Rotating mechanism of vacuum evaporator

By designing a removable lower hanging connector and support device in a vacuum evaporation machine, combined with magnetic fluid and multi-stage transmission system, the problem of complex and heavy load removal of traditional rotary mechanisms is solved, and the effect of rapid disassembly and stable rotation is achieved.

CN120400786APending Publication Date: 2025-08-01SUZHOU YOULUN VACUUM EQUIP TECH CO LTD
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Patent Information

Application Number
CN202510665907.8
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-05-22
Publication Date
2025-08-01

AI Technical Summary

Technical Problem

The rotary mechanism of traditional vacuum evaporators is complicated to disassemble and difficult to compatible with heavy loads, resulting in time-consuming maintenance and easy damage to the seal structure.

Method used

A rotating mechanism of a vacuum evaporation machine is designed, using a detachable lower hanging connector and support device, which can be quickly separated by lifting and rotating. Combining a magnetic fluid and a multi-stage transmission system to ensure the smooth rotation of the rotating shaft and vacuum sealing.

Benefits of technology

It realizes rapid disassembly and maintenance of the rotating mechanism, improves maintenance efficiency, avoids damage to the sealing structure and power loss, and ensures rotation stability and safety.

✦ Generated by Eureka AI based on patent content.

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Abstract

The rotating mechanism comprises a rotating device, the upper portion of the rotating device penetrates through a shell of the vacuum evaporator to be connected with an external driver, the lower portion of the rotating device is connected with a supporting assembly, and the supporting assembly comprises an upper supporting ring and a lower supporting ring; the upper supporting ring is connected with the rotating device through a supporting connecting assembly, the lower supporting ring is used for bearing a carrier to be coated, and a plurality of lower hanging connecting pieces convenient to disassemble are arranged between the upper supporting ring and the lower supporting ring. The lower hanging connecting piece comprises a lower hanging device connected with the lower supporting ring and a bearing device connected with the upper supporting ring, the lower hanging device is detachably connected with the bearing device, when the lower hanging device and the bearing device need to be separated, the lower hanging device and the bearing device can be rapidly separated only by lifting and rotating, and the maintenance efficiency is remarkably improved.
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Description

Technical Field

[0001] The present invention relates to the technical field of vacuum evaporation machines. More specifically, it relates to a rotating mechanism of a vacuum evaporation machine, especially a rotating support system suitable for carrying heavy carriers 300 and achieving efficient disassembly and maintenance. Background Art

[0002] Vacuum evaporation machines are widely used in fields such as optical thin films and semiconductor coatings. Their rotating mechanisms need to stably carry and drive workpieces to be coated in a vacuum environment. The traditional rotating mechanisms have the following problems: Complicated disassembly: The support components are mostly fixed by bolts. During maintenance, it is necessary to disassemble layer by layer, which is time-consuming and prone to damage the sealing structure.

[0003] In the prior art, for example, CN112626486B discloses a vacuum evaporation machine. The present application proposes a vacuum evaporation machine, including: an evaporation machine body, a heating lamp structure, a plating pot structure, a water-cooled heat insulation mechanism, a crucible, an ion source, a control mechanism, and a driving mechanism. The interior of the evaporation machine body is divided into an evaporation chamber and a control component chamber. The heating lamp structure, the plating pot structure, the water-cooled heat insulation mechanism, the crucible, the ion source, and the driving mechanism are all arranged in the evaporation chamber, and the control mechanism is arranged in the control component chamber. The driving mechanism includes a motor and a vacuum pump group. A main valve chamber is provided on one side of the evaporation chamber. A vacuum pump group communicated with the main valve chamber through a vacuum tube is provided at the lower part of the main valve chamber. The vacuum pump group is located on a bracket outside the evaporation machine body. The evaporation chamber is a hollow cylinder or a hollow ellipsoid cylinder. There are 3 umbrella frames of the plating pot structure. A baffle plate arranged on the inner wall of the side surface of the evaporation chamber can be hooked and fixed and disassembled with the inner wall of the side surface of the evaporation chamber, but the compatibility problem of rapid disassembly and heavy load bearing is not solved.

