Drainage equipment for semiconductor material production

By designing drainage equipment for semiconductor material production, and utilizing sand removal plates and dust removal plates to filter abrasive and dust particles in wastewater, the problem of water waste and pollution caused by direct discharge of wastewater is solved, and the recycling of wastewater is realized.

CN120985527AInactive Publication Date: 2025-11-21HIPPO (CHUZHOU) MATERIAL TECH CO LTD
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Patent Information

Application Number
CN202511036583.8
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-07-28
Publication Date
2025-11-21
Estimated Expiration
Not applicable · inactive patent

AI Technical Summary

Technical Problem

In the existing technology, the wastewater generated during the grinding of semiconductor materials is directly discharged, resulting in water waste and pollution, and the filtered water contains dust that cannot be effectively treated.

Method used

A drainage device for semiconductor material production was designed, including a processing box, a drainage area, a water storage area, a sand removal plate, and a dust removal plate. The combined structure of the sand removal plate and the dust removal plate filters the abrasive and dust in the wastewater, and the wastewater is reused through a circulation component.

Benefits of technology

It enables effective filtration and recycling of wastewater, avoids waste and pollution of water resources, and improves the efficiency of water resource utilization.

✦ Generated by Eureka AI based on patent content.

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Abstract

The invention is applicable to the technical field of semiconductor production equipment, and provides drainage equipment for semiconductor material production, which comprises a processing box, a processing area is arranged at the top of the processing box, a plurality of second water through holes are formed in the bottom of the processing area, and a drainage area and a water storage area are sequentially arranged below the processing area from top to bottom. A sand removing plate and a dust removing plate are fixedly connected to the inner wall of the drainage area in an inclined mode from top to bottom, a plurality of sand reserving grooves are formed in the top of the sand removing plate, a plurality of dust removing assemblies are slidably installed at the top of the dust removing plate, and the water storage area is connected with a circulating assembly; sewage generated by washing in the processing area enters the drainage area through the second water through holes and falls onto the desanding plate, in the process that the sewage flows on the desanding plate, frosted sand is gradually retained in the sand retaining grooves, the sewage without the frosted sand falls onto the dust removal plate, dust in the water is intercepted and removed when the sewage passes through the sponge on the sliding plate, and the dust removal effect is improved. The filtered water flows into the water storage area to be stored, so that the water can be repeatedly utilized through the circulating assembly.
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Description

TECHNICAL FIELD

[0001] The application belongs to the technical field of semiconductor production equipment, and particularly relates to a drainage equipment for semiconductor material production. BACKGROUND

[0002] Semiconductor material is a kind of electronic material with semiconductor performance (the electric conductivity is between that of a conductor and an insulator, and the resistivity is about 1 mΩ·cm-1 GΩ·cm), which can be used to make semiconductor devices and integrated circuits. The semiconductor material needs to be ground during processing, and high temperature is generated in the process of grinding. Therefore, a cooling device is needed to cool the semiconductor material during grinding to avoid cracking of the semiconductor material during grinding.

[0003] The utility model with publication number CN216991392U discloses a special grinding machine for semiconductor new material processing, which comprises a rack and a grinding hopper installed on the rack. A grinding turntable is rotatably installed in the grinding hopper. A driving assembly is used to drive the rotation of the grinding turntable. A protective plate is fixedly connected to the top of the grinding hopper. A cooling water pipe is fixedly connected to the protective plate. A spray head is connected to one end of the cooling water pipe, which faces the grinding turntable. The grinding machine also comprises a water tank with an open top. A filter screen is fixedly connected to the water tank. The filter screen divides the water tank into a sedimentation chamber and a drainage chamber. A water inlet pipe and a water outlet pipe are fixedly connected to the water tank. The water inlet pipe is in communication with the sedimentation chamber, and the water outlet pipe is in communication with the drainage chamber. The sprayed cold water can cool the semiconductor workpiece during grinding, preventing the semiconductor workpiece from cracking due to high temperature during grinding.

