High-throughput crystalline silicon-perovskite laminated annealing equipment
By adopting a specific structure of the through-material box, feeding component and uniform heat shield in the crystalline silicon-perovskite stack annealing equipment, combined with the partition assembly and humidification assembly, the uniform heat transfer is achieved, the problem of uneven annealing is solved, and the annealing effect and production efficiency are improved.
Patent Information
- Application Number
- CN202510719099.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-05-30
- Publication Date
- 2025-07-29
AI Technical Summary
The existing crystalline silicon-perovskite stacked annealing equipment has the problem of heat accumulation, resulting in uneven annealing effect.
Using a specific structure of the material passing box, feeding component, uniform heat shield and partition assembly, the heat generated by the heater is uniformly transferred in a near-circulation manner, and combined with the humidification component and adjustable valve control, ensure uniform heating of the material.
The temperature uniformity and production efficiency of the annealing effect are improved and the degree of automation of the equipment is enhanced.
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Figure CN120390570A_ABST
Abstract
Description
Technical Field
[0001] The present invention belongs to the technical field of annealing equipment, and relates to a perovskite solar cell annealing equipment, specifically to a high-throughput crystalline silicon-perovskite tandem annealing equipment. Background Art
[0002] Perovskite solar cells are thin-film solar cells that use perovskite-type organometallic halides (semiconductors) as photoactive materials. Generally, they have structures such as a substrate, a conductive material layer, a first carrier transport layer, a perovskite layer, a second carrier transport layer, and a top electrode layer. The crystalline silicon-perovskite tandem solar cell is prepared by depositing perovskite on the light-receiving surface of the front side of the crystalline silicon cell to fully utilize light of different wavelengths on the front side and improve the conversion efficiency of the cell.
[0003] Chinese Utility Model Patent with Application No. 201822243772.4 discloses an annealing device for crystalline silicon solar cells, which includes a tray, a transmission device, a plurality of process chambers, a flat electrode, a power supply, and a control system. Among them, the tray includes at least two layers of support units, and each layer of support unit can hold at least one stack of cell laminates. Adjacent support units are connected in series so that series connection is achieved between the cell laminates; each process chamber is arranged in sequence along the transmission direction of the transmission device, and the transmission device can transport the tray through each process chamber in sequence; each process chamber includes at least one annealing chamber for electro-injection and temperature modular control and at least one cooling chamber for rapid cooling; the flat electrode is arranged in the annealing chamber and electrically connected to the power supply, and the flat electrode can be electrically connected to the tray under the drive of the transmission device so that each cell laminate and the flat electrode form a circuit; the control system is electrically connected to the transmission device, the flat electrode, and the transmission device. This application also discloses that a temperature control heating device and a ventilation device are arranged in the annealing chamber, but does not disclose their specific structures and cooperation methods, which may lead to heat accumulation and affect the annealing effect of the product. Summary of the Invention
[0004] The purpose of the present invention is to overcome the defects of the prior art and provide a high-throughput crystalline silicon-perovskite tandem annealing equipment to improve the temperature uniformity of annealing.
[0005] To achieve the above purpose, the technical solution adopted by the present invention is: a high-throughput crystalline silicon-perovskite tandem annealing equipment, characterized in that it includes:
[0006] A material passing box;
[0007] An upper material conveying component, which is installed in the material passing box and used for conveying materials;
[0008] A heat homogenizing cover body, which is installed on the top of the material passing box and communicated with it;
[0009] Multiple partition door assemblies, with multiple of said partition door assemblies installed at intervals in the material conveying box body and the heat equalizing cover body, for separating the upper material conveying assembly into a matching blanking unit and multiple groups of material conveying units, and separating the material passing box body and the heat equalizing cover body into a cooling unit and multiple groups of heating units. The cooling unit has a cooling cavity.
[0010] Each group of said heating units includes a housing having a receiving cavity, a heater installed in the receiving cavity, an intake pipe installed on the housing and communicating with the receiving cavity, an exhaust pipe installed on the housing and communicating with the receiving cavity, a first flow guiding cover installed on the inner wall of the housing, a second flow guiding cover installed on the inner wall of the housing and arranged opposite to the first flow guiding cover, and a downward air guiding mechanism installed in the first flow guiding cover.
