Impressing mechanism and grating forming equipment
Through the design of a windable roller and a toothed structure, the problem of photoresist residue in the nanoimprint process is solved, and effective scraping of the photoresist and preparation of high-performance optical components are achieved.
Patent Information
- Application Number
- CN202511307767.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-09-12
- Publication Date
- 2025-10-17
AI Technical Summary
During the imprint molding stage in the nanoimprint process, a large amount of photoresist will remain on the surface of the substrate, affecting the performance of the optical components.
A rollable roller is used to scrape the photoresist into the mold cavity and fill it through its elastic deformation and scraping surface. The tooth structure and piezoelectric material are combined to monitor the pressure to ensure effective scraping of the photoresist.
Reduce or avoid photoresist residue, improve the optical performance of optical components, and allow the use of photoresist with high nanoparticle content to improve the optical performance of gratings.
Smart Images
Figure CN120802559A_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The present application relates to the technical field of optical element preparation, in particular to a stamping mechanism and a grating forming device. BACKGROUND
[0002] Nanoimprint technology is a technology that transfers micro-nano structures on a template to a material to be processed by using photoresist as an aid. The process includes three stages of template preparation, stamping forming and etching processing. In the stamping forming stage, the existing method is to coat photoresist on the surface of the substrate to be processed, then vertically press the template on the surface, and transfer the pattern on the template to the photoresist by using pressure. In this process, the pressure cannot be too large, otherwise the template will directly contact the substrate and damage the template, so usually there will be a thick and uneven residual layer on the surface of the substrate, which needs to be removed by etching. In the etching processing stage, the residual layer is removed by etching, which will inevitably etch the area that needs to be reserved, and also cause the surface of the substrate after removing the residual layer to be rough, affecting the performance of the optical element. SUMMARY
[0003] Therefore, the present application provides a stamping mechanism and a grating forming device to solve the technical problem that a large amount of photoresist is left on the surface of the substrate in the stamping forming stage of the nanoimprint process.
[0004] An embodiment of the present application provides a stamping mechanism. The stamping mechanism is used for stamping a to-be-stamped member coated with photoresist. The stamping mechanism comprises a rolling member. The rolling member is configured to be wound and is configured to roll and scrape along the extension direction thereof. The rolling member comprises a plurality of stamping structures. The plurality of stamping structures are arranged at intervals along the extension direction. A mold cavity is formed between two adjacent stamping structures. The stamping structure has a scraping surface. When the rolling member rolls and scrapes, the rolling member can be unfolded from a wound state to a flat state. The rolling member is elastically deformed in the wound state, and the rolling member can recover from deformation when unfolded. When the rolling member is unfolded, the recovery of the rolling member from deformation causes the scraping surface to scrape the photoresist into and fill the mold cavity; when the rolling member is in the flat state, the scraping surface is attached to the to-be-stamped member.
[0005] By winding, the rolling member is provided with stress so that the rolling member is elastically deformed, the distance between adjacent embossing structures is increased, and the volume of the mold cavity between adjacent embossing structures is also increased. When embossing is needed, the rolling member is unfolded from the winding state to the flat state, and the scraping surface scrapes the photoresist into the mold cavity and fills the mold cavity. As the stress on the rolling member gradually decreases, the rolling member deforms and recovers, the distance between adjacent embossing structures decreases, and the photoresist is difficult to extrude into the mold cavity in the filled state. At the same time, the scraping surface will fall to fit the surface of the to-be-embossed member, and the excess photoresist between the two embossing structures will be scraped by the scraping surface to the next to-be-filled mold cavity. In this way, there is little or even no photoresist remaining between the scraping surface and the surface of the to-be-embossed member.
[0006] In some embodiments, the rolling member includes a first member and a second member. The first member and the second member are connected. The first member has a rolling side and a first connecting side opposite to each other. The second member has a second connecting side. The embossing structure is arranged on the rolling side. The first connecting side and the second connecting side are both provided with a tooth structure. The tooth structure of the first connecting side and the tooth structure of the second connecting side are engaged and connected, so that the first member and the second member are connected.
