A volume calibration method, controller and gas mass flow verification system

Abstract

Embodiments of the present application relate to the technical field of semiconductor manufacturing, and specifically relate to a volume calibration method, a controller and a gas mass flow verification system. Embodiments of the present application utilize the diffusion of a target molar gas in a calibration tank to a second pipeline space, obtain an accurate second volume calibration parameter of the calibration tank when the second pipeline space is in a gas stable state, combine the first volume calibration parameter and the first volume of the calibration tank when the fourth valve is in a closed state, calculate an accurate and high-precision second volume of the second pipeline space, utilize the diffusion of the target molar gas in the calibration tank to a target pipeline space, obtain an accurate third volume calibration parameter of the calibration tank when the target pipeline space is in a gas stable state, combine the first volume calibration parameter and the first volume of the calibration tank when the fourth valve is in a closed state, and calculate an accurate and high-precision third volume of the third pipeline space, thereby meeting the requirements of semiconductor processes on volume accuracy.

Description

TECHNICAL FIELD

[0001] Embodiments of the present application relate to the technical field of semiconductor manufacturing, and in particular, to a volume calibration method, a controller and a gas mass flow verification system. BACKGROUND

[0002] In a semiconductor manufacturing process, accurate gas supply of a process chamber is a key prerequisite for high-precision control of each step, so the flow control precision of the gas delivered to the process chamber is crucial - flow control errors will directly affect the quality of wafer finished products.

[0003] In a semiconductor manufacturing site, there are complex scenarios of multiple machines, multiple chambers and multiple input gas paths, and each gas path gas source is configured with a corresponding mass flow controller (MFC) to regulate the gas flow input to the process chamber. However, the MFCs configured for different gas sources have individual differences, making it difficult to ensure the consistency of mass flow output of multiple machines, multiple chambers and multiple gas paths.

[0004] At the same time, factors such as changes in chamber environment temperature, volume differences, pressure measurement accuracy, and large gas consumption or long measurement time during the measurement process will further affect the measurement accuracy of the MFC; this directly leads to difficulty in guaranteeing the consistency of gas parameter control in semiconductor manufacturing, ultimately affecting the quality of semiconductor products.

[0005] In related technologies, although the structure or control logic of the MFC is optimized to improve performance, it is still difficult to achieve accurate measurement of the output gas, and it cannot meet the stringent requirements of semiconductor processes for gas flow measurement accuracy. SUMMARY

[0006] One of the purposes of embodiments of the present application is to provide a volume calibration method, a controller and a gas mass flow verification system, which are applied to a gas mass flow verification system to solve the technical problems of MFC individual differences and chamber environment interference leading to flow output differences and no further measurement verification in related technologies under multiple machines, multiple chambers and multiple gas paths.

[0007] In a first aspect, embodiments of the present application provide a volume calibration method applied to a gas mass flow verification system, the gas mass flow verification system comprising a calibration system, a calibration tank system and a dry pump, the calibration system comprising a first valve, a second valve and a third valve, the calibration tank system comprising a calibration tank and a fourth valve, the input end of the first valve being used to interface a gas output module, the gas output module being in communication connection with the calibration system, the output end of the first valve being in communication with the input end of the second valve, the output end of the second valve being respectively connected to the input end of the third valve and the input end of the fourth valve, the output end of the third valve being used to interface the dry pump, and the output end of the fourth valve being used to interface the calibration tank. The volume calibration method comprises:

[0008] In response to the calibration tank being filled with the target molar of gas, a first volume calibration parameter of the calibration tank is obtained when the fourth valve is in a closed state, and a volume of the calibration tank is a known first volume;

[0009] In response to the target pipeline space entering a vacuum state, the gas in the calibration tank is controlled to diffuse only to the second pipeline space, the target pipeline space being composed of the third pipeline space and the second pipeline space, the third pipeline space being a pipeline space formed between the first valve and the second valve, and the second pipeline space being a pipeline space formed between the second valve, the third valve, and the fourth valve;

[0010] In response to the second pipeline space entering a gas stable state, a second volume calibration parameter of the calibration tank is obtained;

[0011] Based on the first volume calibration parameter, the second volume calibration parameter, and the first volume, a second volume of the second pipeline space is determined;

[0012] The gas in the calibration tank is controlled to diffuse only to the target pipeline space;

[0013] In response to the target pipeline space entering a gas stable state, a third volume calibration parameter of the calibration tank is obtained;

[0014] Based on the first volume calibration parameter, the third volume calibration parameter, and the first volume, a third volume of the third pipeline space is determined.

[0015] In a second aspect, an embodiment of the present application provides a controller, including a memory and a processor, the memory being connected to the processor, the processor being used to execute one or more computer programs stored in the memory, and the processor, when executing the one or more computer programs, causes the controller to implement the volume calibration method according to the first aspect.

[0016] In a third aspect, an embodiment of the present application provides a gas mass flow verification system, including a calibration system, a calibration tank system, and a dry pump, the calibration system including a first valve, a second valve, a third valve, and a controller according to the second aspect, the calibration tank system including a calibration tank and a fourth valve, an input end of the first valve being used to connect to a gas output module, an output end of the first valve being in communication with an input end of the second valve, an output end of the second valve being connected to an input end of the third valve and an input end of the fourth valve respectively, an output end of the third valve being used to connect to the dry pump, and an output end of the fourth valve being used to connect to the calibration tank, the controller being in communication connection with the first valve, the second valve, the third valve, the fourth valve, and the gas output module respectively;

[0017] The target pipeline space is formed by the third pipeline space and the second pipeline space, and the first pipeline space is formed by the fourth pipeline space, the third pipeline space and the second pipeline space, the fourth pipeline space is formed between the output end of the gas output module and the first valve, the third pipeline space is formed between the first valve and the second valve, and the second pipeline space is formed between the second valve, the third valve and the fourth valve;

[0018] The third pipeline space is provided with a first sensing device configured to detect the pressure and temperature of the third pipeline space;

[0019] The reference pipeline space is formed between the fourth valve and the calibration tank, and the second sensing device is configured to detect the pressure and temperature of the calibration tank.

[0020] In the embodiments of the present application, the target moles of gas in the calibration tank diffuse to the second pipeline space, and the accurate second volume calibration parameter of the calibration tank is obtained when the second pipeline space is in a stable state of the gas, so that the accurate and high-precision second volume of the second pipeline space is calculated in combination with the first volume calibration parameter and the first volume of the calibration tank when the fourth valve is in a closed state, thereby meeting the requirement of the semiconductor process on the volume accuracy, and the target moles of gas in the calibration tank diffuse to the target pipeline space, and the accurate third volume calibration parameter of the calibration tank is obtained when the target pipeline space is in a stable state of the gas, so that the accurate and high-precision third volume of the third pipeline space is calculated in combination with the first volume calibration parameter and the first volume of the calibration tank when the fourth valve is in a closed state, thereby meeting the requirement of the semiconductor process on the volume accuracy. BRIEF DESCRIPTION OF DRAWINGS

[0021] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings needed in the description of the embodiments of the present application will be briefly introduced. Obviously, the drawings in the following description are only some embodiments of the present application, and other drawings can be obtained by those skilled in the art without creative labor.

[0022] Figure 1 The structure schematic diagram of the gas mass flow verification system provided by some embodiments of the present application;

[0023] Figure 2a Another structure schematic diagram of the gas mass flow verification system provided by some embodiments of the present application;

[0024] Figure 2bFig. 1 shows a schematic diagram of a gas mass flow verification system according to some embodiments of the present application;

[0025] Figure 2c Fig. 2 shows a schematic diagram of a gas flow detection process performed by a gas mass flow verification system according to some embodiments of the present application;

[0026] Figure 3 Fig. 3 shows a schematic diagram of a connection between a calibration system and a gas output module in a gas mass flow verification system according to some embodiments of the present application;

[0027] Figure 4 Fig. 4 shows a schematic diagram of an interaction in a calibration volume process in a gas mass flow verification system according to some embodiments of the present application;

[0028] Figure 5 Fig. 5 shows a schematic diagram of a controller in a calibration system according to some embodiments of the present application;

[0029] Figure 6 Fig. 6 shows a schematic diagram of a volume calibration method according to some embodiments of the present application;

[0030] Figure 7 Fig. 7 shows a schematic diagram of a sub-process of step S61 in a volume calibration method according to some embodiments of the present application; Figure 6

[0031] Fig. 8 shows a schematic diagram of a sub-process of step S62 in a volume calibration method according to some embodiments of the present application; Figure 8 Figure 6 Fig. 9 shows a schematic diagram of a volume calibration method according to some other embodiments of the present application;

[0032] Figure 9 Fig. 10 shows a schematic diagram of a sub-process of step S64 in a volume calibration method according to some embodiments of the present application.

