Silver-doped anti-reflection film, assembly and device

Abstract

The invention discloses a silver-doped anti-reflection film, a component and a device, the silver-doped anti-reflection film comprises a base material, an HC layer, a silver plating layer, a low-folding layer and an AF layer which are arranged in sequence, a target material of the silver plating layer is a pure silver target material or a silver alloy target material, the silver alloy target material is a first metal with the total doping amount of 0.5-5 wt% in silver, and the first metal is selected from nickel, copper, cobalt, tin, palladium, chromium and titanium. By optimizing the film layer structure, compared with an existing dry-method AR product, the performance is close, meanwhile, the production efficiency is improved to three times, and the production cost is greatly reduced; compared with an existing wet-process LR product, the performance is comprehensively superior to that of the wet-process LR product. Meanwhile, a better antibacterial effect is achieved, and the product is superior to existing dry-process AR and wet-process LR products.

Description

Technical Field

[0001] This invention belongs to the field of optical film technology, specifically relating to a silver-doped antireflective film, component, and device. Background Technology

[0002] There are currently two main types of antireflective coatings (AR) based on their fabrication processes: dry AR films and dry AR films. Dry AR films are fabricated using magnetron sputtering. Currently, considering cost and efficiency, the optimal structure is a four-layer optical structure with a total film thickness of approximately 260 nm. As is well known, magnetron sputtering is a type of vacuum deposition, and maintaining a high vacuum requires significant equipment and high energy consumption (water, electricity, and gas). Furthermore, magnetron sputtering has relatively low efficiency, with a single target sputtering efficiency of around 20 nm / (m / min). Therefore, the production cost of dry AR films remains consistently high.

[0003] Another type of antireflective coating is the wet-process LR film, which is mainly prepared by coating. The production efficiency of wet-process films is very high; the thickness is approximately 100 nm with an IM layer structure and approximately 200 nm without an IM layer structure, with a coating efficiency exceeding 1500 nm / (m / min). A comparison between dry-process AR films and wet-process LR films is as follows: the main advantage of dry-process AR films is performance, while the main advantages of wet-process LR films are production efficiency and low cost.

[0004] Therefore, in order to address the above-mentioned technical problems, it is necessary to provide a silver-doped antireflective film, component, and device.

[0005] The information disclosed in this background section is intended only to enhance the understanding of the overall background of the invention and should not be construed as an admission or in any way implying that the information constitutes prior art known to those skilled in the art. Summary of the Invention

[0006] The purpose of this invention is to provide a silver-doped antireflective film, component, and device.

[0007] To achieve the above objectives, a specific embodiment of the present invention provides the following technical solution:

[0008] The silver-doped antireflective film comprises, in sequence, a substrate, an HC layer, a silver plating layer, a low-refractive index layer, and an AF layer. The target material for the silver plating layer is a pure silver target or a silver alloy target, wherein the silver alloy target is a first metal doped with silver in a total amount of 0.5-5 wt%, and the first metal is selected from nickel, copper, cobalt, tin, palladium, chromium, and titanium. Preferably, a close-fitting layer is also formed between the HC layer and the silver plating layer.

[0009] In one or more embodiments of the present invention, the thickness of the silver plating layer is 2-5 nm.

[0010] In one or more embodiments of the present invention, the coating conditions for the silver plating layer are: background vacuum < 10 -4Pa, 50~300 sccm Ar is introduced, and the vacuum degree after the gas is introduced is 0.05~0.4 Pa.

[0011] In one or more embodiments of the present invention, a protective layer is further formed on at least one side of the silver plating layer, the protective layer being selected from: a nickel layer, a nickel-chromium alloy layer, a tin layer, a zinc-tin alloy layer, a silicon nitride layer, and a silicon-aluminum alloy layer.

[0012] In one or more embodiments of the present invention, when the target material of the silver plating layer is a pure silver target material, a protective layer is formed on both sides of the silver plating layer.

[0013] In one or more embodiments of the present invention, the thickness of the protective layer is 2-5 nm.

[0014] In one or more embodiments of the present invention, the target material for the low-folding layer is selected from: MgF2, SiO2, Al2O3.

[0015] In one or more embodiments of the present invention, when the target material of the low-folding layer is SiO2, trace elements are also added to the target material, and the addition of trace elements is 0.5% to 10% Al or 1% to 30% N.

