Vacuum cavity system for MBE process and operation method of vacuum cavity system

Abstract

The invention discloses a vacuum cavity system for an MBE process and an operation method of the vacuum cavity system, and particularly relates to the technical field of MBE film growth equipment, and the vacuum cavity system comprises a vacuum cavity system and a sample conveying system; the vacuum cavity system comprises a rapid sample injection cavity, a pretreatment cavity, a process cavity and an interconnection cavity which are sequentially connected through gate valves; the sample conveying system comprises a sample rack placing table mounted at the bottom of the rapid sample injection cavity, a sample rack grabbing table mounted at the top of the pretreatment cavity, a magnetic sample conveying rod mounted on one side of the pretreatment cavity, a process cavity sample table mounted at the top of the process cavity and a transfer sample stopping table mounted at the bottom of the interconnection cavity; and the sample table is placed on the sample rack placing table. By arranging the interconnection cavity, the process cavity is isolated independently, the vacuum degree change gradient of the cavity during substrate conveying is reduced, the vacuumizing time is saved, and meanwhile topological interconnection with other equipment is achieved; by arranging the sample conveying system, pretreatment of six substrates at a time is achieved, the sample conveying frequency and the vacuum breaking frequency are reduced, and the efficiency is improved.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of MBE thin film growth equipment, and more particularly to a vacuum cavity system for MBE process and an operating method thereof. BACKGROUND

[0002] It is known that the vacuum system of the MBE equipment on the market mainly consists of three working chambers of a sample inlet chamber, a pretreatment chamber and a growth chamber; and the MBE epitaxial material growth process requires a stable and good material growth environment, and the change of the cavity environment from an atmospheric state to an ultrahigh vacuum state usually needs to be debugged for several weeks or even months to achieve.

[0003] However, in actual use, each substrate needs to be subjected to a vacuum pumping operation in the process of being conveyed to the process cavity, resulting in a long actual vacuum pumping time and low work efficiency, and therefore a vacuum cavity system for MBE process and an operating method thereof are proposed as a further improvement. SUMMARY

[0004] In order to overcome the above-mentioned defects of the prior art, embodiments of the present application provide a vacuum cavity system for MBE process and an operating method thereof to solve the problems raised in the above background.

[0005] To achieve the above-mentioned purpose, the present application provides the following technical scheme: a vacuum cavity system for MBE process, comprising a vacuum cavity system and a sample conveying system; the vacuum cavity system comprises a rapid sample inlet cavity, a pretreatment cavity, a process cavity and an interconnection cavity connected in sequence through a gate valve; The sample conveying system comprises a sample holder placing table, a sample holder grabbing table, a magnetic sample conveying rod, a process cavity sample table and a transfer sample stopping table; The sample holder placing table is fixedly installed at the bottom of the rapid sample inlet cavity, the sample holder grabbing table is fixedly installed at the top of the pretreatment cavity, the magnetic sample conveying rod is fixedly installed at the side of the pretreatment cavity away from the process cavity, the process cavity sample table is fixedly installed at the top of the process cavity, and the transfer sample stopping table is fixedly installed at the bottom of the interconnection cavity; A sample table is placed on the top of the sample holder placing table, and the sample table supports a plurality of substrates stacked at equal intervals in the vertical direction.

[0006] Further, the sample table comprises a bracket bottom plate, a bracket upright plate and a bracket top plate. Square holes are formed in the middle portions of the bracket bottom plate and the bracket top plate, the bracket top plate and the bracket bottom plate are fixedly installed at the top end and the bottom end of the bracket upright plate respectively, a plurality of fixedly spaced bracket inner plates are fixedly installed on the inner wall of the bracket upright plate, and the substrates are placed on the bracket inner plates. A bottom positioning hole is formed in the bracket bottom plate, and a top positioning hole is formed in the bracket top plate.

[0007] Further, the sample holder placing table comprises a sample holder tray, a transfer adapter and a first vertical movement table; The top of the first vertical movement table is fixedly installed at the bottom of the rapid sample feeding cavity, the end of the output shaft of the first vertical movement table located in the rapid sample feeding cavity is fixedly connected with the bottom of the sample holder tray through the transfer adapter, the bracket bottom plate is clamped with the upper surface of the sample holder tray, and the upper surface of the sample holder tray is fixedly installed with a positioning pin inserted into the bottom positioning hole.

[0008] Further, the sample holder grabbing table comprises a transmission connecting plate, a transmission adapter and a second vertical movement table; The bottom of the second vertical movement table is fixedly installed at the top of the pretreatment cavity, the end of the output shaft of the second vertical movement table located in the pretreatment cavity is fixedly connected with the top of the transmission connecting plate through the transmission adapter, the transmission connecting plate passes through the square hole in the middle of the bracket top plate, and four conical seats inserted into the top positioning holes are fixedly installed at the four corners of the upper surface of the transmission connecting plate; The top of the second vertical movement table is fixedly installed with a vacuum external motor, and the output shaft of the vacuum external motor is fixedly connected with the output shaft of the second vertical movement table through a magnetic fluid.

