Preparation method of high-refraction non-conductive coating material and application of high-refraction non-conductive coating material in hardening anti-reflection film on surface of substrate

Abstract

The invention relates to the technical field of optical coating, and discloses a preparation method of a high-refractive-index non-conductive coating material and application of the high-refractive-index non-conductive coating material to a hardened anti-reflection film on the surface of a substrate, and the preparation method comprises the following steps: sequentially depositing a high-refractive-index film layer and a low-refractive-index film layer on the surface of a glass substrate through a sputter coating process to form a hardened anti-reflection laminated structure; the hardened anti-reflection laminated structure is formed by alternately stacking high-refractive-index film layers and low-refractive-index film layers, an ion source is used for assisting in coating, and the transmittance and the reflectivity of the film layers are tested through a spectrometer. The problems of low hardness, insufficient transmissivity, stress concentration and poor durability in the prior art are solved by optimizing material components, a coating process and a lamination design, and the visible light transmission is 95 or above and the infrared transmission is 92 or above by stacking hardened anti-reflection films which are different in refractive index thickness and meet different light wave requirements; and meanwhile, the glass surface hardening effect reaches Mohs 7 grade, the scratch resistance is 98%, the friction steel wool resistance is 10000 times, the drop resistance is improved by 50%, and other reliability advantages are achieved.

Description

Technical Field

[0001] The present invention relates to the field of optical coating technology, specifically a technology for preparing a composite laminate of a high-refractive-index non-conductive material (SIALN) and a low-refractive-index material (SINO) through a sputtering coating process, a method for preparing a high-refractive-index non-conductive coating material for a hardened anti-reflection film on a glass substrate surface, and the application of the hardened anti-reflection film on a substrate surface. Background Art

[0002] Hardened anti-reflection coatings are manufactured by stacking high- and low-refractive index materials of varying thickness onto a glass substrate to achieve specific wavelength requirements, achieving visible light transmittance exceeding 95% and infrared transmittance exceeding 92%. For example, they offer high transmittance and low reflection for visible light wavelengths of 380-780 nm, and high transmittance and low reflection for near-infrared wavelengths of 800-1000 nm. These coatings also achieve a Mohs 7 hardness rating, 98% scratch resistance, 10,000 steel wool abrasion resistance, and 50% increased drop resistance, offering other reliability advantages. Hardened anti-reflection coatings are widely used in consumer electronics, display panels, laptop monitors, automotive central control screens, and windshields, offering a broad market opportunity.

[0003] Existing hardened antireflection films on the market are created by coating SIO2 and SI3N4, or SIO2 and ZRO2, on glass substrates using high- and low-refractive-index materials. These films only achieve a pencil hardness of 9H-10H, a Mohs hardness of 5 (unstable at 6-7), and a nanoindentation of 11.5 GPA. Currently, there are no solutions to overcome the issues of excessive strength and stress, resulting in products that cannot meet the requirements for scratch resistance, drop resistance, and friction resistance, leading to high repair costs and significant losses for consumers. Currently, conventional superhard films cannot be coated on flexible substrates exceeding 1000 nm due to the high film thickness, which is prone to cracking and delamination. Furthermore, performance limitations include the film's durability and poor adhesion in solar radiation and vibration friction tests, which cannot meet these requirements. Summary of the Invention

[0004] In view of this, and to overcome the shortcomings of the prior art, the present invention aims to provide a method for preparing a high-refractive non-conductive coating material and its application as a hardened anti-reflection film on a substrate surface. By optimizing the material composition, coating process, and stacking design, the problems of low hardness, insufficient transmittance, stress concentration, and poor durability in the prior art are solved. By stacking hardened anti-reflection films of different refractive indices and thicknesses to meet different light wavelength requirements, the material achieves a visible light transmittance of over 95% and an infrared transmittance of over 92%. Furthermore, the material hardens to a Mohs scale of 7, achieves 98% scratch resistance, resists 10,000 steel wool friction cycles, and improves drop resistance by 50%. The material is widely used in consumer electronics decoration and screens, laptop screens, automotive central control screens, and automotive windshields.

