Air isolation device and substrate processing equipment

Abstract

The invention discloses an air isolation device and substrate processing equipment. The air isolation device is used for being arranged at an inlet of a process cavity to prevent air outside the process cavity from entering the process cavity, and comprises an air extraction part used for generating negative pressure to extract the air; the exhaust mechanism is provided with a first substrate conveying port, and the first substrate conveying port is matched with the inlet and used for enabling the substrate to enter the process cavity through the first substrate conveying port and the substrate conveying inlet; wherein a plurality of first exhaust holes are formed in the inner top of the first substrate conveying opening, a plurality of second exhaust holes are formed in the inner bottom of the first substrate conveying opening, and the first exhaust holes and the second exhaust holes are connected with an air exhaust component and used for extracting air in the first substrate conveying opening at the same time; therefore, gas outside the process cavity is prevented from entering the process cavity through the substrate conveying inlet. The isolation effect of the internal environment and the external environment of the annealing cavity is improved, and air is prevented from entering the annealing cavity to affect the annealing effect of the substrate.

Description

Technical Field

[0001] The present invention relates to the field of semiconductor equipment, and further relates to an air isolation device and a substrate processing equipment. Background Art

[0002] In the field of semiconductor processing, annealing is a common substrate heat treatment process used to achieve various effects on a deposited film to improve the electrical properties of the deposited film. For example, annealing can be used to activate dopants, densify the deposited film, or change the state of the grown film.

[0003] During the annealing process, the level of oxygen content in the annealing chamber will directly affect the annealing effect. Therefore, during the annealing process, it is necessary to isolate the external environment of the annealing chamber from the internal environment of the annealing chamber to prevent external air from entering the annealing chamber and thus affecting the annealing effect.

[0004] The patent document with the application number 201910784396.6 discloses an annealing chamber with an isolation door panel.

[0005] The annealing chamber includes an exhaust device, an intake device, a cold plate, and a hot plate. The intake device is installed on one side of the annealing chamber, and the exhaust device is opposite to the intake device and installed on the other side of the annealing chamber. The exhaust device includes an isolation door panel, a nitrogen delivery device, an exhaust plate, and a wafer transfer port. The isolation door panel is movably installed at the wafer transfer port for isolating external air from entering the annealing chamber. The nitrogen delivery device is installed on the top of the exhaust device and is connected to an external nitrogen delivery pipeline. The exhaust plate is installed at the bottom of the exhaust device, and a plurality of exhaust holes are evenly distributed on the exhaust plate. An intake strip is provided above the exhaust plate, and the intake strip is communicated with the nitrogen delivery device. When nitrogen is introduced into the nitrogen delivery device, nitrogen is sent through the intake strip and discharged from the exhaust holes, forming a downward flowing air curtain at the wafer transfer port to isolate external air from entering the annealing chamber, thereby improving the annealing effect of the substrate. However, during the transfer of the substrate into or out of the above wafer transfer port, the substrate will block the downward flow of the air current, resulting in air current disorder at the wafer transfer port and affecting the isolation effect of the exhaust device on the internal and external environments of the annealing chamber. Summary of the Invention

[0006] Aiming at the above technical problems, the purpose of the present application is to improve the isolation effect between the internal and external environments of the annealing chamber and prevent air from entering the annealing chamber, thereby affecting the annealing effect of the substrate.

[0007] To achieve the above purpose, the present application provides an air isolation device and a substrate processing equipment.

[0008] In some embodiments, the air isolation device is configured to be installed at the substrate transfer inlet of the process chamber to prevent the gas outside the process chamber from entering the process chamber, and includes: an air extraction component for generating a negative pressure to extract gas; an exhaust mechanism provided with a first substrate transfer port, the first substrate transfer port being adapted to the substrate transfer inlet for enabling the substrate to enter the process chamber through the first substrate transfer port and the substrate transfer inlet; wherein, a plurality of first exhaust holes are provided at the inner top of the first substrate transfer port, a plurality of second exhaust holes are provided at the inner bottom of the first substrate transfer port, and the first exhaust holes and the second exhaust holes are respectively connected to the air extraction component for simultaneously extracting the gas inside the first substrate transfer port to block the gas outside the process chamber from entering the process chamber through the substrate transfer inlet.

