Ammonia gas absorption device for cyanuric acid processing

Abstract

The invention relates to the technical field of cyanuric acid waste gas treatment, in particular to a cyanuric acid processing ammonia gas absorption device which comprises a urea tank, an alkali washing tank and an acid washing tank. The device further comprises a first waste gas pipe, a urea liquid pipe, a second waste gas pipe, an alkali liquor spraying assembly, a third waste gas pipe and an acid liquor spraying assembly, the first waste gas pipe extends downwards to the bottom of the urea tank, the urea liquid pipe is used for spraying urea liquid downwards, the second waste gas pipe is connected with the top of the urea tank and the bottom of the alkali washing tank, and the alkali liquor spraying assembly is used for spraying alkali liquor downwards. The input end of the third waste gas pipe is connected with the top of a third cavity of the pickling tank, the output end of the third waste gas pipe extends into the bottom of the third cavity of the pickling tank, the output end of the acid liquor spraying assembly extends into the upper portion of the third cavity of the pickling tank, the acid liquor spraying assembly is used for spraying acid liquor downwards, and an exhaust pipe communicated with the third cavity is arranged at the top of the pickling tank; the waste gas is treated twice when passing through each reaction tank, so that the treatment efficiency of impurities and ammonia gas in the waste gas is improved.

Description

Technical Field

[0001] This invention relates to the field of cyanuric acid waste gas treatment technology, and in particular to an ammonia absorption device for cyanuric acid processing. Background Technology

[0002] Cyanuric acid is generally prepared by the pyrolysis of urea. In the prior art, Chinese invention patent CN111018798B discloses a pyrolysis method for cyanuric acid production, along with a supporting ammonia absorption device. This ammonia absorption device includes an ammonia washing tower and a urea tank. The lower part of the ammonia washing tower is connected to an ammonia pipe, and the top of the ammonia washing tower has an exhaust port and a urea inlet for connecting to a liquid urea pipe. The upper part of the ammonia washing tower has multiple sieve plates for dispersing ammonia and liquid urea. The bottom of the ammonia washing tower is connected to the urea tank via a urea pipe, and the urea tank is connected to the top of the ammonia washing tower via a circulating pump, allowing urea vapor in the ammonia to dissolve in the liquid urea, thus recovering urea vapor from the ammonia. Chinese invention patent application CN118558126A discloses a method for treating waste gas from cyanuric acid production. The apparatus and treatment method include a first absorption tower and a second absorption tower connected in series, and a cooling pipe connected to the first absorption tower. Spraying devices are installed at the tops of the first and second absorption towers to spray solvent into the absorption towers. An electrochemical sensor for hydrogen cyanide is installed inside the first absorption tower, and an electrochemical sensor for ammonia is installed inside the second absorption tower. This invention uses a temperature sensor installed at the cooling pipe before the absorption towers to monitor the temperature of the production waste gas in real time, thereby adjusting the cooling device to regulate the temperature of the waste gas and reducing the impact of high-temperature waste gas on the absorption towers and the absorption solvent. The electrochemical sensors for hydrogen cyanide and ammonia respectively monitor the concentration changes of hydrogen cyanide and ammonia in the waste gas in real time. Based on the monitoring results, the solvent nozzles are adjusted to connect to solvents of different concentrations to achieve precise absorption and neutralization of the waste gas components, ensuring reaction efficiency.

[0003] However, the exhaust gas entering the reaction tank through the aforementioned exhaust pipe only comes into contact with the treatment liquid droplets sprayed out by the spray system, and does not come into contact with the treatment liquid at the bottom of the reaction tank. That is, the exhaust gas and ammonia are only treated once, resulting in low treatment efficiency of impurities and ammonia in the exhaust gas. Summary of the Invention

[0004] To solve the above-mentioned technical problems, the present invention provides a cyanuric acid processing ammonia absorption device that performs two treatments on the waste gas as it passes through each reaction tank, thereby improving the treatment efficiency of impurities and ammonia in the waste gas.

[0005] This invention discloses an ammonia absorption device for cyanuric acid processing, comprising a urea tank, an alkaline washing tank, and an acid washing tank. The urea tank has an internal chamber 1, the alkaline washing tank has an internal chamber 2, and the acid washing tank has an internal chamber 3. It also includes a first exhaust pipe, a urea liquid pipe, a second exhaust pipe, an alkaline liquid spray assembly, a third exhaust pipe, and an acid liquid spray assembly. The output end of the first exhaust pipe passes through the middle of the first chamber of the urea tank and extends downwards to the bottom of the first chamber. The output end of the urea liquid pipe extends into the upper part of the first chamber of the urea tank and is used to spray urea liquid downwards. A urea liquid discharge pipe is provided at the bottom of the urea tank. The input of the second exhaust pipe... The first end is connected to the top of chamber one. The output end of the second exhaust pipe passes through the upper part of chamber two and extends downward to the bottom of chamber two. An alkaline solution discharge pipe is provided at the bottom of the second exhaust pipe. The output end of the alkaline solution spraying assembly extends into the upper part of chamber two. The alkaline solution spraying assembly is used to spray alkaline solution downward. The input end of the third exhaust pipe is connected to the top of chamber three of the pickling tank. The output end of the third exhaust pipe extends into the bottom of chamber three. An acid solution discharge pipe is provided at the bottom of the pickling tank. The output end of the acid solution spraying assembly extends into the upper part of chamber three. The acid solution spraying assembly is used to spray acid solution downward. An exhaust pipe connected to chamber three is provided at the top of the pickling tank.

