Silicon carbide focusing ring inner wall polishing mechanism

Abstract

The invention provides a silicon carbide focusing ring inner wall polishing mechanism, and belongs to the field of focusing ring machining. The silicon carbide focusing ring inner wall polishing mechanism comprises a supporting outer frame and a polishing unit, the polishing unit is arranged above the supporting outer frame, and the polishing unit is used for polishing the inner walls of the silicon carbide focusing rings with different inner diameters; and the supporting and clamping unit is arranged above the supporting outer frame, and the supporting and clamping unit is used for supporting and fixing the plurality of silicon carbide focusing rings. The supporting and clamping unit is simple in structure and stable in fixation, can adapt to silicon carbide focusing rings with different thicknesses and different inner and outer diameters during fixation, is wide in application range, can fix the silicon carbide focusing rings with the same inner diameter together at a time and polish the silicon carbide focusing rings together, avoids the situation that multiple silicon carbide focusing rings need to be disassembled for multiple times and polished independently, and improves the production efficiency. And the polishing efficiency of the multiple silicon carbide focusing rings is improved, and the production and preparation efficiency of the multiple types of silicon carbide focusing rings is prevented from being affected.

Description

Technical Field

[0001] The invention relates to a focusing ring inner wall polishing mechanism, in particular to a silicon carbide focusing ring inner wall polishing mechanism. Background Art

[0002] In semiconductor manufacturing, the focus ring is a key component of plasma etching equipment. Positioned outside the wafer, it directly contacts the wafer, ensuring a balanced plasma flow and ensuring consistent and accurate etching.

[0003] Silicon carbide focusing ring is a type of focusing ring. Silicon carbide has the characteristics of high resistance to ion etching, high thermal conductivity, and high wear resistance, making it an ideal preparation material for focusing rings. These characteristics enable silicon carbide focusing rings to withstand high-power plasma etching processes while maintaining a long service life.

[0004] The silicon carbide focusing ring is mainly produced by chemical vapor deposition of silicon carbide into a certain shape, and then precision machining is performed. The machining includes polishing the inner wall to obtain a silicon carbide focusing ring with a smooth inner wall. In the Chinese utility model patent with publication number CN211103357U and the name "A kind of inner wall polishing device for circular ring processing", the grinding stone disk generates a circular motion driven by two shaking structures, the horizontal shaking plate and the longitudinal shaking plate, but the grinding stone disk itself does not rotate. The user only needs to place the inner wall of the object to be polished on the outer surface of the grinding stone disk. The polishing part is inserted into the inner wall of the workpiece to be polished, and the polishing is achieved by rotating the polishing part or the workpiece to be polished. However, the size of the inner diameter of the workpiece to be polished adapted by the polishing part is fixed, and the versatility is low. It is difficult to adapt to silicon carbide focusing rings with different inner diameters. At the same time, the number of fixing parts for fixing the workpiece to be polished is limited, and it is difficult to clamp and fix silicon carbide focusing rings with different outer diameters but the same inner diameter together, resulting in the need to fix them multiple times and then polish them separately, affecting the polishing efficiency of multiple silicon carbide focusing rings, thereby affecting the production efficiency of silicon carbide focusing rings. Summary of the Invention

[0005] The technical problem to be solved by the present invention is to overcome the defects of the prior art in that it is difficult to adapt to focusing rings with different inner and outer diameters and has low versatility and flexibility, and to provide a silicon carbide focusing ring inner wall polishing mechanism.

[0006] The present invention solves the above technical problems through the following technical solutions: The present invention provides a silicon carbide focusing ring inner wall polishing mechanism, comprising a supporting outer frame, A polishing unit is provided above the supporting outer frame and is used to polish the inner wall of the silicon carbide focusing ring having different inner diameters; A clamping unit, the clamping unit being disposed above the supporting outer frame and being used to support and fix the plurality of silicon carbide focusing rings; A synchronization module is connected to the inner side of the supporting outer frame. The synchronization module is connected to the polishing unit and the clamping unit respectively. The synchronization module is used to control the synchronous movement of the polishing unit and the clamping unit toward or away from each other.

[0007] In the present technical solution, the diameter of the polishing ring formed by the polishing unit can be adjusted according to the inner diameter of the silicon carbide focusing ring, and the adjustment is flexible and stable, which can expand the versatility and adaptability of the polishing mechanism. At the same time, the clamping unit adopts a three-point fixing method, so that the structure of the clamping unit is simple and the fixation is stable. When fixed, it can adapt to silicon carbide focusing rings of different thicknesses and different inner and outer diameters. It has a wide range of applications, and only silicon carbide focusing rings with the same inner diameter need to be fixed together at a single time and polished together, avoiding the need for multiple silicon carbide focusing rings to be disassembled multiple times and polished separately, thereby improving the polishing efficiency of multiple silicon carbide focusing rings and avoiding affecting the efficiency of the production and preparation of multiple models of silicon carbide focusing rings.

