Manufacturing method of composite component and shell

Abstract

The invention discloses a manufacturing method of a composite component and a shell. The manufacturing method comprises the following steps: providing an aluminum alloy part, wherein the aluminum alloy part comprises an aluminum base material and an aluminum oxide film layer on the aluminum base material; the invention provides a titanium alloy part. The titanium alloy part comprises a titanium base material and a titanium dioxide film layer arranged on the titanium base material. And a plastic layer is formed between the titanium alloy part and the aluminum alloy part through an in-mold injection molding technology, so that the composite component is formed. In the process of forming the plastic layer between the titanium alloy part and the aluminum alloy part through the in-mold injection molding process, the titanium dioxide film layer and the aluminum oxide film layer are well combined with the plastic layer, so that the bonding strength between the titanium alloy part and the plastic layer and the bonding strength between the aluminum alloy part and the plastic layer are improved; and the overall stability and durability of the composite component are improved.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of structure manufacturing, and particularly relates to a manufacturing method of a composite component and a shell. BACKGROUND

[0002] Electronic devices, such as mobile phones, PADs, notebook computers, smart watches, sports bands, earphones and the like, are usually provided with a shell made of metal or alloy to protect the elements in the electronic devices. At present, the manufacturing of the metal or alloy shell adopts a traditional etching and forming combined process. However, the manufactured shell has insufficient strength, and the shell is prone to deformation, especially at the corner, with a deformation rate of more than 78%, and has defects such as low forming yield and poor compactness. SUMMARY

[0003] The present application provides a manufacturing method of a composite component and a shell.

[0004] The present application provides a manufacturing method of a composite component. The manufacturing method comprises the following steps: providing an aluminum alloy piece, the aluminum alloy piece comprising an aluminum base material and an aluminum oxide film layer arranged on the aluminum base material; providing a titanium alloy piece, the titanium alloy piece comprising a titanium base material and a titanium dioxide film layer arranged on the titanium base material. A plastic layer is formed between the titanium alloy piece and the aluminum alloy piece through an in-mold injection forming process to form the composite component.

[0005] In the manufacturing method of the present application, the titanium base material is formed with the titanium dioxide film layer, and the aluminum base material is formed with the aluminum oxide film layer. In the process of forming the plastic layer between the titanium alloy piece and the aluminum alloy piece through the in-mold injection forming process, the titanium dioxide film layer and the aluminum oxide film layer have good combination with the plastic layer, thereby improving the combination strength between the titanium alloy piece and the plastic layer and the combination strength between the aluminum alloy piece and the plastic layer, and improving the overall stability and durability of the composite component.

[0006] In some embodiments, the titanium alloy part is provided by providing a titanium substrate, pre-treating the titanium substrate, high-temperature mixed-acid oxidation of the pre-treated titanium substrate using a mixed-acid oxidant to form a titanium dioxide film layer on the titanium substrate, the mixed-acid oxidant including sulfuric acid, phosphoric acid, p-toluene sulfonic acid, sodium molybdate, sodium dodecyl benzene sulfonate, and polyethylene glycol, the mass percentage of the sulfuric acid in the mixed-acid oxidant being 40-50%, the mass percentage of the phosphoric acid in the mixed-acid oxidant being 5-15%, the mass percentage of the p-toluene sulfonic acid in the mixed-acid oxidant being 2-8%, the mass percentage of the sodium molybdate in the mixed-acid oxidant being 0.5-1%, the mass percentage of the sodium dodecyl benzene sulfonate in the mixed-acid oxidant being 0.1-0.2%, and the mass percentage of the polyethylene glycol in the mixed-acid oxidant being 0.3-0.5%, high-temperature alkaline washing of the titanium substrate with the titanium dioxide film layer using an alkaline washing agent to form a titanium dioxide film layer with nanoscale pores on the titanium substrate, the alkaline washing agent including sodium hydroxide, polyether-modified siloxane, sodium gluconate, and a sodium carbonate-sodium bicarbonate buffer system, the mass percentage of the sodium hydroxide in the alkaline washing agent being 40-50%, the mass percentage of the polyether-modified siloxane in the alkaline washing agent being 1-1.5%, and the mass percentage of the sodium gluconate in the alkaline washing agent being 1-2%, the pH value of the sodium carbonate-sodium bicarbonate buffer system being 12.5-13.2, and post-treatment of the titanium substrate with the titanium dioxide film layer with nanoscale pores to obtain the titanium alloy part.

[0007] In some embodiments, the pre-treating the titanium substrate includes sandblasting the titanium substrate using alumina particles with a diameter or width of 50-100 microns, degreasing the sandblasted titanium substrate using a degreasing agent including sodium silicate and sodium dodecyl sulfate, and surface activation treatment of the degreased titanium substrate using an activator including nitric acid and sulfuric acid, the mass percentage of the nitric acid in the activator being 10-20%, and the mass percentage of the sulfuric acid in the activator being 5-6%.

[0008] In some embodiments, the post-treating the titanium substrate with the titanium dioxide film layer with nanoscale pores includes multi-stage countercurrent water washing of the titanium substrate with the titanium dioxide film layer with nanoscale pores, ultrasonic water washing of the multi-stage countercurrent water washed titanium substrate, and vacuum drying of the ultrasonic water washed titanium substrate.

[0009] In some embodiments, the thickness of the titanium dioxide film layer is 300-400 nanometers.

[0010] In some embodiments, the porosity of the titanium dioxide film layer ranges from 20% to 50%.

[0011] In some embodiments, the film layer hardness of the titanium dioxide film layer ranges from 900 Vickers hardness to 1050 Vickers hardness.

[0012] In some embodiments, the alkali corrosion resistance of the titanium dioxide film layer ranges from 15 grams per square meter per hour to 20 grams per square meter per hour.

[0013] In some embodiments, the test block tensile force value of the titanium dioxide film layer ranges from 75 kilogram force to 85 kilogram force.

[0014] In some embodiments, the method for providing an aluminum alloy part comprises: providing an aluminum substrate; pretreating the aluminum substrate; performing a phosphoric acid anodic etching treatment on the pretreated aluminum substrate using an additive to form the aluminum oxide film layer on the aluminum substrate, the additive comprising phosphoric acid, cerium ethylenediaminetetraacetate, sodium dihydrogen phosphate, polyvinylpyrrolidone, and deionized water, the mass percentage of the phosphoric acid in the additive being 10% to 20%, the mass percentage of the cerium ethylenediaminetetraacetate in the additive being 1% to 2%, the mass percentage of the sodium dihydrogen phosphate in the additive being 1% to 2%, and the mass percentage of the polyvinylpyrrolidone in the additive being 5% to 10%; and drying the aluminum substrate on which the aluminum oxide film layer is formed to obtain the aluminum alloy part.

[0015] In some embodiments, the thickness of the aluminum oxide film layer ranges from 500 nanometers to 950 nanometers.

[0016] In some embodiments, the pore size of the aluminum oxide film layer ranges from 40 nanometers to 60 nanometers.

[0017] In some embodiments, the film layer hardness of the aluminum oxide film layer ranges from 500 Vickers hardness to 650 Vickers hardness.

[0018] In some embodiments, the alkali corrosion resistance of the aluminum oxide film layer ranges from 1.3 grams per square meter per hour to 2.3 grams per square meter per hour.

[0019] In some embodiments, the test block tensile force value of the aluminum oxide film layer ranges from 45 kilogram force to 55 kilogram force.

[0020] In some embodiments, the forming a plastic layer between the titanium alloy piece and the aluminum alloy piece to form the composite component by the in-mold injection molding process comprises: preheating a mold to reach a target temperature; placing the titanium alloy piece and the aluminum alloy piece into the mold; injecting molten plastic between the titanium alloy piece and the aluminum alloy piece in the mold using a barrel, and controlling a pressure in the mold according to a dynamic pressure control curve; and after the molten plastic fills between the titanium alloy piece and the aluminum alloy piece in the mold, gradient cooling the molten plastic to obtain the composite component.

[0021] In some embodiments, the controlling the pressure in the mold according to the dynamic pressure control curve comprises: controlling the mold to maintain at a first pressure for a first preset time duration; controlling the mold to maintain at a second pressure for a second preset time duration; and controlling the mold to maintain at a third pressure for a third preset time duration, the first pressure, the second pressure and the third pressure decreasing in turn, and the first preset time duration, the second preset time duration and the third preset time duration increasing in turn. The gradient cooling the molten plastic comprises: cooling the molten plastic using a first cooling rate; and cooling the molten plastic using a second cooling rate, the first cooling rate being greater than the second cooling rate.

[0022] The application also provides a shell comprising a body, a frame and a composite component. The frame is connected with the body, the frame comprises a first frame, a connecting frame and a second frame, the first frame and the second frame are arranged at an angle interval, and the connecting frame is connected to the first frame and the second frame. The composite component is made by the manufacturing method of any one of the above embodiments, and at least part of the connecting frame comprises the composite component.

[0023] In the shell of the application, the composite component is formed by forming a plastic layer between a titanium alloy piece and an aluminum alloy piece, and when the composite component is connected with the body, the strength of the manufactured shell can be improved. The connecting frame is at a corner of the shell, and when the composite component is formed at the corner, the corner is less likely to deform, the deformation rate of the corner is greatly reduced, and the compactness and forming yield are improved.

[0024] Additional aspects and advantages of the application will be set forth in part in the description which follows, and in part will become apparent to those skilled in the art upon examination of the following and / or can be learned by practice of the application. BRIEF DESCRIPTION OF DRAWINGS

[0025] The above and / or additional aspects and advantages of the application will become apparent and be readily appreciated from the description of the embodiments, taken in conjunction with the following drawings in which:

[0026] Figure 1 is a flowchart of a method of manufacturing a composite member according to some embodiments of the present application;

[0027] Figure 2 is a flowchart of a method of manufacturing a composite member according to some embodiments of the present application; Figure 1 is a flowchart of a method of manufacturing a composite member according to some embodiments of the present application;

[0028] Figure 3 is a flowchart of a method of manufacturing a composite member according to some embodiments of the present application; Figure 1 is a flowchart of a method of manufacturing a composite member according to some embodiments of the present application;

[0029] Figure 4 is a flowchart of a method of manufacturing a composite member according to some embodiments of the present application; Figure 1 is a flowchart of a method of manufacturing a composite member according to some embodiments of the present application;

[0030] Figure 5 is a flowchart of a method of manufacturing a composite member according to some embodiments of the present application; Figure 1 is a flowchart of a method of manufacturing a composite member according to some embodiments of the present application;

[0031] Figure 6 is a flowchart of a method of manufacturing a composite member according to some embodiments of the present application; Figure 4 is a flowchart of a method of manufacturing a composite member according to some embodiments of the present application;

[0032] Figure 7 is a schematic diagram of a comparison between a conventional method of manufacturing an aluminum alloy member and a method of manufacturing an aluminum alloy member according to some embodiments of the present application; Figure 4 is a schematic diagram of a comparison between a conventional method of manufacturing an aluminum alloy member and a method of manufacturing an aluminum alloy member according to some embodiments of the present application;

[0033] Figure 8 is a flowchart of a method of manufacturing a composite member according to some embodiments of the present application; Figure 1 is a flowchart of a method of manufacturing a composite member according to some embodiments of the present application;

[0034] Figure 9 is a flowchart of a method of manufacturing a composite member according to some embodiments of the present application; Figure 1 is a flowchart of a method of manufacturing a composite member according to some embodiments of the present application;

[0035] Figure 10 is a schematic diagram of a structure of a composite member according to some embodiments of the present application;

[0036] Figure 11 is a schematic diagram of a structure of a composite member according to some embodiments of the present application; Figure 10 is a schematic diagram of a structure of a composite member according to some embodiments of the present application;

[0037] Figure 12 is a schematic diagram of a comparison between a conventional housing and a housing using a composite member according to some embodiments of the present application;

[0038] Figure 13 is a schematic diagram of a structure of an electronic device according to some embodiments of the present application.

[0039] Explanation of main element reference numerals:

[0040] Electronic device 10000; housing 1000; composite member 100; body 300; bezel 500; first bezel 510; connecting bezel 530; second bezel 550; aluminum alloy piece 10; aluminum base material 11; aluminum oxide film layer 13; titanium alloy piece 30; titanium base material 31; titanium dioxide film layer 33; plastic layer 50. DETAILED DESCRIPTION

[0041] In the description of the present application, some disclosed contents have been shown in the drawings correspondingly, in which the same or similar reference numerals represent the same or similar elements or elements with the same or similar functions throughout the description. The following description described by referring to the drawings is exemplary and is only for explaining the present application, and cannot be understood as a limitation to the present application.

[0042] In the description of the present application, many different contents or examples are disclosed to realize different structures of the present application. In order to simplify the disclosure of the present application, the components and settings of specific examples are described below. Of course, they are only examples, and the purpose is not to limit the present application.

