Combined type rotary polishing device for centrifugal pump impeller

Abstract

The invention belongs to the technical field of polishing, and particularly relates to a centrifugal pump impeller combined type rotary polishing device which comprises a polishing chamber, a lifting tray is arranged in the middle of the interior of the polishing chamber, an impeller body is placed on the lifting tray, a first motor is installed at the top of the polishing chamber, and a connecting shaft is fixed to an output shaft of the first motor. A pressing sleeve is vertically and slidably arranged below the connecting shaft, a first liquid spraying pipe is installed at the position, located above the impeller body, of one end of the polishing chamber, a second liquid spraying pipe is arranged on the side, away from the first liquid spraying pipe, of the lower portion of the polishing chamber, and the bottom end of the polishing chamber communicates with a liquid outlet pipe. The impeller main body vertically reciprocates under the action of the lifting tray while rotating, so that the friction contact effect and efficiency between abrasive particles and the impeller main body are improved, the polishing operation efficiency is improved, and the industrial treatment time is saved.

Description

Technical Field

[0001] The present invention relates to the technical field of polishing, and particularly relates to a composite rotary polishing device for a centrifugal pump impeller. Background Art

[0002] As the core component of a centrifugal pump, the roughness of the impeller has a great influence on the performance of the unit, and it is often necessary to polish the surface of the impeller.

[0003] Referring to the Chinese patent with the patent publication number CN115415926B, a composite rotary polishing device for a centrifugal pump impeller is disclosed, including a polishing frame body. A module for carrying the centrifugal pump impeller body to be polished is provided on the polishing frame body. The module includes a fixed module and a moving module. The fixed module is fixedly assembled on the polishing frame body, and the moving module is hermetically spliced with the fixed module. An outlet hole is provided above the moving module.

[0004] In the above-mentioned and prior art polishing operations on the impeller using abrasive flow, the impeller is often only rotated at a fixed position for polishing. However, the actual fluid may rotate along with the circumference of the impeller, resulting in a poor friction contact effect between the abrasive particles in the fluid and the impeller, thus requiring more working time to complete the polishing operation. Summary of the Invention

[0005] Based on the technical problems in the background art, the present invention proposes a composite rotary polishing device for a centrifugal pump impeller.

[0006] A composite rotary polishing device for a centrifugal pump impeller proposed by the present invention includes a polishing chamber. A lifting tray is arranged in the middle of the polishing chamber, and an impeller body is placed on the lifting tray. A motor one is installed at the top of the polishing chamber. A connecting shaft is fixed to the output shaft of the motor one. A pressure sleeve is vertically slidably arranged below the connecting shaft. A liquid spraying pipe one is installed above the impeller body at one end of the polishing chamber. A liquid spraying pipe two is arranged at a position on the lower side of the polishing chamber far from the liquid spraying pipe one. The bottom end of the polishing chamber is communicated with a liquid outlet pipe.

[0007] Preferably, a vertically extending fixed shaft is fixed at the center position of the lifting tray. A hydraulic telescopic rod is connected to the bottom end of the fixed shaft. A sleeve is slidably connected to the outer wall of the fixed shaft. An installation groove is formed at the top of the fixed shaft, and a magnetic block is fixed in the installation groove. The magnetic block is magnetically adsorbed to the top position of the sleeve. The impeller body is sleeved outside the sleeve, and the pressure sleeve is adapted to the top end of the sleeve.

[0008] Preferably, a vertically extending limiting strip is fixed to one side of the sleeve. A vertically extending limiting groove is formed at a position on the inner wall of the pressure sleeve corresponding to the limiting strip. A first annular groove is formed at the top of the lifting tray, and a first turntable is rotatably connected in the first annular groove in a limited manner.

[0009] Preferably, both sides of the top of the pressure sleeve are detachably connected with limiting frames. Vertical sliding grooves extending vertically are formed on both sides of the connecting shaft, and limiting blocks slidably connected with the sliding grooves are fixed at the top ends of the limiting frames.

