Mask plate

Abstract

The invention relates to the technical field of display, and provides a mask which comprises a pixel area, a clearance area and an identification area, the pixel area comprises a plurality of pixel through holes, the clearance area surrounds the identification area, and the exterior of the clearance area is surrounded by the plurality of pixel through holes; the mask comprises a first face and a second face which are opposite in the thickness direction, a plurality of first grooves are formed in one side of the first face of the clearance area, a plurality of second grooves are formed in one side of the second face of the clearance area, and the arrangement of the first grooves and the arrangement of the second grooves are the same as the arrangement of the pixel through holes. The central points of the first groove and the second groove do not coincide in the thickness direction of the mask; the depth of the first groove and the second groove adjacent to the pixel area is one half of the thickness of the mask plate, and the depth of the first groove and the second groove adjacent to the identification area is larger than one half of the thickness of the mask plate and smaller than or equal to two thirds of the thickness of the mask plate. The mask plate solves the technical problems that in the prior art, the pixel area of the FMM is wrinkled, and the identification through hole is prone to deformation.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of display, in particular to a mask plate. BACKGROUND

[0002] In the field of display, FMM (Fine Metal Mask) is a key material for OLED (Organic Light Emitting Diode) panel manufacturing. It is mainly used in the vacuum evaporation process, and RGB (Red, Green, Blue) sub-pixel materials are evaporated to the display panel through the pixel opening through hole of the pixel opening area (AA area) on the FMM, so as to realize high-resolution display.

[0003] There are various opening design types in the FMM plate, among which the mark through hole is the through hole used for PPA (Patterned Precision Alignment) detection. The function of this hole is that the equipment feeds back the PPA precision of this area by grabbing the evaporation material pattern of this hole on the glass substrate. In the existing FMM, the pixel opening area includes a plurality of densely distributed pixel opening through holes, and the shiftmark through hole is distributed with a solid plate clearance area between the surrounding pixel opening area. The clearance area is an area that evaporation material cannot pass through, so as to ensure that the lens will not be mistakenly grabbed. Due to the uneven stress distribution of this area, the pixel opening area of the FMM is prone to wrinkles during the stretching process. In view of this situation, the clearance area is semi-etched to alleviate the wrinkles, such as Figure 1 In this case, the wrinkles are alleviated, but still exist.

[0004] And compared with the area of the mark through hole, the area of the clearance area is larger. When evaporating organic materials, the larger area of the clearance area is more prone to metal thermal expansion at a higher temperature (about 80℃), and the mark through hole is prone to deformation, which causes the misplacement of the evaporation material or the mark to become smaller, thereby causing the change of the mark on the glass substrate to affect the PPA detection result, which will greatly affect the production yield.

[0005] Therefore, it is necessary to solve the problems of wrinkles in the pixel opening area of the FMM and the deformation of the mark through hole. SUMMARY

[0006] The purpose of the present application is to provide a mask plate, which solves the technical problems of wrinkles in the pixel opening area of the FMM and the deformation of the mark through hole in the prior art.

[0007] In a first aspect, embodiments of the present application provide a mask plate, comprising: a pixel region, a clearance region, and a mark region, the pixel region comprising a plurality of pixel through holes, the clearance region surrounding the mark region, an outside of the clearance region being surrounded by the plurality of pixel through holes, the mark region comprising a mark through hole; the mask plate comprising a first surface and a second surface opposite along a thickness direction, a plurality of first grooves being arranged on a first surface side of the clearance region, a plurality of second grooves being arranged on a second surface side of the clearance region, an arrangement of the plurality of first grooves being the same as an arrangement of the pixel through holes, an arrangement of the plurality of second grooves being the same as the arrangement of the pixel through holes, and a center point of the first groove and a center point of the second groove not coinciding in the thickness direction of the mask plate; a depth of the first groove and the second groove adjacent to the pixel region being half of a thickness of the mask plate, and a depth of the first groove and the second groove adjacent to the mark region being greater than half of the thickness of the mask plate and less than or equal to two-thirds of the thickness of the mask plate.

[0008] Further, a first surface opening size of the mark through hole is smaller than a second surface opening size, a distance between the first groove closest to the mark through hole and the mark through hole is greater than or equal to a distance between the second groove closest to the mark through hole and the mark through hole.

[0009] Further, when the arrangement of the pixel through holes is staggered arrangement, in a stretching direction of the mask plate and perpendicular to the stretching direction of the mask plate, projections of the first groove and the second groove in the thickness direction of the mask plate are alternated with each other.

[0010] Further, when the arrangement of the pixel through holes is staggered arrangement, a distance between the first groove or the second groove adjacent to the pixel region and the adjacent pixel through hole is 1-2 times a distance between the pixel through holes with the shortest adjacent distance.

[0011] Further, the arrangement of the first groove and the second groove is symmetrical about a straight line where a diagonal line of the mark region is located.