[0043] In addition, the terms "first", "second" are only for the purpose of description, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of indicated technical features. Therefore, the features defined with "first", "second" can explicitly or implicitly include one or more of the features. In the description of the present application, the meaning of "multiple" is two or more, unless otherwise specifically limited.

[0044] In the description of the present application, it is understood that the terms used to indicate the orientation or positional relationship (such as "center", "vertical", "horizontal", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", etc.) are based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present application and facilitating the understanding of the corresponding embodiments, and therefore the terms used to indicate the orientation or positional relationship cannot be understood as a limitation to the present application.

[0045] In the description of the present application, unless specifically defined and limited otherwise, the "on" or "under" of a first feature to a second feature can include that the first and second features are in direct contact, or that the first and second features are not in direct contact but are in contact through another feature between them. Moreover, the "on", "above" and "above" of the first feature to the second feature includes that the first feature is directly above and obliquely above the second feature, or only indicates that the first feature is higher than the second feature in horizontal height. The "under", "below" and "below" of the first feature to the second feature includes that the first feature is directly below and obliquely below the second feature, or only indicates that the first feature is less than the second feature in horizontal height.

[0046] Electronic devices, such as mobile phones, PADs, notebook computers, smart watches, sports bands, earphones, etc., are usually provided with a shell made of metal or alloy to protect the elements inside the electronic devices. At present, the manufacturing of the metal or alloy shell adopts a traditional etching and forming combined process. However, the manufactured shell has insufficient strength, and the shell is prone to deformation, especially at the corners, with a deformation rate exceeding 78%, and also has defects such as low forming yield and poor compactness.

[0047] Please refer to Figure 1 and Figure 9 The present application provides a manufacturing method of a composite component. The manufacturing method comprises:

[0048] Step 01: providing an aluminum alloy piece 10, the aluminum alloy piece 10 comprising an aluminum base material 11 and an aluminum oxide film layer 13 arranged on the aluminum base material 11;

[0049] Step 03: providing a titanium alloy piece 30, the titanium alloy piece 10 comprising a titanium base material 31 and a titanium dioxide film layer 33 arranged on the titanium base material 31; and

[0050] Step 05: forming a plastic layer 50 between the titanium alloy piece 30 and the aluminum alloy piece 10 by an in-mold injection molding process to form a composite component 100.

[0051] In some embodiments, step 01: providing an aluminum alloy piece 10, specifically can adopt 011-017 which will be introduced below. In other embodiments, step 01: providing an aluminum alloy piece 10, specifically can also adopt other methods, as long as it can ensure that the provided aluminum alloy piece 10 comprises an aluminum base material 11 and an aluminum oxide film layer 13 arranged on the aluminum base material 11.

[0052] The titanium substrate 31 is formed with a titanium dioxide film layer 33, and the aluminum substrate 11 is formed with an aluminum oxide film layer 13. During the process of molding the plastic layer 50 between the titanium alloy piece 30 and the aluminum alloy piece 10 by the in-mold injection molding process, the titanium dioxide film layer 33 and the aluminum oxide film layer 13 have good bonding degree with the plastic layer 50, thereby improving the bonding strength between the titanium alloy piece 30 and the plastic layer 50, and the bonding strength between the aluminum alloy piece 10 and the plastic layer 50, and enhancing the overall stability and durability of the composite component 100.

[0053] Please refer to Figure 2 and Figure 3 In some embodiments, step 03: providing a titanium alloy piece 30, comprising:

[0054] Step 031: providing a titanium substrate 31;

[0055] Step 033: pretreating the titanium substrate 31;

[0056] Step 035: using a mixed acid oxidant to perform high-temperature oxidation on the pretreated titanium substrate 31 at a predetermined temperature for a preset time length to form a titanium dioxide film layer 33 on the titanium substrate 31, the mixed acid oxidant comprising sulfuric acid, phosphoric acid, p-toluenesulfonic acid, sodium molybdate, sodium dodecylbenzenesulfonate, and polyethylene glycol, the mass percentage of sulfuric acid in the mixed acid oxidant being 40% to 50%, the mass percentage of phosphoric acid in the mixed acid oxidant being 5% to 15%, the mass percentage of p-toluenesulfonic acid in the mixed acid oxidant being 2% to 8%, the mass percentage of sodium molybdate in the mixed acid oxidant being 0.5% to 1%, the mass percentage of sodium dodecylbenzenesulfonate in the mixed acid oxidant being 0.1% to 0.2%, and the mass percentage of polyethylene glycol in the mixed acid oxidant being 0.3% to 0.5%; and

[0057] Step 037: using an alkali washing agent to perform high-temperature alkali washing on the titanium substrate 31 formed with the titanium dioxide film layer 33 at a predetermined temperature to form a titanium dioxide film layer 33 with nanoscale pores on the titanium substrate 31, the alkali washing agent comprising sodium hydroxide, polyether-modified siloxane, sodium gluconate, and a sodium carbonate-sodium bicarbonate buffer system, the mass percentage of sodium hydroxide in the alkali washing agent being 40% to 50%, the mass percentage of polyether-modified siloxane in the alkali washing agent being 1% to 1.5%, the mass percentage of sodium gluconate in the alkali washing agent being 1% to 2%, and the pH value of the sodium carbonate-sodium bicarbonate buffer system being 12.5 to 13.2; and

[0058] Step 039: post-treating the titanium substrate 31 formed with the titanium dioxide film layer 33 with nanoscale pores to obtain the titanium alloy piece 30.

[0059] Specifically, in step 035, the titanium substrate 31 is treated to make the pretreated titanium substrate 31 suitable for subsequent processes, which at least include mixed acid high-temperature oxidation, high-temperature alkali washing, post-treatment, and in-mold injection molding.

[0060] In step 035, a mixed acid oxidant is used to etch the titanium substrate 31 to form the titanium dioxide film layer 33. In the mixed acid oxidant, sulfuric acid is used to provide strong oxidizing properties and high reactivity, and can etch the surface of the titanium substrate 31 to form the titanium dioxide film layer 33 through an oxidation reaction. For example, in the mixed acid oxidant, the mass percentage of sulfuric acid is 40% to 50%. The mass percentage of sulfuric acid can be 40%, 41.11%, 42.22%, 43.33%, 44.44%, 45.56%, 46.67%, 47.78%, 48.89%, or 50%. If the mass percentage of sulfuric acid is less than 40%, the mixed acid oxidant will not have sufficient oxidation capacity, and if the mass percentage of sulfuric acid is greater than 50%, the high concentration of the mixed acid oxidant will cause excessive dissolution of titanium. Therefore, the mass percentage of sulfuric acid is greater than or equal to 40% and less than or equal to 50%, which can ensure that there is sufficient concentration of sulfuric acid to provide sufficient oxidation capacity to form a titanium dioxide film layer 33 of sufficient thickness, and can prevent excessive dissolution of titanium caused by excessive concentration, thereby ensuring that the titanium dioxide film layer 33 has a certain density.

[0061] Phosphoric acid is a rate-controlling substrate that reacts with titanium to form a titanium phosphate (TiPO4) passivation layer, preventing the oxidation reaction on the surface of part of the titanium substrate 31 from being too strong, avoiding excessive etching of the surface of the titanium substrate 31, thereby controlling the rate of the oxidation reaction and ensuring that the oxidation reaction proceeds uniformly. For example, in the mixed acid oxidant, the mass percentage of phosphoric acid is 5% to 15%, and the mass percentage of phosphoric acid can be 5%, 6.11%, 7.22%, 8.33%, 9.44%, 10.56%, 11.67%, 12.78%, 13.89%, or 15%. If the mass percentage of phosphoric acid is less than 5%, the phosphoric acid will not have sufficient control capacity to control the rate of the oxidation reaction, and if the mass percentage of phosphoric acid is greater than 15%, the excessive phosphoric acid will inhibit the oxidation reaction. Therefore, the mass percentage of phosphoric acid is greater than or equal to 5% and less than or equal to 15%, which can ensure that the phosphoric acid has sufficient control capacity to control the rate of the oxidation reaction, and can avoid excessive passivation of the phosphoric acid to avoid inhibiting the oxidation reaction, thereby ensuring the thickness of the titanium dioxide film layer 33.

[0062] p-toluenesulfonic acid is used to enhance acid permeability and reduce byproduct deposition. Exemplarily, the mass percentage of p-toluenesulfonic acid in the mixed acid oxidant is 2% to 8%, which can be 2%, 2.67%, 3.33%, 4%, 4.67%, 5.33%, 6%, 6.67%, 7.33% or 8%. If the mass percentage of p-toluenesulfonic acid is less than 2%, the concentration of p-toluenesulfonic acid is too low to reduce byproduct deposition, and the acid permeability is not strong enough; if the mass percentage of p-toluenesulfonic acid is greater than 8%, the concentration of p-toluenesulfonic acid is too high, which is easy to introduce excessive organic residues, and the acid permeability is too strong. Therefore, the mass percentage of p-toluenesulfonic acid is greater than or equal to 2% and less than or equal to 8%, which can not only ensure that p-toluenesulfonic acid has sufficient concentration to reduce byproduct deposition and has reasonable acid permeability, but also avoid excessive organic residues introduced by high concentration.

[0063] Sodium molybdate is a crystal structure regulator, which can regulate the phase transition of the titanium dioxide film layer 33. Titanium dioxide (TiO2) is not a single substance, but exists in multiple crystal structures (crystal phases), including anatase and rutile. Anatase is a metastable phase, and its crystal structure is relatively loose, with many active sites, and it is more easily etched in an alkaline environment. Ratile is the most thermodynamically stable phase, and its crystal structure is dense, with high chemical stability, and it is very resistant to corrosion in an alkaline environment and is difficult to be etched. The molybdate ions (MoO4 2- ) in sodium molybdate can preferentially adsorb the titanium dioxide crystal face and the rutile crystal face in an alkaline solution. The titanium dioxide crystal face is the main exposed face of anatase, and the rutile crystal face is the main exposed face of rutile. Molybdate ions can inhibit the growth of the rutile phase and promote the exposure of the anatase phase. Molybdate ions form a strong coordination bond (Ti-O-Mo) with Ti4+ on the rutile crystal face, which can hinder the etching of the hydroxyl group on the rutile crystal face and reduce the stability of the rutile phase; in addition, the titanium dioxide crystal face has a low adsorption energy and a small coverage of molybdate ions, and the titanium dioxide crystal face is easily corroded in an alkaline solution, exposing more high-activity crystal faces. The reaction principle is:

[0064] TiO2+ MoO4 2- + 2OH - → [Ti-O-MoO3] 3- + H2O

[0065] Exemplarily, the mass percentage of sodium molybdate in the mixed acid oxidant is 0.5% to 1%. The mass percentage of sodium molybdate can be 0.5%, 0.56%, 0.61%, 0.67%, 0.722%, 0.78%, 0.83%, 0.89%, 0.94%, or 1%. If the mass percentage of sodium molybdate is less than 0.5%, the concentration of sodium molybdate is too low to control the phase change of the titanium dioxide film layer 33; if the mass percentage of sodium molybdate is greater than 1%, the titanium dioxide film layer 33 is prone to be too thick. Therefore, the mass percentage of sodium molybdate is greater than or equal to 0.5% and less than or equal to 1%, which can reasonably control the phase change of the titanium dioxide film layer 33 and ensure that the titanium dioxide film layer 33 has a reasonable thickness.

[0066] Sodium dodecyl benzene sulfonate and polyethylene glycol are surfactants, which are used to reduce the surface tension of the titanium substrate 31, improve etching uniformity, form a dynamic adsorption layer, control the wettability of the reaction interface, and improve the phase change reaction rate.

[0067] Exemplarily, the mass percentage of sodium dodecyl benzene sulfonate in the mixed acid oxidant is 0.1% to 0.2%. The mass percentage of sodium dodecyl benzene sulfonate in the mixed acid oxidant can be 0.1%, 0.11%, 0.12%, 0.13%, 0.14%, 0.15%, 0.16%, 0.17%, 0.18%, or 0.2%. If the mass percentage of sodium dodecyl benzene sulfonate is less than 0.1%, the concentration of sodium dodecyl benzene sulfonate is too low to reduce the surface tension of the titanium substrate 31; if the mass percentage of sodium dodecyl benzene sulfonate is greater than 0.2%, the concentration of sodium dodecyl benzene sulfonate is too high to hinder the contact between the mixed acid oxidant and the titanium substrate 31. Therefore, the mass percentage of sodium dodecyl benzene sulfonate is greater than or equal to 0.1% and less than or equal to 0.2%, which can not only reduce the surface tension of the titanium substrate 31, but also ensure that the mixed acid oxidant and the titanium substrate 31 are in full contact.

