Dynamic vacuum seal system for physical vapor deposition sputter applications

Abstract

A vacuum seal and a sealing system are provided that include a respective spacer ring and a respective sputter target. The seal and sealing system can be used in PVD sputtering applications. The seal may include a compressible portion and a rigid portion. The compressible portion may include two or more higher profile protrusions and two or more lower profile recesses that pass through the spacer ring and the sputtering target and facilitate formation of a vacuum seal by compression between the spacer ring and the sputtering target. The seal may also include a removable and replaceable plasma shield attachable to the first end of the seal. The seal may also include an edge on the second end that is selectively coupled with a corresponding stepped portion of the spacer ring. The sputtering target may have a continuous peripheral flange surface. In one embodiment, the seal and sealing system are self-centering.

Description

[0001] Cross - reference to related applications

[0002] This application claims priority to U.S. Patent Application No. 63 / 367,914, entitled "Dynamic Vacuum Sealing System for Physical Vapor Deposition Sputtering Applications", filed on July 8, 2022, the entire content of which is incorporated herein by reference. Technical Field

[0003] The present disclosure generally relates to a dynamic vacuum sealing system for physical vapor deposition sputtering applications, and more particularly to a vacuum seal and sealing system that includes corresponding isolation rings and corresponding sputtering targets that do not include O - rings and corresponding grooves or any vent slots or scallops. Background Art

[0004] Physical vapor deposition (PVD) is a thin - film deposition technique used in manufacturing processes to create coatings and coating patterns on desired surface substrates. This technique can employ sputtering methods to transfer materials from a solid source (such as a sputtering target) to the substrate surface in a vacuum environment. PVD can be used in various applications, such as for semiconductor manufacturing, glass coating, optical coating, solar cell coating, nanotechnology, etc., to deposit thin - film layers. Sputtering in a vacuum environment can also be used to provide sputter cleaning, such as in ion plating.

[0005] In one example, PVD may involve bombarding a sputtering target with high - energy particles (such as ions or plasma) to eject atoms or molecules from the target surface, which can then become vapor in the vacuum chamber. The vaporized particles can then pass through the vacuum chamber and deposit on the substrate surface, thereby forming a thin - film layer on the substrate surface. Based on erosion characteristics and available materials, sputtering targets are consumed and have a limited lifespan. The composition of the deposited thin - film is determined by the material composition of the sputtering target and can be selected to provide desired properties such as conductivity, optical characteristics, adhesion, etc.

[0006] The PVD process generally requires a high - vacuum environment to minimize gas interference and unwanted reactions, but achieving and maintaining a high - vacuum environment is technically demanding and costly. In addition, the presence of residual gases or contaminants can affect the quality and properties of the deposited thin - film. Appropriate sealing is needed to maintain vacuum integrity and prevent air or other gases from entering or escaping the vacuum chamber and disrupting the controlled environment, to minimize system contamination, provide stability in terms of the accuracy and reliability of the processes the system performs in a high - vacuum environment, and meet other considerations such as safety assurance and energy efficiency. Summary of the Invention

[0007] The following presents an overview of the present disclosure to provide a basic understanding of certain aspects. This overview is not intended to identify key or critical elements, nor is it intended to limit any limitations of the embodiments or claims. Additionally, this overview may provide a simplified summary of certain aspects that may be described in more detail in other parts of the present disclosure. Any aspect described may be used alone or in combination with other described aspects without limitation, with the same effect as if described separately and explicitly described in various possible combinations.

[0008] Disclosed is a vacuum seal and seal system that includes a corresponding spacer ring and a corresponding sputtering target. The seal and seal system can be used in PVD sputtering applications. In one embodiment, the seal and seal system does not include an O-ring and a corresponding groove or any vent groove or scallop, or other shapes or features with similar functions. The seal can include a compressible portion and a rigid portion. The compressible portion can include more than two higher-profile protrusions and more than two lower-profile recesses that facilitate the formation of a vacuum seal between and through the spacer ring and the sputtering target by compression. The rigid portion can be encapsulated by the same material as the compressible portion. The seal can also include a removable and replaceable plasma shield that can be attached to a first end of the seal. The seal can also include an edge on a second end that selectively engages a corresponding stepped portion of the spacer ring. The sputtering target can have a continuous peripheral flange surface. In one embodiment, the seal and seal system is self-aligning. In one embodiment, the seal and seal system provides an increased sealing surface area or interface. In one embodiment, the seal and seal system provides a buffer between the sputtering target and the spacer ring.

[0009] In an exemplary embodiment of the present invention, a seal ring for a physical vapor deposition (PVD) vacuum chamber is disclosed, the seal ring having: a compressible portion, wherein the compressible portion includes at least one protrusion and at least one recess; a rigid portion adjacent to the compressible portion, wherein the rigid portion has ribs that are substantially encapsulated by a secondary material; an edge that extends from a first surface of the seal ring and is configured to selectively couple to a spacer ring; and a removable shield that is configured to selectively couple to a first end of the compressible portion and is configured to isolate the compressible portion from the interior of the vacuum chamber.

[0010] In other aspects, the compressible portion is made of a fluorocarbon, a fluorinated elastomer, or a fluorinated rubber material. In another aspect, the auxiliary material is the same material as the compressible portion and the edge. In an additional aspect, the at least one protrusion extends through the first surface and the second opposite surface of the sealing ring. In other aspects, the at least one recess terminates before the first surface and the second opposite surface of the sealing ring. In an additional aspect, each of the at least one protrusion and each of the at least one recess alternate. In other aspects, the compressible material and the at least one recess are configured to entrap particulates.

[0011] In an additional aspect, the ribs of the rigid portion are made of aluminum. In other aspects, the lengths of the compressible portion and the rigid portion are approximately the same. In an additional aspect, the shield is configured to snap-fit with the first end of the compressible portion. In other aspects, the shield is configured to inhibit plasma arcing and thermal degradation of the compressible portion. In an additional aspect, the shield includes polytetrafluoroethylene. In other aspects, the edge further includes a plurality of retaining tabs. In other aspects, the sealing ring is configured to selectively engage with the isolation ring by an interference fit, thereby forming a seal between the sealing ring and the isolation ring when installed in a PVD vacuum chamber.

[0012] In an additional aspect, the sealing ring is configured to self-align with the isolation ring using the plurality of retaining tabs on the edge and a cut-out stepped portion of the isolation ring by approximately 90 degrees. In other aspects, the second surface of the sealing ring is configured to selectively engage with the sputtering target, thereby forming a seal between the sealing ring and the sputtering target when installed in a PVD vacuum chamber. In an additional aspect, the sputtering target does not have any grooves, ventilation slots, and sector slots and is configured to contact the sealing ring with a flat surface. In other aspects, the sealing ring is configured to provide a buffer between the sputtering target and the isolation ring.

[0013] In yet another embodiment, a sputtering target is disclosed that has a first surface configured to selectively engage with a sealing ring on a PVD vacuum chamber, wherein the first surface does not have any grooves, ventilation slots, and sector slots and is configured to contact the sealing ring with a flat surface. In another aspect, the first surface is configured to be isolated from an isolation ring, wherein the isolation ring is configured to selectively engage with the opposite side of the sealing ring on the vacuum chamber when installed in a PVD vacuum chamber. In other aspects,

[0014] In other embodiments, an isolation ring is provided, the isolation ring comprising: a first surface configured to selectively engage a compressible portion and a rigid portion of a seal ring when installed in a PVD vacuum chamber, wherein the first surface is substantially flat; and a stepped portion configured to selectively engage an edge of the seal ring when installed in a PVD vacuum chamber. In yet another aspect, the stepped portion has a cutout of approximately 90 degrees.