[0009] A substrate processing device includes: an annealing chamber provided with a substrate transfer inlet; and the above-mentioned air isolation device installed at the substrate transfer inlet.

[0010] Compared with the prior art, the present application has the following beneficial effects:

[0011] In the present application, by constructing a plurality of first exhaust holes at the inner top of the first substrate transfer port of the air isolation device and a plurality of second exhaust holes at the inner bottom of the first substrate transfer port, the first exhaust holes and the second exhaust holes extract gas simultaneously, so that an upward air flow is formed in the upper half of the first substrate transfer port, and a downward air flow is formed in the lower half of the first substrate transfer port, thereby increasing the isolation effect between the internal and external environments of the process chamber and preventing air from entering the interior of the process chamber, thus affecting the substrate processing effect. BRIEF DESCRIPTION OF THE DRAWINGS

[0012] The following will further illustrate the above characteristics, technical features, advantages and their implementation manners of the present invention in a clear and understandable manner in conjunction with the drawings of the preferred embodiments.

[0013] Figure 1 is a schematic diagram of an air isolation device according to an embodiment of the present application;

[0014] Figure 2a is Figure 1 a top perspective view;

[0015] Figure 2b is Figure 2a a cross-sectional view along the section line a-a;

[0016] Figures 3a to 3c is Figure 2b a cross-sectional view of three embodiments along the section line b-b;

[0017] Figure 4 Schematic diagram of an air isolation device according to an embodiment of the present application;

[0018] Figure 5 is Figure 4 a full cross-sectional view of;

[0019] Figure 6 is Figure 4 a left view of;

[0020] Figure 7 Schematic diagram of a substrate processing apparatus according to an embodiment of the present application; and

[0021] Figure 8 is Figure 7 a cross-sectional view taken along section line c-c. Detailed implementation manners

[0022] In order to more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the specific implementation manners of the present invention will be described below with reference to the accompanying drawings. Obviously, the accompanying drawings in the following description are only some embodiments of the present invention. For those of ordinary skill in the art, other drawings can be obtained based on these drawings without creative efforts, and other implementation manners can also be obtained.

[0023] To simplify the drawings, only the parts related to the invention are schematically shown in each drawing, and they do not represent the actual structure of the product. In addition, for the convenience of understanding and to simplify the drawings, in some drawings, components with the same structure or function are only schematically shown as one, or only one of them is marked. In this document, "one" not only means "only this one", but also means "more than one" situation.

[0024] In this document, it should be noted that unless otherwise clearly specified and limited, the terms "mounted", "connected", and "connected" should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be directly connected, or indirectly connected through an intermediate medium, and it can be the communication inside two components. For those of ordinary skill in the art, the specific meanings of the above terms in the present invention can be understood according to specific situations.

[0025] In addition, in the description of the present application, the terms "first", "second", etc. are only used for distinguishing descriptions, and cannot be understood as indicating or implying relative importance.

[0026] As Figure 1 shown, an air isolation device 100 according to an embodiment of the present application is disclosed, in combination with Figure 7 and Figure 8As shown, the air isolation device 100 is used to be installed at the substrate transfer inlet 210 of the process chamber 200 to prevent gases (e.g., air) outside the process chamber 200 from entering the process chamber 200.

[0027] Specifically, the air isolation device 100 includes an air extraction component 110 and an exhaust mechanism 120. The air extraction component 110 is used to generate negative pressure to extract gases, such as an air extraction pump. The exhaust mechanism 120 is provided with a first substrate transfer port 121. The first substrate transfer port 121 cooperates with the substrate transfer inlet 210 and is used to enable the substrate 400 to enter the process chamber 200 through the first substrate transfer port 121 and the substrate transfer inlet 210. Among them, a plurality of first exhaust holes 122 are provided at the inner top 1211 of the first substrate transfer port 121, and a plurality of second exhaust holes 123 are provided at the inner bottom 1212 of the first substrate transfer port 121. The first exhaust holes 122 and the second exhaust holes 123 are respectively connected to the air extraction component 110 and are used to simultaneously extract the gases inside the first substrate transfer port 121 to block the gases outside the process chamber 200 from entering the process chamber 200 through the substrate transfer inlet 210.

