A kind of magnetic control sputtering coating machine prevents particulate matter pollution baffle structure

Abstract

The application discloses a kind of magnetic control sputtering film coating machine anti-particle pollution baffle structure, belong to magnetic control sputtering film coating field, including inner mounting plate and the target material of fixedly connected in inner mounting plate one side, further include the rotating part of being connected in inner mounting plate one side, the second baffle connected with rotating part, the first baffle at the lower end of second baffle, hollow cavity being opened in the inside of first baffle, multiple support frames being fixedly connected in first baffle one side, and another end of multiple support frames is fixedly connected on the outer surface of target material;Rotating part includes hollow guide rod being fixedly connected in target material and one end with inner mounting plate one side fixedly connected;Since first baffle is fixedly arranged and located above the edge of target material, most of large particles that are peeled off or splashed from the edge of target material, most of them will directly impact and adsorb on the bottom of first baffle, and cannot continue to fly to substrate, significantly reduce the probability that large particles directly reach substrate, improve the electrical, optical, mechanical properties and device reliability of thin film.

Description

Technical Field

[0001] This invention relates to the field of magnetron sputtering coating, and more specifically, to a baffle structure for preventing particulate contamination in a magnetron sputtering coating machine. Background Technology

[0002] A magnetron sputtering coating machine is a high-precision device that uses magnetron sputtering technology to sputter atoms or molecules of a material (target) in a vacuum environment, depositing them onto the surface of a substrate (such as silicon wafers, glass, metal, etc.) to form a thin and uniform film. A magnetron sputtering coating machine baffle is a movable physical barrier installed inside the vacuum chamber, located between the sputtering target (target source) and the substrate (substrate). Its core function is to isolate the target and substrate during the non-coating stage, thereby preventing particulate matter or unstable sputtered material from the initial stage of the target from depositing onto the substrate, thus improving the quality and uniformity of the film.

[0003] Existing magnetron sputtering baffles are generally flip-type or rotating type. For example, Chinese invention patent CN112746254B discloses a magnetron sputtering target baffle mechanism that uses the extension and retraction of a cylinder to drive the baffle to flip and achieve shielding and isolation; Chinese invention patent CN106435498B discloses a magnetron sputtering target baffle mechanism that uses a motor to drive the baffle to rotate and achieve shielding and isolation. Although existing baffles can achieve the effect of shielding and isolation, they can only achieve shielding and isolation in the pre-sputtering stage. In the formal sputtering stage, large particles will be generated and spattered from the edge of the target material. If these large particles are deposited on the substrate, they will affect the electrical properties (such as insulation and conductivity), optical properties (such as scattering and transmittance), and mechanical properties (such as density and corrosion resistance) of the thin film, reducing the long-term reliability and service life of the device. Summary of the Invention

[0004] To address the problems existing in the prior art, the purpose of this invention is to provide a baffle structure for preventing particulate contamination in a magnetron sputtering coating machine.

[0005] To solve the above problems, the present invention adopts the following technical solution.

[0006] A particulate contamination prevention baffle structure for a magnetron sputtering coating machine includes an inner mounting plate and a target material fixed to one side of the inner mounting plate.

[0007] It also includes a rotating part connected to one side of the inner mounting plate, a second baffle connected to the rotating part, a first baffle located at the lower end of the second baffle, a hollow cavity opened inside the first baffle, and multiple support frames fixed to one side of the first baffle, with the other end of the multiple support frames fixed to the outer surface of the target material.

[0008] The rotating part includes a hollow guide rod fixed inside the target material and one end fixed to one side of the inner mounting plate, a rotating rod rotatably connected inside the hollow guide rod, a rotating seat fixed to one end of the rotating rod, and a driving part connected to the rotating rod. One side of the second baffle is connected to the rotating seat. One end of the rotating rod extends out from one end of the hollow guide rod and is fixed to the rotating seat.

[0009] Furthermore, the rotating rod has a movable groove inside, and a drive rod is movably inserted into the movable groove.

[0010] Furthermore, the drive unit includes an outer mounting plate, a bracket fixed to one side of the outer mounting plate, a first gear rotatably connected to one side of the outer mounting plate, a second gear rotatably connected to one side of the outer mounting plate and meshing with the first gear, and a motor fixed to one side of the bracket, with the motor's output shaft passing through the bracket and fixedly connected to the first gear; one end of the rotating rod is movably inserted into the outer mounting plate, and one end of the drive rod passes through the outer mounting plate and is fixedly connected to one side of the second gear.

