Efficient cleaning device for mask processing
By designing a synchronous cleaning device and a moving cleaning head, synchronous cleaning of the mask on all four sides is achieved, solving the problems of extended production cycle and poor cleaning uniformity in the existing technology, improving cleaning efficiency and quality, and meeting the needs of mass production.
Patent Information
- Application Number
- CN202511113925.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-08-11
- Publication Date
- 2025-11-21
AI Technical Summary
Existing mask cleaning equipment cannot achieve simultaneous cleaning of all four sides of the mask, resulting in extended production cycle time, poor cleaning uniformity, and easy contamination from splashing impurities, making it difficult to meet the needs of mass production.
A synchronous cleaning device is adopted, which drives multiple moving cleaning heads to move synchronously along the edge of the mask through a moving frame and a horizontal screw slide. Combined with a limiting mechanism and a rotating mounting shaft, it achieves synchronous cleaning on all four sides, avoiding rotation and secondary clamping. Cleaning rollers and a water spray system are used for efficient cleaning.
It achieves one-time full-coverage cleaning of all four sides of the mask, improving production efficiency and cleaning quality, reducing production costs, avoiding impurity splashing and positional displacement, and adapting to the needs of mass production.
Smart Images

Figure CN120984643A_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The present application relates to the technical field of cleaning equipment, in particular to a high-efficiency cleaning device for mask processing. BACKGROUND
[0002] In the fields of semiconductor, micro-nano manufacturing, etc., the surface cleanliness of a mask (such as a photolithography mask, a hard mask) directly affects the pattern transfer accuracy and device yield. The cleaning process of the side edge of the mask is particularly important as it is a key area where particles and impurities are easily accumulated and photoresist residues are left. Most of the existing mask plate cleaning devices are for the upper and lower surfaces of the mask plate, and cannot clean the side edges of the mask plate, which results in cleaning dead angles of the mask plate.
[0003] A mask plate side edge cleaning device in Chinese patent CN115722467A includes a support rotating mechanism, a clamping mechanism, and a cleaning mechanism. The support rotating mechanism is used to support and rotate the mask plate by a corresponding angle. The clamping mechanism is used to clamp a pair of side edges of the mask plate. The cleaning mechanism is used to clean the other pair of side edges of the mask plate after clamping the group of side edges of the mask plate by the clamping mechanism. The device can efficiently clean the side edges of the mask plate.
[0004] The existing device clamps and fixes a pair of side edges of the mask through the clamping mechanism, so that the clamped area cannot be directly cleaned by the brush roller. To achieve full coverage of the four sides, the mask needs to be rotated and clamped twice for cleaning, which results in the following problems: the single cleaning needs to go through multiple operations such as "loading-clamping-cleaning one side-rotating-clamping again-cleaning the other side-unloading", the production cycle is prolonged, and it is difficult to adapt to batch manufacturing requirements. During the multiple clamping and rotating processes, the mask may be shifted due to mechanical precision problems, affecting the uniformity of cleaning, and even causing damage to the surface of the mask. At the same time, the existing device uses the rotating brush cleaning method of the brush roller, which is easy to make the cleaned impurities (such as photoresist debris, metal particles) splatter to the uncleaned area or surface of the mask under the action of mechanical force: the splattered impurities may adhere to the cleaned area or functional surface of the mask, offsetting the cleaning effect. To avoid pollution, additional auxiliary processes such as blowing and adsorption need to be added, or repeated cleaning is needed, further reducing production efficiency. SUMMARY
[0005] To solve the above problems, a high-efficiency cleaning device for mask processing is provided, which can effectively improve the production efficiency and production quality through a synchronous cleaning device.
[0006] To address the problems of existing technologies, this invention provides a high-efficiency cleaning device for mask processing, including a synchronous cleaning device installed on the mask cleaning device. The synchronous cleaning device includes a movable frame, inside which multiple horizontal lead screw slides are installed. Each horizontal lead screw slide is equipped with a movable cleaning head, which has a cleaning channel for cleaning the edge of the mask. The horizontal lead screw slides are used to drive the movable cleaning head to move horizontally along the edge of the mask. The movable cleaning head is used to clean the edge of the mask. Each horizontal lead screw slide is also equipped with a limiting mechanism, which has multiple limiting pushers that contact the edge of the mask. The limiting pushers are used to limit the position of the mask during cleaning.
[0007] Preferably, the movable cleaning head includes a sliding base installed on the movable end of the horizontal lead screw slide, a limiting pressure device is installed above the sliding base, the gap between the limiting pressure device and the sliding base forms a cleaning channel, a rotating mounting shaft is also installed between the sliding base and the limiting pressure device, the rotating mounting shaft is connected to the water spray system, and a cleaning roller is also installed on the rotating mounting shaft.
[0008] Preferably, the sliding base has multiple support rollers on its support surface, multiple side wall abutment rollers on its side wall, a baffle on its side, a water outlet below the baffle, and mounting holes inside the sliding base.
[0009] Preferably, the limiting press is equipped with a guide post and a lifting adjustment screw. The guide post is slidably connected to the sliding base, and the lifting adjustment screw is threadedly connected to the sliding base. The limiting press is provided with an clearance opening. The bottom of the limiting press is provided with multiple elastic pressing rollers and flexible stop bars. The top of the limiting press is equipped with a detachable roller pressing sleeve.
[0010] Preferably, the roller pressing sleeve is threadedly connected to the limiting pressing tool, the roller pressing sleeve is provided with a lifting slider inside, a first spring is installed between the lifting slider and the roller pressing sleeve, and a rotating abutment block is installed at the bottom of the lifting slider.
