Gas adjusting mechanism and plasma generator device

Abstract

The invention relates to the technical field of plasma generators, in particular to a gas adjusting mechanism and a plasma generator device, and the gas adjusting mechanism comprises an adjusting assembly which comprises an adjusting ring and an annular blocking piece installed at an air inlet of the adjusting ring; the flow guide assembly comprises a first flow guide part and a plurality of second flow guide parts, the first flow guide part is located at the gas outflow end of the adjusting ring, the second flow guide parts are installed on the surface of the first flow guide part, the second flow guide parts can form a plurality of spiral cavities when the annular blocking part extrudes the first flow guide part, and the spiral cavities are arranged to guide gas to generate high-strength rotational flow. The mechanism has the beneficial effects that through the first flow guide part and the second flow guide part capable of dynamically forming the spiral cavity, the mechanism can automatically provide two optimized gas flow fields according to the actual gas flow without manual intervention, and the universality and the process stability of plasma equipment in different application scenes are greatly improved.

Description

Technical Field

[0001] The present invention relates to the technical field of plasma generators, and in particular to a gas regulating mechanism and a plasma generator device. Background Art

[0002] In the field of plasma technology, precise control of the working gas and its flow pattern have a decisive impact on process performance, stability, and final product quality. Plasma generators, as core equipment, are widely used in numerous industrial and scientific research scenarios, including precision coating, surface treatment, material synthesis, plasma cutting, and chemical vapor deposition.

[0003] However, different plasma processes have distinct requirements for the flow patterns of the working gas (or reactant gas). For example, in high-precision coating processes, the gas often needs to enter the reaction chamber in a near-axial uniform flow or a weak swirl to minimize disturbances in the plasma region, ensuring deposition uniformity and film quality. This gentle flow helps maintain a stable plasma region, avoiding unnecessary turbulence or local concentration differences, thereby meeting the stringent stability requirements of plasma processes that do not require high gas disturbances.

[0004] In stark contrast, high-intensity gas swirl is crucial in plasma torches, plasma cutting, and certain chemical vapor deposition processes that require enhanced reactant mixing. This strong swirl effectively stabilizes the arc column, preventing drift or instability, thereby ensuring energy concentration and efficient utilization. Furthermore, high-intensity swirl promotes thorough mixing and uniform distribution of reactants within the plasma region, improving reaction efficiency and product purity.

[0005] Although various gas flow regulating devices exist in the prior art, most solutions often face numerous challenges in achieving adaptive switching between different swirl intensities. For example, some fixed-structure gas flow channels cannot meet the requirements for dynamic adjustment of swirl intensity under different operating conditions. Other adjustable systems often require complex external power supplies, sensors, actuators, or control systems to monitor gas flow and drive regulating components. This not only increases the complexity, manufacturing cost, and maintenance difficulty of the equipment, but may also introduce response delays and limit their application in certain environments with special requirements, such as those without electromagnetic interference. Summary of the Invention

[0006] Therefore, the technical problem to be solved by the present invention is that most solutions usually face many challenges when achieving adaptive switching between different swirl intensities.

[0007] The above technical problems are solved by the following technical solutions: The present invention proposes a gas regulating mechanism, which includes an adjusting component, including an adjusting ring and an annular blocking member installed at the air inlet of the adjusting ring; a flow guide component, including a first flow guide member and multiple second flow guide members, the first flow guide member is located at the gas outflow end of the adjusting ring, and the multiple second flow guide members are installed on the surface of the first flow guide member, and the second guide member can form multiple spiral cavities when the annular blocking member squeezes the first flow guide member, and the spiral cavity is configured to guide the gas to produce a high-intensity swirl.

[0008] In a preferred embodiment of the gas regulating mechanism of the present invention, a guide cavity is provided on the regulating ring, and the guide cavity is used to receive the gas transported through the gas channel.

[0009] In a preferred embodiment of the gas regulating mechanism of the present invention, the annular blocking member is slidably installed inside the guide cavity, and a mixing cavity for accommodating the flow of gas is opened in the middle of the annular blocking member.

