Integrated multi-stage water ring vacuum pump set suitable for semiconductor crystal pulling

Abstract

The integrated multi-stage water ring vacuum pump set comprises a driving motor, a water tank and a pump body, a first-stage pump cavity and a second-stage pump cavity which are independent of each other are formed in the pump body, and impellers coaxially connected with an output shaft of the driving motor are eccentrically arranged in the first-stage pump cavity and the second-stage pump cavity respectively. A first air suction port, a water supplementing port and a first exhaust port which are communicated with the first-stage pump cavity and a second air suction port and a second exhaust port which are communicated with the second-stage pump cavity are formed in the outer side of the pump body, a water supplementing pipe communicated with the water tank is arranged on the water supplementing port, and connecting pipes communicated with each other are arranged on the first exhaust port and the second air suction port; the second exhaust port communicates with the inner cavity of the water tank, an exhaust pipe is arranged at the upper end of the water tank, the driving motor drives the impellers in the first-stage pump cavity and the second-stage pump cavity to rotate at the same time, secondary suction exhaust can be formed for the first-stage pump cavity through the impeller in the second-stage pump cavity, rapid exhaust of the first-stage pump cavity is assisted, and the overall pumping speed of the pump body can be increased.

Description

Technical Field

[0001] The present invention relates to the technical field of water ring vacuum pumps, and particularly to an integrated multi-stage water ring vacuum pump unit suitable for semiconductor crystal pulling. Background Art

[0002] In the single crystal furnace crystal pulling process, establishing a negative pressure environment is crucial for the preparation of high-quality crystals. This environment can effectively control the gas composition and pressure inside the single crystal furnace, forming stable crystal growth conditions; at the same time, by isolating external pollutants, it ensures the cleanliness of the growth area, thereby guaranteeing the purity and structural integrity of the crystals.

[0003] Currently, the negative pressure environment of the single crystal furnace mainly relies on water ring vacuum pumps to provide. A water ring vacuum pump is a common vacuum pump with a wide range of application fields. However, to meet the high requirements of the single crystal furnace for the stability of the negative pressure environment, in the prior art, a multi-stage high-power pump unit composed of multiple vacuum pumping units connected in series is generally adopted to achieve a large pumping speed and stability. For example, a multi-stage air-cooled Roots water ring vacuum unit with the authorized announcement number CN221742845U is composed of multiple groups of vacuum pumping units connected in series with the water ring pump, and by controlling the operation of different numbers of vacuum pumping units, the effects of large pumping speed and multiple pumping speeds are achieved. However, in the actual use process of this water ring vacuum unit, there are obvious disadvantages: the equipment is bulky and occupies a lot of space; it needs to rely on multiple industrial frequency motors for driving, resulting in high energy consumption and high operating costs. Summary of the Invention

[0004] In view of this, it is necessary to provide an integrated multi-stage water ring vacuum pump unit suitable for semiconductor crystal pulling to solve the technical problems of large space occupation and high operating costs existing in the prior art.

[0005] The technical solution adopted by the present invention to solve its technical problems is as follows: An integrated multi-stage water ring vacuum pump unit suitable for semiconductor crystal pulling, including a driving motor, a water tank, and a pump body arranged at the shaft end of the driving motor. The pump body is provided with an independent first-stage pump cavity and a second-stage pump cavity. In the first-stage pump cavity and the second-stage pump cavity, impellers coaxially connected to the output shaft of the driving motor are respectively eccentrically arranged. The outside of the pump body is respectively provided with a first suction port, a water replenishing port, and a first exhaust port communicated with the first-stage pump cavity, and a second suction port and a second exhaust port communicated with the second-stage pump cavity. A water replenishing pipe communicated with the water tank is arranged on the water replenishing port. A connecting pipe is arranged on the first exhaust port and the second suction port and is mutually communicated. The second exhaust port is mutually communicated with the inner cavity of the water tank, and an exhaust pipe mutually communicated with its inner cavity is arranged at the upper end of the water tank. The driving motor simultaneously drives the impellers in the first-stage pump cavity and the second-stage pump cavity to rotate, so that the gas and water sucked in the first-stage pump cavity enter the second-stage pump cavity through the connecting pipe, and then are secondarily sucked and exhausted by the impeller in the second-stage pump cavity.

