Plasma chemical vapor deposition equipment based on high-purity biomass carbon source

Abstract

The invention relates to the technical field of chemical vapor deposition equipment, and discloses plasma chemical vapor deposition equipment based on a high-purity biomass carbon source, the plasma chemical vapor deposition equipment comprises a bottom plate, the upper side of the bottom plate is fixedly provided with a gasification furnace, a condensing tower, a coarse filter, a catalyst, a membrane separator and CVD equipment, the upper side of the membrane separator is provided with a gas introduction and distribution assembly, and the upper side of the gas introduction and distribution assembly is provided with a high-purity biomass carbon source. The gasification furnace, the condensing tower, the coarse filter, the catalyst, the membrane separator, the gas introduction and distribution assembly and the CVD equipment are communicated in sequence; the gas introduction and distribution assembly comprises a gas distribution part and a gas mixing part. Through cooperation of the gasification furnace, the condensing tower, the catalyst, the membrane separator, the gas introduction and distribution assembly and the CVD equipment, the purposes of automatically preparing a carbon source based on hair and supplying the carbon source to the plasma chemical vapor deposition equipment to prepare diamond are achieved; the problem that a carbon source needed by existing chemical vapor deposition equipment for preparing diamond is generally obtained by directly applying finished gas is solved.

Description

Technical Field

[0001] The present invention relates to the technical field of chemical vapor deposition equipment, specifically a plasma chemical vapor deposition equipment based on a high-purity biomass carbon source. Background Art

[0002] In the existing chemical vapor deposition technology, carbon dioxide, methane, and hydrogen are the main carbon sources for the preparation of carbon materials such as diamond. Diamond is prepared by introducing carbon dioxide, methane, and hydrogen into a plasma chemical vapor deposition equipment.

[0003] Generally, the carbon sources (carbon dioxide, methane, hydrogen) required for the existing plasma chemical vapor deposition equipment for preparing diamond are directly applied as finished gases. However, the cost of purchasing the existing finished gases is relatively high, which in turn leads to a relatively high price of the diamond prepared thereby. For this reason, we propose a plasma chemical vapor deposition equipment with a relatively low required cost and based on a high-purity biomass carbon source. Summary of the Invention

[0004] The purpose of the present invention is to provide a plasma chemical vapor deposition equipment based on a high-purity biomass carbon source to solve the problems raised in the background art.

[0005] To achieve the above purpose, the present invention provides the following technical solution: A plasma chemical vapor deposition equipment based on a high-purity biomass carbon source, including a bottom plate, a support platform is installed on the bottom plate, a gasification furnace, a condensation tower, a coarse filter, a catalytic converter, and a membrane separator are fixedly installed on the upper side of the support platform, a CVD equipment is installed on the bottom plate, a gas introduction and distribution assembly is arranged on the upper side of the membrane separator, and the gasification furnace, the condensation tower, the coarse filter, the catalytic converter, the membrane separator, the gas introduction and distribution assembly, and the CVD equipment are connected in sequence; The gas introduction and distribution assembly includes a gas distribution member and a gas mixing member; the gas distribution member includes a first distribution pipe, a second distribution pipe, a third distribution pipe, and a solenoid valve. The lower outer side of the gas mixing member is connected to the first distribution pipe, the second distribution pipe, and the third distribution pipe which are equally distributed at intervals. The first distribution pipe is connected to the membrane separator, and solenoid valves are arranged on the first distribution pipe, the second distribution pipe, and the third distribution pipe; Through the cooperative action among the gasification furnace, the condensation tower, the coarse filter, the catalytic converter, the membrane separator, and the gas introduction and distribution assembly, reaction gases can be automatically supplied to the CVD equipment.

[0006] Further, the gasification furnace includes a furnace body, an oxygen supply assembly, a heating assembly, and a gasification assembly. The furnace body is fixedly connected to the upper side of the support platform, two heating assemblies are fixedly installed on the outer side of the furnace body, an oxygen supply assembly is arranged on the outer side of the furnace body, and a gasification assembly is arranged inside the furnace body; The gasification component includes a feed pipe, a first motor, a conical cylinder, a rotating rod, a first stirring blade, a gasification chamber, a second stirring blade, an exhaust pipe, and a connecting cylinder. An upper side of the furnace body is fixedly connected with a placement rack, an upper side of the placement rack is fixedly connected with the first motor, an upper side of the furnace body is communicated with the feed pipe, an inner side of the furnace body is fixedly connected with the conical cylinder, a lower side of the conical cylinder and on the inner side of the furnace body is fixedly connected with the gasification chamber, a lower inner side of the gasification chamber is fixedly connected with the connecting cylinder, an output end of the first motor is fixedly connected with the rotating rod, the rotating rod is fixedly connected with the first stirring blade and the second stirring blade, the first stirring blade corresponds to the conical cylinder, the second stirring blade corresponds to the connecting cylinder, and a lower outer side of the furnace body is communicated with the exhaust pipe; While gasification is carried out, start the first motor. The first motor drives the rotating rod to rotate, and the rotating rod drives the first stirring blade and the second stirring blade fixedly connected thereto to rotate synchronously. Through the stirring of the first stirring blade and the second stirring blade on the powdered hair, the gasification is made uniform, improving the gasification effect; The oxygen supply component includes a conducting pipe, an annular pipe, and an air inlet pipe. The conducting pipes are uniformly distributed and communicated on the outer sides of the gasification chamber and the furnace body. The annular pipe is communicated with the outer side of the conducting pipe, and the air inlet pipe is communicated with the outer side of the annular pipe.

