Gas-liquid mixer and liquid material gasification device

Abstract

The invention provides a gas-liquid mixer and a liquid material gasification device. The present invention reduces pressure loss in a gas-liquid mixer, and is provided with: a main body block (2) for mixing a liquid material and a carrier gas; and a control valve (3) that is provided to the main body block (2) and that adjusts the flow rate of the liquid material. An annular liquid material supply groove (M1) in which a supply port (H1) for a liquid material is open on the inner surface, and an annular gas-liquid mixing groove (M2) in which a supply port (H2) for a carrier gas and a lead-out port (H3) for leading out a gas-liquid mixture are open on the inner surface are formed in a valve seat section (21) in a main body block (2), said valve seat section (21) being in contact with or separated from a control valve (3). One of the liquid material supply tank (M1) and the gas-liquid mixing tank (M2) is formed on the inner side of the other.

Description

Technical Field

[0001] The present invention relates to a gas-liquid mixer and a liquid material vaporization device. Background Art

[0002] As a conventional liquid material vaporization device, as described in Patent Document 1, a device is considered that includes: a main body block having a mixing portion for mixing a liquid material and a carrier gas; and a control valve provided in the main body block for adjusting the flow rate of the liquid material. Further, a liquid material introduction passage for introducing the liquid material, a carrier gas introduction passage for introducing the carrier gas, and a gas discharge passage for discharging the gas-liquid mixture of the liquid material and the carrier gas are formed in the main body block.

[0003] Moreover, in this liquid material vaporization device, a ring-shaped recess is formed on the upper surface of the main body block (the valve seat surface where the control valve contacts or separates), and an opening on the downstream side of the liquid material introduction passage is formed on the bottom surface of the ring-shaped recess. Further, a linearly elongated groove is formed inside the ring-shaped recess, and an opening on the downstream side of the carrier gas introduction passage and a hole leading to the gas discharge passage of the gas-liquid mixture are formed in the groove.

[0004] However, since the mixing portion for mixing the liquid material and the carrier gas is a linearly elongated groove and the mixing portion is a limited space, the pressure loss in the mixing portion becomes large. As a result, there is a problem that it is difficult to flow a large flow rate of gas-liquid mixture. Prior Art Documents Patent Documents

[0005] Patent Document 1: Japanese Patent Laid-Open Gazette No. 4393677 Summary of the Invention Problems to be Solved by the Invention

[0006] Therefore, the present invention has been completed to solve the above problems, and the problem thereof is to reduce the pressure loss in the gas-liquid mixer. Means for Solving the Problems

[0007] That is, the liquid material vaporization device of the present invention is a gas-liquid mixer that mixes a liquid material and a carrier gas to generate a gas-liquid mixture, and is characterized by including: a main body block for mixing the liquid material and the carrier gas; and a control valve provided in the main body block for adjusting the flow rate of the liquid material. A ring-shaped liquid material supply groove having an opening of the supply port of the liquid material on the inner surface and a ring-shaped gas-liquid mixing groove having an opening of the supply port of the carrier gas and an outlet of the gas-liquid mixture on the inner surface are formed in a valve seat portion where the control valve abuts or separates in the main body block, and one of the liquid material supply groove and the gas-liquid mixing groove is formed inside the other.

[0008] According to such a liquid material vaporization device, one of the annular liquid material supply tank and the annular gas-liquid mixing tank is formed inside the other, so that the liquid material and the carrier gas can be mixed over a larger area than before, and the pressure loss in the mixing section can be reduced. As a result, a large-flow gas-liquid mixture can flow.

[0009] Preferably, the liquid material supply tank and the gas-liquid mixing tank are circular rings. According to this structure, each tank is circular, so that the pressure loss can be reduced and the retention in each tank can be reduced.

[0010] In order to allow a large-flow gas-liquid mixture to flow, preferably, at least one of the liquid material supply tank and the gas-liquid mixing tank is formed with a plurality of them.

[0011] Preferably, a plurality of the liquid material supply tanks and the gas-liquid mixing tanks are alternately formed. According to this structure, the liquid material can easily flow from the liquid material supply tank to the gas-liquid mixing tank.

[0012] Preferably, in the gas-liquid mixing tank, the supply port of the carrier gas and the outlet port of the gas-liquid mixture are formed on both sides across the center. According to this structure, the flow path of the carrier gas can be extended in the gas-liquid mixing tank, and the liquid material and the carrier gas in the gas-liquid mixing tank can be easily mixed.

