Solar photovoltaic cell panel manufacturing silicon wafer high-efficiency cleaning equipment

Abstract

The application relates to the technical field of silicon wafer cleaning equipment, in particular to a high-efficiency silicon wafer cleaning equipment for manufacturing solar photovoltaic cell panels, which comprises a cleaning box and an electric push rod and further comprises a connecting frame arranged at the end of the electric push rod, a cleaning unit arranged on the connecting frame, a clamping type rotating part arranged on the connecting frame, which is used for clamping and positioning silicon wafers of different sizes and cleaning the clamping positions by alternately canceling clamping, and connecting pieces one and two arranged on the connecting frame. The high-efficiency silicon wafer cleaning equipment for manufacturing solar photovoltaic cell panels can effectively clean the clamping positions of the silicon wafers by using the cleaning unit when the silicon wafers are cleaned by workers, and the clamping areas can be fully cleaned in the rotating process by the alternately canceling clamping mode, so that the problem that the clamping positions become cleaning blind areas in the traditional cleaning mode is avoided.

Description

TECHNICAL FIELD

[0001] The application relates to the technical field of silicon wafer cleaning equipment, in particular to high-efficiency silicon wafer cleaning equipment for manufacturing solar photovoltaic cell panels. BACKGROUND

[0002] In the production process of a solar photovoltaic cell panel, a silicon wafer serves as a key raw material, and the cleanliness of the surface of the silicon wafer has a crucial influence on the conversion efficiency and service life of the cell panel. A traditional silicon wafer cleaning process usually relies on manual work or simple mechanical equipment. These cleaning methods have certain limitations in processing efficiency and cleaning quality. In particular, when the silicon wafer is clamped and positioned for subsequent processing or detection, the clamping position often becomes a blind area for cleaning, because the clamping position is difficult to be effectively reached by the traditional cleaning methods.

[0003] Most of the existing silicon wafer cleaning equipment adopts soaking, spraying or brushing methods. For example, the high-efficiency silicon wafer cleaning equipment for manufacturing solar photovoltaic cell panels disclosed in the patent No. CN106531843B. Although these methods can remove most of the stains and particles on the surface of the silicon wafer to a certain extent, the clamping or overlapping position cannot be fully cleaned due to the limitations of the structural design and operating principle. The stains and particles remaining on the clamping position not only affect the overall cleanliness of the silicon wafer, but also may cause surface pollution of the silicon wafer in the subsequent processing process, thereby affecting the performance and reliability of the cell panel. Therefore, the high-efficiency silicon wafer cleaning equipment for manufacturing solar photovoltaic cell panels is proposed. SUMMARY

[0004] One of the technical problems to be solved by the present application is how to design a high-efficiency silicon wafer cleaning equipment for manufacturing solar photovoltaic cell panels which can clean the clamping position.

[0005] To solve the above technical problems, the application provides a high-efficiency silicon wafer cleaning equipment for manufacturing solar photovoltaic cell panels, which comprises a cleaning box and an electric push rod, and further comprises:

[0006] A connecting frame is arranged at the end of the electric push rod.

[0007] A cleaning unit is arranged on the connecting frame.

[0008] The cleaning unit comprises a clamping type rotating part arranged on the connecting frame, which is used for clamping and positioning different sizes of silicon wafers and cleaning the clamping position by alternately canceling clamping.

[0009] The clamping type rotating part is arranged in multiple numbers for cleaning multiple silicon wafers.

[0010] The connecting frame is provided with a connecting member one and a connecting member two, which are used for controlling the synchronous adjustment of the plurality of clamping rotary components.

[0011] In some embodiments, the clamping rotary component comprises two positioning frames slidably arranged on the connecting frame, the connecting frame is provided with a displacement member for driving the two positioning frames to synchronously displace, each of the positioning frames is provided with a rotary assembly for controlling the rotation of the silicon wafer in the cleaning tank and cleaning the clamping position during the rotation.

[0012] In some embodiments, the displacement member comprises a bidirectional screw rod rotatably arranged on the connecting frame, and the two positioning frames are threadedly connected to the two sides of the bidirectional screw rod, respectively.

