High flatness high borosilicate glass petri dish and preparation method thereof

Abstract

The present application relates to the technical field of culture dish, in particular to a high flatness high borosilicate glass culture dish and a preparation method thereof.The present application comprises the following steps: step one: taking high borosilicate flat glass, cutting into glass round pieces, preheating to 500-600 DEG C, and preparing preheated glass round pieces; step two: placing the preheated glass round pieces into a mold, performing press bending forming, annealing treatment, and cooling to room temperature, and preparing high borosilicate glass culture dishes; step three: uniformly mixing epoxy acrylate, trimethylolpropane triacrylate, a photoinitiator and an active diluent, uniformly mixing with double bond silica sol, an amphiphilic block copolymer and 2-methacryloyloxyethylphosphocholine, and preparing a composite coating; and step four: performing plasma treatment on the high borosilicate glass culture dish, coating the composite coating, and performing UV curing, thereby obtaining a high flatness high borosilicate glass culture dish.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of culture dishes, in particular to a high-flatness high-borosilicate glass culture dish and a preparation method thereof. BACKGROUND

[0002] Glass culture dishes, as essential glassware in laboratories, are widely used in medical, biological, chemical, pharmaceutical and other fields. A culture dish is composed of a bottom (dish bottom) and a cover. The dish bottom (hereinafter referred to as a culture dish) has a profile of a perimeter with a vertical surface, and the bottom is a flat circular disc-shaped glassware.

[0003] As the main glassware for culturing cells and bacterial microorganisms, glass culture dishes have high standards for performance, including excellent transparency, good chemical stability, high temperature resistance, precise dimensions, and high flatness. In particular, the overall flatness of the bottom of a glass culture dish is crucial to its use in experiments. If the glass surface is uneven, the culture medium may not be positioned stably inside the culture dish during the experiment. For A-level products used in high-precision biological experiments, the flatness error of the bottom is required to be within 0.02 mm. During experimental operation, no liquid accumulation occurs on the bottom, thereby ensuring the accuracy of experimental results.

[0004] However, the glass culture dishes produced by existing production processes such as blowing and glass tube sealing often have low flatness of the bottom surface, uneven glass thickness, and other phenomena. Therefore, developing high-quality glass materials and high-standard precision preparation processes for glass culture dishes is our focus of research and development. The excessive adhesion of cells and proteins to the surface of existing culture dishes during cell culture may not only affect cell growth and proliferation, but also lead to inaccurate experimental data. In addition, many culture dish surface coatings are prone to peeling or losing effectiveness during use, resulting in a decrease in their anti-fouling and anti-adhesion properties. The coating materials in the prior art often lack sufficient durability and cannot maintain their properties for a long time

[0005] Therefore, we propose a high-flatness high-borosilicate glass culture dish and a preparation method thereof. SUMMARY

[0006] The present application aims to provide a high-flatness high-borosilicate glass culture dish and a preparation method thereof to solve the problems in the prior art.

[0007] To achieve the above-mentioned purpose, the present application provides the following technical solutions:

[0008] A preparation method of a high-flatness high-borosilicate glass culture dish, comprising the following steps:

[0009] Step 1: Take high borosilicate flat glass, cut it into glass discs, and preheat it to 500-600℃ to obtain preheated glass discs;

[0010] Step 2: Place the preheated glass disc into the mold, bend it into shape, anneal it, and cool it to room temperature to obtain a borosilicate glass culture dish.

[0011] Step 3: Mix epoxy acrylate, trimethylolpropane triacrylate, photoinitiator and reactive diluent evenly, add silica sol containing double bonds, amphiphilic block copolymer and 2-methacryloyloxyethyl phosphocholine and mix evenly to obtain composite coating;

[0012] Step 4: The borosilicate glass culture dish is subjected to plasma treatment, then coated with a composite coating, and UV cured to obtain a high-flatness borosilicate glass culture dish.