[0016] In one or more embodiments of the present invention, the display component includes a light-transmitting carrier and a silver-doped antireflective film formed on the light-transmitting carrier.

[0017] In one or more embodiments of the present invention, a device with a display function includes a main body equipped with a display component to realize the function of information display. Examples include vehicles, consumer electronic devices such as mobile phones and home appliances, and commercial displays.

[0018] Compared with existing technologies, the silver-doped antireflective film, components, and apparatus of the present invention, through optimized film structure, achieve performance close to that of existing dry-process AR products, while increasing production efficiency by 3 times and significantly reducing production costs; compared with existing wet-process LR products, its performance is comprehensively superior to that of wet-process LR products. It also exhibits better antibacterial effects than existing dry-process AR and wet-process LR products. Attached Figure Description

[0019] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments recorded in the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0020] Figure 1The diagram below shows the structure of a silver-doped antireflective film in one embodiment of the present invention, wherein: 1. Substrate; 2. HC or AG layer; 3. Adhesive layer; 4.1. Bottom protective layer; 4. Silver plating layer; 4.2. Top protective layer; 5. Low-reflection layer; 6. AF layer;

[0021] Figure 2 This is a comparison diagram of the reflection curves of the silver-doped antireflection film in some embodiments of the present invention;

[0022] Figure 3 This is a comparison diagram of the reflection curves of the silver-doped antireflection film in some embodiments of the present invention. Detailed Implementation

[0023] To enable those skilled in the art to better understand the technical solutions of this invention, the technical solutions of this invention will be clearly and completely described below in conjunction with the embodiments of this invention. Obviously, the described embodiments are only some embodiments of this invention, and not all embodiments. Based on the embodiments of this invention, all other embodiments obtained by those skilled in the art without creative effort should fall within the scope of protection of this invention.

[0024] like Figure 1 As shown, the silver-doped antireflective film in one embodiment of the present invention may include the following structural components:

[0025] substrate

[0026] The substrate includes film materials such as PET (polyethylene terephthalate), SRF (super-refractive polyester film PET), TAC (triacetyl cellulose), PI (polyimide), CPI (colorless polyimide), COP (cycloolefin polymer), PMMA (polymethyl methacrylate), PE (polyethylene), PC (polycarbonate), PP (polypropylene), PA (polyamide), and TPU (thermoplastic polyurethane elastomer). It can also be a composite film of two or more polymers, such as PET+TPU composite film, PC+PMMA composite film, etc. The preferred main film material varies depending on the application scenario. For example, for products used in conventional mobile phones and tablets, PET, SRF, COP, and PET+TPU composite film materials are preferred, with a thickness typically ranging from 10 to 250 μm, preferably 40 to 150 μm. For foldable screen phones, PET and CPI materials are preferred, with a thickness typically ranging from 10 to 100 μm, preferably 20 to 60 μm. If applied to automotive screens where a certain requirement for rainbow patterns is needed, TAC, SRF, and COP materials are preferred, typically with a thickness of 20–150 μm, preferably 30–90 μm.

[0027] Hardening layer

[0028] —The hard coating (HC) is a coating that enhances the hardness of the film material, providing wear resistance and scratch resistance. It is prepared on the substrate through a coating process. Precision coating methods such as gravure coating, comma roller coating, and slot-die coating can be used, with gravure coating and slot-die coating being preferred due to their high coating precision and uniformity.

[0029] The raw materials for the hardened layer can consist of acrylate monomers, crosslinking agents, polymerization inhibitors, plasticizers, etc. Among these, acrylate monomers, such as methyl methacrylate and ethyl methacrylate, are the main factors determining the hardness and wear resistance of the HC layer. To improve the anti-blocking effect of the HC layer, microparticles can be added to the resin. Since the HC layer is a low-refractive-index material (refractive index 1.46~1.52), low-refractive-index material particles are preferred, such as silicon dioxide (SiO2) particles, alumina (Al2O3), and magnesium fluoride (MgF) particles, with SiO2 particles being the most preferred, as their refractive index is 1.48~1.52.