[0013] In some embodiments, the rotary assembly comprises a rotating disc and a rotating shaft rotatably arranged on the positioning frame, the rotating disc and the rotating shaft are coaxially arranged and fixedly connected, the rotating disc is provided with two groups of clamping blocks, the rotating disc is provided with a rotating member connected with the two groups of clamping blocks for controlling the rotation of the two groups of clamping blocks, the rotating shaft is provided with a switching member for controlling the alternate switching of the two groups of clamping blocks, and the positioning frame is provided with a synchronous member for controlling the synchronous operation of the clamping blocks on the two sides.

[0014] In some embodiments, the number of clamping blocks in each group of clamping blocks is the same and greater than 2, the rotating member comprises a plurality of displacement rods slidably arranged on the rotating disc, respectively, and the clamping blocks are arranged on the adjacent displacement rods, respectively.

[0015] In some embodiments, the switching member comprises a fixed rod arranged on the positioning frame, the fixed rod is provided with a jacking post at the end, any clamping block in each group of clamping blocks is provided with a guide block matched with the jacking post, the displacement rod is provided with a spring outside, the two ends of the spring are connected with the rotating disc and the clamping block, respectively, the rotating disc is provided with a plurality of damping layers, the displacement rod is movably penetrated through the damping layers, the rotating shaft is provided with a guide post, and the guide post is slidably provided with two support frames connected with the two groups of clamping blocks, respectively.

[0016] In some embodiments, the synchronous member comprises two rotating shafts rotatably arranged on the two positioning frames, respectively, the opposite sides of the two rotating shafts are provided with a polygonal rod one and a polygonal seat one matched for use, respectively, and the two rotating shafts and the rotating shaft are all provided with a belt wheel, and the two belt wheels located on the same positioning frame are all provided with a synchronous belt.

[0017] In some embodiments, the connecting member one comprises a plurality of couplings arranged between the adjacent two bidirectional screw rods, respectively, the bidirectional screw rod located at the end extends to the outside of the connecting frame, and the end is provided with a knob.

[0018] In some embodiments, the connecting piece two comprises a driving motor arranged on the positioning frame at the end, the driving motor is connected with the adjacent rotating shaft, and the two rotating shafts on the opposite sides of the shaft coupling are provided with a polygonal rod two and a polygonal seat two matched with each other.

[0019] In some embodiments, the clamping block is provided with a clamping layer near one side of the silicon wafer, and the clamping layer is composed of plastic material.

[0020] The present application has at least the following advantages:

[0021] 1. The clamping position is completely cleaned: through the design of the clamping rotary part, the effective cleaning of the clamping position of the silicon wafer is realized. The alternating clamping-free mode ensures that the clamping area is fully cleaned during rotation, avoiding the problem that the clamping position becomes a blind area in the traditional cleaning mode.

[0022] 2. Strong adaptability: the equipment can clamp and clean silicon wafers of different sizes and shapes without frequent replacement or adjustment of the clamping part, improving the versatility and flexibility of the equipment.

[0023] 3. High cleaning efficiency: the arrangement of multiple clamping rotary parts allows simultaneous cleaning of multiple silicon wafers, significantly improving cleaning efficiency and meeting the needs of large-scale production. BRIEF DESCRIPTION OF DRAWINGS

[0024] Figure 1 It is a schematic diagram of the overall structure of the present application;

[0025] Figure 2 It is another view of the overall structure of the present application;

[0026] Figure 3 It is a schematic diagram of the cleaning unit structure of the present application;

[0027] Figure 4 It is a schematic diagram of the clamping rotary part of the present application; Figure 3

[0028] Figure 5 It is a schematic diagram of the cleaning unit plane structure of the present application;

[0029] Figure 6 It is a schematic diagram of the clamping rotary part structure of the present application;

[0030] Figure 7 It is a schematic diagram of the clamping rotary part structure of the present application;

[0031] Figure 8 It is another view of the clamping rotary part structure of the present application;

[0032] Figure 9 ​The exploded schematic view of the clamping type rotating component part structure of the present application;

[0033] Figure 10 The schematic view of the rotating assembly of the present application;

[0034] Figure 11 The schematic view of the structure of the second embodiment of the present application.