[0010] Preferably, the end of the liquid spraying pipe 1 located in the polishing chamber is inclined downward towards the impeller main body. One side of the bottom of the lifting tray is fixed with a mounting plate. A mounting hole is formed at the top of the mounting plate. The top of the outer wall of the liquid spraying pipe 2 is fixed with the inner wall of the mounting hole. A perforation is formed at the bottom of the polishing chamber, and the outer wall of the liquid spraying pipe 2 is hermetically slidably connected with the inner wall of the perforation.

[0011] Preferably, motors 2 are installed on both sides of the polishing chamber. The output shafts of the motors 2 horizontally extend into the polishing chamber. The output shafts of the motors 2 are fixed with dispersion discs. Dispersion strips distributed in an annular array are fixed on the side of the dispersion disc facing the impeller main body, and notches are arranged at the edge positions between adjacent two dispersion strips of the dispersion disc.

[0012] Preferably, a second annular groove is formed at the position corresponding to the liquid spraying pipe 2 on the top of the mounting plate. The second annular groove is coaxially arranged with the liquid spraying pipe 2. The inner diameter of the second annular groove is larger than the outer diameter of the liquid spraying pipe 2. A rotating ring is rotatably connected with the inner wall of the second annular groove in a limiting manner, and a guiding plate is fixed at the top of the rotating ring.

[0013] Preferably, the guiding plate is inclined upward towards the liquid spraying pipe 2, and the guiding plate covers half of the area of the liquid spraying pipe 2.

[0014] Preferably, a motor 3 is fixed below the mounting plate. The output shaft of the motor 3 is fixed with a second turntable located above the mounting plate. A second toothed ring is fixed on the outer wall of the second turntable, and a first toothed ring meshing with the second toothed ring is installed on the outer wall of the rotating ring.

[0015] The beneficial effects in the present invention are as follows:

[0016] 1. In the present invention, while the impeller main body rotates, it makes a vertical reciprocating motion under the action of the lifting tray. The abrasive grains flow along the impeller through circumferential rotation to perform the polishing operation. The vertical lifting and reciprocating operation of the impeller main body improves the discharging effect of the abrasive grain flow carrying out debris, thereby improving the friction contact effect and efficiency between the abrasive grains and the impeller main body, so as to improve the polishing operation efficiency and save the industrial treatment time.

[0017] 2. In the present invention, the liquid spraying pipe 1 extending obliquely from the end position above the impeller main body sprays along the tangent direction of the rotation of the impeller main body, thereby further improving the effectiveness of polishing the top position of the impeller main body. The position of the guiding plate rotates circumferentially around the liquid spraying pipe 2, so that the covering position continuously changes, improving the dispersion effect of the liquid spraying pipe 2 spraying liquid for polishing around the bottom of the impeller main body, thereby further improving the friction polishing effect between the abrasive grain flow and the impeller main body and the overall operation efficiency. Description of the Drawings

[0018] Figure 1 Schematic diagram of the overall structure of a composite rotary polishing device for a centrifugal pump impeller proposed by the present invention;

[0019] Figure 2 Schematic diagram of the internal structure of the polishing chamber of a composite rotary polishing device for a centrifugal pump impeller proposed by the present invention;

[0020] Figure 3 Schematic diagram of the position structure of the pressure sleeve of a composite rotary polishing device for a centrifugal pump impeller proposed by the present invention;

[0021] Figure 4 Schematic diagram of the position structure of the lifting tray of a composite rotary polishing device for a centrifugal pump impeller proposed by the present invention;

[0022] Figure 5 Schematic diagram of the exploded structure of the fixed shaft, sleeve and pressure sleeve of a composite rotary polishing device for a centrifugal pump impeller proposed by the present invention;

[0023] Figure 6 Schematic diagram of the sectional structure of the position of the sleeve of a composite rotary polishing device for a centrifugal pump impeller proposed by the present invention;

[0024] Figure 7 Schematic diagram of the structure of the dispersion plate of a composite rotary polishing device for a centrifugal pump impeller proposed by the present invention;

[0025] Figure 8 Schematic diagram of the position structure of the mounting plate of a composite rotary polishing device for a centrifugal pump impeller proposed by the present invention;

[0026] Figure 9 Schematic diagram of the structure of the guide plate of a composite rotary polishing device for a centrifugal pump impeller proposed by the present invention.