[0006] The inlet of exhaust pipe one is connected to the exhaust outlet of the pyrolysis furnace for cyanuric acid production. The exhaust gas mainly contains urea particles, hydrogen cyanide gas, and ammonia. During operation, the urea liquid pipe sprays urea liquid into chamber one of the urea tank, creating a urea liquid mist zone in the upper part of chamber one. The urea liquid at the bottom of chamber one submerges the outlet of exhaust pipe one. Similarly, the alkaline spray assembly sprays alkaline liquid, creating an alkaline liquid mist zone in the middle of chamber two of the alkaline washing tank. The alkaline solution at the bottom of chamber two submerges the output end of exhaust gas pipe two. The acid spraying assembly sprays acid to form an acid mist zone in the middle of chamber three of the pickling tank. The acid at the bottom of chamber three of the pickling tank submerges the output end of exhaust gas pipe three. This causes the exhaust gas output from exhaust gas pipe one to first enter the urea solution at the bottom of chamber one of the urea tank, allowing the urea particles in the exhaust gas to mix and be washed and absorbed by the urea solution. After the exhaust gas exits the urea solution, it comes into full contact with the urea mist, causing the urea particles in the exhaust gas to be washed again. The process involves two stages of washing and absorption, where urea particles in the waste gas are washed and absorbed twice. The waste gas, after being washed and absorbed by the urea solution, is then fed through waste gas pipe two into the alkaline solution at the bottom of chamber two of the alkaline washing tank. This allows the hydrogen cyanide gas in the waste gas to mix with the alkaline solution for neutralization and absorption. The waste gas then exits through waste gas pipe three into the acid solution at the bottom of chamber three of the acid washing tank. This allows the ammonia gas in the waste gas to mix with the acid solution for reaction and absorption. The waste gas then exits through the acid solution and exits through the acid solution for reaction and absorption. This process repeats twice, with the ammonia gas undergoing two reactions. When the acid solution is dilute sulfuric acid, ammonium sulfate particles are generated. Compared to existing technologies where the waste gas undergoes two treatments in each reaction tank, this method significantly improves the efficiency of removing impurities and ammonia from the waste gas.

[0007] Preferably, it also includes sieve plates, with multiple sieve plates installed in the first chamber. Each sieve plate has multiple sieve holes, and the multiple sieve plates are arranged vertically below the urea liquid pipe. The urea liquid sprayed from the urea liquid pipe falls through the multiple sieve holes of the multiple sieve plates in sequence, forming a multi-layer urea liquid mist zone, and prolonging the contact time between the exhaust gas and the urea liquid, thereby improving the washing efficiency of urea microparticles in the exhaust gas.

[0008] Preferably, it also includes a gas distribution hood, which is installed on the outer side of the outer wall of the output end of the first exhaust pipe and located at the bottom of the first chamber. The gas distribution hood is provided with multiple micro-holes. The exhaust gas output from the first exhaust pipe is gathered by the gas distribution hood and forms an exhaust gas chamber in the urea liquid at the bottom of the first chamber of the urea tank. The exhaust gas in the exhaust gas chamber rises through the multiple micro-holes of the gas distribution hood to form a large number of micro-bubbles, so that the exhaust gas and urea liquid are mixed more thoroughly, thereby improving the first urea liquid washing and absorption efficiency.

[0009] Preferably, it also includes a sleeve, which is sleeved on the outer wall of the output end of the first exhaust pipe, and a gap is provided between the sleeve and the outer wall of the first exhaust pipe. The temperature of the urea solution transported by the urea solution pipe is lower than the temperature of the exhaust gas transported by the first exhaust pipe. The urea solution mist sprayed from the urea solution pipe enters the gap between the sleeve and the first exhaust pipe through the flared end of the sleeve, and flows downward along the gap. This cools the exhaust gas transported in the first exhaust pipe with the urea solution, causing the gaseous urea microparticles in the exhaust gas to cool down and condense into droplets, thereby improving the washing and absorption efficiency of urea microparticles in the exhaust gas.

[0010] Preferably, it also includes a packing layer, which is installed in the second chamber and located below the alkaline spraying assembly. The packing layer fully adsorbs the alkaline solution sprayed by the alkaline spraying assembly, thereby increasing the contact area between the alkaline solution and the waste gas and improving the neutralization and absorption efficiency of hydrogen cyanide in the waste gas.

[0011] Preferably, it also includes an inner sleeve, an outer sleeve, and a liquid collecting hopper. The inner sleeve is fitted onto the outer wall of the outlet end of the second exhaust pipe, and a gap two is provided between the inner sleeve and the outer wall of the second exhaust pipe. The outer sleeve is fitted onto the outer wall of the inner sleeve, and a gap three is provided between the outer sleeve and the outer wall of the inner sleeve. The liquid collecting hopper is installed at the upper end of the outer sleeve and is arranged around the outer side of the second exhaust pipe. The lower end of the liquid collecting hopper extends into gap two, and a gap four is provided between the lower end of the liquid collecting hopper and the outer wall of the second exhaust pipe. A gap five is provided between the lower end face of the liquid collecting hopper and the upper end of the inner sleeve. The exhaust gas output from the second exhaust pipe is relatively high (around 150°C). Cooling pipes are coiled around the alkaline spray assembly, causing the alkaline spray assembly to output low-temperature alkaline solution. The low-temperature alkaline solution mist is collected by the liquid collecting hopper. After collection, the gas flows through gap four into gap two between the inner sleeve and the exhaust gas pipe two, thereby cooling the exhaust gas inside the exhaust gas pipe two. This causes the hydrogen cyanide gas in the exhaust gas to gradually cool down and liquefy, allowing the hydrogen cyanide liquid to be fully neutralized and absorbed by the alkali solution. The remaining small amount of hydrogen cyanide gas overflows from the alkali solution and comes into full contact with the alkali solution mist to be neutralized and absorbed. At the same time, the water in the alkali solution is heated and evaporated by the exhaust gas pipe two. Some of the rising steam generated by the evaporation of water is guided by the bottom surface of the lower end of the liquid collecting hopper and enters gap four between the outer sleeve and the inner sleeve through gap five. As the water vapor flows downward along gap four, it comes into contact with the low temperature liquid collecting hopper and condenses. The condensate flows into the alkali solution at the bottom of the alkali washing tank, preventing water vapor from mixing into the exhaust gas.

[0012] Preferably, the alkaline spray assembly includes a three-way valve, an alkaline pipe one, an alkaline pipe two, and a spray nozzle one. The three-way valve is installed outside the alkaline washing tank. Alkaline pipe one is connected to one input end of the three-way valve, alkaline pipe two is connected to the other input end of the three-way valve, and the input end of spray nozzle one is connected to the output end of the three-way valve. The output end of spray nozzle one extends into the top of chamber two. The three-way valve is connected to the low-concentration alkaline pipe, and alkaline pipe one is connected to the high-concentration alkaline pipe. Adjusting the three-way knob of the three-way valve adjusts the opening size of the two input ends, thereby adjusting the mixing ratio of the low-concentration and high-concentration alkaline solutions to form the required alkaline solution. The alkaline solution of the appropriate concentration is sprayed into chamber two of the alkaline washing tank through spray nozzle one, improving versatility.

