High-toughness CrNbZrNiSiBN high-entropy nitride coating and preparation method thereof

Abstract

The invention relates to the technical field of deposition of wear-resistant and corrosion-resistant coating materials on metal surfaces, in particular to a high-toughness CrNbZrNiSiBN high-entropy nitride coating and a preparation method thereof. A bonding layer formed by a Cr layer, a transition layer formed by a CrN layer and a functional layer coated with CrNbZrNiSiBN high-entropy nitride are sequentially arranged on the surface of a base material. And the total thickness of the coated functional layer is 2-10 microns. The method is completed by adopting an ion beam assisted arc ion plating technology, and the prepared composite coating has the advantages of relatively high hardness, relatively good toughness, wear resistance, corrosion resistance, high-temperature oxidation resistance and the like. The coating can be used for strengthening and protecting the surfaces of cutters, molds, aerospace, marine ship parts and the like.

Description

Technical Field

[0001] The present invention belongs to the technical field of depositing wear-resistant and corrosion-resistant coating materials on metal surfaces, and particularly relates to a CrNbZrNiSiBN high-entropy nitride composite coating, a preparation method thereof, and an application thereof. Background Art

[0002] Marine engineering equipment is the foundation of the marine economy, and the development of advanced marine engineering equipment and high-tech vessels has become a key breakthrough area in marine development. Key moving components in these vessels, such as propeller bearings, submarine buoyancy control systems, underwater robot joints, seawater hydraulic system plunger pumps, and deep-sea drilling heave compensation devices, not only face severe marine corrosion but also operate in harsh environments such as high hydrostatic pressure and high salt corrosion. This can easily degrade and fail the material's service life, severely impacting the service life and operational stability of marine engineering equipment and potentially even causing catastrophic accidents.

[0003] The preparation of protective coatings on the surfaces of some moving parts of these marine engineering equipment is one of the important means to improve their wear resistance, corrosion resistance and service life. Traditional transition metal nitride ceramics, such as TiN, TiAlN and CrAlN, have excellent mechanical properties such as high hardness, high elastic modulus and high wear resistance, as well as high-temperature stability such as high melting point and ablation resistance. They are widely used in mechanical manufacturing such as cutting tools and molds, as well as high-end equipment such as aviation, aerospace, and nuclear energy. In mechanical manufacturing, high hardness is obviously a very sought-after property because it can prevent tool wear under extreme working pressure to extend its life and improve processing performance. Usually, hardness enhancement is achieved by limiting dislocations and slip and reducing plastic deformation in the material. However, this will lead to embrittlement of the material and a significant reduction in damage tolerance. Therefore, in order to improve the durability of coated tools, it is necessary to design coating materials with strong and tough properties.

[0004] Compared to traditional hard coatings, high-entropy nitride coatings are a recently developed multi-element alloy coating composed of five or more metallic or non-metallic elements in equal molar proportions. Due to their numerous advantages, including high hardness, high plasticity, high wear resistance, high temperature resistance, and corrosion resistance, they have become a research hotspot in the development of hard coatings. Currently, high-entropy nitride coatings are primarily prepared using magnetron sputtering, electrochemical deposition, and thermal spraying. However, reports on their application in marine environments are limited.

[0005] Therefore, developing a coating system that has both good high strength and toughness and good wear resistance and corrosion resistance is an important way to solve the above problems. Summary of the Invention

[0006] In view of the shortcomings of the existing coating material system, the purpose of the present invention is to provide a high-strength and tough CrNbZrNiSiBN high-entropy nitride coating and its preparation method and application.

[0007] In order to achieve the above object, the technical solution of the present invention is:

[0008] A high-strength and tough CrNbZrNiSiBN high-entropy nitride coating comprises a bonding layer formed by a Cr layer, a transition layer formed by a CrN layer, and a functional layer coated with the CrNbZrNiSiBN high-entropy nitride, which are sequentially arranged on the surface of a base material.

[0009] Preferably, the thicknesses of the adhesive layer, transition layer, and functional layer of the present invention are 0.2-1.0 microns, 0.4-2.0 microns, and 2.0-10.0 microns, respectively.