[0009] Further, the magnetic sample transmission rod comprises an electric sample transmission rod and a sample fork holder; One end of the electric sample transmission rod is fixedly installed at one side of the pretreatment cavity away from the process cavity, and the sample fork holder is fixedly installed on the output shaft of the electric sample transmission rod.

[0010] Further, the process cavity sample table comprises an upper rotary shaft adapter, a lower rotary shaft adapter, a patch table and a third vertical movement table; The bottom of the third vertical movement table is fixedly installed at the top of the process cavity, the bottom output shaft of the third vertical movement table located in the process cavity is fixedly connected with the upper rotary shaft adapter, the lower rotary shaft adapter is fixedly installed at the top of the patch table, and the upper rotary shaft adapter is fixedly connected with the lower rotary shaft adapter.

[0011] Further, the transfer sample stopping table comprises a sample stopping table, a sample stopping table adapter and a fourth vertical movement table; The sample stopping table comprises a sample stopping table top plate, a sample stopping table stand plate, a sample stopping table bracket and a sample stopping table bottom plate; The sample stopping table top plate and the sample stopping table bottom plate are respectively fixedly installed at the top and the bottom of the sample stopping table stand plate, the sample stopping table bracket is fixedly installed on the inner wall of the sample stopping table stand plate, the top of the fourth vertical movement table is fixedly installed at the bottom of the interconnection cavity, and the end of the output shaft of the fourth vertical movement table located in the interconnection cavity is fixedly connected with the sample stopping table bottom plate through the sample stopping table adapter.

[0012] Further, the number of the sample station support plates is at least two.

[0013] Further, the number of the bracket inner plates is six.

[0014] A method for operating a vacuum chamber system for MBE process, comprising a vacuum chamber system for MBE process, and the specific operation method comprises the following steps: S1: after the vacuum environment of the rapid sample chamber is broken, the sample table of the stacked substrates is fixed on the sample rack placing table in the rapid sample chamber; S2: after the vacuum condition is reached, the sample rack placing table moves the sample table to the pretreatment chamber, the sample rack grabbing table grabs the sample table, the sample rack placing table returns to the rapid sample chamber, the pretreatment chamber enters a closed state, and then the pretreatment chamber performs degassing pretreatment; S3: the magnetic sample transmission rod moves into the pretreatment chamber, cooperates with the sample rack placing table, and grabs any one substrate on the sample table; S4: after the substrate is grabbed by the magnetic sample transmission rod, the substrate is moved from the pretreatment chamber to the process chamber, the magnetic sample transmission rod cooperates with the sample table of the process chamber, so that the sample table of the process chamber obtains the substrate, the magnetic sample transmission rod returns to the initial position in the pretreatment chamber, the process chamber enters a closed state, and is ready for processing the substrate; S5: after the substrate completes the process, the magnetic sample transmission rod cooperates with the sample table of the process chamber to re-grab the substrate after the process; S6: whether there is other extension equipment for operation is judged: if yes, S7 is entered; if not, S9 is entered; S7: the magnetic sample transmission rod moves the substrate from the process chamber to the interconnection chamber, cooperates with the transfer sample station, so that the transfer sample station obtains the substrate, and the magnetic sample transmission rod returns to the initial position in the pretreatment chamber; S8: the interconnection chamber is connected with other extension equipment and related operations are performed, after the operation is completed, the magnetic sample transmission rod cooperates with the transfer sample station, the magnetic sample transmission rod re-grabs the substrate and moves the substrate from the interconnection chamber back to the pretreatment chamber; then S10 is entered; S9: the magnetic sample transmission rod moves the substrate from the process chamber back to the pretreatment chamber; S10: the magnetic sample transmission rod cooperates with the sample rack placing table to re-place the substrate after the process into the sample table grabbed by the sample rack grabbing table; finally, S1 is returned.

[0015] The technical effects and advantages of the present application are as follows: Compared with the prior art, the process cavity is isolated by setting the interconnected cavities, the vacuum degree change gradient of the cavity during conveying the substrate is reduced, the vacuum time is saved, and the interconnection with other equipment topologies is realized; by setting the conveying sample system, six substrates can be pretreated and degassed at one time, the sample conveying frequency is reduced, the number of vacuum breaking is reduced, and the equipment use efficiency is improved; the whole process of sample conveying and sample conveying is automated, and the risk of human operation is reduced. BRIEF DESCRIPTION OF DRAWINGS

[0016] Figure 1 Figure 1 is a schematic diagram of a vacuum cavity system of the present application.

[0017] Figure 2 Figure 2 is a structural schematic diagram of a sample conveying system of the present application.

[0018] Figure 3 Figure 3 is a structural schematic diagram of a sample stage of the present application.

[0019] Figure 4 Figure 4 is a structural schematic diagram of a sample holder placement table of the present application.

[0020] Figure 5 Figure 5 is a structural schematic diagram of a sample holder grabbing table of the present application.

[0021] Figure 6 Figure 6 is a structural schematic diagram of a magnetic sample conveying rod of the present application.

[0022] Figure 7 Figure 7 is a schematic diagram of the sample holder grabbing table of the present application preparing to grab the sample stage on the sample holder placement table.

[0023] Figure 8 Figure 8 is a schematic diagram of the sample holder grabbing table of the present application having grabbed the sample stage.

