A high-strength, high-transmittance nanocrystalline glass, its preparation method and application

Abstract

This invention relates to the field of glass-ceramic technology, and particularly to a high-strength, high-transmittance nanocrystalline glass, its preparation method, and its applications. The preparation method includes the following steps: placing raw materials in a crucible for uniform mixing, melting, and clarifying to obtain molten glass; forming the molten glass into glass sheets and cooling to obtain base glass; subjecting the base glass to microstructure pretreatment, cleaning, and drying; subjecting the pretreated base glass to ion exchange strengthening; subjecting the strengthened glass to two-stage heat treatment to obtain nanocrystalline glass; depositing an anti-reflective film layer on the nanocrystalline glass using magnetron sputtering to obtain high-transmittance nanocrystalline glass; transferring the high-transmittance nanocrystalline glass to a fluorocarbon silane solution, and then polymerizing it through fluorine chain interfaces to form an anti-fingerprint layer to obtain anti-fingerprint hydrophobic nanocrystalline glass. The nanocrystalline glass prepared by this invention possesses high strength and high transmittance, meeting the needs of various industries.

Description

Technical Field

[0001] This invention relates to the field of microcrystalline glass technology, and in particular to a high-strength, high-transmittance nanocrystalline glass, its preparation method, and its applications. Background Technology

[0002] Against the backdrop of rapid development in optoelectronic displays, aerospace, and new energy fields, the market demand for advanced materials that simultaneously possess high strength and high light transmittance is becoming increasingly urgent. Traditional soda-lime glass, due to its high brittleness and poor impact resistance, is difficult to meet the application requirements of flexible screens or ultra-thin devices.

[0003] Current research on optical glass focuses on balancing mechanical and optical properties through nanocrystalline phase control (such as β-quartz solid solution). However, existing processes generally suffer from problems such as unstable grain size control and stress concentration caused by interface defects, which restrict their application in scenarios such as large-size ultrathin cover plates (<0.5mm) and optical windows in extreme environments.

[0004] Therefore, there is a need for a method for preparing high-strength, high-transmittance nanocrystalline glass with stable grain size control and its applications. Summary of the Invention

[0005] The main objective of this invention is to provide a high-strength, high-transmittance nanocrystalline glass, its preparation method, and its application, aiming to solve the problems of unstable grain size control and stress concentration caused by interface defects in existing nanocrystalline glass technologies.

[0006] To achieve the above objectives, this invention proposes a method for preparing high-strength, high-transmittance nanocrystalline glass, which includes the following steps:

[0007] The raw materials are placed in a crucible and mixed evenly. The mixture is then melted and clarified in the crucible to obtain molten glass.

[0008] Molten glass is formed into glass sheets with a thickness of 0.3-1.2 mm by casting, rolling or overflow drawing, and then cooled to 550℃~600℃ for heat preservation and annealing to obtain the base glass;

[0009] The base glass was transferred to a beaker containing a 10-15% HF solution, and the surface of the base glass was subjected to microstructure pretreatment for 20-40 seconds. The pretreated base glass was then placed in deionized water for ultrasonic cleaning for 10 minutes and then dried.

[0010] The pretreated base glass was transferred to a high-temperature mixed molten salt containing LiNO3 and AgNO3 for ion exchange strengthening.

[0011] The strengthened glass was placed in an oxidizing atmosphere for preheating. After preheating, it underwent a two-stage heat treatment. In the first stage, the temperature was raised to the nucleation temperature and held. In the second stage, the temperature was raised to the crystallization temperature and held. Then, the temperature was lowered to 350℃~450℃ at a certain rate and held. Finally, it was cooled to room temperature to obtain nanocrystalline glass.

[0012] The nanocrystalline glass is coated with an anti-reflective film by magnetron sputtering to obtain high-transmittance nanocrystalline glass;

[0013] High-transparency nanocrystalline glass is transferred to a fluorocarbon silane solution, and then an anti-fingerprint layer is formed by interfacial polymerization of fluorine chains, resulting in anti-fingerprint hydrophobic nanocrystalline glass.

[0014] Furthermore, the melting temperature is 1550℃~1650℃, the melting time is 2~4h, the clarification temperature is 1600℃~1700℃, and the clarification time is 1~2h.

[0015] Furthermore, the cooling rate is 3~5℃ / min, and the holding time is 1~2h.

[0016] Furthermore, the temperature of the high-temperature mixed molten salt containing LiNO3 and AgNO3 is 350℃~450℃, the exchange time is 4~12h, and the ion exchange layer depth is 20~50μm.

[0017] Furthermore, in the two-stage heat treatment, the preheating temperature is 300℃~400℃, the heating rate of the first stage is 3~5℃ / min, the nucleation temperature is 640℃~720℃, the nucleation holding time is 2~4h, the heating rate of the second stage is 3~5℃ / min, the crystallization temperature is 760℃~800℃, the crystallization holding time is 0.5~2h, and the cooling rate is 3~5℃ / min.

[0018] Furthermore, the grain size of the nanocrystalline glass is 50-70 nm.

[0019] Furthermore, the antireflective film is a multilayer film formed by alternating SiO2 and Si3N4 deposition, with a total of 7-10 layers and a single layer thickness of 80-200 nm.

[0020] Furthermore, the reaction temperature of the fluorocarbon silane solution is 80-150℃, the reaction time is 10-60 minutes, and an anti-fingerprint layer with a thickness of 1-10 nm and a water contact angle ≥110° is formed.

[0021] To achieve the above objectives, the present invention also proposes a high-strength, high-transmittance nanocrystalline glass prepared by the above preparation method.

[0022] Furthermore, this invention also proposes the application of the high-strength, high-transmittance nanocrystalline glass in the field of mobile phone and tablet glass covers.

[0023] This invention employs a technical solution involving sequential surface microstructuring pretreatment, ion exchange strengthening, two-stage heat treatment under an oxidizing atmosphere, and coating process. This achieves the etching of nanoscale concave-convex structures on the glass surface, increasing the depth of the ion exchange layer and the aggregation density, while avoiding the precipitation of Ag particles during the exchange process that cause the glass to yellow and affect its light transmittance. This solves the problems of low surface crystallinity, coarse grains, and insufficient strength and light transmittance in existing nanocrystalline glass technologies. Attached Figure Description

[0024] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on the processes shown in these drawings without creative effort.