[0068] Exemplarily, the mass percentage of polyethylene glycol in the mixed acid oxidant is 0.3% to 0.5%. The mass percentage of polyethylene glycol in the mixed acid oxidant can be 0.3%, 0.32%, 0.34%, 0.36%, 0.38%, 0.40%, 0.42%, 0.44%, 0.46%, or 0.5%. If the mass percentage of polyethylene glycol is less than 0.3%, the concentration of polyethylene glycol is too low to reduce the surface tension of the titanium substrate 31; if the mass percentage of polyethylene glycol is greater than 0.5%, the concentration of polyethylene glycol is too high to hinder the contact between the mixed acid oxidant and the titanium substrate 31. Therefore, the mass percentage of polyethylene glycol is greater than or equal to 0.3% and less than or equal to 0.5%, which can not only reduce the surface tension of the titanium substrate 31, but also ensure that the mixed acid oxidant and the titanium substrate 31 are in full contact.

[0069] Exemplarily, step 035 is performed at a predetermined temperature, i.e., the predetermined temperature in the mixed acid high-temperature oxidation process is greater than or equal to 80 degrees Celsius and less than or equal to 90 degrees Celsius. The predetermined temperature in the mixed acid high-temperature oxidation process can be 80.00 degrees Celsius, 81.11 degrees Celsius, 82.22 degrees Celsius, 83.33 degrees Celsius, 84.44 degrees Celsius, 85.56 degrees Celsius, 86.67 degrees Celsius, 87.78 degrees Celsius, 88.89 degrees Celsius, or 90.00 degrees Celsius. If the predetermined temperature in the mixed acid high-temperature oxidation process is less than 80 degrees Celsius, the reaction rate is low; if the predetermined temperature in the mixed acid high-temperature oxidation process is greater than 90 degrees Celsius, the components in the mixed acid oxidant are prone to thermal decomposition, affecting the reaction efficiency. Therefore, the predetermined temperature in the mixed acid high-temperature oxidation process is greater than or equal to 80 degrees Celsius and less than or equal to 90 degrees Celsius, which can not only ensure the reaction rate, but also avoid the thermal decomposition of the components in the mixed acid oxidant, promoting the uniform growth of the titanium dioxide film layer 33.

[0070] Exemplarily, step 035 is performed for a preset time length, i.e., the preset time length in the mixed acid high-temperature oxidation process is greater than or equal to 10 minutes and less than or equal to 20 minutes. The preset time length in the mixed acid high-temperature oxidation process can be 10 minutes, 11.11 minutes, 12.22 minutes, 13.33 minutes, 14.44 minutes, 15.56 minutes, 16.67 minutes, 17.78 minutes, 18.89 minutes, or 20 minutes. If the preset time length in the mixed acid high-temperature oxidation process is less than 10 minutes, the thickness of the titanium dioxide film layer 33 is insufficient, and if the preset time length in the mixed acid high-temperature oxidation process is greater than 20 minutes, the thickness of the titanium dioxide film layer 33 is excessive. Therefore, the preset time length in the mixed acid high-temperature oxidation process is greater than or equal to 10 minutes and less than or equal to 20 minutes, which can form a titanium dioxide film layer 33 with a reasonable thickness.

[0071] In this way, after the mixed acid oxidant is subjected to high-temperature oxidation, a dense titanium dioxide film layer 33 can be formed on the titanium substrate 31.

[0072] In step 037, high-temperature alkali washing is used to form nanoscale holes on the titanium dioxide film layer 33. The nanoscale holes refer to holes with a diameter less than or equal to a nanometer unit. Exemplarily, the predetermined temperature in step 037, i.e., the predetermined temperature in the high-temperature alkali washing process, is greater than or equal to 80 degrees Celsius and less than or equal to 90 degrees Celsius. The predetermined temperature in the high-temperature alkali washing process can be 80.00 degrees Celsius, 81.11 degrees Celsius, 82.22 degrees Celsius, 83.33 degrees Celsius, 84.44 degrees Celsius, 85.56 degrees Celsius, 86.67 degrees Celsius, 87.78 degrees Celsius, 88.89 degrees Celsius, or 90.00 degrees Celsius. If the predetermined temperature in the high-temperature alkali washing process is less than 80 degrees Celsius, the high-temperature alkali washing rate is low; if the predetermined temperature in the high-temperature alkali washing process is greater than 90 degrees Celsius, the components in the alkali washing agent are prone to thermal decomposition, affecting the efficiency of high-temperature alkali washing. Therefore, the predetermined temperature in the high-temperature alkali washing process is greater than or equal to 80 degrees Celsius and less than or equal to 90 degrees Celsius, which can not only ensure the high-temperature alkali washing rate, but also avoid the thermal decomposition of the components in the alkali washing agent, ensuring the formation of nanoscale holes.

[0073] Sodium hydroxide is used to alkali etch the titanium dioxide film layer 33 to produce nanoscale holes. Exemplarily, in the alkali washing agent, the mass percentage of sodium hydroxide is 40% to 50%. The mass percentage of sodium hydroxide can be 40%, 41.11%, 42.22%, 43.33%, 44.44%, 45.56%, 46.67%, 47.78%, 48.89%, or 50%. If the mass percentage of sodium hydroxide is less than 40%, the concentration of sodium hydroxide is low, and the etching rate is low; if the mass percentage of sodium hydroxide is greater than 50%, it is easy to cause the nanoscale holes to be connected or collapsed. Therefore, the mass percentage of sodium hydroxide is greater than or equal to 40% and less than or equal to 50%, which can not only provide sufficient concentration of hydroxyl ions to etch to produce nanoscale holes, but also avoid problems such as connection or collapse of nanoscale holes caused by too high concentration.

[0074] The polyether-modified siloxane is a solid-liquid interface active substance, which can be used as a phase transfer catalyst to optimize the wetting permeability of the alkali cleaning agent to the titanium dioxide film layer 33, avoid local over-etching, and ensure uniform etching. For example, the mass percentage of the polyether-modified siloxane in the alkali cleaning agent is 1% to 1.5%. The mass percentage of the polyether-modified siloxane can be 1%, 1.06%, 1.11%, 1.17%, 1.22%, 1.28%, 1.33%, 1.39%, 1.44%, or 1.5%. If the mass percentage of the polyether-modified siloxane is less than 1%, it is easy to cause insufficient wetting permeability, resulting in uneven etching. If the mass percentage of the polyether-modified siloxane is greater than 1.5%, it is easy to reduce the etching rate, block the newly formed nanoscale pores, and reduce the porosity. Therefore, the mass percentage of the polyether-modified siloxane is 1% to 1.5%, which can make the alkali cleaning agent uniformly cover the surface of the titanium dioxide film layer 33 and ensure uniform etching.

[0075] Sodium gluconate is used to form a stable complex with impurity metal ions to prevent impurities from blocking nanoscale pores. The formula reaction is: C6H 11 O7 - + M 3+ → [M(C6H 11 O7)] 2+ For example, the mass percentage of sodium gluconate in the alkali cleaning agent is 1% to 2%. The mass percentage of sodium gluconate can be 1%, 1.11%, 1.22%, 1.33%, 1.44%, 1.56%, 1.67%, 1.78%, 1.89%, or 2%. If the mass percentage of sodium gluconate is less than 1%, it is easy to cause impurities to block nanoscale pores. If the mass percentage of sodium gluconate is greater than 2%, it is easy to cause sodium gluconate to consume sodium hydroxide, weakening the etching effect. Therefore, the mass percentage of sodium gluconate is greater than or equal to 1% and less than or equal to 2%, which can prevent impurities from blocking nanoscale pores and does not affect the etching efficiency.

[0076] The sodium carbonate-sodium bicarbonate buffer system is used to adjust the pH of the alkali cleaning agent. Exemplarily, the pH of the sodium carbonate-sodium bicarbonate buffer system is greater than or equal to 12.5 and less than or equal to 13.2. The pH of the sodium carbonate-sodium bicarbonate buffer system can be 12.50, 12.58, 12.66, 12.74, 12.82, 12.90, 12.98, 13.06, 13.14, or 13.20. If the pH of the sodium carbonate-sodium bicarbonate buffer system is less than 12.5, the buffering capacity of the sodium carbonate-sodium bicarbonate buffer system is insufficient, which can cause the concentration of hydroxyl ions (OH-) to decrease, resulting in etching stagnation; if the pH of the sodium carbonate-sodium bicarbonate buffer system is greater than 13.2, the pH is out of the buffering range, the sodium carbonate-sodium bicarbonate buffer system loses the ability to regulate pH, and the alkali cleaning agent becomes a strong alkali environment, resulting in a dramatic increase in etching rate and excessively large or collapsed nanoscale holes. Therefore, the pH of the sodium carbonate-sodium bicarbonate buffer system is greater than or equal to 12.5 and less than or equal to 13.2, which can provide a suitable pH, and the alkali cleaning agent can uniformly etch the titanium dioxide film layer 33 to produce nanoscale holes.

[0077] In step 039, post-processing is used to remove the alkali cleaning agent and reaction byproducts remaining on the surface of the titanium substrate 31 and in the nanoscale holes, preventing the alkali cleaning agent and reaction byproducts from adversely affecting the molding of the plastic layer 50, the bonding of the plastic layer 50 to the titanium alloy piece 30, and the performance of the composite component 100 in subsequent injection molding processes, such as causing defects in the plastic layer 50 and reducing the bonding strength. This prepares for subsequent bonding with the aluminum alloy piece 10 through the in-mold injection molding process.

[0078] The in-mold injection molding process is a production process in which the plastic layer 50 is injection molded inside a mold and assembled with other components, such as the titanium alloy piece 30 and the aluminum alloy piece 10 in the present application. The plastic layer 50 is molded between the titanium alloy piece 30 and the aluminum alloy piece 10, which means that the plastic layer 50 in a molten state is injected into the nanoscale holes of the titanium alloy piece 30 and into the aluminum oxide film layer 13. After cooling and solidification, the plastic layer 50 can achieve bonding of the titanium alloy piece 30, the plastic layer 50, and the aluminum alloy piece 10, thereby forming a composite component 100. The in-mold injection molding process for forming the composite component 100 has high production efficiency, small errors, and low process complexity.

[0079] In some embodiments, step 05: forming a plastic layer 50 between the titanium alloy piece 30 and the aluminum alloy piece 10 by an in-mold injection molding process to form a composite component 100, which can be specifically implemented by 051-057 to be introduced below. In other embodiments, 05: forming a plastic layer 50 between the titanium alloy piece 30 and the aluminum alloy piece 10 by an in-mold injection molding process to form a composite component 100, which can also be specifically implemented by other methods as long as it can ensure the formation of a composite component 100 in a sandwich structure of aluminum alloy-plastic layer-titanium alloy.

[0080] In the method for manufacturing the composite component of the present application, the titanium base material 31 is provided with a nano-sized pore titanium dioxide film layer 33 formed by a mixed acid oxidant and an alkali cleaning agent. The film layer of the titanium dioxide film layer 33 is thicker, and the pore channel structure of the nano-sized pores is more uniform and has a larger pore size. In the process of forming a plastic layer 50 between the titanium alloy piece 30 and the aluminum alloy piece 10, the increase in the film layer thickness provides more filling space for the plastic layer 50, the uniform pore channel structure ensures uniform filling of the plastic layer 50, and the nano-sized pores with a larger pore size can accommodate more plastic layer 50, thereby improving the bonding strength between the titanium alloy piece 30 and the plastic layer 50 and enhancing the structural strength of the composite component 100.

[0081] Please refer to Figure 2 and Figure 9 In some embodiments, step 033: pre-treating the titanium base material 31, including:

[0082] Step 0331: sandblasting the titanium base material 31 with alumina particles with a diameter or width of 50-100 microns at a predetermined pressure;

[0083] Step 0333: degreasing the sandblasted titanium base material 31 with a degreasing agent containing sodium silicate and sodium dodecyl sulfate at a predetermined pH value and a predetermined temperature; and

[0084] Step 0335: surface activation treatment of the degreased titanium base material 31 with an activator at a predetermined temperature, the activator including nitric acid and sulfuric acid, the mass percentage of nitric acid in the activator being 10-20%, and the mass percentage of sulfuric acid in the activator being 5-6%.

[0085] Specifically, in step 0331, the sand blasting treatment is used to eliminate macro defects (such as scratches, burrs, and scales) on the surface of the titanium substrate 31 by abrasive. Illustratively, the abrasive used in the sand blasting treatment of the present application is an aluminum oxide particle, and the diameter or width of the aluminum oxide particle is greater than or equal to 50 microns and less than or equal to 100 microns. The diameter or width of the aluminum oxide particle can be 50 microns, 55.56 microns, 61.11 microns, 66.67 microns, 72.22 microns, 77.78 microns, 83.33 microns, 88.89 microns, 94.44 microns, or 100 microns. If the diameter of the aluminum oxide particle is less than 50 microns, the impact force of the aluminum oxide particle is insufficient to effectively remove the scales or scratches on the surface of the titanium substrate 31; if the diameter of the aluminum oxide particle is greater than 100 microns, the aluminum oxide particle is too large and can easily cause micro-cracks on the surface of the titanium substrate 31. Therefore, the diameter or width of the aluminum oxide particle is greater than or equal to 50 microns and less than or equal to 100 microns, which can both eliminate the macro defects on the surface of the titanium substrate 31 and not damage the surface of the titanium substrate 31.

