Nitrogen humidifying device for grinding fluid supply system
The integrated nitrogen humidification device arranges nitrogen and ultrapure water tangentially within the humidification chamber and controls them in a coordinated manner. This solves the problems of large size and low mixing efficiency of existing devices, achieves a stable supply and rapid response of wet nitrogen, and reduces the risk of crystallization and stratification of the grinding slurry.
Patent Information
- Application Number
- CN202511361088.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-09-23
- Publication Date
- 2025-11-07
- Estimated Expiration
- Not applicable · inactive patent
AI Technical Summary
Existing nitrogen humidification devices are large in size, have dispersed functions, and have long control chains. They also have low mixing efficiency between nitrogen and ultrapure water and slow humidity response, making it difficult to achieve a stable and controllable supply of wet nitrogen in a clean environment. This results in the grinding slurry being prone to crystallization and stratification during use.
Design an integrated nitrogen humidification device, including a nitrogen pressure regulating unit, an ultrapure water supply unit, an atomizing humidification unit, and a control and drive unit. The nitrogen nozzle and the ultrapure water nozzle are arranged tangentially. The control and drive unit coordinates the operation of each unit to achieve effective gas-liquid shearing and mixing, shorten the control link, and improve the mixing efficiency.
It achieves stable output of wet nitrogen and rapid humidity adjustment response, reduces the risk of crystallization and stratification of grinding slurry during use, and improves the space utilization efficiency of the device.
Smart Images
Figure CN120901852A_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The present application relates to the technical field of polishing liquid supply, in particular to a nitrogen humidifying device for a polishing liquid supply system. BACKGROUND
[0002] In the chemical mechanical polishing process of integrated circuit manufacturing, the polishing liquid needs to be kept in a stable dispersed state during preparation and transportation to avoid crystallization, precipitation, flocculation and delamination. In order to reduce the above risks, wet nitrogen is often introduced into the polishing liquid supply system.
[0003] However, the existing nitrogen humidifying device generally has the problems of large volume, long control link caused by scattered functions, low nitrogen and ultrapure water mixing efficiency, slow humidity response, etc., and it is difficult to realize stable, controllable and fast supply of wet nitrogen in a clean environment. SUMMARY
[0004] The purpose of the present application is to provide a nitrogen humidifying device for a polishing liquid supply system, which can form an integrated device by combining a nitrogen pressure regulating unit, an ultrapure water supply unit, an atomizing humidifying unit and a control driving unit, and can make the nitrogen effectively shear and mix with the ultrapure water in the humidifying cavity by arranging the nitrogen nozzle and the ultrapure water nozzle tangentially in the atomizing humidifying unit. At the same time, the control driving unit is linked to each unit for coordinated control. Compared with the prior art, the control link is shortened, the gas-liquid mixing efficiency is improved, and the device occupies less space, so as to realize stable output and faster humidity adjustment response of wet nitrogen, and effectively reduce the crystallization and delamination risk of the polishing liquid during use.
[0005] To achieve the above purpose, the present application provides a nitrogen humidifying device for a polishing liquid supply system, comprising: a nitrogen pressure regulating unit for regulating the pressure of external high-purity nitrogen; an ultrapure water supply unit comprising an ultrapure water storage tank, a small buffer tank connected with the ultrapure water storage tank, and a micro constant flow pump connected with the small buffer tank, the small buffer tank and the micro constant flow pump cooperate to supply stable water; an atomizing humidifying unit comprising a humidifying cavity, a nitrogen nozzle arranged on the humidifying cavity and connected with the nitrogen pressure regulating unit, and an ultrapure water nozzle arranged on the humidifying cavity and connected with the ultrapure water filter unit, the nitrogen nozzle and the ultrapure water nozzle are arranged tangentially; a control driving unit connected with the nitrogen pressure regulating unit, the ultrapure water supply unit and the atomizing humidifying unit respectively.
[0006] Optionally, a filter unit for filtering external ultrapure nitrogen is arranged between the ultrapure water supply unit and the atomizing humidifying unit.
[0007] Optionally, the ultrapure water supply unit further comprises: a liquid level sensor arranged between the ultrapure water storage tank and the small buffer tank, for monitoring the remaining amount of ultrapure water in real time.
[0008] Optionally, the included angle between the nitrogen gas nozzle and the ultrapure water nozzle is 5-15°.
[0009] Optionally, the nitrogen gas nozzle and the ultrapure water nozzle are microporous ceramic nozzles.
[0010] Optionally, the pressure of the nitrogen gas nozzle is 0.15-0.25 MPa, and the pressure of the ultrapure water nozzle is 0.05-0.15 MPa.
