Out-of-cavity self-cleaning method, device and system for carrier plate of plate-type PVD coating equipment

Abstract

The invention relates to the field of photovoltaic coating equipment, and discloses an out-of-cavity self-cleaning method, device and system for a carrier plate of plate-type PVD coating equipment, the self-cleaning method comprises a full-mode cleaning method and an optimized-mode cleaning method, the full-mode cleaning method is adopted to complete cleaning once, and the optimized-mode cleaning method is adopted to complete cleaning for the following n times, the full-mode cleaning method is carried out again, the steps are repeated, and n is 2-20. The full-mode cleaning method comprises the following steps: firstly, performing high-energy laser cleaning; then, O < + > and / or N < + > plasma or H < + > and / or NH3 < + > plasma is adopted as a cleaning medium to carry out a normal-pressure plasma cleaning method; and finally, carrying plate isolation maintenance is carried out. According to the optimized mode cleaning method, only normal-pressure plasma cleaning is adopted, isolation surface layer pore gas replacement maintenance is carried out, and the laser cleaning treatment step is omitted. The self-cleaning device is applied to the self-cleaning method. According to the self-cleaning system, multiple self-cleaning devices are arranged in a multi-layer parallel mode or a segmented serial mode according to production requirements.

Description

Technical Field

[0001] The present invention relates to the field of photovoltaic coating equipment, and in particular to a self-cleaning method outside a carrier cavity of a plate-type PVD coating equipment, and a device and system thereof. Background Art

[0002] As the flat panel display industry, especially heterojunction solar cells, matures, its key equipment, plate-type PVD coating equipment, has been widely used due to its large production capacity, high coating uniformity, and deposition rate. However, the continuous coating of plate-type PVD coating equipment cannot avoid the problem of coating byproducts on the carrier and vacuum chamber accumulating to a certain extent and easily falling off, causing dust contamination. Traditional plate-type PVD coating equipment uses regular equipment maintenance to clean the carrier and vacuum chamber. However, due to the large amount of byproducts attached to the carrier and the complex distribution, even with regular cleaning, some attachments on the carrier transmitted by the vacuum chamber will still randomly fall off after repeated temperature and pressure changes. In addition, the use of in-cavity cleaning of the carrier will inevitably increase the difficulty of cavity self-cleaning and increase the online cleaning time. Summary of the Invention

[0003] The purpose of the present invention is to solve the shortcomings of the existing technology in carrier cleaning, and to provide a self-cleaning method outside the carrier cavity of a plate-type PVD coating equipment, and its device and system, which can not only clean thoroughly and efficiently, but also reduce the problems of occupying equipment startup time, increasing the difficulty of cavity self-cleaning, and increasing production costs in the current technology.

[0004] To achieve the above object, the present invention adopts the following technical solutions:

[0005] The present invention discloses a self-cleaning method outside the carrier cavity of a plate-type PVD coating equipment. The method utilizes a carrier return area of ​​the plate-type PVD coating equipment to form a plurality of functional chambers that are enclosed on all sides. During the carrier return, a dry cleaning method outside the cavity that combines physical and chemical cleaning methods is used to remove attachments generated on the carrier during coating. The method includes a full-mode cleaning method and an optimized-mode cleaning method.

[0006] When the carrier is transferred to the return area, it is cleaned once using the full-mode cleaning method and then sent to the coating equipment for use. After use, when the carrier returns to the return area again, it is cleaned using the optimized mode cleaning method. After performing the optimized mode cleaning method n times, the full-mode cleaning method is performed again, and this cycle is repeated, where n is 2 to 20.

[0007] The full mode cleaning method is:

[0008] First, high-energy laser cleaning is performed: the front and side edges of the carrier main frame and the front of the sub-carrier are swept and cleaned to remove attachments such as the ITO layer generated by each coating, and a combination of ion and electrostatic dust removal is used to remove smoke and dust generated by laser vaporization or burning of the attachment layer; the high energy is not less than 100W.

[0009] Then, the atmospheric pressure plasma cleaning method is performed: the atmospheric pressure plasma electrochemical reaction is used, and the pulsating negative cavity pressure and electric field interaction are used to perform in-situ and remote guidance combined fine cleaning to remove the residues and dead corners of the high energy laser cleaning; the atmospheric pressure plasma cleaning method uses O + and / or N + plasma, or H + and / or N + Plasma is used as the cleaning medium.

[0010] Finally, the carrier plate is isolated and maintained: gas replacement maintenance is performed on the pores on the surface of the carrier plate;

[0011] The optimized cleaning method uses only atmospheric pressure plasma cleaning to remove loose, island-like deposits from the upper layer of each coating, leaving a small, denser, flat bottom layer as a protective layer for the alloy substrate. This method also performs surface pore gas replacement maintenance, omitting the laser cleaning step.

[0012] Furthermore, when the atmospheric pressure plasma cleaning method adopts H + and / or NH3 + When used as a cleaning medium, the full-mode cleaning method also includes plasma passivation treatment before isolation maintenance. The plasma passivation treatment method is: using N + and O + Plasma, combined with an electric field, catalytically nitrides and oxidizes the surface of the substrate, resulting in surface passivation modification. The substrate must be washed with an isolation gas before and after plasma passivation treatment.

[0013] Furthermore, the isolation gas is compressed air; the quality grade of the compressed air should meet the requirements of ISO 8573.1 (GB / T 13277-1) class 1.2.2.

[0014] Furthermore, the surface pore gas replacement method is: in a clean environment atmosphere, using H + Mixed hydrogen atomic gas replaces the gas in the pores on the carrier surface; the clean environment atmosphere is: temperature: 22°C to 26°C, atmospheric pressure: 86 kPa to 106 kPa, relative humidity: 40% to 60%, ozone concentration: no more than 20μg / m3, and cleanliness level: ISO 1000.

[0015] Furthermore, it also includes waste gas treatment, which collects and purifies the waste gas generated by cleaning and then discharges it.

