Illumination light type exposure machine structure

Abstract

The invention relates to an exposure machine structure of an illumination light type. The exposure machine structure comprises a light source part and a light source part, the light rays irradiate towards the first lens, penetrate through the first lens and then converge to form a first condensed light beam; the first light gathering beams irradiate towards the corresponding lens array parts, each lens array part comprises a plurality of lens columns which are combined side by side, and the first light gathering beams penetrate through the lens columns to form a plurality of first imaging light; the first imaging light irradiates towards the second lens and penetrates through the second lens, then the light path of the first imaging light is changed, the first imaging light is focused, the first imaging light is transmitted through the second lens to form a plurality of images which are mutually overlapped, the images are overlapped to form a final image, and the final image is provided with a plurality of side lines. Each side line is modified by superposition of a plurality of images to form a straight line; each image is focused through the arrangement of the second lens, so that the light pattern of the final image is more complete, each side line of the final image is relatively straight, and when the plurality of final images formed after the plurality of light source parts, the first lens, the lens array part and the second lens operate at the same time are mutually spliced, foldover does not exist. And the light and shadow at the joint of the final images are more consistent.

Description

Technical Field

[0001] This invention relates to an exposure machine structure for illumination patterns, specifically a technology applied in the field of optics. It mainly increases the size of the exposure area by superimposing light patterns, while maintaining the effective area and uniformity of the superimposed exposure light patterns. Background Technology

[0002] Exposure machines are extremely common in the optical industry. Through years of development, they can be categorized into five types: contact, proximity, stepper, scanner, and repeat. These five types are used in modern PCB (Printed Circuit Board) manufacturing. However, in each exposure operation, the size of the image beam 200 often varies. It's difficult for the exposure machine to handle these varying beam sizes. A fixed number of exposure machines is sufficient for a fixed size, but larger sizes require more machines, increasing equipment costs.

[0003] Another problem is that when the exposure size is large, several exposure machines (systems) must be stacked. However, the resulting image beam pattern 200 will have two problems. The first problem is that there will be optical distortion aberrations. Please see... Figure 1 As shown, because the slopes of each image beam 200 projected by the exposure machine are not the same, a pincushion distortion will be formed after superposition. Figure 1 A) or barrel distortion ( Figure 1 The second problem is that after the images are superimposed, the edges where each imaging beam 200 meets the other will have insufficient uniformity. Simply put, it will result in... Figure 2 Generally, there are cross-shaped light and shadow lines of 300, which can cause uneven exposure for printed circuit boards with a large overall exposure size. Summary of the Invention

[0004] The main technical problem to be solved by the present invention is to overcome the above-mentioned defects of the prior art and provide an exposure machine structure with illumination pattern, so that when the user performs optical imaging operations, it can not only eliminate distortion, but more importantly, it can delete and fade the cross-shaped superimposed light and shadow when the exposure area is large, so as to optimize the imaging results. The technical solution adopted by this invention to solve its technical problem is:

[0005] An exposure machine structure with illumination light type includes: a light source section that emits a plurality of light rays; a first lens towards which the light rays illuminate and converge to form a first focused beam after passing through the first lens; a lens array section towards which the first focused beams illuminate corresponding lens array sections, the lens array section comprising a plurality of lens pillars arranged side by side, the first focused beams penetrating the lens pillars of the lens array section to form a plurality of first imaging beams; and a second lens towards which each first imaging beam illuminates and penetrates, the second lens altering the shape of each first imaging beam. The light path is focused, and each first imaging light is transmitted through the second lens to form several superimposed images. The superposition of these images forms the final image, which has several edges. Each edge is modified by the superposition of the images to form a straight line. The second lens is used to focus each image, making the light pattern of the final image more complete and the edges of the final image straighter. Furthermore, when the several final images formed by the simultaneous operation of several light sources, first lenses, first lens arrays, and second lenses are stitched together, there will be no superposition, and the light and shadow at the junctions between the final images will be more consistent.

[0006] A further technical feature of the present invention is that the distance between the light source and the first lens is 27mm to 29mm.