[0004] However, the above-mentioned utility model still has some shortcomings:

[0005] 1. In the process of using the above-mentioned utility model, the cooling water pipe flushes the grinding sand material that falls with the water flow from the semiconductor workpiece. The grinding sand material flows out from the discharge pipe, passes through the water guide pipe, the water inlet pipe, and finally flows into the sedimentation chamber of the water tank. The grinding sand material is filtered and left in the sedimentation chamber by the filter screen. The water flow enters the drainage chamber and is discharged from the water outlet pipe. In this process, the filtered water flow is directly discharged, which causes waste of water resources.

[0006] 2. During the grinding process of semiconductor material, not only sand material but also some fine dust is generated. The sand material can be filtered and left in the sedimentation chamber by the filter screen with small holes, while the dust is mixed in the water flow and cannot be filtered by the filter screen. This leads to pollution of water resources caused by direct discharge of waste water. SUMMARY

[0007] The application provides a drainage equipment for semiconductor material production, and aims to solve the problem that the sewage generated during flushing is directly discharged, which not only causes waste of water resources but also pollutes the water resources.

[0008] The application is implemented as follows: a drainage equipment for semiconductor material production, comprising a processing box, a processing area is arranged on the top of the processing box, a plurality of water passing holes two are arranged on the bottom of the processing area, a drainage area and a water storage area are sequentially arranged below the processing area from top to bottom, a desanding plate and a dust removal plate are fixedly connected on the inner wall of the drainage area from top to bottom, a plurality of sand retaining grooves are arranged on the top of the desanding plate, a plurality of dust removal assemblies are slidably installed on the top of the dust removal plate, and the water storage area is connected with a circulating assembly; in this scheme, the sewage after flushing in the processing area falls on the desanding plate through the water passing holes two, the abrasive sand in the sewage is removed through the sand retaining grooves, the dust in the sewage is filtered and intercepted through the dust removal assemblies, and the filtered sewage is repeatedly used through the circulating assembly.

[0009] Preferably, a plurality of through holes one are arranged on the front and rear walls of the processing box, the through holes one are arranged at positions corresponding to the sand retaining grooves, a front plugging assembly is arranged at the front through holes one, and a rear plugging assembly is arranged at the rear through holes one; in this scheme, the front and rear plugging assemblies respectively close the channels of the through holes one on the front and rear walls of the processing box, so as to avoid leakage during sewage treatment.

[0010] Preferably, the front plugging assembly comprises a U-shaped shaft one, the U-shaped shaft one is fixedly connected to the front outer wall of the processing box, a torsional spring is sleeved on the side wall of the U-shaped shaft one, the abutting end of the torsional spring is fixedly connected to the front outer wall of the processing box through a connecting plate one, the movable end of the torsional spring is fixedly connected with a plugging plate one through a connecting plate two, the plugging plate one is tightly attached to the through hole one on the front wall, and a handle one is fixedly connected to the outer wall of the plugging plate one; in this scheme, pulling the handle one outward can drive the plugging plate one to rotate around the U-shaped shaft one to open the channel of the through hole one on the front wall of the processing box.

[0011] Preferably, the rear plugging assembly comprises a U-shaped shaft two, the U-shaped shaft two is fixedly connected to the rear wall of the processing box, a sleeve ring is sleeved on the side wall of the U-shaped shaft two, and a plugging plate three is fixedly connected to the side wall of the sleeve ring.

[0012] Preferably, the rear blocking assembly further comprises a control motor fixedly installed on the rear wall of the processing box, and the output shaft end of the control motor is connected with a rotating rod, the rotating rod is connected with a rotating base through a U-shaped rod, and the side wall of the U-shaped rod is fixedly connected with the outer side wall of the third blocking plate; the axis lines of the rotating rod, the U-shaped shaft and the rotating base coincide; in this scheme, the control motor controls the rotating rod to drive the U-shaped rod to rotate around the axis of the U-shaped shaft, thereby driving the third blocking plate to rotate, so as to open the channel of the through hole one on the rear wall.

[0013] Preferably, a sand guide plate is arranged below the third blocking plate, the sand guide plate is fixedly connected to the rear wall of the processing box in an inclined manner, a sand storage tank is arranged below the sand guide plate, a sand blocking plate is fixedly connected to the top of the sand storage tank, and the sand blocking plate and the outlet of the sand guide plate are opposite to each other.