[0005] To achieve the above object, the present invention provides the following technical solutions:

[0006] In a first aspect, the present invention provides a method for preparing a high-refractive non-conductive coating material, comprising the following steps:

[0007] High and low refractive index film layers are sequentially deposited on the surface of the glass substrate through a sputtering coating process to form a hardened anti-reflective laminated structure;

[0008] The hardened anti-reflection laminated structure is composed of alternating high-refractive index film layers and low-refractive index film layers. The film is assisted by an ion source and the transmittance and reflectivity of the film layer are tested by a spectrometer.

[0009] As a further solution of the present invention, an oxidation sputtering coating technology is used to deposit at least one layer of high refractive index material and at least one layer of low refractive index material on the surface of the glass substrate. By stacking high and low refractive index material layers of different thicknesses, a hardened and anti-reflective laminated structure is formed.

[0010] As a further solution of the present invention, an ion source is used to assist in coating, and when the transmittance and reflectivity of the film layer are tested by a spectrometer, a post-oxidation sputtering coating machine ICP, CCR or RF source coating machine is used, and the power of the ion source is configured to be 10-12KW to reduce the stress of the film layer and enhance the friction density.

[0011] As a further solution of the present invention, the high refractive index material is SIALN, the components of the high refractive index material SIALN layer include silicon and aluminum, and the refractive index of the high refractive index material SIALN layer is controlled between 2.1 and 2.12; the low refractive index material is SINO, the components of the low refractive index material SINO layer include silicon and oxygen, and the refractive index of the low refractive index material SINO layer is controlled between 1.51 and 1.54.

[0012] As a further embodiment of the present invention, the steps of preparing the high refractive index material SIALN layer include:

[0013] Each set of SI targets is filled with 400-500 SCCM of argon gas;

[0014] Each set of AL target is filled with 400-600 SCCM of argon gas;

[0015] Fill the oxidation source with nitrogen at 600-800 SCCM;

[0016] Silicon target power is 18-20KW, aluminum target power is 9-10KW, and the coating thickness is 600NM;

[0017] Use a spectrometer to test transmission and reflection and select a refractive index between 2.1 and 2.12.

[0018] As a further solution of the present invention, the steps of preparing the low refractive index material SINO layer include:

[0019] Each set of SI targets is filled with 400-500 SCCM of argon gas;

[0020] Fill the oxidation source with 200-400 SCCM of nitrogen and 400-600 SCCM of oxygen;

[0021] Silicon target power 18-20KW, coating thickness 600NM;

[0022] Use a spectrometer to test transmission and reflection and select a refractive index between 1.51 and 1.52.

[0023] As a further solution of the present invention, the step of preparing the low refractive index material SINO layer further includes:

[0024] Each set of SI targets is filled with 400-500 SCCM of argon gas;

[0025] Fill the oxidation source with 450-650 SCCM of nitrogen and 200-350 SCCM of oxygen;

[0026] Silicon target power 18-20KW, coating thickness 600NM;

[0027] Use a spectrometer to test transmission and reflection and select a refractive index between 1.53 and 1.54.

[0028] As a further embodiment of the present invention, the sputtering coating process is implemented in an apparatus having the following conditions:

[0029] Using ICP / CCR / RF source coating machine;

[0030] Equipped with 3 sets of medium frequency power supplies, each with a power of 20kW;

[0031] The vacuum degree is controlled at 5.0×10 -4 Pa to 2.0×10 -4 Pa;

[0032] The substrate heating temperature is 60-80°C, and the pre-pumping time is 17-25 minutes.

[0033] As a further solution of the present invention, the outermost layer of the stacked structure is provided with an AF layer, which has a refractive index of 1.38 and a film thickness of 20 nm.

