Treatment liquid supply system for wafer processing

Abstract

The invention discloses a processing liquid supply system for wafer processing, which comprises at least one accommodating and adjusting unit, and the accommodating and adjusting unit is used for accommodating a processing liquid and adjusting the gas dissolution concentration of the processing liquid flowing through the accommodating and adjusting unit; one end of the liquid outlet unit is arranged on the accommodating adjusting unit, and the other end of the liquid outlet unit is used for being connected with a process cavity so as to transfer the treatment liquid in the first accommodating part to the process cavity; the first detection device is arranged on the liquid outlet unit and is used for detecting the gas dissolution concentration of the treatment liquid flowing through the liquid outlet unit; wherein the accommodating and adjusting unit is provided with an adjusting part which is used for adjusting the gas dissolution concentration of the treatment liquid flowing through the accommodating and adjusting unit; or the accommodating and adjusting unit is provided with a plurality of adjusting parts for adjusting the treatment liquid flowing through the accommodating and adjusting unit in a stepped manner. The gas dissolving concentration of the treating fluid can be accurately regulated and controlled.

Description

Technical Field

[0001] This invention relates to the field of semiconductor technology, and more particularly to a processing liquid supply system for wafer fabrication. Background Technology

[0002] In the manufacturing process of semiconductor substrates (hereinafter referred to as "substrate"), a substrate processing apparatus is used to perform various treatments on the substrate using a processing solution. For example, etching is performed on the surface of a substrate by supplying a solution to the substrate on which a resist pattern is formed. In addition, after the etching process is completed, the resist on the substrate is removed by stripping solution or the substrate is cleaned by cleaning solution.

[0003] In the prior art, during substrate processing using a processing solution, the etching rate of the film on the substrate varies due to the concentration of dissolved oxygen in the processing solution; and the concentration of dissolved gases in the processing solution cannot be precisely controlled.

[0004] Therefore, it is necessary to provide a new processing fluid supply system for wafer fabrication to solve the aforementioned problems in the prior art. Summary of the Invention

[0005] The technical problem to be solved by this application is to provide a treatment liquid supply system that can precisely control the gas dissolved concentration of the treatment liquid.

[0006] To address the aforementioned technical problems, according to embodiments of this application, a processing fluid supply system for wafer fabrication is provided, comprising: At least one containment and regulation unit is provided for containing the treatment liquid and regulating the gas dissolved concentration of the treatment liquid flowing through the containment and regulation unit; The liquid outlet unit has one end located in the receiving and adjusting unit and the other end connected to the process chamber to transfer the processing liquid in the first receiving component to the process chamber. A first detection device is provided in the liquid outlet unit to detect the gas dissolved concentration of the processed liquid flowing through the liquid outlet unit; The container regulating unit has one regulating section to regulate the gas dissolved concentration of the processing liquid flowing through the container regulating unit; or the container regulating unit has multiple regulating sections to regulate the processing liquid flowing through the container regulating unit in a stepwise manner.

[0007] By adopting the above technical solution, at least one containment and adjustment unit is set up to achieve dynamic detection of the treated liquid, that is, to detect the treated liquid during the circulation process, thereby ensuring the accuracy of the detection. Furthermore, when multiple containment and adjustment units are set up, the multiple containment and adjustment units adjust the treated liquid flowing through them in a stepped manner. This stepped adjustment method further improves the accuracy of regulating the dissolved gas concentration of the treated liquid.

[0008] According to an embodiment of this application, the accommodating adjustment unit includes: The first container is used to contain the treatment liquid; The first gas supply unit includes a first gas supply device and a first gas supply pipeline; one end of the first gas supply pipeline is connected to the first gas supply device, and the other end is connected to the first container; the first gas supply device is used to supply gas, which flows through the first gas supply pipeline into the first container; the first gas supply device introduces gas into the first container according to the gas dissolved concentration detected by the first detection device, so as to adjust the gas dissolved concentration of the treated liquid in the first container. By adopting the above technical solution, the first detection device and the first gas supply unit are set to work together to achieve dynamic detection of the treated liquid, that is, to detect the treated liquid during the circulation process, thereby ensuring the accuracy of the detection. The first gas supply unit introduces nitrogen and clean air into the first container according to the detection result of the first detection device to adjust the gas solubility of the treated liquid in the first container, thereby achieving precise control of the gas dissolved concentration of the treated liquid.

[0009] According to an embodiment of this application, the liquid outlet unit includes a first liquid outlet pipeline, a second liquid outlet pipeline, a first control valve, and a second control valve; The second liquid outlet pipeline has a circulation end and a drain end. The circulation end is connected to the first container, and the drain end is used to connect to the process chamber. Both the first control valve and the second control valve are located in the second liquid outlet pipeline; One end of the first liquid outlet pipe is connected to the first container; the other end of the first liquid outlet pipe is connected to the second liquid outlet pipe and is placed between the first control valve and the second control valve; the first liquid outlet pipe, the second liquid outlet pipe, the first control valve and the second control valve cooperate to allow the processed liquid flowing through the first liquid outlet pipe to enter the first container or enter the process chamber; the first detection device is provided in the first liquid outlet pipe to detect the gas dissolved concentration of the processed liquid flowing through the first liquid outlet pipe.

[0010] According to an embodiment of this application, the containing and regulating unit further includes a second containing element, a third liquid outlet pipe, and a regulating unit; The second container is connected to the drain end to receive the treatment liquid flowing through the drain end; One end of the third liquid outlet pipe is connected to the second container, and the other end is connected to the process chamber; the processing liquid in the second container flows through the third liquid outlet pipe and then enters the process chamber; The regulating unit is connected to the second container and is used to supply gas into the second container to regulate the gas solubility of the treatment liquid in the second container.