[0011] Furthermore, a groove is provided on one side of the first baffle, and a liner is fixed to the inner wall of the groove. The liner has a trapezoidal cross section, and multiple alternating stepped flanges are integrally formed on the inner wall of the liner.

[0012] Furthermore, the first baffle is provided with a flow channel inside, and two cooling interfaces connected to the flow channel are provided on the outer surface of the first baffle.

[0013] Furthermore, the movable groove is also provided with a tension spring, and the two ends of the tension spring are respectively connected to the inner wall of the movable groove and one end of the drive rod. Two levers are fixed to the outer surface of the rotating rod, and the two levers are provided with inclined surfaces on both sides. Two protrusions are fixed to one side of the outer mounting plate, and the two protrusions are provided with inclined surfaces on both sides.

[0014] Furthermore, the second baffle is rotatably connected to the rotating seat, and both the rotating seat and the rotating rod are internally connected to a flipping assembly for driving the second baffle to rotate.

[0015] Furthermore, the flipping assembly includes a movable groove two formed inside the rotating rod and a clearance groove connected to the movable groove two, a slide block slidably connected in the movable groove two and the clearance groove, two racks fixed to the upper end of the slide block, two gears three rotatably connected to the inner wall of the movable groove two, a rotating shaft rotatably connected inside the rotating seat, a transmission assembly that drives the gears three and the rotating shaft, a movable rod fixed to the lower end of the slide block, and one end of the movable rod passes through the drive rod and the gears two and extends outward. An electric push rod is also fixed to one side of the bracket, and the telescopic end of the electric push rod contacts one end of the movable rod. One end of the rotating shaft is fixed to one side of the second baffle.

[0016] Furthermore, the transmission assembly includes a second synchronous pulley fixed to the outer surface of the rotating shaft, a first synchronous pulley fixed to two gears three at both ends, and a synchronous belt connecting the first synchronous pulley and the second synchronous pulley.

[0017] Furthermore, the outer surface of the rotating rod is dynamically sealed to the inner wall of the hollow guide rod.

[0018] Compared with the prior art, the beneficial effects of the present invention are as follows:

[0019] (1) This scheme is equipped with a double-layer baffle. When the target material is pre-sputtered, the second baffle can be located above the first baffle and block the hollow cavity of the first baffle, thus separating the substrate from the target source during the pre-sputtering stage. After the pre-sputtering is completed and the plasma is stable, the second baffle rotates and opens the hollow cavity of the first baffle to sputter the substrate. Since the first baffle is fixed and located above the edge of the target material, most of the large particles that peel off or splash out from the edge of the target material will directly hit and be adsorbed at the bottom of the first baffle, and will not be able to continue flying to the substrate. This significantly reduces the probability of large particles directly reaching the substrate and improves the electrical, optical, and mechanical properties of the thin film and the reliability of the device.

[0020] (2) This solution installs a liner on the side of the first baffle facing the target material, and designs the part of the first baffle that is directly bombarded as a liner that can be disassembled and replaced separately. Only the liner needs to be replaced, which greatly reduces the downtime of equipment maintenance. At the same time, the liner is provided with multiple stepped flanges. After large particles fly out from the edge of the target material, they will first hit the concave surface of the liner and will not escape directly to the substrate area. The stepped flanges can change the incident angle and reduce the direct path. At the same time, the multi-layer stepped flanges can disperse the ion kinetic energy and the ejection angle of sputtered particles. Most of the secondary sputtering occurs between multiple stepped flanges, which significantly improves the interception capability of large particles and reduces the risk of secondary sputtering and large piece peeling.

[0021] (3) The second baffle in this design can also move up and down when it rotates. This will cause a certain gap between the second baffle and the first baffle in the initial stage of rotation, so as to prevent the sputtered material on the side of the second baffle facing the target from being scraped off by the first baffle and falling from the hollow cavity onto the target surface when it comes into contact with the first baffle. This also prevents the second baffle from contaminating the target during the rotation and opening process. By making the second baffle flip at a high position, the substrate is not contaminated. Attached Figure Description

[0022] Figure 1 This is a schematic diagram of the overall structure of the present invention;

[0023] Figure 2 This is a schematic diagram of the hollow cavity and cooling interface structure of the present invention;

[0024] Figure 3This is a schematic diagram of the groove, liner, and stepped flange structure of the present invention;

[0025] Figure 4 This is a cross-sectional view of the liner of the present invention;

