Irradiation equipment, application of irradiation equipment and control method of irradiation equipment

Abstract

The invention relates to the technical field of irradiation processing, and provides irradiation equipment, application of the irradiation equipment and a control method of the irradiation equipment, the irradiation equipment is used for processing diamond, and the irradiation equipment comprises an irradiation device, a clamping device and a cooling liquid circulating device. The irradiation device is used for generating a high-energy particle beam; an irradiation area is formed in the clamping device, the clamping device is provided with a plurality of clamping grooves which are formed in the irradiation area and open towards the irradiation device, at least one diamond is placed in each clamping groove, and a liquid cooling flow channel is formed in the clamping device; and the cooling liquid circulating device is communicated with the liquid cooling flow channel. According to the irradiation equipment provided by the invention, the production efficiency of diamond irradiation processing can be improved.

Description

Technical Field

[0001] This application relates to the field of irradiation processing technology, and in particular to an irradiation device, the application of the irradiation device, and a method for controlling the irradiation device. Background Technology

[0002] Diamond, as an ultra-wide bandgap semiconductor material, exhibits enormous application potential in numerous cutting-edge technological fields due to its outstanding physical and chemical properties, such as extremely high thermal conductivity, wide bandgap, high carrier mobility, excellent chemical stability, and biocompatibility. For example, in the field of quantum information technology, nitrogen-vacancy (NV) centers in diamond, as high-performance solid-state qubits, are widely used in quantum computing, quantum sensing, and quantum communication. The preparation of NV centers typically involves irradiating the diamond lattice with high-energy particles (such as electrons, protons, and ions) to generate vacancies, followed by a thermal annealing process to combine the vacancies with the nitrogen atoms inherent in the diamond.

[0003] Furthermore, in the field of power electronics, diamond is considered the ultimate material for manufacturing next-generation high-power, high-frequency, high-voltage-resistant, and radiation-resistant electronic devices. Irradiation technology for p-type or n-type doping of diamond is a key step in constructing diamond-based diodes, transistors, and other components.

[0004] In related technologies, there are two shortcomings in irradiating diamonds. First, only a single sample can be processed at a time, resulting in extremely low production efficiency and failing to meet the cost and capacity requirements of industrialization. Second, the cooling method used for diamonds is simple passive cooling, which is insufficient for high-throughput, high-power irradiation and makes it difficult to ensure the temperature stability of the diamonds throughout the irradiation process. Summary of the Invention

[0005] This application provides an irradiation device, its application, and a control method for the irradiation device, which can improve the production efficiency and heat dissipation stability of diamond irradiation processing.

[0006] The technical solution of this application embodiment is implemented as follows: This application provides an irradiation device for irradiating diamonds, the irradiation device comprising: Irradiation device used to generate high-energy particle beams; A clamping device is provided, forming an irradiation area. The clamping device has a plurality of clamping slots disposed in the irradiation area and opening toward the irradiation device. At least one diamond is placed in each clamping slot. A liquid cooling channel is formed inside the clamping device. A coolant circulation device is connected to the liquid cooling channel.

[0007] In one embodiment, the clamping device includes: The platform body has the liquid cooling channel formed inside it, and the irradiation area is formed on the surface of the platform body; Multiple clamping fixtures and multiple clamping devices are spaced apart within the irradiation area. The clamping fixtures are formed with clamping grooves that abut against the outer wall of the diamond.

[0008] In one embodiment, a thermally conductive material is coated between the clamping fixture and the platform body; and / or, The platform body is made of a metallic material with a thermal conductivity greater than 200 W / (m·K); and / or, The clamping fixture has a through-hole communicating with the clamping slot, through which the diamond contacts the platform body, wherein the size of the diamond is larger than the size of the opening but smaller than the size of the through-hole; and / or, The irradiation device is an electron accelerator or an ion implanter.

[0009] In one embodiment, the liquid cooling channel has a continuously extending, winding structure.

[0010] In one embodiment, the liquid cooling channel includes at least two straight slots and at least one connecting slot, the at least two straight slots are arranged at intervals along a first direction, and the connecting slot connects two adjacent straight slots, wherein the first direction intersects the particle beam direction.