[0016] The present invention also discloses a self-cleaning device for the carrier cavity outside a plate-type PVD coating equipment, which is applied to the self-cleaning method for the carrier cavity outside a plate-type PVD coating equipment described above. The device comprises several sealed and protected functional chambers located above the carrier return area of ​​the coating equipment, and a carrier conveying mechanism disposed within the functional chambers. The functional chambers comprise a sequentially connected laser initial cleaning chamber, an atmospheric pressure plasma cleaning chamber, a maintenance chamber, and an exhaust gas treatment chamber connected to each of the functional chambers. Each functional chamber is provided with an isolation valve and / or an isolation spray air curtain.

[0017] The shell of the atmospheric pressure plasma cleaning functional chamber is a single-layer structure; the atmospheric pressure plasma cleaning functional chamber includes a plasma cleaning chamber; a plurality of plasma cleaning generators are arranged in the plasma cleaning chamber, a cleaning fairing is arranged below the plasma cleaning generator, and the gas source of the plasma cleaning generator is O2 and / or N2, or H2 and / or NH3.

[0018] Furthermore, when the gas source of the plasma cleaning generator is H2 and / or NH3, a passivation function chamber is further provided between the atmospheric pressure plasma cleaning function chamber and the maintenance function chamber.

[0019] The shell of the passivation function chamber is a single-layer stainless steel or aluminum alloy sealed protective cover.

[0020] The passivation function room is provided with a plurality of plasma passivation generators and a passivation fairing provided below the plasma passivation generators; the gas source of the plasma passivation generators is O2 and N2;

[0021] An air curtain is arranged between the plasma passivation generators; a gate valve and an air curtain are arranged between the passivation function chamber and the maintenance function chamber.

[0022] Furthermore, the shell of the maintenance function room is a single-layer stainless steel or aluminum alloy sealed protective cover; the maintenance function room is provided with a plurality of maintenance fairings for introducing maintenance ions and maintenance atmosphere.

[0023] Furthermore, two plasma cleaning chambers are provided, namely a main plasma cleaning chamber for plasma rough cleaning and a secondary plasma cleaning chamber for plasma fine cleaning; the main plasma cleaning chamber and the secondary plasma cleaning chamber are connected to each other.

[0024] Furthermore, the laser preliminary cleaning function room includes a laser chamber, and gate valves and air curtains are provided between the laser chamber and the coating equipment and between the laser chamber and the atmospheric pressure plasma cleaning function room for isolation; a laser machine is provided in the laser chamber; the laser machine is located above the carrier conveying mechanism, and a dust hood for electrostatic dust removal is provided on the laser machine.

[0025] Furthermore, the shell of the laser chamber is a single-layer stainless steel or aluminum alloy sealed protective cover; the laser chamber is provided with two, namely a transverse laser chamber for transverse laser cleaning and a longitudinal laser chamber for longitudinal laser cleaning, the transverse laser chamber is provided with a plurality of transversely movable laser heads, and the longitudinal laser chamber is provided with a plurality of longitudinally movable laser heads; the laser preferably uses a high-power green laser.

[0026] Furthermore, the shell of the exhaust gas treatment chamber is a single-layer stainless steel or aluminum alloy sealed protective cover; the exhaust gas treatment chamber includes an exhaust gas treatment device for harmless treatment of gas, a filter for filtering solid particles and smoke, as well as an air inlet and a sewage outlet; the air inlet of the exhaust gas treatment chamber is respectively connected to the exhaust gas outlets of the laser initial cleaning function chamber, the atmospheric pressure plasma cleaning function chamber, the passivation function chamber, and the maintenance function chamber.

[0027] The present invention also discloses a self-cleaning system outside the carrier cavity of a plate-type PVD coating equipment, which includes two sets of the above-mentioned self-cleaning devices outside the carrier cavity of the plate-type PVD coating equipment, several lifting mechanisms and conveying lines;

[0028] The two sets of self-cleaning devices are arranged in parallel on two levels, with the head and tail ends of the self-cleaning devices connected to the conveyor lines respectively. The conveyor lines are connected to the feeding end and the discharging end of the coating equipment through the lifting mechanism.

[0029] Alternatively, the two sets of self-cleaning devices are arranged in sections and serially; the two sets of self-cleaning devices are connected head to tail, and a conveyor line for conveying the carriers to be cleaned and the carriers that have been cleaned is also provided underneath; the head and tail ends of the self-cleaning device are respectively connected to the inlet and outlet of the self-cleaning device with the conveyor line, the feed end and the discharge end of the coating equipment through a lifting mechanism.

[0030] The present invention has at least the following technical effects:

[0031] (1) The present invention adopts an off-chamber self-cleaning method, which is installed on the substrate return area of ​​the coating equipment. After each coating, the substrate can be cleaned and maintained in time, avoiding contamination caused by the accumulation of attachments and the random shedding of the substrate, thereby improving the coating quality. Compared with the existing off-chamber cleaning technology, no independent substrate cleaning equipment is required, saving equipment space and transportation turnover links; compared with the existing in-chamber cleaning technology, the advantages are: no additional self-cleaning and maintenance time of the coating equipment is added, the difficulty of in-chamber self-cleaning is reduced, equipment maintenance time is saved, and the effective utilization rate of the equipment is improved.

[0032] (2) The present invention adopts an out-of-cavity normal pressure dry cleaning method, which is more efficient and energy-saving compared to the existing in-cavity vacuum cleaning technology; and is more environmentally friendly and emission-reducing compared to the out-of-machine carrier wet cleaning technology.

[0033] (3) The present invention uses a full-mode thorough cleaning followed by several optimization-mode simple cleanings. The optimization mode only removes the upper island-shaped, loose attachments produced by each coating, leaving a small amount of dense flat bottom layer as a protective layer for the alloy carrier. This is more streamlined than existing cleaning technologies, and the combination of the optimization mode and the full-mode makes it more efficient than existing cleaning technologies. BRIEF DESCRIPTION OF THE DRAWINGS

[0034] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the following briefly introduces the drawings required for use in the embodiments. It should be understood that the following drawings only illustrate certain embodiments of the present invention and therefore should not be regarded as limiting the scope. For ordinary technicians in this field, other relevant drawings can be obtained based on these drawings without paying any creative work.

[0035] Figure 1 It is a schematic diagram of the overall structure of embodiment 1.

[0036] Figure 2 It is a structural diagram of the laser primary cleaning functional chamber in Example 1.

[0037] Figure 3 It is a structural diagram of the atmospheric pressure plasma cleaning functional chamber in Example 1.