[0012] Further, when the arrangement of the pixel through holes is parallel arrangement, in a perpendicular direction to the stretching direction of the mask plate, a line connecting the first groove and a line connecting the second groove are parallel to each other, and projections of the lines in the stretching direction do not coincide, and in the stretching direction of the mask plate, the projections of the first groove and the second groove in the thickness direction of the mask plate are alternated with each other.

[0013] Further, when the arrangement of the pixel through holes is parallel arrangement, a distance between the first groove or the second groove adjacent to the pixel region and the adjacent pixel through hole is 1.5-2.5 times a distance between the pixel through holes with the shortest adjacent distance.

[0014] Further, the first groove and the second groove are arranged symmetrically about a straight line where a perpendicular bisection of the mask stretching direction of the identification area is located.

[0015] Further, the depth of the first groove and the second groove between the first groove and the second groove adjacent to the pixel area and the first groove and the second groove adjacent to the identification area is greater than or equal to the depth of the first groove and the second groove adjacent to the pixel area and less than or equal to the depth of the first groove and the second groove adjacent to the identification area.

[0016] Further, when the number of the identification through holes is 1, the distance between the first groove or the second groove adjacent to the identification through hole and the identification through hole is greater than or equal to the distance between two shortest pixel through holes and less than or equal to 2 times the distance between the two shortest pixel through holes; when the number of the identification through holes is greater than 1, the distance between the first groove or the second groove adjacent to the identification through hole and the center of the identification area is greater than 2 times the distance between two shortest pixel through holes and less than or equal to 4 times the distance between the two shortest pixel through holes.

[0017] The embodiment of the present application has at least the following technical effects: The mask provided by the embodiment of the present application includes a pixel area, a clearance area and an identification area. The pixel area includes a plurality of pixel through holes. The clearance area surrounds the identification area. The outside of the clearance area is surrounded by the plurality of pixel through holes. The identification area includes one or more identification through holes. In the case that the identification area includes one identification through hole, the mask includes a first surface and a second surface opposite in the thickness direction. The first surface is a glass surface, i.e. the surface close to the glass substrate during evaporation. The second surface is an evaporation surface, i.e. the surface close to the evaporation source during evaporation. Since the pixel area occupies the largest area on the mask, the clearance area and the identification area have small areas, but the clearance area is an area through which the evaporation material cannot pass. Therefore, during the stretching process, the pixel area may be wrinkled due to the mismatch of stress with the pixel area. Therefore, a plurality of first grooves are arranged on the first surface side of the clearance area, and a plurality of second grooves are arranged on the second surface side of the clearance area. The arrangement of the plurality of first grooves is the same as the arrangement of the pixel through holes, and the arrangement of the plurality of second grooves is the same as the arrangement of the pixel through holes. The same arrangement means that the distance between the center points of any two adjacent first grooves, or the distance between the center points of any two adjacent second grooves, is equal to the distance between the center points of any two adjacent pixel through holes parallel to the connecting line, and the center point of the first groove and the center point of the second groove do not coincide in the thickness direction of the mask. In this way, the stress of the clearance area can match the stress of the peripheral pixel area, and the wrinkling of the pixel area during the stretching process can be reduced.

[0018] Meanwhile, since the identification through hole of the identification area is capable of passing the evaporation material, the mark used for detecting the PPA (Patterned Precision Alignment) is formed on the glass substrate, compared with the clearance area, the identification area is surrounded and has a small area, in order to avoid the influence of the metal thermal expansion of the clearance area on the identification through hole during the evaporation, the depth of the first groove and the second groove adjacent to the pixel through hole is half of the thickness of the mask, so as to ensure that the pixel area does not generate wrinkles, and the depth of the first groove and the second groove adjacent to the identification area is greater than half of the thickness of the mask and less than or equal to two-thirds of the thickness of the mask, in the clearance area close to the identification through hole, the depth of the first groove and the second groove is greater than half of the thickness of the mask, which needs to reduce the metal volume as much as possible and then reduce the influence of the metal thermal expansion, but also needs to consider that the clearance area cannot pass the evaporation material, so the depth of the first groove and the second groove is less than or equal to two-thirds of the thickness of the mask, which also ensures that the clearance area can not be wet etched during the preparation of the mask, and can also ensure that the mask is not torn during the stretching.

[0019] Therefore, the mask provided by the application has the first groove and the second groove arranged in the same way as the pixel through hole on the first surface and the second surface of the clearance area, which solves the problem of wrinkles of the pixel area of the mask during the stretching; the depth of the first groove and the second groove adjacent to the pixel through hole is half of the thickness of the mask, and the depth of the first groove and the second groove adjacent to the identification area is greater than half of the thickness of the mask and less than or equal to two-thirds of the thickness of the mask, which reduces the metal volume close to the identification through hole and reduces the problem of easy deformation of the identification through hole caused by the metal thermal expansion. BRIEF DESCRIPTION OF DRAWINGS

[0020] In order to more clearly illustrate the specific embodiments of the application or the technical solutions in the prior art, the following will briefly introduce the drawings needed to be used in the specific embodiments or the prior art description. Obviously, the drawings in the following description are some embodiments of the application, and those skilled in the art can also obtain other drawings according to these drawings without creative labor.