[0030] tight layer

[0031] The bonding layer is a film layer added between the hardening layer and the coating to increase interlayer adhesion. It is also prepared by vacuum sputtering. Its components mainly include metal coatings, metal-like coatings, and metal-like compounds. Among them, metal coatings mainly include Ti (titanium), Al (aluminum), In (indium), tin (Sn), zirconium (Zr), nickel (Ni), chromium (Cr), etc.; metal-like coatings include Si (silicon), Ge (germanium), etc.; and metal-like compounds include SiC (silicon carbide) and GaN (gallium nitride), etc.

[0032] The preferred materials for the adhesion layer include Ti (titanium), Si (silicon), and Al (aluminum). The thickness of the adhesion layer is set to 0.2–5 nm, preferably 0.2–2 nm.

[0033] The bonding layer serves two purposes: first, it connects the hardening layer and the coating, improving interlayer adhesion; second, when the coating is thick, the bonding layer acts as a base, reducing film stress.

[0034] AR layer

[0035] It mainly consists of two layers: a silver plating layer and a low-refractive-index layer. The silver plating layer is prepared by vacuum deposition, with a base vacuum of <1×10⁻⁶. -4 Pa, introduce 50~300 sccm Ar, after the gas is introduced the vacuum degree is 0.05~0.4 Pa, the power can be set to match the speed, and a thin silver coating of 2~5 nm thickness is deposited.

[0036] Ag is chemically reactive and is an electrophilic metal. In the presence of oxygen, it readily reacts with oxygen to form silver oxide. Silver also readily reacts with sulfides and chlorides. Therefore, to ensure product stability, appropriate anti-oxidation measures must be taken. One approach is to use alloy Ag targets instead of pure Ag targets; another is to add protective layers to both sides of the silver plating.

[0037] For Method 1, one or more of the following metallic components need to be added to the Ag target: nickel (Ni), copper (Cu), cobalt (Co), tin (Sn), palladium (Pd), and chromium (Cr). The proportion of these added atoms is generally 0.5% to 5%, preferably 0.5% to 2%.

[0038] Method two involves adding protective layers to both sides of the Ag layer. The principle for adding these protective layers is that they should not chemically react with the Ag layer, while also providing some water and oxygen barrier effects. The protective layers can be: nickel (Ni) layers, nickel-chromium (NiCr) layers, tin (Sn) layers, zinc-tin (ZnSn) layers, silicon nitride (Si3N4) layers, aluminum-silicon (SiAl) layers, etc., with nickel-chromium (NiCr) layers, zinc-tin (ZnSn) layers, and aluminum-silicon (SiAl) layers being preferred, and nickel-chromium (NiCr) layers being the most preferred.

[0039] To match the anti-reflective effect of this product, the thickness of the protective layer needs to be limited. The thickness of both the bottom and top protective layers is set to 1~5nm.

[0040] (2) The refractive index of the raw material for the low refractive layer is selected to be 1.2 to 1.8, preferably 1.3 to 1.5. Low refractive index materials include MgF2 (magnesium fluoride), SiO2 (silicon dioxide), and Al2O3 (alumina), with SiO2 being the most preferred for mass production.

[0041] When the low-refractive-index layer is a SiO2 layer, its thickness is selected to be 30~120nm, preferably 50~100nm. To improve product performance, such as improving weather resistance, trace elements can be added, preferably Al and N elements. The addition can be achieved through processing methods. Al is added by doping a Si target with Al, with an Al doping ratio selected to be 0.5%~10%, preferably 1%~5%, and most preferably 1%~3%. Normally, SiO2 is generated by vacuum sputtering using a Si target through which O2 is passed to form a SiO2 film. N is added by doping N2 into the process gas O2, followed by sputtering to generate a small amount of Si3N4, with an N2 doping ratio selected to be 1%~30%, preferably 3%~20%, and most preferably 5%~10%.

[0042] Anti-fouling layer

[0043] The antifouling layer, covering the antireflective layer, enhances smoothness, reduces contamination, facilitates cleaning, and inhibits film wear. The antifouling layer is primarily composed of active silane groups and fluorinated modified organic groups. Its preparation method is not particularly limited and can be achieved using known manufacturing methods, such as vapor deposition, coating, spraying, spin coating, or manual brushing. Vapor deposition and coating are preferred. The main agent is perfluoropolyether (PFPE) polymer, and the diluent is primarily perfluorocyclic ether.

[0044] Including but not limited to the following examples, without additional limitations, the dry AR membrane comparison sample is RFT60A3A1-P11; the wet LR membrane comparison sample is LRFP6A-T01A.