[0015] In additional embodiments, a seal kit for a vacuum chamber is provided, the seal kit comprising:

[0016] A seal ring, wherein the seal ring comprises: a compressible portion; a rigid portion adjacent to the compressible portion; and an edge extending perpendicularly from the rigid portion. An isolation ring configured to selectively engage a first mating surface of the isolation ring including the edge, wherein the isolation ring comprises a cutout configured to selectively receive and contact the edge of the seal ring, thereby forming a seal between the isolation ring and the seal ring when installed in a PVD vacuum chamber. A sputtering target comprising a substantially planar first mating surface configured to selectively engage a second mating surface of the seal ring, thereby forming a seal between the sputtering target and the seal ring when installed in a PVD vacuum chamber.

[0017] In another aspect, the first mating surface of the sputtering target does not have any O-ring grooves, ventilation grooves, and segment grooves. In yet another aspect, the compressible portion includes at least one protrusion and at least one recess, wherein each of the at least one protrusion and each of the at least one recess alternate. In other aspects, ribs of the rigid portion are suspended in the same material including the compressible material and the edge. In yet another aspect, the seal ring further comprises a plasma shield configured to be attached to an inner peripheral side of the compressible portion.

[0018] In other aspects, both the sputtering target and the isolation ring form a seal with the seal ring. In another aspect, the sputtering target and the isolation ring are isolated from each other by the seal ring.

[0019] In another embodiment, a method for assembling a seal kit is provided, the method comprising: placing a spacer ring on a PVD vacuum chamber, wherein the spacer ring includes a step on a mating surface; placing a seal ring on the mating surface of the spacer ring, the seal ring having a first mating surface and a second mating surface on an opposite side of the first mating surface, wherein the first mating surface of the seal ring includes an edge configured to selectively couple to the step of the spacer ring, and wherein the first mating surface of the seal ring contacts the mating surface of the spacer ring; placing a sputtering target on the second mating surface of the seal ring, wherein the seal ring includes a compressible portion and a shield portion, and wherein the sputtering target is configured to compress the compressible portion and the shield portion of the seal ring; wherein the spacer ring and the seal ring form a seal when installed in the PVD vacuum chamber, and the seal ring and the sputtering target form a seal when installed in the PVD vacuum chamber. In other aspects, the sputtering target and the spacer ring are isolated from each other by the seal ring.

[0020] A seal kit for a physical vapor deposition (PVD) vacuum chamber is also disclosed, the seal kit having a seal ring for the PVD vacuum chamber, the seal ring having: a compressible portion, wherein the compressible portion includes at least one protrusion and at least one recess; a rigid portion adjacent to the compressible portion, wherein the rigid portion has ribs substantially encapsulated by an auxiliary material; an edge extending from a first surface of the seal ring and configured to selectively couple to a spacer ring; a removable shield portion configured to selectively couple to a first end of the compressible portion and configured to isolate the compressible portion from the interior of the vacuum chamber.

[0021] A spacer ring having a first surface configured to selectively engage the compressible portion and the rigid portion of the seal ring when installed in the PVD vacuum chamber, wherein the first surface is substantially flat; a step portion configured to selectively engage the edge of the seal ring when installed in the PVD vacuum chamber. A sputtering target having a first surface with an outer peripheral flange surface configured to engage the seal ring when installed in the PVD vacuum chamber, wherein the outer peripheral flange surface of the first surface has no O-ring grooves, ventilation grooves, and segment grooves and is configured to contact the seal ring with a flat surface.

[0022] The following description and drawings disclose various illustrative aspects. Some improvements and novel aspects may be explicitly pointed out, while other aspects may be apparent from the description and drawings. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] The present teachings may be better understood by reference to the following detailed description in conjunction with the accompanying drawings, in which like reference numerals throughout the text denote like elements, wherein:

[0024] Figure 1A An embodiment of a conventional vacuum chamber and seal is shown that includes an O-ring inserted into a dovetail groove machined in a sputtering target;

[0025] Figure 1B Shows Figure 1A An enlarged view of the conventional vacuum chamber and seal of

[0026] Figures 1C to 1F An embodiment of a conventional vacuum chamber and seal is shown that includes an O-ring inserted into a dovetail groove machined in a sputtering target and further includes an inner ventilation groove (i), a sector groove (ii), a cross gland ventilation groove (iii), and an outer ventilation groove (iv);

[0027] Figures 2A to 2F Shows Figures 1A to 1C Examples of arc events, oxidation, nodule formation, wear, and redeposition that may occur in the conventional vacuum chamber and seal of

[0028] Figure 3A An embodiment of a seal and seal system is shown that includes an isolation ring and a sputtering target assembled on a vacuum chamber in accordance with aspects disclosed herein;

[0029] Figure 3B An embodiment of a seal and seal system is shown that includes an isolation ring and a sputtering target assembled on a vacuum chamber in accordance with aspects disclosed herein;

[0030] Figure 4A A top view of an embodiment of a seal in accordance with aspects disclosed herein is shown Figure 4B A bottom view of an embodiment of a seal in accordance with aspects disclosed herein is shown;

[0031] Figure 5A An enlarged top view of an embodiment of a seal in accordance with aspects disclosed herein is shown Figure 5B An enlarged bottom view of an embodiment of a seal in accordance with aspects disclosed herein is shown;

[0032] Figure 6A A cross-sectional top view of an embodiment of a seal in accordance with aspects disclosed herein is shown Figure 6B A cross-sectional bottom view of an embodiment of a seal in accordance with aspects disclosed herein is shown, and Figure 6C A cross-sectional side view of an embodiment of a seal in accordance with aspects disclosed herein is shown;

[0033] Figure 7 A perspective view showing an embodiment of a sputtering target according to aspects disclosed herein;

[0034] Figure 8A A top view showing an embodiment of a spacer ring according to aspects disclosed herein, Figure 8B A cross-sectional side view showing an embodiment of a spacer ring according to aspects disclosed herein, Figure 8C An enlarged cross-sectional side view showing an embodiment of a spacer ring according to aspects disclosed herein;

[0035] Figure 9A and 9B A view showing an embodiment of a spacer ring assembled on a vacuum chamber according to aspects disclosed herein;

[0036] Figure 10A and 10B A view showing an embodiment of a seal assembled on a spacer ring and a vacuum chamber according to aspects disclosed herein;

[0037] Figure 11 A view showing an embodiment of a sputtering target assembled on a seal, a spacer ring, and a vacuum chamber according to aspects disclosed herein;

[0038] Figure 12A A view showing an embodiment of a vacuum chamber according to aspects disclosed herein, Figure 12B A view showing an embodiment of a sputtering target according to aspects disclosed herein;

[0039] Figure 13A and 13B A view showing an example of a sputtering target after the end of life of the seal and the sealing system according to aspects disclosed herein;

[0040] Figures 14A to 14D A view showing an example of a sputtering target after the end of life of the seal and the sealing system according to aspects disclosed herein;

[0041] Figures 15A to 15E A view showing experimental data of using the seal and the sealing system according to aspects disclosed herein.

[0042] The present invention may be embodied in many forms without departing from its spirit or essential characteristics. The scope of the present invention is defined by the appended claims rather than the foregoing detailed description. Accordingly, all embodiments falling within the meaning and scope of the claims are intended to be included in the claims. Detailed Description

[0043] Reference will now be made in detail to the exemplary embodiments of the present teachings, which are illustrated in the accompanying drawings, wherein like numbered elements refer to like features throughout. It should be understood that other embodiments may be used and structural and functional changes may be made without departing from the scope of the corresponding teachings of the present disclosure. Moreover, the features of the various embodiments may be combined or changed without departing from the scope of the present disclosure. Accordingly, the following description is presented by way of illustration only and should not in any way limit the various alternatives and modifications to the embodiments shown that are within the spirit and scope of the present teachings.