[0033] Figure 10 Figure 6 DETAILED DESCRIPTION

[0034] In order to make the objects, technical solutions and advantages of the present application clearer, the present application will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present application and should not be used to limit the present application. Based on the embodiments in the present application, all other embodiments obtained by those of ordinary skill in the art without creative labor fall within the scope of the present application.

[0035] ​​​It should be noted that various features of the embodiments of the present application can be combined with each other, and are within the protection scope of the present application. In addition, although the functional modules are divided in the device schematic diagram, and the logical order is shown in the flowchart, in some cases, the steps shown or described can be executed in a manner different from the module division in the device or the order in the flowchart. Furthermore, the "first", "second", "third" and the like used in the present application do not limit the data and execution order, but only distinguish the same items or similar items with basically the same function and effect.

[0036] In the semiconductor manufacturing process, the accurate gas supply of the process chamber is the key prerequisite for high-precision control of each step, so the flow control precision of the gas delivered to the process chamber is crucial-the flow control error will directly affect the quality of the wafer finished product.

[0037] There are complex scenes of multiple machines, multiple chambers and multiple input gas paths in the semiconductor manufacturing site, and each gas path gas source is configured with a corresponding mass flow controller (MFC) to regulate the gas flow input to the process chamber. However, the MFCs of different gas sources have individual differences, making it difficult to ensure the consistency of the mass flow output of multiple machines, multiple chambers and multiple gas paths.

[0038] At the same time, factors such as changes in chamber ambient temperature, volume differences, pressure measurement accuracy, and large gas consumption or long measurement time during the measurement process will further affect the measurement accuracy of the MFC; this directly leads to difficulty in guaranteeing the consistency of gas parameter control in semiconductor manufacturing, ultimately affecting the quality of semiconductor products.

[0039] In related technologies, although the structure or control logic of the MFC is optimized to improve performance, it is still difficult to achieve accurate measurement of the output gas, and it cannot meet the stringent requirements of semiconductor process for gas flow measurement accuracy.

[0040] Therefore, the present application provides a gas mass flow verification system, which aims to measure and verify different MFCs in the same standard without using the chamber body, in a new way, so that in the complex use of different MFCs and different chambers in the semiconductor manufacturing process, there is still a relatively consistent processing result.

[0041] Therefore, the embodiment of the present application provides a volume calibration method, which is applied to a gas mass flow verification system. The gas mass flow verification system comprises a calibration system, a calibration tank system and a dry pump. The calibration system comprises a first valve, a second valve, a third valve and a controller. The calibration tank system comprises a calibration tank and a fourth valve. The target moles of gas are diffused to the corresponding pipeline space by using the known volume of the calibration tank and the target moles of gas filled in the calibration tank. The first volume calibration parameter, the second volume calibration parameter and the third volume calibration parameter of the calibration tank are accurately measured. The volume of the corresponding pipeline space is accurately calculated according to the known volume of the calibration tank, the first volume calibration parameter, the second volume calibration parameter and the third volume calibration parameter. The accuracy measurement of the volume of each partition pipeline is realized. The accuracy of the pipeline volume measurement is improved. The requirement of the semiconductor process on the pipeline volume accuracy can be met.

[0042] Please refer to Figure 1 and Figure 2a , Figure 1 and Figure 2a The structure schematic diagram of the gas mass flow verification system provided by some embodiments of the present application is schematically shown.

[0043] As shown in Figure 1 and Figure 2a , the gas mass flow verification system 100 comprises a calibration system 110, a calibration tank system 120 and a dry pump 130. The calibration system 110 comprises a first valve VAL1, a second valve VAL2, a third valve VAL3 and a controller 111. The calibration tank system 120 comprises a calibration tank 121 and a fourth valve VAL4. It should be understood that the first valve VAL1, the second valve VAL2, the third valve VAL3 and the fourth valve VAL4 can be any suitable type of valve such as an electromagnetic valve or a pneumatic diaphragm valve. The first valve VAL1, the second valve VAL2, the third valve VAL3 and the fourth valve VAL4 can be arranged at any suitable position according to the actual requirement. The embodiments of the present application do not make any limitation in this regard.

[0044] The input end of the first valve VAL1 is used for connecting the gas output module 103. The output end of the first valve VAL1 is in communication with the input end of the second valve VAL2. The output end of the second valve VAL2 is respectively connected to the input end of the third valve VAL3 and the input end of the fourth valve VAL4. The output end of the third valve VAL3 is used for connecting the dry pump 130. The output end of the fourth valve VAL4 is used for connecting the calibration tank 121. The controller 111 is in communication connection with the first valve VAL1, the second valve VAL2, the third valve VAL3, the fourth valve VAL4 and the gas output module 103. The gas output module 103 comprises a gas source (not shown in the figure) and a mass flow controller (not shown in the figure). Figure 1 and Figure 2aThe gas source is used to provide various types of gases, the mass flow controller 1031 is used to control the flow of the gas output by the gas source, and the gas control valve VALSec is used to control the opening or closing of the gas output channel (i.e., the channel from the mass flow controller 1031 to the chamber or the gas mass flow verification system 100).

[0045] Please refer to Figure 2a and Figure 2b , the first pipeline space is composed of the second pipeline space, the third pipeline space, and the fourth pipeline space, the target pipeline space is composed of the third pipeline space and the second pipeline space, the second pipeline space is formed between the second valve VAL2, the third valve VAL3, and the fourth valve VAL4, the second volume of the second pipeline space is as shown in Figure 2a and Figure 2b the pipeline space volume V2, the third pipeline space is formed between the first valve VAL1 and the second valve VAL2, and the third volume of the third pipeline space is as shown in Figure 2a and Figure 2b the pipeline space volume V3. The fourth pipeline space is formed between the output end of the gas output module 103 and the first valve VAL1, and the fourth volume of the fourth pipeline space is as shown in Figure 2a and Figure 2b the pipeline space volume V4. The reference pipeline space is formed between the fourth valve and the calibration tank 121. The standard pipeline space is composed of the first pipeline space and the reference pipeline space. The fifth pipeline space is composed of the third pipeline space and the fourth pipeline space. The sixth pipeline space is composed of the target pipeline space and the reference pipeline space. The volume of the calibration tank 121 is a known first volume V1, which can be any suitable volume, such as 326ml, 286ml, etc.

[0046] Please refer to Figure 2c , the gas mass flow verification system is used to execute the gas flow detection process of the gas output by different MFCs as follows:

[0047] Firstly, the gas tightness of the pipeline between the gas output module and the gas mass flow verification system and the pipeline between the calibration tank and the gas mass flow verification system is detected, that is, the gas tightness of the first pipeline space is detected. The fourth valve VAL4 is controlled to enter the closed state, the first valve VAL1, the second valve VAL2 and the third valve VAL3 are controlled to enter the open state, the dry pump 130 is controlled to perform the vacuumizing operation, and the gas in the first pipeline space is extracted. It is judged whether the first pipeline space enters the gas stable state. After the first pipeline space enters the gas stable state, the pressure of the first pipeline space is obtained. After waiting for a period of time, it is judged again whether the first pipeline space enters the gas stable state. After the first pipeline space enters the gas stable state again, the pressure of the first pipeline space is obtained again. The difference between the two obtained pressures of the first pipeline space is calculated to obtain a pressure difference value. The difference between the two obtained pressures of the first pipeline space is calculated to obtain a pressure difference value. The difference between the two obtained pressures of the first pipeline space is calculated to obtain a pressure difference value. The pressure difference value is divided by the time difference value to obtain the gas leakage rate of the first pipeline space. The gas leakage rate is compared with the preset leakage rate threshold value. If the gas leakage rate is less than the preset leakage rate threshold value, it is determined that the gas tightness of the first pipeline space is good. If the gas leakage rate is greater than or equal to the preset leakage rate threshold value, it is determined that the gas tightness of the first pipeline space fails. The first valve VAL1, the second valve VAL2 and the third valve VAL3 are controlled to enter the closed state, and the gas tightness detection is ended.

[0048] In the embodiment of the application, the gas stable state refers to that the pressure fluctuation values of the gas in the pipeline space sampled for a continuous preset sampling times are all less than or equal to the actual judgment pressure threshold value. For example, the pressure fluctuation values of the gas sampled for 300 continuous times are all less than or equal to the actual judgment pressure threshold value, which indicates that the pipeline space enters the gas stable state. Wherein, the actual judgment pressure threshold value = the basic threshold value x the threshold value rate K. For example, the basic threshold value is set to 1 mTorr. If K = 1, the actual judgment pressure threshold value is 1 x 1 = 1 mTorr. If K = 0.8, the actual judgment pressure threshold value is 1 x 0.8 = 0.8 mTorr.