[0021] Figure 1 Prior art schematic diagram; Figure 2 A region distribution top view schematic diagram of a mask provided by an embodiment of the application; Figure 3 An enlarged top view schematic diagram of a clearance area under a staggered arrangement of pixel through holes of a mask provided by an embodiment of the application; Figure 4 A Figure 3A cross-sectional view of the mask in the thickness direction of the mask in A11-A12; Figure 5 A cross-sectional view of the mask in the thickness direction of the mask in A21-A22; Figure 3 A cross-sectional view of the mask in the thickness direction of the mask in A21-A22; Figure 6 A cross-sectional view of the mask in the thickness direction of the mask in A21-A22; Figure 3 A cross-sectional view of the mask in the thickness direction of the mask in A21-A22; Figure 7 A cross-sectional view of the mask in the thickness direction of the mask in A21-A22; Figure 8 A cross-sectional view of the mask in the thickness direction of the mask in A21-A22; Figure 7 A cross-sectional view of the mask in the thickness direction of the mask in A21-A22; Figure 9 A cross-sectional view of the mask in the thickness direction of the mask in A21-A22; Figure 7 A cross-sectional view of the mask in the thickness direction of the mask in A21-A22; Figure 10 A cross-sectional view of the mask in the thickness direction of the mask in A21-A22; Figure 7 A cross-sectional view of the mask in the thickness direction of the mask in A21-A22; Figure 11 A cross-sectional view of the mask in the thickness direction of the mask in A21-A22; Figure 7 A cross-sectional view of the mask in the thickness direction of the mask in A21-A22; Figure 12 A cross-sectional view of the mask in the thickness direction of the mask in A21-A22; Figure 7 A cross-sectional view of the mask in the thickness direction of the mask in A21-A22;

[0022] Figure: 1-pixel area; 2-clearance area; 3-identification area; 11-pixel via; 21, 211-219-first groove; 22, 221-225-second groove; 31-identification via. DETAILED DESCRIPTION

[0023] The technical solutions of the present application will be described clearly and completely below in conjunction with embodiments. Obviously, the described embodiments are part of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative labor fall within the scope of protection of the present application.

[0024] Those skilled in the art can understand that, unless otherwise defined, all terms (including technical terms and scientific terms) used herein have the same meaning as commonly understood by those skilled in the art to which the present application belongs. It should also be understood that terms such as those defined in general dictionaries should be understood as having meanings consistent with those in the context of the prior art, and should not be interpreted in an idealized or overly formal sense unless specifically defined as such.

[0025] It is to be understood that the singular forms "a," "an," and "the" include plural referents unless the context clearly dictates otherwise. It is further understood that the terms "comprising," "including," "containing," and "having" and the like, when used in the specification, specify the presence of stated features, integers, steps, operations, elements, and / or components but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and / or groups thereof. The term "and / or" includes all combinations of one or more of the associated listed items.

[0026] In a first aspect, referring to Figures 2 to 12 The embodiment of the present application provides a mask plate, which comprises a pixel area 1, a clearance area 2 and a mark area 3, the pixel area 1 comprises a plurality of pixel through holes 11, the clearance area 2 surrounds the mark area 3, the outside of the clearance area 2 is surrounded by the plurality of pixel through holes 11, and the mark area 3 comprises a mark through hole 31; the mask plate comprises a first surface S1 and a second surface S2 opposite in the thickness direction, a plurality of first grooves 21 are arranged on the first surface side of the clearance area, a plurality of second grooves 22 are arranged on the second surface side of the clearance area, the arrangement of the plurality of first grooves 21 is the same as the arrangement of the pixel through holes 11, the arrangement of the plurality of second grooves 22 is the same as the arrangement of the pixel through holes 11, and the center points of the first grooves 21 and the center points of the second grooves 22 do not coincide in the thickness direction of the mask plate; the depths of the first grooves 21 and the second grooves 22 adjacent to the pixel area 1 are half of the thickness of the mask plate, and the depths of the first grooves 21 and the second grooves 22 adjacent to the mark area 3 are greater than half of the thickness of the mask plate and less than or equal to two-thirds of the thickness of the mask plate.

