Single-layer liquid crystal reflection type liquid crystal color display module and preparation method thereof

Abstract

The invention discloses a single-layer liquid crystal reflection type liquid crystal color display module and a preparation method thereof. The display module comprises a light absorption layer, a lower substrate, a red-green-blue three-primary-color reflection type cholesteric liquid crystal layer and an upper substrate which are sequentially arranged. The lower substrate is provided with a TFT electrode, the upper substrate is provided with a conductive indium tin oxide layer, the face, containing the TFT electrode, of the lower substrate is arranged upwards, the red-green-blue three-primary-color reflective cholesteric liquid crystal layer comprises a plurality of polyimide separating walls, and a micron-sized thin-wall container is formed between every two adjacent polyimide separating walls. And three adjacent micron-sized thin-wall containers form a group of pixel strips. Through formula improvement and process upgrading, the reflectivity of the display module is remarkably enhanced, color reflection is brighter, the visual angle characteristic of a display device is improved, the sensitivity to the observation angle is reduced, the display brightness and the light utilization rate are improved, and systematic optimization of reflection efficiency is achieved.

Description

Technical Field

[0001] The present invention belongs to the technical field of liquid crystal display, and in particular relates to a single-layer liquid crystal reflective liquid crystal color display module and a preparation method thereof. Background Art

[0002] Bistable liquid crystal display (LCD) technology within reflective liquid crystal display (LCD) offers significant advantages, including full-color flexible display, high reflective brightness, high contrast, and low power consumption. However, its high cost has limited its application in color display applications. Therefore, the challenge is to develop single-layer, low-cost color display technologies, focusing on breakthroughs in liquid crystal materials and manufacturing processes, two key technical limitations of the industry. Display products fabricated using cholesteric liquid crystals exhibit excellent bistability and a wide operating temperature range. Therefore, they consume no energy in display mode and can be switched on and off by electric fields or pressure. Currently, full-color displays on the market are achieved by stacking three layers of cholesteric liquid crystals reflecting red (R), green (G), and blue (B). This strategy results in complex and costly color CLC displays. Therefore, it is necessary to research how to reduce the production cost of CLC-based reflective displays, overcome various production technology barriers, and develop novel LCD color display structures. Summary of the Invention

[0003] To solve the above technical problems, the technical solution adopted by the present invention is: a single-layer liquid crystal reflective liquid crystal color display module, which includes, from bottom to top, a light absorbing layer arranged in sequence, a lower substrate with a TFT electrode on the upper surface, a red, green and blue primary color reflective cholesteric liquid crystal layer, and an upper substrate with a conductive indium tin oxide layer on the lower surface.

[0004] The light absorbing layer is made of any one of black ink, black adhesive film, and black film with double-sided adhesive tape.

[0005] The lower substrate is made of glass with TFT electrodes, polyethylene terephthalate film with TFT electrodes, or flexible PMMA organic glass with TFT electrodes. The upper substrate is made of glass with a conductive indium tin oxide layer, polyethylene terephthalate film with a conductive indium tin oxide layer, or flexible PMMA organic glass with a conductive indium tin oxide layer.

[0006] The red, green and blue primary color reflective cholesteric liquid crystal layer includes a plurality of evenly distributed polyimide isolation walls, a micron-scale container is formed between two adjacent polyimide isolation walls, and every three adjacent micron-scale containers form a group of pixel strips. In each group of pixel strips, one micron-scale container is filled with a chiral compound and a cholesteric liquid crystal reflecting red, another micron-scale container is filled with a chiral compound and a cholesteric liquid crystal reflecting green, and the last micron-scale container is filled with a chiral compound and a cholesteric liquid crystal reflecting blue.

[0007] A packaging film is provided between the red, green and blue primary color reflective cholesteric liquid crystal layer and the upper substrate.

[0008] The polyimide isolation wall has a height of 0.3-20 microns and a width of 0.3-20 microns. The distance between adjacent polyimide isolation walls is 2-120 microns. The polyimide isolation walls are bonded to the upper substrate and the lower substrate.

[0009] A method for preparing a single-layer liquid crystal reflective liquid crystal color display module comprises the following steps: Step 1: evenly coating a polyimide photosensitive resin on the side of the lower substrate having the TFT electrode, drying to remove the solvent, and polymerizing the resin under ultraviolet light using Mask I to form a plurality of evenly distributed polyimide isolation walls on the lower substrate; Step 2: Transfer the lower substrate to a developer and develop for a period of time to remove unpolymerized polyimide photosensitive resin. After taking it out, rinse the lower substrate to remove the developer and impurities on the lower substrate. Rinse it with a rinse solution to remove the solvent, thereby obtaining a lower substrate with a uniform and highly neat polyimide isolation wall. The area formed by the four adjacent polyimide isolation walls on the lower substrate is defined as RGB pixels. The area between the first and second polyimide isolation walls is called red pixel R, the area between the second and third polyimide isolation walls is called green pixel G, and the area between the third and fourth polyimide isolation walls is called blue pixel B. Step 3: Mix 1-30 parts of a chiral compound, 70-98 parts of an organic solvent, 3-50 parts of a polymer or an acrylate monomer, and 0-2 parts of a photoinitiator in parts by weight, and stir until uniform to obtain a mixture 1; A certain amount of mixture 1 is evenly printed in the area of ​​green pixel G, and a certain amount of mixture 1 is evenly printed in the area of ​​blue pixel B, wherein the amount of mixture 1 printed in the area of ​​blue pixel B is greater than the amount of mixture 1 printed in the area of ​​green pixel G; the mixture is naturally air-dried or the solvent is dried at a certain temperature; the lower substrate is transferred to ultraviolet light for a period of time to cause a polymerization reaction, thereby forming a thin film A in the area of ​​green pixel G and a thin film B in the area of ​​blue pixel B, wherein the total content of chiral compounds in thin film B is greater than the total content of chiral compounds in thin film A; Alternatively, a certain amount of mixture 1 is evenly coated on the side of the lower substrate with the polyimide isolation wall and dried. Mask II is then placed over the side of the lower substrate with mixture 1. Mask II has a plurality of light passages corresponding to red pixels R, green pixels G, and blue pixels B. The light passage corresponding to red pixel R is designated as light passage A, the light passage corresponding to green pixel G is designated as light passage B, and the light passage corresponding to blue pixel B is designated as light passage C. The light passage area of ​​light passage B is larger than that of light passage A, and the light passage area of ​​light passage C is larger than that of light passage B. The lower substrate covered with mask II is polymerized under ultraviolet light for a period of time. Mask II is removed, and the lower substrate is cleaned with a developer solvent to remove unpolymerized mixture 1. Thin film I is formed in the area of ​​red pixel R, thin film II is formed in the area of ​​green pixel G, and thin film III is formed in the area of ​​blue pixel B. The dried mixture 1 in the unpolymerized area is completely removed after development. Light passage A has the smallest area for light transmission, and after development, the unpolymerized areas are completely removed, leaving the smallest area of ​​Film I. Light passage B has a larger area for light transmission than A, and after development, the unpolymerized areas are completely removed, leaving a larger area of ​​Film II than Film I. Light passage C has a larger area for light transmission than Port B, and after development, the unpolymerized areas are completely removed, leaving the largest area of ​​Film III. Therefore, the total amount of polymerizable chiral compounds remaining in Film III is the largest, and the total amount of polymerizable chiral compounds remaining in Film II is larger than that in Film I but smaller than that in Film III.

[0010] Alternatively, a certain amount of mixture 1 is evenly coated on the side of the lower substrate with the polyimide isolation wall and dried. Mask II is then placed over the side of the lower substrate with mixture 1. Mask II has a plurality of light passage openings corresponding to red pixels R, green pixels G, and blue pixels B. The light passage opening corresponding to red pixel R is designated as light passage A, the light passage opening corresponding to green pixel G is designated as light passage B, and the light passage opening corresponding to blue pixel B is designated as light passage C. The light passage area of ​​light passage B is smaller than that of light passage A, and the light passage area of ​​light passage C is smaller than that of light passage B. The lower substrate covered with mask II is polymerized under ultraviolet light for a period of time. Mask II is then removed. Thin film I is formed in the area of ​​red pixel R, thin film II is formed in the area of ​​green pixel G, and thin film III is formed in the area of ​​blue pixel B. Light passage A has the largest light passage area, and the polymerizable chiral compound in the unpolymerized area will be fixed in thin film I. The area through which light passes through light port B is smaller than that through port A. Therefore, the polymerizable chiral compound in the unpolymerized areas after mask polymerization will continue to be anchored in Film II. The area through which light passes through light port C is smaller than that through port B. Therefore, the polymerizable chiral compound in the unpolymerized areas after mask polymerization will continue to be anchored in Film III. The polymerizable chiral compound in the areas through which light passes polymerizes under UV light, forming a polymer network and losing its chiral molecular properties. Therefore, the total amount of polymerizable chiral compound remaining in Film III is the largest, and the total amount of polymerizable chiral compound remaining in Film II is greater than that in Film I but less than that in Film III.

[0011] Alternatively, a certain amount of mixture 1 is evenly applied to the side of the lower substrate with the polyimide isolation wall, dried, and polymerized under ultraviolet light for a period of time to form a thin film 1 on the lower substrate. An etching machine is used to etch away thin film 1 in the red pixel R region and the green pixel G region, while retaining thin film 1 in the blue pixel B region. A certain amount of mixture 1 is again evenly applied to the side of the lower substrate with the micron-scale thin-walled container, dried, and polymerized under ultraviolet light for a period of time to form thin films 2 in the red pixel R and green pixel G, respectively. An etching machine is used to etch away thin film 2 in the red pixel R, while retaining thin film 2 in the green pixel G, and retaining both thin films 1 and 2 in the blue pixel B region. In this manner, the concentration of the chiral molecular compound in thin film 1 is greater than that in thin film 2.

