Cleaning device

Abstract

A cleaning device is applied to a single crystal furnace auxiliary chamber, which comprises a supporting assembly, a cleaning structure, a cleaning cloth and a first driving assembly. The supporting assembly comprises first and second supporting discs. The cleaning structure comprises first and second cleaning assemblies arranged on the front surfaces of the two supporting discs. Each assembly comprises a reel, a guide and a supporting part arranged near the edge of the inner wall of the auxiliary chamber and facing the inner wall. One end of the cleaning cloth is wound around the first reel, the other end is wound around the second reel, the middle part is sequentially supported by the supporting surface of the first supporting part, the first guide, the second guide and the supporting surface of the second supporting part, and is tensioned between the two discs to form a cleaning path. The first driving assembly drives the two reels to rotate in opposite directions, so that the cleaning cloth moves along the path to clean the inner wall. The application can avoid uneven manual force, improve cleaning efficiency and eliminate safety hazards.

Description

Technical Field

[0001] This application relates to the field of semiconductor technology, and more specifically to a cleaning device. Background Technology

[0002] In single crystal growth equipment, the sub-chamber of the single crystal furnace is typically a small-diameter (generally less than 0.5 meters) and deep (greater than 2 meters) tubular structure perpendicular to the ground, with a tungsten wire rope arranged at its center. After the single crystal rod is pulled, dust particles such as silicon oxide often adhere to the inner wall of the sub-chamber, requiring cleaning and wiping to ensure the cleanliness of the equipment. In related technologies, for cleaning such slender tubular sub-chambers, a common method is to attach a dust-free cleaning cloth to one end of a long rod. The operator applies force to move the cleaning cloth up and down along the axis of the sub-chamber to wipe and clean the inner wall surface.

[0003] However, the above solution has at least the following drawbacks: manual operation is time-consuming and labor-intensive and the cleaning effect is not good. Summary of the Invention

[0004] According to one aspect of this application, a cleaning device is provided for use in a sub-chamber of a single crystal furnace, the cleaning device comprising:

[0005] The support components include a first support plate and a second support plate;

[0006] Clean structure, including:

[0007] A first cleaning component is disposed on the front side of the first support plate, and a second cleaning component is disposed on the front side of the second support plate; the first cleaning component includes a first reel, a first guide, and a first support portion, the first support portion being located at the edge of the first support plate near the inner wall of the single crystal furnace sub-chamber and having a support surface facing the inner wall of the single crystal furnace sub-chamber; the second cleaning component includes a second reel, a second guide, and a second support portion, the second support portion being located at the edge of the second support plate near the inner wall of the single crystal furnace sub-chamber and having a support surface facing the inner wall of the single crystal furnace sub-chamber.

[0008] A cleaning cloth, one end of which is wound around the first roll and the other end of which is wound around the second roll, and the middle part of the cleaning cloth passes sequentially through the support surface of the first support part, the first guide, the second guide, and the support surface of the second support part, forming a cleaning path tensioned between the first support plate and the second support plate;

[0009] A first drive assembly is used to drive the first and second reels to rotate in opposite directions, so that the cleaning cloth is released from one of the reels and wound up by the other reel. During the process, the cleaning cloth moves along the cleaning path and cleans the inner wall of the single crystal furnace sub-chamber through the area where the cleaning cloth passes the support surface.

[0010] In some embodiments of this application, the first support disk and the second support disk are connected by a connecting component, which is configured to adjust the distance between the first support disk and the second support disk to adapt to single crystal furnace sub-chambers with different inner wall diameters.

[0011] In some embodiments of this application, the connecting component includes:

[0012] A connecting groove is provided on the first support plate;

[0013] A connecting strip, one end of which is disposed on the second support plate and the other end is inserted into at least part of the connecting groove, and the connecting strip is provided with a plurality of positioning holes spaced apart along its length;

[0014] The fastener is configured to selectively pass through the positioning holes at different positions to fix the connecting strip to the connecting groove. The distance between the first support plate and the second support plate can be adjusted by adjusting the insertion depth of the connecting strip in the connecting groove.

[0015] In some embodiments of this application, both the first support portion and the second support portion include:

[0016] The top support and the bottom support are both oriented to match the inner wall of the sub-chamber of the single crystal furnace;

[0017] Multiple rotatable cylinders are rotatably connected at both ends to the top support and the bottom support, and the multiple rotatable cylinders are distributed at intervals along the direction of the top support and the bottom support.

[0018] Mounting bracket, connected to the top bracket and / or bottom bracket, wherein the mounting bracket has a through hole in the middle;

[0019] Both the first and second support plates are provided with support columns, and the first and second support parts are sleeved on the corresponding support columns through the through holes.

[0020] In some embodiments of this application, at least the rotating cylinder in the first and second support portions is made of an elastic material, and the first and second support portions form an interference contact with the inner wall of the single crystal furnace sub-chamber through the elastic deformation of the elastic material.

[0021] In some embodiments of this application, a plurality of the self-rotating cylinders form a rolling support array disposed along the edge of the support disk, the outer wall surface of the rolling support array constitutes the support surface of the support portion, and the support surface is an arc surface that matches the inner wall of the single crystal furnace sub-chamber.

[0022] In some embodiments of this application, a rolling assembly is provided on the back side of the first support disk and the back side of the second support disk. Each rolling assembly includes at least one helical roller assembly, which can rotate along its own axis and form a rolling contact with the inner wall of the single crystal furnace auxiliary chamber.

[0023] The cleaning device further includes a second drive assembly, which is configured to drive at least one of the spiral roller sets to rotate around the central axis of the support assembly, and to realize the upward or downward movement of the support assembly along the axial direction of the single crystal furnace sub-chamber through the rolling engagement of the spiral roller sets with the inner wall of the single crystal furnace sub-chamber.

[0024] In some embodiments of this application, the total length of the spiral grooves on the spiral roller assembly is not less than the perimeter of the inner wall of the single crystal furnace auxiliary chamber.

