Sample analyzer

Abstract

A sample analysis device that quantifies a component to be analyzed in a sample is provided with: a storage unit (41) that stores information in which, for each of a plurality of known components, the amount of the component is associated with the type and amount of a cleaning solution for removing the component; a quantitative analysis unit (42) that introduces a plurality of samples in a predetermined order and quantifies a component to be analyzed contained in each of the samples; cleaning liquid introduction units (13, 14) for introducing a cleaning liquid for cleaning the plurality of known components; and a cleaning execution unit (43) for determining the type and amount of the cleaning liquid by comparing information on the analysis target component quantified by the quantitative analysis unit with the information stored in the storage unit every time the quantitative analysis unit quantifies the analysis target component contained in one sample, and operating the cleaning liquid introduction unit. And a cleaning operation for removing the analysis target component from the analysis device.

Description

Technical Field

[0001] This invention relates to a sample analysis apparatus for quantifying the analyte components contained in a sample. Background Technology

[0002] To quantify harmful metal elements and other contaminants in liquid samples such as environmental water or drinking water collected from rivers or lakes, an inductively coupled plasma mass spectrometry (ICP-MS) sample analysis device is used (see, for example, Patent Document 1). The ICP-MS sample analysis device comprises an ICP-MS ion source and a mass spectrometry analysis unit. In the ICP-MS ion source, ICP is generated by argon gas. By introducing an atomized liquid sample into this plasma, atomic ions are generated from the components contained in the liquid sample. The atomic ions generated in the ICP-MS ion source are then introduced into the mass spectrometry analysis unit, separated according to their mass-to-charge ratio, and detected by an ion detector.

[0003] Inductively coupled plasma mass spectrometry (ICP-MS) is highly sensitive, making it suitable for the detection and quantification of trace elements. However, if elements from previously analyzed samples remain in the device, a residual effect can easily occur. Therefore, when analyzing multiple samples consecutively, a cleaning solution corresponding to the type and amount of elements expected to be present in the sample is introduced into the device after each sample analysis, based on the sample's properties (tap water, river water, etc.) to clean the device.

[0004] Existing technical documents

[0005] Patent documents

[0006] Patent Document 1: Japanese Patent Application Publication No. 2017-156332

[0007] Patent Document 2: Japanese Patent Application Publication No. 2001-324476 Summary of the Invention

[0008] The problem that the invention aims to solve

[0009] In practical analysis, to effectively prevent residual effects, the amount of elements contained in the sample is sometimes overestimated, resulting in an excessive supply of cleaning solution. Alternatively, even for elements with a very low probability of being present, the corresponding cleaning solution is supplied based on the likelihood of their presence. This increase in the quantity or type of cleaning solution supplied will correspondingly increase the time spent on cleaning. In inductively coupled plasma mass spectrometry (ICP-MS) sample analysis devices, hundreds of samples are typically analyzed consecutively. For example, if the time required for just one cleaning cycle is extended by 30 seconds, the time required for a series of analyses can be extended by several hours.

[0010] Here, the problem in the prior art is illustrated using an inductively coupled plasma mass spectrometry sample analysis device as an example, but the same problem exists in other sample analysis devices that quantify the analyte components contained in the sample.

[0011] The problem to be solved by this invention is to shorten the time required for continuous analysis of multiple samples while preventing residual effects.

[0012] Technical means to solve the problem

[0013] The present invention, made to solve the above-mentioned problems, is a sample analysis apparatus for quantifying the analyte components contained in a sample, comprising:

[0014] The storage unit stores information that establishes a correspondence between the amount of each of the multiple known components that may be contained in the sample and the type and amount of cleaning solution used to remove that known component.

[0015] The quantitative analysis unit introduces multiple samples into the aforementioned sample analysis device in a predetermined order to quantify the analyte components contained in each sample.

