Plasma generating device using freely expandable resonant waveguide

Abstract

The plasma generating device using the resonant waveguide according to the present invention may comprise: a ring-shaped or elliptical central waveguide having a plurality of slits on the inner surface thereof; the electromagnetic wave transmission unit is used for transmitting electromagnetic waves to the central waveguide; an electromagnetic wave supply unit that transmits electromagnetic waves to the electromagnetic wave transmission unit; and a plasma chamber positioned on the exit side of the slit so as to seal the inside of the central waveguide, and having an electromagnetic wave entrance window formed therein, the electromagnetic wave entering through the slit being radiated to the outside.

Description

TECHNICAL FIELD

[0001] The present application relates to a plasma generating apparatus using a resonant waveguide, and more particularly, to a plasma generating apparatus using a resonant waveguide having a length and a width that can be freely expanded. BACKGROUND

[0002] Generally, it is very efficient to use a roll-to-roll method for plasma processing of a large-area substrate, particularly, an OLED thin film process or a functional fabric having flexibility.

[0003] Such a roll-to-roll method is a method of processing by scanning one end to the other end of a substrate, and thus requires a plasma source having a size capable of covering the entire substrate. However, a microwave plasma source according to the related art has a length or a diameter limited to the size of a wavelength of a microwave, and thus has a limitation in processing a substrate having a size of more than a certain size.

[0004] In order to solve the above problem, a plasma source using an electromagnetic wave formed in an oval shape in one direction in the form of a track is used for plasma processing of a large-area object to be processed, but it is difficult to uniformly apply power for generating plasma in the length direction of the track shape, and thus there is a problem in that it is difficult to generate a uniform large-area plasma.

[0005] On the other hand, a plasma source using the electromagnetic wave formed in the oval shape in the form of a track includes an electromagnetic wave incidence window formed of a dielectric material for allowing an electromagnetic wave to be incident into a plasma chamber, and a permanent magnet opposed to the electromagnetic wave incidence window so as to confine plasma to form an ECR plasma, and the electromagnetic wave is incident into the plasma chamber through the electromagnetic wave incidence window and an ECR plasma is generated in the plasma chamber.

[0006] However, since an ECR resonance (Electron Cyclotron Resonance) position, i.e., the ECR plasma is very close to the electromagnetic wave incidence window, electrons having high energy in the vicinity of the ECR resonance region frequently collide with the electromagnetic wave incidence window, and thus there is a problem in that the electromagnetic wave incidence window is damaged and durability of the plasma source is deteriorated.

[0007] On the other hand, the plasma source using the electromagnetic wave formed in the oval shape in the form of a track has a limitation in the length of the track. The reason is that, when the length of the track needs to be elongated, the electromagnetic wave incidence window also needs to be elongated accordingly, but there is a difficulty in manufacturing the electromagnetic wave incidence window to have a long length (e.g., more than 2 m), and when the electromagnetic wave incidence window is manufactured to have a long length, durability thereof is also deteriorated. SUMMARY

[0008] Therefore, an object of the present application is to provide a plasma generating apparatus using a resonant waveguide, which can not only prevent damage to an electromagnetic wave incident window but also freely expand in the length direction and the width direction of a track.

[0009] Effects of Invention The plasma generating apparatus using a resonant waveguide according to the present application has the advantage of not only preventing damage to an electromagnetic wave incident window caused by plasma but also freely expanding in the length direction and the width direction of a track. BRIEF DESCRIPTION OF DRAWINGS

[0010] Figure 1 is a view for explaining a plasma generating apparatus using a resonant waveguide according to an embodiment of the present application.

[0011] Figure 2 is a view for explaining Figure 1 another embodiment of the electromagnetic wave transmission unit shown in

[0012] Figure 3 is a view for explaining Figure 1 another embodiment of the electromagnetic wave transmission unit shown in

[0013] Figure 4 is a view showing Figure 1 a state of the yoke shown in

[0014] Figure 5 is a sectional view showing a cross-sectional shape and a magnetic field formation state of Figure 1

[0015] Figure 6 is a view showing a state in which the plasma generating apparatus using a resonant waveguide according to an embodiment of the present application expands in the width direction.

[0016] Figure 7 is a view showing a result of three-dimensional magnetic field computer simulation for the arrangement of the magnet units in the plasma generating apparatus using a resonant waveguide according to an embodiment of the present application.

[0017] Figure 8 is a view showing a state in which 875 G isolines are formed at the centers of a pair of magnet units arranged at intervals in the slit direction and a state in which 875 G isolines are formed between the slits for the arrangement of the magnet units.

[0018] Figure 9 is a view showing radial profiles of the magnetic field at the slit positions and the positions of the magnet units arranged in pairs above and below for the arrangement of the magnet units.

[0019] Figure 10 ​FIG. 1 is a diagram for illustrating a plasma generation apparatus using a resonant waveguide according to an embodiment of the present application.

[0020] Figure 11 FIG. 2 is a diagram for illustrating a plasma generation apparatus using a resonant waveguide according to another embodiment of the present application.

[0021] Figure 12 Figure 11 FIG. 3 is an enlarged perspective view of a flange.

[0022] Figure 13 FIG. 4 is a diagram showing a state of an electric field distribution in a flange center waveguide and a state of a slit electric field intensity adjustment of a flange of a sub-block type waveguide. DETAILED DESCRIPTION

[0023] Hereinafter, a plasma generation apparatus using a resonant waveguide according to an embodiment of the present application will be described in detail with reference to the accompanying drawings. The present application can be variously changed and can have various forms, and thus a specific embodiment is exemplified in the accompanying drawings and is described in detail in the present specification. It should be understood, however, that this is not intended to limit the present application to a specific disclosed form, but to include all modifications, equivalent techniques, and alternatives included in the idea and technical scope of the present application. In describing the drawings, like reference numerals are used to designate like elements. In the drawings, the size of structures is exaggerated for the sake of clarity.