[0010] In a preferred embodiment of the gas regulating mechanism of the present invention, one end of the annular blocking member is connected to a return spring, which is configured to apply resistance to the annular blocking member.

[0011] In a preferred embodiment of the gas regulating mechanism of the present invention: the first guide member is fixedly arranged inside the guide cavity, the surface of the first guide member is smoothly arranged, and is arranged to guide the gas to produce a weak swirl or a uniform flow close to the axial direction; the second guide member can expand when the annular blocking member squeezes the medium inside the first guide member, and is against the inner wall of the guide cavity.

[0012] In a preferred embodiment of the gas regulating mechanism of the present invention: it also includes a cathode head, which is arranged at the gas outflow end of the guide cavity and is configured to receive the gas flow guided by the first guide member or the spiral cavity. The connection between the cathode head and the guide cavity is configured to ensure stable delivery of the gas flow under low flow or high flow conditions.

[0013] In a preferred embodiment of the gas regulating mechanism of the present invention: a lightweight hollow disturbance piece is provided inside the mixing chamber, and the surface of the disturbance piece is covered with randomly distributed micro-vortex guide structures, and the micro-vortex guide structures include pits, micro blades or irregular protrusions.

[0014] In a preferred embodiment of the gas regulating mechanism of the present invention: a plurality of micro-guide grids or porous plates are provided on the inner wall of the mixing chamber, and the micro-guide grids or porous plates are configured to guide the incoming gas to impact the disturbance member in the form of multiple streams or diffusion flows, drive the disturbance member to move and promote random collision and mixing between gas molecules.

[0015] In a preferred embodiment of the gas regulating mechanism of the present invention, the disturbance piece is spherical or has a special-shaped structure, and the interior of the disturbance piece is hollow to reduce the mass and increase the sensitivity to the airflow, thereby enhancing the rotation or swing effect of the disturbance piece in the mixing chamber.

[0016] To solve the above technical problems, the present invention further provides the following technical solutions: a plasma generator device, comprising a gas regulating mechanism, and a plasma generator body, comprising an air inlet pipe communicating with a gas channel and an anode head corresponding to the cathode head; a cooling assembly, comprising a first pipe and a second pipe, wherein the first pipe transports a coolant into the interior of the plasma generator body and flows out from the second pipe.

[0017] The beneficial effects of the present invention are that the first flow guide and the second flow guide that can dynamically form a spiral cavity can automatically provide two optimized gas flow fields based on the actual gas flow rate without human intervention: under low flow conditions, the first flow guide guides a weak swirl or a uniform flow close to the axial direction, which is suitable for coating or etching processes that do not require high gas disturbance; while under high flow conditions, the dynamically formed spiral cavity generates a high-intensity swirl, which effectively meets the urgent needs of processes such as plasma torch arc stabilization or enhanced reactant mixing that require strong swirl. This adaptive, graded, and highly flexible swirl adjustment capability greatly improves the versatility and process stability of plasma equipment in different application scenarios.

[0018] The rotor surface is covered with randomly distributed micro-vortex guide structures, including pits, micro-blades, or irregular protrusions. Combined with the micro-guide grids or porous plates set on the inner wall of the mixing chamber, the incoming airflow can drive the disturbance element to float freely, rotate, or swing irregularly without external drive. This passive but efficient motion mode, combined with the vortex guide structure, can significantly disturb the airflow, promote high-frequency random collisions and sufficient premixing between gas molecules, and completely solve the problems of low mixing efficiency or uneven mixing at different flow rates in traditional mixing devices. It greatly improves the uniformity of the gas before entering the subsequent process, thereby optimizing the plasma reaction efficiency and process stability. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the following briefly introduces the drawings of the embodiments of the present invention. Obviously, the drawings described below only relate to some embodiments of the present invention and are not intended to limit the present invention. Among them:

[0020] Figure 1 shows a cross-sectional view of the gas regulating mechanism;

[0021] Figure 2 A cutaway perspective view of an adjustment ring of a gas adjustment mechanism is shown;

[0022] Figure 3 A diagram showing the formation of a spiral cavity of a gas regulating mechanism is shown;

[0023] Figure 4 A perspective view of an annular barrier member of a gas regulating mechanism is shown;

[0024] Figure 5 An exploded perspective view of an annular barrier of a gas regulating mechanism is shown;

[0025] Figure 6 Shown is an overall perspective view of a plasma generator device. DETAILED DESCRIPTION

[0026] In order to enable those skilled in the art to better understand the present invention, the present invention is further described in detail below with reference to specific embodiments and the accompanying drawings.

[0027] The terms used in the present invention are those commonly used in the art in view of the functions of the present invention, but these terms may vary according to the intentions of those skilled in the art, precedents, or new technologies in the art. In addition, specific terms may be selected by the applicant, and in such cases, their detailed meanings will be described in the detailed description of the present invention. Therefore, the terms used in the specification should not be understood as simple names, but rather as the meanings of the terms and the overall description of the present invention.

[0028] Reference Figure 1-3 This embodiment provides a gas regulating mechanism, including a regulating component 1, including an regulating ring 11 and an annular blocking member 12 installed at the air inlet of the regulating ring 11; a flow guide component 2, including a first flow guide 21 and multiple second flow guides 22, the first flow guide 21 is located at the gas outflow end of the regulating ring 11, and the multiple second flow guides 22 are installed on the surface of the first flow guide 21, and the second flow guide 22 can form multiple spiral cavities 221 when the annular blocking member 12 squeezes the first flow guide 21, and the spiral cavity 221 is configured to guide the gas to generate a high-intensity swirl.

[0029] In this embodiment, in the application of the plasma generator, different process flows have different requirements for the flow pattern (such as swirl intensity) of the working gas. For example, the precision coating process requires a uniform axial airflow, while the plasma torch requires a high-intensity swirl to stabilize the arc column.

[0030] The adjustment ring 11 forms the main passage for the air flow, and a guide cavity 111 is provided inside the adjustment ring 11 to provide space for the flow of gas and the installation of various components.

[0031] The annular blocking member 12 is slidably mounted inside the guide cavity 111 of the adjustment ring 11 and has a mixing cavity 121 formed therein to ensure that gas can pass through in any state.

[0032] Working in conjunction with the regulating assembly 1 is the flow guide assembly 2, which is responsible for generating swirls of different intensities under different working conditions. The assembly includes a first flow guide 21 and a plurality of second flow guides 22.

[0033] The first flow guide 21 is fixedly mounted at the gas outlet end of the adjustment ring 11, in front of the movable path of the annular barrier 12. The first flow guide 21 is a flexible or hollow structure containing a flowable or compressible medium. Multiple second flow guides 22 are mounted on its surface. In low-flow mode, the first flow guide 21 itself guides the airflow.

[0034] The second flow guide 22 is made of an expandable flexible material and is arranged along the outer surface of the first flow guide 21. In an initial state, the second flow guide 22 does not significantly change the shape of the airflow channel.

[0035] The formation of the spiral cavity 221 is not a pre-existing fixed structure, but is formed dynamically. When the annular barrier 12 is pushed forward by high air pressure and squeezes the first guide member 21, the medium (such as liquid or gas) inside the first guide member 21 is pressurized, causing the multiple second guide members 22 on its surface to expand outward. The expanded second guide members 22 will be tightly against the inner wall of the guide cavity 111, thereby dynamically forming multiple spiral cavities 221 between the second guide members 22. The geometric shape of these spiral cavities 221 can force the passing gas to produce a high-intensity spiral flow.

[0036] The pressure difference generated by the change in gas flow is used as the driving force to achieve automatic switching between two different swirl modes through a purely mechanical structure.