[0034] As a further embodiment of the present invention, the glass substrate has a pencil hardness of 7H-9H after pretreatment, and the pretreatment process includes:

[0035] Surface hardening treatment under 750g load;

[0036] The surface roughness is controlled at Ra≤0.1μm.

[0037] As a further embodiment of the present invention, the high-refractive non-conductive coating material prepared by the preparation method has a transmittance of ≥95% in the visible light band of 380-780nm and a transmittance of ≥92% in the near-infrared band of 800-1000nm;

[0038] Surface Mohs hardness ≥ 7, scratch resistance ≥ 98%;

[0039] After 10,000 times of steel wool friction, the surface wear rate is ≤2%.

[0040] In a second aspect, the present invention further provides an application of the above-mentioned method for preparing a high-refractive non-conductive coating material in a hardened anti-reflection film on a substrate surface, wherein the substrate is a consumer electronic product screen glass, a car central control screen glass, or a car windshield; the film has at least two of the following optical properties:

[0041] The average reflectivity in the 400-700nm band is ≤0.5%;

[0042] Anti-glare performance reaches haze ≤ 1%;

[0043] Blue light blocking rate ≥30%.

[0044] As a further embodiment of the present invention, the film maintains stable performance in the following environmental tests:

[0045] After 1000 hours of high temperature and humidity test at 85℃ / 85%RH, the transmittance attenuation is ≤1%;

[0046] No film cracking after 100 thermal shock cycles from -40℃ to 120℃;

[0047] The film residue rate after 3M tape peeling test is ≥99%.

[0048] Compared with the prior art, the present invention provides a method for preparing a high-refractive non-conductive coating material and its application in hardening an anti-reflection film on a substrate surface, which has the following beneficial effects:

[0049] The high-refractive non-conductive coating material prepared by the present invention has remarkable optical properties and high transmittance over a wide spectrum. Through precise matching of the refractive indices of SIALN (2.1-2.12) and SINO (1.49-1.56), an average transmittance of ≥95% is achieved in the visible light band of 380-780nm; the transmittance in the near-infrared band of 800-1000nm is ≥92%, which is 2-3 percentage points higher than the existing SIO2 / ZRO2 system (transmittance ≤93%); in terms of reflectivity control, the average reflectivity in the 400-700nm band is ≤0.5%, which is more than 60% lower than that of conventional AR films (reflectivity 1.2-1.5%), effectively eliminating screen glare.

[0050] The present invention also improves the blue light blocking rate and stabilizes the Mohs hardness through film layer design. The ion source assisted coating technology is used to enhance the density and friction resistance of the film layer, and the scratch resistance reaches more than 98%. At the same time, after the steel wool friction test, the friction resistance of the film layer exceeds 10,000 times, meeting the high reliability requirements. During the coating process, the use of ion source power control and argon, nitrogen, and oxygen flow adjustment can effectively reduce the internal stress of the film layer, thereby preventing the glass substrate from deforming or bending. Precise vacuum control and heating process ensure the high density and excellent adhesion of the film layer, avoiding peeling or damage of the film during use. The use of a multi-layer design of hardened anti-reflection film, combined with the characteristics of high refractive index materials and low refractive index materials, enables the film to maintain stable optical and mechanical properties during long-term use, greatly improving the durability of the product and reducing maintenance and replacement costs.

[0051] The high-refractive non-conductive coating material prepared by the above method can provide a series of optical, mechanical and functional advantages, meet the needs of modern electronic products and high-end glass surface protection, and has broad application prospects and market potential. BRIEF DESCRIPTION OF THE DRAWINGS

[0052] The accompanying drawings are used to provide a further understanding of the present invention and constitute a part of the specification. Together with the embodiments of the present invention, they are used to explain the present invention and do not constitute a limitation of the present invention. In the accompanying drawings:

[0053] Figure 1 This is a structural diagram of a high-refractive non-conductive coating material prepared by a method for preparing a high-refractive non-conductive coating material according to an embodiment of the present invention.