[0025] In some embodiments of this application, the scrolling component further includes:

[0026] The mounting block has a mounting groove extending radially on the back of the support plate, and the mounting block is slidably connected to the mounting groove. The spiral roller assembly is rotatably mounted on the mounting block via a rotating shaft.

[0027] An elastic element is disposed in the mounting groove and abuts against the mounting block, configured to apply an elastic force radially outward along the mounting groove to the mounting block, so that the spiral roller assembly forms an elastic interference contact with the inner wall of the single crystal furnace sub-chamber under the action of the elastic force.

[0028] In some embodiments of this application, the first support disk and the second support disk are respectively provided with a first half-groove and a second half-groove at the edges away from the inner wall of the single crystal furnace. When the first support disk and the second support disk are close together, the first half-groove and the second half-groove are joined together to form a through groove for the seed crystal rope to pass through. The through groove extends from the center of the support assembly to the edge and has an opening to allow the seed crystal rope to enter and exit the through groove through the opening.

[0029] In some embodiments of this application, when the seed crystal rope is in the through groove, the cleaning cloth between the first guide and the second guide is tangent to the seed crystal rope.

[0030] The cleaning device of this application solves the defects of manual cleaning operations through the cooperation of support components, cleaning structure, cleaning cloth and first drive component: On the one hand, the first drive component drives the first roller and the second roller to rotate in opposite directions, so that the cleaning cloth moves evenly along the taut cleaning path. The cleaning cloth cleans the inner wall of the single crystal furnace auxiliary chamber in the area passing through the support surface, avoiding the problem of inconsistent cleaning force caused by uneven manual force application, improving work efficiency, reducing labor intensity and ensuring cleaning effect; On the other hand, the device can automatically complete the cleaning operation, and the operator does not need to be in the high-risk area below the auxiliary chamber, eliminating the safety hazard of accidental falling heavy objects and solving the problem of production safety hazards. Attached Figure Description

[0031] The above and other objects, features, and advantages of this application will become more apparent from the more detailed description of the embodiments of this application in conjunction with the accompanying drawings. The drawings are provided to further illustrate the embodiments of this application and form part of the specification. They are used together with the embodiments of this application to explain this application and do not constitute a limitation thereof. In the drawings, the same reference numerals generally represent the same components or steps.

[0032] Figure 1 A perspective view of a cleaning apparatus according to an embodiment of this application is shown.

[0033] Figure 2 A partial explosion diagram of a cleaning apparatus according to an embodiment of this application is shown.

[0034] Figure 3 An exploded schematic diagram of a cleaning apparatus according to an embodiment of this application is shown.

[0035] Figure 4 A schematic diagram of the support portion according to an embodiment of this application is shown.

[0036] Figure 5 A schematic diagram of a cleaning apparatus according to an embodiment of this application performing a cleaning operation is shown.

[0037] Figure 6 A schematic diagram is shown showing the cleaning cloth between the first guide and the second guide being tangent to the seed crystal rope. Detailed Implementation

[0038] The following description provides numerous specific details to offer a more thorough understanding of this application. However, it will be apparent to those skilled in the art that this application can be practiced without one or more of these details. In other instances, certain technical features well-known in the art have not been described to avoid confusion with this application.

[0039] It should be understood that this application can be implemented in various forms and should not be construed as limited to the embodiments set forth herein. Rather, providing these embodiments will make the disclosure thorough and complete, and will fully convey the scope of this application to those skilled in the art. In the drawings, for clarity, the dimensions and relative dimensions of layers and regions may be exaggerated. The same reference numerals denote the same elements throughout.

[0040] The sub-chamber of a single crystal furnace is a small-diameter, deep component. In related technologies, a common approach is to attach a dust-free cleaning cloth to one end of a long rod, and then have an operator manually move the cleaning cloth up and down along the axial direction of the sub-chamber to wipe and clean the inner wall surface.

[0041] Manual cleaning operations have at least the following drawbacks: First, due to the difficulty in uniformly controlling the force applied manually, the cleaning intensity on the inner wall of the furnace cylinder is inconsistent, resulting in low work efficiency, high labor intensity, and difficulty in guaranteeing the cleaning effect. Second, operators are located in a high-risk area below the auxiliary chamber, facing the safety risk of accidental falling heavy objects, posing a significant production safety hazard.

[0042] To address one or more of the aforementioned problems, this application provides a cleaning device applied to a single crystal furnace auxiliary chamber. The cleaning device includes:

[0043] The support components include a first support plate and a second support plate;

[0044] Clean structure, including:

[0045] A first cleaning component is disposed on the front side of the first support plate, and a second cleaning component is disposed on the front side of the second support plate; the first cleaning component includes a first reel, a first guide, and a first support portion, the first support portion being located at the edge of the first support plate near the inner wall of the single crystal furnace sub-chamber and having a support surface facing the inner wall of the single crystal furnace sub-chamber; the second cleaning component includes a second reel, a second guide, and a second support portion, the second support portion being located at the edge of the second support plate near the inner wall of the single crystal furnace sub-chamber and having a support surface facing the inner wall of the single crystal furnace sub-chamber.

[0046] A cleaning cloth, one end of which is wound around the first roll and the other end of which is wound around the second roll, and the middle part of the cleaning cloth passes sequentially through the support surface of the first support part, the first guide, the second guide, and the support surface of the second support part, forming a cleaning path tensioned between the first support plate and the second support plate;

[0047] A first drive assembly is used to drive the first and second reels to rotate in opposite directions, so that the cleaning cloth is released from one of the reels and wound up by the other reel. During the process, the cleaning cloth moves along the cleaning path and cleans the inner wall of the single crystal furnace sub-chamber through the area where the cleaning cloth passes the support surface.