[0013] Preferably, the system also includes a jet pump, a guide vane, and a baffle plate. The jet pump is installed in chamber three, with its output end extending into the bottom of chamber three. The output end of exhaust gas pipe three is connected to the low-pressure inlet of the jet pump. One output end of the acid spray assembly is connected to the high-pressure inlet of the jet pump. The guide vane is installed at the bottom of chamber three, located below the output end of the jet pump. The baffle plate is annularly arranged between the guide vane and the inner wall of the pickling tank. High-pressure acid delivered from one output end of the acid spray assembly is input into the high-pressure inlet of the jet pump, thereby drawing exhaust gas into the jet pump through exhaust gas pipe three. In the process, the exhaust gas and high-pressure acid are mixed in the jet pump and sprayed at high speed into the acid at the bottom of the third chamber of the pickling tank. The guide pipe spirally guides the mixture output by the jet pump, causing the acid at the bottom of the third chamber to rotate. This causes the sulfuric acid to mix and react with the ammonia in the exhaust gas to generate ammonium sulfate particles. Under the action of centrifugal force, the ammonium sulfate particles are concentrated towards the edge of the third chamber of the pickling tank and fall outside the surrounding plate. The acid discharge pipe at the bottom of the pickling tank extends between the surrounding plate and the inner wall of the pickling tank, allowing the acid containing the ammonium sulfate particles to be discharged through the acid discharge pipe, thus improving the concentration effect.

[0014] Preferably, the assembly further includes a second sieve plate, an upper surrounding plate, an upper baffle, a lower surrounding plate, and an air guide hopper. The second sieve plate is installed in the third chamber, with a through hole in the middle of the sieve plate to avoid the jet pump. The second sieve plate is located below the acid spray assembly. The upper surrounding plate is installed around the upper edge of the through hole of the second sieve plate, with a gap six between the upper surrounding plate and the jet pump. The upper baffle is fitted onto the jet pump and is located above the upper surrounding plate, with a gap seven between the upper baffle and the upper edge of the upper surrounding plate. The lower surrounding plate is installed around the lower edge of the through hole of the second sieve plate, with a gap eight between the lower surrounding plate and the jet pump. The air guide hopper is fitted onto the jet pump and is located below the lower surrounding plate, with a gap nine between the upper part of the air guide hopper and the outer wall of the lower surrounding plate. The acid sprayed from the other output end of the acid spray assembly is caught by the second sieve plate. Acid falls through the small holes of sieve plate two, forming a lower acid rain zone. This creates a layer of acid on sieve plate two, which is blocked by the upper baffle plate. The upper baffle plate prevents the falling acid from entering the gap six between the upper baffle plate and the injection pump. The exhaust gas overflowing from the acid at the bottom of the acid chamber three of the pickling tank comes into contact with the acid rain and reacts with and absorbs the ammonia. The rising exhaust gas is blocked by the lower end face of sieve plate two and enters the gap eight between the lower baffle plate and the injection pump through the gap nine between the air guide hopper and the lower baffle plate. Then, it enters the acid mist zone above sieve plate two through the gap six between the upper baffle plate and the injection pump and the gap seven between the upper baffle plate and the upper baffle plate. This allows the ammonia in the exhaust gas to come into full contact with the acid mist again, further prolonging the reaction time between ammonia and acid and improving the ammonia reaction absorption efficiency.

[0015] Preferably, the acid spray assembly includes a three-way valve two, an acid pipe one, an acid pipe two, a mixing acid pipe, a three-way valve three, a spray pipe two, and a high-pressure acid pipe. The three-way valve two is installed outside the pickling tank. The acid pipe one is connected to one input end of the three-way valve two, and the acid pipe two is connected to the other input end of the three-way valve two. The input end of the mixing acid pipe is connected to the output end of the three-way valve two, and the output end of the mixing acid pipe is connected to the input end of the three-way valve three. The input end of the spray pipe two is connected to one output end of the three-way valve three, and the output end of the spray pipe two extends into the top of the chamber three. The input end of the high-pressure acid pipe is connected to the other output end of the three-way valve three, and the output end of the high-pressure acid pipe is connected to the high-pressure pump of the spray pump. The system includes two inlet connections: one for acid solution and one for acid solution. Acid solution pipe 1 connects to the low-concentration sulfuric acid solution pipe, and the other connects to the high-concentration sulfuric acid solution pipe. Adjusting the three-way knob of three-way valve 2 adjusts the opening of the two inlet ports, thereby adjusting the mixing ratio of the low-concentration and high-concentration sulfuric acid solutions to form the desired sulfuric acid solution. The appropriate concentration of sulfuric acid solution is then fed into the mixing acid pipe. Adjusting the three-way knob of three-way valve 3 adjusts the opening of the two outlet ports, thereby adjusting the ratio of sulfuric acid solution output through nozzle 2 and the high-pressure acid pipe. The sulfuric acid solution is sprayed into chamber 3 of the pickling tank through nozzle 2, and then fed into the high-pressure inlet of the jet pump through the high-pressure acid pipe, improving versatility.