[0035] In the figure: 1, cleaning tank; 2, electric push rod; 3, connecting frame; 4, cleaning unit; 5, clamping type rotating component; 51, positioning frame; 6, displacement piece; 61, bidirectional screw rod; 7, rotating assembly; 71, rotating disc; 72, rotating shaft; 73, clamping block; 8, rotating piece; 81, displacement rod; 9, switching piece; 91, fixed rod; 92, jacking column; 93, guide block; 94, spring; 95, damping layer; 96, guide column; 97, support frame; 10, synchronization piece; 101, rotating shaft; 102, polygonal rod one; 103, polygonal seat one; 104, pulley; 105, synchronous belt; 11, connecting piece one; 111, shaft coupling; 12, connecting piece two; 121, driving motor; 122, polygonal rod two; 123, polygonal seat two; 13, clamping layer. DETAILED DESCRIPTION

[0036] The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all the embodiments of the present application. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative work fall within the protection scope of the present application. EMBODIMENT

[0037] Please refer to Figures 1-10 The present application provides a technical solution:

[0038] The high-efficiency cleaning equipment for manufacturing solar photovoltaic cell panel by using silicon wafer comprises a cleaning tank 1 and an electric push rod 2. The cleaning tank 1 can store cleaning liquid or clean water. The electric push rod 2 is used for lifting and lowering the connecting frame 3. The cleaning tank 1 and the electric push rod 2 are common existing structures, and thus will not be described in detail. The high-efficiency cleaning equipment further comprises:

[0039] The connecting frame 3 is arranged at the end of the electric push rod 2.

[0040] The cleaning unit 4 is arranged on the connecting frame 3.

[0041] The cleaning unit 4 comprises a clamping type rotating component 5 arranged on the connecting frame 3. The clamping type rotating component 5 is used for clamping and positioning silicon wafers of different sizes and cleaning the clamping position by alternately canceling clamping.

[0042] The clamping type rotating components 5 are provided in plurality for cleaning a plurality of silicon wafers;

[0043] The clamping type rotating components 5 comprise two positioning racks 51 slidingly arranged on the connecting frame 3, the connecting frame 3 is provided with a displacement member 6 for driving the two positioning racks 51 to synchronously displace, the positioning racks 51 are each provided with a rotating assembly 7 for controlling the silicon wafers to rotate in the cleaning tank 1 and cleaning the clamping position during the rotation;

[0044] The displacement member 6 comprises a bidirectional screw rod 61 rotatingly arranged on the connecting frame 3, and the two positioning racks 51 are respectively threadedly connected on both sides of the bidirectional screw rod 61;

[0045] The rotating assembly 7 comprises a rotating disc 71 and a rotating shaft 72 rotatingly arranged on the positioning rack 51, the rotating disc 71 and the rotating shaft 72 are coaxially arranged and fixedly connected, the rotating disc 71 is provided with two groups of clamping blocks 73, the rotating disc 71 is provided with a rotating member 8 connected with the two groups of clamping blocks 73 for controlling the two groups of clamping blocks 73 to rotate, the rotating shaft 72 is provided with a switching member 9 for controlling the two groups of clamping blocks 73 to alternately switch, and the positioning rack 51 is provided with a synchronizing member 10 for controlling the two groups of clamping blocks 73 to synchronously work;

[0046] The number of the clamping blocks 73 in each group of the clamping blocks 73 is same and greater than 2, the rotating member 8 comprises a plurality of displacement rods 81 slidingly arranged on the rotating disc 71 respectively, and the clamping blocks 73 are respectively arranged on the adjacent displacement rods 81, and the number of the clamping blocks 73 in each group of the clamping blocks 73 is 3 in the present scheme, but is not limited to;

[0047] The switching member 9 comprises a fixed rod 91 arranged on the positioning rack 51, the fixed rod 91 is provided with a jacking post 92 at the end, any clamping block 73 in each group of the clamping blocks 73 is provided with a guide block 93 matched with the jacking post 92, the displacement rod 81 is sleeved with a spring 94 outside, the two ends of the spring 94 are respectively connected with the rotating disc 71 and the clamping block 73, the rotating disc 71 is provided with a plurality of damping layers 95, the displacement rod 81 is movably penetrated through the damping layers 95, the rotating shaft 72 is provided with a guide column 96, the guide column 96 is slidingly provided with two support frames 97 respectively connected with the two groups of clamping blocks 73, the guide column 96 is arranged so that the support frames 97 can slide and displace in the guide column 96, thereby the clamping position can be cleaned, and the damping layers 95 are arranged so that after the guide block 93 is jacked out by the jacking post 92, the guide block 93 will not be directly reset by the spring 94, but will be slowly reset, which is beneficial to avoid the impact of the clamping block 73 on the silicon wafer;

[0048] The synchronizer 10 comprises two rotating shafts 101 rotatably arranged on two positioning frames 51, and polygonal rods I 102 and polygonal seats I 103 are arranged on opposite sides of the two rotating shafts 101, respectively, and the two rotating shafts 101 and the rotating shaft 72 are provided with pulleys 104, and a synchronous belt 105 is arranged between the two pulleys 104 on the same positioning frame 51.