[0024] The terms "first", "second", and the like can be used to describe various constituent elements, but these constituent elements should not be limited by these terms. The terms are used only to distinguish one constituent element from another constituent element. For example, a first constituent element can be named a second constituent element, and similarly, a second constituent element can be named a first constituent element without departing from the scope of the present application.

[0025] The terms used in the present application are used only to describe specific embodiments, and are not intended to limit the present application. Unless explicitly indicated otherwise in the context, the expression of the singular includes the expression of the plural. In the present application, the terms "include" or "have" or the like are used to designate the presence of features, steps, actions, constituent elements, components, or combinations thereof described in the specification, and should not be understood as precluding the presence or additional possibility of one or more other features, steps, actions, constituent elements, components, or combinations thereof.

[0026] ​Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. Terms such as those defined in commonly used dictionaries are to be interpreted as having a meaning that is consistent with their meaning in the context of the relevant art and the present disclosure, and are not to be interpreted in an idealized or overly formal sense unless expressly so defined herein.

[0027] Figure 1 is a view for explaining a plasma generation device using a resonant waveguide according to an embodiment of the present application, Figure 2 is a view for explaining Figure 1 is a view for explaining another embodiment of the electromagnetic wave transmission unit shown in Figure 3 is a view for explaining Figure 1 is a view for explaining other another embodiment of the electromagnetic wave transmission unit shown in Figure 4 is a view showing Figure 1 is a view showing the state of the yoke shown in Figure 5 is a view showing the cross-sectional shape and the magnetic field formation state of Figure 1 is a view showing the cross-sectional shape and the magnetic field formation state of Figure 6 is a view showing a state in which the plasma generation device using a resonant waveguide according to an embodiment of the present application is expanded in the width direction.

[0028] Referring to Figures 1 to 3 , the plasma generation device using a resonant waveguide according to an embodiment of the present application includes a center waveguide 100, an electromagnetic wave transmission unit 200, an electromagnetic wave supply part 300, and a plasma chamber 400.

[0029] The center waveguide 100 has a circular or elliptical shape and is configured in a Track shape in which electromagnetic waves can be transmitted in a clockwise direction or a counterclockwise direction.

[0030] The electromagnetic waves transmitted in the clockwise direction or the counterclockwise direction in the center waveguide 100 can be radiated. To this end, the center waveguide 100 has a plurality of slits 100a in an inner side surface thereof through which the electromagnetic waves can be radiated. The slits 100a are vertically formed.

[0031] In an embodiment, the center waveguide 100 can be a rectangular waveguide. That is, the center waveguide 100 is a TE mode rectangular waveguide, and the slits 100a can be vertically formed on an inner side surface of the rectangular waveguide and perpendicular to the transmission direction of the electromagnetic waves.

[0032] The electromagnetic wave transmission unit 200 transmits electromagnetic waves to the center waveguide 100, and the electromagnetic wave supply part 300 transmits electromagnetic waves to the electromagnetic wave transmission unit 200.

[0033] The electromagnetic wave supply part 300 can be a magnetron (omitted from the drawing) and a waveguide 310 that transmits electromagnetic waves oscillated from the magnetron.

[0034] In an embodiment, the electromagnetic wave transmission unit 200 can include a first incident waveguide 241 and a second incident waveguide 242.

[0035] The first incident waveguide 241 is tangentially connected to the center waveguide 100 in a manner that can transmit electromagnetic waves, so that electromagnetic waves are incident to the inside of the center waveguide 100. Electromagnetic waves incident through the first incident waveguide 241 can be transmitted in a clockwise direction inside the center waveguide 100.

[0036] The second incident waveguide 242 is also tangentially connected to the center waveguide 100 in a manner that can transmit electromagnetic waves, so that electromagnetic waves are incident to the inside of the center waveguide 100. The second incident waveguide 242 is tangentially connected to the center waveguide 100 in a manner that can transmit electromagnetic waves at a point symmetric to the first incident waveguide 241 with respect to the center of the center waveguide 100, and can be disposed at a position diagonally opposite to the first incident waveguide 241.

[0037] Electromagnetic waves incident through the second incident waveguide 242 can be transmitted in a clockwise direction inside the center waveguide 100, and the frequency of electromagnetic waves incident through the second incident waveguide 242 can be the same as the frequency of electromagnetic waves incident through the first incident waveguide 241. In addition, electromagnetic waves incident through the second incident waveguide 242 can join and be transmitted with electromagnetic waves incident from the first incident waveguide 241 and transmitted. Therefore, even if the power of electromagnetic waves incident from the first incident waveguide 241 and transmitted is gradually weakened, the power of electromagnetic waves in the entire section inside the center waveguide 100 can be maintained uniform by additional electromagnetic waves incident from the second incident waveguide 242 and transmitted in the same direction.

[0038] Referring to Figure 2 In another embodiment, the waveguide 310 of the electromagnetic wave supply part 300 is disposed to form a tangent with one side of the center waveguide 100, and the electromagnetic wave transmission unit 200 can be a rod-shaped conductor 210 that penetrates the center waveguide 100 and the waveguide 310 of the electromagnetic wave supply part 300 in a manner perpendicular to the tangent.

