Liquid treatment device

Abstract

The invention discloses a liquid treatment device. The liquid treatment device comprises a base; the liquid supply mechanisms are distributed on the base, each liquid supply mechanism comprises a lifting part, a swing arm part and a nozzle part, each swing arm part is used for driving the corresponding nozzle part to move from a standby position to a working position so as to enable the corresponding nozzle part to supply liquid to a substrate, each swing arm part comprises a first swing arm and a second swing arm, and each first swing arm is used for driving the corresponding nozzle part to move from the standby position to the working position. One end of the first swing arm is rotationally connected with the lifting part, the other end of the first swing arm is rotationally connected with one end of the second swing arm, the other end of the second swing arm is rotationally connected with the nozzle part, and the lifting part is used for driving the first swing arm and the second swing arm to do lifting motion; and the nozzle part is driven to do synchronous lifting motion. The liquid supply mechanism can be reasonably arranged, and when the liquid supply mechanism is in a standby state, the first swing arm and the second swing arm are folded, so that the space in the process cavity is effectively saved, and the working efficiency is improved.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of semiconductor, in particular to a liquid processing device. BACKGROUND

[0002] After the photolithography step in the semiconductor manufacturing step is completed, a developing solution is applied to the wafer surface by a developing device.

[0003] The existing developing device includes a cover body arranged to surround a substrate holding part for horizontally holding a wafer, a nozzle part for liquid supply processing to the horizontal wafer, a moving mechanism for moving and supporting the nozzle part, and a cover part for dividing the area between the moving mechanism and the cover body. The structural layout mainly has the following two types:

[0004] (1) The moving mechanism is arranged on both sides of the cover body along the parallel direction of the cavities, and the nozzle part mounted on the moving mechanism moves along the parallel direction of the cavities together with the moving mechanism to the upper side of the wafer in the cover body to complete the coating of the developing solution. This layout needs to occupy the horizontal space of the cavity, and is limited by the height, so that only one type of nozzle can be arranged on both sides of the cover body in a single process cavity, and the configuration of the nozzle part is also relatively simple.

[0005] (2) The moving mechanisms are arranged at the back side of the cover body, and the nozzle part moves along the longitudinal direction of the cavity, i.e. the direction perpendicular to the parallel direction of the cavity, to realize the coating of the developing solution. This layout can arrange multiple nozzles in a single process cavity to meet the configuration requirements, but the moving mechanisms need to move longitudinally for a long distance to realize the liquid supply function, which increases the longitudinal size of the process cavity and requires a long cover part to separate the space from the cover body, resulting in inconvenience in later maintenance.

[0006] In summary, the moving mechanisms in the existing developing device move the nozzle part to the upper side of the wafer in the cover body along the parallel direction of the cavity or the linear trajectory along the longitudinal direction of the cavity to complete the coating of the developing solution, which occupies a large space and requires a cover part to divide the space to protect the wafer in the cover body.

[0007] Therefore, it is necessary to provide a liquid processing device to solve the above problems in the prior art. SUMMARY

[0008] The purpose of the present application is to provide a liquid processing device which can reasonably arrange the liquid supply mechanism, effectively save the space in the process cavity, and improve the work efficiency.

[0009] To achieve the above purpose, the technical scheme of the present application is as follows:

[0010] A liquid processing device, comprising:

[0011] a base;

[0012] Multiple liquid supply mechanisms are distributed on the base, and the liquid supply mechanism includes a lifting part, a swing arm part and a nozzle part. The swing arm part is used to drive the nozzle part to move from a standby position to a working position so that the nozzle part supplies liquid to the substrate. The swing arm part includes a first swing arm and a second swing arm. One end of the first swing arm is rotatably connected to the lifting part, the other end of the first swing arm is rotatably connected to one end of the second swing arm, and the other end of the second swing arm is rotatably connected to the nozzle part. The lifting part is used to drive the first swing arm and the second swing arm to perform lifting and lowering movements, so as to drive the nozzle part to perform synchronous lifting and lowering movements.

