Ion lens assembly, ion source, mass spectrometer and mass spectrometry system

Abstract

The invention relates to the technical field of vacuum equipment, and discloses an ion lens assembly, an ion source, a mass spectrometer and a mass spectrometry system. The ion lens assembly includes a deflection lens assembly and a return lens assembly. The deflection lens assembly is used for focusing an ion beam in the incident particle beam and enabling the ion beam to deflect towards a first direction. And the axis-returning lens assembly is used for receiving the ion beam from the deflection lens assembly, and the axis-returning lens assembly is used for focusing the received ion beam and enabling the ion beam to deflect towards a second direction.

Description

Technical Field

[0001] This disclosure relates to the field of vacuum equipment technology, and in particular to an ion lens assembly, an ion source, a mass spectrometer, and a mass spectrometry system. Background Technology

[0002] Mass spectrometers generate noise signals during operation, which are generally considered to be produced by photons and neutral particles. Current mass spectrometers have limited noise suppression capabilities, especially when the gas sample being measured includes hydrogen. Summary of the Invention

[0003] This disclosure provides an ion lens assembly, including:

[0004] Deflecting lens assembly for focusing the ion beam in an incident particle beam and deflecting the ion beam in a first direction; and

[0005] The return-axis lens assembly is used to receive the ion beam from the deflection lens assembly, and the return-axis lens assembly is used to focus the received ion beam and deflect the ion beam in a second direction.

[0006] This disclosure provides an ion source, including:

[0007] Particle beam generation system, used to generate particle beams; and

[0008] An ion lens assembly according to any embodiment of the present disclosure is used for processing a particle beam.

[0009] This disclosure provides a mass spectrometer including an ion source according to any embodiment of this disclosure.

[0010] This disclosure provides a mass spectrometry system, including:

[0011] The sample inlet assembly includes the sample inlet chamber; and

[0012] A mass spectrometer according to any embodiment of the present disclosure includes a hermetically sealed ionization chamber for ionizing a sample to generate particles, and a sample inlet chamber docked to the hermetically sealed ionization chamber for delivering the sample to the hermetically sealed ionization chamber and controlling the pressure of the hermetically sealed ionization chamber. Attached Figure Description

[0013] To more clearly illustrate the technical solutions in the embodiments of this disclosure or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only one embodiment of this disclosure. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0014] Figure 1A schematic diagram of the structure of an ion lens assembly according to some embodiments of the present disclosure is shown;

[0015] Figure 2 A schematic diagram of the structure of an ion source according to some embodiments of the present disclosure is shown;

[0016] Figure 3 A schematic diagram of the structure of a mass spectrometer according to some embodiments of the present disclosure is shown;

[0017] Figure 4 The electric field contour plots of a mass spectrometer according to some embodiments of the present disclosure are shown.

[0018] Figure 5 The field strength distribution of a mass spectrometer according to some embodiments of the present disclosure is shown;

[0019] Figure 6 A schematic diagram of the particle beam transport path of a mass spectrometer according to some embodiments of the present disclosure is shown;

[0020] Figure 7 A schematic diagram of the structure of a mass spectrometry system according to some embodiments of the present disclosure is shown;

[0021] Figure 8 An exploded schematic diagram showing a partial structure of a mass spectrometry system according to some embodiments of the present disclosure;

[0022] Figure 9 A cross-sectional perspective view of a portion of the structure of a mass spectrometry system according to some embodiments of the present disclosure is shown.

[0023] In the above figures, the reference numerals represent:

[0024] 10-Mass Spectrometry System

[0025] 10000-mass spectrometer

[0026] 1000-ion source

[0027] 100-Ion Lens Assembly

[0028] 110-Deflection Lens Assembly

[0029] 111-Deflection Lens

[0030] 112-Deflection Extraction Pole

[0031] 1121-Deflection Extraction Hole

[0032] 120-Return Axis Lens Assembly

[0033] 121-Return Axis Lens

[0034] 122-Return Axis Extraction Electrode

[0035] 1221-Return Shaft Extraction Hole

[0036] 200-Particle Beam Generation System

[0037] 210-collimator

[0038] 211-Collimation Hole

[0039] 220-Airtight Ionization Chamber

[0040] 221-Filament

[0041] 222-gate

[0042] 223-Waye's Cap

[0043] 230-Extraction Polarity

[0044] 240-Focusing Ring

[0045] 250-support plate

[0046] 2000-Fourth Class

[0047] 3000-Fourth-Stage Bar Housing

[0048] 11-Sample Injection Chamber Assembly

[0049] 111'-Injection Chamber

[0050] 112' - Sample inlet chamber vacuum pump

[0051] 113' - Vacuum gauge for sample inlet chamber

[0052] 114'-Injection Chamber Gate Valve

[0053] 115' - Sample Inlet Flange

[0054] 1151-Micropore

[0055] 1152-Depression

[0056] 1153-Annular Flange

[0057] 122'-Insulating Sleeve

[0058] 1221'-Insulating sleeve flange

[0059] 123'-Ion Chamber Sampling Head

[0060] 124'-Shielding Cover

[0061] 13-Injection Valve Assembly

[0062] 131-Process cavity end gate valve

[0063] 132-Injection Chamber End Gate Valve

[0064] 14-Dating cavity assembly

[0065] 141-Mass Spectrometer Docking Cavity

[0066] 1411-Matching Cavity Flange

[0067] 14111-Flange Hole

[0068] 1412-Mass Spectrometer Interface

[0069] 1413 - Signal Outlet

[0070] 142-Support base

[0071] 1421-Support Plate

[0072] 1422-Support flange

[0073] 1423, 1423A, 1423B - Support Columns

[0074] 1424A, 1424B - Nuts

[0075] 143-Elastic Components

[0076] 144-Dock cavity vacuum pump

[0077] 145-Dating cavity vacuum gauge

[0078] 15-Connecting Pipeline Detailed Implementation

[0079] Some embodiments of this disclosure will now be described with reference to the accompanying drawings. Obviously, the described embodiments are merely exemplary embodiments of this disclosure, and not all embodiments.

[0080] In the description of this disclosure, it should be noted that the terms "center," "upper," "lower," "left," "right," "vertical," "horizontal," "inner," "outer," "top," "bottom," "horizontal," and "longitudinal," etc., indicating the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, are only for the convenience of describing this disclosure and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this disclosure. Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance. In the description of this disclosure, it should be noted that unless otherwise expressly specified and limited, the terms "installation," "connection," "linking," and "coupling" should be interpreted broadly, for example, they can refer to fixed connections or detachable connections; mechanical connections or electrical connections; direct connections or indirect connections through an intermediate medium; and internal communication between two elements. In the description of this disclosure, "distal" or "farside" refers to one end or side that extends into a vacuum environment (e.g., a vacuum chamber), while "proximal" or "proximal" is the end or side opposite to "distal" or "farside" (e.g., one end or side away from the vacuum chamber, or one end or side within the vacuum chamber that is closer to the vacuum chamber wall, etc.). Alternatively, the end or side closer to the drive device is called the proximal or proximal end, and the end or side farther from the drive device is called the distal or distal end. Those skilled in the art will understand the specific meaning of the above terms in this disclosure according to the specific circumstances.