[0028] In practical applications, as Figure 7 and Figure 8 shown, the substrate 400 enters the process chamber 200 for processing through the first substrate transfer port 121 and the substrate transfer inlet 210 of the process chamber 200 in sequence along its transmission direction m. At the same time, the first exhaust holes 122 and the second exhaust holes 123 exhaust respectively, forming airflows s1 and s2 flowing into the first substrate transfer port 121 from both sides (substrate inlet side and substrate outlet side) of the first substrate transfer port 121 in the horizontal direction (refer to Figure 3a and Figure 3b ), and forming airflows s3 flowing from the middle part inside the first substrate transfer port 121 to the inner top 1211 of the first substrate transfer port 121 and airflows s4 flowing from the middle part inside the first substrate transfer port 121 to the inner bottom 1212 of the first substrate transfer port 121 in the vertical direction. During the period when the substrate 400 is transported through the first substrate transfer port 121 along the transmission direction m, the first exhaust holes 122 extract the gases above the substrate 400 to form the airflow s3, and the second exhaust holes 123 extract the gases below the substrate 400 to form the airflow s4. Therefore, the air isolation device 100 forms an upward flowing air curtain in the upper half part inside the first substrate transfer port 121 and a downward flowing air curtain in the lower half part. The upper and lower air curtains are independent of each other, so that during the period when the substrate 400 passes through the first substrate transfer port 121, it does not hinder the normal flow of the original airflow, thereby increasing the isolation effect of the air isolation device 100 on the internal and external environments of the process chamber 200. The above-mentioned process chamber 200 includes but is not limited to an annealing chamber.

[0029] Preferably, as Figure 2a and Figure 2bAs shown, the exhaust mechanism 120 includes a main exhaust passage 126 and a multi-stage branched exhaust passage 127. One end of the main exhaust passage 126 is connected to the air extraction component 110. Each first exhaust hole 122 and each second exhaust hole 123 are respectively connected to the other end of the corresponding main exhaust passage 126 through the corresponding multi-stage branched exhaust passage 127, so that the pipe resistance from each first exhaust hole 122 and each second exhaust hole 123 to the main exhaust passage 126 is the same.

[0030] Specifically, the exhaust mechanism 120 includes an upper plate member 124 and a lower plate member 125. The upper plate member 124 is disposed above the lower plate member 125. There is a strip-shaped gap between the bottom of the upper plate member 124 and the top of the lower plate member 125 to form a first substrate conveying port 121.

[0031] Preferably, as Figure 2a and Figure 2b shown, a main exhaust passage 1261 and a multi-stage branched exhaust passage 127 are provided inside the upper plate member 124. One end of the main exhaust passage 1261 is connected to the air extraction component 110. The other end of the main exhaust passage 1261 is connected to each first exhaust hole 122 through the multi-stage branched exhaust passage 127. The total air extraction pressure provided by the air extraction component 110 is gradually dispersed by the multi-stage branched exhaust passage 127 and finally evenly distributed to each first exhaust hole 122, so that each first exhaust hole 122 has substantially the same exhaust volume. In addition, multiple first exhaust holes 122 are arranged in sequence along the width direction n of the first substrate conveying port 121. The first exhaust hole 122 is configured as a long strip extending along the width direction n of the first substrate conveying port 121 to increase the exhaust range of the first exhaust hole 122 along the width direction n of the first substrate conveying port 121, thereby increasing the isolation effect of the air isolation device 100 on the internal and external environments of the process chamber 200.

[0032] Specifically, as Figure 2bAs shown, the multi-stage branched exhaust passage 127 includes: a first-stage branched exhaust passage 1271, a second-stage branched exhaust passage 1272, a third-stage branched exhaust passage 1273, and a fourth-stage branched exhaust passage 1274 that are arranged in parallel in sequence from the main exhaust passage 1261 to the first exhaust hole 122 (arranged from top to bottom in the figure) and extend along the width direction n. In this example, the main exhaust passage 1261 is divided into two branches by the first-stage branched exhaust passage 1271, and then divided into four branches by two second-stage branched exhaust passages 1272, and then divided into eight branches by four third-stage branched exhaust passages 1273, and finally divided into sixteen branches by eight fourth-stage branched exhaust passages 1274, and are respectively connected to the first exhaust holes 122, so that the pipe resistance from each first exhaust hole 122 to the main exhaust passage 1261 is the same, and thus the exhaust in the width direction n of the first substrate conveying port 121 is more uniform, so as to increase the isolation effect of the air isolation device 100 on the internal and external environments of the process chamber 200.