[0038] Figure 4 It is a schematic diagram of the overall structure of the second embodiment.

[0039] Figure 5 It is a schematic structural diagram of the passivation function chamber and the maintenance function chamber in the second embodiment.

[0040] Figure 6 This is a simplified structural diagram of the self-cleaning device of Example 2.

[0041] Figure 7 This is the self-cleaning system of the fourth embodiment which is arranged in sections and in series.

[0042] Figure 8 This is the self-cleaning system of the fifth embodiment, which is provided in parallel on two upper and lower layers.

[0043] Description of main component symbols:

[0044] 1. Plate conveying mechanism;

[0045] 2. Laser initial cleaning function room, 21. Horizontal laser room, 22. Vertical laser room, 23. Laser head;

[0046] 3. Atmospheric pressure plasma cleaning function room, 31. Plasma cleaning generator, 32. Cleaning fairing, 33. Main plasma cleaning chamber, 34. Secondary plasma cleaning chamber;

[0047] 4. Passivation function room, 41. Plasma passivation generator, 42. Passivation fairing;

[0048] 5. Maintenance function room, 51. Maintenance fairing;

[0049] 6. Interlayer cavity;

[0050] 71, first gate valve, 72, second gate valve, 73, third gate valve, 74, fourth gate valve, 75, fifth gate valve;

[0051] 81. First wind curtain, 82. Second wind curtain, 83. Third wind curtain, 84. Fourth wind curtain, 85. Fifth wind curtain, 86. Sixth wind curtain;

[0052] 9. Passivation maintenance function room;

[0053] 10. First self-cleaning device, 20. Second self-cleaning device, 30. Conveyor line, 40. First lifting mechanism, 50. Second lifting mechanism, 60. Third lifting mechanism, 70. Fourth lifting mechanism, 80. Fifth lifting mechanism. DETAILED DESCRIPTION

[0054] To make the objectives, technical solutions, and advantages of the embodiments of the present invention more clear, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts shall fall within the scope of protection of the present invention.

[0055] In the present invention, unless otherwise specified, directional words such as "up, down, left, right" are generally understood in conjunction with the directions shown in the drawings and actual applications.

[0056] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of the technical features being referred to. Thus, a feature identified as "first" or "second" may explicitly or implicitly include one or more of the features. In the description of the present invention, "plurality" means two or more, unless otherwise specifically defined.

[0057] In the present invention, unless otherwise expressly specified or limited, a first feature being "above" or "below" a second feature may mean that the first and second features are in direct contact, or that the first and second features are in indirect contact through an intermediate medium. Furthermore, a first feature being "above," "above," and "above" a second feature may mean that the first feature is directly above or obliquely above the second feature, or simply means that the first feature is at a higher level than the second feature. A first feature being "below," "below," and "below" a second feature may mean that the first feature is directly below or obliquely below the second feature, or simply means that the first feature is at a lower level than the second feature.

[0058] The endpoints of the ranges and any values ​​disclosed herein are not limited to the precise ranges or values, and these ranges or values ​​should be understood to include values ​​close to these ranges or values. For numerical ranges, the endpoints of each range, the endpoints of each range and individual point values, and the individual point values ​​can be combined to form one or more new numerical ranges, and these numerical ranges should be considered to be specifically disclosed herein. The terms "optional" and "optional" mean that a range may or may not be included (or may or may not be present).

[0059] like Figure 1 As shown, this embodiment discloses a self-cleaning device outside the carrier cavity of a plate-type PVD coating equipment, which includes a plurality of functional rooms located on the carrier return area of ​​the coating equipment and sealed and protected on all sides, and a carrier conveying mechanism 1 arranged in the plurality of functional rooms.

[0060] The functional chambers include a laser initial cleaning chamber 2, an atmospheric pressure plasma cleaning chamber 3, a maintenance chamber 5, and an exhaust gas treatment chamber connected to each of the functional chambers. Each functional chamber is equipped with a gate valve for isolation and / or an air curtain for isolation and spraying.

[0061] The gas source of the atmospheric pressure plasma cleaning chamber 3 of this embodiment is O2 and / or N2 gas, which will produce a carrier passivation effect during the cleaning process. Therefore, this embodiment does not need to set up a passivation chamber.

[0062] In this embodiment, a first gate valve 71 is provided at the connection between the outlet of the coating equipment carrier and the laser preliminary cleaning function chamber 2, a second gate valve 72 is provided at the connection between the laser preliminary cleaning function chamber 2 and the atmospheric pressure plasma cleaning function chamber 3, a fourth gate valve 74 is provided at the connection between the atmospheric pressure plasma cleaning function chamber 3 and the maintenance function chamber 5, and a fifth gate valve 75 is provided at the connection between the maintenance function chamber 5 and the inlet of the coating equipment carrier.

[0063] Specifically, the exhaust gas treatment chamber's housing is a single-layer, sealed protective cover made of stainless steel or aluminum alloy. The exhaust gas treatment chamber (not shown) includes an exhaust gas treatment device for harmless gas treatment, a filter for filtering solid particles and smoke, and an air inlet and a waste outlet. The exhaust gas treatment chamber's air inlet is connected to the exhaust outlets of the laser initial cleaning chamber 2, the atmospheric pressure plasma cleaning chamber 3, and the maintenance chamber 5, respectively. The exhaust gas generated by the cleaning process is collected, purified, and then discharged.

[0064] Specifically, if Figure 2 As shown, the laser primary cleaning chamber 2 includes a laser chamber. Inside the laser chamber, a first air curtain 81 is provided at the outlet of the first gate valve 71, and a second air curtain 82 is provided at the inlet of the second gate valve 72. The isolation and blocking of the gate valve and air curtain effectively prevents waste gases such as plasma from flowing into the external environment and causing air pollution. This also prevents the cleaning medium from the atmospheric pressure plasma cleaning chamber 3 from entering the laser chamber.

[0065] The laser chamber housing is a single-layer, sealed protective cover made of stainless steel or aluminum alloy. The laser chamber houses a laser machine and a laser waste outlet. The laser machine is located above the substrate conveyor mechanism 1 and is equipped with a dust cover for electrostatic dust removal. The laser waste outlet is located below the substrate conveyor mechanism 1 and communicates with the exhaust gas treatment chamber.