[0011] Optionally, the nitrogen gas humidifying device for the polishing liquid supply system further comprises: a touch display unit connected with the control driving unit; a humidity sensor and a nitrogen gas flow meter arranged at the outlet of the atomization humidifying unit and connected with the control driving unit, for detecting the humidity and flow of the mixed humidified nitrogen gas and feeding back to the control driving unit to adjust the nitrogen gas flow and the amount of ultrapure water.
[0012] Optionally, the nitrogen gas humidifying device for the polishing liquid supply system further comprises a cabinet body, the touch display unit is embedded in the top layer of the cabinet body, and the nitrogen gas pressure regulating unit, the ultrapure water supply unit, the atomization humidifying unit, the control driving unit and the humidity sensor and the nitrogen gas flow meter are integrally arranged in the lower layer of the cabinet body.
[0013] The beneficial effects of the present application are that: by integrating the nitrogen gas pressure regulating unit, the ultrapure water supply unit, the atomization humidifying unit and the control driving unit into an integrated device, and arranging the tangential arrangement of the nitrogen gas nozzle and the ultrapure water nozzle in the atomization humidifying unit, the nitrogen gas forms effective shearing and mixing with the ultrapure water in the humidifying cavity; at the same time, the control driving unit links and controls each unit respectively; compared with the prior art, the control link is shortened, the gas-liquid mixing efficiency is improved, and the device occupies less space, so that stable output of humidified nitrogen gas and faster humidity adjustment response are realized, and the crystallization and stratification risk of the polishing liquid during use can be effectively reduced.
[0014] The above description is only a summary of the technical scheme of the present application, in order to more clearly understand the technical means of the present application, and the content of the specification can be implemented as follows. BRIEF DESCRIPTION OF DRAWINGS
[0015] Figure 1A schematic structural view of a nitrogen gas humidifying device for a polishing liquid supply system according to an embodiment of the present application; Figure 2 A schematic structural view of an ultrapure water supply unit of a nitrogen gas humidifying device for a polishing liquid supply system according to an embodiment of the present application; Figure 3 A schematic structural view of an atomizing humidifying unit of a nitrogen gas humidifying device for a polishing liquid supply system according to an embodiment of the present application; In the figure: 1, nitrogen gas pressure regulating unit; 2, ultrapure water supply unit; 21, ultrapure water storage tank; 22, small buffer tank; 23, micro constant flow pump; 24, liquid level sensor; 3, atomizing humidifying unit; 31, humidifying cavity; 32, nitrogen gas nozzle; 33, ultrapure water nozzle; 4, control driving unit; 5, filtering unit; 6, touch display unit; 7, humidity sensor; 8, nitrogen gas flow meter; 9, cabinet body. DETAILED DESCRIPTION
[0016] The technical solutions of the present application will be described clearly and completely below in conjunction with the accompanying drawings. Obviously, the described embodiments are only some of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative work fall within the scope of protection of the present application.
[0017] In the description of the present application, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer" and the like indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present application and simplifying the description, and therefore cannot be understood as indicating or implying that the devices or elements referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as limiting the present application. In addition, the terms "first", "second", "third" are only for descriptive purposes and cannot be understood as indicating or implying relative importance.
[0018] In the description of the present application, it should be noted that unless otherwise explicitly specified and limited, the terms "mounting", "connecting", "connection" should be understood broadly, for example, it can be fixed connection, or detachable connection, or integrally connected; it can be mechanical connection, or electrical connection; it can be directly connected, or indirectly connected through an intermediate medium, or the communication inside two elements. For those skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances. In addition, the technical features involved in the different embodiments of the present application described below can be combined with each other as long as they do not conflict with each other.
[0019] Please see Figures 1 to 3The nitrogen humidification device for the polishing liquid supply system includes a nitrogen pressure regulating unit 1, an ultrapure water supply unit 2, an atomization humidification unit 3, and a control driving unit 4. The nitrogen pressure regulating unit 1 is used for regulating the pressure of external high-purity nitrogen. The ultrapure water supply unit 2 includes an ultrapure water storage tank 21, a small buffer tank 22 connected with the ultrapure water storage tank 21, and a micro constant-flow pump 23 connected with the small buffer tank 22. The small buffer tank 22 cooperates with the micro constant-flow pump 23 to stably supply water. The atomization humidification unit 3 includes a humidification cavity 31, a nitrogen nozzle 32 arranged on the humidification cavity 31 and connected with the nitrogen pressure regulating unit 1, and an ultrapure water nozzle 33 arranged on the humidification cavity 31 and connected with an ultrapure water filtration unit 5. The nitrogen nozzle 32 and the ultrapure water nozzle 33 are arranged tangentially. The control driving unit 4 is connected with the nitrogen pressure regulating unit 1, the ultrapure water supply unit 2, and the atomization humidification unit 3 respectively.
