Treatment device for flue gas deamination treatment and flue gas deamination tower

Abstract

The invention discloses a processor for flue gas deamination treatment and a flue gas deamination tower, and the processor comprises a first processing plate which is provided with a plurality of first through holes; the second processing plate is located below the first processing plate, and a plurality of second through holes are formed in the second processing plate; the aperture and the density of the first through holes meet the condition that the sum of the flow rates of solutions allowed to pass through by the plurality of first through holes in a non-pressure state in unit time is smaller than the flow rate of the solution flowing to the first processing plate in unit time; the aperture and density of the second through holes meet the condition that the sum of the flow rates of the solutions allowed to pass through by the plurality of second through holes in a non-pressure state in unit time is smaller than the flow rate of the solution flowing to the second processing plate in unit time; the axial distance between the first treatment plate and the second treatment plate is greater than the thickness of a water film preformed on the second treatment plate. The technical effects that the flue gas can be in full contact with a solution sprayed in the tower, and the treatment degree of the flue gas in the flowing process in the tower is improved are achieved.

Description

Technical Field

[0001] The present invention relates to the technical field of environmental protection equipment, and in particular, to a processor and a flue gas deammoniation tower for flue gas deammoniation treatment. Background Art

[0002] In production environments such as cement plants and power plants, flue gas needs to be treated. The treatment process includes, but is not limited to, desulfurization, deammoniation, and carbon dioxide capture of the flue gas. In the related art, the flue gas is treated by a flue gas treatment tower. The treatment process is that the flue gas is introduced from the lower part of the treatment tower, and the solution is sprayed from top to bottom in the treatment tower. The solution and the flue gas meet and react chemically in the treatment tower to remove impurities and some gases in the flue gas, and the treated flue gas is discharged from the upper part of the treatment tower.

[0003] However, limited by the height of the treatment tower in the related art, the reaction time between the flue gas and the solution in the treatment tower is short, resulting in incomplete treatment of the flue gas. Summary of the Invention

[0004] The main object of the present invention is to provide a processor and a flue gas deammoniation tower for flue gas deammoniation treatment, so as to solve the problem in the related art that the contact between the flue gas and the solution in the treatment tower is insufficient and the reaction time is short, resulting in incomplete treatment of the flue gas.

[0005] To achieve the above object, the present invention provides a processor for flue gas deammoniation treatment, including:

[0006] A first treatment plate for being installed in the flue gas deammoniation treatment tower, and a plurality of first through holes are provided on the first treatment plate;

[0007] A second treatment plate for being installed in the flue gas deammoniation treatment tower and located below the first treatment plate, and a plurality of second through holes are provided on the second treatment plate;

[0008] The aperture and density of the first through holes satisfy that the sum of the solution flow rates allowed to pass through by the plurality of first through holes in a non-pressure state per unit time is less than the solution flow rate flowing to the first treatment plate per unit time, so that during the flue gas deammoniation treatment process, a water film covering the first through holes can be formed on the upper surface of the first treatment plate;

[0009] The aperture and density of the second through holes satisfy that the sum of the solution flow rates allowed to pass through by the plurality of second through holes in a non-pressure state per unit time is less than the solution flow rate flowing to the second treatment plate per unit time, so that during the flue gas deammoniation treatment process, a water film can be formed on the upper surface of the second treatment plate;

[0010] The axial distance between the first treatment plate and the second treatment plate is greater than the thickness of the water film pre-formed on the second treatment plate.

[0011] Further, the aperture diameter of the first through hole is greater than or equal to the aperture diameter of the second through hole; and / or,

[0012] the density of the first through holes is greater than or equal to the density of the second through holes.

[0013] Further, the first through holes are misaligned with the second through holes.

[0014] Further, a catalytic coating is provided on the upper surfaces of the first treatment plate and the second treatment plate, and the catalytic coating is used to accelerate the chemical reaction of the flue gas in the water film.

[0015] Further, a plurality of partition plates are provided on the upper surfaces of the first treatment plate and the second treatment plate, and a plurality of separated chambers are formed above the treatment plates through the partition plates.

[0016] Further, the partition plates include horizontally arranged plates and vertically arranged plates which are arranged alternately. At least one of the upper ends of the adjacent horizontally arranged plates is provided with a first folding portion, the upper end of the vertically arranged plate is provided with a second folding portion, and the first folding portion is fixedly connected to the second folding portion.

[0017] Further, the first treatment plate and the second treatment plate are arranged as circular plates, and the circumferential edges of the first treatment plate and the second treatment plate are used for being closely attached to the inner wall of the flue gas denitrification treatment tower.

[0018] Further, the first treatment plate and the second treatment plate are arranged as circular plates, and annular enclosing plates are provided on the circumferential edges of the first treatment plate and the second treatment plate, and the outer ring sides of the enclosing plates are used for being closely attached to the inner wall of the flue gas denitrification treatment tower.

[0019] Further, the first treatment plate and the second treatment plate include a plurality of separate plates, and the first treatment plate and the second treatment plate are formed by splicing the plurality of separate plates.

[0020] According to another aspect of the present application, there is provided a flue gas denitrification tower, including a tower body and the above-mentioned processor.

[0021] In an embodiment of the present invention, a first processing plate is provided for installation inside a flue gas denitrification treatment tower. A plurality of first through holes are provided on the first processing plate; a second processing plate is provided for installation inside the flue gas denitrification treatment tower and located below the first processing plate. A plurality of second through holes are provided on the second processing plate; the aperture and density of the first through holes satisfy that the sum of the solution flow rates allowed to pass through by the plurality of first through holes in a non-pressure state per unit time is less than the solution flow rate flowing to the first processing plate per unit time, so that during the flue gas denitrification treatment process, a water film can be formed on the upper surface of the first processing plate; the aperture and density of the second through holes satisfy that the sum of the solution flow rates allowed to pass through by the plurality of second through holes in a non-pressure state per unit time is less than the solution flow rate flowing to the second processing plate per unit time, so that during the flue gas denitrification treatment process, a water film can be formed on the upper surface of the second processing plate; the axial distance between the first processing plate and the second processing plate is greater than the thickness of the water film pre-formed on the second processing plate, achieving the purpose that when spraying the solution onto the first processing plate, a water film with a certain thickness can be formed on the surfaces of the first processing plate and the second processing plate, and the flue gas introduced from below the second processing plate needs to pass through two layers of water films in sequence, greatly increasing the contact degree and reaction time between the flue gas and the solution by using the two layers of water films, thereby realizing the technical effect of enabling the flue gas to fully contact the solution in the tower and improving the treatment degree of the flue gas during the flow process in the tower, and further solving the problem in the related technology that the reaction time between the flue gas and the solution in the treatment tower is short, resulting in incomplete flue gas treatment; and, after increasing the reaction time between the flue gas and the solution, the effective utilization rate of the solution is also improved, and the recovery pressure and usage cost are reduced;

[0022] On the other hand, after the first processing plate and the second processing plate are provided, the flue gas first contacts the second processing plate, and the resistance caused by the second processing plate to the flue gas can redistribute the flue gas and make it flow upward, so that the flue gas can contact the first processing plate in a more uniform manner, comprehensively improving the treatment effect and treatment efficiency of the flue gas. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] The drawings constituting a part of the present invention are used to provide a further understanding of the present invention, making other features, objects, and advantages of the present invention more obvious. The schematic embodiments and descriptions of the present invention are used to explain the present invention and do not constitute an improper limitation of the present invention. In the drawings:

[0024] Figure 1 is a schematic structural diagram of a processor according to an embodiment of the present invention;

[0025] Figure 2 is a schematic structural diagram of a single processing unit according to an embodiment of the present invention;

[0026] Figure 3 is a schematic structural diagram of a support structure according to an embodiment of the present invention;

[0027] Figure 4 is a schematic structural diagram of a first processing board and a second processing board according to an embodiment of the present invention;

[0028] Figure 5 is a schematic top view structural diagram of one of the processing boards according to an embodiment of the present invention;

[0029] Figure 6 is Figure 4 a schematic structural diagram of a quarter of the processing board in;

[0030] Figure 7 is a schematic structural diagram of a rectangular plate according to an embodiment of the present invention;

[0031] Figure 8 is a schematic diagram of a flue gas deammoniation tower according to an embodiment of the present invention;

[0032] Figure 9 is a schematic structural diagram of a smoke collecting subsystem according to an embodiment of the present invention;

[0033] Wherein, 1, processing unit; 2, support structure; 201, arc support plate; 202, support beam; 203, diagonal brace; 3, processing board; 3a, first processing board; 3b, second processing board; 30, through hole; 31, plate; 310, special-shaped plate; 311, rectangular plate; 4, partition; 40, cross plate; 41, longitudinal plate; 5, chamber; 6, flue gas treatment tower; 601, oxygen inlet; 602, flue gas inlet; 603, flue gas outlet; 7, processor; 8, spraying assembly; 801, first spray head; 802, second spray head; 803, third spray head; 9, demisting assembly; 10, liquid storage area; 11, absorbent circulation subsystem; 110, first circulation pump; 111, second circulation pump; 112, third circulation pump; 12, oxygen input subsystem; 120, oxidation blower; 13, dust collector; 14, tail exhaust fan; 15, waste liquid treatment subsystem; 150, water treatment module; 151, buffer tank; 152, grate cooler; 153, decomposition furnace; 16, absorption area pit subsystem; 17, absorbent buffer system; 18, chemical agent delivery subsystem; 180, alkaline chemical agent delivery assembly; 181, acidic chemical agent delivery assembly; 19, smoke collecting subsystem; 190, smoke collecting hood; 191, second ventilation port; 192, third ventilation port; 193, exhaust pipe; 194, first ventilation port. Detailed implementation manners

[0034] To enable those skilled in the art to better understand the solution of the present invention, the following will clearly and completely describe the technical solution in the embodiments of the present invention in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the scope of protection of the present invention.