[0004] Therefore, there is an urgent need for a rotating mechanism with efficient maintenance. Summary of the Invention

[0005] In view of this, to solve the above problems, the present invention provides a rotating mechanism for a vacuum evaporation coater, which includes a rotating device 100. The upper part of the rotating device 100 passes through the housing of the vacuum evaporation coater and is connected to an external driver. The lower part of the rotating device 100 is connected to a support assembly 200. The support assembly 200 includes an upper support ring 210 and a lower support ring 220. The upper support ring 210 is connected to the rotating device 100 through a support connection assembly 211. The lower support ring 220 is used to support a carrier 300 to be coated. A plurality of easily detachable hanging connectors are provided between the upper support ring 210 and the lower support ring 220. The hanging connectors include a hanging device 222 connected to the lower support ring 220 and a supporting device 217 connected to the upper support ring 210. The hanging device 222 and the supporting device 217 are detachably connected. When it is necessary to separate the hanging device 222 from the supporting device 217, only lifting and rotating are required to quickly separate them, significantly improving the maintenance efficiency.

[0006] A rotating mechanism for a vacuum evaporation coater includes a rotating device 100. The upper part of the rotating device 100 passes through the housing of the vacuum evaporation coater and is connected to an external driver. The lower part of the rotating device 100 is connected to a support assembly 200. It is characterized in that: the support assembly 200 includes an upper support ring 210 and a lower support ring 220. The upper support ring 210 is connected to the rotating device 100 through a support connection assembly 211. The lower support ring 220 is used to support a carrier 300 to be coated. A plurality of easily detachable hanging connectors are provided between the upper support ring 210 and the lower support ring 220. The hanging connectors include a hanging device 222 connected to the lower support ring 220 and a supporting device 217 connected to the upper support ring 210. The hanging device 222 and the supporting device 217 are detachably connected. When it is necessary to separate the hanging device 222 from the supporting device 217, only need to lift the lower support ring 220 upward and rotate it at a small angle to separate the hanging device 222 from the supporting device 217, realizing quick disassembly.

[0007] When coating is required, the carrier 300 to be coated is located directly above the crucible. The crucible evaporates the film material upward to the lower part of the carrier sheet installed on the carrier 300 to be coated. At the same time, due to the heavy weight of the carrier 300 to be coated itself and the frictional force between it and the hanging device 222, it will rotate as the support frame rotates.

[0008] Further, the rotating device 100 includes a housing 103 disposed outside it. The housing 103 encloses an internal chamber for accommodating a rotating shaft 101. A connecting ring 104 extends outward from the outer wall of the housing 103 for locking with the housing of the vacuum evaporation coater to fix the rotating device 100.

[0009] In some embodiments, a magnetorheological fluid 105 is provided at the outer shell 103. The housing of the magnetorheological fluid 105 is mounted together with the outer shell 103. A shaft of the magnetorheological fluid 105 is sleeved in the middle of the magnetorheological fluid 105. The upper end of the shaft of the magnetorheological fluid 105 is placed outside the housing of the vacuum evaporation coater, and the lower end of the shaft of the magnetorheological fluid 105 is placed in the internal chamber. A rotating gear 102 is provided on the rotating shaft 101. The rotating gear 102 is connected to a second gear 106 connected to the lower end of the shaft of the magnetorheological fluid 105, and the rotating gear 102 is connected to a second synchronous pulley connected to the upper end of the shaft of the magnetorheological fluid 105. The second synchronous pulley is connected to a synchronous pulley 107 on an external driver through a synchronous belt. By driving the synchronous pulley 107 to rotate with a motor, the second synchronous pulley is driven to rotate in sequence. The second synchronous pulley drives the second gear 106 to rotate, so that the rotating gear 102 rotates to drive the rotating shaft 101 to rotate, forming a multi-stage transmission system to ensure the stable rotation of the rotating shaft 101. The combination of the multi-stage transmission of the shaft of the magnetorheological fluid 105 and the synchronous pulley ensures stable power transmission while ensuring vacuum tightness, and solves the problem that the connection between the traditional rotating shaft 101 and the drive system is prone to air leakage or power loss due to insufficient vacuum sealing.

[0010] In some embodiments, the support connection assembly 211 includes a plurality of support connectors 212. One end of the support connector 212 is perpendicularly and fixedly connected to the rotating shaft 101, and the other end is perpendicularly and fixedly connected to the upper support ring 210. The support connectors 212 divide the upper support ring 210 into a plurality of equally divided fan-shaped regions with the rotating shaft 101 as the center.