[0027] In this embodiment, the mask plate includes a pixel area 1, a clearance area 2 and a mark area 3, the pixel area 1 includes a plurality of pixel through holes 11, the clearance area 2 surrounds the mark area 3, the outside of the clearance area 2 is surrounded by the plurality of pixel through holes 11, the mark area 3 includes one or more mark through holes 31, and the mark area 3 includes one mark through hole 31 in the figure as an example, the mask plate includes a first surface S1 and a second surface S2 opposite in the thickness direction, the first surface S1 is a glass surface, that is, the surface close to the glass substrate during evaporation, and the second surface S2 is an evaporation surface, that is, the surface close to the evaporation source during evaporation. Since the pixel area 1 occupies the largest area on the whole mask plate, the clearance area 2 and the mark area 3 have small areas, but the clearance area 2 is an area through which the evaporation material cannot pass, so during the stretching process, the pixel area 1 will wrinkle due to the mismatch of stress with the pixel area 1, therefore, a plurality of first grooves 21 are arranged on the first surface side of the clearance area 2, a plurality of second grooves 22 are arranged on the second surface side of the clearance area, the arrangement of the plurality of first grooves 21 is the same as the arrangement of the pixel through holes 11, the arrangement of the plurality of second grooves 22 is the same as the arrangement of the pixel through holes 11, the same arrangement means that the distance between the center points of any two adjacent first grooves 21, or the distance between the center points of any two adjacent second grooves 22, is equal to the distance between the center points of any two adjacent pixel through holes 11, and the center point of the first groove 21 and the center point of the second groove 22 do not coincide in the thickness direction of the mask plate, so that the stress of the clearance area 2 matches the stress of the peripheral pixel area 1, and the wrinkles of the pixel area 1 during stretching are reduced.

[0028] At the same time, since the mark through hole 31 of the mark area 3 is capable of passing through the evaporation material, a mark for detecting PPA (Patterned Precision Alignment) is formed on the glass substrate, compared with the peripheral clearance area 2, the mark area 3 is surrounded and has a small area, in order to avoid the influence of the metal thermal expansion of the clearance area 2 on the mark through hole 31 during evaporation, the depth of the first groove 21 and the second groove 22 adjacent to the pixel through hole 11 is half of the thickness of the mask plate, which ensures that the pixel area 1 does not wrinkle, and the depth of the first groove 21 and the second groove 22 adjacent to the mark area 3 is greater than half of the thickness of the mask plate and less than or equal to two-thirds of the thickness of the mask plate, in the clearance area 2 close to the mark through hole 31, the depth of the first groove 21 and the second groove 22 is greater than half of the thickness of the mask plate, which needs to reduce the metal volume as much as possible to reduce the influence of the metal thermal expansion, but also needs to consider that the clearance area 2 cannot allow the evaporation material to pass through, therefore, the depth of the first groove 21 and the second groove 22 is less than or equal to two-thirds of the thickness of the mask plate, which also ensures that the clearance area 2 cannot be wet etched during the preparation of the mask plate, and also ensures that the mask plate will not be torn during stretching.

[0029] The first groove 21 and the second groove 22 adjacent to the identification area 3 can refer to Figure 3 The first groove and the second groove between the second groove 221 and the first groove 213 (excluding the second groove 221 and the first groove 213) in the middle, for example, belong to the first groove 21 and the second groove 22 adjacent to the identification area 3, Figure 7 The first groove and the second groove between the second groove 224, 225 (excluding the second groove 224, 225) in the middle, for example, belong to the first groove 21 and the second groove 22 adjacent to the identification area 3, that is, the recesses on the innermost side of the clearance area are the first groove 21 and the second groove 22 adjacent to the identification area 3, and the depth T3 is greater than half of the mask thickness T1 and less than or equal to two-thirds of the mask thickness T1; the first groove 21 and the second groove 22 adjacent to the pixel area 1 can refer to Figures 7 to 12 The first groove 21 and the second groove 22 under the B41-B42 intersection, the first groove 218, 219, the depth T2 of the first groove 21 and the second groove 22 under the B41-B42 intersection and the first groove 218, 219 is half of the mask thickness T1, that is, the recesses on the outermost side of the clearance area are the first groove 21 and the second groove 22 adjacent to the pixel area 1.

[0030] Therefore, the mask of the present application is provided with the first groove 21 and the second groove 22 in the same arrangement mode as the pixel through hole of the pixel area on the first surface and the second surface of the clearance area 2, which solves the problem of wrinkles of the pixel area 1 of the mask when the screen is stretched; the depth of the first groove 21 and the second groove 22 adjacent to the pixel through hole is half of the mask thickness, and the depth of the first groove 21 and the second groove 22 adjacent to the identification area 3 is greater than half of the mask thickness and less than or equal to two-thirds of the mask thickness, which reduces the metal volume close to the identification through hole 31 and reduces the problem of easy deformation of the identification through hole 31 caused by metal thermal expansion.