[0011] According to an embodiment of this application, the adjustment unit includes: The second detection device is installed in the third liquid outlet pipeline to detect the gas dissolved concentration of the processed liquid flowing through the third liquid outlet pipeline; The second gas supply unit includes a second gas supply device and a second gas supply pipeline; one end of the second gas supply pipeline is connected to the second gas supply device, and the other end is connected to the second container; the second gas supply device is used to supply gas, and the gas flows through the second gas supply pipeline into the second container; the second gas supply device introduces gas into the second container according to the gas dissolved concentration detected by the detection device, so as to adjust the gas dissolved concentration of the treatment liquid in the second container.

[0012] According to embodiments of this application, a loop unit is also included, the loop unit comprising: The circulation pipeline has one end connected to the third liquid outlet pipeline and placed between the second detection device and the process chamber, and the other end connected to the second container so that the processing liquid flowing through the circulation pipeline enters the second container. A circulation control valve is provided in the circulation pipeline to control the on / off state of the circulation pipeline.

[0013] According to an embodiment of this application, both the first liquid outlet pipe and the third liquid outlet pipe are provided with filter elements; the filter element provided in the first liquid outlet pipe is used to filter the processed liquid flowing through the first liquid outlet pipe; the filter element provided in the third liquid outlet pipe is used to filter the processed liquid flowing through the third liquid outlet pipe.

[0014] According to embodiments of this application, it further includes a first detection branch and a first discharge branch; One end of the first detection branch is connected to the first liquid outlet pipe, and the other end is connected to the first container; the first detection branch is used to install a first detection device to detect the gas dissolved concentration of the processed liquid flowing through the first liquid outlet pipe into the first detection branch; the first detection branch is provided with a first detection control valve to control the on / off state of the first detection branch. One end of the first discharge branch is connected to the first detection branch, and the other end is used to discharge the treatment liquid flowing through the first discharge branch; a first discharge control valve is provided on the first discharge branch to control the opening and closing of the first discharge branch.

[0015] According to embodiments of this application, it further includes a second detection branch and a second discharge branch; One end of the second detection branch is connected to the third liquid outlet pipe, and the other end is connected to the second container; the second detection branch is used to install a second detection device to detect the gas dissolved concentration of the processed liquid flowing through the third liquid outlet pipe into the second detection branch; a second detection control valve is provided on the second detection branch to control the on / off state of the second detection branch; One end of the second discharge branch is connected to the second detection branch, and the other end is used to discharge the treatment liquid flowing through the second discharge branch; a second discharge control valve is provided on the second discharge branch to control the opening and closing of the second discharge branch.

[0016] According to an embodiment of this application, the third outlet pipe is provided with a drainage unit, the drainage unit comprising: The drain pipe has one end located in the third outlet pipe and the other end used to discharge the treated liquid flowing through the drain pipe. A drain control valve is provided in the drain pipeline to control the opening and closing of the drain pipeline.

[0017] According to an embodiment of this application, a flow detection device is provided on the third outlet pipeline to detect the flow rate of the processed liquid flowing through the third outlet pipeline into the process chamber.

[0018] According to embodiments of this application, a liquid replenishment unit is also included, the liquid replenishment unit comprising: A liquid replenishment device for supplying the treatment fluid; The liquid replenishment pipeline has one end connected to the liquid replenishment device and the other end connected to the first container, so that the processing liquid provided by the liquid replenishment device flows through the liquid replenishment pipeline and enters the first container. Attached Figure Description

[0019] Figure 1 This is a schematic diagram of the main structure of a treatment fluid supply system according to an embodiment of the present invention; Figure 2 This is a schematic diagram showing the installation position of a first detection device according to an embodiment of the present invention; Figure 3 This is a schematic diagram showing the installation position of a second detection device according to an embodiment of the present invention.

[0020] Figure label: 110. First receiving component; 120. Second receiving component; 121. Third liquid outlet pipeline; 122. Flow detection device; 130. Filter element; 200. Process chamber; 300. First detection device; 310. First detection branch; 311. First detection control valve; 320. First discharge branch; 321. First discharge control valve; 400. First air supply unit; 410. First air supply device; 420. First air supply pipeline; 510. First liquid outlet pipeline; 520. Second liquid outlet pipeline; 530. First control valve; 540. Second control valve; 610, Second detection device; 611, Second detection branch; 612, Second detection control valve; 613, Second discharge branch; 614, Second discharge control valve; 620, Second air supply unit; 621, Second air supply device; 622, Second air supply pipeline; 700, Circulation unit; 710, Circulation pipeline; 720, Circulation control valve; 800, Drainage unit; 810, Drainage pipeline; 820, Drainage control valve; 900, Liquid replenishment unit; 910, Liquid replenishment device; 920, Liquid replenishment pipeline. Detailed Implementation

[0021] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below. Obviously, the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention. Unless otherwise defined, the technical or scientific terms used herein should have the ordinary meaning understood by those skilled in the art. The terms "comprising" and similar expressions used herein mean that the element or object preceding the word covers the element or object listed after the word and its equivalents, but does not exclude other elements or objects.

[0022] The following is in conjunction with the appendix Figure 1-3 The specific embodiments of the present invention will be further described in detail below.

[0023] An embodiment of the present invention provides a processing fluid supply system for wafer processing. The processing fluid supply system is used to adjust the gas dissolved concentration of the processing fluid to keep the gas dissolved concentration of the processing fluid within a desired range. The processing fluid supply system includes: at least one containment and adjustment unit for containing the processing fluid and adjusting the gas dissolved concentration of the processing fluid flowing through the containment and adjustment unit. The liquid outlet unit has one end located in the receiving and regulating unit and the other end connected to the process chamber 200 to transfer the processing liquid in the first receiving member 110 to the process chamber 200. The first detection device 300 is located in the liquid outlet unit to detect the gas dissolved concentration of the processed liquid flowing through the liquid outlet unit; The container regulating unit has one regulating section to regulate the gas dissolved concentration of the treatment liquid flowing through the container regulating unit; or the container regulating unit has multiple regulating sections to regulate the treatment liquid flowing through the container regulating unit in a stepwise manner.