[0045] Example 1

[0046] The silver-doped antireflective coating in this embodiment is as follows: A 60 μm thick TAC substrate is used, and a 3 μm hardening layer is coated on it using a coating method. The main component of the hardening layer is acrylic resin. A 0.5 nm Ti layer, a 3.5 nm Ag layer, and an approximately 63 nm SiO2 layer are deposited on the hardening layer using magnetron sputtering. The Ti layer is obtained by sputtering with a pure Ti target, and the Ag layer is obtained by sputtering with a pure Ag target (sputtering conditions are a base vacuum of 5 × 10⁻⁶). -5 (The vacuum level was 0.05 Pa after introducing 50 sccm of Ar gas). The SiO2 layer was obtained by sputtering pure Si target with oxygen. Then, an AF layer of about 10 nm was coated on the AR layer.

[0047] Example 2

[0048] The silver-doped antireflective coating in this embodiment is as follows: A 60 μm thick TAC substrate is used, and a 3 μm hardening layer is coated on it using a coating method. The main component of the hardening layer is acrylic resin. A 0.5 nm Ti layer, a 3.5 nm Ag alloy layer, and an approximately 63 nm SiO2 layer are deposited on the hardening layer using magnetron sputtering. The Ti layer is obtained by sputtering with a pure Ti target, and the Ag alloy layer is obtained by sputtering with an Ag alloy target (sputtering conditions are a base vacuum of 5 × 10⁻⁶). -5 Pa, 50ccm Ar was introduced, and the vacuum degree was 0.05Pa after the gas was introduced. The Ag alloy target composition was (Ag:Pd:Cu = 98%wt:1%wt:1%wt, Ag alloy 1). The SiO2 layer was obtained by sputtering pure Si target with oxygen. Then, an AF layer of about 10nm was coated on the AR layer.

[0049] Example 3

[0050] The silver-doped antireflective coating in this embodiment is as follows: A 60 μm thick TAC substrate is used, and a 3 μm hardening layer is coated on it using a coating method. The main component of the hardening layer is acrylic resin. A 0.5 nm Ti layer, a 3.5 nm Ag alloy layer, and an approximately 63 nm SiO2 layer are deposited on the hardening layer using magnetron sputtering. The Ti layer is obtained by sputtering with a pure Ti target, and the Ag alloy layer is obtained by sputtering with an Ag alloy target (sputtering conditions are a base vacuum of 5 × 10⁻⁶). -5 Pa, 50 sccm Ar was introduced, and the vacuum degree was 0.05 Pa after the gas was introduced. The Ag alloy target composition was (Ag:Ni:Ti = 98%wt:1.5%wt:0.5%wt, Ag alloy 2). The SiO2 layer was obtained by sputtering pure Si target with oxygen. Then, an AF layer of about 10 nm was coated on the AR layer.

[0051] Example 4

[0052] The silver-doped antireflective film in this embodiment is as follows: A 60μm thick TAC substrate is used, and a 3μm hardening layer is coated on it using a coating method. The main component of the hardening layer is acrylic resin. A 3.5nm Ag alloy layer and an approximately 63nm SiO2 layer are deposited on the hardening layer using magnetron sputtering. The Ag alloy layer is obtained by sputtering using an Ag alloy target (sputtering conditions are a base vacuum of 5×10⁻⁶). -5 The vacuum level was 0.05 Pa after introducing 50 sccm of Ar gas (Ag:Pd:Cu = 98%wt:1%wt:1%wt). The SiO2 layer was obtained by sputtering pure Si target with oxygen. Then, an approximately 10 nm AF layer was coated onto the AR layer.

[0053] (1) Overall performance

[0054] A comparative performance test was conducted on the conventional dry-process AR membrane RFT6A03A1-P11 produced by Jiangsu Riju, and the results are as follows:

[0055]

[0056] —Reflectance: The test reflection curves (test instrument: Olympus USPM RUII reflectometer) are compared as follows:

[0057] From the table above and Figure 1 As can be seen, compared with the dry AR film comparison sample, Examples 1-4 have slightly higher average reflectivity, lower single-point 550nm reflectivity, better slip properties and wear resistance, better consistency, higher production efficiency, and lower cost.