[0048] According to the cleaning device of this application, the defects of manual cleaning operations are solved by the cooperation of the support component, the cleaning structure, the cleaning cloth and the first drive component. On the one hand, the first drive component drives the first roller and the second roller to rotate in opposite directions, so that the cleaning cloth moves evenly along the taut cleaning path. The cleaning cloth cleans the inner wall of the single crystal furnace sub-chamber in the area where it passes through the support surface, avoiding the problem of inconsistent cleaning force caused by uneven manual force application, improving work efficiency, reducing labor intensity and ensuring cleaning effect. On the other hand, the device can automatically complete the cleaning operation. The operator does not need to be in the high-risk area below the sub-chamber, eliminating the safety hazard of accidental falling of heavy objects and solving the problem of production safety hazards.

[0049] To fully understand this application, detailed steps and structures will be presented in the following description to illustrate the technical solutions proposed in this application. Preferred embodiments of this application are described in detail below; however, in addition to these detailed descriptions, this application may have other implementation methods.

[0050] The following is for reference. Figures 1-6 This application describes a cleaning apparatus according to one embodiment. The cleaning apparatus is applied to a single crystal furnace auxiliary chamber 200. For example... Figures 1-4 As shown, the cleaning device includes:

[0051] The support assembly includes a first support plate 111 and a second support plate 112;

[0052] Clean structure, including:

[0053] A first cleaning assembly is disposed on a first support plate 111 and a second cleaning assembly is disposed on a second support plate 112; the first cleaning assembly includes a first reel 1211, a first guide 1212 and a first support portion 1213, the first support portion 1213 is located at the edge of the first support plate 111 near the inner wall of the single crystal furnace sub-chamber and has a support surface facing the inner wall of the single crystal furnace sub-chamber; the second cleaning assembly includes a second reel 1221, a second guide 1222 and a second support portion 1223, the second support portion 1223 is located at the edge of the second support plate 112 near the inner wall of the single crystal furnace sub-chamber and has a support surface facing the inner wall of the single crystal furnace sub-chamber;

[0054] The cleaning cloth 130 has one end wound around the first roll 1211 and the other end wound around the second roll 1221. The middle part of the cleaning cloth 130 passes sequentially through the support surface of the first support part 1213, the first guide 1212, the second guide 1222, and the support surface of the second support part 1223, forming a cleaning path tensioned between the first support plate 111 and the second support plate 112.

[0055] The first drive assembly is used to drive the first spool 1211 and the second spool 1221 to rotate in opposite directions, so that the cleaning cloth 130 is released from one of the spools and wound up by the other spool. During the process, the cleaning cloth 130 moves along the cleaning path and cleans the inner wall of the single crystal furnace sub-chamber through the area where the cleaning cloth 130 passes the support surface.

[0056] In use, the cleaning device of this embodiment is first installed in the sub-chamber 200 of the single crystal furnace. Through the support parts on the edges of the first support plate 111 and the second support plate 112, the cleaning cloth 130 forms a close contact with the inner wall of the sub-chamber of the single crystal furnace through the support surfaces of the first support part 1213 and the second support part 1223, respectively. Then, the first drive component controls the first roller 1211 and the second roller 1221 to rotate in opposite directions. Through the cyclical motion of the cleaning cloth 130 being released from one roller and rolled up by the other roller, the automatic wiping and cleaning of the inner wall of the sub-chamber of the single crystal furnace is realized. This process does not require manual application of force, which significantly reduces the labor intensity of the operator.

[0057] Furthermore, the cleaning cloth 130, via the first support 1213, the first guide 1212, the second guide 1222, and the second support 1223, forms a cleaning path tensioned between the two support plates. This structural design precisely guides the movement trajectory of the cleaning cloth 130 through the guides, thereby avoiding the deviation or loosening of the cleaning cloth 130 caused by uneven force during manual operation. This ensures that the cleaning cloth 130 adheres to the inner wall of the single crystal furnace chamber with a relatively constant contact pressure, effectively improving the efficiency and uniformity of the cleaning operation.

[0058] Moreover, the cleaning cloth 130 is driven by the first drive component to roll up and clean the inner wall of the single crystal furnace auxiliary chamber, achieving a fully automated operation. Operators do not need to stand in the high-risk area below the auxiliary chamber, fundamentally avoiding the safety risks caused by the falling tungsten wire rope or equipment parts.

[0059] It is worth noting that in the cleaning path arrangement of the support components, the support surface of the first support part 1213 is configured such that the front side of the cleaning cloth 130 faces the inner wall of the single crystal furnace sub-chamber, while the support surface of the second support part 1223 is configured such that the back side of the cleaning cloth 130 faces the inner wall. The two configurations are formed by the cleaning cloth 130's cross-flow between the first and second guide components, creating a Möbius strip-like spatial curved surface structure. This arrangement allows the cleaning cloth 130 to contact the inner wall of the sub-chamber with both its front and back sides sequentially as it circulates along the cleaning path, achieving a double-sided alternating cleaning function. This fully utilizes the effective wiping area of ​​the cleaning cloth 130, significantly improving material utilization compared to the traditional single-sided cleaning mode.

[0060] Depending on the actual cleaning needs, the cleaning cloths 130 of the first support 1213 and the second support 1223 can also be set to face opposite directions. That is, the support surface of the first support 1213 uses the back of the cleaning cloth 130 to contact the inner wall surface, and the support surface of the second support 1223 uses the front to contact. Both arrangements can achieve a double-sided cleaning effect through the cyclic movement of the cleaning cloth 130. Therefore, this solution does not impose specific limitations on the orientation combination of the support surface and the cleaning cloth 130. It only needs to ensure that the cleaning cloth 130 forms a wiping structure that can be used alternately on both sides when it is tensioned along the cleaning path.

[0061] In some embodiments, the first drive assembly includes multiple independently controlled sub-drive assemblies (e.g., power devices such as motors, the specific type is not limited), each sub-drive assembly establishing a transmission connection with the first reel 1211 and the second reel 1221 respectively. The sub-drive assemblies can adopt two installation forms: one is a built-in structure, i.e., a hollow shaft motor integrated inside the reel, directly driving the reel to rotate; the other is an external structure, connected to the reel through transmission components such as couplings and synchronous pulleys. By controlling the direction signals of the sub-drive assemblies, the first reel 1211 and the second reel 1221 can rotate synchronously in opposite directions.