[0027] In the figure: 1 polishing chamber, 101 door cover, 2 bracket, 3 lifting tray, 4 impeller main body, 5 pressure sleeve, 6 motor 1, 7 liquid spraying pipe 1, 8 liquid spraying pipe 2, 9 liquid outlet pipe, 10 fixed shaft, 11 hydraulic expansion rod, 12 sleeve, 121 limit strip, 13 magnetic block, 14 turntable 1, 15 connecting shaft, 151 sliding groove, 16 limit frame, 17 motor 2, 18 dispersion plate, 181 dispersion strip, 182 notch, 19 mounting plate, 20 rotating ring, 21 guide plate, 22 gear ring 1, 23 motor 3, 24 turntable 2, 25 gear ring 2, 26 protection cylinder. Detailed implementation mode

[0028] Example 1: Refer to Figures 1-7, A centrifugal pump impeller composite rotary polishing device, comprising a polishing chamber 1. At the four corner positions at the bottom of the polishing chamber 1, brackets 2 are installed. At one end of the polishing chamber 1, a door cover 101 is installed, and after the door cover 101 coincides with the polishing chamber 1, it is sealed. In the middle position inside the polishing chamber 1, a lifting tray 3 is arranged, and an impeller body 4 is placed on the lifting tray 3. At the top of the polishing chamber 1, a first motor 6 is installed. The output shaft of the first motor 6 extends downward into the polishing chamber 1. A connecting shaft 15 that extends vertically downward is fixed to the output shaft of the first motor 6. A pressure sleeve 5 is vertically slidably arranged below the connecting shaft 15. Above the impeller body 4 at one end of the polishing chamber 1, a first liquid spraying pipe 7 is installed. The first liquid spraying pipe 7 is located on one side of the lifting tray 3 and sprays abrasive flow upward towards the impeller body 4. On the side position away from the first liquid spraying pipe 7 below the polishing chamber 1, a second liquid spraying pipe 8 is arranged, and the second liquid spraying pipe 8 sprays abrasive flow downward towards the impeller body 4. The bottom end of the polishing chamber 1 is communicated with a liquid outlet pipe 9. The impeller body 4 is installed between the lifting tray 3 and the pressure sleeve 5. The first motor 6 can drive the pressure sleeve 5 and the impeller body 4 to rotate, and at the same time, the lifting tray 3 can drive the impeller body 4 and the pressure sleeve 5 to move vertically; during use, after placing the impeller body 4 to be polished, abrasive flow is injected into the polishing chamber 1 simultaneously from the positions of the first liquid spraying pipe 7 and the second liquid spraying pipe 8, and the impeller body 4 is rotated. Under the action of the injected abrasive flow, the surface of the rotating impeller body 4 is initially polished; then after the abrasive flow covers the impeller body 4, the first liquid spraying pipe 7 and the second liquid spraying pipe 8 continue to spray abrasive flow simultaneously, and the liquid outlet pipe 9 continuously discharges the abrasive flow at the bottom to enable the abrasive flow in the polishing chamber 1 to cover the impeller body 4. At this time, while the impeller body 4 is rotating, it moves vertically back and forth under the action of the lifting tray 3. Through circular rotation, the abrasive moves along the impeller for polishing operations. Through the vertical reciprocating operation of the impeller body 4, the discharge effect of the abrasive flow carrying debris is improved, thereby improving the friction contact effect and efficiency between the abrasive and the impeller body 4, so as to improve the polishing operation efficiency and save industrial processing time; after a period of time, the liquid inlet is stopped and the liquid is continuously discharged, and after the impeller body 4 continues to rotate and spin-dries, the workpiece is taken out.