[0013] The beneficial effects of the liquid treatment device provided by the present invention are: by arranging different numbers of liquid supply mechanisms of the same structure, the reasonable arrangement of the liquid supply mechanisms can occupy a smaller space, saving space, and at the same time being designed as a lifting part and a swing arm part, and a straight line trajectory and an arc trajectory in space are realized at the same time, compared with the straight line trajectory in the existing structure, it effectively saves space, and further, the swing arm part is designed as a first swing arm and a second swing arm, and the folding and extension of the first swing arm and the second swing arm are realized, thereby reducing the movement distance of the swing arm part, saving space, and improving space utilization.

[0014] Furthermore, the first swing arm includes a first drive assembly and a first housing, wherein the first drive assembly is disposed in the first housing and is configured to drive the first housing to rotate along the axial direction of the lifting portion;

[0015] The second swing arm includes a second drive assembly and a second housing. The second drive assembly is disposed within the second housing, and the first drive assembly is in transmission connection with the second drive assembly. The first drive assembly is configured to drive the second drive assembly to move. This advantageously prevents contamination of the substrate by particles generated during movement of the first and second drive assemblies, eliminating the need for a separate cover, and effectively conserving space.

[0016] Furthermore, the first drive assembly includes a first rotating rod, a first pulley, a first synchronous belt and a second pulley, the first pulley is sleeved on the first rotating rod, one end of the first synchronous belt is sleeved on the first pulley, and the other end of the first synchronous belt is sleeved on the second pulley, the second drive assembly includes a second rotating rod, a third pulley, a second synchronous belt and a fourth pulley, the second pulley and the third pulley are coaxially sleeved on the second rotating rod, one end of the second synchronous belt is sleeved on the third pulley, and the other end of the second synchronous belt is sleeved on the fourth pulley.

[0017] Further, a bearing table is arranged on the base and located at one side of the liquid supply mechanism, and the bearing table is used for bearing the substrate. The beneficial effect is that the overall space is more compact by arranging the bearing table at one side of the liquid supply mechanism, and the liquid supply mechanism can supply liquid to the substrate on the bearing table.

[0018] Further, the bearing table is provided with suction holes for communicating with a vacuum device.

[0019] Further, the liquid supply mechanism comprises a first liquid supply mechanism, a second liquid supply mechanism and a third liquid supply mechanism, the first liquid supply mechanism and the second liquid supply mechanism are arranged at one side of the third liquid supply mechanism, and the first liquid supply mechanism and the second liquid supply mechanism are arranged side by side. The beneficial effect is that by arranging three liquid supply mechanisms in a single process cavity, two liquid treatment modes can be realized, and by arranging the positions of the three liquid supply mechanisms on the base, the limited space is fully utilized, and the space utilization rate is improved.

[0020] Further, the nozzle part of the first liquid supply mechanism is used for providing the substrate with a first chemical liquid, the nozzle part of the second liquid supply mechanism is used for providing the substrate with a second chemical liquid, and the nozzle part of the third liquid supply mechanism is used for providing the substrate with a cleaning liquid. The beneficial effect is that by cooperating the first liquid supply mechanism with the third liquid supply mechanism, and cooperating the second liquid supply mechanism with the third liquid supply mechanism, two liquid treatment modes are realized.

[0021] Further, the nozzle part of the first liquid supply mechanism is a straight rod structure, and the nozzle parts of the second liquid supply mechanism and the third liquid supply mechanism are L-shaped structures. The beneficial effect is that by designing the nozzle part of the first liquid supply mechanism as a straight rod structure, and designing the nozzle parts of the second liquid supply mechanism and the third liquid supply mechanism as L-shaped structures, the overall space is more compact, and the space in the cavity can also be fully utilized.

[0022] Further, the end of the nozzle part is provided with a discharge port for communicating with a liquid source system.

[0023] Further, the lifting part comprises a lifting driving assembly and a lifting shaft, the lifting driving assembly is connected with the lifting shaft, the lifting shaft is connected with the first swing arm, and the lifting driving assembly is used for driving the lifting shaft to make lifting movement, so as to drive the first swing arm to make synchronous lifting movement. BRIEF DESCRIPTION OF DRAWINGS

[0024] Figure 1 It is a schematic view of the liquid treatment device of the embodiment of the present application.