[0011] In one embodiment, the clamping device includes an inlet and an outlet communicating with the liquid cooling channel, and the coolant circulation device includes: The liquid storage tank is connected to the inlet and the outlet via a pipe; A coolant pump is provided, with a pipe located between the reservoir and the inlet or between the reservoir and the outlet; A refrigeration unit is installed in the pipeline between the liquid storage tank and the outlet.

[0012] In one embodiment, the cooling circulation device includes a temperature sensor and a controller. The controller is communicatively connected to both the temperature sensor and the refrigerator. The temperature sensor is used to detect the temperature of the irradiated area. The controller is used to control the cooling power of the refrigerator and / or the flow rate of the coolant pump based on the temperature measured by the temperature sensor, so as to regulate the temperature of the irradiated area.

[0013] In one embodiment, the irradiation device includes a plurality of dose detectors, which are spaced apart on the irradiation area to acquire a dose distribution map of the irradiation area.

[0014] Another aspect of this application provides an application of an irradiation device, which is used to irradiate the diamond in any of the above embodiments, so that the irradiated diamond can be used to manufacture quantum sensing materials for measuring magnetic fields.

[0015] In another aspect, embodiments of this application provide a method for controlling an irradiation device, including: Multiple diamonds are clamped in multiple clamping slots; Before irradiation processing, the irradiation area is dose-calibrated and the preset irradiation time is determined; Start the coolant circulation system and begin irradiation processing; The irradiation process is completed after the preset irradiation time has been reached.

[0016] The irradiation equipment, its application, and control method provided in this application, by forming multiple clamping slots within the irradiation area of ​​the clamping device, with at least one diamond placed in each slot, allows the high-energy particle beam generated by the irradiation equipment to simultaneously irradiate the diamonds in multiple slots. This significantly shortens the diamond production cycle, thereby reducing unit costs and enabling large-scale production of diamond materials. Furthermore, by forming a liquid-cooling channel within the clamping device and connecting it to a coolant circulation system, the coolant in the liquid-cooling channel can circulate and be renewed. This allows for rapid and efficient heat dissipation from the irradiated diamond, stabilizing its temperature, reducing the risk of graphitization, and ensuring the crystal quality and performance of the diamond material. Attached Figure Description

[0017] Figure 1 This is a schematic diagram of the structure of an irradiation device provided in an embodiment of this application, wherein the coolant circulation device is not shown; Figure 2 This is a schematic diagram of the clamping device provided in another embodiment of this application; Figure 3 A partial structural schematic diagram of an irradiation device provided in another embodiment of this application; Figure 4 for Figure 3 A cross-sectional view along the AA direction; Figure 5 for Figure 3 A cross-sectional view along the BB direction; Figure 6A partial cross-sectional schematic diagram of the diamond, platform body, and substrate provided for another embodiment of this application; Figure 7 A flowchart illustrating a control method for an irradiation device according to another embodiment of this application; Figure 8 This application provides a flowchart of the diamond irradiation process in another embodiment.

[0018] Explanation of reference numerals in the attached figures 100. Irradiation equipment; 1. Irradiation device; 2. Clamping device; 2a. Irradiation area; 2b. Clamping groove; 2c. Opening; 2d. Liquid cooling channel; 2d1. Straight groove; 2d2. Connecting groove; 2e. Through port; 2f. Inlet; 2h. Outlet; 21. Platform body; 22. Clamping fixture; 221. Substrate; 222. Positioning component; 200. Diamond. Detailed Implementation

[0019] To make the objectives, technical solutions, and advantages of this application clearer, the application will be further described in detail below with reference to the accompanying drawings. The described embodiments should not be regarded as limitations on this application. All other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0020] In the following description, references are made to “some embodiments,” which describe a subset of all possible embodiments. However, it is understood that “some embodiments” may be the same subset or different subsets of all possible embodiments and may be combined with each other without conflict.

[0021] In the following description, the terms "first, second, third" are used merely to distinguish similar objects and do not represent a specific ordering of objects. It is understood that "first, second, third" may be interchanged in a specific order or sequence where permitted, so that the embodiments of this application described herein can be implemented in an order other than that illustrated or described herein.

[0022] Temperature rise is a critical issue during diamond irradiation processing. This is because high-energy particle beams bombard diamond, depositing a significant amount of energy within the material, causing a rapid temperature increase. At temperatures above 600-700°C and in non-vacuum environments, diamond undergoes a phase transition, transforming from an sp3 hybrid diamond structure to an sp2 hybrid graphite structure—a process known as graphitization. Since graphitization is irreversible, it severely compromises the crystal quality and optical and electrical properties of diamond, leading to device failure or degraded qubit performance.