[0066] In this embodiment, two laser chambers are provided: a transverse laser chamber 21 for transverse laser cleaning and a longitudinal laser chamber 22 for longitudinal laser cleaning. The transverse laser chamber 21 houses several transversely movable laser heads 23, while the longitudinal laser chamber 22 houses several longitudinally movable laser heads 23. High-power green lasers are used as the lasers. The simultaneous use of the transverse laser chamber 21 and the longitudinal laser chamber 22, arranged in separate steps, simplifies the internal structure of the laser chambers, reduces the device's operational failure rate, speeds up operation, and thus improves laser cleaning efficiency. Combined with the return mechanism of the PVD coating equipment, the spatial length is sufficient to accommodate the length of the two laser chambers.

[0067] During use, the transverse laser chamber 21 and the longitudinal laser chamber 22 perform a large-scale longitudinal and transverse cleaning of the front and side edges of the carrier main frame and the front of the sub-carrier using a high-energy laser capable of vaporizing silicon material, removing the surface adhesion layer. Ion and electrostatic dust removal are combined to remove smoke and dust generated by laser vaporization or combustion of the adhesion layer, preventing secondary contamination. A high-power green laser is preferably used as the laser.

[0068] Specifically, if Figure 3As shown, the atmospheric pressure plasma cleaning function chamber 3 includes a plasma cleaning chamber. A plurality of plasma cleaning generators 31 are provided in the plasma cleaning chamber, and a cleaning fairing 32 is provided below the plasma cleaning generator 31. The gas source of the plasma cleaning generator 31 is O2 and / or N2 gas. + or N + Plasma is not toxic, so the shell of the plasma cleaning chamber adopts a single-layer stainless steel or aluminum alloy sealed protective cover to save costs.

[0069] In this embodiment, two plasma cleaning chambers are provided, namely a main plasma cleaning chamber 33 for rough plasma cleaning and a secondary plasma cleaning chamber 34 for fine plasma cleaning. The main plasma cleaning chamber 33 and the secondary plasma cleaning chamber 34 are interconnected. By using the primary and secondary plasma cleaning chambers for coordinated cleaning, rapid cleaning can be performed first with high intensity, followed by fine cleaning with low intensity. The cooperation between the primary and secondary plasma cleaning chambers not only increases the cleaning efficiency, but also allows the two plasma cleaning chambers to be independently controlled, making it easier to control the plasma, adjust the gas volume according to the cleaning requirements, improve the cleaning effect, and reduce the amount of plasma used. Combined with the return mechanism of the PVD coating equipment, its spatial length is sufficient to match the length of the two laser chambers.

[0070] When in use, O2 and / or N2 gas is introduced into several plasma cleaning generators 31 to generate high energy O + and / or N + Plasma, through a number of cleaning fairings 32, cooperates with the interactive transformation of the carrier plate pulse electric field and the pulsating negative cavity pressure to achieve fine cleaning combined with in-situ and remote directional guidance. The preferred pulsating negative cavity pressure range is: -10Pa~-100Pa, the pulsating period is 4s~30s, and the vacuum pump that generates the pulsating negative cavity pressure adopts variable frequency control.

[0071] Specifically, if Figure 1 As shown, a sixth air curtain 86 is provided at the outlet of the fourth gate valve 74 in the maintenance function chamber 5 for isolating other plasmas and spraying away plasma attached to the carrier.

[0072] A plurality of maintenance fairings 51 are provided in the maintenance function chamber 5 , and maintenance ions and maintenance atmosphere are introduced into the maintenance fairings 51 to perform surface pore gas replacement.

[0073] In this embodiment, the surface pore gas replacement method is: in a clean environment atmosphere, a trace amount of H +Mix gas with hydrogen atoms to replace the gas in the pores on the carrier surface; the clean environment atmosphere is: temperature: 22℃~26℃, atmospheric pressure: 86kPa~106kPa, relative humidity: 40%~60%, ozone concentration: no more than 20μg / m3, cleanliness level: ISO1000.

[0074] Since the maintenance function chamber 5 does not contain toxic gases, the housing of the maintenance function chamber 5 adopts a low-cost single-layer stainless steel or aluminum alloy sealed protective cover. The exhaust gas outlet of the maintenance function chamber 5 is connected to the exhaust gas treatment chamber.

[0075] In this embodiment, compressed air is used as the isolation gas in the air curtain. Preferably, the quality level of the compressed air should meet the requirements of ISO 8573.1 (GB / T 13277-1) class 1.2.2.

[0076] In order to allow the exhaust gas in each functional room to enter the exhaust gas treatment chamber smoothly, the negative pressure pump in the exhaust gas treatment chamber pumps each chamber to a slightly negative pressure. The preferred difference between the negative pressure and the normal pressure ranges from -10Pa to -100Pa.

[0077] According to the length of the coating equipment and the cleanliness requirements of the carrier board, the number of laser initial cleaning function chambers 2 and atmospheric pressure plasma cleaning function chambers 3 can be increased.

[0078] In this embodiment, the carrier is first cleaned using a laser suitable for removing large or strongly adherent residues. A high-energy laser beam instantly vaporizes or strips surface deposits (such as amorphous / microcrystalline silicon films or doped amorphous / microcrystalline silicon films) from the carrier. Plasma cleaning then uses ion bombardment and chemical reactions to remove fine particles, organic matter, or debris from laser cleaning, while simultaneously activating the carrier surface. Laser cleaning and plasma cleaning complement each other; neither is indispensable. Laser cleaning followed by plasma cleaning is preferred to avoid surface roughness caused by plasma pretreatment that could affect laser performance.

[0079] In terms of location setting, the self-cleaning device is set on the substrate return area of ​​the coating equipment and is located outside the cavity. Compared with the existing off-machine cleaning technology, no independent substrate cleaning equipment is set up, saving equipment space and transportation turnover links; compared with the existing in-cavity cleaning technology, the advantages are: no additional increase in the self-cleaning and maintenance time of the coating equipment, reducing the difficulty of in-cavity self-cleaning, saving equipment maintenance time, and improving the effective utilization rate of the equipment.