[0014] Preferably, the dust removal assembly comprises a sliding plate, a plurality of through holes two are formed in the front wall of the processing box, a plurality of sliding grooves are formed in the top of the dust removal plate, the positions of the sliding grooves correspond to the through holes two, the sliding plate is inserted into the through holes two and is slidingly installed in the sliding grooves; a plurality of water through holes one are formed in the side wall of the sliding plate, sponges are attached to the left and right side walls of the sliding plate, a second blocking plate is fixedly connected to the outer side wall of the sliding plate, a handle two is fixedly connected to the outer side wall of the second blocking plate, and the second blocking plate is screwed to the front wall of the processing box through a fixing plate, so that the second blocking plate is tightly attached to the through holes two; in this scheme, the handle two is pulled outward to drive the second blocking plate and the sliding plate to move outward, so that the sponges on the sliding plate can be cleaned and replaced.

[0015] Preferably, the circulating assembly comprises a water pump, the water inlet end of the water pump is connected with the water storage area through a water inlet pipe, and the water outlet end of the water pump is connected with a spray head through an elastic pipe.

[0016] Compared with the prior art, the present application has the following advantages:

[0017] 1. The sewage generated by the flushing in the processing area enters the drainage area through the water through holes two and falls on the sand removal plate. In the process of flowing on the sand removal plate, the sand is gradually deposited in the sand storage grooves. After the sewage is removed from the sand, the sewage falls on the dust removal plate, and the dust in the water is intercepted and removed by the sponges on the sliding plate. The filtered water flows into the water storage area for storage, so as to be repeatedly used through the circulating assembly 8, so that the sewage can be filtered and water resources can be saved.

[0018] 2. Control the motor to drive the rotating rod to drive the U-shaped rod 76 to drive each sealing plate three to rotate, and simultaneously open all the through holes one on the rear wall of the processing box. The operator gradually pulls the front sealing assembly to open the through holes one on the front wall of the processing box. The sand in the sand retention tank can be cleaned by cleaning rod or water gun. Attached Figure Description

[0019] Figure 1 This is a front view schematic diagram of the present invention;

[0020] Figure 2 This is a front cross-sectional view of the present invention;

[0021] Figure 3 In this invention Figure 1 Enlarged view of point A;

[0022] Figure 4 In this invention Figure 1 Enlarged view of point B;

[0023] Figure 5 In this invention Figure 2 Enlarged view of point C;

[0024] Figure 6 This is a rear view (partial cross-section) of the present invention;

[0025] In the picture:

[0026] 1. Processing box; 2. Processing area; 3. Drainage area; 4. Water storage area;

[0027] 5. Front sealing assembly; 51. U-shaped shaft one; 52. Torsion spring; 53. Connecting plate one; 54. Connecting plate two; 55. Sealing plate one; 56. Handle one;

[0028] 6. Dust removal components; 61. Sliding plate; 62. Water passage hole one; 63. Sponge; 64. Slide groove; 65. Sealing plate two; 66. Handle two; 67. Fixing plate;

[0029] 7. Rear sealing assembly; 71. Collar; 72. U-shaped shaft II; 73. Sealing plate III; 74. Control motor; 75. Rotating rod; 76. U-shaped rod; 77. Rotating base;

[0030] 8. Circulation assembly; 81. Water pump; 82. Water pipe; 83. Expansion pipe; 84. Sprinkler head;

[0031] 9. Sand removal plate; 10. Sand retention trough; 11. Dust removal plate; 12. Filter screen; 13. Through hole one; 14. Through hole two; 15. Sand guide plate; 16. Sand storage tank; 17. Sand baffle plate; 18. Water inlet; 19. Water passage hole two; 20. Sealing door. Detailed Implementation

[0032] The technical solutions of the present application will be described clearly and completely below in conjunction with the drawings. Obviously, the described embodiments are part of the embodiments of the present application, rather than all the embodiments.