[0026] Figure 5 This is a schematic diagram of the bracket, motor, and electric actuator structure of the present invention;

[0027] Figure 6 This is a schematic diagram of the structure of gear one and gear two of the present invention;

[0028] Figure 7 This is a schematic diagram of the rotating rod and driving rod structure of the present invention;

[0029] Figure 8 This is a cross-sectional view of the connection between the hollow guide rod and the rotating seat of the present invention;

[0030] Figure 9 For the present invention Figure 1 Enlarged schematic diagram of the structure at point A in the middle;

[0031] Figure 10 This is a schematic diagram of the flipping component structure of the present invention;

[0032] Figure 11 This is a schematic diagram of the second movable groove structure of the present invention.

[0033] Explanation of the labels in the diagram:

[0034] 1. Target material; 2. Support frame; 3. First baffle; 31. Hollow cavity; 32. Cooling interface; 33. Groove; 34. Liner plate; 35. Stepped flange; 4. Second baffle; 5. Rotating part; 51. Hollow guide rod; 52. Rotating seat; 53. Rotating rod; 531. Movable groove one; 532. Movable groove two; 533. Alternating groove; 54. Drive rod; 55. Tension spring; 56. Protrusion; 561. Inclined surface one; 57. Pulley; 571. Inclined surface two; 6. Inner mounting plate; 7. Outer mounting plate; 8. Drive part; 81. Bracket; 82. Motor; 83. Gear one; 84. Gear two; 9. Tilting assembly; 91. Movable rod; 92. Slide seat; 93. Rack; 94. Gear three; 95. Synchronous pulley one; 96. Synchronous belt; 97. Synchronous pulley two; 98. Rotating shaft; 10. Electric push rod. Detailed Implementation

[0035] The technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present invention. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. All other embodiments obtained by those skilled in the art based on the embodiments of the present invention without creative effort are within the scope of protection of the present invention.

[0036] Please see Figures 1 to 11 A particulate contamination baffle structure for a magnetron sputtering coating machine includes an inner mounting plate 6 and a target material 1 fixed to one side of the inner mounting plate 6. The inner mounting plate 6 is used to be installed inside the magnetron sputtering coating equipment.

[0037] It also includes a rotating part 5 connected to one side of the inner mounting plate 6, a second baffle 4 connected to the rotating part 5, a first baffle 3 located at the lower end of the second baffle 4, a hollow cavity 31 opened inside the first baffle 3, and multiple support frames 2 fixed to one side of the first baffle 3, with the other end of the multiple support frames 2 fixed to the outer surface of the target material 1.

[0038] The rotating part 5 includes a hollow guide rod 51 fixed inside the target material 1 and one end fixed to one side of the inner mounting plate 6, a rotating rod 53 rotatably connected inside the hollow guide rod 51, a rotating seat 52 fixed to one end of the rotating rod 53, and a driving part 8 connected to the rotating rod 53. One side of the second baffle 4 is connected to the rotating seat 52. One end of the rotating rod 53 extends out from one end of the hollow guide rod 51 and is fixed to the rotating seat 52.

[0039] The rotating rod 53 has a movable groove 531 inside, and a drive rod 54 is movably inserted into the movable groove 531.

[0040] The drive unit 8 includes an outer mounting plate 7, a bracket 81 fixed to one side of the outer mounting plate 7, a gear 83 rotatably connected to one side of the outer mounting plate 7, a gear 84 rotatably connected to one side of the outer mounting plate 7 and meshing with the gear 83, and a motor 82 fixed to one side of the bracket 81, with the output shaft of the motor 82 passing through the bracket 81 and fixedly connected to the gear 83; one end of the rotating rod 53 is movably inserted into the outer mounting plate 7, and one end of the drive rod 54 passes through the outer mounting plate 7 and is fixedly connected to one side of the gear 84. The outer mounting plate 7 is used to be installed outside the magnetron sputtering coating equipment.