[0025] Figure 1 A schematic flowchart illustrating the preparation method of the high-strength, high-transmittance nanocrystalline glass provided by the present invention;

[0026] Figure 2 This is a SEM image of the uncoated nanocrystalline glass provided in Comparative Example 5 of the present invention. Detailed Implementation

[0027] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the scope of protection of the present invention.

[0028] It should be noted that all directional indications (such as up, down, left, right, front, back, etc.) in the embodiments of the present invention are only used to explain the relative positional relationship and movement of each component in a certain specific posture (as shown in the figure). If the specific posture changes, the directional indication will also change accordingly.

[0029] Furthermore, the use of terms such as "first" and "second" in this invention is for descriptive purposes only and should not be construed as indicating or implying their relative importance or implicitly specifying the number of technical features indicated. Therefore, a feature defined with "first" or "second" may explicitly or implicitly include at least one of that feature. Additionally, the technical solutions of the various embodiments can be combined with each other, but only on the basis of being achievable by those skilled in the art. When the combination of technical solutions is contradictory or impossible to implement, such a combination of technical solutions should be considered non-existent and not within the scope of protection claimed by this invention.

[0030] In traditional direct ion exchange processes, ions diffuse only through the "planar interface" of the glass surface. The exchange efficiency is limited by the single surface contact area, and the ion concentration gradient exhibits a simple distribution that "monotonically decreases from the surface to the interior." In this invention, to increase the ion exchange area, a surface microstructure pretreatment is used to uniformly distribute nano-uneven structures on the glass surface before ion exchange. This increases the contact area for ion exchange, provides more reaction sites for ion exchange, increases the embedding depth of ions in subsequent ion exchange, and improves the compressive stress on the glass surface, thereby enhancing its impact resistance.

[0031] It is understandable that the synergistic medium of ion exchange and oxidation atmosphere achieves a systematic improvement in the performance of glass materials through multi-dimensional coupling of composition regulation, crystal nucleation activation, and stress strengthening. In the ion exchange stage of this invention, Li... + Na on the glass surface + / K + On the one hand, the surface composition is adjusted to a lithium-rich region to reduce the crystal activation energy; on the other hand, the lithium-rich region on the surface precipitates β-spodumene with an extremely low coefficient of thermal expansion after subsequent heat treatment, while the interior contains components with a higher coefficient of thermal expansion. This difference causes the glass to exhibit a phenomenon where the outer layer shrinks less and the inner layer shrinks more during cooling, thus creating a star-shaped compressive stress layer on the glass surface, with a depth of 20~50μm. Simultaneously, Ag is introduced... + An oxidation reaction (Ag) occurs in an oxidizing atmosphere. + →AgO), which is converted into nanoscale nucleating agent, increases the nucleus density on the glass surface and increases surface compressive stress.

[0032] The oxidizing atmosphere involved in this invention is an oxygen concentration of 21-90 vol% and an oxygen flow rate of 5-20 L / min.

[0033] Based on this, embodiments of this application provide a high-strength, high-transmittance nanocrystalline glass, the composition of which, by mass percentage, includes: SiO2 57%~64%, Al2O3 14%~21%, Na2O 10%~18%, MgO 3%~7%, K2O 0.5%~1.5%, and TiO2 1%~2%.

[0034] This invention also proposes a method for preparing high-strength, high-transmittance nanocrystalline glass (refer to...). Figure 1 As shown, the preparation method involves the following steps:

[0035] Step S10: Place the raw materials in a crucible and mix them evenly. Then, melt and clarify the mixed raw materials in the crucible to obtain molten glass.

[0036] Step S20: Molten glass is formed into glass sheets with a thickness of 0.3-1.2 mm by casting, rolling or overflow drawing, and then cooled to 550℃~600℃ for heat preservation annealing to obtain the base glass;

[0037] Step S30: Transfer the base glass to a beaker containing a 10-15% HF solution, perform microstructure pretreatment on the surface of the base glass for 20-40 seconds, and then immerse the pretreated base glass in deionized water for ultrasonic cleaning for 10 minutes and then dry it.

[0038] Step S40: The pretreated base glass is transferred to a high-temperature mixed molten salt containing LiNO3 and AgNO3 for ion exchange strengthening.

[0039] Step S50: The strengthened glass is moved to an oxidizing atmosphere for preheating. After preheating, a two-stage heat treatment is performed. In the first stage, the temperature is raised to the nucleation temperature and held. In the second stage, the temperature is raised to the crystallization temperature and held. Then, the temperature is lowered to 350℃~450℃ at a certain rate and held. Finally, the temperature is cooled to room temperature to obtain nanocrystalline glass.

[0040] Step S60: An anti-reflective film is deposited on the nanocrystalline glass by magnetron sputtering to obtain high-transmittance nanocrystalline glass;

[0041] In step S70, the high-transparency nanocrystalline glass is transferred to a fluorocarbon silane solution, and then an anti-fingerprint layer is formed by interfacial polymerization of fluorine chains to obtain anti-fingerprint hydrophobic nanocrystalline glass.

[0042] In detail, during the two-step heat treatment process described above, the nucleation stage induces the uniform precipitation of nanoscale crystal nuclei within the glass matrix at low temperatures. These nanoscale nuclei act as "reinforcing particles" and are uniformly distributed within the glass phase. The crystallization stage controls the directional growth of grains into nanoscale grains at high temperatures. The size of these nanoscale grains is much smaller than the wavelength of visible light, thus avoiding light scattering and improving the light transmittance of the nanocrystalline glass. Simultaneously, when the glass is subjected to external forces, the fine and uniform nanocrystalline network forms an "interlocking structure," hindering crack propagation paths and enhancing the strength of the glass.

[0043] More specifically, the nanocrystalline glass prepared in this invention has 7 to 10 layers of AR film (Anti-Reflective Film) with a single layer thickness of 80 to 200 nm deposited on its surface. The film thickness is controlled to be 1 / 4 of the incident light wavelength. Destructive interference occurs, which greatly reduces the intensity of reflected light, thereby enhancing the light transmittance of the nanocrystalline glass. Furthermore, the AR film itself has high hardness and wear resistance. Alternatingly depositing multiple layers of SiO2 and Si3N4 films can tightly bond with the nanocrystalline glass substrate, reducing damage to the glass surface and preventing crack propagation.