[0016] A cleaning solution introduction unit, which introduces a cleaning solution used to clean the aforementioned known components into the aforementioned sample analysis device; and

[0017] The cleaning execution unit, whenever the aforementioned quantitative analysis unit quantifies the analyte contained in a sample, compares the information of the analyte quantified by the quantitative analysis unit with the information stored in the aforementioned storage unit to determine the type and amount of cleaning solution, and activates the aforementioned cleaning solution introduction unit to perform a cleaning action to remove the analyte from the aforementioned sample analysis device.

[0018] The effects of the invention

[0019] In the sample analysis apparatus of the present invention, information relating to the amount of each of a plurality of known components and the type and amount of cleaning solution used to remove the known components is stored in a storage unit in advance. Furthermore, whenever the quantitative analysis unit quantifies the analyte contained in a sample, the cleaning execution unit checks the quantified analyte information against the information stored in the storage unit to determine the type and amount of cleaning solution, and activates the cleaning solution introduction unit to perform a cleaning operation to remove the analyte from the sample analysis apparatus using the appropriate type and amount of cleaning solution. Therefore, the sample analysis apparatus can be cleaned using a cleaning solution of an appropriate type and amount corresponding to the amount of analyte contained in the sample immediately preceding the analysis, thereby preventing residual effects. In the sample analysis apparatus of the present invention, the amount of elements contained in the sample is not estimated to be too high, resulting in an excessive supply of cleaning solution, or a cleaning operation using a cleaning solution for removing components not contained in the sample is performed, thus shortening the time required for continuous analysis of multiple samples. Attached Figure Description

[0020] [ Figure 1 [Image 1] is a structural diagram of the main parts of an inductively coupled plasma mass spectrometry (ICP-MS) analysis device, one embodiment of the sample analysis apparatus involved in this invention.

[0021] [ Figure 2 [This is an example of information related to the cleaning fluid used in the inductively coupled plasma mass spectrometry analysis apparatus of this embodiment.]

[0022] [ Figure 3 [ ] is a flowchart illustrating the steps of continuously measuring multiple samples in the inductively coupled plasma mass spectrometry analysis apparatus of this embodiment.

[0023] [ Figure 4 This is another example of information related to the cleaning fluid used in the inductively coupled plasma mass spectrometry analysis apparatus of this embodiment. Detailed Implementation

[0024] One embodiment of the sample analysis device involved in this invention, namely an inductively coupled plasma mass spectrometry (ICP-MS) analyzer, will be described below with reference to the accompanying drawings.

[0025] Figure 1 This is a structural diagram of the main parts of the inductively coupled plasma mass spectrometry (ICP-MS) analyzer 1 according to this embodiment. The ICP-MS analyzer 1 includes a plasma ionization unit 10, a mass spectrometry analysis unit 30, and a control / processing unit 40.

[0026] The plasma ionization unit 10 has a plasma torch 20, the interior of which is formed a sample flow tube for the flow of a liquid sample atomized by nebulizer gas; a plasma gas tube formed on the outer periphery of the sample flow tube; and a cooling gas tube further formed on its outer periphery. The sample flow tube is connected to an autosampler 11 for introducing the liquid sample; a nebulizer gas supply source 12 for supplying nebulizer gas for atomizing the liquid sample introduced from the autosampler 11; and a cleaning fluid inlet 13 for introducing cleaning fluid. A flow path leading from the cleaning fluid inlet 13 is connected midway through the flow path from the autosampler 11 to the sample flow tube. A flow path switching valve 14 is disposed at this connection point to switch the flow path so that the autosampler 11 and the cleaning fluid inlet 13 are selectively connected to the sample inlet tube.

[0027] The plasma gas tube is connected to a plasma gas supply source 15. Additionally, the cooling gas tube is connected to a cooling gas supply source (not shown). Argon is used, for example, for the atomizer gas, cooling gas, and plasma gas. In the plasma ionization section 10, argon plasma 21 is generated at the front end of the plasma torch 20. By introducing the atomized liquid sample into this argon plasma 21, atomic ions are generated from the liquid sample.

[0028] The mass spectrometry analysis unit 30 includes: a first vacuum chamber 31, which has a cutoff cone formed at the entrance opposite to the argon plasma 21; and a second vacuum chamber 32, which has a cutoff cone formed between the first vacuum chamber 31 and the second vacuum chamber 32, and is equipped with a quadrupole mass filter 321 and a detector 322 for detecting ions separated by the quadrupole mass filter 321.