[0025] Figure 2Schematic diagram of the standby state of the liquid supply mechanism according to an embodiment of the present invention;

[0026] Figure 3 Schematic diagram of the working state of the liquid supply mechanism according to an embodiment of the present invention.

[0027] Figure numerals: 1. base; 2. liquid supply mechanism; 21. lifting part; 211. lifting drive assembly; 212. lifting shaft; 22. swing arm part; 221. first swing arm; 222. second swing arm; 23. nozzle part; 3. supporting platform. DETAILED DESCRIPTION

[0028] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below. Obviously, the described embodiments are part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative work are within the scope of protection of the present invention. Unless otherwise defined, the technical terms or scientific terms used herein should be the common meanings understood by people with ordinary skills in the field to which the invention belongs. The words "including" and similar words used in this article mean that the elements or objects appearing before the word cover the elements or objects listed after the word and their equivalents, without excluding other elements or objects.

[0029] The specific embodiments of the present invention will be further described in detail below with reference to the accompanying drawings.

[0030] like Figure 1-Figure 3 As shown, an embodiment of the present invention provides a liquid processing device, comprising: a base 1 and a plurality of liquid supply mechanisms 2. The plurality of liquid supply mechanisms 2 are distributed on the base 1. The liquid supply mechanism 2 comprises a lifting portion 21, a swing arm portion 22 and a nozzle portion 23. The lifting portion 21 is connected to the swing arm portion 22, and the lifting portion 21 drives the swing arm portion 22 to perform lifting motion. The swing arm portion 22 is connected to the nozzle portion 23, and the swing arm portion 22 is used to drive the nozzle portion 23 to move from a standby position to a working position, so that the nozzle portion 23 supplies liquid to the substrate. That is, by designing the lifting portion 21, the swing arm portion 22 and the nozzle portion 23 perform a linear lifting motion; by designing the swing arm portion 22, the nozzle portion 23 performs an arc motion, that is, the nozzle portion 23 is driven to first perform a linear motion and then perform an arc motion to above the substrate, so as to supply liquid to the substrate for liquid processing. The substrate is, for example, a wafer.

[0031] The swing arm part 22 comprises a first swing arm 221 and a second swing arm 222. One end of the first swing arm 221 is rotationally connected with the lifting part 21, the other end of the first swing arm 221 is rotationally connected with one end of the second swing arm 222, and the other end of the second swing arm 222 is rotationally connected with the nozzle part 23. The lifting part 21 is used to drive the first swing arm 221 and the second swing arm 222 to make lifting movement, so as to drive the nozzle part 23 to make synchronous lifting movement. That is, the lifting part 21 drives the first swing arm 221 and the second swing arm 222 to make reciprocating linear movement in the vertical direction, and drives the nozzle part 23 to make reciprocating linear movement in the vertical direction. The vertical direction is the direction perpendicular to the base 1. The first swing arm 221 and the second swing arm 222 are rotationally connected, so that the first swing arm 221 and the second swing arm 222 can perform outward extension and inward folding actions, that is, the movement trajectory in space is an arc movement trajectory. In addition, the nozzle part 23 is arranged at the other end of the second swing arm 222, that is, the end of the second swing arm 222, that is, the second swing arm 222 can drive the nozzle part 23 to make arc movement.

[0032] By simultaneously designing the lifting part 21 and the swing arm part 22, the nozzle part 23 can not only make reciprocating linear movement in the vertical direction, but also make arc movement from the standby position to the working position to supply liquid to the wafer. The combination of linear movement and arc movement reduces the distance of the nozzle part 23 moving along the X-axis or Y-axis direction in the space, reduces the space occupied in the cavity, and when the liquid supply mechanism 2 is in the standby position, the first swing arm 221, the second swing arm 222 and the nozzle part 23 are in the folded state, which can effectively save the space in the cavity and improve the space utilization.