[0054] Figure 2 Schematic diagram of hardened AR transmission in a hardened anti-reflection stacked layer in a method for preparing a high-refractive non-conductive coating material according to an embodiment of the present invention.

[0055] Figure 3Schematic diagram of hardened AR reflection in a hardened anti-reflection layer in a method for preparing a high-refractive non-conductive coating material according to an embodiment of the present invention. DETAILED DESCRIPTION

[0056] In order to make the above-mentioned objects, features and advantages of the present invention more obvious and easy to understand, the specific embodiments of the present invention are described in detail below in conjunction with the specification.

[0057] The present invention provides a method for preparing a high-refractive non-conductive coating material. The specific preparation steps of the method for preparing the high-refractive non-conductive coating material are as follows:

[0058] Step 1: depositing high and low refractive index film layers on the surface of the glass substrate in sequence by a sputtering coating process to form a hardened anti-reflection laminated structure;

[0059] Step 2: The hardened anti-reflection laminated structure is composed of alternating high-refractive index film layers and low-refractive index film layers, and an ion source is used to assist in film coating. The transmittance and reflectivity of the film layer are tested by a spectrometer.

[0060] In step 1, an oxidation sputtering coating technique is used to deposit at least one layer of a high refractive index material and at least one layer of a low refractive index material on the surface of a glass substrate. By stacking high and low refractive index material layers of different thicknesses, a hardened and anti-reflective laminated structure is formed.

[0061] Among them, the high refractive index material is SIALN, the components of the high refractive index material SIALN layer include silicon and aluminum, and the refractive index of the high refractive index material SIALN layer is controlled between 2.1 and 2.12; the low refractive index material is SINO, the components of the low refractive index material SINO layer include silicon and oxygen, and the refractive index of the low refractive index material SINO layer is controlled between 1.51 and 1.54.

[0062] In this embodiment, the steps of preparing the high refractive index material SIALN layer include:

[0063] Each set of SI targets is filled with 400-500 SCCM of argon gas;

[0064] Each set of AL target is filled with 400-600 SCCM of argon gas;

[0065] Fill the oxidation source with nitrogen at 600-800 SCCM;

[0066] Silicon target power is 18-20KW, aluminum target power is 9-10KW, and the coating thickness is 600NM;

[0067] Use a spectrometer to test transmission and reflection and select a refractive index between 2.1 and 2.12.

[0068] The steps of preparing the low refractive index material SINO layer include:

[0069] Each set of SI targets is filled with 400-500 SCCM of argon gas;

[0070] Fill the oxidation source with 200-400 SCCM of nitrogen and 400-600 SCCM of oxygen;

[0071] Silicon target power 18-20KW, coating thickness 600NM;

[0072] Use a spectrometer to test transmission and reflection and select a refractive index between 1.51 and 1.52.

[0073] In some embodiments, the step of preparing the low refractive index material SINO layer further comprises:

[0074] Each set of SI targets is filled with 400-500 SCCM of argon gas;

[0075] Fill the oxidation source with 450-650 SCCM of nitrogen and 200-350 SCCM of oxygen;

[0076] Silicon target power 18-20KW, coating thickness 600NM;

[0077] Use a spectrometer to test transmission and reflection and select a refractive index between 1.53 and 1.54.

[0078] In this embodiment, ion source-assisted coating is used. When the transmittance and reflectance of the film layer are tested by spectrometer, a post-oxidation sputtering coating machine (ICP, CCR, or RF source coating machine) is used. The ion source power is configured to be 10-12KW to reduce film stress and enhance triboelectric density. The sputtering coating process is implemented in equipment that meets the following conditions:

[0079] Using ICP / CCR / RF source coating machine;

[0080] Equipped with 3 sets of medium frequency power supplies, each with a power of 20kW;

[0081] The vacuum degree is controlled at 5.0×10 -4 Pa to 2.0×10 -4 Pa;

[0082] The substrate heating temperature is 60-80°C, and the pre-pumping time is 17-25 minutes.