[0049] Then, the first pipeline space is purged and evacuated by the gas output module and the dry pump, i.e., the gas control valve VALSec of the gas output module is controlled to enter an open state, and the first valve VAL1 and the second valve VAL2 are controlled to enter an open state, and the third valve VAL3 and the fourth valve VAL4 are controlled to enter a closed state, so that the dry pump, the calibration tank and the first pipeline space are isolated. The gas output module outputs gas to purge the first pipeline space. When the purging time reaches a reference preset time length or the pressure of the first pipeline space reaches a reference preset pressure, it is indicated that the purging work has been completed, the gas control valve VALSec of the gas output module is controlled to enter a closed state, and the third valve VAL3 is controlled to enter an open state, so that the dry pump performs a vacuumizing operation to evacuate the impurities and gas remaining in the first pipeline space after purging. In this way, the purging and evacuation work is completed. It should be understood that the first pipeline space can be purged and evacuated by the gas output module and the dry pump before and after each detection of the gas flow. Obviously, the engineering personnel can purge and evacuate the first pipeline space once or multiple times according to actual needs, and the embodiments of the present application do not make any limitation thereto.

[0050] Then, the volume of the external pipeline space is calibrated, i.e., the gas in the calibration tank diffuses to the corresponding pipeline space, and the volume calibration parameters (i.e., the pressure and the temperature) of the corresponding pipeline space are detected, and the volume of the external pipeline space is calculated according to the volume calibration parameters of the corresponding pipeline space and the known first volume of the calibration tank. In this way, the calibration of the volume of the external pipeline space is realized. The external pipeline space includes the second pipeline space and the third pipeline space.

[0051] Further, the volume of the front-end pipeline space is calibrated, i.e., the gas in the calibration tank diffuses to the first pipeline space, and the volume calibration parameters (i.e., the pressure and the temperature) of the first pipeline space are detected, and the volume of the front-end pipeline space is calculated according to the volume calibration parameters of the first pipeline space, the known first volume of the calibration tank, the volume of the second pipeline space and the volume of the third pipeline space. In this way, the calibration of the volume of the front-end pipeline space is realized. The front-end pipeline space is the fourth pipeline space.

[0052] Finally, the gas flow output by the gas output module is detected, i.e., the gas flow is calculated according to the volume of the external pipeline space and the volume of the front-end pipeline space, in combination with the volume calibration parameters of the external pipeline space and the volume calibration parameters of the front-end pipeline space. In this way, the detection of the gas flow output by the gas output module is realized.

[0053] It is worth mentioning that after the gas flow is measured by the gas mass flow verification system 100, the data measured by the gas mass flow verification system 100 is fed back to the MFC through another flow feedback monitoring system, so that the MFC can further calibrate the output gas flow according to the data measured by the gas mass flow verification system 100, so as to achieve the purpose of accurately controlling the output gas flow of the gas source. The gas mass flow verification system 100 does not directly control the gas flow, but feeds back the detected gas flow to the MFC, so that the MFC adjusts the valve opening according to the detected gas flow, thereby controlling the output gas flow.

[0054] The third pipeline space is provided with a first sensing device, and the first sensing device is configured to detect the pressure and temperature of the third pipeline space. Obviously, the engineering personnel can set the first sensing device in the third pipeline space in any suitable manner according to actual needs, for example, set the first sensing device in the third pipeline space by means of sticking, hanging and the like.

[0055] The reference pipeline space is provided with a second sensing device, and the second sensing device is configured to detect the pressure and temperature of the calibration tank 121. Obviously, the engineering personnel can set the second sensing device in the reference pipeline space in any suitable manner according to actual needs, for example, set the second sensing device in the reference pipeline space by means of sticking, hanging and the like.

[0056] In some embodiments, the first sensing device and the second sensing device each include a sensor (such as a resistance temperature detector RTD) for measuring the temperature of the pipeline space and a sensor (such as a capacitance diaphragm gauge) for measuring the pressure of the pipeline space.

[0057] It is worth mentioning that the third pipeline space is provided with a first sensing device with a high range and a low range, and the reference pipeline space is provided with a second sensing device with a high range and a low range. The first sensing device and the second sensing device with a high range (for example, 100 Torr) and a low range (for example, 20 Torr) are two independent sensors, signal amplification circuits and ADC circuits, each having a clear effective range interval.

[0058] The high range (100 Torr): the effective range is 0-100 Torr (the sensor, amplifier and ADC circuit are linearly operated). The low range (20 Torr): the effective range is 0-20 Torr (when the pressure is greater than 20 Torr, the sensor / amplifier is nonlinear or even saturated, and the ADC data is distorted). For example, when the pressure is 40 Torr, the first sensor device and the second sensor device of the high range correctly measure 40 Torr, and the first sensor device and the second sensor device of the low range measure close to 20 Torr. At this time, the pressure value and the temperature value used for calculation are the pressure and the temperature detected by the first sensor device and the second sensor device of the high range. The engineer can use the first sensor device and the second sensor device of the corresponding range to detect the pressure and the temperature according to the effective range, so as to calculate the pipeline volume, the gas flow and the like.

[0059] It can be understood that the engineer can connect and fix various systems, modules or components in the gas mass flow verification system 100 according to actual needs, or strengthen the airtightness of the corresponding systems, modules or components by using appropriate components or devices, and the embodiments of the present application do not make any limitation thereto, for example, refer to Figure 2b The engineer can use two joints to be arranged at both ends (i.e., the input end and the output end) of the first valve VAL1, the second valve VAL2, the third valve VAL3 and the fourth valve VAL4, and connect and fix the two joints with the pipeline, and for example, a ball valve stop valve can also be used to strengthen the sealing airtightness of the calibration tank 121.

[0060] In actual application, the gas mass flow verification system 100 can be connected to a plurality of different gas output modules 103, and the opening or closing of the gas control valve VALSec in the plurality of different gas output modules 103 is controlled by the controller 111 of the calibration system 110, so as to transmit different types of gas. Alternatively, the gas mass flow verification system 100 can be connected to one gas output module 103, and the gas output module 103 is equipped with a plurality of different types of gas sources, and the opening or closing of the gas control valve VALSec corresponding to the different gas sources in the gas output module 103 is controlled by the controller 111 of the calibration system 110, so as to transmit different types of gas.

[0061] For example, as shown in Figure 3 , the gas mass flow verification system 100 ( Figure 3 only shows the calibration system 110 and the dry pump 130) is connected to one gas output module 103, and the gas output module 103 is equipped with oxygen ( ), hydrogen ( ) and helium ( Three gas sources in total, each corresponding MFC controls the output gas flow, and the output gas is delivered to the chamber 400 or the gas mass flow verification system 100 through the pipeline.

[0062] In actual industrial applications, the gas output module 103 delivers one or more types of gas into the chamber 400 through the MFC, and the MFC plays a role in gas flow control. For example, the gas flow into the chamber 400 needs to be controlled to 200 Sccm, and the original gas flow is 210 Sccm. Then the MFC adjusts the opening of the valve to control the gas flow to 210 Sccm (but in fact there will be a deviation, and the MFC may be 204 Sccm). Because different commercial mass flow controllers MFCs have use deviations, such as different ranges (the values measured by 500 Sccm and 2000 Sccm range will also be different), and different types of gas also have an impact on gas flow control, and the corresponding MFC output gas flow may be 203 Sccm,

[0063] In the embodiments of the present application, the gas mass flow verification system 100 measures the gas flow, and can realize that the gas flow measured by the gas mass flow verification system 100 and the gas flow output by the MFC remain consistent within a certain error, such as the gas flow of the first gas source, the gas flow of the second gas source, and the gas flow of the third gas source are 203.5 Sccm, 202.5 Sccm, and 201.5 Sccm (all only differ by 0.5 Sccm, or a small error range of 0.1%), and the gas flow error measured by the different chambers 400 is also kept within 0.5 Sccm, and it will not be said that some gas flow deviates by 1 Sccm, and some gas flow deviates by 3 Sccm, that is, the gas mass flow verification system 100 ensures the "consistency" of the gas flow measurement error, the deviation range is small, and a high accuracy can be maintained.

[0064] Please refer to Figure 4 ​​​In some embodiments, the gas mass flow verification system 100 receives sensor values of the first sensing device 101 and the second sensing device 102 in real time, wherein the sensor values of the first sensing device 101 include temperature and pressure values of the third pipeline space, and the sensor values of the second sensing device 102 include pressure and temperature of the calibration tank 121. After receiving instructions sent by the host computer 200 (such as a computer, a server, or other devices or apparatuses) through the network, the gas mass flow verification system 100 responds to each instruction to perform corresponding operations and actions of each process, such as generating and sending a VALSec control command to the gas control valve VALSec of the gas output module 103 to control the opening or closing of the gas control valve VALSec. It can be understood that in addition to the internal operations of the gas mass flow verification system 100, some instructions will also call data (such as temperature and its coefficient, pressure and its coefficient) from the external calibration device 300 through the network according to actual application requirements to perform corresponding operations and actions. The gas mass flow verification system 100 completes each process instruction by internal operations and internal valve control signals to drive internal valves (i.e., the first valve VAL1, the second valve VAL2, the third valve VAL3, and the fourth valve VAL4) and by VALSec control commands to drive the gas control valve VALSec of the gas output module 103, and finally feeds back the gas flow calculation result to the host computer 200 through the network, thereby completing the gas flow detection.