[0033] Similarly, referring again to Figure 2b , a main exhaust passage 1262 and a multi-stage branched exhaust passage 128 are provided inside the lower plate member 125. One end of the main exhaust passage 1262 converges with the main exhaust passage 1261 and is connected to the air extraction component 110 through a connecting pipe 129. The other end of the main exhaust passage 1262 is gradually dispersed by the multi-stage branched exhaust passage 128 and finally connected to each second exhaust hole 123. The multi-stage branched exhaust passage 128 includes: a first-stage branched exhaust passage 1281, a second-stage branched exhaust passage 1282, a third-stage branched exhaust passage 1283, and a fourth-stage branched exhaust passage 1284 that are arranged in parallel in sequence from the main exhaust passage 1262 to the second exhaust hole 123 (arranged from bottom to top in the figure) and extend along the width direction n, and their connection manner is similar to that of the multi-stage branched exhaust passage 127, which will not be elaborated here. In addition, the arrangement manner and shape of the second exhaust holes 123 are similar to those of the first exhaust holes 122. The plurality of second exhaust holes 123 are arranged in sequence along the width direction n of the first substrate conveying port 121 and are configured to be strip-shaped extending along the width direction n of the first substrate conveying port 121.

[0034] Preferably, in the air isolation device 100 according to an embodiment of the present application, the first exhaust holes 122 are arranged in at least two columns along the transmission direction m of the substrate 400, and the second exhaust holes 123 are arranged in at least two columns along the transmission direction m of the substrate 400. Among them, the positions of each column of first exhaust holes and each column of second exhaust holes correspond one by one, or the positions of each column of first exhaust holes and each column of second exhaust holes are arranged in a staggered manner along the transmission direction m of the substrate.

[0035] Specifically, in Figure 3aIn the illustrated example, the first row of exhaust holes 122 is arranged in two columns along the transport direction m of the substrate 400, denoted as the first column of the first exhaust holes 1221 and the second column of the first exhaust holes 1222. The second exhaust holes 123 are arranged in two columns along the transport direction m of the substrate 400, denoted as the first column of the second exhaust holes 1231 and the second column of the second exhaust holes 1232 respectively. Among them, the first column of the first exhaust holes 1221 corresponds to the first column of the second exhaust holes 1231, and the second column of the first exhaust holes 1222 corresponds to the second column of the second exhaust holes 1232. In Figure 3b In the illustrated example, the first row of exhaust holes 122 is arranged in two columns along the transport direction m of the substrate 400, denoted as the first column of the first exhaust holes 1223 and the second column of the first exhaust holes 1224. The second exhaust holes 123 are arranged in two columns along the transport direction m of the substrate 400, denoted as the first column of the second exhaust holes 1233 and the second column of the second exhaust holes 1234 respectively. Among them, the first column of the first exhaust holes 1223, the first column of the second exhaust holes 1233, the second column of the first exhaust holes 1224 and the second column of the second exhaust holes 1234 are arranged in a staggered manner along the transport direction m. It should be noted that in this embodiment, there are multiple groups of multi-stage branched exhaust channels 127 inside the upper plate member 124. Refer to Figure 2a , the first column of the first exhaust holes 1221 and the second column of the first exhaust holes 1222 are respectively connected to the main exhaust channel 126 by a group of multi-stage branched exhaust channels 127. Similarly, there are multiple groups of multi-stage branched exhaust channels 128 respectively inside the lower plate member 125, and the first column of the second exhaust holes 1231 and the second column of the second exhaust holes 1232 are respectively connected to the main exhaust channel 126 by a group of multi-stage branched exhaust channels 128.

