Etching equipment for RFID antenna production

Abstract

The invention provides etching equipment for RFID antenna production. The etching equipment comprises an etching agent storage device, a supporting suspension device, an aeration device and a sealing device. An etching agent used for etching the copper-clad plate is contained in the etching agent storage device, and the etching effect is achieved by making contact with the copper-clad plate through the etching agent. When the antenna etching device is used, the aeration device is arranged at the inner bottom of the etching agent storage device, the containing frame is arranged in the etching agent storage device and located above the aeration device, etching agents enter the containing frame through the liquid passing holes, and when antenna etching is carried out, a copper-clad plate is placed in the containing frame for etching; when double-sided etching is needed, the etching agent is aerated through the aeration device, and the etching agent generates upward power to push the copper-clad plate, so that the copper-clad plate is suspended to be in complete contact with the etching agent, and the effect of double-sided simultaneous etching is achieved.

Description

TECHNICAL FIELD

[0001] The present application relates to the field of etching technology, in particular to an etching equipment for RFID antenna production. BACKGROUND

[0002] RFID is the abbreviation of Radio Frequency Identification, which is a kind of automatic identification technology. It realizes non-contact two-way data communication through wireless radio frequency, and reads and writes the recording medium (electronic tag or radio frequency card) through wireless radio frequency, so as to achieve the purpose of identification and data exchange. It is considered as one of the most potential information technologies in the 21st century.

[0003] Etching is a technology that removes part of the material by using chemical reaction or physical impact. When producing RFID antenna, the circuit line is drawn on the copper-clad plate through ink, and then the etching medium is contacted with the drawn copper-clad plate to obtain the circuit board. Then the electronic components of the RFID antenna are installed on the copper wire of the copper-clad plate according to the regulation, and the RFID antenna is obtained.

[0004] In order to improve the integration degree of the circuit board, the drawing is often carried out on both sides of the copper-clad plate. At this time, the two sides of the copper-clad plate need to be etched. When the traditional process equipment etches, one side of the copper-clad plate needs to be supported, so that only one side can be etched. The next side can be etched only after one side is etched. Therefore, the existing process equipment increases the processing time of etching, causing inconvenience in processing.

[0005] Therefore, the present application provides an etching equipment for RFID antenna production, which is used to improve the convenience of double-sided etching of RFID antenna. SUMMARY

[0006] In view of the above-mentioned shortcomings of the prior art, the purpose of the present application is to provide an etching equipment for RFID antenna production, which is used to solve the problem of inconvenience in double-sided etching in the prior art.

[0007] To achieve the above-mentioned purpose and other related purposes, the present application provides an etching equipment for RFID antenna production, which comprises: An etching agent storage device, the inside of the etching agent storage device is filled with etching agent for etching copper-clad plate; A support suspension device is arranged at the four corners inside the etching agent storage device, the support suspension device supports a copper-clad plate storage device, and the support suspension device can make the bottom of the copper-clad plate storage device float in the inside of the etching agent storage device in a natural state, and the copper-clad plate is placed in the inside of the copper-clad plate storage device; An aeration device is arranged at the inner bottom of the etching agent storage device, which aeration device aeration can make the etching agent in the etching agent storage device float, and in turn drive the copper-clad plate in the copper-clad plate containing device to float; A sealing device is arranged above the etching agent storage device, which is used for sealing the mouth of the etching agent storage device, and can apply pressure to the copper-clad plate containing device when the mouth of the etching agent storage device is sealed. The copper-clad plate containing device comprises a containing frame, the four edges of the top of the containing frame are circularly arranged with support aprons, the four corners of the support apron are provided with through holes, the through holes cooperate with the support suspension device to support the containing frame, and the bottom of the containing frame is provided with a liquid passing hole.

[0008] Preferably, the inner bottom of the containing frame is provided with a plurality of suspension pipes, the copper-clad plate is supported by the suspension pipes, and a gap is left between the bottom of the copper-clad plate and the inner bottom of the containing frame.

[0009] Preferably, the aeration device is provided with a non-return device, the arrangement position of the non-return device is matched with the position of the suspension pipe, and the non-return device is inserted into the inside of the suspension pipe after the containing frame is pressed down.