[0062] As an alternative, the first spool 1211 and the second spool 1221 can be driven by the same power source. In this case, the first drive assembly is configured as a composite drive device including a differential gear set (e.g., a motor with an integrated gearbox), which converts the forward rotational motion of a single motor into the reverse rotational output of the two spools through the velocity decomposition characteristics of the gear system. This solution achieves synchronous control of the reverse rotation through a mechanical transmission mechanism, eliminating the need for independent control signals.

[0063] It should be noted that during the process of the cleaning cloth 130 being released from one reel and wound up by the other, the thickness of the cleaning cloth 130 wound on the first reel 1211 and the second reel 1221 changes in real time, causing the winding radius of the two reels to change dynamically. To ensure that the linear velocity of the cleaning cloth 130 between the two reels remains constant, thereby maintaining its tension stability, whether multiple independently controlled sub-drive components are used to drive the first reel 1211 and the second reel 1221 to rotate synchronously in opposite directions, or the two reels are driven synchronously in opposite directions by the same power source, the rotation speed of the two reels must be dynamically adjusted according to the change in the winding radius (i.e., the rotation speeds of the two reels are usually different). Specifically, when the winding radius of the reel increases due to the increased thickness of the cleaning cloth 130, the rotation speed of the reel decreases accordingly; conversely, when the winding radius of the reel decreases due to the release of the cleaning cloth 130, its rotation speed increases accordingly. Based on the kinematic formula v=ω·r (where v is the linear velocity, ω is the rotational speed, and r is the winding radius of the roller), by matching the rotational speed and radius of the two rollers in real time, it can be ensured that the linear velocity of the cleaning cloth 130 on the two rollers remains consistent.

[0064] Both drive architectures described above employ reasonable power transmission design to ensure that the cleaning cloth 130 maintains stable tension during winding / unwinding. The specific selection of drive component types (such as motor type), installation methods (built-in or external), and transmission mechanism designs (gears, belts, etc.) can be adaptively adjusted according to the spatial dimensions of the single crystal furnace auxiliary chamber 200, the load characteristics of the cleaning cloth 130, and the control precision requirements, and all of these should be considered to fall within the protection scope of this application.

[0065] In some embodiments, the first support disk 111 and the second support disk 112 are connected by a connecting assembly, which is configured to adjust the distance between the first support disk 111 and the second support disk 112 to accommodate single crystal furnace auxiliary chambers 200 with different inner wall diameters. For example, as... Figure 2 and Figure 3 As shown, the connecting assembly includes a connecting groove 141 disposed on the first support plate 111; a connecting strip 142, one end of which is disposed on the second support plate 112 and the other end is inserted into at least part of the connecting groove 141, and the connecting strip 142 is provided with a plurality of positioning holes 1421 at intervals along its length; and a fastener configured to selectively pass through the positioning holes 1421 at different positions to fix the connecting strip 142 to the connecting groove 141, and the distance between the first support plate 111 and the second support plate 112 can be adjusted by adjusting the insertion depth of the connecting strip 142 in the connecting groove 141.

[0066] In the actual assembly process, firstly, based on the inner wall diameter of the single crystal furnace auxiliary chamber 200, the insertion depth of the connecting strip 142 in the connecting groove 141 is adjusted, causing the two support plates to move relative to each other along the length of the connecting strip 142 until the support surfaces of the first support part 1213 and the second support part 1223 both abut against the inner wall of the single crystal furnace auxiliary chamber. Then, the fixing member is inserted into the corresponding positioning hole 1421 to lock the spacing, so that the connecting strip 142 and the connecting groove 141 are fixedly connected, completing the locking of the spacing between the two support plates. This adjustment process, through the matching of the insertion depth of the connecting strip 142 in the connecting groove 141, combined with the selective locking of the positioning hole 1421 by the fixing member, achieves the adaptive adjustment of the cleaning device, enabling the cleaning device to accurately match single crystal furnace auxiliary chambers 200 of different diameters. This effectively solves the compatibility problem caused by the size difference of the single crystal furnace auxiliary chamber 200 of traditional cleaning tools, significantly expanding the engineering application range of the cleaning device.

[0067] It is worth noting that the first connecting groove 141 can be provided only on the first support plate 111, with one end of the connecting strip 142 fixedly disposed on the second support plate 112 and the other end inserted into at least part of the first connecting groove 141. By changing the insertion depth of the connecting strip 142 in the first connecting groove 141, the distance between the first support plate 111 and the second support plate 112 can be adjusted. Alternatively, while providing the first connecting groove 141 on the first support plate 111, a second connecting groove 141 can also be provided on the second support plate 112. One end of the connecting strip 142 is inserted into at least part of the first connecting groove 141 and the other end is inserted into at least part of the second connecting groove 141. This allows for changing either the insertion depth of the connecting strip 142 in the first or second connecting groove 141, thereby adjusting the distance between the first support plate 111 and the second support plate 112.

[0068] Alternatively, the connecting components can also adopt other adjustable structures, and their specific structures are not limited. For example, a threaded telescopic rod structure can also be used, with both ends of the telescopic rod connected to the first and second support plates 112 respectively. By rotating the telescopic rod, its effective length can be changed, thereby adapting to single crystal furnace auxiliary chambers 200 with different inner wall diameters.

[0069] The connecting groove 141 can be a "T" shaped groove or any other suitable shape, and there is no limitation on it.

[0070] The fastener can be a fixing screw or the like, and there is no limitation on it.

[0071] It should be noted that the distance between the adjusted first support plate 111 and the second support plate 112 is slightly smaller than the inner wall diameter of the single crystal furnace auxiliary chamber 200 that needs to be cleaned. For example, the difference between the two is within 5 mm.