[0016] Compared with the prior art, the beneficial effects of the present invention are: the waste gas is treated twice when it passes through each reaction tank, which improves the treatment efficiency of impurities and ammonia in the waste gas. Attached Figure Description

[0017] Figure 1 This is a schematic diagram of the structure of the present invention; Figure 2 This is a schematic diagram of the front section structure of the present invention; Figure 3 This is a schematic diagram of the isometric structure of the present invention; Figure 4 This is a partial cross-sectional view of the urea tank; Figure 5 This is a structural diagram of the exhaust pipe, air distribution hood, and sleeve, etc. Figure 6 This is a partial cross-sectional view of the alkaline washing tank. Figure 7 This is a structural diagram of the exhaust pipe, inner sleeve, outer sleeve, and liquid collection hopper, etc. Figure 8 This is a partial cross-sectional view of the pickling tank. Figure 9 yes Figure 2 A magnified schematic diagram of the local structure at point A; Figure 10 This is a structural diagram of the exhaust pipe, jet pump, flow guide, and enclosure, etc. Figure 11 This is a schematic diagram of the acid spraying assembly; The attached diagram is labeled as follows: 1. Urea tank; 2. Alkali washing tank; 3. Acid washing tank; 4. Exhaust gas pipe one; 5. Urea liquid pipe; 6. Exhaust gas pipe two; 7. Alkali spray assembly; 8. Exhaust gas pipe three; 9. Acid spray assembly; 10. Sieve plate; 11. Gas distribution hood; 12. Sleeve; 13. Packing layer; 14. Inner sleeve; 15. Outer sleeve; 16. Liquid collecting hopper; 17. Three-way valve; 18. Alkali... 19. Liquid pipe 1; 20. Alkali pipe 2; 21. Spray pipe 1; 22. Jet pump; 23. Flow guide; 24. Enclosure plate; 25. Screen plate 2; 26. Upper enclosure plate; 27. Upper baffle plate; 28. Lower enclosure plate; 29. ​​Air guide hopper; 30. Three-way valve 2; 31. Acid pipe 1; 32. Acid pipe 2; 33. Mixed acid pipe; 34. Three-way valve 3; 35. Spray pipe 2; 36. High-pressure acid pipe. Detailed Implementation

[0018] To facilitate understanding of the present invention, a more complete description will be given below with reference to the accompanying drawings. The present invention can be implemented in many different forms and is not limited to the embodiments described herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete.

[0019] Example 1, such as Figures 1 to 3 As shown, an ammonia absorption device for cyanuric acid processing includes a urea tank 1, an alkaline washing tank 2, and an acid washing tank 3. The urea tank 1 has an internal chamber 1, the alkaline washing tank 2 has an internal chamber 2, and the acid washing tank 3 has an internal chamber 3. It also includes a waste gas pipe 1 4, a urea liquid pipe 5, a waste gas pipe 2 6, an alkaline liquid spray assembly 7, a waste gas pipe 3 8, and an acid liquid spray assembly 9. The output end of the waste gas pipe 1 4 passes through the middle of the first chamber of the urea tank 1 and extends downwards to the bottom of the first chamber. The output end of the urea liquid pipe 5 extends into the upper part of the first chamber of the urea tank 1 and is used to spray urea liquid downwards. A urea liquid discharge pipe is provided at the bottom of the urea tank 1. The input end of the waste gas pipe 2 6 is connected to the cavity of the urea tank 1. The top of chamber one is connected to the bottom of chamber two of the acid washing tank 3. The output end of exhaust pipe two 6 passes through the upper part of chamber two of the acid washing tank 2 and extends downward to the bottom of chamber two. An alkali discharge pipe is set at the bottom of exhaust pipe two 6. The output end of alkali spray assembly 7 extends into the upper part of chamber two of the acid washing tank 2. Alkali spray assembly 7 is used to spray alkali downward. The input end of exhaust pipe three 8 is connected to the top of chamber three of the acid washing tank 3. The output end of exhaust pipe three 8 extends into the bottom of chamber three of the acid washing tank 3. An acid discharge pipe is set at the bottom of the acid washing tank 3. The output end of acid spray assembly 9 extends into the upper part of chamber three of the acid washing tank 3. Acid spray assembly 9 is used to spray acid downward. An exhaust pipe connected to chamber three is set at the top of the acid washing tank 3.

[0020] The inlet of exhaust pipe 4 is connected to the exhaust outlet of the pyrolysis furnace for cyanuric acid production. The exhaust gas mainly contains urea particles, hydrogen cyanide gas, and ammonia. During operation, urea liquid pipe 5 sprays urea liquid into chamber 1 of urea tank 1, creating a urea liquid mist zone in the upper part of chamber 1. The urea liquid at the bottom of chamber 1 of urea tank 1 submerges the outlet of exhaust pipe 4. Similarly, Alkali spray assembly 7 sprays alkaline solution, creating an alkaline mist zone in the middle of chamber two of alkaline washing tank 2. The alkaline solution at the bottom of chamber two of alkaline washing tank 2 submerges the output end of exhaust gas pipe two 6. Acid spray assembly 9 sprays acid solution, creating an acid mist zone in the middle of chamber three of acid washing tank 3. The acid solution at the bottom of chamber three of acid washing tank 3 submerges the output end of exhaust gas pipe three 8. This allows the exhaust gas output from exhaust gas pipe one 4 to first enter the urea solution at the bottom of chamber one of urea tank 1, so that the urea microparticles in the exhaust gas mix with the urea solution for washing and absorption. After the exhaust gas exits the urea solution, it comes into full contact with the urea solution mist, allowing the urea microparticles in the exhaust gas to be washed and absorbed again. Thus, the urea microparticles in the exhaust gas undergo two washing and absorption processes. The exhaust gas that has been washed and absorbed by the urea solution is then input into chamber two of alkaline washing tank 2 through exhaust gas pipe two 6. In the alkaline solution at the bottom, the hydrogen cyanide gas in the waste gas mixes with the alkaline solution for neutralization and absorption. After the waste gas exits from the alkaline solution, it comes into full contact with the alkaline mist, causing the hydrogen cyanide in the waste gas to be neutralized and absorbed again. Thus, the hydrogen cyanide in the waste gas undergoes two neutralization and absorption processes. The waste gas, after being neutralized by the alkaline solution, is input into the acid solution at the bottom of the chamber of the pickling tank 3 through the waste gas pipe 8. This allows the ammonia in the waste gas to mix with the acid solution for reaction and absorption. After the waste gas exits from the acid solution, it comes into full contact with the acid mist, causing the ammonia in the waste gas to be reacted and absorbed again. Thus, the ammonia in the waste gas undergoes two reaction and absorption processes. When the acid solution is dilute sulfuric acid, the reaction produces ammonium sulfate particles. Compared with the existing technology, where the waste gas undergoes two treatments when passing through each reaction tank, the treatment efficiency of impurities and ammonia in the waste gas is improved.