[0035] It should be noted that the terms "first", "second", etc. in the specification and claims of the present invention and the above-mentioned drawings are used to distinguish similar objects, and do not necessarily need to describe a specific order or sequence. It should be understood that such data can be interchanged under appropriate circumstances for the embodiments of the present invention described herein.

[0036] In the present invention, the orientation or positional relationship indicated by terms such as "upper", "lower", "inner", etc. is based on the orientation or positional relationship shown in the drawings. These terms are mainly used to better describe the present invention and its embodiments, and are not used to limit that the indicated device, element or component must have a specific orientation or be constructed and operated in a specific orientation.

[0037] Moreover, in addition to being able to represent an orientation or positional relationship, some of the above terms may also be used to represent other meanings. For example, the term "upper" may also be used to represent a certain attachment relationship or connection relationship in some cases. For those of ordinary skill in the art, the specific meanings of these terms in the present invention can be understood according to specific circumstances.

[0038] In addition, terms such as "arranged", "provided with", "connected", "fixed", etc. should be understood in a broad sense. For example, "connected" can be a fixed connection, a detachable connection, or an integral structure; it can be a mechanical connection or an electrical connection; it can be directly connected, or indirectly connected through an intermediate medium, or there is an internal connection between two devices, elements or components. For those of ordinary skill in the art, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0039] In addition, the meaning of the term "plurality" should be two or more.

[0040] It should be noted that, without conflict, the embodiments in the present invention and the features in the embodiments can be combined with each other. The following will detail the present invention with reference to the drawings and in conjunction with the embodiments.

[0041] To solve related technical problems, as Figures 1 to 4 shown, an embodiment of the present invention provides a processor for flue gas deammoniation treatment, including:

[0042] The first processing plate 3a is for installation inside the flue gas denitrification treatment tower, and a plurality of first through holes 30a are provided on the first processing plate 3a;

[0043] The second processing plate 3b is for installation inside the flue gas denitrification treatment tower and below the first processing plate 3a, and a plurality of second through holes 30b are provided on the second processing plate 3b;

[0044] The aperture and density of the first through holes 30a satisfy that the sum of the solution flow rates allowed to pass through by the plurality of first through holes 30a in a non-pressure state per unit time is less than the solution flow rate flowing to the first processing plate 3a per unit time, so that during the flue gas denitrification treatment process, a water film covering the first through holes 30a can be formed on the upper surface of the first processing plate 3a;

[0045] The aperture and density of the second through holes 30b satisfy that the sum of the solution flow rates allowed to pass through by the plurality of second through holes 30b in a non-pressure state per unit time is less than the solution flow rate flowing to the second processing plate 3b per unit time, so that during the flue gas denitrification treatment process, a water film covering the second through holes 30b can be formed on the upper surface of the second processing plate 3b;

[0046] The axial distance between the first processing plate 3a and the second processing plate 3b is greater than the thickness of the water film pre-formed on the second processing plate 3b.

[0047] In this embodiment, the processor is used in a flue gas treatment tower, which is installed inside the flue gas treatment tower and above the flue gas inlet. A sprayer is arranged above the processor. The solution containing the reagent is sprayed downward through the sprayer. The flue gas enters the flue gas treatment tower from the flue gas inlet and flows upward. The flue gas and the solution meet at the processor, and a chemical reaction occurs during the process of passing through the processor to absorb and remove part of the gas in the flue gas. At the same time, part of the particulate matter in the flue gas is separated from the flue gas after contacting the solution. The flue gas after being treated by the processor continues to flow upward and is discharged from the flue gas outlet at the upper part of the flue gas treatment tower.

[0048] The processor is the core flue gas treatment part in the flue gas treatment tower. In this embodiment, the processor includes a first processing plate 3a and a second processing plate 3b, and the first processing plate 3a and the second processing plate 3b are arranged at intervals up and down. A plurality of first through holes 30a and second through holes 30b are respectively provided on the first processing plate 3a and the second processing plate 3b, and the first through holes 30a and the second through holes 30b are respectively arranged on the first processing plate 3a and the second processing plate 3b according to a certain density.

[0049] In one implementation, as Figure 1As shown, the processor further includes a support structure 2. The support structure 2 is used to install and support the first processing plate 3a and the second processing plate 3b. At the same time, the support structure 2 can be installed and fixed in the flue gas treatment tower. Since the solution needs to flow through the processor, the support structure 2 should be able to allow the solution to pass through while meeting the support performance. In one embodiment, the support structure 2 can adopt a skeleton structure composed of multiple beams welded or spliced together. In this embodiment, the first processing plate 3a and the second processing plate 3b are arranged on the support structure 2 in sequence from top to bottom or from bottom to top.

[0050] As Figure 4 shown, the solution sprayed by the sprayer first flows downward to the first processing plate 3a, then flows downward through the first through holes 30a on the first processing plate 3a to the second processing plate 3b, and finally flows to the lower part of the flue gas treatment tower through the second through holes 30b of the second processing plate 3b. The flue gas, on the contrary, first passes through the second through holes 30b on the second processing plate 3b, and then passes through the first through holes 30a on the first processing plate 3a. Therefore, in order to increase the reaction time of the flue gas with the solution in the processor, it is expected in this embodiment that a water film of a certain thickness can be formed on the upper surfaces of the first processing plate 3a and the second processing plate 3b. After passing through the through holes on each processing plate, the flue gas needs to continue to pass through the water film on the processing plate, and can fully contact the solution during the process of passing through the water film, increasing the residence time and reaction degree of the flue gas.

[0051] To form a water film on the two processing plates, the aperture of the first through holes 30a in this embodiment should satisfy that the sum of the solution flow rates allowed to pass through by the multiple first through holes 30a in a unit time under a non-pressure state is less than the solution flow rate flowing to the first processing plate 3a in a unit time. Specifically, the density and aperture of the first through holes 30a determine the solution flow rate passing through the first processing plate 3a in a unit time. To enable a water film to be formed on the upper surface of the first processing plate 3a, the solution flow rate flowing to the first processing plate 3a in a unit time needs to be greater than the solution flow rate flowing through the first processing plate 3a in a unit time. The greater the difference, the thicker the formed water film. The same applies to the second processing plate 3b. The difference between the two is that the solution of the first processing plate 3a directly comes from the sprayer, while the solution of the second processing plate 3b is the solution that has passed through the first processing plate 3a.

[0052] Since a part of the solution is consumed when the flue gas reacts with the solution when passing through the first treatment plate 3a, the solution flow rate from the sprayer to the first treatment plate 3a is not exactly equal to the solution flow rate from the first treatment plate 3a to the second treatment plate 3b. However, generally, the solution flow rate to the first treatment plate 3a is relatively close to the solution flow rate from the first treatment plate 3a to the second treatment plate 3b. Therefore, when the density and aperture of the first through holes 30a are set to be the same as those of the second through holes 30b, water films with similar thicknesses can be formed on the first treatment plate 3a and the second treatment plate 3b. Of course, the density and aperture of the first through holes 30a and the second through holes 30b can also be designed differently so that water films with different thicknesses can be formed on the first treatment plate 3a and the second treatment plate 3b.

[0053] In addition, it should be noted that the greater the thickness of the water film, the greater the resistance to the flue gas. Therefore, a thicker water film will also reduce the flow rate of the flue gas, resulting in a slower overall flue gas treatment speed. For this reason, in this embodiment, the first treatment plate 3a and the second treatment plate 3b are reasonably arranged so that they can form two independent water films to improve the flue gas treatment effect while avoiding excessive resistance to the flue gas and ultimately affecting the flue gas treatment efficiency. As for the thickness of the water film, when the structure of the treatment plate is fixed, the thickness of the water film can be adjusted by controlling the solution flow rate of the sprayer.