[0020] According to the scheme of the embodiment of the application, the nitrogen pressure regulating unit 1, the ultrapure water supply unit 2, the atomization humidification unit 3, and the control driving unit 4 are integrated into an integrated device. The tangential arrangement of the nitrogen nozzle 32 and the ultrapure water nozzle 33 in the atomization humidification unit 3 enables the nitrogen to effectively shear and mix with the ultrapure water in the humidification cavity 31. Meanwhile, the control driving unit 4 is connected with each unit to coordinately control the units. Compared with the prior art, the control link is shortened, the gas-liquid mixing efficiency is improved, and the device occupies less space, so that the stable output of humidified nitrogen and the rapid humidity adjustment response are realized, and the crystallization and stratification risks of the polishing liquid during use are effectively reduced.
[0021] The following will be described in detail with specific embodiments: Further, referring to Figure 1 The filtration unit 5 is arranged between the ultrapure water supply unit 2 and the atomization humidification unit 3 to filter external ultrapure nitrogen. The configuration can improve the cleanliness of the gas entering the atomization humidification unit 3, reduce the influence of particles or impurities on the humidification cavity 31 and the nozzle, reduce the risk of blockage and secondary pollution, and stabilize the quality of humidified nitrogen.
[0022] Specifically, referring to Figure 2 The ultrapure water supply unit 2 further includes a liquid level sensor 24. The liquid level sensor 24 is arranged between the ultrapure water storage tank 21 and the small buffer tank 22 to monitor the remaining amount of ultrapure water in real time. The configuration can realize online perception of the ultrapure water supply state, facilitate the control driving unit 4 to adjust the water supply and supply strategy, and avoid unstable atomization or abnormal shutdown of the equipment due to lack of water.
[0023] Specifically, referring to Figure 3The intersection angle between the nitrogen spout 32 and the ultrapure water spout 33 is 5-15°, and the nitrogen spout 32 and the ultrapure water spout 33 are microporous ceramic spouts. The tangential arrangement between the nitrogen spout 32 and the ultrapure water spout 33 is conducive to forming a stable rotating flow field in the humidification cavity 31 and enhancing the shearing effect, thereby improving the atomization and mixing efficiency and further improving the uniformity and stability of the output of humidified nitrogen gas. The spout structure helps to obtain uniform and repeatable spraying characteristics, reduces droplet size fluctuations and reduces the probability of blockage, thereby improving atomization quality and the operational reliability of the device.
[0024] Specifically, the pressure of the nitrogen spout 32 is 0.15-0.25 MPa, and the pressure of the ultrapure water spout 33 is 0.05-0.15 MPa. Specifically, in the present embodiment, the pressure of the nitrogen spout 32 is 0.2 MPa, and the pressure of the ultrapure water spout 33 is 0.1 MPa, ensuring a stable gas-liquid pressure difference, thereby outputting humidified nitrogen gas with a particle size of less than 50 μm.
[0025] Please refer to Figure 1 The nitrogen humidification device further comprises a touch display unit 6, a humidity sensor 7, a nitrogen flow meter 8, and a cabinet 9. The touch display unit 6 is connected to the control driving unit 4; the humidity sensor 7 and the nitrogen flow meter 8 are arranged at the outlet of the atomization and humidification unit 3 and are connected to the control driving unit 4, for detecting the humidity and flow of the mixed humidified nitrogen gas and feeding back to the control driving unit 4 to adjust the nitrogen flow and the amount of ultrapure water. By feeding back the humidity and flow of the humidified nitrogen gas to the control driving unit 4 to automatically adjust the input nitrogen flow and the amount of ultrapure water, the humidity of the output nitrogen gas is ensured to be stable within a preset range. In the present embodiment, the nitrogen humidity range is 94-97%. The touch display unit 6 is embedded in the top layer of the cabinet 9, and the nitrogen pressure regulating unit 1, the ultrapure water supply unit 2, the atomization and humidification unit 3, the control driving unit 4, and the humidity sensor 7 and the nitrogen flow meter 8 are integrally arranged in the lower layer of the cabinet 9. Such an arrangement is conducive to realizing the modularization and compact layout of the device, improving the installation convenience and on-site adaptability.