[0011] Furthermore, the support connector 212 includes a support bending plate 213 and a first anti-adhesion plate 214 sleeved thereon. The support bending plate 213 is a concave structure with an upward opening. The opening is matched and locked with the first anti-adhesion plate 214 of the downward-bent concave structure. During the upward evaporation coating process of the crucible, sometimes the carrier 300 to be coated is not fully filled with the wafers to be coated, so there will be some positions without wafers to be coated, and the coating material will pass through this position and evaporate upward to the support bending plate 213. Since the support bending plate 213 is difficult to install and cannot be disassembled and assembled frequently, the function of the first anti-adhesion plate 214 is to prevent the support bending plate 213 from adhering to the coating material. Once there is too much coating material on the support bending plate 213, there will be a risk of falling, that is, falling onto the carrier 300 to be coated, thus affecting the coating uniformity of the carrier 300 to be coated. Secondly, during the rotating coating process, if there is too much coating material on the support bending plate 213, it will splash around the coating equipment, and the life of some components will be affected after coating. Therefore, once there is too much coating material on the first anti-adhesion plate 214, it can be disassembled and a new first anti-adhesion plate 214 can be installed to solve this problem.

[0012] Further, through holes 216 are provided at both the first anti-deposition plate 214 and its corresponding support bending plate 213. The through holes 216 of the first anti-deposition plate 214 are arranged in one-to-one correspondence with the through holes 216 of its corresponding support bending plate 213 and are in a communicating state. A downward chamfer is provided at the first anti-deposition plate 214 near the upper support ring 210. The chamfer and through holes 216 of the first anti-deposition plate 214 are designed to reduce the deposition of the coating film.

[0013] Further, sub-plates 215 are symmetrically arranged inside the first anti-deposition plate 214. A clamping chamber for clamping one side of the support bending plate 213 is formed between one side of each first anti-deposition plate 214 and its adjacent sub-plate 215. Since through holes 216 are provided at both the first anti-deposition plate 214 and its corresponding support bending plate 213, after the clamping chamber is provided, the through holes 216 of the first anti-deposition plate 214 can be made to correspond to the through holes 216 of the support bending plate 213 one by one without repeated alignment. At the same time, the threaded holes of the first anti-deposition plate 214 and the support bending plate 213 do not need to be repeatedly aligned, which is convenient for installation.

[0014] In some embodiments, one end of the supporting device 217 is bent inward and detachably connected to the bottom of the support bending plate 213. The other end of the supporting device 217 is bent outward to form a supporting position 218, and the supporting position 218 is a concave hole.

[0015] Further, the hanging device 222 includes a thimble structure 224 with a detachable upper end. When the hanging device 222 is connected to the supporting device 217, the lower end of the thimble is embedded in the concave hole to achieve guiding and limiting. Depending on the taper fit between the lower end of the thimble and the concave hole and combined with the gravity of the carrier 300, the lower support ring 220 will not come out due to inertia at the start and stop of rotation.

[0016] Further, an adjustment hole is provided at the position where the hanging device 222 installs the thimble structure 224. The thimble structure 224 passes through the adjustment hole and slides in the adjustment hole and is connected to the adjustment mechanism 225. Through the adjustment mechanism 225, the length of the thimble structure 224 relative to the lower part of the hanging device 222 is adjusted. The adjustment of the height is to compensate for the errors in the processing and assembly processes to ensure that the entire carrier 300 is in a horizontal state during use.

[0017] Further, the position where the hanging device 222 installs the thimble structure 224 is a convex block 223 perpendicular to the body of the hanging device 222. The protruding position of the convex block 223 is opposite to the rotation direction of the carrier 300. The convex block 223 and the supporting position 218 are arranged in an interleaved manner. While avoiding interference, it plays a secondary protection role when the thimble mechanism fails.

[0018] Further, the connection between the hanging device 222 and the lower support ring 220 is a large-headed T-shape, which is used to strengthen the strength of the connection.

[0019] Further, a sunken ring 221 is provided at the inner ring of the lower support ring 220, which is used to support the outer edge of the carrier 300 to be coated, and to clamp the carrier 300 to be coated, so as to prevent the carrier 300 to be coated from detaching from the support due to centrifugal force during rotation, and to solve the problem that the heavy carrier 300 is prone to detachment from the support due to centrifugal force during high-speed rotation, which poses a safety hazard.