[0006] Preferably, a make-up water pump is provided on the make-up water pipe, and the make-up water pump inputs the water in the water tank into the primary pump chamber.

[0007] Preferably, the drive motor and the pump body are fixedly installed on the upper end of the water tank, and the second exhaust port is communicated with the upper end of the inner cavity of the water tank to discharge the sucked gas and water into the water tank.

[0008] Preferably, a water injection port is provided on the water tank.

[0009] Preferably, an anti-overflow device communicated with the inner cavity thereof is provided at the upper end of the water tank, the exhaust pipe is arranged at the upper end of the anti-overflow device and communicated therewith, and the anti-overflow device can shunt the gas-liquid flowing towards the exhaust pipe, so that the gas passes through the anti-overflow device and is discharged from the exhaust pipe, and the water liquid flows back into the water tank.

[0010] Preferably, the anti-overflow device includes an inner sleeve, an outer sleeve, a return pipe and a gas-liquid diverter. A third exhaust port and a return port communicated with the inner cavity of the water tank are provided at the upper end of the water tank. The inner sleeve is vertically arranged on the third exhaust port at the upper end of the water tank, the outer sleeve is sleeved and connected on the inner sleeve, the lower end of the outer sleeve is hermetically connected with the lower end of the inner sleeve, the upper end of the outer sleeve extends upward and is higher than the upper port of the inner sleeve, and a gap is left between the outer sleeve and the peripheral side wall of the inner sleeve to form a drainage cavity. The return pipe is horizontally arranged on one side of the outer sleeve, one end of the return pipe is communicated with the drainage cavity, and the other end thereof is inserted into the return port. The exhaust pipe is vertically arranged at the upper end of the outer sleeve. The gas-liquid diverter is a conical body structure with a star-shaped cross section and is vertically arranged at the lower end of the exhaust pipe, its tip is downward, facing the center of the inner sleeve and close to the upper port of the inner sleeve. Through holes are formed in each convex rib on the outer side wall of the gas-liquid diverter. The through holes are far from its tip and communicated with the exhaust pipe. An arc-shaped deflector is arranged at the top of the diversion groove formed between two adjacent convex ribs. The arc-shaped deflector is bent towards the direction of the outer sleeve to use the convex ribs and the diversion groove to disperse and shunt the gas-liquid flowing towards the exhaust pipe, and enable the gas to pass through the through holes and be discharged from the exhaust pipe, and enable the water liquid to return to the drainage cavity along the diversion groove and the arc-shaped deflector and flow back into the water tank through the return pipe.

[0011] Preferably, the return port is arranged away from the third exhaust port.

[0012] Preferably, the output port of the return pipe is inserted into the water tank from the return port and is close to the bottom of the water tank.

[0013] Preferably, a liquid level gauge is arranged in the water tank.

[0014] Preferably, a solenoid valve is arranged on the water injection port of the water tank.

[0015] As can be seen from the above technical solutions, an integrated multi-stage water ring vacuum pump unit suitable for semiconductor crystal pulling provided by the present application has an independent first-stage pump chamber and second-stage pump chamber arranged inside the pump body. Impellers coaxial with the output shaft of the drive motor are eccentrically arranged in the first-stage pump chamber and the second-stage pump chamber respectively. A first suction port, a water replenishing port and a first exhaust port communicating with the first-stage pump chamber, and a second suction port and a second exhaust port communicating with the second-stage pump chamber are arranged on the outside of the pump body respectively. A water replenishing pipe communicating with a water tank is arranged on the water replenishing port, a connecting pipe communicating with each other is arranged on the first exhaust port and the second suction port, the second exhaust port communicates with the inner cavity of the water tank, and an exhaust pipe communicating with its inner cavity is arranged at the upper end of the water tank. The beneficial effects are as follows: The impellers in the first-stage pump chamber and the second-stage pump chamber can be driven to rotate simultaneously by one drive motor. The impeller in the second-stage pump chamber can form secondary suction and exhaust for the first-stage pump chamber to assist the first-stage pump chamber to exhaust quickly, which can increase the overall pumping speed of the pump body and meet the requirements of the single crystal furnace for the stability of the negative pressure environment. Moreover, this integrated multi-stage water ring vacuum pump unit occupies a small space and has low operating costs. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] Figure 1 is a three-dimensional structure schematic diagram of the invention.

