Washing tower for semiconductor material processing

Abstract

The invention provides a washing tower for semiconductor material processing. The washing tower comprises a tower body, an exhaust port is formed in the top of the tower body; the gas outlet cover is arranged in the lower part of the tower body, and a liquid collecting cavity is arranged below the gas outlet cover; an annular passage is defined between the outer ring of the air outlet cover and the inner wall of the tower body; the separation barrel is fixedly mounted on the top of the gas outlet cover; a treatment cavity with a closed top and a bottom communicated with the passage is defined between the outer wall of the separation barrel and the inner wall of the tower body; the first treatment assembly is arranged in the treatment cavity, and the first treatment assembly is used for spraying treatment liquid into the treatment cavity; the top of the treatment cavity is communicated with a flow guide pipe; an air outlet part of the flow guide pipe extends to the inner side of the bottom of the separation barrel; the second treatment assembly is arranged in the upper part of the tower body and is used for spraying treatment liquid into the upper part of the tower body. The washing tower can improve the treatment path of the waste gas and improve the treatment effect of the waste gas.

Description

TECHNICAL FIELD

[0001] The present application relates to the field of semiconductor processing, in particular to a washing tower for semiconductor material processing. BACKGROUND

[0002] In the process of electrostatic chuck and silicon carbide material processing, etching and cleaning links need to use acidic chemicals, resulting in a large amount of acidic pollutants in the process waste gas. Such waste gas needs to be purified by a washing tower before being discharged.

[0003] At present, when the washing tower is used for waste gas treatment, the waste gas enters from the bottom of the tower body and rises in the vertical direction, and finally is discharged from the top. The effective treatment path length is completely determined by the physical height of the tower body. In order to improve the purification efficiency, the traditional technical scheme can only prolong the treatment path by increasing the height of the tower body, which is limited by the single flow channel design of the internal space of the tower body, causing the problem that it is difficult to prolong the treatment path in limited space. SUMMARY

[0004] The present application provides a washing tower for semiconductor material processing to solve the technical problem of how to prolong the waste gas treatment path without increasing the height of the tower body.

[0005] The present application solves the above technical problems by the following technical solutions: The present application provides a washing tower for semiconductor material processing, comprising a tower body; the top of the tower body is provided with an exhaust port; further comprising: an exhaust cover, which is arranged in the lower part of the tower body, and a liquid collecting cavity is arranged below the exhaust cover; an annular passageway is formed between the outer circle of the exhaust cover and the inner wall of the tower body; a partition cylinder, which is fixedly installed on the top of the exhaust cover, and a treatment cavity is formed between the outer wall of the partition cylinder and the inner wall of the tower body, which is closed at the top and communicated with the passageway at the bottom; a first treatment assembly, which is arranged in the treatment cavity, and is used for spraying treatment liquid into the treatment cavity; a flow guide pipe is communicated with the top of the treatment cavity, and the gas outlet part of the flow guide pipe extends to the inner side of the bottom of the partition cylinder; at least one second treatment assembly, which is arranged in the upper part of the tower body, and is used for spraying treatment liquid into the upper part of the tower body.

[0006] Preferably, the first processing assembly comprises a spiral partition; the spiral partition is fixedly installed in the processing cavity, and the processing cavity is a circular annular cavity, which is divided into a spiral channel by the spiral partition; the spiral partition is fixedly installed with a spiral pipe with one open end and the other closed end along the length direction; a plurality of first nozzles are uniformly installed on the spiral pipe along the length direction; and the open end of the first nozzle is connected with a liquid injection mechanism.

[0007] Preferably, the top port of the air outlet cover is fixedly connected with an air inlet pipe; the air inlet pipe is located at the axis of the partition cylinder, and the top end of the air inlet pipe penetrates through the air outlet port and extends above the air outlet port; and the air inlet pipe is provided with a third processing assembly.

[0008] Preferably, the third processing assembly comprises an inner pipe; the top end of the inner pipe is closed, the bottom end of the inner pipe is open, and the bottom end of the inner pipe is fixedly connected with a second connecting pipe; the bottom end of the second connecting pipe is connected with a liquid delivery mechanism; a plurality of uniformly distributed fine holes are formed in the pipe wall of the inner pipe; a liquid storage sleeve is fixedly sleeved on the outer wall of the inner pipe; and end frames are fixedly installed on the top end and the bottom end of the inner pipe, and the end frames are fixedly connected with the inner wall of the air inlet pipe.

[0009] Preferably, the liquid delivery mechanism comprises a squeezing disc and a fixed cylinder; the fixed cylinder is fixedly installed at the bottom of the tower body, and the bottom end of the fixed cylinder is open and the top end of the fixed cylinder is closed; a piston is connected with the fixed cylinder in a matched mode; the bottom of the piston is fixedly installed with a movable rod, and the bottom end of the movable rod is provided with a spherical surface; the bottom edge of the fixed cylinder extends inwardly to form an inner ring; the piston and the inner ring are elastically connected through a spring; the top surface of the squeezing disc is provided with an inclined surface; the bottom end of the movable rod abuts against the inclined surface of the squeezing disc; the top end of the fixed cylinder is installed with a first one-way valve and a second one-way valve; and the liquid collecting cavity is provided with a stirring mechanism, and the output part of the stirring mechanism is connected with the squeezing disc.

