Perovskite solar cell based on peptidomimetic passivation and preparation method thereof

Abstract

The invention relates to the technical field of solar cells, in particular to a perovskite solar cell based on peptidomimetic passivation and a preparation method thereof.A substrate, a hole transport layer, a perovskite light absorption thin film layer, a peptidomimetic passivation layer, a C60 electron transport layer and a metal electrode layer are sequentially prepared, and a provided peptidomimetic passivation material comprises multiple functional groups; a hydrogen bond, a halogen bond and a sulfur bond with high directivity can simultaneously generate directional weak interaction with different types of non-coordinated ions, so that various defects at an interface are passivated, the adverse effect of electrode corrosion caused by non-radiative recombination of charges and ion migration is reduced, and the defect state density in a perovskite film is remarkably reduced; and meanwhile, the peptidomimetic passivation material can effectively improve the hydrophobicity of the perovskite light absorption thin film layer and prevent erosion of moisture in the environment, so that the efficiency and the stability of the device are improved, and high-performance power output and long-term stability of the perovskite solar cell can be realized by utilizing the passivation method.

Description

Technical Field

[0001] The present invention relates to the technical field of solar cells, and particularly to a perovskite solar cell based on peptidomimetic passivation and a preparation method thereof. Background Art

[0002] Solar energy has an irreplaceable position in the energy replacement due to its advantages of environmental protection, high utilization value and being renewable. Solar photovoltaics has been listed as one of the key paths to achieve the goals of carbon peak and carbon neutrality. In the past decade or so, the rapidly increasing power conversion efficiency of perovskite solar cells has made them stand out among many photovoltaic devices and become a research hotspot in the solar energy field. Among them, organic-inorganic hybrid halide perovskites have attracted much attention from researchers due to their excellent optical and electrical properties and have become one of the photovoltaic technologies with practical application prospects.

[0003] However, the polycrystalline perovskite light-absorbing thin film layer is prone to form defects on the surface and grain boundaries, which promotes the non-radiative recombination of photo-generated carriers, shortens the carrier lifetime and reduces the open-circuit voltage (V OC ).) To obtain a highly efficient and stable organic-inorganic hybrid halide perovskite solar cell, the interface passivation engineering is one of the effective strategies. At present, ammonium halide compounds have been widely studied as passivators. Common high-efficiency passivators such as phenethylammonium iodide (PEAI), octylammonium iodide (OAI), and butylammonium iodide (BAI) are used to passivate interface defects, which can effectively reduce the non-radiative recombination in perovskite and improve the power conversion efficiency. However, the ammonium halide-based passivation molecules have a high reactivity with the perovskite surface. Under continuous high-temperature light illumination, the ammonium cation is prone to deprotonate to form an amine, which quickly reacts with the organic cation and then destroys the perovskite film structure. In addition, due to continuous light illumination and the intrusion of oxygen, the iodide ions at the interface are easily oxidized and sublimated, destroying the valence balance, resulting in the instability of the perovskite lattice and affecting the photovoltaic performance and long-term stability of perovskite devices. Summary of the Invention

[0004] To solve the defects of the above-mentioned prior art preparation, the present invention provides a perovskite solar cell based on peptidomimetic passivation and a preparation method thereof.