[0013] Preferably, in the liquid material supply tank, the supply port of the liquid material is formed on a line orthogonal to the line connecting the supply port of the carrier gas and the outlet port of the gas-liquid mixture. According to this structure, the liquid material flow path, the carrier gas flow path, and the gas-liquid mixture flow path formed inside the main body block can be easily formed. In addition, the liquid material can be effectively introduced between the supply port of the carrier gas and the outlet port of the gas-liquid mixture in the gas-liquid mixing tank.

[0014] In addition, the liquid material vaporization device of the present invention is characterized by including: the above-mentioned gas-liquid mixer; and a vaporizer that heats the gas-liquid mixture to vaporize the liquid material. Advantages of the Invention

[0015] In this way, according to the present invention, the pressure loss in the gas-liquid mixer can be reduced. Brief Description of the Drawings

[0016] Figure 1 It is a diagram schematically showing the structure of a liquid material vaporization device according to an embodiment of the present invention. Figure 2 It is a top view of the main body block of the gas-liquid mixer of the same embodiment. Figure 3 is a perspective view of the main body block of the gas-liquid mixer of the same embodiment. Figure 4 is a top view of the main body block of the gas-liquid mixer of the modified embodiment. Figure 5 is a perspective view of the main body block of the gas-liquid mixer of the modified embodiment. Figure 6 is a top view of the main body block of the gas-liquid mixer of the modified embodiment. Specific Embodiment

[0017] Hereinafter, an embodiment of the liquid material vaporization device of the present invention will be described with reference to the accompanying drawings. In addition, for ease of understanding, any of the figures shown below is schematically depicted in a manner of appropriate omission or exaggeration. The same reference numerals are assigned to the same components and the description is appropriately omitted.

[0018] <Basic Structure of Liquid Material Vaporization Device 100> The liquid material vaporization device 100 of the present embodiment is used, for example, to supply a gas of a specified flow rate to a chamber or the like assembled in a semiconductor production line and used in a semiconductor manufacturing process.

[0019] Specifically, as Figure 1 shown, the liquid material vaporization device 100 includes: a gas-liquid mixer 10 that mixes a liquid material and a carrier gas to generate a gas-liquid mixture; and a vaporizer 20 that is introduced with the gas-liquid mixture and vaporizes the liquid material contained in the gas-liquid mixture.

[0020] <Gas-Liquid Mixer 10> As Figure 2 shown, the gas-liquid mixer 10 includes: a main body block 2 having a mixing portion 2x that mixes a liquid material and a carrier gas; and a control valve 3 provided on the main body block 2 to adjust the flow rate of the liquid material.

[0021] As Figure 2 and Figure 3 shown, a liquid material flow path 2a for the liquid material to flow, a carrier gas flow path 2b for the carrier gas to flow, and a gas-liquid mixture flow path 2c for the gas-liquid mixture to flow are formed in the main body block 2. Further, each of the flow paths 2a, 2b, and 2c opens at a valve seat portion 21 formed on the upper surface of the main body block 2 where the control valve 3 abuts or separates. In the valve seat portion 21 of the main body block 2, the converging portion of the carrier gas flow path 2b and the gas-liquid mixture flow path 2c becomes the mixing portion 2x of the liquid material and the carrier gas. In addition, the detailed structure of the valve seat portion 21 of the main body block 2 will be described later.

[0022] The control valve 3 functions as a flow control valve, as Figure 1As shown, it is provided on the upper surface of the main body block 2 via a sealing member (not shown). The control valve 3 includes: a diaphragm 31 as a valve core portion, which abuts against or separates from the valve seat portion 21 of the main body block 2; and an actuator 32 that presses the diaphragm 31 to deform it. Additionally, the actuator 32 uses a piezoelectric stack, for example.

[0023] In addition, as Figure 2 and Figure 3 shown, etc., a liquid material supply pipe 4 for supplying a liquid material to the liquid material flow path 2a, a carrier gas supply pipe 5 for supplying a carrier gas to the carrier gas flow path 2b, and a gas-liquid mixture discharge pipe 6 for discharging the gas-liquid mixture from the gas-liquid mixture flow path 2c are connected to the main body block 2.