[0044] The present invention also discloses the following six sets of embodiments and five sets of comparative embodiments, and the specific implementation of each embodiment is as follows:

[0045] Example 1

[0046] Step S1, Preparation of base glass: Weigh the raw materials according to the following proportions by mass fraction: SiO2 62%, Al2O3 17%, Na2O 14%, MgO 5%, K2O 1%, TiO2 1%, with a total mass of 200g. Mix the raw materials evenly and put them into a platinum crucible and place it in a high-temperature furnace. Preheat the temperature to 800℃ and hold for 1 hour. After holding, place it in a melting furnace and heat it to 1600℃ to melt it into a glass melt. Hold the temperature for 3 hours, stirring twice (5 minutes each time). Then heat the temperature to 1650℃ to clarify and hold for 1.5 hours to remove bubbles. Shape the glass melt into a glass substrate with a thickness of 1mm using the casting method, rolling method, or overflow drawing method. Then cool the substrate to 600℃ at a rate of 3℃ / min and hold for annealing for 2 hours to obtain the base glass.

[0047] Step S2, Preparation of nanocrystalline glass: The base glass is immersed in a beaker containing HF solution, and the beaker is placed in a constant temperature water bath at 25°C for 20 seconds for etching. After etching, the base glass is transferred to deionized water for ultrasonic cleaning for 10 minutes, followed by drying to complete the pretreatment. The pretreated base glass is then immersed in a mixed molten salt containing LiNO3 and AgNO3 at 370°C for ion exchange strengthening. The strengthened glass is then ultrasonically cleaned again, and after ultrasonic cleaning and drying, it is placed in a platinum crucible and then placed in a high-temperature furnace. High-purity nitrogen was purged into the furnace for 10 minutes to allow it to be expelled and mixed with air. The gas was then adjusted to an oxygen-nitrogen mixture with an oxygen concentration of 50 vol% and an oxygen flow rate of 10 L / min. After stable ventilation for 5 minutes, the temperature was raised to 300℃ and held for 0.5 hours for preheating. Subsequently, the temperature was raised to 680℃ at a rate of 3℃ / min for nucleation and held for 4 hours. Then, the temperature was raised to 780℃ at a rate of 5℃ / min for crystallization and held for 1 hour. Finally, the temperature was lowered to 400℃ at a rate of 5℃ / min and held for 1 hour. The mixture was then cooled to room temperature to obtain nanocrystalline glass.

[0048] Step S3, Coating Process: The prepared nanocrystalline glass is cleaned with ultrasonic waves, and seven layers of SiO2 and Si3N4 films with a thickness of 80nm are alternately deposited by magnetron sputtering to obtain anti-reflective nanocrystalline glass. The anti-reflective nanocrystalline glass is then immersed in a 100°C fluorocarbon silane solution for 1 hour to form a 1nm anti-fingerprint layer.

[0049] Example 2:

[0050] Step S1, Preparation of base glass: Weigh the raw materials according to the following proportions by mass fraction: SiO2 62%, Al2O3 17%, Na2O 14%, MgO 5%, K2O 1%, TiO2 1%, with a total mass of 200g. Mix the raw materials evenly and put them into a platinum crucible and place it in a high-temperature furnace. Preheat the temperature to 800℃ and hold for 1 hour. After holding, place it in a melting furnace and heat it to 1600℃ to melt it into a glass melt. Hold the temperature for 3 hours, stirring twice (5 minutes each time). Then heat the temperature to 1650℃ to clarify and hold for 1.5 hours to remove bubbles. Shape the glass melt into a glass substrate with a thickness of 1mm using the casting method, rolling method, or overflow drawing method. Then cool the substrate to 600℃ at a rate of 3℃ / min and hold for annealing for 2 hours to obtain the base glass.

[0051] Step S2, Preparation of nanocrystalline glass: The base glass is immersed in a beaker containing HF solution, and the beaker is placed in a constant temperature water bath at 25°C for 20 seconds for etching. After etching, the base glass is transferred to deionized water for ultrasonic cleaning for 10 minutes, followed by drying to complete the pretreatment. The pretreated base glass is then immersed in a mixed molten salt containing LiNO3 and AgNO3 at 370°C for ion exchange strengthening. The strengthened glass is then ultrasonically cleaned again, and after ultrasonic cleaning and drying, it is placed in a platinum crucible and then placed in a high-temperature furnace. High-purity nitrogen was purged into the furnace for 10 minutes to allow it to be expelled and incorporated into the air. The gas was then adjusted to a 50 vol% oxygen-nitrogen mixture with an oxygen flow rate of 10 L / min. After stabilizing the gas flow for 5 minutes, the temperature was raised to 300℃ and held for 0.5 hours for preheating. Subsequently, the temperature was raised to 660℃ at a rate of 3℃ / min for nucleation and held for 4 hours. Then, the temperature was raised to 780℃ at a rate of 5℃ / min for crystallization and held for 1 hour. Finally, the temperature was lowered to 400℃ at a rate of 5℃ / min and held for 1 hour. The mixture was then cooled to room temperature to obtain nanocrystalline glass.

[0052] Step S3, Coating Process: The prepared nanocrystalline glass is cleaned with ultrasonic waves, and seven layers of SiO2 and Si3N4 films with a thickness of 80nm are alternately deposited by magnetron sputtering to obtain anti-reflective nanocrystalline glass. The anti-reflective nanocrystalline glass is then immersed in a 100°C fluorocarbon silane solution for 1 hour to form a 1nm anti-fingerprint layer.

[0053] It can be seen that the nucleation temperature was lowered in Example 2 compared to Example 1.

[0054] Example 3:

[0055] Step S1, Preparation of base glass: Weigh the raw materials according to the following proportions by mass fraction: SiO2 62%, Al2O3 17%, Na2O 14%, MgO 5%, K2O 1%, TiO2 1%, with a total mass of 200g. Mix the raw materials evenly and put them into a platinum crucible and place it in a high-temperature furnace. Preheat the temperature to 800℃ and hold for 1 hour. After holding, place it in a melting furnace and heat it to 1600℃ to melt it into a glass melt. Hold the temperature for 3 hours, stirring twice (5 minutes each time). Then heat the temperature to 1650℃ to clarify and hold for 1.5 hours to remove bubbles. Shape the glass melt into a glass substrate with a thickness of 1mm using the casting method, rolling method, or overflow drawing method. Then cool the substrate to 600℃ at a rate of 3℃ / min and hold for annealing for 2 hours to obtain the base glass.