[0005] The present invention adopts the following technical solutions: A preparation method of a perovskite solar cell based on peptidomimetic passivation, comprising the following steps: S1: Preparation of the substrate: The etched transparent conductive glass is successively ultrasonically cleaned with deionized water, acetone, glass cleaner, deionized water, and isopropyl alcohol for 10 - 30 min each, and the time is the same. Then it is placed in an oven at 60 o °C and dried to obtain the substrate; S2: Preparation of the hole transport layer: Place the treated transparent conductive substrate into a glove box with a nitrogen atmosphere, and prepare a hole transport layer on the transparent conductive substrate. The material of the hole transport layer is selected from one of poly[bis(4-phenyl)(2,4,6-trimethylphenyl)amine, nickel oxide, poly(N,N'-bis-4-butylphenyl-N,N'-biphenyl)benzidine, and self-assembled monolayers, and the preparation method of the material is selected as the solution method; use the spin coating method to uniformly coat the solution, set the rotation speed to 1000 - 10000 rpm, and the spin coating time range: 10 s - 100 s; or transfer it to a hot plate at 80 - 150 °C for annealing for 5 - 20 min after spin coating; S3: Preparation of perovskite light-absorbing thin film layer: Prepare the perovskite light-absorbing thin film layer by a two-step method of vacuum evaporation and solution coating: First, use the vacuum evaporation method: Place the preset metal halide into the corresponding thermal evaporation source of the high-vacuum thermal evaporation equipment, and adjust the vacuum degree to 10 -4 ~10 -5 Pa; the evaporation rate is 0.5 - 10 Å s -1 , and stop heating the evaporation source when the film thickness shows 300 - 800 nm; Solution coating method: After the pressure in the vacuum chamber drops to atmospheric pressure, take out the sample deposited with the metal halide, coat the preset organic salt solution on the metal halide, and use a spin coater to spin coat an appropriate amount of the organic salt solution onto the halide thin film layer. The process includes: the spin coating speed range is selected as 1000 - 10000 rpm, the spin coating time is 10 - 90 s, and after spin coating, place the sample on a hot plate for annealing. The annealing temperature is 80 - 150 °C, and the annealing time is 5 - 30 min to obtain the perovskite light-absorbing thin film layer; S4: Preparation of peptidomimetic passivation layer: Dissolve the peptidomimetic molecule in a solvent. The selected solvent includes at least one of isopropanol, acetonitrile, chlorobenzene, and chloroform, and the concentration is 0.5 - 10 mg mL -1 , to form a peptidomimetic molecule passivation solution; spin coat the peptidomimetic molecule passivation solution on the perovskite light-absorbing thin film layer at a rotation speed of 1000 - 10000 rpm, and the spin coating time is 10 - 100 s. The process does not require heating. Place the perovskite light-absorbing thin film layer coated with the peptidomimetic molecule passivation solution on a hot plate for annealing. The annealing temperature is 50 - 150 °C to obtain the perovskite light-absorbing thin film layer passivated by the peptidomimetic molecule; S5: Preparation of thermally evaporated C60 electron transport layer: Transfer the perovskite light-absorbing thin film layer passivated by the peptidomimetic molecule to an organic material evaporation chamber, evaporate the electron transport layer C60 with a thickness of 10 - 50 nm, and then evaporate bathocuproine with a thickness of 2 - 10 nm. The evaporation rate is 0.1 - 5 Å s-1 ; S6: Preparation of metal electrode layer: Evaporate metal electrodes in a metal evaporation chamber. The metal electrode materials that can be evaporated include gold, silver, and copper. The evaporation thickness is 60 - 200 nm, and the evaporation rate is 0.1 - 10 Å s -1 .

[0006] In some embodiments, in S1, the etched transparent conductive glass is ultrasonically cleaned with deionized water, acetone, and isopropanol for 15 min in sequence, and then placed in a 60°C forced-air drying oven for drying. The dried transparent conductive glass is treated with ultraviolet ozone for 10 min.

[0007] In some embodiments, in S1, the transparent conductive glass is selected from FTO or ITO conductive glass.

[0008] In some embodiments, in S2, an appropriate amount of self-assembled monolayer is dissolved in a specific solvent. The solvent includes at least one of isopropanol, ethanol, dimethyl sulfoxide, dimethylformamide, and n-butanol, and the concentration is 0.1 - 5 mg mL -1 , the rotation speed of the spin coater is set to 4000 rpm, and the prepared self-assembled monolayer solution is pipetted and dropped onto the spare transparent conductive glass substrate, and the spin coating time is 30 s; or the spin-coated transparent conductive glass substrate is placed on a hot stage at 100 o °C for annealing for 10 min.

[0009] In some embodiments, in S3, the preset metal halides include one or 2 - 3 kinds of lead iodide, lead chloride, lead bromide, cesium iodide, cesium chloride, cesium bromide, rubidium iodide, rubidium chloride, and rubidium bromide, and are respectively placed in the corresponding thermal evaporation sources of the high-vacuum thermal evaporation equipment; when the vacuum degree drops to 8x10 -4 Pa, start evaporation, and the evaporation rate is 6 Å s -1 , and stop heating when the thickness reaches 500 nm.

[0010] In some embodiments, in S3, the preset organic salt solution includes at least one of formamidinium iodide, methylammonium iodide, formamidinium chloride, methylammonium chloride, formamidinium bromide, and methylammonium bromide. When multiple kinds are selected, they are mixed according to a preset mass ratio, dissolved in isopropanol solvent to prepare a solution, the spin coating speed is 2500 rpm, and the spin coating time is 30 s. After spin coating, transfer the sample out of the nitrogen atmosphere glove box and transfer it to the air. The relative humidity of the air is controlled below 35%, and anneal on a hot stage at 100 - 180 o °C for 10 - 100 min. Immediately transfer it to the glove box after annealing in the air, and continue annealing on a 100 o °C hot stage for 10 min to complete the preparation of the perovskite light-absorbing thin film layer.