[0007] A further technical feature of the present invention is that the distance between the first lens and the lens array is 5mm to 7mm.

[0008] A further technical feature of the present invention is that an iris sheet is further provided between the lens array and the second lens. The iris sheet blocks each of the first imaging lights illuminating the second lens. The iris sheet includes a ring-shaped blocking portion and a ring-shaped light-transmitting portion. When each of the first imaging lights enters the iris sheet, part of its light rays will be blocked by the ring-shaped blocking portion and cannot be transmitted, while part of the light rays of each of the first imaging lights will be transmitted through the ring-shaped light-transmitting portion and irradiate towards the second lens.

[0009] A further technical feature of the present invention is that the distance between the iris plate and the lens array is 0.4 mm to 0.6 mm.

[0010] A further technical feature of the present invention is that the distance between the iris plate and the second lens is 340mm to 360mm.

[0011] A further technical feature of the present invention is that the distance between the second lens and the projection point of the final image is 790mm to 650mm.

[0012] A further technical feature of the present invention is that the surface of each lens pillar of the lens array facing one end of the second lens is an aspherical surface.

[0013] A further technical feature of the present invention is that the second lens is a convex lens or a reflector.

[0014] In summary, the advantages of this invention are that, through the lens array, each first imaging light, after passing through the second lens, forms several superimposed images. Each image has a different shape due to the parallel arrangement of several lens pillars in the lens array. After the images are superimposed, a standard square final image can be formed. When the invention has several light sources, first lenses, lens arrays, and second lenses operating simultaneously, the light distribution values ​​of each final image are close and the same. Therefore, the large-area image formed by stitching together the final images is more consistent. This changes the previous method of expanding the light pattern and using superposition in the prior art, where optical distortion of individual light patterns would result in obvious cross-shaped superposition after the light patterns are superimposed. However, this invention eliminates the distortion of the light pattern by stitching together the lens pillars, making the light distribution of each final image close and the same, so that the image after stitching together the final images is more consistent and the same, and the image viewed by the eye will not have obvious regional differences.

[0015] The beneficial effect of this invention is that, when performing optical imaging operations, users can not only eliminate distortion, but more importantly, when the exposure area is large, they can delete or fade cross-shaped overlapping light and shadow, so as to optimize the imaging results. Attached Figure Description

[0016] The present invention will be further described below with reference to the accompanying drawings and embodiments.

[0017] Figure 1 This is a schematic diagram of two types of optical deformation formed after optical pattern superposition by an existing exposure machine.

[0018] Figure 2 This is a schematic diagram of the crosshair light and shadow lines formed by the superposition of light patterns in an existing exposure machine.

[0019] Figure 3 This is a schematic diagram of the structural block of the present invention.

[0020] Figure 4 This is a three-dimensional schematic diagram of the lens array section of the present invention.

[0021] Figure 5 This is a comparative schematic diagram showing the present invention compared to the prior art. Explanation of the labels in the diagram: Imaging light pattern 200 Light and shadow lines 300 Light source section 10 Light-emitting element 101 First lens 20 Lens array section 30 Lens column 301 Second lens 40 iris 50 501 Circular shielding part 502 ring-shaped light-transmitting part First focused beam A First imaging light B Imaging B1 Final image B2 edge line L Detailed Implementation