[0056] Step S2, Preparation of nanocrystalline glass: The base glass is immersed in a beaker containing HF solution, and the beaker is placed in a constant temperature water bath at 35°C for 30 seconds for etching. After etching, the base glass is transferred to deionized water for ultrasonic cleaning for 10 minutes, followed by drying to complete the pretreatment. The pretreated base glass is then immersed in a mixed molten salt containing LiNO3 and AgNO3 at 370°C for ion exchange strengthening. The strengthened glass is ultrasonically cleaned again, and after ultrasonic cleaning and drying, it is placed in a platinum crucible and then placed in a high-temperature furnace. High-purity nitrogen was purged into the furnace for 10 minutes to allow it to be expelled and incorporated into the air. The gas was then adjusted to a 50 vol% oxygen-nitrogen mixture with an oxygen flow rate of 10 L / min. After stabilizing the gas flow for 5 minutes, the temperature was raised to 300℃ and held for 0.5 hours for preheating. Subsequently, the temperature was raised to 700℃ at a rate of 3℃ / min for nucleation and held for 4 hours. Then, the temperature was raised to 780℃ at a rate of 5℃ / min for crystallization and held for 1 hour. Finally, the temperature was lowered to 400℃ at a rate of 5℃ / min and held for 1 hour. The mixture was then cooled to room temperature to obtain nanocrystalline glass.

[0057] Step S3, Coating Process: The prepared nanocrystalline glass is cleaned with ultrasonic waves, and seven layers of SiO2 and Si3N4 films with a thickness of 80nm are alternately deposited by magnetron sputtering to obtain anti-reflective nanocrystalline glass. The anti-reflective nanocrystalline glass is then immersed in a 100°C fluorocarbon silane solution for 1 hour to form a 1nm anti-fingerprint layer.

[0058] It can be seen that Example 3 further increased the nucleation temperature compared with Example 2 and Example 1.

[0059] Example 4:

[0060] Step S1, Preparation of base glass: Weigh the raw materials according to the following proportions by mass fraction: SiO2 62%, Al2O3 17%, Na2O 14%, MgO 5%, K2O 1%, TiO2 1%, with a total mass of 200g. Mix the raw materials evenly and put them into a platinum crucible and place it in a high-temperature furnace. Preheat the temperature to 800℃ and hold for 1 hour. After holding, place it in a melting furnace and heat it to 1600℃ to melt it into a glass melt. Hold the temperature for 3 hours, stirring twice (5 minutes each time). Then heat the temperature to 1650℃ to clarify and hold for 1.5 hours to remove bubbles. Shape the glass melt into a glass substrate with a thickness of 1mm using the casting method, rolling method, or overflow drawing method. Then cool the substrate to 600℃ at a rate of 3℃ / min and hold for annealing for 2 hours to obtain the base glass.

[0061] Step S2, Preparation of nanocrystalline glass: The base glass is immersed in a beaker containing HF solution, and the beaker is placed in a constant temperature water bath at 25°C for 20 seconds for etching. After etching, the base glass is transferred to deionized water for ultrasonic cleaning for 10 minutes, followed by drying to complete the pretreatment. The pretreated base glass is then immersed in a mixed molten salt containing LiNO3 and AgNO3 at 370°C for ion exchange strengthening. The strengthened glass is then ultrasonically cleaned again, and after ultrasonic cleaning and drying, it is placed in a platinum crucible and then placed in a high-temperature furnace. High-purity nitrogen was purged into the furnace for 10 minutes to allow it to be expelled and incorporated into the air. The gas was then adjusted to a 50 vol% oxygen-nitrogen mixture with an oxygen flow rate of 10 L / min. After stabilizing the gas flow for 5 minutes, the temperature was raised to 300℃ and held for 0.5 hours for preheating. Subsequently, the temperature was raised to 680℃ at a rate of 3℃ / min for nucleation and held for 2 hours. Then, the temperature was raised to 780℃ at a rate of 5℃ / min for crystallization and held for 2 hours. Finally, the temperature was lowered to 400℃ at a rate of 5℃ / min and held for 1 hour. The mixture was then cooled to room temperature to obtain nanocrystalline glass.

[0062] Step S3, Coating Process: The prepared nanocrystalline glass is cleaned with ultrasonic waves, and seven layers of SiO2 and Si3N4 films with a thickness of 80nm are alternately deposited by magnetron sputtering to obtain anti-reflective nanocrystalline glass. The anti-reflective nanocrystalline glass is then immersed in a 100°C fluorocarbon silane solution for 1 hour to form a 1nm anti-fingerprint layer.

[0063] It can be seen that Example 4 shortened the crystallization time compared to Example 1.

[0064] Example 5:

[0065] Step S1, Preparation of base glass: Weigh the raw materials according to the following proportions by mass fraction: SiO2 62%, Al2O3 17%, Na2O 14%, MgO 5%, K2O 1%, TiO2 1%, with a total mass of 200g. Mix the raw materials evenly and put them into a platinum crucible and place it in a high-temperature furnace. Preheat the temperature to 800℃ and hold for 1 hour. After holding, place it in a melting furnace and heat it to 1600℃ to melt it into a glass melt. Hold the temperature for 3 hours, stirring twice (5 minutes each time). Then heat the temperature to 1650℃ to clarify and hold for 1.5 hours to remove bubbles. Shape the glass melt into a glass substrate with a thickness of 1mm using the casting method, rolling method, or overflow drawing method. Then cool the substrate to 600℃ at a rate of 3℃ / min and hold for annealing for 2 hours to obtain the base glass.

[0066] Step S2, Preparation of nanocrystalline glass: The base glass is immersed in a beaker containing HF solution, and the beaker is placed in a constant temperature water bath at 25°C for 20 seconds for etching. After etching, the base glass is transferred to deionized water for ultrasonic cleaning for 10 minutes, followed by drying to complete the pretreatment. The pretreated base glass is then immersed in a mixed molten salt containing LiNO3 and AgNO3 at 370°C for ion exchange strengthening. The strengthened glass is then ultrasonically cleaned again, and after ultrasonic cleaning and drying, it is placed in a platinum crucible and then placed in a high-temperature furnace. High-purity nitrogen was purged into the furnace for 10 minutes to allow it to be expelled and incorporated into the air. The gas was then adjusted to a 50 vol% oxygen-nitrogen mixture with an oxygen flow rate of 10 L / min. After stabilizing the gas flow for 5 minutes, the temperature was raised to 300℃ and held for 0.5 hours for preheating. Subsequently, the temperature was raised to 680℃ at a rate of 3℃ / min for nucleation and held for 4 hours. Then, the temperature was raised to 760℃ at a rate of 5℃ / min for crystallization and held for 1 hour. Finally, the temperature was lowered to 400℃ at a rate of 5℃ / min and held for 1 hour. The mixture was then cooled to room temperature to obtain nanocrystalline glass.