[0054] Furthermore, since the flue gas enters the tower from one side of the flue gas treatment tower, when no treatment plate is arranged, the flue gas concentration is higher in the space near the flue gas inlet side in the tower and lower in the flue gas concentration on the side far from the flue gas inlet. After arranging the treatment plate, due to the resistance of the treatment plate to the flue gas, the flue gas diffuses around after contacting the treatment plate, thereby redistributing the flue gas and making the flue gas distribution in the tower relatively uniform. On this basis, when the first treatment plate 3a and the second treatment plate 3b are arranged and the axial distance between the first treatment plate 3a and the second treatment plate 3b is greater than the thickness of the water film pre-formed on the second treatment plate 3b, the second treatment plate 3b located below can play the role of redistributing the flue gas. In other words, there is a region where the flue gas can flow freely between the first treatment plate 3a and the second treatment plate 3b, and the flue gas can be redistributed in this region, making the flue gas distribution in this region more uniform. Furthermore, the uniformity of the flue gas distribution can be further improved, and finally the flue gas can pass through the water film on the first treatment plate 3a evenly, improving the treatment effect of the flue gas on the first treatment plate 3a.

[0055] When the distance between the first processing plate 3a and the second processing plate 3b is less than or equal to the water film thickness on the second processing plate 3b, there is a lack of free flow space for the flue gas between the first processing plate 3a and the second processing plate 3b. After passing through the water film on the second processing plate 3b, the flue gas cannot flow freely for distribution, resulting in poor flue gas distribution effect. Only the second processing plate 3b can achieve the distribution effect.

[0056] In this embodiment, when spraying the solution onto the first processing plate 3a, a water film with a certain thickness can be formed on the surfaces of the first processing plate 3a and the second processing plate 3b. The flue gas introduced from below the second processing plate 3b needs to pass through two layers of water films in sequence. By using the two layers of water films, the contact degree and reaction time between the flue gas and the solution are greatly increased, thus achieving the purpose of enabling the flue gas to fully contact the solution in the tower and improving the treatment degree of the flue gas during its flow in the tower. Furthermore, it solves the problem in the related art that the reaction time between the flue gas and the solution in the treatment tower is short, resulting in incomplete treatment of the flue gas. And, after increasing the reaction time between the flue gas and the solution, the effective utilization rate of the solution is also improved, reducing the recovery pressure and usage cost.

[0057] On the other hand, after setting the first processing plate 3a and the second processing plate 3b, the flue gas first contacts the second processing plate 3b. The resistance caused by the second processing plate 3b to the flue gas can redistribute the flue gas and make it flow upward, so that the flue gas can contact the first processing plate 3a in a more uniform manner, comprehensively improving the treatment effect and treatment efficiency of the flue gas.

[0058] In one embodiment, the aperture of the first through hole 30a is larger than the aperture of the second through hole 30b; and / or,

[0059] The density of the first through holes 30a is greater than the density of the second through holes 30b.

[0060] Specifically, it should be noted that the flue gas flow velocity and temperature are relatively high near the flue gas inlet in the flue gas treatment tower. To improve the flue gas treatment effect, it is necessary to quickly reduce the flue gas flow velocity and temperature and make the flue gas more evenly distributed in the tower. The second treatment plate 3b in the processor is closest to the flue gas inlet, so the above purposes need to be achieved through the second treatment plate 3b. To achieve this purpose, it is necessary to make the water film thickness of the second treatment plate 3b thicker. Since the flow rate of the solution flowing to the second treatment plate 3b is constant, when the number of the first through holes 30a and the second through holes 30b is the same, to increase the water film thickness of the second treatment plate 3b, it is necessary to reduce the aperture of the second through hole 30b. When the apertures of the first through holes 30a and the second through holes 30b are the same, to increase the water film thickness on the second treatment plate 3b, it is necessary to reduce the number of the second through holes 30b and reduce the density of the second through holes 30b. In actual operation, one of the two methods can be selected according to the situation to adjust the water film thickness of the second treatment plate 3b, or both methods can be selected simultaneously to adjust the water film thickness of the second treatment plate 3b.

[0061] In one embodiment, the first through holes 30a are offset from the second through holes 30b.

[0062] Specifically, in this embodiment, the flow path of the flue gas through the processor is as follows: first, it flows in through the second through holes 30b, and after passing through the water film on the second treatment plate 3b, the flue gas flows and rises upward in the space between the first treatment plate 3a and the second treatment plate 3b, and then enters the water film of the first treatment plate 3a through the first through holes 30a. To further improve the distribution uniformity of the flue gas, in this embodiment, the first through holes 30a are offset from the second through holes 30b, so that the flue gas flowing in through the second through holes 30b will be further blocked by the first treatment plate 3a and spread out, and then flow out through the first through holes 30a.

[0063] Optionally, catalytic coatings are provided on the upper surfaces of the first treatment plate 3a and the second treatment plate 3b, and the catalytic coatings are used to accelerate the chemical reaction between the flue gas and the solution.

[0064] Specifically, it should be noted that when ammonia and sulfur dioxide in the flue gas need to be treated, the sprayed solution contains sulfate ions. After the solution contacts the flue gas, ammonia and sulfur dioxide in the flue gas react with the sulfate ions to generate salts such as ammonium sulfate. Therefore, to accelerate this chemical reaction process, a catalyst can be added. In this embodiment, catalytic coatings are provided on the upper surfaces of the first treatment plate 3a and the second treatment plate 3b, and the catalytic coatings are coatings containing catalysts. Since most of the flue gas treatment process is in the water film on the upper surfaces of the first treatment plate 3a and the second treatment plate 3b, when the catalytic coatings are provided on the upper surfaces of the first treatment plate 3a and the second treatment plate 3b, the catalytic coatings can catalyze the chemical reaction in the water film, thereby improving the flue gas treatment efficiency.

[0065] In another embodiment, loose catalytic fillers are arranged on the upper surfaces of the first processing plate 3a and the second processing plate 3b. After the water film is formed, the catalytic fillers are located within the water film, and the chemical reaction between the flue gas and the solution is accelerated by the catalytic fillers.

[0066] Optionally, as Figures 1 to 5 shown, a plurality of partition plates 4 are provided on the upper surfaces of the first processing plate 3a and the second processing plate 3b, and a plurality of mutually separated chambers 5 are formed above the processing plate 3 through the partition plates 4.

[0067] Specifically, in this embodiment, to enable the upper surfaces of the first processing plate 3a and the second processing plate 3b to form a water film with a uniform thickness, the first processing plate 3a and the second processing plate 3b need to be horizontal. Since the diameter of the flue gas treatment tower is relatively large, the first processing plate 3a and the second processing plate 3b also tend to have a relatively large diameter. However, it is difficult to ensure the levelness during the installation of the first processing plate 3a and the second processing plate 3b with a relatively large diameter. When the first processing plate 3a and the second processing plate 3b are plate-like structures with a flat surface, if a number of the first processing plate 3a and the second processing plate 3b are in an inclined state, the water film thickness at the higher end of the first processing plate 3a and the second processing plate 3b will be relatively thin or there will be no water film, resulting in the flue gas not being treated, while the water film thickness at the lower end will be relatively large, making it difficult for the flue gas to pass smoothly.

[0068] Therefore, in this embodiment, a plurality of partition plates 4 are provided on the upper surfaces of the first processing plate 3a and the second processing plate 3b, and a plurality of mutually separated chambers 5 are formed above the first processing plate 3a and the second processing plate 3b through the partition plates 4. Even if the first processing plate 3a and the second processing plate 3b are in an inclined state after installation, since a plurality of chambers 5 are formed by the partition plates 4, the solution on the first processing plate 3a and the second processing plate 3b will not flow directly from the higher side to the lower side, but rather ensure that a water film with a certain thickness can be formed in each chamber 5.

[0069] In addition, in this embodiment, after adding the partition plates 4 to the first processing plate 3a and the second processing plate 3b, the structural strength and bending resistance of the entire processing plate are increased, and it is not easy to produce bending deformation even if the diameter of the processing plate is relatively large.

[0070] In one embodiment, as Figures 1 to 5 shown ( Figure 4Omit the vertical plate 41 in the partition plate 4. The partition plate 4 can be a plate-like structure with criss-crossing horizontal and vertical plates, including a plurality of horizontal plates 40 and vertical plates 41. The horizontal plates 40 and vertical plates 41 are welded and fixed to the upper surfaces of the first treatment plate 3a and the second treatment plate 3b. The upper surfaces of the first treatment plate 3a and the second treatment plate 3b are divided into a plurality of regions by the horizontal plates 40 and vertical plates 41, and each region forms an independent chamber 5. The regions at the edges can use circular plates added to the edges of the first treatment plate 3a and the second treatment plate 3b as the closing edges of these regions, or the inner walls of the support structure 2 or the flue gas treatment tower can be used as the closing edges of these regions.