[0012] Step 4: 1-60 parts by weight of UV-polymerizable monomer I, 70-98 parts of an organic solvent, and 0-2 parts of an initiator are mixed uniformly to obtain a mixture 2, and the mixture 2 is evenly coated on one side of the conductive indium tin oxide layer on the upper substrate, and dried to remove the solvent; the upper substrate is placed on the lower substrate containing the thin film and the TFT electrode, and then rolled and photopolymerized for a period of time to obtain a packaged liquid crystal cell without liquid crystal injection, wherein the side of the lower substrate with the polyimide isolation wall faces upward, and the side of the upper substrate with the mixture 2 faces downward; Step 5: uniformly mixing 2-30 parts of a chiral compound, 5-15 parts of a UV-polymerizable monomer II, 0.5-2 parts of a photoinitiator, and 70-95 parts of a nematic liquid crystal according to parts by weight to obtain a matrix liquid crystal mixture; dropwise adding the matrix liquid crystal mixture to a side of a package box not filled with liquid crystal, absorbing the matrix liquid crystal mixture into the package box and filling the entire package box, diffusing for 1-30 minutes to reach diffusion equilibrium, and then irradiating with UV light for 1-30 minutes; Step 6: Apply black ink or a black adhesive film or a black film on the side of the lower substrate without TFT electrodes to form a light absorbing layer, and finally obtain a single-layer liquid crystal reflective liquid crystal color display module.

[0013] The chiral compound is 、 、 、 、 、 、 、 、 、 、 、 、 Any one or more of the following: The organic solvent is one or more of N,N-dimethylformamide, N,N-dimethylacetamide, dimethyl sulfoxide, methanol, ethanol, isopropanol, dichloromethane, chloroform, tetrachloromethane, acetone, ether, petroleum ether, n-hexane, benzene, tetrahydrofuran, ethyl acetate, acetonitrile, toluene, phenol, and anisole; The photoinitiator is one or more of (2,4,6-trimethylbenzoyl)diphenylphosphine oxide, bis(1-(2,4-difluorophenyl)-3-pyrrolyl)titanocene, 2-isopropylthioxanthone, methyl o-benzoylbenzoate, and ethyl 2,4,6-trimethylbenzoylphenylphosphonate; The high molecular polymer is one or more of polyvinyl pyrrolidone, polyvinyl alcohol, ribopolysaccharide, polylactic acid, polycaprolactone, polymethyl methacrylate, and dipentaerythritol hexaacrylate; The ultraviolet polymerizable monomer I is one or more of JT-1000, RFJ-220-60, dipentaerythritol hexaacrylate, ethyl 2-(4-benzoylphenoxy) 2-methylprop-2-enoate, methyl isocyanate, phenyl isocyanate, diisocyanate, polytetrahydrofuran alcohol, polyethylene glycol (100-1000), triethylene glycol dimethacrylate, tetraethylene glycol dimethacrylate, neopentyl glycol dimethacrylate, ethylene glycol acetoacetate methacrylate, ethoxylated bisphenol A methacrylate diester, 2-phenoxyethyl acrylate, trimethylolpropane trimethacrylate, octadecyl methacrylate, tetraethylene glycol diacrylate, 1,4-bis-[4-(6-acryloyloxyhexyloxy)benzoyloxy]-2-methylbenzene, and 2-methyl-1,4-phenylenebis(4-(((4-(acryloyloxy)butoxy)carbonyl)oxy)benzoic acid; The ultraviolet polymerizable monomer II is one or more of isobornyl methacrylate, butyl acrylate, 1,6-hexanediol acrylate diester, 1,4-butanediol acrylate diester, phenyl acrylate, pentaerythritol tetrakis(3-mercaptopropionate), cyclohexyl acrylate, and hydroxypropyl methacrylate; The polyimide photosensitive adhesive is one or more of FRJ-220-60, JZ-2005, AZ4330, SU-8 2025, AZ4620, AZ9260, AZ1500, and AZ5214; The light absorbing layer has a light transmittance of less than 0.1% in the 380-780 nm wavelength range, a mirror reflectivity of less than 1.5%, and a light absorption efficiency of more than 99.9%.

[0014] The photoresist in step 2 has a flash point of 10-40° C., a boiling point of 110-160° C., a density of 0.38-1.3 g / cm 3 , and a polymerization temperature of -25-45° C.

[0015] The beneficial effects of the present invention are: 1. Through formula improvements and process upgrades, the reflectivity of single-layer encapsulated full-color reflective cholesteric liquid crystal color display materials has been significantly enhanced, and the half-peak width has been moderately widened. This not only makes the color reflection more vivid and bright, but also improves the viewing angle characteristics of the display device, reduces sensitivity to viewing angle, increases display brightness and light utilization, and achieves systematic optimization of reflection efficiency. The good planar texture lays the foundation for high reflectivity, reduces light scattering loss, and efficiently concentrates photon energy in the reflection band; 2. Display materials can save energy and reduce power consumption during operation, which has obvious advantages in application scenarios with strict requirements on energy consumption; 3. The transmittance ratio of the reflective spectrum in the planar state and the isotropic state increases, and combined with the continuously improving reflectivity, the display colors are more vivid and the visual effects are more outstanding, which can bring users a better display experience; 4. Inkjet printing, photolithography and other production processes complement each other, providing flexible options for different production conditions and needs, broadening the application scope of the technology, and also proving the diversity and universality of the method of the present invention in preparing single-layer encapsulated full-color reflective cholesteric liquid crystal color display materials, thereby enhancing the market competitiveness and adaptability of the technology. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] Figure 1 It is a structural schematic diagram of a single-layer liquid crystal reflective liquid crystal color display module of the present invention; Figure 2 This is a flow chart for preparing a single-layer liquid crystal reflective liquid crystal color display module of the present invention; Figure 3 This is a polarizing microscope image of a single-layer encapsulated full-color reflective cholesteric liquid crystal color display module prepared in Examples 1-7 of the present invention; Figure 4 Graphs showing the transmittance of red, green, and blue pixels of the single-layer encapsulated full-color reflective cholesteric liquid crystal color display module prepared in Examples 1-7 of the present invention; Figure 5 Graphs showing the reflection spectra of red, green, and blue pixels of the single-layer encapsulated full-color reflective cholesteric liquid crystal color display module prepared in Examples 1-7 of the present invention; Figure 6 Is a driving voltage diagram of a single-layer packaged full-color reflective cholesteric liquid crystal color display module prepared in Example 1-7 of the present invention; Figure 7 This is a contrast diagram of the single-layer encapsulated full-color reflective cholesteric liquid crystal color display module prepared in Examples 1-7 of the present invention. DETAILED DESCRIPTION

[0017] The technical solutions of the present invention are described clearly and completely below with reference to the accompanying drawings. It should be understood that the embodiments described herein are only a portion of the embodiments of the present invention, not all of them. All other embodiments derived by persons of ordinary skill in the art based on the embodiments of the present invention without inventive effort are intended to fall within the scope of protection of the present invention.

[0018] Example 1 At -25-45°C, use a pipette to pipette 4 mL of JF-2005 photoresist onto the TFT glass substrate, onto the side with the TFT electrodes. The TFT substrate is then placed on a constant-temperature hot plate and dried at 65°C for 1 minute, then raised to 95°C and baked for another 1 minute. Mask I is placed on the TFT glass containing the photoresist layer and polymerized under UV light at an intensity of 200 mW / cm² for 30 seconds. The UV-polymerized TFT glass is then placed in a developer (JFX-PMA) for 5 minutes, then removed and rinsed in the JF-2005 rinse solution (isopropyl alcohol) to remove excess developer and unpolymerized photoresist. After development, rinsing, and post-baking, the TFT glass is then baked at 120°C for 5 minutes to obtain a TFT substrate with polyimide isolation walls approximately 5.5 μm high.

[0019] At -25-45°C, 1 part of chiral compound 9-(4-propylcyclohexyl)-9,10-dihydro-8H-naphthyl[2,1-F:1',2'-H][1,5]dioxetane (loaded with chiral compound (9)), 18 parts of polyRFJ-220-60 glue, and 81 parts of dimethyl sulfoxide were prepared into a uniformly mixed solution 1, and 2 parts of chiral compound 9-(4-propylcyclohexyl)-9,10-dihydro-8H-naphthyl[2,1-F:1',2'-H][1,5]dioxetane, 31 parts of RFJ-220-60 glue, and 78 parts of dimethyl sulfoxide were prepared into a uniformly mixed solution 2. Then, solution 1 is printed in a micron-sized thin-walled container for containing green-reflecting cholesteric liquid crystal, and solution 2 is printed in a micron-sized thin-walled container for containing blue-reflecting cholesteric liquid crystal. The DMSO solvent is evaporated at 45° C. to obtain a TFT thin film substrate containing RFJ-220-60 and a chiral compound 9-(4-propylcyclohexyl)-9,10-dihydro-8H-naphtho[2,1-F:1',2'-H][1,5]dioxetane in the micron-sized thin-walled container for containing green-reflecting cholesteric liquid crystal and the micron-sized thin-walled container for containing blue-reflecting cholesteric liquid crystal, respectively. The content of the chiral compound (chiral compound) in the micron-sized thin-walled container for containing green-reflecting cholesteric liquid crystal is less than the content of the chiral compound (chiral compound) in the micron-sized thin-walled container for containing blue-reflecting cholesteric liquid crystal.