[0037] Under low power and low flow conditions, the gas pressure is insufficient to overcome the thrust of the return spring 122, and the annular blocking member 12 remains stationary. The gas flows through the first flow guide 21, generating a weak swirl or a nearly axial uniform flow, meeting the requirements of precision technology.

[0038] Under high-power, high-flow conditions, the increased gas pressure pushes the annular barrier 12 forward, overcoming the spring resistance and squeezing the first flow guide 21. This squeezing causes the multiple second flow guides 22 to expand under pressure, dynamically forming multiple spiral cavities 221. At this point, gas is forced through these spiral cavities 221, generating a high-intensity swirl flow suitable for processes requiring strong swirl.

[0039] refer to Figure 2-4In one embodiment provided in the present application, a guide cavity 111 is provided on the adjustment ring 11, and the guide cavity 111 is used to receive the gas transported through the gas channel. The annular blocking member 12 is slidably installed inside the guide cavity 111, and a mixing cavity 121 for accommodating the flow of gas is provided in the middle of the annular blocking member 12. The annular blocking member 12 is connected to the return spring 122, which is configured to apply resistance to the annular blocking member 12. The first guide member 21 is fixedly arranged inside the guide cavity 111, and the surface of the first guide member 21 is smooth, and is configured to guide the gas to produce a weak swirl or a uniform flow close to the axial direction; a plurality of second guide members 22, the second guide members 22 can expand when the annular blocking member 12 squeezes the medium inside the first guide member 21, and resists the inner wall of the guide cavity 111 to form a plurality of spiral cavities 221, and the spiral cavities 221 are configured to guide the gas to produce a high-intensity swirl;

[0040] Among them, under low gas flow conditions, the gas pressure inside the guide cavity 111 is insufficient to overcome the thrust of the return spring 122, the annular blocking member 12 remains stationary, and the gas forms a weak swirl or a uniform flow close to the axial direction through the first guide member 21, which is suitable for plasma processes that do not require high gas disturbances; under high gas flow conditions, the gas pressure inside the guide cavity 111 is greater than the thrust of the return spring 122, the annular blocking member 12 slides toward the first guide member 21 and squeezes the medium inside the first guide member 21, causing the second guide member 22 to expand to form a spiral cavity 221, and the gas forms a high-intensity swirl through the spiral cavity 221, which is suitable for plasma processes that require strong swirl to stabilize the arc column or enhance the mixing of reactants;

[0041] In this embodiment, regulating the intensity of the gas swirl is crucial to the process performance. Under low gas flow conditions, weak swirl or near-axial uniform flow is required to reduce gas disturbances, suitable for processes requiring high stability. Under high gas flow conditions, high-intensity swirl is required to stabilize the arc column or enhance reactant mixing, meeting specific process requirements.

[0042] The guide cavity 111, located on the adjustment ring 11, serves as the primary structure for receiving gas delivered through the gas channel. This cavity provides a sealed flow space for gas flow. Its internal structure is designed to accommodate other components (such as the annular blocker 12 and flow guide) and provide an environment for regulating gas swirl. The inner wall of the cavity 111 is smooth, and it cooperates with other components to form a specific gas flow path.

[0043] The annular barrier 12, slidingly mounted within the guide chamber 111, is the component that enables adaptive adjustment. A mixing chamber 121 is located in the center of the annular barrier 12. This provides a channel for gas flow, allowing it to pass through and form a swirl under specific conditions. The annular barrier 12 responds to changes in gas flow through its sliding motion, thereby changing the geometry of the gas flow channel and, in turn, adjusting the swirl intensity.

[0044] Return spring 122 is connected to annular barrier 12 and acts to resist it, maintaining its initial position under low gas flow conditions. The spring constant of return spring 122 must be designed based on the expected gas flow range to ensure the device's responsiveness under different flow rates.