[0039] Referring to Figure 3 In still another embodiment, the electromagnetic wave transmission unit 200 is provided at one side of the center waveguide 100, and can be a first tuner 220 that transmits electromagnetic waves of the electromagnetic wave supply part 300 into the center waveguide 100. The first tuner 220 can control the electric field induced by the electromagnetic waves to be maximized in the plasma chamber 400 by adjusting the intensity of incident waves and reflected waves of electromagnetic waves transmitted by the electromagnetic wave supply part 300 to guide impedance matching.

[0040] Referring to Figure 3 In still another embodiment, the electromagnetic wave transmission unit 200 can further include a transmission waveguide 230 having both ends directly connected to the central waveguide 100 and the first tuner 220, between the first tuner 220 and the central waveguide 100. The electromagnetic wave from the electromagnetic wave supply unit 300 can be transmitted to the central waveguide 100 through the transmission waveguide 230.

[0041] In this case, as the length or size of the rail-shaped plasma generation device increases, a sufficient power required can be applied. That is, in a structure in which the electromagnetic wave is directly transmitted to the central waveguide 100 through the transmission waveguide 230, it is easier to transmit a high power required to the rail-shaped plasma generation device than in the case of the rod-shaped conductor 210.

[0042] The plasma chamber 400 is arranged along the inner side of the central waveguide 100, is located inside the central waveguide 100, and can internally receive the electromagnetic wave from the central waveguide 100. For example, the plasma chamber 400 can have a ring shape or an elliptical shape.

[0043] In order to allow the electromagnetic wave to be internally incident to the plasma chamber 400, the plasma chamber 400 can have an electromagnetic wave incidence window 410. The electromagnetic wave incidence window 410 is arranged opposite to the plurality of slits 100a of the central waveguide 100. That is, the electromagnetic wave incidence window 410 is located at an outlet side of the plurality of slits 100a to seal the inside of the central waveguide 100 so that the electromagnetic wave entering through the plurality of slits 100a can be radiated to the outside of the plurality of slits 100a, that is, the inside of the plasma chamber 400.

[0044] On the other hand, the plasma generation device using a resonant waveguide according to an embodiment of the present application can further include a magnet unit 500.

[0045] The magnet unit 500 refers to a permanent magnet and can form a magnetic field toward the inside of the plasma chamber 400. The magnet unit 500 is located between the inner side of the central waveguide 100 and the electromagnetic wave incidence window 410 and is arranged between the slits 100a. In other words, the magnet unit 500 is arranged between the plasma chamber 400 and the inner side of the central waveguide 100 in the electromagnetic wave circulation direction of the central waveguide 100. Here, the electromagnetic wave incidence window 410 is installed to seal the gap formed by the magnet unit 500, that is, to seal the interval between the magnet unit 500 opposite to the slit 100a. Such a magnet unit 500 functions to confine electrons inside the plasma chamber 400 to prevent the electrons from escaping.

[0046] As Figure 5As shown, in order to form a magnetic field of a ring structure in the central waveguide 100, the magnet units 500 are arranged in a direction parallel to the slit 100a, and the magnetization directions of the pair of magnet units are parallel to the slit 100a. According to the magnetization direction structure of the pair of magnet units 500, a magnetic field direction parallel to the slit 100a direction can be formed inside the plasma chamber 400.

[0047] The magnet units 500 can be fixed by yokes 600. The yokes 600 can be fixed between the central waveguide 100 and the electromagnetic wave incidence window 410, such that the magnetization directions of the pair of magnet units 500 are parallel to the slit 100a direction. Referring to Figure 4 , the yokes 600 can be formed with a pair of magnet accommodating grooves 601 arranged at a predetermined interval on the upper and lower sides of the body, and configured to accommodate the pair of magnet units 500 in the pair of magnet accommodating grooves 601, respectively. The yokes 600 can be made of an iron material, as a magnetic field yoke, and can confine the magnetic lines of force of the pair of magnet units 500 to the inside of the yoke 600, thereby forming a stronger magnetic field inside the plasma chamber 400.

[0048] In an embodiment, the width of the first face 602 of the yoke 600 in the horizontal direction can have a width corresponding to the width between the slits 100a, and the width of the second face 603 opposite to the first face 602 can be narrower than the width of the first face 602, whereby at least one of the side faces 604 on the left and right sides of the yoke 600 connecting the first face 602 and the second face 603 can be tapered. For example, the yoke 600 arranged between the slits 100a can have the side faces 604 on the left and right sides tapered, and the yoke 600 arranged in the slit 100a direction at both ends of the arrangement of the slits 100a can have one of the side faces 604 on the left and right sides tapered. In this structure of the yoke 600, the pair of magnet accommodating grooves 601 can be formed to be recessed from the first face 602, which is in close contact with the inner side of the central waveguide 100, and the second face 603, which is in close contact with the electromagnetic wave incidence window 410. According to the shape and arrangement structure of the yoke 600, the spacing between the yokes 600 opposite the slits 100a can form a path that guides electromagnetic waves radiated from the slits 100a toward the electromagnetic wave incidence window 410.

[0049] The path forms a path for electromagnetic waves transmitted out of the slit 100a between the two adjacent magnet units 500 sandwiching the slit 100a. The path is formed by the tapered side faces 604 of the yokes 600 arranged opposite each other, forming a trapezoidal horizontal cross section with a narrow entrance and an expanded exit. Thus, the path causes electromagnetic waves transmitted from the slit 100a to expand when passing through the path and be incident to the inside of the central waveguide 100.