[0080] Example 2:

[0081] like Figure 4 As shown, this embodiment discloses a self-cleaning device outside the carrier cavity of a plate-type PVD coating equipment, wherein the device includes a plurality of functional rooms located on the carrier return area of ​​the coating equipment and sealed and protected on all sides, and a carrier conveying mechanism 1 arranged in the plurality of functional rooms.

[0082] The difference between this embodiment and the first embodiment is that the gas source of the atmospheric pressure plasma cleaning function chamber 3 of this embodiment is H2 and / or NH3. In order to extend the service life of the carrier, a passivation function chamber 4 is added between the atmospheric pressure plasma cleaning function chamber 3 and the maintenance function chamber 5.

[0083] Specifically, the functional chambers include a sequentially connected laser pre-cleaning chamber 2, an atmospheric pressure plasma cleaning chamber 3, a passivation chamber 4, a maintenance chamber 5, and an exhaust gas treatment chamber connected to each of these chambers. Each chamber is equipped with a gate valve for isolation and / or an air curtain for isolation and spraying.

[0084] In this embodiment, a first gate valve 71 is provided at the connection between the carrier outlet of the coating equipment and the laser preliminary cleaning function chamber 2, a second gate valve 72 is provided at the connection between the laser preliminary cleaning function chamber 2 and the atmospheric pressure plasma cleaning function chamber 3, a third gate valve 73 is provided at the connection between the atmospheric pressure plasma cleaning function chamber 3 and the passivation function chamber 4, a fourth gate valve 74 is provided at the connection between the passivation function chamber 4 and the maintenance function chamber 5, and a fifth gate valve 75 is provided at the connection between the maintenance function chamber 5 and the carrier inlet of the coating equipment.

[0085] In this embodiment,

[0086] Specifically, if Figure 5 As shown, a third air curtain 83 and a fourth air curtain 84 are respectively installed at the outlet of the third gate valve 73 and the inlet of the fourth gate valve 74 within the passivation chamber 4. The third air curtain 83 not only isolates the cleaning medium in the plasma cleaning chamber, but also sprays the carrier substrate cleaned in the plasma cleaning chamber to remove plasma attached to the carrier substrate, facilitating the subsequent passivation process. The fourth air curtain 84 is primarily used to isolate the passivation plasma and spray away passivation plasma attached to the carrier substrate.

[0087] The passivation function chamber 4 is provided with a plurality of plasma passivation generators 41 and a passivation fairing 42 provided below the plasma passivation generators 41 ; wherein the gas sources of the plasma passivation generators 41 are O 2 and N 2 .

[0088] In this embodiment, two plasma passivation generators 41 are provided in the passivation chamber 4 to passivate the carrier plate. A fifth air curtain 85 is provided between the two plasma passivation generators 41 to isolate the plasma therebetween, making the passivation easier to control.

[0089] When in use, O2 and N2 gas sources generate N-rich gas through the plasma passivation generator 41. + With part O +The combined plasma, through several passivation fairings 42, coordinates the alternating transformation of the carrier's pulsed electric field and pulsating negative chamber pressure to achieve all-around surface passivation modification of the aluminum alloy carrier, increasing surface density and hardness while reducing the release of impurities from surface pores. The preferred pulsating negative chamber pressure range is -10Pa to -100Pa, with a pulsation period of 4s to 30s. The vacuum pump generating the pulsating negative chamber pressure utilizes variable frequency control. Before and after plasma passivation, the carrier passes through the third and fourth air curtains 83 and 84 for spray washing.

[0090] Since the passivation chamber 4 does not contain toxic gases, the housing of the passivation chamber 4 is made of a low-cost single-layer stainless steel or aluminum alloy sealed protective cover. The exhaust outlet of the passivation chamber is connected to the exhaust gas treatment chamber.

[0091] Other technical features are consistent with those of embodiment 1.

[0092] Example 3:

[0093] like Figure 6 As shown, this embodiment discloses a self-cleaning device outside the carrier cavity of a plate-type PVD coating equipment, wherein the device includes a plurality of functional rooms located on the carrier return area of ​​the coating equipment and sealed and protected on all sides, and a carrier conveying mechanism 1 arranged in the plurality of functional rooms.

[0094] This embodiment is based on the second embodiment, and the passivation function chamber 4 and the maintenance function chamber 5 in the second embodiment are combined into one passivation and maintenance function chamber, simplifying the device cavity. Except for the above features, other technical features are consistent with the second embodiment.

[0095] Specifically, the functional chambers include a laser initial cleaning chamber 2, an atmospheric pressure plasma cleaning chamber 3, a passivation maintenance chamber, and an exhaust gas treatment chamber connected to each of the functional chambers. Each functional chamber is equipped with a gate valve for isolation and / or an air curtain for isolation and spraying.

[0096] The passivation maintenance chamber in this embodiment is equipped with several plasma passivation generators, with a passivation maintenance fairing 51 located below each. Air curtains are installed between adjacent plasma passivation generators, and air curtains are installed at both ends of the chamber to reduce mixing and escape of gases during carrier transport.

[0097] The passivation maintenance fairing 51 is connected to a plasma passivation gas source through a plasma passivation generator, and the passivation maintenance fairing 51 is connected to maintenance ions and maintenance atmosphere away from the plasma passivation generator.

[0098] Specifically, the plasma passivation gas source is O2, N2. The maintenance ion is a trace amount of H + Gas mixed with hydrogen atoms.

[0099] After the passivation is completed, the plasma passivation gas source is turned off. After the air curtain spray cleaning, the maintenance ions and maintenance atmosphere are turned on. Through a plurality of passivation maintenance fairings 51, the maintenance ions are used to replace the gas in the pores on the surface of the carrier board under the maintenance atmosphere to achieve carrier board maintenance.

[0100] This embodiment is a simplified version of the self-cleaning device, and is suitable for situations where there are requirements on the equipment space footprint.

[0101] Example 4:

[0102] like Figures 1 to 5 As shown, this embodiment discloses a self-cleaning method for the self-cleaning device outside the carrier cavity of the plate-type PVD coating equipment using the embodiment one, embodiment two or embodiment three, which uses the carrier return area of ​​the plate-type PVD coating equipment to form a number of functional chambers that are closed on all sides, and adopts a dry cleaning method outside the cavity that combines physical and chemical cleaning methods when the carrier is returned to remove attachments generated on the carrier during coating. This method includes a full-mode cleaning method and an optimized-mode cleaning method. After being used by the coating equipment, the carrier must undergo a full-mode cleaning method or an optimized-mode cleaning method before it can be returned to the coating equipment for use.