[0033] The components of the embodiments of the present application generally described and shown in the drawings herein can be arranged and designed in various different configurations. Therefore, the following detailed description of the embodiments of the present application provided in the drawings is not intended to limit the scope of the claimed application, but merely represents selected embodiments of the application.

[0034] Based on the embodiments in the present application, all other embodiments obtained by those of ordinary skill in the art without creative labor fall within the scope of protection of the present application.

[0035] In the description of the present application, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", and the like indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present application and simplifying the description, and therefore cannot be understood as indicating or implying that the indicated device or element must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as limiting the present application. In addition, the terms "first", "second", "third" are only for descriptive purposes and cannot be understood as indicating or implying relative importance.

[0036] In the description of the present application, it should be noted that unless otherwise explicitly specified and limited, the terms "mounting", "connection", "connection" should be understood broadly, for example, it can be fixedly connected, or it can be detachably connected, or integrally connected; it can be mechanically connected, or it can be electrically connected; it can be directly connected, or it can be indirectly connected through an intermediate medium; it can be the communication inside two elements. For those of ordinary skill in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.

[0037] Please refer to Figures 1-6 The present application provides a technical solution: a drainage equipment for semiconductor material production, comprising a processing box 1, the top of the processing box 1 is provided with a processing area 2, a plurality of water holes 2 19 are opened at the bottom of the processing area 2, a drainage area 3 and a water storage area 4 are sequentially arranged from top to bottom below the processing area 2, a desanding plate 9 and a dust removal plate 11 are obliquely and fixedly connected on the inner wall of the drainage area 3 from top to bottom, a plurality of sand retaining grooves 10 are opened at the top of the desanding plate 9, a plurality of dust removal assemblies 6 are slidingly installed at the top of the dust removal plate 11, and the water storage area 4 is connected with a circulating assembly 8.

[0038] As Figure 2As shown, the sand removing plate 9 and the dust removing plate 11 are fixedly connected to the inner wall of the processing box 1 in an inclined manner, and the inclined directions of the sand removing plate 9 and the dust removing plate 11 are opposite; the sewage with sand is first dropped on the sand removing plate 9 through the water hole 2, and then flows to the dust removing plate 11;

[0039] The operator grinds the semiconductor material in the processing area 2, and the generated sand and dust are washed away by the circulating assembly 8 during the grinding process. The washed sewage enters the drainage area 3 through the water hole 2, and the sand in the sewage flows on the sand removing plate 9 and is left in the sand retaining groove 10. The remaining sewage flows to the dust removing plate 11, and the dust in the sewage is adsorbed by the dust removing assembly 6. After the dust is removed, the water flows into the water storage area 4 for storage for secondary use.

[0040] Further, the front and rear walls of the processing box 1 are provided with a plurality of through holes 1, and the through holes 1 are arranged corresponding to the sand retaining groove 10. The front through hole 1 is provided with a front plugging assembly 5, and the rear through hole 1 is provided with a rear plugging assembly 7.

[0041] Specifically, the sand left in the sand retaining groove 10 can be cleaned through the through holes 1 in the front and rear walls of the processing box 1. The front plugging assembly 5 and the rear plugging assembly 7 plug the through holes 1 in the front and rear walls of the processing box 1 to prevent the sewage from flowing out of the through holes 1.

[0042] Further, the front plugging assembly 5 comprises a U-shaped shaft 1, which is fixedly connected to the front outer wall of the processing box 1. A torsional spring 52 is sleeved on the side wall of the U-shaped shaft 1. The abutting end of the torsional spring 52 is fixedly connected to the front outer wall of the processing box 1 through a connecting plate 1. The movable end of the torsional spring 52 is fixedly connected to a plugging plate 1 through a connecting plate 2. The plugging plate 1 is tightly attached to the through hole 1 in the front wall, and a handle 1 is fixedly connected to the outer wall of the plugging plate 1.