[0021] Example 2, as Figure 1 , Figure 2 , Figure 4 and Figure 5 As shown, based on Embodiment 1, it also includes a sieve plate 10, with multiple sieve plates 10. The sieve plates 10 are installed in the first chamber of the urea tank 1, and each sieve plate 10 has multiple sieve holes. The multiple sieve plates 10 are arranged vertically and are located below the urea liquid pipe 5. It also includes a gas distribution hood 11, which is installed on the outer side of the output end of the exhaust pipe 4. The gas distribution hood 11 is located at the bottom of the first chamber of the urea tank 1, and has multiple micropores. It also includes a sleeve 12, which is sleeved on the outer wall of the output end of the exhaust pipe 4, and a gap 1 is provided between the sleeve 12 and the outer wall of the exhaust pipe 4.

[0022] The temperature of the urea solution transported by urea solution pipe 5 is lower than the temperature of the exhaust gas transported by exhaust gas pipe 4. The urea particles in the exhaust gas are gaseous, liquid, or solid particles. The urea mist sprayed from urea solution pipe 5 enters the gap between sleeve 12 and exhaust gas pipe 4 through the flared end of sleeve 12, and flows downward along the gap, thereby cooling the exhaust gas transported in exhaust gas pipe 4 with urea solution, causing the gaseous urea particles in the exhaust gas to cool down and condense into droplets. The exhaust gas output from exhaust gas pipe 4 is then distributed... The gas hood 11 gathers the gas and forms a waste gas chamber in the urea liquid at the bottom of the urea tank 1. The waste gas in the waste gas chamber rises through multiple micro-holes in the gas hood 11, forming a large number of micro-bubbles, which makes the waste gas and urea liquid mix more thoroughly and improves the first urea liquid washing and absorption efficiency. The urea liquid sprayed by the urea liquid pipe 5 falls through multiple sieve holes of multiple sieve plates 10 in sequence, forming a multi-layer urea liquid mist zone and prolonging the contact time between the waste gas and urea liquid, thereby improving the washing efficiency of urea microparticles in the waste gas.

[0023] Example 3, as Figure 1 , Figure 2 , Figure 6 and Figure 7 As shown, based on Embodiment 1, it further includes a packing layer 13, which is installed in chamber two of the alkaline washing tank 2 and located below the alkaline spray assembly 7; it also includes an inner sleeve 14, an outer sleeve 15, and a collection hopper 16. The inner sleeve 14 is fitted onto the outer wall of the output end of the exhaust pipe 6, and a second gap is provided between the inner sleeve 14 and the outer wall of the exhaust pipe 6. The outer sleeve 15 is fitted onto the outer wall of the inner sleeve 14, and a third gap is provided between the outer sleeve 15 and the outer wall of the inner sleeve 14. The collection hopper 16 is installed on the upper end of the outer sleeve 15 and is arranged around the outer side of the exhaust pipe 6. The lower end of the collection hopper 16 extends outward. In the gap two between the inner sleeve 14 and the exhaust pipe 6, a gap four is provided between the lower end of the liquid collecting hopper 16 and the outer wall of the exhaust pipe 6, and a gap five is provided between the lower end face of the liquid collecting hopper 16 and the upper end of the inner sleeve 14; the alkaline spray assembly 7 includes a three-way valve 17, an alkaline pipe 18, an alkaline pipe 29 and a spray pipe 20. The three-way valve 17 is installed outside the alkaline washing tank 2. The alkaline pipe 18 is connected to one input end of the three-way valve 17, the alkaline pipe 29 is connected to the other input end of the three-way valve 17, the input end of the spray pipe 20 is connected to the output end of the three-way valve 17, and the output end of the spray pipe 20 extends into the top of the chamber two of the alkaline washing tank 2.

[0024] The exhaust gas output from exhaust pipe 26 is relatively high. A cooling pipe is coiled around nozzle 120, causing it to output a low-temperature alkaline solution. Three-way valve 17 connects to the low-concentration alkaline solution pipe, and alkaline solution pipe 18 connects to the high-concentration alkaline solution pipe. Adjusting the three-way knob of valve 17 adjusts the opening of the two input ends, thereby adjusting the mixing ratio of the low-concentration and high-concentration alkaline solutions to form the desired alkaline solution (the specific concentration is existing technology and not the technical problem to be solved in this patent, so it will not be elaborated here). The alkaline solution of the appropriate concentration is sprayed into chamber 2 of the alkaline washing tank 2 through nozzle 120. The packing layer 13 fully absorbs the alkaline solution sprayed from nozzle 120, thereby increasing the contact area between the alkaline solution and the exhaust gas, and improving the neutralization and absorption efficiency of hydrogen cyanide in the exhaust gas. The low-temperature alkaline solution mist passes through the collection hopper. After collection, the water flows through gap four into gap two between inner sleeve 14 and exhaust pipe two 6, thereby cooling the exhaust gas inside exhaust pipe two 6. This causes the hydrogen cyanide gas in the exhaust gas to gradually cool and liquefy, allowing the hydrogen cyanide liquid to be fully neutralized and absorbed by the alkali solution. The remaining small amount of hydrogen cyanide gas overflows from the alkali solution and comes into full contact with the alkali mist to be neutralized and absorbed. At the same time, the water in the alkali solution is heated and evaporated by exhaust pipe two 6. Some of the rising steam generated by the evaporation of water is guided by the bottom surface of the lower end of the liquid collecting hopper 16 and enters gap four between outer sleeve 15 and inner sleeve 14 through gap five. As the water vapor flows downward along gap four, it comes into contact with the low temperature liquid collecting hopper 16 and condenses. The condensate flows into the alkali solution at the bottom of the alkali washing tank 2, preventing water vapor from mixing into the exhaust gas.