[0007] The raw material hair required for the biomass carbon source is cut and ground by an external cutting and grinding device. Subsequently, the powdered hair is introduced into the feed pipe and then enters the conical cylinder. A spiral heating pipe is arranged inside the heating component. By starting the heating pipe inside the heating component, the inside of the furnace body is heated up. When the temperature rises to 800 - 1000 °C, at the same time, an external oxygen supply device is communicated with the air inlet pipe, so that oxygen is introduced into the inside of the annular pipe. The oxygen inside the annular pipe is uniformly introduced into the inside of the gasification chamber through the uniformly distributed conducting pipes to assist in high-temperature gasification of the powdered hair inside; Furthermore, the condensation tower includes a tower body, a partition board, a water inlet pipe, a drain pipe, a condensation inlet pipe, a condensation pipe, a fixing plate, and a condensation outlet pipe. An upper side of the support platform is fixedly connected with the tower body. The inner side of the tower body is fixedly connected with the fixing plates which are cross-distributed uniformly. The condensation pipes are uniformly installed inside the fixing plates. A lower inner side of the tower body is fixedly connected with the partition board. A lower outer side of the tower body is communicated with the water inlet pipe and the drain pipe. A lower part of the tower body and on the upper side of the water inlet pipe is communicated with the condensation inlet pipe. An upper outer side of the tower body is communicated with the condensation outlet pipe; Subsequently, the gas mixture flows through the connecting cylinder and the exhaust pipe and circulates into the condensation inlet pipe. At the same time, water is supplied to the water inlet pipe. The water flow enters the interior of the tower body through the water inlet pipe, and then through the partition and the fixed plate, the water flow circulates through half of the condensation pipes to the upper side, and then circulates through the other half of the condensation pipes and is discharged through the drain pipe, achieving the purpose of having a circulating water flow inside the condensation pipes. The gas mixture makes full contact with the outer walls of the evenly distributed condensation pipes, and the circulating water flow inside the condensation pipes condenses the gas mixture to remove water vapor. The gas mixture after condensation flows through the condensation outlet pipe into the filtration inlet pipe; The exhaust pipe is connected to the condensation inlet pipe through a pipeline.

[0008] Further, the coarse filter includes a filter body, a filtration inlet pipe, a filtration outlet pipe, a bearing plate, and a filter cartridge group. The filter body is fixedly connected to the upper side of the support platform. The outer side of the filter body is communicated with the filtration inlet pipe and the filtration outlet pipe. The inner side of the filter body is fixedly connected with the bearing plate, and the filter cartridge group is fixedly installed on the upper side of the bearing plate; The gas mixture enters the interior of the filter body through the filtration inlet pipe, and then the gas mixture enters and is distributed into the filter cartridge group. The filter cartridge group filters the gas mixture to filter out large particle impurities, and then the gas flows into the filtration outlet pipe through the filter cartridge group; The condensation outlet pipe is connected to the filtration inlet pipe through a pipeline.

[0009] Further, the catalytic converter includes a fixed frame, a reaction tank, a heating layer, a steam outlet, a steam inlet, a porcelain particle layer, a support plate, and a catalytic layer. The fixed frame is fixedly connected to the upper side of the support platform. The heating layer is fixedly connected to the inner side of the fixed frame. The reaction tank is fixedly connected to the inner side of the heating layer. There are two groups of porcelain particle layers arranged inside the reaction tank. The lower side of the upper porcelain particle layer and the upper and lower sides of the lower porcelain particle layer are provided with support plates, and the support plates are fixedly connected to the inner side wall of the reaction tank. A catalytic layer is arranged between the two groups of upper support plates. The steam outlet and the steam inlet are opened on the outer side of the heating layer; The upper side of the reaction tank is communicated with a reaction inlet pipe, and the lower side of the catalytic layer is communicated with a reaction outlet pipe. The filtration outlet pipe is connected to the reaction inlet pipe through a pipeline.

[0010] The filtered gas outlet pipe feeds the filtered gas mixture into the reaction inlet pipe on the upper side of the reaction tank. At the same time, hot steam is introduced into the steam inlet, causing the hot steam to flow within the heating layer and be discharged through the steam outlet, thereby achieving the purpose of having circulating hot steam inside the heating layer. The temperature inside the reaction tank is maintained between 300 - 500 °C to ensure complete oxidation of the organic matter. The noble metal catalyst used in the catalytic layer can be platinum or palladium. The gas mixture sequentially passes through the upper ceramic particle layer from the upper side and undergoes a catalytic reaction through the catalytic layer. At high temperature, the VOCs in the gas mixture are completely converted into water and carbon dioxide; Further, the membrane separator includes a mounting frame, a first main inlet pipe, an inlet pipe, a connecting pipe, a second main inlet pipe, an outlet pipe, and a membrane separation component. The upper side of the support platform is fixedly connected to the mounting frame. The upper inner side of the mounting frame is provided with the second main inlet pipe, and the lower inner side of the mounting frame is provided with the first main inlet pipe. A connecting pipe is communicated between the second main inlet pipe and the first main inlet pipe. The side of the connecting pipe away from the CVD device is communicated with the inlet pipe. A uniformly distributed membrane separation component is communicated between the second main inlet pipe and the first main inlet pipe. The upper side of the membrane separation component is communicated with the outlet pipe; The reaction outlet pipe is communicated with the inlet pipe through a pipeline.

[0011] Further, the membrane separation component includes an inlet gas pipe, a body, a fixed connecting plate, a membrane group, and a separation pipe. Uniformly distributed inlet gas pipes are communicated on the outer sides of the second main inlet pipe and the first main inlet pipe. A body is communicated between the two groups of inlet gas pipes. Two groups of fixed connecting plates are fixedly connected to the inner side of the body. A central pipe is fixedly connected between the two groups of fixed connecting plates. A membrane group is arranged between the fixed connecting plates on the outer side of the central pipe. A separation pipe is communicated between the outlet pipe and the body.