[0033] As Figure 1As shown, in some embodiments of the present invention, the first swing arm 221 includes a first drive assembly and a first shell. The first drive assembly is arranged in the first shell, that is, the first shell is used to surround the first drive assembly. The first drive assembly is used to drive the first shell to rotate along the axial direction of the lifting part. The second swing arm 222 includes a second drive assembly and a second shell. The second drive assembly is arranged in the second shell, that is, the second shell is used to surround the second drive assembly. The first drive assembly is transmission-connected to the second drive assembly, and the first drive assembly is used to drive the second drive assembly to move. The first swing arm 221 and the second swing arm 222 are both long hollow structures. The hollow interiors of the first shell of the first swing arm 221 and the second shell of the second swing arm 222 can respectively accommodate the first drive assembly and the second drive assembly, thereby maximizing the rational use of space and eliminating the need to separately design a covering component to cover the outside of the swing drive assembly. At the same time, compared to the prior art that intentionally designs a covering portion, designing the first drive assembly within the first shell and the second drive assembly within the second shell can not only prevent the moving parts of the first drive assembly and the second drive assembly from being affected by particles generated by friction during movement on the wafer, but also save manufacturing costs, save space, and improve space utilization. The first drive assembly and the second drive assembly cooperate to cause the first swing arm 221 and the second swing arm 222 to swing in different directions and at different angles. As a result, the first swing arm 221 and the second swing arm 222 work in conjunction to drive the nozzle unit 23 from the standby position to the working position. That is, the nozzle unit 23 is driven to move in an arc.

[0034] The first drive assembly and the second drive assembly serve to output power. The swingable first swing arm 221 and the second swing arm 222 drive the nozzle portion 23 to perform reciprocating arc motion by folding and extending. The action is fast and the structural design is simple. Compared with the prior art which only performs linear motion along the X-axis direction or the Y-axis direction, the limited space in the cavity is effectively utilized, the moving distance of the swing arm portion 22 is significantly shortened, and the space utilization rate is improved.

[0035] In some embodiments of the present invention, the first drive assembly includes a first rotating rod, a first pulley, a first synchronous belt, and a second pulley. The first pulley is mounted on the first rotating rod, one end of the first synchronous belt is mounted on the first pulley, and the other end of the first synchronous belt is mounted on the second pulley. The second drive assembly includes a second rotating rod, a third pulley, a second synchronous belt, and a fourth pulley. The second pulley and the third pulley are coaxially mounted on the second rotating rod, one end of the second synchronous belt is mounted on the third pulley, and the other end of the second synchronous belt is mounted on the fourth pulley. The first synchronous belt is provided with a rack to mesh with the first and second pulleys for transmission. The second synchronous belt is provided with a rack to mesh with the third and fourth pulleys for transmission.

[0036] The first rotating rod is driven to rotate by driving the motor, and the first rotating rod drives the first pulley to rotate, the first pulley drives the second pulley to rotate through the first synchronous belt, the second pulley drives the third pulley to rotate through the second rotating rod, and the third pulley drives the fourth pulley to rotate through the second synchronous belt. This is the driving mode of the first swing arm 221 and the second swing arm 222. Because the number of teeth of the second pulley and the third pulley is different, a speed reduction transmission is established between the second pulley and the third pulley. Of course, a harmonic reducer can also be sleeved on the second rotating rod connecting the first swing arm 221 and the second swing arm 222 instead of the second pulley and the third pulley. After receiving the torque, the harmonic reducer can make the power transmission more stable, so that the position of the first swing arm 221 and the second swing arm 222 when swinging is more stable and accurate.