[0024] The containment and adjustment unit includes a first containment member 110 for containing the treatment liquid; The first gas supply unit 400 includes a first gas supply device 410 and a first gas supply pipeline 420. One end of the first gas supply pipeline 420 is connected to the first gas supply device 410, and the other end is connected to the first container 110. The first gas supply device 410 supplies gas, which flows through the first gas supply pipeline 420 into the first container 110. The first gas supply device 410 introduces gas into the first container 110 according to the gas dissolved concentration detected by the first detection device 300, so as to adjust the gas dissolved concentration of the treatment liquid in the first container 110. In some embodiments, the first container 110 and the first gas supply unit 400 form an adjustment section, that is, the container adjustment unit has an adjustment section.

[0025] In some embodiments, the wafer is processed within the process chamber 200 of the wafer processing equipment, which is prior art and will not be described in detail here. The processing fluid supply system includes a first container 110 having a receiving space for containing processing fluid, thereby facilitating the supply of processing fluid to the wafer. Specifically, the processing fluid supply system further includes a dispensing unit, one end of which is disposed in the first container 110 and communicates with the receiving space, and the other end of which is disposed in the process chamber 200 and communicates with the interior of the process chamber 200, so that the processing fluid in the first container 110 can flow through the dispensing unit and enter the process chamber 200 to supply processing fluid for the wafer processing process.

[0026] In some embodiments, the processing fluid supply system includes a first detection device 300 for detecting the gas solubility of the processing fluid flowing through the discharge unit. Specifically, the first detection device 300 is disposed on the discharge unit to detect the gas solubility of the processing fluid flowing through the discharge unit.

[0027] In some embodiments, the processing liquid supply system includes a first gas supply unit 400, wherein the first gas supply unit 400 is used to introduce gas into the first container 110 to adjust the gas solubility of the processing liquid in the first container 110. Specifically, the first gas supply unit 400 includes a first gas supply device 410 and a first gas supply line 420; wherein the first gas supply device 410 is used to supply gas; one end of the first gas supply line 420 is connected to the first gas supply device 410, and the other end is connected to the first container 110, so that the gas supplied by the first gas supply device 410 can enter the first container 110 through the first gas supply line 420 to adjust the gas solubility of the processing liquid in the first container 110.

[0028] In some specific embodiments, the first gas supply unit 400 cooperates with the first detection device 300. The first gas supply unit 400 can adjust the treatment liquid according to the gas dissolution concentration detected by the first detection device 300, so that the two cooperate to jointly adjust the gas dissolution concentration of the treatment liquid.

[0029] In some specific embodiments, there are two first gas supply devices 410, which are used to supply nitrogen and clean air respectively; there are two first gas supply lines 420, which correspond one-to-one with the two first gas supply devices 410; thus, nitrogen and clean air can be introduced into the first container 110 to regulate the gas solubility of the treatment liquid in the first container 110. Each of the two first gas supply lines 420 is equipped with a valve to control the opening and closing of the corresponding first gas supply line 420, thereby facilitating the control of the introduction of nitrogen and / or clean air into the first container 110.

[0030] In some more specific embodiments, two first gas supply lines 420 are respectively connected to the first receiving member 110.

[0031] In some more specific embodiments, two first gas supply lines 420 are interconnected, with one of the gas supply lines branching out and extending into the first housing 110 to facilitate the introduction of nitrogen and / or clean air into the first housing 110.

[0032] The liquid outlet unit includes a first liquid outlet line 510, a second liquid outlet line 520, a first control valve 530, and a second control valve 540; The second liquid outlet pipeline 520 has a circulation end and a discharge end. The circulation end is connected to the first receiving member 110, and the discharge end is used to connect to the process chamber 200. The first control valve 530 and the second control valve 540 are both located in the second liquid outlet line 520. One end of the first liquid outlet pipe 510 is connected to the first container 110; the other end of the first liquid outlet pipe 510 is connected to the second liquid outlet pipe 520 and is placed between the first control valve 530 and the second control valve 540; the first liquid outlet pipe 510, the second liquid outlet pipe 520, the first control valve 530 and the second control valve 540 cooperate to allow the processed liquid flowing through the first liquid outlet pipe 510 to enter the first container 110 or enter the process chamber 200; the first detection device 300 is provided in the first liquid outlet pipe 510 to detect the gas dissolved concentration of the processed liquid flowing through the first liquid outlet pipe 510.

[0033] In some embodiments, the liquid outlet unit includes a first liquid outlet pipe 510 and a second liquid outlet pipe 520. One end of the first liquid outlet pipe 510 is disposed at and communicates with the first receiving member 110. The arrangement method can be adhesive, snap-fit, or bolted, etc., which is not limited here. The main purpose is to seal the connection between the two so that the treatment liquid in the first receiving member 110 can enter the first liquid outlet pipe 510. The other end of the first liquid outlet pipe 510 is disposed at the middle of the second liquid outlet pipe 520 and communicates with the second liquid outlet pipe 520. The arrangement method can be adhesive, snap-fit, or bolted, etc., which is not limited here. The main purpose is to seal the connection between the two so that the treatment liquid in the first liquid outlet pipe 510 can enter the second liquid outlet pipe 520.

[0034] In some specific embodiments, the second liquid outlet pipe 520 has a circulation end and a drain end, wherein the circulation end extends to the first container 110 and communicates with the interior of the first container 110 so that the processing liquid flowing through the circulation end in the second liquid outlet pipe 520 can enter the first container 110; the drain end is used to connect to the process chamber 200 so that the processing liquid flowing through the drain end can eventually enter the process chamber 200.