[0081] Figure 1 A schematic diagram of the structure of an ion lens assembly 100 according to some embodiments of the present disclosure is shown.

[0082] like Figure 1 As shown, in some embodiments of this disclosure, the ion lens assembly 100 may include a deflection lens assembly 110 and a return-axis lens assembly 120. The deflection lens assembly 110 is used to focus the ion beam in the incident particle beam and deflect the ion beam in a first direction. The return-axis lens assembly 120 is used to receive and focus the ion beam from the deflection lens assembly 110 and deflect the ion beam in a second direction. Those skilled in the art will understand that in this disclosure, the particle beam includes ions, neutral particles, photons, etc. For ease of description, the particle beam is described as including an ion beam, but this does not mean that the ions in the particle beam have been separated from neutral particles or other particles.

[0083] like Figure 1As shown, in some embodiments of this disclosure, the deflection lens assembly 110 may include a deflection lens 111 and a deflection extraction electrode 112. The deflection lens 111 is used to focus the ion beam and deflect the ion beam in a first direction. The deflection extraction electrode 112 is used to further deflect the ion beam in the first direction. The deflection extraction electrode 112 may include a deflection extraction aperture 1121 for allowing the deflected ion beam to pass through.

[0084] like Figure 1 As shown, in some embodiments of this disclosure, the projected profile of the deflection extraction aperture 1121 on the incident surface does not overlap with, for example, the beam spot of the incident particle beam on the incident surface, and is tangent to it.

[0085] In some embodiments of this disclosure, the deflecting lens 111 directs the ion beam in a first direction (e.g., Figure 1 (shown in the left direction) deflects the ion beam a first deflection distance. The deflection extraction electrode 112 is used to further deflect the ion beam in the first direction (e.g., ...). Figure 1 (Showing the left-hand direction) Second deflection distance. The ion beam is continuously deflected in the first direction and then passes through the deflection extraction aperture 1121. Neutral particles and photons in the particle beam are blocked by the electrode plate of the deflection extraction pole 112, achieving efficient separation of the ion beam from neutral particles, etc.

[0086] like Figure 1 As shown, in some embodiments of this disclosure, the return-axis lens assembly 120 may include a return-axis lens 121 and a return-axis extraction pole 122. The return-axis lens 121 is used to receive the ion beam from the deflection lens assembly 110, to focus the received ion beam, and to orient the ion beam in a second direction (e.g., Figure 1 (shown in the right direction) deflects the first cyclotron distance. The cyclotron extraction electrode 122 is used to further direct the ion beam in a second direction (e.g., Figure 1 (shown in the right direction) deflection of the second cyclone distance. Cyclone extraction electrode 122 may include cyclone extraction aperture 1221 for allowing the deflected ion beam to pass through.

[0087] In some embodiments of this disclosure, the first direction is opposite to the second direction. In some embodiments of this disclosure, the homing lens assembly 120 deflects the ion beam in the second direction by a distance equal to the distance the deflecting lens assembly 110 deflects the ion beam in the first direction, thus achieving homing of the ion beam. In some embodiments of this disclosure, the first direction may not be opposite to the second direction, or the homing lens assembly 120 may deflect the ion beam in the second direction by a distance not equal to the distance the deflecting lens assembly 110 deflects the ion beam in the first direction. The ion beam may not be completely homed, but it can still block neutral particles, photons, etc., in the particle beam, and different ion beam paths can be designed.

[0088] like Figure 1 As shown, in some embodiments of this disclosure, the return-axis extraction aperture 1221 is coaxial with the beam spot of the incident particle beam on the incident surface.

[0089] In some embodiments of this disclosure, the ion beam is continuously deflected in a first direction and then continuously deflected in a second direction before returning to the incident axial position and being extracted through the return-axis extraction hole 1221.

[0090] In some embodiments of this disclosure, the axis refers to the particle beam generation system (e.g., Figure 2 The particle beam generation system 200 shown), collimator (e.g., Figure 2 The collimator 210 shown), and the deflection lens assembly (e.g., Figure 1 The deflection lens assembly 110 shown), and the return-axis lens assembly (e.g., Figure 1 The direction in which the geometric center axis of the back-axis lens assembly 120, etc., extends is also the reference direction of the main transport path of particles (e.g., ions).

[0091] like Figure 1 As shown, in some embodiments of this disclosure, the deflection lens 111 is disposed off-axis parallel to the central axis of the incident ion beam.

[0092] like Figure 1 As shown, in some embodiments of this disclosure, the first end of the deflection extraction electrode 112 is insulated from the second end of the deflection lens 111, and the deflection extraction hole 1121 is disposed parallel to the deflection lens 111 on an off-axis. Those skilled in the art will understand that in this disclosure, the first end (e.g., Figure 1 and Figure 2 The upper end shown) and the second end (e.g.) Figure 1 and Figure 2 (The lower end shown is opposite.)

[0093] like Figure 1 As shown, in some embodiments of this disclosure, the first end of the return-axis lens 121 is insulated from the second end of the deflection extraction pole 112 and is arranged off-axis parallel to the deflection extraction hole 1121.

[0094] like Figure 1 As shown, in some embodiments of this disclosure, the first end of the return axis extraction pole 122 is insulated from the second end of the return axis lens 121 and is arranged off-axis parallel to the return axis lens 121.

[0095] In some embodiments of this disclosure, the first end of the deflection extraction electrode 112 and the second end of the deflection lens 111 can be insulatedly connected using bolts, nuts, ceramic sheets, insulating sleeves, etc. For example, a ceramic sheet can be placed between the deflection extraction electrode 112 and the deflection lens 111, an insulating washer can be placed on the outside of the deflection extraction electrode 112 and the deflection lens 111, and an insulating sleeve can be fitted onto a bolt and passed through the mounting holes of the deflection extraction electrode 112, the ceramic sheet, and the deflection lens 111, and fixed with a nut. Those skilled in the art will understand that similar connection methods can also be used for insulated connections between other components.

[0096] like Figure 1 As shown, in some embodiments of this disclosure, the deflection lens 111 is generally cylindrical, and the main body of the deflection lens 111 includes a conductive material.

[0097] like Figure 1 As shown, in some embodiments of this disclosure, the return-axis lens 121 is generally cylindrical, and the main body of the return-axis lens 121 includes a conductive material.

[0098] In some embodiments of this disclosure, the deflection lens 111 is subjected to a voltage during use. The ion beam is deflected while being focused in the deflection lens 111, which improves ion beam transmission efficiency. Similarly, the return-axis lens 121 is subjected to a voltage during use. The ion beam is deflected while being focused in the return-axis lens 121, which also improves ion beam transmission efficiency.

[0099] Those skilled in the art will understand that, in some embodiments of this disclosure, the body of the deflection extraction electrode 112 comprises a conductive material and is subject to a voltage during use. Similarly, in some embodiments of this disclosure, the body of the return-axis extraction electrode 122 comprises a conductive material and is subject to a voltage during use.