[0026] The nitrogen humidification device, when working, supplies the atomization and humidification unit 3 with the outside high-purity nitrogen gas which enters the nitrogen pressure regulating unit 1 and is treated by the filter unit 5 according to the set parameters of the control driving module; the ultrapure water is continuously sent to the atomization and humidification unit 3 by the ultrapure water supply unit 2 through the small buffer tank 22 and the micro constant-flow pump 23, and the liquid level sensor 24 monitors the real-time amount of the ultrapure water; in the atomization and humidification unit 3, the nitrogen gas nozzle 32 and the ultrapure water nozzle 33 guide the gas and liquid into the humidification cavity 31 in a tangential way, realize effective shearing and sufficient mixing, and form the humidified nitrogen gas; the humidified nitrogen gas is detected by the humidity sensor 7 and the nitrogen gas flow meter 8, the detection data and the human-computer interaction information are transmitted to the control driving module, the operation parameters of the nitrogen pressure regulating unit 1 and the ultrapure water supply unit 2 are adjusted by the control driving module, the humidified nitrogen gas output is maintained in the set target range, and finally the humidified nitrogen gas is delivered to the grinding liquid supply system for use.
[0027] The technical features of the above-described embodiments can be combined in any manner, and to make the description concise, all possible combinations of the technical features in the above-described embodiments are not described, however, as long as the combinations of the technical features do not exist contradictory, they should be considered as the scope of the present disclosure.
[0028] The above-described embodiments only express several implementation manners of the present application, the description is more specific and detailed, but it should not be understood as the limitation of the patent scope of the present application. It should be pointed out that for ordinary skilled in the art, without departing from the concept of the present application, a number of modifications and improvements can be made, which all belong to the protection scope of the present application. Therefore, the patent protection scope of the present application should be subject to the appended claims.
Claims
1. A nitrogen gas humidifying device for a polishing liquid supply system, characterized by, The application relates to a nitrogen gas humidification device, which comprises the following parts: a nitrogen gas pressure regulating unit for regulating the pressure of external high-purity nitrogen gas; an ultrapure water supply unit comprising an ultrapure water storage tank, a small buffer tank connected with the ultrapure water storage tank and a micro constant-flow pump connected with the small buffer tank, wherein the small buffer tank and the micro constant-flow pump cooperate to realize stable water supply; an atomization humidification unit comprising a humidification cavity, a nitrogen gas nozzle arranged on the humidification cavity and connected with the nitrogen gas pressure regulating unit and an ultrapure water nozzle arranged on the humidification cavity and connected with the ultrapure water filter unit, wherein the nitrogen gas nozzle and the ultrapure water nozzle are arranged tangentially; a control driving unit connected with the nitrogen gas pressure regulating unit, the ultrapure water supply unit and the atomization humidification unit respectively.
2. The nitrogen gas humidifying device for a polishing liquid supply system according to claim 1, characterized by, A filter unit for filtering external ultrapure nitrogen gas is arranged between the ultrapure water supply unit and the atomization humidification unit.
3. The nitrogen gas humidifying device for a polishing liquid supply system according to Claim 1, wherein The ultrapure water supply unit further comprises: a liquid level sensor arranged between the ultrapure water storage tank and the small buffer tank, which is used for monitoring the residual amount of ultrapure water in real time.
4. The nitrogen gas humidifying device for a polishing liquid supply system according to Claim 1, wherein The tangential angle between the nitrogen gas nozzle and the ultrapure water nozzle is 5-15 degrees.
5. The nitrogen gas humidifying device for a polishing liquid supply system according to Claim 1, wherein The nitrogen gas nozzle and the ultrapure water nozzle are microporous ceramic nozzles.
6. The nitrogen gas humidifying device for a polishing liquid supply system according to claim 1, wherein The pressure of the nitrogen gas nozzle is 0.15-0.25 MPa, and the pressure of the ultrapure water nozzle is 0.05-0.15 MPa.
7. The nitrogen gas humidifying device for a polishing liquid supply system according to Claim 1, wherein The application further comprises: a touch display unit connected with the control driving unit; a humidity sensor and a nitrogen gas flow meter arranged at the outlet of the atomization humidification unit and connected with the control driving unit, which are used for detecting the humidity and flow of mixed humid nitrogen gas and feeding back to the control driving unit to adjust the nitrogen gas flow and the amount of ultrapure water.
8. The nitrogen gas humidifying device for a polishing liquid supply system according to claim 7, wherein The application further comprises a cabinet, wherein the touch display unit is embedded on the top layer of the cabinet, and the nitrogen gas pressure regulating unit, the ultrapure water supply unit, the atomization humidification unit, the control driving unit and the humidity sensor and nitrogen gas flow meter are integrally arranged in the lower layer of the cabinet.