[0008] Preferably, the polishing unit includes a polishing support frame and a rotating shaft, the bottom side of the polishing support frame is connected to the synchronization module, one side of the polishing support frame is rotatably connected to the rotating shaft, the end of the rotating shaft away from the polishing support frame is connected to a diameter control component, and the side of the diameter control component is connected to a plurality of polishing components distributed in a ring array; A power transmission component is connected to the inner side of the polishing support frame, and an output end of the power transmission component is connected to an end of the rotating shaft away from the diameter control component. The power transmission component is used to output rotational power to the rotating shaft.

[0009] In this technical solution, the polishing unit can be used to polish silicon carbide focusing rings with different inner diameters.

[0010] Preferably, the diameter control assembly comprises a central threaded shaft, both ends of the central threaded shaft are rotatably connected to fixed plates, and one of the fixed plates is connected to one end of the rotating shaft; The surface of the central threaded shaft is threadedly connected to two symmetrically distributed adjustment plates, and the side of the adjustment plate is provided with a plurality of mounting blocks distributed in a ring array, and the side of the mounting block away from the central threaded shaft is connected to the polishing assembly, and the other side of the mounting block is provided with an adjustment column; Both ends of the adjustment column are rotatably connected to a rotating frame, wherein the rotating frame on one side is connected to one side of the mounting block, and the rotating frame on the other side is connected to the side surface of the adjustment plate.

[0011] In this technical solution, the position of the polishing component can be adjusted using the diameter control component.

[0012] Preferably, the center of the central threaded shaft is rotatably connected to the center plate, and the side of the center plate is connected to a plurality of elastic reinforcements distributed in a ring array, and the end of the elastic reinforcement away from the center plate is connected to one side of the mounting block.

[0013] In this technical solution, the center plate and the elastic reinforcement can increase the stability of the polishing assembly position.

[0014] Preferably, a plurality of limiting rails are connected to both sides of the central plate, and the surfaces of the limiting rails are slidably connected to the adjustment plate.

[0015] In this technical solution, the movement trajectory of the adjustment plate can be limited by using the limiting track.

[0016] Preferably, the polishing assembly includes a polishing block, and the polishing block is connected to one side of the mounting block; A fixed traction wheel and a movable traction wheel are respectively provided on the left and right sides of the polishing block, wherein the fixed traction wheel is close to the polishing support frame and is connected to one side of the mounting block; One side of the movable traction wheel is connected to a sliding connection column, and the sliding connection column is slidably connected to the mounting block. An elastic reset member is provided between the movable traction wheel and the mounting block, and the elastic reset member is sleeved on the surface of the sliding connection column.

[0017] In this technical solution, multiple polishing components can constitute a polishing ring, and the polishing components can be used to polish the inner wall of the silicon carbide focusing ring, and the fixed traction wheel and the movable traction wheel can pull the rotation of the polishing block to improve the polishing efficiency and polishing quality.

[0018] Preferably, the clamping unit includes a clamping support frame, the bottom side of the clamping support frame is connected to the synchronization module, and one side of the clamping support frame is rotatably connected to three angle control components distributed in a circular array, and one end of the angle control component is connected to one end of the multi-station clamping component.

[0019] In this technical solution, a clamping unit can be used to stably fix multiple silicon carbide focusing rings of different models, so as to control the accuracy of polishing.

[0020] Preferably, the angle control assembly includes an anti-slip shaft, the surface of the anti-slip shaft is rotatably connected to the clamping support frame, one end of the anti-slip shaft is connected to one end of the multi-station clamping assembly, and the other end of the anti-slip shaft is connected to a rotating disk; A control groove is provided on the side of the anti-slip shaft, an anti-skid rubber pad is connected in the control groove, a control stud is contacted and connected to the anti-skid rubber pad, and the control stud is threadedly connected to the side of the clamping support frame.

[0021] In this technical solution, the angle of the multi-station clamping assembly can be controlled by using an angle control assembly.

[0022] Preferably, the multi-station clamping assembly includes a fixed threaded shaft, one end of the fixed threaded shaft is connected to one end of the anti-slip shaft, and the surface of the fixed threaded shaft is threadedly connected to two threaded adjustment rings distributed on the left and right; A plurality of clamping plates are provided between the two threaded adjustment rings, each of which is provided with a mounting opening, and the clamping plates are sleeved on the surface of the fixed threaded shaft through the mounting opening; The fixed threaded shaft is provided with a sliding opening, the mounting opening wall of the clamping plate is connected with a follower column, and the follower column is slidably connected with the fixed threaded shaft through the sliding opening.

[0023] In this technical solution, a plurality of multi-station clamping assemblies can be used to clamp and fix the silicon carbide focusing ring.

[0024] Preferably, the synchronization module includes two symmetrically distributed synchronization threaded shafts, the end faces of the two synchronization threaded shafts are rotatably connected to the inner wall of the support outer frame, and one end of the two synchronization threaded shafts is connected to the output end of the driving source, and the driving source is installed on the outside of the support outer frame; The surface of the synchronous threaded shaft is threadedly connected with two symmetrically distributed moving plates, wherein the top of one of the moving plates is connected to the bottom side of the polishing support frame, and the top of the other moving plate is connected to the bottom side of the clamping support frame.