[0100] In some embodiments of this disclosure, the deflecting lens 111 deflects the ion beam in a first direction by a first deflection distance, causing the central axis of the ion beam to deviate from the axis of the incident particle beam. The deflection extraction pole 112 further deflects the ion beam in the first direction by a second deflection distance, causing the central axis of the ion beam to further deviate from the axis of the incident particle beam and pass through the deflection extraction aperture 1121. Neutral particles and photons in the particle beam are blocked by the electrode plate of the deflection extraction pole 112. The return-axis lens 121 deflects the central axis of the ion beam in a second direction by a first return-axis distance. The return-axis extraction pole 122 further deflects the central axis of the ion beam towards the field axis and back to the axis of the incident particle beam, passing through the deflection extraction aperture 1121. The axis of the incident particle beam is the central axis of the ion beam at incidence (e.g., ...). Figure 2 (The geometric symmetry axis of the particle beam generation system 200 is shown).

[0101] In some embodiments, the first deflection distance is half the diameter of the incident particle beam spot on the incident surface. In some embodiments, the second deflection distance is half the diameter of the incident particle beam spot on the incident surface. In some embodiments, the first return-axis distance is half the diameter of the incident particle beam spot on the incident surface. In some embodiments, the second return-axis distance is half the diameter of the incident particle beam spot on the incident surface. In some embodiments, the return-axis extraction aperture is coaxial with the incident particle beam spot on the incident surface.

[0102] According to some embodiments of the present disclosure, the ion lens assembly 100 enables the ion beam to be deflected and returned to its axis in four steps, which can be achieved at a lower bias voltage, effectively reducing costs, while preventing the ion beam from diverging during the deflection process to improve transmission efficiency.

[0103] Figure 2 A schematic diagram of the structure of an ion source 1000 according to some embodiments of the present disclosure is shown.

[0104] like Figure 2 As shown, in some embodiments of this disclosure, the ion source 1000 may include a particle beam generation system 200 and an ion lens assembly 100 according to any embodiment of this disclosure. The particle beam generation system 200 is used to generate a particle beam. The ion lens assembly 100 is used to process the particle beam.

[0105] like Figure 2 As shown, in some embodiments of this disclosure, the ion lens assembly 100 is used to continuously deflect the ion beam in the particle beam in a first direction and then continuously deflect it in a second direction, so that the central axis of the ion beam returns to the axial direction before the deflection.

[0106] like Figure 2 As shown, in some embodiments of this disclosure, the particle beam generation system 200 may include a collimator 210. The collimator 210 may include a collimation aperture 211 for collimating the ion beam in the particle beam.

[0107] like Figure 2 As shown, in some embodiments of this disclosure, the first end of the deflection lens 111 is insulated from the collimator 210 and is arranged off-axis parallel to the collimation hole 211. The projection contours of the deflection extraction hole 1121 and the collimation hole 211 on the incident plane (e.g., the plane defined by the collimator 210) do not overlap. The return-axis extraction hole 1221 is coaxially arranged with the collimation hole 211.

[0108] like Figure 2As shown, in some embodiments of this disclosure, the projected profile of the deflection extraction aperture 1121 on the incident surface does not overlap with the projected profile of the collimating aperture 211 on the incident surface. Those skilled in the art will understand that in this disclosure, the incident surface can be a plane defined by the collimator 210, such as the lower surface of the collimator 210.

[0109] In some embodiments of this disclosure, the deflecting lens 111 aligns the center axis of the ion beam in a first direction (e.g., Figure 2 After being deflected (shown in the left direction), the deflection extraction pole 112 further deflects the ion beam in the first direction. The projection profile of the deflection extraction aperture 1121 on the incident surface does not overlap with the projection profile of the collimation aperture 211 on the incident surface, thereby allowing the ion beam to pass through the deflection extraction aperture 1121, while the neutral particles and photons in the particle beam are blocked by the electrode plate of the deflection extraction pole 112.

[0110] like Figure 2 As shown, in some embodiments of this disclosure, the projection profile of the deflection extraction aperture 1121 on the incident surface is tangent to the projection profile of the collimation aperture 211 on the incident surface.

[0111] In some embodiments of this disclosure, tangent projection profiles can ensure that the projection profile of the deflection extraction aperture 1121 on the incident surface does not overlap with the projection profile of the collimation aperture 211 on the incident surface, and the degree of misalignment is minimal, thereby reducing the voltage applied to the deflection extraction electrode 210 and ensuring ion beam transmission efficiency.

[0112] like Figure 2 As shown, in some embodiments of this disclosure, the deflecting lens 111 deflects the central axis of the ion beam by a first deflection distance in a first direction.

[0113] In some embodiments of this disclosure, the first deflection distance is half the diameter of the collimating hole 211.

[0114] like Figure 2 As shown, in some embodiments of this disclosure, the deflection extraction electrode 112 is used to deflect the central axis of the ion beam in a first direction by a second deflection distance.

[0115] In some embodiments of this disclosure, the second deflection distance is half the diameter of the collimating aperture 211.

[0116] like Figure 2 As shown, in some embodiments of this disclosure, the cyclotron lens 121 is used to deflect the central axis of the ion beam in a second direction by a first cyclotron distance.

[0117] In some embodiments of this disclosure, the first return axis distance is half the diameter of the collimation hole 211.

[0118] like Figure 2As shown, in some embodiments of this disclosure, the cycloidal extraction pole 122 is used to deflect the central axis of the ion beam in a second direction by a second cycloidal distance.

[0119] In some embodiments of this disclosure, the second return axis distance is half the diameter of the collimation hole 211.

[0120] like Figure 2 As shown, in some embodiments of this disclosure, the particle beam generation system 200 may further include a hermetically sealed ionization chamber 220, an extraction electrode 230, and a focusing ring 240. The hermetically sealed ionization chamber 220 is used to ionize the sample to generate particles. The extraction electrode 230 is insulated at the outlet of the hermetically sealed ionization chamber 220 and coaxially arranged with the collimating aperture 211. The focusing ring 240 is insulated between the extraction electrode 230 and the collimator 210 and coaxially arranged with the collimating aperture 211, and is used for focusing and controlling the ion beam.

[0121] like Figure 2 As shown, in some embodiments of this disclosure, the hermetically sealed ionization chamber 220 may include a filament 221, a grid 222, and a Widmanstätten cap 223. The filament 221 generates an electron beam to ionize the sample and generate an ion beam. The grid 222 is disposed within the hermetically sealed ionization chamber 220 and is used to guide and focus the electron beam. The Widmanstätten cap 223 is located within the hermetically sealed ionization chamber 220 near the extraction electrode 230 and is used to focus and directionally constrain the ion beam generated within the hermetically sealed ionization chamber 220.

[0122] like Figure 2 As shown, in some embodiments of this disclosure, the particle beam generation system 200 may further include a support disk 250, which can be used to support and fix components such as the extraction electrode 230 and the gate 222.