[0013] Further, the composite coating comprises the following components by weight: 40-60 parts epoxy acrylate, 20-30 parts trimethylolpropane triacrylate, 3-8 parts photoinitiator, 10-20 parts silica sol containing double bonds, 5-10 parts amphiphilic block copolymer, 3-5 parts 2-methacryloyloxyethyl phosphocholine, and 25-35 parts reactive diluent.

[0014] Furthermore, the preparation method of the amphiphilic block copolymer is as follows:

[0015] Step A: Mix polyethylene glycol methacrylate and dichloromethane, cool to 0°C with ice water, add triethylamine and acryloyl chloride under nitrogen protection and stir until homogeneous, heat to room temperature and react for 8-10 hours. After filtration, washing and drying, the intermediate is obtained.

[0016] Step B: Mix hydrogen-capped polydimethylsiloxane, toluene and caster catalyst evenly, add intermediate, heat to 80-90℃ under nitrogen protection, react for 2-4 hours, and obtain amphiphilic block copolymer by rotary evaporation.

[0017] In the above technical solution, the terminal hydroxyl groups of polyethylene glycol methacrylate react with acryloyl chloride to introduce double bonds into the polyethylene glycol macromolecular chain, obtaining an intermediate. Through the hydrosilylation reaction of hydrogen-capped terminal polydimethylsiloxane with the intermediate, an amphiphilic block copolymer with antifouling properties is synthesized. The amphiphilic molecules can adsorb water molecules to form a water wall, preventing cells, protein molecules, bacteria, and other substances from adhering to the culture vessel, thus exhibiting ultra-low cell adhesion characteristics. It not only takes into account the anti-protein adsorption properties of polyethylene glycol (PEG) but also retains the low surface energy properties of organosilicon, which is beneficial to improving the fouling and desorption performance of the coating.

[0018] Furthermore, the mass ratio of polyethylene glycol methacrylate to dichloromethane is 1:(10-12).

[0019] Further, the mass ratio of polyethylene glycol methacrylate, triethylamine and acryloyl chloride is 1:(0.1-0.3):(0.3-0.5).

[0020] Furthermore, the molar ratio of the hydrogen-capped polydimethylsiloxane to the intermediate is 1:(1.5-2.0).

[0021] Furthermore, the amount of the caster catalyst added is 0.01-0.2 wt% of the total mass of hydrogen-terminated polydimethylsiloxane and intermediates.

[0022] Furthermore, the preparation method of the silica sol containing double bonds is as follows:

[0023] Tetraethyl orthosilicate, anhydrous ethanol, and deionized water were mixed evenly. The pH of the system was adjusted to 2-3 using hydrochloric acid. A mixed solution of γ-methacryloyloxypropyltrimethoxysilane and anhydrous ethanol was added, and the mixture was stirred for 3-5 hours and allowed to stand overnight to obtain a silica sol containing double bonds.

[0024] In the above technical solution, double bonds are introduced by adding γ-methacryloxypropyltrimethoxysilane to the silica sol, forming a modified silica sol with double bonds.

[0025] Further, the mass ratio of the tetraethyl orthosilicate, anhydrous ethanol, and deionized water is 1:(3-4):(0.6-0.8).

[0026] Further, the mass ratio of γ-methacryloxypropyltrimethoxysilane, tetraethyl orthosilicate and anhydrous ethanol is 1:(2-4):(5-10).

[0027] Furthermore, the bending temperature is 850-950℃.

[0028] Furthermore, the annealing process conditions are as follows: annealing and holding at 450-550℃ for 1-2 hours.

[0029] Furthermore, the plasma treatment process conditions are as follows: the discharge atmosphere is a mixture of oxygen and nitrogen in a volume ratio of 3:2, the treatment time is 3-7 min, the treatment power is 100-150 W, and the vacuum degree is 40-60 Pa.

[0030] Furthermore, the active diluent is tripropylene glycol diacrylate.

[0031] Furthermore, the thickness of the composite coating is 10-15 μm.