[0011] In some embodiments, in S4, 1 mg of the peptidomimetic molecule is weighed and dissolved in an isopropanol solvent at a concentration of 1 mg / mL -1 , and spin-coated at a speed of 4000 r for 30 s without heating or annealing to obtain a perovskite light-absorbing thin film layer passivated by the peptidomimetic molecule.

[0012] In some embodiments, in S5, the electron transport layer C60 is evaporated with a thickness of 30 nm, and then bathocuproine is evaporated with a thickness of 5 nm at an evaporation rate of 0.3 Å / s -1 .

[0013] In some embodiments, in S6, a metal electrode is evaporated in a metal evaporation chamber. The metal electrode material is selected as silver with a thickness of 100 nm and an evaporation rate of 0.1 - 10 Å / s -1 , and a stepped rate control is adopted. When the evaporated metal thickness is 0 - 10 nm, the rate is 0.1 Å / s -1 ; when the thickness is 10 - 20 nm, the rate is 0.2 Å / s -1 ; when the thickness is 20 - 30 nm, the rate is 0.3 Å / s -1 ; when the thickness is 30 - 40 nm, the rate is 0.3 Å / s -1 ; when the thickness is 40 - 50 nm, the rate is 0.4 Å / s -1 ; when the thickness is 50 - 60 nm, the rate is 0.5 Å / s -1 ; when the thickness is 60 - 70 nm, the rate is 0.6 Å / s -1 ; when the thickness is 70 - 100 nm, the rate is 1 - 10 Å / s -1 .

[0014] The present invention also provides a perovskite solar cell based on peptidomimetic passivation, which is prepared by using the preparation method of the perovskite solar cell based on peptidomimetic passivation described above. Beneficial effects

[0015] The present invention discloses a perovskite solar cell based on peptidomimetic passivation and a preparation method. Compared with the prior art, the present invention has the following advantages: The quasi-peptide passivation material provided by the present invention contains a variety of functional groups. By utilizing highly directional hydrogen bonds, halogen bonds, sulfur bonds, etc., it can simultaneously undergo directional weak interactions with different types of uncoordinated ions to passivate various defects at the interface, reduce adverse effects such as non-radiative recombination of charges and ion migration leading to electrode corrosion, significantly reduce the density of defect states in the perovskite film. At the same time, the quasi-peptide passivation material can effectively improve the hydrophobicity of the perovskite light-absorbing thin film layer, prevent the erosion of moisture in the environment, and thus improve the device efficiency and stability, completely overcoming the uncoordinated ions (FA + , MA + , Pb 2+ , I - ) and halogen vacancies and other defects existing on the surface and grain boundaries of the perovskite light-absorbing thin film layer in the prior art; using this passivation method can achieve high-performance power output and long-term stability of perovskite solar cells, that is, a reverse-structure perovskite solar cell with an efficiency of 24.3% is obtained, the open-circuit voltage is 1.13 V, and the short-circuit current density is 25.9 mA cm -2 , and the fill factor is 0.83; while the highest photoelectric conversion efficiency of the prior art battery is 23.1%, the open-circuit voltage is 1.10 V, the short-circuit current density is 25.2 mA cm -2 , and the fill factor is 0.83. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings required for description in the embodiments will be briefly introduced below. They form a part of the present invention. The schematic embodiments of the present invention and their descriptions explain the present invention and do not constitute an improper limitation of the present invention; in the drawings: Figure 1 is a flowchart of the preparation method of the perovskite solar cell based on quasi-peptide passivation provided by the embodiment of the present invention; Figure 2 is a structural block diagram of the perovskite solar cell based on quasi-peptide passivation provided by the embodiment of the present invention. DETAILED DESCRIPTION OF THE INVENTION

[0017] The following describes exemplary embodiments of the present invention with reference to the accompanying drawings, including various details of the embodiments of the present invention to facilitate understanding. It should be considered merely exemplary. Therefore, those of ordinary skill in the art should recognize that various changes and modifications can be made to the embodiments described here without departing from the scope and spirit of the present invention. Similarly, for the sake of clarity and conciseness, descriptions of well-known functions and structures are omitted below.