[0007] With repeated winding and unfolding of the rolling member, the embossing structure may be displaced or distorted, and the deformation degree of the embossing structure at different positions may be different. For a rolling member with a relatively long length, it may need to be wound for multiple turns. When in the winding state, the stress borne by the embossing structure at different positions is also different. Excessive stress may cause the embossing structure at different positions to deform along the extension direction after the rolling member is unfolded, thereby affecting the fitting degree of the scraping surface and the to-be-embossed member and affecting the embossing effect. By arranging the tooth structure on the first connecting side and the second connecting side, the first member and the second member can be interlocked and connected through the tooth structure. The tooth structure can reduce the excess deformation stress, thereby reducing the influence of the deformation of the embossing structure on the embossing effect.
[0008] In some embodiments, the tooth structure includes a plurality of tooth-shaped portions. The plurality of tooth-shaped portions are sequentially arranged and connected along the extension direction. The tooth-shaped portion has a first tooth surface and a second tooth surface. The first tooth surface and the second tooth surface are symmetrically arranged and connected. The included angle between the first tooth surface and the second tooth surface ranges from 30° to 75°.
[0009] The angle value of the included angle between the first tooth surface and the second tooth surface determines the density of the tooth structure. The density of the tooth structure can affect the speed of the deformation recovery of the rolling member when it is expanded, and further affect the fineness of the action of the scraping surface scraping the photoresist. When the angle value is small, the tooth structure is arranged more densely, and the step corresponding to each tooth is small, which can realize more subtle and fine actions of each imprint structure rolling and scraping, and the speed of the deformation recovery of the rolling member will be slower. When the angle value is large, the tooth structure is arranged more sparsely, and the step corresponding to each tooth is large, which can realize larger actions of each imprint structure rolling and scraping, and the speed of the deformation recovery of the rolling member will be faster. Therefore, the angle value of the included angle between the first tooth surface and the second tooth surface can be set to adjust the imprinting action of the imprinting mechanism, and further to obtain a better imprinting effect.
[0010] In some embodiments, the imprinting mechanism further comprises a winding member. The rolling member is wound on the winding member. The winding member is configured to rotate around a rotation axis and drive the rolling member to roll and scrape along the extension direction. The rotation axis and the extension direction intersect. The rolling member comprises a first clamping part and a second clamping part. The first clamping part and the second clamping part are connected to make the rolling member wound on the winding member.
[0011] The winding member can provide support for the rolling member in the wound state. Compared with the rolling member relying on its own winding, the rolling member can be wound on the winding member, which can protect the imprint structure and facilitate control of the unwinding speed of the rolling member from the wound state to the flat state.
[0012] In some embodiments, the imprinting mechanism further comprises a controller. The first member is made of piezoelectric material. The controller is electrically connected to the first member to obtain the pressure value of the first member.
[0013] The first member is made of piezoelectric material. By using the piezoelectricity of the piezoelectric material, the pressure applied by the scraping surface of the imprint structure to the to-be-imprinted member during expansion can be obtained, and further the amount of photoresist remaining between the scraping surface of the imprint structure and the to-be-imprinted member and the imprinting effect can be monitored. If the pressure value applied by the rolling member to the to-be-imprinted member during expansion and rolling scraping is appropriate, the scraping surface will contact the surface of the to-be-imprinted member, and there will be no photoresist remaining between the scraping surface and the to-be-imprinted member, and the imprinting effect is the best. If the pressure value applied by the rolling member is too large, the scraping surface will not only contact the surface of the to-be-imprinted member but also damage the to-be-imprinted member. If the pressure value applied by the rolling member is too small, there will be a thick photoresist remaining between the scraping surface and the to-be-imprinted member, i.e. the imprinting effect is not ideal.
[0014] In some embodiments, the embossing mechanism further comprises a sensing module. The sensing module comprises an emitting member and a detecting member. The emitting member and the detecting member are electrically connected. The emitting member is configured to emit a detecting light when the rolling member is in the flattened state. The detecting light passes through the scraping surface. The detecting member is configured to receive the detecting light.
[0015] The emitting member emits the detecting light along the detecting direction, the detecting light passes through the embossing structure of the rolling member and the to-be-embossed member, and the mold cavity is filled with the photoresist. Since the materials of the to-be-embossed member, the photoresist and the rolling member are different, the refractive indexes of different materials are different, and the optical signal of the detecting light after passing through changes. If the detecting light only passes through the scraping surface of the to-be-embossed member and the rolling member, the detecting light will be refracted at least twice; if the detecting light passes through the scraping surface of the to-be-embossed member, the photoresist and the rolling member, the detecting light will be refracted at least three times, so that whether the photoresist is left between the scraping surface and the to-be-embossed member can be judged according to the change of the refraction angle of the detecting light received by the detecting member.