[0044] In the present disclosure, numerous specific details are provided to provide a thorough understanding of the subject matter of the present disclosure. It should be understood that the various aspects of the present disclosure may be implemented by other embodiments and the like that do not necessarily include all of the aspects described herein.

[0045] As used herein, the terms "example" and "exemplary" mean an instance or illustration. The terms "example" and "exemplary" do not denote a key or preferred aspect or embodiment. Unless the context indicates otherwise, the term "or" is intended to be inclusive rather than exclusive. For example, the phrase "A employs B or C" includes any inclusive combinations (e.g., A employs B; A employs C; or A employs both B and C). Additionally, the articles "a" and "an" generally are intended to mean "one or more" unless the context indicates otherwise.

[0046] Moreover, unless the context otherwise dictates, a description of a shape (e.g., circular, rectangular, triangular, etc.) refers to a shape that conforms to the definition of such a shape and a general representation of such a shape. For example, a triangle or a generally triangular shape may include a shape having three sides and three vertices, or may include a shape that generally represents a triangle, such as a shape having three main sides that may or may not have straight edges, a triangular-like shape having rounded vertices, etc.

[0047] The disclosed vacuum seals and sealing systems include corresponding spacer rings and corresponding sputtering targets. The seals and sealing systems may be used in PVD sputtering applications. PVD sputtering applications utilize sputtering targets to provide material transfer under vacuum conditions. By bombarding the sputtering target with high-energy particles, the material from the sputtering target can be vaporized, and the vaporized material can be deposited as a thin film layer on the substrate surface. During this process, the sputtering target may be consumed.

[0048] For semiconductor applications, in one example, the sputtering target can be a suitable material that is vaporized and deposited onto a substrate, such as but not limited to copper. A vacuum chamber can be used to vaporize the material from the sputtering target and deposit the material onto a substrate, such as forming copper traces on a wafer. The transfer of material from the sputtering target to the substrate can be used to create conductive paths, insulating layers, or provide barrier properties, and can also be used to fabricate circuit boards or other electrical components. The vacuum conditions and seals between the sputtering target and the vacuum chamber are very useful for performing PVD and providing a viable end product.

[0049] As Figures 1A to 1F shown, traditional seals in a PVD sputtering process typically can include an O-ring 13 inserted into an O-ring groove (such as but not limited to a dovetail groove) machined into the flange of the sputtering target 255. During assembly and the PVD process, such an O-ring may twist and rotate within the groove, resulting in insufficient and unreliable sealing of the vacuum chamber 5 during the life and use of the sputtering target 255 and before the sputtering target 255 is consumed. Moreover, the flange of the sputtering target 255 typically can include vent grooves and / or scalloped grooves that cross the sealing surface, or can include other shapes with similar functions, see Figures 1C to 1F , which shows examples of inner vent grooves 21, scalloped grooves 22, cross gland vent grooves 23, and outer vent grooves 24.

[0050] However, these traditional features weaken the flange of the sputtering target 255 and provide a source of leakage between the sputtering environment inside the vacuum chamber 5 and the atmosphere, especially under elevated and sustained pressures. As the sputtering target is consumed and its quality degrades, the physical characteristics of the assembly may also be affected. Arc events, oxidation, nodule formation, degradation, wear, redeposition, and particle generation often occur near or adjacent to the O-ring seals, vent grooves, and / or scalloped grooves, for example, see Figures 2A to 2F , and can lead to inefficient and failed system seals. Moreover, the single O-ring 13, which relies on a single discrete contact point, can cause a single-point fulcrum effect with the bottom contact surface 15a of the spacer ring 15 during the dynamic cycling of the sputtering target (A), which in turn can result in a single stress point, making the seal prone to wear and failure.

[0051] There is a need to improve the vacuum sealing mechanism for vacuum chambers and sputtering applications. There is a need for an improved vacuum seal that provides one or more (or all) of the following: prevent leakage and maintain a vacuum seal during the life and use of the sputtering target; minimize or prevent arc events, oxidation, nodule formation, degradation, wear, redeposition, and / or particle generation (and PVD-related failures due to these events) during the life and use of the sputtering target; be less susceptible to variations or fluctuations in use (e.g., distortion); provide stability and consistent application of components; achieve self-leveling and self-aligning during assembly; minimize or eliminate ventilation grooves and / or scallop grooves; minimize or eliminate grooves in the sputtering target surface; eliminate the single-point fulcrum effect of traditional systems; provide an increased sealing surface or interface; include an inherent occlusion mechanism to capture and eliminate potential particle ingress into the vacuum chamber that may occur during dynamic cycling; include an integral plasma shield to protect the seal from attack and thermal degradation by high-energy ionized gas (plasma); provide a buffer between the sputtering target and the isolation ring; and so on.

[0052] In one embodiment, the seal and seal system do not require O-rings and corresponding grooves or any ventilation grooves or scallop grooves in the sputtering target, such as the backing plate in a non-monolithic sputtering target or the flange of a monolithic sputtering target. The sputtering target can have a continuous peripheral flange surface. In one embodiment, the seal and seal system are self-aligning. In one embodiment, the seal and seal system provide an increased sealing surface or interface. In one embodiment, the seal and seal system provide a buffer between the sputtering target and the isolation ring.

[0053] The disclosed seal and seal system can provide one or more (or all) of the following: prevent leakage and maintain a vacuum seal during the life and use of the sputtering target; minimize or prevent arc events, oxidation, nodule formation, degradation, wear, redeposition, and / or particle generation (and PVD-related failures due to these events) during the life and use of the sputtering target; be less susceptible to variations or fluctuations in use (e.g., distortion); provide stability and consistent application of components; achieve self-leveling and self-aligning during assembly; minimize or eliminate ventilation grooves and / or scallop grooves; minimize or eliminate grooves in the sputtering target surface; eliminate the single-point fulcrum effect of traditional systems; provide an increased sealing surface or interface; include an inherent occlusion mechanism to capture and eliminate potential particle ingress into the vacuum chamber that may occur during dynamic cycling; include an integral plasma shield to protect the seal from attack and thermal degradation by high-energy ionized gas (plasma); provide a buffer between the sputtering target and the isolation ring; and so on.

[0054] Turning to FIGS. 3-6, there is shown a sealing ring 100 that can be used as part of a sealing system 400, which sealing system includes a corresponding spacer ring 210 and / or a corresponding sputtering target 255. The spacer ring 210 can be selectively engaged with the vacuum chamber 5. The sealing ring 100 can be selectively engaged with the spacer ring 210. The sputtering target 255 can be selectively engaged with the sealing ring 100. Assembling the spacer ring 210, the sealing ring 100, and the sputtering target 255 (including the sealing system 400) onto the vacuum chamber 5 can provide a vacuum seal between the sputtering target 255 and the vacuum chamber 5, enabling a PVD process to be performed while accommodating a plasma within the vacuum chamber 5.