[0025] In this technical solution, a synchronization module is used to synchronously provide driving force for the rotating shaft and the vibration component, so that the vibration component can be driven to operate during polishing. The operation of the vibration component can shake the filter component, thereby improving the filtration efficiency of the filter component and reducing the probability of the filter component being blocked.

[0026] On the basis of conforming to the common sense in this field, the above-mentioned preferred conditions can be arbitrarily combined to obtain the preferred embodiments of the present invention.

[0027] The positive progress effect of the present invention is: The diameter of the polishing ring formed by the polishing unit of the present invention can be adjusted according to the inner diameter of the silicon carbide focusing ring, and the adjustment is flexible and stable, which can expand the versatility and adaptability of the polishing mechanism. At the same time, the clamping unit adopts a three-point fixing method, so that the structure of the clamping unit is simple and the fixation is stable. When fixed, it can adapt to silicon carbide focusing rings of different thicknesses and different inner and outer diameters. It has a wide range of applications, and silicon carbide focusing rings with the same inner diameter can be fixed together at a single time and polished together, avoiding the need to disassemble and polish multiple silicon carbide focusing rings multiple times, thereby improving the polishing efficiency of multiple silicon carbide focusing rings and avoiding affecting the efficiency of the production and preparation of multiple models of silicon carbide focusing rings. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] Figure 1 Schematic diagram of the structure of the inner wall polishing mechanism of the silicon carbide focusing ring according to an embodiment of the present invention.

[0029] Figure 2 for Figure 1 The schematic diagram of the overall internal structure of the silicon carbide focusing ring inner wall polishing mechanism is shown.

[0030] Figure 3 for Figure 1 The diagram shows the internal structure of the rotating shaft, diameter control assembly and polishing assembly of the inner wall polishing mechanism of the silicon carbide focusing ring.

[0031] Figure 4 for Figure 3 The diagram shows a partially enlarged structural diagram of point A of the inner wall polishing mechanism of the silicon carbide focusing ring.

[0032] Figure 5 for Figure 1 Schematic diagram of the three-dimensional structure of the rotating shaft, diameter control component and polishing component of the inner wall polishing mechanism of the silicon carbide focusing ring Figure 1 .

[0033] Figure 6 for Figure 1 Schematic diagram of the three-dimensional structure of the rotating shaft, diameter control component and polishing component of the inner wall polishing mechanism of the silicon carbide focusing ring Figure 2 .

[0034] Figure 7 for Figure 1 The diagram shows a three-dimensional structure of the clamping unit of the silicon carbide focusing ring inner wall polishing mechanism.

[0035] Figure 8 for Figure 2 The diagram shows a partially enlarged structural diagram of location B of the inner wall polishing mechanism of the silicon carbide focusing ring.

[0036] Figure 9 for Figure 1The diagram shows the three-dimensional structure of the fixed threaded shaft, anti-slip shaft and anti-slip rubber pad of the inner wall polishing mechanism of the silicon carbide focusing ring.

[0037] Figure 10 for Figure 1 The diagram shows a three-dimensional sectional structure of the fixed threaded shaft, anti-slip shaft and anti-slip rubber pad of the inner wall polishing mechanism of the silicon carbide focusing ring.

[0038] Figure 11 for Figure 2 The diagram shows a partially enlarged structural diagram of location C of the inner wall polishing mechanism of the silicon carbide focusing ring.

[0039] Figure 12 for Figure 1 The diagram shows the three-dimensional structure of the power transmission component and the vibration component of the inner wall polishing mechanism of the silicon carbide focusing ring.

[0040] Figure 13 for Figure 1 Schematic diagram of the three-dimensional structure of the spray dust reduction component of the inner wall polishing mechanism of the silicon carbide focusing ring.

[0041] Description of Reference Numerals In the figure: 1. Support outer frame; 2. Synchronous module; 21. Synchronous threaded shaft; 22. Driving source; 23. Moving plate; 3. Polishing support frame; 4. Rotating axis; 5. Diameter control assembly; 51. Center threaded shaft; 52. Fixed plate; 53. Adjusting plate; 54. Mounting block; 55. Adjusting column; 56. Rotating frame; 57. Center plate; 58. Elastic reinforcement; 59. Limiting track; 6. Polishing assembly; 61. Polishing block; 62. Fixed traction wheel; 63. Movable traction wheel; 64. Sliding connecting column; 65. Elastic reset member; 7. Power transmission assembly; 71. Power source; 72. Upper sprocket; 73. Transmission chain; 74. Lower sprocket; 8. Clamping support frame; 9. Angle control assembly; 9 1. Anti-slip rotating shaft; 92. Rotating disk; 93. Control stud; 94. Anti-slip rubber pad; 10. Multi-station clamping assembly; 101. Fixed threaded shaft; 102. Threaded adjustment ring; 103. Clamping plate; 104. Follow-up column; 11. Protective outer frame; 12. Filter assembly; 121. Filter screen; 122. Elastic connecting belt; 13. Spray dust suppression assembly; 131. Spray pump; 132. Spray pipeline; 133. Water inlet pipe; 134. Treatment cylinder; 135. Arc filter plate; 136. Floating block; 137. Counterweight bar; 14. Vibration assembly; 141. Drive shaft; 142. Reinforcement plate; 143. Eccentric wheel; 15. Blocking assembly; 151. Collection box; 152. Arc guide guard. DETAILED DESCRIPTION

[0042] The present invention is further described below by way of examples, but the present invention is not limited to the scope of the examples.