[0029] In addition to the storage unit 41, the control / processing unit 40 also includes a quantitative analysis unit 42, a cleaning execution unit 43, and a cleaning setting modification unit 44 as functional blocks. The control / processing unit 40 is essentially a personal computer, and the aforementioned functional blocks are implemented by a processor executing pre-installed dedicated programs. Furthermore, the control / processing unit 40 is connected to an input unit 60 such as a keyboard or mouse, and a display unit 70 such as an LCD screen.

[0030] The storage unit 41 stores information on the measurement conditions of the target element (mass-to-charge ratio of ions generated by the element, mass-to-charge ratio of the target ion in the SIM measurement, interfering ions, etc.). In addition to the element being measured (the target element), the target element may also include elements that need to be measured for quantifying the target element (elements that generate interfering ions to the target element). The target ion in the SIM measurement is determined based on factors such as being unaffected by (or minimally affected by) interfering ions from other elements and having high detection sensitivity (e.g., Patent Document 1).

[0031] In addition, the storage unit 41 also stores calibration curve data showing the relationship between the measured intensity and concentration of the target ion for each analyte element. The calibration curve is, for example, created by the user taking into account the properties of the analyte sample and performing preliminary measurements using standard samples prepared for each analyte element, and includes information on the minimum concentration (lower limit of quantitation) or the maximum concentration expected to be present in the sample (upper limit of quantitation). The maximum concentration is the maximum concentration expected to be present in the sample, and is usually determined by the user based on the properties of the sample or the pretreatment process.

[0032] Furthermore, the storage unit 41 also stores information about the cleaning solution used to clean the plasma ionization unit 10 and the mass spectrometry analysis unit 30. Specifically, it stores information about the standard cleaning solution (type of cleaning solution and supply time), the concentration threshold of each target element, and information about additional cleaning solutions related to each target element (type of cleaning solution and supply time).

[0033] Figure 2 This is an example of cleaning solution information. In this example, the information for the standard cleaning solution is set to sequentially supply cleaning solution a for 30 seconds, cleaning solution b for 30 seconds, and cleaning solution c for 30 seconds. Furthermore, the information for additional cleaning solution is set as follows: if the concentration of element A exceeds the threshold (100 ppm), additional cleaning solution a is supplied for 30 seconds; if the concentration of element B exceeds the threshold (200 ppm), additional cleaning solution b' is supplied for 20 seconds; if the concentration of element C exceeds the threshold (100 ppm), additional cleaning solution c is supplied for 30 seconds; and if the concentration of element D exceeds the threshold (150 ppm), additional cleaning solution c is supplied for 20 seconds, and so on. Additionally, cleaning solution b' is the same type as cleaning solution b but with a higher concentration. The information for additional cleaning solution can be set for all elements or only for a subset of elements. In the latter case, the concentration threshold for that element can be set to, for example, the maximum concentration of the calibration curve or infinity. Cleaning solutions typically use solvents such as hydrochloric acid, nitric acid, and hydrofluoric acid. These solvents are used to dissolve the metals and other elements being measured contained in the sample. Although these are all acidic solvents, pure water, alkaline solvents, and organic solvents can also be used.

[0034] Next, refer to Figure 3 The flowchart illustrates the steps of continuously analyzing multiple liquid samples using the inductively coupled plasma mass spectrometry analysis apparatus 1 of this embodiment. The example described here is the quantification of elements using the calibration curve method. However, in the case of quantification using the internal standard method, the element to be quantified is pre-matched with the internal standard element, and a predetermined amount of the internal standard element is added to each sample (e.g., Patent Document 2).

[0035] The user pre-sets multiple samples to be analyzed in the autosampler 11. In addition, cleaning solutions a, b, b', c, and d are placed in the cleaning solution inlet 13.

