Preparation method and device for realizing electrochromic glass

Abstract

The invention relates to the field of material science and optoelectronics, and discloses a preparation method and device for realizing electrochromic glass, and the preparation method comprises the following steps: carrying out solution cleaning on an ITO glass substrate to obtain a first cleaned ITO glass substrate; performing ultrasonic cleaning on the cleaned ITO glass substrate to obtain a second cleaned ITO glass substrate, and calculating a dust coefficient and a grease coefficient of the second cleaned ITO glass substrate; taking the second cleaned ITO glass substrate as a target ITO glass substrate and a standby ITO glass substrate of to-be-prepared photochromic glass, analyzing coating parameters of the evaporation electrochromic material on the target ITO glass substrate, integrating a preset monomer solution to the electrochromic substrate to obtain a solution electrochromic substrate, and performing ultraviolet polymerization on the solution electrochromic substrate to obtain the photochromic glass. A target electrochromic substrate is obtained, the target electrochromic substrate and the standby ITO glass substrate are packaged, and the electrochromic glass is obtained. The performance of the electrochromic glass can be improved.

Description

Technical Field

[0001] The invention relates to a preparation method and device for realizing electrochromic glass, and belongs to the fields of material science and optoelectronics. Background Art

[0002] Electrochromic glass refers to a new type of smart glass material that can change its transmittance, reflectivity or color under the action of an external electric field. Electrochromic glass is widely used in architectural windows, car sunroofs, smart glasses, displays and other fields.

[0003] The traditional preparation method of electrochromic glass usually involves coating the electrochromic material on an ITO glass substrate through solution coating or vacuum deposition techniques, followed by drying and assembling into a device. However, this method often requires the use of organic solvents, which may cause environmental pollution and material waste. In addition, it is difficult to accurately control the thickness and uniformity of the electrochromic layer during the preparation process, resulting in poor performance of the electrochromic glass. Summary of the Invention

[0004] The present invention provides a method and device for preparing electrochromic glass, the main purpose of which is to improve the performance of the electrochromic glass.

[0005] To achieve the above-mentioned object, the present invention provides a method for preparing electrochromic glass, comprising:

[0006] Obtaining preparation requirements for the color-changing glass to be prepared, determining an ITO glass substrate and an electrochromic material for the color-changing glass to be prepared based on the preparation requirements, and performing solution cleaning on the ITO glass substrate to obtain a first cleaned ITO glass substrate;

[0007] Establishing an ultrasonic cleaning environment for the cleaned ITO glass substrate, ultrasonically cleaning the cleaned ITO glass substrate based on the ultrasonic cleaning environment to obtain a second cleaned ITO glass substrate, and calculating a dust coefficient and a grease coefficient of the second cleaned ITO glass substrate;

[0008] When the dust coefficient and the grease coefficient both meet the preset dust threshold and the grease threshold, the second cleaned ITO glass substrate is used as the target ITO glass substrate and the spare ITO glass substrate for preparing the color-changing glass, the electrochromic material is placed in a preset evaporation chamber, and the evaporation chamber is configured to a high vacuum state;

[0009] The electrochromic material is evaporated in the high vacuum state to obtain an evaporated electrochromic material, a coating parameter of the evaporated electrochromic material on the target ITO glass substrate is analyzed using a preset coating control function, and the target ITO glass substrate is coated with the evaporated electrochromic material based on the coating parameter to obtain an electrochromic substrate;

[0010] A preset monomer solution is integrated into the electrochromic substrate to obtain a solution electrochromic substrate, and the solution electrochromic substrate is ultraviolet-polymerized using a preset polymerization algorithm to obtain a target electrochromic substrate. The target electrochromic substrate and the spare ITO glass substrate are packaged to obtain electrochromic glass.

[0011] Optionally, the step of performing solution cleaning on the ITO glass substrate to obtain a first cleaned ITO glass substrate comprises:

[0012] Identifying the type of contaminants on the ITO glass substrate;

[0013] Determining a cleaning solvent for the initial cleaning of the ITO glass substrate based on the type of contaminant;

[0014] Pre-cleaning the ITO glass substrate to obtain a pre-cleaned ITO glass substrate;

[0015] Performing initial cleaning on the pre-cleaned ITO glass substrate using deionized water in the cleaning solvent to obtain an initially cleaned ITO glass substrate;

[0016] The organic matter in the initially cleaned ITO glass substrate is cleaned by using isopropyl alcohol in the cleaning solvent to obtain the first cleaned ITO glass substrate.

[0017] Optionally, the calculating of the dust coefficient and grease coefficient of the second cleaned ITO glass substrate includes:

[0018] marking the substrate sample surface of the second cleaned ITO glass substrate;

[0019] Identifying the number of dust particles on the surface of the substrate sample in a preset specific area;

[0020] Calculating the dust coefficient of the second cleaned ITO glass substrate according to the number of dust particles;

[0021] Mark the grease measurement area of ​​the second cleaned ITO glass substrate;

[0022] Constructing a contact angle environment of the grease measurement area;

[0023] detecting the contact angle of the grease measurement area under the contact angle environment;

[0024] Based on the contact angle, the grease coefficient of the second cleaned ITO glass substrate is calculated.