[0020] At -25-45°C, 18 parts of photopolymerizable JT-1000, 80 parts of dichloromethane, and 2 parts of initiator (2,4,6-trimethylbenzoyl)diphenylphosphine oxide were mixed uniformly by weight to obtain a mixture solution. The mixture containing the photopolymerizable monomers was then coated onto a PET film containing an ITO layer. The PET film containing JT-1000 and a TFT film substrate containing RFJ-220-60 loaded with the chiral compound 9-(4-propylcyclohexyl)-9,10-dihydro-8H-naphtho[2,1-F:1',2'-H][1,5]dioxetane were roll-pressed to prepare an encapsulated liquid crystal cell. The solution was then dried at 60°C to remove the solvent. After drying, the solution was polymerized for 600 seconds at a light intensity of 0.3-200 mW / cm2 to obtain an encapsulated cell.

[0021] At -25-45°C, 2.3 parts by weight of the chiral compound 9-(4-propylcyclohexyl)-9,10-dihydro-8H-naphtho[2,1-F:1',2'-H][1,5]dioxetane, 2 parts of the UV-polymerizable monomer ethyl 2-(4-benzoylphenoxy)-2-methylprop-2-enoate, 2 parts of 2-phenoxyethyl acrylate, 2 parts of 1,4-bis-[4-(6-acryloyloxyhexyloxy)benzoyloxy]-2-methylbenzene, 2 parts of isobornyl methacrylate, 0.5 parts of the photoinitiator (2,4,6-trimethylbenzoyl)diphenylphosphine oxide, and 91.2 parts of nematic liquid crystal SLC-1717 were uniformly mixed to obtain a red reflective matrix liquid crystal mixture. The vacuum pump was turned on and the matrix liquid crystal mixture was dripped onto one side of the encapsulated packaging box. Under the vacuum pump, the matrix liquid crystal mixture was drawn into the packaging box due to atmospheric pressure. The matrix liquid crystal mixture then fills the entire package, diffuses at 35°C for 10 minutes, and then irradiates with UV light for 5-30 minutes. A black film made of polyimide or polyester is applied to the side of the lower substrate that does not have the conductive indium tin oxide layer, forming a light-absorbing layer. This results in a single-layer liquid crystal reflective color display module.

[0022] Example 2 Step 1: At -25-45°C, use a pipette to transfer 3.5 mL of photoresist RFJ-220-60 onto a TFT glass substrate. This coating creates a TFT substrate containing a photoresist film. The TFT substrate is then transferred to a 165°C hotplate and baked for 2 minutes. A mask with a 10 μm pixel pitch is then placed on the TFT glass containing the photoresist layer and polymerized under UV light at an intensity of 400 mW / cm² for 4 seconds. The mask is then removed, and the TFT glass is developed in a developer solution (RFX-2272, a negative photoresist developer) using RFJ-220-60. The developer solution and unpolymerized photoresist (RFJ-220-60) are then rinsed in a rinse solution (RFP-2202) for 5 minutes to remove excess developer (RFX-2272) and unpolymerized photoresist (RFJ-220-60). After development, rinsing and post-baking, the TFT glass was baked at 120 °C for 5 min to obtain a TFT glass with a photolithographic wall height of about 3 μm (e.g. Figure 1 shown).

[0023] Step 2: At -25-45°C, 1 part of the chiral compound 9-(4-propylcyclohexyl)-9,10-dihydro-8H-naphthyl[2,1-F:1',2'-H][1,5]dioxetane, 2 parts of polymethacrylate, and 97 parts of methanol / dichloromethane (1 / 1) are mixed to form a uniform solution 1, and 2 parts of the chiral compound (9), 4 parts of polymethacrylate, and 94 parts of methanol / dichloromethane (1 / 1) are mixed to form a uniform solution 2. Then, solution 1 is printed in the green pixel and solution 2 is printed in the blue pixel, and the solvent is evaporated and removed at 45°C to obtain a TFT thin film substrate containing polymethacrylate-loaded chiral compound 9-(4-propylcyclohexyl)-9,10-dihydro-8H-naphthyl[2,1-F:1',2'-H][1,5]dioxetane in the green pixel and the blue pixel.

[0024] Step 3: At -25-45°C, 30 parts by weight of dipentaerythritol hexaacrylate (DPHA), 68 parts of a 1 / 1 methanol / dichloromethane mixed organic solvent, and 2 parts of an initiator are mixed and stirred to obtain a mixture solution. The mixture containing the photopolymerizable monomer DPHA is coated on a PET film containing an ITO layer. The PET film containing dipentaerythritol hexaacrylate and a TFT film substrate containing a polymethacrylate-loaded chiral compound 9-(4-propylcyclohexyl)-9,10-dihydro-8H-naphtho[2,1-F:1',2'-H][1,5]dioxetane are roll-pressed to prepare a package box. The solution is then dried at 60°C to remove the solvent. After drying, the solution is polymerized for 480 seconds under a light intensity of 0.3-600 mw / cm2 to obtain a package box.

[0025] Step 4: At -25-45°C, 2.3 parts of a chiral compound, 9-(4-propylcyclohexyl)-9,10-dihydro-8H-naphtho[2,1-F:1',2'-H][1,5]dioxetane, 2 parts of JT-1000, 2 parts of dipentaerythritol hexaacrylate, 2 parts of phenyl isocyanate, 2 parts of neopentyl glycol dimethacrylate, 0.5 parts of a photoinitiator, (2,4,6-trimethylbenzoyl)diphenylphosphine oxide, and 91.2 parts of a nematic liquid crystal are uniformly mixed according to weight to obtain a parent liquid crystal mixture reflecting red. A vacuum pump is turned on, and the parent liquid crystal mixture is dripped onto one side of the encapsulation box. Under the presence of the vacuum pump, the parent liquid crystal mixture is sucked into the encapsulation box due to atmospheric pressure. Then, the matrix liquid crystal mixture filled the entire packaging box, diffused at a temperature of 35°C for 10 minutes, and then irradiated with ultraviolet light for 10 minutes to obtain a single-layer liquid crystal reflective color display module.

[0026] Example 3 Step 1: At -25-45°C, use a pipette to transfer 5.5 mL of photoresist JZ-305 onto TFT glass, coating the substrate with a photoresist film. The TFT substrate is then placed on a constant-temperature hot plate and baked at 100°C for 2.5 minutes. A mask with a 12 μm pixel pitch is then placed on the TFT glass containing the photoresist layer and polymerized under UV light at an intensity of 450 mW / cm² for 1.5 minutes. The masked TFT glass is then developed in dichloromethane for 3.5 minutes, removed from the glass, and rinsed in an ethanol solution of JZ-305 rinse solution to remove excess developer and impurities. The developed, rinsed, and post-baked TFT glass is then baked at 120°C for 5 minutes to achieve a TFT with a photoresist wall height of approximately 2.8 μm.

[0027] Step 2. At -25-45 ° C, 1 part of a chiral compound 9-(4-propylcyclohexyl)-9,10-dihydro-8H-naphthyl[2,1-F:1',2'-H][1,5]dioxetane, 2 parts of a mixed glue of polyvinyl pyrrolidone / dipentaerythritol hexaacrylate, and 60 parts of tetrahydrofuran / DMSO=1 / 4 are configured to form a uniformly mixed solution 1. 1 part of a chiral compound 9-(4-propylcyclohexyl)-9,10-dihydro-8H-naphthyl[2,1-F:1',2'-H][1,5]dioxetane, 2 parts of a mixed glue of polyvinyl pyrrolidone / dipentaerythritol hexaacrylate, and 30 parts of tetrahydrofuran / DMSO=1 / 4 are configured to form a uniformly mixed solution 2. Then, solution 1 was printed in the green pixel and solution 2 was printed in the blue pixel, and the tetrahydrofuran / DMSO = 1 / 4 solvent was evaporated and removed at 60 °C to obtain a TFT thin film substrate containing RFJ-220-60 loaded chiral compound 9-(4-propylcyclohexyl)-9,10-dihydro-8H-naphtho[2,1-F:1',2'-H][1,5]dioxetane in the green and blue pixels.

[0028] Step 3: At -25-45°C, 25 parts by weight of photopolymerizable sealant JZ-2005, 73 parts of an organic solvent, and 2 parts of an initiator are mixed and stirred to obtain a mixture solution. The mixture containing the photopolymerizable monomer is coated on a PET film containing an ITO layer. The PET film containing JZ-2005 and a TFT film substrate containing a polyvinylpyrrolidone / dipentaerythritol hexaacrylate film loaded with the chiral compound 9-(4-propylcyclohexyl)-9,10-dihydro-8H-naphtho[2,1-F:1',2'-H][1,5]dioxetane are roll-pressed to prepare a packaging box. The solution is then dried at 60°C to remove the solvent. After drying, the solution is polymerized for 600 seconds at a light intensity of 0.3-200 mW / cm2 to obtain a sealed packaging box.