[0010] Preferably, the stirring mechanism comprises a bottom cover; a motor is fixedly installed at the bottom of the bottom cover; the bottom cover is provided with a first gear and a plurality of second gears; the output shaft of the motor is fixedly sleeved with the first gear, and the top end of the output shaft of the motor is fixedly connected with the bottom center of the squeezing disc; the second gears are meshingly connected with the first gear; a stirring shaft is fixedly installed at the middle part of the second gear; the stirring shaft is rotatably connected with the bottom of the tower body, and the part of the stirring shaft located in the liquid collecting cavity is provided with stirring blades.

[0011] Preferably, the bottom inner side of the partition cylinder is provided with a plurality of strip shells; the height of the strip shell gradually decreases in the direction away from the axis of the partition cylinder, and the end of the strip shell away from the axis of the partition cylinder is provided with a port; the port penetrates through the bottom side wall of the partition cylinder and extends to the bottom inner side of the processing cavity; the strip shell is connected with a collection assembly for collecting the processing liquid sprayed by the second processing assembly; the number of the flow guide pipes is a plurality, and the gas outlet portions of the plurality of flow guide pipes are respectively arranged at the top openings of the plurality of strip shells.

[0012] Preferably, the gas outlet portion of the flow guide pipe comprises an inclined pipe arranged at the bottom end of the flow guide pipe; the bottom of the inclined pipe is provided with a plurality of gas outlets arranged along the length direction of the inclined pipe, and the plurality of gas outlets are equidistantly distributed at the top opening of the strip shell along the length direction of the strip shell.

[0013] Preferably, the collection assembly comprises a first liquid receiving disc; the first liquid receiving disc is in a circular ring shape; the first liquid receiving disc is located below the second processing assembly, and the outer edge of the first liquid receiving disc is fixedly connected with the inner wall of the partition cylinder; the inner edge of the first liquid receiving disc extends upward to form a liquid blocking cylinder; the bottom of the first liquid receiving disc is fixedly connected with a liquid discharge port; a second liquid receiving disc is arranged below the liquid blocking cylinder; the second liquid receiving disc is fixedly sleeved on the outer wall of the air inlet pipe; the bottom of the second liquid receiving disc is fixedly connected with a first connecting pipe; and the bottom end of the first connecting pipe is fixedly connected with the end of the strip shell close to the air inlet pipe.

[0014] Preferably, the second processing assembly comprises a horizontal pipe fixedly installed on the tower body; a plurality of vertical pipes are arranged on the horizontal pipe; a plurality of second nozzles are arranged on the bottom of the horizontal pipe and the bottom of the vertical pipe; and the horizontal pipe is connected with a liquid injection mechanism.

[0015] On the basis of common sense in the art, the above-mentioned preferred conditions can be combined arbitrarily, that is, each preferred example of the present application is obtained.

[0016] The positive progress effect of the present application is that: The above-mentioned washing tower for processing semiconductor materials is provided with a partition cylinder, the outer side of the partition cylinder and the inner wall of the tower body form a processing cavity, when the waste gas is treated, the waste gas flows in the processing cavity, and after flowing to the top of the processing cavity, the waste gas is downwardly conveyed through the flow guide pipe and returns to the inner side of the bottom of the partition cylinder, without increasing the height of the tower body, the processing path is prolonged, the first processing assembly and the second processing assembly are respectively arranged on the processing cavity and the inner side of the partition cylinder, the waste gas can be treated in each path, the treatment effect is guaranteed, and the collection cavity is arranged at the entry position of the waste gas, the waste gas enters the tower body and contacts the processing liquid in the collection cavity, the treatment effect is improved. BRIEF DESCRIPTION OF DRAWINGS

[0017] Figure 1 It is a structural schematic view of the whole front side of the present application.

[0018] Figure 2 Structure diagram of the whole back side of the application.

[0019] Figure 3 Structure diagram of the inside of the tower body of the application.

[0020] Figure 4 Structure diagram of the second processing assembly of the application.

[0021] Figure 5 Structure diagram of the partition tube of the application.

[0022] Figure 6 Structure diagram of the strip shell and the gathering assembly of the application.

[0023] Figure 7 Structure diagram of the first processing assembly of the application.

[0024] Figure 8 Structure diagram of the inside of the air inlet pipe of the application.

[0025] Figure 9 Structure diagram of the stirring mechanism and the liquid conveying mechanism of the application.

[0026] Figure 10 Structure diagram of the liquid conveying mechanism of the application.

[0027] Figure 11 Structure diagram of the third processing assembly of the application.

[0028] Figure 12 Structure diagram of the distribution of the extension arm of the application.