[0016] In some embodiments, the material of the first member is a thermosetting resin.
[0017] In some embodiments, the material of the second member is a metal material or a resin base material.
[0018] In some embodiments, the embossing structure further has a first side surface and a second side surface. The first side surface, the scraping surface and the second side surface are sequentially connected along the extending direction. The first side surface and the second side surface are both perpendicularly connected with the scraping surface and located on the same side of the scraping surface. The length of the scraping surface along the extending direction is L1, and 50nm≤L1≤400nm. The length of the first side surface along the direction perpendicular to the extending direction is L2, the length of the second side surface along the direction perpendicular to the extending direction is L3, and 100nm≤L2=L3≤800nm.
[0019] The embossing structure is a straight-toothed structure. When the embossing structure is transferred to the to-be-embossed member coated with the photoresist, an optical component with a grating structure on the surface can be obtained.
[0020] An embodiment of the present application provides a grating forming device. The grating forming device comprises a workbench and the embossing mechanism in any of the above embodiments. The workbench is used for fixing the to-be-embossed member coated with the photoresist. BRIEF DESCRIPTION OF DRAWINGS
[0021] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some of the embodiments of the present application, and therefore should not be regarded as a limitation on the scope.
[0022] Figure 1 A structural schematic diagram of the embossing mechanism provided by an embodiment of the present application is shown in the figure; Figure 2A partial structure of the embossing mechanism in a rolling and scraping process is provided in an embodiment of the present application. Figure 3 A structure of the first and second buckling parts is provided in an embodiment of the present application. Figure 4 A connection of the first member and the controller is provided in an embodiment of the present application. Figure 5 A structure of the embossing mechanism in a flat state is provided in an embodiment of the present application. Figure 6 A connection of the sensing module and the controller is provided in an embodiment of the present application. Figure 7 A partial structure of the grating forming device is provided in an embodiment of the present application.
[0023] Main element symbol description: 100, embossing mechanism; 1, rolling part; 101, embossing structure; 1011, scraping surface; 1012, first side surface; 1013, second side surface; 102, mold cavity; 1021, bottom wall; 11, first member; 12, second member; 103, tooth structure; 1031, tooth part; 1031a, first tooth surface; 1031b, second tooth surface; 1041, first buckling part; 1042, second buckling part; 2, rolling part; 31, first controller; 32, second controller; 4, sensing module; 41, emitting part; 42, detecting part; 200, grating forming device; 5, workbench; 6, to-be-embossed part; 7, photoresist; X, extension direction; Z, detection direction; R, rotation axis. DETAILED DESCRIPTION
[0024] The technical solutions in the embodiments of the present application will be described below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only some of the embodiments of the present application, but not all the embodiments of the present application.
[0025] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. The terminology used in the description of the application herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the application.
[0026] The terms "first", "second", and the like, are used only for the purpose of description, and should not be understood as indicating or implying relative importance.
[0027] It is to be understood that when an element is referred to as being "connected", "coupled", "attached" or "joined" to another element, it can be directly connected, coupled, attached or joined to the other element, or intervening elements can be present. When an element is referred to as being "disposed on" another element, it can be directly disposed on the other element, or intervening elements can be present.
[0028] Embodiments of the present application provide a stamping mechanism. The stamping mechanism is used for stamping a workpiece coated with photoresist. The stamping mechanism comprises a rolling member. The rolling member is configured to be wound and is configured to roll the squeegee along the extension direction thereof. The rolling member comprises a plurality of stamping structures. The plurality of stamping structures are arranged at intervals along the extension direction. A mold cavity is formed between any two adjacent stamping structures. The stamping structure has a squeegee surface. When the rolling member rolls the squeegee, the rolling member can be unfolded from the wound state to the flat state. The rolling member is elastically deformed in the wound state, and the rolling member can be deformed to recover in the unfolded state. When the rolling member is unfolded, the deformed recovery of the rolling member causes the squeegee surface to squeegee the photoresist into and fill the mold cavity; when the rolling member is in the flat state, the squeegee surface is in contact with the workpiece.