[0055] For example, FIGS. 9 to Figure 11 show the spacer ring 210 being assembled onto the vacuum chamber 5, then the sealing ring 100 being assembled onto the spacer ring 210, and then the sputtering target 255 being assembled onto the sealing ring 100. In one embodiment, each of the sealing ring 100, the spacer ring 210, and the sputtering target 255 can be generally concentric, and sized and shaped to fit onto a vacuum chamber such as the vacuum chamber 5. In one embodiment, each of the sealing ring 100, the spacer ring 210, and the sputtering target 255 can be attached in an interference fit or a friction fit. Note: Other attachment mechanisms can also be used. The assembly of the sealing ring 100, the spacer ring 210, and the sputtering target 255 can be relatively fast, for example, achieved within 5 minutes, 1 minute, 30 seconds, etc. Components of the sealing ring 100, the spacer ring 210, and the sputtering target 255 (such as an edge portion 140 having a retaining tab 144, etc.) can facilitate rapid assembly and have features such as self-aligning and self-leveling.

[0056] The sealing ring 100 generally can include a planar portion 148 and an edge portion 140. The planar portion 148 has a first side (or surface) 102 and a second side (or surface) 104. In one embodiment, the first side 102 of the sealing ring 100 can be understood as the spacer ring facing side, which spacer ring facing side can be selectively coupled to a corresponding side of the spacer ring 210. In one embodiment, the second side 104 of the sealing ring 100 can be understood as the sputtering target facing side, which sputtering target facing side can be selectively engaged with a corresponding side of the sputtering target 255. Note: The first side 102 can also be referred to as the lower side of the sealing ring 100, and the second side 104 can also be referred to as the upper side of the sealing ring 100. Upon assembly, the first side (or surface) 102 can contact (engage) the spacer ring 210, and the second side (or surface) 104 can contact (engage) the sputtering target 255. In one embodiment, the sealing ring 100 can act as a buffer and separator between the spacer ring 210 and the sputtering target 255 such that the spacer ring 210 and the sputtering target 255 do not contact each other when assembled in the vacuum chamber 5.

[0057] The planar portion 148 of the seal ring 100 may include a compressible portion 110 extending toward the center of the seal ring 100. In one embodiment, the compressible portion 110 may include one or more higher-profile protrusions extending away from the horizontal axis 150 of the seal ring 100, such as the protrusion 113. The planar portion 148 includes the horizontal axis 150. In one embodiment, the horizontal axis 150 is located at an intermediate position between the peak points of the protrusions 113 on the first side 102 and the peak points of the protrusions 113 on the second side 104, and the compressible portion 110 may include one or more lower-profile recesses (such as the recess 116) that narrow toward the horizontal axis 150 of the seal ring 100. In one embodiment, the compressible portion 110 may include two or more higher-profile protrusions 113. For example, the compressible portion 110 may include 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 15, 20, etc. higher-profile protrusions 113. In one embodiment, the compressible portion 110 may include two or more lower-profile recesses 116. For example, the compressible portion 110 may include 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 15, 20, etc. lower-profile recesses 116. The protrusions 113 and the recesses 116 may alternate. In one embodiment, the compressible portion 110 may include n protrusions 113 and n - 1 recesses 116. For example, the compressible portion 110 may include two protrusions 113 and one recess 116. One recess 116 may be located between two protrusions 113. In one embodiment, the compressible portion 110 may include n protrusions 113 and n + 1 recesses 116. For example, the compressible portion 110 may include two protrusions 113 and three recesses 116. One of the recesses 116 may be located between two protrusions 113, and each of the other two recesses 116 may be located on the other side of each protrusion 113 respectively, so that the formed pattern is similar to recess, protrusion, recess, protrusion, recess. Note: Other quantities, positions, and patterns of protrusions 113 and recesses 116 may also be used in the compressible portion 110.

[0058] In one embodiment, the protrusion 113 may extend beyond the profile of the remainder of the seal ring 100 on the second side 104. In other words, the protrusion 113 may extend further from the horizontal axis 150 than any other feature of the seal ring 100 on the first side 102. Additionally, except for the edge portion 140, the protrusion 113 may extend beyond the profile of the remainder of the seal ring 100 on the first side 102. In other words, except for the edge portion 140, the protrusion 113 may extend further from the horizontal axis 150 than any other feature of the seal ring 100 on the second side 104. In an exemplary embodiment, the height or diameter of the protrusion 113 may be greater than the profile of the remainder of the seal ring 100 (excluding the edge portion 140). In one embodiment, the recess 116 may terminate before the profile of the remainder of the seal ring 100. In one embodiment, the height or diameter of the recess 116 may be less than the profile of the remainder of the seal ring 100. In an exemplary embodiment, the protrusion 113 may extend past the first surface 102. In an exemplary embodiment, the protrusion 113 may extend past the second surface 104. In an exemplary embodiment, the protrusion 113 may extend past the first surface 102 and the second surface 104. In an exemplary embodiment, the protrusion 113 may be generally rounded or circular. Note: Other shapes may also be used unless the context or the present disclosure dictates otherwise. In an exemplary embodiment, the recess 116 may terminate before the first surface 102. In one example, the recess 116 may terminate before the second surface 104. In an exemplary embodiment, the recess 116 may terminate before both the first surface 102 and the second surface 104. Additionally, in an exemplary embodiment, the recess 116 may extend downwardly from below the first surface 102 toward the horizontal axis 150 of the seal ring 100. In an exemplary embodiment, the recess 116 may terminate downwardly from below the second surface 104 toward the horizontal axis 150 of the seal ring 100. In an exemplary embodiment, the recess 116 may terminate downwardly from below both the first surface 102 and the second surface 104 toward the horizontal axis 150 of the seal ring 100. In an exemplary embodiment, the recess 116 may be generally rounded or concave. Note: Other shapes may also be used unless the context or the present disclosure dictates otherwise.

[0059] The compressible portion 110 may include any compressible material or combination of materials to achieve a desired or suitable specific purpose or intended application. In one embodiment, the compressible portion 110 may include a fluorocarbon, a fluorinated elastomer, or a fluorinated rubber material (FKM) composition. In one example, the material may be selected based on the hardness of the material. In one example, the material may be selected based on the compressibility and / or resilience of the material. In one example, the material may be selected based on the heat resistance of the material. Other materials may include, but are not limited to: polymers such as polyurethane, ethylene propylene diene monomer, styrene butadiene rubber, thermoplastic elastomers, etc.; other natural rubbers or silicone rubbers, neoprene, expanded polytetrafluoroethylene, foam materials such as polyurethane foam; combinations of two or more of such materials; and so on.

[0060] The protrusions 113 may serve as contact points or compression points that selectively contact the respective surfaces of the spacer ring 210 and / or the sputtering target 255, wherein the respective surfaces of the spacer ring 210 and / or the sputtering target 255 selectively compress the protrusions 113 until the respective surfaces of the spacer ring 210 and / or the sputtering target 255 contact the remaining body portion of the seal ring 100 (e.g., the rigid portion 130, the shielding portion 190, etc.). The recesses 116 may generally provide clearance for the compressed protrusions 113 and be capable of compressing the protrusions 113 into the recesses 116 to achieve a vacuum seal. The compressible portion 110 may generally facilitate the formation of a vacuum seal through the compression of the protrusions 113 by the spacer ring 210 and / or the sputtering target 255 and the compression of the protrusions 113 between the spacer ring 210 and / or the sputtering target 255.

[0061] The seal ring 100 may provide a radially concentric seal that separates a high-vacuum (sputtering) environment (e.g., within the vacuum chamber 5 where sputtering occurs) from the atmosphere during the dynamic cycles that occur throughout the PVD process.