[0023] In view of this, one embodiment of this application provides an irradiation device 100, please refer to... Figures 1 to 6 The irradiation device 100 includes an irradiation unit 1, a clamping device 2, and a coolant circulation device (not shown in the figure). The irradiation unit 1 is used to generate a high-energy particle beam. The clamping device 2 forms an irradiation area 2a and has multiple clamping slots 2b disposed within the irradiation area 2a and facing the opening 2c of the irradiation unit 1. At least one diamond 200 is placed in each clamping slot 2b, and a liquid cooling channel 2d is formed within the clamping device 2. The coolant circulation device is connected to the liquid cooling channel 2d.

[0024] Irradiation device 1 refers to a device capable of generating and emitting high-energy particle beams for irradiating diamond 200.

[0025] It should be noted that the irradiation equipment 100 provided in this application is not limited to processing diamond 200, but can also process other semiconductor materials.

[0026] Clamping device 2 refers to the device that can clamp diamond 200 so that the high-energy particle beam can stably irradiate diamond 200.

[0027] The liquid cooling channel 2d refers to the channel through which the coolant flows. Its cross-sectional shape can be circular, rectangular, or elliptical, etc. The flow of coolant can remove the heat generated during the irradiation process of diamond 200.

[0028] The liquid cooling channel 2d can be realized inside the clamping device 2 by machining or brazing.

[0029] A coolant circulation device is a device that can continuously replace the coolant within a 2d liquid cooling channel.

[0030] Irradiation area 2a refers to the area covered by the high-energy particle beam generated by irradiation device 1 on clamping device 2.

[0031] The irradiation equipment 100 provided in this application forms multiple clamping slots 2b within the irradiation area 2a of the clamping device 2, with at least one diamond 200 placed in each slot 2b. This allows the high-energy particle beam generated by the irradiation device 1 to simultaneously irradiate the diamonds 200 in multiple slots 2b, significantly shortening the production cycle of the diamonds 200, thereby reducing unit costs and enabling large-scale production of diamond 200 materials. By forming a liquid cooling channel within the clamping device 2 and connecting it to a coolant circulation device, the coolant in the liquid cooling channel 2d can circulate and be renewed. This allows for rapid and efficient heat dissipation from the irradiated diamonds 200, stabilizing the temperature of the diamonds 200, reducing the risk of graphitization, and ensuring the crystal quality and performance of the diamond 200 material.

[0032] In one embodiment, please refer to Figures 2 to 6 The clamping device 2 includes a platform body 21 and multiple clamping fixtures 22. A liquid cooling channel 2d is formed inside the platform body 21, and an irradiation area 2a is formed on the surface of the platform body 21. Multiple clamping devices 2 are spaced apart in the irradiation area 2a, and the clamping fixtures 22 are formed with clamping grooves 2b, which abut against the outer wall of the diamond 200.

[0033] The shape of the platform body 21 is not limited; for example, it can be a cube-shaped box structure of 200 mm × 200 mm × 30 mm.

[0034] The structure of the clamping fixture 22 is not limited. For example, it can be a frame structure so that it can only abut against the outer wall of the diamond 200 and expose the main area of ​​the diamond 200, i.e. the surface to be irradiated, as much as possible, thereby reducing the obstruction of the incident particle beam.

[0035] For example, the clamping fixture 22 can be made of stainless steel or the same material as the platform body 21.

[0036] For example, the number of clamping fixtures 22 can be forty, which can be divided into two groups of twenty each to form a 2×20 array. The clamping fixtures 22 in each group can be spaced apart along the length of the platform body 21, and the two groups can be spaced apart along the width of the platform component.

[0037] Here, by setting up a platform body 21 and multiple clamping fixtures 22, each clamping fixture 22 has a clamping groove 2b. When the diamond 200 is located in the clamping groove 2b, the groove wall of the clamping groove 2b abuts against the outer wall of the diamond 200. In this way, on the one hand, the clamping stability of the diamond 200 can be improved, and the situation where the surface to be irradiated is changed due to being blown by the heat dissipation system of the irradiation device 1 during the irradiation process can be avoided. On the other hand, by clamping the outer wall of the diamond 200, the obstruction of the surface to be irradiated of the diamond 200 can be reduced, thereby improving the irradiation processing quality of the diamond 200.