[0032] Compared with the prior art, the beneficial effects of the present invention are:

[0033] 1. This invention discloses a high-flatness borosilicate glass culture dish and its preparation method. The culture dish, integrally molded from high borosilicate flat glass, fully utilizes the superior physicochemical properties of high borosilicate glass. Furthermore, the flatness of the inner surface of the bottom of the culture dish is significantly improved, which not only enhances product quality but also increases experimental accuracy. Particularly in cell culture and experimental operations, the flat surface facilitates uniform cell distribution and growth. The preparation method is simple, directly using flat glass molding, reducing energy consumption and material waste during production, thus meeting the energy-saving and high-efficiency requirements of modern manufacturing.

[0034] 2. Based on the above scheme, by coating the surface of the culture dish with a composite coating, which incorporates silica sol containing double bonds, amphiphilic block copolymers, and 2-methacryloyloxyethyl phosphocholine, the hardness and wear resistance of the coating are significantly improved. At the same time, the coating is endowed with excellent antifouling properties and ultra-low adsorption effect, effectively reducing the adhesion of cells, proteins, and bacteria, thereby extending the service life of the culture dish and improving the convenience of maintenance. Meanwhile, 2-methacryloyloxyethyl phosphocholine, as an amphoteric compound, works synergistically with the amphiphilic block copolymer to form a strongly hydrophilic water film on the surface of the culture dish, which greatly reduces cell adhesion. Detailed Implementation

[0035] The technical solutions in the embodiments of the present invention will be clearly and completely described below. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0036] The sources and types of the substances involved in this invention are not subject to any specific limitations. Exemplary examples include: epoxy acrylate: brand name EBECREL 3700; high borosilicate flat glass: 3mm thick, purchased from Dongguan Yaohe Glass Co., Ltd.; hydrogen-terminated polydimethylsiloxane: model name R054945, purchased from Shanghai Yi'en Chemical Technology Co., Ltd.; polyethylene glycol methacrylate: model name P832403, purchased from Shanghai Maclean Biochemical Technology Co., Ltd.

[0037] Unless otherwise specified, all the following quantities are parts by weight.

[0038] Example 1: A method for preparing a high-flatness borosilicate glass culture dish, comprising the following processes:

[0039] Step 1: Take high borosilicate flat glass, cut it into glass discs, preheat it to 500℃, and obtain preheated glass discs;

[0040] Step 2: Place the preheated glass disc into the mold and bend it (at 850℃). Anneal at 450℃ for 1 hour and cool to room temperature to obtain a borosilicate glass culture dish.

[0041] Step 3: Mix 40 parts of epoxy acrylate, 20 parts of trimethylolpropane triacrylate, 3 parts of 2-hydroxy-methylphenylpropane-1-one and 25 parts of dipropylene glycol diacrylate evenly, add 10 parts of silica sol containing double bonds, 5 parts of amphiphilic block copolymer and 3 parts of 2-methacryloyloxyethyl phosphocholine and mix evenly to obtain a composite coating.

[0042] Step 4: Plasma treatment is performed on the high borosilicate glass culture dish (the discharge atmosphere is a mixture of oxygen and nitrogen in a volume ratio of 3:2, the treatment time is 3 minutes, the treatment power is 100W, and the vacuum degree is 40Pa), then a composite coating is applied, and the dish is cured under a UV lamp for 2 minutes to obtain a high-flatness high borosilicate glass culture dish.

[0043] The preparation method of amphiphilic block copolymers is as follows:

[0044] Step A: Mix 5 parts polyethylene glycol methacrylate and 50 parts dichloromethane, cool to 0°C with ice water, add 0.5 parts triethylamine and 1.5 parts acryloyl chloride under nitrogen protection and stir until homogeneous. Heat to room temperature and react for 8 hours. After filtration, washing and drying, the intermediate is obtained.

[0045] Step B: The hydrogen-capped polydimethylsiloxane, toluene, and caster catalyst were mixed evenly, and the intermediate was added. The mixture was heated to 80°C under nitrogen protection and reacted for 2 hours. After rotary evaporation, the amphiphilic block copolymer was obtained. The molar ratio of hydrogen-capped polydimethylsiloxane to the intermediate was 1:1.5. The amount of caster catalyst added was 0.01 wt% of the total mass of hydrogen-capped polydimethylsiloxane and intermediate.