[0031] It should be noted that, Figure 3 and Figure 7Each solid circle represents a first recess 21, and each dashed circle represents a second recess 22. However, the above figure is not a limitation on the shape and size of the first recess 21 and the second recess 22. The first recess 21 and the second recess 22 can also be square recesses. The circles are used here to distinguish the pixel via holes for ease of understanding. The first recess 21 and the second recess 22 do not necessarily have the same size as the circles in the figure. The actual opening size can be smaller, for example, within 100 microns. The figure only demonstrates one arrangement of the first recess 21 and the second recess 22. The dashed circles of the second recess 22 cannot be directly seen in the top view facing the first surface S1, and are therefore shown in dashed lines. The dashed boxes of the clearance area 2 and the identification area 3 in the figure are only used to indicate the division of the clearance area 2 and the identification area 3. The dashed boxes do not exist on the actual mask.

[0032] Optionally, the first surface opening size C11 of the identification via hole 31 is smaller than the second surface opening size C21. The distance between the first recess 21 closest to the identification via hole 31 and the identification via hole 31 is greater than or equal to the distance between the second recess 22 closest to the identification via hole 31 and the identification via hole 31.

[0033] In this embodiment, if the first recess 21 and the second recess 22 are evenly distributed around the identification area 3, for example, Figure 3 , the number of the first recess 21 and the second recess 22 around the identification area 3 is the same and evenly alternately distributed. At this time, the distance between the first recess 21 closest to the identification via hole 31 and the identification via hole 31 is equal to the distance between the second recess 22 closest to the identification via hole 31 and the identification via hole 31. If the first recess 21 and the second recess 22 are not evenly distributed around the identification area 3, for example, Figure 7 , the recess closest to the identification via hole 31 should be the first recess with the opening on the first surface S1 of the mask, such as the first recesses 214, 215, 216, and 217. Because the first surface opening size C11 of the identification via hole 31 is smaller than the second surface opening size C21, the first surface S1 is closer to the glass substrate. Therefore, the first surface opening size C11 has a greater impact on the preparation of the mark on the glass substrate. Selecting the first recess 21 as the recess closest to the identification via hole 31 can more effectively reduce the influence of metal thermal expansion on the deformation of the first surface opening size C11. At this time, the distance between the first recess 21 closest to the identification via hole 31 and the identification via hole 31 is greater than the distance between the second recess 22 closest to the identification via hole 31 and the identification via hole 31.

[0034] Optionally, when the pixel via hole 11 is arranged in a staggered arrangement, in the stretching direction of the mask and perpendicular to the stretching direction of the mask, the projections of the first recess 21 and the second recess 22 in the thickness direction of the mask alternate with each other.

[0035] In this embodiment, when the pixel vias 11 are arranged in a staggered manner, at least one side of the closed pattern formed by the projection lines of any four adjacent pixel vias 11 is not parallel to the mask stretching direction. Figure 3 The staggered arrangement in the image is that two adjacent rows or two columns of pixel vias are arranged alternately. Therefore, the projections of the first groove 21 and the second groove 22 in the clearance area 2 onto the thickness direction (Z direction) of the mask are alternating, whether in the mask stretching direction (X direction) or perpendicular to the mask stretching direction (Y direction). This is beneficial for stress matching between the clearance area 2 and the pixel area 1.

[0036] Optionally, when the pixel vias 11 are arranged in a staggered manner, the distance between the first groove 21 and the second groove 22 adjacent to the pixel area 1 and the adjacent pixel via 11 is 1-2 times the distance between the adjacent pixel vias 11 with the shortest distance.

[0037] In this embodiment, the distance between the first groove 21 and the second groove 22 near the pixel area 1 and their nearest pixel via is 1-2 times the distance between their nearest pixel via and their adjacent nearest pixel via. For example, Figure 3 The distance between the first groove 21 and its nearest pixel via is E1, while the distance between that pixel via and its nearest adjacent pixel via is E2. E1 should be 1 to 2 times E2. Similarly, the distance between the second groove 22 and its nearest pixel via is F1, while the distance between that pixel via and its nearest adjacent pixel via is F2. F1 should be 1 to 2 times F2. This ensures that the grooves adjacent to pixel area 1 are neither too close to pixel area 1, affecting the vapor deposition process, nor too far from pixel area 1, resulting in poor stress matching and inability to remove wrinkles during screen fabrication.

[0038] Preferably, when the grooves are staggered, the arrangement of the first groove 21 and the second groove 22 in the clearance area 2 is symmetrical about the straight line containing the diagonal of the marking area 3. In this embodiment, since the distance between the first groove 21 and the second groove 22 near the pixel area 1 and their nearest pixel via is only 1-2 times the distance between their nearest pixel via and their adjacent nearest pixel via, this range may cause the arrangement of the first groove 21 and the second groove 22 in the clearance area 2 to be asymmetrical about the straight line containing the diagonal of the marking area 3. This asymmetry will affect the stress distribution in the clearance area 2. Therefore, when setting the first groove 21 and the second groove 22, their arrangement about the straight line containing the diagonal of the marking area 3 should also be considered (e.g., Figure 3 The lines containing A11-A12 and A21-A22 are symmetrical.