[0035] In some more specific embodiments, both the first control valve 530 and the second control valve 540 are located in the second outlet pipe 520, such that the connection point between the first outlet pipe 510 and the second outlet pipe 520 is located between the first control valve 530 and the second control valve 540. Specifically, the position of the first control valve 530 corresponds to the circulation end, so that the circulation end can be closed or opened, thereby facilitating the control of whether the processed liquid flows through the circulation end; the position of the second control valve 540 corresponds to the drain end, so that the drain end can be closed or opened, thereby facilitating the control of whether the processed liquid flows through the drain end. That is, the first outlet pipe 510, the second outlet pipe 520, the first control valve 530, and the second control valve 540 cooperate to allow the processed liquid flowing through the first outlet pipe 510 to enter the first container 110 or the process chamber 200.

[0036] In some more specific embodiments, the first detection device 300 is located in the first liquid outlet pipe 510 to detect the gas solubility of the processed liquid flowing through the first liquid outlet pipe 510. The first detection device 300, in conjunction with the circulation end, enables dynamic circulation detection of the processed liquid. The core function of controlling the circulation of the processed liquid back into the first container 110 is to achieve precise control of dissolved gas through a dynamic balance mechanism. Through the circulation of the processed liquid, local concentration gradients are eliminated, and uniform mixing is achieved. If the processed liquid flows unidirectionally into the process chamber 200 (without circulation), the processed liquid in the first container 110 will form concentration stratification due to continuous gas dissolution / escape (e.g., the upper layer of processed liquid has more contact with gas, while the lower layer has a lower concentration), causing the reading of the first detection device 300 to fail to reflect the overall true concentration. Through circulation backflow (circulation end open), the liquid forms a closed-loop flow between the first container 110 and the liquid outlet unit, forcibly mixing the liquid and homogenizing the distribution of dissolved gas, making the detection data of the first detection device 300 more representative. In addition, after the returned processing liquid re-enters the first container 110, it is exposed again to the gas environment (nitrogen or clean air) introduced by the first gas supply unit 400. Through multiple cycles, the gas dissolution concentration of the processing liquid in the first container 110 gradually approaches the target dissolution concentration, avoiding insufficient or excessive adjustment in a single gas supply. At the same time, if the substandard processing liquid is directly discharged into the process chamber 200, it may cause wafer defects (such as residual bubbles). The circulation design can reuse the substandard processing liquid, reducing waste liquid generation. That is, the circulation path (first control valve 530 open, second control valve 540 closed) can temporarily isolate the process chamber 200 to prevent the abnormally concentrated processing liquid from entering the process, ensuring that only the qualified liquid is supplied through the drain end (second control valve 540 open).

[0037] The containment and adjustment unit also includes a second containment component 120, a third liquid outlet pipe 121, and an adjustment unit; The second container 120 is connected to the drain end to receive the treatment liquid flowing through the drain end; One end of the third liquid outlet pipe 121 is connected to the second container 120, and the other end is connected to the process chamber 200; the processing liquid in the second container 120 flows through the third liquid outlet pipe 121 and enters the process chamber 200. The regulating unit is connected to the second container 120 and is used to supply gas into the second container 120 to regulate the gas solubility of the treatment liquid within the second container 120. In some embodiments, the first container 110 and the first gas supply unit 400 form a regulating section, and the second container 120 and the regulating unit form a regulating section, i.e., the regulating unit has multiple regulating sections.

[0038] In some embodiments, the second container 120 also has a storage space for storing the treatment liquid. The second container 120 is connected to the drain end so that the treatment liquid in the first container 110 can flow sequentially through the first outlet pipe 510, the second outlet pipe 520 and the drain end before entering the second container 120.

[0039] In some specific embodiments, the second receiving member 120 is further provided with a third liquid outlet pipe 121. One end of the third liquid outlet pipe 121 is located in connection with the second receiving member 120. The pipe can be installed by bonding, snap-fitting, or bolting, etc., without limitation, with the primary goal of ensuring a sealed connection so that the processing liquid in the second receiving member 120 can enter the third liquid outlet pipe 121. The other end of the third liquid outlet pipe 121 is located in connection with the process chamber 200. This pipe can also be installed by bonding, snap-fitting, or bolting, without limitation, with the primary goal of ensuring a sealed connection so that the processing liquid in the third liquid outlet pipe 121 can enter the process chamber 200.

[0040] In some specific embodiments, an adjustment unit is also provided inside the second container 120, which is used to adjust the gas dissolution concentration of the treatment liquid inside the second container 120.

[0041] The adjustment unit includes: The second detection device 610 is installed in the third liquid outlet pipe 121 to detect the gas dissolved concentration of the processed liquid flowing through the third liquid outlet pipe 121. The second gas supply unit 620 includes a second gas supply device 621 and a second gas supply pipeline 622; one end of the second gas supply pipeline 622 is connected to the second gas supply device 621, and the other end is connected to the second container 120; the second gas supply device 621 is used to supply gas, and the gas flows through the second gas supply pipeline 622 into the second container 120; the second gas supply device 621 introduces gas into the second container 120 according to the gas dissolved concentration detected by the detection device, so as to adjust the gas dissolved concentration of the treatment liquid in the second container 120.

[0042] In some embodiments, the adjustment unit includes a second detection device 610 and a second gas supply unit 620; wherein the second gas supply unit 620 is used to introduce gas into the second container 120 to adjust the gas solubility of the processed liquid in the second container 120, and the second detection device 610 is provided in the third liquid outlet pipe 121 to detect the gas solubility concentration of the processed liquid flowing through the third liquid outlet pipe 121. The second detection device 610 cooperates with the second gas supply unit 620 to realize secondary adjustment of the processed liquid in the second container 120.

[0043] In some embodiments, the second gas supply unit 620 includes a second gas supply device 621 and a second gas supply line 622; wherein the second gas supply device 621 is used to supply gas; one end of the second gas supply line 622 is connected to the second gas supply device 621, and the other end is connected to the second container 120, so that the gas supplied by the second gas supply device 621 can enter the second container 120 through the second gas supply line 622 to adjust the gas solubility of the processing liquid in the second container 120.