[0058] Smoothness is characterized by several factors, including the teardrop angle, coefficient of kinetic friction, and tactile feel. The comparison results are as follows:

[0059]

[0060] Abrasion resistance was characterized by the abrasion resistance of steel wool, using Bonstar 0000# steel wool, with a load of 1kg and a grinding head of 2×2cm:

[0061]

[0062] Consistency mainly refers to thickness uniformity, which is primarily determined by the preparation process and equipment. The dry AR comparison sample is prepared by magnetron sputtering, and its optical AR layer is a four-layer film system of Nb2O5+SiO2+Nb2O5+SiO2 with a total thickness of approximately 260nm and a thickness uniformity of approximately ±1%. In contrast, the optical AR layers of Examples 1, 2, 3, and 4 are two-layer films of Ag / Ag alloy + SiO2 with a total thickness of approximately 70nm and a thickness uniformity of approximately ±0.5%. These samples exhibit better film uniformity and have a lower coating process difficulty.

[0063] Production efficiency and cost: The single-target sputtering efficiency of the dry AR comparison sample is about 20 nm / (m / min). With 12 targets, the production line speed can only reach about 1 m / min. However, in Examples 1-4, with the same 12 targets, the production line speed can reach more than 3 m / min, which increases the production efficiency by 3 times and naturally reduces the cost significantly.

[0064] (2) Reliability testing

[0065]

[0066] Note: 1. The antioxidant property is determined by observing the degree of surface oxidation after the sample has been left to stand at room temperature for 500 hours.

[0067] 2. The standard for resistance to damp heat is based on GB / T2423.50. Observe the appearance abnormalities and test the adhesion of the samples under damp heat conditions (65℃*93%RH)*500h.

[0068] 3. Salt spray resistance test shall be conducted in accordance with GB / T 2423.17-2008, with NaCl content of 5% by mass and a test temperature of 35℃. The surface corrosion of the sample in the salt spray shall be observed.

[0069] As can be seen from the table above, Examples 2-3 exhibit superior antioxidant properties, resistance to damp heat, and resistance to salt spray corrosion.

[0070] (3) Antibacterial test

[0071] The testing standard refers to ISO 9022-11-2015. The test strains include: Aspergillus niger ATCC 9642, Aspergillus flavus AS3.3950, Aspergillus variegata AS 3.3885, Trichoderma viride ATCC 9645, Penicillium cordiformis ATCC 36839, Penicillium citrinum ATCC9849, Penicillium pseudomonadum AS 3.4253, Chaetomium globosum ATCC 6205, Chlorella vulgaris CICC 41449, and Aspergillus penicillium AS3.124.

[0072] Test conditions: Temperature 30℃, Humidity 95%RH, Duration 28 days. Observe whether mold grows on the bottom layer. Test results are as follows:

[0073]

[0074] As can be seen from the table above, Examples 1-4 passed the mold test, while conventional AR and LR films failed the mold test.

[0075] Example 5

[0076] The silver-doped antireflective coating in this embodiment is as follows: A 60μm thick TAC substrate is used, and a 3μm hardening layer is coated on it using a coating method. The main component of the hardening layer is acrylic resin. Using magnetron sputtering, a 0.5nm Si layer, a 3nm lower protective layer NiCr, a 3.5nm Ag layer, a 3nm upper protective layer NiCr, and a 78.5nm SiO2 layer are deposited on the hardening layer, respectively. The Si layer is obtained by sputtering with a pure Si target, the NiCr layer is obtained by sputtering with a nickel-chromium alloy target with a Ni:Cr composition of 80%wt:20%wt, and the Ag layer is obtained by sputtering with a pure Ag target (sputtering conditions are a base vacuum of 5×10⁻⁶). -5 (The vacuum level was 0.05 Pa after introducing 50 sccm of Ar gas). The SiO2 layer was obtained by sputtering pure Si target with oxygen. Then, an AF layer of about 10 nm was coated on the AR layer.