[0010] Preferably, the Cr content in the coated CrNbZrNiSiBN high entropy nitride of the present invention is 15-25 at.%, the Nb content is 10-20 at.%, the Zr content is 10-20 at.%, the Ni content is 5-20 at.%, the Si content is 5-15 at.%, and the B content is 5-15 at.%, and the N content is 40-55 at.%.

[0011] A method for preparing a high-strength and high-toughness CrNbZrNiSiBN high-entropy nitride coating comprises the following steps:

[0012] Step S1: Place the pre-treated workpiece on the workpiece rack in the vacuum chamber of the PVD equipment and evacuate to 1×10 -2 ~3×10 -3 Pa, heated to 300-500°C;

[0013] Step S2, plating transition layer and bonding layer: using high chromium target, when the vacuum degree in the vacuum chamber reaches 1×10 -2 Pa~3×10 -3When the vacuum chamber temperature reaches 300-500°C, the workpiece holder is turned on and the rotation speed is adjusted to 1-4 rpm; argon gas is introduced into the vacuum chamber and the pressure is controlled between 0.1 and 2 Pa; the substrate is pulsed with a negative bias voltage in the range of -20 to -500 V, the arc-enhanced glow discharge ion source is turned on to make the gas glow discharge, and the workpiece is glow cleaned for 20 to 60 minutes; the argon flow rate is adjusted so that the vacuum chamber pressure is 0.02-1.0 Pa, and the aluminum-chromium target arc source is turned on at the same time. , the arc current is 50-200A, the pulse negative bias is adjusted to -30V--500V, the pulse negative bias duty cycle is adjusted to 10%-80%, and the transition layer formed by the Cr layer is deposited for 10-40 minutes; then nitrogen is introduced, the gas pressure is adjusted to 0.5-5.0Pa, the pure chromium target arc source is turned on, the arc current is 50-200A, the pulse negative bias is adjusted to -50V--500V, the pulse negative bias duty cycle is adjusted to 10%-80%, and the transition layer formed by the CrN layer is deposited for 10-40 minutes;

[0014] Step S3, closing the arc Cr target, introducing a mixed gas of Ar and N2, adjusting the total gas pressure to 0.5-5 Pa, adjusting the pulse bias to -30 V to -500 V, adjusting the pulse negative bias duty cycle to 10% to 80%, and simultaneously turning on the pulse arc CrNbZrNiSiB alloy target, adjusting the pulse arc target current to 50-200 A, and simultaneously turning on the arc enhanced glow discharge ion source for ion beam assisted deposition for 40-200 minutes to deposit a high entropy nitride hard coating on the substrate;

[0015] Step S4: After the deposition is completed, turn off the arc power supply, pulse negative bias, and ion source, stop the gas supply, continue to evacuate, cool with the furnace to below 150°C, open the vacuum chamber, take out the workpiece, and the coating process is completed.

[0016] A high-strength and tough CrNbZrNiSiBN high-entropy nitride coating is used to strengthen and protect the surfaces of cutting tools, molds, aerospace, and marine ship components.

[0017] Compared with the prior art, the technical solution of the present invention has the following beneficial effects:

[0018] 1. The present invention provides a high-entropy nitride nanocomposite coating and a deposition method thereof. By adopting a pulsed arc target and regulating the valence state and energy density of each element in the plasma during the deposition process, the coating has a good composite structure of a nanocrystalline / amorphous interface layer, thereby solving the technical problems that high-entropy nitride coatings are easy to dissolve in the solid state and difficult to separate into phases, and that traditional single deposition power sources cannot effectively prepare nanocomposite high-entropy nitride coatings.

[0019] 2. The (CrNbZrNiSiB)N high-entropy nitride coating of the present invention is a high-entropy nanocrystalline (CrNbZrNi)N composite structure wrapped with amorphous SiNx and BN. This coating belongs to the category of high-entropy coatings and has a nanocomposite structure. The performance of this coating can combine the performance advantages of nanocomposite structures and high-entropy coatings. By adding Si and B elements, a (TiAlCrNbV)N / (SiNx / BN) nanocomposite structure is formed, which refines the coating grain size, thereby improving the coating density and hardness. At the same time, corrosion-resistant elements such as Cr, Nb, Zr, and Ni are added to improve the corrosion resistance of the coating. Moreover, since Ni is a weak nitride-forming element, Ni exists in the coating in a metallic form, which can effectively improve the toughness of the coating. 3. This invention utilizes ion beam-assisted pulsed arc ion plating technology for production. The pulsed arc improves the arc spot discharge characteristics of the target surface, reducing large particle emission. Ion beams are used for ion beam-assisted deposition, further improving coating density and regulating coating structure. This method not only achieves a faster deposition rate, but also produces a composite coating with fewer large particles on the surface, resulting in a denser coating. In addition to high hardness, the coating also exhibits excellent toughness, wear resistance, corrosion resistance, and high-temperature oxidation resistance. This coating can be used to strengthen and protect the surfaces of cutting tools, molds, aerospace, and marine vessel components. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] Figure 1 Schematic diagram of the structure of the high-strength, high-toughness, high-entropy nitride coating of the present invention. DETAILED DESCRIPTION

