High-aluminum glass etching solution as well as preparation method and application thereof

By preparing the composition of high-aluminum glass etching liquid, the problems of instability and high deamination cost of etching liquid in the prior art are solved, and a glass etching effect with high pass rate and low cost are achieved.

CN120289090APending Publication Date: 2025-07-11NANJING HUASHENG OPTOELECTRONICS NEW MATERIALS CO LTD
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Patent Information

Application Number
CN202510455035.2
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-04-11
Publication Date
2025-07-11

AI Technical Summary

Technical Problem

During the etching process, the existing glass etching liquid has problems such as unstable reaction, easy defect formation, low yield and high deamination cost.

Method used

The combination of hydrofluoric acid, citric acid, sodium sulfate, sodium fluoroaluminate and sodium dihydrogen phosphate is used to control the acidity and sodium ion concentration, and high-aluminum glass etching liquid is prepared by stirring and maturation, avoiding the use of ammonia-containing components, and forming fluorosilicate precipitation to control the reaction speed.

Benefits of technology

The stability of the etching liquid and the etching effect are improved, and the pass rate reaches more than 90%, reducing environmental investment and production costs.

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Abstract

The invention relates to the technical field of etching solutions, in particular to a high-aluminum glass etching solution as well as a preparation method and application thereof. The high-aluminum glass etching solution is prepared from the following components in parts by mass: 20 to 30 parts of hydrofluoric acid, 20 to 30 parts of citric acid, 10 to 15 parts of sodium sulfate, 5 to 10 parts of sodium fluoroaluminate, 5 to 10 parts of sodium dihydrogen phosphate and 10 to 15 parts of water. According to the method, the use of ammonia-containing components is avoided, so that deamination treatment is not needed, the environmental protection investment is greatly reduced, and the production cost can be greatly reduced. Sodium fluoroaluminate, sodium sulfate, sodium dihydrogen phosphate and the like are added in the formula to control the acidity and the sodium ion concentration, the reaction speed is controlled in a surface precipitation mode, the problems of stripes and crystal points can be well solved, and the overall yield is 90% or above.
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Description

Technical Field

[0001] The present invention relates to the technical field of etching solutions, and particularly to a high-aluminum glass etching solution, a preparation method thereof, and an application thereof. Background Art

[0002] Anti-glare glass is a kind of glass that forms an uneven and rough surface on the glass in a special way, so that the reflected light is scattered, thereby forming a diffuse reflection surface and eliminating specular reflection.

[0003] Anti-glare glass has a wide range of applications in many aspects. For example, in the fields of electronic display devices, vehicle-mounted displays, medical industrial control displays, and aerospace, etc., these fields have relatively high requirements for the visual effects and user experiences of display devices, and anti-glare glass can well meet these needs.

[0004] The processing techniques of anti-glare glass include three types: coating, laminating, and chemical etching. Chemical etching is the most widely used and has the best anti-glare effect. Chemical etching mainly changes the surface roughness of the glass in the following ways: 1. Surface crystal growth forms a shielding effect. 2. The chemical etching solution reacts with the glass surface, eroding the glass surface. 3. Depressions and protrusions are formed on the glass surface.

[0005] A very important parameter characterizing the performance of anti-glare glass is the surface roughness. Different surface roughnesses represent different surface granularities and different appearance sensations. The greater the roughness, the greater the surface granularity, the stronger the surface diffuse reflection, the stronger the ability to eliminate specular reflection, and at the same time, the stronger the blurring of the display screen. On different products, different roughnesses need to be used to achieve the best display effect.

[0006] The prior art generally uses fluorides and acids to generate hydrofluoric acid or adds hydrofluoric acid to the etching solution to corrode the glass surface. However, because the reaction is violent, it is difficult to control the process, and defects such as stripes and crystal points are easily formed, resulting in a low qualified rate. The patent with the patent publication number CN1154951A uses such a volatile strong acid as a strong acid, resulting in unstable etching solution, difficult process control, and low yield. In the patent with the patent publication number CN110563341A, although solid acid citric acid is used, due to the addition of potassium salts and starch, it is easy to precipitate in the etching equipment and adhere to the equipment surface, affecting the quality and production capacity, and the yield is below 80%.