[0072] In some embodiments, such as Figure 4 As shown, both the first support portion 1213 and the second support portion 1223 include:

[0073] The top support 1202 and the bottom support 1203 are both oriented to match the inner wall of the single crystal furnace auxiliary chamber.

[0074] Multiple rotatable cylinders 1204 are rotatably connected at both ends to a top support 1202 and a bottom support 1203, and the multiple rotatable cylinders 1204 are distributed at intervals along the direction of the top support 1202 and the bottom support 1203.

[0075] Mounting bracket 1205 is connected to top bracket 1202 and / or bottom bracket 1203, and mounting bracket 1205 has a through hole in the middle.

[0076] Both the first support plate 111 and the second support plate 112 are provided with support columns 1201, and the first support part 1213 and the second support part 1223 are sleeved on the corresponding support column 1201 through through holes.

[0077] Specifically, the support column 1201 is vertically positioned on the front of the support plate. Both the top bracket 1202 and the bottom bracket 1203 are designed as arc-shaped structures matching the curvature of the inner wall of the single crystal furnace auxiliary chamber, arranged symmetrically in parallel. Multiple rotatable cylinders 1204 are connected to the top bracket 1202 and the bottom bracket 1203 by rotation, and are evenly spaced along the circumference of the arc-shaped brackets, forming a rolling support array along the edge of the support plate. The outer wall of this array constitutes the support surface of the support unit, and its contour surface is adapted to the curvature of the inner wall of the single crystal furnace auxiliary chamber. The mounting bracket 1205 can adopt a butterfly-shaped structure design. The ends of the two butterfly-shaped wing plates are fixedly connected to the top bracket 1202 and the bottom bracket 1203. A positioning through-hole matching the outer diameter of the support column 1201 is opened in the middle of the butterfly-shaped abdomen. Through this through-hole, the entire support unit is fitted onto the support column 1201, achieving a limited degree of rotational freedom of the support unit around the axis of the column.

[0078] During the cleaning process, the cleaning cloth 130 maintains constant tension along the cleaning path. Its outer surface forms a sliding wiping fit with the inner wall of the single crystal furnace sub-chamber, while its inner surface rolls against the outer circumferential surface of the rotating cylinder 1204. As the cleaning cloth 130 moves along the cleaning path, the rotating cylinder 1204 rotates synchronously around its own axis under the drive of friction, transforming traditional sliding friction into rolling friction. This effectively reduces the sliding friction between the support and the cleaning cloth 130 and provides guidance and constraint for the movement trajectory of the cleaning cloth 130. Through the curved surface adaptation characteristics of the rolling support array and the rolling friction characteristics of the rotating cylinder 1204, the curved surface fitting accuracy between the cleaning cloth 130 and the inner wall of the single crystal furnace sub-chamber is ensured, while the movement resistance of the cleaning cloth 130 is significantly reduced. This ensures that the cleaning cloth 130 maintains trajectory stability during reciprocating motion, effectively improving the uniformity and reliability of the cleaning operation.

[0079] In addition, the support part is fitted onto the support column 1201 through the through hole in the middle of the mounting bracket 1205, which enables quick matching and replacement of the support part.

[0080] In some embodiments, at least the rotatable cylinder 1204 in the first support portion 1213 and the second support portion 1223 is made of an elastic material, and the first support portion 1213 and the second support portion 1223 form an interference contact with the inner wall of the single crystal furnace sub-chamber through the elastic deformation of the elastic material.

[0081] For example, both the first support portion 1213 and the second support portion 1223 are made of elastic material. The elastic modulus of the elastic material is configured such that the outer diameter of the support portion in its natural state is larger than the inner diameter of the single crystal furnace sub-chamber 200. When the support assembly is installed in the single crystal furnace sub-chamber 200, the first support portion 1213 and the second support portion 1223 form an interference contact with the inner wall of the sub-chamber through elastic deformation, so as to ensure that the cleaning cloth 130 and the inner wall of the single crystal furnace sub-chamber maintain a relatively constant contact pressure.

[0082] The elastic material can be elastic metal, elastic plastic, etc., and there are no restrictions on the type.

[0083] In some embodiments, such as Figures 1-3 As shown, the first support plate 111 and the second support plate 112 are respectively provided with a first half-groove 151 and a second half-groove 152 at the edges away from the inner wall of the single crystal furnace. When the first support plate 111 and the second support plate 112 are close to each other, the first half-groove 151 and the second half-groove 152 are joined together to form a through groove 150. The through groove 150 extends from the center of the support assembly to the edge and has an opening to allow the seed crystal rope 300 to enter and exit the through groove 150 through the opening.

[0084] Even when the two support plates are tightly connected due to the small diameter of the inner wall of the single crystal furnace auxiliary chamber 200, the through-slot 150 with an opening still provides an independent passageway for the seed crystal rope 300 during the use of the cleaning device. The seed crystal rope 300 can be inserted into the through-slot 150 along the opening without disassembling or separating the support plates, ensuring that the seed crystal rope 300 does not interfere with the cleaning operation of the inner wall of the single crystal furnace auxiliary chamber when passing through the support assembly. When the cleaning operation is completed and the cleaning device needs to be removed, there is no need to adjust the support plate spacing; the seed crystal rope 300 can be directly withdrawn from the through-slot 150 along the opening, ensuring rapid separation of the cleaning device and the seed crystal rope 300. This design ensures continuous wiping of the inner wall of the single crystal furnace auxiliary chamber by the cleaning cloth 130 under tension, while allowing the seed crystal rope 300 to pass through the support assembly unimpeded during installation and removal. This avoids the installation interference problems of the seed crystal rope 300 caused by traditional cleaning tools, achieves compatibility between the cleaning device and the original seed crystal system of the single crystal furnace, and significantly improves the continuity and ease of operation of the equipment.

[0085] In addition, the existing technology uses a manual tool with a dust-free cleaning cloth attached to the end of a long rod, which can only achieve contact cleaning of the inner wall of the auxiliary chamber, but cannot effectively clean the surface of the seed crystal rope 300, resulting in a technical defect of limited cleaning targets.