[0012] Subsequently, the gas mixture enters the inlet pipe through the reaction outlet pipe at the lower side of the reaction tank, and the inlet pipe feeds into the connecting pipe. The gas mixture in the connecting pipe is respectively fed into the first main inlet pipe and the second main inlet pipe through upper and lower shunts. Then, the gas mixture in the first main inlet pipe and the second main inlet pipe enters the body through the inlet gas pipe, and then enters the central pipe. Since uniformly distributed through holes are provided on the central pipe and the membrane group is a multi-layer palladium membrane, the gas mixture then passes through the membrane group. By virtue of the relatively large size and low diffusion rate of nitrogen molecules, nitrogen is effectively intercepted, thereby removing nitrogen and retaining hydrogen (H2) and other gas components; Further, the gas mixing element includes an injection pipe, a second motor, a stirring rod, a connecting pipe, and a tapered pipe. The inner sides of the first distribution pipe, the second distribution pipe, and the third distribution pipe are connected with a tapered pipe, the upper side of the tapered pipe is connected with a connecting pipe, the upper side of the connecting pipe is connected with an injection pipe, the upper side of the injection pipe is fixedly connected with the second motor through a mounting block, the output end of the second motor is fixedly connected with a stirring rod, and the stirring rod passes through the injection pipe, the connecting pipe, and the tapered pipe; Then the gas mixture is introduced into the distribution pipe 1 through the separation pipe and the outlet pipe, and the gas mixture is separated and passivated. Then the external methane is introduced into the distribution pipe 2, and the external hydrogen is introduced into the distribution pipe 3. Through the opening size of the solenoid valves at various locations, the ratio of the gas introduced into the conical pipe is hydrogen (H2): 70-90%, methane (CH4): 10-30%, and carbon dioxide (CO2): trace (0-5%). Start the second motor, which drives the stirring rod to rotate. As the diameter of the conical tube gradually decreases from bottom to top, the gas entering the conical tube is highly evenly mixed under the stirring effect and diameter reduction effect of the stirring rod, and then enters the gas injection branch pipe through the connecting fixed pipe and the gas injection pipe. The outlet pipe is communicated with the distribution pipe through a pipeline.

[0013] Further, the CVD device comprises a body, a gas injection branch pipe, a waveguide part, and a reaction part, the upper side of the bottom plate is fixedly connected to the body, the inner side of the body is fixedly connected to a microwave source, one side of the microwave source is connected to the waveguide part, the upper side of the waveguide part is connected to the gas injection branch pipe, and the lower side of the waveguide part is connected to the reaction part; The gas injection pipe is communicated with the gas injection branch pipe.

[0014] Furthermore, the central tube is provided with evenly distributed through holes, and the catalytic layer is a precious metal catalyst.

[0015] The microwave source is started to generate microwaves, which are transmitted to the outside of the introduced gas through the waveguide, and the target gas excites plasma. A diamond slice is placed inside the reaction part, and then the electrons move downward and deposit, so that the electrons contact the diamond slice to generate diamond.

[0016] Compared with the prior art, the present invention provides a plasma chemical vapor deposition device based on a high-purity biomass carbon source, which has the following beneficial effects: 1. Through the cooperative action among the gasifier, the condenser, the catalytic converter, the membrane separator, the gas introduction and distribution assembly, and the CVD equipment, the present invention realizes the automated preparation of carbon sources based on hair, for the purpose of supplying the plasma chemical vapor deposition equipment to prepare diamond, solving the problem that the carbon sources (carbon dioxide, methane, hydrogen) required by the existing plasma chemical vapor deposition equipment for preparing diamond are generally directly applied with finished gases. However, the cost of purchasing the existing finished gases is relatively high, which leads to the high price of the diamond prepared thereby. At the same time, the carbon elements of biomass can be permanently fixed in diamonds, which can meet people's commemorative and emotional needs for pets or relatives and friends.

[0017] 2. Through the cooperative action between the gas distribution part and the gas mixing part, the present invention enables precise proportioning of the target gases hydrogen (H2), methane (CH4), and carbon dioxide (CO2) required in the diamond preparation process, ensuring that each gas reaches the best under the CVD growth conditions, and at the same time highly uniformly mixing the target gases to improve the quality of the diamond. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 is a schematic three-dimensional structure diagram of the present invention; Figure 2 is of the present invention Figure 1 an enlarged schematic diagram of part C; Figure 3 is a schematic three-dimensional structure diagram of another angle of the present invention; Figure 4 is of the present invention Figure 3 an enlarged schematic diagram of part D; Figure 5 is a schematic three-dimensional structure diagram of the gasifier of the present invention; Figure 6 is a schematic cut-away three-dimensional structure diagram of the furnace body of the present invention; Figure 7 is a schematic cut-away three-dimensional structure diagram of the gasifier of the present invention; Figure 8 is a schematic cut-away three-dimensional structure diagram of the condenser of the present invention; Figure 9 is a schematic cut-away three-dimensional structure diagram of the coarse filter of the present invention; Figure 10 is a schematic cut-away three-dimensional structure diagram of the catalytic converter of the present invention; Figure 11 is a schematic three-dimensional structure diagram of the membrane separator of the present invention; Figure 12 is a schematic three-dimensional structure diagram of the membrane separation assembly of the present invention; Figure 13 is a schematic three-dimensional structure diagram of the membrane module of the present invention; Figure 14 Schematic cross-sectional three-dimensional structure diagram of the gas introduction and distribution component of the present invention; Figure 15 For the present invention Figure 14 Enlarged schematic diagram at position A in; Figure 16 For the present invention Figure 14 Enlarged schematic diagram at position B in; Figure 17 Schematic three-dimensional structure diagram of the CVD device of the present invention.

[0019] In the figure: 1. Gasifier; 11. Furnace body; 12. Oxygen supply component; 121. Conducting pipe; 122. Annular pipe; 123. Inlet pipe; 13. Heating component; 14. Gasification component; 141. Feeding pipe; 142. Motor 1; 143. Conical cylinder; 144. Rotating rod; 145. Stirring blade 1; 146. Gasification chamber; 147. Stirring blade 2; 148. Exhaust pipe; 149. Connecting cylinder; 2. Condensation tower; 21. Tower body; 22. Partition board; 23. Water inlet pipe; 24. Drain pipe; 25. Condensation inlet pipe; 26. Condensation pipe; 27. Fixed plate; 28. Condensation outlet pipe; 3. Coarse filter; 31. Filter body; 32. Filter inlet pipe; 33. Filter outlet pipe; 34. Bearing plate; 35. Filter cartridge group; 4. Catalyzer; 41. Fixed frame; 42. Reaction tank; 43. Heating layer; 44. Steam outlet; 45. Steam inlet; 46. Ceramic particle layer; 47. Support plate; 48. Catalytic layer; 5. Membrane separator; 51. Mounting frame; 52. First introduction main pipe; 53. Inlet pipe; 54. Connecting pipe; 55. Second introduction main pipe; 56. Outlet pipe; 57. Membrane separation component; 571. Inlet gas pipe; 572. Body; 573. Fixed connecting plate; 574. Membrane group; 575. Separation pipe; 576. Central pipe; 6. CVD device; 61. Machine body; 62. Injection gas branch pipe; 63. Waveguide part; 64. Reaction part; 65. Microwave source; 7. Gas introduction and distribution component; 71. First distribution pipe; 72. Second distribution pipe; 73. Third distribution pipe; 74. Injection gas pipe; 75. Motor 2; 76. Stirring rod; 77. Connecting and fixing pipe; 78. Conical pipe; 79. Solenoid valve. Detailed implementation manners