[0043] Figures 1 to 13 Shown is a structural schematic diagram of an embodiment of the silicon carbide focusing ring inner wall polishing mechanism of the present invention.

[0044] Example 1 The silicon carbide focusing ring inner wall polishing mechanism includes a supporting outer frame 1, A polishing unit is provided above the supporting outer frame 1 and is used to polish the inner wall of the silicon carbide focusing ring with different inner diameters; A clamping unit, which is arranged above the supporting outer frame 1 and is used to support and fix the multiple silicon carbide focusing rings; The synchronization module 2 is connected to the inner side of the supporting outer frame 1 , and is respectively connected to the polishing unit and the clamping unit. The synchronization module 2 is used to control the synchronous movement of the polishing unit and the clamping unit toward or away from each other.

[0045] In an embodiment, the diameter of the polishing ring formed by the polishing unit can be adjusted according to the inner diameter of the silicon carbide focusing ring, and the adjustment is flexible and stable, which can expand the versatility and adaptability of the polishing mechanism. At the same time, the clamping unit adopts a three-point fixing method, so that the structure of the clamping unit is simple and the fixation is stable, and it can adapt to silicon carbide focusing rings of different thicknesses and different inner and outer diameters when fixed. It has a wide range of applications, and only silicon carbide focusing rings with the same inner diameter need to be fixed together at a single time and polished together, avoiding the need to disassemble and polish multiple silicon carbide focusing rings multiple times, thereby improving the polishing efficiency of multiple silicon carbide focusing rings and avoiding affecting the efficiency of the production and preparation of multiple models of silicon carbide focusing rings.

[0046] The polishing unit includes a polishing support frame 3 and a rotating shaft 4. The bottom side of the polishing support frame 3 is connected to the synchronization module 2. One side of the polishing support frame 3 is rotatably connected to the rotating shaft 4. The end of the rotating shaft 4 away from the polishing support frame 3 is connected to a diameter control component 5. The side of the diameter control component 5 is connected to multiple polishing components 6 distributed in a circular array.

[0047] A power transmission component 7 is connected to the inner side of the polishing support frame 3 , and one output end of the power transmission component 7 is connected to an end of the rotating shaft 4 away from the diameter control component 5 . The power transmission component 7 is used to output rotational power to the rotating shaft 4 .

[0048] In an embodiment, the polishing unit can be used to polish silicon carbide focusing rings with different inner diameters.

[0049] The diameter control assembly 5 includes a central threaded shaft 51 , both ends of which are rotatably connected to fixed plates 52 , one of which is connected to one end of the rotating shaft 4 ; The surface of the central threaded shaft 51 is threadedly connected to two symmetrically distributed adjustment plates 53. The side of the adjustment plate 53 is provided with a plurality of mounting blocks 54 distributed in a ring array. The side of the mounting block 54 away from the central threaded shaft 51 is connected to the polishing assembly 6. The other side of the mounting block 54 is provided with an adjustment column 55. Both ends of the adjustment column 55 are rotatably connected to a rotating frame 56 , wherein the rotating frame 56 on one side is connected to one side of the mounting block 54 , and the rotating frame 56 on the other side is connected to the side surface of the adjustment plate 53 .

[0050] In an embodiment, the position of the polishing assembly 6 can be adjusted using the diameter control assembly 5 .

[0051] The center of the central threaded shaft 51 is rotatably connected to the central plate 57 , and the side of the central plate 57 is connected to a plurality of elastic reinforcements 58 distributed in a circular array, and the end of the elastic reinforcement 58 away from the central plate 57 is connected to one side of the mounting block 54 .

[0052] In an embodiment, the center plate 57 and the elastic reinforcement 58 can be used to increase the stability of the position of the polishing assembly 6 .

[0053] A plurality of limiting rails 59 are connected to both sides of the center plate 57 , and the surfaces of the limiting rails 59 are slidably connected to the adjustment plate 53 .

[0054] In the embodiment, the limiting track 59 can be used to limit the movement trajectory of the adjustment plate 53.

[0055] During use, the central threaded shaft 51 is rotated according to the size of the inner diameter of the silicon carbide focusing ring, which drives the adjustment plates 53 on both sides to move toward or away from each other. At this time, under the action of the rotating frame 56, the adjustment column 55 is driven to rotate, thereby driving the mounting block 54 to move, so that multiple mounting blocks 54 move synchronously in a direction away from the central threaded shaft 51 or close to the central threaded shaft 51, thereby driving the polishing assembly 6 to move synchronously, adjusting the position of multiple polishing assemblies 6, and thereby adjusting the diameter of the polishing ring formed by the polishing assembly 6 to adapt to silicon carbide focusing rings of different diameters, thereby increasing the flexibility and versatility of the diameter control assembly 5 when in use, and expanding the scope of use of the diameter control assembly 5.