[0029] In the present invention, a vertically extending fixed shaft 10 is fixed at the central position of the lifting tray 3. The bottom end of the fixed shaft 10 is connected to a hydraulic telescopic rod 11. It should be noted that: the housing of the hydraulic telescopic rod 11 is installed at the bottom position of the polishing chamber 1. The telescopic shaft of the hydraulic telescopic rod extends vertically upward into the polishing chamber 1, and a sealing sliding sleeve is installed at the position corresponding to the telescopic shaft of the hydraulic telescopic rod 11 at the bottom of the polishing chamber 1. The telescopic shaft of the hydraulic telescopic rod 11 and the sealing sliding sleeve are in sealed sliding connection; the outer wall of the fixed shaft 10 is slidably connected to a sleeve 12. The bottom end of the sleeve 12 is open, and the top end of the sleeve 12 is sealed. An installation groove is formed at the top of the fixed shaft 10, and a magnetic block 13 is fixed in the installation groove. The magnetic block 13 is magnetically adsorbed to the top position of the sleeve 12. The impeller main body 4 is sleeved outside the sleeve 12. The pressing sleeve 5 is adapted to the top end of the sleeve 12. A vertically extending limiting strip 121 is fixed on one side of the sleeve 12. A vertically extending limiting groove is formed at the position corresponding to the limiting strip 121 on the inner wall of the pressing sleeve 5. The inner wall of the pressing sleeve 5 is slidably connected to the outer wall of the sleeve 12. A first annular groove is formed at the top of the lifting tray 3, and a first turntable 14 is rotatably connected in the first annular groove in a limited manner. It should be noted that: the first turntable 14 contacts the bottom of the shaft ring at the middle position between the impeller main body 4. In the design of the present application, the sleeve 12 is directly slidably arranged with the fixed shaft 10, so that the corresponding sleeve 12 and the corresponding pressing sleeve 5 can be replaced according to needs. For example, the structure of the groove body is used for connecting with the motor shaft in the impeller shaft ring, that is, the sleeve 12 with the limiting strip 121 in the attached drawing is used. If the convex strip structure is arranged in the impeller shaft ring, the sleeve 12 with the matching groove can be used; further, even if the impeller shaft ring is a smooth circumferential surface, after the impeller main body is lifted by the lifting tray 3 in the setting of the present application, the impeller main body 4 can also be rotated by the extrusion friction between the pressing sleeve 5 and the top surface of the impeller main body 4.

[0030] In the present invention, vertical upwardly extending limiting frames 16 are detachably connected to both sides of the top of the pressing sleeve 5. Vertical extending sliding grooves 151 are provided on both sides of the connecting shaft 15. A limiting block slidably connected to the sliding groove 151 is fixed to the top end of the limiting frame 16. During actual use, the sleeve 12 is pre - sleeved outside the fixed shaft 10, and the sleeve 12 is assisted in positioning by the magnetic block 13. In the initial state, the hydraulic telescopic rod 11 does not extend, so that the lifting tray 3, the fixed shaft 10 and the sleeve 12 are in the lower position. After the impeller body 4 is sleeved outside the sleeve 12, the hydraulic telescopic rod 11 is used to lift the lifting tray 3 together with the impeller body 4. After the inner wall of the pressing sleeve 5 coincides with the top end of the sleeve 12 until the bottom end of the pressing sleeve 5 is pressed against the top of the impeller body 4, then the pressing sleeve 5, the sleeve 12, the impeller body 4 and the first turntable 14 can be rotated by the first motor 6; when controlling the reciprocating lifting of the impeller body 4, the hydraulic telescopic rod 11 drives the fixed shaft 10, the lifting tray 3 and the impeller body 4 to rise. When descending, the lifting tray 3, the fixed shaft 10 and the sleeve 12 will quickly descend, but the top end of the sleeve 12 is always inside the pressing sleeve 5. The impeller body 4 will relatively slowly descend under the resistance of the abrasive flow, causing an opening and closing between the impeller body 4 and the lifting tray 3. And the gravity difference between the impeller body 4 and the pressing sleeve 5 will cause an opening and closing between the top of the impeller body 4 and the pressing sleeve 5, so that when the impeller body 4 moves vertically in a reciprocating manner, the contact positions above and below can have an opening and closing, so as to improve the comprehensiveness of polishing the impeller body 4, and further improve the polishing operation efficiency.