[0020] Next, the technical solutions in the embodiments of the present invention will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention. Embodiment

[0021] Please refer to Figures 1 - 17, a plasma chemical vapor deposition device based on a high-purity biomass carbon source, comprising a bottom plate, on which a support table is installed, and on the upper side of the support table, a gasifier 1, a condenser 2, a coarse filter 3, a catalytic converter 4, a membrane separator 5 are fixedly installed. A CVD device 6 is installed on the bottom plate. A gas introduction and distribution assembly 7 is arranged above the membrane separator 5. The gasifier 1, the condenser 2, the coarse filter 3, the catalytic converter 4, the membrane separator 5, the gas introduction and distribution assembly 7, and the CVD device 6 are connected in sequence; The gas introduction and distribution assembly 7 includes a gas distribution part and a gas mixing part; the gas distribution part includes a first distribution pipe 71, a second distribution pipe 72, a third distribution pipe 73, and a solenoid valve 79. The lower outer side of the gas mixing part is connected to the equidistantly distributed first distribution pipe 71, second distribution pipe 72, and third distribution pipe 73. The first distribution pipe 71 is connected to the membrane separator 5, and solenoid valves 79 are arranged on the first distribution pipe 71, the second distribution pipe 72, and the third distribution pipe 73; Through the cooperative action among the gasifier 1, the condenser 2, the coarse filter 3, the catalytic converter 4, the membrane separator 5, and the gas introduction and distribution assembly 7, reaction gas can be automatically supplied to the CVD device 6.

[0022] Furthermore, the gasifier 1 includes a furnace body 11, an oxygen supply assembly 12, a heating assembly 13, and a gasification assembly 14. The furnace body 11 is fixedly connected to the upper side of the support table. Two groups of heating assemblies 13 are fixedly installed on the outer side of the furnace body 11. The oxygen supply assembly 12 is arranged on the outer side of the furnace body 11, and the gasification assembly 14 is arranged inside the furnace body 11; The gasification assembly 14 includes a feed pipe 141, a first motor 142, a conical cylinder 143, a rotating rod 144, a first stirring blade 145, a gasification chamber 146, a second stirring blade 147, an exhaust pipe 148, and a connecting cylinder 149. A placement rack is fixedly connected to the upper side of the furnace body 11, and the first motor 142 is fixedly connected to the upper side of the placement rack. The feed pipe 141 is connected to the upper side of the furnace body 11. The conical cylinder 143 is fixedly connected to the inside of the furnace body 11. The gasification chamber 146 is fixedly connected to the lower side of the conical cylinder 143 and inside the furnace body 11. The connecting cylinder 149 is fixedly connected to the lower inner side of the gasification chamber 146. The output end of the first motor 142 is fixedly connected to the rotating rod 144. The first stirring blade 145 and the second stirring blade 147 are fixedly connected to the rotating rod 144. The first stirring blade 145 corresponds to the conical cylinder 143, and the second stirring blade 147 corresponds to the connecting cylinder 149. The exhaust pipe 148 is connected to the lower outer side of the furnace body 11; While gasification is in progress, start the first motor 142. The first motor 142 drives the rotating rod 144 to rotate. The rotating rod 144 drives the first stirring blade 145 and the second stirring blade 147 fixedly connected thereto to rotate synchronously. Through the stirring of the powdery hair by the first stirring blade 145 and the second stirring blade 147, the gasification is made uniform, and the gasification effect is improved; The oxygen supply component 12 includes a conduction pipe 121, an annular pipe 122, and an intake pipe 123. The conduction pipes 121 are distributed evenly and connected to the outside of the gasification chamber 146 and the furnace body 11. The outside of the conduction pipe 121 is connected to the annular pipe 122, and the outside of the annular pipe 122 is connected to the intake pipe 123.

[0023] The raw material hair required for the biomass carbon source is cut and ground by an external cutting and grinding device. Subsequently, the powdered hair is introduced into the feed pipe 141 and then into the conical cylinder 143. A spiral heating pipe is arranged inside the heating component 13. By starting the heating pipe inside the heating component 13, the temperature inside the furnace body 11 is increased to 800 - 1000 °C. At the same time, an external oxygen supply device is connected to the intake pipe 123, so that oxygen is introduced into the annular pipe 122. The oxygen inside the annular pipe 122 is evenly introduced into the gasification chamber 146 through the evenly distributed conduction pipes 121 to assist in the high-temperature gasification of the powdered hair inside. Furthermore, the condensation tower 2 includes a tower body 21, a partition 22, a water inlet pipe 23, a drain pipe 24, a condensation intake pipe 25, a condensation pipe 26, a fixing plate 27, and a condensation outlet pipe 28. The tower body 21 is fixedly connected to the upper side of the support platform. The inside of the tower body 21 is fixedly connected with the fixing plates 27 that are evenly distributed in a cross pattern. The evenly distributed condensation pipes 26 are fixedly installed inside the fixing plates 27. The lower inner side of the tower body 21 is fixedly connected with the partition 22. The lower outside of the tower body 21 is connected to the water inlet pipe 23 and the drain pipe 24. The condensation intake pipe 25 is connected to the lower part of the tower body 21 and above the water inlet pipe 23. The condensation outlet pipe 28 is connected to the upper outside of the tower body 21. Subsequently, the gas mixture flows into the condensation intake pipe 25 through the connecting cylinder 149 and the exhaust pipe 148. At the same time, water is supplied to the water inlet pipe 23. The water flows into the inside of the tower body 21 through the water inlet pipe 23, and then through the partitioning effect of the partition 22 and the fixing plates 27, the water flows through half of the condensation pipes 26 to the upper side, and then through the other half of the condensation pipes 26 and is discharged through the drain pipe 24, achieving the purpose of having water circulating inside the condensation pipes 26. The gas mixture comes into full contact with the outer walls of the evenly distributed condensation pipes 26. The water circulating inside the condensation pipes 26 condenses the gas mixture and removes the water vapor. The gas mixture after condensation flows into the filtration intake pipe 32 through the condensation outlet pipe 28. The exhaust pipe 148 is connected to the condensation intake pipe 25 through a pipe.