[0037] In some embodiments of the application, the other end of the second swing arm 222 is connected to the nozzle part 23 through a third rotating rod. The second drive assembly further includes a fifth pulley. The fourth pulley and the fifth pulley are coaxially sleeved on the third rotating rod, and the fourth pulley drives the fifth pulley to rotate through the third rotating rod when the fourth pulley is driven to rotate by the second synchronous belt. Because the number of teeth of the fourth pulley and the fifth pulley is different, a speed reduction transmission is established between the fourth pulley and the fifth pulley. By designing the second pulley and the third pulley to form a gear set with different speed reduction ratios and the fourth pulley and the fifth pulley to form a gear set with different speed reduction ratios, i.e. designing two gear sets, the movement range of the nozzle part 23 is limited, i.e. just above the edge of the wafer, so that the wafer can be liquid treated. Of course, a harmonic reducer can also be sleeved on the third rotating rod connecting the second swing arm 222 and the nozzle part 23 instead of the fourth pulley and the fifth pulley. The harmonic reducer ensures that the power transmitted by the first swing arm 221 and the second swing arm 222 to the nozzle part 23 is more stable, accurate and has no impact.

[0038] It should be noted that the first drive assembly and the second drive assembly can also use other driving modes, which are not described here. Because the number of swing arms determines the range of the movement trajectory, two or more than two swing arms can be set according to actual production needs, and the specific connection mode and movement mode refer to the connection mode of the first swing arm 221 and the second swing arm 222, so as to meet the liquid treatment needs.

[0039] As Figure 1As shown, in some embodiments of the present invention, the liquid supply mechanism 2 includes a first liquid supply mechanism, a second liquid supply mechanism and a third liquid supply mechanism. In this embodiment, three liquid supply mechanisms 2 are simultaneously configured in a single process chamber. The three liquid supply mechanisms 2 can all independently perform liquid supply work, but need to cooperate with each other to complete related process flows, such as the development process. The first liquid supply mechanism and the second liquid supply mechanism are both arranged on one side of the third liquid supply mechanism, and the first liquid supply mechanism and the second liquid supply mechanism are arranged side by side. That is, the first liquid supply mechanism, the second liquid supply mechanism and the third liquid supply mechanism are arranged on the base 1 in the form of a triangle formed by three points. This arrangement facilitates the rational use of space, maximizes space utilization, and facilitates the completion of liquid supply work. Depending on actual conditions, two, three or more liquid supply mechanisms 2 can be set to meet different liquid supply needs.

[0040] It should be emphasized that since the positions of the first liquid supply mechanism, the second liquid supply mechanism and the third liquid supply mechanism are different on the base 1, the first swing arm 221 of the first liquid supply mechanism, the first swing arm 221 of the second liquid supply mechanism and the first swing arm 221 of the third liquid supply mechanism have different swing angles and directions, and the second swing arm 222 of the first liquid supply mechanism, the second swing arm 222 of the second liquid supply mechanism and the second swing arm 222 of the third liquid supply mechanism also have different swing angles and directions. The specific angle design is specifically designed according to actual conditions, so as to meet the needs of the first swing arm 221 and the second swing arm 222 to realize folding and stretching and other actions.

[0041] like Figure 1 As shown, in some embodiments of the present invention, the nozzle portion 23 of the first liquid supply mechanism is used to supply a first chemical liquid to the substrate, the nozzle portion 23 of the second liquid supply mechanism is used to supply a second chemical liquid to the substrate, and the nozzle portion 23 of the third liquid supply mechanism is used to supply a cleaning liquid to the substrate. Specifically, the first and second liquid supply mechanisms for supplying chemical liquids are designed to be arranged side by side, and the third liquid supply mechanism for supplying cleaning liquid is positioned to one side of the first and second liquid supply mechanisms, facilitating the coordination of the liquid supply mechanisms for developing. The first and second chemical liquids are different types of developer, enabling simultaneous implementation of two liquid treatment methods to meet different development requirements and significantly improving development efficiency.