[0011] Optimally, the first flow guiding cover has a first air intake structure and a first air outlet structure, and the first air intake structure is located above the first air outlet structure; the second flow guiding cover has a second air intake structure that cooperates with the first air outlet structure.
[0012] Further, the first air intake structure, the first air outlet structure, and the second air intake structure are independently through hole arrays.
[0013] Further, the downward air guiding mechanism includes a wind wheel rotatably installed in the first flow guiding cover, a wind wheel motor connected to the wind wheel to drive its rotation, and a sealing cover body installed on the outer wall of the housing to cover the wind wheel motor.
[0014] Further, a first valve with adjustable angle is installed in the intake pipe, and a second valve with adjustable degree is installed in the exhaust pipe.
[0015] Further, each group of said heating units further includes a humidifying component, and the humidifying component includes a humidifying water tank installed on the outer wall of the material passing box body and a humidifying steam pipe with one end communicating with the humidifying water tank and the other end extending into the receiving cavity.
[0016] Optimally, the material conveying unit includes a first conveyor belt support frame installed in the material passing box body and a first conveyor belt rotatably installed on the first conveyor belt support frame in a circulating manner. The blanking unit includes a second conveyor belt support frame installed in the material passing box body, a second conveyor belt rotatably installed on the second conveyor belt support frame in a circulating manner, a pair of first centering blocks installed on the inner wall of the second conveyor belt support frame and arranged facing each other, and first buffer blocks correspondingly installed on the bottom surfaces of the pair of first centering blocks.
[0017] Optimally, each partition door assembly includes a sealing cushion plate installed on the bottom plate of the material passing box body, two support frames installed on the top of the material passing box body and separating the heat equalizing cover body, a support cross plate installed on the top of the support frames, a plurality of guide sleeves installed on the support cross plate, a partition plate arranged between the two support frames, a plurality of guide rods passing through the guide sleeves and having the lower ends connected to the upper surface of the partition plate, a cylinder installed on the support cross plate and connected to the partition plate, and a reinforcing plate installed on the tops of the plurality of guide rods and avoiding the cylinder.
[0018] Optimally, it further includes:
[0019] a lower material conveying component, which is installed below the material passing box body;
[0020] a material receiving lifting component, which is arranged at one end of the lower material conveying component and the material passing box body and is used for receiving the materials conveyed by the lower material conveying component and feeding them into the material passing box body through the upper material conveying component.
[0021] Further, the lower material conveying component includes a support frame body, a lower material conveying mechanism installed in the support frame body, a plurality of support feet installed at the bottom of the support frame body, a plurality of rollers installed at the bottom of the support frame body, a plurality of reinforcing rods installed on the bottom surface of the support frame body, and a buckle plate installed on the side surface of the support frame body.
[0022] The lower material conveying mechanism includes a third conveyor belt support frame installed in the support frame body, a third conveyor belt installed on the third conveyor belt support frame in a recyclable rotation manner, a pair of second centering blocks installed at the discharge end of the third conveyor belt support frame and arranged oppositely, and second buffer blocks correspondingly installed on the bottom surfaces of the pair of second centering blocks.
[0023] Due to the application of the above technical solutions, the present invention has the following advantages compared with the prior art: The high-throughput crystalline silicon-perovskite tandem annealing equipment of the present invention can evenly transfer the heat generated by the heater in an almost cyclic manner through the cooperation of a material passing box body, an upper material conveying component, a heat equalizing cover body, a partition door assembly and the like with specific structures, so as to ensure uniform heating of the materials and improve the annealing effect. BRIEF DESCRIPTION OF THE DRAWINGS
[0024] Figure 1 is a schematic structural diagram of the high-throughput crystalline silicon-perovskite tandem annealing equipment of the present invention;
[0025] Figure 2 is a partial structural schematic diagram of the high-throughput crystalline silicon-perovskite tandem annealing equipment of the present invention;
[0026] Figure 3Schematic diagram of the structure of the lower part of the high-throughput crystalline silicon-perovskite tandem annealing equipment of the present invention;
[0027] Figure 4 is Figure 3 the partial enlarged view of the left end in
[0028] Figure 5 Schematic diagram of the structure of the heating unit in the high-throughput crystalline silicon-perovskite tandem annealing equipment of the present invention. Detailed implementation manners
[0029] The present invention will be further described below in conjunction with the embodiments shown in the drawings.