[0123] According to some embodiments of the present disclosure, the ion source 1000 can be integrated into an existing quadrupole mass spectrometer without changing its original structure. The modification process is simple and will not significantly increase the size of the original mass spectrometer. It can improve the performance of the mass spectrometer (for example, solve the problem of decreased dynamic range and sensitivity and narrowed dynamic range when the mass spectrometer detects hydrogen atmosphere) without affecting the normal operation of other core functions of the mass spectrometer.

[0124] Figure 3 A schematic diagram of the structure of a mass spectrometer 10000 according to some embodiments of the present disclosure is shown.

[0125] like Figure 3 As shown, in some embodiments of this disclosure, the mass spectrometer 1000 may include an ion source 1000 according to any embodiment of this disclosure.

[0126] like Figure 3As shown, in some embodiments of this disclosure, the mass spectrometer 10000 may further include a quadrupole 2000. The quadrupole 2000 is disposed at the outlet of the return-axis extraction port 1221 and is coaxially arranged with the collimation port 211.

[0127] like Figure 3 As shown, in some embodiments of this disclosure, the mass spectrometer 10000 may further include a quadrupole housing 3000. The quadrupole housing 3000 is disposed outside the quadrupole 2000 and is insulated from the return-axis extraction electrode 122.

[0128] Hydrogen is frequently used as a process atmosphere in applications such as atomic layer deposition (ALD), chemical vapor deposition (CVD), and etching. The presence of hydrogen severely degrades the dynamic range and sensitivity of mass spectrometers, specifically manifesting as a 1-2 order of magnitude increase in the full-spectrum baseline. This makes the detection and analysis of trace gases at the ppb (parts per billion) level impossible. Furthermore, conventional noise suppression methods are ineffective in a hydrogen atmosphere, with noise increases still occurring across the entire spectrum and an integration slope appearing between 1 and 10 amu. These noise signals are positively correlated only with the signal strength of hydrogen itself and are independent of other factors. Currently, the mass spectrometry industry broadly defines these noise signals as noise from photons and neutral particles. To suppress signal noise, existing solutions may lose nearly 80% of ion transmission efficiency; or be ineffective against excited-state hydrogen atom noise; or increase space occupancy by nearly 50%, making it difficult for the mass spectrometer to be integrated into other devices for online monitoring, which is very detrimental to the miniaturization of the device; or cause mass discrimination effects, with ions that are too small or too large exhibiting over- or under-biasing, significantly increasing the cost of the device and also increasing instability during operation.

[0129] like Figure 3 As shown, in some embodiments of this disclosure, the mass spectrometer 10000 can be used to detect gaseous components in a sample including hydrogen.

[0130] According to some embodiments of the mass spectrometer 10000 disclosed herein, hydrogen molecules enter the hermetically sealed ionization chamber 220 axially. The thermionic cathode filament 222 is lit, emitting thermionic electrons. These electrons are directionally emitted from the narrow slit of the Widmanstätten cap 223, accelerated to a specified energy by the grid 222, and collide with hydrogen molecules, dissociating, exciting, and ionizing the hydrogen to produce hydrogen ions (H+). + ) and excited-state hydrogen atoms (H * ), H + The extracted electrode 230 is pulled out and diverges, then converges in the focusing ring 240 to improve the uniformity of energy distribution, and finally exits through the collimating hole 211. H *Because it carries no charge, it does not participate in the above-mentioned process and only diffuses along the field axis, also passing through the collimating aperture 211 and exiting. The hydrogen ion beam is focused in the deflecting lens 111 onto the axis of a first deflection distance (e.g., +d / 2, where d is the diameter of the collimating aperture 211) offset from the incident particle beam. It is then straightened by the deflecting extraction electrode 112 by a second deflection distance (e.g., +d / 2). The hydrogen ion beam is pulled by the deflecting extraction electrode 112 to another axis offset from the axial direction (+d distance), thus completely offsetting the positions of the deflecting extraction aperture 1121 and the collimating aperture 221. * Similarly, it does not participate in the aforementioned deflection action, and is blocked by the electrode plate that directly impacts the deflection extraction electrode 112 along the field axis, with a theoretical blocking rate of up to 99%. Subsequently, H + The image is focused back to the first return axis distance in the return axis lens 121 (e.g., the first return axis distance is +d / 2), and then pulled to the second return axis distance by the return axis extraction pole 122 (e.g., the second return axis distance is +d / 2), thereby being pulled back to the axial direction, thus achieving H + It can efficiently strip H* without significantly affecting the permeability of H+, and it does not discriminate against ions of other masses and energies.

[0131] Figure 4 An electric field contour plot of a mass spectrometer 10000 according to some embodiments of the present disclosure is shown. Figure 5 The field strength distribution of a mass spectrometer 10000 according to some embodiments of the present disclosure is shown. Figure 6 A schematic diagram of the particle beam transport path of a mass spectrometer 10000 according to some embodiments of the present disclosure is shown.

[0132] According to some embodiments of the mass spectrometer 10000 of this disclosure, after setting voltage boundary conditions for each component based on reference values, electric field simulation is performed using COMSOL simulation software to obtain electric field contour maps and field strength distribution maps, such as... Figure 4 and Figure 5 As shown in the bar chart on the right, blue indicates a relatively low electric field strength, while dark red indicates a relatively high electric field strength. Figure 6 The diagram illustrates the particle beam propagation path simulated using COMSOL simulation software after setting voltage boundary conditions for each component according to reference values ​​in a mass spectrometer 10000 based on some embodiments of the present disclosure. Figure 6 As shown in the bars on the right, purple indicates a lower ion density, and as the color changes, yellow indicates a higher ion density. Figure 6 The blue arrows indicate the transport paths of excited-state atoms, photons, and neutrons, etc. Figure 6 It can be seen that the continuous deflection and homing of the ion beam achieves a highly efficient separation effect from neutral particles such as excited-state atoms.

[0133] In some embodiments of this disclosure, the mass spectrometer 10000 can be used to detect gas components, and the reference voltages applied to each component are as follows: grid 222: +80V, hot cathode filament 222: +10V, Wechsler cap 223: 0V, extraction electrode 230: -120V, support disk 250: 0V, focusing ring 240: +69V, collimation aperture 211: 0V, deflection lens 111: +90V, deflection extraction electrode 112: -50V, return-axis lens 121: +90V, return-axis extraction electrode 122: -50V, quadrupole housing 3000: 0V, quadrupole 2000: 65V.

[0134] According to some embodiments of the mass spectrometer 10000 disclosed herein, the stripping of excited-state hydrogen atoms is completed before the particle beam enters the quadrupole field formed during quadrupole operation, thereby effectively suppressing noise from the formation of excited-state hydrogen atoms. For example, in a hydrogen atmosphere, H... * The resulting baseline rise of 1-2 orders of magnitude and the slope at low mass numbers can be suppressed in the mass spectrometer 10000 of some embodiments disclosed herein, and the detection dynamic range and sensitivity under hydrogen atmosphere are significantly improved, enabling trace gas analysis at the ppb level or even subppb level in a hydrogen background.