[0039] Optionally, when the pixel vias 11 are arranged in a parallel configuration, refer toFigure 7 The line connecting the first groove 21 and the line connecting the second groove 22 perpendicular to the stretching direction of the mask are parallel to each other and their projections in the stretching direction do not coincide. Furthermore, along the stretching direction of the mask, the projections of the first groove 21 and the second groove 22 in the thickness direction of the mask alternate with each other.

[0040] In this embodiment, when the pixel vias 11 are arranged in parallel, at least two sides of the closed pattern formed by the projection lines of any four adjacent pixel vias 11 are parallel to the mask stretching direction (X direction). The projections of the first groove 21 and the second groove 22 in the mask thickness direction (Z direction) are not alternating in the Y direction, but alternating in the mask stretching direction (X direction). The lines P1P2 connecting the first groove 21 and Q1Q2 connecting the second groove 22 are parallel to each other in the stretching direction (Y direction) and the projections of the lines connecting them in the stretching direction do not coincide. This is to match the stress of the mask along the X direction when stretching the mesh and to better eliminate the wrinkles in the pixel area 1.

[0041] Optionally, when the pixel vias 11 are arranged in parallel, the distance between the first groove 21 and the second groove 22 adjacent to the pixel area and the adjacent pixel via 11 is 1.5-2.5 times the distance between the adjacent pixel vias 11 with the shortest distance.

[0042] In this embodiment, the distance between the first groove 21 and the second groove 22 near the pixel area 1 and their nearest pixel aperture 11 is 1.5-2.5 times the distance between their nearest pixel aperture 11 and its adjacent nearest pixel aperture 11. For example, Figure 7 The distance between the first groove 21 and its nearest pixel aperture 11 is G1, while the distance between the pixel aperture 11 and its nearest adjacent pixel aperture 11 is G2. G1 should be 1.5 to 2.5 times G2. Similarly, the distance between the second groove 22 and its nearest pixel aperture 11 is H1, while the distance between the pixel aperture 11 and its nearest adjacent pixel aperture 11 is H2. H1 should be 1.5 to 2.5 times H2. This ensures that, when arranged in parallel, the grooves adjacent to pixel area 1 are neither too close to pixel area 1, affecting the vapor deposition of pixel area 1, nor too far from pixel area 1, resulting in poor stress matching and inability to remove wrinkles during mesh stretching. It should be noted that... Figure 7 The arrangement of the first groove 21 and the second groove 22 in the diagram is merely a demonstration of one possible arrangement. It is sufficient that the distance between the outermost first groove 21 and the second groove 22 of the clearance area and their nearest pixel via is 1.5-2.5 times the distance between the nearest pixel via and its adjacent nearest pixel via. Furthermore, because... Figure 7The arrangement of the pixel via 11 is square, so G2 equals H2. This is not a restriction on a certain pixel via and its nearest adjacent pixel via, but only a layout demonstration. If the layout is not square, then the nearest pixel via can be selected.

[0043] Preferably, when arranged in parallel, the arrangement of the first groove 21 and the second groove 22 in the clearance area 2 is symmetrical about the line containing the perpendicular line of the marking area 3 perpendicular to the mask stretching direction. In this embodiment, since the distance between the first groove 21 and the second groove 22 near the pixel area 1 and their nearest pixel aperture is 1.5-2.5 times the distance between their nearest pixel aperture and their adjacent nearest pixel aperture, this range may cause the arrangement of the first groove 21 and the second groove 22 in the clearance area 2 to be asymmetrical about the line containing the perpendicular line of the marking area 3 perpendicular to the mask stretching direction. This asymmetry will affect the stress distribution in the clearance area 2 when the mask is stretched. Therefore, when setting the first groove 21 and the second groove 22, the arrangement of their perpendicular line about the marking area 3 perpendicular to the mask stretching direction should be considered (e.g., Figure 7 The line containing B21-B22 is symmetrical.

[0044] Optionally, the depth of the first groove 21 and the second groove 22 located between the first groove 21 and the second groove 22 adjacent to the pixel aperture 11 and the first groove 21 and the second groove 22 adjacent to the identifier area 3 is greater than or equal to the depth of the first groove 21 and the second groove 22 adjacent to the pixel aperture 11 and less than or equal to the depth of the first groove 21 and the second groove 22 adjacent to the identifier area 3.