[0024] Figure 9 Figure 9 is a schematic diagram of the sample holder fork frame of the present application waiting to grab the substrate on the sample stage.

[0025] Figure 10 Figure 10 is a schematic diagram of the sample holder fork frame of the present application having grabbed the substrate.

[0026] Figure 11 Figure 11 is a structural schematic diagram of a process cavity sample stage of the present application.

[0027] Figure 12 Figure 12 is a structural schematic diagram of a transfer stop sample table of the present application.

[0028] Figure 13 Figure 13 is a structural schematic diagram of a sample holder fork frame and a tab table of the present application.

[0029] Figure 14 Figure 14 is a structural schematic diagram of the stop sample table of the present application grabbing the substrate.

[0030] The reference signs are: 100, vacuum chamber system; 110, fast loading chamber; 120, pretreatment chamber; 130, process chamber; 140, interconnection chamber; 200, sample transfer system; 210, sample holder placement table; 211, sample holder tray; 212, transfer adapter; 213, first vertical movement table; 214, positioning pin; 220, sample holder grabbing table; 221, transmission connecting plate; 222, transmission adapter; 223, second vertical movement table; 224, conical seat; 225, vacuum external motor; 226, magnetic fluid; 230, magnetic force sample transfer rod; 231, electric sample transfer rod; 232, sample fork holder; 240, process chamber sample table; 241, upper rotary shaft adapter; 242, lower rotary shaft adapter; 243, tab table; 244, third vertical movement table; 250, transfer sample stopping table; 251, sample stopping table; 2511, sample stopping table top plate; 2512, sample stopping table vertical plate; 2513, sample stopping table supporting plate; 2514, sample stopping table bottom plate; 252, sample stopping table adapter; 253, fourth vertical movement table; 300, gate valve; 400, sample table; 410, bracket bottom plate; 411, bottom positioning hole; 420, bracket vertical plate; 430, bracket top plate; 431, top positioning hole; 440, square hole; 450, bracket inner plate; 500, substrate. DETAILED DESCRIPTION

[0031] In order to make the objectives, technical solutions and advantages of the present application clearer, the present application will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present application and should not be used to limit the present application.

[0032] As shown in the accompanying drawings Figure 1 , the accompanying drawings Figure 2 , and the accompanying drawings Figure 3 , a vacuum chamber system for MBE process includes a vacuum chamber system 100 and a sample transfer system 200. The vacuum chamber system 100 includes a fast loading chamber 110, a pretreatment chamber 120, a process chamber 130 and an interconnection chamber 140 connected in sequence through a gate valve 300; that is, the vacuum chamber system 100 includes a fast loading chamber system, a pretreatment chamber system, a process chamber system and an interconnection chamber system; the fast loading chamber system mainly consists of the fast loading chamber 110, a fast loading chamber vacuum acquisition system and a vacuum measurement system; the pretreatment chamber system mainly consists of the pretreatment chamber 120, a pretreatment chamber vacuum acquisition system and a vacuum measurement system; the process chamber system mainly consists of the process chamber 130, a process chamber vacuum acquisition system and a vacuum measurement system; the interconnection chamber system mainly consists of the interconnection chamber 140, an interconnection chamber vacuum acquisition system and a vacuum measurement system; and further, the fast loading chamber 110, the pretreatment chamber 120, the process chamber 130 and the interconnection chamber 140 are separated by the gate valve 300.

[0033] The sample transfer system 200 includes: a sample rack placement platform 210, a sample rack gripping platform 220, a magnetic sample transfer rod 230, a process chamber sample stage 240, and a transfer and stopping platform 250; The sample holder placement stage 210 is fixedly installed at the bottom of the rapid sample injection chamber 110, the sample holder gripping stage 220 is fixedly installed at the top of the pretreatment chamber 120, the magnetic sample transfer rod 230 is fixedly installed on the side of the pretreatment chamber 120 away from the process chamber 130, and the process chamber sample stage 240 is fixedly installed at the top of the process chamber 130 so that the process chamber sample stage 240 can hold the substrate 500 to be processed; the transfer stop stage 250 is fixedly installed at the bottom of the interconnection chamber 140 so that the transfer stop stage 250 can hold the substrate 500 after processing, and can also be used to hold the substrate 500 sent from other expansion equipment. A sample stage 400 is placed on top of the sample holder stage 210, which supports multiple substrates 500 stacked at equal intervals in the vertical direction.

[0034] In one embodiment of the sample stage 400: six 2-inch substrates 500 are placed inside the sample stage 400; when the sample stage 400 is placed on the sample holder placement stage 210, the sample stage 400 with six layers of substrates 500 can move as a whole with the sample holder placement stage 210; the sample holder gripping stage 220 grips the sample stage 400 with six layers of substrates 500 from the sample holder placement stage 210 as a whole and rotates it to change its orientation so that the magnetic transfer rod 230 can grip the multiple substrates 500 of the sample stage 400 one by one and send them into the process chamber sample stage 240 of the process chamber 130 for further processing. Since multiple substrates 500 can be processed after a single vacuuming, the work efficiency is improved.

