

[0008] The grinding mechanism includes:

[0009] An installation table, the outer wall of which is rotatably connected to the outer wall of the installation seat. At the bottom of the installation table, there is a first telescopic column, and at the top of the installation table, there is a second telescopic column;

[0010] A protection component, the top of which is installed at the bottom of the first telescopic column, and the protection component is used to cooperate with the protection mechanism to form a relatively sealed space for the operation range of the main body mechanism;

[0011] A cleaning component, the bottom of which is rotatably connected to the top of the second telescopic column;

[0012] A pretreatment component, which is installed on the inner wall of the cleaning component.

[0013] Further, the main body mechanism includes:

[0014] Workbench, a collection groove is provided at the central axis of the top of the workbench, and the top of the workbench is connected to the top of the lifting column;

[0015] Liquid injection pipe, the liquid injection pipe is installed on the inner wall of the workbench, and spray heads are uniformly arranged at the annular end of the liquid injection pipe.

[0016] Furthermore, the main body mechanism further includes:

[0017] Rotating table, the bottom of the rotating table is rotatably connected to the bottom of the inner wall of the collection groove;

[0018] Collection plate, the inner wall of the collection plate is slidably connected to the outer wall of the rotating table, and the outer wall of the collection plate is fixedly connected to the inner wall of the collection groove.

[0019] Furthermore, the protection mechanism includes:

[0020] Fixed plate, the outer wall of the fixed plate is fixedly connected to the inner wall of the workbench, the top of the fixed plate is rotatably connected to a rotating plate, and there are nine fixed plates;

[0021] Fixed sleeve, the fixed sleeve is installed on the inner wall of the fixed plate, an elastic sleeve is arranged at the top of the fixed sleeve, the outer wall of the elastic sleeve is connected to the inner wall of the rotating plate, the elastic sleeve is made of rubber, and its bottom can be bent at the connection with the fixed sleeve.

[0022] Furthermore, the protection component includes:

[0023] Cast iron plate, the top of the cast iron plate is connected to the bottom of the first telescopic column, and support rods are uniformly arranged on the top of the cast iron plate, and the support rods are rotatably connected to the top of the cast iron plate;

[0024] Baffle plate, the baffle plate is installed on the outer wall of the support rod, and the baffle plate is used to block the top of the cast iron plate;

[0025] Arc-shaped rod, the arc-shaped rod is installed at one end of the support rod away from the cast iron plate, and elastic rods are uniformly arranged on the outer wall of the arc-shaped rod;

[0026] Sleeve ring, the inner wall of the sleeve ring is connected to the other end of the elastic rod.

[0027] Furthermore, the protection component further includes:

[0028] Moving ring, the inner wall of the moving ring is slidably connected to the outer wall of the support rod, a counterweight block is arranged at the bottom of the moving ring, and the outer wall of the counterweight block is rotatably connected to the inner wall of the moving ring;

[0029] Cleaning rod, the cleaning rods are symmetrically arranged on the outer wall of the moving ring, and the outer wall of the cleaning rod is in contact with the bottom of the baffle plate.

[0030] Further, the cleaning component includes:

[0031] A conical seat, the bottom of the conical seat is rotatably connected to the top of the second telescopic column. The conical seat is used to contact the rotating table and rotate with the rotating table, and uses centrifugal force to clean the surface of the rotating table.

[0032] A rotating shaft, the outer wall of the rotating shaft is rotatably connected to the inner wall of the conical seat.

[0033] Further, the cleaning component further includes:

[0034] A connecting rope, the connecting rope is wound around the outer wall of the rotating shaft;

[0035] A cleaning block, the cleaning block is arc-shaped and symmetrically arranged on the outer wall of the conical seat. The outer wall of the cleaning block is connected to the end of the connecting rope, and the top of the cleaning block is flush with the top of the conical seat.

[0036] Further, the pretreatment component includes:

[0037] A first bent rod, the outer wall of the first bent rod is rotatably connected to the inner wall of the conical seat, and a second bent rod is rotatably connected to the top of the first bent rod;

[0038] A support rod, the support rod is arranged on the top of the first bent rod, and the other end of the support rod is connected to the bottom of the second bent rod;

[0039] A rotating rod, the bottom of the rotating rod is rotatably connected to the top of the second bent rod. The position of the axis of the rotating rod is the same as the axis position of the rotating table, and the length of the rotating rod is greater than the maximum circular surface diameter of the conical seat.