[0041] By adopting the above technical solution, during the pre-sputtering of the target material 1, the second baffle 4 can be positioned above the first baffle 3 and shield the hollow cavity 31 of the first baffle 3, thus separating the substrate from the target source during the pre-sputtering stage. After the pre-sputtering is completed and the plasma is stable, the motor 82 drives the gear 1 83 and the gear 2 84 to rotate. The rotation of the gear 2 84 drives the drive rod 54 to rotate, and the rotation of the drive rod 54 drives the rotating rod 53 to rotate inside the hollow guide rod 51. One end of the rotating rod 53 drives the rotating seat 52 and the second baffle 4. The second baffle 4 rotates and moves away from above the first baffle 3, opening the hollow cavity 31. The target 1 can then sputter the substrate through the hollow cavity 31. During the actual sputtering process, since the first baffle 3 is fixed and located above the edge of the target 1, most of the large particles that peel off or splash from the edge of the target 1 will directly impact and adhere to the bottom of the first baffle 3, and will not be able to continue flying towards the substrate. This significantly reduces the probability of large particles directly reaching the substrate, improving the electrical, optical, and mechanical properties of the thin film and the reliability of the device.

[0042] like Figure 3 and Figure 4 As shown, a groove 33 is provided on one side of the first baffle 3, and a liner 34 is fixed to the inner wall of the groove 33. The cross section of the liner 34 is trapezoidal, and multiple alternating stepped flanges 35 are integrally formed on the inner wall of the liner 34.

[0043] The first baffle 3 has a flow channel inside, and two cooling interfaces 32 connected to the flow channel are opened on the outer surface of the first baffle 3.

[0044] By adopting the above technical solution, the liner 34 can be fixed in the groove 33 by snap-fit. The part of the first baffle 3 that is directly bombarded is designed as a liner 34 that can be disassembled and replaced separately. When there is too much deposit on the liner 34, only the liner 34 can be replaced, which greatly reduces the downtime for equipment maintenance. At the same time, the liner 34 is provided with multiple stepped flanges 35. After large particles fly out from the edge of the target, they will first hit the concave surface of the liner 34 and will not directly escape to the substrate area. The stepped flanges 35 can change the incident angle and reduce the direct path. At the same time, the multi-layer stepped flanges 35 can disperse the ion kinetic energy and the ejection angle of sputtered particles. Most of the secondary sputtering occurs between multiple stepped flanges 35, which significantly improves the large particle interception capability and reduces the risk of secondary sputtering and large piece peeling.

[0045] like Figure 1 , Figure 8 and Figure 9As shown, the movable groove 531 is also provided with a tension spring 55, and the two ends of the tension spring 55 are respectively connected to the inner wall of the movable groove 531 and one end of the drive rod 54. Two levers 57 are fixedly connected to the outer surface of the rotating rod 53, and the two levers 57 are provided with inclined surfaces 571 on both sides. Two protrusions 56 are fixedly connected to one side of the outer mounting plate 7, and the two protrusions 56 are provided with inclined surfaces 561 on both sides.

[0046] By adopting the above technical solution, when the motor 82 drives the gear 84 to rotate, the gear 84 can drive the drive rod 54 and the rotating rod 53 to rotate. The rotation of the rotating rod 53 can drive the lever 57 to rotate. When the lever 57 rotates, its inclined surface 571 contacts the inclined surface 561. The protrusion 56 can lift the lever 57. When the lever 57 is lifted, it can drive the rotating rod 53 to move upward inside the hollow guide rod 51, thereby driving the rotating seat 52 to move upward. When the rotating seat 52 moves upward, it can drive the second baffle 4 to move upward, so that a gap appears between the second baffle 4 and the first baffle 3. This prevents the sputtered material on the side of the second baffle 4 facing the target material 1 from being scraped off by the first baffle 3 and falling from the hollow cavity 31 onto the surface of the target material 1 when the second baffle 4 is rotating. This also prevents the second baffle 4 from contaminating the target material 1 during the rotation and opening process. By making the second baffle 4 rise while rotating, contamination of the substrate is avoided.

[0047] like Figures 5-8 , Figure 10 and Figure 11 As shown, the second baffle 4 is rotatably connected to the rotating seat 52, and both the rotating seat 52 and the rotating rod 53 are internally connected to a flipping assembly 9 for driving the second baffle 4 to rotate.

[0048] The flipping assembly 9 includes a second movable groove 532 opened inside the rotating rod 53 and a clearance groove 533 connected to the second movable groove 532, a slide seat 92 slidably connected in the second movable groove 532 and the clearance groove 533, two racks 93 fixed to the upper end of the slide seat 92, two gears 94 rotatably connected to the inner wall of the second movable groove 532, a rotating shaft 98 rotatably connected inside the rotating seat 52, a transmission assembly that drives the gears 94 and the rotating shaft 98, a movable rod 91 fixed to the lower end of the slide seat 92, and one end of the movable rod 91 passes through the drive rod 54 and the gears 94 and extends outward. An electric push rod 10 is also fixed to one side of the bracket 81, and the telescopic end of the electric push rod 10 contacts one end of the movable rod 91. One end of the rotating shaft 98 is fixed to one side of the second baffle 4.