[0086] The cleaning device proposed in this application overcomes the aforementioned technical bottlenecks through an innovative guiding structure design: when the seed crystal rope 300 is within the through groove 150, the cleaning cloth 130 between the first guide 1212 and the second guide 1222 is tangent to the seed crystal rope 300. For example, as... Figure 6 As shown, when the seed crystal rope 300 enters the through groove 150, the guiding assembly composed of the first guide member 1212 and the second guide member 1222 constrains the middle section of the cleaning cloth 130 into a geometric shape tangent to the outer contour of the seed crystal rope 300. Under the guidance of the two guide members, as the cleaning cloth 130 moves along the cleaning path, a dynamic friction interface is formed in the tangential contact area with the seed crystal rope 300, thereby achieving continuous wiping and cleaning of the deposits on the surface of the seed crystal rope 300.

[0087] In one specific embodiment: the diameter of the seed crystal rope 300 is 5mm to 6mm, and the cleaning cloth 130 is located in the middle section between the two guides, with a distance of 2mm to 3mm from the central axis of the cleaning device. These parameters ensure that the surface of the cleaning cloth 130 and the outer circumference of the seed crystal rope 300 meet the tangential condition, forming a stable tangential contact cleaning area. This allows for the cleaning of the seed crystal rope 300 while simultaneously cleaning the inner wall of the single crystal furnace auxiliary chamber.

[0088] In some embodiments, such as Figure 2 and Figure 3As shown, rolling components are provided on the back of the first support plate 111 and the back of the second support plate 112. Each rolling component includes at least one helical roller assembly 161. The helical roller assembly 161 can rotate along its own axis and form a rolling contact with the inner wall of the single crystal furnace sub-chamber. The cleaning device also includes a second drive assembly, which is configured to drive at least one helical roller assembly 161 to rotate around the central axis of the support assembly. The rolling contact between the helical roller assembly 161 and the inner wall of the single crystal furnace sub-chamber enables the support assembly to rise or fall along the axial direction of the single crystal furnace sub-chamber 200.

[0089] The second drive assembly may include one or more independently controlled sub-drive assemblies (such as motors or other power devices, the specific type of which is not limited), each sub-drive assembly establishing a transmission connection with a spiral roller assembly 161. The sub-drive assemblies can adopt two installation forms: one is a built-in structure, that is, a hollow shaft motor integrated inside the spiral roller assembly 161, directly driving the roller to rotate; the other is an external structure, connected to the spiral roller assembly 161 through a coupling, synchronous pulley, or other transmission components.

[0090] As an alternative, when the second drive assembly drives the multiple helical roller groups 161 to move, the first drive assembly can also be configured as a composite drive device including a differential gear set (e.g., a motor with an integrated gearbox). This solution achieves synchronous control of the multiple helical roller groups 161 through a mechanical transmission mechanism, without the need for independent control signals.

[0091] Both drive architectures described above employ reasonable power transmission design to ensure that the spiral roller assembly 161 rolls within the single crystal furnace sub-chamber 200 and rises or falls axially. The specific selection of drive component types (such as motor type), installation methods (built-in or external), and transmission mechanism design (gears, belts, etc.) can be adaptively adjusted according to the spatial dimensions of the single crystal furnace sub-chamber 200, the size of the cleaning cloth 130, and control precision requirements; all of these should be considered within the scope of protection of this application.

[0092] When the cleaning device is in operation, the second drive assembly is activated, driving the spiral roller assembly 161 to rotate around the central axis of the support assembly. Because the spiral grooves on the outer circumference of the spiral roller assembly 161 roll in contact with the inner wall of the single crystal furnace sub-chamber, this rotational motion is decomposed into tangential and axial forces at the contact point. The tangential force drives the cleaning device to rotate along its own axis, while the axial force pushes the entire cleaning device upwards or downwards along the axial direction of the single crystal furnace sub-chamber 200, the specific direction of motion depending on the actual situation.

[0093] By precisely controlling the speed of the drive motor, the axial movement speed of the support assembly can be matched with the retraction and extension speed of the cleaning cloth 130, ensuring that the cleaning cloth 130 maintains a relatively constant tension during wiping. At the same time, the rolling contact method of the spiral roller assembly 161 significantly reduces motion resistance, reduces wear on the inner wall of the sub-chamber 200 of the single crystal furnace, and achieves smooth and efficient movement of the cleaning device within the sub-chamber.

[0094] In some embodiments, the spiral groove of the spiral roller assembly 161 is configured such that the total length of the spiral groove is not less than the circumference of the inner wall of the single crystal furnace auxiliary chamber, so that when the support assembly rotates around the central axis, the axial displacement achieved by the rolling engagement between the spiral roller assembly 161 and the inner wall of the single crystal furnace auxiliary chamber does not exceed the axial height of the spiral roller assembly 161, thereby ensuring that the cleaning cloth 130 forms a continuous cleaning path covering the inner wall of the single crystal furnace auxiliary chamber during a single circular motion.

[0095] As a preferred option, the height of the spiral roller assembly 161 is greater than or equal to the height of the cleaning cloth 130.

[0096] In some embodiments, such as Figure 2 and Figure 3 As shown, the scrolling component also includes:

[0097] Mounting block 162, the back of the support plate has a mounting groove 163 extending radially, the mounting block 162 is slidably connected to the mounting groove 163, and the spiral roller assembly 161 is rotatably mounted on the mounting block 162 via a rotating shaft;

[0098] An elastic element is disposed in the mounting groove 163 and abuts against the mounting block 162. It is configured to apply an elastic force to the mounting block 162 radially outward along the mounting groove 163, so that the spiral roller assembly 161 forms an elastic interference contact with the inner wall of the single crystal furnace under the action of the elastic force.

