A PVD coating process method applied to a galvanized sheet stamping die

Abstract

This invention relates to the field of coating technology, specifically to a PVD coating process for stamping dies of galvanized steel sheets. The method includes: pre-treating the die by wet cleaning the die surface and then placing it in a vacuum deposition chamber for vacuuming, followed by heating to a predetermined temperature under an inert gas environment; performing plasma pre-treatment on the die surface by using a high-power pulsed magnetron sputtering cathode with a chromium target to generate chromium-rich plasma under an argon atmosphere, and applying a negative bias voltage to the die; activating at least one unbalanced magnetron sputtering cathode, which gradually increases the target current in a ramp-up mode to improve the target voltage, while simultaneously introducing nitrogen as a reactive gas, thereby depositing a nitride transition layer on the die surface; and performing multi-source reactive sputtering deposition on the transition layer using a high-power pulsed magnetron sputtering cathode and an unbalanced magnetron sputtering cathode working synchronously to form a multilayer hard coating composed of alternating titanium aluminum vanadium and chromium nitrides. This invention solves the problems of poor coating adhesion and insufficient high-temperature resistance in existing technologies by combining high-power pulsed magnetron sputtering and unbalanced magnetron sputtering technologies.

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