[0040] The beneficial effects of the present invention are as follows:

[0041] 1. By setting the protection mechanism in the present invention, the fixed collar and the elastic collar form a surrounding and wrapping state around the grinding area. Cooperating with the grinding mechanism, the working area is in a relatively closed state. When spraying the grinding liquid, it can block the splashing liquid, reduce the splashing range of the grinding liquid, and facilitate its cleaning.

[0042] 2. By setting the grinding mechanism in the present invention, it seals the working space in cooperation with the protection mechanism during grinding to avoid the difficulty of cleaning caused by the outward splashing of the grinding liquid. After grinding, the pretreatment component is brought into contact with the top of the rotating table, and the rotating table is initially cleaned at the center to scrape off the grinding liquid. Subsequently, the bottom of the protection component is brought into contact with the top of the rotating table, and the protection component is subjected to the centrifugal force of the rotating table to clean the surface of the rotating table. Each time new silicon carbide is ground, the waste liquid on the surface of the rotating table is cleaned off, avoiding the contact between the silicon carbide and the waste liquid to cause unnecessary impurities on the surface and affecting the grinding accuracy.

[0043] 3. By providing a protection component, the collar always remains in contact with and scrapes the inner walls of the elastic ring and the fixed ring, quickly cleaning the grinding fluid on the inner walls of the elastic ring and the fixed ring onto the collection plate. At the same time, when the support rod rotates downward, as the counterweight moves downward under gravity, the moving ring drives the cleaning rod to scrape the grinding fluid at the bottom of the baffle downward as well, ensuring that every surface in contact with the grinding fluid on the inner wall of the device can quickly concentrate the grinding fluid onto the collection plate, reducing the adhesion time of the grinding fluid on the inner wall of the device, keeping the rotating table clean during the next silicon carbide grinding, reducing the cleaning work, and protecting the device.

[0044] 4. By providing a cleaning component and a pretreatment component, the conical block rotates with the rotating table, and thus, using centrifugal force, the cleaning blocks on both sides are thrown outward. After being thrown out, the cleaning blocks drive the connecting ropes to wind again under the drive of the rotating shaft and then return to their original positions. As the conical block rotates, the cleaning blocks push all the grinding fluid on the top of the rotating table outward onto the collection plate, quickly cleaning the grinding oil on the top of the rotating table. Then, the grinding of the next silicon carbide wafer is carried out. During the interval between each silicon carbide grinding, the rotating table is cleaned separately, quickly removing the waste liquid after the previous grinding, avoiding contaminating the new silicon carbide and affecting the grinding accuracy, and reducing cross-contamination. BRIEF DESCRIPTION OF THE DRAWINGS

[0045] Figure 1 is a schematic structural diagram of the present invention;

[0046] Figure 2 is a cross-sectional view of the present invention;

[0047] Figure 3 is a schematic structural diagram of the main body mechanism of the present invention;

[0048] Figure 4 is a schematic structural diagram of the protection mechanism of the present invention;

[0049] Figure 5 is a schematic structural diagram of the grinding mechanism of the present invention;

[0050] Figure 6 is a bottom view of the grinding mechanism of the present invention;

[0051] Figure 7 is a schematic structural diagram of the protection component of the present invention;

[0052] Figure 8 is a schematic structural diagram of the cleaning component of the present invention;

[0053] Figure 9 is a schematic structural diagram of the pretreatment component of the present invention.