[0010] Preferably, the non-return device comprises an airflow pipe, the inner top of the airflow pipe is provided with an inwardly extending limiting lip, the inner wall of the airflow pipe is provided with a cross-shaped support frame, the center of the cross-shaped support frame is provided with a sealing column, and a gap is left between the end of the sealing column and the limiting lip. A sealing ring is sleeved on the sealing column, the inner diameter of the sealing ring is the same as the diameter of the sealing column, the outer diameter of the sealing ring is the same as the inner diameter of the airflow pipe, and the height of the sealing ring is less than the length of the gap between the end of the sealing column and the limiting lip.

[0011] Preferably, the support suspension device comprises a support sleeve, the inside of the support sleeve is provided with a movable cavity, the inside of the movable cavity is provided with a support rod which can move along the movable cavity, and the end of the support rod is provided with a support table to support the support apron. The inside of the movable cavity is provided with an elastic member, and the elastic member makes the support rod extend upward under force.

[0012] Preferably, a protective sleeve is arranged between the top of the support sleeve and the bottom of the support table, the protective sleeve seals the connection between the movable cavity and the support rod, and the protective sleeve is a telescopic bellows.

[0013] Preferably, an auxiliary groove is arranged on the support apron, and the auxiliary groove is between two adjacent support suspension devices.

[0014] Preferably, the sealing device comprises a cover plate with a size matched with the etching agent storage device, and a pressing block is arranged at the bottom of the cover plate and can extend into the etching agent storage device.

[0015] Preferably, a telescopic driving device is arranged at the side of the etching agent storage device, and the end of the telescopic driving device is connected with the side of the sealing device for supporting the sealing device.

[0016] Preferably, the end of the telescopic driving device is respectively provided with a lower gasket and an upper gasket, a gap for mounting the sealing device is arranged between the lower gasket and the upper gasket, and the sealing device can rotate along the radial direction of the telescopic driving device between the lower gasket and the upper gasket.

[0017] As described above, the etching device for RFID antenna production has the following beneficial effects: The etching agent storage device is provided with an aeration device at the inner bottom, and a containing frame is arranged inside the etching agent storage device and located above the aeration device, and the etching agent enters the inside of the containing frame through the liquid passage, the copper-clad plate is placed in the containing frame during antenna etching, and etching is performed, when double-sided etching is required, the etching agent is aerated by the aeration device, the etching agent generates upward power to push the copper-clad plate, the copper-clad plate is suspended and fully contacts with the etching agent, and the effect of double-sided etching at the same time is realized.

[0018] Meanwhile, when the aeration device aerates the etching agent, the etching agent is in a stirring state, so as to avoid the chemical reaction substances in the etching agent from precipitating and causing the etching efficiency to be reduced.

[0019] 1、The inner bottom of the containing frame is provided with a suspension pipe for supporting the copper-clad plate, so as to reduce the area covered by the bottom of the copper-clad plate, and a non-return device is arranged on the aeration device, the suspension pipe is inserted with the non-return device when the containing frame is pressed, and when the aeration device is aerated, the airflow directly acts on the bottom of the copper-clad plate through the non-return device, so as to improve the floating effect of the copper-clad plate.

[0020] 2、The airflow pipe is provided with a cross support frame and a sealing column inside the airflow pipe for supporting the sealing ring, when aeration is performed, the airflow pushes the sealing ring to rise and forms a flow channel in the inside of the airflow pipe, when aeration is stopped, the sealing ring falls and is sleeved on the sealing column to form a sealed channel in the inside of the airflow pipe, and the etching agent is prevented from flowing back and corroding the air pump in the aeration device.

[0021] 3、The application supports the copper-clad plate containing device by arranging the support suspension device in the inside of the etching agent storage device, the mouth of the containing frame is close to the mouth of the etching agent storage device in the natural state, the containing frame is soaked in the etching agent in the inside of the etching agent storage device to realize etching by the sealing device pressing down during etching. Meanwhile, the protective sleeve is arranged between the end of the support sleeve and the support table, the connection place of the support sleeve and the support rod is isolated by the protective sleeve, and the etching agent is prevented from entering the inside of the movable cavity to corrode the elastic member.

[0022] 4、The application supports the sealing device by arranging the lower gasket and the upper gasket on the telescopic driving device, and the sealing device can rotate, so that the containing frame is conveniently disassembled and assembled.