[0065] In some embodiments, referring to Figure 4 When the gas mass flow verification system 100 is connected to multiple gas output modules 103, the gas mass flow verification system 100 also generates and sends pressure difference value signals of each gas output module 103 to each gas output module 103, so that each gas output module 103 can monitor in real time that the pressure difference of each gas output module 103 is less than a set value, thereby ensuring stable and safe operation and ensuring pressure balance between each gas output module 103 during production to avoid equipment damage and production accidents caused by pressure fluctuations.

[0066] After measuring the gas flow by the gas mass flow verification system 100, the output gas flow is further calibrated by another flow feedback monitoring system according to the data measured by the gas mass flow verification system 100, thereby achieving the purpose of accurately controlling the output gas flow of the gas source. For the gas after the reaction in the chamber 400 or the measurement by the gas mass flow verification system 100, a dry pump 130 can be used to extract and store it in a suitable container or directly use it, which is not limited in the embodiments of the present application.

[0067] It can be understood that, in the process of measuring the gas flow by the gas mass flow verification system 100, the pipeline volume of the calibration system 110 itself needs to be calibrated first, and in the embodiment of the present application, the volumes of the second pipeline space and the third pipeline space in the calibration system 110 are calibrated.

[0068] Therefore, the embodiment of the present application provides a volume calibration method, which is applied to the above-mentioned gas mass flow verification system. By using the known first volume of the calibration tank and the target moles of gas filled into the calibration tank, the target moles of gas are diffused to the corresponding pipeline space, and the first volume calibration parameter, the second volume calibration parameter and the third volume calibration parameter of the calibration tank are accurately measured, so that the volumes of the second pipeline space and the third pipeline space are accurately calculated according to the first volume, the first volume calibration parameter, the second volume calibration parameter and the third volume calibration parameter of the calibration tank, the accuracy of the measurement of the volumes of the respective partition pipelines is realized, the accuracy of the measurement of the pipeline volume is improved, the requirement of the semiconductor process on the accuracy of the pipeline volume is met, and the stability of the semiconductor process is improved.

[0069] Please refer to Figure 5 , Figure 5 The structure of the controller in the calibration system provided by some embodiments of the present application is shown.

[0070] As Figure 5 shown, the controller 111 includes at least one processor 1111 and a memory 1112 connected in communication, Figure 5 and the processor 1111 is taken as an example. In the controller 111, various components are coupled together through the bus system 1113, and the bus system 1113 is used to realize the connection and communication between the components. It can be easily understood that, in addition to the data bus, the bus system 1113 can also include a power bus, a control bus and a state signal bus, etc. However, in order to make the description clear and concise, all kinds of buses are marked as the bus system 1113 in the description. Figure 5 It can be understood that, Figure 5 the structure shown in the embodiment is only illustrative, and it does not cause any limitation to the structure of the above-mentioned controller. For example, the above-mentioned controller can also include more or less components than the structure shown in Figure 5 , or have a different configuration from the structure shown in Figure 5 .

[0071] Specifically, the processor 1111 is configured to provide operation and control capabilities to support the controller 111 to perform corresponding business logic and functions, for example, to support the controller 111 to perform the volume calibration method provided by the embodiments of the present application, or to perform the steps in any possible implementation of the volume calibration method provided by the embodiments of the present application. Those skilled in the art can understand that the processor 1111 can be a general processor, including a central processing unit (CPU), a network processor (NP), etc.; can also be a digital signal processor (DSP), an application specific integrated circuit (ASIC), a field-programmable gate array (FPGA) or other programmable logic device, a discrete gate or transistor logic device, a discrete hardware component.

[0072] The memory 1112, as a kind of non-transient computer readable storage medium, can be used to store non-transient software programs, non-transient computer executable programs, instructions and modules, for example, programs, instructions / modules corresponding to the volume calibration method in the embodiments of the present application. In some embodiments, the memory 1112 can include a program storage area and a data storage area, the program storage area can store an operating system, at least one application required by a function, and the data storage area can store data created according to the use of the processor 1111, etc. The processor 1111 performs various functional applications and data processing of the controller 111 by running the non-transient software programs, instructions and modules stored in the memory 1112, thereby implementing the volume calibration method provided by the embodiments of the present application, or performing the steps in any possible implementation of the volume calibration method provided by the embodiments of the present application. In some embodiments, the memory 1112 can include a high-speed random access memory, and can also include a non-transient memory. For example, at least one magnetic disk storage device, a flash memory device or other non-transient solid-state memory device. In some embodiments, the memory 1112 can also include a memory remotely arranged with respect to the processor 1111, which can be connected to the processor 1111 through a communication network. It can be understood that examples of the above communication network include but are not limited to the Internet, an intranet, a local area network, a mobile communication network and a combination thereof.

[0073] According to the above, it can be understood that the implementation subject of any volume calibration method provided by the embodiments of the present application can be a controller of any suitable type with certain calculation and control capabilities, for example, can be implemented by the controller 111 described above. In some possible implementations, the volume calibration method provided by the embodiments of the present application can be implemented by a processor executing computer program instructions stored in a memory.

[0074] The volume calibration method provided by the embodiments of the present application will be described in detail below in combination with an exemplary application and implementation of the gas mass flow verification system provided by the embodiments of the present application.

[0075] It can be understood that the specific process of the volume calibration method provided by the embodiments of the present application is as follows:

[0076] First, the gas output module is used to fill the calibration tank with a fixed amount of gas of a substance, after the calibration tank is filled with the fixed amount of gas of the substance, the gas control valve VALSec of the gas output module is closed, at this time, the fourth pipeline space, the third pipeline space, the second pipeline space and the reference pipeline space form a closed system.

[0077] Then, the first valve VAL1 and the fourth valve VAL4 are controlled to enter a closed state, so that the fourth pipeline space is isolated from the third pipeline space, and the reference pipeline space is isolated from the second pipeline space, at this time, the second pipeline space and the third pipeline space are connected to form a target pipeline space. The third valve VAL3 is controlled to enter an open state, so that the dry pump performs a vacuum pumping operation to extract the gas in the target pipeline space. After detecting that the target pipeline space enters a gas stable state, the first volume calibration parameter of the calibration tank (i.e., the first pressure and the first temperature of the calibration tank) is obtained.

[0078] Next, the first valve VAL1 and the third valve VAL3 are controlled to enter a closed state, so that the dry pump and the third pipeline space are isolated from the second pipeline space, at this time, the fixed amount of gas of the substance in the calibration tank is controlled to diffuse only to the second pipeline space, after detecting that the second pipeline space enters a gas stable state, the second volume calibration parameter of the calibration tank (i.e., the second pressure and the second temperature of the calibration tank) is obtained.

[0079] Further, the first valve VAL1 is controlled to enter an open state, so that the second pipeline space is connected with the third pipeline space to form the target pipeline space again. At this time, the fixed amount of gas of the substance in the calibration tank is controlled to diffuse only to the target pipeline space, and after detecting that the second pipeline space enters a gas stable state, the third volume calibration parameter of the calibration tank (i.e., the third pressure and the third temperature of the calibration tank) is obtained.

[0080] Finally, the second volume of the second pipeline space is calculated according to the first volume calibration parameter, the second volume calibration parameter and the known first volume of the calibration tank, and the third volume of the third pipeline space is calculated according to the first volume calibration parameter, the third volume calibration parameter and the known first volume of the calibration tank. According to the ideal gas law PV = nRT (P represents pressure, V represents volume (i.e. the volume of the pipeline space), n represents the amount of substance, R represents the ideal gas constant, and T represents temperature), Q = nR is constant in a closed system, so when the second volume of the second pipeline space is calculated according to the first volume calibration parameter, the second volume calibration parameter and the known first volume of the calibration tank, (P41*V1) / T41 = [P42*(V1+V2)] / T42 can be obtained, where P41 and T41 are the first pressure and the first temperature respectively, P42 and T42 are the second pressure and the second temperature respectively, and V1 and V2 are the first volume and the second volume respectively. Thus, the second volume V2 = T42*(P41*V1) / (T41*P42)-V1 can be calculated according to the above formula, and after transformation, V2 = [(T42*P41 / T41*P42)-1]*V1.

[0081] Similarly, when the third volume of the third pipeline space is calculated according to the first volume calibration parameter, the third volume calibration parameter and the known first volume of the calibration tank, (P41*V1) / T41 = [P43*(V1+V2+V3)] / T43 can be obtained, where P41 and T41 are the first pressure and the first temperature respectively, P43 and T43 are the third pressure and the third temperature respectively, V1, V2 and V3 are the first volume, the second volume and the third volume respectively. Thus, the third volume V3 = T43*(P41*V1) / (T41*P43)-V1-V2 can be calculated according to the above formula, and after transformation, V3 = [(T43*P41) / (T41*P43)-1]*V1-V2.