[0043] As shown in the figure, Figure 3 The front and rear walls of the connecting plate 1 are fixedly connected to the abutting end of the torsional spring 52 and the front wall of the processing box 1, respectively. The front and rear walls of the connecting plate 2 are fixedly connected to the movable end of the torsional spring 52 and the front wall of the plugging plate 1, respectively. The abutting end of the torsional spring 52 is a elastic fulcrum. When the handle 1 is pulled to pull the plugging plate 1 outward around the U-shaped shaft 1, the connecting plate 2 drives the movable end of the torsional spring 52 to rotate synchronously, so that the plugging plate 1 extrudes the abutting end of the torsional spring 52, thereby opening the channel of the through hole 1 in the front wall of the processing box 1. When the handle 1 is released, the elastic force of the torsional spring 52 makes the plugging plate 1 return to the original position and tightly attach to the front wall of the processing box 1. The inner wall of all the plugging plates is bonded with a sealing rubber ring, which can prevent the leakage of sewage.

[0044] Further, the rear blocking assembly 7 comprises a U-shaped shaft two 72 fixedly connected to the rear wall of the processing box 1, and a sleeve ring 71 is sleeved on the side wall of the U-shaped shaft two 72, and a blocking plate three 73 is fixedly connected to the side wall of the sleeve ring 71.

[0045] Further, the rear blocking assembly 7 further comprises a control motor 74 fixedly installed on the rear wall of the processing box 1, and the output shaft end of the control motor 74 is connected with a rotating rod 75, the rotating rod 75 is connected to a rotating base 77 through a U-shaped rod 76, and the side wall of the U-shaped rod 76 and the outer side wall of the blocking plate three 73 are fixedly connected; the axis lines of the rotating rod 75, the U-shaped shaft two 72 and the rotating base 77 coincide.

[0046] As shown in Figure 6 the two ends of the U-shaped rod 76 are fixedly connected to the side wall of the rotating rod 75 and rotatably connected to the rotating base 77 respectively, and the rotating base 77 is fixedly connected to the rear wall of the processing box 1; the blocking plate three 73 can rotate around the U-shaped shaft two 72 through the sleeve ring 71 to open or close the passages of the through holes one 13 on the rear wall of the processing box 1;

[0047] The control motor 74 drives the rotating rod 75 to drive the U-shaped rod 76 to drive each blocking plate three 73 to rotate around the axis line of the U-shaped shaft two 72, so as to synchronously open the passages of all the through holes one 13 on the rear wall of the processing box 1, facilitating the operator to clean each sand retaining groove 10 by opening the front blocking assembly 5 one by one.

[0048] Further, a sand guide plate 15 is arranged below the blocking plate three 73, the sand guide plate 15 is fixedly inclined to the rear wall of the processing box 1, and a sand storage tank 16 is arranged below the sand guide plate 15, the top of the sand storage tank 16 is fixedly connected with a sand blocking plate 17, and the outlet of the sand guide plate 15 is opposite to the sand blocking plate 17.

[0049] Specifically, the sand guide plate 15 is fixedly inclined to below the through hole one 13 on the rear wall of the processing box 1, when the passages of the through holes one 13 on the rear wall are opened, the operator opens the front blocking assembly 5 one by one, inserts a cleaning rod into the sand retaining groove 10 or directly flushes through a water gun, and the abrasive in the sand retaining groove 10 can be directly cleaned into the sand guide plate 15, the abrasive is guided by the sand guide plate 15 and enters the sand storage tank 16, facilitating recycling.

[0050] Further, the dust removal assembly 6 comprises a sliding plate 61, a plurality of through holes two 14 are formed in the front wall of the processing box 1, a plurality of sliding grooves 64 are formed in the top of the dust removal plate 11, the positions of the sliding grooves 64 correspond to the through holes two 14, and the sliding plate 61 is inserted into the through holes two 14 and slidingly installed in the sliding grooves 64;

[0051] The side wall of the sliding plate 61 is provided with a plurality of water holes 62, and the left and right side walls of the sliding plate 61 are both attached with sponges 63. The outer side wall of the sliding plate 61 is fixedly connected with a blocking plate 2 65, and the outer side wall of the blocking plate 2 65 is fixedly connected with a handle 2 66. The blocking plate 2 65 is screwed to the front wall of the processing box 1 through a fixed plate 67 so as to tightly attach the blocking plate 2 65 to the water hole 2 14.