[0045] The first flow guide 21 is fixedly mounted within the guide cavity 111 and has a smooth surface. It guides the gas to form a weak vortex or a nearly axial uniform flow. Weak vortex refers to a gas flow with low vortex intensity and relatively straight streamlines, which is suitable for plasma processes that do not require high gas disturbance (such as certain plasma deposition or etching processes). The fixed arrangement of the first flow guide 21 ensures that it can provide a stable flow field foundation under any gas flow conditions.

[0046] The plurality of second flow guides 22 are components for achieving high-intensity swirl. The second flow guide 22 can expand when the annular blocking member 12 slides and squeezes the medium inside the first flow guide 21, and abuts against the inner wall of the guide cavity 111 to form a plurality of spiral cavities 221. The spiral cavity 221 is a flow channel structure with a spiral shape, which can significantly enhance the rotational motion of the gas and form a high-intensity swirl. The high-intensity swirl has a strong vortex strength, which helps to stabilize the plasma arc column or promote the full mixing of reactants in the plasma environment, and is suitable for processes that require strong disturbances (such as plasma cutting or certain chemical vapor deposition processes).

[0047] The guide cavity 111 provides a sliding space for the annular blocking member 12 . The sliding of the annular blocking member 12 directly affects the geometric shape of the gas flow channel, thereby determining the swirl intensity.

[0048] The return spring 122 controls the sliding behavior of the annular blocking member 12 by applying resistance. Only when the air pressure in the guide cavity 111 is sufficient to overcome the thrust of the return spring 122 will the annular blocking member 12 slide, triggering a change in the swirl intensity.

[0049] Under low flow conditions, the annular barrier 12 remains stationary, and the gas forms a weak swirl or axial flow through the first guide member 21; under high flow conditions, the annular barrier 12 slides and squeezes the medium inside the first guide member 21, causing the second guide member 22 to expand and form a spiral cavity 221, thereby guiding the gas to form a high-intensity swirl.

[0050] The first flow guide 21 provides a basic flow field, and the second flow guide 22 enhances the swirl intensity through the spiral cavity 221 under high flow conditions, and the two together achieve graded adjustment of the swirl intensity.

[0051] refer to Figure 1-2 As an optional embodiment, it also includes a cathode head 3, which is arranged at the gas outflow end of the guide cavity 111 and is configured to receive the gas flow guided by the first guide member 21 or the spiral cavity 221. The connection between the cathode head 3 and the guide cavity 111 is configured to ensure stable delivery of the gas flow under low flow or high flow conditions.

[0052] In this embodiment, the cathode head 3 is arranged at the gas outflow end of the guide cavity 111, and is a component that receives the gas flow guided by the first guide member 21 or the spiral cavity 221. The cathode head 3 usually serves as the generation point of the arc or the excitation area of ​​the reactant in the plasma process, and its design must ensure that it can efficiently receive the gas flow and convert it into a stable plasma flow. The structure of the cathode head 3 usually includes high-temperature resistant and corrosion-resistant materials (such as tungsten or its alloys) to withstand the high temperature and chemical corrosion environment in the plasma process. The internal flow channel design of the cathode head 3 matches the outlet shape of the guide cavity 111 to reduce the disturbance of the airflow in the transition area.

[0053] The gas outflow end of the guide cavity 111 is matched with the inlet flow channel of the cathode head 3 in terms of geometry, for example, through a gradual tapered or streamlined design, to reduce pressure loss or vortex generation of the gas flow in the transition area.

[0054] The cathode head 3 is connected to the guide cavity 111 by means of threads, snaps or other reliable mechanical fixing methods, ensuring that vibration or displacement caused by increased air pressure under high flow conditions will not affect the connection stability.

[0055] The gas outlet end of the guide cavity 111 serves as an output channel for the gas flow, directly delivering the gas flow guided by the first flow guide 21 or the spiral cavity 221 to the cathode head 3. The inlet design of the cathode head 3 closely matches the gas outlet end of the guide cavity 111, ensuring that the gas flow maintains its preset swirl intensity or uniformity when entering the cathode head 3.