[0046] The preparation method of silica sol containing double bonds is as follows:

[0047] Mix 10 parts tetraethyl orthosilicate, 30 parts anhydrous ethanol and 6 parts deionized water evenly, adjust the pH of the system to 2 with hydrochloric acid, add 5 parts γ-methacryloyloxypropyltrimethoxysilane and 50 parts anhydrous ethanol, stir for 3 hours and let stand overnight to obtain a silica sol containing double bonds.

[0048] Example 2: A method for preparing a high-flatness borosilicate glass culture dish, comprising the following processes:

[0049] Step 1: Take high borosilicate flat glass, cut it into glass discs, preheat it to 550℃, and obtain preheated glass discs;

[0050] Step 2: Place the preheated glass disc into the mold and bend it (at 900℃). Anneal it at 500℃ for 1.5 hours and cool it to room temperature to obtain a borosilicate glass culture dish.

[0051] Step 3: Mix 50 parts of epoxy acrylate, 25 parts of trimethylolpropane triacrylate, 5 parts of 2-hydroxy-methylphenylpropane-1-one and 30 parts of dipropylene glycol diacrylate evenly, add 15 parts of silica sol containing double bonds, 8 parts of amphiphilic block copolymer and 4 parts of 2-methacryloyloxyethyl phosphocholine and mix evenly to obtain a composite coating.

[0052] Step 4: Plasma treatment is performed on the high borosilicate glass culture dish (the discharge atmosphere is a mixture of oxygen and nitrogen in a volume ratio of 3:2, the treatment time is 5 minutes, the treatment power is 120W, and the vacuum degree is 50Pa), then a composite coating is applied, and the dish is cured under a UV lamp for 2 minutes to obtain a high-flatness high borosilicate glass culture dish.

[0053] The preparation method of amphiphilic block copolymers is as follows:

[0054] Step A: Mix 8 parts of polyethylene glycol methacrylate and 88 parts of dichloromethane, cool to 0°C with ice water, add 1.6 parts of triethylamine and 3 parts of acryloyl chloride under nitrogen protection and stir until homogeneous, heat to room temperature and react for 9 hours. After filtration, washing and drying, the intermediate is obtained.

[0055] Step B: The hydrogen-capped polydimethylsiloxane, toluene, and caster catalyst were mixed evenly, and the intermediate was added. The mixture was heated to 85°C under nitrogen protection and reacted for 3 hours. After rotary evaporation, the amphiphilic block copolymer was obtained. The molar ratio of hydrogen-capped polydimethylsiloxane to the intermediate was 1:1.8. The amount of caster catalyst added was 0.1 wt% of the total mass of hydrogen-capped polydimethylsiloxane and the intermediate.

[0056] The preparation method of silica sol containing double bonds is as follows:

[0057] Mix 15 parts tetraethyl orthosilicate, 52.5 parts anhydrous ethanol and 10.5 parts deionized water evenly, adjust the pH of the system to 2.5 with hydrochloric acid, add 6 parts of a mixed solution of γ-methacryloyloxypropyltrimethoxysilane and 48 parts anhydrous ethanol, stir for 4 hours, let stand overnight to obtain a silica sol containing double bonds.

[0058] Example 3: A method for preparing a high-flatness borosilicate glass culture dish, comprising the following processes:

[0059] Step 1: Take high borosilicate flat glass, cut it into glass discs, preheat it to 600℃, and obtain preheated glass discs;

[0060] Step 2: Place the preheated glass disc into the mold and bend it (at 950℃). Anneal at 550℃ for 2 hours and cool to room temperature to obtain a borosilicate glass culture dish.