[0071] For the convenience of the fixed connection between the horizontal plate 40 and the vertical plate 41, as Figure 6 shown, in one embodiment, a first folding portion 400 can be selectively provided at the upper ends of all the horizontal plates 40, and a second folding portion 410 is provided at the upper end of the vertical plate 41. The first folding portion 400 and the second folding portion 410 are attached and fixedly connected. Both the first folding portion 400 and the second folding portion 410 can be plate-like structures extending in the horizontal direction.

[0072] In another embodiment, when a first flipping portion 400 is selectively provided at the upper ends of some of the horizontal plates 40, since the vertical plate 41 is located between two adjacent horizontal plates 40, in order to enable the second folding portions 410 on each vertical plate 41 to have corresponding first folding portions 400 for connection, a first folding portion 400 can be provided at the upper end of one of the two adjacent horizontal plates 40. In addition, the side elevation of the vertical plate 41 can also be welded and fixed to the inner side surface of the horizontal plate 40, thereby further improving the connection strength.

[0073] In one embodiment, the first treatment plate 3a and the second treatment plate 3b are circular plates, and the circumferential edges of the first treatment plate 3a and the second treatment plate 3b are used to closely fit with the inner wall of the flue gas deammoniation treatment tower.

[0074] In another embodiment, the first treatment plate 3a and the second treatment plate 3b are provided as circular plates, and annular surrounding plates are provided at the circumferential edges of the first treatment plate 3a and the second treatment plate 3b. The outer ring side of the surrounding plate is used to closely fit with the inner wall of the flue gas deammoniation treatment tower.

[0075] In one embodiment, the first treatment plate 3a and the second treatment plate 3b include a plurality of separate plates, and the first treatment plate 3a and the second treatment plate 3b are formed by splicing a plurality of separate plates.

[0076] For example, the first treatment plate 3a and the second treatment plate 3b can include a plurality of sector plates. During installation, a plurality of sector plates need to be spliced to form a circular plate for easy installation in the flue gas treatment tower.

[0077] In one embodiment, as Figure 1 and Figure 5 shown, the first processing board 3a and the second processing board 3b include a plurality of separate plates 31, and a plurality of through holes 30 are provided on each plate 31, and the plates 31 are fixedly arranged on the support structure 2.

[0078] When the overall diameter of the processing board 3 is relatively large, for the convenience of transportation and installation of the processing board 3, in this embodiment, the processing board 3 is divided into a plurality of separate plates 31. During transportation, the plurality of plates 31 can be stacked to reduce the occupied space. During installation, each plate 31 is fixed to the support structure 2 one by one according to the corresponding division method, and finally the processing board 3 and the processor are assembled. The plate 31 and the support structure 2 can be fixedly connected by welding or by bolts, etc., and this embodiment does not limit it here.

[0079] According to different division methods, plates 31 with different numbers and shapes will be formed. In one embodiment, the first processing board 3a and the second processing board 3b are circular plates as a whole, as Figure 1 and Figure 5 shown, by longitudinally and transversely dividing the first processing board 3a and the second processing board 3b, a plurality of rectangular plates 311 and special-shaped plates 310 with arc-shaped edges can be obtained. The special-shaped plates 310 correspond to the edge regions of the first processing board 3a and the second processing board 3b. On this basis, the division spacing also determines the size of each plate 31, so the corresponding division method can be selected according to the actual situation.

[0080] In another embodiment, the first processing board 3a and the second processing board 3b include a plurality of sector plates that can be spliced into a circle. For example, the processing board 3 includes two semi-circular plates. Similarly, by longitudinally and transversely dividing the first processing board 3a and the second processing board 3b, a plurality of rectangular plates 311 and special-shaped plates 310 with arc-shaped edges can be obtained. The special-shaped plates 310 correspond to the edge regions of the processing board.

[0081] After the first processing board 3a and the second processing board 3b are divided into a plurality of plates, in order to enable the first processing board 3a and the second processing board 3b to form a plurality of chambers 5 through the vertical plates 41 and the horizontal plates 40 after assembly, in this embodiment, a horizontal plate 40 is respectively arranged on two opposite sides of the rectangular plate 311, and the horizontal plates 40 between adjacent rectangular plates 311 are mutually attached and fixedly connected, and a vertical plate 41 is arranged in the middle of each rectangular plate 311.

[0082] Specifically, the horizontal plate 40 in this embodiment is a plate-like structure arranged in a single direction. For the rectangular plate 311, the horizontal plates 40 are provided only on two opposite sides of the rectangular plate 311 (for example, on the opposite long sides or short sides of the rectangular plate 31). When the rectangular plate 311 is arranged on the support structure 2 in the direction of the other pair of sides, the horizontal plates 40 between adjacent rectangular plates 311 are in contact with each other, and the rectangular plate 311 can be welded or bolted to the support structure 2, and at the same time, the adjacent horizontal plates 40 are welded or bolted.

[0083] In one embodiment, as Figure 7 shown, the height of the horizontal plate 40 on one of the long sides of the rectangular plate 311 is less than the height of the horizontal plate 40 on the other side. While facilitating the welding and fixing of adjacent two horizontal plates 40, the material used for the horizontal plate 40 is reduced, thereby reducing the use cost. In this embodiment, since the height of the horizontal plate 40 on one side of the rectangular plate 311 is small, it cannot provide the first folding part 400 for connecting with the second folding part 410 on the vertical plate 41. Therefore, for a rectangular plate 311, the first folding part 400 can be provided on the horizontal plate 40 with a higher height on the rectangular plate 311.

[0084] When two rectangular plates 311 are assembled, as Figure 6 shown, the higher horizontal plate 40 on one rectangular plate 311 is in contact with the lower horizontal plate 40 on the other rectangular plate 311. Therefore, after assembly, for the same rectangular plate 311, both sides of the rectangular plate 311 have higher horizontal plates 40, and the higher horizontal plates 40 can be provided with the first folding part 400. Therefore, both ends of the second folding part 410 on the vertical plate 41 arranged on the rectangular plate 311 can be fixedly connected to the corresponding first folding part.

[0085] In one embodiment, as Figure 3 shown, the support structure 2 includes support beams 202 arranged vertically and horizontally, and each rectangular plate 311 and the special-shaped plate 310 are fixed on the support beams 202.

[0086] Specifically, in this embodiment, the support beams 202 are arranged vertically and horizontally to provide stable support for the first processing plate 3a and the second processing plate 3b. Correspondingly, the support beams 202 are also set in two groups, and each group of support beams 202 is used to support one processing plate. The upper and lower groups of support beams 202 can be connected by connecting members such as diagonal braces 203 to ensure the structural stability of the entire support structure 2.

[0087] When the first processing plate 3a and the second processing plate 3b are divided into multiple plate bodies, in order to provide a fixed position for each plate body, in this embodiment, the position of the support beam 202 corresponds to the division position of the first processing plate 3a and the second processing plate 3b, that is, it corresponds to the edge position of the plate body, and at least one pair of opposite edges on the plate body can be fixed on the corresponding support beam 202.

[0088] In one implementation manner, the support structure 2 further includes an enclosing plate 204, and the support beam 202 is fixedly arranged inside the enclosing plate 204.

[0089] Specifically, the enclosing plate 204 surrounds the outside of the entire support beam 202 and the processing plate 3. The support beam 202 and the processing plate 3 are both installed inside the enclosing plate 204. The enclosing plate 204 can be fixedly connected to the inside of the flue gas treatment tower, and the entire processor is installed in the flue gas treatment tower through the enclosing plate 204.

[0090] In one specific implementation manner, for the convenience of transportation, the support structure 2 is set to two semi-circular parts, which can be installed in the flue gas treatment tower on-site to form a circular structure. Correspondingly, in a single part of the support structure 2, the enclosing plate 204 includes a semi-circular plate and a straight plate. The two ends of the straight plate are fixedly connected to the two ends of the semi-circular plate to form a semi-circular frame. The support beam 202 is then fixed inside the frame and fixedly connected to the corresponding semi-circular plate and straight plate. In this embodiment, when dividing the circular first processing plate 3a and the second processing plate 3b, the circular processing plate 3 is preferably divided into two semi-circular plates first, and then the two semi-circular plates are divided.

[0091] On the basis of providing a catalytic coating on the first processing plate 3a and the second processing plate 3b, the first processing plate 3a and the second processing plate 3b can also be made of a material with catalytic effect to accelerate the chemical reaction between the flue gas and the solution.

[0092] For large flue gas treatment towers, it is necessary to configure flue gas processors with a larger diameter, and the installation and transportation of large-diameter flue gas processors are both relatively difficult.