[0024] A mass flow meter (not shown) for measuring the flow rate of the liquid material flowing in the liquid material supply pipe 4 is provided on the upstream side of the liquid material supply pipe 4. And, based on the measured value of this mass flow meter, feedback control is performed on the control valve 3 so that the liquid material supplied to the mixing section 2x becomes a specified flow rate. In addition, a mass flow controller for adjusting the flow rate of the carrier gas flowing in the carrier gas supply pipe 5 is provided on the upstream side of the carrier gas supply pipe 5.

[0025] <Vaporizer 20> As Figure 1 shown, the vaporizer 20 includes a heating block 7, and the heating block 7 has a heating flow path HS for heating the gas-liquid mixture generated by the gas-liquid mixer 10. In addition, the vaporizer 20 has a structure in which the gas-liquid mixture is sprayed into the heating flow path HS by using a nozzle portion N to promote the vaporization of the liquid material.

[0026] A heater 8 for heating the gas-liquid mixture flowing in the heating flow path HS is built into the heating block 7. The heating block 7 is made of a metal for heat conduction (such as aluminum). The upstream end of the heating flow path HS is connected to the gas-liquid mixture discharge pipe 6. In addition, the downstream end of the heating flow path HS is connected to a discharge port 9 for discharging the vaporized gas after the liquid material is vaporized.

[0027] <Specific structure of the gas-liquid mixer 10 (detailed structure of the valve seat portion 21)> Next, the detailed structure of the valve seat portion 21 in the gas-liquid mixer 10 of the present embodiment will be described.

[0028] In the valve seat portion 21 of the present embodiment, a ring-shaped liquid material supply groove M1 in which a supply port H1 of the liquid material opens on the inner surface (here, the bottom surface), and a ring-shaped gas-liquid mixing groove M2 that serves as a mixing portion 2x in which a supply port H2 of the carrier gas and a discharge port H3 of the gas-liquid mixture open on the inner surface (here, the bottom surface) are formed. In addition, the supply port H1 of the liquid material may be configured to open on the side surface of the liquid material supply groove M1, and the discharge port H3 of the gas-liquid mixture may be configured to open on the side surface of the gas-liquid mixing groove M2.

[0029] In the liquid material supply groove M1 of the present embodiment, one supply port H1 of the liquid material is formed, and the supply port H1 of the liquid material communicates with the liquid material flow path 2a. In addition, in the gas-liquid mixing groove M2, one supply port H2 of the carrier gas is formed, and the supply port H2 of the carrier gas communicates with the carrier gas flow path 2b. Further, in the gas-liquid mixing groove M2, one discharge port H3 of the gas-liquid mixture is formed, and the discharge port H3 of the gas-liquid mixture communicates with the gas-liquid mixture flow path 2c. In addition, two or more supply ports H1 of the liquid material may be formed in the liquid material supply groove M1, two or more supply ports H2 of the carrier gas may be formed in the gas-liquid mixing groove M2, and two or more discharge ports H3 of the gas-liquid mixture may be formed.

[0030] Moreover, when viewed from above, one of the liquid material supply groove M1 and the gas-liquid mixing groove M2 is formed inside the other in the liquid material supply groove M1 and the gas-liquid mixing groove M2. Specifically, the liquid material supply groove M1 and the gas-liquid mixing groove M2 are formed concentrically in the valve seat portion 21 when viewed from above. In addition, the concentric shape includes not only a structure in which the centers of the liquid material supply groove M1 and the gas-liquid mixing groove M2 are completely coincident, but also a structure in which they are slightly offset. In addition, the liquid material supply groove M1 and the gas-liquid mixing groove M2 are circular rings when viewed from above. In the present embodiment, they are formed in concentric circles with the liquid material supply groove M1 on the outside and the gas-liquid mixing groove M2 on the inside.

[0031] In the present embodiment, in the gas-liquid mixing groove M2, the supply port H2 of the carrier gas and the discharge port H3 of the gas-liquid mixture are formed on both sides with the center therebetween. Thus, the carrier gas supplied from the supply port H2 of the carrier gas is divided into two parts and flows toward the discharge port H3 of the gas-liquid mixture from the supply port H2 of the carrier gas. In addition, in the liquid material supply groove M1, the supply port H1 of the liquid material is formed on a line orthogonal to the line connecting the supply port H2 of the carrier gas and the discharge port H3 of the gas-liquid mixture. According to this structure, in the main body block 2, the carrier gas flow path 2b and the gas-liquid mixture flow path 2c can be formed on the same straight line, and the liquid material flow path 2a can be formed orthogonal to these flow paths 2b and 2c. Thus, it is easy to form the respective flow paths 2a to 2c with respect to the main body block 2.