[0045] In this embodiment, considering that if the area of ​​the clearance area 2 is large, the first groove 21 and the second groove 22 provided therein include not only the grooves closer to the pixel area 1 and the grooves closer to the identifier area 3, but also some grooves sandwiched between the grooves closer to the pixel area 1 and the grooves closer to the identifier area 3. In order to better balance the stress distribution within the clearance area 2, it is necessary to restrict the grooves sandwiched between the grooves closer to the pixel area 1 and the grooves closer to the identifier area 3. For example, in Figure 3The first grooves 211 and 212 under the A11-A12 section line, the second grooves 222 and 223 under the A21-A22 section line, and the first groove 213 and second groove 221 under the A31-A32 section line are all grooves sandwiched between the first groove 21 and second groove 22 closer to pixel area 1 and the first groove 21 and second groove 22 closer to identifier area 3. Therefore, the depth of these first grooves and second grooves sandwiched in the middle, such as the first grooves 211, 212 and 213, and the second grooves 221, 222 and 223, is greater than or equal to the depth of the first groove 21 and second groove 22 adjacent to the pixel via, and less than or equal to the depth of the first groove 21 and second groove 22 adjacent to the identifier area 3.

[0046] Optionally, in the direction from pixel area 1 to the identifier area 3, the depth 22 of the first groove 21 and the second groove gradually increases. In this embodiment, with... Figure 7 For example, the second grooves 224 and 225 below the B31-B32 section are also grooves sandwiched between the groove closer to pixel area 1 and the groove closer to the identifier area 3. The depth of the second grooves 224 and 225 can be as follows: Figure 11 The groove shown has the same depth as the one closer to pixel area 1, which is half the thickness of the mask. It can also have the same depth as the groove closer to marker area 3 (not shown in the figure), or even be... Figure 10 The depth of the groove shown is greater than half the thickness of the mask but less than that of the groove closer to the marker area 3, so that the depth of the first groove 21 and the second groove 22 gradually increases in the direction of the marker area 3 from the pixel area 1, which better alleviates the stress distribution in the clearance area 2.

[0047] Optionally, when the number of identification through-holes 31 is 1, the distance of the first groove 21 or the second groove 22 adjacent to the identification through-hole 31 from the identification through-hole 31 is greater than or equal to the distance between the two shortest pixel through-holes 11 and less than or equal to twice the distance between the two shortest pixel through-holes 11; when the number of identification through-holes 31 is greater than 1, the distance of the first groove 21 or the second groove 22 adjacent to the identification through-hole 31 from the center of the identification area is greater than twice the distance between the two shortest pixel through-holes 11 and less than or equal to four times the distance between the two shortest pixel through-holes 11.

[0048] In this embodiment, as Figure 3 and Figure 7 As shown, regardless of whether the arrangement is staggered or parallel, the distance between any two closest adjacent pixel apertures 11 is basically the same, as... Figure 3The interlacing degree of the interlaced columns shown is interlaced to halfway point, but there are other cases, such as when they are staggered, interlacing to one-third point. In this case, the distance between a certain pixel aperture 11 and its surrounding adjacent pixel apertures 11 will inevitably be different. In this case, the distance between the other pixel aperture 11 with the shortest distance to the first pixel aperture 11 is selected as the distance between the two shortest-distance pixel apertures 11. This represents the minimum distance limit between two openings on the entire mask, such as... Figure 3 and Figure 7 In the indicated area 3, there is only one through-hole 31, and it is located at the center of the indicated area 3. Figure 3 In the first groove 21 and the second groove 22 adjacent to the marking area 3, the distance between the farthest first groove 21 or second groove 22 adjacent to the marking through hole 31 and the center point of the marking through hole 31 is greater than the distance between the two shortest pixel through holes 11 and less than twice the distance between the two shortest pixel through holes 11. Figure 7 In the first groove 21 and the second groove 22 adjacent to the identification area 3, the distance from the center point of the nearest first groove 21 to the identification through hole 31 is equal to the distance between the two shortest pixel through holes 11, and the distance from the center point of the nearest second groove 22 and the farthest first groove 21 to the identification through hole 31 is greater than the distance between the two shortest pixel through holes 11 but less than twice the distance between the two shortest pixel through holes 11.

[0049] Also, as not shown in the figure, if the number of identification through-holes 31 in the identification area 3 is greater than 1, then the center of the identification area 3 should be the center point of the line connecting all the identification through-holes 31. In this case, the distance between the first groove 21 or the second groove 22 adjacent to the identification through-hole 11 and the center of the identification area 3 should be greater than twice the distance between the two shortest pixel through-holes 11 and less than or equal to four times the distance between the two shortest pixel through-holes 11. These distance restrictions are to reduce the adverse effects of the clearance area 2 on the identification through-holes 31 of the identification area 3 during vapor deposition.