[0023] Therefore, the application effectively overcomes the various defects in the prior art and has high industrial utilization value. BRIEF DESCRIPTION OF DRAWINGS

[0024] Figure 1 The structure schematic diagram of the application is shown.

[0025] Figure 2 The structure side view of the application is shown.

[0026] Figure 3 The structure assembly schematic diagram of the application is shown.

[0027] Figure 4 The installation schematic diagram of the copper-clad plate containing device of the application is shown.

[0028] Figure 5 The structure sectional view of the support suspension of the application is shown.

[0029] Figure 6 The structure schematic diagram of the copper-clad plate containing device of the application is shown.

[0030] Figure 7 The structure sectional view of the reverse stopping device of the application is shown.

[0031] Figure 8 The structure assembly schematic diagram of the sealing ring of the application is shown.

[0032] Element number explanation: 1、Etching agent storage device; 2、Support suspension device; 201、Support sleeve; 202、Movable cavity; 203、Support rod; 204、Support table; 205、Elastic member; 206、Protective sleeve; 3、Copper-clad plate containing device; 301、Containing frame; 302、Support apron; 303、Through hole; 304、Liquid passing hole; 305、Suspension pipe; 306、Auxiliary groove; 4. An aeration device; 5. A check valve; 501, an air flow pipe; 502, a limiting lip; 503, a cross support frame; 504, a sealing column; 505, a sealing ring; 6. A telescopic driving device; 601, a lower gasket; 602, an upper gasket; 7. A sealing device. DETAILED DESCRIPTION

[0033] The embodiments of the present application will be described in detail by specific embodiments, and those skilled in the art can easily understand other advantages and effects of the present application from the content disclosed in the specification.

[0034] Please refer to Figures 1 to 8 . It should be understood that the structure, proportion, size, etc. shown in the drawings attached to the specification are only used to cooperate with the content disclosed in the specification for those skilled in the art to understand and read, and are not used to limit the defined conditions that the present application can be implemented, so they do not have technical significance. Any modification of the structure, change of the proportion relationship or adjustment of the size, without affecting the effects and purposes that the present application can produce, should still fall within the scope of the technical content disclosed by the present application. At the same time, the terms such as "upper", "lower", "left", "right", "middle" and "one" in the specification are only for the convenience of clear description, and are not used to limit the scope of the present application, and the change or adjustment of the relative relationship, without substantially changing the technical content, is also considered as the scope of the present application.

[0035] As shown in Figures 1-4 , the present application provides an etching device for RFID antenna production, which comprises: an etching agent storage device 1, a support suspension device 2, an aeration device 4 and a sealing device 7. The inside of the etching agent storage device 1 is filled with etching agent for etching copper-clad plate, and the etching effect is achieved by contacting the etching agent with the copper-clad plate. The support suspension device 2 is arranged at the four corners inside the etching agent storage device 1, and the support suspension device 2 supports the copper-clad plate storage device 3 from the four corners of the copper-clad plate storage device 3 to ensure the stable installation of the copper-clad plate storage device 3. The copper-clad plate storage device 3 can be detached from the support suspension device 2. The support suspension device 2 can make the bottom of the copper-clad plate storage device 3 float in the inside of the etching agent storage device 1 in a natural state, and the etching agent enters the copper-clad plate storage device 3 from the bottom of the copper-clad plate storage device 3. The above-mentioned copper-clad plate is placed in the inside of the copper-clad plate storage device 3 and contacts the etching agent to achieve etching.

[0036] The aeration device 4 is arranged at the inner bottom of the etching agent storage device 1. The aeration device 4 transmits gas through a gas pump and sprays the gas through the fine holes to generate bubbles in the liquid to achieve aeration. The aeration can make the etching agent in the etching agent storage device 1 float. The floating etching agent can drive the copper-clad plate in the copper-clad plate containing device 3 to float, so that the bottom of the copper-clad plate is in a non-contact state, thereby facilitating the double-sided etching at the same time and improving the etching efficiency and convenience. At the same time, the aeration device 4 can stir the etching agent during the aeration process, which can play a role in stirring the agent. The deposition of the agent is avoided to reduce the etching effect and efficiency. The sealing device 7 is arranged above the etching agent storage device 1 and is used for sealing the mouth of the etching agent storage device 1 to make the etching in a relatively closed state. The sealing device 7 is provided with a one-way hydraulic port for avoiding excessive pressure in the etching agent storage device 1 during the aeration process. The sealing device 7 can apply pressure to the copper-clad plate containing device 3 downward when sealing the mouth of the etching agent storage device 1, so that the copper-clad plate containing device 3 enters the deeper part of the etching agent storage device 1.