[0035] In a preferred embodiment, as shown in the appendix Figure 3 As shown, the sample stage 400 includes: a bracket base plate 410, a bracket upright plate 420, and a bracket top plate 430; Both the bracket base plate 410 and the bracket top plate 430 have square holes 440 in the middle to facilitate the fixing of the sample rack placement platform 210 and the gripping of the sample rack gripping platform 220. The bracket top plate 430 and the bracket base plate 410 are respectively fixedly installed at the top and bottom of the bracket upright plate 420. Multiple bracket inner plates 450 with fixed intervals are fixedly installed on the inner wall of the bracket upright plate 420. In this embodiment, the bracket upright plate 420 has positioning grooves with fixed intervals for installing the bracket inner plates 450. The bracket upright plate 420 and the bracket inner plates 450 are fixed together by screws. The bracket top plate 430 and the bracket base plate 410 are both fixed to the bracket upright plate 420 by screws.

[0036] The substrate 500 is placed on the inner plate 450 of the bracket; The bracket base plate 410 has a bottom positioning hole 411 for fixing the sample rack placement platform 210; the bracket top plate 430 has a top positioning hole 431 for gripping the sample rack gripping platform 220.

[0037] The sample rack placement stage 210 and the sample rack gripping stage 220 both consist of two parts: a vacuum inner and a vacuum outer part. The vacuum outer part uses the same model of vertical motion stage, which is an existing mature product and will not be described in detail here. The focus is on the vacuum inner part of both. In a preferred embodiment, as shown in the appendix Figure 4 As shown, the sample rack placement stage 210 includes: a sample rack tray 211, a transfer adapter 212, and a first vertical motion stage 213; The top of the first vertical motion stage 213 is fixedly installed at the bottom of the rapid injection chamber 110. The end of the output shaft of the first vertical motion stage 213 located in the rapid injection chamber 110 is fixedly connected to the bottom of the sample holder tray 211 through a transfer adapter 212. For example, the sample holder tray 211 and the transfer adapter 212 are locked together by a threaded connection. The bracket base plate 410 is snapped onto the upper surface of the sample holder tray 211. A positioning pin 214 that is inserted into the bottom positioning hole 411 is fixedly installed on the upper surface of the sample holder tray 211. The positioning pin 214 is locked onto the sample holder tray 211 by a thread. The first vertical motion stage 213 of the sample rack placement stage 210 is located outside the rapid injection chamber 110, while the rest is located inside the rapid injection chamber 110. Thus, the first vertical motion stage 213 drives the sample stage 400 fixed on the sample rack tray 211 by the positioning pin 214 to move to the pretreatment chamber 120. In a preferred embodiment, as shown in the appendix Figure 5 , Figure 7 and Figure 8 As shown, the sample holder gripping stage 220 includes: a transmission connecting plate 221, a transmission adapter 222, and a second vertical motion stage 223; The bottom of the second vertical motion stage 223 is fixedly installed on the top of the pretreatment chamber 120. The end of the output shaft of the second vertical motion stage 223 located in the pretreatment chamber 120 is fixedly connected to the top of the transmission connecting plate 221 through the transmission adapter 222. For example, the transmission connecting plate 221 and the transmission adapter 222 are locked by a threaded connection, and the transmission adapter 222 is locked to the end of the output shaft of the second vertical motion stage 223 by screws. The transmission connecting plate 221 passes through the square hole 440 in the middle of the bracket top plate 430. Conical top seats 224 that are inserted into the top positioning holes 431 are fixedly installed at the four corners of the upper surface of the transmission connecting plate 221. For example, the conical top seats 224 and the transmission connecting plate 221 are locked by a threaded connection. A vacuum external motor 225 is fixedly mounted on the top of the second vertical motion stage 223. The output shaft of the vacuum external motor 225 is fixedly connected to the output shaft of the second vertical motion stage 223 via a magnetic fluid 226. That is, the rotational motion of the output shaft of the vacuum external motor 225 is transmitted to the output shaft of the second vertical motion stage 223 through the magnetic fluid 226, thereby realizing the rotational motion of the output shaft of the second vertical motion stage 223. The second vertical motion stage 223 of the sample holder gripping stage 220 is located outside the pretreatment chamber 120, while the rest of the stage is located within the pretreatment chamber 120. The second vertical motion stage 223 works in conjunction with the vacuum external motor 225 to grip the sample stage 400 fixed on the sample holder placement stage 210. When the pretreatment chamber 120 of the pretreatment chamber system is in a sealed state, it can perform degassing pretreatment on the substrate 500.

[0038] In a preferred embodiment, as shown in the appendix Figure 6 , Figure 9 and Figure 10 As shown, the magnetic sample transfer rod 230 includes: an electric sample transfer rod 231 and a sample support fork 232; One end of the electric sample transfer rod 231 is fixedly installed on the side of the pretreatment chamber 120 away from the process chamber 130, and the sample support fork 232 is fixedly installed on the output shaft of the electric sample transfer rod 231; for example, the sample support fork 232 is locked to the output shaft of the electric sample transfer rod 231 by screws.

[0039] The magnetic sample transfer rod 230 is connected to the pretreatment cavity 120, which can send the substrates 500 on the sample stage 400 one by one into the process cavity sample stage 240 of the process cavity 130.