[0056] The polishing assembly 6 includes a polishing block 61, and the polishing block 61 is connected to one side of the mounting block 54; The polishing block 61 is provided with a fixed traction wheel 62 and a movable traction wheel 63 on the left and right sides respectively. The fixed traction wheel 62 is close to the polishing support frame 3 and is connected to one side of the mounting block 54. One side of the movable traction wheel 63 is connected to a sliding connection column 64 , and the sliding connection column 64 is slidably connected to the mounting block 54 . An elastic reset member 65 is provided between the movable traction wheel 63 and the mounting block 54 , and the elastic reset member 65 is sleeved on the surface of the sliding connection column 64 .

[0057] The cross section of the sliding connection column 64 is a T-shaped structure. An anti-slip groove is provided on one side of the mounting block 54 , and the sliding connection column 64 slides in the anti-slip groove.

[0058] In an embodiment, multiple polishing assemblies 6 can constitute a polishing ring, and the polishing assembly 6 can be used to polish the inner wall of the silicon carbide focusing ring, and the fixed traction wheel 62 and the movable traction wheel 63 can pull the rotation of the polishing block 61 to improve the polishing efficiency and polishing quality.

[0059] During use, the synchronization module 2 is used to move the polishing assembly 6 and the clamping unit toward each other, and the polishing block 61 is moved to the inside of the silicon carbide focus ring. Then, the power transmission assembly 7 is used to drive the rotating shaft 4, the diameter control assembly 5, and the polishing assembly 6 to rotate, so that the polishing block 61 is used to polish the inner wall of the silicon carbide focus ring. When the polishing block 61 rotates on the inner wall of the silicon carbide focus ring, the fixed traction wheel 62 and the movable traction wheel 63 can guide the polishing block 61, thereby limiting the rotation trajectory of the polishing block 61, allowing the polishing block 61 to rotate on the inner wall of the silicon carbide focus ring, thereby improving the polishing quality of the silicon carbide focus ring; It is worth noting that the movable traction wheel 63 can adapt to the uneven surface of the inner wall of the silicon carbide focusing ring under the action of the sliding connecting column 64 and the elastic reset member 65, and can elastically guide the polishing block 61. The fixed traction wheel 62 adapts to the smooth inner wall of the silicon carbide focusing ring after polishing, and fixedly guides the polishing block 61. The cooperation between the fixed traction wheel 62 and the movable traction wheel 63 makes the guiding effect better.

[0060] The clamping unit includes a clamping support frame 8, the bottom side of which is connected to the synchronization module 2, and one side of the clamping support frame 8 is rotatably connected to three angle control components 9 distributed in a circular array, and one end of the angle control component 9 is connected to one end of the multi-station clamping component 10.

[0061] In an embodiment, a clamping unit can be used to stably fix multiple silicon carbide focusing rings of different models to facilitate controlling the accuracy of polishing.

[0062] The angle control assembly 9 includes an anti-slip shaft 91, the surface of which is rotatably connected to the clamping support frame 8, one end of which is connected to one end of the multi-station clamping assembly 10, and the other end of which is connected to a rotating disk 92; A control groove is provided on the side of the anti-slip shaft 91 , and an anti-skid rubber pad 94 is connected in the control groove. A control stud 93 is in contact with the anti-skid rubber pad 94 , and the control stud 93 is threadedly connected to the side of the clamping support frame 8 .

[0063] In the embodiment, the angle of the multi-station clamping assembly 10 can be controlled by using the angle control assembly 9 .

[0064] During use, according to the thickness, outer diameter and other parameters of the silicon carbide focusing ring, the rotating disk 92 is rotated to drive the anti-slip shaft 91 to rotate, and then drive the fixed threaded shaft 101 and the clamping plate 103 and other structures to rotate, and adjust the angle of the clamping plate 103 so that the clamping plates 103 located in the same plane clamp and fix the silicon carbide focusing ring without blocking the inner wall of the silicon carbide focusing ring. After the adjustment is completed, the control stud 93 is rotated so that the control stud 93 is pressed tightly against the anti-slip rubber pad 94, thereby limiting the angle of the anti-slip shaft 91 and completing the locking of the position of the clamping plate 103.

[0065] The multi-station clamping assembly 10 includes a fixed threaded shaft 101, one end of which is connected to one end of the anti-slip shaft 91, and two threaded adjustment rings 102 distributed on the left and right are threadedly connected to the surface of the fixed threaded shaft 101; A plurality of clamping plates 103 are provided between the two threaded adjustment rings 102. The clamping plates 103 are provided with mounting openings. The clamping plates 103 are sleeved on the surface of the fixed threaded shaft 101 through the mounting openings. The fixed threaded shaft 101 is provided with a sliding opening, and the mounting opening wall of the clamping plate 103 is connected with a follower column 104 . The follower column 104 is slidably connected to the fixed threaded shaft 101 through the sliding opening.

[0066] In an embodiment, a plurality of multi-station clamping assemblies 10 can be used to clamp and fix the silicon carbide focus ring.