[0044] In some specific embodiments, there are two second gas supply devices 621, which are used to supply nitrogen and clean air respectively; there are two second gas supply lines 622, which correspond one-to-one with the two second gas supply devices 621; thereby enabling nitrogen and clean air to be introduced into the second container 120 to regulate the gas solubility of the treatment liquid in the second container 120. Each of the two second gas supply lines 622 is equipped with a valve to control the opening and closing of the corresponding second gas supply line 622, thereby facilitating the control of the introduction of nitrogen and / or clean air into the second container 120.

[0045] In some more specific embodiments, two second gas supply lines 622 are respectively connected to the second housing 120.

[0046] In some more specific embodiments, two second gas supply lines 622 are interconnected, with one of the gas supply lines branching out and extending into the second housing 120 to facilitate the introduction of nitrogen and / or clean air into the second housing 120.

[0047] The processing fluid supply system also includes a circulation unit 700, which includes: The circulation pipeline 710 is connected at one end to the third liquid outlet pipeline 121 and is placed between the second detection device 610 and the process chamber 200, and at the other end to the second container 120 so that the processing liquid flowing through the circulation pipeline 710 enters the second container 120. A circulation control valve 720 is provided in the circulation pipeline 710 to control the opening and closing of the circulation pipeline 710.

[0048] In some embodiments, the processing fluid supply system further includes a circulation unit 700 for circulating the processing fluid flowing through the second outlet line 520 to the second container 120.

[0049] In some specific embodiments, the circulation unit 700 includes a circulation pipeline 710 and a circulation control valve 720. One end of the circulation pipeline 710 is connected to and connected to the third outlet pipeline 121. Its connection method can be adhesive, snap-fit, or bolted, etc., without limitation, primarily to ensure a sealed connection so that the treated liquid in the third outlet pipeline 121 can enter the circulation pipeline 710. The other end of the circulation pipeline 710 is connected to and connected to the interior of the second receiving member 120. Its connection method can be adhesive, snap-fit, or bolted, etc., without limitation, primarily to ensure a sealed connection so that the treated liquid in the circulation pipeline 710 can enter the second receiving member 120.

[0050] In some specific embodiments, a circulation control valve 720 is provided in the circulation pipeline 710 to control the opening and closing of the circulation pipeline 710. It is worth noting that the circulation pipeline 710 here has the same function as the circulation end of the second outlet pipeline 520, which will not be described in detail here.

[0051] In some more specific embodiments, the core purpose of setting up the second container 120 for secondary adjustment is to improve process stability, accuracy, and redundancy. It can eliminate the impact of upstream disturbances on the process. Specifically, gas solubility is strongly correlated with temperature. If the temperature control of the first container 110 is unstable, the concentration will drift. The second container 120, as a buffer chamber, temporarily stores the processed liquid initially adjusted by the first container 110, isolating upstream disturbances. Even if the output concentration of the first container 110 deviates from the target for a short time, the second container 120 can quickly correct it through secondary adjustment, preventing abnormal liquid from entering the process chamber 200. Furthermore, the secondary fine-tuning within the second container 120 can bring the gas solubility closer to the process window. For example, the limitation of the minimum opening of the valve in the first gas supply unit 400 may prevent the processed liquid from reaching the target process window in a single adjustment. The second container 120, through fine-tuning with smaller steps (such as introducing a small amount of nitrogen for degassing or clean air for solubilization in the second gas supply unit 620), further converges the concentration to the range required by the process, forming a two-stage control of coarse and fine adjustment. In addition, the second containment 120 can also cope with sudden anomalies, such as gas contamination caused by a failure of the first gas supply device 410 (e.g., a decrease in nitrogen purity). The second containment 120 can operate and adjust independently through the second gas supply unit 620 and the second detection device 610, so even if the first containment 110 fails, the process can still be guaranteed to continue uninterrupted, improving system stability. On this basis, the first containment 110 and the second containment 120 can support multi-step differentiated requirements. In some processes where solubility needs to be controlled in stages, such as the cleaning step requiring high oxygen solubility to oxidize residues, while the etching step requires low oxygen to avoid sidewall damage, the first containment 110 can be preset to a "general concentration," and the second containment 120 can be adjusted to a process-specific concentration as needed, avoiding system oscillations caused by frequent switching of the parameters of the first containment 110.

[0052] Both the first outlet pipe 510 and the third outlet pipe 121 are equipped with filter elements 130; the filter element 130 in the first outlet pipe 510 is used to filter the processed liquid flowing through the first outlet pipe 510; the filter element 130 in the third outlet pipe 121 is used to filter the processed liquid flowing through the third outlet pipe 121.

[0053] In some embodiments, the filter element 130 provided in the first liquid outlet pipe 510 is used to filter the treatment liquid flowing through the first liquid outlet pipe 510; the filter element 130 provided in the third liquid outlet pipe 121 is used to filter the treatment liquid flowing through the third liquid outlet pipe 121.

[0054] In some specific embodiments, a pumping device is provided on both the first liquid outlet pipeline 510 and the third liquid outlet pipeline 121. The pumping device is a transfer pump to provide power for the treatment liquid in the first liquid outlet pipeline 510 or the third liquid outlet pipeline 121.

[0055] In some more specific embodiments, taking the first liquid outlet pipe 510 as an example, the treatment liquid in the first liquid outlet pipe 510 passes sequentially through a pumping device and a filter element 130. The filter element 130 is used to filter the treatment liquid flowing through the pumping device to reduce impurities in the treatment liquid.