[0054] In the figure: 1. Main body mechanism; 101. Workbench; 102. Collection tank; 103. Rotary table; 104. Liquid injection pipe; 105. Nozzle; 106. Collection plate; 2. Protection mechanism; 201. Fixed plate; 202. Rotating plate; 203. Fixed collar; 204. Elastic collar; 3. Lifting column; 4. Mounting seat; 5. Grinding mechanism; 501. Mounting table; 502. First telescopic column; 503. Protection component; 5031. Cast iron plate; 5032. Support rod; 5033. Arc-shaped rod; 5034. Elastic rod; 5035. Collar; 5036. Baffle; 5037. Moving ring; 5038. Cleaning rod; 5039. Counterweight; 504. Second telescopic column; 505. Cleaning component; 5051. Tapered seat; 5052. Rotating shaft; 5053. Connecting rope; 5054. Cleaning block; 506. Pretreatment component; 5061. First bent rod; 5062. Second bent rod; 5063. Support rod; 5064. Rotating rod. Detailed implementation manners

[0055] The present invention will be further described in detail below with reference to the accompanying drawings and specific implementation manners. The embodiments of the present invention are given for the purpose of illustration and description, and are not exhaustive or limited to the disclosed form. Many modifications and variations will be obvious to those of ordinary skill in the art. The embodiments are selected and described to better illustrate the principles and practical applications of the present invention, and enable those of ordinary skill in the art to understand the present invention and design various embodiments with various modifications suitable for specific purposes.

[0056] Example 1, please refer to Figures 1-5 A technical solution is provided by the present invention: A rough grinding device for single crystal grinding fluid is described as follows.

[0057] It includes:

[0058] The main body mechanism 1, on one side of the top of the main body mechanism 1, a lifting column 3 is installed. At the top of the lifting column 3, there is a mounting seat 4. The mounting seat 4 can flexibly drive the grinding mechanism 5 to move. The bottom of the lifting column 3 is rotatably connected to the top of the main body mechanism 1;

[0059] The protection mechanism 2 is installed at the central axis of the top of the main body mechanism 1;

[0060] The grinding mechanism 5, the outer wall of the grinding mechanism 5 is rotatably connected to the outer wall of the mounting seat 4.

[0061] During operation, the transfer device places the silicon carbide wafer into the main body mechanism 1, and then the lifting column 3 drives the mounting seat 4 to rotate, so that the grinding mechanism 5 is directly above the central axis of the main body mechanism 1. Subsequently, the main body mechanism 1 sprays the grinding fluid onto the surface of the silicon carbide. The lifting column 3 descends to make the grinding mechanism 5 contact the main body mechanism 1, and grind the silicon carbide. The protection mechanism 2 protects during the spraying of the grinding fluid and the grinding process to prevent the grinding fluid from splashing.

[0062] The main body mechanism 1 includes:

[0063] A workbench 101, a collection groove 102 is provided at the central axis of the top of the workbench 101, and the top of the workbench 101 is connected to the top of the lifting column 3;

[0064] A liquid injection pipe 104, the liquid injection pipe 104 is installed on the inner wall of the workbench 101, and spray heads 105 are uniformly arranged at the annular end of the liquid injection pipe 104.

[0065] The main body mechanism 1 further includes:

[0066] A rotating table 103, the bottom of the rotating table 103 is rotatably connected to the bottom of the inner wall of the collection groove 102;

[0067] A collection plate 106, the inner wall of the collection plate 106 is slidably connected to the outer wall of the rotating table 103, and the outer wall of the collection plate 106 is fixedly connected to the inner wall of the collection groove 102.

[0068] During use, place the silicon carbide wafer at the middle position of the rotating table 103. The liquid injection pipe 104 is externally connected to the grinding fluid, and the spray heads 105 spray the surface of the silicon carbide from multiple angles. Subsequently, the grinding mechanism 5 descends and contacts the surface of the silicon carbide. The rotating table 103 rotates to make the surface of the silicon carbide and the grinding mechanism 5 perform grinding. During the grinding process, make the spray heads 105 aim at the gaps and spray. The liquid water flow is small but more uniform. After the treatment is completed, take out the silicon carbide. With the help of the grinding mechanism 5, clean the grinding fluid on the surface of the rotating table 103 and the waste liquid on the surface of the protection mechanism 2 onto the collection plate 106. The collection plate 106 is inclined, and finally collect the waste liquid from the bottom.