[0093] Therefore, on the basis of the above implementation manner, as Figure 1 and Figure 2 shown, this embodiment provides a core processor for flue gas treatment, including:

[0094] The processor includes a plurality of processing units 1. The processing units 1 are fan-shaped, and a plurality of processing units 1 can be assembled circumferentially in a columnar space;

[0095] The processing unit 1 includes a support structure 2 and a processing plate 3. The support structure 2 is arranged to allow the solution to flow through;

[0096] A plurality of through holes 30 are provided on the processing plate 3, and the aperture and density of the through holes 30 satisfy that the sum of the solution flow rates allowed to pass through per unit time in the non-pressure state is less than the solution flow rate flowing to the processing plate 3 where the through holes 30 are located per unit time.

[0097] In this embodiment, the processor is set as a plurality of split processing units 1, and each processing unit 1 is in a fan shape. After the plurality of fan-shaped processing units 1 are arranged along the circumferential direction, they can be installed in a columnar space, that is, they can be installed in a flue gas treatment tower. According to different layout methods, the plurality of processing units 1 can be closely attached or arranged at intervals. To make full use of the space, it is preferably that the plurality of processing units 1 are closely attached to each other. Each processing unit 1 includes a support structure 2 and a processing plate 3. The support structure 2 and the processing plate 3 in this embodiment have the same functions as the support structure 2 and the processing plate 3 in the above embodiment, and will not be elaborated here. In one embodiment, the support structure 2 is set as a fan-shaped frame structure. The processing plate 3 in a single processing unit 1 can be set as one or more. When it is set as one, the processing plate 3 is set as a fan shape and installed on the support structure 2. The processing plate 3 in each processing unit can include a first processing plate 3a and a second processing plate 3b.

[0098] This embodiment achieves the purpose of setting the processor as a plurality of split processing units 1. During transportation, the processing units 1 can be placed separately. After arriving at the site, the plurality of processing units 1 are installed in the flue gas treatment tower one by one. Since the processing units 1 are in a fan shape, when installed, the processing units 1 are installed along the circumferential direction in a certain order to form a circular processor, so that it can be adapted to the columnar flue gas treatment tower, thereby achieving the technical effect of reducing the space requirement for a large processor during transportation and reducing the installation difficulty during installation, and further solving the problem of inconvenient installation and transportation of large-diameter flue gas processors in the related art.

[0099] In one embodiment, as Figure 3 shown, the support structure 2 includes an enclosing plate 204 and support beams 202. The enclosing plate 204 encloses a fan-shaped space. The support beams 202 are provided in a plurality and arranged in the fan-shaped space. The support beams 202 are fixedly connected to the enclosing plate 204;

[0100] The processing plate 3 is arranged in the fan-shaped space and fixedly connected to the support beams 202.

[0101] Specifically, in this embodiment, the processing plate 3 can be a fan-shaped plate matching the fan-shaped space, or a plurality of plates 31 are installed in the fan-shaped space to form the processing plate 3. The edge of the processing plate 3 fits against the inner side of the enclosing plate 204, and the enclosing plate 204 is used as a retaining structure for the water film on the processing plate 3.

[0102] When the enclosing plate 204 encloses a fan-shaped space, asFigure 3 As shown, the surrounding plate 204 includes a first plate body 2040 and a second plate body 2041. In this embodiment, the surrounding plate 204 has at least two forms. One form is that the sector space enclosed by the surrounding plate 204 is semi-circular, and the other form is that the sector space enclosed by the surrounding plate 204 is a non-semi-circular sector. Correspondingly, when the sector space enclosed by the surrounding plate 204 is semi-circular, the first plate body 2040 is a semi-circular arc plate, the second plate body 2041 is a straight plate, and the two ends of the second plate body 2041 are fixedly connected to the two ends of the arc plate.

[0103] When the sector space enclosed by the surrounding plate 204 is other sectors, the first plate body 2040 is a non-semi-circular arc plate, the second plate body 2041 is a V-shaped plate, and the two ends of the second plate body 2041 are fixedly connected to the two ends of the arc plate.

[0104] Both ends of the support beam 202 are fixedly connected to the corresponding first plate body 2040 and second plate body 2041, and the fixing method can be welding or bolt connection.

[0105] When adjacent processing units 1 are closely attached to each other, the second plate bodies 2041 in adjacent surrounding plates 204 are closely attached, and the two ends of the first plate bodies 2040 in adjacent surrounding plates 204 are closely attached to form a circle.

[0106] In one implementation, as Figure 3 shown, two support structures 2 are provided and symmetrically distributed. The corresponding surrounding plates 204 enclose a semi-circular space. The first plate body 2040 is a semi-circular arc plate, the second plate body 2041 is a straight plate, and the second plate bodies 2041 in the two support structures 2 are closely attached.

[0107] Furthermore, as Figure 3 shown, a plurality of support beams 202 are crisscrossed. Both ends of the support beam 202 are fixedly connected to the surrounding plate 204; the processing plate 3 is fixedly arranged on the upper end surface of the support beam 202.

[0108] At least one of the plurality of support beams 202 is attached to the inner side of the second plate body 2041; to facilitate supporting the arc edge of the processing plate 3, in this embodiment, the support structure 2 further includes an arc support plate 201. The arc support plate 201 is fixedly arranged on the inner side of the surrounding plate 204 and is attached to the inner side of the first plate body 2040. The arc edge of the processing plate 3 is supported by the arc support plate 201, and the straight edge of the processing plate 3 is supported by the support beam 202.

[0109] When the processing plates 3 are arranged in two groups in the up-and-down direction, the support beams 202 are arranged in two groups and distributed up and down in the sector space. Each group of support beams 202 is provided with a plurality of support beams 202 that are crisscrossed; the upper ends of each group of support beams 202 are fixedly provided with processing plates 3.

[0110] To further improve the support performance, the support structure 2 further includes diagonal braces 203. A plurality of diagonal braces 203 are provided and located between two sets of support beams 202. The upper and lower ends of the diagonal braces 203 are respectively fixedly connected to the corresponding support beams 202.

[0111] According to another aspect of the present application, there is provided a flue gas deammoniation tower, including a tower body and the above-mentioned processor.

[0112] In one embodiment, as Figure 8 shown, the flue gas deammoniation tower includes:

[0113] A flue gas treatment tower 6, in which a processor 7, a spray assembly 8 and a demisting assembly 9 are sequentially arranged from bottom to top. A flue gas outlet 603 is provided at the upper end of the flue gas treatment tower 6, a flue gas inlet 602 is provided on the flue gas treatment tower 6, and a liquid storage area 10 is provided at the lower part of the flue gas treatment tower 6;

[0114] The flue gas inlet 602 is located between the processor 7 and the liquid storage area 10. Under the action of the spray assembly, a multi-layer water film can be formed in the core processor. The flue gas and the absorbent sprayed by the spray assembly 8 converge in the processor 7, and the flue gas is deammoniated during the process of passing through the water film;

[0115] An absorbent circulation subsystem 11, the first end of the absorbent circulation subsystem 11 is communicated with the liquid storage area 10, and the second end is communicated with the spray assembly 8, for circulating and transporting the absorbent in the liquid storage area 10 to the spray assembly 8 and spraying it downward by the spray assembly 8;

[0116] A chemical agent delivery subsystem 18, the chemical agent delivery subsystem 18 is communicated with the liquid storage area 10, for delivering a treatment chemical agent to the liquid storage area 10;

[0117] A waste liquid treatment subsystem 15, the waste liquid treatment subsystem 15 is communicated with the liquid storage area 10, for recycling and treating the waste liquid;

[0118] An oxygen input subsystem 12, the oxygen input subsystem 12 is used for inputting oxygen into the flue gas treatment tower 6 to promote the oxidation reaction of the sulfur-containing substances in the flue gas treatment tower 6 in a lower valence state.

[0119] In this embodiment, the flue gas treatment system is used to treat the tail gas of a cement kiln, mainly for ammonia removal from the tail gas of the cement kiln. The flue gas treatment process includes: the flue gas is introduced into the flue gas treatment tower 6 through the flue gas inlet 602 at the lower part of the tower. The chemical agent delivery subsystem 18 introduces a treatment chemical agent that can absorb ammonia in the flue gas into the liquid storage area 10 at the lower part of the flue gas treatment tower 6. The treatment chemical agent and the aqueous solution are mixed in the liquid storage area 10 to form an absorbent, and the absorbent circulation subsystem 11 transports the absorbent in the liquid storage area 10 to the spray assembly 8. The spray assembly 8 sprays the absorbent downward onto the processor 7, and multiple water films are formed on the processor 7. The flue gas entering the flue gas treatment tower 6 flows from bottom to top and converges with the sprayed absorbent in the processor 7. Most of the substances to be treated in the flue gas, such as ammonia and sulfur, are washed away during the process of passing through the water films. The flue gas passing through the processor 7 continues to flow upward and continuously contacts the absorbent sprayed downward, further absorbing and treating the remaining substances to be treated in the flue gas. The treated flue gas mixed with liquid droplets flows upward to the demisting assembly 9. When passing through the demisting assembly 9, the demisting assembly 9 adsorbs the liquid droplets mixed in the flue gas for gas-liquid separation. The separated flue gas is discharged from the flue gas outlet 603 at the upper part of the flue gas treatment tower 6, and the separated liquid droplets flow downward to the liquid storage area 10.