[0029] Step 4: At -25-45°C, uniformly mix 2.3 parts of the chiral compound 9-(4-propylcyclohexyl)-9,10-dihydro-8H-naphtho[2,1-F:1',2'-H][1,5]dioxetane, 6 parts of a UV-polymerizable monomer, 0.5 parts of a photoinitiator, and 94 parts of a nematic liquid crystal, by weight, to produce a red-reflecting matrix liquid crystal mixture. Turn on the vacuum pump and drop the matrix liquid crystal mixture onto one side of the encapsulated package. Under the vacuum pump, the matrix liquid crystal mixture is drawn into the package due to atmospheric pressure. The matrix liquid crystal mixture then fills the entire package. After diffusion at 35°C for 10 minutes, the mixture is irradiated with ultraviolet light at a wavelength of 254-395 nm and an intensity of 0.3-100 mW / cm² for 8.5 minutes, yielding a single-layer liquid crystal reflective color display module.

[0030] Example 4 Step 1: At -25-45°C, use a pipette to transfer 5 mL of RFJ-210 photoresist onto TFT glass. This coating creates a TFT substrate containing a photoresist film. The TFT substrate is then placed on a constant-temperature hot plate and baked at 105°C for 2 minutes. A mask with a 10 μm pixel pitch is then placed on the TFT glass containing the photoresist layer and polymerized under UV light at a wavelength of 254-395 nm and an intensity of 200 mW / cm² for 15 seconds. The masked, polymerized TFT glass is then immersed in a developer solution for 3.5 minutes. After removal, the mask is rinsed with the RFJ-210 rinse solution to remove excess developer and unpolymerized photoresist. After development, rinsing, and post-baking, the TFT glass is then baked at 135°C for 10 minutes to create the TFT glass with photoresist walls.

[0031] Step 2. At -25-45°C, prepare, by weight, 1 part of a chiral compound (S)-4-(4-octylphenoxy)-2-fluorobenzoate, 1 part of polymethacrylate, 2 parts of RFJ-220-60, and 30 parts of a 1 / 1 / 1 ratio of dichloromethane / ethanol / anisole to form a uniformly mixed solution 1. Prepare, by weight, 2 parts of a chiral compound (13BR)-5,6-dihydro-5-(trans-4-propylcyclohexyl)-4H-dinaphtho[2,1-F:1',2'-H][1,5]dioxacyclononatetraene, 4 parts of RFJ-220-60, and 94 parts of a 1 / 1 / 1 ratio of dichloromethane / ethanol / anisole to form a uniformly mixed solution 2. Then, solution 1 was printed in the green pixel and solution 2 was printed in the blue pixel, and the dichloromethane / ethanol / anisole = 1 / 1 / 1 solvent was evaporated and removed at 45°C to obtain a TFT film substrate containing RFJ-220-60 / polymethacrylate-loaded chiral compound (S)-4-(4-octylphenoxy)-2-fluorobenzoate in the green and blue pixels.

[0032] Step 3: At -25-45°C, 10 parts by weight of a photopolymerizable monomer (dipentaerythritol hexaacrylate), 10 parts of a PEGD-1000 polymerizable monomer, 20 parts of isobornyl methacrylate, 2 parts of an initiator, and 48 parts of dichloromethane were mixed and stirred uniformly to obtain a mixture solution. This mixture containing the photopolymerizable monomers was coated onto a PET film containing an ITO layer. The PET film and a TFT film substrate containing RFJ-220-60 / polymethacrylate-loaded chiral compound (S)-4-(4-octylphenoxy)-2-fluorobenzoate were roll-pressed to prepare a package box. The solution was then dried at 55°C to remove the solvent. After drying, the solution was polymerized at a light intensity of 200 mW / cm² for 600 seconds to obtain a package box.

[0033] Step 4: At -25-45°C, 2.3 parts of chiral compound (9), 1 part of 1,4-bis[4-(6-acryloyloxyhexyloxy)benzoyloxy]-2-methylbenzene, 2 parts of isobornyl methacrylate, 2 parts of 1,4-butanediol acrylate, 1 part of pentaerythritol tetrakis(3-mercaptopropionate), 0.5 parts of (2,4,6-trimethylbenzoyl)diphenylphosphine oxide, and 88 parts of nematic liquid crystal are uniformly mixed according to weight to obtain a matrix liquid crystal mixture reflecting red color. The vacuum pump is turned on, and the matrix liquid crystal mixture is dripped onto one side of the encapsulation box. Under the presence of the vacuum pump, the matrix liquid crystal mixture is sucked into the encapsulation box due to atmospheric pressure. Then, the matrix liquid crystal mixture fills the entire encapsulation box, is fully diffused at a temperature of 25-40°C for 10 minutes, and then irradiated with ultraviolet light for 5-30 minutes to obtain a single-layer liquid crystal reflective color display module.

[0034] Example 5 Step 1. At -25-45 °C, use a rubber-tipped dropper to transfer 5 mL of photosensitive adhesive AZ4620 onto the TFT glass. After coating, a TFT substrate containing a photoresist film is obtained. The TFT substrate is then placed on a constant temperature hot plate and baked at 120 °C for 1.5 minutes. Then, a mask with a pixel pitch of 20 μm is placed on the TFT glass containing the photoresist layer and polymerized for 120 s under ultraviolet light with a wavelength of 254-395 nm and a light intensity of 200 mW / cm2. The TFT glass after mask polymerization is then placed in the matching developer for development. After soaking in the developer CD-26 for 4.5 minutes, it is taken out and placed in the rinsing solution NMP4L matching AZ4620 to wash away excess developer and unpolymerized photosensitive adhesive. The TFT glass that has undergone development, rinsing and post-baking operations is then baked at 110 °C for 10 minutes to obtain a TFT glass with a photoresist wall (such as Figure 1 shown).

[0035] Step 2. At -25-45°C, 2 parts of a chiral compound (S)-2-(4-octylphenyl)-4-(4-hydroxyphenyl)-2-fluoro-1,3-dioxetane, 4 parts of polymethacrylate, 2 parts of polyvinyl pyrrolidone, and 92 parts of toluene / anisole / dimethyl sulfoxide (DMSO) in a mass ratio of 1 / 1 / 1 are mixed to form a uniformly mixed solution 1. 4 parts of a chiral compound (S)-2-(4-octylphenyl)-4-(4-hydroxyphenyl)-2-fluoro-1,3-dioxetane, 8 parts of polymethacrylate, 3.5 parts of polyvinyl pyrrolidone, 40 parts of a uniformly mixed solution 2 with a mass ratio of toluene / anisole / dimethyl sulfoxide = 1 / 1 / 1 were prepared. Then, solution 1 was printed in the green pixel and solution 2 was printed in the blue pixel. The toluene / anisole / dimethyl sulfoxide = 1 / 1 / 1 solvent was evaporated and removed at 45°C to obtain a TFT film substrate (such as TFT film substrate) containing RFJ-220-60 / polymethacrylate loaded chiral compound (S)-2-(4-octylphenyl)-4-(4-hydroxyphenyl)-2-fluoro-1,3-dioxetane in the green pixel and the blue pixel. Figure 1 shown).

[0036] Step 3: At -25-45°C, 10 parts by weight of a photopolymerizable monomer (dipentaerythritol hexaacrylate), 10 parts of a 2-phenoxyethyl acrylate polymerizable monomer, 20 parts of octadecyl methacrylate, 2 parts of an initiator (2,4,6-trimethylbenzoyl)diphenylphosphine oxide, and 48 parts of dichloromethane were mixed and stirred uniformly to obtain a mixture solution. The mixture containing the photopolymerizable monomers was coated onto a PET film containing an ITO layer. The PET film and a TFT film substrate containing RFJ-220-60 / polymethacrylate-loaded chiral compound (S)-2-(4-octylphenyl)-4-(4-hydroxyphenyl)-2-fluoro-1,3-dioxane were roll-laminated to prepare a package box. The solution was then dried at 40°C to remove the solvent. After drying, the solution was polymerized at a light intensity of 0.3-200 mW / cm² for 600 s to obtain a package box.

[0037] Step 4: At -25-45°C, 2.3 parts of chiral compound (10), 2 parts of 1,4-bis[4-(6-acryloyloxyhexyloxy)benzoyloxy]-2-methylbenzene, 1 part of phenyl acrylate, 2 parts of 1,6-hexanediol acrylate, 1 part of pentaerythritol tetrakis(3-mercaptopropionic acid), 0.5 parts of (2,4,6-trimethylbenzoyl)diphenylphosphine oxide, and 90 parts of nematic liquid crystal SLC-1717 are uniformly mixed according to weight to obtain a matrix liquid crystal mixture reflecting red color. The vacuum pump is turned on, and the matrix liquid crystal mixture is dripped onto one side of the encapsulation box. Under the presence of the vacuum pump, the matrix liquid crystal mixture is sucked into the encapsulation box due to atmospheric pressure. Then, the matrix liquid crystal mixture fills the entire encapsulation box, is fully diffused at a temperature of 25-40°C for 10 minutes, and then irradiated with ultraviolet light for 5-30 minutes to obtain a single-layer liquid crystal reflective color display module.

[0038] Example 6 Step 1: At -25-45°C, use a pipette to transfer 3 mL of AZ9260 photoresist onto TFT glass. This coating creates a TFT substrate containing a photoresist film. The TFT substrate is then placed on a constant-temperature hot plate and baked at 135°C for 2.5 minutes. A mask with an 18 μm pixel pitch is then placed on the TFT glass containing the photoresist layer and polymerized under UV light at a wavelength of 254-395 nm and an intensity of 200 mW / cm² for 15 seconds. The masked TFT glass is then placed in the accompanying developer solution for development. After soaking in the developer solution for 5 minutes, the glass is removed and rinsed in the AZ9260 rinse solution to remove excess developer and unpolymerized photoresist. After development, rinsing, and post-baking, the TFT glass is then baked at 150°C for 6.5 minutes to create the TFT glass with photoresist walls.