[0025] Optionally, the calculating the grease coefficient of the second cleaning ITO glass substrate based on the contact angle includes:

[0026] Identifying the dispersion force component and the polar force component of the contact angle environment corresponding to the second cleaned ITO glass substrate;

[0027] Based on the dispersion force component, the polar force component, and the contact angle, the surface free energy of the second cleaned ITO glass substrate is calculated using the following formula:

[0028]

[0029] Among them, γ s represents the surface free energy of the second cleaned ITO glass substrate, R represents the ratio of the dispersion force component to the polar force component, θ represents the contact angle, cosθ represents the cosine value of the contact angle, γ l，d represents the dispersion force component, γ l，P Represents polar force component;

[0030] Based on the surface free energy, the grease coefficient of the second cleaned ITO glass substrate is calculated.

[0031] Optionally, evaporating the electrochromic material in the high vacuum state to obtain the evaporated electrochromic material includes:

[0032] Calculating the vacuum value of the high vacuum state;

[0033] When the vacuum value meets a preset vacuum threshold, constructing an electron beam corresponding to the evaporation chamber of the electrochromic material;

[0034] heating the evaporation chamber based on the electron beam to obtain a heated evaporation chamber;

[0035] collecting evaporation data of the electrochromic material in the heated evaporation chamber;

[0036] calculating a sputtering coefficient of the electrochromic material based on the evaporation data;

[0037] Optimizing the electron beam according to the sputtering coefficient to obtain an optimized electron beam;

[0038] The electrochromic material is evaporated according to the optimized electron beam to obtain the evaporated electrochromic material.

[0039] Optionally, calculating the sputtering coefficient of the electrochromic material based on the evaporation data includes:

[0040] defining a material density and a material binding energy of the electrochromic material;

[0041] identifying an electron beam current of an optimized electron beam corresponding to the electrochromic material based on the evaporation data;

[0042] determining the sputtering yield and sputtering angle of the electrochromic material based on the evaporation data;

[0043] The sputtering coefficient of the electrochromic material is calculated based on the material density, the material binding energy, the electron beam current, the sputtering yield, and the sputtering angle using the following formula:

[0044]

[0045] Where Y represents the sputtering coefficient of the electrochromic material, I represents the electron beam current, σ represents the sputtering yield, β represents the sputtering angle, π represents the circumference, d represents the distance from the optimized electron beam to the electrochromic material, ρ represents the material density, and E bind Represents the binding energy of the material.

[0046] Optionally, the analyzing the coating parameters of the evaporated electrochromic material on the target ITO glass substrate by using a preset coating control function includes:

[0047] analyzing evaporation material characteristics of the evaporated electrochromic material;

[0048] Determining initial coating parameters of the evaporated electrochromic material on the target ITO glass substrate based on the properties of the evaporated material;

[0049] Defining the coating requirements of the evaporated electrochromic material on the target ITO glass substrate;

[0050] Calculating a coating coefficient of the initial coating parameters based on the coating requirements;

[0051] According to the coating coefficient and the coating requirement, the coating control function is used to analyze the coating parameters of the evaporated electrochromic material on the target ITO glass substrate.

[0052] Optionally, the calculating the coating coefficient of the initial coating parameter based on the coating requirement includes:

[0053] Defining coating performance indicators of the initial coating parameters, wherein the coating performance indicators include film thickness, film uniformity, film optical properties, film resistivity, and film mechanical properties;

[0054] Based on the coating performance index, the coating coefficient of the initial coating parameters is calculated using the following formula:

[0055]

[0056] Where C represents the coating coefficient of the initial coating parameters, T act Indicates the film thickness, T tar represents the target film thickness, ωT represents the weight of the film thickness, U act Indicates the uniformity of the film, U tar represents the target film uniformity, ωU represents the weight of film uniformity, P act Indicates the optical properties of the film, P tar represents the target film optical performance, ωR represents the weight of the film optical performance, E act Indicates the mechanical properties of the film, E tar represents the target film mechanical properties, and ωE represents the weight of the film mechanical properties.

[0057] Optionally, the method of performing ultraviolet polymerization on the solution electrochromic substrate using a preset polymerization algorithm to obtain a target electrochromic substrate includes:

[0058] Establishing an ultraviolet curing device for the solution electrochromic substrate;

[0059] analyzing ultraviolet curing parameters of the ultraviolet curing device using the aggregation algorithm;

[0060] Based on the ultraviolet curing parameters, polymerizing the monomers corresponding to the electrochromic substrate of the solution to obtain a polymer network;

[0061] The target electrochromic substrate of the solution electrochromic substrate is constructed through the polymer network.

[0062] In order to solve the above problems, the present invention further provides a device for preparing electrochromic glass, the device comprising:

[0063] A glass substrate solution cleaning module is used to obtain preparation requirements of the color-changing glass to be prepared, determine the ITO glass substrate and electrochromic material of the color-changing glass to be prepared based on the preparation requirements, and perform solution cleaning on the ITO glass substrate to obtain a first cleaned ITO glass substrate;

[0064] a glass substrate ultrasonic cleaning module, configured to establish an ultrasonic cleaning environment for cleaning the ITO glass substrate, ultrasonically clean the cleaned ITO glass substrate based on the ultrasonic cleaning environment to obtain a second cleaned ITO glass substrate, and calculate a dust coefficient and a grease coefficient of the second cleaned ITO glass substrate;

[0065] an electrochromic material evaporation module, configured to, when the dust coefficient and grease coefficient simultaneously meet preset dust thresholds and grease thresholds, use the second cleaned ITO glass substrate as the target ITO glass substrate and spare ITO glass substrate for preparing the color-changing glass, place the electrochromic material in a preset evaporation chamber, and configure the evaporation chamber to a high vacuum state;

[0066] an electrochromic substrate construction module, configured to evaporate the electrochromic material in the high vacuum state to obtain evaporated electrochromic material, analyze coating parameters of the evaporated electrochromic material on the target ITO glass substrate using a preset coating control function, and execute coating of the evaporated electrochromic material on the target ITO glass substrate based on the coating parameters to obtain an electrochromic substrate;

[0067] The electrochromic glass building module is used to integrate a preset monomer solution into the electrochromic substrate to obtain a solution electrochromic substrate, and to perform ultraviolet polymerization on the solution electrochromic substrate using a preset polymerization algorithm to obtain a target electrochromic substrate. The target electrochromic substrate and the spare ITO glass substrate are packaged to obtain electrochromic glass.