[0020] Further, a sloping plate 227 is provided in a circle at the inner wall of the second anti-evaporation plate 226 close to the sunken ring 221. The design of the sloping plate 227 is used to reduce the weight of the lower support ring 220.

[0021] Further, a second anti-evaporation plate 226 is provided in a circle at the lower part of the lower support ring 220. The second anti-evaporation plate 226 includes a part extending downward from the periphery of the lower support ring 220, a part fixedly connected to the lower part of the lower support ring 220, and a part fixedly connected to the sloping plate 227, which is used to prevent the evaporation material from evaporating onto the lower support ring 220. The cost of replacing and cleaning the lower support ring 220 is very high, and it is more economical to only replace the anti-evaporation plate.

[0022] The beneficial effects of the present invention: The present invention provides a rotating mechanism of a vacuum evaporation machine, which includes a rotating device 100. The upper part of the rotating device 100 passes through the housing of the vacuum evaporation machine and is connected to an external driver. The lower part of the rotating device 100 is connected to a support assembly 200. The support assembly 200 includes an upper support ring 210 and a lower support ring 220. The upper support ring 210 is connected to the rotating device 100 through a support connection assembly 211. The lower support ring 220 is used to support the carrier 300 to be coated. A plurality of detachable hanging connectors are provided between the upper support ring 210 and the lower support ring 220. The hanging connectors include a hanging device 222 connected to the lower support ring 220 and a supporting device 217 connected to the upper support ring 210. The hanging device 222 and the supporting device 217 are detachably connected. When it is necessary to separate the hanging device 222 from the supporting device 217, only need to lift and rotate to quickly separate, which significantly improves the maintenance efficiency. Description of the Drawings

[0023] Figure 1 It is the overall structure diagram of the rotating mechanism of the vacuum evaporation machine of the present invention.

[0024] Figure 2 It is the exploded view of the rotating mechanism of the vacuum evaporation machine of the present invention.

[0025] Figure 3 Vertical sectional view of the rotating device of the rotating mechanism of the vacuum evaporation machine of the present invention.

[0026] Figure 4 Cross-sectional view of the support assembly of the rotating device of the rotating mechanism of the vacuum evaporation machine of the present invention.

[0027] Figure 5 Horizontal sectional view of the support assembly of the rotating device of the rotating mechanism of the vacuum evaporation machine of the present invention.

[0028] Description of main component symbols

[0029] Rotating device 100, rotating shaft 101, rotating gear 102, housing 103, connecting ring 104, magnetic fluid 105, second gear 106, synchronous pulley 107, support assembly 200, upper support ring 210, support connection assembly 211, support connecting piece 212, support bending plate 213, first anti-adhesion plate 214, sub-plate 215, through hole 216, supporting device 217, supporting position 218, lower support ring 220, sunken ring 221, lower hanging device 222, convex block 223, thimble structure 224, adjusting mechanism 225, second anti-adhesion plate 226, inclined plate 227, carrier 300.

[0030] The following specific embodiments will further illustrate the present invention in conjunction with the above-mentioned drawings. Specific embodiments Embodiment 1:

[0031] As Figure 1-2 shown, a rotating mechanism of a vacuum evaporation machine includes a rotating device 100. The upper part of the rotating device 100 passes through the housing of the vacuum evaporation machine and is connected to an external driver. The lower part of the rotating device 100 is connected to a support assembly 200. It is characterized in that: the support assembly 200 includes an upper support ring 210 and a lower support ring 220. The upper support ring 210 is connected to the rotating device 100 through a support connection assembly 211. The lower support ring 220 is used to support the carrier 300 to be coated. A plurality of detachable lower hanging connectors are arranged between the upper support ring 210 and the lower support ring 220. The lower hanging connectors include a lower hanging device 222 connected to the lower support ring 220 and a supporting device 217 connected to the upper support ring 210. The lower hanging device 222 and the supporting device 217 are detachably connected. When it is necessary to separate the lower hanging device 222 from the supporting device 217, only need to lift the lower support ring 220 upward and rotate it at a small angle, then the lower hanging device 222 can be separated from the supporting device 217, realizing quick disassembly.