[0040] The process chamber sample stage 240 and the transfer and stopping sample stage 250 also include two parts: an inner and an outer vacuum section. The vertical motion stage outside the vacuum section uses an existing mature product, which will not be described in detail here. It mainly realizes the lifting and rotating motion of the components inside the vacuum section. The focus is on the vacuum interior of both components. In a preferred embodiment, as shown in the appendix Figure 11 and Figure 13 As shown, the process chamber sample stage 240 includes: an upper rotating shaft adapter 241, a lower rotating shaft adapter 242, a receiving stage 243, and a third vertical motion stage 244; The bottom of the third vertical motion stage 244 is fixedly installed on the top of the process cavity 130. The bottom output shaft of the third vertical motion stage 244 located in the process cavity 130 is fixedly connected to the upper rotary shaft adapter 241. For example, the lower rotary shaft adapter 242 is locked to the bottom output shaft of the third vertical motion stage 244 by screws. The lower rotary shaft adapter 242 is fixedly installed on the top of the receiving stage 243. For example, the receiving stage 243 and the lower rotary shaft adapter 242 are locked by threaded connection. The upper rotary shaft adapter 241 and the lower rotary shaft adapter 242 are fixedly connected. For example, the upper rotary shaft adapter 241 and the lower rotary shaft adapter 242 are locked by threaded connection.

[0041] Among them, the third vertical motion stage 244 of the process cavity sample stage 240 is located outside the process cavity 130, i.e. outside the vacuum, while the rest of the process cavity sample stage 240 is inside the process cavity 130, i.e., the vacuum internal components. In a preferred embodiment, as shown in the appendix Figure 12 and Figure 14 As shown, the transfer and stopping platform 250 includes: a stopping platform 251, a stopping platform adapter 252, and a fourth vertical motion platform 253; The sample stopping platform 251 includes: a sample stopping platform top plate 2511, a sample stopping platform vertical plate 2512, a sample stopping platform support plate 2513, and a sample stopping platform bottom plate 2514; The top plate 2511 and bottom plate 2514 of the sample-stopping stage are respectively fixedly installed on the top and bottom of the upright plate 2512 of the sample-stopping stage. For example, the top plate 2511 and the upright plate 2512 of the sample-stopping stage are locked together by screws. The support plate 2513 of the sample-stopping stage is fixedly installed on the inner wall of the upright plate 2512 of the sample-stopping stage. The top of the fourth vertical motion stage 253 is fixedly installed on the bottom of the interconnection cavity 140. The end of the output shaft of the fourth vertical motion stage 253 located in the interconnection cavity 140 is fixedly connected to the bottom plate 2514 of the sample-stopping stage through the sample-stopping stage adapter 252. For example, the sample-stopping stage adapter 252 is locked to the bottom plate 2514 of the sample-stopping stage by screws. The end of the output shaft of the fourth vertical motion stage 253 is locked to the sample-stopping stage adapter 252 by screws.

[0042] Among them, the fourth vertical motion stage 253 of the transfer and stop stage 250 is located outside the interconnection cavity 140, i.e. outside the vacuum, while the rest of the transfer and stop stage 250 is inside the interconnection cavity 140, i.e., the vacuum internal components. In a preferred embodiment, as shown in the appendix Figure 12 and attached Figure 14 As shown, at least two sample stop trays 2513 are provided; however, only one sample stop tray 2513 is needed during normal use, and the extra one is reserved for convenient sample stop when the interconnection cavity 140 is interconnected with other devices.

[0043] In a preferred embodiment, as shown in the appendixFigure 3 As shown, the number of inner plates 450 in the bracket is set to 6; so as to maximize the loading of substrates 500 according to the existing sample stage 400 volume; thus, after vacuuming, multiple substrates 500 can be processed, improving work efficiency.

[0044] As attached Figures 1-14 As shown, a method for operating a vacuum chamber system for MBE (Metal-Based Exposure) process includes a vacuum chamber system for MBE process, and the specific operation method includes the following steps: S1: After the vacuum environment of the rapid sample injection chamber 110 is broken, open the quick-opening door and fix the sample stage 400 of the stacked substrate 500 on the sample rack placement stage 210 inside the rapid sample injection chamber 110. For example, the sample rack tray 211 of the sample rack placement platform 210 is fixed by inserting the positioning pin 214 into the bottom positioning hole 411 of the sample stage 400. Due to its own weight, the sample stage 400 is placed steadily on the sample rack placement platform 210. S2: After reaching the vacuum condition, automatic sample transfer is performed. The gate valve 300 between the rapid injection chamber 110 and the pretreatment chamber 120 is opened. The sample rack placement stage 210 moves the sample stage 400 to the pretreatment chamber 120. The sample rack gripping stage 220 grips the sample stage 400. The sample rack placement stage 210 returns to the rapid injection chamber 110. The gate valve 300 between the rapid injection chamber 110 and the pretreatment chamber 120 is closed. The pretreatment chamber 120 enters a sealed state. Subsequently, the pretreatment chamber 120 undergoes degassing pretreatment. For example, the first vertical motion stage 213 of the sample rack placement stage 210 drives the sample stage 400 fixed on the sample rack tray 211 to move upward, thereby moving the sample stage 400 to the pretreatment chamber 120; the second vertical motion stage 223 of the sample rack gripping stage 220 drives the transmission connecting plate 221 to move downward, so that the transmission connecting plate 221 passes through the square hole 440 in the middle of the bracket top plate 430 and descends until the top of the conical apex 224 on the transmission connecting plate 221 is lower than the bottom of the bracket bottom plate 410, and then... An external motor 225 drives the transmission connecting plate 221 to rotate 90°. At this time, the cone top seat 224 is aligned with the bottom positioning hole 411 on the bracket base plate 410. Subsequently, as the second vertical motion stage 223 drives the transmission connecting plate 221 to rise, the cone top seat 224 is inserted into the four bottom positioning holes 411 on the bracket base plate 410 and continues to move upward. When the transmission connecting plate 221 is higher than the top of the bracket base plate 410, due to its own weight, the sample stage 400 is hung on the sample holder gripping stage 220, completing the gripping operation.