[0025] Example 4, as Figure 1 , Figure 2 , Figures 8 to 11As shown, based on Embodiment 1, it further includes a jet pump 21, a flow guide 22, and a surrounding plate 23. The jet pump 21 is installed in the third chamber of the pickling tank 3, and the output end of the jet pump 21 extends into the bottom of the third chamber of the pickling tank 3. The output end of the exhaust pipe 3 8 is connected to two low-pressure inlets of the jet pump 21, and one output end of the acid spray assembly 9 is connected to the high-pressure inlet of the jet pump 21. The flow guide 22 is installed at the bottom of the third chamber of the pickling tank 3, and the flow guide 22 is located below the output end of the jet pump 21. The surrounding plate 23 is arranged in a ring around the inner wall of the flow guide 22 and the pickling tank 3. The assembly also includes a second sieve plate 24, an upper surrounding plate 25, an upper baffle plate 26, a lower surrounding plate 27, and an air guide hopper 28. The second sieve plate 24 is installed in the third chamber of the pickling tank 3. A through hole for the jet pump 21 is provided in the middle of the second sieve plate 24. The second sieve plate 24 is located below the acid spray assembly 9. The upper surrounding plate 25 is installed around the upper edge of the through hole of the second sieve plate 24. A gap six is ​​provided between the upper surrounding plate 25 and the jet pump 21. The upper baffle plate 26 is fitted onto the jet pump 21. The upper baffle plate 26 is located above the upper surrounding plate 25. A gap six is ​​provided between the upper baffle plate 26 and the upper edge of the upper surrounding plate 25. A gap seven is provided; the lower enclosure plate 27 is installed around the lower edge of the through hole of the screen plate 24; a gap eight is provided between the lower enclosure plate 27 and the jet pump 21; the air guide hopper 28 is fitted onto the jet pump 21 and is located below the lower enclosure plate 27; a gap nine is provided between the upper part of the air guide hopper 28 and the outer wall of the lower enclosure plate 27; the acid spray assembly 9 includes a three-way valve 29, an acid pipe 1 30, an acid pipe 21, a mixing acid pipe 32, a three-way valve 33, a spray pipe 2 34, and a high-pressure acid pipe 35. The three-way valve 29 is installed outside the pickling tank 3; the acid pipe 1 30 and the high-pressure acid pipe 35 are installed around the screen plate 24; the lower enclosure plate 27 is installed around the lower edge of the through hole of the screen plate 24; a gap eight is provided between the lower enclosure plate 27 and the jet pump 21; the air guide hopper 28 is fitted onto the jet pump 21 and is located below the lower enclosure plate 27; a gap nine is provided between the upper part of the air guide hopper 28 and the outer wall of the lower enclosure plate 27; the acid spray assembly 9 includes a three-way valve 29, an acid pipe 1 30, an acid pipe 21, a mixing acid pipe 32, a three-way valve 33, a spray pipe 24, and a high-pressure acid pipe 35. The three-way valve 29 is installed outside the pickling tank 3; the acid pipe 1 30 and the high-pressure acid pipe 35 are installed around the screen plate 24 ... One input end of the three-way valve 29 is connected, the acid pipe 21 is connected to the other input end of the three-way valve 29, the input end of the mixing acid pipe 32 is connected to the output end of the three-way valve 29, the output end of the mixing acid pipe 32 is connected to the input end of the three-way valve 33, the input end of the nozzle 2 34 is connected to one output end of the three-way valve 33, the output end of the nozzle 2 34 extends into the top of the chamber 3 of the pickling tank 3, the input end of the high-pressure acid pipe 35 is connected to the other output end of the three-way valve 33, and the output end of the high-pressure acid pipe 35 is connected to the high-pressure inlet of the jet pump 21.

[0026] Acid pipe 1 (30) is connected to the low-concentration sulfuric acid pipe, and acid pipe 2 (31) is connected to the high-concentration sulfuric acid pipe. Adjusting the three-way knob of three-way valve 29 adjusts the opening of the two input ends, thereby adjusting the mixing ratio of the low-concentration and high-concentration sulfuric acid solutions to form the required sulfuric acid solution. The appropriate concentration of sulfuric acid solution is input into mixing acid pipe 32. Adjusting the three-way knob of three-way valve 33 adjusts the opening of the two output ends, thereby adjusting the ratio of sulfuric acid solution output through nozzle 2 (34) and high-pressure acid pipe 35. The sulfuric acid solution is sprayed into chamber 3 of the pickling tank 3 through nozzle 2 (34), and input into the high-pressure pump 21 through high-pressure acid pipe 35. During the inlet process, exhaust gas is drawn into the jet pump 21 through the exhaust gas pipe 38, where the exhaust gas and high-pressure acid are mixed and sprayed at high speed into the acid at the bottom of the third chamber of the pickling tank 3. The guide 22 spirally guides the mixture output by the jet pump 21, causing the acid at the bottom of the third chamber to rotate. This causes the sulfuric acid to mix and react with the ammonia in the exhaust gas to generate ammonium sulfate particles. Under the action of centrifugal force, the ammonium sulfate particles accumulate towards the edge of the third chamber of the pickling tank 3 and fall outside the surrounding plate 23. The acid discharge pipe at the bottom of the pickling tank 3 extends between the surrounding plate 23 and the inner wall of the pickling tank 3, allowing the acid containing the ammonium sulfate particles to be discharged through the acid discharge pipe, thus improving the enrichment effect. The acid sprayed from nozzle 234 is caught by sieve plate 24. The acid falls through the small holes of sieve plate 24, forming a lower acid rain zone, resulting in a layer of acid on sieve plate 24. This layer of acid is blocked by upper baffle plate 25, and upper baffle plate 26 blocks the falling acid, preventing it from entering the gap between upper baffle plate 25 and spray pump 21. The waste gas overflowing from the acid at the bottom of chamber 3 of pickling tank 3 comes into contact with the acid rain, reacting and absorbing the ammonia. The rising waste gas... After being blocked by the lower end face of the sieve plate 24, the gas enters through the gap nine between the air guide hopper 28 and the lower enclosure plate 27, then through the gap eight between the lower enclosure plate 27 and the jet pump 21, and then through the gap six between the upper enclosure plate 25 and the jet pump 21 and the gap seven between the upper baffle plate 26 and the upper enclosure plate 25, entering the acid mist zone above the sieve plate 24. This allows the ammonia in the exhaust gas to come into full contact with the acid mist again, further prolonging the reaction time of the ammonia and the acid and improving the ammonia reaction absorption efficiency.