[0011] Preferably, the rotating mounting shaft is rotatably mounted in the mounting hole of the sliding base. A cross-shaped sleeve shaft is mounted on the top of the rotating mounting shaft. The cross-shaped sleeve shaft is provided with multiple water outlet holes. The interior of the rotating mounting shaft is provided with a flow cavity. The interior of the flow cavity is provided with water flow drive blades. A water inlet connector is rotatably mounted on the bottom of the rotating mounting shaft.
[0012] Preferably, a circulating telescopic assembly is also installed on the outside of the rotating mounting shaft. The circulating telescopic assembly includes an assembly sleeve sleeved on the outside of the rotating mounting shaft. The assembly sleeve is engaged with the mounting hole of the sliding base. The inside of the assembly sleeve is provided with an inclined annular groove. The circulating telescopic assembly also includes a movable ball rotatably mounted on the outside of the rotating mounting shaft. The movable ball is slidably connected to the inclined annular groove.
[0013] Preferably, the cleaning roller has an inner bushing inside, the inner bushing has an insertion hole at the center of the shaft that matches the shape of the cross bushing shaft, the inner bushing has several water seepage holes, and a flexible cleaning layer is installed on the outer side of the inner bushing.
[0014] Preferably, the limiting mechanism includes a fixed mounting bracket installed on a horizontal lead screw slide, the fixed mounting bracket being slidably connected to multiple limiting push brackets, a second spring being installed between the limiting push brackets and the fixed mounting bracket, and an abutting roller being provided at the bottom of the limiting push bracket. The limiting mechanism also includes a trapezoidal guide bracket installed at the movable end of the horizontal lead screw slide.
[0015] Preferably, the movable frame has two longitudinal adjustment plates and two transverse adjustment plates slidably installed inside. The transverse adjustment plates are positioned above the longitudinal adjustment plates. The two longitudinal adjustment plates slide longitudinally. A first bidirectional adjustment screw is installed between the two longitudinal adjustment plates to drive the longitudinal spacing adjustment. The two transverse adjustment plates slide laterally. A second bidirectional adjustment screw is installed between the two transverse adjustment plates to drive the transverse spacing adjustment.
[0016] The advantages of this invention compared to the prior art are: 1. Existing devices use a clamping mechanism to hold and fix a pair of sides of the mask, preventing the clamped area from being directly cleaned by the brush roller. To achieve full coverage of all four sides, the mask needs to be rotated and clamped twice for cleaning, resulting in multiple steps for each cleaning cycle: "loading - clamping - cleaning one side - rotating - re-clamping - cleaning the other side - unloading". This invention achieves simultaneous cleaning of all four sides of the mask. Multiple horizontal lead screw slides installed inside the moving frame can drive multiple moving cleaning heads to move horizontally synchronously along the edge of the mask, allowing all four sides of the mask to be cleaned in one go, eliminating the need for two separate cleaning cycles involving rotating the mask and clamping it twice, as is required in existing devices. This greatly simplifies the cleaning process, effectively shortens the cleaning time per cycle, significantly improves the production cycle, and can well adapt to the needs of batch manufacturing, greatly improving production efficiency. At the same time, this invention does not require rotating and switching the mask. During the cleaning of the mask edges by multiple moving cleaning heads, there is sufficient operating space on the upper and lower sides of the mask. The mask cleaning device can clean the upper and lower sides of the mask simultaneously, further improving the convenience and efficiency of cleaning.
[0017] 2. The limiting mechanism of this invention is equipped with multiple limiting pushers that contact the mask edge. During mask cleaning, these effectively limit the mask's position, preventing positional shifts caused by mechanical precision issues during repeated clamping and rotation. This ensures cleaning uniformity and reduces the risk of mask surface damage. Simultaneously, the moving cleaning head cleans the mask edge through the cleaning channel, effectively preventing impurities from splashing during cleaning. This reduces the possibility of splashed impurities adhering to cleaned areas or functional surfaces of the mask, eliminating the need for repeated cleaning. This improves cleaning quality while reducing production costs. Attached Figure Description
[0018] Figure 1 This is a three-dimensional schematic diagram of the material feeding state of a high-efficiency cleaning device for mask processing according to the present invention.
[0019] Figure 2 This is a three-dimensional schematic diagram of the synchronous cleaning device in a high-efficiency cleaning apparatus for mask processing according to the present invention.
[0020] Figure 3 This is a top view of the synchronous cleaning device in a high-efficiency cleaning apparatus for mask processing according to the present invention.
[0021] Figure 4 This is a three-dimensional schematic diagram of the horizontal lead screw slide, limiting mechanism, and moving cleaning head in a high-efficiency cleaning device for mask processing according to the present invention.
[0022] Figure 5 This is a three-dimensional schematic diagram of the moving cleaning head of a high-efficiency cleaning device for mask processing according to the present invention.
[0023] Figure 6 This is an exploded view of the moving cleaning head of a high-efficiency cleaning device for mask processing according to the present invention.
[0024] Figure 7 This is a front view of the movable cleaning head in a high-efficiency cleaning device for mask processing according to the present invention.
[0025] Figure 8 yes Figure 7 A three-dimensional planar sectional view at section AA.
[0026] Figure 9 This is an exploded view of the rotating mounting shaft in a high-efficiency cleaning device for mask processing according to the present invention.
[0027] Figure 10 This is a three-dimensional schematic diagram of the cleaning roller in a high-efficiency cleaning device for mask processing according to the present invention.