[0068] Compared to the problems described in the background art, first, this preparation method significantly improves the surface cleanliness of the ITO glass substrate through strict solution cleaning and ultrasonic cleaning steps, ensuring that the dust coefficient and grease coefficient meet the preset standards, thereby reducing defects in the electrochromic material coating process and improving the yield and performance stability of the electrochromic glass. Secondly, the evaporation process under high vacuum conditions ensures the purity and uniformity of the electrochromic material. The application of the coating control function further optimizes the coating parameters, making the electrochromic layer have excellent uniformity and density, enhancing the color change effect and durability of the glass. In addition, the integration of the monomer solution and the ultraviolet polymerization step effectively improve the mechanical strength and chemical stability of the electrochromic substrate, enabling the electrochromic glass to maintain long-term stable working performance under variable environmental conditions. The encapsulation process ensures that the electrochromic layer is isolated from the external environment, preventing oxidation and contamination, and extending the service life of the product. Therefore, the present invention can improve the timeliness and stability of information processing and data analysis. BRIEF DESCRIPTION OF THE DRAWINGS

[0069] Figure 1 A schematic flow chart of a method for preparing electrochromic glass according to an embodiment of the present invention;

[0070] Figure 2 A schematic diagram of a module for implementing the method for preparing electrochromic glass provided in one embodiment of the present invention.

[0071] The purpose, features and advantages of the present invention will be further described with reference to the accompanying drawings and in conjunction with the embodiments. DETAILED DESCRIPTION

[0072] It should be understood that the specific embodiments described herein are only used to explain the present invention and are not intended to limit the present invention.

[0073] The present invention provides a method for producing electrochromic glass. The method can be performed by at least one electronic device, such as a server or a terminal, that can be configured to perform the method provided in the present invention. In other words, the method can be performed by software or hardware installed on a terminal or server. The server includes, but is not limited to, a single server, a server cluster, a cloud server, or a cloud server cluster.

[0074] Example 1:

[0075] Reference Figure 1 FIG. 1 is a flow chart of a method for producing electrochromic glass according to an embodiment of the present invention. In this embodiment, the method for producing electrochromic glass includes:

[0076] S1. Obtaining preparation requirements of the color-changing glass to be prepared, determining an ITO glass substrate and an electrochromic material for the color-changing glass to be prepared based on the preparation requirements, and performing solution cleaning on the ITO glass substrate to obtain a first cleaned ITO glass substrate.

[0077] The present invention obtains the manufacturing requirements of the color-changing glass to be produced, which can provide a basis for subsequent glass production. The manufacturing requirements refer to a series of technical specifications, performance indicators, application conditions, and other relevant requirements that must be met when manufacturing the color-changing glass. For example, performance requirements and material selection requirements are required.

[0078] It should be explained that the ITO glass substrate refers to a conductive material used in the preparation of electrochromic glass, and the electrochromic material refers to a material that can change its optical properties (usually color) under the action of an electric field.

[0079] The present invention cleans the ITO glass substrate with a solution to obtain a first cleaned ITO glass substrate to remove surface pollutants, grease, dust and other impurities that may affect the coating and performance of the electrochromic material, thereby improving the quality of the subsequent glass.

[0080] In detail, the step of performing solution cleaning on the ITO glass substrate to obtain a first cleaned ITO glass substrate comprises:

[0081] Identifying the type of contaminants on the ITO glass substrate;

[0082] Determining a cleaning solvent for the initial cleaning of the ITO glass substrate based on the type of contaminant;

[0083] Pre-cleaning the ITO glass substrate to obtain a pre-cleaned ITO glass substrate;

[0084] Performing initial cleaning on the pre-cleaned ITO glass substrate using deionized water in the cleaning solvent to obtain an initially cleaned ITO glass substrate;

[0085] The organic matter in the initially cleaned ITO glass substrate is cleaned by using isopropyl alcohol in the cleaning solvent to obtain the first cleaned ITO glass substrate.

[0086] Among them, the contaminant type refers to the different types of impurities that may exist on the surface of the ITO glass substrate, the cleaning solvent refers to the chemical substance used to clean the ITO glass substrate, the pre-cleaned ITO glass substrate refers to the glass on which larger particles and loose contaminants on the surface of the ITO glass substrate are removed by physical methods (such as blowing, brushing, etc.) before the formal chemical cleaning, the initial cleaning of the ITO glass substrate refers to the first chemical cleaning of the pre-cleaned ITO glass substrate using deionized water, the purpose of which is to remove water-soluble contaminants and some inorganic contaminants from the glass, and the first cleaning of the ITO glass substrate refers to the second chemical cleaning of the ITO glass substrate using isopropyl alcohol after the initial cleaning.

[0087] S2. Establish an ultrasonic cleaning environment for the cleaned ITO glass substrate, perform ultrasonic cleaning on the cleaned ITO glass substrate based on the ultrasonic cleaning environment to obtain a second cleaned ITO glass substrate, and calculate the dust coefficient and grease coefficient of the second cleaned ITO glass substrate.