[0135] According to some embodiments of the mass spectrometer 10000 disclosed herein, the ion beam is continuously deflected and then continuously returned to the axis before returning to the axial direction, incident on a quadrupole field. This not only eliminates mass discrimination but also prevents the ion beam from diverging during deflection, thereby improving ion transport efficiency. Furthermore, the design of the continuously deflecting and continuously returning ion source in the mass spectrometer 10000 reduces the voltage requirements for deflection and return, and eliminates the need for additional voltage adjustment compensation. The bias voltage of each component can be kept customized during scanning, thereby effectively reducing costs.

[0136] The mass spectrometer 10000 according to some embodiments of this disclosure can be improved based on the existing quadrupole mass spectrometer without changing the axial position (e.g., the axial direction of the mass spectrometer 10000, the axial direction of the ion source 1000, or the axial direction of the particle beam incident surface) and the overall ion optical system, without significantly increasing the size of the original equipment, without significantly changing the external structure of the original equipment, and without changing the vacuum cavity design, which is beneficial to the miniaturization of the equipment and the compatibility of the system.

[0137] Figure 7 A schematic diagram of the structure of a mass spectrometry system 10 according to some embodiments of the present disclosure is shown.

[0138] like Figure 7As shown, in some embodiments of this disclosure, the mass spectrometry system 10 may include a sample inlet assembly 11 and a mass spectrometer 10000 (components such as the quadrupole 2000 and quadrupole housing 3000 are not shown in the figure). The sample inlet assembly 11 may include a sample inlet chamber 111'. The sample inlet chamber 111' is docked with the hermetically sealed ionization chamber 220 and is used to deliver samples to the hermetically sealed ionization chamber 220 and control the pressure of the hermetically sealed ionization chamber 220.

[0139] In some embodiments of this disclosure, the mass spectrometer 10000 may include a residual gas analyzer (RGA).

[0140] The mass spectrometry system 10 of some embodiments of this disclosure controls the pressure of the gas-tight ionization chamber 220 by controlling the pressure of the sample injection chamber 111'. This not only suppresses the interference of background residual gas and broadens the working pressure of the mass spectrometer 10000, but also makes the gas pressure in the gas-tight ionization chamber 220 controllable, thereby enabling the mass spectrometer 10000 to have good reproducibility in high-precision applications.

[0141] like Figure 7 As shown, in some embodiments of this disclosure, the mass spectrometry system 10 may further include a connecting conduit 15 and an injection valve assembly 13. The connecting conduit 15 is connected to the injection chamber 111' for delivering a sample to the injection chamber 111'. For example, the connecting conduit 15 may connect the injection chamber 111' to a process chamber (not shown) for generating a sample, so as to deliver a sample to the injection chamber 111'. The injection valve assembly 13 may be disposed on the connecting conduit 15.

[0142] like Figure 7 As shown, in some embodiments of this disclosure, the injection valve assembly 13 may include a process chamber end gate valve 131 and an injection chamber end gate valve 132. The process chamber end gate valve 131 is disposed on the connecting pipeline. The injection chamber end gate valve 132 is disposed on the connecting pipeline and located downstream of the process chamber end gate valve 131. The valve plate of the injection chamber end gate valve 132 includes valve plate holes, such as... Figure 7 It is shown schematically within the middle circle.

[0143] like Figure 7 As shown, in some embodiments of this disclosure, the process chamber end gate valve 131 may include a pneumatic gate valve or any suitable gate valve.

[0144] like Figure 7 As shown, in some embodiments of this disclosure, the gate valve 132 at the injection chamber end may include a gate valve with switchable valve plate orifice diameter, used to assist in controlling the pressure of the airtight ionization chamber 220 by selecting valve plate orifices with different orifice diameters.

[0145] In some embodiments of this disclosure, the valve plate of the gate valve 132 at the injection chamber end may include multiple valve plate holes of different diameters (not shown in the figures). The pressure of the injection chamber 111' can be controlled by selecting valve plate holes of different diameters, thereby assisting in controlling the pressure of the hermetically sealed ionization chamber 220. Those skilled in the art will understand that the inclusion of multiple valve plate holes of different diameters on the valve plate of the gate valve 132 at the injection chamber end is merely an exemplary structure and does not constitute a limitation of this disclosure. For example, the valve plate of the gate valve 132 at the injection chamber end may also include a single valve plate hole. Different valve plates may include valve plate holes of different diameters, thereby allowing the pressure of the injection chamber 111' to be controlled by selecting valve plate holes of different diameters, thus assisting in controlling the pressure of the hermetically sealed ionization chamber 220.

[0146] In some embodiments of this disclosure, the process cavity may include a thin film deposition process cavity, a photolithography process cavity, an epitaxial growth process cavity, etc.

[0147] like Figure 7 As shown, in some embodiments of this disclosure, the injection chamber assembly 11 may further include an injection chamber vacuum pump 112' and an injection chamber vacuum gauge 113'. The injection chamber vacuum pump 112' may be connected to the injection chamber 111' for adjusting the vacuum level of the injection chamber 111'. The injection chamber vacuum gauge 113' may be vacuum-sealed to the injection chamber 111' for detecting the vacuum level of the injection chamber 111'.

[0148] In some embodiments of this disclosure, the sample inlet vacuum pump 112' may be connected to the sample inlet 111' via a flange (e.g., a vacuum flange).

[0149] In some embodiments of this disclosure, the sample inlet vacuum pump 112' may include a molecular pump or any suitable vacuum pump, such as an oil-free magnetically levitated molecular pump.

[0150] In some embodiments of this disclosure, the sample inlet chamber vacuum gauge 113' may include a BA-type hot cathode ion vacuum gauge or any suitable vacuum gauge.

[0151] like Figure 7 As shown, in some embodiments of this disclosure, the injection chamber assembly 11 may further include an injection chamber gate valve 114'. The injection chamber vacuum pump 112' can be connected to the injection chamber 111' via the injection chamber gate valve 114' to control the pressure of the injection chamber 111' by adjusting the opening degree.

[0152] In some embodiments of this disclosure, the vacuum pump 112' of the injection chamber can be connected to one end of the gate valve 114' of the injection chamber via a flange (e.g., a vacuum flange), and the other end of the gate valve 114' of the injection chamber can be connected to the injection chamber 111' via a flange (e.g., a vacuum flange).

[0153] In some embodiments of this disclosure, the sample inlet vacuum pump 112' is connected to the sample inlet 111' via the sample inlet gate valve 114'. The flow rate of the sample from the sample inlet 111' to the sample inlet vacuum pump 112' can be limited by adjusting the opening of the sample inlet gate valve 114', thereby actively controlling the pressure inside the sample inlet 111'.

[0154] In some embodiments of this disclosure, the injection chamber gate valve 114' may include an electrically actuated, degree-controllable gate valve for precisely controlling the pressure in the injection chamber 111', thereby precisely controlling the pressure in the ion chamber.