[0036] After the sample is placed in the autosampler 11, when the user performs the measurement by issuing a predetermined operation instruction via the input unit 60, the quantitative analysis unit 42 displays a screen on the display unit 70 for specifying the quantitative target element. When the user specifies the quantitative target element, the quantitative analysis unit 42 determines the specified quantitative target element and related elements as the measurement target elements, and reads the measurement conditions for those measurement target elements and the information of the cleaning solution corresponding to each element from the storage unit 41. In the following description, elements A, B, C, and D are referred to as the measurement target elements.

[0037] When the measurement conditions and cleaning fluid information of the target element are read, the cleaning setting change unit 44 displays the read cleaning fluid information on the screen of the display unit 70. The displayed content is stored in the storage unit 41, such as settings made by the device administrator during device installation, or content changed and saved during subsequent analyses. The user confirms the displayed cleaning fluid information, makes changes as needed, and then determines the cleaning fluid information (step 1). If the user makes changes, the cleaning setting change unit 44 saves the changed cleaning fluid information in the storage unit 41.

[0038] When the user determines the information of the cleaning solution, the quantitative analysis unit 42 supplies the first sample, which is set at a predetermined position in the autosampler 11, to the sample inlet tube. In parallel, nebulizer gas is supplied from the nebulizer gas supply source 12 to the sample inlet tube, plasma gas is supplied from the plasma gas supply source 15 to the plasma gas tube, and cooling gas is supplied from the cooling gas supply source to the cooling gas tube.

[0039] The sample, supplied to the sample introduction tube and atomized by the nebulizer gas, is introduced into the argon plasma 21 generated at the front end of the plasma torch 20, generating atomic ions. The generated atomic ions are introduced into the mass spectrometry analysis unit 30, where they are separated by a quadrupole mass filter 321 and detected by a detector 322. In the mass spectrometry analysis unit 30, for each of the target elements A, B, C, and D, a predetermined mass-to-charge ratio ion (target ion) is measured using SIM. This is in the case where none of elements A, B, C, and D contains interfering ions. If any element contains interfering ions (isotopic ions relative to the ions of that element), a SIM measurement is also performed on an ion with a different mass-to-charge ratio corresponding to that isotopic ion. Alternatively, when there are many target elements for quantitative analysis, MS scanning can also be performed.

[0040] After the sample measurement is completed (step 2), the quantitative analysis unit 42 reads the calibration curves of elements A, B, C, and D stored in the storage unit 41. Then, the measurement intensity of the target ions of elements A, B, C, and D in the SIM measurement is compared with the calibration curves to determine (calculate the quantitative value) the concentration values ​​of elements A, B, C, and D respectively (step 3).

[0041] When the concentration values ​​of elements A, B, C, and D are determined, the cleaning execution unit 43 compares the concentration value of each element with the threshold value of each element stored in the storage unit 41. Then, if the concentration of any element is below the threshold value (NO in step 4), the cleaning execution unit 43 activates the cleaning fluid introduction unit 13 and the flow path switching valve 14, and uses a standard cleaning fluid based on the information stored in the storage unit 41 to clean the plasma ionization unit 10 and the mass spectrometry analysis unit 30 (step 5). On the other hand, if the concentration value of any element exceeds the threshold value (YES in step 4), the cleaning execution unit 43 activates the cleaning fluid introduction unit 13 and the flow path switching valve 14, uses the aforementioned standard cleaning fluid to clean the plasma ionization unit 10 and the mass spectrometry analysis unit 30, and then uses additional cleaning fluid based on the information stored in the storage unit 41 to clean the plasma ionization unit 10 and the mass spectrometry analysis unit 30 (step 6).

[0042] Specifically, for example, if the concentration of element A exceeds the threshold (100 ppm), after cleaning with the standard cleaning solution, cleaning solution a is allowed to flow for 30 seconds. Furthermore, if the concentrations of both element A and element B exceed the thresholds (element A: 100 ppm, element B: 200 ppm), after cleaning with the standard cleaning solution, cleaning solution a is allowed to flow for 30 seconds, and cleaning solution b' is allowed to flow for 20 seconds. Additionally, if the concentration of an element common to the additional cleaning solution exceeds the threshold, an additional cleaning solution of the element with a longer supply time (or a larger supply quantity) is supplied. In this example, if the concentrations of both element A and element C exceed the thresholds, after performing the cleaning action with the standard cleaning solution, cleaning solution a is allowed to flow for 40 seconds to perform the additional cleaning action.