[0007] Moreover, in many existing glass etching solutions, components containing ammonia are often added to slow down the reaction rate. However, wastewater containing ammonia is generated after etching. The general treatment methods for wastewater containing ammonia include integrated biological treatment method, high-efficiency suspended filler biological contact oxidation method, activated carbon adsorption method, etc. The one-time investment is huge, and the daily cost of deammoniation treatment is also very high. Summary of the Invention

[0008] The object of the present invention is to provide a high-aluminum glass etching solution, a preparation method thereof and an application, aiming at the above deficiencies of the prior art.

[0009] A high-aluminum glass etching solution of the present invention comprises the following components in parts by mass: 20-30 parts of hydrofluoric acid, 20-30 parts of citric acid, 10-15 parts of sodium sulfate, 5-10 parts of sodium hexafluoroaluminate, 5-10 parts of sodium dihydrogen phosphate, and 10-15 parts of water.

[0010] Further, 25-28 parts of hydrofluoric acid, 22-25 parts of citric acid, 11-12 parts of sodium sulfate, 5-7 parts of sodium hexafluoroaluminate, 5-7 parts of sodium dihydrogen phosphate, and 12-14 parts of water.

[0011] Further, 28 parts of hydrofluoric acid, 22 parts of citric acid, 11.5 parts of sodium sulfate, 5.8 parts of sodium hexafluoroaluminate, 5.8 parts of sodium dihydrogen phosphate, and 12 parts of water.

[0012] A preparation method of a high-aluminum glass etching solution as described above, weighing hydrogen fluoride, citric acid, sodium sulfate, sodium hexafluoroaluminate and sodium dihydrogen phosphate in proportion, mixing them together, stirring evenly, and then adding them into water for aging to obtain the etching solution.

[0013] Further, the aging temperature is 60-70 °C, and the stirring and aging time is 12-24 hours.

[0014] An etching method for anti-glare glass, soaking the glass in the high-aluminum glass etching solution as described above, the reaction time does not exceed 2 minutes, uneven reaction will form an uneven structure on the glass surface, and then polishing the glass with 10% concentration of hydrofluoric acid, the anti-glare glass can be obtained.

[0015] The present invention avoids using components containing ammonia, so no deammoniation treatment is required, greatly reducing environmental protection investment and production cost. In the formula of the present invention, sodium hexafluoroaluminate, sodium sulfate, sodium dihydrogen phosphate, etc. are added to control the acidity and sodium ion concentration, and the reaction rate is controlled by forming surface precipitation (the precipitate is mainly fluorosilicate), which can well solve the problems of stripes and crystal points, and the overall yield is above 90%. In addition, the etching solution is stable and not easy to deteriorate. It will not change after being stored for a long time and still has good etching performance, so the yield and production capacity are greatly improved. Specific embodiments

[0016] The following are specific embodiments of the present invention, further describing the technical solutions of the present invention, but the present invention is not limited to these embodiments.

[0017] Example 1:

[0018] Weigh the following components by weight parts: 25 kg of hydrofluoric acid, 25 kg of citric acid, 12.5 kg of sodium sulfate, 5.8 kg of sodium hexafluoroaluminate, 6.5 kg of sodium dihydrogen phosphate, and 12 kg of water.

[0019] Etching solution preparation method: Mix hydrofluoric acid, citric acid, sodium sulfate, sodium hexafluoroaluminate, and sodium dihydrogen phosphate together, stir evenly, and then add them to water for aging. The aging temperature is 60 °C, and stir and age for 12 hours to obtain the etching solution.

[0020] Use the above etching solution to etch high-aluminum glass at a temperature of 30 °C for 2 minutes to obtain antiglare glass.

[0021] Example 2:

[0022] Weigh the following components by weight parts: 30 kg of hydrofluoric acid, 20 kg of citric acid, 10.5 kg of sodium sulfate, 6.9 kg of sodium hexafluoroaluminate, 5.5 kg of sodium dihydrogen phosphate, and 12 kg of water.

[0023] Etching solution preparation method: Mix hydrofluoric acid, citric acid, sodium sulfate, sodium fluoroborate, and sodium dihydrogen phosphate together, stir evenly, and then add them to water for aging. The aging temperature is 60 °C, and stir and age for 12 hours to obtain the etching solution.

[0024] Use the above etching solution to etch high-aluminum glass at a temperature of 30 °C for 2 minutes to obtain antiglare glass.

[0025] Example 3:

[0026] Weigh the following components by weight parts: 28 kg of hydrofluoric acid, 22 kg of citric acid, 11.5 kg of sodium sulfate, 5.8 kg of sodium hexafluoroaluminate, 5.8 kg of sodium dihydrogen phosphate, and 12 kg of water.