[0032] When coating is required, since the weight of the carrier 300 to be coated is very heavy, plus the frictional force between it and the hanging device 222, it will rotate as the support frame rotates.

[0033] The rotating device 100 includes a housing 103 disposed outside thereof. The housing 103 encloses an internal chamber for accommodating the rotating shaft 101. A connecting ring 104 extends outward from the outer wall of the housing 103 for locking with the housing of the vacuum evaporation machine to fix the rotating device 100.

[0034] The support connection assembly 211 includes a plurality of support connectors 212. One end of the support connector 212 is perpendicularly and fixedly connected to the rotating shaft 101, and the other end is perpendicularly and fixedly connected to the upper support ring 210. The support connectors 212 divide the upper support ring 210 into a plurality of equally divided fan-shaped regions centered on the rotating shaft 101.

[0035] One end of the supporting device 217 is bent inward and detachably connected to the bottom of the supporting bending plate 213. The other end of the supporting device 217 is bent outward to form a supporting position 218, and the supporting position 218 is a concave hole.

[0036] As Figure 3 As shown, a magnetic fluid 105 is provided at the housing 103. The housing of the magnetic fluid 105 is installed together with the housing 103. A shaft of the magnetic fluid 105 is sleeved in the middle of the magnetic fluid 105. The upper end of the shaft of the magnetic fluid 105 is placed outside the housing of the vacuum evaporation machine, and the lower end of the shaft of the magnetic fluid 105 is placed in the internal chamber. A rotating gear 102 is provided on the rotating shaft 101. The rotating gear 102 is connected to a second gear 106 connected to the lower end of the shaft of the magnetic fluid 105. The rotating gear 102 is connected to a second synchronous pulley connected to the upper end of the shaft of the magnetic fluid 105. The second synchronous pulley is connected to a synchronous pulley 107 on an external driver through a synchronous belt. By driving the synchronous pulley 107 to rotate by a motor, the second synchronous pulley is driven to rotate in sequence. The second synchronous pulley drives the second gear 106 to rotate, so that the rotating gear 102 rotates to drive the rotating shaft 101 to rotate, forming a multi-stage transmission system to ensure the smooth rotation of the rotating shaft 101. The combination of the shaft of the magnetic fluid 105 and the multi-stage transmission of the synchronous pulley ensures stable power transmission while ensuring vacuum tightness, and solves the problem that the connection between the traditional rotating shaft 101 and the drive system is prone to air leakage or power loss due to insufficient vacuum seal.

[0037] As Figure 4-5As shown, the support connecting member 212 includes a support bending plate 213 and a first anti-adhesion plate 214 sleeved thereon. The support bending plate 213 is a concave structure with an upward opening, and the opening is matingly sleeved with the first anti-adhesion plate 214 of the downward-bent concave structure, solving the problem that material vapor is easily attached to the support structure, affecting the service life of the equipment and the coating uniformity.

[0038] Furthermore, symmetrically arranged sub-plates 215 are provided inside the first anti-adhesion plate 214. A clamping chamber for clamping one side of the support bending plate 213 is formed between one side of each first anti-adhesion plate 214 and its adjacent sub-plate 215. Since through holes 216 are provided at the corresponding positions of the first anti-adhesion plate 214 and the support bending plate 213, after the clamping chamber is provided, the through holes 216 of the first anti-adhesion plate 214 can be made to correspond to the through holes 216 of the support bending plate 213 one by one without repeated alignment. At the same time, it is also not necessary to repeatedly align the threaded holes of the first anti-adhesion plate 214 and the support bending plate 213, which is convenient for installation.

[0039] Furthermore, through holes 216 are provided at the corresponding positions of the first anti-adhesion plate 214 and the support bending plate 213. The through holes 216 of the first anti-adhesion plate 214 are arranged to correspond to the through holes 216 of the support bending plate 213 one by one and are in a communicating state. A downward chamfer is provided on the first anti-adhesion plate 214 near the upper support ring 210. The chamfer and through holes 216 of the first anti-adhesion plate 214 are designed to reduce coating adhesion.