[0028] The numbers on the map are: 1. Mask cleaning device; 2. Moving frame; 21. Longitudinal adjusting plate; 22. Transverse adjusting plate; 23. First bidirectional adjusting screw; 24. Second bidirectional adjusting screw; 3. Horizontal screw slide; 4. Moving cleaning head; 41. Sliding base; 411. Support roller; 412. Side wall contact roller; 413. Baffle; 4131. Water outlet; 42. Limiting press; 421. Clearance opening; 422. Elastic pressing roller; 423. Lifting adjusting screw; 424. Guide post; 425. Flexible baffle; 456. Roller pressing sleeve; 4561. First spring; 4562. 4563. Lifting slider; 43. Rotating contact block; 43. Rotary mounting shaft; 431. Cross-shaped sleeve shaft; 433. Water outlet; 434. Water flow drive blade; 435. Water inlet connector; 436. Telescopic assembly; 437. Assembly sleeve; 4371. Inclined annular groove; 438. Movable ball bearing; 44. Cleaning roller; 441. Inner bushing; 4411. Insertion hole; 442. Flexible cleaning layer; 5. Limiting mechanism; 51. Limiting push frame; 52. Fixed mounting frame; 53. Second spring; 54. Contact roller; 55. Trapezoidal guide frame; 551. Guide bevel; 6. Mask plate; Detailed Implementation
[0029] To further understand the features, technical means, and specific objectives and functions achieved by the present invention, the present invention will be described in further detail below with reference to the accompanying drawings and specific embodiments.
[0030] See Figures 1 to 10 As shown, a high-efficiency cleaning device for mask processing includes a synchronous cleaning device installed on a mask cleaning device 1. The synchronous cleaning device includes a movable frame 2, and multiple horizontal screw slides 3 are installed inside the movable frame 2. Each horizontal screw slide 3 is equipped with a movable cleaning head 4, which has a cleaning channel for cleaning the side of a mask plate 6. The horizontal screw slide 3 is used to drive the movable cleaning head 4 to move horizontally along the side of the mask plate 6. The movable cleaning head 4 is used to clean the side of the mask plate 6. Each horizontal screw slide 3 is also equipped with a limiting mechanism 5, which has multiple limiting pushers 51 that contact the side of the mask plate 6. The limiting pushers 51 are used to limit the position of the mask plate 6 during cleaning.
[0031] The synchronous cleaning device includes a movable frame 2, inside which multiple horizontal lead screw slides 3 are installed. Each horizontal lead screw slide 3 is equipped with a movable cleaning head 4 and is equipped with a limiting mechanism 5. The movable cleaning head 4 has a cleaning channel for cleaning the sides of the mask 6. The function of the horizontal lead screw slides 3 is to drive the movable cleaning head 4 to move horizontally along the sides of the mask 6 to clean the sides of the mask 6. The limiting mechanism 5 is equipped with multiple limiting pushers 51 that contact the sides of the mask 6 to limit its position during the cleaning process. The movable frame 2 can adjust the installation position of the multiple horizontal lead screw slides 3 to accommodate mask 6 of different sizes.
[0032] During the cleaning operation of the mask plate 6, the mask cleaning device 1 moves the moving frame 2 to the placement area. With the help of an industrial robot, the mask plate 6 is horizontally placed at the center of the moving frame 2. During the horizontal placement of the mask plate 6, the limiting pushers 51 on multiple limiting mechanisms 5 act as limiting guides, ensuring that the mask plate 6 is placed in the designated position. The mask plate 6 descends to the bottom and contacts the moving cleaning head 4. Once it reaches the designated position, multiple horizontal lead screw slides 3 are simultaneously activated, driving multiple moving cleaning heads 4 to move horizontally in sync. The movement of the moving cleaning heads 4 causes the edges and corners of the mask plate 6 to enter the cleaning channel, achieving the positioning of the mask plate 6. Subsequently, the industrial robot resets and detaches from the mask plate 6, and the mask cleaning device 1 drives the moving frame 2 back to the cleaning area.
[0033] In the cleaning area, multiple horizontal lead screw slides 3 drive multiple movable cleaning heads 4 to move synchronously along the sides of the mask plate 6. When the movable cleaning head 4 moves to the position of the limiting pusher 51, the limiting mechanism 5 adjusts the movement of the limiting pusher 51 to avoid the movable cleaning head 4, ensuring that the movable cleaning head 4 can move continuously along the mask plate 6. Multiple movable cleaning heads 4 clean the four sides of the mask plate 6 simultaneously, effectively improving cleaning efficiency. The movable cleaning heads 4 clean the sides of the mask plate 6 through the cleaning channel, which can effectively avoid the splashing of impurities during the cleaning process. At the same time, this device does not require the mask plate 6 to be rotated and switched. During the cleaning of the sides of the mask plate 6 by multiple movable cleaning heads 4, there is sufficient operating space on the upper and lower sides of the mask plate 6. The mask cleaning device 1 can clean the upper and lower sides of the mask plate 6 simultaneously, further improving the convenience and efficiency of cleaning.
[0034] See Figures 1 to 8 As shown, the movable cleaning head 4 includes a sliding base 41 installed on the movable end of the horizontal lead screw slide 3. A limiting pressure device 42 is installed above the sliding base 41. The gap between the limiting pressure device 42 and the sliding base 41 forms a cleaning channel. A rotating mounting shaft 43 is also installed between the sliding base 41 and the limiting pressure device 42. The rotating mounting shaft 43 is connected to the water spray system. A cleaning roller 44 is also installed on the rotating mounting shaft 43.
[0035] The sliding base 41 is installed on the movable end of the horizontal lead screw slide 3, providing a limiting support for the mask plate 6 and ensuring the stability of the mask plate 6 during the cleaning process. The limiting press 42 is installed above the sliding base 41, forming a cleaning channel between the two. This cleaning channel is used to limit the position of the mask plate 6, ensuring that the edge of the mask plate 6 can accurately enter and remain within the cleaning area during cleaning.