[0069] The protection mechanism 2 includes:

[0070] A fixing plate 201, the outer wall of the fixing plate 201 is fixedly connected to the inner wall of the workbench 101, and a rotating plate 202 is rotatably connected to the top of the fixing plate 201. There are nine fixing plates 201;

[0071] A fixed collar 203, the fixed collar 203 is installed on the inner wall of the fixing plate 201, an elastic collar 204 is provided at the top of the fixed collar 203, the outer wall of the elastic collar 204 is connected to the inner wall of the rotating plate 202, the elastic collar 204 is made of rubber material, and its bottom is bendable at the connection with the fixed collar 203.

[0072] During grinding, the fixed plate 201 drives the rotating plate 202 to expand vertically, so that the rotating plate 202 is at the upper end of the fixed plate 201, thereby expanding the elastic ring 204 upward. The fixed ring 203 and the elastic ring 204 form a surrounding state around the grinding area. Cooperating with the grinding mechanism 5, the working area is in a relatively closed state. When spraying the grinding liquid, it can block the splashing liquid, reduce the splashing range of the grinding liquid, and facilitate its cleaning.

[0073] The grinding mechanism 5 includes:

[0074] The mounting table 501, the outer wall of the mounting table 501 is rotatably connected to the outer wall of the mounting seat 4. The bottom of the mounting table 501 is provided with a first telescopic column 502, and the top of the mounting table 501 is provided with a second telescopic column 504;

[0075] The protection component 503, the top of the protection component 503 is installed at the bottom of the first telescopic column 502. The protection component 503 is used to cooperate with the protection mechanism 2 to form a relatively airtight space for the operation range of the main body mechanism 1;

[0076] The cleaning component 505, the bottom of the cleaning component 505 is rotatably connected to the top of the second telescopic column 504;

[0077] The pretreatment component 506, the pretreatment component 506 is installed on the inner wall of the cleaning component 505.

[0078] After placing the silicon carbide on the rotating table 103, the mounting table 501 lowers the first telescopic column 502, so that the bottom of the protection component 503 contacts the surface of the silicon carbide and grinds. After grinding is completed, the mounting seat 4 rotates 180 degrees, extends the second telescopic column 504 downward, so that the pretreatment component 506 contacts the top of the rotating table 103, and initially cleans the rotating table 103 at the center to scrape off the grinding liquid. Subsequently, the bottom of the protection component 503 contacts the top of the rotating table 103, and the protection component 503 is subjected to the centrifugal force of the rotating table 103 to clean the surface of the rotating table 103, so that every time new silicon carbide is ground, the waste liquid on the surface of the rotating table 103 is cleaned, avoiding contact between the silicon carbide and the waste liquid and causing unnecessary impurities on the surface, which affects the grinding accuracy.

[0079] Embodiment 2, please refer to Figures 1-9 , the present invention provides a technical solution: on the basis of Embodiment 1, the protection component 503 includes:

[0080] The cast iron disc 5031, the top of the cast iron disc 5031 is connected to the bottom of the first telescopic column 502. The top of the cast iron disc 5031 is evenly provided with support rods 5032, and the support rods 5032 are rotatably connected to the top of the cast iron disc 5031;

[0081] A baffle plate 5036 is installed on the outer wall of the support rod 5032, and the baffle plate 5036 is used to block the top of the cast iron plate 5031;

[0082] An arc-shaped rod 5033 is installed at one end of the support rod 5032 away from the cast iron plate 5031, and elastic rods 5034 are uniformly arranged on the outer wall of the arc-shaped rod 5033;

[0083] A collar 5035, the inner wall of the collar 5035 is connected to the other end of the elastic rod 5034.

[0084] The protection component 503 further includes:

[0085] A moving ring 5037, the inner wall of the moving ring 5037 is slidably connected to the outer wall of the support rod 5032, a counterweight 5039 is arranged at the bottom of the moving ring 5037, and the outer wall of the counterweight 5039 is rotatably connected to the inner wall of the moving ring 5037;

[0086] A cleaning rod 5038 is symmetrically arranged on the outer wall of the moving ring 5037, and the outer wall of the cleaning rod 5038 is in contact with the bottom of the baffle plate 5036.