[0062] In one embodiment, the greater or longer the distance that the compressible portion 110 extends toward the center of the seal ring 100 and the greater the number of protrusions 113 or contact points, the greater the contact area. The protrusions 113 may be semi-circular in shape. A greater contact area can provide a longer vacuum seal life and can provide additional rigidity and structure to the seal ring 100. Multiple contact points, such as multiple protrusions 113, can provide repeatability of the vacuum seal such that the vacuum seal can be maintained and is less prone to defects such as leaks during the use and life of the sputtering target 255. In one exemplary embodiment, the protrusions 113 may be spaced apart by approximately 0.150 inches. In other words, when measured along the horizontal axis 150, such as when traveling from the outer wall 147 to the center of the seal ring 100 along the horizontal axis 150, the vertical axes 113a of each successive protrusion 113 may be spaced apart by approximately 0.150 inches. Each protrusion 113a has a vertical axis 113a. Additionally, in one exemplary embodiment, the innermost protrusion 113 (the protrusion closest to the center of the seal ring 100) may be located approximately 0.255 inches from the end 190a of the shield 190. Additionally, in one exemplary embodiment, the innermost protrusion 113 (the protrusion closest to the center of the seal ring 100) may be located approximately 0.255 inches from the inner diameter of the shield 190. In one exemplary embodiment, the protrusion 113 may have a height of approximately 0.114 inches to 0.124 inches when measured in the vertical direction along the vertical axis 113a from the top 113b to the bottom 113c of the protrusion 113.

[0063] Additionally, multiple contact points (such as multiple protrusions 113) can provide a trapping mechanism to entrap gases and particulates within the annular space between the seal ring 100 and the compressible portion 110 while allowing a high enough contact force to form a vacuum seal. The seal ring 100 can increase the contact area on the flange portion of the sputtering target 255 while allowing for a sufficient contact force on the seal ring 100, which can help reduce movement of the sputtering target flange during the life of the sputtering target 255. In one embodiment, a flat gasket type seal may require an unrealistic contact force to seal and the vacuum force itself cannot provide such a contact force.

[0064] The seal ring 100 may also include a rigid portion 130. In one embodiment, the rigid portion 130 may be located near the compressible portion 110. In one embodiment, the rigid portion 130 may be positioned further from the center of the seal ring 100 (e.g., toward the surrounding environment) compared to the position of the compressible portion 110, while the compressible portion 110 is positioned closer to the center of the seal ring 100 (e.g., toward the interior of the vacuum chamber 5) compared to the position of the rigid portion 130.

[0065] The rigid portion 130 can be stiffer than the compressible portion 110. The rigid portion can have ribs 131 to provide rigidity. The ribs 131 can include any rigid material or combination of materials such that a desired or suitable specific purpose or intended application can be achieved. In one embodiment, the ribs 131 can include aluminum. Note that any other non-magnetic material with suitable mechanical properties can also be used. In one example, the material can be selected based on the hardness of the material. In one example, the material can be selected based on the rigidity, non-magnetic, conductive properties, etc. of the material. Other materials can include, but are not limited to, certain grades of stainless steel, titanium, brass, carbon fiber reinforced polymers, ceramics such as alumina and zirconia, fiberglass, etc.

[0066] The ribs 131 of the rigid portion 130 can be encapsulated or suspended in the same material as the compressible portion 110. The ribs 131 can be encapsulated or suspended in a material similar to the compressible portion 110. The ribs 131 can be completely encapsulated by the compressible material. The ribs 131 can be substantially encapsulated by the compressible material. The ribs 131 can be partially encapsulated by the compressible material. The horizontal axis of the rigid portion 130 can be positioned along the horizontal axis 150 of the seal ring 100. Additionally, the horizontal axis of the ribs 131 can be positioned along the horizontal axis 150 of the seal ring 100. For example, the ribs 131 can be completely encapsulated by the compressible material except for a number of cuts or holes 120 used to suspend the ribs 131 in a mold to apply the compressible material thereon. In one embodiment, the ribs 131 can be exposed through the cuts or holes 120 in the compressible material in the rigid portion 130. The coating or encapsulation can prevent or minimize arcing between the rigid portion 130 and the sputtering target 255. In one embodiment, the thickness of the coating or encapsulation at each side (above and below the ribs 131) of the rigid portion 130 can be from about 0.084 inches to 0.096 inches. In other embodiments, the thickness of the coating or encapsulation at the rigid portion can be from about 0.080 inches to 0.010 inches. In other exemplary embodiments, the thickness of the coating or encapsulation at the rigid portion can be from about 0.076 inches to 0.014 inches.

[0067] In other embodiments, the thickness of the coating or encapsulation at the rigid portion 130 (on each side above and below the rib 131) can be about 0.014 inches. In other embodiments, the thickness of the coating or encapsulation at the rigid portion 130 between the top surface 131a of the rib 131 and the second side 104 can be about 0.014 inches, and the thickness of the coating or encapsulation at the rigid portion 130 between the bottom surface 131b of the rib 131 and the first side 102 can be about 0.013 inches. In another exemplary embodiment, the thickness of the coating or encapsulation at the rigid portion 130 between the bottom surface 131b of the rib 131 and the first side 102 can be from about 0.008 inches to 0.018 inches. In other embodiments, the thickness of the coating or encapsulation between the rear surface 131d of the rib 131 and the second end 108 of the seal ring 100 can be about 0.07 inches. The coating or encapsulation can prevent or minimize wear from the isolation ring 210 and / or the sputtering target 255. In one embodiment, the width dimension of the rigid portion 130 can be substantially the same as the opposing compressible portion 110. In one embodiment, the length of the rigid portion 130 can be less than the compressible portion 110. In one embodiment, the length of the rigid portion 130 can be greater than the compressible portion 110. The thickness of the rib 131 can be 0.063 inches (the distance between the top surface 131a and the bottom surface 131b of the rib portion 131). The rib 131 can also have a width of about 0.45 inches (the distance between the inner surface 131c and the outer surface 131d along the horizontal cross-section of the rigid portion 130 (or rib 131), also referred to as along the horizontal axis 150).

[0068] The rigid portion 130 can provide support, rigidity, and / or stability to the seal ring 100. The rigid portion 130 can provide strength to the seal ring 100 during a dynamic sputtering cycle and can help eliminate excessive movement of the flanged sputtering target 255 to the isolation ring 210. The rigid portion 130 can eliminate or minimize mechanical wear and particle generation resulting from the proximity movement of the flange of the sputtering target 255 (the flange of the backing plate 260 of the sputtering target that is not a monolithic target 255 or the peripheral flange of the monolithic sputtering target 255) and the isolation ring 210. In one exemplary embodiment, the inner diameter of the rib 131 measured from the inner surface 131c of the rib 131 can be from about 19.57 inches to 19.63 inches, and the outer diameter of the rib 131 measured from the outer surface 131d of the rib 131 can be from about 20.47 inches to 20.53 inches.