[0056] The processing fluid supply system also includes a first detection branch 310 and a first discharge branch 320; One end of the first detection branch 310 is connected to the first liquid outlet pipe 510, and the other end is connected to the first receiving member 110; the first detection branch 310 is used to install the first detection device 300 to detect the gas dissolved concentration of the processed liquid flowing through the first liquid outlet pipe 510 into the first detection branch 310; the first detection branch 310 is provided with a first detection control valve 311 to control the opening and closing of the first detection branch 310; One end of the first discharge branch 320 is connected to the first detection branch 310, and the other end is used to discharge the processing liquid flowing through the first discharge branch 320; the first discharge branch 320 is provided with a first discharge control valve 321 to control the opening and closing of the first discharge branch 320.

[0057] In some embodiments, to facilitate the detection of the gas solubility of the treatment liquid, the treatment liquid supply system further includes a first detection branch 310 and a first discharge branch 320. One end of the first detection branch 310 is located in and connected to the first discharge pipe 510, allowing the treatment liquid flowing through the first discharge pipe 510 to enter the first detection branch 310. The other end of the first detection branch 310 is connected to the first container 110. A first detection device 300 is located in the first detection branch 310, meaning that the treatment liquid flowing through the first detection branch 310 and detected by the first detection device 300 can be circulated back into the first container 110, thus serving as a circulating treatment liquid during the detection process.

[0058] In some embodiments, a first detection control valve 311 is provided on the first detection branch 310 to control the opening and closing of the first detection branch 310; it is worth noting that the processing liquid flows sequentially through the first detection device 300 and the first detection control valve 311 in the first detection branch 310, and the first detection control valve 311 is used to control whether the processing liquid of the first detection branch 310 enters the first container 110.

[0059] In some embodiments, one end of the first discharge branch 320 is located at and connected to the first detection branch 310, and the other end is used to discharge the processed liquid flowing through the first discharge branch 320. A first discharge control valve 321 is provided on the first discharge branch 320 to control its opening and closing. During the detection process, by controlling the first detection control valve 311 and the first discharge control valve 321, the flow direction of the processed liquid detected by the first detection device 300 can be switched. Adding the first discharge branch 320 can prevent the processed liquid that has come into contact with the first detection device 300 from flowing back into the supply tank. Specifically, during the process of introducing the processed liquid, the first discharge control valve 321 can be opened first, and the first detection control valve 311 closed to discharge the residual processed liquid in the pipe. After one end has been discharged, the first discharge control valve 321 is closed, and the first detection control valve 311 is opened, so that the processed liquid circulates to the first container 110, while reducing the possibility of the processed liquid carrying particulate matter into the first container 110.

[0060] The processing fluid supply system also includes a second detection branch 611 and a second discharge branch 613; One end of the second detection branch 611 is connected to the third liquid outlet pipe 121, and the other end is connected to the second container 120; the second detection branch 611 is used to install the second detection device 610 to detect the gas dissolved concentration of the processed liquid flowing through the third liquid outlet pipe 121 into the second detection branch 611; the second detection branch 611 is provided with a second detection control valve 612 to control the on / off state of the second detection branch 611; One end of the second discharge branch 613 is connected to the second detection branch 611, and the other end is used to discharge the processing liquid flowing through the second discharge branch 613; a second discharge control valve 614 is provided on the second discharge branch 613 to control the opening and closing of the second discharge branch 613.

[0061] In some embodiments, to facilitate the detection of the gas solubility of the treatment liquid, the treatment liquid supply system further includes a second detection branch 611 and a second discharge branch 613. One end of the second detection branch 611 is located in and connected to the second discharge pipe 520, allowing the treatment liquid flowing through the second discharge pipe 520 to enter the second detection branch 611. The other end of the second detection branch 611 is connected to the second container 120. A second detection device 610 is located in the second detection branch 611, meaning that the treatment liquid flowing through the second detection branch 611 and detected by the second detection device 610 can be circulated back into the second container 120, thus serving as a circulating treatment liquid during the detection process.

[0062] In some embodiments, a second detection control valve 612 is provided on the second detection branch 611 to control the opening and closing of the second detection branch 611; it is worth noting that the processing liquid flows sequentially through the second detection device 610 and the second detection control valve 612 in the second detection branch 611, and the second detection control valve 612 is used to control whether the processing liquid in the second detection branch 611 enters the second container 120.

[0063] In some embodiments, one end of the second discharge branch 613 is located at and connected to the second detection branch 611, and the other end is used to discharge the processed liquid flowing through the second discharge branch 613. A second discharge control valve 614 is provided on the second discharge branch 613 to control its opening and closing. During the detection process, by controlling the second detection control valve 612 and the second discharge control valve 614, the flow direction of the processed liquid detected by the second detection device 610 can be switched. Adding the second discharge branch 613 can prevent the processed liquid that has come into contact with the second detection device 610 from flowing back into the supply tank. Specifically, during the process of introducing the processed liquid, the second discharge control valve 614 can be opened first, and the second detection control valve 612 can be closed to discharge the residual processed liquid in the pipe. After one end has been discharged, the second discharge control valve 614 is closed, and the second detection control valve 612 is opened, so that the processed liquid circulates to the second container 120, while reducing the possibility of particulate matter entering the second container 120.

[0064] The third liquid outlet pipe 121 is equipped with a drain unit 800, which includes: The drain pipe 810 has one end connected to the third outlet pipe 121 and the other end used to discharge the treated liquid flowing through the drain pipe 810. A drain control valve 820 is installed in the drain line 810 to control the opening and closing of the drain line 810.

[0065] In some embodiments, one end of the drain pipe 810 is provided in connection with the third outlet pipe 121 and communicates with the third outlet pipe 121 so that the treatment liquid in the third outlet pipe 121 can enter the drain pipe 810; the other end of the drain pipe 810 is used to discharge the treatment liquid flowing through the drain pipe 810.