[0103] During self-cleaning, the substrate is cleaned once using the full-mode cleaning method and then sent to the coating equipment for use. After using the coating equipment, the substrate is returned to the return area and cleaned once again using the optimized mode cleaning method before being sent to the coating equipment for use. After performing the optimized mode cleaning method n times, the full-mode cleaning method is repeated, and this cycle repeats, where n is 2 to 20. For example, when n = 2, the substrate returned for the first time is cleaned using the full-mode cleaning method and then sent to the coating equipment for use. The substrate returned for the second time is cleaned using the optimized mode cleaning method and then sent to the coating equipment for use. The substrate returned for the third time is also cleaned using the optimized mode cleaning method and then sent to the coating equipment for use. The substrate returned for the fourth time is cleaned using the full-mode cleaning method and then sent to the coating equipment for use. This cycle repeats in this manner.

[0104] The specific full-mode cleaning method is:

[0105] Laser cleaning is performed first: in the laser initial cleaning function room 2, the front and side edges of the main frame of the carrier and the front of the sub-carrier transmitted back from the coating equipment are subjected to large-area edge sweeping and initial cleaning with high-energy laser to remove the ITO adhesion layer on the surface, and a combination of ion and electrostatic dust removal is used to absorb the smoke and dust generated by laser vaporization or combustion of the adhesion layer to avoid secondary pollution.

[0106] Then, atmospheric pressure plasma cleaning is performed: O2 and / or N2, or H2 and / or NH3 gas is introduced into the plasma cleaning generator 31 to generate high energy O + and / or N + plasma, or H+ and / or NH3 + The plasma, combined with the interactive transformation of the carrier plate pulse electric field and the pulsating negative cavity pressure, achieves a combination of in-situ and remote directional flow guidance for fine cleaning, removing residues and dead corners from high-energy laser cleaning, such as ITO layer attachments generated during each coating process.

[0107] When the gas source for the plasma cleaning generator is H2 and / or NH3 gas, in order to extend the service life of the carrier, the carrier needs to be isolated and passivated after cleaning: several atmospheric pressure plasma generators are used to generate N-rich + With part O + Combined plasma, coupled with the alternating effects of a pulsed electric field and pulsating negative chamber pressure, achieves comprehensive surface passivation modification of aluminum alloy substrates, increasing surface density and hardness while reducing impurity release from surface pores. The substrate must be purged with an isolation gas before and after plasma passivation treatment.

[0108] If the gas source for the plasma cleaning generator is O2 and / or N2, due to the O + and / or N + The plasma produces a passivating effect on the substrate, so no passivation treatment is required.

[0109] Finally, the carrier is maintained: in a clean environment, use a small amount of H + Mix gas with hydrogen atoms to replace the gas in the pores on the carrier surface; the clean environment atmosphere is: temperature: 22 ℃ ~ 26 ℃, atmospheric pressure: 86 kPa ~ 106 kPa, relative humidity: 40% ~ 60%, ozone concentration: no more than 20 μg / m 3 , cleanliness level: ISO 1000.

[0110] After maintenance is completed, the carrier board is sent to the coating equipment for use.

[0111] Since laser cleaning in the full-mode cleaning method cleans the adhesion layer more thoroughly, the carrier board after being cleaned using H2 and / or NH3 as the gas source is also isolated and passivated to extend the service life of the carrier board.

[0112] Specifically, the optimized pattern cleaning method is:

[0113] Laser cleaning is disabled, and laser primary cleaning chamber 2 serves as a buffer isolation chamber. The substrates returned from the coating equipment are directly cleaned with atmospheric-pressure plasma, removing the loose, island-like ITO deposits from each coating process, while retaining a small, dense, flat bottom layer as a protective layer for the alloy substrate. This small, dense, flat bottom layer allows the optimized cleaning method to omit plasma passivation treatment, requiring only a harmless spray, isolation, and gas washing treatment, as well as surface pore gas replacement maintenance. The substrates are then returned to the coating equipment for use.

[0114] This embodiment uses a full-mode thorough cleaning once, followed by several optimization-mode simple cleanings. In the optimization mode, laser cleaning and plasma passivation treatment are omitted, and only the upper island-shaped, loose attachments produced by each coating are removed, leaving a small amount of denser flat bottom layer as a protective layer for the alloy carrier plate, as well as surface pore gas replacement maintenance. After each coating, the carrier plate can be cleaned and maintained in time when it is returned, avoiding contamination caused by the accumulation and random shedding of attachments on the carrier plate, improving the coating quality, and solving the problem of cross-contamination of the carrier plate during continuous coating of different process film layers in plate-type PVD coating equipment. By combining the optimization mode with the full mode, while meeting the cleaning effect, the cleaning steps are simplified, energy consumption is reduced, and cleaning costs are saved. Compared with existing cleaning technologies, it is more streamlined and more efficient.

[0115] During the cleaning process, dry cleaning is used throughout, which is more environmentally friendly and reduces emissions compared to the wet cleaning technology of the external substrate.

[0116] Embodiment 5:

[0117] like Figure 7 As shown, this embodiment also discloses a self-cleaning system outside the carrier cavity of a plate-type PVD coating equipment, which includes two sets of self-cleaning devices outside the carrier cavity of the plate-type PVD coating equipment of embodiment one, embodiment two or embodiment three, a number of lifting mechanisms and a conveying line 30; the two sets of self-cleaning devices are respectively a first self-cleaning device 10 and a second self-cleaning device 20.

[0118] When the length of the return zone is greater than the total length of the two self-cleaning devices, the two sets of self-cleaning devices are arranged in sections in series. Specifically, the first self-cleaning device 10 and the second self-cleaning device 20 are connected head to tail, and a conveyor line 30 for conveying carriers to be cleaned and carriers that have been cleaned is also provided below. The discharge end of the coating equipment is connected to the head end of the first self-cleaning device 10 and the head end of the conveyor line 30 respectively through the first lifting mechanism 40, and the middle part of the conveyor line 30 is connected to the tail end of the first self-cleaning device 10 and the head end of the second self-cleaning device 20 respectively through the second lifting mechanism 50; the tail end of the second self-cleaning device 20 and the tail end of the conveyor line 30 are connected to the feed end of the coating equipment through the third lifting mechanism 60.