[0036] The rotating mounting shaft 43 is positioned between the sliding base 41 and the limiting press 42, and is connected to the water spray system. When the horizontal lead screw slide 3 drives the moving cleaning head 4 to move along the edge of the mask plate 6, the water spray system is activated, supplying cleaning fluid to the rotating mounting shaft 43. The cleaning fluid passes through the rotating mounting shaft 43 and penetrates the surface of the cleaning roller 44 mounted on the rotating mounting shaft 43. At the same time, the rotating mounting shaft 43 begins to rotate, causing the cleaning roller 44 to rotate synchronously.
[0037] During rotation, the cleaning roller 44 cleans the sides of the mask plate 6 inside the cleaning channel. Due to the limiting effect of the cleaning channel on the sides of the mask plate 6, and the close contact between the cleaning roller 44 and the sides of the mask plate 6, the cleaning of the sides of the mask plate is effectively controlled. This cleaning method effectively avoids splashing of cleaning fluid during the cleaning process, ensuring the cleanliness of the cleaning environment and the consistency of the cleaning effect. The moving cleaning head 4 achieves high efficiency on the sides of the mask plate 6 while avoiding splashing of impurities, thus improving the overall cleaning quality.
[0038] The water spray system is existing technology and will not be described in detail here.
[0039] See Figures 4 to 7 As shown, the sliding base 41 has multiple support rollers 411 on its support surface, multiple side wall abutment rollers 412 on its side wall, a baffle 413 on its side, a water outlet 4131 below the baffle 413, and mounting holes inside the sliding base 41.
[0040] Multiple support rollers 411 are rotatably mounted on the support surface of the sliding base 41. These support rollers 411 horizontally support the bottom surface of the mask plate 6. During the cleaning process, the mask plate 6 is placed on the support rollers 411, achieving horizontal support through rolling contact, effectively reducing the friction between the sliding base 41 and the bottom surface of the mask plate 6. Simultaneously, multiple sidewall abutment rollers 412 are rotatably mounted on the sidewall of the sliding base 41. These sidewall abutment rollers 412 limit contact with the sides of the mask plate 6, also reducing friction with the sides of the mask plate 6 through rolling contact. The combined effect of the support rollers 411 and the sidewall abutment rollers 412 prevents wear on the mask plate 6 caused by friction during the cleaning process.
[0041] A baffle 413 is provided on the side of the sliding base 41. The main function of the baffle 413 is to prevent impurities generated during the cleaning process from splashing. During the cleaning process, cleaning fluid and impurities may splash. The presence of the baffle 413 effectively blocks these splashes, protecting the cleanliness of the cleaning environment. At the same time, a water outlet 4131 is provided below the baffle 413. Under the action of gravity, the cleaning fluid and impurities can flow along the baffle 413 to the water outlet 4131 and flow out of the sliding base 41 in a designated direction, facilitating subsequent collection and treatment.
[0042] The sliding base 41 has mounting holes inside for mounting the rotating mounting shaft 43.
[0043] See Figures 4 to 7 As shown, the limiting press 42 is equipped with a guide post 424 and a lifting adjustment screw 423. The guide post 424 is slidably connected to the sliding base 41, and the lifting adjustment screw 423 is threadedly connected to the sliding base 41. The limiting press 42 is provided with an clearance opening 421. The bottom of the limiting press 42 is provided with multiple elastic pressing rollers 422 and flexible baffles 425. The top of the limiting press 42 is equipped with a detachable roller pressing sleeve 456.
[0044] The limiting press 42 is equipped with a guide post 424 and a lifting adjustment screw 423. The guide post 424 is slidably connected to the sliding base 41, providing guidance for the lifting and lowering movement of the limiting press 42 and ensuring smooth movement. The lifting adjustment screw 423 is threadedly connected to the sliding base 41 and rotatably connected to the limiting press 42. When the lifting adjustment screw 423 is rotated, the limiting press 42 will move up and down on the sliding base 41 due to the transmission action of the thread. Through this lifting adjustment mechanism, the height of the cleaning channel can be effectively controlled, which can accommodate mask plates 6 of different thicknesses and ensure a tight fit between the cleaning channel and the edge of the mask plate 6, thereby ensuring the cleaning effect.
[0045] The limiting presser 42 is provided with a clearance opening 421. During the feeding process, the mask plate 6 can directly pass through the clearance opening 421 and fall onto the sliding base 41.
[0046] The bottom of the limiting presser 42 is equipped with multiple elastic pressing rollers 422. When the mask 6 enters the cleaning channel, the elastic pressing rollers 422 will elastically press the mask 6. This elastic pressing action can ensure that the mask 6 remains stable during the cleaning process, avoiding displacement or shaking due to mechanical vibration or external interference, thereby ensuring the accuracy and consistency of cleaning.
[0047] The bottom of the limiting press 42 is also equipped with a flexible baffle 425. During the cleaning process, the flexible baffle 425 can effectively prevent impurities generated during cleaning from splashing onto the mask plate 6, avoiding secondary contamination of the mask plate 6 by impurities. The flexible baffle 425 has good flexibility and sealing properties, and can closely fit the surface of the mask plate 6 to form an effective barrier, ensuring the cleanliness of the cleaning environment and the cleaning quality of the mask plate 6.
[0048] A detachable roller pressing sleeve 456 is installed on the top of the limiting pressing device 42. The main function of the roller pressing sleeve 456 is to limit and press the cleaning roller 44, ensuring that the cleaning roller 44 can be stably installed on the rotating mounting shaft 43, thereby maintaining the stability of the cleaning roller 44 during operation and ensuring the accuracy and reliability of the cleaning operation. When the cleaning roller 44 needs to be replaced due to cleaning needs or equipment maintenance, the operator does not need to perform complicated operations. They can simply remove the roller pressing sleeve 456 to easily remove the cleaning roller 44 from the rotating mounting shaft 43 and complete the replacement, greatly improving the convenience and efficiency of equipment maintenance.