[0029] By winding, the rolling member is provided with stress to cause elastic deformation of the rolling member, the distance between the adjacent stamping structures will be larger, and the volume of the mold cavity between the adjacent stamping structures will also increase. When stamping is needed, the rolling member is unfolded from the wound state to the flat state, the squeegee surface will squeegee the photoresist into the mold cavity and fill the mold cavity, as the stress on the rolling member gradually decreases, the rolling member will deform to recover, the distance between the adjacent stamping structures will decrease, and it will be difficult for the photoresist to be squeezed into the mold cavity in the filled state, at the same time, the squeegee surface will fall to be in contact with the workpiece, and the excess photoresist between the two stamping structures will be squeegeed by the squeegee surface to the next mold cavity to be filled, so that there is little or even no photoresist remaining between the squeegee surface and the surface of the workpiece.
[0030] Some embodiments of the present application will be described in detail below with reference to the accompanying drawings. The following embodiments and features in the embodiments can be combined with each other without conflict.
[0031] Nanoimprint technology is a technology that transfers micro-nano structures on a template to a workpiece by photoresist assistance. The micro-nano structures on the template refer to a plurality of parallel groove structures at the nanometer level or even the micrometer-nanometer level. In the imprint forming stage, the traditional nanoimprint technology is to coat photoresist on the surface of the workpiece, then press the side of the template with micro-nano structures on the photoresist, and use the pressure to transfer the micro-nano structures to the photoresist. If the template and the workpiece are in contact, the template will be damaged, therefore, a layer of photoresist must be left between the template and the workpiece, and the excess photoresist will be removed by etching later.
[0032] Please refer to Figure 1 andFigure 2 An embodiment of the present application provides a stamping mechanism 100. Figure 1 Fig. 1 is a schematic view of the stamping mechanism 100 in a flat state. The stamping mechanism 100 is used for stamping a workpiece 6 coated with photoresist 7. The stamping mechanism 100 comprises a rolling member 1. The rolling member 1 is configured to be wound and is arranged to roll squeegee along an extension direction X thereof. The rolling member 1 comprises a plurality of stamping structures 101. The plurality of stamping structures 101 are arranged at intervals along the extension direction X. A mold cavity 102 is formed between two adjacent stamping structures 101. The stamping structure 101 has a squeegee surface 1011. When the rolling member 1 rolls squeegee, the rolling member 1 can be unfolded from a wound state to a flat state. The rolling member 1 is elastically deformed in the wound state and can be deformed to recover in the unfolded state. As shown in Fig. 1, the stamping structure 101 refers to the protruding straight-tooth structure on the side of the rolling member 1 in contact with the photoresist 7. It should be noted that when the rolling member 1 is in the flat state, the rolling member 1 itself extends along the extension direction X, the plurality of stamping structures 101 are arranged at intervals along the extension direction X, and the direction in which the rolling member 1 rolls squeegee is the extension direction X; when the rolling member 1 is in the wound state, the plurality of stamping structures 101 are arranged at intervals along the circumferential direction of the rolling member 1. Figure 2
[0033] By winding, stress is provided to the rolling member 1 to cause the rolling member 1 to deform, the distance between the adjacent stamping structures 101 increases, and the volume of the mold cavity 102 between the adjacent stamping structures 101 also increases. When stamping is needed, the rolling member 1 is unfolded from the wound state to the flat state, the squeegee surface 1011 squeegees the photoresist 7 into the mold cavity 102 and fills the mold cavity 102, as the stress received by the rolling member 1 gradually decreases, the rolling member 1 deforms to recover, the distance between the adjacent stamping structures 101 decreases, and it is difficult for the photoresist 7 to be squeezed into the mold cavity 102 in the filled state, at the same time, the squeegee surface 1011 falls to be in contact with the workpiece 6, the excess photoresist 7 between the two stamping structures 101 is squeegeed by the squeegee surface 1011 into the next mold cavity 102 to be filled, so that there is little or even no photoresist 7 remaining between the squeegee surface 1011 and the surface of the workpiece 6.