[0038] In one exemplary embodiment, Figure 1 In this context, R1 can be the thickness direction of the platform body 21, R2 can be the width direction of the platform body 21, and R3 can be the length direction of the platform body 21.

[0039] In one embodiment, a thermally conductive material is coated between the clamping fixture 22 and the platform body 21.

[0040] For example, the thermally conductive material can be thermally conductive silicone grease.

[0041] This reduces the contact thermal resistance between the clamping fixture 22 and the platform body 21, ensuring that heat can be efficiently transferred from the diamond 200 to the platform body 21, thus improving the heat dissipation effect.

[0042] In one embodiment, the platform body 21 is made of a metal material with a thermal conductivity greater than 200 W / (m·K).

[0043] For example, the material of the platform body 21 can be oxygen-free copper, dispersion-strengthened copper, or thermally conductive aluminum, etc.

[0044] In this way, the diamond 200 can be efficiently exchanged with the coolant in the liquid cooling channel 2d, improving the heat dissipation effect of the diamond 200 and reducing graphitization.

[0045] In one embodiment, please refer to Figure 4 and Figure 6 The clamping fixture 22 has a through-hole 2e that communicates with the clamping groove 2b. The diamond 200 contacts the platform body 21 through the through-hole 2e. The size of the diamond 200 is larger than the size of the opening 2c and smaller than the size of the through-hole 2e.

[0046] For example, diamond 200 can be a square sheet structure of 3 mm × 3 mm × 0.5 mm, the through-hole 2e can be a square with a size larger than diamond 200, and the opening 2c can be a square with a size smaller than diamond 200. That is, the diameter of the clamping groove 2b gradually decreases along the direction of the particle beam from the through-hole 2e to the opening 2c.

[0047] For example, the clamping fixture 22 includes a substrate 221 and a plurality of positioning members 222. The substrate 221 is disposed through both ends along the direction of movement of the particle beam, with one end having an opening 2c facing the irradiation device 1 and the other end having a through opening 2e, so that the substrate 221 is generally in the shape of a "U". A plurality of positioning holes are formed on the substrate 221, and the positioning members 222 can be screws, which pass through the positioning holes and are fixed to the platform body 21.

[0048] When installing the diamond 200, it can be first inserted into the clamping slot 2b through the larger diameter through-hole 2e. Finally, the clamping fixture 22 is placed on the platform body 21. Since the diameter of the upper opening 2c is smaller than the size of the diamond 200, the diamond 200 cannot pass through the opening 2c, and it cannot pass through the bottom due to the obstruction of the platform body 21. This allows the diamond 200 to be fixed well in the clamping slot 2b, and part of it can contact the platform body 21 through the through-hole 2e. In this way, the diamond 200 can be clamped relatively quickly and stably, and the heat dissipation effect can be further improved by allowing the diamond 200 to directly contact the platform body 21.

[0049] In one embodiment, please refer to Figure 2 The liquid cooling channel 2d has a continuously extending, winding structure.

[0050] For example, the shape of the liquid cooling channel 2d can be an S-shaped, spiral, or grid-like meandering flow path.

[0051] Here, by designing the liquid cooling channel 2d as a continuously extending curved structure, the heat exchange area can be increased and the residence time of the coolant in the platform body 21 can be extended to maximize the heat exchange efficiency and improve the temperature uniformity of the platform body 21 to a certain extent, thus ensuring heat dissipation stability.

[0052] In one embodiment, please refer to Figure 2 The liquid cooling channel 2d includes at least two straight grooves 2d1 and at least one connecting groove 2d2. The at least two straight grooves 2d1 are arranged at intervals along a first direction, and the connecting groove 2d2 connects two adjacent straight grooves 2d1. The first direction intersects with the particle beam direction.

[0053] For example, the first direction can be perpendicular to the particle beam direction. For instance, the particle beam can be the thickness direction of the platform body 21, the first direction can be the width direction of the platform body 21, and the straight groove 2d1 can extend along the length direction of the platform body 21.

[0054] For example, there can be two straight grooves 2d1 and one connecting groove 2d2. The two straight grooves 2d1 are arranged at intervals along the first direction, and the connecting groove 2d2 connects the two straight grooves 2d1 along the first direction, so that the liquid cooling channel 2d is approximately "S" shaped. The connecting groove 2d2 and the straight groove 2d1 can be connected at right angles, or they can be connected as shown in the figure. Figure 2 The rounded corners shown reduce stress concentration points and increase strength.