[0030] As Figures 1 to 5 shown, the high-throughput crystalline silicon-perovskite tandem annealing equipment mainly includes a material passing box body 2, an upper material conveying component 3, a heat homogenizing cover body, a partition door component 4, a heating unit 5 and other structures.
[0031] Among them, the material passing box body 2 can adopt a conventional box body structure, with both ends open, the bottom being a bearing plate ( Figure 3 not shown in
[0032] ), and part of the top structure is also open to communicate with the heat homogenizing cover body; since the annealing process (requiring high temperature) is carried out in the material passing box body 2, the box wall of the material passing box body 2 is preferably made of conventional heat insulation and heat preservation materials to avoid heat dissipation. Figure 1 The upper material conveying component 3 is installed in the material passing box body 2 and is used for conveying materials (carriers carrying a number of crystalline silicon-perovskite tandem solar cell wafers), that is, conveying the materials from the feed port ( Figure 1 the left end in
[0033] the material passing box body 2) to the discharge port (
[0034] the right end in Figure 1As shown, there are five groups of partition door assemblies 4. The heating units separated by adjacent two groups of partition door assemblies 4 are defined as a preheating unit, a first heating unit, a second heating unit, and a third heating unit in sequence from left to right to perform the same or different heating processes. At this time, the states of multiple groups of feeding units 32 and discharging units 31 are as Figure 3 shown.
[0035] Each heating unit 5 includes a housing 50 having a receiving cavity 501 (the housing 50 here includes partial structures of the material-passing box body 2 and the heat-uniforming cover body), a heater 58 installed in the receiving cavity 501, an air inlet pipe 54 installed on the housing 50 and communicating with the receiving cavity 501 (ensuring the communication between the inside of the housing 50 and the outside atmosphere), an air outlet pipe 53 installed on the housing 50 and communicating with the receiving cavity 501 (discharging the flowing gas outwards and taking out heat), a first air deflector 51 installed on the inner wall of the housing 50, a second air deflector 52 installed on the inner wall of the housing 50 and arranged opposite to the first air deflector 51 (the first air deflector 51 and the second air deflector 52 are respectively located on two inner walls of the housing 50), and a downward air guiding mechanism 55 installed in the first air deflector 51, so that the gas flow direction in the heating unit 5 is as Figure 5 shown (in a state close to circulation).
[0036] In this embodiment, the first air deflector 51 has a first air inlet structure and a first air outlet structure. The first air inlet structure is located above the first air outlet structure (the first air inlet structure is located in the heat-uniforming cover body, and the first air outlet structure is located in the material-passing box body 2); the second air deflector 52 has a second air inlet structure (the second air inlet structure is located in the material-passing box body 2) that cooperates with the first air outlet structure. The first air inlet structure, the first air outlet structure, and the second air inlet structure are independently a through-hole array, which can ensure the smoothness of air inlet and outlet and further improve the heating effect; the area size of the through-hole array can be adjusted or selected conventionally according to factors such as actual heat exchange requirements and temperature requirements in the heat-uniforming cover body and the material-passing box body 2.