[0099] For example, each helical roller assembly 161 is radially floating-mounted via an independent mounting block 162: the mounting block 162 forms a sliding guide engagement with a radial mounting groove 163 opened on the back of the support plate, and the helical roller assembly 161 is rotatably mounted on the mounting block 162 via a rotating shaft. An elastic element is disposed within the mounting groove 163 and abuts against the mounting block 162 to form a preload loading mechanism.

[0100] In the initial compressed state of the elastic element, the elastic preload pushes the mounting block 162 radially outward along the mounting groove 163, causing the outer circumferential surface of the spiral roller assembly 161 to form an elastic interference contact with the inner wall of the single crystal furnace sub-chamber. This interference contact state can adapt to the diameter tolerance and local deformation of the inner wall of the sub-chamber, ensuring the stability of the rolling contact. By adjusting the compression amount of the elastic element or selecting elastic elements with different elastic coefficients, the normal contact force between the spiral roller assembly 161 and the inner wall surface can be precisely controlled, thereby adjusting the magnitude of the friction force between the contact surfaces.

[0101] The mounting block 162 can be an I-shaped mounting block 162. Correspondingly, the back of the support plate is provided with an I-shaped mounting groove 163 extending radially. Alternatively, the mounting block 162 and the mounting groove 163 can also be other structural shapes, which are not limited.

[0102] The elastic element can be a compression spring or an elastic rubber body, etc., and there are no restrictions on this.

[0103] In some embodiments, the cleaning device also integrates a power supply 170 to power the cleaning device, and / or the cleaning device draws power from an external power supply 170 via a plug. For example, as... Figure 3 As shown, a power supply 170 is integrated on the back of the second support plate 112.

[0104] In some embodiments, the cleaning device may further integrate a remote control element 180. The remote control element 180 establishes a data connection with the first drive component and the second drive component via an industrial Ethernet or wireless communication protocol, enabling operators to remotely configure and monitor the operating parameters of the cleaning device (such as the roller speed, the speed of the spiral roller assembly 161, etc.) in a control room or safe area.

[0105] This remote control architecture allows operators to issue cleaning commands and receive device status feedback via a human-machine interface without remaining in the high-risk work area below the auxiliary chamber, achieving fully automated control of the cleaning process. This design fundamentally avoids the safety risks caused by accidental falls of heavy objects in traditional manual operations, further improving the safety and reliability of cleaning operations in the single crystal furnace auxiliary chamber 200.

[0106] Combination Figures 1-5Taking a single crystal furnace auxiliary chamber 200 with an inner diameter of 500mm as an example, the total height of the cleaning device is designed to be 215mm. The height of both the spiral roller assembly 161 and the cleaning cloth 130 is 100mm, and the thickness of both the first support plate 111 and the second support plate 112 is 15mm. The spiral roller assembly 161 has a diameter of 50mm and a spiral groove pitch of 10mm. When the spiral roller assembly 161 rotates around the inner wall of the auxiliary chamber, the device simultaneously rises or falls by approximately 100mm. The support plate radius is 240mm, and the seed crystal rope through groove 150 formed by the two plates is 5mm wide, meeting the equipment's wiring requirements.

[0107] During installation, the initial distance between the first support plate 111 and the second support plate 112 is adjusted to 15mm using a connecting assembly, and a fixing piece is used to achieve a fixed connection through the positioning hole 1421. The outer side of the spiral roller assembly 161 extends 4mm beyond the support plate, and the compression spring embedded in the I-shaped mounting groove 163 generates an elastic deformation of about 3mm after the cleaning cloth 130 is installed, forming a preload. According to mechanical calculations, the preload provided by the compression spring makes the friction between the spiral roller assembly 161 and the inner wall of the auxiliary chamber reach more than 1.5 times the weight of the device, ensuring that the displacement of the device in the auxiliary chamber furnace is entirely driven by the spiral rollers, eliminating the risk of gravity slippage.

[0108] The clockwise or counterclockwise rotation of the roller assembly corresponds to the rising or falling mode of the device, respectively. Regardless of whether the device is rising or falling, the cleaning cloth 130 always operates in accordance with... Figure 1 Rotate in the direction indicated by the arrow in the center to ensure consistency of the cleaning trajectory and uniformity of the cleaning effect.

[0109] As an example, the cleaning device rotates once every 5 seconds, advancing 100mm per rotation. Assuming the auxiliary chamber height is 3000mm, the process of wiping twice (rising and falling) takes approximately 5 minutes, achieving a rapid cleaning operation of the single crystal furnace auxiliary chamber 200.

[0110] Based on the above description, the cleaning device according to the embodiments of this application solves the defects of manual cleaning operations through the cooperation of the support component, the cleaning structure, the cleaning cloth, and the first drive component. On the one hand, the first drive component drives the first roller and the second roller to rotate in opposite directions, so that the cleaning cloth moves evenly along the taut cleaning path. The cleaning cloth cleans the inner wall of the single crystal furnace auxiliary chamber in the area passing through the support surface, avoiding the problem of inconsistent cleaning force caused by uneven manual force application, improving work efficiency, reducing labor intensity, and ensuring cleaning effect. On the other hand, the device can automatically complete the cleaning operation, and the operator does not need to be in the high-risk area below the auxiliary chamber, eliminating the safety hazard of accidental falling of heavy objects and solving the problem of production safety hazards.

[0111] Although exemplary embodiments have been described herein with reference to the accompanying drawings, it should be understood that the above exemplary embodiments are merely illustrative and are not intended to limit the scope of this application. Various changes and modifications can be made therein by those skilled in the art without departing from the scope and spirit of this application. All such changes and modifications are intended to be included within the scope of this application as claimed in the appended claims.

[0112] Similarly, it should be understood that, in order to simplify this application and aid in understanding one or more aspects of the application, various features of this application may sometimes be grouped together in a single embodiment, figure, or description thereof in the description of exemplary embodiments of this application. However, this approach should not be construed as reflecting an intention that the claimed application requires more features than are expressly recited in each claim. Rather, as reflected in the corresponding claims, the point of application is that the corresponding technical problem can be solved with fewer features than all of a single disclosed embodiment. Therefore, the claims following the detailed description are hereby expressly incorporated into that detailed description, wherein each claim itself is a separate embodiment of this application.