[0120] During the treatment process, the oxygen input subsystem 12 inputs oxygen into the flue gas treatment tower 6 to promote the oxidation reaction of the sulfur substances in the lower valence state in the flue gas treatment tower 6. For example, sulfur dioxide is converted into sulfur trioxide, which dissolves in water to form sulfuric acid. After reacting with calcium in the subsequent process, calcium sulfate can be directly formed as an industrial product. The waste liquid formed after flue gas treatment is transported outwards through the waste liquid treatment subsystem 15 and the waste liquid is recycled and treated to extract the beneficial substances in the waste liquid and reduce the content of harmful substances in the waste liquid.

[0121] Specifically, in this embodiment, the internal structure of the flue gas treatment tower 6 includes a processor 7, a spray assembly 8, and a demisting assembly 9 arranged in sequence from bottom to top. Among them, the processor 7 is the area where the flue gas and the absorbent converge. The flue gas is fully treated and absorbed in the processor 7, and most or all of the substances to be treated in the flue gas, including ammonia, sulfur, nitrogen, solid impurities in the flue gas, etc., are washed away by the absorbent. The absorbent sprayed from the spray assembly 8 washes away the substances to be treated in the flue gas after passing through the processor 7 and flows downward into the liquid storage area 10.

[0122] The flue gas passing through the processor 7 and the spray component 8 contains some droplets, and the droplets contain absorbent and some substances dissolved in the absorbent. Therefore, it is necessary to remove the droplets in the flue gas before the flue gas is discharged. In this embodiment, the demisting component 9 located above the spray component 8 is used to remove the droplets in the flue gas. Since the flue gas entering the flue gas treatment tower 6 has a certain initial velocity, it still maintains a certain velocity and flows upward even after being treated in contact with the absorbent. The flue gas with a certain velocity carries the droplets and flows upward until it contacts the demisting component 9. The flow direction of the flue gas is changed by the blocking member in the demisting component 9 to block the flue gas. Since the flue gas, as a gas, can change its direction and continue to flow upward after being blocked, the droplets in the flue gas will be adsorbed on the blocking member and drip and flow downward after collection. In one embodiment, the demisting component 9 includes a plurality of baffle plates, and the resistance during the flow of the flue gas is increased by the baffle plates to remove the droplets in the flue gas.

[0123] As Figure 8 shown, the absorbent circulation subsystem 11, the chemical agent delivery subsystem 18, the waste liquid treatment subsystem 15, and the oxygen input subsystem 12 are connected to the flue gas treatment tower 6 as external systems. Among them, the absorbent circulation subsystem 11 is used to continuously transport the absorbent in the liquid storage area 10 to the spray component 8, and the absorbent sprayed by the spray component 8 flows back to the liquid storage area 10 after treating the flue gas. In one embodiment, the absorbent circulation subsystem 11 mainly includes one or more circulation pumps.

[0124] The chemical agent delivery subsystem 18 is used to transport the treatment chemical agent to the liquid storage area 10 of the flue gas treatment tower 6, and the treatment chemical agent is mixed with the aqueous solution in the liquid storage area 10 to form the absorbent. According to different treatment requirements, the chemical agent delivery subsystem 18 transports different types of treatment chemical agents into the liquid storage area 10. The aqueous solution in the liquid storage area 10 can be directly input through a water tank and a water pump.

[0125] Since the absorbent after treating the flue gas still flows back to the liquid storage area 10, after a period of treatment, more waste liquid will be stored in the liquid storage area 10. Therefore, it is necessary to treat the waste liquid. In this embodiment, the waste liquid treatment subsystem 15 pumps out and treats the waste liquid in the liquid storage area 10 and utilizes the beneficial substances in the waste liquid. The specific treatment method can be determined by analyzing the composition of the waste liquid.

[0126] The oxygen input subsystem 12 is used to input oxygen into the flue gas treatment tower 6 to promote the treatment of the flue gas and the subsequent recovery treatment of the waste liquid, reduce the complexity in the subsequent treatment process, and improve the economic value.

[0127] Through this flue gas deammoniation system, the present invention can fully treat ammonia in flue gas during a single treatment process, improve the flue gas treatment efficiency, and reduce the complexity of flue gas treatment. Moreover, during the treatment process, it can promote the oxidation reaction of substances containing sulfur in the sub-valent state in the tower, which is beneficial for subsequent recycling. At the same time, the formed waste liquid can be recycled and treated again, making full use of various beneficial substances and improving the economic value.

[0128] To further improve the treatment efficiency, as Figure 8 shown, the flue gas can first pass through the dust collector 13, then through the tail gas exhaust fan 14, and then enter the flue gas treatment tower 6. The dust collector 13 is used to remove dust from the flue gas, reducing the content of solid substances in the flue gas. The tail gas exhaust fan 14 is used to accelerate the flue gas, increasing the flow rate of the flue gas in the flue gas treatment tower 6.

[0129] In addition, when the flue gas temperature is relatively high, to ensure the treatment effect, it is necessary to reduce the flue gas temperature before the flue gas comes into contact with the absorbent. Therefore, a cooling device can be arranged in the flue gas treatment tower 6. The cooling device is used to first cool the flue gas entering from the flue gas inlet 602, and the cooled flue gas then flows upward to come into contact with the absorbent. In one embodiment, the cooling device can be a cooling water spraying device arranged in the flue gas treatment tower 6 and corresponding to the flue gas inlet 602. Cooling water is sprayed onto the flue gas inlet 602 through the cooling water spraying device to cool the flue gas.

[0130] In one embodiment, as Figure 8 shown, the waste liquid treatment subsystem 15 includes:

[0131] A water treatment module 150, which is used to receive the waste liquid discharged from the liquid storage area 10 and purify the waste liquid. The treated purified water is returned to the flue gas treatment tower 6, and the treated concentrated salt water is transported to the next level;

[0132] A buffer tank 151, which is connected to the water treatment module 150 and is used to receive the treated concentrated salt water and transport the concentrated salt water to the next level respectively;

[0133] A decomposition furnace 153, which is connected to the buffer tank 151 and is used to receive the separated concentrated salt water and recycle and utilize it;

[0134] A grate cooler 152, which is connected to the buffer tank 151 and is used to receive part of the concentrated salt water from the buffer tank and recycle and utilize it.

[0135] In this embodiment, the water treatment module 150 is connected to the liquid storage area 10 by a water pump. The waste liquid in the liquid storage area 10 is pumped into the water treatment module 150 by the water pump, and the waste liquid is treated by the water treatment module 150. The treatment process may include purifying the waste liquid. The treated purified water can be transported back to the liquid storage area 10 as a solvent for the treatment agent by the water pump, and the treated concentrated brine containing salt is transported to the buffer tank 151. The concentrated brine containing salt includes solid micro-particle impurities, water-soluble salts, and water-insoluble salts. Therefore, the concentrated brine containing salt needs to be further treated.

[0136] Specifically, after the flue gas is treated, the formed salt-containing solution contains ammonium salts, ammonium sulfate, nitrogen oxides, etc. Therefore, the concentrated brine containing salt can be transported to the decomposition furnace 153 for high-temperature treatment. In a high-temperature environment, ammonium sulfate decomposes into sulfate radicals and ammonia. Among them, the sulfate radicals react with calcium oxide, the alkaline mineral decomposed from calcium carbonate in the decomposition furnace 153, to form calcium sulfate and enter the kiln with the raw meal. The ammonia decomposed from the ammonium salts reacts with nitrogen oxides to produce a redox reaction to generate nitrogen gas, which can be used for denitrification to save ammonia water. Finally, calcium sulfate, nitrogen gas, and ammonia water are obtained after treating the concentrated brine containing salt in this embodiment. In addition, the concentrated brine containing salt can also be directly introduced into the grate cooler 152 for treatment, for example, introduced into the high-temperature section in the grate cooler 152 for treatment and recycling. The treatment includes that the ammonia decomposed from the ammonium salts enters the kiln and furnace with the secondary and tertiary air and is directly used for denitrification to save ammonia water. The sulfate radicals decomposed from the ammonium salts react with calcium oxide, the alkaline mineral on the surface of the clinker, to form stable calcium salts and enter the warehouse with the clinker.

[0137] In this embodiment, the flue gas is subjected to deammoniation and desulfurization treatment by the flue gas treatment tower 6. The ammonia water obtained after deammoniation can be further used for denitrification treatment, so that multiple substances can be treated in one treatment process, further improving the treatment efficiency, and fully recycling the beneficial substances after the flue gas treatment. In addition, it should be noted that in the present invention, oxygen is input into the flue gas treatment tower 6 through the oxygen input subsystem 12, so that sulfur dioxide in the flue gas treatment tower 6 can be converted into sulfur trioxide, which can form ammonium sulfate after dissolving in water and is beneficial to the subsequent formation of calcium sulfate.