[0082] Referring to Figure 6 , Figure 6 A flowchart of a volume calibration method provided by some embodiments of the present application is schematically shown.

[0083] It is easy to understand that the volume calibration method provided by the embodiments of the present application can be applied to the above-mentioned controller (for example, the controller 111 of the calibration system 110 in the gas mass flow verification system 100). Specifically, the execution subject of the volume calibration method is one or at least two processors of the controller.

[0084] Referring to Figure 6 , the volume calibration method includes but is not limited to the following steps S61-S67:

[0085] S61: In response to the fact that the calibration tank has been filled with the target moles of gas, the first volume calibration parameter of the calibration tank when the fourth valve is in the closed state is acquired.

[0086] In this embodiment, the volume of the calibration tank is a known first volume. The embodiments of the present application fill the calibration tank with gas and monitor the amount of substance of the gas filled into the calibration tank in real time. When it is detected that the amount of substance of the gas filled into the calibration tank is the target moles, that is, the calibration tank has been filled with the target moles of gas, the fourth valve is controlled to be closed, so that the fourth valve is in the closed state, and the first volume calibration parameter of the calibration tank when the fourth valve is in the closed state is acquired. It can be understood that the target moles can be any suitable value.

[0087] Please refer to Figure 7 , Figure 7 A sub-process flow diagram of step S61 in the volume calibration method provided by some embodiments of the present application is schematically shown.

[0088] For example, as Figure 7 shown, in some embodiments, in response to the fact that the calibration tank has been filled with the target moles of gas, the first volume calibration parameter of the calibration tank when the fourth valve is in the closed state is acquired, specifically including but not limited to the following steps S611-S613:

[0089] S611: Control the first valve, the second valve and the fourth valve to be in the open state, and control the third valve to be in the closed state.

[0090] In this step, the third valve is controlled to be in the closed state, so that the dry pump is spatially isolated from the second pipeline, and the first valve, the second valve and the fourth valve are controlled to be in the open state, so that the second pipeline space, the third pipeline space and the reference pipeline space are communicated to form a sixth pipeline space.

[0091] S612: Control the gas output module to output gas, so that the gas is filled into the calibration tank through the first valve, the second valve and the fourth valve, so that the amount of substance of the gas filled into the calibration tank is the target moles.

[0092] S613: Acquire the first volume calibration parameter of the calibration tank when the fourth valve is in the closed state.

[0093] The embodiments of the present application control the gas control valve of the gas output module to be in the open state, fill the gas output by the gas output module into the calibration tank through the first valve, the second valve and the fourth valve, control the fourth valve to be in the closed state when it is detected that the amount of substance of the gas filled into the calibration tank is the target moles, and acquire the first volume calibration parameter of the calibration tank when the fourth valve is in the closed state.

[0094] S62: in response to the target pipeline space entering the vacuum state, control the gas of the calibration tank to diffuse only to the second pipeline space.

[0095] In the embodiments of the present application, the dry pump is controlled to start working to perform the vacuumizing operation, so as to vacuumize the target pipeline space, so that the target pipeline space enters and is in the vacuum state. When it is detected that the target pipeline space enters the vacuum state, the gas of the calibration tank is controlled to diffuse only to the second pipeline space.

[0096] Please refer to Figure 8 , Figure 8 A sub-flowchart diagram of step S62 in the volume calibration method provided by some embodiments of the present application is schematically shown.

[0097] As Figure 8 shown, in some embodiments, in response to the target pipeline space entering the vacuum state, the gas of the calibration tank is controlled to diffuse only to the second pipeline space, specifically including but not limited to the following steps S621-S623:

[0098] S621: control the first valve and the fourth valve to enter the closed state.

[0099] In this step, the first valve and the fourth valve are controlled to enter the closed state, so that the reference pipeline space is isolated from the second pipeline space, and the fourth pipeline space is isolated from the third pipeline space. At this time, the second pipeline space and the third pipeline space are communicated to form the target pipeline space.

[0100] S622: after experiencing a first preset time delay, control the third valve to enter the open state, so that the dry pump performs the vacuumizing operation to set the target pipeline space to enter the vacuum state.

[0101] In this step, the first preset time length can be any suitable time length, for example, 2s, 5s or other time lengths.

[0102] In some embodiments, after experiencing the first preset time delay, the third valve is controlled to enter the open state, so that the dry pump performs the vacuumizing operation to set the target pipeline space to enter the vacuum state, specifically including but not limited to the following steps S6221-S6223:

[0103] S6221: after experiencing the first preset time delay, control the third valve to enter the open state, so that the dry pump performs the vacuumizing operation.

[0104] In the embodiments of the present application, a timer is used to time the delay time length. After experiencing the first preset time delay, the third valve is controlled to enter the open state, so that the dry pump is communicated with the target pipeline space, so that the dry pump performs the vacuumizing operation to extract the gas in the target pipeline space.

[0105] S6222: Obtain the target pressure of the third pipeline space.

[0106] In the embodiment, the target pressure of the third pipeline space is obtained during the vacuumizing operation of the dry pump.

[0107] For example, in some embodiments, the target pressure of the third pipeline space is obtained, specifically including but not limited to the following steps S62221-S62223:

[0108] S62221: Obtain the to-be-corrected pressure of the third pipeline space detected by the first sensing device.

[0109] In the embodiment, the first sensing device arranged in the third pipeline space is used to obtain the detected pressure of the third pipeline space, and the detected pressure of the third pipeline space is the to-be-corrected pressure of the third pipeline space.

[0110] S62222: Obtain the pressure correction coefficient.

[0111] S62223: Correct the to-be-corrected pressure based on the pressure correction coefficient to obtain the target pressure of the third pipeline space.

[0112] In the embodiment, the pressure correction coefficient of the pipeline space is stored in any suitable storage medium, and the pressure correction coefficient is obtained from the storage medium to correct the to-be-corrected pressure based on the pressure correction coefficient to obtain the target pressure of the third pipeline space. For example, in some embodiments, the pressure correction coefficient is added to the preset correction threshold to obtain a pressure correction sum, and the to-be-corrected pressure is multiplied by the pressure correction sum to obtain the target pressure of the third pipeline space.

[0113] In the embodiment, the pressure correction coefficient includes a deviation ratio and a bias parameter.

[0114] In some embodiments, the to-be-corrected pressure is corrected based on the pressure correction coefficient to obtain the target pressure of the third pipeline space, specifically including but not limited to the following steps S62A-S62B:

[0115] S62A: Multiply the to-be-corrected pressure by the deviation ratio to obtain a total pressure deviation.

[0116] S62B: Add the total pressure deviation to the bias parameter to obtain the target pressure of the third pipeline space.

[0117] It can be understood that the specific process of obtaining the pressure correction coefficient in the volume calibration method provided by the embodiment is as follows:

[0118] Firstly, the first valve, the second valve, the third valve and the fourth valve are controlled to enter the open state, so that the second pipeline space, the third pipeline space, the fourth pipeline space and the reference pipeline space are communicated to form a standard pipeline space, and the dry pump performs a vacuum pumping operation to extract the gas in the standard pipeline space, so that the standard pipeline space enters a vacuum state.

[0119] Then, under the condition that the standard pipeline space is in the vacuum state, the first valve and the third valve are controlled to enter the closed state, so that the fourth pipeline space is isolated from the third pipeline space, and the dry pump is isolated from the second pipeline space, and the third pipeline space, the second pipeline space and the reference pipeline space are communicated to form a sixth pipeline space. After the sixth pipeline space enters a gas stable state, the third volume calibration parameter of the calibration tank (i.e., the third pressure of the calibration tank) detected by the second sensing device and the fourth volume calibration parameter of the third pipeline space (i.e., the fourth pressure of the third pipeline space) detected by the first sensing device are obtained.

[0120] Then, the first valve is controlled to enter the open state, so that the fourth pipeline space, the third pipeline space, the second pipeline space and the reference pipeline space are communicated to form a standard pipeline space. The gas output module is controlled to output gas, and the specified moles of gas are filled into the calibration tank through the first valve, the second valve, the third valve and the fourth valve. After the specified moles of gas are filled into the calibration tank, the gas output module is controlled to stop outputting gas.

[0121] Further, the first valve is controlled to enter the closed state, so that the fourth pipeline space is isolated from the sixth pipeline space. In this way, the target pipeline space (i.e., the second pipeline space and the third pipeline space) is controlled to communicate with the calibration tank to form a closed sixth pipeline space, that is, the target pipeline space is controlled to communicate with the reference pipeline space to form a sixth pipeline space. When it is detected that the sixth pipeline space enters a gas stable state, the fifth volume calibration parameter of the calibration tank (i.e., the fifth pressure of the calibration tank) detected by the second sensing device and the sixth volume calibration parameter of the third pipeline space (i.e., the sixth pressure of the third pipeline space) detected by the first sensing device are obtained.