[0021] A high-strength and tough CrNbZrNiSiBN high-entropy nitride coating is described. A bonding layer formed by a Cr layer, a transition layer formed by a CrN layer, and a functional layer coated with the CrNbZrNiSiBN high-entropy nitride are sequentially arranged on the surface of a substrate. The thicknesses of the bonding layer, transition layer, and functional layer are 0.2-1.0 microns, 0.4-2.0 microns, and 2.0-10.0 microns, respectively. The coated CrNbZrNiSiBN high-entropy nitride has a Cr content of 15-25 at.%, a Nb content of 10-20 at.%, a Zr content of 10-20 at.%, a Ni content of 5-20 at.%, a Si content of 5-15 at.%, a B content of 5-15 at.%, and a N content of 40-55 at.%.

[0022] A method for preparing a high-strength and high-toughness CrNbZrNiSiBN high-entropy nitride coating comprises the following steps:

[0023] Step S1: Place the pre-treated workpiece on the workpiece rack in the vacuum chamber of the PVD equipment and evacuate to 1×10 -2 ~3×10 -3Pa, heated to 300-500°C;

[0024] Step S2, plating transition layer and bonding layer: using high chromium target, when the vacuum degree in the vacuum chamber reaches 1×10 -2 Pa~3×10 -3 When the vacuum chamber temperature reaches 300-500°C, the workpiece holder is turned on and the rotation speed is adjusted to 1-4 rpm; argon gas is introduced into the vacuum chamber and the pressure is controlled between 0.1 and 2 Pa; the substrate is pulsed with a negative bias voltage in the range of -20 to -500 V, the arc-enhanced glow discharge ion source is turned on to make the gas glow discharge, and the workpiece is glow cleaned for 20 to 60 minutes; the argon flow rate is adjusted so that the vacuum chamber pressure is 0.02-1.0 Pa, and the aluminum-chromium target arc source is turned on at the same time. , the arc current is 50-200A, the pulse negative bias is adjusted to -30V--500V, the pulse negative bias duty cycle is adjusted to 10%-80%, and the transition layer formed by the Cr layer is deposited for 10-40 minutes; then nitrogen is introduced, the gas pressure is adjusted to 0.5-5.0Pa, the pure chromium target arc source is turned on, the arc current is 50-200A, the pulse negative bias is adjusted to -50V--500V, the pulse negative bias duty cycle is adjusted to 10%-80%, and the transition layer formed by the CrN layer is deposited for 10-40 minutes;

[0025] Step S3, closing the arc Cr target, introducing a mixed gas of Ar and N2, adjusting the total gas pressure to 0.5-5 Pa, adjusting the pulse bias to -30 V to -500 V, adjusting the pulse negative bias duty cycle to 10% to 80%, and simultaneously turning on the pulse arc CrNbZrNiSiB alloy target, adjusting the pulse arc target current to 50-200 A, and simultaneously turning on the arc enhanced glow discharge ion source for ion beam assisted deposition for 40-200 minutes to deposit a high entropy nitride hard coating on the substrate;

[0026] Step S4: After the deposition is completed, turn off the arc power supply, pulse negative bias, and ion source, stop the gas supply, continue to evacuate, cool with the furnace to below 150°C, open the vacuum chamber, take out the workpiece, and the coating process is completed.

[0027] A high-strength and tough CrNbZrNiSiBN high-entropy nitride coating is used to strengthen and protect the surfaces of cutting tools, molds, aerospace, and marine ship components.