[0049] See Figures 4 to 8 As shown, the roller pressing sleeve 456 is threadedly connected to the limiting pressing device 42. The roller pressing sleeve 456 has a lifting slider 4562 inside. A first spring 4561 is installed between the lifting slider 4562 and the roller pressing sleeve 456. A rotating abutment block 4563 is installed at the bottom of the lifting slider 4562.
[0050] The roller pressing sleeve 456 and the limiting pressing device 42 are connected by a threaded connection. The threaded connection has the characteristics of simple structure, convenient installation and stable connection, ensuring that the roller pressing sleeve 456 can be firmly installed on the limiting pressing device 42, providing a stable foundation for the subsequent limiting pressing of the cleaning roller 44.
[0051] The roller pressing sleeve 456 has a lifting slider 4562 inside, and a first spring 4561 is installed between the lifting slider 4562 and the roller pressing sleeve 456. After the roller pressing sleeve 456 is installed to the limiting pressing device 42, the first spring 4561 is in a compressed state, thereby generating a downward elastic force. This elastic force pushes the lifting slider 4562 downward, providing power for subsequent pressing of the cleaning roller 44.
[0052] A rotating abutment block 4563 is installed at the bottom of the lifting slider 4562, and the rotating abutment block 4563 is rotatably connected to the lifting slider 4562. When the roller pressing sleeve 456 is installed in place, the lifting slider 4562 moves downward under the action of the first spring 4561, causing the rotating abutment block 4563 to press against the cleaning roller 44. This pressing action ensures that the cleaning roller 44 is stably installed on the rotating mounting shaft 43, preventing the cleaning roller 44 from loosening or shifting during operation, thereby maintaining the stability of the cleaning roller 44.
[0053] During the rotation of the cleaning roller 44, the rotating contact block 4563 rotates synchronously. Since the rotating contact block 4563 and the cleaning roller 44 are in rotational contact, this rotational design effectively reduces the friction between the two, reduces energy loss and wear caused by friction, and ensures that the cleaning roller 44 can rotate smoothly, thereby ensuring the accuracy and reliability of the cleaning operation.
[0054] When the cleaning roller 44 needs to be replaced due to cleaning requirements or equipment maintenance, the operator only needs to remove the roller pressing sleeve 456 from the limiting pressing device 42. During the disassembly process, the elastic force of the first spring 4561 disappears, and the lifting slider 4562 and the rotating abutment block 4563 no longer apply pressure to the cleaning roller 44. At this time, the operator can easily remove the cleaning roller 44 from the rotating mounting shaft 43 and complete the replacement. This design greatly improves the convenience and efficiency of equipment maintenance.
[0055] See Figures 6 to 9 As shown, the rotating mounting shaft 43 is rotatably mounted in the mounting hole of the sliding base 41. A cross-shaped sleeve shaft 431 is mounted on the top of the rotating mounting shaft 43. The cross-shaped sleeve shaft 431 is provided with multiple water outlet holes 433. The interior of the rotating mounting shaft 43 is provided with a flow cavity. The interior of the flow cavity is provided with a water flow drive blade 434. A water inlet connector 435 is rotatably mounted on the bottom of the rotating mounting shaft 43.
[0056] A cross-shaped fitting shaft 431 is mounted on the top of the rotating mounting shaft 43, which facilitates the positioning and fitting of the cleaning roller 44. When installing the cleaning roller 44, the cleaning roller 44 can be precisely fitted onto the cross-shaped fitting shaft 431, achieving quick and accurate positioning and ensuring the stability of the cleaning roller 44 on the rotating mounting shaft 43.
[0057] The rotating mounting shaft 43 has a flow cavity inside, and a water inlet connector 435 is rotatably mounted at the bottom of the flow cavity. When the water spray system is started, the cleaning fluid enters the flow cavity through the water inlet connector 435. Simultaneously, the cross-shaped mounting shaft 431 has multiple water outlet holes 433, through which the cleaning fluid flows within the flow cavity and exits. The outflowing cleaning fluid permeates the surface of the cleaning rollers 44 mounted on the cross-shaped mounting shaft 431, ensuring the cleaning rollers 44 are fully saturated with the cleaning fluid, providing sufficient cleaning medium for subsequent cleaning operations and effectively improving the cleaning effect.
[0058] Inside the flow cavity, there is a water flow drive blade 434, which is inclined. When the cleaning fluid flows in the flow cavity, it passes through the inclined water flow drive blade 434. Due to the impact of the water flow on the inclined blade, a torque is generated that pushes the rotating mounting shaft 43 to rotate, thereby causing the rotating mounting shaft 43 to rotate. This rotation method utilizes the energy of the cleaning fluid flow to achieve automatic drive of the rotating mounting shaft 43 without the need for an additional power source, reducing the complexity and energy consumption of the equipment.
[0059] When the rotating mounting shaft 43 rotates, it drives the cleaning roller 44 mounted on top to rotate synchronously. During the rotation, the cleaning roller 44 comes into close contact with the mask plate 6 inside the cleaning channel, thereby achieving the cleaning treatment of the mask plate 6.
[0060] See Figure 8 and Figure 9 As shown, a circulating telescopic assembly 436 is also installed on the outside of the rotating mounting shaft 43. The circulating telescopic assembly 436 includes an assembly sleeve 437 sleeved on the outside of the rotating mounting shaft 43. The assembly sleeve 437 is engaged with the mounting hole of the sliding base 41. The inside of the assembly sleeve 437 is provided with an inclined annular groove 4371. The circulating telescopic assembly 436 also includes a movable ball 438 rotatably mounted on the outside of the rotating mounting shaft 43. The movable ball 438 is slidably connected to the inclined annular groove 4371.