[0036] Preferably, referring again to Figure 1 , on the horizontal two sides (i.e., both sides in the width direction n) perpendicular to the transport direction m of the substrate 400 inside the first substrate transport port 121, there are relatively arranged first inner side walls 1213 and second inner side walls 1214. Among them, a number of third exhaust holes (not shown in the figure) are provided on the first inner side wall 1213, and a number of fourth exhaust holes (not shown in the figure) are provided on the second inner side wall 1214. The third exhaust holes and the fourth exhaust holes are respectively connected to the air extraction component 110, and are used to simultaneously extract the gas inside the first substrate transport port 121 to block the gas outside the process chamber 200 from entering the process chamber 200 through the substrate transport inlet 210.

[0037] Preferably, as Figure 3cAs shown, the air isolation device 100 further includes a gas supply component 130 and a gas supply mechanism 140. The gas supply component 130 is used to provide a preset gas, such as nitrogen. The gas supply mechanism 140 is located on the side of the exhaust mechanism 120 away from the substrate conveying inlet 210. The gas supply mechanism 140 is provided with a second substrate conveying port 141, and the second substrate conveying port 141 is connected to the first substrate conveying port 121. Among them, a plurality of first gas supply holes 142 are provided at the inner top 1411 of the second substrate conveying port 141, and a plurality of second gas supply holes 143 are provided at the inner bottom 1412 of the second substrate conveying port 141. The first gas supply holes 142 and the second gas supply holes 143 are respectively connected to the gas supply component 130, and are used to simultaneously supply airflows s5 and s6 into the second substrate conveying port 141, so as to block the gas outside the process chamber 200 from entering the process chamber 200 through the substrate conveying inlet 210.

[0038] In this embodiment, by adding a gas supply mechanism 140 on the side of the exhaust mechanism 120 away from the substrate conveying inlet 210 of the process chamber 200, an air curtain is formed at the second substrate conveying port 141 on the side of the first substrate conveying port 121 away from the substrate conveying inlet 210, so that the air isolation device 100 forms a double airflow barrier at the substrate conveying inlet 210, thereby increasing the isolation effect of the air isolation device 100 on the internal and external environments of the process chamber 200.

[0039] Preferably, opposite third inner wall and fourth inner wall (not shown in the figure) are further constructed on the horizontal two sides (i.e., both sides in the width direction n) of the inside of the second substrate conveying port 141 along the direction perpendicular to the transmission direction m of the substrate 400. Among them, a plurality of third gas supply holes are provided on the third inner wall, and a plurality of fourth gas supply holes are provided on the fourth inner wall. The third gas supply holes and the fourth gas supply holes are respectively connected to the gas supply component 130, and are used to simultaneously supply airflows into the second substrate conveying port 141, so as to block the gas outside the process chamber 200 from entering the process chamber through the substrate conveying inlet 210.

[0040] Preferably, as Figure 4 shown, the air isolation device 100 further includes a flow splitting mechanism 150. The flow splitting mechanism 150 is used to connect a plurality of exhaust mechanisms 120 to the air extraction component 110 at the same time. A total airflow channel 151 and a multi-stage branched airflow channel 152 are provided inside the flow splitting mechanism 150. One end of the total airflow channel 151 is connected to the air extraction component 110, and the other end of the total airflow channel 151 is connected to each exhaust mechanism 120 through the multi-stage branched airflow channel 152. The total air extraction pressure provided by the air extraction component 110 is gradually dispersed by the multi-stage branched airflow channel 152, and finally evenly distributed to each exhaust mechanism 120, so that each exhaust mechanism 120 has basically the same exhaust volume.

[0041] In this embodiment, a plurality of exhaust mechanisms 120 are simultaneously connected to the air extraction component 110 through the flow splitting mechanism 150 to eliminate the pipe resistance differences of the pipelines connecting the air extraction component 110 and different exhaust mechanisms 120, so that each exhaust mechanism 120 has a uniform exhaust volume, and each exhaust mechanism 120 can be respectively installed at the substrate conveying inlet 210 of different process chambers 200, thereby keeping the process environments of each process chamber 200 consistent and improving the substrate 400 processing effect.