[0028] The technical solution of the present invention is described in detail below through examples.

[0029] Example 1

[0030] A high-strength and high-entropy nitride coating, the structural diagram of which is shown in the following figure: Figure 1 As shown, it is prepared by the following steps:

[0031] Step S1, substrate pretreatment: a stainless steel substrate was selected and ground with 400 mesh, 800 mesh, 1000 mesh, 1500 mesh, and 2000 mesh sandpaper in sequence, and then polished to a mirror surface with a polishing cloth and polishing paste. The alloy substrate was then ultrasonically cleaned with anhydrous ethanol for 20 minutes and dried with compressed argon gas;

[0032] Step S2, substrate sputtering cleaning: Place the pre-treated workpiece on the workpiece rack in the vacuum chamber of the PVD equipment and evacuate to 5×10 -3 Pa, heated to 520°C; the workpiece holder was turned on and the speed was adjusted to 1 rpm; argon gas was introduced into the vacuum chamber and the pressure was controlled at 0.4 Pa; a pulsed negative bias voltage of -200 V was applied to the substrate with a duty cycle of 70%, and the arc-enhanced glow discharge ion source was turned on to generate a glow discharge in the gas, and the sample was glow cleaned for 50 minutes;

[0033] Step S3, plating a transition layer and an intermediate layer: using a high-purity chromium target, adjusting the argon flow rate to a vacuum chamber pressure of 0.2 Pa, adjusting the pulse negative bias voltage to -450 V, adjusting the pulse negative bias voltage duty cycle to 20%, and simultaneously turning on the chromium target arc source with an arc current of 100 A, depositing a transition layer formed by a Cr layer for 20 minutes; then introducing nitrogen, adjusting the pressure to 1.5 Pa, turning on the pure chromium target arc source with an arc current of 100 A, adjusting the pulse negative bias voltage to -150 V, adjusting the pulse negative bias voltage duty cycle to 50%, and depositing a transition layer formed by a CrN layer for 25 minutes;

[0034] Step S4, plating a high-entropy nitride layer: turning off the arc Cr target, introducing a mixed gas of nitrogen and argon, adjusting the flow ratio of nitrogen to argon to 5:1, adjusting the total gas pressure to 2.5 Pa, adjusting the pulse bias to -120 V, adjusting the pulse negative bias duty cycle to 60%, and at the same time turning on the pulse arc CrNbZrNiSiB alloy target, and adjusting the pulse arc target current to 100 A, and at the same time turning on the arc enhanced glow discharge ion source for ion beam assisted deposition, the deposition time is 80 minutes, and a high-entropy nitride hard coating is deposited on the substrate.

[0035] Step S5: After the deposition is completed, turn off the arc power supply, pulse negative bias, and ion source, stop the gas supply, continue to evacuate, continue to evacuate, cool with the furnace to below 150°C, open the vacuum chamber, take out the workpiece, and the coating process is completed.

[0036] The hardness of the high entropy nitride ceramic coating prepared in this embodiment was tested by nanoindentation method, and the hardness was 45.26 GPa. The thickness of the coating was tested by scanning electron microscopy, and the thickness was 4.38 microns.

[0037] Example 2

[0038] A high-strength and high-entropy nitride coating, the structural diagram of which is shown in the following figure: Figure 1As shown, it is prepared by the following steps:

[0039] Step S1, substrate pretreatment: a titanium alloy substrate was selected, and a stainless steel substrate was ground using 400 mesh, 800 mesh, 1000 mesh, 1500 mesh, and 2000 mesh sandpaper in sequence, and then polished to a mirror surface using a polishing cloth and polishing paste. The alloy substrate was then ultrasonically cleaned with anhydrous ethanol for 20 minutes and dried with compressed argon gas;

[0040] Step S2: Sputtering cleaning of substrate: Place the pre-treated workpiece on the workpiece rack in the vacuum chamber of the PVD equipment and evacuate the vacuum to 4.5×10 -3 Pa, heated to 500 ° C; the workpiece holder was turned on and the speed was adjusted to 2 rpm; argon gas was introduced into the vacuum chamber and the pressure was controlled at 0.3 Pa; a pulsed negative bias voltage of -200 V was applied to the substrate with a duty cycle of 75%, and the arc-enhanced glow discharge ion source was turned on to generate a glow discharge in the gas, and the sample was glow cleaned for 55 minutes;