[0037] As shown in Figure 3 and Figure 6 , wherein the copper-clad plate containing device 3 comprises a containing frame 301, and four edges of the top of the containing frame 301 are circularly provided with support aprons 302, which cooperate with the end of the support suspension device 2 to limit the installation position and height of the containing frame 301. The four corners of the support apron 302 are provided with through holes 303, which are penetrated by the end of the support suspension device 2 for limiting the installation position of the containing frame 301. The through holes 303 cooperate with the support suspension device 2 to support the containing frame 301, and the bottom of the support apron 302 is supported by the support suspension device 2. The bottom of the containing frame 301 is provided with a liquid passing hole 304, and the etching agent in the etching agent storage device 1 enters the inside of the containing frame 301 from the liquid passing hole 304 to contact the copper-clad plate to corrode the parts of the copper-clad plate that are not drawn.

[0038] As shown in Figure 4 and Figure 5 , in some embodiments, the inner bottom of the containing frame 301 is provided with a plurality of suspension pipes 305 for supporting the copper-clad plate, so that a gap is left between the bottom of the copper-clad plate and the inner bottom of the containing frame 301, thereby reducing the area covered by the bottom of the copper-clad plate. Adjacent suspension pipes 305 are provided with gaps to further reduce the coverage area of the bottom of the copper-clad plate and improve the etching efficiency.

[0039] As shown in Figure 3As shown in some embodiments, the aeration device 4 is provided with a check device 5, and the aeration gas is sprayed from the check device 5. The check device 5 is arranged in a position matched with the position of the suspension tube 305. When the containing frame 301 is pressed down, the check device 5 is inserted into the inside of the suspension tube 305. When double-sided etching is performed, the gas is directly applied to the bottom of the copper-clad plate from the suspension tube 305 to suspend the copper-clad plate. The diffusion of the gas flow can be effectively avoided to reduce the thrust. When single-sided etching is performed, the aeration device 4 can be not started to keep the copper-clad plate stationary.

[0040] As shown in some embodiments, Figure 7 and Figure 8 As shown in some embodiments, the check device 5 includes a gas flow tube 501, which is used as a gas flow channel. The inner top of the gas flow tube 501 is provided with an inwardly extending limiting lip 502. The inner wall of the gas flow tube 501 is provided with a cross-shaped support frame 503, and the center of the cross-shaped support frame 503 is provided with a sealing column 504, which supports a sealing ring 505 sleeved on the sealing column 504. A gap is left between the end of the sealing column 504 and the limiting lip 502, which is a channel for the upward movement of the sealing ring 505, so that the sealing ring 505 can be released from the constraint of the sealing column 504 to allow the gas flow to enter the inside of the etching agent storage device 1 or the containing frame 301 through the axis of the sealing ring 505.

[0041] Specifically, the inner diameter of the sealing ring 505 is the same as the diameter of the sealing column 504, which is used to seal the axis of the sealing ring 505. The outer diameter of the sealing ring 505 is the same as the inner diameter of the gas flow tube 501, which is used to form a seal between the sealing ring 505 and the gas flow tube 501. When the sealing ring 505 is inserted on the sealing column 504, the inside of the gas flow tube 501 can be completely blocked. The height of the sealing ring 505 is less than the length of the gap between the end of the sealing column 504 and the limiting lip 502. When the aeration device 4 is working, the gas flow will push the sealing ring 505 to be released from the constraint of the sealing column 504, so that the axis of the sealing ring 505 is exposed to form a flow channel. At this time, the sealing ring 505 will be blocked by the limiting lip 502 to avoid the sealing ring 505 from being separated from the inside of the gas flow tube 501.

[0042] As shown in some embodiments, Figure 5 As shown in some embodiments, the support suspension device 2 includes a support sleeve 201, and the inside of the support sleeve 201 is provided with a movable cavity 202. The inside of the movable cavity 202 is provided with a support rod 203, which can move along the movable cavity 202 to realize the extension and contraction of the support rod 203 to pull the installation height of the containing frame 301 in the etching agent storage device 1. The end of the support rod 203 is provided with a support table 204 to support the support skirt 302, so as to avoid the containing frame 301 from sliding to the bottom of the etching agent storage device 1.