[0042] Preferably, as Figure 5 and Figure 6 shown, the multi-stage branch air flow channel 152 includes: a plurality of branch air flow channels sequentially arranged between the main air flow channel 151 and a plurality of exhaust mechanisms 120. Among them, each branch air flow channel has a first interface and a second interface. The first interface is used to connect the upper-level channel or the main air flow channel of the current branch air flow channel (if the current branch air flow channel is the first-stage branch air flow channel, its upper-level channel is the main air flow channel, and the first interface is used to connect the current branch air flow channel to the main air flow channel), and the second interface is used to connect the lower-level channel or the exhaust mechanism of the current branch air flow channel (if the current branch air flow channel is the last-stage branch air flow channel, its lower-level channel is the exhaust mechanism, and the second interface is used to connect the current branch air flow channel to the exhaust mechanism). Moreover, the number of the second interfaces is greater than the number of the first interfaces, so as to distribute the air pressure provided by its upper-level channel or the main air flow channel to the first interface to a plurality of lower-level channels or a plurality of exhaust mechanisms through the second interface of the current branch air flow channel.

[0043] Specifically, the multi-stage branch air flow channel 152 includes: a first-stage branch air flow channel 1521. The first-stage branch air flow channel 1521 has a first interface 1531 and at least two second interfaces 1532. The first interface 1531 is used to connect the main air flow channel 151, and the second interfaces 1532 are used to connect the exhaust mechanisms 120. Among them, the linear distances from each second interface 1532 to the first interface 1531 are the same.

[0044] Preferably, the multi-stage branch air flow channel 152 further includes: a plurality of second-stage branch air flow channels 1522. The second-stage branch air flow channels 1522 correspond to the second interfaces 1532 one by one, and each second-stage branch air flow channel 1522 is respectively connected to the first-stage branch air flow channel 1521 through the corresponding second interface 1532. Each second-stage branch air flow channel 1522 has at least two third interfaces 1541, and the third interfaces 1541 are used to connect the exhaust mechanisms 120. Among them, the linear distances from each third interface 1541 to the corresponding second interface 1532 are the same.

[0045] Preferably, the multi-stage branched air flow channel 152 further includes: a plurality of tertiary branched air flow channels 1523, which correspond to the third interfaces 1541 one by one, and each tertiary branched air flow channel 1523 is respectively connected to the corresponding secondary branched air flow channel 1522 through the corresponding third interface 1541. Each tertiary branched air flow channel 1523 has at least two fourth interfaces 1551, and each fourth interface 1551 is used to connect to the total exhaust channel 126 of the corresponding exhaust mechanism 120. Among them, the linear distance from each fourth interface 1551 to the corresponding third interface 1541 is the same.

[0046] Specifically, the flow splitting mechanism 150 includes a first flow splitting plate 153, a second flow splitting plate 154, and a third flow splitting plate 155. The first flow splitting plate 153, the second flow splitting plate 154, and the third flow splitting plate 155 are sequentially overlapped, and a cavity extending in the vertical direction is formed between the first flow splitting plate 153 and the second flow splitting plate 154 to form a primary branched air flow channel 1521; a plurality of cavities extending in the vertical direction are formed between the second flow splitting plate 154 and the third flow splitting plate 155 to form a plurality of secondary branched air flow channels 1522; a plurality of cavities extending in the vertical direction are formed inside the third flow splitting plate 155 to form a plurality of tertiary branched air flow channels 1523.

[0047] Preferably, the first interface 1531 is disposed in the middle of the first flow splitting plate 153 and is used to connect the primary branched air flow channel 1521 to the total air flow channel 151; two second interfaces 1532 are sequentially disposed in the vertical direction on the side of the second flow splitting plate 154 close to the first flow splitting plate 153, and the linear distance from each second interface 1532 to the first interface 1531 is the same, and is used to connect the corresponding secondary branched air flow channel 1522 to the primary branched air flow channel 1521; four third interfaces 1541 are sequentially disposed in the vertical direction on the side of the third flow splitting plate 155 close to the second flow splitting plate 154, and the linear distance from each third interface 1541 to the corresponding second interface 1532 is the same, and is used to connect the tertiary branched air flow channel 1523 to the corresponding secondary branched air flow channel 1522; eight fourth interfaces 1551 are sequentially disposed in the vertical direction on the side of the third flow splitting plate 155 away from the second flow splitting plate 154, and the linear distance from each fourth interface 1551 to the corresponding third interface 1541 is the same. Each fourth interface 1551 respectively connects the tertiary branched air flow channel 1523 to the corresponding exhaust mechanism 120 through a connecting pipe 129. In addition, see Figure 4, a pressure detection interface 1291 is provided on the connecting pipe 129 between the flow dividing mechanism 150 and each exhaust mechanism 120, which is used to connect a barometer to monitor the air pressure introduced by the flow dividing mechanism 150 into each exhaust mechanism 120. In this embodiment, the total gas flow channel 151 is evenly divided into two branches by a first-level branch gas flow channel 1521, and then evenly divided into four branches by two second-level branch gas flow channels 1522, and finally evenly divided into eight branches by four third-level branch gas flow channels 1523, and are respectively connected to the exhaust mechanisms 120, so that the paths from each exhaust mechanism 120 to the total gas flow channel 151 are the same, and thus the pipe resistance from each exhaust mechanism 120 to the total gas flow channel 151 is the same.