[0086] Illustratively, in step 0331, the preset pressure is greater than or equal to 0.3 MPa and less than or equal to 0.5 MPa. The preset pressure can be 0.30 MPa, 0.32 MPa, 0.34 MPa, 0.36 MPa, 0.38 MPa, 0.4 MPa, 0.42 MPa, 0.44 MPa, 0.46 MPa, or 0.5 MPa. If the preset pressure is less than 0.3 MPa, the impact force of the aluminum oxide particle is weak and cannot effectively remove the scales or scratches on the surface of the titanium substrate 31; if the preset pressure is greater than 0.5 MPa, the aluminum oxide particle is easily broken and produces micro dust to contaminate the surface of the titanium substrate 31. Therefore, the preset pressure is greater than or equal to 0.3 MPa and less than or equal to 0.5 MPa, which can both eliminate the macro defects on the surface of the titanium substrate 31 and not damage the surface of the titanium substrate 31.

[0087] The degreasing treatment is used to remove the sandblasting residues, grease, fingerprints and organic contaminants on the surface of the titanium substrate 31 after the sandblasting treatment. Exemplarily, the degreasing agent of the present application comprises sodium silicate and sodium dodecyl sulfate. Exemplarily, in step 0333, the predetermined pH value of the degreasing treatment is greater than or equal to 10 and less than or equal to 12. The predetermined pH value can be 10, 10.22, 10.44, 10.67, 10.89, 11.11, 11.33, 11.56, 11.78 or 12. If the predetermined pH value of the degreasing treatment is less than 10, the degreasing agent has insufficient decontamination ability, resulting in the sandblasting residues, grease, fingerprints and organic contaminants remaining on the surface of the titanium substrate 31; if the predetermined pH value of the degreasing treatment is greater than 12, the degreasing agent is prone to corrode the surface of the titanium substrate 31, damaging the surface of the titanium substrate 31 after the sandblasting treatment. Therefore, the predetermined pH value of the degreasing treatment is greater than or equal to 10 and less than or equal to 12, which can not only remove the sandblasting residues, grease, fingerprints and organic contaminants on the surface of the titanium substrate 31, but also does not damage the surface of the titanium substrate 31.

[0088] Exemplarily, the predetermined temperature of step 0333, i.e., the predetermined temperature in the degreasing treatment, is greater than or equal to 40 degrees Celsius and less than or equal to 60 degrees Celsius. The predetermined temperature in the degreasing treatment can be 40 degrees Celsius, 42.22 degrees Celsius, 44.44 degrees Celsius, 46.67 degrees Celsius, 48.89 degrees Celsius, 51.11 degrees Celsius, 53.33 degrees Celsius, 55.56 degrees Celsius, 57.78 degrees Celsius or 60 degrees Celsius. If the predetermined temperature in the degreasing treatment is less than 40 degrees Celsius, the degreasing efficiency is low and the degreasing time is long; if the predetermined temperature in the degreasing treatment is greater than 60 degrees Celsius, the sodium silicate and the sodium dodecyl sulfate are prone to thermal decomposition, reducing the degreasing ability. Therefore, the predetermined temperature in the degreasing treatment is greater than or equal to 40 degrees Celsius and less than or equal to 60 degrees Celsius, which can maintain the degreasing speed of the degreasing agent and ensure the degreasing effect.

[0089] The surface activation treatment is used to remove the passivation layer on the surface of the titanium substrate 31 after the degreasing treatment. Exemplarily, the activator of the present application comprises nitric acid and sulfuric acid, the mass percentage of nitric acid in the activator is 10% to 20%, and exemplarily, the mass percentage of nitric acid in the activator is 5% to 6%. If the mass percentage of nitric acid in the activator is less than 10%, the passivation layer on the surface of the titanium substrate 31 cannot be effectively removed. If the mass percentage of nitric acid in the activator is greater than 20%, the titanium substrate 31 itself will be corroded. Therefore, the mass percentage of nitric acid in the activator is 10% to 20%, which can not only remove the passivation layer on the surface of the titanium substrate 31, but also does not damage the titanium substrate 31. The mass percentage of sulfuric acid in the activator is 5% to 6% respectively. If the mass percentage of sulfuric acid in the activator is less than 5%, the rate of activation reaction will slow down. If the mass percentage of nitric acid in the activator is greater than 6%, some side reactions will be easily triggered, such as reaction with impurity elements in the titanium substrate 31 to generate precipitates that are not easy to clean. Therefore, the mass percentage of sulfuric acid in the activator is 5% to 6%, which helps to remove the passivation layer and make the surface of the titanium substrate reach a good activation state.

[0090] Exemplarily, the predetermined temperature in step 0335, i.e., the predetermined temperature of the surface activation treatment, is greater than or equal to 40 degrees Celsius and less than or equal to 50 degrees Celsius. The predetermined temperature in the surface activation treatment can be 40 degrees Celsius, 42.22 degrees Celsius, 44.44 degrees Celsius, 46.67 degrees Celsius, 47.89 degrees Celsius, 48 degrees Celsius, 48.4 degrees Celsius, 48.9 degrees Celsius, 49.5 degrees Celsius or 50 degrees Celsius. If the predetermined temperature in the surface activation treatment is less than 40 degrees Celsius, the predetermined temperature is too low, which will cause the activation reaction rate to slow down and the efficiency of removing the passivation layer on the surface of the titanium substrate to decrease. If the predetermined temperature in the surface activation treatment is greater than 50 degrees Celsius, the predetermined temperature is too high, which will cause the nitric acid to decompose and volatilize, affecting the activation effect. The predetermined temperature of the surface activation treatment is greater than or equal to 40 degrees Celsius and less than or equal to 50 degrees Celsius, which can achieve a good activation effect in a relatively short time.

[0091] Please refer to Figure 2 and Figure 9 In some embodiments, step 039: the titanium substrate 31 on which the titanium dioxide film layer 33 with nanoscale pores is formed is subjected to post-treatment, comprising:

[0092] Step 0391: the titanium substrate 31 on which the titanium dioxide film layer 33 with nanoscale pores is formed is subjected to multi-stage countercurrent water washing at a predetermined temperature;

[0093] Step 0393: the titanium substrate 31 after multi-stage countercurrent water washing is subjected to ultrasonic water washing at a predetermined temperature; and

[0094] Step 0395: vacuum drying the titanium substrate 31 after the ultrasonic water washing at a predetermined temperature.

[0095] Specifically, in step 0391, the multi-stage countercurrent water washing is used to remove the residual alkali washing agent and reaction by-products on the surface of the titanium substrate 31 and in the nanoscale pores, so as to prevent the chemical residues from affecting the subsequent injection molding process. For example, the predetermined temperature in step 0391, i.e., the predetermined temperature of the multi-stage countercurrent water washing, is greater than or equal to 55 degrees Celsius and less than or equal to 75 degrees Celsius. The predetermined temperature of the multi-stage countercurrent water washing can be 55 degrees Celsius, 57.22 degrees Celsius, 59.44 degrees Celsius, 61.67 degrees Celsius, 63.89 degrees Celsius, 66.11 degrees Celsius, 68.33 degrees Celsius, 70.56 degrees Celsius, 72.78 degrees Celsius, or 75 degrees Celsius. If the predetermined temperature of the multi-stage countercurrent water washing is less than 55 degrees Celsius, the diffusion rate of water molecules is low, and the water washing efficiency is low. If the predetermined temperature of the multi-stage countercurrent water washing is greater than 75 degrees Celsius, high temperature can easily lead to a decrease in the stability of the pore walls of the nanoscale pores. Therefore, the predetermined temperature of the multi-stage countercurrent water washing is greater than or equal to 55 degrees Celsius and less than or equal to 75 degrees Celsius, which can maintain stable water washing efficiency and does not damage the nanoscale pores.

[0096] In step 0393, the ultrasonic water washing is used to strip the ultrafine particles (such as the aluminum oxide sandblasting dust that falls off) adsorbed on the surface of the titanium substrate 31 and in the nanoscale pores. The ultrasonic waves can use cavitation to generate periodic high / low pressure areas in the liquid, form microbubbles and collapse instantaneously, and the energy of the collapsing microbubbles can impact the ultrafine particles to strip the ultrafine particles. For example, the predetermined temperature in step 0393, i.e., the predetermined temperature of the ultrasonic water washing, is greater than or equal to 55 degrees Celsius and less than or equal to 75 degrees Celsius. The predetermined temperature of the ultrasonic water washing can be 55 degrees Celsius, 57.22 degrees Celsius, 59.44 degrees Celsius, 61.67 degrees Celsius, 63.89 degrees Celsius, 66.11 degrees Celsius, 68.33 degrees Celsius, 70.56 degrees Celsius, 72.78 degrees Celsius, or 75 degrees Celsius. If the predetermined temperature of the ultrasonic water washing is less than 55 degrees Celsius, the liquid viscosity is high, the ultrasonic energy is dissipated by the viscous resistance, and the cleaning efficiency is decreased. If the predetermined temperature of the ultrasonic water washing is greater than 75 degrees Celsius, the microbubbles are too active, and the energy of the collapsing microbubbles can easily lead to the fracture of the pore walls of the nanoscale pores. Therefore, the predetermined temperature of the ultrasonic water washing is greater than or equal to 55 degrees Celsius and less than or equal to 75 degrees Celsius, which can have sufficient efficiency to strip the ultrafine particles and maintain the integrity of the nanoscale pores.

[0097] In step 0395, the vacuum drying is used to remove the moisture in the surface and the nanoscale holes of the titanium substrate 31 after the ultrasonic water washing under the condition of negative pressure, so as to avoid the collapse of the nanoscale holes or the cracking of the oxidation layer caused by the high-temperature drying under normal pressure. Exemplarily, the predetermined temperature in step 0395, i.e., the predetermined temperature of the vacuum drying, is greater than or equal to 55 degrees Celsius and less than or equal to 75 degrees Celsius. The predetermined temperature of the vacuum drying can be 55 degrees Celsius, 57.22 degrees Celsius, 59.44 degrees Celsius, 61.67 degrees Celsius, 63.89 degrees Celsius, 66.11 degrees Celsius, 68.33 degrees Celsius, 70.56 degrees Celsius, 72.78 degrees Celsius or 75 degrees Celsius. If the predetermined temperature of the vacuum drying is less than 55 degrees Celsius, the drying efficiency is low and the drying time is long; if the predetermined temperature of the vacuum drying is greater than 75 degrees Celsius, the strength of the hole wall of the nanoscale hole is easily affected, resulting in the shrinkage of the pore size. The predetermined temperature of the vacuum drying is greater than or equal to 55 degrees Celsius and less than or equal to 75 degrees Celsius, which can not only have sufficient efficiency to dry the titanium substrate 31 after the ultrasonic water washing, but also maintain the integrity of the nanoscale hole.

[0098] The parameter characteristics of the titanium dioxide film layer 33 in the titanium alloy piece 30 obtained by performing steps 031 to 039 are introduced below.

[0099] Referring to Figure 3 In some embodiments, the thickness of the titanium dioxide film layer 33 ranges from 300 nm to 400 nm.

[0100] Specifically, the thickness of the titanium dioxide film layer 33 refers to the thickness of the titanium dioxide film layer 33 formed with the nanoscale holes. The thickness of the titanium dioxide film layer 33 can be 300 nm, 320 nm, 330 nm, 340 nm, 350 nm, 360 nm, 370 nm, 380 nm, 390 nm or 400 nm. If the thickness of the titanium dioxide film layer 33 is less than 300 nm, the thickness of the titanium dioxide film layer 33 is insufficient, which affects the combined thickness of the titanium dioxide film layer 33 and the plastic layer 50, and may cause the delamination of the composite member 100 during use. If the thickness of the titanium dioxide film layer 33 exceeds 400 nm, the strength of the titanium substrate 31 itself is easily reduced. Therefore, the thickness of the titanium dioxide film layer 33 is greater than or equal to 300 nm and less than or equal to 400 nm, which can not only form a titanium dioxide film layer 33 with sufficient thickness on the surface of the titanium substrate 31 to ensure the combined thickness with the plastic layer 50, but also maintain the strength of the titanium substrate 31 itself.

[0101] Referring to Figure 3 In some embodiments, the porosity of the titanium dioxide film layer 33 ranges from 20% to 50%.