[0031] In the present invention, the first liquid spraying pipe 7 at the end of the polishing chamber 1 is inclined downward towards the direction close to the impeller body 4. One side of the bottom of the lifting tray 3 is fixed with a mounting plate 19. A mounting hole is provided on the top of the mounting plate 19. The top of the outer wall of the second liquid spraying pipe 8 is fixed to the inner wall of the mounting hole. A through - hole is provided at the bottom of the polishing chamber 1. The outer wall of the second liquid spraying pipe 8 is hermetically slidably connected to the inner wall of the through - hole, so that the second liquid spraying pipe 8 located below the impeller body 4 always moves with the lifting tray 3, so as to ensure the effectiveness of spraying abrasive flow for polishing the bottom of the impeller body 4. And the first liquid spraying pipe 7 extending obliquely from the end position above the impeller body 4 sprays along the tangent direction of the rotation of the impeller body 4, so as to further improve the effectiveness of polishing the top position of the impeller body 4, and further improve the polishing operation efficiency through the overall setting.

[0032] In the present invention, motors two 17 are installed on both sides of the polishing chamber 1. The output shafts of the motors two 17 horizontally extend into the polishing chamber 1. A dispersion disk 18 is fixed to the output shaft of the motor two 17. Dispersion bars 181 distributed in an annular array are fixed to one side of the dispersion disk 18 facing the impeller body 4. And a notch 182 is provided at the edge position between two adjacent dispersion bars 181 on the dispersion disk 18. When the first liquid spray pipe 7 and the second liquid spray pipe 8 spray abrasive flow with liquid towards the middle positions above and below the impeller body 4, combined with the rotation of the impeller body 4 itself and the dispersion effect of the dispersion disks 18 at both sides towards the outer periphery in the vertical direction, the abrasive flow with debris is guided towards the outside, avoiding the backflow of the abrasive flow with debris and affecting the polishing operation effect.

[0033] Example 2: Refer to Figures 1-9 , a centrifugal pump impeller compound rotary polishing device. On the basis of Example 1, a second annular groove is provided at a position corresponding to the second liquid spray pipe 8 at the top of the mounting plate 19. The second annular groove is coaxially arranged with the second liquid spray pipe 8. The inner diameter of the second annular groove is larger than the outer diameter of the second liquid spray pipe 8. A rotating ring 20 is rotationally connected to the inner wall of the second annular groove in a limited manner. A guiding plate 21 is fixed to the top of the rotating ring 20. The guiding plate 21 is inclined upwards towards the direction close to the second liquid spray pipe 8. The guiding plate 21 covers half of the area of the second liquid spray pipe 8. A motor three 23 is fixed below the mounting plate 19. A second rotating disk 24 located above the mounting plate 19 is fixed to the output shaft of the motor three 23. A second toothed ring 25 is fixed to the outer wall of the second rotating disk 24. A first toothed ring 22 meshing with the second toothed ring 25 is installed on the outer wall of the rotating ring 20. A protective cylinder 26 is fixed to the bottom of the mounting plate 19 at a position corresponding to the motor three 23. A through hole corresponding to the position of the protective cylinder 26 is provided at the bottom of the polishing chamber 1. The outer wall of the protective cylinder 26 is in sliding contact with the inner wall of the through hole. During the process of the second liquid spray pipe 8 spraying liquid upwards for polishing, the guiding plate 21 covers half of the area of the second liquid spray pipe 8. The area of the second liquid spray pipe 8 that is not covered sprays liquid vertically upwards. The area of the second liquid spray pipe 8 that is covered is distributed around along the guiding plate 21, and the position of the guiding plate 21 rotates circumferentially around the second liquid spray pipe 8 so that the covered position changes continuously, thereby improving the dispersion effect of the second liquid spray pipe 8 spraying liquid for polishing around the bottom of the impeller body 4, and further improving the friction polishing effect between the abrasive flow and the impeller body 4 and the overall operation efficiency.

[0034] The above is only a preferred specific embodiment of the present invention, but the protection scope of the present invention is not limited thereto. Any person skilled in the art within the technical scope disclosed by the present invention, according to the technical solution and inventive concept of the present invention, makes equivalent substitutions or changes, and should be covered within the protection scope of the present invention.