[0018] In the description of the present invention, it should be noted that the orientation or positional relationship indicated by the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc. is based on the orientation or positional relationship shown in the drawings. It is only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be construed as a limitation to the present invention.

[0019] As Figure 1 shown, the technical solution of the present invention: A preparation method of a perovskite solar cell based on peptidomimetic passivation, comprising the following steps: S1: Preparation of the substrate: The etched transparent conductive glass is ultrasonically cleaned with deionized water, acetone, glass cleaner, deionized water, and isopropanol in sequence for 10 - 30 min each, and the time is the same. Then it is placed in an oven at 60 o °C and dried to obtain the substrate; S2: Preparation of the hole transport layer: The treated transparent conductive substrate is placed in a glove box under a nitrogen atmosphere, and a hole transport layer is prepared on the transparent conductive substrate. The material of the hole transport layer is selected from one of poly[bis(4-phenyl)(2,4,6-trimethylphenyl)amine], nickel oxide, poly(N,N'-bis-4-butylphenyl-N,N'-biphenyl)benzidine, and self-assembled monolayers, and the preparation method of the material is selected as the solution method; the solution is uniformly coated by spin coating, the rotation speed is set to 1000 - 10000 rpm, and the spin coating time range is 10 s - 100 s; or after spin coating, it is transferred to a hot plate at 80 - 150 °C and annealed for 5 - 20 min; S3: Preparation of the perovskite light-absorbing thin film layer: The perovskite light-absorbing thin film layer is prepared by a two-step method of vacuum evaporation and solution coating: First, the vacuum evaporation method is used: the preset metal halide is placed in the corresponding thermal evaporation source of the high-vacuum thermal evaporation equipment, and the vacuum degree is adjusted to 10 -4 ~10 -5 Pa; the evaporation rate is 0.5 - 10 Å s -1 , and the heating of the evaporation source is stopped when the thickness of the film shows 300 - 800 nm; Solution coating method: After the pressure in the vacuum chamber is reduced to atmospheric pressure, take out the sample deposited with metal halide, coat a preset organic salt solution on the metal halide, and use a spin coater to spin-coat an appropriate amount of the organic salt solution onto the halide thin film layer. The process includes: the spin-coating speed range is selected as 1000 - 10000 rpm, the spin-coating time is 10 - 90 s. After spin-coating, place the sample on a hot plate for annealing, the annealing temperature is 80 °C to 150 °C, and the annealing time is 5 - 30 min to obtain a perovskite light-absorbing thin film layer; S4: Preparation of peptidomimetic passivation layer: Dissolve peptidomimetic molecules in a solvent. The selected solvent includes at least one of isopropyl alcohol, acetonitrile, chlorobenzene, and chloroform, and the concentration is 0.5 - 10 mg mL -1 , to form a peptidomimetic molecule passivation solution; spin-coat the peptidomimetic molecule passivation solution on the perovskite light-absorbing thin film layer at a speed of 1000 - 10000 rpm, and the spin-coating time is 10 - 100 s. The process does not require heating. Place the perovskite light-absorbing thin film layer coated with the peptidomimetic molecule passivation solution on a hot plate for annealing, and the annealing temperature is 50 - 150 °C to obtain a perovskite light-absorbing thin film layer passivated by peptidomimetic molecules; S5: Preparation of thermally evaporated C60 electron transport layer: Transfer the perovskite light-absorbing thin film layer passivated by peptidomimetic molecules to an organic material evaporation chamber, evaporate the electron transport layer C60 with a thickness of 10 - 50 nm, and then immediately evaporate bathocuproine with a thickness of 2 - 10 nm, and the evaporation rate is 0.1 - 5 Å s -1 ; S6: Preparation of metal electrode layer: Evaporate a metal electrode in a metal evaporation chamber. The metal electrode materials that can be evaporated include gold, silver, and copper, and the evaporation thickness is 60 - 200 nm, and the evaporation rate is 0.1 - 10 Å s -1 .

[0020] The preferred embodiments disclosed in the present invention are as Figure 1 shown: The present invention discloses a preparation method of a perovskite solar cell based on peptidomimetic passivation, including the following steps: S1: Preparation of substrate: Ultrasonically clean the etched transparent conductive glass with deionized water, acetone, glass cleaning agent, deionized water, and isopropyl alcohol for 10 - 30 min each, and the time is the same. Then place it in a blast drying oven at 60 o °C for drying to obtain a substrate; the transparent conductive glass selects FTO or ITO conductive glass; In this embodiment, the etched ITO conductive glass is ultrasonically cleaned with deionized water, acetone, and isopropyl alcohol for 15 minutes in sequence, and then placed in a blast drying oven at 60 °C for drying. The dried transparent conductive glass is treated with ultraviolet ozone for 10 minutes.