[0087] After the silicon carbide is placed on the rotating table 103, the first telescopic column 502 drives the cast iron plate 5031 to move downward, so that the cast iron plate 5031 contacts the top of the silicon carbide. Driven by the rotating table 103, the silicon carbide contacts the cast iron plate 5031 for grinding. At this time, the support rod 5032 is in an upward inclined state, connecting the baffle plate 5036 with the elastic sleeve 204, so that the baffle plate 5036 and the elastic sleeve 204 cover the working area;

[0088] After the grinding is completed, the support rod 5032 drives the arc-shaped rod 5033 to rotate downward, so that the collar 5035 on the arc-shaped rod 5033 contacts the inner walls of the elastic sleeve 204 and the fixed sleeve 203. Since the elastic rod 5034 is squeezed at this time, the collar 5035 always remains in contact with the inner walls of the elastic sleeve 204 and the fixed sleeve 203 and scrapes, quickly cleaning the grinding liquid on the inner walls of the elastic sleeve 204 and the fixed sleeve 203 onto the collecting plate 106;

[0089] At the same time, during the downward rotation of the support rod 5032, when the counterweight 5039 moves downward due to gravity, the moving ring 5037 drives the cleaning rod 5038 to also scrape the grinding liquid at the bottom of the baffle plate 5036 downward, ensuring that every surface in the equipment that comes into contact with the grinding liquid can quickly concentrate the grinding liquid onto the collecting plate 106, reducing the adhesion time of the grinding liquid on the inner wall of the equipment, keeping the surface of the rotating table 103 clean during the next group of silicon carbide grinding, and improving the grinding accuracy.

[0090] The cleaning component 505 includes:

[0091] The conical seat 5051, the bottom of the conical seat 5051 is rotatably connected to the top of the second telescopic column 504. The conical seat 5051 is used to contact the rotating table 103 and rotate following the rotating table 103, and use centrifugal force to clean the surface of the rotating table 103;

[0092] The rotating shaft 5052, the outer wall of the rotating shaft 5052 is rotatably connected to the inner wall of the conical seat 5051.

[0093] The cleaning assembly 505 further includes:

[0094] The connecting rope 5053, the connecting rope 5053 is wound around the outer wall of the rotating shaft 5052;

[0095] The cleaning block 5054, the cleaning block 5054 is arc-shaped and symmetrically arranged on the outer wall of the conical seat 5051. The outer wall of the cleaning block 5054 is connected to the end of the connecting rope 5053, and the top of the cleaning block 5054 is flush with the top of the conical seat 5051.

[0096] The pretreatment assembly 506 includes:

[0097] The first bent rod 5061, the outer wall of the first bent rod 5061 is rotatably connected to the inner wall of the conical seat 5051, and the top of the first bent rod 5061 is rotatably connected to the second bent rod 5062;

[0098] The support rod 5063, the support rod 5063 is arranged at the top of the first bent rod 5061, and the other end of the support rod 5063 is connected to the bottom of the second bent rod 5062;

[0099] The rotating rod 5064, the bottom of the rotating rod 5064 is rotatably connected to the top of the second bent rod 5062, and the position of the axis of the rotating rod 5064 is the same as the axis position of the rotating table 103.

[0100] After the grinding on one side of the silicon carbide is completed, the mounting table 501 rotates 180 degrees along the mounting seat 4, so that the second telescopic column 504 drives the conical block to move downward, making the rotating rod 5064 contact the surface of the rotating table 103. Subsequently, the motor inside the second bent rod 5062 drives the rotating rod 5064 to rotate, cleaning the grinding liquid in the bottom area of the conical block. Then, driven by the first bent rod 5061, the second bent rod 5062 moves the rotating rod 5064 horizontally and finally closes and places it above the conical block at this time, making the bottom of the conical block contact the top of the rotating table 103;

[0101] Driven by the second telescopic column 504, the conical block rotates with the rotating table 103, so that the cleaning blocks 5054 on both sides are thrown outwards by centrifugal force. After being thrown out, the cleaning blocks 5054 drive the connecting ropes 5053 to wind again under the drive of the rotating shaft 5052 and return to their original positions. As the conical block rotates, the cleaning blocks 5054 push all the grinding fluid on the top of the rotating table 103 outwards onto the collection plate 106, completing the rapid cleaning of the grinding oil on the top of the rotating table 103. Then, the grinding of the next silicon carbide wafer is carried out, and the rotating table 103 is cleaned separately during the interval between each silicon carbide grinding, so that the waste liquid after the previous grinding is quickly removed, avoiding contaminating the new silicon carbide and affecting the grinding accuracy.