[0155] like Figure 7 As shown, in some embodiments of this disclosure, the mass spectrometry system 10 may further include a controller (not shown). The controller may be communicatively connected to the injection chamber vacuum gauge 113', the injection chamber gate valve 114', and the injection chamber vacuum pump 112', for receiving the detection signal from the injection chamber vacuum gauge 113', and determining the gate opening degree of the injection chamber gate valve 114' and / or the pumping speed of the injection chamber vacuum pump 112' based on the detection signal, thereby controlling the pressure of the injection chamber 111'.

[0156] Figure 8 An exploded schematic diagram of a portion of the structure of a mass spectrometry system 10 according to some embodiments of the present disclosure is shown. Figure 9 A cross-sectional perspective view of a portion of the structure of a mass spectrometry system 10 according to some embodiments of the present disclosure is shown.

[0157] like Figure 7 , Figure 8 and Figure 9 As shown, in some embodiments of this disclosure, the injection chamber assembly 11 may further include an injection chamber flange 115'. The injection chamber flange 115' is mounted on the injection chamber 111'. Figure 8 and Figure 9 As shown, the sample inlet flange 115' may include a micropore 1151, and the sample inlet 111' is connected to the airtight ionization chamber 220 through the micropore 1151.

[0158] In some embodiments of this disclosure, the aperture of the micro-orifice 1151 is not specifically limited, as long as the aperture of the micro-orifice 1151 matches the size of the inlet of the hermetically sealed ionization chamber 220, so that the sample inlet chamber 111' can be connected to the hermetically sealed ionization chamber 220 through the micro-orifice 1151. For example, the aperture of the micro-orifice 1151 can be less than 10 mm, such as 5 mm, 7 mm, 10 mm, etc. Those skilled in the art will understand that in this disclosure, the term "micro-orifice" is merely used to illustrate that the aperture size is small and to distinguish it from other apertures in this disclosure, and does not constitute a strict limitation on the size of the micro-orifice 1151. In terms of description, it can be replaced by "aperture", "sample inlet chamber flange aperture", etc. Those skilled in the art can choose an appropriate aperture size according to the actual situation.

[0159] like Figure 8 and Figure 9 As shown, in some embodiments of this disclosure, the sample inlet flange 115' may include a recess 1152 located on the inner side. Micropores 1151 may be disposed within the recess 1152 to reduce the influence of the micropores 1151 on flow conduction.

[0160] In some embodiments of this disclosure, the micropore 1151 is disposed within the recess 1152, resulting in a shorter length, increased conductivity, and increased sample flow rate. Under the same pressure difference, this improves sampling efficiency, allowing more gas molecules to enter the mass spectrometer and thus enhancing detection sensitivity.

[0161] like Figure 8 and Figure 9 As shown, in some embodiments of this disclosure, the sample inlet flange 115' may further include an annular flange 1153. The annular flange 1153 may be disposed around the micropore 1151. The mass spectrometer 10000 may also include an insulating sleeve 122'.

[0162] like Figure 9 As shown, the first end of the insulating sleeve 122' (e.g., Figure 9 The left end of the insulating sleeve 122' shown abuts against the sample inlet flange 115', and the annular flange 1153 is at least partially disposed within the first end of the insulating sleeve 122'.

[0163] In other embodiments of this disclosure, the annular flange 1153 may at least partially come into close contact with the inner wall of the first end of the insulating sleeve 122', and the seal is provided within the first end of the insulating sleeve 122', thereby further enhancing the sealing effect on the basis of the vacuum-sealed connection between the sample inlet flange 115' and its mating flange (e.g., mating flange 1411).

[0164] In some embodiments of this disclosure, the first end refers to the end near the injection chamber 111', for example, Figures 7-8 The left side is shown. The second end refers to the end closest to the hermetically sealed ionization chamber 220 and opposite to the first end, for example, as shown... Figures 7-8 The right side is shown.

[0165] In some embodiments of this disclosure, the material of the insulating sleeve 122' may include insulating materials such as ceramics.

[0166] like Figure 7 and Figure 8 As shown, in some embodiments of this disclosure, the mass spectrometer 10000 may further include an ion chamber sampling head 123'. The first end of the ion chamber sampling head 123' is at least partially disposed at the second end of the insulating sleeve 122' (e.g., Figure 8 , Figure 9 The right end of the insulating sleeve 122' shown is inside the ion chamber and remains in non-contact with the annular flange 1153. The second end of the ion chamber sampling head 123' is vacuum-sealed to the hermetically sealed ionization chamber 220.

[0167] Those skilled in the art will understand that the ion chamber sampling head 123' and the airtight ionization chamber 220 can be integrally formed or separately formed and then vacuum-sealed together.

[0168] In some other embodiments of this disclosure, the outer wall of the first end of the ion chamber sampling head 123' can be in close contact with the inner wall of the insulating sleeve 122', and the seal is provided inside the second end of the insulating sleeve 122', thereby further enhancing the sealing effect on the basis of the vacuum seal connection between the sample inlet flange 115' and its mating flange (e.g., mating flange 1411).

[0169] In some embodiments of this disclosure, the inner diameter of the insulating sleeve 122' is not particularly limited, but it needs to match the outer diameter of the ion chamber sampling head 123' so that the ion chamber sampling head 123' can achieve tight contact with the insulating sleeve 122'. Similarly, the outer diameter of the annular flange 1153 is not particularly limited, and the outer diameter of the annular flange 1153 can be smaller than the inner diameter of the insulating sleeve 122'; or the outer diameter of the annular flange 1153 can match the inner diameter of the insulating sleeve 122' so that the annular flange 1153 can achieve tight contact with the insulating sleeve 122', thereby enhancing the sealing effect of the entire system.

[0170] In some embodiments of this disclosure, the hermetically sealed ionization chamber 220 of the mass spectrometer 10000 is connected to the sample injection chamber 111' via an insulating sleeve 122', ensuring good insulation between the hermetically sealed ionization chamber 220 and the sample injection chamber flange 115'. This insulation between the hermetically sealed ionization chamber 220 and the sample injection chamber flange 115' prevents high voltage from the hermetically sealed ionization chamber 220 from being conducted to the process chamber, causing short circuits or affecting the process stability and product quality. Furthermore, it also prevents process chambers with electric fields from interfering with the detection of the mass spectrometer 10000.

[0171] like Figure 7 As shown, in some embodiments of this disclosure, the mass spectrometry system 10 may further include a docking cavity assembly 14. The docking cavity assembly 14 may include a mass spectrometer docking cavity 141. A hermetically sealed ionization chamber 220 is disposed within the mass spectrometer docking cavity 141.

[0172] like Figure 7As shown, in some embodiments of this disclosure, the mass spectrometer docking cavity 141 may include a docking cavity flange 1411. The docking cavity flange 1411 is vacuum-sealed to the sample inlet flange 115'. The docking cavity flange 1411 may include a flange hole 14111, and an insulating sleeve 122' may be disposed within the flange hole 14111.