[0021] S2: Preparation of the hole transport layer: Place the treated transparent conductive substrate in a glove box with a nitrogen atmosphere, and prepare a layer of hole transport layer on the transparent conductive substrate. The material of the hole transport layer is selected from one of poly[bis(4-phenyl)(2,4,6-trimethylphenyl)amine], nickel oxide, poly(N,N'-bis-4-butylphenyl-N,N'-biphenyl)benzidine, and self-assembled monolayers, and the preparation method of the material is selected as the solution method; use the spin coating method to uniformly coat the solution, and the rotation speed is set to 1000 - 10000 rpm, and the spin coating time range is 10 s - 100 s; or after spin coating, transfer it to a hot stage at 80 - 150 °C for annealing for 5 - 20 minutes.

[0022] Weigh an appropriate amount of self-assembled monolayers and dissolve them in a specific solvent. The solvent includes at least one of isopropyl alcohol, ethanol, dimethyl sulfoxide, dimethylformamide, and n-butanol, and the concentration is 0.1 - 5 mg mL -1 ; In this embodiment, weigh an appropriate amount of self-assembled monolayer material and dissolve it in isopropyl alcohol, with a concentration of 0.3 mg mL -1 , set the rotation speed of the spin coater to 4000 rpm, use a pipette to transfer the prepared self-assembled monolayer (SAMs) solution and drop it onto the prepared ITO conductive glass substrate, and the spin coating time is 30 s. This process does not require annealing.

[0023] This patent also includes a process with annealing: Place the sample on a hot stage at 100 o °C for annealing for 10 minutes.

[0024] S3: Preparation of the perovskite light-absorbing thin film layer: Use a two-step method of vacuum evaporation and solution coating to prepare the perovskite light-absorbing thin film layer: First, use the vacuum evaporation method: Place the preset metal halide in the corresponding thermal evaporation source of the high-vacuum thermal evaporation equipment, and adjust the vacuum degree to 10 -4 ~10 -5 Pa; the evaporation rate is 0.5 - 10 Å s -1 , and stop heating the evaporation source when the film thickness shows 300 - 800 nm.

[0025] The preset metal halides include one or two to three of lead iodide (PbI2), lead chloride (PbCl2), lead bromide (PbBr2), cesium iodide (CsI), cesium chloride (CsCl), cesium bromide (CsBr), rubidium iodide (RbI), rubidium chloride (RbCl), and rubidium bromide (RbBr), which are respectively placed in the corresponding thermal evaporation sources of a high-vacuum thermal evaporation device; in this embodiment, lead iodide (PbI2) is used for evaporation coating, and lead iodide (PbI2) is deposited in the evaporation coating instrument. The annealed ITO conductive glass is transferred into the evaporation chamber, and an appropriate amount of PbI2 powder is weighed into a crucible. When the vacuum degree drops to 8x10 -4 Pa, the evaporation coating starts, and the evaporation rate is 6 Å s -1 , and the heating is stopped when the thickness reaches 500 nm.

[0026] Then, the solution coating method is carried out: after the pressure in the vacuum chamber drops to atmospheric pressure, the sample deposited with the metal halide is taken out, and the preset organic salt solution is coated on the metal halide. A spin coater is used to spin coat an appropriate amount of the organic salt solution onto the halide thin film layer. The process includes: the spin coating speed range is selected from 1000 - 10000 rpm, the spin coating time is 10 - 90 s, after the spin coating is completed, the sample is placed on a hot stage for annealing, the annealing temperature is 80°C to 150°C, and the annealing time is 5 - 30 min to obtain a perovskite light-absorbing thin film layer.