[0122] Finally, the pressure correction coefficient is generated according to the third volume calibration parameter, the fourth volume calibration parameter, the fifth volume calibration parameter and the sixth volume calibration parameter. The pressure correction coefficient includes a bias ratio k and a bias parameter b, and k and b can be obtained according to the formulas P50=k*P51+b and P52=k*P53+b, that is, k=(P52-P50) / (P53-P51) and b=(P50-k*P51)=(P50*P53-P51*P52) / (P53-P51), where P50 represents the third pressure of the calibration tank, P51 represents the fourth pressure of the third pipeline space, P52 represents the fifth pressure of the calibration tank, and P53 represents the sixth pressure of the third pipeline space. In this way, the pressure correction coefficient is calculated.

[0123] Please refer to Figure 9 , Figure 9 A flowchart schematically showing a volume calibration method provided by some embodiments of the present application is shown.

[0124] As Figure 9 shown, before the calibration tank has been filled with the target moles of gas, the volume calibration method further includes, but is not limited to, the following steps S91-S96:

[0125] S91: Control the standard line space to enter a vacuum state.

[0126] In the embodiments of the present application, all the valves (i.e., the first valve, the second valve, the third valve, and the fourth valve) related to the standard line space are opened, and the dry pump performs a vacuumizing operation on the standard line space to extract the gas in the standard line space, so that the standard line space enters a vacuum state.

[0127] In some embodiments, controlling the standard line space to enter a vacuum state specifically includes, but is not limited to, the following steps S911-S914:

[0128] S911: Control the first valve, the second valve, the third valve, and the fourth valve to enter an open state.

[0129] S912: Control the dry pump to perform a vacuumizing operation.

[0130] S913: Obtain the pressure of the standard line space detected by the first sensing device.

[0131] S914: In response to the pressure of the standard line space being less than a preset vacuum threshold, determine that the standard line space enters a vacuum state.

[0132] In the embodiments of the present application, the first valve, the second valve, the third valve, and the fourth valve are controlled to enter and be in an open state, so that the fourth line space, the third line space, the second line space, and the reference line space are communicated to form the standard line space. The dry pump performs a vacuumizing operation to extract the gas in the standard line space, and the pressure of the standard line space detected by the first sensing device is obtained in real time. Obviously, since the fourth line space, the third line space, the second line space, and the reference line space are communicated at this time, the pressure of the third line space detected by the first sensing device is the pressure of the standard line space.

[0133] In the embodiments of the present application, the pressure of the standard line space is compared with the preset vacuum threshold. If the pressure of the standard line space is less than the preset vacuum threshold, it is determined that the standard line space enters and is in a vacuum state. It can be understood that the preset vacuum threshold can be any suitable value, for example, 200 mmTorr.

[0134] S92: Obtain the third volume calibration parameter of the calibration tank detected by the second sensing device and the fourth volume calibration parameter of the third pipeline space detected by the first sensing device when the standard pipeline space is in a vacuum state.

[0135] In this embodiment, the third volume calibration parameter includes a third pressure of the calibration tank, and the fourth volume calibration parameter includes a fourth pressure of the third pipeline space.

[0136] For example, in some embodiments, obtaining the third volume calibration parameter of the calibration tank detected by the second sensing device and the fourth volume calibration parameter of the third pipeline space detected by the first sensing device when the standard pipeline space is in a vacuum state specifically includes but is not limited to the following steps S921-S923:

[0137] S921: Control the first valve and the third valve to enter a closed state when the standard pipeline space is in a vacuum state, wherein the second valve and the fourth valve are in an open state.

[0138] S922: Determine whether the standard pipeline space enters a gas stable state.

[0139] S923: Obtain the third volume calibration parameter of the calibration tank detected by the second sensing device and the fourth volume calibration parameter of the third pipeline space detected by the first sensing device in response to the standard pipeline space entering the gas stable state.

[0140] In this embodiment, the pressure of the gas in the standard pipeline space is sampled multiple times to obtain multiple pressure values. After determining that the standard pipeline space enters the gas stable state according to the multiple pressure values, the third volume calibration parameter of the calibration tank detected by the second sensing device and the fourth volume calibration parameter of the third pipeline space detected by the first sensing device are obtained. In this way, accidental pressure fluctuations (such as electromagnetic interference and gas flow transients) are filtered out, and the continuous stable state of the standard pipeline space is identified (to avoid misjudgment of a single pressure fluctuation as a stable state).

[0141] S93: Control the gas output module to fill the calibration tank with a specified number of moles of gas.

[0142] In this embodiment, the gas control valve VALSec of the gas output module is controlled to enter an open state, and the gas output by the gas output module is filled into the calibration tank, so that the calibration tank is filled with a specified number of moles of gas. The specified number of moles can be any suitable value.

[0143] In some embodiments, controlling the gas output module to fill the calibration tank with a specified number of moles of gas specifically includes but is not limited to the following steps S931-S932:

[0144] S931: control the first valve to enter an open state, wherein the third valve is in a closed state, and the second valve and the fourth valve are both in an open state.

[0145] S932: control the gas output module to fill the specified moles of gas into the calibration tank.

[0146] The embodiment of the present application controls the gas control valve of the gas output module to enter an open state, and controls the first valve, the second valve, and the fourth valve to all enter and be in an open state, and controls the third valve to enter and be in a closed state, fills the gas output by the gas output module into the calibration tank through the first valve, the second valve, and the fourth valve, and when it is detected that the amount of substance of the gas filled into the calibration tank has reached the specified moles, controls the gas control valve of the gas output module to enter a closed state, and stops filling the gas into the calibration tank.

[0147] S94: control the target pipeline space to communicate with the calibration tank to form a closed sixth pipeline space.

[0148] In some embodiments, controlling the target pipeline space to communicate with the calibration tank to form a closed sixth pipeline space specifically includes but is not limited to the following step S941:

[0149] S941: control the first valve to enter a closed state, so that the target pipeline space communicates with the calibration tank to form a closed sixth pipeline space, wherein the third valve is in a closed state, and the second valve and the fourth valve are both in an open state.

[0150] The embodiment of the present application controls the first valve to enter a closed state, so that the fourth pipeline space is isolated from the sixth pipeline space, and the third valve is in a closed state, and the second valve and the fourth valve are both in an open state, so that the target pipeline space communicates with the calibration tank to form a closed sixth pipeline space, that is, the target pipeline space communicates with the reference pipeline space to form the sixth pipeline space.

[0151] S95: in response to the sixth pipeline space entering a gas stable state, acquire the fifth volume verification parameter of the calibration tank detected by the second sensing device, and the sixth volume verification parameter of the third pipeline space detected by the first sensing device.

[0152] The embodiment of the present application controls the first valve to enter and be in a closed state, so that the fourth pipeline space is isolated from the third pipeline space, the third pipeline space, the second pipeline space, and the reference pipeline space communicate to form the sixth pipeline space, and after detecting that the sixth pipeline space enters a gas stable state, the fifth volume verification parameter of the calibration tank detected by the second sensing device and the sixth volume verification parameter of the third pipeline space detected by the first sensing device are acquired.

[0153] In this embodiment, the fifth volume verification parameter includes a fifth pressure related to the calibration tank, and the sixth volume verification parameter includes a sixth pressure related to the third pipeline space.

[0154] In some embodiments, in response to the sixth pipeline space entering a gas stable state, the second sensing device detects the fifth volume verification parameter of the calibration tank, and the first sensing device detects the sixth volume verification parameter of the third pipeline space, specifically including but not limited to the following steps S951-S952:

[0155] S951: Determine whether the sixth pipeline space enters a gas stable state under the condition that the sixth pipeline space is in a sealed state.

[0156] S952: In response to the sixth pipeline space entering a gas stable state, the second sensing device detects the fifth volume verification parameter of the calibration tank, and the first sensing device detects the sixth volume verification parameter of the third pipeline space.

[0157] In this embodiment, the pressure of the gas in the sixth pipeline space is sampled multiple times under the condition that the sixth pipeline space is in a sealed state, and multiple pressure values are obtained. After determining that the sixth pipeline space enters a gas stable state according to the multiple pressure values, the fifth volume verification parameter of the calibration tank detected by the second sensing device and the sixth volume verification parameter of the third pipeline space detected by the first sensing device are obtained. In this way, accidental pressure fluctuations (such as electromagnetic interference and gas flow transients) can be filtered out, and the sustained stable state of the sixth pipeline space can be identified (to avoid misjudgment of a single pressure fluctuation as a stable state).