[0067] When in use, each clamping plate 103 can clamp a silicon carbide focus ring, and then one or two threaded adjustment rings 102 are rotated so that the threaded adjustment rings 102 can move along the fixed threaded shaft 101, thereby driving the clamping plates 103 to move, and the silicon carbide focus ring is clamped and fixed by multiple clamping plates 103; When disassembling, use the opposite method.

[0068] It is worth noting that the number of clamping plates 103 on the fixed threaded shaft 101 can be increased or decreased according to the number of silicon carbide focusing rings.

[0069] The synchronization module 2 includes two symmetrically distributed synchronization threaded shafts 21, the end faces of the two synchronization threaded shafts 21 are rotatably connected to the inner wall of the support outer frame 1, and one end of the two synchronization threaded shafts 21 is connected to the output end of the driving source 22, and the driving source 22 is installed on the outside of the support outer frame 1; The surface of the synchronous threaded shaft 21 is threadedly connected to two symmetrically distributed moving plates 23, wherein the top of one of the moving plates 23 is connected to the bottom side of the polishing support frame 3, and the top of the other moving plate 23 is connected to the bottom side of the clamping support frame 8.

[0070] In an embodiment, the synchronization module 2 is utilized to synchronously provide driving force for the rotating shaft 4 and the shaking assembly 14, so that the shaking assembly 14 can be driven to operate during polishing. The operation of the shaking assembly 14 can shake the filter assembly 12, thereby improving the filtration efficiency of the filter assembly 12 and reducing the probability of the filter assembly 12 being blocked.

[0071] When in use, the driving source 22 is used to drive the synchronous threaded shafts 21 on both sides to rotate, thereby driving the movable plates 23 on both sides to move toward or away from each other, thereby driving the polishing assembly 6 and the multi-station clamping assembly 10 to move toward or away from each other, thereby polishing the silicon carbide focusing ring.

[0072] Example 2 As an embodiment of the present application, the difference between it and the first embodiment is that the silicon carbide focusing ring inner wall polishing mechanism further includes a protection unit, the protection unit including a protection outer frame 11, a filter assembly 12 and a spray dust reduction assembly 13, the protection outer frame 11 is connected to the top of the support outer frame 1, the filter assembly 12 is connected to the inner wall of the support outer frame 1, and the spray dust reduction assembly 13 is divided into an upper and lower part, the upper part is arranged above the support outer frame 1, and the lower part is arranged in the inner cavity of the support outer frame 1; A vibration component 14 is provided on the upper portion of the protective outer frame 11 , and the vibration component 14 is connected to an output end of the power transmission component 7 .

[0073] The spray dust suppression assembly 13 includes a spray pump 131, which is connected to the top of the protective outer frame 11. The outlet end of the spray pump 131 is connected to a spray pipe 132, which is connected to the inner wall of the protective outer frame 11. The bottom of the spray pipe 132 is provided with multiple spray holes. The inlet end of the spray pipe 132 is connected to the water inlet pipe 133, and one end of the water inlet pipe 133 is rotatably connected to one side of the treatment cylinder 134. The treatment cylinder 134 is arranged in the inner cavity of the supporting outer frame 1. The side of the treatment cylinder 134 is provided with a liquid inlet, and the liquid inlet is connected to the curved filter plate 135; Two symmetrically distributed floating blocks 136 are provided above the curved filter plate 135, and two symmetrically distributed counterweight bars 137 are provided below the curved filter plate 135. The floating blocks 136 and the counterweight bars 137 are both connected to the outside of the treatment cylinder 134. During use, the polishing liquid and the spraying liquid are collected in the supporting outer frame 1, first filtered by the filter screen 121, then filtered by the curved filter plate 135 and enter the treatment cylinder 134, and then the liquid in the treatment cylinder 134 is sent to the spray pipe 132 by the spray pump 131 and the water inlet pipe 133, and then sprayed above the polishing position through the spray pipe 132, so as to spray and reduce dust on the silicon carbide dust generated during polishing, as well as the tiny particles splashed when the abrasive particles in the polishing liquid come into contact with the silicon carbide surface and rub against it, thereby reducing the probability of dust overflow and avoiding pollution of the environment and harm to the human body. It is worth noting that when the polishing liquid is circulated and extracted, in order to avoid extracting floating objects and sediments, a floating block 136 and a counterweight bar 137 are provided, which allows the treatment cylinder 134 to float on the liquid, so that the arc filter plate 135 can be below the liquid surface and away from the inner wall of the bottom surface of the supporting outer frame 1, avoiding the spray pump 131 from being blocked, facilitating the recycling of the polishing liquid. At the same time, the floating block 136 can prevent the treatment cylinder 134 from rotating and causing the arc filter plate 135 to be above the liquid surface.