[0027] The preset organic salt solution includes at least one of formamidinium iodide (FAI), methylammonium iodide (MAI), formamidinium chloride (FACl), methylammonium chloride (MACl), formamidinium bromide (FABr), and methylammonium bromide (MABr). Isopropyl alcohol (IPA) is selected as the solvent. Another 50 - 150 mg of formamidinium iodide (FAI) and 5 - 50 mg of methylammonium chloride (MACl) are weighed, and their mass ratio is 10:1, which are dissolved in the isopropyl alcohol (IPA) solvent. In this embodiment, 90 mg of formamidinium iodide (FAI) and 9 mg of methylammonium chloride (MACl) are weighed and added to 1 mL of isopropyl alcohol IPA to prepare a 90 / 9 (mg / mL) solution, which is oscillated and stirred evenly to dissolve. Then, a spin coater is used to spin coat an appropriate amount of the organic salt onto the lead iodide thin film layer. The process includes: The spin coating speed is 2500 rpm, the spin coating time is 30 s. After the spin coating is completed, the sample is transferred out of the nitrogen atmosphere glove box and transferred to the air. The relative air humidity is controlled below 35%. It is annealed on a hot stage at 100 - 180 o °C for 10 - 100 min. In this embodiment, it is annealed on a hot stage at 150 o °C for 15 min. After the annealing in the air is completed, it is immediately transferred into the glove box and annealed on a hot stage at 100 o °C for another 10 min to complete the preparation of the perovskite light-absorbing thin film layer.

[0028] S4: Preparation of peptidomimetic passivation layer: Dissolve peptidomimetic molecules in a solvent. The selected solvents include at least one of isopropanol, acetonitrile, chlorobenzene, and chloroform, with a concentration of 0.5 - 10 mg mL -1 , to form a peptidomimetic molecule passivation solution; spin - coat the peptidomimetic molecule passivation solution on the perovskite light - absorbing thin - film layer at a speed of 1000 - 10000 rpm for 10 - 100 s. The process does not require heating. Place the perovskite light - absorbing thin - film layer coated with the peptidomimetic molecule passivation solution on a hot stage for annealing at an annealing temperature of 50 - 150 °C to obtain a perovskite light - absorbing thin - film layer passivated by peptidomimetic molecules; in this example, weigh 1 mg of peptidomimetic molecules and dissolve them in isopropanol solvent with a concentration of 1 mgmL -1 , to form a peptidomimetic molecule passivation solution. Spin - coat the peptidomimetic molecule passivation solution at a speed of 4000 rpm for 30 s. The process does not require heating. Place the perovskite light - absorbing thin - film layer coated with the peptidomimetic molecule passivation solution on a hot stage for annealing at an annealing temperature of 35 °C to obtain a perovskite light - absorbing thin - film layer passivated by peptidomimetic molecules.

[0029] Another example of the present invention: Weigh 1 mg of peptidomimetic molecules and dissolve them in isopropanol solvent with a concentration of 1 mgmL -1 , to form a peptidomimetic molecule passivation solution. Spin - coat the peptidomimetic molecule passivation solution at a speed of 4000 rpm for 30 s. The process does not require heating and does not require annealing, and directly obtain a perovskite light - absorbing thin - film layer passivated by peptidomimetic molecules.

[0030] S5: Preparation of thermally evaporated C60 electron - transport layer: Transfer the perovskite light - absorbing thin - film layer passivated by peptidomimetic molecules to an organic material evaporation chamber, evaporate the electron - transport layer C60 with a thickness of 10 - 50 nm, and then immediately evaporate bathocuproine with a thickness of 2 - 10 nm at an evaporation rate of 0.1 - 5 Å s -1 ; In this example, evaporate the electron - transport layer C60 with a thickness of 30 nm, and then immediately evaporate bathocuproine with a thickness of 5 nm at an evaporation rate of 0.3 Å s -1 .

[0031] S6: Preparation of metal electrode layer: Evaporate a metal electrode in a metal evaporation chamber. The metal electrode materials that can be evaporated include gold, silver, and copper, with an evaporation thickness of 60 - 200 nm and an evaporation rate of 0.1 - 10 Å s -1 .

[0032] In this example, evaporate a metal electrode in a metal evaporation chamber. Select silver as the metal electrode material with a thickness of 100 nm and an evaporation rate of 0.1 - 10 Å s -1, adopting stepped rate control, when the evaporated metal thickness is 0 - 10 nm, the rate is 0.1 Å s -1 ; when the thickness is 10 - 20 nm, the rate is 0.2 Å s -1 ; when the thickness is 20 - 30 nm, the rate is 0.3 Å s -1 ; when the thickness is 30 - 40 nm, the rate is 0.3 Å s -1 ; when the thickness is 40 - 50 nm, the rate is 0.4 Å s -1 ; when the thickness is 50 - 60 nm, the rate is 0.5 Å s -1 ; when the thickness is 60 - 70 nm, the rate is 0.6 Å s -1 ; when the thickness is 70 - 100 nm, the rate is 1 - 10 Å s -1 .