[0088] It should be explained that the ultrasonic cleaning environment refers to the conditions for cleaning ITO glass substrates using ultrasonic energy.

[0089] The present invention ultrasonically cleans the cleaned ITO glass substrate in the ultrasonic cleaning environment to obtain a second cleaned ITO glass substrate, thereby ensuring a clean surface before coating the electrochromic material, thereby improving the adhesion of the coating and the performance of the final product. The second cleaned ITO glass substrate refers to an ITO glass substrate that, after undergoing the ultrasonic cleaning step, achieves a more thorough cleaning state than the pre-cleaning or initial cleaning.

[0090] The present invention calculates the dust coefficient and grease coefficient of the second cleaned ITO glass substrate to determine the cleanliness of the ITO glass substrate, thereby improving the effect of subsequent glass manufacturing.

[0091] In detail, the calculation of the dust coefficient and grease coefficient of the second cleaning ITO glass substrate includes:

[0092] marking the substrate sample surface of the second cleaned ITO glass substrate;

[0093] Identifying the number of dust particles on the surface of the substrate sample in a preset specific area;

[0094] Calculating the dust coefficient of the second cleaned ITO glass substrate according to the number of dust particles;

[0095] Mark the grease measurement area of ​​the second cleaned ITO glass substrate;

[0096] Constructing a contact angle environment of the grease measurement area;

[0097] detecting the contact angle of the grease measurement area under the contact angle environment;

[0098] Based on the contact angle, the grease coefficient of the second cleaned ITO glass substrate is calculated.

[0099] Among them, the substrate sample surface refers to the actual surface of the ITO glass substrate, the number of dust particles refers to the total number of dust particles that can be identified and counted within a preset specific area (usually square millimeters or square centimeters) through a microscope or other high-magnification imaging technology, the dust coefficient refers to the coefficient used to quantify the degree of dust contamination on the surface of the ITO glass substrate, the grease measurement area refers to the area specially designated on the ITO glass substrate for measuring grease residue, the contact angle environment refers to the experimental conditions created for measuring the contact angle, including the control of factors such as temperature, humidity, and air flow, the contact angle refers to the angle formed by a liquid (usually a water droplet) on a solid surface (in this case, the ITO glass substrate), and the grease coefficient refers to the coefficient used to quantify the degree of grease contamination on the surface of the ITO glass substrate.

[0100] Furthermore, the calculating of the grease coefficient of the second cleaning ITO glass substrate based on the contact angle includes:

[0101] Identifying the dispersion force component and the polar force component of the contact angle environment corresponding to the second cleaned ITO glass substrate;

[0102] Based on the dispersion force component, the polar force component, and the contact angle, the surface free energy of the second cleaned ITO glass substrate is calculated using the following formula:

[0103]

[0104] Among them, γ srepresents the surface free energy of the second cleaned ITO glass substrate, R represents the ratio of the dispersion force component to the polar force component, θ represents the contact angle, cosθ represents the cosine value of the contact angle, γ l，d represents the dispersion force component, γ l，P Represents polar force component;

[0105] Based on the surface free energy, the grease coefficient of the second cleaned ITO glass substrate is calculated.

[0106] Among them, the dispersion force component refers to the action value caused by the dispersion force (London dispersion force) in the surface free energy of the ITO glass substrate, the polar force component refers to the action value caused by the polar force in the surface free energy of the ITO glass substrate, the surface free energy refers to the surface free energy per unit area, and the grease coefficient refers to the value used to quantify the degree of grease contamination on the surface of the ITO glass substrate.

[0107] S3. When the dust coefficient and grease coefficient simultaneously meet the preset dust threshold and grease threshold, the second cleaned ITO glass substrate is used as the target ITO glass substrate and spare ITO glass substrate for the color-changing glass to be prepared, the electrochromic material is placed in a preset evaporation chamber, and the evaporation chamber is configured to a high vacuum state.

[0108] It should be explained that the dust threshold refers to the maximum number or density of dust particles allowed on the surface of the ITO glass substrate, the grease threshold refers to the maximum degree of grease contamination allowed on the surface of the ITO glass substrate, the target ITO glass substrate refers to the ITO glass substrate processed in the process of preparing electrochromic glass, and the spare ITO glass substrate is the ITO glass substrate used for combination in the process of preparing electrochromic glass.

[0109] The present invention places the electrochromic material in a pre-set evaporation chamber and maintains a high vacuum in the chamber to ensure uniform deposition of the electrochromic material on an ITO glass substrate, thereby producing a high-performance electrochromic device. The evaporation chamber is a specially designed chamber used for physical vapor deposition (PVD) processes such as evaporation and sputtering, and the high vacuum refers to a state in which the pressure within the evaporation chamber is significantly below atmospheric pressure.

[0110] S4. Evaporating the electrochromic material in the high vacuum state to obtain an evaporated electrochromic material, analyzing coating parameters of the evaporated electrochromic material on the target ITO glass substrate using a preset coating control function, and coating the target ITO glass substrate with the evaporated electrochromic material based on the coating parameters to obtain an electrochromic substrate.

[0111] The present invention evaporates the electrochromic material in the high vacuum state to obtain the evaporated electrochromic material, thereby ensuring the quality and performance of the electrochromic film.