[0083] In this embodiment, the outermost layer of the stacked structure is provided with an AF layer, which has a refractive index of 1.38 and a film thickness of 20 nm.

[0084] When used, the glass substrate has a pencil hardness of 7H-9H after pretreatment, and the pretreatment process includes:

[0085] Surface hardening treatment under 750g load;

[0086] The surface roughness is controlled at Ra≤0.1μm.

[0087] The high-refractive non-conductive coating material prepared by this preparation method has a transmittance of ≥95% in the visible light band of 380-780nm and a transmittance of ≥92% in the near-infrared band of 800-1000nm.

[0088] Surface Mohs hardness ≥ 7, scratch resistance ≥ 98%;

[0089] After 10,000 times of steel wool friction, the surface wear rate is ≤2%.

[0090] In the following description, many specific details are set forth to facilitate a full understanding of the present invention. However, the present invention may also be implemented in other ways different from those described herein. Those skilled in the art may make similar generalizations without violating the connotation of the present invention. Therefore, the present invention is not limited to the specific embodiments disclosed below.

[0091] Secondly, the term "one embodiment" or "embodiment" herein refers to a specific feature, structure, or characteristic that may be included in at least one implementation of the present invention. The phrase "in one embodiment" appearing in various places throughout this specification does not necessarily refer to the same embodiment, nor does it refer to a separate or selective embodiment that is mutually exclusive of other embodiments.

[0092] Example 1

[0093] The present invention provides a method for preparing a high-refractive non-conductive coating material, which is used for preparing and testing the performance of a high-refractive non-conductive coating material for mobile phone screens. The preparation method includes the following steps:

[0094] Step 1: Prepare materials and equipment

[0095] 1. Substrate treatment:

[0096] Glass substrate: size 150×70×0.7 mm.

[0097] Pretreatment process:

[0098] Diamond grinding and hardening treatment under 750g load;

[0099] Surface roughness Ra = 0.08 μm (measured by white light interferometer);

[0100] Pencil hardness 8H (JIS K5600 standard).

[0101] 2. Coating equipment:

[0102] Model: MULTIVAC 7000S magnetron sputtering system

[0103] Equipped with 3 sets of medium frequency power supplies (20kW / set);

[0104] ICP ion source (maximum power 15kW);

[0105] Temperature control accuracy ±2℃;

[0106] Vacuum system ultimate vacuum 5.0×10 -5 Pa.

[0107] 3. Target material and gas:

[0108] High-purity silicon target (99.999%, Φ150mm);

[0109] High purity aluminum target (99.995%, Φ150mm);

[0110] Process gas:

[0111] Gas type purity use Argon 6N Sputtering gas Nitrogen 5N5 Reactive gas oxygen 5N5 Reactive gas

[0112] Step 2: Implementation of coating process

[0113] 1. Preprocessing stage:

[0114] The vacuum chamber is pre-evacuated to 2.5×10 -4 Pa;

[0115] Heat the substrate to 75±3°C and maintain for 20 minutes;

[0116] Ion cleaning (Ar+ bombardment, 500V bias, 5 minutes).

[0117] 2. SIALN high refractive layer deposition:

[0118] parameter Setting value Silicon target power 19kW Aluminum target power 9.5kW Argon flow rate (Si / Al) 450 / 500sccm Nitrogen flow 700sccm Sedimentation time 18min Film thickness 58nm (ellipsometry measurement) Refractive index@550nm 2.11±0.01

[0119] 3. SINO low refractive layer deposition (first type)

[0120] parameter Setting value Aluminum target power 9.5kW Argon flow rate 480sccm Nitrogen / oxygen flow rate 380 / 520sccm Sedimentation time 22min Film thickness 105nm (ellipsometer measurement) Refractive index@550nm 1.52±0.01

[0121] 4. Alternating coating structure:

[0122] The 7-layer stack (total film thickness 1063nm) was completed in the following order:

[0123] GLASS→SINO(105nm)→SIALN(58nm)→SINO(82nm)→

[0124] SIALN (67 nm) → SINO (95 nm) → SIALN (73 nm) → AF layer (20 nm).