[0049] The transmission assembly includes a second synchronous pulley 97 fixed to the outer surface of the rotating shaft 98, a first synchronous pulley 95 fixed to two third gears 94 at both ends, and a synchronous belt 96 connecting the first synchronous pulley 95 and the second synchronous pulley 97.

[0050] The outer surface of the rotating rod 53 is dynamically sealed to the inner wall of the hollow guide rod 51. The connection between the outer mounting plate 7 and the rotating rod 53 is also dynamically sealed. The dynamic sealing treatment adopts end face dynamic sealing technology to achieve the dynamic sealing effect. End face dynamic sealing technology is a mature existing technology, which will not be described in detail here.

[0051] By adopting the above technical solution, when the rotating rod 53 rotates inside the hollow guide rod 51 and drives the second baffle 4 to move away from the first baffle 3, the protrusion 56 lifts the push block 57, so the slide block 92 will slide towards the clearance groove 533 inside the rotating rod 53; at this time, the electric push rod 10 is controlled to work, the telescopic end of the electric push rod 10 extends and contacts one end of the movable rod 91, pushing the movable rod 91 to move upward inside the drive rod 54. The upward movement of the movable rod 91 can drive the slide block 92 to move towards the synchronous pulley 95. The slide block 92 slides in the movable groove 532 and the slide block 92... The rack 93 drives two gears 94 to rotate, which in turn drives the synchronous pulley 95 to rotate. The rotation of the synchronous pulley 95 drives the synchronous pulley 97 to rotate via the synchronous belt 96. The rotation of the synchronous pulley 97 drives the rotating shaft 98 to rotate, which in turn drives the second baffle 4 to rotate, thereby causing the second baffle 4 to rotate 180° and interchange its upper and lower surfaces. The original lower surface, if exposed for a long time, may cause film accumulation, stress concentration, or particle peeling. After the rotation, the upper surface of the second baffle 4 faces down, and the clean side of the second baffle 4 can be used to intercept the next batch of particles, extending the service life of the second baffle 4.

[0052] Usage: During pre-sputtering of target 1, the second baffle 4 can be positioned above the first baffle 3 and shield the hollow cavity 31 of the first baffle 3, separating the substrate from the target source during the pre-sputtering stage; after pre-sputtering is completed and the plasma is stable, the motor 82 drives gear 1 83 and gear 2 84 to rotate. The rotation of gear 2 84 drives the drive rod 54 to rotate, which in turn drives the rotating rod 53 to rotate inside the hollow guide rod 51. One end of the rotating rod 53 drives the rotating seat 52 and the second baffle 4 to rotate. The second baffle 4 rotates and moves away from above the first baffle 3, opening the hollow cavity 31, allowing target 1 to sputter the substrate through the hollow cavity 31; when the motor 82 drives gear 2... When gear 84 rotates, gear 84 can drive drive rod 54 and rotating rod 53 to rotate. Rotating rod 53 can drive lever 57 to rotate. When lever 57 rotates, its inclined surface 571 contacts inclined surface 561. Protrusion 56 can lift lever 57. When lever 57 is lifted, it can drive rotating rod 53 to move upward inside hollow guide rod 51, thereby driving rotating seat 52 to move upward. When rotating seat 52 moves upward, it can drive second baffle 4 to move upward, so that a gap appears between second baffle 4 and first baffle 3. This prevents sputtered material on the side of second baffle 4 facing target 1 from being scraped off by first baffle 3 and falling from hollow cavity 31 onto target 1 surface when the second baffle 4 is rotating.

[0053] The above description is merely a preferred embodiment of the present invention; however, the scope of protection of the present invention is not limited thereto. Any equivalent substitutions or modifications made by those skilled in the art within the scope of the technology disclosed in the present invention, based on the technical solution and its improved concepts, should be covered within the scope of protection of the present invention.

