Surface processing method of diamond-like carbon film
By depositing metal nanoparticle layers on the diamond-like carbon film and forming a concave and convex structure, the problem of diamond-like carbon film prone to crack peeling under high strain rate is solved, and better ductility and service life are achieved.
Patent Information
- Application Number
- CN202410098863.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-01-24
- Publication Date
- 2025-07-25
AI Technical Summary
Diamond-like carbon films are prone to cracks and peeling under high load and high strain rate, resulting in reduced application effect and shortened service life.
Diamond-like carbon film is deposited on the substrate, and a metal nanoparticle layer is formed thereon, and then an electrochemical corrosion method is used to form an uneven structure on the metal nanoparticle layer to improve its ductility.
It significantly improves the ductility of diamond-like carbon film, avoids cracks and peeling, extends service life, and enhances the application effect under high strain rate.
Abstract
Description
Technical Field
[0001] The present invention relates to the field of semiconductor processing, and particularly to a method for surface processing of diamond-like carbon films. Background Art
[0002] Diamond-Like Carbon (DLC) films are a kind of surface modification materials with excellent mechanical properties, chemical inertness and corrosion resistance. DLC films are widely used in the fields of lubrication, anti-wear, anti-corrosion, biomedicine, etc. However, due to the inherent brittleness and lack of ductility of DLC films, cracking, spalling and other failure phenomena will occur under high load and high strain rate conditions, thus reducing their application effects and service lives.
[0003] Therefore, how to improve the ductility of DLC films and enhance their performance has become one of the current research hotspots. It is necessary to provide an improved method for surface processing of diamond-like carbon films to overcome the above defects. Summary of the Invention
[0004] The purpose of the present invention is to provide an improved method for surface processing of diamond-like carbon films. This method is simple and efficient, can effectively change the surface ductility of diamond-like carbon films, avoid failure phenomena such as cracking and spalling, and thus improve the application effect and extend the service life.
[0005] To achieve the above purpose, the method for surface processing of diamond-like carbon films of the present invention includes the following steps:
[0006] Deposit a diamond-like carbon film on a substrate;
[0007] Deposit a metal nanoparticle layer on the diamond-like carbon film; and
[0008] Form an uneven structure on the metal nanoparticle layer by an electrochemical corrosion method.
[0009] Compared with the prior art, in the method of the present invention, first a diamond-like carbon film is formed on a substrate, then a metal nanoparticle layer is formed on the diamond-like carbon film, and finally an uneven structure is formed on the metal nanoparticle layer by electrochemical corrosion. That is to say, the metal nanoparticles are formed in an uneven shape on the diamond-like carbon film. In this way, the ductility of the diamond-like carbon film can be greatly improved. After repeated bending tests, the surface of the diamond-like carbon film still remains intact, and failure phenomena such as cracking and spalling will not occur. For the use under high strain rate conditions, the diamond-like carbon film can also exhibit good ductility, greatly improving its application effect and extending its service life.
[0010] As an example, the diamond-like carbon film is formed by plasma-assisted chemical vapor deposition of a gas mixture of CF4 and C2H2 in a vacuum chamber.
[0011] As an example, the material of the metal nanoparticle layer is TiO2 and / or Al2O3.
[0012] As an example, depositing the metal nanoparticle layer includes: controlling the air pressure in the vacuum chamber to be 1.0×10 -3 Pa to 1.2×10 -4 Pa, and controlling the temperature of the vacuum chamber to be 60 - 80 °C.
[0013] As an example, in the electrochemical corrosion method, a mixed solution of nitric acid, glacial acetic acid, and hydrofluoric acid is used as the corrosion liquid, and the electrode potential is controlled to be -0.5 V to 0.5 V.
[0014] Preferably, the temperature of the corrosion liquid is 30 - 45 °C, and the corrosion time is 5 - 30 minutes.
[0015] Preferably, the thickness of the diamond-like carbon film is 15 - 100 nm.
[0016] As an example, the diameter of the metal nanoparticles in the metal nanoparticle layer is 5 - 20 nm.
[0017] Preferably, the diameter of the metal nanoparticles is 10 nm. Detailed implementation manners
[0018] To make the above objects, features, and advantages of the present application more obvious and understandable, the following describes the detailed implementation manners of the present application in combination with some examples. Many specific details are set forth in the following description to fully understand the present application. However, the present application can be implemented in many other ways different from those described herein, and those skilled in the art can make similar improvements without departing from the connotation of the present application. Therefore, the present application is not limited by the specific examples disclosed below.
[0019] In the description of the present application, the terms "first" and "second" are only used for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly specifying the quantity of the indicated technical features. Thus, the features defined with "first" and "second" may explicitly or implicitly include at least one of such features. In the description of the present application, "a plurality of" means at least two, such as two, three, etc., unless otherwise specifically defined.
[0020] In this application, unless otherwise clearly specified and defined, the first feature being "on" or "under" the second feature may mean that the first and second features are in direct contact, or the first and second features are indirectly in contact through an intermediate medium. Moreover, the first feature being "above", "over" and "on top of" the second feature may mean that the first feature is directly above or obliquely above the second feature, or simply indicates that the first feature has a higher horizontal height than the second feature. The first feature being "under", "beneath" and "underneath" the second feature may mean that the first feature is directly below or obliquely below the second feature, or simply indicates that the first feature has a lower horizontal height than the second feature.
[0021] It should be noted that when an element is referred to as being "fixed to" or "disposed on" another element, it can be directly on the other element or there may also be an intermediate element. When an element is considered to be "connected" to another element, it can be directly connected to the other element or there may be an intermediate element at the same time. The terms "vertical", "horizontal", "upper", "lower", "left", "right" and similar expressions used herein are only for the purpose of illustration and do not represent the only implementation.