[0055] In this way, by arranging at least two straight slots 2d1 and at least one connecting slot 2d2, with the at least two straight slots 2d1 spaced apart along the first direction, the heat dissipation stability of the diamond 200 can be improved.

[0056] In one embodiment, please refer to Figure 2 The clamping device 2 includes an inlet 2f and an outlet 2h connected to the liquid cooling channel 2d. The coolant circulation device includes a storage tank, a coolant pump, and a chiller. The storage tank is connected to the inlet 2f and the outlet 2h via a pipe. The coolant pump is installed in a pipe located between the storage tank and the inlet 2f or between the storage tank and the outlet 2h. The chiller is installed in a pipe between the storage tank and the outlet 2h.

[0057] For example, deionized water at 5°C can be pumped into the liquid cooling channel 2d through inlet 2f. As the cooling water flows in the liquid cooling channel 2d, after absorbing the heat conducted from the diamond 200 by the platform body 21, the temperature of the cooling water will rise. Then it will flow out from outlet 2h, and after being cooled by the refrigerator, it will flow back to the storage tank. Then it will be pumped into the liquid cooling channel 2d from inlet 2f by the coolant pump, forming a stable closed loop.

[0058] Here, a stable heat dissipation closed loop can be formed through the liquid storage tank, coolant pump and refrigeration unit, which can quickly and efficiently conduct away the heat of diamond 200. Even under high power irradiation conditions, the temperature of diamond 200 can be controlled, reducing the risk of graphitization.

[0059] In one embodiment, the cooling circulation device includes a temperature sensor and a controller. The controller is communicatively connected to both the temperature sensor and the refrigerator. The temperature sensor is used to detect the temperature of the irradiated area 2a, and the controller is used to control the cooling power of the refrigerator and / or the flow rate of the coolant pump based on the temperature measured by the temperature sensor, so as to regulate the temperature of the irradiated area 2a.

[0060] For example, the temperature sensor can be a PT100 resistance temperature detector (RTD). There can be one or more temperature sensors, which can be positioned within the platform body 21 near the irradiation area 2a for real-time monitoring of the temperature of the platform body 21. The controller can be integrated into the chiller or a separate control unit.

[0061] For example, after the controller receives real-time temperature data from the temperature sensor, it can control the temperature of the irradiation area 2a within the range of 25℃ ± 0.5℃ by controlling the power of the refrigerator and / or the flow rate of the coolant pump.

[0062] The controller can be adjusted using PID (proportional-integral-derivative).

[0063] Here, by setting a temperature sensor and controller, the power of the refrigerator and / or the flow rate of the coolant pump can be adjusted based on the temperature of the irradiation area 2a, so that the temperature of the irradiation area 2a is maintained within a preset range, realizing closed-loop precise control of the temperature of the irradiation area 2a. Even under high-power irradiation conditions, the temperature of diamond 200 can be precisely controlled within a safe threshold, such as room temperature to 200°C, which can fundamentally eliminate the risk of graphitization of diamond 200 and ensure the crystal processing quality and performance of diamond 200.

[0064] In one embodiment, the irradiation device 100 includes a plurality of dose detectors, which are spaced apart on the irradiation area 2a to acquire a dose distribution map of the irradiation area 2a.

[0065] For example, before installing the diamond 200, several representative locations such as the center, edge, and corner can be selected within the irradiation area 2a to install dose detectors. Then, the platform body 21 is sent into the irradiation position of the irradiation device 1. Initially, a low and stable particle beam is used for short-term irradiation. By reading the dose information from the dose detectors, a dose distribution map within the irradiation area 2a is obtained. Based on the dose distribution map, the accurate irradiation time required for the diamond 200 at each location to reach the target total dose can be precisely calculated, or the beam parameters of the irradiation device 1 can be optimized, thereby ensuring the consistency of batch processing.

[0066] Here, by setting multiple dose detectors on the irradiation area 2a to obtain a dose distribution map, the irradiation dose can be accurately calibrated and its spatial distribution measured. This eliminates the errors of traditional estimation methods and ensures that each diamond 200 receives an accurate irradiation dose, thereby ensuring high consistency and repeatability of the performance of batch products.