[0077] Example 6

[0078] The silver-doped antireflective film in this embodiment is as follows: A 60μm thick TAC substrate is used, and a 3μm hardening layer is coated on it. The main component of the hardening layer is acrylic resin. Using magnetron sputtering, a 0.5nm Si layer, a 3nm lower protective layer NiCr, a 3nm Ag alloy layer, a 3nm upper protective layer NiCr, and an 80nm SiO2 layer are deposited on the hardening layer. The Si layer is obtained by sputtering with a pure Si target, the NiCr layer is obtained by sputtering with a nickel-chromium alloy target with a Ni:Cr composition of 80%wt:20%wt, and the Ag alloy layer is obtained by sputtering with an Ag alloy target (sputtering conditions are a base vacuum of 5×10⁻⁶).-5 The vacuum level was 0.05 Pa after introducing 50 sccm of Ar gas (Ag:Pd:Cu = 98%wt:1%wt:1%wt). The SiO2 layer was obtained by sputtering pure Si target with oxygen. Then, an approximately 10 nm AF layer was coated onto the AR layer.

[0079] A performance comparison test was conducted on a conventional dry-process AR film produced by Zhejiang Riju, and the results are as follows:

[0080]

[0081] (1) Reflectivity: The test reflection curves (test instrument: Olympus USPM RUII reflectometer) are compared as follows:

[0082] From the table above and Figure 3 As can be seen, compared with the dry AR film comparison sample, Examples 5 and 6 have higher average reflectivity, lower single-point 550nm reflectivity, better smoothness and wear resistance, better consistency, higher production efficiency, and lower cost.

[0083] Smoothness is characterized by several factors, including the teardrop angle, coefficient of kinetic friction, and tactile feel. The comparison results are as follows:

[0084]

[0085] Abrasion resistance was characterized by the abrasion resistance of steel wool, using Bonstar 0000# steel wool, with a load of 1kg and a grinding head of 2×2cm:

[0086]

[0087] Consistency mainly refers to thickness uniformity, which is primarily determined by the preparation process and equipment. The dry AR comparison sample is prepared by magnetron sputtering, and its AR layer is a four-layer film system of Nb2O5+SiO2+Nb2O5+SiO2 with a total thickness of approximately 260nm and a thickness uniformity of about ±1%. In contrast, the AR layer of Examples 5 and 6 consists of a lower protective layer + Ag / Ag alloy layer + upper protective layer + SiO2 with a total thickness of approximately 90nm and a thickness uniformity of about ±0.5%. Its film uniformity is better and the coating process is less difficult.

[0088] Production efficiency and cost: The single-target sputtering efficiency of the dry AR comparison sample is about 20 nm / (m / min). With 12 targets, the production line speed can only reach about 1 m / min. However, in Examples 5 and 6, the production line speed with 12 targets can reach more than 2.5 m / min, which increases the production efficiency by 2.5 times and reduces the cost significantly.

[0089] (2) Reliability testing

[0090]

[0091] As can be seen from the table above, Examples 5-6 exhibit excellent antioxidant properties, resistance to damp heat, and resistance to salt spray corrosion.

[0092] (3) Antibacterial test

[0093] The testing method is the same as above:

[0094]

[0095] As can be seen from the table above, both Examples 5 and 6 passed the mold test.

[0096] Example 7

[0097] The only difference between this embodiment and embodiment 6 is that the lower protective layer is removed.

[0098] Example 8

[0099] The only difference between this embodiment and embodiment 6 is that the upper protective layer is removed.

[0100] Example 9

[0101] The only difference between this embodiment and Embodiment 6 is that the Ag alloy target composition is Ag:Ni = 95%wt: 5%wt.

[0102] Example 10

[0103] The only difference between this embodiment and Embodiment 6 is that the Ag alloy target composition is Ag:Ni = 99.5%wt:0.5%wt.

[0104] Example 11

[0105] The only difference between this embodiment and Embodiment 6 is that the sputtering conditions for the silver plating are a base vacuum of 9×10⁻⁶. -5 Pa, 100 sccm Ar is introduced, and the vacuum degree is 0.4 Pa after the gas is introduced.

[0106] Example 12

[0107] The only difference between this embodiment and Embodiment 6 is that the sputtering conditions for the silver plating are a base vacuum of 9×10⁻⁶. -5 Pa, 300 sccm Ar is introduced, and the vacuum degree is 0.25 Pa after the gas is introduced.

[0108] Example 13

[0109] The only difference between this embodiment and Embodiment 6 is that the SiO2 layer is obtained by sputtering oxygen through a Si target doped with 5% Al.

[0110] Example 14

[0111] The only difference between this embodiment and Embodiment 6 is that the SiO2 layer is obtained by sputtering oxygen through a Si target doped with 10% Al.