[0050] Optionally, the cross-section of the first groove 21 and the second groove 22 along the thickness direction of the mask is U-shaped. In this embodiment, since the first groove 21 and the second groove 22 are staggered on both sides of the mask, especially the first groove 21 and the second groove 22 are deeper closer to the marking area 3, the bottom corners of the staggered first groove 21 and the second groove 22 are designed to avoid right angles or acute angles, and the lines at the bottom of the grooves are made as gentle as possible to prevent tearing at the bottom corners of the staggered first groove 21 and the second groove 22 during stretching.

[0051] Those skilled in the art will understand that the steps, measures, and schemes in the various operations, methods, and processes discussed in this invention can be alternated, modified, combined, or deleted. Furthermore, other steps, measures, and schemes in the various operations, methods, and processes discussed in this invention can also be alternated, modified, rearranged, decomposed, combined, or deleted. Furthermore, steps, measures, and schemes in the prior art that are similar to those disclosed in this invention can also be alternated, modified, rearranged, decomposed, combined, or deleted.

[0052] In the description of this invention, it should be understood that the terms "center", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this invention.

[0053] The terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this invention, unless otherwise stated, "a plurality of" means two or more.

[0054] In the description of this invention, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "linking" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal communication between two components. Those skilled in the art can understand the specific meaning of the above terms in this invention based on the specific circumstances.

[0055] In the description of this specification, specific features, structures, materials, or characteristics may be combined in any suitable manner in one or more embodiments or examples.

[0056] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, and not to limit them; although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some or all of the technical features; and these modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present invention.

Claims

1. A photomask, characterized in that, include: The system comprises a pixel area, a clearance area, and a marking area. The pixel area includes multiple pixel vias, the clearance area surrounds the marking area, and the clearance area is surrounded by multiple pixel vias. The marking area includes marking vias. The photomask includes a first surface and a second surface opposite to each other along the thickness direction. A plurality of first grooves are provided on one side of the first surface of the clearance area, and a plurality of second grooves are provided on one side of the second surface of the clearance area. The arrangement of the plurality of first grooves is the same as the arrangement of the pixel vias, and the arrangement of the plurality of second grooves is the same as the arrangement of the pixel vias. The center point of the first groove and the center point of the second groove do not coincide in the thickness direction of the photomask. The depth of the first and second grooves adjacent to the pixel area is half the thickness of the mask, and the depth of the first and second grooves adjacent to the marking area is greater than half the thickness of the mask and less than or equal to two-thirds the thickness of the mask.

2. The photomask according to claim 1, characterized in that, The opening size of the first side of the identification through hole is smaller than the opening size of the second side, and the distance between the first groove closest to the identification through hole and the identification through hole is greater than or equal to the distance between the second groove closest to the identification through hole and the identification through hole.

3. The photomask according to claim 1, characterized in that, When the pixel vias are arranged in a staggered manner, the projections of the first groove and the second groove in the mask thickness direction alternate in the mask stretching direction and perpendicular to the mask stretching direction.

4. The photomask according to claim 3, characterized in that, When the pixel vias are arranged in a staggered manner, the distance between the first groove or the second groove adjacent to the pixel area and the adjacent pixel via is 1-2 times the distance between the adjacent pixel vias with the shortest distance.

5. The photomask according to claim 4, characterized in that, The arrangement of the first groove and the second groove is symmetrical about the straight line containing the diagonal of the marking area.

6. The photomask according to claim 1, characterized in that, When the pixel vias are arranged in parallel, the line connecting the first groove and the line connecting the second groove are parallel to each other in the stretching direction of the mask and the projection of the line connecting them in the stretching direction does not coincide. Furthermore, along the stretching direction of the mask, the projections of the first groove and the second groove in the thickness direction of the mask alternate with each other.

7. The photomask according to claim 6, characterized in that, When the pixel vias are arranged in parallel, the distance between the first groove or the second groove adjacent to the pixel area and the adjacent pixel via is 1.5-2.5 times the distance between the adjacent pixel vias with the shortest distance.

8. The photomask according to claim 7, characterized in that, The arrangement of the first groove and the second groove is symmetrical about the line containing the perpendicular line of the marking area that is perpendicular to the stretching direction of the mask.

9. The photomask according to claim 1, characterized in that, The depth of the first and second grooves located between the first and second grooves adjacent to the pixel area and the first and second grooves adjacent to the identifier area is greater than or equal to the depth of the first and second grooves adjacent to the pixel area and less than or equal to the depth of the first and second grooves adjacent to the identifier area.

10. The photomask according to claim 1, characterized in that, When the number of the identification through-holes is 1, the distance between the first groove or the second groove adjacent to the identification through-hole and the identification through-hole is greater than or equal to the distance between the two shortest pixel through-holes and less than or equal to twice the distance between the two shortest pixel through-holes; when the number of the identification through-holes is greater than 1, the distance between the first groove or the second groove adjacent to the identification through-hole and the center of the identification area is greater than twice the distance between the two shortest pixel through-holes and less than or equal to four times the distance between the two shortest pixel through-holes.

Images