[0173] In some embodiments of this disclosure, the mass spectrometer 10000 may also include a power supply and control signal feedthrough module (not shown in the figure), which is disposed outside the mass spectrometer docking cavity 141 and is used to transmit heating current to the filament, transmit radio frequency voltage to the quadrupole, etc.

[0174] like Figure 7 As shown, in some embodiments of this disclosure, the mass spectrometer docking cavity 141 may further include a mass spectrometer interface 1412. The mass spectrometer interface 1412 is disposed on the mass spectrometer docking cavity 141, and the power supply and control signal feedthrough module of the mass spectrometer 10000 can be vacuum-sealed to the mass spectrometer docking cavity 141 through the mass spectrometer interface 1412 (for example, a vacuum-sealed connection can be made through a vacuum feedthrough flange).

[0175] like Figure 7 As shown, in some embodiments of this disclosure, the mass spectrometer docking cavity 141 may include a signal outlet 1413. The signal outlet 1413 is disposed on the mass spectrometer docking cavity 141, and the signal lead line outputs the signal detected by the detector located in the mass spectrometer docking cavity 141 through the signal outlet 1413. For example, the detected signal can be output to a processing terminal (e.g., a processor, a computer, etc.).

[0176] like Figure 7 As shown, in some embodiments of this disclosure, the mass spectrometer 10000 may further include a shield 124', with the airtight ionization chamber 220 at least partially disposed within the shield 124'.

[0177] like Figure 8 As shown, in some embodiments of this disclosure, the docking cavity assembly 14 may further include a support base 142. The support base 142 may include a support plate 1421 and a support flange 1422. The support plate 1421 may be fixedly connected to the airtight ionization chamber 220 or the shield 124', and the support flange 1422 is sleeved on the insulating sleeve 122'.

[0178] like Figure 8 As shown, in some embodiments of this disclosure, the material of the support base 142 may include materials such as ceramic.

[0179] like Figure 8As shown, in some embodiments of this disclosure, the support flange 1422 can be fixedly connected to the hermetically sealed ionization chamber 220 or the shield 124' via at least one support post (e.g., support posts 1423A, 1423B). The second end of the support post (e.g., support posts 1423A, 1423B) (e.g., Figure 8 The right end shown is fixedly connected to the airtight ionization chamber 220 or the shield 124', and the first end of the support column (e.g., support column 1423A, 1423B) is fixedly connected to the right end shown to the right end of the support column (e.g., support column 1423A, 1423B). Figure 8 The left end shown passes through the support flange 1422 and is secured by a fastening nut (e.g., fastening nuts 1424A, 1424B).

[0180] Those skilled in the art will understand that the support plate 1421 and the support flange 1422 can be integrally formed or separately formed and then connected to form the support 142.

[0181] like Figure 8 and Figure 9 As shown, in some embodiments of this disclosure, the mating cavity assembly 14 may further include an elastic member 143. The elastic member 143 is sleeved on the insulating sleeve 122' and is used to adjust the axial assembly distance of the insulating sleeve 122'.

[0182] like Figure 8 and Figure 9 As shown, in some embodiments of this disclosure, the first end of the insulating sleeve 122' (e.g., Figure 8 and Figure 9 The left end of the insulating sleeve 122' shown may include an insulating sleeve flange 1221', and the first end of the elastic member 143 and the second end of the insulating sleeve flange 1221' (e.g., Figure 8 and Figure 9 The right end of the insulating sleeve 122' shown abuts against the support flange 1422, and the second end of the elastic member 143 abuts against the support flange 1422. The first end of the insulating sleeve flange 1221' abuts against the sample inlet flange 115'.

[0183] In some embodiments of this disclosure, the first end of the insulating sleeve 122' abuts against the sample inlet flange 115' via the insulating sleeve flange 1221', which can increase the contact area and reduce assembly errors and the risk of local deformation.

[0184] like Figure 8 As shown, in some embodiments of this disclosure, the elastic component 143 may include a spring. Those skilled in the art will understand that this is merely exemplary, and the elastic component 143 may also include rubber elastic elements, plastic elastic elements, etc.

[0185] like Figure 7As shown, in some embodiments of this disclosure, the docking cavity assembly 14 may further include a docking cavity vacuum pump 144. The docking cavity vacuum pump 144 is connected to the mass spectrometer docking cavity 141 and is used to adjust the vacuum level of the mass spectrometer docking cavity 141.

[0186] In some embodiments of this disclosure, the docking chamber vacuum pump 144 may be connected to the mass spectrometer docking chamber 141 via a flange (e.g., a vacuum flange).

[0187] In some embodiments of this disclosure, the docking cavity vacuum pump 144 may include a molecular pump or any suitable vacuum pump, such as an oil-free magnetically levitated molecular pump.

[0188] like Figure 7 As shown, in some embodiments of this disclosure, the docking cavity assembly 14 may further include a docking cavity vacuum gauge 145. The docking cavity vacuum gauge 145 is vacuum-sealed with the mass spectrometer docking cavity 141 and is used to detect the vacuum level of the mass spectrometer docking cavity 141.

[0189] In some embodiments of this disclosure, the docking cavity vacuum gauge 145 may include a BA-type hot cathode ion vacuum gauge or any other suitable vacuum gauge.

[0190] like Figure 7 As shown, in some embodiments of this disclosure, the mass spectrometer 10000 may also include a detector (e.g., a Faraday cup, etc.). The docking chamber vacuum pump 144 may be disposed opposite to the detector and perpendicular to the axis of the hermetically sealed ionization chamber 220.

[0191] In some embodiments of this disclosure, the docking chamber vacuum pump 144 is positioned opposite to the detector, and unionized molecules, atoms, etc. are directly pumped away by the docking chamber vacuum pump 144, which can improve the detection accuracy of the mass spectrometer 10000.

[0192] Those skilled in the art will understand that the multi-stage rods and detectors (not shown in the figure) can be housed within the shield 124'.

[0193] In some embodiments of the mass spectrometry system 10 disclosed herein, the sample introduction chamber 111' is connected to the hermetically sealed ionization chamber 220 (e.g., a closed ionization chamber) of the mass spectrometer 10000 via a passage including a micropore 1151. The pressure within the hermetically sealed ionization chamber 220 can be accurately controlled by the pressure of the sample introduction chamber 111'. For example, in a hydrogen atmosphere, the pressure of the hermetically sealed ionization chamber 220 can be accurately controlled at 5E-6 mbar by the sample introduction chamber 111', thereby greatly reducing the probability of hydrogen interacting with the filament of the mass spectrometer 10000 while ensuring a sufficiently large sampling volume. The sample injection chamber 111' and the mass spectrometer docking chamber 141 are connected only through the ion outlet of the gas-tight ionization chamber 220 (e.g., an ion outlet with a diameter of 3 mm). This makes the gas pressure in the environment where the filament and detector of the mass spectrometer 10000 are located at least two orders of magnitude lower than the pressure inside the gas-tight ionization chamber 220. The interaction between hydrogen and the filament is significantly reduced. Even if a very small amount of hydrogen interacts with the filament and products are generated, it is difficult for it to flow back into the gas-tight ionization chamber 220 against the gas pressure. Therefore, the mass spectrometry system 10 of some embodiments of this disclosure can effectively reduce the interference of hydrogen atmosphere on the detection of the mass spectrometer 10000.