[0112] A performance comparison test was conducted, and the results are as follows:

[0113]

[0114] Smoothness is characterized by several factors, including the teardrop angle, coefficient of kinetic friction, and tactile feel. The comparison results are as follows:

[0115]

[0116] Abrasion resistance was characterized by the abrasion resistance of steel wool, using Bonstar 0000# steel wool, with a load of 1kg and a grinding head of 2×2cm:

[0117]

[0118] Consistency mainly refers to thickness uniformity, which is primarily determined by the preparation process and equipment. The dry AR comparison sample is prepared by magnetron sputtering, and its AR layer is a four-layer film system of Nb2O5+SiO2+Nb2O5+SiO2 with a total thickness of approximately 260nm and a thickness uniformity of about ±1%. In contrast, the thickness uniformity of the example sample is about ±0.5%, indicating better film uniformity and a lower coating process difficulty.

[0119] Production efficiency and cost: The single-target sputtering efficiency of the dry AR comparison sample is about 20 nm / (m / min). With 12 targets, the production line speed can only reach about 1 m / min. However, in Examples 5 and 6, the production line speed with 12 targets can reach more than 2.5 m / min, which increases the production efficiency by 2.5 times and reduces the cost significantly.

[0120] (2) Reliability testing

[0121]

[0122] As can be seen from the table above, Examples 7-14 exhibit excellent antioxidant properties, resistance to damp heat, and resistance to salt spray corrosion.

[0123] (3) Antibacterial test

[0124] The testing method is the same as above:

[0125]

[0126] As can be seen from the table above, Examples 7-14 all passed the mold test.

[0127] It will be apparent to those skilled in the art that the present invention is not limited to the details of the exemplary embodiments described above, and that the invention can be implemented in other specific forms without departing from the spirit or essential characteristics of the invention. Therefore, the embodiments should be considered in all respects as exemplary and non-limiting, and the scope of the invention is defined by the appended claims rather than the foregoing description. Thus, it is intended that all variations falling within the meaning and scope of equivalents of the claims be included within the present invention.

[0128] Furthermore, it should be understood that although this specification describes embodiments, not every embodiment contains only one independent technical solution. This narrative style is merely for clarity. Those skilled in the art should consider the specification as a whole, and the technical solutions in each embodiment can also be appropriately combined to form other embodiments that can be understood by those skilled in the art.

Claims

1. A silver-doped antireflective film, comprising a substrate, an HC layer, a silver plating layer, a low-refractive-index layer, and an AF layer arranged sequentially, wherein the target material of the silver plating layer is a pure silver target material or a silver alloy target material, wherein the silver alloy target material is a first metal doped with a total amount of 0.5-5 wt% in silver, and the first metal is selected from nickel, copper, cobalt, tin, palladium, chromium, and titanium.

2. The silver-doped antireflective film according to claim 1, characterized in that, The thickness of the silver plating layer is 2-5 nm.

3. The silver-doped antireflective film according to claim 2, characterized in that, The coating conditions for the silver plating layer are: background vacuum < 10. -4 Pa, 50~300 sccm Ar is introduced, and the vacuum degree after the gas is introduced is 0.05~0.4 Pa.

4. The silver-doped antireflective film according to any one of claims 1-3, characterized in that, At least one side of the silver plating layer is further provided with a protective layer, the protective layer being selected from: a nickel layer, a nickel-chromium alloy layer, a tin layer, a zinc-tin alloy layer, a silicon nitride layer, and a silicon-aluminum alloy layer.

5. The silver-doped antireflective film according to claim 4, characterized in that, When the target material for the silver plating layer is a pure silver target material, a protective layer is formed on both sides of the silver plating layer.

6. The silver-doped antireflective film according to claim 4, characterized in that, The thickness of the protective layer is 2-5 nm.

7. The silver-doped antireflective film according to claim 1, characterized in that, The target material for the low-folding layer is selected from: MgF2, SiO2, and Al2O3.

8. The silver-doped antireflective film according to claim 7, characterized in that, When the target material of the low-fold layer is SiO2, trace elements are also added to the target material, and the addition of trace elements is 0.5% to 10% Al or 1% to 30% N.

9. A display component, comprising a light-transmitting carrier and a silver-doped antireflective film formed on the light-transmitting carrier according to any one of claims 1-8.

10. A device with a display function, comprising a main body equipped with a display component according to claim 9 to realize an information display function.

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