[0040] The hanging device 222 includes a thimble structure 224 detachably connected to the upper end. When the hanging device 222 is connected to the supporting device 217, the lower end of the thimble is embedded in the concave hole to achieve guidance and limit. Depending on the taper fit between the lower end of the thimble and the concave hole and combined with the gravity of the carrier 300, the lower support ring 220 will not be disengaged due to inertia at the start and stop of rotation. An adjustment hole is provided at the position where the hanging device 222 installs the thimble structure 224. The thimble structure 224 passes through the adjustment hole and slides in the adjustment hole and is connected to the adjustment mechanism 225. Through the adjustment mechanism 225, the length of the thimble structure 224 relative to the lower part of the hanging device 222 is adjusted. The adjustment of the height is to compensate for the errors in the processing and assembly processes to ensure that the entire carrier 300 is in a horizontal state during use. The position where the hanging device 222 installs the thimble structure 224 is a convex block 223 perpendicular to the body of the hanging device 222. The protruding position of the convex block 223 is opposite to the rotation direction of the carrier 300. The convex block 223 and the supporting position 218 are arranged alternately to avoid interference. At the same time, when the thimble mechanism fails, it plays a secondary protection role. The connection between the hanging device 222 and the lower support ring 220 is a large-head T shape to strengthen the strength of the connection.

[0041] A sunken ring 221 is provided at the inner ring of the lower support ring 220 to support the outer edge of the carrier 300 to be coated, clamp the carrier 300 to be coated, and prevent the carrier 300 to be coated from being separated due to centrifugal force during rotation, solving the problem that the heavy carrier 300 is prone to break away from the support due to centrifugal force during high-speed rotation and there is a safety hazard.

[0042] A sloping plate 227 is provided in a circle near the inner wall of the second anti-deposition plate 226 close to the sunken ring 221. The design of the sloping plate 227 is used to reduce the weight of the lower support ring 220. A second anti-deposition plate 226 is provided in a circle at the lower part of the lower support ring 220. The second anti-deposition plate 226 includes a part extending downward from the periphery of the lower support ring 220, a part fixedly connected to the lower part of the lower support ring 220, and a part fixedly connected to the sloping plate 227, which is used to prevent the evaporation material from evaporating onto the lower support ring 220. The cost of replacing and cleaning the lower support ring 220 is very high, and it is more economical to only replace the anti-deposition plate.

[0043] Advantages of the present invention: The present invention provides a rotating mechanism for a vacuum evaporation machine, which includes a rotating device 100. The upper part of the rotating device 100 passes through the housing of the vacuum evaporation machine and is connected to an external driver. The lower part of the rotating device 100 is connected to a support assembly 200. The support assembly 200 includes an upper support ring 210 and a lower support ring 220. The upper support ring 210 is connected to the rotating device 100 through a support connection assembly 211. The lower support ring 220 is used to support a carrier 300 to be coated. A plurality of easily detachable hanging connectors are provided between the upper support ring 210 and the lower support ring 220. The hanging connector includes a hanging device 222 connected to the lower support ring 220 and a supporting device 217 connected to the upper support ring 210. The hanging device 222 and the supporting device 217 are detachably connected. When it is necessary to separate the hanging device 222 from the supporting device 217, only need to lift and rotate to quickly separate, significantly improving the maintenance efficiency.

[0044] The above embodiments merely represent several implementation manners of the present invention. The description is relatively specific and detailed, but it should not be construed as a limitation on the scope of the present invention. It should be noted that for those of ordinary skill in the art, without departing from the concept of the present invention, several modifications and improvements can be made, and these all belong to the protection scope of the present invention. Therefore, the protection scope of the present invention shall be subject to the appended claims.

Claims

1. A rotating mechanism of a vacuum evaporation coating machine, comprising a rotating device (100), the upper part of the rotating device (100) passes through the housing of the vacuum evaporation coating machine and is connected to an external driver, and the lower part of the rotating device (100) is connected to a support assembly (200), characterized in that: The support assembly (200) includes an upper support ring (210) and a lower support ring (220). The upper support ring (210) is connected to the rotating device (100) through a support connection assembly (211). The lower support ring (220) is used to support the carrier to be coated. A plurality of detachable hanging connectors are provided between the upper support ring (210) and the lower support ring (220). The hanging connector includes a hanging device (222) connected to the lower support ring (220) and a supporting device (217) connected to the upper support ring (210). The hanging device (222) is detachably connected to the supporting device (217). When it is necessary to separate the hanging device (222) from the supporting device (217), only need to lift the lower support ring (220) upward and rotate it at a small angle to separate the hanging device (222) from the supporting device (217).