[0066] In some specific embodiments, a drain control valve 820 is provided on the drain pipe 810 to control the opening and closing of the drain pipe 810. More specifically, a third outlet control valve is provided on the third outlet pipe 121 to control the opening and closing of the third outlet pipe 121; wherein, the third outlet control valve is located between the drain pipe 810 and the process chamber 200; before the processing liquid is introduced into the process chamber, the drain control valve 820 is opened and the third outlet control valve is closed to drain the residual processing liquid in the pipe. After the residual processing liquid is completely drained, the drain control valve 820 is closed and the third outlet control valve is opened to allow the processing liquid to enter the process chamber 200.

[0067] The processing fluid supply system also includes a liquid replenishment unit 900, which includes: Liquid replenishment device 910, used to supply processing fluid; The liquid replenishment pipeline 920 is connected at one end to the liquid replenishment device 910 and at the other end to the first container 110, so that the processing liquid provided by the liquid replenishment device 910 flows through the liquid replenishment pipeline 920 and enters the first container 110.

[0068] In some embodiments, to facilitate the supply of processing fluid to the first container 110, the processing fluid supply system further includes a liquid replenishment unit 900. The liquid replenishment unit 900 includes a liquid replenishment device 910 and a liquid replenishment pipeline 920. The liquid replenishment device 910 is used to supply processing fluid. One end of the liquid replenishment pipeline 920 is disposed in the liquid replenishment device 910, and the other end is connected to the first container 110, so that the processing fluid provided by the liquid replenishment device 910 can flow through the liquid replenishment pipeline 920 and enter the first container 110, so as to replenish the processing fluid in a timely manner when the first container 110 is short of fluid.

[0069] In some embodiments, a flow detection device 122 is provided on the third outlet pipeline 121 to detect the flow rate of the processing liquid flowing through the third outlet pipeline 121 into the process chamber 200.

[0070] In some specific embodiments, the flow detection device 122 is a flow meter. The first detection device 300 and the second detection device 610 can be optical dissolved gas sensors or electrochemical dissolved gas sensors, etc., without limitation, as long as they can detect the gas solubility of the processed liquid.

[0071] The implementation principle of a processing fluid supply system for wafer processing according to an embodiment of this application is as follows: When the system is turned on, the liquid replenishment unit 900 is turned on to supply processing fluid to the first container 110. Simultaneously, the nitrogen and clean air pipelines of the first container 110 and the second container 120 are turned on, the first control valve 530 is turned on, and the second control valve 540 is turned off, allowing the processing fluid to circulate in the first container 110. The flow rates of the nitrogen and clean air pipelines are adjusted according to set values ​​to regulate the gas solubility in the processing fluid. After the first detection device 300 detects that the gas solubility of the processing fluid has reached the set value, the first control valve 530 is turned off, and the second control valve 540 is turned on to supply processing fluid to the second container 120. If the detection value of the first detection device 300 is not equal to the set value during the supply process, the valve is switched, and adjustment continues until the detection value of the first detection device 300 stabilizes. Subsequently, the second control valve 540 is opened, the drain control valve 820 is opened, the third outlet control valve is closed, and the circulation control valve 720 is closed to drain the previously stored processing liquid in the third outlet pipeline 121, avoiding affecting the adjustment time and accuracy. After a set time, the drain control valve 820 is closed, the third outlet control valve is closed, and the circulation control valve 720 is opened. The flow rates of nitrogen and clean air pipelines are adjusted according to the set values ​​to regulate the gas solubility in the processing liquid in the second container 120. After the measured value of the second concentration measuring unit reaches the set value, the third outlet control valve is opened and the circulation control valve 720 is closed, delivering the processing liquid to the process chamber 200 to process the substrate. The detection process of the second detection device 610 is the same as that of the first detection device 300. If the measured value of the second detection device 610 is not equal to the set value, the valve is switched, and the adjustment continues until it stabilizes. High-precision control of the target is achieved through step-by-step gas solubility control. The process chamber 200 is supplied with the required gas solubility of the treatment liquid through a simple pipeline device and control system. Finally, the gas solubility at the chamber is basically consistent with the measurement value of the second detection device 610. The gas solubility value can be directly monitored by the second detection device 610, so as to achieve high-precision control of the gas solubility of the treatment liquid. While embodiments of the present invention have been described in detail above, it will be apparent to those skilled in the art that various modifications and variations can be made to these embodiments. However, it should be understood that such modifications and variations fall within the scope and spirit of the invention as set forth in the claims. Furthermore, the invention described herein may have other embodiments and can be implemented or carried out in various ways.

Claims

1. A processing fluid supply system for wafer fabrication, characterized in that, include: A containment and regulation unit is used to contain the treatment liquid and regulate the gas dissolved concentration of the treatment liquid flowing through the containment and regulation unit; The liquid outlet unit has one end located in the receiving and adjusting unit and the other end connected to the process chamber (200) to transfer the processing liquid in the first receiving member (110) to the process chamber (200). A first detection device (300) is provided in the liquid outlet unit to detect the gas dissolved concentration of the processed liquid flowing through the liquid outlet unit; The container regulating unit has one regulating section to regulate the gas dissolved concentration of the treatment liquid flowing through the container regulating unit; or the container regulating unit has multiple regulating sections to regulate the treatment liquid flowing through the container regulating unit in a stepwise manner.

2. The processing fluid supply system according to claim 1, characterized in that, The accommodating adjustment unit includes: The first container (110) is used to contain the treatment liquid; The first gas supply unit (400) includes a first gas supply device (410) and a first gas supply pipeline (420); one end of the first gas supply pipeline (420) is connected to the first gas supply device (410), and the other end is connected to the first container (110); the first gas supply device (410) is used to supply gas, and the gas flows through the first gas supply pipeline (420) into the first container (110); the first gas supply device (410) introduces gas into the first container (110) according to the gas dissolved concentration detected by the first detection device (300) to adjust the gas dissolved concentration of the treatment liquid in the first container (110).