[0043] After the cleaning action performed by the cleaning execution unit 43 is completed, the quantitative analysis unit 42 checks whether all samples have been measured. If only the first sample has been measured at this point, and there are still unmeasured samples remaining (NO in step 7), the process returns to step 2 to measure the next sample. If all samples have been measured (YES in step 7), the series of measurement actions ends.

[0044] Inductively coupled plasma mass spectrometry (ICP-MS) is suitable for the detection or quantification of trace elements due to its high sensitivity. However, it is prone to residual effects if elements present in previously measured samples remain. Therefore, to reliably prevent residual effects, the amount of elements in the sample is sometimes overestimated, resulting in an excessive supply of cleaning solution. Alternatively, even for elements with a very low probability of being present, the corresponding cleaning solution is supplied considering the possibility of their presence.

[0045] In contrast, in the inductively coupled plasma mass spectrometry (ICP-MS) analyzer 1 of this embodiment, the concentration value of each element is determined (quantified) whenever the target element contained in a sample is quantified. Then, if the concentration value (quantitative value) of any element does not exceed a threshold, the apparatus is cleaned only with standard cleaning solution. Only when the concentration value (quantitative value) of any element exceeds the threshold is additional cleaning performed using a cleaning solution of the appropriate type and amount corresponding to that element. Therefore, the sample analysis apparatus can be cleaned using a cleaning solution of an appropriate type and amount corresponding to the amount of the target component contained in the sample immediately following the previous analysis, thereby preventing residual effects. In the ICP-MS analyzer 1 of this embodiment, the amount of elements contained in the sample is not estimated to be too high, resulting in an excessive supply of cleaning solution, or cleaning is performed using a cleaning solution for cleaning elements not contained in the sample. Therefore, the time required for continuous analysis of multiple samples can be shortened compared to the past.

[0046] In the above embodiment, the device is configured such that when the concentration of any element being measured does not exceed a threshold, only a standard cleaning solution is used to clean the device; and when the concentration of any element exceeds the threshold, additional cleaning solution is used for cleaning. However, other configurations may also be employed. Several examples of such configurations will be described below. The configuration described below allows the cleaning setting change unit 44 to change settings related to the cleaning of the device in response to a specified input operation performed by the user.

[0047] In the example above, the threshold is set as a concentration value (absolute value), but it can also be set as a proportion based on the maximum concentration in the calibration curve for each element. Specifically, for example, for elements A, B, C, and D, 80% of the maximum concentration in the calibration curve can be set as a common threshold. Alternatively, it can be configured such that 80%, 70%, 75%, and 95% of the maximum concentration in the calibration curve are set as thresholds for each of elements A, B, C, and D, respectively. In this case, for example, if... Figure 4 Information about the cleaning fluid as shown can be stored in storage unit 41.

[0048] In the examples above, each element corresponds to one cleaning solution, but multiple cleaning solutions can also be used for one element. For example, a cleaning sequence can be set such that: when the concentration of element E exceeds a threshold, in addition to cleaning with the standard cleaning solution, the device is cleaned by sequentially running cleaning solution A for 30 seconds, cleaning solution B for 20 seconds, and pure water for 30 seconds; when the concentration of element F exceeds a threshold, in addition to cleaning with the standard cleaning solution, the device is cleaned by sequentially running cleaning solution A for 40 seconds, cleaning solution C for 30 seconds, and pure water for 30 seconds. By setting such a cleaning sequence for one or more elements that are prone to remain in the flow path or other parts of the device, and performing cleaning actions using multiple cleaning solutions, those elements can be removed from the device more effectively.