[0067] Step S3, Coating Process: The prepared nanocrystalline glass is cleaned with ultrasonic waves, and seven layers of SiO2 and Si3N4 films with a thickness of 80nm are alternately deposited by magnetron sputtering to obtain anti-reflective nanocrystalline glass. The anti-reflective nanocrystalline glass is then immersed in a 100°C fluorocarbon silane solution for 1 hour to form a 1nm anti-fingerprint layer.

[0068] It can be seen that the crystallization temperature was lowered in Example 5 compared to Example 1.

[0069] Example 6:

[0070] Step S1, Preparation of base glass: Weigh the raw materials according to the following proportions by mass fraction: SiO2 62%, Al2O3 17%, Na2O 14%, MgO 5%, K2O 1%, TiO2 1%, with a total mass of 200g. Mix the raw materials evenly and put them into a platinum crucible and place it in a high-temperature furnace. Preheat the temperature to 800℃ and hold for 1 hour. After holding, place it in a melting furnace and heat it to 1600℃ to melt it into a glass melt. Hold the temperature for 3 hours, stirring twice (5 minutes each time). Then heat the temperature to 1650℃ to clarify and hold for 1.5 hours to remove bubbles. Shape the glass melt into a glass substrate with a thickness of 1mm using the casting method, rolling method, or overflow drawing method. Then cool the substrate to 600℃ at a rate of 3℃ / min and hold for annealing for 2 hours to obtain the base glass.

[0071] Step S2, Preparation of nanocrystalline glass: The base glass is immersed in a beaker containing HF solution, and the beaker is placed in a constant temperature water bath at 25°C for 20 seconds for etching. After etching, the base glass is transferred to deionized water for ultrasonic cleaning for 10 minutes, followed by drying to complete the pretreatment. The pretreated base glass is then immersed in a mixed molten salt containing LiNO3 and AgNO3 at 370°C for ion exchange strengthening. The strengthened glass is then ultrasonically cleaned again, and after ultrasonic cleaning and drying, it is placed in a platinum crucible and then placed in a high-temperature furnace. High-purity nitrogen was introduced for 10 minutes to purge the furnace and allow air to enter. The gas was then adjusted to a 50 vol% oxygen-nitrogen mixture with an oxygen flow rate of 10 L / min. After stabilizing the gas flow for 5 minutes, the temperature was raised to 300℃ and held for 0.5 hours for preheating. Subsequently, the temperature was raised to 680℃ at a rate of 5℃ / min for nucleation and held for 4 hours. Then, the temperature was raised to 780℃ at a rate of 5℃ / min for crystallization and held for 1 hour. Finally, the temperature was lowered to 400℃ at a rate of 5℃ / min and held for 1 hour. The mixture was then cooled to room temperature to obtain nanocrystalline glass.

[0072] Step S3, Coating Process: The prepared nanocrystalline glass is cleaned with ultrasonic waves, and seven layers of SiO2 and Si3N4 films with a thickness of 80nm are alternately deposited by magnetron sputtering to obtain anti-reflective nanocrystalline glass. The anti-reflective nanocrystalline glass is then immersed in a 100°C fluorocarbon silane solution for 1 hour to form a 1nm anti-fingerprint layer.

[0073] It can be seen that Example 6 improved the nucleation heating rate compared to Example 1.

[0074] Comparative Example 1:

[0075] Step S1, Preparation of base glass: Weigh the raw materials according to the following proportions by mass fraction: SiO2 62%, Al2O3 17%, Na2O 14%, MgO 5%, K2O 1%, TiO2 1%, with a total mass of 200g. Mix the raw materials evenly and put them into a platinum crucible and place it in a high-temperature furnace. Preheat the temperature to 800℃ and hold for 1 hour. After holding, place it in a melting furnace and heat it to 1600℃ to melt it into a glass melt. Hold the temperature for 3 hours, stirring twice (5 minutes each time). Then heat the temperature to 1650℃ to clarify and hold for 1.5 hours to remove bubbles. Shape the glass melt into a glass substrate with a thickness of 1mm using the casting method, rolling method, or overflow drawing method. Then cool the substrate to 600℃ at a rate of 3℃ / min and hold for annealing for 2 hours to obtain the base glass.

[0076] Step S2, Preparation of nanocrystalline glass: The base glass is placed in a platinum crucible and then placed in a high-temperature furnace. High-purity nitrogen is introduced for 10 minutes to purge the air from the furnace. The gas is then adjusted to an oxygen-nitrogen mixture with an oxygen concentration of 50 vol% and an oxygen flow rate of 10 L / min. After stable gas introduction for 5 minutes, the temperature is raised to 300℃ and held for 0.5 hours for preheating treatment. Then, the temperature is raised to 680℃ at a rate of 3℃ / min for nucleation and held for 4 hours. Next, the temperature is raised to 780℃ at a rate of 5℃ / min for crystallization and held for 1 hour. Finally, the temperature is lowered to 400℃ at a rate of 5℃ / min and held for 1 hour. Then, the temperature is cooled to room temperature to obtain nanocrystalline glass.

[0077] Step S3, Coating Process: The prepared nanocrystalline glass is cleaned with ultrasonic waves, and seven layers of SiO2 and Si3N4 films with a thickness of 80nm are alternately deposited by magnetron sputtering to obtain anti-reflective nanocrystalline glass. The anti-reflective nanocrystalline glass is then immersed in a 100°C fluorocarbon silane solution for 1 hour to form a 1nm anti-fingerprint layer.

[0078] It can be seen that, compared with Example 1, Comparative Example 1 lacks surface microstructure pretreatment and ion exchange enhancement treatment.