[0102] Specifically, the porosity of the titanium dioxide film layer 33 can be 20%, 23%, 25%, 30%, 34%, 35%, 37%, 40%, 45%, or 50%. If the porosity of the titanium dioxide film layer 33 is less than 20%, the nanoscale pores account for too small a volume of the titanium dioxide film layer 33, and the bonding area with the plastic layer 50 is limited, making it difficult to form a firm bonding interface, resulting in a lower interfacial strength of the composite component 100, which is prone to phenomena such as delamination when subjected to external forces. If the porosity of the titanium dioxide film layer 33 exceeds 50%, the nanoscale pores account for too large a volume of the titanium dioxide film layer 33, resulting in a decrease in the structural strength of the titanium dioxide film layer 33. At the same time, too high a porosity can result in insufficient filling of the plastic layer 50 during the molding process, forming nanoscale pore defects. Therefore, the porosity of the titanium dioxide film layer 33 is greater than or equal to 20% and less than or equal to 50%, which can not only provide sufficient nanoscale pores on the basis of ensuring a certain structural strength of the titanium dioxide film layer 33, but also increase the bonding area with the plastic layer 50, so that the bonding strength between the titanium dioxide film layer 33 and the plastic layer 50 is high.

[0103] Referring to Figure 3 In some embodiments, the film layer hardness of the titanium dioxide film layer 33 is in the range of 900 Vickers hardness to 1050 Vickers hardness.

[0104] Specifically, the film layer hardness of the titanium dioxide film layer 33 can be 900 Vickers hardness, 915 Vickers hardness, 930 Vickers hardness, 945 Vickers hardness, 960 Vickers hardness, 975 Vickers hardness, 990 Vickers hardness, 1005 Vickers hardness, 1020 Vickers hardness, 1035 Vickers hardness, or 1050 Vickers hardness. If the film layer hardness of the titanium dioxide film layer 33 is less than 900 Vickers hardness, the titanium dioxide film layer 33 is prone to being scratched and worn during use, resulting in the structure of the nanoscale pores on the surface of the titanium dioxide film layer 33 being destroyed, reducing the bonding force with the plastic layer 50, and affecting the service life of the composite component 100. If the film layer hardness of the titanium dioxide film layer 33 is greater than 1050 Vickers hardness, the titanium dioxide film layer 33 can become more brittle, and cracks can easily occur when subjected to impact or temperature changes, which can also affect the service life of the composite component 100. Therefore, the film layer hardness of the titanium dioxide film layer 33 is greater than or equal to 900 Vickers hardness and less than or equal to 1050 Vickers hardness, which can not only ensure that the titanium dioxide film layer 33 has good wear resistance and scratch resistance to protect the nanoscale pores, but also avoid the brittleness becoming too large due to being too hard, ensuring the durability of the composite component 100.

[0105] Referring to Figure 3 In some embodiments, the alkali corrosion resistance of the titanium dioxide film layer 33 is in the range of 15 grams per square meter per hour to 20 grams per square meter per hour.

[0106] Specifically, the alkali corrosion resistance refers to the corrosion resistance of the titanium dioxide film layer 33 in an alkaline environment. The unit of the alkali corrosion resistance is “grams per square meter per hour (g / m 2 h)”, which represents the mass loss of the titanium dioxide film layer 33 per unit area (per square meter) per unit time (per hour) due to corrosion by alkaline substances. The value range of the alkali corrosion resistance of the titanium dioxide film layer 33 is the alkali corrosion resistance value of the titanium dioxide film layer 33. The alkali corrosion resistance value of the titanium dioxide film layer 33 can be 15 g / m

[0107] If the alkali corrosion resistance value of the titanium dioxide film layer 33 is less than 15 g / m

[0108] Please refer to Figure 3 In some embodiments, the test block tensile force value of the titanium dioxide film layer 33 under the preset conditions is in the range of 75 kgf to 85 kgf.

[0109] Specifically, the preset condition in the present embodiment refers to that a titanium test block (a titanium test block on which a titanium dioxide film layer 33 and nanoscale holes are formed) with a size (width*thickness*length) of 5mm*5mm*20mm is subjected to a tensile test. The test block tensile value of the titanium dioxide film layer 33 under the preset condition can be 75 kgf, 76 kgf, 77 kgf, 78 kgf, 79 kgf, 80 kgf, 81 kgf, 82 kgf, 83 kgf, 84 kgf or 85 kgf. If the test block tensile value is less than 75 kgf, it indicates that the bonding force between the titanium dioxide film layer 33 and the titanium substrate 31 is weak, and delamination or peeling phenomenon is likely to occur when the titanium dioxide film layer 33 is subjected to external stretching force, resulting in unstable structure of the composite component 100 and failing to meet the mechanical performance requirements in actual use. If the test block tensile value is greater than 85 kgf, it indicates that the bonding between the titanium dioxide film layer 33 and the titanium substrate 31 is too tight, and local damage of the titanium substrate 31 or the titanium dioxide film layer 33 itself is likely to occur when the material is subjected to impact or deformation, which cannot normally play the advantages of the composite material, and at the same time, can also affect the subsequent bonding performance with the plastic layer 50. Therefore, the test block tensile value of the titanium dioxide film layer 33 under the preset condition is greater than or equal to 75 kgf and less than or equal to 85 kgf, and the titanium dioxide film layer 33 and the titanium substrate 31 have moderate bonding force, so that the structure of the composite component 100 made therefrom is relatively stable.

[0110] Referring to Figures 4 to 7 , and Figure 9 In some embodiments, step 01: providing an aluminum alloy piece 10, comprising:

[0111] Step 011: providing an aluminum substrate 11;

[0112] Step 013: pretreating the aluminum substrate 11;

[0113] Step 015: under the conditions of a predetermined temperature and a predetermined voltage, using an additive to perform phosphoric acid anodic oxidation etching treatment on the pretreated aluminum substrate 11 for a preset time length to form an aluminum oxide film layer 13 on the aluminum substrate 11, the additive comprising phosphoric acid, cerium ethylenediaminetetraacetate, sodium dihydrogen phosphate, polyvinylpyrrolidone and deionized water, the mass percentage of the phosphoric acid in the additive being 10% to 20%, the mass percentage of the cerium ethylenediaminetetraacetate in the additive being 1% to 2%, the mass percentage of the sodium dihydrogen phosphate in the additive being 1% to 2%, and the mass percentage of the polyvinylpyrrolidone in the additive being 5% to 10%; and

[0114] Step 017: drying the aluminum substrate 11 on which the aluminum oxide film layer 13 is formed at a preset temperature to obtain the aluminum alloy piece 10.

[0115] Specifically, in some embodiments, 013: pretreating the aluminum substrate 11, comprising:

[0116] Step 0131: degreasing the aluminum substrate 11 with a degreasing agent having a preset pH value;

[0117] Step 0133: alkali cleaning the aluminum substrate 11 after the degreasing treatment with an alkaline solution; and

[0118] Step 0135: acid cleaning the aluminum substrate 11 after the alkali cleaning with an acidic solution.

[0119] In step 0131, the preset pH value is greater than or equal to 10 and less than or equal to 13. The predetermined pH value for the degreasing treatment is greater than or equal to 10 and less than or equal to 13. The predetermined pH value can be 10, 10.22, 10.44, 10.67, 10.89, 11.11, 11.33, 12.56, 12.78, or 13. If the predetermined pH value for the degreasing treatment is less than 10, the degreasing agent has insufficient decontamination ability, resulting in the presence of sandblasting residues, grease, fingerprints, and organic contaminants on the surface of the aluminum substrate 11. If the predetermined pH value for the degreasing treatment is greater than 13, the degreasing agent easily corrodes the surface of the titanium substrate 31, damaging the surface of the aluminum substrate 11 after the sandblasting treatment. Therefore, the predetermined pH value for the degreasing treatment is greater than or equal to 10 and less than or equal to 13, which can remove the sandblasting residues, grease, fingerprints, and organic contaminants on the surface of the aluminum substrate 11 without damaging the surface of the aluminum substrate 11. In step 0133, the NaOH solution is used to alkali clean the aluminum substrate 11 after the degreasing treatment, which can remove impurities that can react with NaOH and activate the surface of the aluminum substrate 11. In step 0135, the H2SO4 solution is used to acid clean the aluminum substrate 11 after the alkali cleaning, which can remove impurities that can react with H2SO4 and activate the surface of the aluminum substrate 11.

[0120] In step 015, the additive is used to form the aluminum oxide film layer 13 on the aluminum substrate 11 and form the honeycomb nanostructure on the aluminum oxide film layer 13. The honeycomb nanostructure refers to a plurality of nanoscale pores.

[0121] The phosphoric acid can dissociate hydrogen ions (H +) and phosphate (PO43-), promoting anodic oxidation reaction, and the reaction of phosphate with newly generated AIO can generate soluble AlPO, controlling the dissolution rate of the film layer and forming nanoscale pores. Exemplarily, the mass percentage of phosphoric acid in the additive is 10% to 20%. The mass percentage of phosphoric acid can be 10%, 11.11%, 12.22%, 13.33%, 14.44%, 15.56%, 16.67%, 17.78%, 18.89%, or 20%. If the mass percentage of phosphoric acid in the additive is less than 10%, the acidic medium is less and the anodic oxidation reaction ability is low, which can lead to insufficient thickness of the aluminum oxide film layer 13; if the mass percentage of phosphoric acid in the additive is greater than 20%, it can lead to dissolution of the aluminum oxide film layer 13. Therefore, the mass percentage of phosphoric acid in the additive is greater than or equal to 10% and less than or equal to 20%, which can control the rate of anodic oxidation reaction to form an aluminum oxide film layer 13 with a thickness.

[0122] Please refer to Figure 6 , cerium ethylenediaminetetraacetate (Ce-EDTA) can dissociate Ce 3+ in the additive 3+ , which can form a stable complex with PO43- to inhibit the erosion of free PO43- to the pore wall and reduce lateral pore expansion. EDTA is used for double coordination to regulate the diffusion rate of Al 3+ and stabilize the growth rate of the aluminum oxide film layer 13, and can also balance Ce 3+ to avoid precipitation of cerium salts formed by Ce 3+ . Exemplarily, the mass percentage of cerium ethylenediaminetetraacetate in the additive is 1% to 2%. The mass percentage of cerium ethylenediaminetetraacetate can be 1%, 1.11%, 1.22%, 1.33%, 1.44%, 1.56%, 1.67%, 1.78%, 1.89%, or 2%. If the mass percentage of cerium ethylenediaminetetraacetate in the additive is less than 1%, the concentration of Ce 3+ is insufficient, which is not good for reducing lateral pore expansion; if the mass percentage of cerium ethylenediaminetetraacetate in the additive is greater than 2%, the precipitation of Ce 3+ salts formed by Ce - is easy to block the nanoscale pores. Therefore, the mass percentage of cerium ethylenediaminetetraacetate in the additive is greater than or equal to 1% and less than or equal to 2%, which can control the growth rate of the aluminum oxide film layer 13 and form stable nanoscale pores.

[0123] Sodium phosphate has a buffering effect, and sodium phosphate can dissociate H2PO4 - and Na +The ions can stabilize the PH value of the additive at weak acidity (PH≈4.5-7), avoid the uneven dissolution of the aluminum oxide film layer 13 caused by the over-acid or over-alkali additive, help the dynamic balance of the growth and dissolution of the aluminum oxide film layer 13, and thus help the uniform expansion of the nano-scale pores. Exemplarily, the mass percentage of sodium dihydrogen phosphate in the additive is 1% to 2%. The mass percentage of sodium dihydrogen phosphate can be 1%, 1.11%, 1.22%, 1.33%, 1.44%, 1.56%, 1.67%, 1.78%, 1.89%, or 2%. If the mass percentage of sodium dihydrogen phosphate in the additive is less than 1%, the buffering effect of sodium dihydrogen phosphate is limited, and the additive is prone to be over-acid, which causes the uneven dissolution of the aluminum oxide film layer 13 and the collapse of the nano-scale pores. If the mass percentage of sodium dihydrogen phosphate in the additive is greater than 2%, the additive is prone to be over-alkali, which also causes the uneven dissolution of the aluminum oxide film layer 13. Therefore, the mass percentage of sodium dihydrogen phosphate in the additive is greater than or equal to 1% and less than or equal to 2%, which can control the growth rate of the aluminum oxide film layer 13 and form stable nano-scale pores.

[0124] Referring to Figure 7 , (a) is a schematic diagram of providing an aluminum alloy part by using a conventional manufacturing method; and (b) is a schematic diagram of providing an aluminum alloy part by using the method in 011-017. Polyvinylpyrrolidone (PVP, K30, 40000) is a water-soluble dispersant. The K value in K30 refers to the relative viscosity characteristic value of the PVP aqueous solution, which can represent the average molecular weight of the PVP. The larger the K value, the higher the viscosity of the PVP and the stronger the adhesion. 40000 is the average molecular weight of the PVP. The PVP can provide stable ion diffusion, regulate the diffusion path of Al 3+ , and make the growth rate and the dissolution rate of the aluminum oxide film layer 13 reach a stable speed difference, so as to produce nano-scale pores with uniform pore size and an aluminum oxide film layer 13 with high film thickness.