[0069] The seal ring 100 can generally include a first end 106 and a second end 108. In one embodiment, the first end 106 can be the inner peripheral end of the seal ring 100, and this inner peripheral end is positioned towards the center of the seal ring 100. In one embodiment, the second end 108 can be the outer peripheral end of the seal ring 100, and this outer peripheral end is opposite to the first end 106 and is positioned away from the center of the seal ring 100. The first end 106 can extend from the compressible portion 110 towards the center of the seal ring 100. The first end 106 can be attached to and adjacent to the compressible portion 110 of the seal ring 100. The first end 106 can include the same or similar material as the compressible portion 110. In one embodiment, the compressible portion 110 can be located between the rigid portion 130 and the first end 106. The first end 106 can be configured to selectively receive the shielding portion 190. The shielding portion 190 can be configured to cover all or at least a part of the first end 106. The shielding portion 190 can be configured to isolate and protect the compressible portion 110 and the rest of the seal ring 100 from the vacuum environment in the vacuum chamber 5, such as to provide protection from the plasma in the vacuum chamber 5. The shielding portion 190 can be selectively removable from the compressible portion 110 of the seal ring 100 and can be replaced. The first end 106 can be configured to selectively receive the shielding portion 190 in a snap-fit engagement manner. Note: Other connection mechanisms can also be used to achieve the desired or suitable specific purpose or intended application. In one embodiment, the first end 106 of the seal ring 100 can be conical. In one embodiment, the first end 106 of the seal ring 100 can be referred to as a C-shaped configuration. In one embodiment, the first end 106 of the seal ring 100 can be referred to as a snake-head shape. In one example, the first end 106 of the seal ring 100 can include a ramp-up portion with a gradually increasing slope and a groove. In one example, the shielding portion 190 can include: a hollow portion, the size and shape of which generally correspond to the conical or snake-head shape of the first end 106 of the seal ring 100; and snap fingers, which are configured to be inserted into the groove. The snap fingers can be inserted onto the ramp-up portion with a gradually increasing slope of the first end 106 of the seal ring 100 until the snap fingers are inserted and locked into the groove. The shape of the shielding portion 190 can be configured such that during the assembly of the sealing system 400 and when pressure is applied to the sputtering target 255 and the spacer ring 210, the shielding portion 190 is clamped onto the first end 106 of the seal ring 100. In one exemplary embodiment, when measured from the end 190a of the shielding portion 190, the shielding portion 190 can have an inner diameter of approximately 18.585 inches to 18.645 inches. In one exemplary embodiment, when measured from the base 190b of the shielding portion 190, the shielding portion 190 can have an inner diameter of approximately 19.095 inches to 19.155 inches.

[0070] As Figure 3A shown, the shield portion 190 may have a curved or rounded C-shaped configuration that has a relatively slender profile and is sized and shaped to correspond to the first end 106 of the seal ring 100. As Figure 3B shown, the shield portion 190 may have an elongated teardrop shape that extends into the interior of the vacuum chamber 5 toward the center of the seal ring 100. In one embodiment, the elongated teardrop shape of the shield portion 190 may extend to and beyond the inner edge of the isolation ring 210. Note that the shield portion 190 may also assume other shapes, thicknesses, and dimensions. In an exemplary embodiment, the width of the shield portion 190 along the horizontal axis 150 is 0.130 inches when measured from the end 190a to the base 190b. In another exemplary embodiment, the shield portion 190 may have a height of approximately 0.114 inches to 0.124 inches when measured in a vertical direction (parallel to the vertical axis 113a) perpendicular to the horizontal axis 150.

[0071] The shield portion 190 may include any plasma-suppressing material or combination of materials that may achieve a desired or suitable particular purpose or intended application. In one embodiment, the shield portion 190 may include a plasma-suppressing polytetrafluoroethylene (PTFE) material, which is a synthetic fluoropolymer of tetrafluoroethylene. Note that any other material that suppresses plasma and thermal damage may also be used. In one embodiment, the material may be selected based on its low coefficient of friction. Other materials may include, but are not limited to, polyimide, ceramics such as alumina and boron nitride, molybdenum disulfide, fluorinated ethylene propylene, and the like.

[0072] In one embodiment, the shield portion 190 may be referred to as a plasma shield. In one embodiment, the shield portion 190 may provide plasma arc suppression and protect the vacuum seal by suppressing plasma arcs and thermal degradation of the vacuum sealing material.

[0073] Thus, the planar portion 148 of the seal ring 100 has the shield portion 190, the compressible portion 110, and the rigid portion 130 as it travels outward from the center of the seal ring 100 along the horizontal axis 150.

[0074] The seal ring 100 may further include an edge portion 140 located on the first surface 102 and forming an "L" shape with the planar portion 148. The edge portion 140 has: an inner wall 142 that is oriented perpendicular to the first surface 102 toward the center of the seal ring 100; an outer wall 147 that is located on the outer periphery of the seal ring 100 and perpendicular to the first surface; and a bottom wall 146 that connects the bottom 142a of the inner wall 142 and the bottom 147a of the outer wall 147. The inner wall 142 may be oriented toward the center of the seal ring 100. The bottom wall 146 may be oriented perpendicular to the inner wall 142 and the outer wall 147 to form a "U" shape. When measured along the horizontal axis 150 of the planar portion 148, the outer wall 147 and the second end 108 may form a continuous surface that is linearly equidistant from the first end 106. In one exemplary embodiment, the edge portion 140 may be positioned adjacent to the rigid portion 130 of the planar portion 148. In one exemplary embodiment, the edge portion 140 may be positioned at the second end 108 of the seal ring 100. In one exemplary embodiment, the edge portion 140 may extend perpendicularly from the rigid portion 130 and the compressible portion 110 to an isolation ring facing the first surface 102 of the seal ring 100. In one exemplary embodiment, the seal ring 100 may be in an L shape. The edge portion 140, the rigid portion 130, and the compressible portion 110 may be provided as a single attachment unit. The edge portion 140 may include the same material as the compressible portion 110. The edge portion 140 may include a material similar to the compressible portion 110. The edge portion 140 may be configured to selectively couple with a corresponding stepped portion 213 of the isolation ring 210. The inner wall 142 and the bottom wall 146 (or the inner wall 142, the retaining tab 144, and / or the bottom wall 146) may each selectively engage a corresponding wall of the stepped portion 213 of the isolation ring 210.

[0075] In one exemplary embodiment, when measured at the edge portion 140, the thickness of the seal ring 100 may be approximately 0.270 inches. In other words, in one exemplary embodiment, the distance between the bottom wall 146 of the seal ring 100 and the second side 104 may be approximately 0.270 inches. Additionally, in another exemplary embodiment, the thickness of the seal ring 100 at the rigid portion 130 may be approximately 0.085 inches to 0.095 inches. In other words, in one exemplary embodiment, the distance between the first side 102 and the second side 104 of the seal ring 100 at the rigid portion 130 may be approximately 0.085 inches to 0.095 inches. In other exemplary embodiments, the diameter of the second end 108 of the seal ring 100 may be approximately 20.585 inches to 20.645 inches. In another exemplary embodiment, at a location where there is no retaining tab 144, the diameter of the inner wall 142 of the seal ring 100 may be approximately 20.325 inches to 20.385 inches.

[0076] The edge portion 140 may also include one or more (or several) retaining tabs 144 that are located on the inner wall 142 and extend from the inner wall 142 along the inner perimeter of the edge portion 140 toward the center of the seal ring 100. In one exemplary embodiment, a plurality of retaining tabs 144 may be equidistantly arranged along the circumference of the inner wall 142. In one exemplary embodiment, a plurality of retaining tabs 144 may be positioned at different distances along the circumference of the inner wall 142. In one exemplary embodiment, the edge portion 140 may include 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 15, 20, 30, etc. retaining tabs 144. The retaining tabs 144 may be in a semi-circular shape and extend from the bottom wall 146 (or the bottom of the inner wall 142a) to the first side 102. The retaining tabs 144 may have a chamfer near the bottom wall 146 (or the bottom of the inner wall 142a) to facilitate placing the seal ring 100 onto the spacer ring 210. In one exemplary embodiment, the inner surface 144a of the retaining tab 144 may be approximately 10.10 inches from the center of the seal ring 100. The inner surface 144a is the surface of the retaining tab 144 that is closest to the center of the seal ring 100 when traveling along the horizontal axis 150.