[0022] The surface processing method of the diamond-like carbon film of the present invention will be further described below in conjunction with embodiments, but the present invention is not limited thereby. The method of the present invention aims to provide a surface processing method of a diamond-like carbon film, which is simple and efficient, can effectively change the surface ductility of the diamond-like carbon film, avoid failure phenomena such as cracks and peeling, and thus improve the application effect and extend the service life.
[0023] In an embodiment of the surface processing method of the diamond-like carbon film of the present invention, the following steps are included:
[0024] Deposit a diamond-like carbon film on a substrate;
[0025] Deposit a metal nanoparticle layer on the diamond-like carbon film; and
[0026] Form an uneven structure on the metal nanoparticle layer by an electrochemical corrosion method.
[0027] In the method of the present invention, first a diamond-like carbon film is formed on a substrate, then a metal nanoparticle layer is formed on the diamond-like carbon film, and finally an uneven structure is formed on the metal nanoparticle layer by electrochemical corrosion. That is to say, the metal nanoparticles are formed in an uneven shape on the diamond-like carbon film. In this way, the ductility of the diamond-like carbon film can be greatly improved. After repeated bending tests, the surface of the diamond-like carbon film still remains intact and no failure phenomena such as cracks and peeling will occur. For the use under high strain rates, the diamond-like carbon film can also exhibit good ductility, greatly improving its application effect and extending its service life.
[0028] Specifically, in a particular embodiment, first, a diamond-like carbon film is deposited on a substrate. The diamond-like carbon film is formed by plasma-assisted chemical vapor deposition of a gas mixture of CF4 and C2H2 in a vacuum chamber. The thickness of the diamond-like carbon film is preferably 15 - 100 nm. Optionally, the substrate can be a semiconductor substrate, a plastic substrate, or a metal substrate.
[0029] Next, a metal nanoparticle layer is deposited on the diamond-like carbon film, for example, by chemical vapor deposition. Specifically, the deposition steps and parameters are as follows. Control the air pressure in the vacuum chamber to be 1.0×10 -3 Pa to 1.2×10 -4 Pa, control the temperature of the vacuum chamber to be 60 - 80 °C, and use metal oxides as targets, such as TiO2 and / or Al2O3. Thus, metal nanoparticles of TiO2 and / or Al2O3 are formed on the diamond-like carbon film, thereby forming a metal nanoparticle layer. Preferably, the diameter of the metal nanoparticles is 5 - 20 nm, more preferably 10 nm.
[0030] Subsequently, an uneven structure is formed on the metal nanoparticle layer by electrochemical etching. Specifically, in the electrochemical etching method, a mixed solution of nitric acid, glacial acetic acid, and hydrofluoric acid is used as the etching solution. By optimizing and controlling the working parameters of the electrochemical etching, an uneven structure is formed on the metal nanoparticle layer to improve the surface ductility. Specifically, control the electrode potential in the etching tank to be -0.5 V to 0.5 V, the temperature of the etching solution to be 30 - 45 °C, and the etching time to be 5 - 30 minutes. Commonly, the concentration of hydrofluoric acid is preferably 60% - 70%.
[0031] Thus, the metal nanoparticles are formed in an uneven shape on the diamond-like carbon film. In this way, the ductility of the diamond-like carbon film can be greatly improved. After repeated bending tests, the surface of the diamond-like carbon film still remains intact, and no failure phenomena such as cracks and peeling occur. For use under high strain rates, the diamond-like carbon film can also exhibit good ductility, greatly improving its application effect and extending its service life.
[0032] The above-disclosed are only the preferred embodiments of the present invention. Of course, the scope of the rights of the present invention cannot be limited thereby. Therefore, equivalent changes made according to the scope of the patent application of the present invention still fall within the scope covered by the present invention.
Claims
1. A method for surface processing of diamond-like carbon film, characterized in that, Comprising the following steps: Depositing a diamond-like carbon film on a substrate; Depositing a metal nanoparticle layer on the diamond-like carbon film; and Forming a concavo-convex structure on the metal nanoparticle layer by an electrochemical etching method.
2. The surface processing method of the diamond-like carbon film according to claim 1, characterized in that, The diamond-like carbon film is formed by plasma-assisted chemical vapor deposition of a CF4 and C2H2 gas mixture in a vacuum chamber.
3. The surface processing method of the diamond-like carbon film according to claim 1, characterized in that, The material of the metal nanoparticle layer is TiO2 and / or Al2O3.
4. The surface processing method of the diamond-like carbon film according to claim 1, characterized in that, Depositing the metal nanoparticle layer includes: controlling the air pressure in the vacuum chamber to be 1.0×10 -3 Pa to 1.2×10 -4 Pa, and controlling the temperature of the vacuum chamber to be 60 - 80 °C.
5. The surface processing method of the diamond-like carbon film according to claim 1, characterized in that, In the electrochemical etching method, a mixed solution of nitric acid, glacial acetic acid, and hydrofluoric acid is used as the etching solution, and the electrode potential is controlled to be -0.5 V to 0.5 V.
6. The surface processing method of the diamond-like carbon film according to claim 5, characterized in that, The temperature of the etching solution is 30 - 45 °C, and the etching time is 5 - 30 minutes.
7. The surface processing method of the diamond-like carbon film according to claim 1, characterized in that, The thickness of the diamond-like carbon film is 15 - 100 nm.
8. The surface processing method of the diamond-like carbon film according to claim 1, characterized in that, The diameter of the metal nanoparticles in the metal nanoparticle layer is 5 - 20 nm.
9. The surface processing method of the diamond-like carbon film according to claim 8, characterized in that, The diameter of the metal nanoparticles is 10 nm.