[0061] The recirculating telescopic assembly 436 includes an assembly sleeve 437 and a movable ball bearing 438. The assembly sleeve 437 is composed of two semi-annular sleeves assembled together and is fitted onto the outside of the rotating mounting shaft 43. At the same time, the assembly sleeve 437 is locked in place with the mounting hole of the sliding base 41. The locking mechanism prevents the assembly sleeve 437 from rotating within the mounting hole.
[0062] The assembly sleeve 437 has an inclined annular groove 4371 inside. The movable ball 438 is rotatably mounted on the outside of the rotating mounting shaft 43 and is slidably connected to the inclined annular groove 4371. The inclined annular groove 4371 provides a path and guidance for the movement of the movable ball 438.
[0063] When the water spray system is activated, the cleaning fluid flows through the circulation cavity inside the rotating mounting shaft 43, passing through the inclined water flow driving the blades 434. Due to the impact of the water flow on the inclined blades, a torque is generated that pushes the rotating mounting shaft 43 to rotate, causing it to rotate. As the rotating mounting shaft 43 rotates, it drives the movable ball bearings 438 on its outer side to rotate synchronously. During rotation, the movable ball bearings 438 slide along the inclined annular groove 4371 inside the assembly sleeve 437. The inclined annular groove 4371 guides the movable ball bearings 438 to move up and down. During this up-and-down movement, due to their rotational connection with the rotating mounting shaft 43, the movable ball bearings 438 drive the rotating mounting shaft 43 to move synchronously up and down.
[0064] When the rotating mounting shaft 43 moves up and down, it drives the cleaning roller 44 mounted on top to move synchronously. The cleaning roller 44 rotates while moving up and down, creating an irregular friction cleaning trajectory. This cleaning method increases the contact area and contact pattern between the cleaning roller 44 and the mask 6, effectively removing stubborn impurities from the mask 6 and improving the cleaning effect.
[0065] See Figures 6 to 10 As shown, the cleaning roller 44 has an inner bushing 441 inside. The inner bushing 441 has an insertion hole 4411 at the axial position that matches the shape of the cross bushing 431. The inner bushing 441 has several water seepage holes. A flexible cleaning layer 442 is installed on the outer side of the inner bushing 441.
[0066] The cleaning roller 44 has an inner bushing 441 inside, and the inner bushing 441 has an insertion hole 4411 at its axial position that matches the shape of the cross-shaped mounting shaft 431 at the top of the rotating mounting shaft 43. During installation, the cleaning roller 44 is precisely fitted onto the cross-shaped mounting shaft 431 through the insertion hole 4411, achieving quick and accurate positioning, ensuring the stability of the cleaning roller 44 on the rotating mounting shaft 43, and ensuring that the cleaning roller 44 can move synchronously with the rotating mounting shaft 43.
[0067] The rotating mounting shaft 43 has a flow cavity inside, and a water inlet connector 435 is rotatably mounted at the bottom. Inclined water flow drive blades 434 are located within the flow cavity. When the water spray system is activated, the cleaning fluid enters the flow cavity through the water inlet connector 435. The water flow impacts the inclined water flow drive blades 434, causing the rotating mounting shaft 43 to rotate. Simultaneously, the cleaning fluid flows within the flow cavity and exits from multiple water outlets 433 on the cross-shaped bushing shaft 431. After exiting, the cleaning fluid permeates into the flexible cleaning layer 442 through several seepage holes on the inner bushing 441, ensuring the flexible cleaning layer 442 is fully saturated with the cleaning fluid. This provides sufficient cleaning medium for subsequent cleaning operations, effectively improving the cleaning effect.
[0068] When the rotating mounting shaft 43 rotates, it drives the cleaning roller 44 mounted on top of it to rotate synchronously. The flexible cleaning layer 442 on the outer side of the cleaning roller 44 is in close contact with the edge of the mask plate 6 in the cleaning channel. During rotation, the flexible cleaning layer 442 uses the penetrating cleaning fluid to chemically clean the edge of the mask plate 6, and at the same time performs physical cleaning through the friction between itself and the edge of the mask plate 6, removing impurities on the edge of the mask plate 6.
[0069] See Figures 2 to 4 As shown, the limiting mechanism 5 includes a fixed mounting bracket 52 installed on the horizontal screw slide 3. The fixed mounting bracket 52 is slidably connected to multiple limiting push brackets 51. A second spring 53 is installed between the limiting push bracket 51 and the fixed mounting bracket 52. The bottom of the limiting push bracket 51 is provided with an abutting roller 54. The limiting mechanism 5 also includes a trapezoidal guide bracket 55 installed on the movable end of the horizontal screw slide 3.
[0070] In the initial state, the second spring 53 is in a naturally extended state, pushing the limiting pusher 51 to extend in a specified direction, so that the limiting pusher 51 is in the extended position. At this time, the limiting pusher 51 can be used to limit the placement of the mask plate 6, ensuring that the mask plate 6 can be accurately positioned when horizontally placed into the center position inside the moving frame 2. The bottom of the limiting pusher 51 is provided with an abutment roller 54, which is used to contact the guide inclined side 551 of the trapezoidal guide frame 55 and realize relative movement. The trapezoidal guide frame 55 is installed on the movable end of the horizontal screw slide 3 and can move synchronously with the moving cleaning head 4.
[0071] During the cleaning operation of the mask plate 6, the mask cleaning device 1 moves the moving frame 2 to the placement area, and the industrial robot horizontally places the mask plate 6 at the center position inside the moving frame 2. During the horizontal placement of the mask plate 6, multiple limiting pushers 51 are extended to limit and guide the mask plate 6, ensuring that the mask plate 6 is placed in the designated position and that it can accurately contact the moving cleaning head 4 when it descends to the bottom.