[0077] In one exemplary embodiment, during the assembly of the sealing system 400, the edge portion 140 may conveniently align the seal ring 100 on the spacer ring 210. In one exemplary embodiment, the retaining tabs 144 may self-align the seal ring 100 onto the spacer ring 210. In one exemplary embodiment, the retaining tabs 144 may clamp onto the spacer ring 210 and may fix the seal ring 100 to the spacer ring 210. In one exemplary embodiment, the seal ring 100 may be applied, for example, upside down onto the spacer ring 210 located above the seal ring 100, and the retaining tabs 144 may hold and fix the seal ring 100 to the upside-down spacer ring 210 (e.g., when the spacer ring 210 and the seal ring 100 are inverted such that the spacer ring 210 is oriented above the seal ring 100 and the seal ring 100 is pulled away from the spacer ring 210 by gravity, the retaining tabs may hold and fix the seal ring 100 to the spacer ring 210).

[0078] Turning to Figure 7 , a sputtering target 255 including a sealing mating surface 259 is shown. As previously described, the sealing mating surface 259 may be a generally continuous and / or smooth flange surface, i.e., a surface without any grooves, ventilation slots, scalloped slots, and other shapes or features with similar functions. See also Figure 3A and 3B. In an exemplary embodiment, the flange (sealing mating surface 259) of the backing plate 260 of the sputtering target 255 has no features. In one embodiment, the sputtering target 255 does not have Figures 1A to 1F the conventional O-ring seals, grooves, ventilation slots, scalloped slots, and other shapes or features with similar functions shown in Figures 1A to 1F , which may be prone to Figures 2A to 2F the failures shown in Figures 2A to 2F , including arc events, oxidation, nodule formation, degradation, wear, redeposition, and particle generation, which often occur near or adjacent to the O-ring seals, ventilation slots, and / or scalloped slots. In an exemplary embodiment, the sputtering target 255 also eliminates the radial single-point fulcrum in the conventional sputtering target vacuum chamber assembly, which may cause mechanical movement of components during the dynamic sputtering cycle of the sputtering target 255.

[0079] The sealing mating surface 259 of the sputtering target 255 (e.g., the flange of the backing plate 260 of the sputtering target 255 that is not a monolithic target or the peripheral flange of the monolithic sputtering target 255) may be configured to selectively engage with the sealing ring 100. The sealing mating surface 259 of the sputtering target 255 may be configured to selectively engage with the second side 104 of the sealing ring 100, which includes a compressible portion 110, a rigid portion 130 (encapsulated by a compressible material), and a shielding portion 190. The sputtering target 255 may provide a vacuum seal with the sealing ring 100.

[0080] The sputtering target 255 may include any material or combination of materials that can achieve a desired or suitable specific purpose or intended application. In one embodiment, the sputtering target 255 may include copper, titanium, gold, etc. Note: Any other metals, their alloys, their oxides, and their nitrides may also be used. In one embodiment, the material may be selected based on the sputtering ability of the material. Other materials may include, but are not limited to, aluminum, tungsten, nickel, silicon, germanium, etc.

[0081] Turn to Figures 8A to 8C, shows a spacer ring 210 including a sealing mating surface 216 and an edge mating step 213. As described above, the sealing mating surface 216 (top surface) can be a generally continuous and / or smooth surface, and the edge mating step 213 can provide a step on the outer circumference of the spacer ring 210. The edge mating step 213 can be configured to selectively engage the inner wall 142 and the bottom wall 146 (or the inner wall 142 and the retaining tab 144) of the edge portion 140. The edge mating step 213 can generally have a notch of approximately 90 degrees. In one exemplary embodiment, the step 213 can be formed by cutting vertically and horizontally into the top of the outer diameter of the spacer ring 210. In other words, in one exemplary embodiment, the step 213 can be formed in the mating surface 216 and the outer surface 217 of the spacer ring 210, thereby creating a vertical surface 218 and a horizontal surface 219 of the step 213. In one exemplary embodiment, once the step 213 is formed in the spacer ring, the vertical surface 218 can be offset from the outer surface 217 by approximately 0.200 inches, and the horizontal surface 219 can be offset from the mating surface 216 by approximately 0.200 inches. In one exemplary embodiment, when measured at the inner surface 220 of the spacer ring 210, the inner diameter of the spacer ring 210 can be approximately 18.505 inches. In another exemplary embodiment, when measured at the outer surface 217 of the spacer ring 210, the outer diameter of the spacer ring 210 can be approximately 20.625 inches. In an additional exemplary embodiment, when measured at the vertical surface 218 of the step 213 of the spacer ring 210, the diameter of the spacer ring 210 can be approximately 20.225 inches. In another exemplary embodiment, when measured from the mating surface 216 to the bottom surface 221 of the spacer ring 210, the thickness of the spacer ring 210 can be approximately 0.538 inches. In an additional exemplary embodiment, when measured from the horizontal surface 219 to the bottom surface 221 of the spacer ring 210, the thickness of the spacer ring 210 can be approximately 0.338 inches. In another exemplary embodiment, when measured from the outer surface 217 to the inner surface 220, the width of the spacer ring 210 can be approximately 1.06 inches. The outer surface 217 is positioned opposite to the inner surface 220.

[0082] The sealing mating surface 216 of the spacer ring 210 can be configured to selectively couple with the sealing ring 100. The sealing mating surface 216 of the spacer ring 210 can be configured to selectively couple with the first side 102 of the sealing ring 100, which includes a compressible portion 110, a rigid portion 130 (encapsulated by a compressible material), a shielding portion 190, and an edge portion 140. The spacer ring 210 can form a vacuum seal with the sealing ring 100. The sealing ring 100, the sputtering target 255, and the spacer ring 210 can also jointly provide an increased sealing surface or interface and a buffer between the sputtering target 255 and the spacer ring 210.

[0083] The spacer ring 210 can include any material or combination of materials to achieve a desired or suitable specific purpose or intended application. In one embodiment, the spacer ring 210 can include a highly polished ceramic dielectric material. Note that any other material capable of electrically isolating the sputtering target 255 from the vacuum chamber 5 can also be used. In one example, the material can be selected based on its electrical insulation properties. Other materials can include, but are not limited to, glass, plastics, and polymers such as polyethylene (PE), polypropylene (PP), polycarbonate (PC), polyimide (PI), and polytetrafluoroethylene (PTFE), mica, epoxy resin, polyethylene terephthalate (PET), etc.

[0084] Figure 13A and 13B and Figures 14A to 14D The end-of-life sputtering target 255 using the seal ring 100 and the sealing system 400 is shown. The formed sputtering target 255 shows no signs of arcing, particles, or flange wear. Additionally, the formation of sidewall oxides is also continuously controlled.

[0085] Figures 15A to 15E Various experimental data obtained during the life of the sputtering target 255 using the seal ring 100 and the sealing system 400 are shown. For example, Figure 15A shows the observed baking phenomenon. Figure 15B shows that no helium leakage is observed at the seal. Figure 15C shows that the gas load is stable during the processing of the sputtering target 255. Figure 15D shows that no arc discharge events are captured during the life of the sputtering target 255. Figure 15E shows that the idle mode chamber pressure remains stable throughout the life of the sputtering target 255.

[0086] Although embodiments of the present teachings have been shown in the drawings and described in the foregoing detailed description, it should be understood that the present teachings are not limited to the disclosed embodiments, but rather, many rearrangements, modifications, and substitutions of the present teachings described herein can be made without departing from the scope of the appended claims. The appended claims are intended to cover all modifications and variations as long as they fall within the scope or the equivalent scope of the claims.