[0024] Further, the coarse filter 3 includes a filter body 31, a filtered air inlet pipe 32, a filtered air outlet pipe 33, a bearing plate 34, and a filter cartridge group 35. The upper side of the support platform is fixedly connected with the filter body 31. The outside of the filter body 31 is communicated with the filtered air inlet pipe 32 and the filtered air outlet pipe 33. The inside of the filter body 31 is fixedly connected with the bearing plate 34. The upper side of the bearing plate 34 is fixedly installed with the filter cartridge group 35; The gas mixture enters the inside of the filter body 31 through the filtered air inlet pipe 32, and then the gas mixture enters and is distributed into the filter cartridge group 35. The filter cartridge group 35 filters the gas mixture to filter out large particulate impurities, and then the gas flows into the filtered air outlet pipe 33 through the filter cartridge group 35; The condensate outlet pipe 28 is connected to the filtered air inlet pipe 32 through a pipeline.

[0025] Further, the catalytic converter 4 includes a fixing frame 41, a reaction tank 42, a heating layer 43, a steam outlet 44, a steam inlet 45, a porcelain particle layer 46, a support plate 47, and a catalytic layer 48. The upper side of the support platform is fixedly connected with the fixing frame 41. The inside of the fixing frame 41 is fixedly connected with the heating layer 43. The inside of the heating layer 43 is fixedly connected with the reaction tank 42. Two groups of porcelain particle layers 46 are arranged inside the reaction tank 42. Support plates 47 are arranged on the upper and lower sides of the lower porcelain particle layer 46 and the upper porcelain particle layer 46. The support plates 47 are fixedly connected to the inner side wall of the reaction tank 42. A catalytic layer 48 is arranged between the two groups of upper support plates 47. Steam outlets 44 and steam inlets 45 are arranged on the outside of the heating layer 43; The upper side of the reaction tank 42 is communicated with a reaction inlet pipe, and the lower side of the catalytic layer 48 is communicated with a reaction outlet pipe. The filtered air outlet pipe 33 is connected to the reaction inlet pipe through a pipeline.

[0026] The filtered air outlet pipe 33 feeds the filtered gas mixture into the reaction inlet pipe on the upper side of the reaction tank 42. At the same time, hot steam is introduced into the steam inlet 45 so that the hot steam flows in the heating layer 43 and is discharged through the steam outlet 44, achieving the purpose of having circulating hot steam inside the heating layer 43, maintaining the temperature inside the reaction tank 42 between 300 - 500 °C, ensuring complete oxidation of the organic matter. The noble metal catalyst used in the catalytic layer 48 can be platinum or palladium. The gas mixture sequentially passes through the upper porcelain particle layer 46 from the upper side and undergoes a catalytic reaction through the catalytic layer 48. At high temperature, the VOCs in the gas mixture are completely converted into water and carbon dioxide; Further, the membrane separator 5 includes a mounting frame 51, a main inlet pipe 52, an inlet pipe 53, a connecting pipe 54, a main outlet pipe 55, an outlet pipe 56, and a membrane separation module 57. The upper side of the support platform is fixedly connected to the mounting frame 51. The upper inner side of the mounting frame 51 is provided with the main outlet pipe 55, and the lower inner side of the mounting frame 51 is provided with the main inlet pipe 52. A connecting pipe 54 is connected between the main outlet pipe 55 and the main inlet pipe 52. The side of the connecting pipe 54 away from the CVD device 6 is connected to the inlet pipe 53. A uniformly distributed membrane separation module 57 is connected between the main outlet pipe 55 and the main inlet pipe 52. The upper side of the membrane separation module 57 is connected to the outlet pipe 56; The reaction outlet pipe is connected to the inlet pipe 53 through a pipeline.

[0027] Further, the membrane separation module 57 includes an intake pipe 571, a device body 572, a fixed connecting plate 573, a membrane group 574, and a separation pipe 575. Uniformly distributed intake pipes 571 are connected to the outer sides of the main outlet pipe 55 and the main inlet pipe 52. A device body 572 is connected between the two groups of intake pipes 571. Two groups of fixed connecting plates 573 are fixedly connected to the inner side of the device body 572. A central pipe 576 is fixedly connected to the inner sides of the two groups of fixed connecting plates 573. A membrane group 574 is arranged between the outer side of the central pipe 576 and between the fixed connecting plates 573. A separation pipe 575 is connected between the outlet pipe 56 and the device body 572.