[0052] As shown in the drawings, the sponge 63 can intercept dust in the sewage. The filtered water flows to the next sliding plate 61 through the water hole 2 14 for the next step of dust filtration. The blocking plate 2 65 can be pulled outward through the handle 2 66 to pull out the sliding plate 61 as a whole from the processing box 1, so as to facilitate cleaning or replacement of the sponge 63. In addition, whether the sponge 63 on the most downstream sliding plate 61 needs to be cleaned can be inferred by observing whether dust accumulates too much on the surface of the sponge 63. Figure 5

[0053] The fixed plate 67 can be fixed to the front wall of the processing box 1 through bolts, so as to press all the blocking plates 2 65 and make them tightly attached to the water hole 2 14, so as to close the channel of the water hole 2 14 and avoid leakage of the sewage.

[0054] Further, the circulating assembly 8 comprises a water pump 81. The water inlet end of the water pump 81 is connected with the water storage area 4 through a water pipe 82. The water outlet end of the water pump 81 is connected with a spray head 84 through an extension pipe 83.

[0055] As shown in the drawings, the inner wall of the water storage area 4 is provided with a filter screen 12 to avoid abrasive entering the water storage area 4. The side wall of the water storage area 4 is connected with a water inlet 18 to add clean water to the water storage area 4. In addition, a sealing door 20 can be arranged on the front wall of the processing box 1 at the position of the water storage area 4 to clean the water storage area 4. Figure 1 Figure 2 The water pump 81 can draw the water in the water storage area 4 into the extension pipe 83 through the water pipe 82, and can wash the processing area 2 through the spray head 84. The spray head 84 is hung on the side wall of the processing box 1. The filtered water enters the water storage area 4 for storage, and can be repeatedly used by the circulating assembly 8 to avoid pollution and waste of water resources.

[0056] The working principle and use process of the present application are as follows: after the present application is installed, the operator performs grinding operation on the photoelectric material at the processing area 2. During the process, the processing area 2 can be washed through the spray head 84 to clean the abrasive and dust during the grinding process, so as to ensure the cleanliness of the processing area 2.

[0057]

[0058] ​​​The rinsed sewage enters the drainage area 3 through the water hole 2 19, falls on the sand removal plate 9, and flows on the sand removal plate 9, during which the sand is gradually deposited in the sand depositing groove 10, and the sewage after removing the sand falls on the dust removal plate 11, and when passing through the sponge 63 on the sliding plate 61, the dust in the water is intercepted and removed, and the filtered water flows into the water storage area 4 for storage, so as to be repeatedly used through the circulating assembly 8, saving water resources;

[0059] When it is necessary to clean the sand in the sand depositing groove 10, the control motor 74 drives the rotating rod 75 to drive the U-shaped rod 76 to drive each blocking plate three 73 to rotate around the axis of the U-shaped shaft two 72 as the rotating shaft, thereby synchronously opening the channels of all the through holes one 13 on the rear wall of the processing box 1;

[0060] When the operator pulls the handle one 56 on each front blocking assembly 5 outward along the U-shaped shaft one 51 as the axis, the connecting plate two 54 drives the movable end of the torsional spring 52 to synchronously rotate, so that the blocking plate one 55 extrudes the abutting end of the torsional spring 52, thereby opening the channels of the through holes one 13 on the front wall of the processing box 1, at this time, the sand in the sand depositing groove 10 can be cleaned into the sand guide plate 15 through the cleaning rod or the water gun, and in this way, the sand in all the sand depositing grooves 10 can be cleaned.

[0061] When it is necessary to clean the sponge 63 on the sliding plate 61, the fixed plate 67 fixed on the front wall of the processing box 1 through the bolts is first removed, the blocking plate two 65 drives the sliding plate 61 to pull out the through hole two 14 by pulling the handle two 66 outward, so as to clean the sponge 63.

[0062] The above only describes the preferred embodiments of the present application, and is not used to limit the present application, and any modification, equivalent replacement and improvement within the spirit and principle of the present application should be included in the protection scope of the present application.