[0125] Exemplarily, the mass percentage of PVP in the additive is 5% to 10%. The mass percentage of PVP in the additive can be 5%, 5.56%, 6.11%, 6.67%, 7.22%, 7.78%, 8.33%, 8.89%, 9.44%, or 10%. If the mass percentage of PVP in the additive is less than 5%, the Al 3+ is not dispersed enough, the Al 3+The additive is not uniform in the additive, causing the growth of the nanoscale holes to be uneven; if the mass percentage of PVP in the additive is greater than 10%, the viscosity of the additive is too high, which can easily block the nanoscale holes. Therefore, the mass percentage of PVP in the additive is greater than or equal to 5% and less than or equal to 10%, which can provide a uniform growth environment for the nanoscale holes and the aluminum oxide film layer 13, thereby producing nanoscale holes with uniform pore sizes and an aluminum oxide film layer 13 with high film thickness. Deionized water has few impurities, which can reduce the impact of impurities on the additive.

[0126] Exemplarily, the predetermined temperature in step 015, i.e., the predetermined temperature of the additive, is greater than or equal to 15 degrees Celsius and less than or equal to 25 degrees Celsius. The predetermined temperature of the additive can be 15.00 degrees Celsius, 16.11 degrees Celsius, 17.22 degrees Celsius, 18.33 degrees Celsius, 19.44 degrees Celsius, 20.56 degrees Celsius, 21.67 degrees Celsius, 22.78 degrees Celsius, 23.89 degrees Celsius, or 25.00 degrees Celsius. If the predetermined temperature of the additive is less than 15 degrees Celsius, the reaction rate of the additive is low; if the predetermined temperature of the additive is greater than 25 degrees Celsius, the components in the additive are easily decomposed by heat, which affects the reaction efficiency. Therefore, the predetermined temperature of the additive is greater than or equal to 15 degrees Celsius and less than or equal to 90 degrees Celsius, which can not only ensure the reaction rate of the additive, but also avoid the decomposition of the components in the additive by heat, thereby promoting the uniform growth of the titanium dioxide film layer 33.

[0127] Exemplarily, the predetermined voltage in step 015, i.e., the predetermined voltage of the additive, is greater than or equal to 23 volts and less than or equal to 27 volts. The predetermined voltage of the additive can be 23 volts, 23.44 volts, 23.89 volts, 24.33 volts, 24.78 volts, 25.22 volts, 25.67 volts, 26.11 volts, 26.56 volts, or 27 volts. If the predetermined voltage of the additive is less than 23 volts, the electric field strength is insufficient, and the oxidation reaction is easily stagnant; if the predetermined voltage of the additive is greater than 27 volts, the electric field strength is too large, and the pore wall of the nanoscale hole is easily broken. Therefore, the predetermined voltage of the additive is greater than or equal to 23 volts and less than or equal to 27 volts, which can maintain a stable electric field strength and is conducive to the smooth progress of the oxidation reaction.

[0128] Exemplarily, the preset time length in step 015, i.e., the preset time length of the additive etching treatment, is greater than or equal to 25 minutes and less than or equal to 35 minutes. The preset time length of the additive etching treatment can be 25 minutes, 26.11 minutes, 27.22 minutes, 28.33 minutes, 29.44 minutes, 30.56 minutes, 31.67 minutes, 32.78 minutes, 33.89 minutes, or 35 minutes. If the preset time length of the additive etching treatment is less than 25 minutes, the etching time is too short, and the thickness of the titanium dioxide film layer 33 is not enough; if the preset time length of the additive etching treatment is greater than 35 minutes, the etching time is too long, and the pore wall of the nanoscale hole is easy to be dissolved. Therefore, the preset time length of the additive etching treatment is greater than or equal to 25 minutes and less than or equal to 35 minutes, which can not only ensure that the titanium dioxide film layer 33 has sufficient thickness, but also form the nanoscale hole meeting the requirements.

[0129] Exemplarily, the preset temperature in step 017, i.e., the preset temperature of drying the aluminum substrate 11 on which the aluminum oxide film layer 13 is formed, is greater than or equal to 55 degrees Celsius and less than or equal to 65 degrees Celsius. The preset temperature of drying can be 55.00 degrees Celsius, 56.11 degrees Celsius, 57.22 degrees Celsius, 58.33 degrees Celsius, 59.44 degrees Celsius, 60.56 degrees Celsius, 61.67 degrees Celsius, 62.78 degrees Celsius, 63.89 degrees Celsius, or 65.00 degrees Celsius. If the preset temperature of drying is less than 55 degrees Celsius, the reaction rate of the additive is low; if the preset temperature of drying is greater than 65 degrees Celsius, the components in the additive are easy to be decomposed by heat, affecting the reaction efficiency. Therefore, the preset temperature of drying is greater than or equal to 55 degrees Celsius and less than or equal to 65 degrees Celsius, which can not only ensure the reaction rate of the additive, but also avoid the components in the additive from being decomposed by heat, promoting the uniform growth of the aluminum oxide film layer 13.

[0130] The aluminum substrate 11 of the present application forms the aluminum oxide film layer 13 on the surface through phosphoric acid anodic oxidation etching, which can produce nanoscale holes with uniform pore size, expand the pore size, and improve the mechanical properties of the aluminum alloy piece 10.

[0131] The following introduces the parameter characteristics of the aluminum oxide film layer 13 in the aluminum alloy piece 10 obtained by performing steps 011 to 017.

[0132] Please refer to Figure 5 In some embodiments, the thickness of the aluminum oxide film layer 13 is in the range of 500 nanometers to 950 nanometers.

[0133] Specifically, the thickness of the aluminum oxide film layer 13 can be 500 nm, 520 nm, 630 nm, 640 nm, 750 nm, 760 nm, 870 nm, 880 nm, 890 nm, or 950 nm. If the thickness of the aluminum oxide film layer 13 is less than 500 nm, the aluminum oxide film layer 13 is insufficient in thickness, affecting the combined thickness of the aluminum oxide film layer 13 and the plastic layer 50, and possibly leading to delamination of the composite component 100 during use. If the thickness of the aluminum oxide film layer 13 exceeds 950 nm, the strength of the aluminum base material 11 itself is likely to decrease. Therefore, the thickness of the aluminum oxide film layer 13 is greater than or equal to 500 nm and less than or equal to 950 nm, which can form an aluminum oxide film layer 13 of sufficient thickness on the surface of the aluminum base material 11, ensure the combined thickness of the aluminum oxide film layer 13 and the plastic layer 50, and maintain the strength of the aluminum base material 11 itself.

[0134] Referring to Figure 5 In some embodiments, the pore size of the aluminum oxide film layer 13 ranges from 40 nm to 60 nm.

[0135] Specifically, the pore size of the aluminum oxide film layer 13 can be 40 nm, 43 nm, 45 nm, 46 nm, 52 nm, 55 nm, 56 nm, 57 nm, 59 nm, or 60 nm. If the pore size of the aluminum oxide film layer 13 is less than 40 nm, the nanoscale pores are too small for the plastic layer 50 to enter, making it difficult for the aluminum oxide film layer 13 and the plastic layer 50 to form a firm bonding interface, and leading to a low interfacial strength of the composite component 100, which is prone to delamination and other phenomena when subjected to external forces. If the pore size of the aluminum oxide film layer 13 is greater than 60 nm, the nanoscale pores are too large, leading to a decrease in the structural strength of the aluminum oxide film layer 13, and possibly resulting in insufficient filling of the plastic layer 50 during molding, forming nanoscale pore defects. Therefore, the pore size of the aluminum oxide film layer 13 is greater than or equal to 40 nm and less than or equal to 60 nm, which can provide nanoscale pores of sufficient size on the basis of ensuring a certain structural strength of the aluminum oxide film layer 13, increase the bonding area with the plastic layer 50, and increase the bonding strength between the aluminum oxide film layer 13 and the plastic layer 50.

[0136] Referring to Figure 5 In some embodiments, the film hardness of the aluminum oxide film layer 13 ranges from 500 Vickers hardness to 650 Vickers hardness.

[0137] Specifically, the film layer hardness of the aluminum oxide film layer 13 can be 500 Vickers hardness, 515 Vickers hardness, 530 Vickers hardness, 545 Vickers hardness, 560 Vickers hardness, 575 Vickers hardness, 590 Vickers hardness, 605 Vickers hardness, 620 Vickers hardness, 635 Vickers hardness, or 650 Vickers hardness. If the film layer hardness of the aluminum oxide film layer 13 is less than 500 Vickers hardness, the aluminum oxide film layer 13 is easily scratched and worn during use, resulting in the structure of the nanoscale holes on the surface of the aluminum oxide film layer 13 being destroyed, reducing the bonding force with the plastic layer 50, and affecting the service life of the composite component 100. If the film layer hardness of the aluminum oxide film layer 13 is greater than 650 Vickers hardness, the aluminum oxide film layer 13 can become more brittle, and cracks can easily occur when impacted or when the temperature changes, thereby affecting the service life of the composite component 100. Therefore, the film layer hardness of the aluminum oxide film layer 13 is greater than or equal to 900 Vickers hardness and less than or equal to 1050 Vickers hardness, which can not only ensure that the aluminum oxide film layer 13 has good wear resistance and scratch resistance to protect the nanoscale holes, but also avoid the brittleness becoming too large due to excessive hardness, thereby ensuring the durability of the composite component 100.

[0138] Referring to Figure 5 In some embodiments, the alkali corrosion resistance of the aluminum oxide film layer 13 is in the range of 1.3 grams per square meter per hour to 2.3 grams per square meter per hour.

[0139] Specifically, the alkali corrosion resistance of the aluminum oxide film layer 13 can be 1.3 grams per square meter per hour, 1.4 grams per square meter per hour, 1.56 grams per square meter per hour, 1.6 grams per square meter per hour, 1.7 grams per square meter per hour, 1.76 grams per square meter per hour, 1.8 grams per square meter per hour, 1.86 grams per square meter per hour, 1.9 grams per square meter per hour, or 2.3 grams per square meter per hour. If the alkali corrosion resistance of the aluminum oxide film layer 13 is less than 1.3 grams per square meter per hour, the aluminum oxide film layer 13 is easily eroded by alkaline substances, and the nanoscale holes are easily damaged. If the alkali corrosion resistance of the aluminum oxide film layer 13 is greater than 2.3 grams per square meter per hour, the aluminum oxide film layer 13 is too resistant to alkali, and it is difficult to form a sufficient number and size of nanoscale holes. Therefore, the alkali corrosion resistance of the aluminum oxide film layer 13 is greater than or equal to 15 grams per square meter per hour and less than or equal to 20 grams per square meter per hour, which can ensure that the aluminum oxide film layer 13 is etched at an appropriate rate to form uniform and appropriate nanoscale holes, while also having certain alkali corrosion resistance during subsequent use, thereby ensuring the performance stability of the composite component 100 in different environments.

[0140] Referring to Figure 5 In some embodiments, the test block tensile force value of the aluminum oxide film layer 13 under the predetermined conditions is in the range of 45 kilograms of force to 55 kilograms of force.

[0141] Specifically, the preset condition in the present embodiment refers to that the aluminum test block with a size (width*thickness*length) of 5mm*5mm*20mm (the aluminum test block is formed with the alumina film layer 13 and the nano-scale holes) is subjected to a tensile test. The test block tensile value of the alumina film layer 13 under the preset condition can be 45 kgf, 46 kgf, 47 kgf, 48 kgf, 49 kgf, 50 kgf, 51 kgf, 52 kgf, 53 kgf, 54 kgf or 55 kgf. If the test block tensile value is less than 45 kgf, it indicates that the bonding force between the alumina film layer 13 and the aluminum substrate 11 is weak, and delamination or peeling phenomenon is prone to occur when subjected to external tensile force, resulting in unstable structure of the composite component 100 and failing to meet the mechanical performance requirements in actual use. If the test block tensile value is greater than 55 kgf, it indicates that the bonding between the alumina film layer 13 and the aluminum substrate 11 is too tight, and when the material is subjected to impact or deformation, local damage of the aluminum substrate 11 or the alumina film layer 13 itself can occur, which cannot normally play the advantages of composite materials, and can also affect the subsequent bonding performance with the plastic layer 50. Therefore, the test block tensile value of the alumina film layer 13 under the preset condition is greater than or equal to 45 kgf and less than or equal to 55 kgf, and the alumina film layer 13 and the aluminum substrate 11 have moderate bonding force, so that the composite component 100 made thereby has stable structure.