[0017] Figure 2 is a schematic diagram of the structure of another angle of the invention.

[0018] Figure 3 is Figure 1 a schematic cross-sectional structure diagram along A-A in

[0019] Figure 4 a schematic exploded structure diagram of the pump body.

[0020] Figure 5 is a schematic diagram of the structure of the impeller arranged in the pump body.

[0021] Figure 6 is a schematic diagram of the structure of the water tank.

[0022] Figure 7 is a schematic diagram of the structure of the anti-overflow device.

[0023] Figure 8 is a schematic side view structure diagram of the gas-liquid diverter.

[0024] Figure 9 is a schematic three-dimensional structure diagram of the gas-liquid diverter.

[0025] Figure 10 is a schematic three-dimensional structure diagram of another angle of the gas-liquid diverter.

[0026] Figure 11 is a schematic cross-sectional structure diagram along B-B in

[0027] In the figure: drive motor 10, water tank 20, make-up water pipe 21, exhaust pipe 22, make-up water pump 23, water injection port 24, third exhaust port 25, return port 26, air inlet 27, pump body 30, primary pump chamber 31, secondary pump chamber 32, impeller 33, first suction port 34, make-up water port 35, first exhaust port 36, second suction port 37, second exhaust port 38, connecting pipe 39, pump shaft 301, anti-overflow device 40, inner sleeve 41, outer sleeve 42, return pipe 43, gas-liquid diverter 44, drainage chamber 45, rib 441, through hole 442, diversion groove 443, arc-shaped diversion plate 444. Specific embodiments

[0028] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the following will briefly introduce the drawings required for the embodiments. Obviously, the drawings in the following description are some embodiments of the present invention. For those of ordinary skill in the art, without creative efforts, other drawings can also be obtained based on these drawings.

[0029] Please refer to Figure 1 and Figure 2, an embodiment of the present invention provides an integrated multi-stage water ring vacuum pump set suitable for semiconductor crystal pulling, including a driving motor 10, a water tank 20, and a pump body 30 disposed at the shaft end of the driving motor 10. An independent first-stage pump chamber 31 and a second-stage pump chamber 32 are provided in the pump body 30. The first-stage pump chamber 31 and the second-stage pump chamber 32 are arranged in parallel. Impellers 33 are respectively provided in the first-stage pump chamber 31 and the second-stage pump chamber 32. The impellers 33 are eccentrically arranged in the first-stage pump chamber 31 and the second-stage pump chamber 32 and are coaxially connected to the output shaft of the driving motor 10. A first suction port 34, a water replenishing port 35, and a first exhaust port 36 communicating with the first-stage pump chamber 31, and a second suction port 37 and a second exhaust port 38 communicating with the second-stage pump chamber 32 are respectively provided outside the pump body 30. A water replenishing pipe 21 communicating with the water tank 20 is provided on the water replenishing port 35. A connecting pipe 39 is provided on the first exhaust port 36 and the second suction port 37 and is interconnected. The second exhaust port 38 communicates with the inner cavity of the water tank 20, and an exhaust pipe 22 communicating with its inner cavity is provided at the upper end of the water tank 20. The first suction port 34 is used to connect to the negative pressure pipeline of the single crystal furnace equipment for crystal pulling. Clean water is stored in the water tank 20. Water is replenished into the first-stage pump chamber 31 through the water replenishing pipe 21. Water is used as the working fluid. The first-stage pump chamber 31, the second-stage pump chamber 32, and the impellers 33 provided therein have the same specifications. The driving motor 10 drives the impellers 33 in the first-stage pump chamber 31 and the second-stage pump chamber 32 to rotate synchronously and at the same speed for vacuum pumping operations. During the vacuum pumping operation, the impeller 33 in the second-stage pump chamber 32 can perform secondary suction and exhaust on the first-stage pump chamber 31, so that the gas and water liquid sucked in the first-stage pump chamber 31 enter the second-stage pump chamber 32 through the connecting pipe 39, and then are discharged into the water tank 20 through the second exhaust port 38 on the second-stage pump chamber 32. The water liquid can be recycled after entering the water tank 20, and the gas can be discharged through the exhaust pipe 22 at the upper end of the water tank 20. By means of secondary suction and exhaust to assist the first-stage pump chamber 31 in quickly exhausting, the overall pumping speed of the pump body 30 can be increased, meeting the requirements of the single crystal furnace for the stability of the negative pressure environment.