[0119] When in use, the coating equipment sends the carriers to be cleaned into the return area, and distributes them into the first part of carriers and the second part of carriers according to the set distribution amount.

[0120] The first part of the carriers to be cleaned are sent to the first self-cleaning device 10 for cleaning through the first lifting mechanism 40. After cleaning, the cleaned carriers are transported to the middle of the conveyor line 30 by the second lifting mechanism 50, and finally transported to the tail of the conveyor line 30. The cleaned carriers are transported to the feed end of the coating equipment by the third lifting mechanism 60 to complete the cleaning.

[0121] The second part of the carriers to be cleaned are sent into the conveyor line 30 by the first lifting mechanism 40. When they reach the middle of the conveyor line 30, they are transported to the second self-cleaning device 20 for cleaning by the second lifting mechanism 50. After cleaning, the carriers are transported to the feed end of the coating equipment by the third lifting mechanism 60 to complete the cleaning.

[0122] In this embodiment, two sets of self-cleaning devices are arranged in series in sections and transported through a conveyor line 30 below, thereby reducing the height space of the self-cleaning system without affecting the cleaning efficiency of multiple sets of self-cleaning devices.

[0123] Embodiment 5:

[0124] like Figure 8 As shown, this embodiment also discloses a self-cleaning system outside the carrier cavity of a plate-type PVD coating equipment, which includes two sets of self-cleaning devices outside the carrier cavity of the plate-type PVD coating equipment of embodiment one or embodiment two, a number of lifting mechanisms and a conveying line 30; the two sets of self-cleaning devices are respectively a first self-cleaning device 10 and a second self-cleaning device 20.

[0125] When the length of the return zone is less than the total length of the two self-cleaning devices, the two sets of self-cleaning devices are arranged in parallel in two layers, with the head and tail ends of the self-cleaning devices respectively connected to the conveyor line 30. Specifically, the first self-cleaning device 10 and the second self-cleaning device 20 are arranged in two layers, one above the other. The head ends of the first self-cleaning device 10 and the second self-cleaning device 20 are connected to the discharge end of the coating equipment via the fourth lifting mechanism 70, and the tail ends of the first self-cleaning device 10 and the second self-cleaning device 20 are connected to the feed end of the coating equipment via the fifth lifting mechanism 80.

[0126] During use, the coating equipment sends the carriers to be cleaned into the return area, which are divided into the first part of carriers and the second part of carriers according to the set distribution amount. The first part of carriers and the second part of carriers are respectively transported to the first self-cleaning device 10 and the second self-cleaning device 20 for cleaning through the fourth lifting mechanism 70. After the cleaning is completed, the cleaned carriers are collected into the feed end of the coating equipment through the fifth lifting mechanism 80 to complete the cleaning.

[0127] This embodiment overcomes the shortcoming of the return zone by placing two sets of self-cleaning devices in parallel on two levels. Although the height of the self-cleaning system is greater than that of the third embodiment, the structure is relatively simpler, eliminating the need for a lifting mechanism, and thus achieving superior cleaning efficiency.

[0128] The self-cleaning systems of Examples 4 and 5 are configured with two self-cleaning devices. This is merely an example used to illustrate the present invention and does not imply that a self-cleaning system can only have two self-cleaning devices. Depending on production requirements, any number of self-cleaning devices can be used in a segmented serial configuration, a parallel configuration, or a combination of the two.

[0129] The preferred embodiments of the present invention have been described in detail above, but the present invention is not limited thereto. Within the technical concept of the present invention, various simple variations of the technical solution of the present invention may be made, including combining the various technical features in any other appropriate manner. These simple variations and combinations should also be regarded as disclosed in the present invention and fall within the scope of protection of the present invention.

Claims

1. A self-cleaning method outside the carrier cavity of a plate-type PVD coating equipment, characterized by: The substrate return area of ​​the plate-type PVD coating equipment is used to form several enclosed functional chambers. During the substrate return, an out-of-chamber dry cleaning method combining physical and chemical cleaning methods is used to remove attachments on the substrate during coating. This includes full-mode cleaning and optimized-mode cleaning methods. When the carrier is transferred to the return area, it is cleaned once using the full-mode cleaning method and then sent to the coating equipment for use. After use, when the carrier returns to the return area again, it is cleaned using the optimized mode cleaning method. After performing the optimized mode cleaning method n times, the full-mode cleaning method is performed again, and this cycle is repeated, where n is 2 to 20. The full mode cleaning method is: First, high-energy laser cleaning is performed: the front and side edges of the carrier main frame and the front of the sub-carrier are swept and cleaned to remove the surface adhesion layer, and a combination of ion and electrostatic dust removal is used to remove the smoke and dust generated by laser vaporization or combustion of the adhesion layer; the high energy is not less than 100W; Then, the atmospheric pressure plasma cleaning method is performed: the atmospheric pressure plasma electrochemical reaction is used, and the pulsating negative cavity pressure and electric field interaction are used to perform in-situ and remote guidance combined fine cleaning to remove the residues and dead corners of the high energy laser cleaning; the atmospheric pressure plasma cleaning method uses O + and / or N + plasma, or H + and / or NH3 + Plasma is used as the cleaning medium. Finally, the carrier plate is isolated and maintained: gas replacement maintenance is performed on the pores on the surface of the carrier plate; The optimized cleaning method is as follows: only the atmospheric pressure plasma cleaning is used to remove the upper surface attachments produced by the coating, and surface pore gas replacement maintenance is performed, omitting the laser cleaning step.

2. The self-cleaning method outside the carrier cavity of a plate-type PVD coating equipment according to claim 1, characterized in that: When the atmospheric pressure plasma cleaning method uses H + and / or NH3 + When plasma is used as the cleaning medium, the full-mode cleaning method also includes plasma passivation treatment before isolation maintenance. The plasma passivation treatment method is: using N + and O + Plasma, combined with an electric field, catalytically nitrides and oxidizes the surface of the substrate, resulting in surface passivation modification. The substrate must be washed with an isolation gas before and after plasma passivation treatment.