[0049] Alternatively, instead of information such as standard cleaning solution and additional cleaning solution, the cleaning solution corresponding to each element can be supplied only for a time (amount) corresponding to the quantitative value of that element. In this case, for example, information representing the relationship between the quantitative value of each element and the amount or supply time of the cleaning solution (e.g., a mathematical formula for calculating the amount or supply time of the cleaning solution with the quantitative value as a variable) can be stored in the storage unit 41, and the cleaning execution unit 43 can determine the amount or supply time of the cleaning solution based on this mathematical formula. In this case, different amounts of cleaning solution can be used to clean the device according to the concentration (quantitative value) of the elements contained in the actual sample. Furthermore, when a common cleaning solution corresponds to multiple elements, the longest supply time of the cleaning solution calculated from the mathematical formula corresponding to each of the multiple elements can be used.

[0050] The above implementation is only one example, and appropriate modifications can be made in accordance with the spirit of this invention.

[0051] The above-described embodiment is an inductively coupled plasma mass spectrometry (ICP-MS) analyzer. However, the same structure can also be used in apparatuses that detect atomic ions generated by an ICP-MS ion source using other measurement methods. Furthermore, the same structure can be used in analyzers that use other ion sources, or in apparatuses that perform analysis without generating ions from the analyte sample, as long as they are various analyzers that quantitatively analyze the components contained in a sample and perform analysis on multiple samples. In particular, similar to the ICP-MS analyzer, the same structure can be suitably used in atomic absorption spectrometry apparatuses and the like that quantitatively analyze trace elements contained in a sample.

[0052] In addition, in the above embodiments, only one threshold is set for each element, but multiple thresholds can also be preset. Whenever the threshold is exceeded, a cleaning action is performed using the preset type and amount (or supply time) of additional cleaning fluid.

[0053] [Way]

[0054] It will be apparent to those skilled in the art that the above exemplary embodiments are specific examples of the following approaches.

[0055] (Item 1)

[0056] One aspect of the present invention is a sample analysis apparatus for quantifying analyte components contained in a sample, comprising:

[0057] The storage unit stores information that establishes a correspondence between the amount of each of the multiple known components that may be contained in the sample and the type and amount of cleaning solution used to remove that known component.

[0058] The quantitative analysis unit introduces multiple samples into the aforementioned sample analysis device in a predetermined order to quantify the analyte components contained in each sample.

[0059] A cleaning solution introduction unit, which introduces a cleaning solution used to clean the aforementioned known components into the aforementioned sample analysis device; and

[0060] The cleaning execution unit, whenever the aforementioned quantitative analysis unit quantifies the analyte contained in a sample, compares the information of the analyte quantified by the quantitative analysis unit with the information stored in the aforementioned storage unit to determine the type and amount of cleaning solution, and activates the aforementioned cleaning solution introduction unit to perform a cleaning action to remove the analyte from the aforementioned sample analysis device.

[0061] In the sample analysis apparatus according to the first claim, information relating to the amount of each of a plurality of known components and the type and amount of cleaning solution used to remove the known components is stored in a storage unit in advance. Furthermore, whenever the quantitative analysis unit quantifies the analyte contained in a sample, the cleaning execution unit checks the quantified analyte information against the information stored in the storage unit to determine the type and amount of cleaning solution, and activates the cleaning solution introduction unit to perform a cleaning operation to remove the analyte from the sample analysis apparatus using the appropriate type and amount of cleaning solution. Therefore, the sample analysis apparatus can be cleaned using an appropriate type and amount of cleaning solution corresponding to the amount of the analyte contained in the sample immediately preceding the analysis, thereby preventing residual effects. In the sample analysis apparatus according to the first claim, the amount of elements contained in the sample is not estimated to be too high, resulting in an excessive supply of cleaning solution, or a cleaning operation using a cleaning solution for removing elements not contained in the sample is performed, thus shortening the time required for continuous analysis of multiple samples. In addition, the components of the analysis object are often multiple, but the components of the analysis object can also be a single component.

[0062] (Item 2)

[0063] The sample analysis device involved in item 2 is the same as the sample analysis device involved in item 1, wherein,

[0064] The aforementioned storage unit further stores information on the type and quantity of the standard cleaning solution, information on the threshold for establishing a correspondence with each of the aforementioned known components, and information on the type and quantity of additional cleaning solution used when the threshold is exceeded.