[0067] In one embodiment, the dose detector is a Faraday cup.

[0068] Here, the Faraday cup is used as a dose detector. On the one hand, it can directly and absolutely measure the total charge of the particles, reducing the need for intermediate conversion processes and improving the accuracy and precision of the measurement. On the other hand, the response of the Faraday cup is almost independent of the energy of the incident charged particles within a certain energy range and is not sensitive to the type of particles.

[0069] In one embodiment, the dose detector is a fluorescent sheet.

[0070] Here, a fluorescent sheet is used as a dose detector, which has high sensitivity and measurement efficiency.

[0071] In one embodiment, the dose detector is a dose detector thin film.

[0072] Here, a thin film dose detector is used as the dose detector, which has high resolution and can withstand extreme doses.

[0073] In one embodiment, the irradiation device 1 is an electron accelerator.

[0074] Here, an electron accelerator is used as the irradiation device 1. On the one hand, the electron accelerator generates a wide range of electron energies, which can be precisely adjusted according to the processing requirements of diamond 200, and is suitable for modification or coloring treatments of different depths. On the other hand, the electron beam generated by the electron accelerator has a fast irradiation speed, simple process, and does not produce chemical residues or radioactive waste, which meets environmental protection requirements. Furthermore, the electron accelerator can generate a deep-penetrating electron beam, which is suitable for uniform irradiation of thick diamond 200 materials.

[0075] In one embodiment, the irradiation device 1 is an ion implanter.

[0076] Here, an ion implanter is used as the irradiation device 1. On the one hand, it can achieve atomic-level precision in impurity doping and defect introduction, with a dose control accuracy of ±1% and an energy range covering keV to MeV. This allows for precise control of the NV center concentration or electrical properties of diamond 200. On the other hand, ion implantation can be performed at room temperature, avoiding damage to the diamond 200 lattice caused by high-temperature treatment, making it suitable for modifying heat-sensitive diamond 200 devices.

[0077] For example, in one embodiment, the irradiation device 100 includes a movable base, which can be moved by a slide rail or roller, etc. During irradiation processing, the clamping device 2 can be placed on the base and then moved to the irradiation position; after the irradiation processing is completed, the base can be moved and the clamping device 2 can be moved away from the irradiation position.

[0078] Another aspect of this application provides an application of an irradiation device, including: irradiating diamond with the irradiation device in any of the above embodiments so that the irradiated diamond can be used to manufacture quantum sensing materials for measuring magnetic fields.

[0079] For example, the quantum sensing material can be an NV color center.

[0080] Here, by utilizing the irradiation equipment provided in this application on diamond, the irradiated diamond can be used to manufacture quantum sensing materials, thereby improving the accuracy and operational stability of magnetic field measurements.

[0081] In another aspect, this application provides a method for controlling an irradiation device. Please refer to [link to relevant documentation]. Figure 7 The control methods include: S1. Clamp multiple diamonds into multiple clamping slots; S2. Before irradiation processing, the dose of the irradiated area is calibrated and the preset irradiation time is determined; S3. Start the coolant circulation system and begin irradiation processing; S4. After the irradiation processing time reaches the preset irradiation time, the irradiation processing is completed.

[0082] For example, please refer to Figure 8 This application provides an operational procedure for diamond irradiation processing based on the above control scheme, including: 1. Sample loading: The operator installs forty diamond 200 pieces into the clamping fixture 22 in sequence and fixes them to the platform body 21 with screws.

[0083] 2. Dose Calibration and Evaluation of Preset Irradiation Time: Before installing the diamond 200, select several representative locations (such as the center, edge, and corner) within the irradiation area 2a of the platform body 21 and install miniature Faraday cups or dosing plates. Position the platform body 21 at the irradiation location and irradiate for a short time using a low and stable beam. By reading the current of the Faraday cup or analyzing the color development depth of the dosing plate, obtain the dose distribution map within the irradiation area 2a. Based on the dose distribution map, the preset irradiation time required for the diamond 200 at each location to reach the target total dose can be accurately calculated.

[0084] 3. System preparation - coolant circulation device: Connect the loaded platform body 21 to the coolant circulation device pipeline, set the target temperature to 25℃, and wait for the temperature of the irradiated area 2a on the platform body 21 to stabilize.