3. The self-cleaning method outside the carrier cavity of a plate-type PVD coating equipment according to claim 2, characterized in that: The isolation gas is compressed air; the quality grade of the compressed air should meet the requirements of ISO 8573.1 (GB / T 13277-1) class 1.2.

2.

4. The self-cleaning method outside the carrier cavity of a plate-type PVD coating equipment according to claim 1, characterized in that: The surface pore gas replacement method is: in a clean environment atmosphere, use H + Mixed hydrogen atomic gas replaces the gas in the pores on the carrier surface; the clean environment atmosphere is: temperature: 22°C to 26°C, atmospheric pressure: 86 kPa to 106 kPa, relative humidity: 40% to 60%, ozone concentration: no more than 20 μg / m3, and cleanliness level: ISO 1000.

5. The self-cleaning method outside the carrier cavity of a plate-type PVD coating equipment according to claim 1, characterized in that: It also includes waste gas treatment, which collects and purifies the waste gas generated by cleaning and then discharges it.

6. A self-cleaning device outside the carrier cavity of a plate-type PVD coating equipment, characterized by: The device is applied to the self-cleaning method outside the carrier cavity of a plate-type PVD coating equipment as described in any one of claims 1 to 5; the device comprises a plurality of functional chambers located on the carrier return area of ​​the coating equipment and sealed on all sides for protection, and a carrier conveying mechanism arranged in the plurality of functional chambers, the functional chambers comprising a laser initial cleaning functional chamber, a normal pressure plasma cleaning functional chamber, a maintenance functional chamber, and an exhaust gas treatment chamber connected to each functional chamber in sequence; each functional chamber is provided with a gate valve for isolation and / or an air curtain for isolation spraying; The shell of the atmospheric pressure plasma cleaning functional chamber is a single-layer structure; the atmospheric pressure plasma cleaning functional chamber includes a plasma cleaning chamber; a plurality of plasma cleaning generators are arranged in the plasma cleaning chamber, a cleaning fairing is arranged below the plasma cleaning generator, and the gas source of the plasma cleaning generator is O2 and / or N2, or H2 and / or NH3.

7. The self-cleaning device outside the carrier cavity of the plate-type PVD coating equipment according to claim 6, characterized in that: When the gas source of the plasma cleaning generator is H2 and / or NH3, a passivation function chamber is further provided between the atmospheric pressure plasma cleaning function chamber and the maintenance function chamber; The shell of the passivation function chamber is a single-layer stainless steel or aluminum alloy sealed protective cover; The passivation function room is provided with a plurality of plasma passivation generators and a passivation fairing provided below the plasma passivation generators; the gas source of the plasma passivation generators is O2 and N2; An air curtain is arranged between the plasma passivation generators; a gate valve and an air curtain are arranged between the passivation function chamber and the maintenance function chamber.

8. The self-cleaning device outside the carrier cavity of the plate-type PVD coating equipment according to claim 6, characterized in that: The shell of the maintenance function room is a single-layer stainless steel or aluminum alloy sealed protective cover; the maintenance function room is provided with a plurality of maintenance fairings for introducing maintenance ions and maintenance atmosphere.

9. The self-cleaning device outside the carrier cavity of the plate-type PVD coating equipment according to claim 8, characterized in that: The plasma cleaning chambers are provided with two, namely a main plasma cleaning chamber for plasma rough cleaning and a secondary plasma cleaning chamber for plasma fine cleaning; the main plasma cleaning chamber and the secondary plasma cleaning chamber are communicated with each other.

10. The self-cleaning device outside the carrier cavity of the plate-type PVD coating equipment according to claim 9, characterized in that: The laser primary cleaning function room includes a laser chamber, and gate valves and air curtains are provided between the laser chamber and the coating equipment and between the laser chamber and the atmospheric pressure plasma cleaning function room for isolation; a laser machine is provided in the laser chamber; the laser machine is located above the carrier conveying mechanism, and a dust removal hood for electrostatic dust removal is provided on the laser machine.

11. The self-cleaning device outside the carrier cavity of the plate-type PVD coating equipment according to claim 10, characterized in that: The shell of the laser chamber is a single-layer stainless steel or aluminum alloy sealed protective cover; the laser chamber is provided with two, namely a transverse laser chamber for transverse laser cleaning and a longitudinal laser chamber for longitudinal laser cleaning, the transverse laser chamber is provided with a plurality of transversely movable laser heads, and the longitudinal laser chamber is provided with a plurality of longitudinally movable laser heads; the laser adopts a high-power green laser.

12. The self-cleaning device outside the carrier cavity of the plate-type PVD coating equipment according to claim 7, characterized in that: The shell of the waste gas treatment chamber is a single-layer stainless steel or aluminum alloy sealed protective cover; the waste gas treatment chamber includes a waste gas treatment device for harmless gas treatment, a filter for filtering solid particles and smoke, as well as an air inlet and a sewage outlet; the air inlet of the waste gas treatment chamber is respectively connected to the waste gas outlets of the laser initial cleaning function chamber, the atmospheric pressure plasma cleaning function chamber, the passivation function chamber, and the maintenance function chamber.

13. A self-cleaning system outside the carrier cavity of a plate-type PVD coating equipment, characterized in that It comprises two sets of self-cleaning devices outside the carrier cavity of the plate-type PVD coating equipment according to any one of claims 7 to 12, a plurality of lifting mechanisms and conveying lines; The two sets of self-cleaning devices are arranged in parallel on two levels, with the head and tail ends of the self-cleaning devices connected to the conveyor lines respectively. The conveyor lines are connected to the feeding end and the discharging end of the coating equipment through the lifting mechanism. Alternatively, the two sets of self-cleaning devices are arranged in sections and serially; the two sets of self-cleaning devices are connected head to tail, and a conveyor line for conveying the carriers to be cleaned and the carriers that have been cleaned is also provided underneath; the head and tail ends of the self-cleaning device are respectively connected to the inlet and outlet of the self-cleaning device with the conveyor line, the feed end and the discharge end of the coating equipment through a lifting mechanism.

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