[0194] According to some embodiments of the mass spectrometry system 10 disclosed herein, during sample injection, the following steps may be included: opening the process chamber end gate valve 131 and closing the injection chamber end gate valve 132, allowing the sample in the process chamber to enter the injection chamber 111'. The gate opening of the injection chamber gate valve 114' is adjusted to control the pressure in the injection chamber 111', thereby controlling the pressure in the hermetically sealed ionization chamber 220. When the pressure in the hermetically sealed ionization chamber 220 and the pressure in the mass spectrometer docking chamber can meet the measurement and analysis requirements, for example, when the signal-to-noise ratio and dynamic range are good, the mass spectrometer is turned on for gas analysis.

[0195] The mass spectrometry system 10 according to some embodiments of this disclosure can effectively improve the signal-to-noise ratio and detection dynamic range of trace gas mass spectrometry analysis under a hydrogen atmosphere. For example, the mass spectrometry system 10 according to some embodiments of this disclosure has a significant suppression effect on the mass peaks of 41, 42, 43 amu, 55, 56, 57 amu, 69, 70, 71 amu, etc., which are from the dissociation fragments of C3, C4, C5 and subsequent long-chain hydrocarbons, respectively. This effectively improves the detection dynamic range in the mass range of 41 to 300 amu, makes the detection limit more sensitive, and is suitable for measuring trace gas components appearing in this atomic mass unit range.

[0196] The mass spectrometry system 10 according to some embodiments of this disclosure is able to suppress noise from the formation of excited-state hydrogen atoms more efficiently.

[0197] It should be noted that the above are merely exemplary embodiments of this disclosure and are not intended to limit this disclosure. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this disclosure should be included within the scope of protection of this disclosure.

Claims

1. An ion lens assembly, characterized in that, include: A deflecting lens assembly for focusing an ion beam in an incident particle beam and deflecting the ion beam in a first direction; as well as A return-axis lens assembly is used to receive the ion beam from the deflection lens assembly, the return-axis lens assembly being used to focus the received ion beam and deflect the ion beam in a second direction.

2. The ion lens assembly according to claim 1, characterized in that, The deflection lens assembly includes: A deflecting lens for focusing the ion beam in the incident particle beam and deflecting the ion beam a first deflection distance in the first direction; and A deflection extraction electrode is used to further deflect the ion beam in the first direction by a second deflection distance. The deflection extraction electrode includes a deflection extraction aperture for allowing the deflected ion beam to pass through.

3. The ion lens assembly according to claim 2, characterized in that, The projection profile of the deflection extraction aperture on the incident surface does not overlap with or tangent to the beam spot profile of the incident particle beam on the incident surface.

4. The ion lens assembly according to claim 1 or 2, characterized in that, The return-axis lens assembly includes: A return-axis lens for receiving the ion beam from the deflection lens assembly, the return-axis lens for focusing the received ion beam and deflecting the ion beam in a second direction by a first return-axis distance; and A homing extraction electrode is used to further deflect the ion beam in the second direction by a second homing distance. The homing extraction electrode includes a homing extraction aperture for allowing the deflected ion beam to pass through.

5. The ion lens assembly according to claim 4, characterized in that, The deflecting lens is offset from the central axis of the incident ion beam; and / or The first end of the deflection extraction electrode is insulated from the second end of the deflection lens, and the deflection extraction hole is arranged off-axis parallel to the deflection lens; and / or The first end of the return-axis lens is insulated from the second end of the deflection extraction electrode and is arranged off-axis parallel to the deflection extraction hole; and / or The first end of the return axis extraction electrode is insulated from the second end of the return axis lens and is set off-axis parallel to the return axis lens.

6. The ion lens assembly according to claim 4, characterized in that, The deflecting lens is generally cylindrical in shape, and its main body comprises a conductive material; and / or The return-axis lens is generally cylindrical in shape, and the main body of the return-axis lens includes a conductive material.

7. The ion source according to claim 4, characterized in that, The first deflection distance is half the diameter of the beam spot of the incident particle beam on the incident surface; and / or The second deflection distance is half the diameter of the beam spot of the incident particle beam on the incident surface; and / or The first axial distance is half the diameter of the beam spot of the incident particle beam on the incident surface; and / or The second axial distance is half the diameter of the beam spot of the incident particle beam on the incident plane; and / or The return-axis extraction aperture is coaxial with the beam spot of the incident particle beam on the incident surface.

8. The ion lens assembly according to claim 1, characterized in that, The first direction is opposite to the second direction; and / or The distance by which the return-axis lens assembly deflects the ion beam in the second direction is equal to the distance by which the deflection lens assembly deflects the ion beam in the first direction.

9. An ion source, characterized in that, include: A particle beam generation system used to generate particle beams; as well as The ion lens assembly according to any one of claims 1-8 is used for processing the particle beam.

10. The ion source according to claim 9, characterized in that, The particle beam generation system includes: A collimator, including a collimation aperture, is used to collimate the ion beam in the particle beam. The first end of the deflection lens is insulated from the collimator and is set off-axis parallel to the collimation hole. The projection contours of the deflection extraction hole and the collimation hole on the incident plane do not overlap. The return-axis extraction hole is set coaxially with the collimation hole.

11. The ion source according to claim 10, characterized in that, The projection profile of the deflection extraction aperture on the incident surface does not overlap with the projection profile of the collimating aperture on the incident surface; or The projection profile of the deflection extraction hole on the incident surface is tangent to the projection profile of the collimation hole on the incident surface.

12. The ion source according to claim 10, characterized in that, The particle beam generation system also includes: An airtight ionization chamber is used to ionize samples to generate particles; An extraction electrode, insulatedly disposed at the outlet of the hermetically sealed ionization chamber, and coaxially arranged with the collimating orifice; and A focusing ring, insulatedly disposed between the extraction electrode and the collimator, and coaxially disposed with the collimation aperture, is used for focusing and controlling the ion beam.

13. A mass spectrometer, characterized in that, Includes an ion source according to any one of claims 8-13.

14. The mass spectrometer according to claim 13, characterized in that, Also includes: A fourth-stage rod is positioned at the outlet of the return shaft extraction hole and is coaxially arranged with the collimation hole; and / or The fourth-stage rod housing is located on the outside of the fourth-stage rod and is insulated from the return shaft extraction pole.

15. The mass spectrometer according to claim 13, characterized in that, The mass spectrometer is used to detect gaseous components in samples containing hydrogen.

16. A mass spectrometry system, characterized in that, include: The sample inlet assembly includes the sample inlet chamber; as well as The mass spectrometer according to any one of claims 13-15 includes a hermetically sealed ionization chamber for ionizing a sample to generate particles, wherein the sample inlet chamber is docked to the hermetically sealed ionization chamber for delivering a sample to the hermetically sealed ionization chamber and controlling the pressure of the hermetically sealed ionization chamber.

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