[0027] like Figures 1 to 11As shown, the ammonia absorption device for cyanuric acid processing of the present invention, during operation, firstly, the waste gas output from waste gas pipe 4 is input into the urea solution at the bottom of chamber 1 of urea tank 1, so that the urea microparticles in the waste gas are mixed with the urea solution for washing and absorption. After the waste gas exits the urea solution, it comes into full contact with the urea solution mist, so that the urea microparticles in the waste gas are washed and absorbed again, thus the urea microparticles in the waste gas undergo two washing and absorption processes. After the waste gas has been washed and absorbed by the urea solution, it is input into the alkaline solution at the bottom of chamber 2 of alkaline washing tank 2 through waste gas pipe 6, so that the hydrogen cyanide gas in the waste gas is mixed with the alkaline solution for neutralization and absorption. After the waste gas exits the alkaline solution, it comes into full contact with the alkaline solution mist, so that the hydrogen cyanide in the waste gas is neutralized and absorbed again, thus the hydrogen cyanide in the waste gas undergoes two neutralization and absorption processes. Then, the high-pressure acid solution delivered by one output end of acid spray assembly 9 is input into the high-pressure inlet of spray pump 21, and after passing through the alkaline solution... The neutralized waste gas is drawn into the jet pump 21 through the waste gas pipe 38, where the waste gas and high-pressure acid are mixed and sprayed at high speed into the acid at the bottom of the third chamber of the pickling tank 3. The guide 22 spirally guides the mixture output from the jet pump 21, causing the acid at the bottom of the third chamber to rotate. This causes the sulfuric acid to react with the ammonia in the waste gas to generate ammonium sulfate particles. Under the action of centrifugal force, the ammonium sulfate particles accumulate at the edge of the third chamber of the pickling tank 3 and fall outside the surrounding plate 23. The acid discharge pipe at the bottom of the pickling tank 3 extends between the surrounding plate 23 and the inner wall of the pickling tank 3, allowing the acid enriched with ammonium sulfate particles to be discharged through the acid discharge pipe. Finally, the waste gas emerges from the acid and comes into full contact with the acid mist, causing the ammonia in the waste gas to be absorbed again. This process of absorption of ammonia in the waste gas is repeated twice. The waste gas after absorbing ammonia is discharged through the exhaust pipe at the top of the pickling tank 3.

[0028] The main functions achieved by this invention are: 1. The exhaust gas undergoes two treatments as it passes through each reaction tank, improving the efficiency of removing impurities and ammonia from the exhaust gas. 2. The urea solution falls through multiple sieve holes of multiple sieve plates 10, forming a multi-layer urea solution mist zone, and prolonging the contact time between the exhaust gas and the urea solution, thereby improving the washing efficiency of urea microparticles in the exhaust gas. 3. A gas distribution hood 11 is used to form a "gas chamber" under the urea solution, and the waste gas is dispersed into microbubbles through a large number of micropores in the gas distribution hood 11, which increases the gas-liquid contact area and contact time. 4. The single-tube and double-tube pre-cooling structures, consisting of a sleeve 12, an inner sleeve 14, and an outer sleeve 15, reduce the exhaust gas temperature and improve the absorption efficiency of subsequent exhaust gas. 5. By setting up a jet pump 21, high-pressure acid is used as a power source to transport gas on the one hand, and to achieve preliminary mixing and reaction of ammonia and acid during the transport process, thereby improving mass transfer efficiency and reaction rate. 6. By setting the flow guide 22 to form a bottom centrifugal flow guide structure, the acid solution is rotated, so that the reaction is complete.

[0029] The ammonia absorption device for cyanuric acid processing of the present invention uses common mechanical methods for installation, connection, or setting. Any method that can achieve its beneficial effects can be implemented. The urea tank 1, alkali washing tank 2, acid washing tank 3, urea liquid pipe 5, alkali spray assembly 7, acid spray assembly 9, sieve plate 10, gas distribution hood 11, packing layer 13, three-way valve 17, spray pipe 1 20, jet pump 21, flow guide 22, sieve plate 24, three-way valve 29, three-way valve 33, and spray pipe 2 34 of the ammonia absorption device for cyanuric acid processing of the present invention are commercially available. Technicians in the industry only need to install and operate it according to the accompanying instruction manual, without requiring any creative work from those skilled in the art.

[0030] The above description is only a preferred embodiment of the present invention. It should be noted that for those skilled in the art, several improvements and modifications can be made without departing from the technical principles of the present invention, and these improvements and modifications should also be considered within the scope of protection of the present invention.

Claims

1. A cyanuric acid processing ammonia gas absorption device, comprising a urea tank (1), an alkali washing tank (2) and an acid washing tank (3), a chamber one is arranged in the interior of the urea tank (1), a chamber two is arranged in the interior of the alkali washing tank (2), and a chamber three is arranged in the interior of the acid washing tank (3); characterized in that, The application also comprises a waste gas pipe one (4), a urea liquid pipe (5), a waste gas pipe two (6), an alkali liquid spraying assembly (7), a waste gas pipe three (8) and an acid liquid spraying assembly (9), the output end of the waste gas pipe one (4) extends to the bottom of the chamber one through the middle of the chamber one of the urea tank (1), the output end of the urea liquid pipe (5) extends into the upper part of the chamber one of the urea tank (1), the urea liquid pipe (5) is used for spraying urea liquid downward, the bottom of the urea tank (1) is provided with a urea liquid discharge pipe, the input end of the waste gas pipe two (6) is connected with the top of the chamber one, the output end of the waste gas pipe two (6) extends to the bottom of the chamber two through the upper part of the chamber two, the bottom of the waste gas pipe two (6) is provided with an alkali liquid discharge pipe, the output end of the alkali liquid spraying assembly (7) extends into the upper part of the chamber two, the alkali liquid spraying assembly (7) is used for spraying alkali liquid downward, the input end of the waste gas pipe three (8) is connected with the top of the chamber three of the pickling tank (3), the output end of the waste gas pipe three (8) extends into the bottom of the chamber three, the bottom of the pickling tank (3) is provided with an acid liquid discharge pipe, the output end of the acid liquid spraying assembly (9) extends into the upper part of the chamber three, the acid liquid spraying assembly (9) is used for spraying acid liquid downward, the top of the pickling tank (3) is provided with an exhaust pipe which is communicated with the chamber three.