Claims

1. A sealing kit for a physical vapor deposition (PVD) vacuum chamber, the sealing kit comprising: A sealing ring for a PVD vacuum chamber, the sealing ring comprising: A compressible portion, wherein the compressible portion includes at least one protrusion and at least one recess; A rigid portion adjacent to the compressible portion, wherein the rigid portion has ribs that are substantially encapsulated by an auxiliary material; An edge that extends from a first surface of the sealing ring and is configured to selectively couple to an isolation ring; A removable shield that is configured to selectively couple to a first end of the compressible portion and is configured to isolate the compressible portion from the interior of the vacuum chamber; The isolation ring, the isolation ring comprising: A first surface that, when installed in the PVD vacuum chamber, is configured to selectively engage the compressible portion and the rigid portion of the sealing ring, wherein the first surface is substantially flat; A stepped portion that, when installed in the PVD vacuum chamber, is configured to selectively engage the edge of the sealing ring; and A sputtering target, the sputtering target comprising: A peripheral flange surface of a first surface that, when installed in the PVD vacuum chamber, is configured to engage the sealing ring, wherein the peripheral flange surface does not have any O-ring grooves, ventilation grooves, and sector grooves and is configured to contact the sealing ring with a flat surface.

2. A sealing ring for a physical vapor deposition (PVD) vacuum chamber, the sealing ring comprising: A compressible portion, wherein the compressible portion includes at least one protrusion and at least one recess; A rigid portion adjacent to the compressible portion, wherein the rigid portion has ribs that are substantially encapsulated by an auxiliary material; An edge that extends from a first surface of the sealing ring and is configured to selectively couple to an isolation ring; A removable shield that is configured to selectively couple to a first end of the compressible portion and is configured to isolate the compressible portion from the interior of the vacuum chamber.

3. The sealing ring according to claim 2, wherein, The compressible portion includes a fluorocarbon, a fluoroelastomer, and / or a fluorinated rubber material.

4. The seal ring according to any one of claims 2 to 3, wherein, The auxiliary material is the same material as the compressible portion and the edge.

5. The sealing ring according to any one of claims 2 to 4, wherein, The at least one protrusion extends through the first surface and a second opposing surface of the sealing ring.

6. The seal ring according to any one of claims 2 to 5, wherein, The at least one recess terminates before the first surface and a second opposing surface of the sealing ring.

7. The sealing ring according to any one of claims 2 to 6, wherein, Each protrusion of the at least one protrusion and each recess of the at least one recess alternate.

8. The sealing ring according to any one of claims 2 to 6, wherein, The compressible material and at least one recess are configured to entrap particulates.

9. The sealing ring according to any one of claims 2 to 8, wherein The ribs of the rigid portion are made of aluminum.

10. The sealing ring according to any one of claims 2 to 9, wherein, The lengths of the compressible portion and the rigid portion are approximately the same.

11. The sealing ring according to any one of claims 2 to 10, wherein, The shield is configured to snap-fit with the first end of the compressible portion.

12. The sealing ring according to any one of claims 2 to 11, wherein, The shield is configured to inhibit plasma arcing and thermal degradation of the compressible portion.

13. The sealing ring according to any one of claims 2 to 12, wherein, The shield includes polytetrafluoroethylene.

14. The seal ring according to any one of claims 2 to 13, wherein, The edge further includes a plurality of retaining tabs.

15. The seal ring according to any one of claims 2 to 14, wherein, The sealing ring is configured to selectively engage with the isolation ring by an interference fit, thereby forming a seal between the sealing ring and the isolation ring when installed in a PVD vacuum chamber.

16. The sealing ring according to any one of claims 2 to 15, wherein, The sealing ring is configured to self-align with the isolation ring using the plurality of retaining tabs on the edge and a stepped portion of a cutout of the isolation ring at approximately 90 degrees.

17. The sealing ring according to any one of claims 2 to 16, wherein A second surface of the sealing ring is configured to selectively engage with the sputtering target, thereby forming a seal between the sealing ring and the sputtering target when installed in a PVD vacuum chamber.

18. The sealing ring according to claim 17, wherein, The sputtering target does not have any grooves, vent slots, and segment slots, and is configured to contact the sealing ring with a flat surface.

19. The sealing ring according to claim 17 or 18, wherein, The sealing ring is configured to provide a buffer between the sputtering target and the isolation ring.

20. A sputtering target, the sputtering target comprising: A first surface configured to selectively engage with a sealing ring on a PVD vacuum chamber, wherein the first surface does not have any grooves, vent slots, and segment slots, and is configured to contact the sealing ring with a flat surface.

21. The sputtering target according to claim 20, wherein, The first surface is configured to be isolated from the isolation ring, and wherein the isolation ring is configured to selectively engage with an opposite side of the sealing ring on the vacuum chamber when installed in the PVD vacuum chamber.

22. An isolation ring, the isolation ring comprising: A first surface configured to selectively engage with a compressible portion and a rigid portion of a sealing ring when installed in a PVD vacuum chamber, wherein the first surface is substantially flat; A stepped portion configured to selectively engage with an edge of the sealing ring when installed in a PVD vacuum chamber.

23. The isolation ring according to claim 22, wherein, The stepped portion has a cutout of approximately 90 degrees.

24. A sealing kit for a vacuum chamber, the sealing kit comprising: A sealing ring, wherein the sealing ring comprises: a compressible portion; a rigid portion adjacent to the compressible portion; and an edge extending perpendicularly from the rigid portion; An isolation ring configured to selectively engage with a first mating surface of the isolation ring including the edge, wherein the isolation ring comprises a cutout configured to selectively receive and contact the edge of the sealing ring, thereby forming a seal between the isolation ring and the sealing ring when installed in a PVD vacuum chamber; A sputtering target comprising a substantially planar first mating surface configured to selectively engage with a second mating surface of the sealing ring, thereby forming a seal between the sputtering target and the sealing ring when installed in a PVD vacuum chamber.

25. The sealing kit according to claim 24, wherein, The first mating surface of the sputtering target does not have any grooves, vent slots, and segment slots.

26. The sealing kit according to claim 24 or 25, wherein, The compressible portion includes at least one protrusion and at least one recess, wherein each of the at least one protrusion and each of the at least one recess alternate.

27. The sealing kit according to any one of claims 24 to 26, wherein, Ribs of the rigid portion are suspended in the same material including the compressible material and the edge.

28. The sealing kit according to any one of claims 24 to 27, wherein, The sealing ring further includes a plasma shield configured to be attached to an inner peripheral side of the compressible portion.

29. The sealing kit according to any one of claims 24 to 28, wherein, Both the sputtering target and the spacer ring form a seal with the sealing ring.

30. The sealing kit according to any one of claims 24 to 29, wherein, The sputtering target and the spacer ring are isolated from each other by the sealing ring.

31. A method for assembling the sealing kit according to claim 24, the method comprising: Placing a spacer ring on a PVD vacuum chamber, wherein the spacer ring includes a step on a mating surface; Placing a sealing ring on the mating surface of the spacer ring, the sealing ring having a first mating surface and a second mating surface on an opposite side of the first mating surface, wherein the first mating surface of the sealing ring includes an edge configured to selectively couple to the step of the spacer ring, and wherein the first mating surface of the sealing ring contacts the mating surface of the spacer ring; Placing a sputtering target on the second mating surface of the sealing ring, wherein the sealing ring includes a compressible portion and a shielding portion, and wherein the sputtering target is configured to compress the compressible portion and the shielding portion of the sealing ring; Wherein the spacer ring and the sealing ring form a seal when installed in the PVD vacuum chamber, and the sealing ring and the sputtering target form a seal when installed in the PVD vacuum chamber.

32. The method according to claim 31, wherein The sputtering target and the spacer ring are isolated from each other by the sealing ring.

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