[0050] Although not shown, the yoke 600 can be fixed between the central waveguide 100 and the electromagnetic wave incidence window 410 by an upper fixing plate (not shown) covering the upper portion thereof and a lower fixing plate (not shown) covering the lower portion thereof. For example, the upper fixing plate and the lower fixing plate can be fixed to the upper and lower portions of the yoke 600 by screw coupling.

[0051] On the other hand, according to the plasma generating apparatus using a resonant waveguide according to an embodiment of the present application, the central waveguide 100 can be extended in the length direction by using a plurality of block waveguides.

[0052] In an embodiment, in order to extend the central waveguide 100 in the length direction, the central waveguide 100 can include a first side portion waveguide 110, a first block waveguide 120, a second block waveguide 130, and a second side portion waveguide 140.

[0053] The first side portion waveguide 110 is a rectangular waveguide and has a shape of a or a C shape, and has flanges at both ends.

[0054] For example, the first side portion waveguide 110 can be a rectangular waveguide and have a shape of a and include a first side portion first rectangular waveguide 111, a first side portion block waveguide 112, and a first side portion second rectangular waveguide 113.

[0055] The first side portion first rectangular waveguide 111 is a rectangular waveguide and has a shape of a

[0056] The first side portion block waveguide 112 is a rectangular waveguide and has a shape of a line, and has flanges at both ends, one end of which can be coupled with the other end of the first side portion first rectangular waveguide 111, i.e., the other end not coupled with the first block waveguide 120.

[0057] The first side portion second rectangular waveguide 113 is a rectangular waveguide and has a shape of a

[0058] The first block waveguide 120 has a shape of a line, and has flanges at both ends, one end of which can be coupled with one end of the first side portion waveguide 110.

[0059] As an example, the first block waveguide 120 can be composed of two or more first sub-block waveguides 121 in series, the first sub-block waveguides 121 being rectangular waveguides and linear, and having fourth flanges 121a at both ends. For example, a slit 100a can be vertically formed in the center of the inner side of each first sub-block waveguide 121.

[0060] The second block waveguide 130 is linear, and has flanges at both ends, one of which can be combined with the flange at the other end of the first side portion waveguide 110.

[0061] As an example, the second block waveguide 130 can be composed of two or more second sub-block waveguides 131 in series, the second sub-block waveguides 131 being rectangular waveguides and linear, and having fifth flanges 131a at both ends. For example, a slit 100a can be vertically formed in the center of the inner side of each second sub-block waveguide 131.

[0062] The second side portion waveguide 140 is arranged on the opposite side of the first side portion waveguide 110 with reference to the first block waveguide 120 and the second block waveguide 130. The second side portion waveguide 140 is shaped or C-shaped, and has flanges at both ends, and is connected to the flange at the other end of the first block waveguide 120 and the flange at the other end of the second block waveguide 130.

[0063] The second side portion waveguide 140 can be shaped, and can include a second side portion first ┐-shaped waveguide 141, a second side portion block waveguide 142, and a second side portion second ┐-shaped waveguide 143.

[0064] The second side portion first ┐-shaped waveguide 141 is a rectangular waveguide and ┐-shaped, and has sixth flanges 141a at both ends, one of which can be combined with the flange of the second block waveguide 130.

[0065] The second side portion block waveguide 142 is a rectangular waveguide and linear, and has seventh flanges 142a at both ends, one of which can be combined with the flange at the other end of the second side portion first ┐-shaped waveguide 141.

[0066] The second side portion second ┐-shaped waveguide 143 is a rectangular waveguide and ┐-shaped, and has eighth flanges 143a at both ends, one of which can be combined with the flange at the other end of the first side portion block waveguide 112, and the other of which can be combined with the flange of the first block waveguide 120.

[0067] In this structure of the central waveguide 100, each of the flanges 111a, 112a, 113a, 121a, 131a, 141a, 143a, and 142a is not formed on the inner side of the central waveguide 100, but is formed on the upper side, lower side, and outer side of each of the waveguides 110, 120, 130, and 140. For example, the vertical cross section of each of the flanges 111a, 112a, 113a, 121a, 131a, 141a, 143a, and 142a can be a rectangular shape.

[0068] Further, in this structure of the central waveguide 100, in order to realize the extension of the central waveguide 100 in the length direction, the extension of the central waveguide 100 in the length direction can be realized by increasing the number of the first sub-block waveguide 121 of the first block waveguide 120 and the second sub-block waveguide 131 of the second block waveguide 130 to two or more and connecting them with flanges.

[0069] On the other hand, in the plasma generating apparatus using a resonant waveguide according to an embodiment of the present application, in order to correspond to the extension of the central waveguide 100 in the length direction, the electromagnetic wave incidence window 410 can be composed of a plurality of sub-electromagnetic wave incidence windows 411, and the plurality of sub-electromagnetic wave incidence windows 411 can be connected in series along the length direction of the first block waveguide 120 and the second block waveguide 130. Here, each of the sub-electromagnetic wave incidence windows 411 can be arranged to seal one slit 100a or one slit 100a and one slit 100a adjacent thereto.

[0070] With this structure of the electromagnetic wave incidence window 410, even if the central waveguide 100 is extended in the length direction, the electromagnetic wave incidence window 410 can be first manufactured to a length that is easy to process and then connected in series, so as to be arranged within the length range of the extended central waveguide 100, and the durability thereof can be more easily ensured than when manufactured to a length corresponding to the length of the extended central waveguide 100.