2. A cyanuric acid processing ammonia absorption apparatus as claimed in claim 1, characterized in that The application also comprises a sieve plate (10), the sieve plate (10) is provided in plurality, the sieve plate (10) is installed in the chamber one, the sieve plate (10) is provided with a plurality of sieve holes, a plurality of sieve plates (10) are arranged in up and down, a plurality of sieve plates (10) are located below the urea liquid pipe (5).

3. A cyanuric acid processing ammonia absorption apparatus as claimed in claim 1, characterized in that, The application also comprises a gas distribution cover (11), the gas distribution cover (11) is installed outside the outer wall of the output end of the waste gas pipe one (4), the gas distribution cover (11) is located at the bottom of the chamber one, a plurality of micropores are arranged on the gas distribution cover (11).

4. A cyanuric acid processing ammonia absorption apparatus as defined in claim 1, wherein The application also comprises a sleeve pipe (12), the sleeve pipe (12) is sleeved on the outer wall of the output end of the waste gas pipe one (4), a gap one is arranged between the sleeve pipe (12) and the outer wall of the waste gas pipe one (4).

5. A cyanuric acid processing ammonia absorption apparatus as defined in claim 1, wherein The application also comprises a filler layer (13), the filler layer (13) is installed in the chamber two, the filler layer (13) is located below the alkali liquid spraying assembly (7).

6. A cyanuric acid processing ammonia absorption apparatus as defined in claim 1, wherein The application also comprises an inner sleeve pipe (14), an outer sleeve pipe (15) and a liquid collecting hopper (16), the inner sleeve pipe (14) is sleeved outside the outer wall of the output end of the waste gas pipe two (6), a gap two is arranged between the inner sleeve pipe (14) and the outer wall of the waste gas pipe two (6), the outer sleeve pipe (15) is sleeved outside the outer wall of the inner sleeve pipe (14), a gap three is arranged between the outer sleeve pipe (15) and the outer wall of the inner sleeve pipe (14), the liquid collecting hopper (16) is installed at the upper end of the outer sleeve pipe (15), the liquid collecting hopper (16) is annularly arranged outside the waste gas pipe two (6), the lower end of the liquid collecting hopper (16) extends into the gap one, a gap four is arranged between the lower end of the liquid collecting hopper (16) and the outer wall of the waste gas pipe two (6), a gap five is arranged between the lower end surface of the liquid collecting hopper (16) and the upper end of the inner sleeve pipe (14).

7. A cyanuric acid processing ammonia absorption apparatus as defined in claim 1, wherein The lye spraying assembly (7) comprises a three-way valve (17), a lye pipe one (18), a lye pipe two (19) and a spray pipe one (20), the three-way valve (17) is installed outside the caustic washing tank (2), the lye pipe one (18) is connected with one input end of the three-way valve (17), the lye pipe two (19) is connected with another input end of the three-way valve (17), the input end of the spray pipe one (20) is connected with the output end of the three-way valve (17), and the output end of the spray pipe one (20) extends into the top of the chamber two.

8. A cyanuric acid processing ammonia absorption apparatus as defined in claim 1, wherein The spraying pump (21), the flow guide (22) and the coaming (23) are further included, the spraying pump (21) is installed in the chamber three, the output end of the spraying pump (21) extends into the bottom of the chamber three, the output end of the waste gas pipe three (8) is connected with the low-pressure inlet of the spraying pump (21), one output end of the acid liquid spraying assembly (9) is connected with the high-pressure inlet of the spraying pump (21), the flow guide (22) is installed at the bottom of the chamber three, the flow guide (22) is located below the output end of the spraying pump (21), and the coaming (23) is annularly arranged between the flow guide (22) and the inner wall of the pickling tank (3).

9. A cyanuric acid processing ammonia absorption apparatus as defined in claim 8, wherein The sieve plate two (24), the upper coaming (25), the upper baffle (26), the lower coaming (27) and the gas guide hopper (28) are further included, the sieve plate two (24) is installed in the chamber three, the middle part of the sieve plate two (24) is provided with a through hole for avoiding the spraying pump (21), the sieve plate two (24) is located below the acid liquid spraying assembly (9), the upper coaming (25) is annularly installed on the upper edge of the through hole of the sieve plate two (24), a gap six is arranged between the upper coaming (25) and the spraying pump (21), the upper baffle (26) is sleeved on the spraying pump (21), the upper baffle (26) is located above the upper coaming (25), a gap seven is arranged between the upper baffle (26) and the upper edge of the upper coaming (25), the lower coaming (27) is annularly installed on the lower edge of the through hole of the sieve plate two (24), a gap eight is arranged between the lower coaming (27) and the spraying pump (21), the gas guide hopper (28) is sleeved on the spraying pump (21), the gas guide hopper (28) is located below the lower coaming (27), and a gap nine is arranged between the upper part of the gas guide hopper (28) and the outer wall of the lower coaming (27).

10. A cyanuric acid processing ammonia absorption apparatus as defined in claim 8, wherein The acid liquid spraying assembly (9) comprises a three-way valve two (29), an acid liquid pipe one (30), an acid liquid pipe two (31), a mixed acid pipe (32), a three-way valve three (33), a spray pipe two (34) and a high-pressure acid pipe (35), the three-way valve two (29) is installed outside the pickling tank (3), the acid liquid pipe one (30) is connected with one input end of the three-way valve two (29), the acid liquid pipe two (31) is connected with another input end of the three-way valve two (29), the input end of the mixed acid pipe (32) is connected with the output end of the three-way valve two (29), the output end of the mixed acid pipe (32) is connected with the input end of the three-way valve three (33), the input end of the spray pipe two (34) is connected with one output end of the three-way valve three (33), the output end of the spray pipe two (34) extends into the top of the chamber three, the input end of the high-pressure acid pipe (35) is connected with another output end of the three-way valve three (33), and the output end of the high-pressure acid pipe (35) is connected with the high-pressure inlet of the spraying pump (21).

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