[0042] The first liquid processing mode is that the first liquid supply mechanism and the third liquid supply mechanism cooperate. Specifically, the lifting part 21 of the first liquid supply mechanism drives the first swing arm 221, the second swing arm 222 and the nozzle part 23 of the first liquid supply mechanism to rise, and the first swing arm 221, the second swing arm 222 and the nozzle part 23 of the first liquid supply mechanism start to make an arc motion, i.e. extend from the standby position to the working position, at this time, the nozzle part 23 of the first liquid supply mechanism is above the edge of the wafer, the nozzle part 23 of the first liquid supply mechanism independently supplies the developing liquid to the wafer to coat the surface thereof, and develops. After the development is completed, the first liquid supply mechanism returns to the standby position. The lifting part 21 of the third liquid supply mechanism drives the first swing arm 221, the second swing arm 222 and the nozzle part 23 of the third liquid supply mechanism to rise, and the first swing arm 221, the second swing arm 222 and the nozzle part 23 of the third liquid supply mechanism start to make an arc motion, i.e. extend from the standby position to the working position, at this time, the nozzle part 23 of the third liquid supply mechanism is above the edge of the wafer, the nozzle part 23 of the third liquid supply mechanism independently supplies the cleaning liquid to the wafer to coat the surface thereof, and cleans. After the cleaning is completed, the third liquid supply mechanism returns to the standby position.

[0043] The second liquid processing mode is that the second liquid supply mechanism and the third liquid supply mechanism cooperate. Specifically, the lifting part 21 of the second liquid supply mechanism drives the first swing arm 221, the second swing arm 222 and the nozzle part 23 of the second liquid supply mechanism to rise, and the first swing arm 221, the second swing arm 222 and the nozzle part 23 of the second liquid supply mechanism start to make an arc motion, i.e. extend from the standby position to the working position, at this time, the nozzle part 23 of the second liquid supply mechanism is above the edge of the wafer, the nozzle part 23 of the second liquid supply mechanism independently supplies different kinds of developing liquid to the wafer to coat the surface thereof, and develops. After the development is completed, the second liquid supply mechanism returns to the standby position. The lifting part 21 of the third liquid supply mechanism drives the first swing arm 221, the second swing arm 222 and the nozzle part 23 of the third liquid supply mechanism to rise, and the first swing arm 221, the second swing arm 222 and the nozzle part 23 of the third liquid supply mechanism start to make an arc motion, i.e. extend from the standby position to the working position, at this time, the nozzle part 23 of the third liquid supply mechanism is above the edge of the wafer, the nozzle part 23 of the third liquid supply mechanism independently supplies the cleaning liquid to the wafer to coat the surface thereof, and cleans. After the cleaning is completed, the third liquid supply mechanism returns to the standby position.

[0044] As Figure 1As shown in the drawings, in some embodiments of the present application, the nozzle part 23 of the first liquid supply mechanism is in a straight rod structure, and the nozzle part 23 of the second liquid supply mechanism and the third liquid supply mechanism are both in an L-shaped structure. Such a structure design makes the space in the cavity more compact. Of course, the nozzle part 23 of the first liquid supply mechanism, the second liquid supply mechanism and the third liquid supply mechanism can also be designed to be the same structure, that is, the nozzle part 23 of the first liquid supply mechanism, the second liquid supply mechanism and the third liquid supply mechanism are all designed to be a straight rod structure or an L-shaped structure. The specific design can be made according to the actual space requirement.

[0045] As shown in the drawings, Figure 1 In some embodiments of the present application, the end of the nozzle part 23 is provided with a discharge port, and the discharge port is in communication with the liquid source system. That is, the front end of the nozzle part 23 is rotatably connected with the end of the second swing arm 222, and the discharge port for discharging liquid is arranged at the end of the nozzle part 23. The liquid in the liquid source system enters the nozzle part 23 from the liquid inlet of the nozzle part 23, and the liquid is discharged from the discharge port to supply the wafer with developing liquid or cleaning liquid for developing or cleaning work.

[0046] As shown in the drawings, Figure 1 In some embodiments of the present application, the lifting part 21 includes a lifting drive assembly 211 and a lifting shaft 212. The lifting drive assembly 211 is connected with the lifting shaft 212, and the lifting shaft 212 is connected with the first swing arm 221. The first swing arm 221 is connected with the second swing arm 222, and the second swing arm 222 is connected with the nozzle part 23. The lifting drive assembly 211 is used to drive the lifting shaft 212 to make lifting movement, and the lifting shaft 212 drives the first swing arm 221, the second swing arm 222 and the nozzle part 23 to make synchronous lifting movement. That is, the nozzle part 23 realizes the reciprocating linear motion in the vertical direction through the design of the lifting part 21.