Claims

1. A particle pollution prevention baffle structure of a magnetron sputtering coating machine, comprising an inner mounting plate (6) and a target material (1) fixed on one side of the inner mounting plate (6), characterized in that: it further comprises a rotating part (5) connected to one side of the inner mounting plate (6), a second baffle (4) connected to the rotating part (5), a first baffle (3) located at the lower end of the second baffle (4), a hollow cavity (31) opened in the first baffle (3), and a plurality of support frames (2) fixed on one side of the first baffle (3) and the other end of the plurality of support frames (2) is fixed on the outer surface of the target material (1). The rotating part (5) comprises a hollow guide rod (51) fixed in the target material (1) and one end of the hollow guide rod (51) is fixed to one side of the inner mounting plate (6), a rotating rod (53) rotatably connected in the hollow guide rod (51), a rotating seat (52) fixed on one end of the rotating rod (53), and a driving part (8) connected to the rotating rod (53), one side of the second baffle (4) is connected to the rotating seat (52), and one end of the rotating rod (53) extends from one end of the hollow guide rod (51) and is fixed to the rotating seat (52). An active slot one (531) is opened in the rotating rod (53), and a driving rod (54) is movably inserted in the active slot one (531). The driving part (8) comprises an outer mounting plate (7), a support (81) fixed on one side of the outer mounting plate (7), a gear one (83) rotatably connected on one side of the outer mounting plate (7), a gear two (84) rotatably connected on one side of the outer mounting plate (7) and engaged with the gear one (83), a motor (82) fixed on one side of the support (81), and the output shaft of the motor (82) penetrates the support (81) and is fixed to the gear one (83); one end of the rotating rod (53) is movably inserted in the outer mounting plate (7), and one end of the driving rod (54) penetrates the outer mounting plate (7) and is fixed to one side of the gear two (84). A tension spring (55) is further arranged in the active slot one (531), and the two ends of the tension spring (55) are respectively connected to the inner wall of the active slot one (531) and one end of the driving rod (54), and the outer surface of the rotating rod (53) is fixed with two knobs (57), and the two sides of the two knobs (57) are respectively provided with inclined surfaces two (571), and one side of the outer mounting plate (7) is fixed with two protrusions (56), and the two sides of the two protrusions (56) are respectively provided with inclined surfaces one (561). A recess (33) is opened on one side of the first baffle (3), and a lining plate (34) is fixed on the inner wall of the recess (33), the cross section of the lining plate (34) is trapezoidal, and a plurality of alternating stepped flanges (35) are integrally formed on the inner wall of the lining plate (34).

2. The anti-particle contamination baffle structure of a magnetron sputtering coating machine according to claim 1, characterized in that: A flow channel is further opened in the first baffle (3), and two cooling interfaces (32) are opened on the outer surface of the first baffle (3) and are connected with the flow channel.

3. The anti-particle contamination baffle structure of a magnetron sputtering coating machine according to claim 2, characterized in that: The second baffle (4) is rotatably connected with the rotating seat (52), and the rotating seat (52) and the rotating rod (53) are both connected with a turnover assembly (9) for driving the second baffle (4) to rotate.

4. The anti-particle contamination baffle structure of a magnetron sputtering coating machine according to claim 3, characterized in that: ​ 5. The anti-particle contamination baffle structure of a magnetron sputtering coating machine according to claim 4, characterized in that: Said turnover assembly (9) is provided with a movable slot two (532) in the rotating rod (53), a position-avoiding slot (533) communicated with the movable slot two (532), a sliding seat (92) sliding in the movable slot two (532) and the position-avoiding slot (533), two gear racks (93) fixed on the upper end of the sliding seat (92), two gear three (94) rotatingly connected with the inner wall of the movable slot two (532), a rotating shaft (98) rotatingly connected in the rotating base (52), a transmission assembly drivingly connecting the gear three (94) and the rotating shaft (98), a movable rod (91) fixed on the lower end of the sliding seat (92), and one end of the movable rod (91) penetrating through the driving rod (54) and the gear two (84) and extending outwardly, the bracket (81) is further provided with an electric push rod (10) on one side, and the telescopic end of the electric push rod (10) is in contact with one end of the movable rod (91), and one end of the rotating shaft (98) is fixed on one side of the second baffle (4).

6. The anti-particle contamination baffle structure of a magnetron sputtering coating machine according to claim 5, characterized in that: The transmission assembly comprises a synchronous wheel two (97) fixed on the outer surface of the rotating shaft (98), a synchronous wheel one (95) with two ends fixed with two gear three (94) respectively, and a synchronous belt (96) connecting the synchronous wheel one (95) and the synchronous wheel two (97).

7. The anti-particle contamination baffle structure of a magnetron sputtering coating machine according to claim 6, characterized in that: The outer surface of the rotating rod (53) is in dynamic sealing connection with the inner wall of the hollow guide rod (51).

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