[0113] Furthermore, those skilled in the art will understand that although some embodiments described herein include certain features but not others included in other embodiments, combinations of features from different embodiments are intended to be within the scope of this application and form different embodiments. For example, in the claims, any one of the claimed embodiments can be used in any combination.

[0114] It should be noted that the above embodiments are illustrative of this application and not limiting of it, and that those skilled in the art can devise alternative embodiments without departing from the scope of the appended claims. In the claims, any reference signs placed between parentheses should not be construed as limiting the claims. The use of the words first, second, and third, etc., does not indicate any order. These words can be interpreted as names.

Claims

1. A cleaning device applied to the auxiliary chamber of a single crystal furnace, characterized in that, The cleaning device includes: The support components include a first support plate and a second support plate; Clean structure, including: A first cleaning component is disposed on the front side of the first support plate, and a second cleaning component is disposed on the front side of the second support plate; the first cleaning component includes a first reel, a first guide, and a first support portion, the first support portion being located at the edge of the first support plate near the inner wall of the single crystal furnace sub-chamber and having a support surface facing the inner wall of the single crystal furnace sub-chamber; the second cleaning component includes a second reel, a second guide, and a second support portion, the second support portion being located at the edge of the second support plate near the inner wall of the single crystal furnace sub-chamber and having a support surface facing the inner wall of the single crystal furnace sub-chamber. A cleaning cloth, one end of which is wound around the first roll and the other end of which is wound around the second roll, and the middle part of the cleaning cloth passes sequentially through the support surface of the first support part, the first guide, the second guide, and the support surface of the second support part, forming a cleaning path tensioned between the first support plate and the second support plate; A first drive assembly is used to drive the first and second reels to rotate in opposite directions, so that the cleaning cloth is released from one of the reels and wound up by the other reel. During the process, the cleaning cloth moves along the cleaning path and cleans the inner wall of the single crystal furnace sub-chamber through the area where the cleaning cloth passes the support surface.

2. The cleaning device as claimed in claim 1, characterized in that, The first support plate and the second support plate are connected by a connecting component, which is configured to adjust the distance between the first support plate and the second support plate to adapt to single crystal furnace sub-chambers with different inner wall diameters.

3. The cleaning device as described in claim 2, characterized in that, The connecting components include: A connecting groove is provided on the first support plate; A connecting strip, one end of which is disposed on the second support plate and the other end is inserted into at least part of the connecting groove, and the connecting strip is provided with a plurality of positioning holes spaced apart along its length; The fastener is configured to selectively pass through the positioning holes at different positions to fix the connecting strip to the connecting groove. The distance between the first support plate and the second support plate can be adjusted by adjusting the insertion depth of the connecting strip in the connecting groove.

4. The cleaning device as claimed in claim 1, characterized in that, Both the first support portion and the second support portion include: The top support and the bottom support are both oriented to match the inner wall of the sub-chamber of the single crystal furnace; Multiple self-rotating cylinders are rotatably connected at both ends to the top support and the bottom support, and the multiple self-rotating cylinders are distributed at intervals along the direction of the top support and the bottom support; Mounting bracket, connected to the top bracket and / or bottom bracket, wherein the mounting bracket has a through hole in the middle; Both the first and second support plates are provided with support columns, and the first and second support parts are sleeved on the corresponding support columns through the through holes.

5. The cleaning device as described in claim 4, characterized in that, At least the rotating cylinder in the first and second support parts is made of an elastic material, and the first and second support parts form an interference contact with the inner wall of the single crystal furnace sub-chamber through the elastic deformation of the elastic material.

6. The cleaning device as claimed in claim 4, characterized in that, Multiple self-rotating cylinders form a rolling support array arranged along the edge of the support disk. The outer wall surface of the rolling support array constitutes the support surface of the support part, and the support surface is an arc surface that matches the inner wall of the single crystal furnace sub-chamber.

7. The cleaning device as claimed in claim 1, characterized in that, Rolling components are provided on the back of the first support plate and the back of the second support plate. Each rolling component includes at least one set of spiral rollers. The set of spiral rollers can rotate along its own axis and form a rolling contact with the inner wall of the single crystal furnace. The cleaning device further includes a second drive assembly, which is configured to drive at least one of the spiral roller sets to rotate around the central axis of the support assembly, and to realize the upward or downward movement of the support assembly along the axial direction of the single crystal furnace sub-chamber through the rolling engagement of the spiral roller sets with the inner wall of the single crystal furnace sub-chamber.

8. The cleaning device as claimed in claim 7, characterized in that, The total length of the spiral grooves on the spiral roller assembly is not less than the perimeter of the inner wall of the single crystal furnace auxiliary chamber.

9. The cleaning device as claimed in claim 7, characterized in that, The scrolling component also includes: The mounting block has a mounting groove extending radially on the back of the support plate, and the mounting block is slidably connected to the mounting groove. The spiral roller assembly is rotatably mounted on the mounting block via a rotating shaft. An elastic element is disposed in the mounting groove and abuts against the mounting block, configured to apply an elastic force radially outward along the mounting groove to the mounting block, so that the spiral roller assembly forms an elastic interference contact with the inner wall of the single crystal furnace sub-chamber under the action of the elastic force.

10. The cleaning device as claimed in claim 1, characterized in that, The first support plate and the second support plate are respectively provided with a first half-groove and a second half-groove at the edges away from the inner wall of the single crystal furnace. When the first support plate and the second support plate are close together, the first half-groove and the second half-groove are joined together to form a through groove for the seed crystal rope to pass through. The through groove extends from the center of the support assembly to the edge and has an opening to allow the seed crystal rope to enter and exit the through groove through the opening.

11. The cleaning device as claimed in claim 10, characterized in that, When the seed crystal rope is in the through groove, the cleaning cloth between the first guide and the second guide is tangent to the seed crystal rope.

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