[0048] As Figure 7 and Figure 8 shown, a substrate processing apparatus 10 according to an embodiment of the present application is disclosed. The substrate processing apparatus 10 includes an annealing chamber 300, a gas inlet device 340, and the air isolation device 100 of any of the above embodiments. Among them, the annealing chamber 300 is provided with a substrate conveying inlet 310. Inside the annealing chamber 300, there are a hot plate 320 and a cold plate 330, which are used to perform heat treatment on the substrate 400. The gas inlet device 340 is connected to a process gas source 350 and is used to transport process gas into the process chamber 200, for example: hydrogen. The air isolation device 100 is installed at the substrate conveying inlet 310 of the annealing chamber 300 and is used to isolate the internal and external environments of the annealing chamber 300 and prevent air from entering the inside of the annealing chamber 300, thereby affecting the annealing effect of the substrate 400. In addition, during the annealing process, the exhaust mechanism 120 in the air isolation device 100 is also used to discharge the above process gas to maintain the stable gas flow in the annealing chamber 300.

[0049] It should be noted that the above embodiments can be freely combined according to needs. The above are only the preferred embodiments of the present invention. For those of ordinary skill in the art, without departing from the principle of the present invention, several improvements and refinements can be made, and these improvements and refinements should also be regarded as the protection scope of the present invention.

Claims

1. An air isolation device, used to be installed at the substrate delivery entrance of a process chamber to prevent the gas outside the process chamber from entering the process chamber, characterized in that: include: A gas extraction component, used to generate negative pressure to extract gas; An exhaust mechanism is provided with a first substrate delivery port, the first substrate delivery port cooperates with the substrate delivery entrance, and is used to allow the substrate to enter the process chamber through the first substrate delivery port and the substrate delivery entrance; wherein, A plurality of first exhaust holes are provided at the inner top of the first substrate conveying port, and a plurality of second exhaust holes are provided at the inner bottom of the first substrate conveying port. The first exhaust holes and the second exhaust holes are respectively connected to the exhaust component for simultaneously extracting the gas in the first substrate conveying port to prevent the gas outside the process chamber from entering the process chamber through the substrate conveying inlet.

2. The air isolation device according to claim 1, characterized in that: The exhaust mechanism includes a main exhaust channel and a multi-stage branch exhaust channel. One end of the main exhaust channel is connected to the air extraction component. Each first exhaust hole and each second exhaust hole are respectively connected to the other end of the corresponding main exhaust channel through the corresponding multi-stage branch exhaust channel, so that the pipe resistance from each first exhaust hole and each second exhaust hole to the main exhaust channel is consistent.

3. The air isolation device according to claim 1, characterized in that: The plurality of first exhaust holes are arranged in at least two rows along the transport direction of the substrate; The plurality of second exhaust holes are arranged in at least two rows along the transport direction of the substrate; wherein, The positions of the first exhaust holes in each column correspond to the positions of the second exhaust holes in each column, or the positions of the first exhaust holes in each column and the second exhaust holes in each column are staggered along the transport direction of the substrate.