[0030] Please refer to Figure 1 , Figure 4 , Figure 5 and Figure 6, specifically, the pump body 30 is an integral housing. A partition is provided at the center inside the housing. The space inside the housing is separated into the above-mentioned primary pump chamber 31 and secondary pump chamber 32 by the partition. A pump shaft 301 passing through the primary pump chamber 31 and secondary pump chamber 32 is provided in the housing. Two impellers 33 are eccentrically arranged in the primary pump chamber 31 and secondary pump chamber 32 respectively and are coaxially and fixedly connected to the pump shaft 301. One end of the pump shaft 301 passes through the housing and is coaxially connected to the output shaft of the driving motor 10. The driving motor 10 is a power frequency motor. The impellers 33 in the primary pump chamber 31 and secondary pump chamber 32 can be driven by the driving motor 10 to rotate synchronously and at the same speed. A makeup water pump 23 is provided on the makeup water pipe 21. The makeup water pump 23 is a metering water pump. The water stored in the water tank 20 is quantitatively input into the primary pump chamber 31 by the makeup water pump 23. The driving motor 10 and the pump body 30 are fixedly installed on the upper end of the water tank 20 by bolts. An air inlet 27 and a third exhaust port 25 communicating with its inner cavity are provided at the upper end of the water tank 20. The second exhaust port 38 of the pump body 30 is connected to the air inlet 27 at the upper end of the water tank 20. The exhaust pipe 22 is erected on the third exhaust port 25 at the upper end of the water tank 20. During the vacuum pumping operation of the pump body 30, the gas-liquid mixture sucked in the primary pump chamber 31 of the pump body 30 is discharged to the secondary pump chamber 32 through the connecting pipe 39. After being secondarily sucked by the impeller 33 in the secondary pump chamber 32, it is discharged into the water tank 20 from the second exhaust port 38. The water liquid remains in the water tank 20 for recycling, and the gas is discharged from the exhaust pipe 22 at the upper end of the water tank 20.

[0031] A water injection port 24 is provided on the water tank 20. A liquid level gauge is provided in the water tank 20, and a solenoid valve is provided on the water injection port 24 of the water tank 20. The water injection port 24 is connected to an external water supply pipe. The liquid level gauge and the solenoid valve are connected in a matching manner with a controller. The liquid level gauge is used to detect the liquid level in the water tank 20. When the liquid level in the water tank 20 is lower than the threshold value, the controller controls the solenoid valve to open, and water can be replenished into the water tank 20.

[0032] In this technical solution, the driving motor 10, the pump body 30 and the water tank 20 are integrally and fixedly arranged, which can reduce the occupied space.