[0034] The related technology is to use vertical pressure to transfer the micro-nano structure on the template to the photoresist. The embossing mechanism 100 of the present application is to complete the embossing by rolling the rolling piece 1 along the extension direction X, so that the rolling piece 1 is unfolded from the winding state to the flat state. In the process of unfolding, due to the deformation recovery of the rolling piece 1, there is a gradual process, and the rolling piece 1 with the embossing structure 101 will gradually fall to the surface of the to-be-embossed piece 6 coated with the photoresist 7. Along the extension direction X, with the scraping, embossing and contact of the to-be-embossed piece 6, the embossing structure 101 that has completed the embossing will be in a horizontal state and will play a role in controlling the embossing height. The embossing structure 101 that has not been unfolded and is about to fall will complete the embossing along the extension direction X based on the embossing height. In the whole process, the rolling piece 1 will not and does not need to apply pressure to the to-be-embossed piece 6 that will damage the embossing structure 101.
[0035] In the related technology, since the embossing is completed by using vertical pressure, it is necessary to rely on the capillary force of the photoresist 7 to spontaneously fill the grooves of the template, so the mass fraction of the nano particles of the photoresist cannot be too high, generally less than 80%. Because if the mass fraction of the nano particles is greater than or equal to 80%, the viscosity of the photoresist will be high, resulting in slow filling speed of the photoresist and difficulty in completely filling the grooves, thereby forming voids or defects. Therefore, in order to ensure the filling effect of the photoresist, the content of nano particles is usually reduced, but this will also cause the optical performance of the grating formed by the photoresist to be poor. The embodiments of the present application rely on the deformation recovery of the rolling piece 1 in the unfolding process, and the scraping surface 1011 scrapes the photoresist 7 into and fills the mold cavity 102, so the photoresist 7 with a higher content of nano particles can be selected. In some embodiments, the content of nano particles is greater than 85%, so that a grating with better optical performance can be prepared.
[0036] Please continue to see Figure 2 In some embodiments, the rolling piece 1 includes a first member 11 and a second member 12. The first member 11 and the second member 12 are connected. The first member 11 has a rolling side and a first connecting side opposite to each other. The second member 12 has a second connecting side. The embossing structure 101 is arranged on the rolling side. The first connecting side and the second connecting side are both provided with a tooth structure 103. The tooth structure 103 of the first connecting side and the tooth structure 103 of the second connecting side are engaged and connected, so that the first member 11 and the second member 12 are connected.
[0037] With repeated winding and unwinding of the rolling element 1, the embossing structure 101 may be displaced or distorted, and the distortion degree of the embossing structure 101 at different positions may be different. For a rolling element 1 with a relatively long length, it may need to be wound for multiple turns. When in the wound state, the embossing structure 101 at different positions bears different stresses. Too much stress may cause the embossing structure 101 at different positions to be deformed along the extension direction X after the rolling element 1 is unwound, thereby affecting the fitting degree of the scraping surface 1011 and the to-be-embossed element 6 and affecting the embossing effect. The tooth-shaped structure 103 arranged on the first connecting side and the second connecting side can enable the first member 11 and the second member 12 to be connected to each other through interlocking of the tooth-shaped structure 103. The tooth-shaped structure 103 can reduce the excess deformation stress, thereby reducing the influence of the deformation of the embossing structure 101 on the embossing effect.
[0038] In some embodiments, the tooth-shaped structure 103 includes a plurality of tooth-shaped portions 1031. The plurality of tooth-shaped portions 1031 are arranged in sequence along the extension direction X and are connected to each other. The tooth-shaped portion 1031 has a first tooth surface 1031a and a second tooth surface 1031b. The first tooth surface 1031a and the second tooth surface 1031b are symmetrically arranged and connected to each other. The included angle between the first tooth surface 1031a and the second tooth surface 1031b ranges from 30° to 75°. Figure 2 In the formula, a is the included angle between the first tooth surface 1031a and the second tooth surface 1031b.
[0039] The angle value of the included angle between the first tooth surface 1031a and the second tooth surface 1031b determines the density of the tooth-shaped structure 103, which can affect the speed of deformation recovery of the rolling element 1 when unwound, thereby affecting the fineness of the action of the scraping surface 1011 scraping the photoresist 7. When the angle value is small, the tooth-shaped structure 103 is arranged relatively densely, and the step corresponding to each tooth is small, which can realize more subtle and fine rolling and scraping actions of each embossing structure 101, and the speed of deformation recovery of the rolling element 1 is relatively slow. When the angle value is large, the tooth-shaped structure 103 is arranged relatively sparsely, and the step corresponding to each tooth is large, which can realize relatively large rolling and scraping actions of each embossing structure 101, and the speed of deformation recovery of the rolling element 1 is relatively fast. Therefore, the embossing action of the embossing mechanism 100 can be adjusted by setting the angle value of the included angle between the first tooth surface 1031a and the second tooth surface 1031b, thereby obtaining a better embossing effect.