[0056] refer to Figure 4-5As an optional embodiment, a lightweight hollow disturbance member 123 is provided inside the mixing chamber 121. The surface of the disturbance member 123 is covered with randomly distributed micro-vortex guide structures. The micro-vortex guide structures include pits, micro-blades or irregular protrusions. The disturbance member 123 is configured to float freely, rotate or swing irregularly in the mixing chamber 121 to pre-mix the incoming gas. A plurality of micro-guide grids or porous plates are provided on the inner wall of the mixing chamber 121. The micro-guide grids or porous plates are configured to guide the incoming gas to impact the disturbance member 123 in the form of multiple streams or diffuse flows, driving the disturbance member 123 to move and promoting random collisions and mixing between gas molecules. The disturbance member 123 is a spherical or special-shaped structure. The interior of the disturbance member 123 is hollow to reduce the mass and increase the sensitivity to the airflow, thereby enhancing the rotation or swinging effect of the disturbance member 123 in the mixing chamber 121.

[0057] In this embodiment, in the plasma process, uniform mixing of gas molecules is more important for reaction efficiency and process stability. The gas entering the mixing chamber 121 needs to be fully pre-mixed to ensure that the gas molecules are evenly distributed and fully collided before entering the subsequent process area (such as the cathode head 3). However, conventional mixing devices usually rely on fixed structures or external drive devices to promote gas mixing, which may lead to inconsistent mixing effects under different gas flow rates, especially insufficient mixing under low flow conditions, or excessive turbulence under high flow conditions, affecting process stability.

[0058] The disturbance member 123 is arranged inside the mixing chamber 121. It is a lightweight hollow structure. The disturbance member 123 floats freely, rotates or swings irregularly in the mixing chamber 121 to pre-mix the incoming gas. The lightweight hollow design of the disturbance member 123 (with a cavity inside) significantly reduces its mass, making it highly sensitive to small changes in the airflow, so that it can move flexibly under the push of the gas. The shape of the disturbance member 123 can be a spherical or special-shaped structure (such as an ellipsoid, a polyhedron, etc.). The specific shape is optimized according to the process requirements to enhance its dynamic response capability in the gas flow. The movement (rotation or swinging) of the disturbance member 123 promotes random collisions between gas molecules by disturbing the airflow, thereby achieving uniform pre-mixing.

[0059] The surface of the disturbance piece 123 is covered with randomly distributed micro-vortex guide structures, which are used to enhance the turbulence effect and mixing efficiency of the airflow. The micro-vortex guide structure can be: a tiny structure with a concave surface, which can generate local vortices when the gas flows through, increasing the disturbance of the airflow. Small blade-shaped protrusions can guide the airflow to form tiny vortices, further promoting the collision of gas molecules. Irregularly shaped protrusions can generate complex airflow paths when the gas impacts, enhancing the random mixing effect. The random distribution of these micro-vortex guide structures ensures that the gas generates multi-directional turbulence when it contacts the disturbance piece 123, avoiding a single-directional flow pattern, thereby improving the uniformity of mixing.

[0060] The inner wall of the mixing chamber 121 is provided with multiple micro-guide grids or porous plates, which are used to guide the incoming gas to impact the disturbance element 123 in the form of multiple streams or diffuse flows. The micro-guide grid is a component with a regular grid structure that can divide the incoming airflow into multiple small streams, increasing the contact area between the airflow and the disturbance element 123; the porous plate, through its pore structure, allows the gas to enter the mixing chamber 121 in the form of a diffuse flow, resulting in a more uniform flow field distribution. The specific design of these structures (such as grid spacing and pore size) is optimized according to the gas flow rate and process requirements to ensure that the airflow can effectively drive the movement of the disturbance element 123, while promoting random collisions and mixing between gas molecules.