[0102] The specific working process is as follows:

[0103] During operation, the transfer device places the silicon carbide wafer into the main body mechanism 1, and then the lifting column 3 drives the mounting seat 4 to rotate, so that the grinding mechanism 5 is directly above the central axis of the main body mechanism 1. The liquid injection pipe 104 is externally connected to the grinding fluid, and the nozzle 105 sprays the surface of the silicon carbide from multiple angles. Subsequently, the grinding mechanism 5 descends and contacts the surface of the silicon carbide, and the rotating table 103 rotates, so that the surface of the silicon carbide is ground with the grinding mechanism 5. During the grinding process, the nozzle 105 is aligned with the gap and sprayed. The liquid water flow is small but more uniform. After the treatment is completed, the silicon carbide is taken out. During grinding, the fixing plate 201 drives the rotating plate 202 to expand vertically, so that the rotating plate 202 is at the upper end of the fixing plate 201, thereby expanding the elastic sleeve 204 upwards. The fixed sleeve 203 and the elastic sleeve 204 form a surrounding and wrapping state around the grinding area, cooperating with the grinding mechanism 5 to make the working area in a relatively closed state, and being able to block the splashing liquid when spraying the grinding fluid;

[0104] After the silicon carbide is placed on the rotating table 103, the mounting table 501 moves the first telescopic column 502 downwards, so that the bottom of the protection component 503 contacts the surface of the silicon carbide and grinds it. After the grinding is completed, the mounting seat 4 rotates 180 degrees, extends the second telescopic column 504 downwards, so that the pretreatment component 506 contacts the top of the rotating table 103, and initially cleans the rotating table 103 at the center, scraping off the grinding fluid. Subsequently, the bottom of the protection component 503 contacts the top of the rotating table 103, and the protection component 503 is subjected to the centrifugal force of the rotating table 103 to clean the surface of the rotating table 103, so that the waste liquid on the surface of the rotating table 103 is cleaned off every time a new silicon carbide is ground. The grinding fluid on the surface of the rotating table 103 and the waste liquid on the surface of the protection mechanism 2 are cleaned onto the collection plate 106. The collection plate 106 is inclined, and finally the waste liquid is collected from the bottom.

[0105] Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all of them. All other embodiments obtained by those of ordinary skill in the art and related fields based on the embodiments of the present invention without creative efforts shall fall within the scope of protection of the present invention. Structures, devices, and operation methods not specifically described and explained in the present invention shall be implemented by conventional means in the art unless otherwise specified and limited.

Claims

1. A rough grinding device for single crystal grinding fluid, comprising: A main body mechanism (1), characterized in that: a lifting column (3) is installed on one side of the top of the main body mechanism (1), and a mounting seat (4) is arranged at the top of the lifting column (3); A protection mechanism (2), which is installed at the central axis of the top of the main body mechanism (1); A grinding mechanism (5), the outer wall of which is rotatably connected to the outer wall of the mounting seat (4); The grinding mechanism (5) includes: A mounting table (501), the outer wall of which is rotatably connected to the outer wall of the mounting seat (4), a first telescopic column (502) is arranged at the bottom of the mounting table (501), and a second telescopic column (504) is arranged at the top of the mounting table (501); A protection component (503), the top of which is installed at the bottom of the first telescopic column (502), and the protection component (503) is used to cooperate with the protection mechanism (2) to form a relatively sealed space for the operation range of the main body mechanism (1); A cleaning component (505), the bottom of which is rotatably connected to the top of the second telescopic column (504); A pretreatment component (506), which is installed on the inner wall of the cleaning component (505).

2. The rough grinding device for single crystal grinding fluid according to claim 1, wherein: The main body mechanism (1) includes: A workbench (101), a collection groove (102) is provided at the central axis of the top of the workbench (101), and the top of the workbench (101) is connected to the top of the lifting column (3); A liquid injection pipe (104), which is installed on the inner wall of the workbench (101), and spray heads (105) are uniformly arranged at the annular end of the liquid injection pipe (104).