[0061] Step 3: Mix 60 parts of epoxy acrylate, 30 parts of trimethylolpropane triacrylate, 8 parts of 2-hydroxy-methylphenylpropane-1-one and 35 parts of dipropylene glycol diacrylate evenly, add 20 parts of silica sol containing double bonds, 10 parts of amphiphilic block copolymer and 5 parts of 2-methacryloyloxyethyl phosphocholine and mix evenly to obtain a composite coating;

[0062] Step 4: Plasma treatment is performed on the high borosilicate glass culture dish (the discharge atmosphere is a mixture of oxygen and nitrogen in a volume ratio of 3:2, the treatment time is 7 minutes, the treatment power is 150W, and the vacuum degree is 60Pa), then a composite coating is applied, and the dish is cured under a UV lamp for 2 minutes to obtain a high-flatness high borosilicate glass culture dish.

[0063] The preparation method of amphiphilic block copolymers is as follows:

[0064] Step A: Mix 10 parts of polyethylene glycol methacrylate and 120 parts of dichloromethane, cool to 0°C with ice water, add 3 parts of triethylamine and 5 parts of acryloyl chloride under nitrogen protection and stir until homogeneous, heat to room temperature and react for 10 hours. After filtration, washing and drying, the intermediate is obtained.

[0065] Step B: The hydrogen-capped polydimethylsiloxane, toluene, and caster catalyst were mixed evenly, and the intermediate was added. The mixture was heated to 90°C under nitrogen protection and reacted for 4 hours. After rotary evaporation, the amphiphilic block copolymer was obtained. The molar ratio of hydrogen-capped polydimethylsiloxane to the intermediate was 1:2. The amount of caster catalyst added was 0.2 wt% of the total mass of hydrogen-capped polydimethylsiloxane and intermediate.

[0066] The preparation method of silica sol containing double bonds is as follows:

[0067] Mix 20 parts tetraethyl orthosilicate, 80 parts anhydrous ethanol and 16 parts deionized water evenly, adjust the pH of the system to 3 with hydrochloric acid, add 5 parts γ-methacryloyloxypropyltrimethoxysilane and 50 parts anhydrous ethanol, stir for 5 hours and let stand overnight to obtain a silica sol containing double bonds.

[0068] Comparative Example 1: A method for preparing a high-flatness borosilicate glass culture dish, comprising the following processes:

[0069] Step 1: Take high borosilicate flat glass, cut it into glass discs, preheat it to 550℃, and obtain preheated glass discs;

[0070] Step 2: Place the preheated glass disc into the mold and bend it (at 900℃). Anneal it at 500℃ for 1.5 hours and cool it to room temperature to obtain a borosilicate glass culture dish.

[0071] Step 3: Mix 50 parts of epoxy acrylate, 25 parts of trimethylolpropane triacrylate, 5 parts of 2-hydroxy-methylphenylpropane-1-one and 30 parts of dipropylene glycol diacrylate evenly, add 8 parts of amphiphilic block copolymer and 4 parts of 2-methacryloyloxyethyl phosphocholine and mix evenly to obtain a composite coating.

[0072] Step 4: Plasma treatment is performed on the high borosilicate glass culture dish (the discharge atmosphere is a mixture of oxygen and nitrogen in a volume ratio of 3:2, the treatment time is 5 minutes, the treatment power is 120W, and the vacuum degree is 50Pa), then a composite coating is applied, and the dish is cured under a UV lamp for 2 minutes to obtain a high-flatness high borosilicate glass culture dish.

[0073] Compared with Example 2, Comparative Example 1 did not introduce silicone rubber containing double bonds, and the other steps were the same as in Example 2.

[0074] Comparative Example 2: A method for preparing a high-flatness borosilicate glass culture dish, comprising the following processes:

[0075] Step 1: Take high borosilicate flat glass, cut it into glass discs, preheat it to 550℃, and obtain preheated glass discs;

[0076] Step 2: Place the preheated glass disc into the mold and bend it (at 900℃). Anneal it at 500℃ for 1.5 hours and cool it to room temperature to obtain a borosilicate glass culture dish.