[0040] For different to-be-imprinted objects 6, the applied photoresist 7 will be different, the nano-particle content of different photoresist 7 will be different, and the fluidity or viscosity will also be different. In addition, the imprint structure 101 will also be different, that is, the depth-width ratio of the groove formed by transferring to the to-be-imprinted object 6 will be different. Therefore, it is necessary to set the angle value of the above-mentioned included angle according to the actual needs, so as to obtain better imprinting effect by the imprinting mechanism 100 provided by each embodiment of the present application.
[0041] Please refer to Figure 1 and Figure 3 In some embodiments, the imprinting mechanism 100 further comprises a winding member 2. The rolling member 1 is wound on the winding member 2. The winding member 2 is configured to rotate around a rotation axis R and drive the rolling member 1 to roll and scrape along the extension direction X. The rotation axis R and the extension direction X intersect. The rolling member 1 comprises a first clamping portion 1041 and a second clamping portion 1042. The first clamping portion 1041 and the second clamping portion 1042 are connected in cooperation to make the rolling member 1 wound on the winding member.
[0042] The winding member 2 can provide support for the rolling member 1 in the wound state. Compared with the rolling member 1 relying on its own winding, the rolling member 1 can be wound on the winding member 2, which can protect the imprint structure 101 and facilitate the control of the unwinding speed of the rolling member 1 from the wound state to the flat state. It can be understood that the switching of the rolling member 1 between the wound state and the flat state can be completed by electric control to achieve more precise and accurate control.
[0043] In some embodiments, the first clamping portion 1041 and the second clamping portion 1042 can be located in the first member 11; or part of them is located in the first member 11 and the rest is located in the second member 12.
[0044] Please refer to Figure 4 In some embodiments, the imprinting mechanism 100 further comprises a first controller 31. The material of the first member 11 is piezoelectric material. The first controller 31 is electrically connected to the first member 11 to obtain the pressure value fed back by the first member 11.
[0045] The first member 11 is made of piezoelectric material. The piezoelectricity of the piezoelectric material can be used to obtain the pressure applied by the scraping surface 1011 of the pressure imprint structure 101 to the object 6 to be imprinted when the pressure imprint structure 101 is unfolded, and further to monitor the amount of photoresist 7 remaining between the scraping surface 1011 of the pressure imprint structure 101 and the object 6 to be imprinted and the pressure imprint effect. If the pressure value applied by the rolling pressure device 1 to the object 6 to be imprinted is appropriate, the scraping surface 1011 will contact the surface of the object 6 to be imprinted, and there will be no photoresist 7 remaining between the scraping surface 1011 and the object 6 to be imprinted, and the pressure imprint effect is the best. If the pressure value applied by the rolling pressure device 1 is too large, the scraping surface 1011 will not only contact the surface of the object 6 to be imprinted but also damage the object 6 to be imprinted. If the pressure value applied by the rolling pressure device 1 is too small, there will be a thick photoresist 7 remaining between the scraping surface 1011 and the object 6 to be imprinted, i.e., the pressure imprint effect is not ideal.
[0046] In some embodiments, the first member 11 can be PVDF (polyvinylidene fluoride) or PLLA (poly-L-lactic acid) or other piezoelectric materials.
[0047] Please refer to Figure 5 and Figure 6 In some embodiments, the pressure imprint mechanism 100 further comprises a sensing module 4. The sensing module 4 comprises an emitting member 41 and a detecting member 42. The emitting member 41 and the detecting member 42 are electrically connected. The emitting member 41 is configured to emit detection light when the rolling pressure device 1 is in the flat state. The detection light passes through the scraping surface 1011. The detecting member 42 is configured to receive the detection light.