[0037] In this embodiment, the heating unit 5 further includes a cover plate 57 that is detachably installed on the top of the housing 50, which facilitates the maintenance of the heating mechanism 5. The downward air guiding mechanism 55 includes a wind wheel 551 rotatably installed in the first air guide cover 51 (the rotatable manner adopts the existing conventional one. At this time, the wind wheel 551 has a horizontally arranged mounting shaft, as long as it can ensure that the wind wheel 551 rotates around the mounting shaft as the axis line, such as being installed through a bearing, etc.; when the wind wheel 551 rotates, a local negative pressure is generated in the first air guide cover 51 and air is conveyed into the housing 50), a wind wheel motor 552 connected to the wind wheel 551 to drive its rotation (for example, the wind wheel motor 552 can be installed on the outer wall of the housing 50 to fix the wind wheel motor 552), and a sealing cover 553 installed on the outer wall of the housing 50 to cover the wind wheel motor 552. An angle-adjustable first valve 541 is installed in the intake pipe 54, and an angle-adjustable second valve 531 is installed in the outlet pipe 53. By controlling the angles of the first valve 541 and the second valve 531, the intake and outlet air flows of the intake pipe 54 and the outlet pipe 53 can be adjusted, thereby precisely controlling the temperature inside the housing 50 and improving the effect of uniform heat dissipation, etc. Each group of heating units 5 further includes a humidifying component 56, and the humidifying component 56 includes a humidifying water tank 561 installed on the outer wall of the material passing box 2 and a humidifying steam pipe 562 with one end communicating with the humidifying water tank 561 and the other end extending into the accommodating cavity 501 to precisely control the humidity inside the housing 50 and further improve the annealing effect of the product.
[0038] Specifically, such as Figure 3As shown, the feeding unit 32 includes a first conveyor belt support frame 321 (there are two first conveyor belt support frames 321, which are opposite and spaced apart) installed in the material passing box body 2, and a first conveyor belt 322 rotatably installed on the two first conveyor belt support frames 321 in a circulating manner (the rotatable installation method of the first conveyor belt 322 and the first conveyor belt support frame 321 can adopt the existing conventional method. This part is not the invention point of this application. As long as the first conveyor belt 322 can rotate in a circulating manner on the first conveyor belt support frame 321 to convey materials; for example, a plurality of driving rollers (not shown in the figure) are installed on the two first conveyor belt support frames 321 through bearings, the first conveyor belt 322 is wound around the plurality of driving rollers, and at least one driving roller is connected to the driving motor through a transmission belt or a transmission chain. In this way, when the driving motor works, it can drive the corresponding driving roller to rotate, and then drive the circulating movement of the first conveyor belt 322). The basic structure of the blanking unit 31 is similar to that of the feeding unit 32, including a second conveyor belt support frame 311 installed in the material passing box body 2 and a second conveyor belt 312 rotatably installed on the second conveyor belt support frame 311 in a circulating manner (the same as above); the difference is that it further includes a pair of first centering blocks 313 installed on the inner wall of the second conveyor belt support frame 311 and facing each other (the pair of first centering blocks 313 have two first inner surfaces 3131 arranged oppositely, and these two first inner surfaces 3131 are spaced apart and reduced in the direction from left to right in Figure 3 and a first buffer block 314 correspondingly installed on the bottom surface of the pair of first centering blocks 313 (the structure of the first buffer block 314 matches the structure of the first centering blocks 313).
[0039] In this embodiment, as Figure 1 shown, the high-throughput crystalline silicon-perovskite stacked annealing equipment further includes a lower feeding assembly 1 and a material receiving lifting assembly; the lower feeding assembly 1 is installed below the material passing box body 2 and is used to convey materials from left to right. At this time, manual operation can be adopted to receive materials on the left side of the lower feeding assembly 1 and place them at the left end of the material passing box body 2 so as to convey them from right to left through the upper feeding assembly 3; but it is more preferably to use a material receiving lifting assembly (not shown in the figure) to perform the above operations to improve the degree of automation. At this time, the material receiving lifting assembly is arranged at one end of the lower feeding assembly 1 and the material passing box body 2 (that is, Figure 1 the left side in), and is used to receive the materials conveyed by the lower feeding assembly 1 and send them into the material passing box body 2 through the upper feeding assembly 3; the material receiving lifting assembly can adopt the existing conventional ones as long as it has functions such as material receiving, lifting, and feeding.