[0138] In one embodiment, as Figure 8 shown, the oxygen input subsystem 12 includes an oxidation blower 120. An oxygen inlet 601 is provided on the flue gas treatment tower 6. The oxygen inlet 601 is located below the flue gas inlet 602. The oxidation blower 120 is connected to the oxygen inlet 601 and is used to input oxygen from the oxygen inlet 601 into the flue gas treatment tower 6 to promote the chemical reaction of sulfur-containing substances in the flue gas treatment tower 6. According to actual needs, multiple oxidation blowers 120 can be provided.

[0139] In one embodiment, since it is necessary to detect the absorbent in the liquid storage area 10 in real time during the flue gas treatment process, including but not limited to detecting the composition and pH value of the absorbent. Therefore, the flue gas deammoniation treatment system in this embodiment further includes an absorption area sump subsystem 16. The absorption area sump subsystem 16 is connected to the liquid storage area 10 and is used to extract the absorbent after participating in the flue gas treatment from the liquid storage area 10 and transport the extracted absorbent back to the liquid storage area 10, and detect the absorbent after participating in the flue gas treatment through the absorption area sump subsystem 16.

[0140] Specifically, in this embodiment, the absorption area sump subsystem 16 includes an absorption area sump and a corresponding sump pump. The liquid in the liquid storage area 10 is continuously pumped into the absorption area sump by the sump pump, and the liquid in the absorption area sump is detected by corresponding detection equipment. At the same time, the liquid in the absorption area sump also needs to be continuously transported back to the liquid storage area 10 for use as an absorbent. Therefore, the liquid in the absorption area sump is in a continuous flow state, and its state is basically the same as that of the liquid in the liquid storage area 10. By detecting the liquid in the absorption area sump, the state of the liquid in the liquid storage area 10 can be judged.

[0141] In one embodiment, the processes such as the replenishment of treatment agents, the replenishment of aqueous solutions, and the extraction of waste liquids can be judged by the state of the liquid in the absorption area sump.

[0142] In one embodiment, in order to facilitate the maintenance and cleaning of the flue gas treatment tower 6, it is necessary to drain the absorbent in the liquid storage area 10. Therefore, in this embodiment, an absorbent buffer system 17 is further included. The absorbent buffer system 17 is used to buffer the absorbent in the liquid storage area 10 and transport the buffered absorbent back to the liquid storage area 10.

[0143] Specifically, the absorbent buffer system 17 may include an absorbent buffer tank 151. Its input end can be connected in parallel to the output end of the absorption area sump subsystem 16, and its output end is connected to the liquid storage area 10 through an absorbent return pump. The absorbent in the liquid storage area 10 is buffered by the absorbent buffer tank 151, which is convenient for the maintenance and cleaning of the flue gas treatment tower 6. In the subsequent treatment process, the absorbent is transported back to the liquid storage area 10 through the absorbent return pump.

[0144] In one embodiment, as Figure 8 shown, the chemical agent delivery subsystem 18 includes: an alkaline chemical agent delivery component 180 for inputting an alkaline chemical agent into the liquid storage area 10; an acidic chemical agent delivery component 181 for inputting an acidic chemical agent into the liquid storage area 10.

[0145] In one embodiment, to improve the treatment effect on flue gas, it is desired that the flue gas in each area of the flue gas treatment tower 6 can contact the absorbent sprayed by the spray assembly 8, so as to treat the flue gas with the absorbent. In addition, in the processor 7 part, it is necessary to rely on the absorbent sprayed by the spray assembly 8 to form a water film. To enable the flue gas to fully contact the absorbent, the surface of the processor 7 should be completely covered by the water film, so that all the flue gas passing through the processor 7 needs to pass through the water film.

[0146] Therefore, the spraying range of the spray assembly 8 needs to cover the processor 7, so as to form a complete water film on the processor 7. Even after the processing board of the processor 7 is partitioned, a water film can still be formed in each area, ensuring full contact between the flue gas and the absorbent.

[0147] Specifically, in this embodiment, the spray assembly 8 includes a first spray head 801, a second spray head 802, and a third spray head 803 arranged in sequence from top to bottom. The spraying ranges of the first spray head 801, the second spray head 802, and the third spray head 803 intersect and jointly cover the processor 7. In this embodiment, each spray head includes a plurality of nozzles, and the ranges of each nozzle intersect, so as to avoid the generation of unsprayed areas. The first spray head 801, the second spray head 802, and the third spray head 803 are staggered by a certain angle in the circumferential direction, so as to ensure full coverage.

[0148] Correspondingly, after the first spray head 801, the second spray head 802, and the third spray head 803 are set, the absorbent circulation subsystem 11 includes a first circulation pump 110, a second circulation pump 111, and a third circulation pump 112. The two ends of the first circulation pump 110 are respectively connected to the liquid storage area 10 and the first spray head 801. The two ends of the second circulation pump 111 are respectively connected to the liquid storage area 10 and the second spray head 802. The two ends of the third circulation pump 112 are respectively connected to the liquid storage area 10 and the third spray head 803.

[0149] In the present invention, although the flue gas carrying droplets has undergone gas-liquid separation through the demisting assembly 9, there will still be some tiny droplets in the separated flue gas, and these tiny droplets also need to be treated. For this reason, as Figure 8 shown, this embodiment further includes a smoke collection subsystem 19. The smoke collection subsystem 19 is arranged in the upper part of the flue gas treatment tower 6 and is communicated with the flue gas outlet 603. The smoke collection subsystem 19 is used to collect the gas containing droplets after the flue gas is treated, and perform gas-liquid separation on the gas containing droplets. The separated gas is discharged from the flue gas outlet 603.

[0150] Specifically, the smoke collection subsystem 19 can adopt different structures according to different gas-liquid separation methods. For example, a dedicated gas-liquid separation device is connected to the upper end of the flue gas treatment tower to perform gas-liquid separation on the flue gas. In another embodiment, the rising speed of the flue gas is utilized to make the flue gas rotate and contact the wall on the path, thereby achieving gas-liquid separation. In still another embodiment, the flow path of the flue gas is increased, and the path is bent multiple times to achieve gas-liquid separation.

[0151] To reduce costs, reasonably utilize the flow rate of the flue gas for gas-liquid separation, and reduce the resistance of the flue gas during gas-liquid separation to ensure sufficient treatment efficiency. As Figure 8 and Figure 9 shown, the smoke collection subsystem 19 in this embodiment includes a smoke collection hood 190 and an exhaust pipe 193. The smoke collection hood 190 is set to be conical. A first ventilation port 194 is provided at the upper end of the smoke collection hood 190. The lower end of the exhaust pipe 193 is connected to the first ventilation port 194, and the exhaust pipe 193 is communicated with the flue gas outlet 603;

[0152] A second ventilation port 191 is provided on the smoke collection hood 190, and a third ventilation port 192 is provided on the exhaust pipe 193. The second ventilation port 191 and the third ventilation port 192 are connected by a pipe. The orientation of the third ventilation port 192 deviates from the axis of the exhaust pipe 193, so that the gas discharged from the third ventilation port 192 enters the exhaust pipe 193 from the tangential direction of the exhaust pipe 193, making the gas in the exhaust pipe 193 rise in a cyclone manner and achieve gas-liquid separation.

[0153] Specifically, as Figure 9 shown, in this embodiment, the conical smoke collection hood 190 can collect the treated flue gas and collect the flue gas into the exhaust pipe 193 through the first ventilation port 194. The first ventilation port 194 can be located in the middle of the smoke collection hood 190. The diameter of the exhaust pipe 193 is much smaller than the inner diameters of the smoke collection hood 190 and the flue gas treatment tower 6. Therefore, the flow rate of the flue gas further increases when it enters the exhaust pipe 193. In this embodiment, in order to make the flue gas entering the exhaust pipe 193 rotate and make the liquid droplets in the flue gas contact the wall of the exhaust pipe 193 to achieve gas-liquid separation, a second ventilation port 191 is eccentrically provided on the smoke collection hood 190, and a third ventilation port 192 is provided on the exhaust pipe 193. The second ventilation port 191 and the third ventilation port 192 are kept connected by a pipe. In order to make the flue gas in the exhaust pipe 193 rotate, a tangential force needs to be provided for the flue gas. Therefore, in this embodiment, the third ventilation port 192 does not directly face the middle of the exhaust pipe 193, but deviates from the axis of the exhaust pipe 193, making it face the left or right side of the exhaust pipe 193, so that the flue gas entering the exhaust pipe 193 from the third ventilation port 192 can provide a tangential force for the flue gas in the exhaust pipe 193, making the flue gas in the exhaust pipe 193 rotate and rise to achieve gas-liquid separation.