[0142] Please refer to Figures 8 to 11 In some embodiments, in step 05, the in-mold injection molding process uses a preset dynamic pressure holding control curve to control the pressure in the mold during the injection molding process.

[0143] Specifically, as described above, the in-mold injection molding process fixes the titanium alloy part 30 and the aluminum alloy part 10 in the injection mold, injects the molten plastic layer 50 into the mold cavity under high pressure, combines the plastic with the titanium alloy part 30 and the aluminum alloy part 10, and forms the composite component 100 after cooling and solidification.

[0144] The preset dynamic pressure maintaining control curve refers to that in the injection molding process, the pressure in the injection mold is controlled by the injection molding machine according to the preset pressure change curve. In the pressure maintaining stage of the injection molding, the pressure maintaining curve can be a constant pressure or a pressure curve changing with time. Exemplarily, the dynamic pressure maintaining control curve of the present application is in time sequence: first maintaining at a first pressure (80 MPa) for a first preset time (2 s), then dropping to a second pressure (60 MPa) for a second preset time (3 s), and then dropping to a third pressure (30 MPa) for a third preset time (5 s). The dynamic pressure maintaining control curve can optimize the flow and filling process of the plastic layer 50, reduce the volume shrinkage difference when the plastic layer 50 is combined with the titanium alloy piece 30 and the aluminum alloy piece 10 respectively, and the plastic layer 50 can better diffuse in the nano-scale holes and discharge the gas in the nano-scale holes, so that the plastic layer 50 can be more tightly combined with the titanium alloy piece 30 and the aluminum alloy piece 10 respectively.

[0145] In the in-mold injection molding process, the composite component 100 is formed by the plastic layer 50 between the titanium alloy piece 30 and the aluminum alloy piece 10 using the preset dynamic pressure maintaining control curve, which can form a composite component 100 with high strength, high forming rate and good density. After the composite component 100 is arranged at the corner of the shell 1000, the deformation rate at the corner can be reduced, the airproof rate of the shell 1000 can be improved, and the strength of the shell 1000 can be improved.

[0146] Please refer to Figures 8 to 11 In some embodiments, step 05: forming a composite component 100 by molding a plastic layer 50 between the titanium alloy piece 30 and the aluminum alloy piece 10 through an in-mold injection molding process, comprises:

[0147] Step 051: preheating the mold for a predetermined time using a preset preheating method, so that the temperature of the mold reaches a target temperature;

[0148] Step 053: placing the titanium alloy piece 30 and the aluminum alloy piece 10 into the mold;

[0149] Step 055: injecting molten plastic between the titanium alloy piece 30 and the aluminum alloy piece 10 in the mold using a barrel with a preset temperature, and controlling the pressure in the mold according to the dynamic pressure maintaining control curve; and

[0150] Step 057: after filling the molten plastic between the titanium alloy piece 30 and the aluminum alloy piece 10 in the mold, gradient cooling the molten plastic to obtain a composite component 100.

[0151] Specifically, in step 051, the preheating is used to make the mold have a target temperature, so as to avoid the molten plastic being cooled after entering the mold, affecting the flowability of the molten plastic into the nanoscale holes. Exemplarily, the preheating method of the present application is vacuum drying, the mold is uniformly heated in a vacuum environment, and the vacuum drying can quickly remove the moisture and impurities on the surface and inside of the mold, improving the drying efficiency. Exemplarily, the preheating time in step 051 is 2 hours, so that the mold can be fully preheated, and the temperature of each position of the mold is uniform. Exemplarily, the target temperature in step 051 is 120 degrees Celsius, so that the integrity of the titanium alloy part 30, the aluminum alloy part 10 and the structure of the molten plastic can be ensured, and the temperature difference between the molten plastic and the mold can be reduced, ensuring the flowability of the molten plastic into the nanoscale holes.

[0152] The dynamic pressure maintaining control curve is as described above, which will not be repeated here. Exemplarily, the plastic of the present application selects polybutylene terephthalate (PBT), which has good flowability and can fully fill the nanoscale holes. Exemplarily, in step 055, the preset temperature of the barrel is greater than or equal to 120 degrees Celsius and less than or equal to 250 degrees Celsius. The preset temperature of the barrel can be 120 degrees Celsius, 134.44 degrees Celsius, 148.89 degrees Celsius, 163.33 degrees Celsius, 177.78 degrees Celsius, 192.22 degrees Celsius, 206.67 degrees Celsius, 221.11 degrees Celsius, 235.56 degrees Celsius or 250 degrees Celsius. If the preset temperature of the barrel is less than 120 degrees Celsius, the flowability of the plastic is not enough, and if the preset temperature of the barrel is greater than 250 degrees Celsius, the molten plastic is prone to decomposition. Therefore, the preset temperature of the barrel is greater than or equal to 120 degrees Celsius and less than or equal to 250 degrees Celsius, which can ensure that the molten PBT has stable properties and good flowability.

[0153] Gradient cooling refers to cooling the mold at different cooling rates at different times after the molten plastic fills the space between the titanium alloy part 30 and the aluminum alloy part 10. Exemplarily, the present application adopts two different cooling rates (a first cooling rate and a second cooling rate). The first cooling rate is 20 degrees Celsius per minute, and the second cooling rate is 5 degrees Celsius per minute. More specifically, the mold is first cooled at a cooling rate of 20 degrees Celsius per minute, and then cooled at a cooling rate of 5 degrees Celsius per minute after a certain time, so as to reduce the warping deformation of the composite component 100.

[0154] It can be understood that the above embodiments can be freely combined, and at least have the beneficial effects of the combined embodiments themselves, which are not described here. Below are some combinations of the present application. It can be understood that the embodiments below at least have the beneficial effects of the combined embodiments involving the above embodiments themselves.

[0155] Please refer to Figure 1 , Figures 4 to 7 , and Figure 9 The present application also provides a manufacturing method of a composite component. The manufacturing method comprises:

[0156] Step 01: providing an aluminum alloy piece 10, the aluminum alloy piece 10 comprising an aluminum base material 11 and an aluminum oxide film layer 13 disposed on the aluminum base material 11;

[0157] Step 03: providing a titanium alloy piece 30, the titanium alloy piece 10 comprising a titanium base material 31 and a titanium dioxide film layer 33 disposed on the titanium base material 31; and

[0158] Step 05: forming a plastic layer 50 between the titanium alloy piece 30 and the aluminum alloy piece 10 by an in-mold injection molding process to form a composite component 100.

[0159] Among them, step 01 includes the steps in 011, 013, 015 and 017 described above, which are not described here. Step 03 can adopt a traditional method, as long as it can ensure that the provided titanium alloy piece 30 comprises a titanium base material 31 and a titanium dioxide film layer 33 disposed on the titanium base material 31. Step 05 can also adopt a traditional step, as long as it can ensure that the composite component 100 in the sandwich structure of aluminum alloy-plastic layer-titanium alloy is formed.

[0160] Please refer to Figure 1 , Figure 8 and Figure 9 The present application also provides a manufacturing method of a composite component. The manufacturing method comprises:

[0161] Step 01: providing an aluminum alloy piece 10, the aluminum alloy piece 10 comprising an aluminum base material 11 and an aluminum oxide film layer 13 disposed on the aluminum base material 11;

[0162] Step 03: providing a titanium alloy piece 30, the titanium alloy piece 10 comprising a titanium base material 31 and a titanium dioxide film layer 33 disposed on the titanium base material 31; and

[0163] Step 05: forming a plastic layer 50 between the titanium alloy piece 30 and the aluminum alloy piece 10 by an in-mold injection molding process to form a composite component 100.

[0164] Wherein, step 01 comprises 011, 013, 015 and 017 described above, which will not be repeated here; step 03 can adopt a traditional step, which only needs to ensure that the provided titanium alloy piece 30 comprises a titanium base material 31 and a titanium dioxide film layer 33 arranged on the titanium base material 31. Step 05 comprises 051, 053, 055 and 057 described above, which will not be repeated here.

[0165] Please refer to Figure 1 , Figure 8 and Figure 9 , the application also provides a manufacturing method of a composite component. The manufacturing method comprises:

[0166] Step 01: providing an aluminum alloy piece 10, which comprises an aluminum base material 11 and an aluminum oxide film layer 13 arranged on the aluminum base material 11;

[0167] Step 03: providing a titanium alloy piece 30, which comprises a titanium base material 31 and a titanium dioxide film layer 33 arranged on the titanium base material 31; and

[0168] Step 05: forming a plastic layer 50 between the titanium alloy piece 30 and the aluminum alloy piece 10 by an in-mold injection molding process to form a composite component 100.

[0169] Wherein, step 01 can adopt a traditional step, which only needs to ensure that the provided aluminum alloy piece 10 comprises an aluminum base material 11 and an aluminum oxide film layer 13 arranged on the aluminum base material 11; step 05 comprises 033, 035, 037 and 039 described above, which will not be repeated here. Step 05 comprises steps 051, 053, 055 and 057 described above, which will not be repeated here.

[0170] The following table is the test result of the composite component formed by the manufacturing method of the composite component.

[0171]

[0172]

[0173] For example 4, in a test method, a titanium test block with a size of 5*5*20mm and an aluminum test block with a size of 5*5*20mm are prepared. The titanium test block is a titanium alloy piece 30 with a titanium dioxide film layer 33 with nanoscale pores prepared by example 4. The aluminum test block is an aluminum alloy piece with an aluminum oxide film layer on a traditional aluminum base material. A plastic layer is formed between the titanium alloy piece 30 and the aluminum alloy piece by an in-mold injection molding process to form a composite component 100. The composite component 100 is formed in the fillet of the body 300.

[0174] The tensile test result of the composite component 100 is that the test block tensile value is 40 kgf, the test block air resistance is less than 0.4 kPa, and the R-angle impact deformation rate is 25%.

[0175] For example 3, in a test mode, a titanium test block with a size of 5*5*20 mm and an aluminum test block with a size of 5*5*20 mm are prepared, the titanium test block is a titanium alloy piece with a titanium dioxide film layer with holes on a titanium base prepared by a conventional scheme, and the aluminum test block is an aluminum alloy piece 10 with an aluminum oxide film layer 13 on an aluminum base 11 prepared by example 3. A plastic layer is formed between the titanium alloy piece and the aluminum alloy piece 10 by an in-mold injection molding process to form a composite component 100. The composite component 100 is formed on the round corner of the body 300.

[0176] The tensile test result of the composite component 100 is that the test block tensile value is 50 kgf, the test block air resistance is less than 0.4 kPa, and the R-angle impact deformation rate is 22%.

[0177] For example 3, in a test mode, a titanium test block with a size of 5*5*20 mm and an aluminum test block with a size of 5*5*20 mm are prepared, the titanium test block is a titanium alloy piece with a titanium dioxide film layer with holes on a titanium base prepared by a conventional scheme, and the aluminum test block is an aluminum alloy piece with an aluminum oxide film layer on an aluminum base prepared by a conventional scheme. A plastic layer 50 is formed between the titanium alloy piece and the aluminum alloy piece by an in-mold injection molding process to form a composite component 100. The composite component 100 is formed on the round corner of the body 300.

[0178] The tensile test result of the composite component 100 is that the test block tensile value is 40 kgf, the test block air resistance is less than 0.3 kPa, and the R-angle impact deformation rate is 28%.

[0179] For example 3, in a test mode, a titanium test block with a size of 5*5*20 mm and an aluminum test block with a size of 5*5*20 mm are prepared, the titanium test block is a titanium alloy piece with a titanium dioxide film layer with holes on a titanium base prepared by a conventional scheme, and the aluminum test block is an aluminum alloy piece with an aluminum oxide film layer on an aluminum base prepared by a conventional scheme. A plastic layer 50 is formed between the titanium alloy piece and the aluminum alloy piece by an in-mold injection molding process to form a composite component 100. The composite component 100 is formed on the round corner of the body 300.

[0180] The tensile test result of the composite component 100 is that the test block tensile value is 65 kgf, the test block air resistance is less than 0.1 kPa, and the R-angle impact deformation rate is 8%.

[0181] For example 7, in one test mode, a titanium test block with a size of 5*5*20mm and an aluminum test block with a size of 5*5*20mm are prepared, the titanium test block is the titanium alloy piece 30 with the nano-porous titanium dioxide film layer 33 prepared in example 6, and the aluminum test block is the aluminum alloy piece 10 with the aluminum oxide film layer 13 prepared in example 6. The plastic layer 50 is formed between the titanium alloy piece 30 and the aluminum alloy piece 10 by the in-mold injection molding process to form the composite component 100. The composite component 100 is formed in the fillet of the body 300.

[0182] The tensile test result of the composite component 100 is that the test block tensile value is 70kgf, the test block air resistance is less than 0.03kpa, and the R-angle impact deformation rate is 3%.

[0183] The tensile test result of the conventional scheme is that the test block tensile value is 40kgf, the test block air resistance is less than 0.5kpa, and the R-angle impact deformation rate is 38%.