[0048] The emitting member 41 emits detection light along the detection direction Z. The detection light passes through the object 6 to be imprinted and the pressure imprint structure 101 of the rolling pressure device 1, and the mold cavity 102 is filled with photoresist 7. Since the materials of the object 6 to be imprinted, the photoresist 7 and the rolling pressure device 1 are different, the refractive indexes of different materials are different, and the optical signal of the detection light changes after passing through. If the detection light only passes through the object 6 to be imprinted and the scraping surface 1011 of the pressure imprint structure 101, the detection light will be refracted at least twice; if the detection light passes through the object 6 to be imprinted, the photoresist 7 and the scraping surface 1011 of the pressure imprint structure 101, the detection light will be refracted at least three times. Thus, whether there is photoresist 7 remaining between the scraping surface 1011 and the object 6 to be imprinted can be determined according to the change of the refraction angle of the detection light received by the detecting member 42. It can be understood that the at least here refers to the object 6 to be imprinted, the photoresist 7 and the pressure imprint structure 101. In some embodiments, the rolling pressure device 1 further comprises a first member 11 and a second member 12. The pressure imprint structure 101 is arranged on the first member 11. The detection light also needs to pass through the second member 12. The refractive indexes of the materials of the first member 11 and the second member 12 are also different.
[0049] In some embodiments, the imprinting mechanism 100 further comprises a second controller 32, which is electrically connected to the sensing module 4. Since the materials of the object to be imprinted 6, the photoresist 7 and the rolling member 1 are different, the refractive index is also different, and thus the refraction angle after the detection light passes through and the time required for the detection member 42 to receive the detection light are different. The second controller 32 determines whether the photoresist 7 remains between the scraping surface 1011 and the object to be imprinted 6 according to the refraction angle value and the time.
[0050] In some embodiments, the material of the first member 11 is a thermosetting resin.
[0051] In some embodiments, the material of the first member 11 is an acrylic resin or an epoxy resin.
[0052] In some embodiments, the material of the second member 12 is a metal material or a resin base material. The second member 12 should have a certain material hardness and strength. When the rolling member 1 is unfolded from the winding state to the flat state, the second member 12 can resist the compression stress and deformation generated during winding, ensure that the rolling member 1 has good fatigue resistance, shape memory ability and durability, and can withstand repeated winding and unfolding. At the same time, by using a material with a certain material hardness and strength to manufacture the second member 12, the deformation of the first member 11 caused by repeated winding can be reduced. When the rolling member 1 is unfolded to the flat state, the second member 12 with a certain material hardness and strength can drive the first member 11 to maintain flatness as much as possible, ensuring the imprinting effect. The resin base material can be PMMA (polymethyl methacrylate), PC (polycarbonate), or polyurethane, which is not limited in the present application and the embodiments.
[0053] In some embodiments, the imprinting structure 101 further has a first side surface 1012 and a second side surface 1013. Along the extension direction X, the first side surface 1012, the scraping surface 1011 and the second side surface 1013 are connected in sequence. The first side surface 1012 and the second side surface 1013 are both connected perpendicularly to the scraping surface 1011 and located on the same side of the scraping surface 1011. Along the extension direction X, the length of the scraping surface 1011 is L1, and 50nm≤L1≤400nm. Along the direction perpendicular to the extension direction X, the length of the first side surface 1012 is L2, the length of the second side surface 1013 is L3, and 100nm≤L2=L3≤800nm. Along the extension direction X, the length of the bottom wall 1021 of the mold cavity 102 is L4, and 50nm≤L4≤400nm.
[0054] The imprinting structure 101 is a straight-toothed structure. After the imprinting structure 101 is transferred to the object to be imprinted 6 coated with the photoresist 7, an optical component with a grating structure on the surface can be obtained. Please refer to Figure 5The sidewall of the cavity 102 is the second side 1013 of one of the embossing structures 101 and the first side 1012 of the other embossing structure 101, respectively. In some embodiments, the values of L1, L2 (or L3) and L4 can be set to obtain a grating structure with a desired aspect ratio.
[0055] Please refer to Figure 7 An embodiment of the present application provides a grating forming device 200. The grating forming device 200 comprises a workbench 5 and the embossing mechanism 100 described in any of the above embodiments; the workbench 5 is used to fix a to-be-embossed piece 6 coated with photoresist 7.