[0065] The aforementioned cleaning execution unit performs a cleaning action using the aforementioned standard cleaning solution when the quantitative value of the aforementioned analytical component does not exceed the threshold for establishing a correspondence with the analytical component; and performs a cleaning action using an additional cleaning solution that establishes a correspondence with the analytical component in addition to performing the cleaning action using the aforementioned standard cleaning solution when the quantitative value of the aforementioned analytical component exceeds the threshold for establishing a correspondence with the analytical component.

[0066] In the sample analysis apparatus described in item 2, the apparatus can be cleaned with an appropriate type and amount of cleaning solution for each analyte, based on whether the quantitative value exceeds a threshold. If the concentration of a common component in the additional cleaning solution exceeds a threshold, an additional cleaning solution containing a larger quantity of that component can be supplied.

[0067] (Item 3)

[0068] The sample analysis device involved in item 3 is the same as the sample analysis device involved in item 2, wherein,

[0069] The aforementioned storage unit further stores calibration curves and maximum concentration information for each of the aforementioned known components.

[0070] The aforementioned threshold is set as a proportion relative to the aforementioned maximum concentration.

[0071] (Item 4)

[0072] The sample analysis device involved in item 4 is the same as the sample analysis device involved in item 3, wherein,

[0073] The aforementioned proportions are set for each of the aforementioned known components.

[0074] When using a calibration curve to quantify components contained in a sample, information indicating the minimum concentration of that component as the lower limit of quantification or the maximum concentration expected to be present in the sample is usually stored along with the calibration curve. In the sample analysis apparatus described in Section 3, a threshold can be set relative to this stored maximum concentration, and the apparatus can be cleaned using an appropriate type and amount of cleaning solution. Alternatively, the ratio relative to the maximum concentration can be set to a common value for multiple known components, or it can be set separately as in the sample analysis apparatus described in Section 4. In the latter case, the threshold can be set more precisely.

[0075] (Item 5)

[0076] The sample analysis apparatus mentioned in item 5 is any one of the sample analysis apparatuses mentioned in items 1 to 4, wherein,

[0077] The aforementioned storage unit further stores information relating the quantitative values ​​of the aforementioned known components to the amount of cleaning solution.

[0078] The aforementioned cleaning unit performs a cleaning action using a cleaning solution of an amount corresponding to the quantitative value of the aforementioned analytical component.

[0079] In the sample analysis apparatus described in item 5, for each known component, information representing the relationship between the quantitative value of that component and the amount or supply time of the cleaning solution (e.g., a mathematical formula for calculating the amount or supply time of the cleaning solution using the quantitative value as a variable) is stored in a storage unit. The cleaning execution unit determines the amount or supply time of the cleaning solution based on this mathematical formula. In the sample analysis apparatus described in item 5, different amounts of cleaning solution can be used to clean the apparatus based on the concentration (quantitative value) of the elements contained in the actual sample. When a common cleaning solution is used to establish a correspondence with multiple components, the longest supply time of the cleaning solution calculated from the mathematical formulas corresponding to each of the multiple components can be used.

[0080] The sample analysis apparatus mentioned in item 6 is any one of the sample analysis apparatuses mentioned in items 1 to 5, wherein,

[0081] For at least one of the aforementioned known components, a threshold for the amount of the known component is set, and a cleaning sequence is set to perform cleaning actions by sequentially using multiple cleaning solutions when the quantitative value of the known component exceeds the threshold.

[0082] In the sample analysis apparatus described in item 6, for example, regarding components that are prone to remain in the apparatus, by performing a cleaning action using a variety of cleaning solutions, the component can be removed from the apparatus more reliably.

[0083] (Item 7)

[0084] The sample analysis apparatus mentioned in item 7 is the sample analysis apparatus mentioned in any one of items 1 to 5, wherein,

[0085] The aforementioned quantitative analysis unit is equipped with an inductively coupled plasma ion source, which uses inductively coupled plasma to generate atomic ions from the components contained in the aforementioned sample.