3. The single crystal grinding fluid rough grinding device according to claim 2, wherein: The main body mechanism (1) further includes: A rotating table (103), the bottom of which is rotatably connected to the bottom of the inner wall of the collection groove (102); A collection plate (106), the inner wall of which is slidably connected to the outer wall of the rotating table (103), and the outer wall of the collection plate (106) is fixedly connected to the inner wall of the collection groove (102).

4. The single crystal grinding fluid rough grinding device according to claim 1, characterized in that: The protection mechanism (2) includes: A fixing plate (201), the outer wall of which is fixedly connected to the inner wall of the workbench (101), a rotating plate (202) is rotatably connected to the top of the fixing plate (201), and there are nine fixing plates (201); A fixed collar (203), which is installed on the inner wall of the fixing plate (201), an elastic collar (204) is arranged at the top of the fixed collar (203), and the outer wall of the elastic collar (204) is connected to the inner wall of the rotating plate (202).

5. The rough grinding device for single crystal grinding fluid according to claim 1, characterized in that: The protection component (503) includes: A cast iron plate (5031), the top of which is connected to the bottom of the first telescopic column (502), and support rods (5032) are uniformly arranged at the top of the cast iron plate (5031); A baffle plate (5036), the baffle plate (5036) is installed on the outer wall of the support rod (5032), and the baffle plate (5036) is used to block the top of the cast iron plate (5031); An arc-shaped rod (5033), the arc-shaped rod (5033) is installed at one end of the support rod (5032) away from the cast iron plate (5031), and elastic rods (5034) are evenly arranged on the outer wall of the arc-shaped rod (5033); A collar (5035), the inner wall of the collar (5035) is connected to the other end of the elastic rod (5034).

6. The rough grinding device for single crystal grinding fluid according to claim 5, characterized in that: The protection assembly (503) further includes: A moving ring (5037), the inner wall of the moving ring (5037) is slidably connected to the outer wall of the support rod (5032), a counterweight block (5039) is arranged at the bottom of the moving ring (5037), and the outer wall of the counterweight block (5039) is rotatably connected to the inner wall of the moving ring (5037); A cleaning rod (5038), the cleaning rods (5038) are symmetrically arranged on the outer wall of the moving ring (5037), and the outer wall of the cleaning rod (5038) is in contact with the bottom of the baffle plate (5036).

7. The rough grinding device for single crystal grinding fluid according to claim 1, characterized in that: The cleaning assembly (505) includes: A conical seat (5051), the bottom of the conical seat (5051) is rotatably connected to the top of the second telescopic column (504), and the conical seat (5051) is used to contact the rotating table (103) and rotate with the rotating table (103) to clean the surface of the rotating table (103) by centrifugal force; A rotating shaft (5052), the outer wall of the rotating shaft (5052) is rotatably connected to the inner wall of the conical seat (5051).

8. The rough grinding device for single crystal grinding fluid according to claim 7, wherein: The cleaning assembly (505) further includes: A connecting rope (5053), the connecting rope (5053) is wound around the outer wall of the rotating shaft (5052); A cleaning block (5054), the cleaning block (5054) is arc-shaped and symmetrically arranged on the outer wall of the conical seat (5051), the outer wall of the cleaning block (5054) is connected to the end of the connecting rope (5053), and the top of the cleaning block (5054) is flush with the top of the conical seat (5051).

9. The rough grinding device for single crystal grinding fluid according to claim 8, characterized in that: The pretreatment assembly (506) includes: A first bent rod (5061), the outer wall of the first bent rod (5061) is rotatably connected to the inner wall of the conical seat (5051), and a second bent rod (5062) is rotatably connected to the top of the first bent rod (5061); A support rod (5063), the support rod (5063) is arranged at the top of the first bent rod (5061), and the other end of the support rod (5063) is connected to the bottom of the second bent rod (5062); A rotating rod (5064), the bottom of the rotating rod (5064) is rotatably connected to the top of the second bent rod (5062).

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