[0022] To clearly illustrate the aforementioned objectives and effects achieved by the present invention, its features and effects will be described in detail below with reference to the accompanying drawings and embodiments. Please refer to... Figures 3 to 5 As shown, the present invention discloses an exposure machine structure with illumination light type, comprising: a light source unit 10, which is provided with a plurality of light-emitting elements 101 to emit a plurality of light rays; a first lens 20, which may be a convex lens, which receives the light rays emitted by the light-emitting elements 101 and refracts them to converge them into a first focused beam A, the function of which is to first concentrate the energy of the light source; a lens array unit 30, which includes a plurality of lens pillars 301 arranged side by side, and one end of each lens pillar 301 is aspherical, the first focused beam A is incident on each lens pillar 301 of the lens array unit 30, and the first focused beam A is refracted by each lens pillar 301 to form a plurality of first imaging beams B; and a second lens 40, which may be a convex lens or a reflector, the first imaging beams B being incident on the second lens 40. The second lens 40 adjusts and changes the emission path of the first imaging light B, so that the first imaging light B is focused after passing through the second lens 40 to form several images B1, and the images B1 are superimposed to form a final image B2. The final image B2 has several edges L, and each edge L is modified by the superposition of several images B1 to form a straight line. In this way, by using the setting of the second lens 40 to focus the first imaging light B to form images B1 superimposed to form each other, the light pattern of the final image B2 formed after superposition is more complete, and the edges L of the final image B2 are straighter. Furthermore, when the several final images B1 formed by the simultaneous operation of several light source units 10, first lens 20, lens array unit 30 and second lens 40 are stitched together, there will be no superposition, and the light and shadow at the junction of each final image B2 is more consistent.

[0023] Based on the above description, the present invention mainly utilizes the arrangement of several lens pillars 301 in the lens array 30 to allow the first focused beam A to enter from one side of the lens array 30. The aspherical design of one end of each lens pillar 301 alters the light wave path and wavefront of the first focused beam A, causing it to be transmitted from each lens pillar 301 to form several first imaging beams B. At this time, due to the aspherical shape of each lens pillar 301, the light patterns of each first imaging beam B are differentiated. The light patterns of the first imaging beams are similar or nearly identical, but their shapes are not the same. Finally, each first imaging beam B enters the second lens 40. Under the adjustment, refinement, and focusing of the second lens 40, all the rays of each first imaging beam B are finely adjusted and focused again, causing the light patterns of each first imaging beam B to be superimposed. The different shapes of the light patterns of each first imaging beam B compensate for each other, making the final image B2 clearer, neater, and more uniform. Furthermore, the edges L of the final image B2 approach straight lines. (See [link / reference]). Figure 5 As shown, the left side shows the light pattern formed by the prior art, while the right side shows the final image B2 light pattern formed by the present invention after passing through the aspherical lens pillars 301 and the second lens 40. The comparison of the two clearly shows that the prior art has obvious differences in each image and the final image. However, the edge of the final image B2 formed by the present invention after passing through the aspherical end of each lens pillar 301 and the second lens 40 is not deformed and the light pattern gradually becomes hazy. When several final images B2 are arranged side by side, there will be no obvious irregular light patterns or cross light patterns at the connection / overlap between the final images B2, thereby making the large area image more closely integrated.

[0024] Based on the above description, other technical features of the present invention will be further detailed below. Firstly, in order to obtain the optimal light pattern (light wave, light shape) of the final image B2, the distance between the light source 10 and the first lens 20 is 27mm to 29mm (inclusive of 27mm, 28mm, 29mm), the distance between the first lens 20 and the lens array 30 is 5mm to 7mm (inclusive of 5mm, 6mm, 7mm), and the distance between the second lens 40 and the projection point of the final image B2 is 590mm to 610mm (inclusive of 590mm, 600mm, 610mm). The main experimental data of the present invention are: the distance between the light source 10 and the first lens 20 is 28mm, the distance between the first lens 20 and the lens array 30 is 6mm, and the distance between the second lens 40 and the projection point of the final image B2 is 600mm. Please see [link to relevant documentation]. Figure 3 As shown.

[0025] Finally, to avoid the first imaging light B transmitted through the lens array 30 having an excessively large range that would affect the focusing (light) effect of the second lens 40, the present invention further provides an iris sheet 50 between the lens array 30 and the second lens 40. The iris sheet 50 blocks a portion of each first imaging light B that is irradiated by the second lens 40. The iris sheet 50 includes a ring-shaped blocking portion 501 and a ring-shaped light-transmitting portion 502. When each first imaging light B enters the iris sheet 50, a portion of its light is blocked by the ring-shaped blocking portion 501 and cannot be transmitted. Some light rays are transmitted through the annular light-transmitting portion 502 and irradiate towards the second lens 40. The distance between the iris plate 50 and the lens array portion 30 is 0.4mm to 0.6mm (inclusive of 0.4mm, 0.5mm, and 0.6mm; however, based on the aforementioned experimental data, 0.5mm is used in this invention). Additionally, the distance between the iris plate 50 and the second lens 40 is 340mm to 360mm (inclusive of 340mm, 350mm, and 360mm; however, based on the aforementioned experimental data, 350mm is used in this invention). Please see [link to relevant documentation]. Figure 3 As shown.