[0041] Step S3, plating a transition layer and an intermediate layer: using a high-purity chromium target, adjusting the argon flow rate to a vacuum chamber pressure of 0.5 Pa, adjusting the pulse negative bias voltage to -150 V, adjusting the pulse negative bias voltage duty cycle to 50%, and simultaneously turning on the chromium target arc source with an arc current of 120 A, depositing a transition layer formed by a Cr layer for 15 minutes; then introducing nitrogen, adjusting the pressure to 2.0 Pa, turning on the pure chromium target arc source with an arc current of 120 A, adjusting the pulse negative bias voltage to -180 V, adjusting the pulse negative bias voltage duty cycle to 50%, and depositing a transition layer formed by a CrN layer for 20 minutes;

[0042] Step S4, plating a high-entropy nitride layer: closing the arc Cr target, introducing a mixed gas of nitrogen and argon, adjusting the nitrogen to argon flow ratio to 6:1, adjusting the total gas pressure to 2.1 Pa, adjusting the pulse bias to -200 V, adjusting the pulse negative bias duty cycle to 45%, and at the same time turning on the pulse arc CrNbZrNiSiB alloy target, and adjusting the pulse arc target current to 110 A, and at the same time turning on the arc enhanced glow discharge ion source for ion beam assisted deposition, the deposition time is 100 minutes, and a high-entropy nitride hard coating is deposited on the substrate.

[0043] Step S5: After the deposition is completed, turn off the arc power supply, pulse negative bias, and ion source, stop the gas supply, continue to evacuate, continue to evacuate, cool with the furnace to below 150°C, open the vacuum chamber, take out the workpiece, and the coating process is completed.

[0044] The hardness of the high entropy nitride ceramic coating prepared in this embodiment was tested by nanoindentation method, and the hardness was 35.26 GPa. The thickness of the coating was tested by scanning electron microscopy, and the thickness was 5.77 microns.

[0045] Example 3

[0046] A high-strength and high-entropy nitride coating, the structural diagram of which is shown in the following figure: Figure 1 As shown, it is prepared by the following steps:

[0047] Step S1, substrate pretreatment: a titanium alloy substrate was selected, and a stainless steel substrate was ground using 400 mesh, 800 mesh, 1000 mesh, 1500 mesh, and 2000 mesh sandpaper in sequence, and then polished to a mirror surface using a polishing cloth and polishing paste. The alloy substrate was then ultrasonically cleaned with anhydrous ethanol for 25 minutes and dried with compressed argon gas;

[0048] Step S2: Sputtering cleaning of substrate: Place the pre-treated workpiece on the workpiece rack in the vacuum chamber of the PVD equipment and evacuate to 5.5×10 -3 Pa, heated to 480 ° C; the workpiece holder was turned on and the speed was adjusted to 3 rpm; argon gas was introduced into the vacuum chamber and the pressure was controlled at 0.25 Pa; the substrate was pulsed with a negative bias voltage of -200 V and a duty cycle of 75%, and the arc-enhanced glow discharge ion source was turned on to generate a glow discharge in the gas, and the sample was glow cleaned for 55 minutes;

[0049] Step S3, plating a transition layer and an intermediate layer: using a high-purity chromium target, adjusting the argon flow rate to a vacuum chamber pressure of 0.6 Pa, adjusting the pulse negative bias voltage to -210 V, adjusting the pulse negative bias voltage duty cycle to 40%, and simultaneously turning on the chromium target arc source with an arc current of 100 A, depositing a transition layer formed by a Cr layer for 22 minutes; then introducing nitrogen, adjusting the pressure to 1.9 Pa, turning on the pure chromium target arc source with an arc current of 110 A, adjusting the pulse negative bias voltage to -160 V, adjusting the pulse negative bias voltage duty cycle to 47%, and depositing a transition layer formed by a CrN layer for 22 minutes;

[0050] Step S4, plating a high-entropy nitride layer: turning off the arc Cr target, introducing a mixed gas of nitrogen and argon, adjusting the flow ratio of nitrogen to argon to 7:1, adjusting the total gas pressure to 3.6 Pa, adjusting the pulse bias to -250 V, adjusting the pulse negative bias duty cycle to 40%, and at the same time turning on the pulse arc CrNbZrNiSiB alloy target, and adjusting the pulse arc target current to 130 A, and at the same time turning on the arc enhanced glow discharge ion source for ion beam assisted deposition, the deposition time is 120 minutes, and a high-entropy nitride hard coating is deposited on the substrate.