[0045] S3: After the substrate 500 is degassed, the gate valve 300 between the pretreatment chamber 120 and the process chamber 130 is opened, and the magnetic sample transfer rod 230 moves into the pretreatment chamber 120. The magnetic sample transfer rod 230 cooperates with the sample holder placement stage 210 and grabs any substrate 500 on the sample stage 400. For example, the sample fork 232 of the magnetic sample transfer rod 230 moves into the pretreatment cavity 120 until the pre-reserved groove of the sample fork 232 is concentric with the substrate 500 of the sample stage 400; then the sample holder gripping stage 220 moves downward until the substrate 500 is completely separated from the sample stage 400 and stops; the magnetic sample transfer rod 230 first retracts until the sample fork 232 leaves the front end of the sample stage 400; the sample holder gripping stage 220 moves upward to avoid the direction of movement of the magnetic sample transfer rod 230; the magnetic sample transfer rod 230 completes the operation of gripping the substrate 500. S4: After the magnetic transfer rod 230 picks up the substrate 500, it moves the substrate 500 from the pretreatment cavity 120 to the process cavity 130. The magnetic transfer rod 230 cooperates with the sample stage 240 of the process cavity, so that the sample stage 240 of the process cavity acquires the substrate 500. The magnetic transfer rod 230 retracts to the initial position in the pretreatment cavity 120, and the process cavity 130 enters a sealed state, ready to process the substrate 500. For example, the magnetic transfer rod 230 moves the substrate 500 into the process cavity 130. The upper surface of the groove reserved in the receiving stage 243 of the sample stage 240 of the process cavity is flush with the lower end of the sample support fork 232 of the magnetic transfer rod 230. At this time, the substrate 500 and the groove reserved in the receiving stage 243 are concentric. The third vertical motion stage 244 of the sample stage 240 of the process cavity drives the receiving stage 243 to move upward. When the substrate 500 falls completely into the groove reserved in the receiving stage 243, the magnetic transfer rod 230 retracts to its initial position in the pretreatment cavity 120. The gate valve 300 between the pretreatment cavity 120 and the process cavity 130 is closed, and the sample stage 240 of the process cavity is ready to perform the process. S5: After the substrate 500 completes the process, the gate valve 300 between the pretreatment chamber 120 and the process chamber 130 is opened, the magnetic transfer rod 230 cooperates with the sample stage 240 of the process chamber, and the magnetic transfer rod 230 re-grabs the substrate 500 that has completed the process. For example, after the substrate 500 completes the process, the gate valve 300 between the pretreatment chamber 120 and the process chamber 130 opens, and the sample fork 232 of the magnetic sample transfer rod 230 moves towards the process chamber 130, passes through the gate valve 300, until the substrate 500 and the pre-reserved groove of the receiving stage 243 are in a concentric position. The third vertical motion stage 244 of the sample stage 240 in the process chamber drives the receiving stage 243 to descend until the bottom of the sample fork 232 is flush with the upper surface of the pre-reserved groove of the receiving stage 243. At this time, the substrate 500 falls on the sample fork 232; the magnetic sample transfer rod 230 re-grabs the substrate 500.

[0046] S6: Determine if there are other expansion devices operating: if yes, proceed to S7; otherwise, proceed to S9. S7: The gate valve 300 between the process chamber 130 and the interconnect chamber 140 is opened, and the magnetic transfer rod 230 moves the substrate 500 from the process chamber 130 to the interconnect chamber 140. The magnetic transfer rod 230 cooperates with the transfer station 250 so that the transfer station 250 can acquire the substrate 500. The magnetic transfer rod 230 retracts to its initial position in the pretreatment chamber 120. For example, the fourth vertical motion stage 253 of the transfer station 250 drives the station 251 to the sample receiving position, i.e., the position to acquire the substrate 500; at this time, the upper end of the station 2513 is flush with the lower end of the sample fork 232; the gate valve 300 between the process cavity 130 and the interconnect cavity 140 opens, and the magnetic transfer rod 230 grasps the substrate 500, passes it through the receiving stage 243, and continues to move towards the interconnect cavity 140 until the substrate... The substrate 500 is concentric with the stop plate 2513; the fourth vertical motion stage 253 drives the stop plate 2513 of the stop stage 251 to move upward until the substrate 500 falls into the stop plate 2513; at this time, the magnetic transfer rod 230 retracts to the initial position in the pretreatment chamber 120, the gate valve 300 between the pretreatment chamber 120 and the process chamber 130 opens and closes, and the gate valve 300 between the process chamber 130 and the interconnection chamber 140 closes.