[0158] S96: Generate a pressure correction coefficient based on the third volume verification parameter, the fourth volume verification parameter, the fifth volume verification parameter, and the sixth volume verification parameter.

[0159] For example, in some embodiments, the pressure correction coefficient is generated based on the third volume verification parameter, the fourth volume verification parameter, the fifth volume verification parameter, and the sixth volume verification parameter, specifically including but not limited to the following steps S961-S965:

[0160] S961: Calculate the difference between the fifth pressure and the third pressure to obtain a first difference.

[0161] S962: Calculate the difference between the sixth pressure and the fourth pressure to obtain a second difference.

[0162] S963: Obtain a deviation ratio by dividing the first difference by the second difference.

[0163] S964: Calculate the product of the deviation ratio and the fourth pressure to obtain a pressure deviation.

[0164] S965: Subtract the pressure deviation from the third pressure to obtain a bias parameter.

[0165] In this embodiment, the deviation ratio is used to represent the deviation of the third pipeline space relative to the calibration tank at each unit pressure.

[0166] S6223: In response to the target pressure of the third pipeline space being less than the preset vacuum threshold, it is determined that the target pipeline space enters a vacuum state.

[0167] In this embodiment, the target pressure of the third pipeline space is compared with the preset vacuum threshold. If the target pressure of the third pipeline space is less than the preset vacuum threshold, it indicates that the third pipeline space enters and is in a vacuum state. At this time, the third pipeline space and the second pipeline space are connected to form a target pipeline space. In this way, it can be determined that the target pipeline space enters a vacuum state.

[0168] S623: Control the gas of the calibration tank to diffuse only to the second pipeline space.

[0169] In some embodiments, controlling the gas of the calibration tank to diffuse only to the second pipeline space specifically includes but is not limited to the following steps S6231-S6232:

[0170] S6231: Control the second valve and the third valve to enter a closed state.

[0171] S6232: After experiencing a second preset time delay, control the fourth valve to enter an open state, so that the gas of the calibration tank diffuses only to the second pipeline space.

[0172] In this step, the second valve and the third valve are controlled to enter a closed state, so that the dry pump and the third pipeline space are isolated from the second pipeline space. It can be understood that the second preset time length can be any suitable time length, for example, 2s, 5s or other time lengths.

[0173] In this embodiment, the timer is used to time the delay time length. After experiencing the second preset time delay, the fourth valve is controlled to enter an open state, so that the reference pipeline space is connected to the second pipeline space, and the gas of the calibration tank diffuses only to the second pipeline space.

[0174] S63: In response to the second pipeline space entering a gas stable state, a second volume verification parameter of the calibration tank is obtained.

[0175] In this embodiment, the pressure of the gas in the second pipeline space is sampled multiple times to obtain multiple pressure values. The second volume verification parameter of the calibration tank is obtained after the second pipeline space enters a gas stable state according to the multiple pressure values. In this way, accidental pressure fluctuations (such as electromagnetic interference and gas flow transients) are filtered, and the continuous stable state of the second pipeline space is identified (to avoid misjudgment of a single pressure fluctuation as a stable state).

[0176] S64: determining the second volume of the second pipeline space based on the first volume verification parameter, the second volume verification parameter and the first volume.

[0177] In the embodiments of the present application, the first volume verification parameter comprises the first pressure and the first temperature related to the calibration tank, and the second volume verification parameter comprises the second pressure and the second temperature related to the calibration tank.

[0178] Please refer to Figure 10 , Figure 10 A sub-process flowchart of step S64 in the volume calibration method provided by some embodiments of the present application is schematically shown.

[0179] As Figure 10 shown, in some embodiments, the second volume of the second pipeline space is determined based on the first volume verification parameter, the second volume verification parameter and the first volume, specifically including but not limited to the following steps S641-S644:

[0180] S641: dividing the product of the second temperature and the first pressure by the product of the first temperature and the second pressure to obtain a first coefficient.

[0181] S642: multiplying the result of subtracting the natural number 1 from the first coefficient by the first volume to obtain a candidate volume.

[0182] S643: determining a first undetermined volume based on one or more candidate volumes.

[0183] In the embodiments of the present application, the second volume verification parameter of the calibration tank is obtained one or more times, and the second volume of the second pipeline space is determined based on the first volume verification parameter, the second volume verification parameter and the first volume one or more times, so that one or more candidate volumes can be calculated and obtained. When the second volume verification parameter of the calibration tank is obtained only once, a candidate volume is calculated and obtained once, and the candidate volume is determined as the first undetermined volume. When the second volume verification parameter of the calibration tank is obtained multiple times, multiple candidate volumes are calculated and obtained, and the average of the multiple candidate volumes is determined as the first undetermined volume.

[0184] S644: determining the second volume of the second pipeline space based on the first undetermined volume and a preset volume error.

[0185] In the embodiments, the preset volume error is the volume of the valve, and the purpose is to calculate the pipeline volume, so the first undetermined volume calculated is subtracted by the preset volume error (i.e. the volume of the fourth valve in the second pipeline space at this time) to obtain the second volume of the second pipeline space.

[0186] S65: controlling the gas of the calibration tank to diffuse only to the target pipeline space.

[0187] After the second volume of the second pipeline space is determined, the gas in the calibration tank is controlled to diffuse only to the target pipeline space.

[0188] In some embodiments, the controlling of the gas in the calibration tank to diffuse only to the target pipeline space specifically includes but is not limited to the following step S651:

[0189] S651: controlling the second valve to enter an open state, so that the third pipeline space and the second pipeline space jointly form the target pipeline space, and the gas in the calibration tank diffuses only to the target pipeline space, wherein the first valve and the third valve are both in a closed state, and the fourth valve is in an open state.

[0190] In the embodiments of the present application, the first valve and the third valve are controlled to be closed, so that the first valve and the third valve are both in a closed state, the fourth valve and the second valve are controlled to be opened, so that the fourth valve and the second valve enter and are in an open state, so that the third pipeline space and the second pipeline space are communicated to form the target pipeline space, and when the fourth valve enters and is in an open state, the gas in the calibration tank diffuses out, so that the gas in the calibration tank diffuses only to the target pipeline space.

[0191] S66: in response to the target pipeline space entering a gas stable state, obtaining a third volume verification parameter of the calibration tank.

[0192] In the embodiments, the pressure of the gas in the target standard pipeline space is obtained multiple times to obtain multiple pressure values. According to the multiple pressure values, the third volume verification parameter of the calibration tank is obtained after the target pipeline space enters a gas stable state, so that accidental pressure fluctuations (such as electromagnetic interference and gas flow transients) are filtered, and the sustained stable state of the target pipeline space is identified (to avoid misjudgment of a single pressure fluctuation as a stable state).

[0193] S67: determining a third volume of the third pipeline space based on the first volume verification parameter, the third volume verification parameter and the first volume.

[0194] In the embodiments of the present application, the first volume verification parameter includes a first pressure and a first temperature of the calibration tank, and the third volume verification parameter includes a third pressure and a third temperature of the calibration tank.

[0195] In some embodiments, the determination of the third volume of the third pipeline space based on the first volume verification parameter, the third volume verification parameter and the first volume specifically includes but is not limited to the following steps S671-S675:

[0196] S671: dividing the product of the third temperature and the first pressure by the product of the first temperature and the third pressure to obtain a second coefficient.

[0197] S672: multiplying the result of subtracting the natural number 1 from the second coefficient by the first volume to obtain a reference volume.

[0198] S673: determining the second to-be-determined volume based on the one or more reference volumes.

[0199] In the embodiment of the present application, the third volume verification parameter of the calibration tank is acquired one or more times, and the third volume of the third pipeline space is determined based on the first volume verification parameter, the third volume verification parameter and the first volume one or more times, and the one or more reference volumes can be calculated. When the third volume verification parameter of the calibration tank is acquired only once, the one reference volume is calculated, and the reference volume is determined as the second to-be-determined volume. When the third volume verification parameter of the calibration tank is acquired multiple times, the multiple reference volumes are calculated, and the average of the multiple reference volumes is determined as the second to-be-determined volume.

[0200] S674: obtaining the third to-be-determined volume by subtracting the second volume from the second to-be-determined volume.

[0201] S675: determining the third volume of the third pipeline space based on the third to-be-determined volume and the preset volume error.

[0202] In the embodiment, the preset volume error is the volume of the valve, and the purpose is to calculate the pipeline volume, so the third to-be-determined volume calculated is subtracted by the preset volume error (i.e. the volume of the second valve in the target pipeline space at this time), to obtain the third volume of the third pipeline space.

[0203] It should be noted that in the above various embodiments, the above steps do not necessarily have a certain order, and those skilled in the art can understand from the description of the embodiments of the present application that the above steps can have different execution orders in different embodiments, that is, they can be executed in parallel, or they can be exchanged and executed, etc.