[0184] Referring to Figure 9 The application also provides a composite component 100. The composite component 100 is prepared by the manufacturing method of any one of the above embodiments.

[0185] Specifically, the composite component 100 is formed by forming the plastic layer 50 between the titanium alloy piece 30 and the aluminum alloy piece 10, which can form a composite component 100 with higher strength and less deformation compared to the aluminum alloy piece 10 itself.

[0186] Referring to Figure 9 The application also provides a composite component 100. The composite component 100 includes an aluminum alloy piece 10, a titanium alloy piece 30, and a plastic layer 50. The aluminum alloy piece 10 includes an aluminum base material 11 and an aluminum oxide film layer 13 disposed on the aluminum base material 11. The titanium alloy piece 30 includes a titanium base material 31 and a titanium dioxide film layer 33 disposed on the titanium base material 31, the thickness of the titanium dioxide film layer 33 is in a range of 300nm to 400nm, and the porosity of the titanium dioxide film layer 33 is in a range of 20% to 50%. The plastic layer 50 is disposed between the titanium alloy piece 30 and the aluminum alloy piece 10.

[0187] Specifically, the thickness of the titanium dioxide film layer 33 is greater than or equal to 300nm and less than or equal to 400nm, which can form a titanium dioxide film layer 33 with sufficient thickness on the surface of the titanium base material 31 to ensure the combined thickness with the plastic layer 50, and can also maintain the strength of the titanium base material 31 itself. The porosity of the titanium dioxide film layer 33 is greater than or equal to 20% and less than or equal to 50%, which can provide sufficient nano-porous holes on the basis of ensuring a certain structural strength of the titanium dioxide film layer 33, and can also increase the combined area with the plastic layer 50 to make the combined strength between the titanium dioxide film layer 33 and the plastic layer 50 high.

[0188] The composite component 100 is arranged at the corner of the shell 1000, so as to reduce the deformation rate of the corner, improve the airproof performance of the shell 1000, and improve the strength of the shell 1000.

[0189] Referring to Figure 12 The application further provides a shell 1000, which comprises a body 300 and the composite component 100 according to any one of the above embodiments.

[0190] Specifically, the composite component 100 is formed by molding a plastic layer 50 between the titanium alloy piece 30 and the aluminum alloy piece 10, so as to improve the strength of the shell 1000, improve the compactness and the forming yield when the composite component 100 is connected to the body 300.

[0191] Referring to Figure 12 In some embodiments,

[0192] The application further provides a shell 1000, which comprises a body 300, a frame 500 and a composite component 100. The frame 500 is connected to the body 300, and the frame 500 comprises a first frame 510, a connecting frame 530 and a second frame 550. The first frame 510 and the second frame 550 are arranged at an angle and are spaced apart. The connecting frame 530 is connected to the first frame 510 and the second frame 550. The composite component 100 is made by the manufacturing method according to any one of the above embodiments. At least part of the connecting frame 530 comprises the composite component 100.

[0193] Specifically, the shell 1000 comprises two first frames 510, two second frames 550 and four connecting frames 530. The first frame 510 and the second frame 550 are arranged at an angle and are spaced apart. The connecting frame 530 is located between the first frame 510 and the second frame 550. The whole formed by the two first frames 510, the two second frames 550 and the four connecting frames 530 is connected to the body 300. It can be understood that the connecting frame 530 is the corner of the shell 1000, and the corner is prone to deformation. The composite component 100 is arranged at the corner, so as to improve the structural strength of the connecting frame 530 and reduce the deformation of the connecting frame 530.

[0194] Referring to Figure 13 The application further provides an electronic device 10000, which comprises the shell 1000 according to any one of the above embodiments.

[0195] Specifically, the titanium base material 31 is formed with a nano-scale pore titanium dioxide film layer 33 by a mixed acid oxidant and an alkali cleaning agent, the film layer of the titanium dioxide film layer 33 is thicker, the nano-scale pore channel structure is more uniform, and the pore size is larger. In the process of forming the plastic layer 50 between the titanium alloy part 30 and the aluminum alloy part 10, the increase in the film layer thickness provides more filling space for the plastic layer 50, the uniform channel structure ensures uniform filling of the plastic layer 50, and the nano-scale pores with larger pore size can accommodate more plastic layer 50, thereby improving the bonding strength between the titanium alloy part 30 and the plastic layer 50 and enhancing the overall stability and durability of the composite component 100. The aluminum base material 11 is formed with an aluminum oxide film layer 13 on the surface by phosphoric acid anodic oxidation etching, which can produce nano-scale pores with uniform pore size, expand the pore size, and improve the mechanical properties of the aluminum alloy part 10. The preset dynamic pressure maintaining control curve is used to form the plastic layer 50 between the titanium alloy part 30 and the aluminum alloy part 10, which can form a composite component 100 with high strength, high forming rate, and good density. After the composite component 100 is arranged at the round corner of the shell 1000, the deformation rate of the round corner can be reduced, the yield rate of the shell 1000 can be improved, and the strength of the shell 1000 can be improved.

[0196] In the description of the present specification, the description referring to the terms "certain embodiments", "one example", "exemplarily", and the like means that the specific features, structures, materials, or characteristics described in connection with the embodiments or examples are included in at least one embodiment or example of the present application. In the present specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiments or examples. Moreover, the specific features, structures, materials, or characteristics described can be combined in any one or more embodiments or examples in a suitable manner. Furthermore, the person skilled in the art can combine and combine the different embodiments or examples described in the present specification and the features of the different embodiments or examples without contradiction.

[0197] Any process or method descriptions in flow charts or described herein in other ways can be understood as representing code modules, segments, or portions of code that include one or more executable instructions for performing specific logic functions or steps in the process. The scope of preferred embodiments of the present application encompasses the additional implementation in which the functions can be performed in an order different from the order shown or discussed, including functions performed in a substantially simultaneous manner or in reverse order, as will be understood by those skilled in the art of the embodiments to which the present application pertains.

[0198] Although the embodiments of the present application have been shown and described above, it should be understood that the above-described embodiments are exemplary and should not be construed as limiting the present application, and those skilled in the art can make changes, modifications, replacements, and variations to the above-described embodiments within the scope of the present application.

Claims

1. A method of making a composite structure, characterized by, comprise: providing an aluminum alloy piece comprising an aluminum base material and an aluminum oxide film layer disposed on the aluminum base material; providing a titanium alloy piece comprising a titanium base material and a titanium dioxide film layer disposed on the titanium base material; and forming a plastic layer between the titanium alloy piece and the aluminum alloy piece by an in-mold injection molding process to form the composite member. The providing a titanium alloy piece comprises:

2. The production method according to claim 1, characterized by, providing a titanium base material; pretreating the titanium base material; high-temperature mixed acid oxidation of the pretreated titanium base material with a mixed acid oxidant to form a titanium dioxide film layer on the titanium base material, the mixed acid oxidant comprising sulfuric acid, phosphoric acid, p-toluenesulfonic acid, sodium molybdate, sodium dodecylbenzenesulfonate, and polyethylene glycol, the mass percentage of the sulfuric acid in the mixed acid oxidant being 40-50%, the mass percentage of the phosphoric acid in the mixed acid oxidant being 5-15%, the mass percentage of the p-toluenesulfonic acid in the mixed acid oxidant being 2-8%, the mass percentage of the sodium molybdate in the mixed acid oxidant being 0.5-1%, the mass percentage of the sodium dodecylbenzenesulfonate in the mixed acid oxidant being 0.1-0.2%, and the mass percentage of the polyethylene glycol in the mixed acid oxidant being 0.3-0.5%; and high-temperature alkali washing of the titanium base material with the titanium dioxide film layer formed thereon with an alkali washing agent to form a titanium dioxide film layer with nanoscale pores on the titanium base material, the alkali washing agent comprising sodium hydroxide, polyether-modified siloxane, sodium gluconate, and a sodium carbonate-sodium bicarbonate buffer system, the mass percentage of the sodium hydroxide in the alkali washing agent being 40-50%, the mass percentage of the polyether-modified siloxane in the alkali washing agent being 1-1.5%, and the mass percentage of the sodium gluconate in the alkali washing agent being 1-2%, the pH value of the sodium carbonate-sodium bicarbonate buffer system being 12.5-13.2; and post-treating the titanium base material with the titanium dioxide film layer with nanoscale pores formed thereon to obtain a titanium alloy piece. The pretreating the titanium base material comprises:

3. The method of manufacturing according to claim 2, wherein, sandblasting the titanium base material with aluminum oxide particles with a diameter or width of 50-100 microns; degreasing the sandblasted titanium base material with a degreasing agent comprising sodium silicate and sodium dodecyl sulfate; and surface activation treatment of the degreased titanium base material with an activator comprising nitric acid and sulfuric acid, the mass percentage of the nitric acid in the activator being 10-20% and the mass percentage of the sulfuric acid in the activator being 5-6%. The post-treating the titanium base material with the titanium dioxide film layer with nanoscale pores formed thereon comprises:

4. The method of manufacturing according to claim 2, wherein, multi-stage countercurrent water washing of the titanium base material with the titanium dioxide film layer with nanoscale pores formed thereon; ultrasonic water washing of the titanium base material after the multi-stage countercurrent water washing; and vacuum drying of the titanium base material after the ultrasonic water washing.

5. The manufacturing method according to claim 1, wherein ​ The thickness of the titanium dioxide film layer ranges from 300 nm to 400 nm; and / or, The porosity of the titanium dioxide film layer ranges from 20% to 50%; and / or, The film layer hardness of the titanium dioxide film layer ranges from 900 Vickers hardness to 1050 Vickers hardness; and / or, The alkali corrosion resistance of the titanium dioxide film layer ranges from 15 g / m2·h to 20 g / m2·h; and / or, The test block tensile value of the titanium dioxide film layer ranges from 75 kgf to 85 kgf.

6. The method of making of claim 1, wherein, The aluminum alloy part is provided by: providing an aluminum base material; pretreating the aluminum base material; performing phosphoric acid anodic etching treatment on the pretreated aluminum base material by using an additive to form the aluminum oxide film layer on the aluminum base material, the additive comprising phosphoric acid, cerium ethylenediaminetetraacetate, sodium dihydrogen phosphate, polyvinylpyrrolidone, and deionized water, the mass percentage of the phosphoric acid in the additive being 10% to 20%, the mass percentage of the cerium ethylenediaminetetraacetate in the additive being 1% to 2%, the mass percentage of the sodium dihydrogen phosphate in the additive being 1% to 2%, and the mass percentage of the polyvinylpyrrolidone in the additive being 5% to 10%; and drying the aluminum base material on which the aluminum oxide film layer is formed to obtain the aluminum alloy part.

7. The manufacturing method of claim 6, wherein, the thickness of the aluminum oxide film layer ranges from 500 nm to 950 nm; and / or, the pore size of the aluminum oxide film layer ranges from 40 nm to 60 nm; and / or, the film layer hardness of the aluminum oxide film layer ranges from 500 Vickers hardness to 650 Vickers hardness; and / or, the alkali corrosion resistance of the aluminum oxide film layer ranges from 1.3 g / m2·h to 2.3 g / m2·h; and / or, the test block tensile value of the aluminum oxide film layer ranges from 45 kgf to 55 kgf.

8. The method of making of claim 1, wherein, The plastic layer is formed between the titanium alloy part and the aluminum alloy part by the in-mold injection molding process to form the composite component, comprising: preheating a mold to make the temperature of the mold reach a target temperature; placing the titanium alloy part and the aluminum alloy part into the mold; injecting molten plastic into the titanium alloy part and the aluminum alloy part in the mold by using a barrel, and controlling the pressure in the mold according to a dynamic pressure maintaining control curve; and after the molten plastic fills the titanium alloy part and the aluminum alloy part in the mold, gradient cooling the molten plastic to obtain the composite component.

9. The manufacturing method of claim 8, wherein, controlling the pressure in the mold according to the dynamic pressure maintaining control curve comprises: controlling the mold to maintain a first preset time length at a first pressure; controlling the mold to maintain a second preset time length at a second pressure; and controlling the mold to keep at a third pressure for a third preset time length, the first pressure, the second pressure and the third pressure are sequentially decreased, and the first preset time length, the second preset time length and the third preset time length are sequentially increased; gradient cooling the molten plastic, comprising: cooling the molten plastic at a first cooling rate; and cooling the molten plastic at a second cooling rate, the first cooling rate being greater than the second cooling rate.

10. A housing characterized by, comprising: a body; a frame connected to the body, the frame comprising a first frame, a connecting frame and a second frame, the first frame and the second frame being arranged at an angle interval, the connecting frame being connected to the first frame and the second frame, and a composite member made by the manufacturing method of any one of claims 1-9, at least part of the connecting frame comprising the composite member.

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