[0027] Etching solution preparation method: Mix hydrofluoric acid, citric acid, sodium sulfate, sodium hexafluoroaluminate, and sodium dihydrogen phosphate together, stir evenly, and then add them to water for aging. The aging temperature is 60 °C, and stir and age for 12 hours to obtain the etching solution.

[0028] Use the above etching solution to etch high-aluminum glass at a temperature of 30 °C for 2 minutes to obtain antiglare glass.

[0029] Example 4:

[0030] Weigh the following components by weight parts: 29 kg of hydrofluoric acid, 28 kg of citric acid, 10.5 kg of sodium sulfate, 5.0 kg of sodium fluoroborate, 5.5 kg of sodium dihydrogen phosphate, and 15 kg of water.

[0031] Etching solution preparation method: Mix hydrofluoric acid, citric acid, sodium sulfate, sodium hexafluoroaluminate, and sodium dihydrogen phosphate together, stir evenly, and then add water for aging. The aging temperature is 60 °C, and stir and age for 12 hours to obtain the etching solution.

[0032] Use the above etching solution to etch high-aluminum glass at a temperature of 30 °C for 2 minutes to obtain anti-glare glass.

[0033] Table 1 is the performance test result table of the anti-glare glass prepared in Examples 1-4. As can be seen from the following table, the qualified rate of the anti-glare glass obtained by the etching solution of the present invention is 94-98%.

[0034] Table 1

[0035]

[0036]

[0037] Where not covered above, the prior art applies.

[0038] Although some specific embodiments of the present invention have been described in detail by way of examples, those skilled in the art should understand that the above examples are only for illustration and not for limiting the scope of the present invention. Those skilled in the technical field to which the present invention pertains can make various modifications or supplements to the described specific embodiments or use similar ways to substitute, but will not deviate from the direction of the present invention or exceed the scope defined by the appended claims. Those skilled in the art should understand that any modifications, equivalent substitutions, improvements, etc. made to the above embodiments based on the technical essence of the present invention should be included in the protection scope of the present invention.

Claims

1. A high-aluminum glass etching solution, characterized in that: It comprises components in the following parts by mass: 20 - 30 parts of hydrofluoric acid, 20 - 30 parts of citric acid, 10 - 15 parts of sodium sulfate, 5 - 10 parts of sodium hexafluoroaluminate, 5 - 10 parts of sodium dihydrogen phosphate, and 10 - 15 parts of water.

2. The high-aluminum glass etching solution according to claim 1, wherein: 25 - 28 parts of hydrofluoric acid, 22 - 25 parts of citric acid, 11 - 12 parts of sodium sulfate, 5 - 7 parts of sodium hexafluoroaluminate, 5 - 7 parts of sodium dihydrogen phosphate, and 12 - 14 parts of water.

3. The high-aluminum glass etching solution according to claim 1, characterized in that: 28 parts of hydrofluoric acid, 22 parts of citric acid, 11.5 parts of sodium sulfate, 5.8 parts of sodium hexafluoroaluminate, 5.8 parts of sodium dihydrogen phosphate, and 12 parts of water.

4. A preparation method of a high-aluminum glass etching solution according to any one of claims 1-3, characterized in that: Weigh hydrogen fluoride, citric acid, sodium sulfate, sodium hexafluoroaluminate, and sodium dihydrogen phosphate according to the ratio, mix them together, stir evenly, and then add them to water for aging to obtain the etching solution.

5. The preparation method according to claim 4, characterized in that: The aging temperature is 55 - 70 °C, and the stirring and aging time is 10 - 24 hours.

6. The preparation method according to claim 5, characterized in that: The aging temperature is 60 °C, and the stirring and aging time is 12 hours.

7. An etching method for anti-glare glass, characterized in that: Immerse the glass in the high - alumina glass etching solution described in any one of claims 1 - 3 for no more than 2 minutes, and then polish the glass with 10% - concentration hydrofluoric acid to obtain the antiglare glass.

8. The etching method of an anti-glare glass as claimed in claim 7, wherein: The reaction temperature is 28 - 35 °C.

9. The etching method of an anti-glare glass according to claim 8, characterized in that: The reaction temperature is 30 °C.

Citation Information

Patent Citations

  • High-alumina glass frosting liquid and preparation method thereof

    CN110563341A

  • Formula of liquid for making glass product frosted and method for making glass-product frosted

    CN1154951A