[0112] In detail, evaporating the electrochromic material in the high vacuum state to obtain the evaporated electrochromic material includes:

[0113] Calculating the vacuum value of the high vacuum state;

[0114] When the vacuum value meets a preset vacuum threshold, constructing an electron beam corresponding to the evaporation chamber of the electrochromic material;

[0115] heating the evaporation chamber based on the electron beam to obtain a heated evaporation chamber;

[0116] collecting evaporation data of the electrochromic material in the heated evaporation chamber;

[0117] calculating a sputtering coefficient of the electrochromic material based on the evaporation data;

[0118] Optimizing the electron beam according to the sputtering coefficient to obtain an optimized electron beam;

[0119] The electrochromic material is evaporated according to the optimized electron beam to obtain the evaporated electrochromic material.

[0120] Among them, the vacuum value refers to the pressure level in the evaporation chamber, the vacuum threshold refers to the minimum vacuum level that must be reached for evaporation deposition, the electron beam refers to the high-speed electron flow generated by the electron gun, which is used to heat the evaporation source to evaporate the material, and the heated evaporation chamber refers to an environment in which the evaporation source in the evaporation chamber is brought to a high temperature by an electron beam or other heating method, thereby achieving material evaporation. The evaporation data refers to a series of parameters collected during the evaporation process, including evaporation rate, deposition rate, film thickness, etc. The sputtering coefficient refers to a quantitative indicator of the sputtering effect caused by electron beam bombardment of the material during the evaporation process. The optimized electron beam refers to an electron beam adjusted according to the sputtering coefficient to reduce the sputtering effect and improve evaporation efficiency and film quality. The evaporated electrochromic material refers to an electrochromic material film deposited on a substrate through an evaporation process.

[0121] Furthermore, the calculating the sputtering coefficient of the electrochromic material based on the evaporation data includes:

[0122] defining a material density and a material binding energy of the electrochromic material;

[0123] identifying an electron beam current of an optimized electron beam corresponding to the electrochromic material based on the evaporation data;

[0124] determining the sputtering yield and sputtering angle of the electrochromic material based on the evaporation data;

[0125] The sputtering coefficient of the electrochromic material is calculated based on the material density, the material binding energy, the electron beam current, the sputtering yield, and the sputtering angle using the following formula:

[0126]

[0127] Where Y represents the sputtering coefficient of the electrochromic material, I represents the electron beam current, σ represents the sputtering yield, β represents the sputtering angle, π represents the circumference, d represents the distance from the optimized electron beam to the electrochromic material, ρ represents the material density, and E bind Represents the binding energy of the material.

[0128] Among them, the material density refers to the mass of the material per unit volume, the material binding energy refers to the energy required to remove an atom from the surface of the material, the electron beam current refers to the intensity of the electron flow emitted by the electron gun, the sputtering yield refers to the number of atoms sputtered from the material surface by each incident electron, the sputtering angle refers to the angle between the direction in which the sputtered atoms fly out of the material surface and the normal to the material surface, and the sputtering coefficient describes the efficiency of the material sputtering from the evaporation source under electron beam bombardment.

[0129] The present invention uses a preset coating control function to analyze the coating parameters of the evaporated electrochromic material on the target ITO glass substrate. The coating control function can be used to ensure that the electrochromic material is coated on the ITO glass substrate in an optimal manner, thereby preparing a high-performance electrochromic device.

[0130] In detail, the analyzing the coating parameters of the evaporated electrochromic material on the target ITO glass substrate using a preset coating control function includes:

[0131] analyzing evaporation material characteristics of the evaporated electrochromic material;

[0132] Determining initial coating parameters of the evaporated electrochromic material on the target ITO glass substrate based on the properties of the evaporated material;

[0133] Defining the coating requirements of the evaporated electrochromic material on the target ITO glass substrate;

[0134] Calculating a coating coefficient of the initial coating parameters based on the coating requirements;

[0135] According to the coating coefficient and the coating requirement, the coating control function is used to analyze the coating parameters of the evaporated electrochromic material on the target ITO glass substrate.

[0136] Among them, the evaporation material characteristics refer to the physical and chemical properties of the electrochromic material during the evaporation process, which affect the evaporation rate, deposition behavior and film formation of the material. The initial coating parameters are a set of parameters preset before the coating process begins. These parameters are based on the evaporation material characteristics and the target coating effect, including: evaporation source power, distance from the evaporation source to the substrate, substrate temperature, deposition rate, deposition time, substrate movement speed, vacuum degree, etc. The coating requirements refer to the specific requirements for the electrochromic film in order to achieve specific application performance. The coating coefficient refers to the coefficient used to quantify the efficiency and quality of material deposition during the coating process. The coating control function refers to the function used to analyze and optimize the coating parameters to ensure that the coating process meets the coating requirements. The coating parameters refer to the parameters actually used in the coating process.

[0137] Furthermore, the calculating of the coating coefficient of the initial coating parameter based on the coating requirement includes:

[0138] Defining coating performance indicators of the initial coating parameters, wherein the coating performance indicators include film thickness, film uniformity, film optical properties, film resistivity, and film mechanical properties;

[0139] Based on the coating performance index, the coating coefficient of the initial coating parameters is calculated using the following formula:

[0140]

[0141] Where C represents the coating coefficient of the initial coating parameters, T act Indicates the film thickness, T tar represents the target film thickness, ωT represents the weight of the film thickness, U act Indicates the uniformity of the film, U tar represents the target film uniformity, ωU represents the weight of film uniformity, P act Indicates the optical properties of the film, P tar represents the target film optical performance, ωR represents the weight of the film optical performance, E act Indicates the mechanical properties of the film, E tar represents the target film mechanical properties, and ωE represents the weight of the film mechanical properties.