[0071] On the other hand, the plasma generating apparatus using a resonant waveguide according to an embodiment of the present application can also be configured to be extendable in the width direction of the central waveguide 100.

[0072] As an embodiment, in order to extend the central waveguide 100 in the width direction, the first side portion block waveguide 112 can be composed of two or more third sub-block waveguides 1121 connected in series, the third sub-block waveguides 1121 being rectangular waveguides and being linear, and both ends thereof having the second flanges 112a, and the second side portion block waveguide 142 can be composed of two or more fourth sub-block waveguides 1421 connected in series, the fourth sub-block waveguides 1421 being rectangular waveguides and being linear, and both ends thereof having the seventh flanges 142a. ​

[0073] In this structure of the center waveguide 100, in order to expand the center waveguide 100 in the width direction, the expansion of the center waveguide 100 in the width direction can be achieved by increasing the number of the third sub-block waveguide 1121 and the fourth sub-block waveguide 1421 to two or more and connecting them in a flange manner.

[0074] On the other hand, the first side portion waveguide 110 of the center waveguide 100 is connected to the electromagnetic wave transmission unit 200.

[0075] As one embodiment, in the case where the electromagnetic wave transmission unit 200 is the first tuner 220 or the rod-shaped conductor 210, the first side portion waveguide 110 can be connected to the first tuner 220 or the rod-shaped conductor 210. In this case, the first tuner 220 or the rod-shaped conductor 210 can be connected to the first side portion block waveguide 112.

[0076] In another embodiment, in the case where the electromagnetic wave transmission unit 200 is the first incident waveguide 241 and the second incident waveguide 242, the first incident waveguide 241 can be connected to the first side portion waveguide 110 of the center waveguide 100 in a manner that electromagnetic waves can be transmitted, tangent to the first side portion waveguide 110. In other words, the first incident waveguide 241 can be connected to the first side portion waveguide 110 in parallel to the first block waveguide 120. Here, the first incident waveguide 241 can be connected to the first side portion waveguide 110 in parallel to the first block waveguide 120 at the corner side of the first side portion waveguide 110 in a manner that electromagnetic waves can be transmitted.

[0077] The second incident waveguide 242 can be connected to the second side portion waveguide 143 in parallel to the second block waveguide 130. Here, the second incident waveguide 242 can be connected to the second side portion waveguide 143 tangent to the second block waveguide 130 at the corner side of the second side portion waveguide 143 in a manner that electromagnetic waves can be transmitted.

[0078] On the other hand, the plasma generating apparatus using a resonant waveguide according to one embodiment of the present application can further include a second tuner 151 inserted into an opposite surface opposite to a slit 100a formed in each of the inner side surfaces of the first sub-block waveguide 121 and the second sub-block waveguide 131 in the direction of the slit 100a so as to be opposite to the slit 100a.

[0079] For example, the second tuner 151 can be a stub tuner, and can be installed from the outside to the inside through the outer side surface of the first and second sub-block waveguides 121 and 131. Here, the insertion length of the second tuner 151 can be fixed, or the interval between the slits 100a can be adjusted by adjusting the insertion length. When the insertion length of the second tuner 151 is fixed, the insertion length of the second tuner 151 can be differently set in the direction of transmission of the electromagnetic wave in the center waveguide 100, thereby constituting intervals different from each other with respect to each slit 100a in the direction of transmission of the electromagnetic wave. For example, the second tuner 151 can also be configured in a structure in which the insertion length is variable.

[0080] Hereinafter, an electromagnetic wave incidence process and a plasma formation process of a plasma generating apparatus using a resonant waveguide according to an embodiment of the present application will be described.

[0081] In order to form plasma in the plasma chamber 400, electromagnetic waves are incident into the center waveguide 100 through the electromagnetic wave supply unit 300 and the electromagnetic wave transmission unit 200.

[0082] The electromagnetic waves moving in the center waveguide 100, i.e., in the track-shaped moving path, enter through the plurality of slits 100a disposed on the first and second linear rectangular waveguides 111 and 112, and are radiated to the inside of the plasma chamber 400 through the electromagnetic wave incidence window 410 of the plasma chamber 400.

[0083] At this time, at the first side portion waveguide 110 and the second side portion waveguide 140, the high-temperature electrons generated near the slits 100a are rotated in the direction of inflection under the action of the magnetic field along the shape of the plasma chamber 400 and continuously rotate along the shape of the plasma chamber 400, and plasma is generated. Thus, the generated high-temperature electrons act on ionization in the entire plasma chamber 400 while having a moving path with a closed loop, and by this structure, plasma is confined in the magnetic field and forms a closed loop, and not only the density of the plasma can be improved, but also there is a significant advantage in uniformity.

[0084] Figure 7 FIG. 1 is a view showing a result of three-dimensional magnetic field computer simulation for the arrangement of the magnet unit in the plasma generating apparatus using a resonant waveguide according to an embodiment of the present application, Figure 8 FIG. 2 is a view showing a state in which 875G isosurfaces are formed at the centers of a pair of magnet units arranged at an interval in the slit direction and a state in which 875G isosurfaces are formed between the slits with respect to the arrangement of the magnet unit.

[0085] Referring to Figure 7As shown in the 875G contour state of the ECR (Electron Cyclotron Resonance) region of (a), it can be confirmed that although the contours are in a concave-convex state under the magnetic field gradient of the portion with the magnet unit 500 and the portion of the slit 100a, the magnetic field strength formed inside the plasma chamber 400 is sufficient. As shown in the contour state of (b), it can also be confirmed that the magnetic field strength and gradient in the circumferential direction in which the high-temperature electrons can rotate are effectively formed.