[0039] Step 2. At -25-45°C, 15 parts of a chiral compound (S)-2-(4-octylphenoxy)-4-(4-hydroxyphenyl)-1,3-dioxetane-2-ester, 30 parts of polymethacrylate, and 100 parts of dichloromethane / ethanol in a mass ratio of 1 / 1 are prepared, by weight, to form a uniformly mixed solution 1. 30 parts of a chiral compound (S)-2-(4-octylphenoxy)-4-(4-hydroxyphenyl)-1,3-dioxetane-2-ester, 60 parts of polymethacrylate, and 100 parts of dichloromethane / ethanol in a mass ratio of 1 / 1 are prepared, by weight, to form a uniformly mixed solution 2. Then, solution 1 was printed in the green pixel and solution 2 was printed in the blue pixel, and the methane / ethanol = 1 / 1 solvent was evaporated at 65 ° C to obtain a TFT film substrate containing polymethacrylate-loaded chiral compound (S)-2-(4-octylphenoxy)-4-(4-hydroxyphenyl)-1,3-dioxacyclohexane-2-ester in the green pixel and the blue pixel (such as Figure 1 shown).

[0040] Step 3: At -25-45°C, 30 parts by weight of a photopolymerizable monomer of ethylene glycol acetoacetate or ethoxylated bisphenol A methacrylate, 10 parts by weight of 1,4-bis-[4-(6-acryloyloxyhexyloxy)benzoyloxy]-2-methylbenzene, 20 parts by weight of pentaerythritol tetrakis(3-mercaptopropionate), 2 parts by weight of an initiator (2,4,6-trimethylbenzoyl)diphenylphosphine oxide, and 30 parts by weight of dichloromethane are mixed and stirred to obtain a mixture solution. The mixture containing the photopolymerizable monomer is coated on a PET film containing an ITO layer. A PET film and a TFT film substrate containing a loaded chiral compound (S)-2-(4-octylphenoxy)-4-(4-hydroxyphenyl)-1,3-dioxacyclohexane-2-ester were roll-pressed to prepare a packaging box. Then, the packaging box was dried at 40°C to remove the solvent. After drying, the packaging box was polymerized for 600 s under a light intensity of 0.3-200 mW / cm2 to obtain a packaged packaging box.

[0041] Step 4: At -25-45°C, 2.3 parts of chiral compound (9), 1 part of 1,4-bis[4-(6-acryloyloxyhexyloxy)benzoyloxy]-2-methylbenzene, 2 parts of isobornyl methacrylate, 2 parts of 1,4-butanediol acrylate, 1 part of pentaerythritol tetrakis(3-mercaptopropionate), 0.5 parts of (2,4,6-trimethylbenzoyl)diphenylphosphine oxide, and 90 parts of nematic liquid crystal are uniformly mixed according to weight to obtain a matrix liquid crystal mixture reflecting red color. The vacuum pump is turned on, and the matrix liquid crystal mixture is dripped onto one side of the encapsulation box. Under the presence of the vacuum pump, the matrix liquid crystal mixture is sucked into the encapsulation box due to atmospheric pressure. Then, the matrix liquid crystal mixture fills the entire encapsulation box, is fully diffused at a temperature of 25-40°C for 10 minutes, and then irradiated with ultraviolet light for 5-30 minutes to obtain a single-layer liquid crystal reflective color display module.

[0042] Example 7 Step 1. At -25-45 °C, use a rubber-tipped dropper to transfer 5 mL of photosensitive adhesive AZ5214 onto the TFT glass, and after coating, a TFT substrate containing a photoresist film is obtained. The TFT substrate is then placed on a constant temperature hot stage and maintained at a temperature of 120 °C for 2 minutes. Then, a mask with a pixel size of 10 μm and a pixel pitch of 10 μm is placed on the TFT glass containing the photolithography layer, and polymerized under ultraviolet light with a light intensity of 300 mW / cm2 for 2 minutes. The TFT glass after the mask polymerization is then placed in the matching developer for development, soaked in the developer for 3.5 minutes, taken out, and placed in the rinsing solution matching AZ5214 to wash away excess developer and unpolymerized photosensitive adhesive. The TFT glass that has undergone development, rinsing and post-baking operations is then baked at 115 °C for 3 minutes to obtain a TFT glass substrate with a photolithography wall (such as Figure 1 shown).

[0043] Step 2: At -25-45°C, 3 parts of chiral compound (S)-2-(4-propoxyphenyl)-4-(4-hydroxyphenyl)-1,3-dioxocyclohexane-2-ester, 1 part of 1,6-hexanediol diacrylate, 0.5 parts of dipentaerythritol hexaacrylate, 0.5 parts of ethylene glycol acetoacetate and 80 parts of a solvent of N,N-dimethylformamide / dimethyl sulfoxide / dichloromethane = 1 / 1 / 1 are prepared into a uniformly mixed solution 1; 2 parts of chiral compound ( A uniformly mixed solution 1 was prepared by preparing 6 parts of 1,6-hexanediol diacrylate, 0.5 parts of dipentaerythritol hexaacrylate, 0.5 parts of ethylene glycol acetoacetate and 80 parts of a solvent of N,N-dimethylformamide / dimethyl sulfoxide / dichloromethane = 1 / 1 / 1. Solution 1 was then printed in a green pixel and solution 2 in a blue pixel. The solvent of N,N-dimethylformamide / dimethyl sulfoxide / dichloromethane = 1 / 1 / 1 was evaporated and removed at 45°C to obtain a TFT film substrate containing a polymer film loaded with the chiral compound (S)-2-(4-propoxyphenyl)-4-(4-hydroxyphenyl)-1,3-dioxane-2-ester in the green and blue pixels.

[0044] Step 3: At -25-45°C, 10 parts of 1,6-hexanediol diacrylate, 15 parts of dipentaerythritol hexaacrylate, 10 parts of ethylene glycol acetoacetate methacrylate, 50 parts of dichloromethane, and 2 parts of the initiator (2,4,6-trimethylbenzoyl)diphenylphosphine oxide were mixed and stirred to obtain a mixture solution. The mixture containing the photopolymerizable monomers was coated on a PET film containing an ITO layer. The PET film containing JT-1000 and a TFT film substrate containing a polymer film-loaded chiral compound (S)-2-(4-propoxyphenyl)-4-(4-hydroxyphenyl)-1,3-dioxacyclohexane-2-ester were roll-pressed to prepare a package box. The solution was then dried at 60°C to remove the solvent. After drying, the solution was polymerized at a light intensity of 0.3-300 mW / cm² for 120 seconds to obtain a package box.

[0045] Step 4: At -25-45°C, uniformly mix, by weight, 6 parts of the chiral compound (S)-2-(4-propoxyphenyl)-4-(4-hydroxyphenyl)-1,3-dioxocyclohexane-2-ester, 1 part of 1,4-bis[4-(6-acryloyloxyhexyloxy)benzoyloxy]-2-methylbenzene, 2 parts of 1,6-hexanediol diacrylate, 2 parts of 1,4-butanediol acrylate, 1 part of pentaerythritol tetrakis(3-mercaptopropionic acid), 0.5 parts of (2,4,6-trimethylbenzoyl)diphenylphosphine oxide, and 85 parts of nematic liquid crystal to obtain a red-reflecting matrix liquid crystal mixture. Turn on the vacuum pump and drop the matrix liquid crystal mixture onto one side of the package box. Under the vacuum pump, the matrix liquid crystal mixture is drawn into the package box due to atmospheric pressure. Then, the matrix liquid crystal mixture fills the entire packaging box, is fully diffused at a temperature of 25-40°C for 10 minutes, and then irradiated with ultraviolet light for 5-30 minutes to obtain a single-layer liquid crystal reflective color display module.

[0046] Example 8 Step 1: At -25-45°C, use a pipette to pipette 5 mL of photoresist FRJ-220-60 onto TFT glass. This coating produces a TFT substrate containing a photoresist film. The TFT substrate is then placed on a constant-temperature hot plate at 115°C and dried for 3 minutes. A mask with a 15-micron pixel size and a 2-μm pixel pitch is then placed on the TFT glass containing the photoresist layer and polymerized under UV light at an intensity of 200 mW / cm² for 10 seconds. The masked, polymerized TFT glass is then placed in the accompanying developer solution for development. After soaking in the developer solution for 5 minutes, it is removed and placed in the rinse solution provided with FRJ-220-60 to remove excess developer and unpolymerized photoresist. After development, rinsing, and post-baking, the TFT glass is then baked at 115°C for 5 minutes to produce a TFT glass substrate with photoresist walls.

[0047] Step 2: At -25-45°C, a uniform mixed solution of 4 parts of chiral molecule 9-(4-propylcyclohexyl)-9,10-dihydro-8H-naphtho[2,1-F:1',2'-H][1,5]dioxetane, 8 parts of polyvinylpyrrolidone, and 110 parts of dichloromethane is added dropwise on the TFT glass containing the photolithography wall at a temperature of -25-45°C. A layer of the mixed solution with a thickness of 4 microns is applied using a coater, and then dried at 60°C for 10 min to obtain a TFT glass containing a polymer-loaded chiral molecule film and a photolithography wall.