[0077] Step 3: Mix 50 parts of epoxy acrylate, 25 parts of trimethylolpropane triacrylate, 5 parts of 2-hydroxy-methylphenylpropane-1-one and 30 parts of dipropylene glycol diacrylate evenly, add 15 parts of silica sol containing double bonds, 8 parts of polyethylene glycol methacrylate and 4 parts of 2-methacryloyloxyethyl phosphocholine and mix evenly to obtain a composite coating;

[0078] Step 4: Plasma treatment is performed on the high borosilicate glass culture dish (the discharge atmosphere is a mixture of oxygen and nitrogen in a volume ratio of 3:2, the treatment time is 5 minutes, the treatment power is 120W, and the vacuum degree is 50Pa), then a composite coating is applied, and the dish is cured under a UV lamp for 2 minutes to obtain a high-flatness high borosilicate glass culture dish.

[0079] Compared to Example 2, Comparative Example 2 replaced the amphiphilic block copolymer with the same mass of polyethylene glycol methacrylate, while the other steps were the same as in Example 2.

[0080] Comparative Example 3: A method for preparing a high-flatness borosilicate glass culture dish, comprising the following processes:

[0081] Step 1: Take high borosilicate flat glass, cut it into glass discs, preheat it to 550℃, and obtain preheated glass discs;

[0082] Step 2: Place the preheated glass disc into the mold and bend it (at 900℃). Anneal it at 500℃ for 1.5 hours and cool it to room temperature to obtain a borosilicate glass culture dish.

[0083] Step 3: Mix 50 parts of epoxy acrylate, 25 parts of trimethylolpropane triacrylate, 5 parts of 2-hydroxy-methylphenylpropane-1-one and 30 parts of dipropylene glycol diacrylate evenly, add 15 parts of silica sol containing double bonds and 8 parts of amphiphilic block copolymer and mix evenly to obtain a composite coating.

[0084] Step 4: Plasma treatment is performed on the high borosilicate glass culture dish (the discharge atmosphere is a mixture of oxygen and nitrogen in a volume ratio of 3:2, the treatment time is 5 minutes, the treatment power is 120W, and the vacuum degree is 50Pa), then a composite coating is applied, and the dish is cured under a UV lamp for 2 minutes to obtain a high-flatness high borosilicate glass culture dish.

[0085] Compared with Example 2, Comparative Example 3 did not introduce 2-methacryloyloxyethyl phosphocholine, and the other steps were the same as in Example 2.

[0086] Experiment: High-flatness borosilicate glass culture dishes obtained in Examples 1-3 and Comparative Examples 1-3 were used to prepare samples. Their performance was tested and the results were recorded.

[0087] Hardness test: The pencil hardness test was performed on the sample according to the standard GB / T 6739-2006 "Determination of Hardness of Paints and Varnishes by Pencil Method".

[0088] Coating adhesion test: The test was conducted according to standard GB / T 9286-2021 "Cross-cut test of paint and varnish film".

[0089] Anti-protein performance test: Bovine serum albumin (FITC-BSA) labeled with fluorescein isothiocyanate at a concentration of 5 mg / mL and a purity of 98% (produced by Shanghai Kemin Biotechnology Co., Ltd.) was used for the experiment. Under dark conditions, 50 μL of the labeled protein solution was taken with a pipette, diluted at a volume ratio of 1:20, and dropped onto the surface of the coated sample. A coverslip was then placed on top to allow the protein solution to spread evenly. After 1 hour, the coverslip was removed, and the sample surface was washed with PBS buffer to remove as much protein solution as possible. Observation was performed using a LEICA DM6000B confocal microscope with an excitation wavelength of 488 nm and an emission wavelength of 500-550 nm. Image-Pro was used to process the image, and the relative gray value of the sample was calculated. A higher gray value indicates a greater amount of attached protein.

[0090] The test results are shown in Table 1.

[0091] Table 1

[0092]

[0093] Based on the data in the table above, the following conclusions can be clearly drawn:

[0094] Combining Examples 1-3 and Comparative Examples 1-3, it can be seen that the high-flatness borosilicate glass culture dishes prepared by the present invention exhibit excellent surface flatness, while also possessing superior hardness and resistance to protein adhesion, effectively resisting physical wear and extending service life.