[0086] The more sensitive the analytical device is in detecting trace components in a sample, the more prone it is to residual effects. This leads to overestimation of the amount of elements present in the sample, resulting in excessive supply of cleaning solution, or the use of cleaning solutions intended for elements not present in the sample. Therefore, the structure of the sample analysis device described in any of items 1 to 6 is suitable. One example of such a sample analysis device is an analytical device equipped with an inductively coupled plasma ion source, as described in item 7.

[0087] Explanation of icon numbers

[0088] 1: Inductively Coupled Plasma Mass Spectrometry (ICP-MS) Analyzer

[0089] 10: Plasma ionization section

[0090] 11: Autosampler

[0091] 12: Atomizer gas supply source

[0092] 13: Cleaning fluid inlet section

[0093] 14: Flow path switching valve

[0094] 15: Plasma gas supply source

[0095] 20: Plasma torch

[0096] 21: Argon Plasma

[0097] 30: Mass Spectrometry Analysis Department

[0098] 31: Vacuum Chamber 1

[0099] 32: Second Vacuum Chamber

[0100] 321: Quadrupole mass filter

[0101] 322: Detector

[0102] 40: Control / Processing Unit

[0103] 41: Storage Department

[0104] 42: Quantitative Analysis Department

[0105] 43: Cleaning Execution Department

[0106] 44: Cleaning Setting Change Department

[0107] 60: Input Section

[0108] 70: Display Section

Claims

1. A sample analysis device for quantifying analyte components contained in a sample, characterized in that, Possessing: a storage section that stores information that, for each of a plurality of known components that can be contained in a sample, establishes a correspondence between the amount of the known component and the kind and amount of a cleaning solution used to remove the known component; a quantitative analysis section that introduces a plurality of samples into the sample analysis device in a predetermined order and performs quantitative analysis of an analysis target component contained in each sample; a cleaning solution introduction section that introduces a cleaning solution used to clean the plurality of known components into the sample analysis device; and a cleaning execution section that, each time the quantitative analysis section performs quantitative analysis of an analysis target component contained in a sample, collates information on the analysis target component quantitatively analyzed by the quantitative analysis section with information stored in the storage section to determine the kind and amount of a cleaning solution, and causes the cleaning solution introduction section to perform a cleaning operation to remove the analysis target component from the sample analysis device.

2. The sample analysis device according to claim 1, wherein the storage section further stores information on the kind and amount of a standard cleaning solution, information on a threshold value that corresponds to each of the plurality of known components, and information on the kind and amount of an additional cleaning solution used when the threshold value is exceeded, the cleaning execution section performs a cleaning operation using the standard cleaning solution when the quantitative value of the analysis target component does not exceed the threshold value that corresponds to the analysis target component, and performs a cleaning operation using the additional cleaning solution that corresponds to the analysis target component in addition to the cleaning operation using the standard cleaning solution when the quantitative value of the analysis target component exceeds the threshold value that corresponds to the analysis target component.

3. The sample analysis device according to claim 2, wherein the storage section further stores information on a calibration curve and a maximum concentration for each of the plurality of known components, the threshold value is set to a proportion with respect to the maximum concentration. the proportion is set for each of the plurality of known components.

4. The sample analysis device of claim 3, wherein, 5. The sample analysis device according to claim 1, wherein the storage section further stores information indicating a relationship between the quantitative value of the plurality of known components and the amount of a cleaning solution, the cleaning execution section performs a cleaning operation using a cleaning solution in an amount corresponding to the quantitative value of the analysis target component. for at least one of the plurality of known components, a threshold value of the amount of the known component is set, and a cleaning sequence that performs a cleaning operation sequentially using a plurality of cleaning solutions is set to be used when the quantitative value of the known component exceeds the threshold value.

6. The sample analysis device of claim 1, wherein, the quantitative analysis section includes an inductively coupled plasma ion source that generates atomic ions from components contained in the sample using an inductively coupled plasma.

7. The sample analysis device of claim 1, wherein, ​

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