[0056] The working process of the embossing mechanism 100 and the grating forming device 200 provided by the embodiments of the present application is described as follows: the to-be-embossed piece 6 is fixed on the workbench 5, and the photoresist 7 is coated on the surface of the to-be-embossed piece 6. After the unwinding speed and the embossing height of the rolling member 1 are set, the rolling member 1 in the winding state is unwound from the winding state, and embossing is performed along the extension direction X; when the rolling member 1 is unwound to the flat state along the extension direction X, solidification is performed; after the solidification is completed, the rolling member 1 and the to-be-embossed piece 6 are separated, and the rolling member 1 in the flat state is wound, and the embossing is completed.
[0057] In addition, those skilled in the art should understand that the above embodiments are only used to illustrate the present application, and are not used as a limitation to the present application, and any appropriate changes and modifications to the above embodiments within the spirit and principle of the present application are within the scope of the present application.
Claims
1. An imprinting mechanism for imprinting a workpiece coated with a photoresist, characterized in that: include: A rolling member is configured to be rollable and configured to roll and scrape along its extension direction; the rolling member includes a plurality of embossing structures, the plurality of embossing structures are arranged at intervals along the extension direction, and a mold cavity is formed between two adjacent embossing structures; The embossed structure has a scraping surface; When the rolling part is rolling and scraping, the rolling part can be unfolded from a wound state to a flat state; the rolling part is elastically deformed in the wound state, and can recover its deformation when unfolded; When the rolling member is unfolded, the deformation of the rolling member is restored so that the scraping surface scrapes the photoresist into and fills the mold cavity; when the rolling member is in the flat state, the scraping surface and the workpiece to be imprinted are in contact with each other.
2. The stamping mechanism according to claim 1, characterized in that: The rolling element includes a first component and a second component, wherein the first component and the second component are connected; The first component has a rolling side and a first connecting side arranged in opposite directions, the second component has a second connecting side, the embossing structure is arranged on the rolling side, and the first connecting side and the second connecting side are both provided with a tooth structure. The tooth structure of the first connecting side and the tooth structure of the second connecting side are engaged and connected to connect the first component and the second component.
3. The stamping mechanism according to claim 2, characterized in that: The tooth structure includes a plurality of tooth-shaped portions, and the plurality of tooth-shaped portions are sequentially arranged and connected along the extension direction; The toothed portion comprises a first tooth surface and a second tooth surface, wherein the first tooth surface and the second tooth surface are symmetrically arranged and connected, and an angle between the first tooth surface and the second tooth surface ranges from 30° to 75°.
4. The stamping mechanism according to claim 1, wherein: The stamping mechanism further includes a winding member, the rolling member is windably provided on the winding member, the winding member is configured to rotate about a rotation axis and drive the rolling member to roll and stamp along the extension direction, the rotation axis and the extension direction intersecting; The rolling member includes a first snap-fit portion and a second snap-fit portion, and the first snap-fit portion and the second snap-fit portion are cooperatively connected to allow the rolling member to be wound around the winding member.
5. The stamping mechanism according to claim 2, characterized in that: The stamping mechanism further includes a controller. The material of the first component is piezoelectric material. The controller is electrically connected to the first component to obtain a pressure value applied to the first component.
6. The stamping mechanism according to claim 1, characterized in that: The stamping mechanism further includes a sensing module, the sensing module includes a transmitter and a detector, and the transmitter and the detector are electrically connected; The emitting element is configured to emit detection light when the rolling element is in the flat state, and the detection light passes through the scraping surface; the detecting element is configured to receive the detection light.
7. The stamping mechanism according to claim 2, characterized in that: The material of the first member is thermosetting resin.
8. The stamping mechanism according to claim 2, characterized in that: The second member is made of a metal material or a resin base material.
9. The stamping mechanism according to any one of claims 1 to 8, characterized in that: The embossing structure further comprises a first side surface and a second side surface, wherein the first side surface, the scraping surface and the second side surface are sequentially connected along the extension direction; the first side surface and the second side surface are both perpendicularly connected to the scraping surface and are located on the same side of the scraping surface; Along the extending direction, the length of the scraping surface is L1, 50nm≤L1≤400nm; along the direction perpendicular to the extending direction, the length of the first side surface is L2, and the length of the second side surface is L3, 100nm≤L2=L3≤800nm.
10. A grating forming device, characterized in that: The invention comprises a workbench and an imprinting mechanism as claimed in any one of claims 1 to 9; the workbench is used for fixing a workpiece to be imprinted coated with photoresist.