[0047] S8: The interconnect cavity 140 is connected to other expansion devices and related operations are performed. After the operation is completed, the magnetic transfer rod 230 cooperates with the transfer and stop stage 250. The magnetic transfer rod 230 re-grabs the substrate 500 and moves the substrate 500 from the interconnect cavity 140 back to the pretreatment cavity 120; then proceed to S10. S9: The magnetic transfer rod 230 moves the substrate 500 from the process cavity 130 back to the pretreatment cavity 120; S10: The magnetic transfer rod 230 cooperates with the sample holder placement stage 210 to put the completed substrate 500 back into the sample stage 400 held by the sample holder gripping stage 220; finally, it returns to S1.

[0048] After six process steps are completed, the automatic sampling function is manually activated. At this time, the gate valve 300 between the rapid injection chamber 110 and the pretreatment chamber 120 opens, and the sample holder placement stage 210 moves upward into the pretreatment chamber 120. The sample holder gripping stage 220 moves downward to place the sample stage 400 onto the sample holder placement stage 210, then releases its grip and moves upward, while the sample holder placement stage 210 moves downward. Once the sample holder placement stage 210 returns to the rapid injection chamber 110, the gate valve 300 between the rapid injection chamber 110 and the pretreatment chamber 120 closes. At this time, the rapid injection chamber 110 stops evacuating. After the molecular pump connected to the rapid injection chamber 110 stops, the rapid injection chamber 110 is vented. This allows the rapid injection chamber 110 to open quickly, removing the sample stage 400, and the operation is repeated.

[0049] It should be noted that, in this document, relational terms such as "first" and "second" are used only to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such process, method, article, or apparatus.

[0050] Although embodiments of the invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the invention, the scope of which is defined by the appended claims and their equivalents.

Claims

1. A vacuum chamber system for MBE process, characterized in that, It includes a vacuum chamber system (100) and a sample transfer system (200); the vacuum chamber system (100) includes a rapid sample injection chamber (110), a pretreatment chamber (120), a process chamber (130) and an interconnection chamber (140) connected in sequence via a gate valve (300); The sample transfer system (200) includes: a sample rack placement platform (210), a sample rack gripping platform (220), a magnetic sample transfer rod (230), a process chamber sample stage (240), and a transfer and stopping platform (250). The sample rack placement platform (210) is fixedly installed at the bottom of the rapid injection chamber (110), the sample rack gripping platform (220) is fixedly installed at the top of the pretreatment chamber (120), the magnetic transfer rod (230) is fixedly installed on the side of the pretreatment chamber (120) away from the process chamber (130), the process chamber sample stage (240) is fixedly installed at the top of the process chamber (130), and the transfer and stopping platform (250) is fixedly installed at the bottom of the interconnection chamber (140). A sample stage (400) is placed on top of the sample rack placement stage (210).

2. The vacuum chamber system for MBE process according to claim 1, characterized in that: The sample stage (400) includes: a bracket base plate (410), a bracket upright plate (420), and a bracket top plate (430). The bracket bottom plate (410) and bracket top plate (430) are both provided with square holes (440) in the middle. The bracket top plate (430) and bracket bottom plate (410) are respectively fixedly installed at the top and bottom of the bracket upright plate (420). Multiple bracket inner plates (450) with fixed intervals are fixedly installed on the inner wall of the bracket upright plate (420). The bracket base plate (410) has a bottom positioning hole (411), and the bracket top plate (430) has a top positioning hole (431).

3. A vacuum chamber system for MBE process according to claim 2, characterized in that: The sample rack placement stage (210) includes: a sample rack tray (211), a transfer connector (212), and a first vertical motion stage (213). The top of the first vertical motion stage (213) is fixedly installed at the bottom of the rapid injection chamber (110). The end of the output shaft of the first vertical motion stage (213) located in the rapid injection chamber (110) is fixedly connected to the bottom of the sample holder tray (211) through the intermediate transfer adapter (212). The tray base plate (410) is snapped into the upper surface of the sample holder tray (211). The upper surface of the sample holder tray (211) is fixedly installed with a positioning pin (214) that is inserted into the bottom positioning hole (411).

4. A vacuum chamber system for MBE process according to claim 2, characterized in that: The sample holder gripping stage (220) includes: a transmission connecting plate (221), a transmission adapter (222), and a second vertical motion stage (223). The bottom of the second vertical motion stage (223) is fixedly installed on the top of the pretreatment chamber (120). The end of the output shaft of the second vertical motion stage (223) located in the pretreatment chamber (120) is fixedly connected to the top of the transmission connecting plate (221) through the transmission adapter (222). The transmission connecting plate (221) passes through the square hole (440) in the middle of the bracket top plate (430). Conical top seats (224) that are inserted into the top positioning hole (431) are fixedly installed at the four corners of the upper surface of the transmission connecting plate (221). A vacuum external motor (225) is fixedly installed on the top of the second vertical motion stage (223), and the output shaft of the vacuum external motor (225) is fixedly connected to the output shaft of the second vertical motion stage (223) through a magnetic fluid (226).