[0040] In this embodiment, the lower feeding assembly 1 includes a support frame body 11, a lower feeding mechanism 10 installed inside the support frame body 11, a plurality of support feet 13 installed at the bottom of the support frame body 11, a plurality of rollers 12 installed at the bottom of the support frame body 11 (the specific number of the support feet 13 and the rollers 12 can be conventionally selected according to actual needs), a plurality of reinforcing rods 15 installed on the bottom surface of the support frame body 11 (there are two reinforcing rods 15, which are parallel and spaced apart), and a buckle plate 14 installed on the side surface of the support frame body 11.
[0041] The specific structure of the lower feeding mechanism 10 is the same as that of the aforementioned blanking unit 31. The difference is that the length of the lower feeding mechanism 10 runs through the entire support frame body 11 and specifically includes a third conveyor belt support frame 101 installed inside the support frame body 11, a third conveyor belt 102 rotatably installed on the third conveyor belt support frame 101 in a circulating manner, a pair of second centering blocks 103 installed at the discharge end of the third conveyor belt support frame 101 and arranged facing each other (the second centering block 103 has a second inner surface 1031), and second buffer blocks 104 correspondingly installed on the bottom surfaces of the pair of second centering blocks 103 (similarly, as Figure 4 shown).
[0042] In this embodiment, as Figure 1 and Figure 2 shown, each partition door assembly 4 includes a sealing gasket 40 installed on the bottom plate of the material passing box body 2, two support frames 41 installed on the top of the material passing box body 2 and separating the heat homogenizing cover body, a support cross plate 42 installed on the top of the support frames 41, a plurality of guide sleeves 44 (two in this application) installed on the support cross plate 42, a partition plate 43 arranged between the two support frames 41, a plurality of guide rods 45 passing through the guide sleeves 44 and having their lower ends connected to the upper surface of the partition plate 43 (the number of the guide rods 45 corresponds one-to-one to the number of the guide sleeves 44), a cylinder 47 installed on the support cross plate 42 and connected to the partition plate 43, and a reinforcing plate 46 installed on the tops of the plurality of guide rods 45 and avoiding the cylinder 47. In this way, when the cylinder 47 works, it can drive the lifting of the partition plate 43. When the partition plate 43 descends, the material passing box body 2 and the heat homogenizing cover body are separated into a cooling unit (the cooling unit has a cooling cavity communicating with the atmospheric environment) and multiple groups of heating units 5. At this time, the material (usually continuously conveyed) is conveyed by multiple groups of feeding units 32 into the corresponding heating units 5 and stays for a certain time according to the heating (annealing) process for heating (annealing) treatment. After the heating is completed, the partition plate 43 rises; the feeding unit 32 works again to convey the material; and so on, repeating and moving in sequence until it is output by the blanking unit 31 (it can be manually received outside the blanking unit 31 or an existing receiving structure can be used to receive the material). In this way, the automation degree and production efficiency of the entire high-throughput crystalline silicon-perovskite tandem annealing equipment can be greatly improved.
[0043] The above embodiments are only used to illustrate the technical concept and features of the present invention, and the purpose is to enable those skilled in the art to understand the content of the present invention and implement it accordingly. It should not be used to limit the protection scope of the present invention. Any equivalent changes or modifications made according to the spirit of the present invention should be covered within the protection scope of the present invention.
Claims
1. A high-throughput crystalline silicon-perovskite tandem annealing device, characterized in that It includes: A material passing box body; An upper material conveying component, which is installed in the material passing box body and used for conveying materials; A heat - uniforming cover body, which is installed on the top of the material passing box body and is communicated with it; Multiple partition door components, which are installed at intervals in the material conveying box body and the heat - uniforming cover body, and are used to divide the upper material conveying component into a matching blanking unit and multiple groups of material conveying units, and divide the material passing box body and the heat - uniforming cover body into a cooling unit and multiple groups of heating units. The cooling unit has a cooling cavity; Each group of the heating units includes a shell with a containing cavity, a heater installed in the containing cavity, an air inlet pipe installed on the shell and communicated with the containing cavity, an air outlet pipe installed on the shell and communicated with the containing cavity, a first flow - guiding cover installed on the inner wall of the shell, a second flow - guiding cover installed on the inner wall of the shell and arranged opposite to the first flow - guiding cover, and a downward air - guiding mechanism installed in the first flow - guiding cover.