[0125] 5.AF functional layer processing:

[0126] Material: Fluorosilicone compound

[0127] Deposition process parameters and settings:

[0128] parameter Setting value RF power 800W C4F8 traffic 80sccm Deposition rate 0.3nm / s contact angle 118°

[0129] Step 3: Tested on a mobile phone: Color gamut coverage: 98.5% (a 2.3% increase); Bright light visibility: 92% contrast retention at 100,000 lux. Key scratch test (500g): No visible scratches; 1.8m drop test (on marble): 78% pass rate; Sand abrasion test (#240 sandpaper): Wear depth <50nm.

[0130] Step 4: AR performance verification test results are as follows:

[0131] AR performance verification test results

[0132]

[0133]

[0134] Please refer to Figures 1 to 3 As shown, Figure 1 In the laminated structure diagram, in the preparation method of the high-refractive non-conductive coating material, the glass substrate is hardened through a hardening process, and the pencil hardness of the glass substrate is controlled to be between 7H and 9H under 750g gravity; the prepared non-conductive high-low material coating hardened high-transmittance low-reflection film layer AR anti-reflection film laminated structure meets the customer's needs for high transmittance, low reflection, and low stress products in various bands, solves the problem of glass deformation causing bending, and meets the anti-glare effect, anti-blue light, anti-fatigue, and anti-myopia effects; such as Figure 2 As shown, the average transmission of the 400-700 band is above 95%, Figure 3 The average reflection is below 0.5; at the same time, the glass surface is hardened to Mohs level 7, with 98% scratch resistance, 10,000 times of steel wool friction, and 50% increased drop resistance.

[0135] Use an ICP / CCR / RF source coating machine for post-oxidation sputtering. The ion source power is configured at 10-12 kW to assist in reducing stress and enhancing friction density. Three medium-frequency power supplies, each 20 kW, are used. The machine is loaded with 99.999% purity targets, including one pair of Al targets and two pairs of Si targets. The machine must be equipped with a heating function to pre-evacuate the chamber to remove impurities from the substrate, increasing film density and enhancing hardness.

[0136] A high-refractive-index hardened material SIALN was prepared; the refractive index was controlled between 2.1-2.12 to enhance the hardness while achieving high transmittance and low reflection. Specific implementation: each set of SI targets was filled with 400-500 SCCM of argon; each set of AL targets was filled with 400-600 SCCM of argon, and the oxidation source was filled with 600-800 SCCM of nitrogen; the silicon power was 18-20 kW, the aluminum power was 9-10 kW, and the film was coated with a thickness of 600 NM. The transmission and reflection were tested using a spectrometer to calculate the refractive index to be between 2.1 and 2.12. See Table 1 for details.

[0137] Table 1 SIALN target ion test results

[0138]

[0139]

[0140] A low-refractive-index hardened material, SINO, was prepared; its refractive index was controlled at about 1.51-1.52, which is close to the refractive index of glass. Through this refractive index, the surface of the glass substrate can be hardened first and then slightly higher high- and low-refractive-index materials can be stacked for further hardening; specific implementation: 400-500 SCCM of argon was filled into each set of SI targets; 200-400 SCCM of nitrogen and 400-600 SCCM of oxygen were filled into the oxidation source; silicon power was 18-20 kW, the coating thickness was 600 NM, and the refractive index was calculated using a spectrometer to test transmission and reflection, reaching between 1.51 and 1.52. See Table 2 for details.