[0048] Step 3: Place the TFT glass containing the polymer-loaded chiral molecule film and the photolithography wall in the etching area of ​​the etching machine at -25-45°C, and etch away the polyvinyl pyrrolidone-loaded R5011 film in the red and green pixel areas at an etching energy of 50% and a frequency of 300 Hz.

[0049] Step 4: Add a mixed solution of polyvinyl pyrrolidone (PVP) in a volume ratio of ethanol to dichloromethane (1:6) and a mass ratio of PVP to R5011 (100:3:1) to the TFT glass produced in Step 3 at 20-35°C. Then, apply a 4-micron-thick layer of the mixed solution on a coater to produce TFT glass containing PVP-loaded R5011 in the red and green pixels. The blue pixel film has the highest content of the chiral molecule 9-(4-propylcyclohexyl)-9,10-dihydro-8H-naphtho[2,1-F:1',2'-H][1,5]dioxetane.

[0050] Step 5: Place the TFT glass prepared in step 4 in the etching zone of an etching machine at 20-35°C. Etch away the polyvinyl pyrrolidone-loaded chiral molecule film in the red pixel area at an etching energy of 50% and a frequency of 300 Hz to obtain the TFT glass used to diffuse red, green, and blue pixels.

[0051] Step 6. At 20-35° C., 90.3 parts of liquid crystal SLC1717, 2.2 parts of chiral molecule S5011, 2 parts of acryloyloxypropionic acid, 2 parts of isobornyl methacrylate, 2.2 parts of 1,4-bis[4-(6-acryloyloxyhexyloxy)benzoyloxy]-2-methylbenzene, 0.9 parts of phenyl acrylate, and 0.4 parts of benzil bismethyl ether were ultrasonicated in an ultrasonic bath for 4 hours, and then stirred under a magnetic stirrer for 6 hours to obtain a uniformly mixed red matrix liquid crystal.

[0052] Step 7: At -25-45°C, 10 parts of 1,6-hexanediol diacrylate, 15 parts of dipentaerythritol hexaacrylate, 10 parts of ethylene glycol acetoacetate methacrylate, 50 parts of dichloromethane solvent, and 2 parts of initiator are mixed and stirred evenly to obtain a mixture solution. The mixture containing the photopolymerizable monomer is coated on a PET film containing an ITO layer. The PET film containing JT-1000 and the TFT film substrate containing the polymer film loaded chiral compound (3) are rolled to prepare an encapsulated liquid crystal box. Then, the solvent is removed by drying at a temperature of 60°C. After drying, the solution is polymerized for 120 seconds under a light intensity of 0.3-300 mW / cm2 to obtain an encapsulated encapsulation box.

[0053] Step 8: At -25-45°C, 2.0 parts of a chiral compound, 9-(4-propylcyclohexyl)-9,10-dihydro-8H-naphtho[2,1-F:1',2'-H][1,5]dioxetane, 1 part of 1,4-bis[4-(6-acryloyloxyhexyloxy)benzoyloxy]-2-methylbenzene, 2 parts of 1,6-hexanediol diacrylate, 1 part of 1,4-butanediol acrylate, 2 parts of pentaerythritol tetrakis(3-mercaptopropionate), 2 parts of (2,4,6-trimethylbenzoyl)diphenylphosphine oxide, and 83 parts of nematic liquid crystal are uniformly mixed according to weight to obtain a mother liquid crystal mixture reflecting red. A vacuum pump is turned on, and the mother liquid crystal mixture is dripped onto one side of the package box. Under the presence of the vacuum pump, the mother liquid crystal mixture is sucked into the package box due to atmospheric pressure. Then, the matrix liquid crystal mixture fills the entire packaging box, is fully diffused at a temperature of 25-40°C for 10 minutes, and then irradiated with ultraviolet light for 5-30 minutes to obtain a single-layer liquid crystal reflective color display module.

[0054] Example 9 Step 1: At -25-45°C, use a pipette to transfer 3 mL of polyimide photoresist AZ9260 onto TFT glass. This coating creates a TFT substrate containing a photoresist film. The TFT substrate is then placed on a constant-temperature hot plate and baked at 135°C for 2.5 minutes. A mask with a 2μm pixel pitch and 18μm pixel width is then placed on the TFT glass containing the photoresist layer. The mask is then polymerized for 15 seconds under UV light with a wavelength of 254-395 nm and an intensity of 200 mW / cm². The masked TFT glass is then placed in the accompanying developer solution for development. After soaking in the developer solution for 5 minutes, it is removed and placed in the rinse solution provided with the polyimide photoresist AZ9260 to remove excess developer and unpolymerized photoresist. After development, rinsing, and post-baking, the TFT glass is then baked at 150°C for 6.5 minutes to create the TFT glass with polyimide isolation walls.

[0055] Step 2. At -25-45°C, 4 parts of a chiral compound 9-(4-propylcyclohexyl)-9,10-dihydro-8H-naphthyl[2,1-F:1',2'-H][1,5]dioxetane, 8 parts of polyurethane acrylate, and 92 parts of toluene / anisole / dimethyl sulfoxide (DMSO) in a mass ratio of 1 / 1 / 1 are mixed to form a uniform solution 1. Then, a TFT thin film substrate containing red, green, and blue pixels containing a polyurethane acrylate-loaded chiral compound 9-(4-propylcyclohexyl)-9,10-dihydro-8H-naphthyl[2,1-F:1',2'-H][1,5]dioxetane is obtained by uniformly coating the solution 1 with a thickness of 6 μm on a TFT glass containing an isolation wall, and volatilizing the toluene / anisole / dimethyl sulfoxide (DMSO) in a 1 / 1 / 1 ratio to remove the solvent at 45°C. A mask with a pixel pitch of 2 microns and a pixel width of 18 microns is placed on a solvent-coated and dried TFT film substrate. The mask features three adjacent, 2-micron-spaced light-shielding regions, designated Z, X, and V. The Z region is completely opaque, blocking UV light and preventing polymerization of the polymerizable monomers there. The X region is uniformly distributed with black holes, allowing UV light to pass through 50% of the area. The V region is completely transparent, allowing most UV light to pass. The red, green, and blue pixel strips on the TFT glass are then aligned with the Z, X, and V regions and polymerized under UV light at a wavelength of 254-395 nm and an intensity of 20 mW / cm² for 120 seconds. The polymerized TFT glass is then immersed in ethanol for 3 minutes at -25-60°C to remove the polymerized polyurethane acrylate monomers. Then, the ethanol was removed by drying at 25-200°C, resulting in a film with the least amount of polyurethane acrylate-loaded chiral compound 9-(4-propylcyclohexyl)-9,10-dihydro-8H-naphtho[2,1-F:1',2'-H][1,5]dioxetane in the red pixel strip, a film with more polyurethane acrylate-loaded chiral compound 9-(4-propylcyclohexyl)-9,10-dihydro-8H-naphtho[2,1-F:1',2'-H][1,5]dioxetane in the green pixel strip than in the red pixel strip, and a film with the most amount of polyurethane acrylate-loaded chiral compound 9-(4-propylcyclohexyl)-9,10-dihydro-8H-naphtho[2,1-F:1',2'-H][1,5]dioxetane in the blue pixel strip. Finally, a TFT substrate with pixel strip isolation walls of uniform and highly regular morphology and polymer-loaded chiral compound films A1, B1 and C1 is obtained.

[0056] Step 3: At -25-45°C, 10 parts of 1,6-hexanediol diacrylate, 15 parts of dipentaerythritol hexaacrylate, 10 parts of ethylene glycol acetoacetate methacrylate, 50 parts of dichloromethane, and 2 parts of an initiator are mixed and stirred to obtain a mixture solution. The mixture containing the photopolymerizable monomer is coated on a PET film containing an ITO layer. The PET film containing JT-1000 and a TFT film substrate containing a polymer film-loaded chiral compound 9-(4-propylcyclohexyl)-9,10-dihydro-8H-naphtho[2,1-F:1',2'-H][1,5]dioxetane are roll-pressed to prepare a package box. The solution is then dried at 60°C to remove the solvent. After drying, the solution is polymerized at a light intensity of 0.3-300 mW / cm2 for 120 seconds to obtain a package box.

[0057] Step 4: At -25-45°C, 2 parts of a chiral compound 9-(4-propylcyclohexyl)-9,10-dihydro-8H-naphtho[2,1-F:1',2'-H][1,5]dioxetane, 1 part of 1,4-bis[4-(6-acryloyloxyhexyloxy)benzoyloxy]-2-methylbenzene, 2 parts of 1,6-hexanediol diacrylate, 1 part of 1,4-butanediol acrylate, 2 parts of pentaerythritol tetrakis(3-mercaptopropionate), 2 parts of (2,4,6-trimethylbenzoyl)diphenylphosphine oxide, and 85 parts of nematic liquid crystal are uniformly mixed according to weight to obtain a mother liquid crystal mixture reflecting red. A vacuum pump is turned on, and the mother liquid crystal mixture is dripped onto one side of the package box. Under the presence of the vacuum pump, the mother liquid crystal mixture is sucked into the package box due to atmospheric pressure. Then, the mother liquid crystal mixture fills the entire packaging box, is fully diffused at a temperature of 25-40° C. for 10 minutes, and then irradiated with ultraviolet light for 5-30 minutes to obtain a single-layer liquid crystal reflective color display module.