[0028] Subsequently, the gas mixture enters the inlet pipe 53 through the reaction outlet pipe at the lower side of the reaction tank 42. The inlet pipe 53 leads into the connecting pipe 54. The gas mixture in the connecting pipe 54 enters the main inlet pipe 52 and the main outlet pipe 55 through upper and lower shunts respectively. Then, the gas mixture in the main inlet pipe 52 and the main outlet pipe 55 enters the device body 572 through the intake pipes 571 and then enters the central pipe 576. Since uniformly distributed through holes are formed in the central pipe 576 and the membrane group 574 is a multi-layer palladium membrane, the gas mixture then passes through the membrane group 574. By virtue of the relatively large size and low diffusion rate of nitrogen molecules, nitrogen is effectively intercepted, thereby removing nitrogen and retaining hydrogen (H2) and other gas components; Further, the gas mixer includes an injection pipe 74, a second motor 75, a stirring rod 76, a connecting and fixing pipe 77, and a conical pipe 78. A conical pipe 78 is connected to the inner sides of the first distribution pipe 71, the second distribution pipe 72, and the third distribution pipe 73. The upper side of the conical pipe 78 is connected to the connecting and fixing pipe 77. The upper side of the connecting and fixing pipe 77 is connected to the injection pipe 74. The upper side of the injection pipe 74 is fixedly connected to the second motor 75 through a mounting block. The output end of the second motor 75 is fixedly connected to the stirring rod 76. The stirring rod 76 passes through the injection pipe 74, the connecting and fixing pipe 77, and the conical pipe 78; Then the gas mixture is introduced into the distribution pipe 1 71 through the separation pipe 575 and the outlet pipe 56, and the gas mixture is separated and passivated. Then the external methane is introduced into the distribution pipe 2 72, and the external hydrogen is introduced into the distribution pipe 3 73. Through the opening size of the electromagnetic valve 79 at various places, the ratio of the gas introduced into the conical pipe 78 is hydrogen (H2): 70-90%, methane (CH4): 10-30%, and carbon dioxide (CO2): trace (0-5%); The second motor 75 is started, and the second motor 75 drives the stirring rod 76 to rotate. Since the diameter of the tapered tube 78 gradually decreases from bottom to top, the gas introduced into the tapered tube 78 is highly evenly mixed under the stirring effect and the diameter reduction effect of the stirring rod 76, and then introduced into the gas injection branch pipe 62 through the connecting fixed pipe 77 and the gas injection pipe 74. The outlet pipe 56 is connected to the distribution pipe 71 through a pipeline.

[0029] Further, the CVD device 6 includes a body 61, a gas injection branch pipe 62, a waveguide part 63, and a reaction part 64. The upper side of the bottom plate is fixedly connected to the body 61, the inner side of the body 61 is fixedly connected to a microwave source 65, one side of the microwave source 65 is connected to the waveguide part 63, the upper side of the waveguide part 63 is connected to the gas injection branch pipe 62, and the lower side of the waveguide part 63 is connected to the reaction part 64; The gas injection pipe 74 is connected to the gas injection branch pipe 62 .

[0030] Furthermore, the central tube 576 is provided with evenly distributed through holes, and the catalyst layer 48 is a precious metal catalyst.

[0031] The microwave source 65 is started to generate microwaves, which are transmitted to the outside of the introduced gas through the waveguide part 63, and the target gas excites plasma. A diamond slice is placed inside the reaction part 64, and then the electrons move downward and deposit, so that the electrons contact the diamond slice to generate diamond.

[0032] The specific usage and function of this embodiment are as follows: When in use, the raw hair required for the biomass carbon source is first cut and ground through an external cutting and grinding device, and then the powdered hair is passed into the feed pipe 141, and then into the conical cylinder 143. A spiral heating tube is arranged on the inner side of the heating component 13. By starting the heating tube inside the heating component 13, the temperature inside the furnace body 11 is increased to 800-1000°C. At the same time, the external oxygen supply device is connected to the air inlet pipe 123, so that oxygen is passed into the inside of the annular tube 122. The oxygen inside the annular tube 122 is evenly passed into the inside of the gasification chamber 146 through the evenly distributed conducting pipe 121, so as to assist in high-temperature gasification of the powdered hair inside. While gasification is carried out, motor 142 is started. Motor 142 drives the rotating rod 144 to rotate. The rotating rod 144 drives the stirring blade 145 and the stirring blade 147 fixedly connected thereto to rotate synchronously. Through the stirring of the powdery hair by the stirring blade 145 and the stirring blade 147, the gasification is made uniform, and the gasification effect is improved. During the gasification process, the organic matter in the hair is converted into a gas mixture. The gas mixture contains hydrogen (H2), methane (CH4), carbon dioxide (CO2), nitrogen (N2) and some organic volatiles VOCs. Subsequently, the gas mixture passes through the connecting cylinder 149 and the exhaust pipe 148 and flows into the condensation inlet pipe 25. At the same time, water is supplied to the water inlet pipe 23. The water flow enters the inside of the tower body 21 through the water inlet pipe 23, and then through the partition of the partition plate 22 and the fixing plate 27, the water flow passes through half of the condensation pipe 26 and flows to the upper side, and then passes through the other half of the condensation pipe 26 and is discharged through the drain pipe 24, realizing the purpose of having a circulating water flow inside the condensation pipe 26. The gas mixture makes full contact with the outer wall of the uniformly distributed condensation pipe 26. The circulating water flow inside the condensation pipe 26 condenses the gas mixture and removes water vapor. The gas mixture after condensation flows through the condensation outlet pipe 28 and into the filtration inlet pipe 32. The gas mixture enters the inside of the filter body 31 through the filtration inlet pipe 32, and then the gas mixture enters and is distributed into the filter cartridge group 35. The filter cartridge group 35 filters the gas mixture, filtering out large particle impurities, and then the gas flows into the filtration outlet pipe 33 through the filter cartridge group 35. The filtration outlet pipe 33 passes the filtered gas mixture into the reaction inlet pipe on the upper side of the reaction tank 42. At the same time, hot steam is introduced into the steam inlet 45, so that the hot steam flows in the heating layer 43 and is discharged through the steam outlet 44, realizing the purpose of having a circulating hot steam inside the heating layer 43. The temperature inside the reaction tank 42 is maintained between 300 - 500 °C to ensure complete oxidation of the organic matter. The noble metal catalyst used in the catalytic layer 48 can be platinum or palladium. The gas mixture sequentially passes through the upper ceramic particle layer 46 from the upper side and undergoes a catalytic reaction through the catalytic layer 48. At high temperature, the VOCs in the gas mixture are completely converted into water and carbon dioxide. Subsequently, the gas mixture enters the inlet pipe 53 through the reaction outlet pipe at the lower side of the reaction tank 42. The inlet pipe 53 leads into the connecting pipe 54. The gas mixture in the connecting pipe 54 enters the main inlet pipe one 52 and the main inlet pipe two 55 respectively through upper and lower shunts. Then, the gas mixture in the main inlet pipe one 52 and the main inlet pipe two 55 enters the body 572 through the gas inlet pipe 571, and then enters the central pipe 576. Since the central pipe 576 is provided with uniformly distributed through holes and the membrane group 574 is a multi-layer palladium membrane, the gas mixture then passes through the membrane group 574. By virtue of the larger size and lower diffusion rate of nitrogen molecules, nitrogen is effectively intercepted, thereby removing nitrogen and retaining hydrogen (H2) and other gas components; Subsequently, the gas mixture passes through the separation pipe 575 and the outlet pipe 56 and enters the distribution pipe one 71. Thus, the separation and passivation of the gas mixture are completed. Then, methane from the outside is introduced into the distribution pipe two 72, and hydrogen from the outside is introduced into the distribution pipe three 73. By adjusting the opening sizes of the solenoid valves 79 at various locations, the gas ratio introduced into the conical pipe 78 is hydrogen (H2): 70 - 90%, methane (CH4): 10 - 30%, and carbon dioxide (CO2): trace amount (0 - 5%); Start the motor two 75. The motor two 75 drives the stirring rod 76 to rotate. Since the diameter of the conical pipe 78 gradually decreases from bottom to top, the gas introduced into the conical pipe 78 is highly uniformly mixed under the stirring action and the diameter reduction action of the stirring rod 76, and then enters the gas injection branch pipe 62 through the connecting fixed pipe 77 and the gas injection pipe 74. Start the microwave source 65. The microwave source 65 generates microwaves. The microwaves are transmitted to the outside of the introduced gas through the waveguide part 63, exciting plasma in the target gas. A diamond thin sheet is placed inside the reaction part 64. Then, electrons move downward and deposit, causing the electrons to contact the diamond thin sheet to generate diamond.