[0072] Once the mask plate 6 descends to the designated position, multiple horizontal lead screw slides 3 are simultaneously activated, driving multiple movable cleaning heads 4 to move horizontally in sync, allowing the edges and corners of the mask plate 6 to enter the cleaning channel, thus achieving the positioning of the mask plate 6. Subsequently, the industrial robot resets and detaches from the mask plate 6, and the mask cleaning device 1 drives the movable frame 2 to reset to the cleaning area. In the cleaning area, multiple horizontal lead screw slides 3 drive multiple movable cleaning heads 4 to move synchronously along the edge of the mask plate 6. When the movable cleaning head 4 approaches the limiting pusher 51, because the trapezoidal guide frame 55 moves synchronously with the movable cleaning head 4, the guide inclined edges 551 on both sides of the trapezoidal guide frame 55 will first contact the abutment rollers 54. As the movable cleaning head 4 continues to move, the guide inclined edges 551 will apply a backward force to the abutment rollers 54, guiding the abutment rollers 54 to move backward. When the roller 54 moves, it will cause the limiting pusher 51 to retract and move backward synchronously. The movement of the limiting pusher 51 will compress the second spring 53, putting the second spring 53 into a compressed state. After the limiting pusher 51 retracts and moves, it can avoid the moving cleaning head 4, allowing the moving cleaning head 4 to pass smoothly through the position of the limiting pusher 51 and continue to move along the edge of the mask plate 6 for cleaning.
[0073] After the moving cleaning head 4 passes through the limiting pusher 51, the trapezoidal guide 55 separates from the contact roller 54, and the contact roller 54 is no longer subjected to the force of the trapezoidal guide 55. At this time, the second spring 53, due to its own elastic restoring force, will push the limiting pusher 51 back to its extended position, preparing for the next limiting and guiding of the mask plate 6. Through the above process, the limiting mechanism 5 achieves the function of both restricting the placement position of the mask plate 6 and facilitating the continuous movement of the moving cleaning head 4 along the edge of the mask plate 6 for cleaning, effectively improving cleaning efficiency and accuracy.
[0074] See Figure 2 and Figure 3 As shown, two longitudinal adjustment plates 21 and two transverse adjustment plates 22 are slidably installed inside the movable frame 2. The transverse adjustment plates 22 are located below the longitudinal adjustment plates 21. The two longitudinal adjustment plates 21 are slidably arranged longitudinally. A first bidirectional adjustment screw 23 is installed between the two longitudinal adjustment plates 21 for driving the longitudinal spacing adjustment. The two transverse adjustment plates 22 are slidably arranged transversely. A second bidirectional adjustment screw 24 is installed between the two transverse adjustment plates 22 for driving the transverse spacing adjustment.
[0075] When the longitudinal spacing needs to be adjusted to accommodate mask plates 6 with different longitudinal dimensions, the first bidirectional adjusting screw 23 is driven to rotate. The two longitudinal adjusting plates 21 will move simultaneously in opposite or the same direction along the longitudinal direction, thereby achieving the adjustment of the longitudinal spacing.
[0076] When the lateral spacing needs to be adjusted to accommodate mask plates 6 of different lateral dimensions, the second bidirectional adjusting screw 24 is driven to rotate. The two lateral adjusting plates 22 will move simultaneously in opposite or the same lateral direction to adjust the lateral spacing.
[0077] By adjusting the longitudinal and lateral spacing described above, the positions of multiple horizontal lead screw slides 3 can be effectively adjusted. Changing the position of the horizontal lead screw slides 3 will cause the positions of the moving cleaning head 4 and the limiting mechanism 5 to move accordingly. When the positions of the moving cleaning head 4 and the limiting mechanism 5 are adjusted to match the mask 6, the cleaning operation can be performed. This allows for the adaptation to mask 6 of different sizes, improving the versatility and efficiency of the cleaning device.
[0078] Specific working principle: During the cleaning operation of the mask plate 6, the mask cleaning device 1 moves the moving frame 2 to the placement area. With the help of an industrial robot, the mask plate 6 is horizontally placed at the center of the moving frame 2. During the horizontal placement of the mask plate 6, the limiting pushers 51 on multiple limiting mechanisms 5 act as limiting guides, ensuring that the mask plate 6 is placed in the designated position. The mask plate 6 descends to the bottom and contacts the moving cleaning head 4. After descending to the designated position, multiple horizontal lead screw slides 3 are simultaneously activated, driving multiple moving cleaning heads 4 to move horizontally synchronously. The movement of the moving cleaning heads 4 causes the edges and corners of the mask plate 6 to enter the cleaning channel, achieving the positioning of the mask plate 6. Subsequently, the industrial robot resets and detaches from the mask plate 6, and the mask cleaning device 1 drives the moving frame 2 to reset to the cleaning area. In the cleaning area, multiple horizontal lead screw slides 3 drive multiple moving cleaning heads 4 to move synchronously along the edges of the mask plate 6. When the movable cleaning head 4 moves to the position of the limiting pusher 51, the limiting mechanism 5 adjusts the movement of the limiting pusher 51 to avoid the movable cleaning head 4, ensuring that the movable cleaning head 4 can move continuously along the mask plate 6. Multiple movable cleaning heads 4 simultaneously clean along the four sides of the mask plate 6, effectively improving cleaning efficiency. The movable cleaning heads 4 clean the sides of the mask plate 6 through the cleaning channel, which can effectively prevent impurities from splashing during the cleaning process. At the same time, while multiple movable cleaning heads 4 are cleaning the sides of the mask plate 6, the mask cleaning device 1 simultaneously cleans the upper and lower sides of the mask plate 6, further improving the convenience and efficiency of cleaning.