[0061] The disturbance element 123, the micro vortex guide structure, and the micro guide grid or porous plate achieve efficient premixing of the gas through synergistic action:

[0062] Micro-vortex guide structures are distributed on the surface of the disruptor 123. When the gas flow impacts the disruptor 123, the micro-vortex guide structures generate localized vortices, enhancing the turbulent effect of the airflow. The lightweight, hollow design of the disruptor 123 makes it sensitive to slight changes in the airflow. By rotating or oscillating, the micro-vortex guide structures maximize their turbulent effect, thereby promoting uniform mixing of gas molecules.

[0063] The micro-guide grids or porous plates on the inner wall of the mixing chamber 121 divide the incoming airflow into multiple streams or diffuse flows, increasing the chances of contact between the airflow and the disruptor 123. These structures guide the airflow to impact the disruptor 123 in multiple directions, driving the disruptor 123 to float freely, rotate, or oscillate irregularly, further enhancing the airflow disturbance and molecular collision effects.

[0064] The agitator 123 and its related structures further pre-mix the gas flows to ensure that the gases are evenly mixed before entering the cathode head 3, thereby optimizing the reaction efficiency of the subsequent plasma process.

[0065] The disturbance piece 123 inside the mixing chamber 121, through its lightweight hollow design and micro-vortex guide structures (pits, micro blades or irregular protrusions) randomly distributed on the surface, floats freely, rotates or swings irregularly under the impact of the gas flow, disturbs the airflow and generates local vortices, and promotes random collisions and premixing of gas molecules. The micro-guide grids or porous plates on the inner wall of the mixing chamber 121 divide the incoming airflow into multiple streams or diffuse flow forms, further enhancing the driving effect of the airflow on the disturbance piece 123, and improving the mixing efficiency through multi-directional impact. Whether under low flow conditions (weak vortex or uniform flow guided by the first guide piece 21) or high flow conditions (high-intensity vortex guided by the spiral chamber 221), the disturbance piece 123 and its related structures can effectively adapt to the airflow characteristics to ensure that the gas reaches a uniform mixing state before entering the cathode head 3.

[0066] Reference Figure 1 and Figure 6 This embodiment provides a plasma generator device, including a plasma generator body 4, including an air inlet pipe 41 connected to a gas channel and an anode head corresponding to a cathode head 3; a cooling assembly 5, including a first pipe 51 and a second pipe 52, the first pipe 51 transports the cooling liquid into the interior of the plasma generator body 4 and flows out from the second pipe 52

[0067] In this embodiment, the plasma generator body 4 is used to generate a plasma arc column and support process operation.

[0068] The air inlet pipe 41 is in communication with the gas channel and is responsible for introducing external gas (transported through the gas channel) into the interior of the plasma generator body 4. The air inlet pipe 41 is usually made of corrosion-resistant and high-temperature-resistant materials (such as stainless steel or ceramics).

[0069] The anode head and the cathode head 3 are arranged correspondingly, and together constitute the electrode system of the plasma generator body 4. The anode head receives the gas flow delivered by the cathode head 3, and forms an arc between the cathode head 3 and the anode head to excite the gas to generate plasma.

[0070] The cooling assembly 5 is used to manage the high temperature generated by the plasma generator body 4 during operation, ensuring that the device maintains stability and reliability during long-term operation.

[0071] The first pipe 51 is responsible for transporting the coolant (such as water or special coolant) to the interior of the plasma generator body 4 and is usually arranged around the anode head, the cathode head 3 or the high-temperature area of ​​the body shell.

[0072] The second pipe 52 serves as an outflow channel for the coolant, directing the heat-absorbing coolant from the interior of the plasma generator body 4 to an external heat dissipation system (e.g., a heat exchanger or cooling tower). The second pipe 52 forms a closed loop with the first pipe 51, ensuring continuous coolant flow and heat transfer.

[0073] The inlet pipe 41 serves as a bridge connecting the gas channel and the plasma generator body 4, introducing the external gas flow into the mixing chamber 121, the guide chamber 111 and other structures, and finally transporting it to the anode head through the cathode head 3. The smooth delivery characteristics of the inlet pipe 41 ensure that the gas flow maintains a preset swirl intensity or uniformity (such as weak swirl or high-intensity swirl) before entering the cathode head 3.