[0074] Example 3 As an embodiment of the present application, the difference between it and the second embodiment is that, in order to prevent the polishing liquid from having an adverse effect on the polishing after use, a blocking assembly 15 is provided above the spray dust reduction assembly 13 and the polishing area. The blocking assembly 15 includes a collection box 151. Both sides of the collection box 151 are connected to an arc-shaped flow guide guard plate 152. One side of the arc-shaped flow guide guard plate 152 is connected to the inner wall of the side of the protective outer frame 11. A plurality of small holes are opened on the side of the collection box 151. A corresponding number of flow grooves are opened on the inner side of the arc-shaped flow guide guard plate 152. The plurality of flow grooves are connected to the inner side of the collection box 151 through the plurality of small holes. When in use, the collection box 151 can collect the droplet-shaped spray liquid, and then guide it into the flow groove through the small holes. Due to the small number of small holes and the small liquid flow rate, the spray liquid can flow along the flow groove along the arc-shaped guide guard plate 152 to the inner wall of the side of the protective outer frame 11, and then be collected in the supporting outer frame 1 for further recycling. It should be noted that the arc-shaped guide guards 152 on both sides can block the flying particles generated in the polishing area to prevent the flying particles from damaging human body or mechanical equipment; Furthermore, when the spray liquid flows on the arc-shaped guide guard plate 152, it can take away some particles adhering to the arc-shaped guide guard plate 152, which facilitates the cleaning of the arc-shaped guide guard plate 152 and prevents the adhering particles from falling on the polishing area after long-term use, thereby affecting the quality of polishing.

[0075] Example 4 As an embodiment of the present application, the difference between it and other embodiments is that the filter assembly 12 includes a filter screen plate 121, and an elastic connecting belt 122 is connected to the side of the filter screen plate 121, and the elastic connecting belt 122 is connected to the inner wall of the supporting outer frame 1; During use, the filter plate 121 is used to filter the polishing liquid used during polishing, the particles thrown out, etc., so as to facilitate the subsequent use of the spray dust reduction component 13.

[0076] The power transmission assembly 7 includes a power source 71, which is connected to the inner side of the polishing support frame 3. The output end of the power source 71 is connected to an upper sprocket 72, and the upper sprocket 72 is meshed with a transmission chain 73 on the side. The transmission chain 73 is meshed with the side of a lower sprocket 74, and the upper sprocket 72 and the lower sprocket 74 are connected by the transmission chain 73. One side of the upper sprocket 72 is connected to one end of the rotating shaft 4, and the side of the lower sprocket 74 is connected to the shaking assembly 14; The shaking assembly 14 includes a transmission shaft 141, and the transmission shaft 141 is connected to both sides of the lower sprocket 74. The surface of the transmission shaft 141 is rotatably connected to a reinforcing plate 142. One side of the reinforcing plate 142 is connected to the bottom of the synchronization module 2 at the polishing support frame 3. The end of the transmission shaft 141 away from the lower sprocket 74 is connected to an eccentric wheel 143. When in use, the power source 71 drives the upper sprocket 72 to rotate, thereby driving the transmission chain 73 to rotate, and then driving the lower sprocket 74 to rotate. When the upper sprocket 72 rotates, it drives the rotating shaft 4 and the polishing assembly 6 and other structures to rotate, and polishes the inner wall of the silicon carbide focusing ring. When the lower sprocket 74 rotates, it drives the transmission shaft 141 to rotate, thereby driving the eccentric wheel 143 to rotate. The rotating eccentric wheel 143 is used to cyclically press down the transmission shaft 141. At this time, under the action of the reinforcing plate 142, the transmission shaft 141 is cyclically shaken to avoid blockage of the transmission shaft 141 and improve the filtering effect of the transmission shaft 141.

[0077] The driving source 22 and the power source 71 are motors or other devices that can output rotational kinetic energy.

[0078] Although the above describes specific embodiments of the present invention, it should be understood by those skilled in the art that these are merely illustrative. Those skilled in the art may make various changes or modifications to these embodiments without departing from the principles and essence of the present invention, and such changes and modifications shall fall within the scope of protection of the present invention.

Claims

1. A silicon carbide focusing ring inner wall polishing mechanism, comprising a supporting outer frame (1), characterized in that: The silicon carbide focusing ring inner wall polishing mechanism further comprises: a polishing unit, the polishing unit being arranged above the supporting outer frame (1), the polishing unit being used for polishing the inner walls of silicon carbide focusing rings having different inner diameters; A clamping unit, the clamping unit being arranged above the supporting outer frame (1), and the clamping unit being used to support and fix a plurality of silicon carbide focusing rings; A synchronization module (2) is connected to the inner side of the supporting outer frame (1), the synchronization module (2) is connected to the polishing unit and the clamping unit respectively, and the synchronization module (2) is used to control the synchronous movement of the polishing unit and the clamping unit toward or away from each other.

2. The silicon carbide focusing ring inner wall polishing mechanism according to claim 1, wherein: The polishing unit comprises a polishing support frame (3) and a rotating shaft (4), the bottom side of the polishing support frame (3) is connected to the synchronization module (2), one side of the polishing support frame (3) is rotatably connected to the rotating shaft (4), the end of the rotating shaft (4) away from the polishing support frame (3) is connected to a diameter control component (5), and the side of the diameter control component (5) is connected to a plurality of polishing components (6) distributed in a ring array; A power transmission component (7) is connected to the inner side of the polishing support frame (3), and an output end of the power transmission component (7) is connected to an end of the rotating shaft (4) away from the diameter control component (5). The power transmission component (7) is used to output rotational power to the rotating shaft (4).