[0079] Comparative Example 2:

[0080] Step S1, Preparation of base glass: Weigh the raw materials according to the following proportions by mass fraction: SiO2 62%, Al2O3 17%, Na2O 14%, MgO 5%, K2O 1%, TiO2 1%, with a total mass of 200g. Mix the raw materials evenly and put them into a platinum crucible and place it in a high-temperature furnace. Preheat the temperature to 800℃ and hold for 1 hour. After holding, place it in a melting furnace and heat it to 1600℃ to melt it into a glass melt. Hold the temperature for 3 hours, stirring twice (5 minutes each time). Then heat the temperature to 1650℃ to clarify and hold for 1.5 hours to remove bubbles. Shape the glass melt into a glass substrate with a thickness of 1mm using the casting method, rolling method, or overflow drawing method. Then cool the substrate to 600℃ at a rate of 3℃ / min and hold for annealing for 2 hours to obtain the base glass.

[0081] Step S2, Preparation of nanocrystalline glass: The base glass is immersed in a beaker containing HF solution, and the beaker is placed in a constant temperature water bath at 25°C for 20 seconds for etching. After etching, the base glass is transferred to deionized water for ultrasonic cleaning for 10 minutes. After ultrasonic cleaning for 10 minutes, it is dried to complete the pretreatment. The pretreated base glass is immersed in a mixed molten salt containing LiNO3 and AgNO3 at 370°C for ion exchange strengthening. The strengthened glass is ultrasonically cleaned again. After ultrasonic cleaning and drying, it is placed in a platinum crucible and then placed in a high-temperature furnace. It is heated to 300°C and held for 0.5 hours for preheating treatment. Then, it is heated to 680°C at 3°C / min for nucleation and held for 4 hours. Then, it is heated to 780°C at 5°C / min for crystallization and held for 1 hour. Finally, it is cooled to 400°C at a cooling rate of 5°C / min and held for 1 hour. Then, it is cooled to room temperature to obtain nanocrystalline glass.

[0082] Step S3, Coating Process: The prepared nanocrystalline glass is cleaned with ultrasonic waves, and seven layers of SiO2 and Si3N4 films with a thickness of 80nm are alternately deposited by magnetron sputtering to obtain anti-reflective nanocrystalline glass. The anti-reflective nanocrystalline glass is then immersed in a 100°C fluorocarbon silane solution for 1 hour to form a 1nm anti-fingerprint layer.

[0083] It can be seen that, compared with Example 1, Comparative Example 2 did not involve an oxidizing atmosphere treatment during the heat treatment step.

[0084] Comparative Example 3:

[0085] Step S1, Preparation of base glass: Weigh the raw materials according to the following proportions by mass fraction: SiO2 62%, Al2O3 17%, Na2O 14%, MgO 5%, K2O 1%, TiO2 1%, with a total mass of 200g. Mix the raw materials evenly and put them into a platinum crucible and place it in a high-temperature furnace. Preheat the temperature to 800℃ and hold for 1 hour. After holding, place it in a melting furnace and heat it to 1600℃ to melt it into a glass melt. Hold the temperature for 3 hours, stirring twice (5 minutes each time). Then heat the temperature to 1650℃ to clarify and hold for 1.5 hours to remove bubbles. Shape the glass melt into a glass substrate with a thickness of 1mm using the casting method, rolling method, or overflow drawing method. Then cool the substrate to 600℃ at a rate of 3℃ / min and hold for annealing for 2 hours to obtain the base glass.

[0086] Step S2, Preparation of nanocrystalline glass: The base glass is immersed in a beaker containing HF solution, and the beaker is placed in a constant temperature water bath at 25°C for 20 seconds for etching. After etching, the base glass is transferred to deionized water for ultrasonic cleaning for 10 minutes, followed by drying to complete the pretreatment. The pretreated base glass is then immersed in a mixed molten salt containing LiNO3 and AgNO3 at 370°C for ion exchange strengthening. The strengthened glass is then ultrasonically cleaned again, and after ultrasonic cleaning and drying, it is placed in a platinum bath. The crucible was then placed in a high-temperature furnace, and high-purity nitrogen was introduced for 10 minutes to purge the air from the furnace. The gas was then adjusted to an oxygen-nitrogen mixture with an oxygen concentration of 50 vol% and an oxygen flow rate of 10 L / min. After stabilizing the gas flow for 5 minutes, the temperature was raised to 300℃ and held for 0.5 hours for preheating. Subsequently, the temperature was raised to 680℃ at a rate of 3℃ / min for heat treatment and held for 5 hours. Finally, the temperature was lowered to 400℃ at a rate of 5℃ / min and held for 1 hour. The mixture was then cooled to room temperature to obtain nanocrystalline glass.

[0087] Step S3, Coating Process: The prepared nanocrystalline glass is cleaned with ultrasonic waves, and seven layers of SiO2 and Si3N4 films with a thickness of 80nm are alternately deposited by magnetron sputtering to obtain anti-reflective nanocrystalline glass. The anti-reflective nanocrystalline glass is then immersed in a 100°C fluorocarbon silane solution for 1 hour to form a 1nm anti-fingerprint layer.

[0088] As can be seen, in Comparative Example 3, compared to Example 1, a one-step heat treatment method was used instead of a two-step heat treatment method in the heat treatment step.

[0089] Comparative Example 4:

[0090] Step S1, Preparation of base glass: Weigh the raw materials according to the following proportions by mass fraction: SiO2 62%, Al2O3 17%, Na2O 14%, MgO 5%, K2O 1%, TiO2 1%, with a total mass of 200g. Mix the raw materials evenly and put them into a platinum crucible and place it in a high-temperature furnace. Preheat the temperature to 800℃ and hold for 1 hour. After holding, place it in a melting furnace and heat it to 1600℃ to melt it into a glass melt. Hold the temperature for 3 hours, stirring twice (5 minutes each time). Then heat the temperature to 1650℃ to clarify and hold for 1.5 hours to remove bubbles. Shape the glass melt into a glass substrate with a thickness of 1mm using the casting method, rolling method, or overflow drawing method. Then cool the substrate to 600℃ at a rate of 3℃ / min and hold for annealing for 2 hours to obtain the base glass.