[0047] As shown in the drawings, Figure 2 As shown in the drawings, when the liquid supply mechanism 2 is set to the standby state, the lifting part 21 is in the initial position, that is, the lifting shaft 212 of the lifting part 21 is not lifted. At this time, the first swing arm 221, the second swing arm 222 and the nozzle part 23 are arranged along the X-axis direction. Specifically, the nozzle part 23 is located directly above the second swing arm 222, the second swing arm 222 is located directly above the first swing arm 221, that is, the nozzle part 23, the second swing arm 222 and the first swing arm 221 are in a folded state. Such a design can effectively save the overall space in the cavity when the liquid supply mechanism 2 is in the standby state, and the overall space is simple and compact.

[0048] As shown in the drawings, Figure 3As shown, when the liquid supply mechanism 2 is in operation, the lifting shaft 212 of the lifting unit 21 is in the raised position. That is, the lifting drive assembly 211 is activated, driving the lifting shaft 212 to the raised position. Simultaneously, the first swing arm 221, the second swing arm 222, and the nozzle unit 23 are also driven to the raised position. The first swing arm 221, the second swing arm 222, and the nozzle unit 23 then extend toward the wafer, moving in an arc. That is, the first swing arm 221, the second swing arm 222, and the nozzle unit 23 unfold from a folded state to an extended state, i.e., in the operating position. At this point, the nozzle unit 23 is above the edge of the wafer, with the discharge port of the nozzle unit 23 facing the wafer. This allows liquid to be discharged from the discharge port of the nozzle unit 23 onto the wafer, supplying developer or cleaning liquid to the wafer for development or cleaning.

[0049] In some embodiments of the present invention, the lifting drive assembly 211 includes a lifting motor and a lead screw. One end of the lead screw is connected to the motor shaft of the lifting motor, and the other end of the lead screw is connected to the lifting shaft 212. This design is simple in structure and easy to manufacture.

[0050] like Figure 1 As shown, in some embodiments of the present invention, the liquid processing apparatus further includes a carrier 3. Carrier 3 is disposed on base 1 and located to one side of liquid supply mechanism 2. Carrier 3 is used to support a substrate. The location of carrier 3 facilitates liquid supply mechanism 2 to supply liquid to a wafer positioned on carrier 3.

[0051] like Figure 1 As shown, in some embodiments of the present invention, an adsorption hole is provided on the carrier 3, and the adsorption hole is used to communicate with the vacuum equipment. One adsorption hole can be provided, or multiple adsorption holes can be evenly provided. By evenly providing multiple adsorption holes, the force on the wafer is more evenly applied when being adsorbed. By connecting the pipe to the vacuum equipment, vacuum suction is started to generate negative pressure in the carrier 3, thereby sucking the wafer. Specifically, in the process of adsorbing the wafer, under the action of the vacuum equipment, the adsorption hole generates vacuum pressure, so that the wafer is sucked; when the wafer needs to be released, the vacuum equipment stops generating vacuum pressure, and blows air of a certain pressure and flow rate into the adsorption hole to break the vacuum, thereby facilitating better separation of the wafer from the carrier 3.

[0052] The carrier 3 is connected to a rotary drive assembly. The rotary drive assembly drives the carrier 3 to rotate, thereby driving the wafer placed and adsorbed on the carrier 3 to rotate, keeping the wafer in a rotating state when the liquid supply mechanism 2 is working, thereby ensuring more complete development and cleaning.

[0053] In summary, since the space in the cavity is limited, how to arrange the components for liquid processing in the cavity is crucial. In this regard, the liquid processing device of the present application can arrange different numbers of liquid supply mechanisms with the same structure in the cavity, and the reasonable arrangement of the liquid supply mechanisms can occupy less space, realize multiple independent configurations in a single process cavity, save space in the process cavity, improve the space utilization, and improve the production capacity. Meanwhile, the lifting part and the swing arm part are designed to realize the linear motion trajectory of the space motion trajectory of the nozzle part combined with the arc motion trajectory, reduce the motion distance of the swing arm part, effectively save the space, and do not need to separately set the covering part to avoid the particle pollution of the wafer generated by the moving components, greatly improve the production efficiency.