[0204] In general, the volume calibration method provided by the embodiments of the present application obtains the accurate second volume calibration parameter of the calibration tank under the condition that the target moles of gas in the calibration tank diffuse to the second pipeline space and the second pipeline space is in a gas stable state, combines the first volume calibration parameter and the first volume of the calibration tank under the condition that the fourth valve is in a closed state, and calculates the accurate and high-precision second volume of the second pipeline space. In addition, the target moles of gas in the calibration tank diffuse to the target pipeline space, the accurate third volume calibration parameter of the calibration tank is obtained under the condition that the target pipeline space is in a gas stable state, the first volume calibration parameter and the first volume of the calibration tank under the condition that the fourth valve is in a closed state are combined, and the accurate and high-precision third volume of the third pipeline space is calculated. In this way, the volumes of different partition pipeline spaces (i.e., the second pipeline space and the third pipeline space) are accurately measured, and the requirements of the semiconductor process on the volume accuracy are met. In addition, the volume of the pipeline space is calculated based on the accurately collected temperature and pressure, the accurate measurement of the volume of the pipeline space in the industrial scene with dynamic temperature changes is improved, and the gas mass flow verification system provided by the embodiments of the present application is used for multiple cycle verification calibration, steady state criterion, and the accuracy requirements of the semiconductor equipment on the pipeline volume are met.

[0205] The embodiments of the present application also provide a computer readable storage medium, which stores a computer program. The computer program includes program instructions. When the program instructions are executed by a processor, the computer executes the volume calibration method as described in the foregoing embodiments.

[0206] Those skilled in the art can understand that all or part of the processes in the above-mentioned embodiments can be completed by a computer program instructing related hardware. The program can be stored in a computer readable storage medium. When the program is executed, the program can include the processes of the above-mentioned embodiments. The storage medium can be a magnetic disc, an optical disc, a read-only memory (ROM) or a random access memory (RAM).

[0207] The above only describes the preferred embodiments of the present application, and of course cannot limit the scope of the rights of the present application. Therefore, equivalent changes made according to the claims of the present application are still within the scope of the present application.

Claims

1. A volume calibration method applied to a gas mass flow verification system, characterized in that, The gas mass flow verification system comprises a calibration system, a calibration tank system and a dry pump, the calibration system comprises a first valve, a second valve and a third valve, the calibration tank system comprises a calibration tank and a fourth valve, an input end of the first valve is used for docking a gas output module, the gas output module is in communication connection with the calibration system, an output end of the first valve is in communication with an input end of the second valve, an output end of the second valve is respectively docked with an input end of the third valve and an input end of the fourth valve, an output end of the third valve is used for docking the dry pump, and an output end of the fourth valve is used for docking the calibration tank, and the volume calibration method comprises: In response to the calibration tank being filled with a target mole of gas, a first volume calibration parameter of the calibration tank is obtained when the fourth valve is in a closed state, and the volume of the calibration tank is a known first volume; In response to the target pipeline space entering a vacuum state, the gas of the calibration tank is controlled to diffuse only to a second pipeline space, the target pipeline space is composed of a third pipeline space and the second pipeline space, the third pipeline space is a pipeline space formed between the first valve and the second valve, and the second pipeline space is a pipeline space formed between the second valve, the third valve and the fourth valve; In response to the second pipeline space entering a gas stable state, a second volume calibration parameter of the calibration tank is obtained; Based on the first volume calibration parameter, the second volume calibration parameter and the first volume, a second volume of the second pipeline space is determined; The gas of the calibration tank is controlled to diffuse only to the target pipeline space; In response to the target pipeline space entering a gas stable state, a third volume calibration parameter of the calibration tank is obtained; Based on the first volume calibration parameter, the third volume calibration parameter and the first volume, a third volume of the third pipeline space is determined.

2. The volume calibration method of claim 1, wherein, The response to the calibration tank being filled with a target mole of gas, the first volume calibration parameter of the calibration tank is obtained when the fourth valve is in a closed state, comprising: The first valve, the second valve and the fourth valve are controlled to enter an open state, and the third valve enters a closed state; The gas output module outputs gas, so that the gas fills the calibration tank through the first valve, the second valve and the fourth valve, so that the amount of substance of the gas filled in the calibration tank is a target mole; The first volume calibration parameter of the calibration tank in the closed state of the fourth valve is obtained.

3. The volume calibration method of claim 1, wherein, The response to the target pipeline space entering a vacuum state, the gas of the calibration tank is controlled to diffuse only to a second pipeline space, comprising: The first valve and the fourth valve are controlled to enter a closed state; After a first preset time delay, the third valve is controlled to enter an open state, so that the dry pump performs a vacuumizing operation to set the target pipeline space to enter a vacuum state; The gas of the calibration tank is controlled to diffuse only to the second pipeline space.

4. The volume calibration method of claim 3, wherein, The control of the gas of the calibration tank to diffuse only to the second pipeline space comprises: controlling the second valve and the third valve to enter a closed state; after experiencing a delay for a second preset time length, controlling the fourth valve to enter an open state, so that the gas of the calibration tank is only diffused to the second pipeline space.

5. The volumetric calibration method of claim 3, wherein, after experiencing a delay for a first preset time length, controlling the third valve to enter an open state, so that the dry pump performs a vacuumizing operation to set the target pipeline space to enter a vacuum state, including: after experiencing a delay for a first preset time length, controlling the third valve to enter an open state, so that the dry pump performs a vacuumizing operation; acquiring a target pressure of the third pipeline space; in response to the target pressure of the third pipeline space being less than a preset vacuum threshold, determining that the target pipeline space enters a vacuum state.

6. A volume calibration method according to any one of claims 1 to 5, characterized in that, the first volume verification parameter includes a first pressure and a first temperature of the calibration tank, the second volume verification parameter includes a second pressure and a second temperature of the calibration tank, and the second volume of the second pipeline space is determined based on the first volume verification parameter, the second volume verification parameter, and the first volume, including: dividing the product of the second temperature and the first pressure by the product of the first temperature and the second pressure to obtain a first coefficient; multiplying the result of subtracting a natural number 1 from the first coefficient by the first volume to obtain a candidate volume; determining a first undetermined volume based on one or more candidate volumes; determining the second volume of the second pipeline space based on the first undetermined volume and a preset volume error.

7. A volume calibration method according to any one of claims 1 to 5, characterized in that, the control of the gas of the calibration tank only diffusing to the target pipeline space includes: controlling the second valve to enter an open state, so that the third pipeline space and the second pipeline space together constitute the target pipeline space, and the gas of the calibration tank only diffuses to the target pipeline space, wherein the first valve and the third valve are both in a closed state, and the fourth valve is in an open state.

8. A volume calibration method according to any one of claims 1 to 5, characterized in that, the first volume verification parameter includes a first pressure and a first temperature of the calibration tank, the third volume verification parameter includes a third pressure and a third temperature of the calibration tank, and the third volume of the third pipeline space is determined based on the first volume verification parameter, the third volume verification parameter, and the first volume, including: dividing the product of the third temperature and the first pressure by the product of the first temperature and the third pressure to obtain a second coefficient; multiplying the result of subtracting a natural number 1 from the second coefficient by the first volume to obtain a reference volume; determining a second undetermined volume based on one or more reference volumes; subtracting the second volume from the second undetermined volume to obtain a third undetermined volume; determining the third volume of the third pipeline space based on the third undetermined volume and a preset volume error.

9. A controller characterized by comprising: a memory and a processor, the memory being connected to the processor, the processor being used to execute one or more computer programs stored in the memory, and the processor, when executing the one or more computer programs, causing the controller to implement the volume calibration method according to any one of claims 1-8.

10. A gas mass flow verification system characterized by, The calibration system comprises a first valve, a second valve, a third valve and a controller as claimed in claim 9, the calibration tank system comprises a calibration tank and a fourth valve, an input end of the first valve is used for docking a gas output module, an output end of the first valve is communicated with an input end of the second valve, output ends of the second valve are respectively docked with input ends of the third valve and the fourth valve, an output end of the third valve is used for docking the dry pump, an output end of the fourth valve is used for docking the calibration tank, and the controller is respectively connected in communication with the first valve, the second valve, the third valve, the fourth valve and the gas output module; The target pipeline space is composed of the third pipeline space and the second pipeline space, and the first pipeline space is composed of the fourth pipeline space, the third pipeline space and the second pipeline space, the fourth pipeline space is a pipeline space formed between an output end of the gas output module and the first valve, the third pipeline space is a pipeline space formed between the first valve and the second valve, and the second pipeline space is a pipeline space formed between the second valve, the third valve and the fourth valve; The third pipeline space is provided with a first sensing device configured to detect the pressure and temperature of the third pipeline space; The reference pipeline space is provided with a second sensing device, the reference pipeline space is a pipeline space formed between the fourth valve and the calibration tank, and the second sensing device is configured to detect the pressure and temperature of the calibration tank.

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