[0086] In addition, referring to Figure 8 In the embodiment, as shown in (a), the contours formed between the pair of magnet units 500 are formed deep into the inside of the plasma chamber 400, and it can be confirmed that the gradient of the magnetic field contours in the plasma chamber 400 is formed in a D shape (positive curvature). According to this contour formation, the high-temperature electrons can exhibit excellent plasma uniformity characteristics by the B-field curvature drift induction and diffusion effects.

[0087] Furthermore, as shown in (b), the contours formed in the section between the slit 100a and the slit 100a reflect the result of the discontinuous arrangement of the magnet units 500 caused by the structure of the slit 100a. In this regard, by increasing the distance between the pair of magnet units 500 and continuously arranging the magnet units, the problem of the magnetic field contour discontinuous interval between the slit 100a and the slit 100a can be solved. However, since the distance between the pair of magnet units 500 is large, the magnetic field contours are formed close to or near the electromagnetic wave incidence window 410, and thus durability problems such as etching and heat loss of the electromagnetic wave incidence window 410 can occur due to high-density plasma.

[0088] Figure 9 is a graph showing the radial profiles of the magnetic field for the magnet unit arrangement at the slit position and the position of the pair of magnet units above and below.

[0089] Referring to Figure 9 As shown in (a), it can be confirmed that the ECR region is formed at a distance of 16.9mm from the electromagnetic wave incidence window 410 at the position between the opposing magnet units 500 and the magnet units 500, and as shown in (b), the ECR region is formed at a distance of 9.8mm from the electromagnetic wave incidence window 410 at the position between the opposing slit 100a and the slit 100a. Here, the mirror ratio Bmax / Becr between the magnet units 500 is 1.86, and the Bmax / Becr between the slit 100a and the slit 100a is 1.22, and it can be confirmed that a magnetic force sufficient for electron confinement is formed.

[0090] Therefore, according to the plasma generating device using resonant waveguide of one embodiment of the present application, by arranging the magnet unit 500, the distance between the ECR plasma formed in the plasma chamber 400 and the electromagnetic wave incidence window 410 can be kept far, so that the electromagnetic wave incidence window 410 can be effectively prevented from being damaged by the ECR plasma. Therefore, the plasma generating device has the advantage of preventing the electromagnetic wave incidence window 410 from being damaged and further improving the durability of the plasma generating device.

[0091] On the other hand, according to the plasma generating device using resonant waveguide of one embodiment of the present application, the electromagnetic wave power applied to the plasma chamber 130 can be adjusted by the second tuner 151 during transmission of the electromagnetic wave and generation of the plasma.

[0092] That is, the second tuner 151 opposite to each of the slits 100a can be provided or can be changed in the length of insertion to the interval between the slits 100a into which the electromagnetic wave power is incident more uniformly, so that the density of the plasma generated in the plasma chamber 130 can be made more uniform or a high-density plasma can be generated.

[0093] On the other hand, according to the plasma generating device using resonant waveguide of one embodiment of the present application, the center waveguide 100 can be expanded in the length direction and in the width direction.

[0094] That is, by increasing the number of the first and second sub-block waveguides 121 and 131, respectively, and connecting them in series to each other, the lengths of the first and second block waveguides 120 and 130 can be lengthened, so that the center waveguide 100 can be expanded in the length direction. Further, by increasing the number of the third and fourth sub-block waveguides 1121 and 1421, respectively, and connecting them in series to each other, the lengths of the first and second side portion block waveguides 112 and 142 can be lengthened, so that the center waveguide 100 can be expanded in the width direction.

[0095] Further, when the number of the first and second sub-block waveguides 121 and 131 is increased, respectively, and they are connected in series to each other, the number of the sub-electromagnetic wave incidence windows 411 can be increased, respectively, and they can be connected in series to each other.

[0096] Therefore, according to the plasma generating device using resonant waveguide according to the embodiment of the present application, the expansion in the length direction and the width direction can be realized by freely increasing the number of the block waveguides, so that the large-area plasma can be generated very easily, and therefore, the use is very convenient as a large-area plasma generating source, and furthermore, the electromagnetic wave incidence window 410 can be expanded in the length direction of the central waveguide 100 by connecting the plurality of the sub electromagnetic wave incidence windows 411 in series, so that even if the central waveguide 100 is expanded in the length direction, the length of the electromagnetic wave incidence window 410 can be expanded while ensuring the durability of the electromagnetic wave incidence window 410.

[0097] Figure 10 is a view for explaining the plasma generating device using resonant waveguide according to another embodiment of the present application.

[0098] On the other hand, the plasma generating device using resonant waveguide according to another embodiment of the present application, as shown in Figure 10 The magnet units 500 can be arranged left and right in the direction perpendicular to the slit 100a. That is, the magnet units 500 can be arranged left and right in the yoke 600. Here, the magnet units 500 adjacent to the slit 100a can be arranged with opposite polarity by the yoke 600.

[0099] In this case, the magnetization directions of the pair of magnet units 500 are perpendicular to the direction of the slit 100a, and the magnetic field formed by the pair of magnet units 500 can cross the slit 100a.

[0100] The plasma generating device using resonant waveguide according to another embodiment of the present application can also achieve the same effects and advantages as the ECR plasma away from the electromagnetic wave incidence window 410.

[0101] Figure 11 is a view for explaining the plasma generating device using resonant waveguide according to another embodiment of the present application, Figure 12 is Figure 11 is an enlarged perspective view of the flange.