[0033] The working principle of the integrated multi-stage water ring vacuum pump set is as follows: The make-up water pump 23 inputs an appropriate amount of water into the first-stage pump chamber 31 of the pump body 30 as the working fluid. The driving motor 10 is started to drive the impellers 33 in the first-stage pump chamber 31 and the second-stage pump chamber 32 to rotate. The water in the first-stage pump chamber 31 is thrown to the surroundings by the impeller 33. Due to the action of centrifugal force, a closed water ring with approximately equal thickness is formed in the first-stage pump chamber 31. The inner surface of the lower part of the water ring just touches the hub of the impeller 33, and the inner surface of the upper part of the water ring just contacts the tip of the blade of the impeller 33. At this time, a crescent-shaped space is formed between the hub of the impeller 33 and the water ring, and this space is divided into several small chambers equal to the number of blades by the impeller 33. When the impeller 33 rotates, the volume of the small chamber increases from small to large and communicates with the first suction port 34. At this time, gas is sucked into the first-stage pump chamber 31. When the suction ends, the small chamber is isolated from the first suction port 34. When the impeller 33 continues to rotate, the small chamber decreases from large to small, compressing the gas. When the small chamber communicates with the first exhaust port 36, the compressed gas is discharged from the first exhaust port 36. At this time, the impeller 33 in the second-stage pump chamber 32 forms a secondary suction on the gas discharged from the first exhaust port 36, so that the gas discharged from the first exhaust port 36 is sucked into the second-stage pump chamber 32 along the connecting pipe 39 and then discharged into the water tank 20 from the second exhaust port 38. During the operation of the pump body 30, the water entering the first-stage pump chamber 31 is sucked into the second-stage pump chamber 32 along with the gas and then discharged into the water tank 20 from the second exhaust port 38 for recycling, while the gas discharged into the water tank 20 is discharged from the exhaust pipe 22. The working principle of the above integrated multi-stage water ring vacuum pump set is the same as that of the water ring vacuum pump in the prior art.

[0034] Please refer to Figure 3 and Figure 7 Furthermore, in order to reduce the occupied space, the driving motor 10, the pump body 30 and the water tank 20 in the above embodiment are integrally fixedly arranged. The second exhaust port 38 of the pump body 30 needs to be closely arranged next to the water tank 20. However, during the operation of the pump body 30, in the state of large pumping speed, the airflow and liquid discharged into the water tank 20 will form a large impact force on the liquid level in the water tank 20. Under the action of the large impact force of the airflow and liquid, the liquid level in the water tank 20 will splash and fluctuate violently, which is likely to cause the splashed water in the water tank 20 to rush towards the exhaust pipe 22 and be easily pushed into the exhaust pipe 22 by the airflow during the discharge process of the airflow from the exhaust pipe 22, resulting in poor exhaust. In order to avoid this phenomenon and ensure the stable operation of the pump body 30, an anti-overflow device 40 communicating with its inner cavity is provided at the upper end of the water tank 20. The exhaust pipe 22 is arranged at the upper end of the anti-overflow device 40 and is interconnected. The anti-overflow device 40 can divert the gas-liquid rushing towards the exhaust pipe 22, allowing the gas to pass through the anti-overflow device 40 and be discharged from the exhaust pipe 22, and the water liquid to flow back into the water tank 20.