[0033] Although the embodiments of the present invention have been shown and described, for those of ordinary skill in the art, it can be understood that various changes, modifications, substitutions, and variations can be made to these embodiments without departing from the principles and spirit of the present invention. The scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A plasma chemical vapor deposition device based on a high-purity biomass carbon source, comprising a bottom plate, characterized in that: A support platform is installed on the bottom plate, and a gasifier (1), a condensation tower (2), a coarse filter (3), a catalytic converter (4), and a membrane separator (5) are fixedly installed on the upper side of the support platform. A CVD device (6) is installed on the bottom plate. A gas introduction and distribution assembly (7) is arranged above the membrane separator (5). The gasifier (1), the condensation tower (2), the coarse filter (3), the catalytic converter (4), the membrane separator (5), the gas introduction and distribution assembly (7), and the CVD device (6) are connected in sequence; The gas introduction and distribution assembly (7) includes a gas distribution member and a gas mixing member; the gas distribution member includes a first distribution pipe (71), a second distribution pipe (72), a third distribution pipe (73), and a solenoid valve (79). The lower outer side of the gas mixing member is connected to the first distribution pipe (71), the second distribution pipe (72), and the third distribution pipe (73) which are equidistantly distributed. The first distribution pipe (71) is connected to the membrane separator (5). Solenoid valves (79) are arranged on the first distribution pipe (71), the second distribution pipe (72), and the third distribution pipe (73); Through the cooperation of the gasifier (1), the condensation tower (2), the coarse filter (3), the catalytic converter (4), the membrane separator (5), and the gas introduction and distribution assembly (7), reaction gas can be automatically supplied to the CVD device (6).

2. The plasma chemical vapor deposition device based on a high-purity biomass carbon source according to claim 1, wherein: The gasifier (1) includes a furnace body (11), an oxygen supply assembly (12), a heating assembly (13), and a gasification assembly (14). The furnace body (11) is fixedly connected to the upper side of the support platform. Two groups of heating assemblies (13) are fixedly installed on the outer side of the furnace body (11). An oxygen supply assembly (12) is arranged on the outer side of the furnace body (11). A gasification assembly (14) is arranged inside the furnace body (11); The gasification assembly (14) includes a feed pipe (141), a first motor (142), a conical cylinder (143), a rotating rod (144), a first stirring blade (145), a gasification chamber (146), a second stirring blade (147), an exhaust pipe (148), and a connecting cylinder (149). A placement rack is fixedly connected to the upper side of the furnace body (11). The first motor (142) is fixedly connected to the upper side of the placement rack. The feed pipe (141) is connected to the upper side of the furnace body (11). The conical cylinder (143) is fixedly connected to the inside of the furnace body (11). The gasification chamber (146) is fixedly connected to the lower side of the conical cylinder (143) and inside the furnace body (11). The connecting cylinder (149) is fixedly connected to the lower inner side of the gasification chamber (146). The output end of the first motor (142) is fixedly connected to the rotating rod (144). The first stirring blade (145) and the second stirring blade (147) are fixedly connected to the rotating rod (144). The first stirring blade (145) corresponds to the conical cylinder (143). The second stirring blade (147) corresponds to the connecting cylinder (149). The exhaust pipe (148) is connected to the lower outer side of the furnace body (11); The oxygen supply component (12) includes a conduction pipe (121), an annular pipe (122), and an air inlet pipe (123). The conduction pipes (121) with uniform distribution are connected to the outside of the gasification chamber (146) and the furnace body (11). The annular pipe (122) is connected to the outside of the conduction pipe (121), and the air inlet pipe (123) is connected to the outside of the annular pipe (122).