4. The air isolation device according to claim 1, characterized in that: The interior of the first substrate conveying port is constructed with a first inner side wall and a second inner side wall oppositely disposed along two horizontal sides perpendicular to the conveying direction of the substrate, wherein: The first inner side wall is provided with a plurality of third exhaust holes, and the second inner side wall is provided with a plurality of fourth exhaust holes. The third exhaust holes and the fourth exhaust holes are respectively connected to the exhaust component, and are used to simultaneously extract the gas in the first substrate delivery port to prevent the gas outside the process chamber from entering the process chamber through the substrate delivery port.

5. The air isolation device according to claim 1, characterized in that: Also includes: A gas supply component, used for providing preset gas; The air supply mechanism is located on a side of the exhaust mechanism away from the substrate delivery inlet, and the air supply mechanism is provided with a second substrate delivery inlet, which is connected to the first substrate delivery inlet; wherein, A plurality of first gas supply holes are provided at the inner top of the second substrate conveying port, and a plurality of second gas supply holes are provided at the inner bottom of the second substrate conveying port. The first gas supply holes and the second gas supply holes are respectively connected to the gas supply components, and are used to simultaneously supply airflow into the second substrate conveying port to prevent the gas outside the process chamber from entering the process chamber through the substrate conveying inlet.

6. The air isolation device according to claim 5, characterized in that: The interior of the second substrate conveying port is constructed with a third inner side wall and a fourth inner side wall oppositely disposed along two horizontal sides perpendicular to the conveying direction of the substrate, wherein: The third inner side wall is provided with a plurality of third gas supply holes, and the fourth inner side wall is provided with a plurality of fourth gas supply holes. The third gas supply holes and the fourth gas supply holes are respectively connected to the gas supply components, and are used to simultaneously supply airflow into the second substrate delivery port to prevent the gas outside the process chamber from entering the process chamber through the substrate delivery port.

7. The air isolation device according to claim 1, characterized in that: Also includes: The diversion mechanism is used to connect multiple exhaust mechanisms to the air extraction component at the same time. The diversion mechanism is provided with a total airflow channel and a multi-stage branch airflow channel. One end of the total airflow channel is connected to the air extraction component, and the other end of the total airflow channel is connected to each exhaust mechanism through the multi-stage branch airflow channel to make the pipe resistance from each exhaust mechanism to the air extraction component consistent.

8. The air isolation device according to claim 7, characterized in that: The multi-level branch airflow channel includes: a plurality of branch airflow channels arranged in sequence between the total airflow channel and the plurality of exhaust mechanisms, wherein each branch airflow channel has a first interface and a second interface, the first interface is used to connect the upper channel of the current branch airflow channel or the total airflow channel, the second interface is used to connect the lower channel of the current branch airflow channel or the exhaust mechanism, and the number of the second interfaces is greater than the number of the first interfaces.

9. The air isolation device according to claim 7, characterized in that: The multi-stage branch air flow channel includes: A first-level branch airflow channel, wherein the first-level branch airflow channel has a first interface and at least two second interfaces, the first interface is used to connect to the total airflow channel, and the second interface is used to connect to the exhaust mechanism; wherein the straight-line distance from each second interface to the first interface is the same.

10. The air isolation device according to claim 9, characterized in that: The multi-stage branch air flow channel also includes: Several secondary branch air flow channels, the secondary branch air flow channels correspond one-to-one to the second interface, and each of the secondary branch air flow channels is connected to the primary branch air flow channel through the corresponding second interface, and each of the secondary branch air flow channels has at least two third interfaces, and the third interface is used to connect the exhaust mechanism; wherein the straight-line distance from each third interface to the corresponding second interface is the same.

11. The air isolation device according to claim 10, characterized in that: The multi-stage branch air flow channel also includes: Several three-level branch air flow channels, the three-level branch air flow channels correspond one-to-one to the third interface, and each of the three-level branch air flow channels is connected to the corresponding two-level branch air flow channel through the corresponding third interface, and each of the three-level branch air flow channels has at least two fourth interfaces, and the fourth interface is used to connect the exhaust mechanism; wherein the straight-line distance from each fourth interface to the corresponding third interface is the same.

12. A substrate processing device, characterized in that: include: An annealing chamber, wherein the annealing chamber is provided with a substrate delivery entrance; as well as, The air isolation device according to any one of claims 1 to 11 is installed at the substrate conveying entrance.

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