[0054] Although the embodiments of the present application have been described in detail above, it is obvious to those skilled in the art that various modifications and changes can be made to the embodiments. However, it should be understood that such modifications and changes all belong to the scope and spirit of the present application described in the claims. Moreover, the present application described herein can have other embodiments, and can be implemented or realized in various ways.

Claims

1. A liquid treatment device, characterized by, The utility model relates to a liquid supply device for substrate, which comprises: a base; a plurality of liquid supply mechanisms distributed on the base, each of the liquid supply mechanisms comprising a lifting part, a swing arm part and a nozzle part, the swing arm part being used to drive the nozzle part to move from a standby position to a working position so as to supply liquid to the substrate, the swing arm part comprising a first swing arm and a second swing arm, one end of the first swing arm being rotatably connected to the lifting part, the other end of the first swing arm being rotatably connected to one end of the second swing arm, the other end of the second swing arm being rotatably connected to the nozzle part, the lifting part being used to drive the first swing arm and the second swing arm to make lifting movement so as to drive the nozzle part to make synchronous lifting movement.

2. The fluid treatment device defined in claim 1, wherein The first swing arm comprises a first driving assembly and a first housing, the first driving assembly being arranged in the first housing and being used to drive the first housing to rotate along the axial direction of the lifting part; The second swing arm comprises a second driving assembly and a second housing, the second driving assembly being arranged in the second housing, and the first driving assembly being drivingly connected to the second driving assembly, the first driving assembly being used to drive the second driving assembly to move.

3. The fluid treatment device defined in claim 2, wherein The first driving assembly comprises a first rotating rod, a first pulley, a first synchronous belt and a second pulley, the first pulley being sleeved on the first rotating rod, one end of the first synchronous belt being sleeved on the first pulley, the other end of the first synchronous belt being sleeved on the second pulley, the second driving assembly comprising a second rotating rod, a third pulley, a second synchronous belt and a fourth pulley, the second pulley and the third pulley being coaxially sleeved on the second rotating rod, one end of the second synchronous belt being sleeved on the third pulley, the other end of the second synchronous belt being sleeved on the fourth pulley.

4. The fluid treatment device defined in claim 1, wherein The utility model further comprises a bearing table, the bearing table being arranged on the base and being located at one side of the liquid supply mechanisms, the bearing table being used to bear the substrate.

5. The fluid treatment device defined in claim 4, wherein The bearing table is provided with suction holes, the suction holes being used to communicate with a vacuum equipment.

6. The fluid treatment device defined in claim 1, wherein The liquid supply mechanisms comprise a first liquid supply mechanism, a second liquid supply mechanism and a third liquid supply mechanism, the first liquid supply mechanism and the second liquid supply mechanism being arranged at one side of the third liquid supply mechanism, and the first liquid supply mechanism and the second liquid supply mechanism being arranged side by side.

7. The fluid treatment device defined in claim 6, wherein The nozzle part of the first liquid supply mechanism is used to provide a first reagent to the substrate, the nozzle part of the second liquid supply mechanism is used to provide a second reagent to the substrate, and the nozzle part of the third liquid supply mechanism is used to provide a cleaning liquid to the substrate.

8. The fluid treatment device defined in claim 6, wherein The nozzle part of the first liquid supply mechanism is in a straight rod structure, and the nozzle parts of the second liquid supply mechanism and the third liquid supply mechanism are in an L-shaped structure.

9. The fluid treatment device defined in claim 1, wherein The nozzle part is provided with an outlet, the outlet being used to communicate with a liquid source system.

10. The fluid treatment device defined in claim 1, wherein The lifting part comprises a lifting driving assembly and a lifting shaft, the lifting driving assembly being connected to the lifting shaft, the lifting shaft being connected to the first swing arm, and the lifting driving assembly being used to drive the lifting shaft to make lifting movement so as to drive the first swing arm to make synchronous lifting movement.

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