[0043] The interior of the movable cavity 202 is provided with an elastic member 205, which makes the support rod 203 extend upward under force. In the natural curved state, the mouth of the containing frame 301 is close to the mouth of the etching agent storage device 1, so as to facilitate the disassembly and assembly of the containing frame 301 and the placement of the copper-clad plate into the interior of the containing frame 301 for etching. When the end of the support rod 203 is pressed, the containing frame 301 will sink into the interior of the etching agent storage device 1, increasing the contact area of the copper-clad plate with the etching agent in the etching agent storage device 1.

[0044] As shown in Figure 5 some embodiments, in order to prevent the etching agent from entering the movable cavity 202 to corrode the elastic member 205, a protective sleeve 206 is arranged between the top of the support sleeve 201 and the bottom of the support table 204. The protective sleeve 206 seals the connection between the movable cavity 202 and the support rod 203. The protective sleeve 206 is an extensible bellows, which will expand or contract with the expansion or contraction of the support rod 203, so as not to hinder the expansion or contraction of the support rod 203.

[0045] As shown in Figure 3 some embodiments, the support skirt 302 of the present application is provided with an auxiliary groove 306. When the containing frame 301 is taken out or placed, a tool can be used to cooperate with the auxiliary groove 306 to take out the containing frame 301, improving the convenience. The auxiliary groove 306 is between two adjacent support suspension devices 2, so as to increase the gap around the bottom of the auxiliary groove 306, facilitating the insertion of a tool or a hand into the auxiliary groove 306.

[0046] As shown in Figure 3 some embodiments, the sealing device 7 of the present application includes a cover plate which is sized to fit the etching agent storage device 1, and the cover plate is used to seal the mouth of the etching agent storage device 1, so as to avoid the splashing of the etching agent during aeration. The bottom of the cover plate is provided with a pressing block which can extend into the interior of the etching agent storage device 1. The pressing block will exert pressure on the end of the support suspension device 2 or the support skirt 302 according to the depth of installation, so as to make the support suspension device 2 contract, make the containing frame 301 sink into the interior of the etching agent storage device 1, so as to realize the insertion of the suspension tube 305 and the check device 5, improve the effect of the aeration device 4 on the suspension of the copper-clad plate, and avoid the floating of the containing frame 301 during the aeration process.

[0047] In some embodiments, the etching agent storage device 1 is provided with a telescopic drive device 6 on the side, which is an electric, pneumatic or hydraulic telescopic rod. The end of the telescopic drive device 6 is connected to the side of the sealing device 7 for supporting the sealing device 7. After the telescopic drive device 6 is activated, the sealing device 7 can be driven to extend or retract to seal or open the mouth of the etching agent storage device 1. The telescopic degree of the telescopic drive device 6 can change the pressure on the support suspension device 2, and adjust the height of the containing frame 301 in the etching agent storage device 1.

[0048] As shown in Figure 3 and Figure 4 In some embodiments, the end of the telescopic drive device 6 is provided with a lower gasket 601 and an upper gasket 602. A gap is provided between the lower gasket 601 and the upper gasket 602 for mounting the sealing device 7. The sealing device 7 can rotate radially along the telescopic drive device 6 between the lower gasket 601 and the upper gasket 602. When disassembling the containing frame 301, the sealing device 7 can be rotated backward to completely expose the mouth of the etching agent storage device 1, facilitating the disassembly of the containing frame 301. When etching, the sealing device 7 is rotated to the top of the etching agent storage device 1, and the mouth of the etching agent storage device 1 is sealed by the retraction of the telescopic drive device 6.