[0026] In summary, to address the problem that existing exposure machines, when expanding the light pattern range, suffer from light pattern distortion and overlapping, resulting in poor image uniformity, this invention utilizes the combination of several lens pillars 301 (one end of which has a special aspherical design) of the lens array 30 and the second lens 40 to first modify and adjust the light pattern of each first imaging light B transmitted through the lens array 30. This makes the distribution of the light patterns of each imaging B1 of each first imaging light B approach the same and similar. After being focused by the second lens 40, each imaging B1 overlaps with the edges L of each imaging B1 complementing each other. This results in a more uniform and clear overall light pattern when the several final imaging B2s emitted from inside the exposure machine are arranged side by side. There are no cross-shaped or irregular light patterns at the junctions (overlapping points) between the final imaging B2s. This invention improves upon the problems that occur when expanding the light pattern in existing exposure machines. Obviously, this invention has a certain degree of progress and practicality.

[0027] The above description is merely a preferred embodiment of the present invention and is not intended to limit the present invention in any way. Any simple modifications, equivalent changes, and alterations made to the above embodiments based on the technical essence of the present invention shall still fall within the scope of the technical solution of the present invention.

Claims

1. A structure for an exposure machine with an illumination beam, characterized in that, include: The light source section emits several rays of light. The first lens is used to illuminate each light ray, and the light rays converge to form a first focused beam after passing through the first lens. The lens array section irradiates the corresponding lens array section, and the lens array section includes several lens columns arranged side by side. After the first focused beam passes through the lens columns of the lens array section, it forms several first imaging beams. And a second lens, after each first imaging light is irradiated and penetrated by the second lens, the second lens changes the light path of each first imaging light and focuses it. After each first imaging light is transmitted through the second lens, it forms several superimposed images. The superposition of each image forms a final image. The final image has several edges, and each edge is modified by the superposition of several images to form a straight line. The second lens is used to focus each image, making the light pattern of the final image more complete and the edges of the final image straighter. Furthermore, when several final images formed by the simultaneous operation of several light sources, the first lens, the lens array, and the second lens are stitched together, there will be no superimposition, and the light and shadow at the junctions between the final images will be more consistent.

2. The exposure machine structure with illumination pattern according to claim 1, characterized in that, The distance between the light source and the first lens is 27mm to 29mm.

3. The exposure machine structure with illumination pattern according to claim 1, characterized in that, The distance between the first lens and the lens array is 5mm to 7mm.

4. The exposure machine structure with illumination light type according to claim 1, characterized in that, An iris sheet is further provided between the lens array and the second lens. The iris sheet blocks each of the first imaging lights that are irradiated to the second lens. The iris sheet includes a ring-shaped blocking portion and a ring-shaped light-transmitting portion. When each of the first imaging lights is irradiated into the iris sheet, part of its light rays will be blocked by the ring-shaped blocking portion and will not be able to pass through. Part of the light rays of each of the first imaging lights will pass through the ring-shaped light-transmitting portion and irradiate towards the second lens.

5. The exposure machine structure with illumination pattern according to claim 4, characterized in that, The distance between the iris and the lens array is 0.4mm to 0.6mm.

6. The exposure machine structure with illumination pattern according to claim 4, characterized in that, The distance between the iris plate and the second lens is 340mm to 360mm.

7. The exposure machine structure with illumination type according to claim 1, characterized in that, The distance between the second lens and the projection point of the final image is 790mm to 650mm.

8. The exposure machine structure with illumination pattern according to claim 1, characterized in that, The surface of each lens cylinder in the lens array facing one end of the second lens is an aspherical surface.

9. The exposure machine structure with illumination type according to claim 1, characterized in that, The second lens is a convex lens or a reflecting mirror.

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