[0058] The performance of the single-layer liquid crystal reflective color display modules prepared in Examples 1-9 was tested by measuring the transmission and reflection spectra of Examples 1-9 using a Perkin Elmer-LAMBDA Model 950 UV-VIS-IR spectrophotometer. The driving voltage was measured using a frequency-switchable oscilloscope and a polarizing microscope. The contrast ratio was calculated from the data measured using the Perkin Elmer-LAMBDA Model 950 UV-VIS-IR spectrophotometer by calculating the ratio of the planar state to the isotropic state. The texture of the red, green, and blue liquid crystals was observed using an Axio Lab. A1 Pol polarizing microscope.

[0059] The measurement process involves using a Perkin Elmer LAMBDA 950 UV-VIS-IR spectrophotometer to measure the reflectance spectrum of cholesteric liquid crystals. The instrument must first be warmed up and calibrated: after powering on, the instrument is allowed to warm up for 15 minutes to ensure stability of the deuterium / tungsten lamp light source. A baseline calibration is performed using a standard reflector over the target wavelength range (e.g., 300-800 nm) to eliminate environmental interference. The test sample thickness is controlled to the height of the photolithographic wall to maintain optical uniformity. Regarding parameter settings, reflection mode is selected, and the slit width is adjusted by 1 nm to balance signal-to-noise ratio and scanning speed (medium speed mode, approximately 240 nm / min). The Bragg reflection peak position is estimated based on the liquid crystal pitch (λ = n·P, where n is the mean refractive index and P is the pitch). During measurement, the sample is secured to the reflectance attachment, and the scan is initiated after background subtraction. Data analysis uses UV WinLab software to extract the reflection peak position, half-width (FWHM), and intensity. Temperature-controlled data is also correlated to analyze peak position shifts caused by the temperature dependence of the pitch.

[0060] When measuring the transmission spectrum of cholesteric liquid crystals, the instrument must first be preheated for 15 minutes to ensure stability of the deuterium and tungsten lamps. A background scan is then performed within the target wavelength range to eliminate substrate absorption and ambient noise. Parameter settings are selected for transmission mode. The slit width is set to 1 nm to balance resolution and signal-to-noise ratio, based on the optical properties of the liquid crystal. The scanning speed (approximately 240 nm / min in medium mode) and the data acquisition interval (1 nm) are adjusted based on the optical properties of the liquid crystal. The Bragg reflection theory formula (λ = n·P) is used to estimate the location of the characteristic transmission valley corresponding to the liquid crystal helical pitch, and a targeted scanning range (300-800 nm in the visible light range) is set. The sample orientation is fixed during measurement to maintain consistent liquid crystal molecular orientation. During data processing, UV WinLab software is used to extract the characteristic parameters of the transmittance curve, including valley wavelength, half-width (FWHM), and transmittance gradient. The instrument's wide spectral coverage (250-2500 nm) and high optical resolution (0.05 nm) accurately capture the transmission modulation characteristics and dynamic response behavior of cholesteric liquid crystals. The test results are shown in the table below: From the above test results, it can be seen that after the formula improvement of Examples 1-7 and the process upgrade, the driving voltage, contrast and reflectivity all show a trend of performance enhancement.

[0061] Figure 3 This is a polarizing microscope image of a single-layer encapsulated full-color reflective cholesteric liquid crystal color display module prepared in Examples 1-7 of the present invention. Figure 3As can be seen, the single-layer encapsulated full-color reflective cholesteric liquid crystal display modules produced in each of the above examples all exhibit good planar texture. Good planar texture is a prerequisite for high reflectivity. The single-layer encapsulated full-color reflective cholesteric liquid crystal display modules produced by this method have excellent reflective properties.

[0062] Figure 4 is the transmittance of red, green and blue pixels of the single-layer encapsulated full-color reflective cholesteric liquid crystal color display material prepared in Examples 1-7 of the invention. Figure 4 As can be seen from the graph, the transmittance of Examples 1-7 gradually decreases, while the half-peak width increases, making the reflection band wider and the color reflection more vivid and bright. In addition, the depth of the transmission valley is positively correlated with the reflection peak intensity, thereby improving the reflection efficiency. Secondly, the lower background transmission can improve the display contrast while reducing the power consumption of the backlight. Therefore, the decreasing transmittance trend essentially reflects the systematic optimization of reflective optical performance.

[0063] Figure 5 The reflection spectra of the red, green and blue pixels of the single-layer encapsulated full-color reflective cholesteric liquid crystal color display module prepared in Examples 1-7 of the invention are shown in FIG. Figure 5 As can be seen from the results, the gradual increase in reflectivity and the slightly widened half-wavewidth in Examples 1-7 reflect the directional optimization of the optical performance of the cholesteric LC RGB pixels. The direct cause of the enhanced reflectivity is the improved precision of pitch (P) control. A pitch distribution closer to the Bragg condition allows for the selective reflection of more incident light. Simultaneously, the orientational uniformity of the planar texture reduces light scattering losses, more efficiently concentrating photon energy within the reflection band. Through process upgrades and technical optimization, the reflectivity of Examples 1-7 continues to increase, while the half-wavewidth of reflection also slightly widens. This combination of "high reflectivity and moderately widened half-wavewidth" has dual benefits in practical applications: increased reflectivity directly enhances display brightness and light utilization, while the slightly wider reflection band improves the viewing angle characteristics of the display device and reduces sensitivity to viewing angle. The data from Examples 1-7 overall indicates that molecular arrangement control and structural design optimization have achieved synergistic improvements in reflection efficiency and optical performance.

[0064] Figure 6 is the driving voltage of the single-layer encapsulated full-color reflective cholesteric liquid crystal color display module prepared in Examples 1-7 of the present invention. Figure 6 As can be seen from the figure, the driving voltages of embodiments 1-7 show a downward trend, demonstrating a more energy-saving display effect.

[0065] Figure 7 The contrast ratio of the single-layer encapsulated full-color reflective cholesteric liquid crystal color display material prepared in Examples 1-7 of the present invention. Figure 7As can be seen from the figure, the contrast of Examples 1-7 gradually increases, which is caused by the increase in the transmittance ratio between the planar state and the isotropic state of the reflectance spectra of Examples 1-7. As can be seen from the reflectance spectra of Examples 1-7, the reflectivity becomes higher and higher, and the color becomes more and more vivid.

[0066] The preparation methods and processes of Examples 8 and 9 are different from those of Examples 1-7. Example 1-7 uses inkjet printing to realize the RGB pixel array. Example 8 uses the concentration difference of chiral molecules within the RGB pixels achieved by etching the base film to realize the preparation of a single-layer encapsulated full-color reflective cholesteric liquid crystal color display module. There are essential preparation process and technical differences from Examples 1-7. It is worth noting that both are for the preparation of a single-layer encapsulated full-color reflective cholesteric liquid crystal color display module, but are achieved through different methods. The methods and materials designed by the present invention should all be within the scope of protection.

[0067] Example 9 utilizes photolithography, in addition to inkjet printing and etching, to achieve different chiral molecules within the RGB pixels, resulting in a single-layer encapsulated full-color reflective cholesteric liquid crystal display material. Photolithographic polymerization of the polymerizable chiral molecules anchored within the RGB pixels varies in degree. This results in blue pixels being formed in areas with the most UV light passing through, where the chiral molecules diffuse. Next, green pixels are formed in areas with relatively less UV light passing through, where the chiral molecules diffuse. Finally, red pixels are formed in areas with the least UV light passing through, where most of the film and chiral molecules are removed after development. The result is a single-layer encapsulated full-color reflective cholesteric liquid crystal display module.

[0068] It is worth mentioning that the technical features such as the mask, etcher (Delphilaser type), inkjet printer (DP-400) involved in the patent application of this invention should be regarded as prior art. The specific structure, working principle and possible control method and spatial arrangement method of these technical features can be selected according to the conventional selection in the field, and should not be regarded as the inventive point of the patent of this invention. The patent of this invention will not be further elaborated.

[0069] The above describes in detail the preferred specific embodiments of the present invention. It should be understood that ordinary technicians in this field can make many modifications and changes based on the concept of the present invention without creative work. Therefore, any technical solutions that can be obtained by technicians in this technical field through logical analysis, reasoning or limited experiments based on the concept of the present invention on the basis of existing technologies should be within the scope of protection determined by the claims.

Claims

1. Single-layer liquid crystal reflective liquid crystal color display module, characterized in that: From bottom to top, it includes a light absorption layer, a lower substrate with a TFT electrode on the upper surface, a red, green and blue primary color reflective cholesteric liquid crystal layer, and an upper substrate with a conductive indium tin oxide layer on the lower surface.

2. The single-layer liquid crystal reflective liquid crystal color display module according to claim 1, wherein: The light absorbing layer is made of any one of black ink, black adhesive film, and black film with double-sided adhesive tape.

3. The single-layer liquid crystal reflective liquid crystal color display module according to claim 1, wherein: The lower substrate is glass with TFT electrodes.

4. The single-layer liquid crystal reflective liquid crystal color display module according to claim 1, wherein: The red, green and blue primary color reflective cholesteric liquid crystal layer includes a plurality of evenly distributed polyimide isolation walls, a micron-scale container is formed between two adjacent polyimide isolation walls, and every three adjacent micron-scale containers form a group of pixel strips. In each group of pixel strips, one micron-scale container is filled with a chiral compound and a cholesteric liquid crystal reflecting red, another micron-scale container is filled with a chiral compound and a cholesteric liquid crystal reflecting green, and the last micron-scale container is filled with a chiral compound and a cholesteric liquid crystal reflecting blue.