[0142] Among them, the film thickness refers to the thickness of the electrochromic material layer deposited on the ITO glass substrate, the film uniformity refers to the description of the uniformity of the film thickness or properties across the entire substrate, the film optical properties refer to the optical properties of the film, such as transmittance, reflectivity or absorptivity, the film resistivity refers to the resistivity of the film, the film mechanical properties refer to the mechanical properties of the film, and the weight refers to the weight of the coating performance index in the coating coefficient analysis.

[0143] S5. Integrate the preset monomer solution into the electrochromic substrate to obtain a solution electrochromic substrate, and perform ultraviolet polymerization on the solution electrochromic substrate using a preset polymerization algorithm to obtain a target electrochromic substrate. The target electrochromic substrate and the spare ITO glass substrate are packaged to obtain electrochromic glass.

[0144] The present invention integrates a preset monomer solution into the electrochromic substrate to obtain a solution electrochromic substrate. The solution electrochromic substrate refers to a key component of a specially treated electrochromic device, and the monomer solution refers to a chemical solution comprising a monomer and a solvent. The monomer refers to a small molecule compound having one or more reactive groups, and the solvent refers to a liquid used to dissolve the monomer, which can be water, alcohol, ether, ketone, aromatic hydrocarbon, ester, halogenated hydrocarbon, etc.

[0145] The present invention utilizes a preset polymerization algorithm to perform ultraviolet polymerization on the solution electrochromic substrate to obtain a target electrochromic substrate, thereby improving the electrochromic quality of the subsequent process.

[0146] In detail, the method of performing ultraviolet polymerization on the solution electrochromic substrate using a preset polymerization algorithm to obtain a target electrochromic substrate includes:

[0147] Establishing an ultraviolet curing device for the solution electrochromic substrate;

[0148] analyzing ultraviolet curing parameters of the ultraviolet curing device using the aggregation algorithm;

[0149] Based on the ultraviolet curing parameters, polymerizing the monomers corresponding to the electrochromic substrate of the solution to obtain a polymer network;

[0150] The target electrochromic substrate of the solution electrochromic substrate is constructed through the polymer network.

[0151] Among them, the ultraviolet curing device refers to a device used to induce monomer molecular polymerization reaction through ultraviolet irradiation, which usually includes an ultraviolet light source, an irradiation system, a control system and other auxiliary equipment. The polymerization algorithm refers to a set of calculation methods for analyzing and optimizing the polymerization process, which includes the setting and adjustment of curing parameters. The ultraviolet curing parameters include the intensity, time, temperature, wavelength of ultraviolet irradiation and the distance between the substrate and the light source. The polymer network refers to a three-dimensional cross-linked structure formed by monomer molecules through polymerization reaction, which remains stable in the solid state and has specific physical and chemical properties. The target electrochromic substrate refers to a substrate with the desired electrochromic properties after ultraviolet curing treatment, and is coated with a cured electrochromic polymer film.

[0152] The present invention packages the target electrochromic substrate and the spare ITO glass substrate to obtain the electrochromic glass, thereby realizing the preparation of the existing electrochromic glass.

[0153] Compared to the problems described in the background art, first, this preparation method significantly improves the surface cleanliness of the ITO glass substrate through strict solution cleaning and ultrasonic cleaning steps, ensuring that the dust coefficient and grease coefficient meet the preset standards, thereby reducing defects in the electrochromic material coating process and improving the yield and performance stability of the electrochromic glass. Secondly, the evaporation process under high vacuum conditions ensures the purity and uniformity of the electrochromic material. The application of the coating control function further optimizes the coating parameters, making the electrochromic layer have excellent uniformity and density, enhancing the color change effect and durability of the glass. In addition, the integration of the monomer solution and the ultraviolet polymerization step effectively improve the mechanical strength and chemical stability of the electrochromic substrate, enabling the electrochromic glass to maintain long-term stable working performance under variable environmental conditions. The encapsulation process ensures that the electrochromic layer is isolated from the external environment, preventing oxidation and contamination, and extending the service life of the product. Therefore, the present invention can improve the timeliness and stability of information processing and data analysis.

[0154] Example 2:

[0155] like Figure 2 The figure shows a functional module diagram of a device for preparing electrochromic glass according to the present invention.

[0156] The electrochromic glass manufacturing device 200 described in the present invention can be installed in an electronic device. Depending on the functions to be implemented, the device can include a glass substrate solution cleaning module 201, a glass substrate ultrasonic cleaning module 202, an electrochromic material evaporation module 203, an electrochromic substrate construction module 204, and an electrochromic glass construction module 205. A module, also referred to as a unit, is a series of computer program segments that can be executed by an electronic device processor and perform a fixed function. These modules are stored in the electronic device's memory.