[0102] Referring to Figure 11 and Figure 12 , the plasma generating device using resonant waveguide according to another embodiment of the present application, the two or more first sub block waveguides 121 constituting the first block waveguide 120 of the central waveguide 100, and the two or more second sub block waveguides 131 constituting the second block waveguide 130 of the central waveguide 100, the flanges 121a, 131a thereof can be located at the position of the slit 100a, respectively.

[0103] In addition, the flange opposite to the slit 100a can be partially extended in the direction of the slit 100a.

[0104] That is, the first sub-block waveguide 121 can form a slit 100a at both ends of the inner side surface, and a fourth flange 121a can be formed at both ends, which can be located opposite to the slit 100a. Here, a portion of the fourth flange 121a located opposite to the slit 100a can partially extend in the direction of the slit 100a and protrude to the inner side of the first sub-block waveguide 121.

[0105] The second sub-block waveguide 131 can form a slit 100a at both ends of the inner side surface, and a fifth flange 131a can be formed at both ends, which can be arranged opposite to the slit 100a. Here, a portion of the fifth flange 131a located opposite to the slit 100a can partially extend in the direction of the slit 100a and protrude to the inner side of the second sub-block waveguide 131.

[0106] Here, the length of the extension of the third flange 113a and the fourth flange 121a of the first sub-block waveguide 121 and the second sub-block waveguide 131 in the direction of the slit 100a can be the same or different among the plurality of first sub-block waveguides 121 and the plurality of second sub-block waveguides 131.

[0107] This plasma generating device using a resonant waveguide according to another embodiment of the present application can adjust the electric field distribution in the center waveguide 100 and also adjust the electric field intensity incident to the slit 100a.

[0108] Figure 13 is a diagram showing the state of the electric field distribution in the center waveguide and the state of the adjustment of the electric field intensity of the slit when the flange of the sub-block waveguide partially extends in the direction of the slit.

[0109] Referring to Figure 13 , the state of the adjustment of the electric field distribution in the center waveguide 100 and the adjustment of the electric field intensity of the slit 100a after the fourth flange 121a or the fifth flange 131a extends in the direction of the slit 100a by a predetermined length is shown. It can be confirmed that the electric field distribution in the center waveguide 100 is adjusted to be different from that of the B region, and as shown in the C region, the electric field intensity incident to the slit 100a opposite to the flange 121a, 131a is increased compared to the other slits 100a. Figure 13

[0110] ​Thus, the plasma generating apparatus using a resonant waveguide according to still another embodiment of the present application has the advantage that the electric field distribution in the central waveguide 100 and the electric field intensity of the slit 100a can be adjusted by adjusting the length of the portion of the flange 121a, 131a opposite the slit 100a that extends in the direction of the slit 100a, without having to provide an additional tuner.

[0111] The foregoing description of the embodiments has been presented for the purpose of enabling those skilled in the art to utilize or perform the present application. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein can be applied to other embodiments without departing from the scope of the application. Thus, the present application is not intended to be limited to the embodiments described herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. A plasma generator utilizing a resonant waveguide, wherein, include: The center waveguide can be ring-shaped, elliptical, or angular, and has multiple slits on its inner surface; An electromagnetic wave transmission unit is used to transmit electromagnetic waves to the central waveguide; An electromagnetic wave supply unit is used to transmit electromagnetic waves to the electromagnetic wave transmission unit. as well as The plasma chamber is located on the exit side of the slit in a manner that seals the interior of the central waveguide, and is formed with an electromagnetic wave entrance window that allows electromagnetic waves entering through the slit to radiate to the outside.

2. The plasma generator utilizing a resonant waveguide according to claim 1, wherein, The electromagnetic wave transmission unit is located on one side of the central waveguide and transmits the electromagnetic waves from the electromagnetic wave supply unit to the tuner inside the central waveguide.

3. The plasma generator utilizing a resonant waveguide according to claim 2, wherein, A transmission waveguide is provided between the center waveguide and the tuner, with both ends of the transmission waveguide directly connected to the center waveguide and the tuner, respectively, so that electromagnetic waves from the electromagnetic wave supply unit are transmitted to the center waveguide through the transmission waveguide.

4. The plasma generator utilizing a resonant waveguide according to claim 1, wherein, The waveguide of the electromagnetic wave supply section is arranged to form a tangent with one side of the central waveguide. The electromagnetic wave transmission unit is a rod-shaped conductor that is perpendicular to the tangent and passes through the central waveguide and the electromagnetic wave supply section.

5. The plasma generator utilizing a resonant waveguide according to claim 1, wherein, The electromagnetic wave transmission unit is a first incident waveguide that is tangentially connected to the central waveguide in a manner capable of transmitting electromagnetic waves.

6. The plasma generator utilizing a resonant waveguide according to claim 5, wherein, It also includes a second incident waveguide, which is tangentially connected to the central waveguide at a position symmetrical to the center point of the central waveguide in a manner that allows electromagnetic waves to be transmitted.

7. The plasma generator utilizing a resonant waveguide according to any one of claims 1 to 6, wherein, The central waveguide, in a plan view, includes: The first side waveguide is... It is shaped like a triangle or a C-shape, with flanges at both ends, and connected to the electromagnetic wave transmission unit; The first block waveguide is linear and has flanges at both ends, one end of which is connected to one flange of the first side waveguide. The second block waveguide, which is linear, has flanges at both ends, one end of which is connected to the other flange of the first side waveguide; and The second side waveguide is... It is shaped like a zigzag or C-shape, with flanges at both ends, and connected to a second incident waveguide that is connected to the other end of the first block waveguide and the other end of the second block waveguide.