3. The processing fluid supply system according to claim 2, characterized in that, The liquid outlet unit includes a first liquid outlet pipeline (510), a second liquid outlet pipeline (520), a first control valve (530), and a second control valve (540); The second liquid outlet pipe (520) has a circulation end and a drain end. The circulation end is connected to the first container (110), and the drain end is used to connect to the process chamber (200). The first control valve (530) and the second control valve (540) are both located in the second liquid outlet pipeline (520); One end of the first liquid outlet pipe (510) is connected to the first container (110); the other end of the first liquid outlet pipe (510) is connected to the second liquid outlet pipe (520) and is placed between the first control valve (530) and the second control valve (540); the first liquid outlet pipe (510), the second liquid outlet pipe (520), the first control valve (530) and the second control valve (540) cooperate to allow the processed liquid flowing through the first liquid outlet pipe (510) to enter the first container (110) or enter the process chamber (200); the first detection device (300) is provided in the first liquid outlet pipe (510) to detect the gas dissolved concentration of the processed liquid flowing through the first liquid outlet pipe (510).

4. The processing fluid supply system according to claim 3, characterized in that, The containment and adjustment unit also includes a second containment component (120), a third liquid outlet pipe (121), and an adjustment unit; The second container (120) is connected to the drain end to receive the treatment liquid flowing through the drain end; One end of the third liquid outlet pipe (121) is connected to the second container (120), and the other end is connected to the process chamber (200); the processing liquid in the second container (120) flows through the third liquid outlet pipe (121) and then enters the process chamber (200); The regulating unit is connected to the second container (120) and is used to supply gas into the second container (120) to regulate the gas solubility of the treatment liquid in the second container (120).

5. The processing fluid supply system according to claim 4, characterized in that, The adjustment unit includes: A second detection device (610) is provided in the third liquid outlet pipe (121) to detect the gas dissolved concentration of the treatment liquid flowing through the third liquid outlet pipe (121); The second gas supply unit (620) includes a second gas supply device (621) and a second gas supply pipeline (622); one end of the second gas supply pipeline (622) is connected to the second gas supply device (621), and the other end is connected to the second container (120); the second gas supply device (621) is used to supply gas, and the gas flows through the second gas supply pipeline (622) into the second container (120); the second gas supply device (621) introduces gas into the second container (120) according to the gas dissolved concentration detected by the detection device, so as to adjust the gas dissolved concentration of the treatment liquid in the second container (120).

6. The processing fluid supply system according to claim 5, characterized in that, It also includes a loop unit (700), which includes: The circulation pipeline (710) is connected at one end to the third liquid outlet pipeline (121) and placed between the second detection device (610) and the process chamber (200), and at the other end to the second container (120) so that the processing liquid flowing through the circulation pipeline (710) enters the second container (120); A circulation control valve (720) is provided in the circulation pipeline (710) to control the opening and closing of the circulation pipeline (710).

7. The processing fluid supply system according to claim 4, characterized in that, Both the first liquid outlet pipe (510) and the third liquid outlet pipe (121) are provided with filter elements (130); the filter element (130) provided in the first liquid outlet pipe (510) is used to filter the treatment liquid flowing through the first liquid outlet pipe (510); the filter element (130) provided in the third liquid outlet pipe (121) is used to filter the treatment liquid flowing through the third liquid outlet pipe (121).

8. The processing fluid supply system according to claim 3, characterized in that, It also includes a first detection branch (310) and a first discharge branch (320); One end of the first detection branch (310) is connected to the first liquid outlet pipe (510), and the other end is connected to the first container (110); the first detection branch (310) is used to install a first detection device (300) to detect the gas dissolved concentration of the processed liquid flowing through the first liquid outlet pipe (510) into the first detection branch (310); the first detection branch (310) is provided with a first detection control valve (311) to control the opening and closing of the first detection branch (310); One end of the first discharge branch (320) is connected to the first detection branch (310), and the other end is used to discharge the processing liquid flowing through the first discharge branch (320); a first discharge control valve (321) is provided on the first discharge branch (320) to control the opening and closing of the first discharge branch (320).

9. The processing fluid supply system according to claim 4, characterized in that, It also includes a second detection branch (611) and a second discharge branch (613); One end of the second detection branch (611) is connected to the third outlet pipe (121), and the other end is connected to the second container (120); the second detection branch (611) is used to install a second detection device (610) to detect the gas dissolved concentration of the processed liquid flowing through the third outlet pipe (121) into the second detection branch (611); a second detection control valve (612) is provided on the second detection branch (611) to control the on / off state of the second detection branch (611). One end of the second discharge branch (613) is connected to the second detection branch (611), and the other end is used to discharge the processing liquid flowing through the second discharge branch (613); a second discharge control valve (614) is provided on the second discharge branch (613) to control the opening and closing of the second discharge branch (613).

10. The processing fluid supply system according to claim 4, characterized in that, The third outlet pipe (121) is provided with a drainage unit (800), the drainage unit (800) comprising: The drain pipe (810) has one end located in the third outlet pipe (121) and the other end used to discharge the treatment liquid flowing through the drain pipe (810); A drain control valve (820) is provided in the drain line (810) to control the opening and closing of the drain line (810).

11. The processing fluid supply system according to claim 4, characterized in that, The third outlet pipe (121) is equipped with a flow detection device (122) to detect the flow rate of the processing liquid flowing through the third outlet pipe (121) into the process chamber (200).

12. The processing fluid supply system according to any one of claims 1-11, characterized in that, It also includes a liquid replenishment unit (900), which comprises: Liquid replenishment device (910) for supplying processing liquid; A liquid replenishment line (920) is connected at one end to the liquid replenishment device (910) and at the other end to the first container (110) so that the processing liquid provided by the liquid replenishment device (910) flows through the liquid replenishment line (920) and enters the first container (110).

Images