[0157] In the embodiment of the present invention, the functions of each module / unit are as follows:

[0158] The glass substrate solution cleaning module 201 is used to obtain the preparation requirements of the color-changing glass to be prepared, determine the ITO glass substrate and electrochromic material of the color-changing glass to be prepared based on the preparation requirements, and perform solution cleaning on the ITO glass substrate to obtain a first cleaned ITO glass substrate;

[0159] The glass substrate ultrasonic cleaning module 202 is used to establish an ultrasonic cleaning environment for cleaning the ITO glass substrate, ultrasonically clean the cleaned ITO glass substrate based on the ultrasonic cleaning environment to obtain a second cleaned ITO glass substrate, and calculate the dust coefficient and grease coefficient of the second cleaned ITO glass substrate;

[0160] The electrochromic material evaporation module 203 is configured to, when the dust coefficient and grease coefficient simultaneously meet the preset dust threshold and grease threshold, use the second cleaned ITO glass substrate as the target ITO glass substrate and the spare ITO glass substrate for preparing the color-changing glass, place the electrochromic material in a preset evaporation chamber, and configure the evaporation chamber to a high vacuum state;

[0161] The electrochromic substrate construction module 204 is configured to evaporate the electrochromic material in the high vacuum state to obtain an evaporated electrochromic material, analyze coating parameters of the evaporated electrochromic material on the target ITO glass substrate using a preset coating control function, and coat the target ITO glass substrate with the evaporated electrochromic material based on the coating parameters to obtain an electrochromic substrate;

[0162] The electrochromic glass building module 205 is used to integrate a preset monomer solution into the electrochromic substrate to obtain a solution electrochromic substrate, and use a preset polymerization algorithm to ultraviolet polymerization on the solution electrochromic substrate to obtain a target electrochromic substrate, and encapsulate the target electrochromic substrate and the spare ITO glass substrate to obtain electrochromic glass.

[0163] In detail, the modules in the device 200 for producing electrochromic glass according to the embodiment of the present invention are used in the same manner as above. Figure 1 The same technical means as described in the preparation method for electrochromic glass are used and can produce the same technical effects, so they will not be repeated here.

[0164] It will be apparent to those skilled in the art that the present invention is not limited to the details of the exemplary embodiments described above, and that the present invention can be implemented in other specific forms without departing from the spirit or essential characteristics of the present invention.

[0165] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention and are not limiting. Although the present invention has been described in detail with reference to the preferred embodiments, those skilled in the art should understand that the technical solutions of the present invention may be modified or replaced by equivalents without departing from the spirit and scope of the technical solutions of the present invention.

Claims

1. A method for preparing electrochromic glass, characterized in that: The method comprises: Obtaining preparation requirements for the color-changing glass to be prepared, determining an ITO glass substrate and an electrochromic material for the color-changing glass to be prepared based on the preparation requirements, and performing solution cleaning on the ITO glass substrate to obtain a first cleaned ITO glass substrate; Establishing an ultrasonic cleaning environment for the cleaned ITO glass substrate, ultrasonically cleaning the cleaned ITO glass substrate based on the ultrasonic cleaning environment to obtain a second cleaned ITO glass substrate, and calculating a dust coefficient and a grease coefficient of the second cleaned ITO glass substrate; When the dust coefficient and the grease coefficient both meet the preset dust threshold and the grease threshold, the second cleaned ITO glass substrate is used as the target ITO glass substrate and the spare ITO glass substrate for preparing the color-changing glass, the electrochromic material is placed in a preset evaporation chamber, and the evaporation chamber is configured to a high vacuum state; The electrochromic material is evaporated in the high vacuum state to obtain an evaporated electrochromic material, a coating parameter of the evaporated electrochromic material on the target ITO glass substrate is analyzed using a preset coating control function, and the target ITO glass substrate is coated with the evaporated electrochromic material based on the coating parameter to obtain an electrochromic substrate; A preset monomer solution is integrated into the electrochromic substrate to obtain a solution electrochromic substrate, and the solution electrochromic substrate is ultraviolet-polymerized using a preset polymerization algorithm to obtain a target electrochromic substrate. The target electrochromic substrate and the spare ITO glass substrate are packaged to obtain electrochromic glass.

2. The method for preparing electrochromic glass according to claim 1, wherein: The step of performing solution cleaning on the ITO glass substrate to obtain a first cleaned ITO glass substrate comprises: Identifying the type of contaminants on the ITO glass substrate; Determining a cleaning solvent for the initial cleaning of the ITO glass substrate based on the type of contaminant; Pre-cleaning the ITO glass substrate to obtain a pre-cleaned ITO glass substrate; Performing initial cleaning on the pre-cleaned ITO glass substrate using deionized water in the cleaning solvent to obtain an initially cleaned ITO glass substrate; The organic matter in the initially cleaned ITO glass substrate is cleaned by using isopropyl alcohol in the cleaning solvent to obtain the first cleaned ITO glass substrate.

3. The method for preparing electrochromic glass according to claim 2, wherein: The calculating of the dust coefficient and grease coefficient of the second cleaning ITO glass substrate includes: marking the substrate sample surface of the second cleaned ITO glass substrate; Identifying the number of dust particles on the surface of the substrate sample in a preset specific area; Calculating the dust coefficient of the second cleaned ITO glass substrate according to the number of dust particles; Mark the grease measurement area of ​​the second cleaned ITO glass substrate; Constructing a contact angle environment of the grease measurement area; detecting the contact angle of the grease measurement area under the contact angle environment; Based on the contact angle, the grease coefficient of the second cleaned ITO glass substrate is calculated.

4. The method for preparing electrochromic glass according to claim 3, wherein: Calculating the grease coefficient of the second cleaning ITO glass substrate based on the contact angle includes: Identifying the dispersion force component and the polar force component of the contact angle environment corresponding to the second cleaned ITO glass substrate; Based on the dispersion force component, the polar force component, and the contact angle, the surface free energy of the second cleaned ITO glass substrate is calculated using the following formula: Among them, γ s represents the surface free energy of the second cleaned ITO glass substrate, R represents the ratio of the dispersion force component to the polar force component, θ represents the contact angle, cosθ represents the cosine value of the contact angle, γ l,d represents the dispersion force component, γ l,p Represents polar force component; Based on the surface free energy, the grease coefficient of the second cleaned ITO glass substrate is calculated.