[0141] Table 2 SINO target ion test results

[0142]

[0143]

[0144] A low-refractive-index hardened material, SINO, was prepared; its refractive index was between 1.53 and 1.54. The specific implementation was as follows: 400-500 SCCM of argon was filled into each set of SI targets; 450-650 SCCM of nitrogen and 200-350 SCCM of oxygen were filled into the oxidation source; silicon power was 18-20 kW, and the coating thickness was 600 nm. The refractive index was calculated to be between 1.53 and 1.54 by using a spectrometer to test transmission and reflection, as detailed in Table 2; a laminated hardened AR was then designed, as shown in Table 3; the hardness was met while also meeting the conventional single-side transmission requirement of 94 or higher; and the transmission at a central wavelength of 550 nm was above 95.

[0145] Place the product in the machine; control the vacuum degree from 5.0*10-4PA to 2.0*10-4PA, place the product in the chamber and heat it in the range of 60-80 degrees; control the time within 17-25 minutes to quickly remove the substrate impurities; and perform coating according to the parameters in Table 3 of the optimal combination.

[0146] Table 3 Refractive index, film thickness and film system design structure of hardened AR material

[0147]

[0148]

[0149] High and low refractive index materials are used to design a hardened anti-reflection film on the surface of the glass substrate. By stacking hardened anti-reflection films of different refractive index thicknesses to meet different light wave requirements, the film achieves a visible light transmittance of over 95% and an infrared transmittance of over 92%. At the same time, the glass surface is hardened to Mohs level 7, with 98% scratch resistance, 10,000 times steel wool friction resistance, and 50% increased drop resistance, among other reliability advantages. It is widely used in consumer electronics decoration and screens, laptop screens, automotive central control screens / car front windshields and other fields.

[0150] It is important to note that the construction and arrangement of the present application shown in a number of different exemplary embodiments are merely illustrative. Although only a few embodiments are described in detail in this disclosure, it should be readily understood by those who refer to this disclosure that many modifications are possible (e.g., the size, scale, structure, shape and proportion of various elements, as well as parameter values ​​(e.g., temperature, pressure, etc.), mounting arrangements, use of materials, color, directional changes, etc.) without departing substantially from the novel teachings and advantages of the subject matter described in this application. For example, an element shown as integrally formed may be composed of multiple parts or elements, the position of the element may be inverted or otherwise changed, and the nature or number or position of the discrete elements may be altered or changed. Therefore, all such modifications are intended to be included within the scope of the present invention. The order or sequence of any process or method steps may be changed or reordered according to alternative embodiments. In the claims, any "means plus function" clause is intended to cover the structure described herein that performs the function, and is not only structurally equivalent but also equivalent structures. Other replacements, modifications, changes, and omissions may be made in the design, operating conditions, and arrangement of the exemplary embodiments without departing from the scope of the present invention. Therefore, the invention is not limited to the specific embodiments, but extends to various modifications that still fall within the scope of the appended claims.

[0151] Additionally, in order to provide a concise description of exemplary embodiments, all features of an actual embodiment (i.e., those features that are not relevant to the best mode presently contemplated for carrying out the invention or those that are not relevant to implementing the invention) may not be described.

[0152] It will be appreciated that in the development of any actual embodiment, as in any engineering or design project, numerous implementation-specific decisions may be made. Such a development effort may be complex and time-consuming, but will, for those of ordinary skill having the benefit of this disclosure, be a routine undertaking of design, fabrication, and production without undue experimentation.

[0153] It should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention and are not intended to limit the present invention. Although the present invention has been described in detail with reference to the preferred embodiments, those skilled in the art should understand that the technical solutions of the present invention may be modified or replaced by equivalents without departing from the spirit and scope of the technical solutions of the present invention, which should all be included in the scope of the claims of the present invention.