[0074] The cathode head 3 receives the gas flow from the guide cavity 111, guides it through the first flow guide 21 or the spiral cavity 221, and transmits it to the anode head. The electric field between the cathode head 3 and the anode head excites the gas to form a plasma arc column. The design of the anode head matches the flow path of the cathode head 3 to ensure the stability of the gas flow in the arc region.

[0075] The first conduit 51 introduces coolant into the plasma generator body 4, absorbing heat around high-temperature areas (such as the cathode head 3, anode head, or arc generation zone). The second conduit 52 removes the high-temperature coolant, forming a circulating cooling system. The flow path design of the cooling assembly 5 closely matches the structure of the plasma generator body 4, ensuring that the coolant reaches all critical high-temperature areas without interfering with gas flow or arc stability.

[0076] Finally, it should be pointed out that the methods and devices described in detail above are merely embodiments, and those skilled in the art can modify these embodiments in different ways without departing from the scope of the present invention.

Claims

1. A gas regulating mechanism, characterized in that: include, An adjustment assembly (1) comprises an adjustment ring (11) and an annular blocking member (12) mounted at an air inlet of the adjustment ring (11); A flow guide assembly (2) comprises a first flow guide member (21) and a plurality of second flow guide members (22), wherein the first flow guide member (21) is located at a gas outflow end of an adjustment ring (11), and the plurality of second flow guide members (22) are mounted on a surface of the first flow guide member (21), and the second flow guide members (22) are capable of forming a plurality of spiral cavities (221) when the annular blocking member (12) squeezes the first flow guide member (21).

2. The gas regulating mechanism according to claim 1, characterized in that: A guide cavity (111) is provided on the adjustment ring (11), and the guide cavity (111) is used to receive gas transported through the gas channel.

3. The gas regulating mechanism according to claim 2, characterized in that: The annular blocking member (12) is slidably mounted inside the guide cavity (111), and a mixing cavity (121) for accommodating gas flow is provided in the middle of the annular blocking member (12).

4. The gas regulating mechanism according to claim 3, characterized in that: One end of the annular blocking member (12) is connected to a return spring (122), and the other end of the return spring (122) is against the adjustment ring (11).

5. The gas regulating mechanism according to claim 4, characterized in that: The first flow guide (21) is fixedly arranged inside the guide cavity (111), and the surface of the first flow guide (21) is smooth; The second flow guide (22) can expand when the annular blocking member (12) squeezes the medium inside the first flow guide (21) and abut against the inner wall of the guide cavity (111).

6. The gas regulating mechanism according to any one of claim 2, characterized in that: It also includes a cathode head (3), which is arranged at the gas outflow end of the guide cavity (111), and receives the gas flow guided by the first guide member (21) or the spiral cavity (221).

7. The gas regulating mechanism according to claim 3, characterized in that: A disturbance member (123) is provided inside the mixing chamber (121), and the surface of the disturbance member (123) is covered with micro vortex guiding structures.

8. The gas regulating mechanism according to claim 7, characterized in that: A flow bypass portion (124) is provided on the inner wall surface of the mixing chamber (121), and the flow bypass portion (124) includes a plurality of micro-flow guide grids or porous plates, and the micro-flow guide grids or porous plates guide the incoming gas to impact the disturbance member (123) in the form of multiple streams or diffused flows.

9. The gas regulating mechanism according to claim 8, characterized in that: The disturbance member (123) is a spherical or special-shaped structure, and the interior of the disturbance member (123) is hollow.

10. A plasma generator device, characterized in that: A gas regulating mechanism comprising any one of claims 1 to 9, and The plasma generator body (4) includes an air inlet pipe (41) communicating with the gas channel and an anode head arranged corresponding to the cathode head (3); The cooling assembly (5) comprises a first pipe (51) and a second pipe (52), wherein the first pipe (51) transports the cooling liquid into the interior of the plasma generator body (4) and flows out from the second pipe (52).

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