5. The single-layer liquid crystal reflective liquid crystal color display module according to claim 4, wherein: The polyimide isolation wall has a height of 0.3-20 microns and a width of 0.3-20 microns. The distance between adjacent polyimide isolation walls is 2-120 microns. The polyimide isolation walls are bonded to the upper substrate and the lower substrate.

6. The method for preparing a single-layer liquid crystal reflective liquid crystal color display module according to claim 5, wherein: The following steps are included: Step 1: evenly coating a polyimide photosensitive resin on the side of the lower substrate having the TFT electrode, drying to remove the solvent, and polymerizing the resin under ultraviolet light using Mask I to form a plurality of evenly distributed polyimide isolation walls on the lower substrate; Step 2: Transfer the lower substrate to a developer and develop for a period of time to remove unpolymerized polyimide photosensitive resin. After taking it out, rinse the lower substrate to remove the developer and impurities on the lower substrate. Rinse it with a rinse solution to remove the solvent, thereby obtaining a lower substrate with a uniform and highly neat polyimide isolation wall. The area formed by the four adjacent polyimide isolation walls on the lower substrate is defined as RGB pixels. The area between the first and second polyimide isolation walls is called red pixel R, the area between the second and third polyimide isolation walls is called green pixel G, and the area between the third and fourth polyimide isolation walls is called blue pixel B. Step 3: Mix 1-30 parts of a chiral compound, 70-98 parts of an organic solvent, 3-50 parts of a polymer or an acrylate monomer, and 0-2 parts of a photoinitiator in parts by weight, and stir until uniform to obtain a mixture 1; A certain amount of mixture 1 is evenly printed in the area of ​​green pixel G, and a certain amount of mixture 1 is evenly printed in the area of ​​blue pixel B, wherein the amount of mixture 1 printed in the area of ​​blue pixel B is greater than the amount of mixture 1 printed in the area of ​​green pixel G; the mixture is naturally air-dried or the solvent is dried at a certain temperature; the lower substrate is transferred to ultraviolet light for a period of time to cause a polymerization reaction, thereby forming a thin film A in the area of ​​green pixel G and a thin film B in the area of ​​blue pixel B, wherein the total content of chiral compounds in thin film B is greater than the total content of chiral compounds in thin film A; Alternatively, a certain amount of mixture 1 is evenly coated on the side of the lower substrate with the polyimide isolation wall and dried. A mask II is then placed over the side of the lower substrate with the mixture 1. The mask II has a plurality of light passages for light to pass through. The light passages correspond one-to-one to red pixels R, green pixels G, and blue pixels B. The light passage corresponding to the red pixel R is designated as light passage A, the light passage corresponding to the green pixel G is designated as light passage B, and the light passage corresponding to the blue pixel B is designated as light passage C. The light passage area of ​​light passage B is larger than that of light passage A, and the light passage area of ​​light passage C is larger than that of light passage B. The lower substrate covered with mask II is polymerized under ultraviolet light for a period of time. The mask II is removed, and the lower substrate is cleaned with a developer solvent to remove unpolymerized mixture 1. Thin film I is formed in the area of ​​the red pixel R, thin film II is formed in the area of ​​the green pixel G, and thin film III is formed in the area of ​​the blue pixel B. Alternatively, a certain amount of mixture 1 is evenly coated on the side of the lower substrate with the polyimide isolation wall, dried, and then covered with a mask II on the side of the lower substrate with the mixture 1. The mask II has a plurality of light passages for light to pass through, and the light passages correspond to red pixels R, green pixels G, and blue pixels B. The light passage corresponding to the red pixel R is set as light passage A, the light passage corresponding to the green pixel G is set as light passage B, and the light passage corresponding to the blue pixel B is set as light passage C. The light passage area of ​​light passage B is smaller than that of light passage A, and the light passage area of ​​light passage C is smaller than that of light passage B. The lower substrate covered with mask II is polymerized under ultraviolet light for a period of time. Mask II is removed. Thin film I is formed in the region of the red pixel R, thin film II is formed in the region of the green pixel G, and thin film III is formed in the region of the blue pixel B; Alternatively, a certain amount of mixture 1 is evenly coated on the side of the lower substrate with the polyimide isolation wall, dried, and polymerized under ultraviolet light for a period of time to form a thin film 1 on the lower substrate; the thin film 1 in the red pixel R area and the thin film 1 in the green pixel G area are etched away using an etcher, while the thin film 1 is retained in the blue pixel B area; a certain amount of mixture 1 is evenly coated again on the side of the lower substrate with the micron-level thin-walled container, dried, and polymerized under ultraviolet light for a period of time to form thin films 2 in the red pixel R and the green pixel G, respectively; the thin film 2 in the red pixel R is etched away using an etcher, while the thin film 2 is retained in the green pixel G, and the thin films 1 and 2 are retained in the blue pixel B area; Step 4: 1-60 parts by weight of UV-polymerizable monomer I, 70-98 parts of an organic solvent, and 0-2 parts of an initiator are mixed uniformly to obtain a mixture 2, and the mixture 2 is evenly coated on one side of the conductive indium tin oxide layer on the upper substrate, and dried to remove the solvent; the upper substrate is placed on the lower substrate containing the thin film and the TFT electrode, and then rolled and photopolymerized for a period of time to obtain a packaged liquid crystal cell without liquid crystal injection, wherein the side of the lower substrate with the polyimide isolation wall faces upward, and the side of the upper substrate with the mixture 2 faces downward; Step 5: uniformly mixing 2-30 parts of a chiral compound, 5-15 parts of a UV-polymerizable monomer II, 0.5-2 parts of a photoinitiator, and 70-95 parts of a nematic liquid crystal according to parts by weight to obtain a matrix liquid crystal mixture; dropwise adding the matrix liquid crystal mixture to a side of a package box not filled with liquid crystal, absorbing the matrix liquid crystal mixture into the package box and filling the entire package box, diffusing for 1-30 minutes to reach diffusion equilibrium, and then irradiating with UV light for 1-30 minutes; Step 6: Apply black ink or a black adhesive film or a black film on the side of the lower substrate without TFT electrodes to form a light absorbing layer, and finally obtain a single-layer liquid crystal reflective liquid crystal color display module.

7. The method for preparing a single-layer liquid crystal reflective liquid crystal color display module according to claim 6, wherein: The chiral compound is 、 、 、 、 、 、 、 、 、 、 、 、 Any one or more of the following: The organic solvent is one or more of N,N-dimethylformamide, N,N-dimethylacetamide, dimethyl sulfoxide, methanol, ethanol, isopropanol, dichloromethane, chloroform, tetrachloromethane, acetone, ether, petroleum ether, n-hexane, benzene, tetrahydrofuran, ethyl acetate, acetonitrile, toluene, phenol, and anisole; The photoinitiator is one or more of (2,4,6-trimethylbenzoyl)diphenylphosphine oxide, bis(1-(2,4-difluorophenyl)-3-pyrrolyl)titanocene, 2-isopropylthioxanthone, methyl o-benzoylbenzoate, and ethyl 2,4,6-trimethylbenzoylphenylphosphonate; The high molecular polymer is one or more of polyvinyl pyrrolidone, polyvinyl alcohol, ribopolysaccharide, polylactic acid, polycaprolactone, polymethyl methacrylate, and dipentaerythritol hexaacrylate; The ultraviolet polymerizable monomer I is one or more of JT-1000, RFJ-220-60, dipentaerythritol hexaacrylate, ethyl 2-(4-benzoylphenoxy) 2-methylprop-2-enoate, methyl isocyanate, phenyl isocyanate, diisocyanate, polytetrahydrofuran alcohol, polyethylene glycol (100-1000), triethylene glycol dimethacrylate, tetraethylene glycol dimethacrylate, neopentyl glycol dimethacrylate, ethylene glycol acetoacetate methacrylate, ethoxylated bisphenol A methacrylate diester, 2-phenoxyethyl acrylate, trimethylolpropane trimethacrylate, octadecyl methacrylate, tetraethylene glycol diacrylate, 1,4-bis-[4-(6-acryloyloxyhexyloxy)benzoyloxy]-2-methylbenzene, and 2-methyl-1,4-phenylenebis(4-(((4-(acryloyloxy)butoxy)carbonyl)oxy)benzoic acid; The ultraviolet polymerizable monomer II is one or more of isobornyl methacrylate, butyl acrylate, 1,6-hexanediol acrylate diester, 1,4-butanediol acrylate diester, phenyl acrylate, pentaerythritol tetrakis(3-mercaptopropionate), cyclohexyl acrylate, and hydroxypropyl methacrylate; The polyimide photosensitive adhesive is one or more of FRJ-220-60, JZ-2005, AZ4330, SU-8 2025, AZ4620, AZ9260, AZ1500, and AZ5214.

8. The method for preparing a single-layer liquid crystal reflective liquid crystal color display module according to claim 6, wherein: The light absorbing layer has a light transmittance of less than 0.1% in the 380-780 nm wavelength range, a mirror reflectivity of less than 1.5%, and a light absorption efficiency of more than 99.9%.

9. The method for preparing a single-layer liquid crystal reflective liquid crystal color display module according to claim 6, wherein: The photoresist in step 2 has a flash point of 10-40° C., a boiling point of 110-160° C., a density of 0.38-1.3 g / cm 3 , and a polymerization temperature of -25-45° C.

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