Claims

1. A method for preparing a high-refractive non-conductive coating material, characterized in that: The following steps are involved: High and low refractive index film layers are sequentially deposited on the surface of the glass substrate through a sputtering coating process to form a hardened anti-reflective laminated structure; The hardened anti-reflection laminated structure is composed of alternating high-refractive index film layers and low-refractive index film layers. The film is assisted by an ion source and the transmittance and reflectivity of the film layer are tested by a spectrometer.

2. The method for preparing a high-refractive non-conductive coating material according to claim 1, wherein: Using the oxidation sputtering coating technology, at least one layer of high refractive index material and at least one layer of low refractive index material are deposited on the surface of the glass substrate. By stacking high and low refractive index material layers of different thicknesses, a hardened and anti-reflective laminated structure is formed.

3. The method for preparing a high-refractive non-conductive coating material according to claim 2, wherein: When using an ion source to assist in coating and testing the transmittance and reflectivity of the film layer by a spectrometer, use a post-oxidation sputtering coating machine, ICP, CCR or RF source coating machine, and configure the ion source power to 10-12KW to reduce film stress and enhance friction density.

4. The method for preparing a high-refractive non-conductive coating material according to claim 2, wherein: The high refractive index material is SIALN, the components of the high refractive index material SIALN layer include silicon and aluminum, and the refractive index of the high refractive index material SIALN layer is controlled between 2.1 and 2.12; the low refractive index material is SINO, the components of the low refractive index material SINO layer include silicon and oxygen, and the refractive index of the low refractive index material SINO layer is controlled between 1.51 and 1.

54.

5. The method for preparing a high-refractive non-conductive coating material according to claim 4, characterized in that: The steps of preparing the high refractive index material SIALN layer include: Each set of SI targets is filled with 400-500 SCCM of argon gas; Each set of AL target is filled with 400-600 SCCM of argon gas; Fill the oxidation source with nitrogen at 600-800 SCCM; Silicon target power is 18-20KW, aluminum target power is 9-10KW, and the coating thickness is 600NM; Use a spectrometer to test transmission and reflection and select a refractive index between 2.1 and 2.

12.

6. The method for preparing a high-refractive non-conductive coating material according to claim 4, wherein: The steps of preparing the low refractive index material SINO layer include: Each set of SI targets is filled with 400-500 SCCM of argon gas; Fill the oxidation source with 200-400 SCCM of nitrogen and 400-600 SCCM of oxygen; Silicon target power 18-20KW, coating thickness 600NM; Use a spectrometer to test transmission and reflection and select a refractive index between 1.51 and 1.

52.

7. The method for preparing a high-refractive non-conductive coating material according to claim 4, wherein: The steps of preparing the low refractive index material SINO layer include: Each set of SI targets is filled with 400-500 SCCM of argon gas; Fill the oxidation source with 450-650 SCCM of nitrogen and 200-350 SCCM of oxygen; Silicon target power 18-20KW, coating thickness 600NM; Use a spectrometer to test transmission and reflection and select a refractive index between 1.53 and 1.

54.

8. The method for preparing a high-refractive non-conductive coating material according to claim 3, wherein: The sputtering coating process is carried out in equipment with the following conditions: Using ICP / CCR / RF source coating machine; Equipped with 3 sets of medium frequency power supplies, each with a power of 20kW; The vacuum degree is controlled at 5.0×10 -4 Pa to 2.0×10 -4 Pa; The substrate heating temperature is 60-80°C, and the pre-pumping time is 17-25 minutes.

9. The method for preparing a high-refractive non-conductive coating material according to claim 1, wherein: The outermost layer of the stacked structure is provided with an AF layer, which has a refractive index of 1.38 and a film thickness of 20 nm.

10. An application of the method for preparing a high-refractive non-conductive coating material according to any one of claims 1 to 9 in hardening an anti-reflection film on a substrate surface, characterized in that: The substrate is a consumer electronic product screen glass, a car central control screen glass or a car front windshield.

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