2. The rotating mechanism of the vacuum evaporation apparatus according to claim 1, wherein: The rotating device (100) includes a housing (103) arranged outside it. The housing (103) encloses an internal chamber for accommodating a rotating shaft (101). A connecting ring (104) extends outward from the outer wall of the housing (103) for locking with the housing of the vacuum evaporation coater to fix the rotating device (100).

3. The rotating mechanism of the vacuum evaporation coater according to claim 2, characterized in that: A magnetic fluid (105) is provided at the housing (103). The housing of the magnetic fluid (105) is installed together with the housing (103). A shaft of the magnetic fluid (105) is sleeved in the middle of the magnetic fluid (105). The upper end of the shaft of the magnetic fluid (105) is placed outside the housing of the vacuum evaporation coater, and the lower end of the shaft of the magnetic fluid (105) is placed in the internal chamber. A rotating gear (102) is provided on the rotating shaft (101). The rotating gear (102) is connected to a second gear (106) connected to the lower end of the shaft of the magnetic fluid (105). The rotating gear (102) is connected to a second synchronous pulley connected to the upper end of the shaft of the magnetic fluid (105). The second synchronous pulley is connected to a synchronous pulley (107) on an external driver through a synchronous belt. By driving the synchronous pulley (107) to rotate by a motor, the second synchronous pulley is driven to rotate in sequence, and the second synchronous pulley drives the second gear (106) to rotate, so that the rotating gear (102) rotates to drive the rotating shaft (101) to rotate.

4. The rotating mechanism of the vacuum evaporation apparatus according to claim 1, wherein: The support connection assembly (211) includes a plurality of support connectors (212). One end of the support connector (212) is vertically and fixedly connected to the rotating shaft (101), and the other end is vertically and fixedly connected to the upper support ring (210). The support connectors (212) divide the upper support ring (210) into a plurality of equal-sector fan-shaped regions with the rotating shaft (101) as the center.

5. The rotating mechanism of the vacuum evaporation coater according to claim 4, characterized in that: The support connector (212) includes a support bending plate (213) and a first anti-falling plate (214) sleeved thereon. The support bending plate (213) is a concave structure with an upward opening, and the opening is matched and sleeved with the first anti-falling plate (214) with a downward-bent concave structure.

6. The rotating mechanism of the vacuum evaporation coater according to claim 5, wherein: Through holes (216) are formed in both the first anti-blocking plate (214) and its corresponding support bending plate (213). The through holes (216) of the first anti-blocking plate (214) are arranged in one-to-one correspondence with the through holes (216) of its corresponding support bending plate (213) and are in a communicating state. A downward chamfer is provided at the position where the first anti-blocking plate (214) is close to the upper support ring (210).

7. The rotating mechanism of the vacuum evaporation apparatus according to claim 1, characterized in that: One end of the supporting device (217) is bent inward and detachably connected to the bottom of the support bending plate (213). The other end of the supporting device (217) is bent outward to form a supporting position (218), and the supporting position (218) is a concave hole.

8. The rotating mechanism of the vacuum evaporation coater according to claim 1, characterized in that: The lower hanging device (222) includes a thimble structure (224) with a detachable upper end. When the lower hanging device (222) is connected to the supporting device (217), the lower end of the thimble is embedded in the concave hole to achieve guiding and limiting. Relying on the taper fit between the lower end of the thimble and the concave hole and combined with the gravity of the carrier, the lower support ring (220) will not be disengaged from the entire lower support ring (220) due to inertia at the start and stop of rotation.

9. The rotating mechanism of the vacuum evaporation coater according to claim 1, wherein: An adjustment hole is provided at the position where the lower hanging device (222) installs the thimble structure (224). The thimble structure (224) passes through the adjustment hole and slides in the adjustment hole and is connected to an adjustment mechanism (225). Through the adjustment mechanism (225), the length of the thimble structure (224) relative to the lower part of the lower hanging device (222) is adjusted.

10. The rotating mechanism of the vacuum evaporation machine according to claim 1, wherein: The position where the lower hanging device (222) installs the thimble structure (224) is a convex block (223) perpendicular to the body of the lower hanging device (222). The protruding position of the convex block (223) is opposite to the rotation direction of the carrier, and the convex block (223) and the supporting position (218) are arranged in an alternating manner.

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