[0049] The specific use process of the present application is as follows: Inject the etching agent used for etching into the inside of the etching agent storage device 1; Place the finished copper-clad plate in the inside of the containing frame 301 and support it through the suspension tube 305; Place the containing frame 301 with the copper-clad plate in the etching agent storage device 1, and support the support skirt 302 through the support rod 203 penetrating the penetration hole 303 and cooperating with the support table 204; When single-sided etching is performed, no additional operation is required, and the copper-clad plate can be immersed in the etching agent for etching; When double-sided etching is performed, the sealing device 7 is driven downward by the telescopic drive device 6 to seal the mouth of the etching agent storage device 1, and the end of the support rod 203 is pressed downward by the sealing device 7 to make the check device 5 inserted into the inside of the suspension tube 305, the aeration device 4 is activated for aeration, the copper-clad plate is suspended in the etching agent, and double-sided etching is performed at the same time; After the antenna etching is completed, the containing frame 301 is taken out from the etching agent storage device 1 with the auxiliary groove 306 to drain the etching agent, and the etching of the antenna is completed.

[0050] In conclusion, the etching device for RFID antenna production of the present application is characterized in that the aeration device 4 is arranged at the inner bottom of the etching agent storage device 1, the etching agent storage device 1 is internally provided with the containing frame 301 which is arranged above the aeration device 4, the etching agent enters the inside of the containing frame 301 through the liquid passage hole 304, the copper-clad plate is placed in the containing frame 301 during the etching of the antenna, and the etching is performed; when double-sided etching is required, the etching agent is aerated by the aeration device 4, the etching agent is forced to move upward to push the copper-clad plate, the copper-clad plate is suspended and fully contacts with the etching agent, and the effect of double-sided etching at the same time is achieved.

[0051] Meanwhile, the etching agent is in an agitated state when the aeration device 4 aerates the etching agent, so as to avoid the chemical reaction substances in the etching agent from precipitating and reducing the etching efficiency.

[0052] The present application supports the copper-clad plate by arranging the suspension pipe 305 at the inner bottom of the containing frame 301, so as to reduce the area of the copper-clad plate which is covered, and the reverse stopping device 5 is arranged on the aeration device 4; when the containing frame 301 is pressed, the suspension pipe 305 is inserted into the reverse stopping device 5; when the aeration device 4 aerates, the airflow directly acts on the bottom of the copper-clad plate through the reverse stopping device 5, so as to improve the floating effect of the copper-clad plate.

[0053] The present application supports the sealing ring 505 by arranging the airflow pipe 501, the cross-shaped support frame 503 and the sealing column 504 in the airflow pipe 501; when aeration is performed, the airflow pushes the sealing ring 505 to rise, so as to form a flow channel in the airflow pipe 501; when aeration is stopped, the sealing ring 505 falls and is sleeved on the sealing column 504, so as to form a sealed channel in the airflow pipe 501, and the etching agent is prevented from flowing back and corroding the air pump in the aeration device 4.

[0054] The present application supports the copper-clad plate containing device 3 by arranging the support suspension device 2 in the etching agent storage device 1; in a natural state, the mouth of the containing frame 301 is close to the mouth of the etching agent storage device 1, so as to facilitate the taking and placing of the containing frame 301; during etching, the containing frame 301 is immersed in the etching agent in the etching agent storage device 1 by the sealing device 7, so as to realize etching. Meanwhile, the protective sleeve 206 is arranged between the end of the support sleeve 201 and the support table 204, so as to isolate the connection between the support sleeve 201 and the support rod 203, and prevent the etching agent from entering the inside of the movable cavity 202 to corrode the elastic member 205.

[0055] The present application supports the sealing device 7 by arranging the lower gasket 601 and the upper gasket 602 on the telescopic driving device 6, and enables the sealing device 7 to rotate, so as to facilitate the disassembly and assembly of the containing frame 301.

[0056] Therefore, the present application effectively overcomes the shortcomings of the prior art and has a high industrial utilization value.

[0057] The above embodiments only exemplarily illustrate the principles and effects of the present application, and are not intended to limit the present application. Any person skilled in the art can modify or change the above embodiments without departing from the spirit and scope of the present application. Therefore, all equivalent modifications or changes made by those skilled in the art without departing from the spirit and technical thought disclosed by the present application should be covered by the claims of the present application.