[0035] Please refer to Figure 3 、 8 to Figure 11 Specifically, the anti-overflow device 40 includes an inner sleeve 41, an outer sleeve 42, a return pipe 43 and a gas-liquid diverter 44. A return port 26 communicating with the inner cavity is further provided at the upper end of the water tank 20. The inner sleeve 41 is vertically arranged on the third exhaust port 25 at the upper end of the water tank 20. The outer sleeve 42 is sleeved and connected to the inner sleeve 41. The lower end of the outer sleeve 42 is hermetically connected to the lower end of the inner sleeve 41. The upper end of the outer sleeve 42 extends upward and is higher than the upper port of the inner sleeve 41. A gap is left between the outer sleeve 42 and the peripheral side walls of the inner sleeve 41 to form an annular drainage cavity 45. The return pipe 43 is horizontally arranged on one side of the outer sleeve 42. One end of the return pipe 43 communicates with the drainage cavity 45 and is arranged near the lower end of the drainage cavity 45. The other end of the return pipe 43 is inserted into the return port 26 and communicates with the water tank 20, and the end inserted into the return port 26 is lower than the other end. The exhaust pipe 22 is vertically arranged at the upper end of the outer sleeve 42 and is hermetically connected to the outer sleeve 42. The gas-liquid diverter 44 is a conical body structure with a star-shaped cross-section, vertically arranged in the outer sleeve 42 and closely arranged at the lower end of the exhaust pipe 22. The tip of the gas-liquid diverter 44 faces downward, directly opposite the center of the inner sleeve 41 and near the upper port of the inner sleeve 41, so that there is no obstruction between the outer side wall of the gas-liquid diverter 44 and the inner side wall of the outer sleeve 42. Through holes 442 are formed in each rib 441 on the outer side wall of the gas-liquid diverter 44. The through holes 442 are away from its tip and communicate with the exhaust pipe 22, and the opening direction of the through holes 442 is not directly opposite to the pipe orifice of the inner sleeve 41. The outer diameter of the gas-liquid diverter 44 at the position where the through holes 442 are formed is equal to or close to the inner diameter of the inner sleeve 41. An arc-shaped guide plate 444 is arranged at the top of the diversion groove 443 formed between two adjacent ribs 441. The arc-shaped guide plate 444 bends along the top of the diversion groove 443 towards the outer sleeve 42. During the operation of the pump body 30, when the water in the water tank 20 is mixed with the air flow and is pushed towards the exhaust pipe 22 by the air flow and impacts on the gas-liquid diverter 44, it will be divided and scattered by the ribs 441 on the outer side wall of the gas-liquid diverter 44 to form a scattered diversion. The divided water and air flow will rush towards the arc-shaped guide plate 444 along the diversion groove 443 between the two ribs 441 and be guided by the arc-shaped guide plate 444 towards the outer sleeve 42. During this period, the water can be thrown towards the outer sleeve 42 under the action of gravity and inertia, flow into the drainage cavity 45, and finally return to the water tank 20 through the return pipe 43, while the air flow can enter the exhaust pipe 22 through the through holes 442 and be discharged. In this way, it is possible to prevent water from flowing into the exhaust pipe 22 during the exhaust process of the exhaust pipe 22, causing the phenomenon of unsmooth exhaust and ensuring the stable operation of the pump body 30.

[0036] Please continue to refer to Figure 1 andFigure 6 , further, in this embodiment, since the return pipe 43 and the exhaust pipe 22 are in communication with each other, part of the air flow will also be discharged from the return pipe 43 into the exhaust pipe 22. In order to avoid the phenomenon of backwater in the return pipe 43 and cause poor return, the return port 26 is opened away from the third exhaust port 25 to increase the length of the return pipe 43, which can play a buffering role.

[0037] Please refer to again Figure 3 , in another preferred embodiment, the output port of the return pipe 43 is inserted into the water tank 20 from the return port 26 and extends into the water tank 20, approaching the bottom of the water tank 20, so as to use the water in the water tank 20 to block the output port of the return pipe 43, so that the gas discharged by the pump body 30 can only be discharged from the third exhaust port 25 to the exhaust pipe 22.

[0038] The above-disclosed are only the preferred embodiments of the present invention. Of course, the scope of the rights of the present invention cannot be limited by this. Those of ordinary skill in the art can understand all or part of the processes of implementing the above embodiments, and the equivalent changes made according to the claims of the present invention still fall within the scope covered by the present invention.

Claims

1. An integrated multi-stage water ring vacuum pump unit applicable to semiconductor crystal pulling, characterized in that: It includes a drive motor, a water tank, and a pump body arranged at the shaft end of the drive motor. An independent primary pump chamber and a secondary pump chamber are arranged inside the pump body. Impellers coaxial with the output shaft of the drive motor are eccentrically arranged in the primary pump chamber and the secondary pump chamber respectively. A first suction port, a water replenishing port, and a first exhaust port communicating with the primary pump chamber, as well as a second suction port and a second exhaust port communicating with the secondary pump chamber, are arranged on the outside of the pump body. A water replenishing pipe communicating with the water tank is arranged on the water replenishing port. A connecting pipe communicating with each other is arranged on the first exhaust port and the second suction port. The second exhaust port communicates with the inner cavity of the water tank, and an exhaust pipe communicating with its inner cavity is arranged at the upper end of the water tank. The drive motor drives the impellers in the primary pump chamber and the secondary pump chamber to rotate simultaneously, so that the gas and water sucked in the primary pump chamber enter the secondary pump chamber through the connecting pipe, and then are secondarily sucked and exhausted by the impeller in the secondary pump chamber.