[0085] 4. Irradiation Processing: Turn on the electron accelerator and set the energy, beam intensity, and preset irradiation time calculated based on the calibration results. The electron beam uniformly bombards the irradiation area 2a to simultaneously irradiate forty diamond 200 sheets. During this process, the coolant circulation device operates continuously to ensure that the temperature of all diamond 200 sheets does not rise significantly due to irradiation heat generation, thus preventing graphitization.

[0086] 5. Processing complete: After the preset irradiation time is reached, turn off the accelerator. After the clamping device 2 cools down, remove the clamping fixture 22 and unload all the irradiated diamonds 200.

[0087] The control method for the irradiation equipment provided in this embodiment enables irradiation tasks that originally required multiple steps to be completed in one go. Furthermore, due to precise temperature control and dose calibration, the processing quality of all diamond 200 diamonds is highly guaranteed.

[0088] The above description is merely an embodiment of this application and is not intended to limit the scope of protection of this application. Any modifications, equivalent substitutions, and improvements made within the spirit and scope of this application are included within the scope of protection of this application.

Claims

1. An irradiation apparatus for irradiation processing of a diamond, characterized by, The irradiation device comprises: an irradiation device for generating a high-energy particle beam; a clamping device formed with an irradiation area, the clamping device having a plurality of clamping slots arranged in the irradiation area and open towards the irradiation device, at least one diamond being placed in each clamping slot, the clamping device being formed with a liquid cooling channel; a cooling liquid circulating device in communication with the liquid cooling channel.

2. The irradiation apparatus according to claim 1, characterized in that, The clamping device comprises: a platform body formed with the liquid cooling channel, a surface of the platform body being formed with the irradiation area; a plurality of clamping tools arranged in the irradiation area, the clamping tools being formed with the clamping slots, the clamping slots being in abutment with the outer wall of the diamond.

3. The irradiation apparatus of claim 2, wherein The clamping tool and the platform body are coated with a heat-conducting material; and / or, The platform body is made of a metal material with a thermal conductivity greater than 200 W / (m·K); and / or, The clamping tool is formed with a through hole in communication with the clamping slot, the diamond being in contact with the platform body through the through hole, wherein the size of the diamond is greater than the size of the opening and less than the size of the through hole; and / or, The irradiation device is an electron accelerator or an ion implanter.

4. The irradiation apparatus of claim 1, wherein The liquid cooling channel has a continuously extending curved structure.

5. The irradiation apparatus of claim 4, wherein The liquid cooling channel comprises at least two straight slots and at least one connecting slot, the at least two straight slots being arranged in a first direction, the connecting slot being in communication with two adjacent straight slots, wherein the first direction intersects the direction of the particle beam.

6. The irradiation apparatus of claim 1, wherein The clamping device comprises an inlet and an outlet in communication with the liquid cooling channel, and the cooling liquid circulating device comprises: a liquid storage tank in communication with the inlet and the outlet through a pipeline; a cooling liquid pump arranged in the pipeline between the liquid storage tank and the inlet or between the liquid storage tank and the outlet; a refrigerator arranged in the pipeline between the liquid storage tank and the outlet.

7. The irradiation apparatus of claim 6, wherein The cooling circulating device comprises a temperature sensor and a controller, the controller being communicatively connected with the temperature sensor and the refrigerator, the temperature sensor being used for detecting the temperature of the irradiation area, and the controller being used for controlling the refrigeration power of the refrigerator and / or the flow rate of the cooling liquid pump according to the temperature measured by the temperature sensor, so as to adjust the temperature of the irradiation area.

8. The irradiation apparatus of claim 1, wherein, The irradiation device comprises a plurality of dose detectors arranged in the irradiation area, the dose detectors being used for acquiring the dose distribution map of the irradiation area.

9. Use of an irradiation apparatus, characterized in that The irradiation device of any one of claims 1 to 8 is used for irradiation processing of the diamond, so that the irradiated diamond can be used for manufacturing quantum sensing materials for measuring magnetic fields.

10. A control method of an irradiation apparatus, characterized by, The method comprises: clamping a plurality of diamonds in a plurality of clamping slots; dose calibration of the irradiation area before irradiation processing, and determination of a preset irradiation time; starting the cooling liquid circulating device and starting the irradiation processing; after the irradiation processing time reaches the preset irradiation time, the irradiation processing is completed.

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