2. The high-throughput crystalline silicon-perovskite tandem annealing device according to claim 1, wherein: The first flow - guiding cover has a first air - inlet structure and a first air - outlet structure, and the first air - inlet structure is located above the first air - outlet structure; the second flow - guiding cover has a second air - inlet structure matched with the first air - outlet structure.
3. The high-throughput crystalline silicon-perovskite tandem annealing equipment according to claim 2, characterized in that: The first air - inlet structure, the first air - outlet structure and the second air - inlet structure are independently a through - hole array.
4. The high-throughput crystalline silicon-perovskite tandem annealing equipment according to claim 1 or 2, characterized in that: The downward air - guiding mechanism includes a wind wheel rotatably installed in the first flow - guiding cover, a wind wheel motor connected to the wind wheel to drive its rotation, and a sealing cover body installed on the outer wall of the shell to cover the wind wheel motor.
5. The high-throughput crystalline silicon-perovskite tandem annealing device according to claim 1 or 2, characterized in that: An angle - adjustable first valve is installed in the air inlet pipe, and an angle - adjustable second valve is installed in the air outlet pipe.
6. The high-throughput crystalline silicon-perovskite tandem annealing equipment according to claim 1 or 2, characterized in that: Each group of the heating units further includes a humidifying component, and the humidifying component includes a humidifying water tank installed on the outer wall of the material passing box body and a humidifying steam pipe with one end communicated with the humidifying water tank and the other end extending into the containing cavity.
7. The high-throughput crystalline silicon-perovskite tandem annealing device according to claim 1, characterized in that: The material conveying unit includes a first conveyor belt support frame installed in the material passing box body and a first conveyor belt installed on the first conveyor belt support frame in a recyclable rotation manner. The blanking unit includes a second conveyor belt support frame installed in the material passing box body, a second conveyor belt installed on the second conveyor belt support frame in a recyclable rotation manner, a pair of first centering blocks installed on the inner wall of the second conveyor belt support frame and arranged oppositely, and a first buffer block correspondingly installed on the bottom surface of the pair of first centering blocks.
8. The high-throughput crystalline silicon-perovskite tandem annealing equipment according to claim 1, characterized in that: Each partition door component includes a sealing cushion plate installed on the bottom plate of the material passing box body, two support frames installed on the top of the material passing box body and separating the heat - uniforming cover body, a support cross - plate installed on the top of the support frames, a plurality of guide sleeves installed on the support cross - plate, a partition plate arranged between the two support frames, a plurality of guide rods passing through the guide sleeves and having the lower ends connected to the upper surface of the partition plate, a cylinder installed on the support cross - plate and connected to the partition plate, and a reinforcing plate installed on the top of the plurality of guide rods and avoiding the cylinder.
9. The high-throughput crystalline silicon-perovskite tandem annealing device according to claim 1, characterized in that, It also includes: A lower material conveying component, which is installed below the material passing box body; The material receiving and lifting assembly is arranged at one end of the lower material conveying assembly and the material passing box body, and is used for receiving the materials conveyed by the lower material conveying assembly and feeding them into the material passing box body through the upper material conveying assembly.
10. The high-throughput crystalline silicon-perovskite tandem annealing equipment according to claim 9, wherein: The lower material conveying assembly includes a support frame body, a lower material conveying mechanism installed in the support frame body, a plurality of support feet installed at the bottom of the support frame body, a plurality of rollers installed at the bottom of the support frame body, a plurality of reinforcing rods installed on the bottom surface of the support frame body, and a buckle plate installed on the side surface of the support frame body. The lower material conveying mechanism includes a third conveyor belt support frame installed in the support frame body, a third conveyor belt rotatably installed on the third conveyor belt support frame in a circulating manner, a pair of second centering blocks installed at the discharge end of the third conveyor belt support frame and arranged facing each other, and second buffer blocks correspondingly installed on the bottom surfaces of the pair of second centering blocks.
Citation Information
Patent Citations
Annealing device of crystalline silicon solar cell
CN209104180U