[0033] The present invention also discloses a perovskite solar cell based on peptidomimetic passivation, which is prepared by using the preparation method of the perovskite solar cell based on peptidomimetic passivation, as Figure 2 shown.

[0034] The embodiments of the present invention have been described above with reference to the accompanying drawings. However, the present invention is not limited to the above specific embodiments. The above specific embodiments are merely illustrative and not restrictive. Under the inspiration of the present invention, those of ordinary skill in the art can also make many forms without departing from the spirit and scope protected by the claims of the present invention, and all of them fall within the protection scope of the present invention.

Claims

1. A preparation method of a perovskite solar cell based on peptidomimetic passivation, characterized in that: It includes the following steps: S1: Preparation of the substrate: The etched transparent conductive glass was successively ultrasonically cleaned with deionized water, acetone, glass cleaning agent, deionized water, and isopropyl alcohol for 10 - 30 min each, and the time was the same. Subsequently, it was placed in an oven at 60 o °C for drying to obtain the substrate; S2: Preparation of the hole transport layer: Place the treated transparent conductive substrate into a glove box with a nitrogen atmosphere, and prepare a hole transport layer on the transparent conductive substrate. The material of the hole transport layer is selected from one of poly[bis(4-phenyl)(2,4,6-trimethylphenyl)amine], nickel oxide, poly(N,N'-bis-4-butylphenyl-N,N'-biphenyl)benzidine, and self-assembled monolayers, and the preparation method of the material is selected as the solution method; use the spin coating method to uniformly coat the solution, set the rotation speed to 1000 - 10000 rpm, and the spin coating time range: 10 s - 100 s; or transfer to a hot plate at 80 - 150 °C for annealing for 5 - 20 min after spin coating; S3: Preparation of the perovskite light-absorbing thin film layer: Use a two-step method of vacuum evaporation and solution coating to prepare the perovskite light-absorbing thin film layer: First, the vacuum evaporation method is adopted: put the preset metal halide into the corresponding thermal evaporation source of the high-vacuum thermal evaporation equipment, and adjust the vacuum degree to 10 -4 ~10 -5 Pa; the evaporation rate is 0.5 - 10 Å s -1 , and stop heating the evaporation source when the thickness of the film shows 300 - 800 nm; Solution coating method: After the pressure in the vacuum chamber is reduced to atmospheric pressure, take out the sample deposited with metal halide, coat a preset organic salt solution on the metal halide, and use a spin coater to spin coat an appropriate amount of the organic salt solution onto the halide thin film layer. The process includes: the spin coating speed range is selected as 1000 - 10000 rpm, the spin coating time is 10 - 90 s, after spin coating, place the sample on a hot plate for annealing, the annealing temperature is 80 - 150 °C, and the annealing time is 5 - 30 min to obtain the perovskite light-absorbing thin film layer; S4: Preparation of the peptidomimetic passivation layer: Dissolve the peptidomimetic molecule in a solvent, and the selected solvents include at least one of isopropanol, acetonitrile, chlorobenzene, and chloroform, with a concentration of 0.5 - 10 mg mL -1 , to form a peptidomimetic molecule passivation solution; spin-coat the peptidomimetic molecule passivation solution on the perovskite light-absorbing thin film layer at a rotation speed of 1000 - 10000 rpm for 10 - 100 s, without heating during the process. Place the perovskite light-absorbing thin film layer coated with the peptidomimetic molecule passivation solution on a hot stage for annealing at an annealing temperature of 50 - 150 °C to obtain a perovskite light-absorbing thin film layer passivated with a peptidomimetic molecule; S5: Preparation of the thermally evaporated C60 electron transport layer: Transfer the perovskite light-absorbing thin film layer passivated by peptidomimetic molecules into the organic material evaporation chamber, evaporate the electron transport layer C60 with a thickness of 10 - 50 nm, and then evaporate bathocuproine with a thickness of 2 - 10 nm at an evaporation rate of 0.1 - 5 Å s -1 ; S6: Preparation of the metal electrode layer: Evaporate the metal electrode in a metal evaporation chamber. The materials for evaporating the metal electrode include gold, silver, and copper. The evaporation thickness is 60 - 200 nm, and the evaporation rate is 0.1 - 10 Å s -1 .

2. The preparation method of the perovskite solar cell based on peptidomimetic passivation according to claim 1, wherein: In S1, the etched transparent conductive glass is ultrasonically cleaned with deionized water, acetone, and isopropanol for 15 min in sequence, and then placed in a 60 °C air blast drying oven for drying, and the dried transparent conductive glass is treated with ultraviolet ozone for 10 min.