Claims

1. A drainage device for semiconductor material production, comprising a processing box (1), wherein a processing area (2) is provided on the top of the processing box (1), and a plurality of water passage holes (19) are provided on the bottom of the processing area (2), characterized in that: Below the processing area (2), a drainage area (3) and a water storage area (4) are arranged sequentially from top to bottom. On the inner wall of the drainage area (3), a sand removal plate (9) and a dust removal plate (11) are fixedly attached from top to bottom. The top of the sand removal plate (9) is provided with several sand retention grooves (10). The top of the dust removal plate (11) is slidably installed with several dust removal components (6). The water storage area (4) is connected to a circulation component (8). The front and rear walls of the processing box (1) are provided with several through holes (13). The opening position of the through holes (13) corresponds to the sand retention groove (10). A front sealing component (5) is provided at the front through hole (13), and a rear sealing component (7) is provided at the rear through hole (13).

2. The drainage device for semiconductor material production as described in claim 1, characterized in that: The front sealing assembly (5) includes a U-shaped shaft (51), which is fixedly connected to the front outer wall of the processing box (1). A torsion spring (52) is sleeved on the side wall of the U-shaped shaft (51). The contact end of the torsion spring (52) is fixedly connected to the front outer wall of the processing box (1) through a connecting plate (53). The movable end of the torsion spring (52) is fixedly connected to a sealing plate (55) through a connecting plate (54). The sealing plate (55) is in close contact with the through hole (13) on the front wall, and a handle (56) is fixedly connected to the outer wall of the sealing plate (55).

3. The drainage device for semiconductor material production as described in claim 1, characterized in that: The rear sealing assembly (7) includes a second U-shaped shaft (72), which is fixedly connected to the rear wall of the processing box (1). A collar (71) is sleeved on the side wall of the second U-shaped shaft (72), and a sealing plate (73) is fixedly connected to the side wall of the collar (71).

4. The drainage device for semiconductor material production as described in claim 3, characterized in that: The rear sealing assembly (7) also includes a control motor (74), which is fixedly installed on the rear wall of the processing box (1), and the output shaft end of the control motor (74) is connected to a rotating rod (75). The rotating rod (75) is connected to the rotating base (77) through a U-shaped rod (76), and the side wall of the U-shaped rod (76) is fixedly connected to the outer side wall of the sealing plate (73). The centerlines of the rotating rod (75), the U-shaped shaft (72), and the rotating base (77) coincide.

5. A drainage device for semiconductor material production as described in claim 3, characterized in that: A sand guide plate (15) is provided below the sealing plate three (73). The sand guide plate (15) is obliquely fixed to the rear wall of the processing box (1). A sand storage tank (16) is provided below the sand guide plate (15). A sand baffle plate (17) is fixedly connected to the top of the sand storage tank (16). The outlets of the sand baffle plate (17) and the sand guide plate (15) are opposite to each other.

6. The drainage device for semiconductor material production as described in claim 1, characterized in that: The dust removal assembly (6) includes a sliding plate (61). The front wall of the processing box (1) is provided with several through holes (14). The top of the dust removal plate (11) is provided with several sliding grooves (64). The position of the sliding grooves (64) corresponds to the through holes (14). The sliding plate (61) is inserted into the through holes (14) and slidably installed in the sliding grooves (64). The sliding plate (61) has several water passage holes (62) on its side wall, and sponges (63) are glued to both the left and right side walls of the sliding plate (61). A sealing plate (65) is fixedly connected to the outer side wall of the sliding plate (61), and a handle (66) is fixedly connected to the outer side wall of the sealing plate (65). The sealing plate (65) is screwed to the front wall of the processing box (1) by a fixing plate (67) to tightly adhere the sealing plate (65) to the through hole (14).

7. A drainage device for semiconductor material production as described in claim 1, characterized in that: The circulation component (8) includes a water pump (81), the water inlet of the water pump (81) is connected to the water storage area (4) through a water pipe (82), and the water outlet of the water pump (81) is connected to a spray head (84) through a telescopic pipe (83).

Citation Information

Patent Citations

  • Special grinding machine for processing new semiconductor material

    CN216991392U