Industrial image anomaly detection method and system based on feature-level anomaly synthesis and reconstruction
By extracting and adapting multi-scale features of industrial images, adding noise to simulate anomalies and reconstructing normal regions, the problems of high computational cost and unrealistic synthesized anomalies in existing technologies are solved, achieving high-accuracy industrial image anomaly detection and improving production efficiency and product quality.
Patent Information
- Application Number
- CN202510695060.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2025-05-28
- Publication Date
- 2026-04-28
- Estimated Expiration
- 2045-05-28
AI Technical Summary
Existing industrial image anomaly detection methods are computationally expensive, produce unrealistic anomalies, and are difficult to reconstruct anomaly regions effectively, resulting in low detection accuracy.
By acquiring visible light images of products from industrial production lines, multi-scale local features are extracted, the size is standardized and the features are adapted, noise is added to simulate anomalies, a feature reconstruction network is used to reconstruct normal regions, feature map difference loss is calculated to train the model, and segmentation maps are generated for detection.
It improves the accuracy and speed of industrial image anomaly detection, reduces computing costs, increases production efficiency and product quality, and promotes the intelligentization of industrial systems.