8. The plasma generator utilizing a resonant waveguide according to claim 7, wherein, Both the first and second block waveguides are composed of two or more sub-block waveguides connected in series. Each sub-block waveguide is linear and has flanges at both ends.

9. The plasma generator utilizing a resonant waveguide according to claim 7, wherein, The first side waveguide is Shape, the first side waveguide includes: The first side portion of the first U-shaped waveguide is U-shaped and has flanges at both ends, one end of which is connected to the flange of the first block waveguide. A first side-mounted block waveguide, which is linear, has flanges at both ends, one end of which is connected to the flange at the other end of the first side-mounted U-shaped waveguide; and The second U-shaped waveguide on the first side portion is U-shaped and has flanges at both ends. One end is connected to the flange at the other end of the first side portion block waveguide, and the other end is connected to the flange of the second block waveguide.

10. The plasma generator utilizing a resonant waveguide according to claim 9, wherein, The second side waveguide is The shape, the second side face wave, includes: The second side portion has a first U-shaped waveguide, which is U-shaped and has flanges at both ends, one end of which is connected to the flange of the second block waveguide. The second side portion of the block waveguide is linear and has flanges at both ends, one end of which is connected to the other flange of the first U-shaped waveguide on the second side portion; and The second side portion has a second U-shaped waveguide, which is U-shaped and has flanges at both ends. One end is connected to the flange at the other end of the first side portion block waveguide, and the other end is connected to the flange of the first block waveguide.

11. The plasma generator utilizing a resonant waveguide according to claim 9, wherein, The electromagnetic wave transmission unit is a first incident waveguide that is tangentially connected to the central waveguide in a manner capable of transmitting electromagnetic waves. The first incident waveguide is parallel to the first block waveguide and connected to the first U-shaped waveguide on the first side.

12. The plasma generator utilizing a resonant waveguide according to claim 10, wherein, It also includes a second incident waveguide, which is tangentially connected to the central waveguide at a position symmetrical to the center point of the central waveguide in a manner capable of transmitting electromagnetic waves, relative to the first incident waveguide. The second incident waveguide is parallel to the second block waveguide and connected to the second U-shaped waveguide on the second side.

13. The plasma generator utilizing a resonant waveguide according to claim 9, wherein, The electromagnetic wave transmission unit is a tuner disposed on one side of the central waveguide, and the tuner is used to transmit the electromagnetic waves from the electromagnetic wave supply unit into the central waveguide; or... The waveguide of the electromagnetic wave supply section is arranged to form a tangent with one side of the central waveguide, and the electromagnetic wave transmission unit is a rod-shaped conductor perpendicular to the tangent and passing through the central waveguide and the waveguide of the electromagnetic wave supply section. The tuner or the conductor is connected to the first side block waveguide.

14. The plasma generator utilizing a resonant waveguide according to claim 9, wherein, Both the first side block waveguide and the second side block waveguide are composed of two or more sub-block waveguides connected in series. Each sub-block waveguide is linear and has flanges at both ends.

15. The plasma generator utilizing a resonant waveguide according to claim 7, wherein, The slit is a vertical slit. It includes a magnet unit located between the inner surface of the central waveguide and the electromagnetic wave incident window, and arranged between the slits. The electromagnetic wave incident window is installed to seal the gap formed by the magnet unit.

16. The plasma generator utilizing a resonant waveguide according to claim 15, wherein, The magnet units are arranged in pairs, one above and one below, parallel to the direction of the slit, and the pair of magnets form a magnetic field parallel to the direction of the slit.

17. The plasma generator utilizing a resonant waveguide according to claim 15, wherein, The magnet units are arranged in pairs on the left and right sides perpendicular to the slit direction, and the pair of magnets are arranged to form a magnetic field perpendicular to the slit direction.

18. The plasma generator utilizing a resonant waveguide according to claim 7, wherein, The electromagnetic wave incident window includes multiple sub-electromagnetic wave incident windows, each of which is used to seal one slit, or to seal one slit and an adjacent slit.

19. The plasma generator utilizing a resonant waveguide according to claim 7, wherein, The flange is not formed inside the central waveguide, but rather on the upper, lower, and outer sides of the waveguide, and its vertical cross-section is... shape.

20. The plasma generator utilizing a resonant waveguide according to claim 11, wherein, The first incident waveguide is connected in parallel to the first block waveguide at the corner of the first U-shaped waveguide on the first side portion in a manner that allows electromagnetic waves to be transmitted.

21. The plasma generator utilizing a resonant waveguide according to claim 12, wherein, The second incident waveguide is connected in parallel to the second block waveguide at the corner of the first U-shaped waveguide on the second side of the second side in a manner that allows electromagnetic waves to communicate with it.

22. The plasma generator utilizing a resonant waveguide according to claim 7, wherein, The waveguide is a TE-mode rectangular waveguide. The slit is formed vertically on the inner side of the linear rectangular waveguide and perpendicular to the direction of electromagnetic wave propagation.

23. The plasma generator utilizing a resonant waveguide according to claim 8, wherein, The flange of the sub-block waveguide is located at the slit position.

24. The plasma generator utilizing a resonant waveguide according to claim 23, wherein, The flange portion of the opposing surface of the sub-block waveguide, opposite to the slit, extends to the inner slit direction of the sub-block waveguide.

25. The plasma generator utilizing a resonant waveguide according to claim 7, wherein, The center waveguide includes a tuner on the opposing surface opposite the slit.

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