3. The preparation method of the perovskite solar cell based on peptidomimetic passivation according to claim 1, characterized in that: In S1, the transparent conductive glass is selected as FTO or ITO conductive glass.

4. The preparation method of the perovskite solar cell based on peptidomimetic passivation according to claim 1, characterized in that: In S2, an appropriate amount of self-assembled monolayer material is weighed and dissolved in a specific solvent, where the solvent includes at least one of isopropanol, ethanol, dimethyl sulfoxide, dimethylformamide, and n-butanol, and the concentration is 0.1-5 mg mL -1 , the rotation speed of the spin coater is set to 4000 rpm, and the prepared self-assembled monolayer solution is pipetted and dropped onto the spare transparent conductive glass substrate, and the spin coating time is 30 s; or the spin-coated transparent conductive glass substrate is placed on a hot stage at a temperature of 100 o °C for annealing for 10 min.

5. The preparation method of the perovskite solar cell based on peptidomimetic passivation according to claim 1, wherein: In S3, the preset metal halide includes one or two to three of lead iodide, lead chloride, lead bromide, cesium iodide, cesium chloride, cesium bromide, rubidium iodide, rubidium chloride, and rubidium bromide, which are respectively placed in the corresponding thermal evaporation sources of the high-vacuum thermal evaporation equipment; when the vacuum degree drops to 8x10 -4 Pa, start evaporation coating, and the evaporation coating rate is 6 Å s -1 , and stop heating when the thickness reaches 500 nm.

6. The preparation method of the perovskite solar cell based on peptidomimetic passivation according to claim 1, characterized in that: In S3, the preset organic salt solution includes at least one of iodomethylformamidinium, iodomethylammonium, chloromethylformamidinium, chloromethylammonium, bromomethylformamidinium, and bromomethylammonium. When multiple types are selected, they are mixed according to a preset mass ratio and dissolved in an isopropyl alcohol solvent to prepare a solution. The spin-coating speed is 2500 rpm and the spin-coating time is 30 s. After spin-coating, the sample is transferred out of the nitrogen atmosphere glove box and transferred to the air. The relative humidity of the air is controlled below 35%, and it is annealed on a 100-180 o °C hot stage for 10-100 min. Immediately after annealing in the air is completed, it is transferred into the glove box and further annealed on a 100 o °C hot stage for 10 min to complete the preparation of the perovskite light-absorbing thin film layer.

7. The preparation method of the perovskite solar cell based on peptidomimetic passivation according to claim 1, wherein: In S4, weigh 1 mg of peptidomimetic molecules and dissolve them in isopropanol solvent with a concentration of 1 mg / mL, spin coat at a speed of 4000 r for 30 s, without heating and annealing, to obtain a perovskite light-absorbing thin film layer passivated by peptidomimetic molecules.

8. The preparation method of the perovskite solar cell based on peptidomimetic passivation according to claim 1, wherein: In S5, the electron transport layer C60 is vapor-deposited with a thickness of 30 nm, and then bathocuproine is vapor-deposited with a thickness of 5 nm at a vapor deposition rate of 0.3 Å s -1 .

9. The preparation method of the perovskite solar cell based on peptidomimetic passivation according to claim 1, characterized in that: In S6, a metal electrode is vapor-deposited in a metal evaporation chamber. The material of the vapor-deposited metal electrode is silver, with a thickness of 100 nm and a vapor deposition rate of 0.1 - 10 Å s -1 , and a stepped rate control is adopted. When the thickness of the vapor-deposited metal is 0 - 10 nm, the rate is 0.1 Å s -1 ; when the thickness is 10 - 20 nm, the rate is 0.2 Å s -1 ; when the thickness is 20 - 30 nm, the rate is 0.3 Å s -1 ; when the thickness is 30 - 40 nm, the rate is 0.3 Å s -1 ; when the thickness is 40 - 50 nm, the rate is 0.4 Å s -1 ; when the thickness is 50 - 60 nm, the rate is 0.5 Å s -1 ; when the thickness is 60 - 70 nm, the rate is 0.6 Å s -1 ; when the thickness is 70 - 100 nm, the rate is 1 - 10 Å s -1 .

10. A perovskite solar cell based on peptidomimetic passivation, characterized in that, It is prepared by using the preparation method of the perovskite solar cell based on peptidomimetic passivation described in any one of claims 1 - 9.

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