[0049] The connecting frame 3 is provided with a connecting piece I 11 and a connecting piece II 12 for controlling the synchronous adjustment of the plurality of clamping rotating parts 5;

[0050] The connecting piece I 11 comprises a plurality of couplings 111 arranged between adjacent two bidirectional screws 61, the bidirectional screw 61 at the end extends to the outside of the connecting frame 3, and the end is provided with a knob, rotating the knob can drive the plurality of bidirectional screws 61 to rotate synchronously under the action of the coupling 111, thereby driving the plurality of positioning frames 51 to move synchronously, realizing the clamping and positioning work of the plurality of silicon wafers;

[0051] The connecting piece II 12 comprises a driving motor 121 arranged on the positioning frame 51 at the end, the driving motor 121 is connected with the adjacent rotating shaft 101, polygonal rods II 122 and polygonal seats II 123 are arranged on opposite sides of the two rotating shafts 101 close to the coupling 111, the driving motor 121 drives the adjacent rotating shaft 101 to rotate, and the next rotating shaft 101 is driven to rotate under the action of the polygonal rod I 102 and the polygonal seat I 103, and the other rotating shaft 101 is driven to rotate under the action of the polygonal rod II 122 and the polygonal seat II 123, and all the rotating shafts 101 can be driven to rotate in the same way, so that the silicon wafer can rotate continuously during cleaning, and the clamping position can be cleaned during rotation.

[0052] When the device is initially, the connecting frame 3 is lifted to the upper side of the cleaning tank 1 by the electric push rod 2, the positioning frame 51 in the clamping rotating part 5 is in the initial position under the action of the bidirectional screw 61, the clamping block 73 does not clamp the silicon wafer, the silicon wafer is placed between the two groups of clamping blocks 73, the bidirectional screw 61 is driven to rotate by rotating the knob, so that the two positioning frames 51 move synchronously to the center to clamp the silicon wafer, and then the silicon wafer is lowered into the cleaning tank 1 by the electric push rod 2;

[0053] The driving motor 121 is started, and the rotating shafts 101 and the rotating shaft 72 are driven to rotate synchronously through the cooperation of the polygonal rod I 102, the polygonal seat I 103, the polygonal rod II 122 and the polygonal seat II 123, and the transmission of the synchronous belt 105 and the pulley 104, so that the clamping block 73 and the silicon wafer rotate with the rotating shaft 72, and the cleaning effect of the silicon wafer is improved;

[0054] In the rotating process, two guiding blocks 93 in two groups will contact the jacks 92 on the fixed rod 91 in turn and reciprocate, and then be pushed back by the jacks 92, so that the two groups of clamping blocks 73 are alternately loosened and clamped, the clamping position is cleaned, the damping layer 95 on the rotating disc 71 slowly resets the clamping block 73, and impact on the silicon wafer is avoided;

[0055] After the cleaning is completed, the electric push rod 2 lifts the connecting frame 3, reversely rotates the knob to loosen the silicon wafer, takes out the silicon wafer and puts a new silicon wafer for the next round of cleaning, and the whole process realizes the integrated operation of stable clamping, rotating cleaning and alternating clamping and cleaning of the silicon wafer, and improves the cleaning efficiency and cleaning quality. Embodiment

[0056] Please refer to Figure 11 The application provides a technical solution:

[0057] Different from embodiment 1, the clamping block 73 is provided with a clamping layer 13 on the side close to the silicon wafer, the clamping layer 13 is made of plastic material, and in the scheme, the clamping layer 13 is made of PFA or PEEK material, but is not limited to, so as to avoid damage to the surface of the silicon wafer.

[0058] Although the embodiments of the application have been shown and described, it can be understood by those skilled in the art that various changes, modifications, replacements and variations can be made to the embodiments without departing from the principles and spirits of the application.