[0091] Step S2, Preparation of nanocrystalline glass: The base glass is immersed in a beaker containing HF solution, and the beaker is placed in a constant temperature water bath at 25°C for 20 seconds for etching. After etching, the base glass is transferred to deionized water for ultrasonic cleaning for 10 minutes. After ultrasonic cleaning for 10 minutes, it is dried to complete the pretreatment. The pretreated base glass is immersed in a mixed molten salt containing LiNO3 and AgNO3 at 370°C for ion exchange strengthening. The strengthened glass is ultrasonically cleaned again. After ultrasonic cleaning and drying, it is placed in a platinum crucible and then placed in a high-temperature furnace. High-purity nitrogen gas is introduced for 10 minutes to remove air from the furnace. The gas is then adjusted to an oxygen-nitrogen mixture with an oxygen concentration of 50 vol% and an oxygen flow rate of 10 L / min. After stable gas introduction for 5 minutes, the temperature is increased to 680°C at 3°C / min for nucleation. Nucleation is held at this temperature for 4 hours. Then, the temperature is increased to 780°C at 5°C / min for crystallization. Crystallization is held at this temperature for 1 hour. Finally, it is cooled to room temperature to obtain nanocrystalline glass.

[0092] Step S3, Coating Process: The prepared nanocrystalline glass is cleaned with ultrasonic waves, and seven layers of SiO2 and Si3N4 films with a thickness of 80nm are alternately deposited by magnetron sputtering to obtain anti-reflective nanocrystalline glass. The anti-reflective nanocrystalline glass is then immersed in a 100°C fluorocarbon silane solution for 1 hour to form a 1nm anti-fingerprint layer.

[0093] It can be seen that, compared with Example 1, Comparative Example 4 did not involve pre-firing treatment before heat treatment or annealing and heat preservation treatment after heat treatment.

[0094] Comparative Example 5:

[0095] Step S1, Preparation of base glass: Weigh the raw materials according to the following proportions by mass fraction: SiO2 62%, Al2O3 17%, Na2O 14%, MgO 5%, K2O 1%, TiO2 1%, with a total mass of 200g. Mix the raw materials evenly and put them into a platinum crucible and place it in a high-temperature furnace. Preheat the temperature to 800℃ and hold for 1 hour. After holding, place it in a melting furnace and heat it to 1600℃ to melt it into a glass melt. Hold the temperature for 3 hours, stirring twice (5 minutes each time). Then heat the temperature to 1650℃ to clarify and hold for 1.5 hours to remove bubbles. Shape the glass melt into a glass substrate with a thickness of 1mm using the casting method, rolling method, or overflow drawing method. Then cool the substrate to 600℃ at a rate of 3℃ / min and hold for annealing for 2 hours to obtain the base glass.

[0096] Step S2, Preparation of nanocrystalline glass: The base glass is immersed in a beaker containing HF solution, and the beaker is placed in a constant temperature water bath at 25°C for 20 seconds for etching. After etching, the base glass is transferred to deionized water for ultrasonic cleaning for 10 minutes, followed by drying to complete the pretreatment. The pretreated base glass is then immersed in a mixed molten salt containing LiNO3 and AgNO3 at 370°C for ion exchange strengthening. The strengthened glass is then ultrasonically cleaned again, and after ultrasonic cleaning and drying, it is placed in a platinum crucible and then placed in a high-temperature furnace. High-purity nitrogen was purged into the furnace for 10 minutes to allow it to be expelled and mixed with air. The gas was then adjusted to an oxygen-nitrogen mixture with an oxygen concentration of 50 vol% and an oxygen flow rate of 10 L / min. After stable ventilation for 5 minutes, the temperature was raised to 300℃ and held for 0.5 hours for preheating. Subsequently, the temperature was raised to 680℃ at a rate of 3℃ / min for nucleation and held for 4 hours. Then, the temperature was raised to 780℃ at a rate of 5℃ / min for crystallization and held for 1 hour. Finally, the temperature was lowered to 400℃ at a rate of 5℃ / min and held for 1 hour. The mixture was then cooled to room temperature to obtain nanocrystalline glass.

[0097] As can be seen, in Comparative Example 5, there is no coating process compared to Example 1.

[0098] This invention also discloses performance tests, as detailed below:

[0099] The present invention conducts performance tests on the nanocrystalline glass obtained in the above embodiments and comparative embodiments. Surface compressive stress is tested using a surface stress tester; the impact resistance height of each embodiment product against a 55g, 20mm diameter steel ball is measured using a drop ball tester, with nine impact points and the average value of these points taken as the sample glass's impact resistance height; the light transmittance of the glass in the 400-750nm range is measured using a spectrophotometer. The specific results are shown in the table below.

[0100] surface Performance of nanocrystalline glass prepared in each embodiment and comparative embodiment

[0101] Group Surface compressive stress / MPa Drop ball height / cm transmittance / % Example 1 977.56 176 92.42 Example 2 966.18 169 91.76 Example 3 970.54 167 90.81 Example 4 962.98 155 90.47 Example 5 969.14 151 90.36 Example 6 971.65 153 90.11 Comparative Example 1 767.75 129 90.18 Comparative Example 2 805.84 144 89.15 Comparative Example 3 807.89 148 87.26 Comparative Example 4 814.79 130 89.14 Comparative Example 5 756.48 124 88.45

[0102] Among them, surface compressive stress refers to the compressive stress value formed on the glass surface due to ion exchange. It is the core indicator of ion exchange strengthening. Surface compressive stress can counteract externally applied tensile stress (such as stress generated by impact or friction) and delay the propagation of microcracks. The higher the surface compressive stress, the stronger the glass's ability to resist surface damage.

[0103] In detail, the performance test results of the nanocrystalline glass provided in Examples 1, 2, 3, and 5 show that the optimal nucleation temperature and optimal crystallization temperature of the prepared base glass are around 680℃ and 780℃, respectively. The performance test results of the nanocrystalline glass provided in Examples 1, 4, and 6 show that shortening the nucleation time and extending the crystallization time reduces the light transmittance of the glass: from 91.42% to 90.47%, and from 91.42% to 90.11%, and simultaneously reduces surface compressive stress and impact resistance.

[0104] A comparison of the performance test results of the nanocrystalline glass provided in Examples 1-6 and Comparative Examples 1-4 shows that the nanocrystalline glass in Examples 1-6 has stronger surface compressive stress and impact resistance, and its light transmittance is also improved. This indicates that the preheating process, surface microstructuring pretreatment, and ion strengthening (Li) of this invention are effective. + With Ag + Two-step heat treatment and annealing under an oxidizing atmosphere can comprehensively improve the surface compressive stress, impact resistance and light transmittance of nanocrystalline glass, significantly improving the performance of nanocrystalline glass.