3. The silicon carbide focusing ring inner wall polishing mechanism according to claim 2, wherein: The polishing assembly (6) comprises a polishing block (61), and the polishing block (61) is connected to one side of the mounting block (54); A fixed traction wheel (62) and a movable traction wheel (63) are respectively provided on the left and right sides of the polishing block (61), the fixed traction wheel (62) is close to the polishing support frame (3), and the fixed traction wheel (62) is connected to one side of the mounting block (54); One side of the movable traction wheel (63) is connected to a sliding connection column (64), and the sliding connection column (64) is slidably connected to the mounting block (54). An elastic reset member (65) is provided between the movable traction wheel (63) and the mounting block (54), and the elastic reset member (65) is sleeved on the surface of the sliding connection column (64).

4. The silicon carbide focusing ring inner wall polishing mechanism according to claim 2, wherein: The diameter control assembly (5) comprises a central threaded shaft (51), both ends of the central threaded shaft (51) are rotatably connected to fixed plates (52), and one of the fixed plates (52) is connected to one end of the rotating shaft (4); The surface of the central threaded shaft (51) is threadedly connected to two symmetrically distributed adjustment plates (53), and a plurality of mounting blocks (54) distributed in a ring array are provided on the side of the adjustment plate (53). A polishing assembly (6) is connected to the side of the mounting block (54) away from the central threaded shaft (51), and an adjustment column (55) is provided on the other side of the mounting block (54); Both ends of the adjustment column (55) are rotatably connected to a rotating frame (56), wherein the rotating frame (56) on one side is connected to one side of the mounting block (54), and the rotating frame (56) on the other side is connected to the side of the adjustment plate (53).

5. The silicon carbide focusing ring inner wall polishing mechanism according to claim 4, characterized in that: The center of the central threaded shaft (51) is rotatably connected to the center plate (57), and the side of the center plate (57) is connected to a plurality of elastic reinforcement members (58) distributed in a ring array, and the end of the elastic reinforcement member (58) away from the center plate (57) is connected to one side of the mounting block (54).

6. The silicon carbide focusing ring inner wall polishing mechanism according to claim 5, characterized in that: Both sides of the center plate (57) are connected to a plurality of limiting rails (59), and the surfaces of the limiting rails (59) are slidably connected to the adjustment plate (53).

7. The silicon carbide focusing ring inner wall polishing mechanism according to claim 1, wherein: The clamping unit includes a clamping support frame (8), the bottom side of the clamping support frame (8) is connected to the synchronization module (2), one side of the clamping support frame (8) is rotatably connected to three angle control components (9) distributed in a ring array, and one end of the angle control component (9) is connected to one end of the multi-station clamping component (10).

8. The silicon carbide focusing ring inner wall polishing mechanism according to claim 7, characterized in that: The angle control assembly (9) includes an anti-slip shaft (91), the surface of the anti-slip shaft (91) is rotatably connected to the clamp support frame (8), one end of the anti-slip shaft (91) is connected to one end of the multi-station clamping assembly (10), and the other end of the anti-slip shaft (91) is connected to a rotating disk (92); A control groove is provided on the side of the anti-slip rotating shaft (91), an anti-skid rubber pad (94) is connected in the control groove, a control stud (93) is contacted and connected to the anti-skid rubber pad (94), and the control stud (93) is threadedly connected to the side of the clamping support frame (8).

9. The silicon carbide focusing ring inner wall polishing mechanism according to claim 7, wherein: The multi-station clamping assembly (10) comprises a fixed threaded shaft (101), one end of the fixed threaded shaft (101) is connected to one end of the anti-slip shaft (91), and the surface of the fixed threaded shaft (101) is threadedly connected to two threaded adjustment rings (102) distributed on the left and right. A plurality of clamping plates (103) are provided between the two threaded adjustment rings (102), the clamping plates (103) are provided with mounting openings, and the clamping plates (103) are sleeved on the surface of the fixed threaded shaft (101) through the mounting openings; The fixed threaded shaft (101) is provided with a sliding opening, and the mounting opening wall of the clamping plate (103) is connected to a follower column (104), and the follower column (104) is slidably connected to the fixed threaded shaft (101) through the sliding opening.

10. The silicon carbide focusing ring inner wall polishing mechanism according to claim 1, wherein: The synchronization module (2) includes two symmetrically distributed synchronization threaded shafts (21), the end faces of the two synchronization threaded shafts (21) are rotatably connected to the inner wall of the support outer frame (1), and one end of the two synchronization threaded shafts (21) is connected to the output end of the driving source (22), and the driving source (22) is installed on the outside of the support outer frame (1); The surface of the synchronous threaded shaft (21) is threadedly connected to two symmetrically distributed moving plates (23), wherein the top of one of the moving plates (23) is connected to the bottom side of the polishing support frame (3), and the top of the other moving plate (23) is connected to the bottom side of the clamping support frame (8).

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