Claims

1. A high-efficiency cleaning device for silicon wafers used in the manufacture of solar photovoltaic panels, comprising a cleaning tank (1) and an electric push rod (2), characterized in that: Also include: ​ The connecting frame (3) is provided at the end of the electric push rod (2); The cleaning unit (4) is provided on the connecting frame (3); The cleaning unit (4) includes a clamping type rotating part (5) provided on the connecting frame (3), which is used for clamping positioning of silicon wafers of different sizes, and cleaning the clamping position by alternatingly releasing the clamping; The clamping type rotating part (5) is provided with a plurality of clamping type rotating parts (5) for cleaning a plurality of silicon wafers; The connecting frame (3) is provided with a connecting piece one (11) and a connecting piece two (12) for controlling the synchronous adjustment of a plurality of clamping type rotating parts (5), the clamping type rotating part (5) includes two positioning frames (51) slidingly arranged on the connecting frame (3), the connecting frame (3) is provided with a displacement member (6) for driving the two positioning frames (51) to displace synchronously, the positioning frame (51) is provided with a rotating assembly (7), which is used for controlling the rotation of the silicon wafer in the cleaning box (1), and the clamping position is cleaned during rotation, the displacement member (6) includes a two-way screw rod (61) rotatingly arranged on the connecting frame (3), the two positioning frames (51) are threadedly connected on both sides of the two-way screw rod (61), the rotating assembly (7) includes a rotating disc (71) and a rotating shaft (72) rotatingly arranged on the positioning frame (51), the rotating disc (71) and the rotating shaft (72) are coaxially arranged and fixedly connected, the rotating disc (71) is provided with two groups of clamping blocks (73), the rotating disc (71) is provided with a rotating member (8) connected with the two groups of clamping blocks (73), which is used for controlling the rotation of the two groups of clamping blocks (73), the rotating shaft (72) is provided with a switching member (9) for controlling the alternating switching of the two groups of clamping blocks (73), the positioning frame (51) is provided with a synchronous member (10) for controlling the synchronous work of the clamping blocks (73) on both sides, the number of clamping blocks (73) in each group of clamping blocks (73) is the same and greater than 2, the rotating member (8) includes a plurality of displacement rods (81) slidingly arranged on the rotating disc (71), the clamping blocks (73) are arranged on the adjacent displacement rods (81), the switching member (9) includes a fixed rod (91) arranged on the positioning frame (51), the fixed rod (91) is provided with a top column (92) at the end, any clamping block (73) in each group of clamping blocks (73) is provided with a guide block (93) matched with the top column (92), the displacement rod (81) is provided with a spring (94) outside, the two ends of the spring (94) are connected with the rotating disc (71) and the clamping block (73), the rotating disc (71) is provided with a plurality of damping layers (95), the displacement rod (81) is movably penetrated in the damping layer (95), the rotating shaft (72) is provided with a guide column (96), the guide column (96) is slidingly provided with two support frames (97) connected with the two groups of clamping blocks (73).

2. The high efficiency cleaning apparatus for silicon wafer for making solar photovoltaic cell panel according to claim 1, characterized in that: The synchronizer (10) comprises two rotating shafts (101) arranged on two positioning frames (51) respectively, and the opposite sides of the two rotating shafts (101) are respectively provided with a polygonal rod one (102) and a polygonal seat one (103) matched with each other, and the rotating shafts (101) and the rotating shaft (72) are all provided with a belt wheel (104), and the two belt wheels (104) arranged on the same positioning frame (51) are all provided with a synchronous belt (105).

3. The high efficiency cleaning apparatus for silicon wafer for making solar photovoltaic cell panel according to claim 2, characterized in that: The connecting piece one (11) comprises a plurality of couplings (111) arranged between two adjacent bidirectional screw rods (61) respectively, and the bidirectional screw rod (61) at the end extends to the outside of the connecting frame (3), and the end is provided with a knob.

4. The high efficiency cleaning apparatus for silicon wafer for making solar photovoltaic cell panel according to claim 3, characterized in that: The connecting piece two (12) comprises a driving motor (121) arranged on the positioning frame (51) at the end, the driving motor (121) is connected with the adjacent rotating shaft (101), and the opposite sides of the two rotating shafts (101) close to the coupling (111) are all provided with a polygonal rod two (122) and a polygonal seat two (123) matched with each other.

5. The high efficiency cleaning apparatus for silicon wafer for making solar photovoltaic cell panel according to claim 1, wherein: The clamping block (73) is provided with a clamping layer (13) close to the side of the silicon wafer, and the clamping layer (13) is composed of plastic material.

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