[0079] The above embodiments only illustrate one or more implementations of the present invention, and their descriptions are relatively specific and detailed, but they should not be construed as limiting the scope of protection of the present invention. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of the present invention, and these all fall within the scope of protection of the present invention. Therefore, the scope of protection of the present invention should be determined by the appended claims.
Claims
1. A high-efficiency cleaning device for mask processing, comprising a synchronous cleaning device installed on a mask cleaning device (1), characterized in that, The synchronous cleaning device includes a movable frame (2), and multiple horizontal screw slides (3) are installed inside the movable frame (2). Each horizontal screw slide (3) is equipped with a movable cleaning head (4). The movable cleaning head (4) is provided with a cleaning channel for cleaning the side of the mask plate (6). The horizontal screw slide (3) is used to drive the movable cleaning head (4) to move horizontally along the side of the mask plate (6). The movable cleaning head (4) is used to clean the side of the mask plate (6). Each horizontal screw slide (3) is also equipped with a limiting mechanism (5). The limiting mechanism (5) is provided with multiple limiting pushers (51) that contact the side of the mask plate (6). The limiting pushers (51) are used to limit the position of the mask plate (6) during cleaning.
2. The high-efficiency cleaning device for mask processing according to claim 1, characterized in that, The movable cleaning head (4) includes a sliding base (41) installed on the movable end of the horizontal screw slide (3). A limiting pressure device (42) is installed above the sliding base (41). The gap between the limiting pressure device (42) and the sliding base (41) forms a cleaning channel. A rotating mounting shaft (43) is also installed between the sliding base (41) and the limiting pressure device (42). The rotating mounting shaft (43) is connected to the water spray system. A cleaning roller (44) is also installed on the rotating mounting shaft (43).
3. The high-efficiency cleaning device for mask processing according to claim 2, characterized in that, The sliding base (41) has multiple support rollers (411) on its support surface, multiple side wall abutment rollers (412) on its side wall, a baffle (413) on its side, a water outlet (4131) below the baffle (413), and mounting holes inside the sliding base (41).
4. The high-efficiency cleaning device for mask processing according to claim 2, characterized in that, The limit press (42) is equipped with a guide post (424) and a lifting adjustment screw (423). The guide post (424) is slidably connected to the sliding base (41), and the lifting adjustment screw (423) is threadedly connected to the sliding base (41). The limit press (42) is provided with a clearance opening (421). The bottom of the limit press (42) is provided with multiple elastic pressing rollers (422) and flexible baffles (425). The top of the limit press (42) is equipped with a detachable roller pressing sleeve (456).
5. The high-efficiency cleaning device for mask processing according to claim 4, characterized in that, The roller pressing sleeve (456) is threadedly connected to the limiting pressing tool (42). The roller pressing sleeve (456) is provided with a lifting slider (4562). A first spring (4561) is installed between the lifting slider (4562) and the roller pressing sleeve (456). A rotating abutment block (4563) is installed at the bottom of the lifting slider (4562).
6. The high-efficiency cleaning device for mask processing according to claim 3, characterized in that, The rotating mounting shaft (43) is rotatably mounted in the mounting hole of the sliding base (41). A cross-shaped sleeve shaft (431) is mounted on the top of the rotating mounting shaft (43). The cross-shaped sleeve shaft (431) is provided with multiple water outlet holes (433). A flow cavity is provided inside the rotating mounting shaft (43). A water flow drive blade (434) is provided inside the flow cavity. A water inlet connector (435) is rotatably mounted on the bottom of the rotating mounting shaft (43).
7. The high-efficiency cleaning device for mask processing according to claim 6, characterized in that, A circulating telescopic assembly (436) is also installed on the outside of the rotating mounting shaft (43). The circulating telescopic assembly (436) includes an assembly sleeve (437) sleeved on the outside of the rotating mounting shaft (43). The assembly sleeve (437) is limited and engaged with the mounting hole of the sliding base (41). The inside of the assembly sleeve (437) is provided with an inclined annular groove (4371). The circulating telescopic assembly (436) also includes a movable ball (438) rotatably installed on the outside of the rotating mounting shaft (43). The movable ball (438) is slidably connected to the inclined annular groove (4371).
8. The high-efficiency cleaning device for mask processing according to claim 6, characterized in that, The cleaning roller (44) has an inner bushing (441) inside. The inner bushing (441) has an insertion hole (4411) at the axial position that matches the shape of the cross bushing (431). The inner bushing (441) has several water seepage holes. A flexible cleaning layer (442) is installed on the outer side of the inner bushing (441).
9. The high-efficiency cleaning device for mask processing according to claim 1, characterized in that, The limiting mechanism (5) includes a fixed mounting bracket (52) installed on the horizontal screw slide (3). The fixed mounting bracket (52) is slidably connected to multiple limiting push brackets (51). A second spring (53) is installed between the limiting push bracket (51) and the fixed mounting bracket (52). The bottom of the limiting push bracket (51) is provided with an abutting roller (54). The limiting mechanism (5) also includes a trapezoidal guide bracket (55) installed at the movable end of the horizontal screw slide (3).
10. The high-efficiency cleaning device for mask processing according to claim 1, characterized in that, The movable frame (2) has two longitudinal adjustment plates (21) and two transverse adjustment plates (22) slidably installed inside. The transverse adjustment plates (22) are located below the longitudinal adjustment plates (21). The two longitudinal adjustment plates (21) are slidably installed along the longitudinal direction. A first bidirectional adjustment screw (23) is installed between the two longitudinal adjustment plates (21) to drive the longitudinal spacing adjustment. The two transverse adjustment plates (22) are slidably installed along the transverse direction. A second bidirectional adjustment screw (24) is installed between the two transverse adjustment plates (22) to drive the transverse spacing adjustment.
Citation Information
Patent Citations
Mask plate side edge cleaning device
CN115722467A
Cited By
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