[0105] In summary, compared to traditional single ion exchange or one-step heat treatment processes, this invention utilizes surface microstructure pretreatment and dual ion exchange (Li... + / Ag + A synergistic mechanism involving synergistic displacement, preheating (300-400℃ / 0.5-2h), and two-step heat treatment under an oxidizing atmosphere (nucleation 640-720℃ / 2-4h, crystallization 760-800℃ / 0.5-2h) is employed to enhance the performance of nanocrystalline glass. Preheating reduces glass viscosity, promoting the opening of ion diffusion channels and allowing Li... + / Ag + The replacement is more uniform, and at the same time, the residual stress after ion exchange is reduced.

[0106] In this invention, reference is made to Figure 2 As shown, Figure 2The SEM image of uncoated nanocrystalline glass provided in an embodiment of the present invention clearly shows that uncoated nanocrystalline glass has the following significant defects: decreased strength, local stress concentration at the pore edges when subjected to force, and cracks that are generated will initiate and propagate from the pores; poor wear resistance, as the pores are prone to trapping dirt and grime, becoming "weak areas" during wear and accelerating surface damage; and decreased corrosion resistance, as corrosive media (such as water, acids, and alkalis) can penetrate into the interior through the pores, destroying the crystal-glass phase structure.

[0107] This invention constructs a lithium-rich layer on a glass surface through ion exchange, preferentially inducing lithium disilicate crystallization and forming a gradient structure of large surface grains and fine internal grains. In an oxidizing atmosphere, Ag... + Oxidized into high-valence Ag 2+ (by Ag) + (Transformed into AgO), increasing crystal nucleus density, suppressing grain coarsening, and ensuring visible light transmittance ≥90%. This invention further improves the surface compressive stress, impact resistance, and light transmittance of nanocrystalline glass through preheating treatment. The surface compressive stress, impact resistance, and light transmittance of nanocrystalline glass after two-step heat treatment (preheating treatment, surface microstructure pretreatment, dual ion exchange, and oxidation atmosphere) are significantly higher than those of nanocrystalline glass treated with single ion exchange, and also higher than those of nanocrystalline glass that only undergoes one-step heat treatment.

[0108] The above description is merely a preferred embodiment of the present invention and does not limit the patent scope of the present invention. Any equivalent structural transformations made using the contents of the present invention's specification and drawings under the inventive concept of the present invention, or direct / indirect applications in other related technical fields, are included within the patent protection scope of the present invention.

Claims

1. A method for preparing high-strength, high-transmittance nanocrystalline glass, characterized in that, Includes the following steps: The raw materials are placed in a crucible and mixed evenly. The mixture is then melted and clarified in the crucible to obtain molten glass. Molten glass is formed into glass sheets with a thickness of 0.3-1.2 mm by casting, rolling or overflow drawing, and then cooled to 550℃~600℃ for heat preservation and annealing to obtain the base glass; The base glass was transferred to a beaker containing a 10-15% HF solution, and the surface of the base glass was subjected to microstructure pretreatment for 20-40 seconds. The pretreated base glass was then placed in deionized water for ultrasonic cleaning for 10 minutes and then dried. The pretreated base glass was transferred to a high-temperature mixed molten salt containing LiNO3 and AgNO3 for ion exchange strengthening. The strengthened glass was placed in an oxidizing atmosphere for preheating. After preheating, it underwent a two-stage heat treatment. In the first stage, the temperature was raised to the nucleation temperature and held. In the second stage, the temperature was raised to the crystallization temperature and held. Then, the temperature was lowered to 350℃~450℃ at a certain rate and held. Finally, it was cooled to room temperature to obtain nanocrystalline glass. The nanocrystalline glass is coated with an anti-reflective film by magnetron sputtering to obtain high-transmittance nanocrystalline glass; High-transparency nanocrystalline glass is transferred to a fluorocarbon silane solution, and then an anti-fingerprint layer is formed by interfacial polymerization of fluorine chains, resulting in anti-fingerprint hydrophobic nanocrystalline glass.

2. The method for preparing high-strength, high-transmittance nanocrystalline glass as described in claim 1, characterized in that, The melting temperature is 1550℃~1650℃, the melting time is 2~4h, the clarification temperature is 1600℃~1700℃, and the clarification time is 1~2h.

3. The method for preparing high-strength, high-transmittance nanocrystalline glass as described in claim 1, characterized in that, The cooling rate is 3~5℃ / min, and the holding time is 1~2h.

4. The method for preparing high-strength, high-transmittance nanocrystalline glass as described in claim 1, characterized in that, The high-temperature mixed molten salt containing LiNO3 and AgNO3 is heated to a temperature of 350℃~450℃, the exchange time is 4~12h, and the ion exchange layer depth is 20~50μm.

5. The method for preparing high-strength, high-transmittance nanocrystalline glass as described in claim 1, characterized in that, In the two-stage heat treatment, the preheating temperature is 300℃~400℃, the heating rate of the first stage is 3~5℃ / min, the nucleation temperature is 640℃~720℃, the nucleation holding time is 2~4h, the heating rate of the second stage is 3~5℃ / min, the crystallization temperature is 760℃~800℃, the crystallization holding time is 0.5~2h, and the cooling rate is 3~5℃ / min.

6. The method for preparing high-strength, high-transmittance nanocrystalline glass as described in claim 1, characterized in that, The grain size of the nanocrystalline glass is 50-70 nm.

7. The method for preparing high-strength, high-transmittance nanocrystalline glass as described in claim 1, characterized in that, The antireflective coating is a multilayer film made of alternating SiO2 and Si3N4, with a total of 7-10 layers and a single layer thickness of 80-200 nm.

8. The method for preparing high-strength, high-transmittance nanocrystalline glass as described in claim 1, characterized in that, The reaction temperature of the fluorocarbon silane solution is 80-150℃, and the reaction time is 10-60 minutes, forming an anti-fingerprint layer with a thickness of 1-10 nm and a water contact angle ≥110°.

9. High-strength, high-transmittance nanocrystalline glass prepared by the preparation method according to any one of claims 1-8.

10. The application of the high-strength, high-transmittance nanocrystalline glass as described in claim 9 in the field of mobile phone and tablet glass cover plates.

Images