2. The integrated multi-stage water ring vacuum pump unit applicable to semiconductor crystal pulling as described in claim 1, wherein: A water replenishing pump is arranged on the water replenishing pipe, and the water replenishing pump inputs the water in the water tank into the primary pump chamber.

3. The integrated multi-stage water ring vacuum pump unit applicable to semiconductor crystal pulling as claimed in claim 2, wherein: The drive motor and the pump body are fixedly arranged at the upper end of the water tank, and the second exhaust port communicates with the upper end of the inner cavity of the water tank to discharge the sucked gas and water into the water tank.

4. The integrated multi-stage water ring vacuum pump unit applicable to semiconductor crystal pulling as described in claim 3, wherein: A water injection port is arranged on the water tank.

5. The integrated multi-stage water ring vacuum pump unit applicable to semiconductor crystal pulling as claimed in claim 1 or 4, wherein: An anti-overflow device communicating with the inner cavity is arranged at the upper end of the water tank. The exhaust pipe is arranged at the upper end of the anti-overflow device and communicates with each other. The anti-overflow device can shunt the gas-liquid flowing towards the exhaust pipe, so that the gas passes through the anti-overflow device and is discharged from the exhaust pipe, and the water liquid flows back into the water tank.

6. The integrated multi-stage water ring vacuum pump unit applicable to semiconductor crystal pulling as claimed in claim 5, wherein: The anti-overflow device includes an inner sleeve, an outer sleeve, a return pipe, and a gas-liquid shunt. A third exhaust port and a return port communicating with the inner cavity are arranged at the upper end of the water tank. The inner sleeve is vertically arranged on the third exhaust port at the upper end of the water tank. The outer sleeve is sleeved and connected on the inner sleeve. The lower end of the outer sleeve is hermetically connected with the lower end of the inner sleeve. The upper end of the outer sleeve extends upward and is higher than the upper port of the inner sleeve. A gap is left between the outer sleeve and the peripheral side walls of the inner sleeve to form a drainage cavity. The return pipe is horizontally arranged on one side of the outer sleeve. One end of the return pipe communicates with the drainage cavity, and the other end is inserted into the return port. The exhaust pipe is vertically arranged at the upper end of the outer sleeve. The gas-liquid shunt is a conical structure with a star-shaped cross-section, vertically arranged at the lower end of the exhaust pipe, with its tip facing downwards, directly opposite the center of the inner sleeve and close to the upper port of the inner sleeve. Through holes are arranged on each convex rib of the outer side wall of the gas-liquid shunt. The through holes are far from its tip and communicate with the exhaust pipe. An arc-shaped diversion plate is arranged at the top of the diversion groove formed between two adjacent convex ribs. The arc-shaped diversion plate is bent towards the direction of the outer sleeve to disperse and shunt the gas-liquid flowing towards the exhaust pipe by using the convex ribs and the diversion groove, and enable the gas to pass through the through holes and be discharged from the exhaust pipe, and enable the water liquid to return to the drainage cavity along the diversion groove and the arc-shaped diversion plate and flow back into the water tank through the return pipe.

7. The integrated multi-stage water ring vacuum pump unit applicable to semiconductor crystal pulling as described in claim 6, wherein: The return port is arranged far from the third exhaust port.

8. The integrated multi-stage water ring vacuum pump unit applicable to semiconductor crystal pulling as claimed in claim 7, wherein: The output port of the return pipe is inserted into the water tank from the return port and is close to the bottom of the water tank.

9. The integrated multi-stage water ring vacuum pump unit applicable to semiconductor crystal pulling as described in claim 4, wherein: A liquid level gauge is arranged in the water tank.

10. The integrated multi-stage water ring vacuum pump unit applicable to semiconductor crystal pulling as described in claim 9, wherein: An electromagnetic valve is arranged on the water injection port of the water tank.

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