[0032] In the structure of the valve seat portion 21 described above, the upper surface of the partition portion T1 formed between the liquid material supply groove M1 and the gas-liquid mixing groove M2 serves as the valve seat surface 21a. In addition, the upper surface of the central portion formed inside the gas-liquid mixing groove M2 serves as the valve seat surface 21a.

[0033] Moreover, in the state where the control valve 3 is in contact with the valve seat surface 21a (closed valve state), the liquid material supply groove M1 and the gas-liquid mixing groove M2 are partitioned, and the supply of the liquid material to the gas-liquid mixing groove M2 is stopped. In this state, carrier gas is supplied to the gas-liquid mixing groove M2 from the carrier gas supply port H2, and the carrier gas flows out from the gas-liquid mixture outlet H3.

[0034] On the other hand, in the state where the control valve 3 is separated from the valve seat surface 21a (open valve state), the liquid material supply groove M1 communicates with the gas-liquid mixing groove M2, and the liquid material is supplied to the gas-liquid mixing groove M2. By adjusting the opening degree of the control valve 3 (the distance separated from the valve seat surface 21a), the flow rate of the liquid material flowing into the gas-liquid mixing groove M2 is adjusted. Specifically, the liquid material is supplied to the liquid material supply groove M1 from the liquid material supply port H1, and the liquid material flows into the gas-liquid mixing groove M2 from the liquid material supply groove M1 in the entire circumferential direction. At this time, the liquid material is mixed with the carrier gas on the partition portion T1 or in the gas-liquid mixing groove M2. Then, the gas-liquid mixture flows out from the gas-liquid mixture outlet H3.

[0035] <Effect of this Embodiment> In this way, according to the liquid material vaporization device 100 in this embodiment, one of the annular liquid material supply groove M1 and the annular gas-liquid mixing groove M2 is formed inside the other, so that the liquid material and the carrier gas can be mixed with a larger area than in the past, and the pressure loss in the mixing portion 2x can be reduced. As a result, a gas-liquid mixture with a large flow rate can be made to flow.

[0036] <Other Embodiments> For example, as Figure 4 and Figure 5 shown, at least one of the plurality of liquid material supply grooves M1 and gas-liquid mixing grooves M2 may be formed. In Figure 4 and Figure 5 an example in which two annular liquid material supply grooves M1 and two annular gas-liquid mixing grooves M2 are formed is shown. Here, an example in which the circular liquid material supply groove M1 and the circular gas-liquid mixing groove M2 are formed in concentric circles in order from the outside is shown. In addition, a circular liquid material supply groove M11 is formed inside the innermost gas-liquid mixing groove M2. In the structure of the valve seat portion 21, the upper surface of the partition portion formed between the liquid material supply grooves M1, M11 and the gas-liquid mixing groove M2 serves as the valve seat surface.

[0037] Moreover, the supply ports H1 of the liquid materials formed on the bottom surfaces of the respective liquid material supply tanks M1 and M11 communicate with the liquid material flow path 2a. In addition, the supply ports H2 of the carrier gas formed on the bottom surfaces of the respective gas-liquid mixing tanks M2 communicate with the carrier gas flow path 2b. Further, the discharge ports H3 of the gas-liquid mixture formed on the bottom surfaces of the respective gas-liquid mixing tanks M2 communicate with the gas-liquid mixture flow path 2c.

[0038] Moreover, in a state where the control valve 3 abuts against the valve seat surface (closed valve state), the plurality of liquid material supply tanks M1 and M11 and the plurality of gas-liquid mixing tanks M2 are partitioned, and the supply of the liquid material to the gas-liquid mixing tanks M2 is stopped. In this state, the carrier gas is supplied from the supply port H2 of the carrier gas to the plurality of gas-liquid mixing tanks M2, and the carrier gas flows out from the discharge port H3 of the gas-liquid mixture.

[0039] On the other hand, in a state where the control valve 3 is separated from the valve seat surface (open valve state), the plurality of liquid material supply tanks M1 and M11 communicate with the plurality of gas-liquid mixing tanks M2, and the liquid material is supplied to the plurality of gas-liquid mixing tanks M2. Specifically, the liquid material is supplied from the supply port H1 of the liquid material to the plurality of liquid material supply tanks M1 and M11, and the liquid material flows into the plurality of gas-liquid mixing tanks M2 from the plurality of liquid material supply tanks M1 and M11 in the entire circumferential direction. At this time, the liquid material is mixed with the carrier gas in the partition portion or in the gas-liquid mixing tank M2. Then, the gas-liquid mixture flows out from the discharge port H3 of the gas-liquid mixture.