Claims

1. A compound rotary polishing device for a centrifugal pump impeller, comprising a polishing chamber (1), characterized in that, An elevating tray (3) is arranged at the middle position inside the polishing chamber (1), and an impeller main body (4) is placed on the elevating tray (3). A first motor (6) is installed at the top of the polishing chamber (1), a connecting shaft (15) is fixed to the output shaft of the first motor (6), and a pressure sleeve (5) is vertically slidably arranged below the connecting shaft (15). A first liquid spraying pipe (7) is installed above the impeller main body (4) at one end of the polishing chamber (1), and a second liquid spraying pipe (8) is arranged at a position on the lower side of the polishing chamber (1) far away from the first liquid spraying pipe (7). A liquid outlet pipe (9) is communicated with the bottom end of the polishing chamber (1).

2. The composite rotary polishing device for a centrifugal pump impeller according to claim 1, wherein A vertically extending fixed shaft (10) is fixed at the center position of the elevating tray (3). The bottom end of the fixed shaft (10) is connected with a hydraulic telescopic rod (11). A sleeve (12) is slidably connected to the outer wall of the fixed shaft (10). An installation groove is formed at the top of the fixed shaft (10), and a magnetic block (13) is fixed in the installation groove. The magnetic block (13) is magnetically adsorbed to the top position of the sleeve (12). The impeller main body (4) is sleeved outside the sleeve (12), and the pressure sleeve (5) is adapted to the top end of the sleeve (12).

3. The compound rotary polishing device for a centrifugal pump impeller according to claim 2, characterized in that, A vertically extending limiting strip (121) is fixed to one side of the sleeve (12). A vertically extending limiting groove is formed at a position on the inner wall of the pressure sleeve (5) corresponding to the limiting strip (121). A first annular groove is formed at the top of the elevating tray (3), and a first turntable (14) is rotatably connected in the first annular groove in a limited manner.

4. A composite rotary polishing device for a centrifugal pump impeller according to claim 3, characterized in that, Limiting frames (16) are detachably connected to both sides of the top of the pressure sleeve (5). Vertically extending sliding grooves (151) are formed on both sides of the connecting shaft (15). Limiting blocks slidably connected to the sliding grooves (151) are fixed to the top ends of the limiting frames (16).

5. A compound rotary polishing device for a centrifugal pump impeller according to any one of claims 1 to 4, characterized in that The first liquid spraying pipe (7) is inclined downward toward the impeller main body (4) at the end of the polishing chamber (1). An installation plate (19) is fixed to one side of the bottom of the elevating tray (3). An installation hole is formed at the top of the installation plate (19). The top of the outer wall of the second liquid spraying pipe (8) is fixed to the inner wall of the installation hole. A perforation is formed at the bottom of the polishing chamber (1), and the outer wall of the second liquid spraying pipe (8) is hermetically slidable with the inner wall of the perforation.

6. The composite rotary polishing device for a centrifugal pump impeller according to claim 5, wherein Second motors (17) are installed on both sides of the polishing chamber (1). The output shafts of the second motors (17) horizontally extend into the polishing chamber (1). Dispersing discs (18) are fixed to the output shafts of the second motors (17). Dispersing strips (181) distributed in an annular array are fixed to one side of the dispersing discs (18) facing the impeller main body (4), and notches (182) are arranged at the edge positions between adjacent two dispersing strips (181) of the dispersing discs (18).

7. A compound rotary polishing device for a centrifugal pump impeller according to claim 5, characterized in that, A second annular groove is formed at the top of the installation plate (19) corresponding to the second liquid spraying pipe (8). The second annular groove is coaxially arranged with the second liquid spraying pipe (8). The inner diameter of the second annular groove is larger than the outer diameter of the second liquid spraying pipe (8). A rotating ring (20) is rotatably connected in the inner wall of the second annular groove in a limited manner, and a guiding plate (21) is fixed to the top of the rotating ring (20).

8. A composite rotary polishing device for a centrifugal pump impeller according to claim 7, characterized in that The guiding plate (21) is inclined upward toward the second liquid spraying pipe (8), and the guiding plate (21) covers half of the area of the second liquid spraying pipe (8).

9. The composite rotary polishing device for a centrifugal pump impeller according to claim 8, characterized in that, A third motor (23) is fixed below the mounting plate (19). The output shaft of the third motor (23) is fixed with a second turntable (24) located above the mounting plate (19). An outer wall of the second turntable (24) is fixed with a second gear ring (25). An outer wall of the rotating ring (20) is mounted with a first gear ring (22) meshing with the second gear ring (25).

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