5. A vacuum chamber system for MBE process according to claim 1, characterized in that: The magnetic transfer rod (230) includes: an electric transfer rod (231) and a sample support fork (232); One end of the electric sample transfer rod (231) is fixedly installed on the side of the pretreatment chamber (120) away from the process chamber (130), and the sample support fork (232) is fixedly installed on the output shaft of the electric sample transfer rod (231).

6. A vacuum chamber system for MBE process according to claim 1, characterized in that: The process chamber sample stage (240) includes: an upper rotating shaft adapter (241), a lower rotating shaft adapter (242), a receiving stage (243), and a third vertical motion stage (244). The bottom of the third vertical motion stage (244) is fixedly installed on the top of the process cavity (130). The bottom output shaft of the third vertical motion stage (244) located in the process cavity (130) is fixedly connected to the upper rotary shaft adapter (241). The lower rotary shaft adapter (242) is fixedly installed on the top of the receiving stage (243). The upper rotary shaft adapter (241) is fixedly connected to the lower rotary shaft adapter (242).

7. A vacuum chamber system for MBE process according to claim 1, characterized in that: The transfer station (250) includes: a station (251), a station adapter (252), and a fourth vertical motion stage (253). The sample stopping platform (251) includes: a top plate (2511), a vertical plate (2512), a support plate (2513), and a bottom plate (2514). The top plate (2511) and bottom plate (2514) of the sample stopping platform are respectively fixedly installed on the top and bottom of the upright plate (2512) of the sample stopping platform, and the support plate (2513) of the sample stopping platform is fixedly installed on the inner wall of the upright plate (2512) of the sample stopping platform; the top of the fourth vertical motion stage (253) is fixedly installed on the bottom of the interconnection cavity (140), and the end of the output shaft of the fourth vertical motion stage (253) located in the interconnection cavity (140) is fixedly connected to the bottom plate (2514) of the sample stopping platform through the sample stopping platform adapter (252).

8. A vacuum chamber system for MBE process according to claim 7, characterized in that: The number of sample trays (2513) is at least two.

9. A vacuum chamber system for MBE process according to claim 2, characterized in that: The number of inner plates (450) of the bracket is set to 6.

10. A method for operating a vacuum chamber system for MBE process, comprising the vacuum chamber system for MBE process as described in any one of claims 1-9, characterized in that: The specific operating method includes the following steps: S1: After the vacuum environment of the rapid injection chamber (110) is broken, the sample stage (400) of the stacked substrate (500) is fixed on the sample rack placement stage (210) inside the rapid injection chamber (110); S2: After the vacuum condition is reached, the sample rack placement stage (210) moves the sample stage (400) to the pretreatment chamber (120), the sample rack gripping stage (220) grips the sample stage (400), the sample rack placement stage (210) returns to the rapid injection chamber (110), the pretreatment chamber (120) enters a sealed state, and then the pretreatment chamber (120) performs degassing pretreatment; S3: The magnetic transfer rod (230) moves into the pretreatment cavity (120), and the magnetic transfer rod (230) cooperates with the sample holder placement stage (210). The magnetic transfer rod (230) grabs any substrate (500) on the sample stage (400). S4: After the magnetic transfer rod (230) picks up the substrate (500), it moves the substrate (500) from the pretreatment cavity (120) to the process cavity (130). The magnetic transfer rod (230) cooperates with the sample stage (240) of the process cavity, so that the sample stage (240) of the process cavity acquires the substrate (500). The magnetic transfer rod (230) retracts to the initial position in the pretreatment cavity (120), and the process cavity (130) enters a sealed state, ready to process the substrate (500). S5: After the substrate (500) completes the process, the magnetic transfer rod (230) cooperates with the sample stage (240) of the process cavity to re-grab the substrate (500) that has completed the process. S6: Determine if there are other expansion devices operating: if yes, proceed to S7; otherwise, proceed to S9. S7: The magnetic transfer rod (230) moves the substrate (500) from the process cavity (130) to the interconnect cavity (140). The magnetic transfer rod (230) cooperates with the transfer station (250) so that the transfer station (250) acquires the substrate (500). The magnetic transfer rod (230) retracts to the initial position in the pretreatment cavity (120). S8: The interconnect cavity (140) is connected to other expansion equipment and related operations are performed. After the operation is completed, the magnetic transfer rod (230) cooperates with the transfer station (250) to re-grab the substrate (500) and move the substrate (500) from the interconnect cavity (140) back to the pretreatment cavity (120); then proceed to S10; S9: The magnetic transfer rod (230) moves the substrate (500) from the process cavity (130) back to the pretreatment cavity (120). S10: The magnetic transfer rod (230) cooperates with the sample holder placement stage (210) to put the completed substrate (500) back into the sample stage (400) held by the sample holder gripping stage (220); finally, it returns to S1.

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