[0051] Step S5: After the deposition is completed, turn off the arc power supply, pulse negative bias, and ion source, stop the gas supply, continue to evacuate, continue to evacuate, cool with the furnace to below 150°C, open the vacuum chamber, take out the workpiece, and the coating process is completed.

[0052] The hardness of the high entropy nitride ceramic coating prepared in this embodiment was tested by nanoindentation method, and the hardness was 32.17 GPa. The thickness of the coating was tested by scanning electron microscopy, and the thickness was 6.65 microns.

[0053] Example 4

[0054] A high-strength and high-entropy nitride coating, the structural diagram of which is shown in the following figure: Figure 1 As shown, it is prepared by the following steps:

[0055] Step S1, substrate pretreatment: a cemented carbide substrate was selected, and a stainless steel substrate was ground using 400 mesh, 800 mesh, 1000 mesh, 1500 mesh, and 2000 mesh sandpaper in sequence, and then polished to a mirror surface using a polishing cloth and polishing paste. The alloy substrate was then ultrasonically cleaned with anhydrous ethanol for 30 minutes and dried with compressed argon gas;

[0056] Step S2: Sputtering cleaning of substrate: Place the pre-treated workpiece on the workpiece rack in the vacuum chamber of the PVD equipment and evacuate to 6.5×10 -3 Pa, heated to 480°C; turned on the workpiece holder rotation and adjusted the speed to 3 rpm; introduced argon gas into the vacuum chamber and controlled the pressure at 0.6 Pa; applied a pulsed negative bias voltage of -180 V to the substrate with a duty cycle of 70%, turned on the arc-enhanced glow discharge ion source to generate a glow discharge in the gas, and glow cleaned the sample for 40 minutes;

[0057] Step S3, plating a transition layer and an intermediate layer: using a high-purity chromium target, adjusting the argon flow rate to a vacuum chamber pressure of 0.6 Pa, adjusting the pulse negative bias voltage to -150 V, adjusting the pulse negative bias voltage duty cycle to 35%, and simultaneously turning on the chromium target arc source with an arc current of 120 A, depositing a transition layer forming a Cr layer for 40 minutes; then introducing nitrogen, adjusting the pressure to 2.5 Pa, turning on the pure chromium target arc source with an arc current of 150 A, adjusting the pulse negative bias voltage to -100 V, adjusting the pulse negative bias voltage duty cycle to 60%, and depositing a transition layer forming a CrN layer for 40 minutes;

[0058] Step S4, plating a high-entropy nitride layer: turning off the arc Cr target, introducing a mixed gas of nitrogen and argon, adjusting the flow ratio of nitrogen to argon to 4:1, adjusting the total gas pressure to 2.2 Pa, adjusting the pulse bias to -160 V, adjusting the pulse negative bias duty cycle to 45%, and at the same time turning on the pulse arc CrNbZrNiSiB alloy target, and adjusting the pulse arc target current to 150 A, and at the same time turning on the arc enhanced glow discharge ion source for ion beam assisted deposition, the deposition time is 120 minutes, and a high-entropy nitride hard coating is deposited on the substrate.

[0059] Step S5: After the deposition is completed, turn off the arc power supply, pulse negative bias, and ion source, stop the gas supply, continue to evacuate, continue to evacuate, cool with the furnace to below 150°C, open the vacuum chamber, take out the workpiece, and the coating process is completed.

[0060] The hardness of the high entropy nitride ceramic coating prepared in this embodiment was tested by nanoindentation method, and the hardness was 30.26 GPa. The thickness of the coating was tested by scanning electron microscopy, and the thickness was 9.23 microns.