5. The method for preparing electrochromic glass according to claim 4, wherein: The step of evaporating the electrochromic material in the high vacuum state to obtain the evaporated electrochromic material comprises: Calculating the vacuum value of the high vacuum state; When the vacuum value meets a preset vacuum threshold, constructing an electron beam corresponding to the evaporation chamber of the electrochromic material; heating the evaporation chamber based on the electron beam to obtain a heated evaporation chamber; collecting evaporation data of the electrochromic material in the heated evaporation chamber; calculating a sputtering coefficient of the electrochromic material based on the evaporation data; Optimizing the electron beam according to the sputtering coefficient to obtain an optimized electron beam; The electrochromic material is evaporated according to the optimized electron beam to obtain the evaporated electrochromic material.

6. The method for preparing electrochromic glass according to claim 5, wherein: Calculating the sputtering coefficient of the electrochromic material based on the evaporation data includes: defining a material density and a material binding energy of the electrochromic material; identifying an electron beam current of an optimized electron beam corresponding to the electrochromic material based on the evaporation data; determining the sputtering yield and sputtering angle of the electrochromic material based on the evaporation data; The sputtering coefficient of the electrochromic material is calculated based on the material density, the material binding energy, the electron beam current, the sputtering yield, and the sputtering angle using the following formula: Where Y represents the sputtering coefficient of the electrochromic material, I represents the electron beam current, σ represents the sputtering yield, β represents the sputtering angle, π represents the circumference, d represents the distance from the optimized electron beam to the electrochromic material, ρ represents the material density, and E bind Represents the binding energy of the material.

7. The method for preparing electrochromic glass according to claim 6, wherein: The analyzing the coating parameters of the evaporated electrochromic material on the target ITO glass substrate by using a preset coating control function includes: analyzing evaporation material characteristics of the evaporated electrochromic material; Determining initial coating parameters of the evaporated electrochromic material on the target ITO glass substrate based on the properties of the evaporated material; Defining the coating requirements of the evaporated electrochromic material on the target ITO glass substrate; Calculating a coating coefficient of the initial coating parameters based on the coating requirements; According to the coating coefficient and the coating requirement, the coating control function is used to analyze the coating parameters of the evaporated electrochromic material on the target ITO glass substrate.

8. The method for preparing electrochromic glass according to claim 7, wherein: The step of calculating the coating coefficient of the initial coating parameters based on the coating requirement includes: Defining coating performance indicators of the initial coating parameters, wherein the coating performance indicators include film thickness, film uniformity, film optical properties, film resistivity, and film mechanical properties; Based on the coating performance index, the coating coefficient of the initial coating parameters is calculated using the following formula: Where C represents the coating coefficient of the initial coating parameters, T act Indicates the film thickness, T tar represents the target film thickness, ωT represents the weight of the film thickness, U act Indicates the uniformity of the film, U tar represents the target film uniformity, ωU represents the weight of film uniformity, P act Indicates the optical properties of the film, P tar represents the target film optical performance, ωR represents the weight of the film optical performance, E act Indicates the mechanical properties of the film, E tar represents the target film mechanical properties, and ωE represents the weight of the film mechanical properties.

9. The method for preparing electrochromic glass according to claim 8, wherein: The method of performing ultraviolet polymerization on the solution electrochromic substrate using a preset polymerization algorithm to obtain a target electrochromic substrate includes: Establishing an ultraviolet curing device for the solution electrochromic substrate; analyzing ultraviolet curing parameters of the ultraviolet curing device using the aggregation algorithm; Based on the ultraviolet curing parameters, polymerizing the monomers corresponding to the electrochromic substrate of the solution to obtain a polymer network; The target electrochromic substrate of the solution electrochromic substrate is constructed through the polymer network.

10. A device for producing electrochromic glass, characterized in that: The device comprises: A glass substrate solution cleaning module is used to obtain preparation requirements of the color-changing glass to be prepared, determine the ITO glass substrate and electrochromic material of the color-changing glass to be prepared based on the preparation requirements, and perform solution cleaning on the ITO glass substrate to obtain a first cleaned ITO glass substrate; a glass substrate ultrasonic cleaning module, configured to establish an ultrasonic cleaning environment for cleaning the ITO glass substrate, ultrasonically clean the cleaned ITO glass substrate based on the ultrasonic cleaning environment to obtain a second cleaned ITO glass substrate, and calculate a dust coefficient and a grease coefficient of the second cleaned ITO glass substrate; an electrochromic material evaporation module, configured to, when the dust coefficient and grease coefficient simultaneously meet preset dust thresholds and grease thresholds, use the second cleaned ITO glass substrate as the target ITO glass substrate and spare ITO glass substrate for preparing the color-changing glass, place the electrochromic material in a preset evaporation chamber, and configure the evaporation chamber to a high vacuum state; an electrochromic substrate construction module, configured to evaporate the electrochromic material in the high vacuum state to obtain evaporated electrochromic material, analyze coating parameters of the evaporated electrochromic material on the target ITO glass substrate using a preset coating control function, and execute coating of the evaporated electrochromic material on the target ITO glass substrate based on the coating parameters to obtain an electrochromic substrate; The electrochromic glass building module is used to integrate a preset monomer solution into the electrochromic substrate to obtain a solution electrochromic substrate, and to perform ultraviolet polymerization on the solution electrochromic substrate using a preset polymerization algorithm to obtain a target electrochromic substrate. The target electrochromic substrate and the spare ITO glass substrate are packaged to obtain electrochromic glass.

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