[0154] In this embodiment, the flue gas treated in the flue gas treatment tower 6 is divided into two paths from the smoke collecting hood 190. The first path, as the main path, enters the exhaust pipe 193 through the first ventilation port 194 and flows upward. The second path enters the exhaust pipe 193 tangentially from the exhaust pipe 193 through the second ventilation port 191, the pipeline and the third ventilation port 192. The velocity of the flue gas itself is used to provide a tangential thrust to the flue gas in the exhaust pipe 193, so that the flue gas in the exhaust pipe 193 spirally rises as a whole. During the spiral rising process, the tiny droplets carried by the flue gas come into contact with the inner wall of the exhaust pipe 193 and adhere to the inner wall. On the one hand, it realizes the further gas-liquid separation of the treated flue gas and reduces the content of tiny droplets in the flue gas, thus solving the problem that the flue gas discharged from the flue gas treatment tower 6 in the related art still carries a large amount of tiny droplets. On the other hand, the velocity of the flue gas itself is fully utilized to form a spirally upward flowing gas flow in the exhaust pipe 193, without introducing additional air induction equipment, reducing the cost of flue gas treatment.

[0155] On this basis, to further facilitate the rotation of the flue gas in the exhaust pipe 193, as Figure 9 shown, the second ventilation port 191 is provided with a plurality of them and is distributed along the circumferential direction of the first ventilation port 194. The third ventilation port 192 is provided with a plurality of them and is distributed along the circumferential direction of the exhaust pipe 193, and the orientations of the plurality of third ventilation ports 192 are all in the clockwise direction or the counterclockwise direction; the plurality of second ventilation ports 191 are respectively connected to the plurality of third ventilation ports 192 through pipelines.

[0156] In this embodiment, the orientations of all the third ventilation ports 192 are all in the clockwise direction or the counterclockwise direction. Multiple third ventilation ports provide multiple tangential thrusts to the flue gas in the exhaust pipe, so as to better rotate the flue gas in the exhaust pipe. In a specific implementation manner, the second ventilation port 191 is provided with two and is located on opposite sides of the smoke collecting hood 190. Correspondingly, the third ventilation port 192 is also provided with two and is located on both sides of the exhaust pipe 193. Two third ventilation ports 192 provide a greater and more stable tangential force to the flue gas in the exhaust pipe 193, ensuring the stable rotation of the flue gas in the exhaust pipe 193. At the same time, it also ensures that a sufficient amount of flue gas enters the flue gas in the exhaust pipe from the first ventilation port 194, improving the flue gas treatment efficiency.

[0157] When a plurality of second ventilation ports 191 and a plurality of third ventilation ports 192 are provided, the plurality of second ventilation ports 191 can be evenly distributed along the circumferential direction on the gas collecting hood, and the plurality of third ventilation ports 192 are distributed along the spiral direction on the exhaust pipe 193, so as to better push the flue gas in the exhaust pipe 193 to spiral upward.

[0158] Specifically, when there are two second ventilation openings 191 and two third ventilation openings 192, the two second ventilation openings 191 can be symmetrically distributed on the air collecting hood, and the two third ventilation openings 192 are respectively located on both sides of the exhaust pipe 193 and are vertically distributed, so as to better promote the spiral upward movement of the flue gas in the exhaust pipe 193.

[0159] To facilitate the rotation of the flue gas, the exhaust pipe 193 is set as a circular pipe, and the third ventilation opening 192 needs to face the tangential direction of the exhaust pipe 193. To provide sufficient tangential force, the third ventilation opening 192 needs to have a sufficient diameter, and its orientation needs to be as close as possible to the edge of the exhaust pipe 193, that is, sufficiently deviated from the axis of the exhaust pipe 193. When the third ventilation opening 192 is a circular opening, the diameter of the third ventilation opening 192 is limited, resulting in insufficient tangential force. Therefore, as Figure 9 shown, in this embodiment, the third ventilation opening 192 is set as a square opening, so as to provide a larger outlet area while being as close as possible to the edge of the exhaust pipe 193, thereby being able to provide sufficient tangential force, providing the rotational stability and rotational speed of the flue gas in the exhaust pipe 193, and finally providing the gas-liquid separation effect.

[0160] After the third ventilation opening 192 is set as a square opening, it belongs to a special-shaped structure for conventional pipeline connection. Therefore, a special-shaped interface needs to be welded separately with a steel plate. The first end of the interface matches the third ventilation opening 192, and the second end is still a circular opening for connecting with the pipeline. To ensure the structural strength of the interface, strengthening structures such as reinforcing ribs can be welded on each steel plate forming the interface.

[0161] On this basis, as Figure 9 shown, the upper boundary of the third ventilation opening 192 is a spiral shape extending around the wall of the exhaust pipe 193, which further facilitates the formation of a spiral upward airflow in the exhaust pipe 193. Further, the lower boundary of the third ventilation opening 192 is also a spiral shape extending around the wall of the exhaust pipe 193, and the height difference between the starting point and the ending point of the lower boundary is less than the height difference between the starting point and the ending point of the upper boundary. The connection line between the starting point of the upper boundary and the starting point of the lower boundary is a straight line, and the connection line between the ending point of the upper boundary and the ending point of the lower boundary is a straight line, that is, the side boundaries on both sides of the third ventilation opening are straight lines.

[0162] The above are only the preferred embodiments of the present invention and are not used to limit the present invention. For those skilled in the art, the present invention can have various changes and modifications. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principle of the present invention shall be included within the protection scope of the present invention.

Claims

1. A processor for flue gas denitrification treatment, characterized in that, Comprising: A first treatment plate for installation inside a flue gas denitrification treatment tower, wherein a plurality of first through holes are provided on the first treatment plate; A second treatment plate for installation inside the flue gas denitrification treatment tower and located below the first treatment plate, wherein a plurality of second through holes are provided on the second treatment plate; The aperture and density of the first through holes satisfy that the sum of the solution flow rates allowed to pass through by the plurality of first through holes in a pressureless state per unit time is less than the solution flow rate flowing towards the first treatment plate per unit time, so that during the flue gas denitrification treatment process, a water film covering the first through holes can be formed on the upper surface of the first treatment plate; The aperture and density of the second through holes satisfy that the sum of the solution flow rates allowed to pass through by the plurality of second through holes in a pressureless state per unit time is less than the solution flow rate flowing towards the second treatment plate per unit time, so that during the flue gas denitrification treatment process, a water film covering the second through holes can be formed on the upper surface of the second treatment plate; The axial distance between the first treatment plate and the second treatment plate is greater than the thickness of the water film pre-formed on the second treatment plate.

2. The processor for flue gas denitrification treatment according to claim 1, wherein The aperture of the first through holes is greater than or equal to the aperture of the second through holes; and / or, The density of the first through holes is greater than or equal to the density of the second through holes.

3. The processor for flue gas deammoniation treatment according to claim 1, characterized in that The first through holes and the second through holes are misaligned.

4. The processor for flue gas denitrification treatment according to claim 1, characterized in that, Catalytic coatings are provided on the upper surfaces of the first treatment plate and the second treatment plate, and the catalytic coatings are used to accelerate the chemical reaction of the flue gas in the water film.

5. The processor for flue gas deammoniation treatment according to claim 1, characterized in that A plurality of partition plates are provided on the upper surfaces of the first treatment plate and the second treatment plate, and a plurality of separated chambers are formed above the treatment plates through the partition plates.

6. The processor for flue gas denitrification treatment according to claim 5, characterized in that, The partition plates include horizontally arranged plates and vertically arranged plates which are arranged alternately. At least one of the upper ends of the adjacent horizontally arranged plates is provided with a first folding portion, the upper end of the vertically arranged plate is provided with a second folding portion, and the first folding portion is fixedly connected to the second folding portion.

7. The processor for flue gas denitrification treatment according to claim 1, wherein, The first treatment plate and the second treatment plate are arranged as circular plates, and the circumferential edges of the first treatment plate and the second treatment plate are used for being closely attached to the inner wall of the flue gas denitrification treatment tower.

8. The processor for flue gas denitrification treatment according to claim 1, characterized in that, The first treatment plate and the second treatment plate are arranged as circular plates, and annular enclosing plates are provided on the circumferential edges of the first treatment plate and the second treatment plate, and the outer ring sides of the enclosing plates are used for being closely attached to the inner wall of the flue gas denitrification treatment tower.

9. The processor for flue gas denitrification treatment according to claim 1, characterized in that, The first treatment plate and the second treatment plate include a plurality of individual plates, and the first treatment plate and the second treatment plate are formed by splicing the plurality of individual plates.

10. A flue gas deammoniation tower, characterized in that, Comprising a tower body and the processor according to any one of claims 1 to 9.

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