Claims

1. An etching apparatus for producing RFID antennas, characterized in that, Include: Etching agent storage device (1), the inside of the etching agent storage device (1) is filled with etching agent for etching copper-clad plate; Supporting suspension device (2) is arranged at the four corners inside the etching agent storage device (1), the supporting suspension device (2) is supported with copper-clad plate storage device (3), the supporting suspension device (2) can make the bottom of copper-clad plate storage device (3) float in the inside of etching agent storage device (1) in natural state, the above-mentioned copper-clad plate is placed in the inside of copper-clad plate storage device (3); Aeration device (4) is arranged at the inner bottom of etching agent storage device (1), the aeration device (4) aeration can make the etching agent in etching agent storage device (1) float, in turn drive the copper-clad plate in copper-clad plate storage device (3) float; Sealing device (7) is arranged above the etching agent storage device (1), for sealing the mouth of etching agent storage device (1), and can apply pressure to copper-clad plate storage device (3) when sealing the mouth of etching agent storage device (1); Wherein, the copper-clad plate storage device (3) includes a storage frame (301), the four edges of the top of the storage frame (301) are circularly provided with support aprons (302), the four corners of the support apron (302) are provided with through holes (303), the through holes (303) are matched with the support suspension device (302) to support the storage frame (301), and the bottom of the storage frame (301) is provided with a liquid passing hole (304).

2. The etching apparatus for producing an RFID antenna according to claim 1, wherein: The inner bottom of the storage frame (301) is provided with a plurality of suspension pipes (305) for supporting the copper-clad plate, so that a gap is left between the bottom of the copper-clad plate and the inner bottom of the storage frame (301), and gaps are arranged between adjacent suspension pipes (305).

3. The etching apparatus for producing an RFID antenna according to claim 2, characterized by: The aeration device (4) is provided with a non-return device (5), the arrangement position of the non-return device (5) is matched with the position of the suspension pipe (305), and the non-return device (5) is inserted into the inside of the suspension pipe (305) after the storage frame (301) is pressed down.

4. The etching apparatus for producing an RFID antenna according to claim 3, wherein: The non-return device (5) includes an airflow pipe (501), the inner top of the airflow pipe (501) is provided with an inwardly extending limiting lip (502), the inner wall of the airflow pipe (501) is provided with a cross support frame (503), the center of the cross support frame (503) is provided with a sealing column (504), and a gap is left between the end of the sealing column (504) and the limiting lip (502); The sealing column (504) is provided with a sealing ring (505), the inner diameter of the sealing ring (505) is the same as the diameter of the sealing column (504), the outer diameter of the sealing ring (505) is the same as the inner diameter of the airflow pipe (501), and the height of the sealing ring (505) is less than the length of the gap between the end of the sealing column (504) and the limiting lip (502).

5. The etching apparatus for producing an RFID antenna according to any one of claims 1 to 4, characterized by: The support suspension device (2) comprises a support sleeve (201), an inner part of the support sleeve (201) is provided with a movable cavity (202), an inner part of the movable cavity (202) is provided with a support rod (203) which can move along the movable cavity (202), and an end part of the support rod (203) is provided with a support table (204) for supporting a support apron (302). An inner part of the movable cavity (202) is provided with an elastic member (205), the elastic member (205) makes the support rod (203) extend upward under force.

6. The etching apparatus for producing an RFID antenna according to claim 5, wherein: A protective sleeve (206) is arranged between the top of the support sleeve (201) and the bottom of the support table (204), the protective sleeve (206) seals the connection part between the movable cavity (202) and the support rod (203), and the protective sleeve (206) is a telescopic bellows.

7. The etching apparatus for producing an RFID antenna according to claim 6, wherein: An auxiliary groove (306) is arranged on the support apron (302), and the auxiliary groove (306) is between two adjacent support suspension devices (2).

8. The etching apparatus for producing an RFID antenna according to claim 5, wherein: The sealing device (7) comprises a cover plate which is matched in size with the etching agent storage device (1), and a bottom part of the cover plate is provided with a pressing block which can extend into the inner part of the etching agent storage device (1). 9.The etching apparatus for producing an RFID antenna according to claim 8, characterized by: A side of the etching agent storage device (1) is provided with a telescopic driving device (6), and an end part of the telescopic driving device (6) is connected with a side edge of the sealing device (7) for supporting the sealing device (7). 10.The etching apparatus for producing an RFID antenna according to claim 9, characterized by: An end part of the telescopic driving device (6) is respectively provided with a lower gasket (601) and an upper gasket (602), a gap for mounting the sealing device (7) is arranged between the lower gasket (601) and the upper gasket (602), and the sealing device (7) can rotate along the radial direction of the telescopic driving device (6) between the lower gasket (601) and the upper gasket (602).

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