[0061] The present invention provides a high-entropy nitride (HEN) coating composed of multiple metal elements and a method for preparing the same using ion beam assisted arc ion plating. A bonding layer formed by a Cr layer, a transition layer formed by a CrN layer, and a functional layer coated with a CrNbZrNiSiBN high-entropy nitride are sequentially arranged on the surface of a substrate material. The total thickness of the coated functional layers is 2 to 10 microns. The present invention uses ion beam assisted arc ion plating (IBA-AIP) technology to prepare a composite coating that not only has high hardness but also has advantages such as good toughness, wear resistance, corrosion resistance, and high-temperature oxidation resistance. The coating can be used to strengthen and protect the surfaces of cutting tools, molds, aerospace, and marine ship components.

[0062] The embodiments of the present invention are described in detail above, but the present invention is not limited to the above embodiments. Various changes can be made within the scope of knowledge of those skilled in the art without departing from the spirit of the present invention.

Claims

1. A high-strength and tough CrNbZrNiSiBN high-entropy nitride coating, characterized in that: A bonding layer formed by a Cr layer, a transition layer formed by a CrN layer, and a functional layer coated with CrNbZrNiSiBN high entropy nitride are sequentially arranged on the surface of the base material.

2. The high-strength and tough CrNbZrNiSiBN high-entropy nitride coating according to claim 1, characterized in that: The thicknesses of the bonding layer, transition layer and functional layer are 0.2-1.0 microns, 0.4-2.0 microns and 2.0-10.0 microns respectively.

3. The high-strength and tough CrNbZrNiSiBN high-entropy nitride coating according to claim 1, characterized in that: The coated CrNbZrNiSiBN high entropy nitride has a Cr content of 15-25 at.%, a Nb content of 10-20 at.%, a Zr content of 10-20 at.%, a Ni content of 5-20 at.%, a Si content of 5-15 at.%, a B content of 5-15 at.%, and a N content of 40-55 at.%.

4. A method for preparing the high-strength and tough CrNbZrNiSiBN high-entropy nitride coating according to any one of claims 1 to 3, characterized in that: The steps include: Step S1: Place the pre-treated workpiece on the workpiece rack in the vacuum chamber of the PVD equipment and evacuate to 1×10 -2 ~3×10 - 3 Pa, heated to 300-500°C; Step S2, plating transition layer and bonding layer: using high chromium target, when the vacuum degree in the vacuum chamber reaches 1×10 -2 Pa~3×10 -3 When the vacuum chamber temperature reaches 300-500°C, the workpiece holder is turned on and the rotation speed is adjusted to 1-4 rpm; argon gas is introduced into the vacuum chamber and the pressure is controlled between 0.1 and 2 Pa; a pulsed negative bias voltage is applied to the substrate in the range of -20 to -500 V, and the arc-enhanced glow discharge ion source is turned on to cause the gas to glow discharge, and the workpiece is glow cleaned for 20-60 minutes; Adjust the argon flow rate to make the vacuum chamber pressure 0.02-1.0 Pa, and at the same time, turn on the aluminum-chromium target arc source, the arc current is 50-200 A, the pulse negative bias is adjusted to -30V--500V, the pulse negative bias duty cycle is adjusted to 10%-80%, and the transition layer formed by the Cr layer is deposited for 10-40 minutes; then, nitrogen is introduced, the pressure is adjusted to 0.5-5.0 Pa, and the pure chromium target arc source is turned on, the arc current is 50-200 A, the pulse negative bias is adjusted to -50V--500V, the pulse negative bias duty cycle is adjusted to 10%-80%, and the transition layer formed by the CrN layer is deposited for 10-40 minutes; Step S3, closing the arc Cr target, introducing a mixed gas of Ar and N2, adjusting the total gas pressure to 0.5-5 Pa, adjusting the pulse bias to -30 V to -500 V, adjusting the pulse negative bias duty cycle to 10% to 80%, and simultaneously turning on the pulse arc CrNbZrNiSiB alloy target, adjusting the pulse arc target current to 50-200 A, and simultaneously turning on the arc enhanced glow discharge ion source for ion beam assisted deposition for 40-200 minutes to deposit a high entropy nitride hard coating on the substrate; Step S4: After the deposition is completed, turn off the arc power supply, pulse negative bias, and ion source, stop the gas supply, continue to evacuate, cool with the furnace to below 150°C, open the vacuum chamber, take out the workpiece, and the coating process is completed.

5. A high-strength and tough CrNbZrNiSiBN high-entropy nitride coating for strengthening and protecting the surfaces of cutting tools, molds, aerospace, and marine ship components.

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