3. The plasma chemical vapor deposition device based on a high-purity biomass carbon source according to claim 2, characterized in that: The condensation tower (2) includes a tower body (21), a partition plate (22), a water inlet pipe (23), a drain pipe (24), a condensation air inlet pipe (25), a condensation pipe (26), a fixing plate (27), and a condensation air outlet pipe (28). The tower body (21) is fixedly connected to the upper side of the support platform. The fixing plates (27) with uniform cross - distribution are fixedly connected to the inside of the tower body (21). The condensation pipes (26) with uniform distribution are fixedly installed on the inside of the fixing plates (27). The partition plate (22) is fixedly connected to the inner side of the lower part of the tower body (21). The water inlet pipe (23) and the drain pipe (24) are connected to the outside of the lower part of the tower body (21). The condensation air inlet pipe (25) is connected to the lower part of the tower body (21) and on the upper side of the water inlet pipe (23). The condensation air outlet pipe (28) is connected to the outside of the upper part of the tower body (21); The exhaust pipe (148) is connected to the condensation air inlet pipe (25) through a pipeline.

4. The plasma chemical vapor deposition device based on a high-purity biomass carbon source according to claim 3, wherein: The coarse filter (3) includes a filter main body (31), a filter air inlet pipe (32), a filter air outlet pipe (33), a bearing plate (34), and a filter cartridge group (35). The filter main body (31) is fixedly connected to the upper side of the support platform. The filter air inlet pipe (32) and the filter air outlet pipe (33) are connected to the outside of the filter main body (31). The bearing plate (34) is fixedly connected to the inside of the filter main body (31). The filter cartridge group (35) is fixedly installed on the upper side of the bearing plate (34); The condensation air outlet pipe (28) is connected to the filter air inlet pipe (32) through a pipeline.

5. The plasma chemical vapor deposition apparatus based on a high-purity biomass carbon source according to claim 4, wherein: The catalytic converter (4) includes a fixing frame (41), a reaction tank (42), a heating layer (43), a steam outlet (44), a steam inlet (45), a porcelain particle layer (46), a support plate (47), and a catalytic layer (48). The fixing frame (41) is fixedly connected to the upper side of the support platform. The heating layer (43) is fixedly connected to the inside of the fixing frame (41). The reaction tank (42) is fixedly connected to the inside of the heating layer (43). Two groups of porcelain particle layers (46) are arranged inside the reaction tank (42). Support plates (47) are arranged on the upper and lower sides of the upper porcelain particle layer (46) and on the upper and lower sides of the lower porcelain particle layer (46). The support plates (47) are fixedly connected to the inner side wall of the reaction tank (42). The catalytic layer (48) is arranged between the two groups of upper support plates (47). The steam outlet (44) and the steam inlet (45) are arranged on the outside of the heating layer (43); The upper side of the reaction tank (42) is connected to a reaction inlet pipe, and the lower side of the catalytic layer (48) is connected to a reaction outlet pipe. The filter air outlet pipe (33) is connected to the reaction inlet pipe through a pipeline.

6. The plasma chemical vapor deposition equipment based on a high-purity biomass carbon source according to claim 5, wherein: The membrane separator (5) includes a mounting frame (51), a first main inlet pipe (52), an inlet pipe (53), a connecting pipe (54), a second main inlet pipe (55), an outlet pipe (56), and a membrane separation module (57). The upper side of the support platform is fixedly connected to the mounting frame (51). The second main inlet pipe (55) is installed inside the upper part of the mounting frame (51), and the first main inlet pipe (52) is installed inside the lower part of the mounting frame (51). A connecting pipe (54) communicates between the second main inlet pipe (55) and the first main inlet pipe (52). The side of the connecting pipe (54) away from the CVD device (6) communicates with an inlet pipe (53). A membrane separation module (57) with uniform distribution communicates between the second main inlet pipe (55) and the first main inlet pipe (52). The upper side of the membrane separation module (57) communicates with an outlet pipe (56); The reaction outlet pipe is connected to the inlet pipe (53) through a pipeline.

7. The plasma chemical vapor deposition device based on a high-purity biomass carbon source according to claim 6, wherein: The membrane separation module (57) includes an inlet gas pipe (571), a device body (572), a fixed connecting plate (573), a membrane group (574), and a separation pipe (575). Uniformly distributed inlet gas pipes (571) communicate with the outer sides of both the second main inlet pipe (55) and the first main inlet pipe (52). A device body (572) communicates between the two groups of inlet gas pipes (571). Two groups of fixed connecting plates (573) are fixedly connected to the inner side of the device body (572). A central pipe (576) is fixedly connected to the inner sides of the two groups of fixed connecting plates (573). A membrane group (574) is arranged between the outer side of the central pipe (576) and between the fixed connecting plates (573). A separation pipe (575) communicates between the outlet pipe (56) and the device body (572).

8. The plasma chemical vapor deposition equipment based on a high-purity biomass carbon source according to claim 6, characterized in that: The gas mixing member includes an injection gas pipe (74), a second motor (75), a stirring rod (76), a connecting and fixing pipe (77), and a conical pipe (78). A conical pipe (78) communicates with the inner sides of the first distribution pipe (71), the second distribution pipe (72), and the third distribution pipe (73). The upper side of the conical pipe (78) communicates with a connecting and fixing pipe (77). The upper side of the connecting and fixing pipe (77) communicates with an injection gas pipe (74). The upper side of the injection gas pipe (74) is fixedly connected to a second motor (75) through a mounting block. The output end of the second motor (75) is fixedly connected to a stirring rod (76). The stirring rod (76) penetrates through the injection gas pipe (74), the connecting and fixing pipe (77), and the conical pipe (78); The outlet pipe (56) is connected to the first distribution pipe (71) through a pipeline.

9. The plasma chemical vapor deposition device based on a high-purity biomass carbon source according to claim 8, wherein: The CVD device (6) includes a machine body (61), an injection gas branch pipe (62), a waveguide part (63), and a reaction part (64). The machine body (61) is fixedly connected to the upper side of the bottom plate. A microwave source (65) is fixedly connected to the inner side of the machine body (61). A waveguide part (63) communicates with one side of the microwave source (65). The injection gas branch pipe (62) communicates with the upper side of the waveguide part (63). The reaction part (64) communicates with the lower side of the waveguide part (63); The injection gas pipe (74) communicates with the injection gas branch pipe (62).

10. The plasma chemical vapor deposition device based on a high-purity biomass carbon source according to claim 7, characterized in that: The central tube (576) is provided with uniformly distributed through holes, and the catalytic layer (48) is a noble metal catalyst.

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