[0040] Furthermore, as Figure 6 shown, an annular gas-liquid mixing tank M2 may be formed on the outside, an annular liquid material supply tank M1 may be formed on the inside, and a linear gas-liquid mixing tank M21 may be formed inside the annular liquid material supply tank M1. The gas-liquid mixing tank M21 is formed with a supply port H2 of the carrier gas and a discharge port H3 of the gas-liquid mixture.

[0041] In the above-described embodiment and the like, the arrangement of the liquid material supply tank M1 and the gas-liquid mixing tank M2 may be reversed.

[0042] On this basis, neither the liquid material supply tank M1 nor the gas-liquid mixing tank M2 is limited to a circular ring shape when viewed from above, and it can also be various shapes such as an elliptical shape, an oblong shape, a rectangular shape, etc. when viewed from above. In addition, either the liquid material supply tank M1 or the gas-liquid mixing tank M2 can be in a form in which a part of the circular ring, such as a C-shaped form, is cut off in addition to the tank that is continuous over the entire circumference. That is, in the present invention, a form in which a part of the ring is cut off is also included in the concept of a circular ring. For example, when the gas-liquid mixing tank M2 is formed in a form in which a part of the circular ring, such as a C-shaped form, is cut off, a carrier gas supply port H2 can be formed at one circumferential end of the gas-liquid mixing tank M2, and a gas-liquid mixture outlet port H3 can be formed at the other circumferential end of the gas-liquid mixing tank M2. In addition, one of the carrier gas supply port H2 and the gas-liquid mixture outlet port H3 can be formed at the circumferential center of the gas-liquid mixing tank M2, and the other of the carrier gas supply port H2 and the gas-liquid mixture outlet port H3 can be formed at each of the two circumferential ends of the gas-liquid mixing tank M2, respectively.

[0043] In addition, as long as it does not violate the gist of the present invention, various modifications and combinations of the embodiments can also be made. Explanation of reference numerals:

[0044] 100: Liquid material vaporization device; 10: Gas-liquid mixer; 20: Vaporizer; 2: Main body block; 3: Control valve; 21: Valve seat portion M1: Liquid material supply tank; H1: Liquid material supply port; M2: Gas-liquid mixing tank (mixing portion); H2: Carrier gas supply port; H3: Gas-liquid mixture outlet port.

Claims

1. A gas-liquid mixer that mixes a liquid material and a carrier gas to generate a gas-liquid mixture, characterized in that, Comprising: A main body block for mixing the liquid material and the carrier gas; and A control valve provided in the main body block to adjust the flow rate of the liquid material, In the valve seat portion where the control valve in the main body block abuts or separates, a ring-shaped liquid material supply groove with an inner surface opening of the supply port of the liquid material formed therein, and a ring-shaped gas-liquid mixing groove with an inner surface opening of the supply port of the carrier gas and the outlet of the gas-liquid mixture formed therein, One of the liquid material supply groove and the gas-liquid mixing groove is formed inside the other.

2. The gas-liquid mixer according to claim 1, characterized in that The liquid material supply groove and the gas-liquid mixing groove are in a circular ring shape.

3. The gas-liquid mixer according to claim 1 or 2, characterized in that At least one of the liquid material supply groove and the gas-liquid mixing groove is formed in plurality.

4. The gas-liquid mixer according to any one of claims 1 to 3, characterized in that A plurality of the liquid material supply grooves and the gas-liquid mixing grooves are alternately formed.

5. The gas-liquid mixer according to any one of claims 1 to 4, characterized in that In the gas-liquid mixing groove, the supply port of the carrier gas and the outlet of the gas-liquid mixture are formed on both sides across the center.

6. The gas-liquid mixer according to claim 5, characterized in that In the liquid material supply groove, the supply port of the liquid material is formed on a line orthogonal to the line connecting the supply port of the carrier gas and the outlet of the gas-liquid mixture.

7. A vaporization device for liquid materials, characterized in that, Comprising: The gas-liquid mixer according to any one of claims 1 to 6; and A vaporizer for heating the gas-liquid mixture to vaporize the liquid material.

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