[0095] It will be apparent to those skilled in the art that the present invention is not limited to the details of the exemplary embodiments described above, and that the invention can be implemented in other specific forms without departing from the spirit or essential characteristics of the invention. Therefore, the embodiments should be considered in all respects as exemplary and non-limiting, and the scope of the invention is defined by the appended claims rather than the foregoing description. Thus, it is intended that all variations falling within the meaning and scope of equivalents of the claims be included within the present invention.

Claims

1. A method for preparing a high-flatness borosilicate glass culture dish, characterized in that: Includes the following steps: Step 1: Take high borosilicate flat glass, cut it into glass discs, and preheat it to 500-600℃ to obtain preheated glass discs; Step 2: Place the preheated glass disc into the mold, bend it into shape, anneal it, and cool it to room temperature to obtain a borosilicate glass culture dish. Step 3: Mix epoxy acrylate, trimethylolpropane triacrylate, photoinitiator and reactive diluent evenly, add silica sol containing double bonds, amphiphilic block copolymer and 2-methacryloyloxyethyl phosphocholine and mix evenly to obtain composite coating; Step 4: Plasma treatment is performed on the high borosilicate glass culture dish, followed by coating with a composite coating and UV curing to obtain a high-flatness high borosilicate glass culture dish; The preparation method of the amphiphilic block copolymer is as follows: Step A: Mix polyethylene glycol methacrylate and dichloromethane, cool to 0°C with ice water, add triethylamine and acryloyl chloride under nitrogen protection and stir until homogeneous, heat to room temperature and react for 8-10 hours. After filtration, washing and drying, the intermediate is obtained. Step B: Mix hydrogen-capped polydimethylsiloxane, toluene and caster catalyst evenly, add intermediate, heat to 80-90℃ under nitrogen protection, react for 2-4 hours, and obtain amphiphilic block copolymer by rotary evaporation.

2. The method for preparing a high-flatness borosilicate glass culture dish according to claim 1, characterized in that: The composite coating comprises the following components by weight: 40-60 parts epoxy acrylate, 20-30 parts trimethylolpropane triacrylate, 3-8 parts photoinitiator, 10-20 parts silica sol containing double bonds, 5-10 parts amphiphilic block copolymer, 3-5 parts 2-methacryloyloxyethyl phosphocholine, and 25-35 parts reactive diluent.

3. The method for preparing a high-flatness borosilicate glass culture dish according to claim 1, characterized in that: The mass ratio of polyethylene glycol methacrylate, triethylamine, and acryloyl chloride is 1:(0.1-0.3):(0.2-0.5).

4. The method for preparing a high-flatness borosilicate glass culture dish according to claim 1, characterized in that: The molar ratio of the hydrogen-terminated polydimethylsiloxane to the intermediate is 1:(1.5-2.0).

5. The method for preparing a high-flatness borosilicate glass culture dish according to claim 2, characterized in that: The preparation method of the silica sol containing double bonds is as follows: Tetraethyl orthosilicate, anhydrous ethanol, and deionized water were mixed evenly. The pH of the system was adjusted to 2-3 using hydrochloric acid. A mixed solution of γ-methacryloyloxypropyltrimethoxysilane and anhydrous ethanol was added, and the mixture was stirred for 3-5 hours and allowed to stand overnight to obtain a silica sol containing double bonds.

6. The method for preparing a high-flatness borosilicate glass culture dish according to claim 5, characterized in that: The mass ratio of γ-methacryloxypropyltrimethoxysilane, tetraethyl orthosilicate and anhydrous ethanol is 1:(2-4):(5-10).

7. The method for preparing a high-flatness borosilicate glass culture dish according to claim 1, characterized in that: The plasma treatment process conditions are as follows: the discharge atmosphere is a mixture of oxygen and nitrogen in a volume ratio of 3:2, the treatment time is 3-7 min, the treatment power is 100-150 W, and the vacuum degree is 40-60 Pa.

8. The method for preparing a high-flatness borosilicate glass culture dish according to claim 2, characterized in that: The reactive diluent is tripropylene glycol diacrylate.

9. A high-flatness borosilicate glass culture dish prepared by the preparation method according to any one of claims 1-8.

Images