[0029] Explanation of reference signs 1. Base frame; 2. Tower body; 3. Exhaust port; 4. Air inlet pipe; 5. Liquid injection mechanism; 501. Liquid storage tank; 502. Pump body; 503. First liquid delivery pipe; 504. Second liquid delivery pipe; 6. Overflow port; 7. Stirring mechanism; 701. Bottom cover; 702. Stirring shaft; 703. Motor; 704. First gear; 705. Second gear; 8. Air outlet hood; 801. Chassis; 802. Air outlet nozzle; 9. Partition cylinder; 901. Trumpet mouth; 10. First processing component; 1001. Spiral partition; 1002. Spiral tube; 1003. First nozzle; 11. Guide pipe; 1101. Air outlet; 12. Second processing component; 1201. Horizontal pipe; 1202, Longitudinal tube; 1203, Second nozzle; 13, Strip shell; 1301, Port; 14, Collection assembly; 1401, First receiving tray; 1402, Liquid baffle; 1403, Drain outlet; 1404, Second receiving tray; 1405, First connecting pipe; 15, Second connecting pipe; 16, Third processing assembly; 1601, Inner tube; 1602, Fine orifice; 1603, Liquid storage sleeve; 16031, Extension arm; 17, End frame; 18, Infusion mechanism; 1801, Squeezing plate; 1802, Fixed cylinder; 1803, Piston; 1804, Spring; 1805, Movable rod; 1806, First check valve; 1807, Second check valve. Detailed Implementation

[0030] The present invention will be further illustrated by way of embodiments below, but the present invention is not limited to the scope of the embodiments described herein.

[0031] like Figures 1-12 As shown, a washing tower for semiconductor material processing includes a tower body 2; an exhaust port 3 is provided at the top of the tower body 2; and further includes: The exhaust hood 8 is located in the lower part of the tower body 2, and a liquid collection chamber is provided below the exhaust hood 8. The liquid collection chamber is a cavity formed by the inner wall of the lower part of the tower body 2. The outer ring of the exhaust hood 8 and the inner wall of the tower body 2 form an annular passage. The partition cylinder 9 is fixedly installed on the top of the vent hood 8. The outer wall of the partition cylinder 9 and the inner wall of the tower body 2 form a processing cavity that is closed at the top and connected to the passage at the bottom. A first processing component 10 is disposed inside a processing chamber and is used to spray processing liquid into the processing chamber. The top of the processing chamber is connected to a guide pipe 11, and the air outlet of the guide pipe 11 extends to the inner side of the bottom of the partition cylinder 9. At least one second processing component 12 is disposed in the upper part of the tower body 2, and the second processing component 12 is used to spray processing liquid into the upper part of the tower body 2.

[0032] In the specific implementation, the exhaust cover 8 discharges the exhaust gas to be treated into the lower part of the tower body 2, the treatment liquid in the collecting chamber first contacts the exhaust gas to achieve treatment, and then enters the treatment chamber through the passage, and the exhaust gas is treated by the first treatment assembly 10 in the process of flowing upward from the bottom of the treatment chamber; after the exhaust gas enters the top of the treatment chamber, it is guided to the lower side of the inner side of the baffle cylinder 9 through the flow guide pipe 11, and then is discharged from the top of the baffle cylinder 9 to the upper part of the tower body 2, is treated by the second treatment assembly 12 in the upper part of the tower body 2, and is finally discharged from the exhaust port 3; the flow path of the exhaust gas in the tower body 2 can be prolonged, the residence time of the exhaust gas in the tower body 2 can be prolonged, and the exhaust gas is treated in the flow path, so that the treatment effect of the exhaust gas is improved.

[0033] The top of the baffle cylinder 9 is provided with a flared opening 901, the top side of the flared opening 901 is fixedly connected with the inner wall of the tower body 2, and the flared opening 901 is as shown in Figures 5-6 The flared opening 901 is arranged to close the top of the treatment chamber.

[0034] The bottom frame 1 is fixed with the bottom of the tower body 2 and is used to support the tower body 2; and the bottom frame 1 provides a mounting position for the liquid injection mechanism 5, and the liquid storage tank 501 and the pump body 502 of the liquid injection mechanism 5 are fixed on the bottom frame 1.

[0035] As shown in Figure 3 and Figure 7 As a specific technical solution, the first treatment assembly 10 comprises a spiral partition 1001; the spiral partition 1001 is fixedly installed in the treatment chamber, the inner side of the spiral partition 1001 is fixedly sleeved to the inner wall of the baffle cylinder 9, and the treatment chamber is a circular ring type cavity, the treatment chamber is divided into a spiral type channel by the spiral partition 1001, the spiral partition 1001 is fixedly installed with a spiral pipe 1002 having an open end at one end and a closed end at the other end along the length direction, and a plurality of first nozzles 1003 are uniformly arranged on the spiral pipe 1002 along the length direction; the open end of the first nozzle 1003 is connected with the liquid injection mechanism 5.

[0036] The exhaust gas flows in the treatment chamber, specifically in the spiral type channel, to increase the flow path of the exhaust gas in the treatment chamber and increase the residence time; and in the process of exhaust gas flow, the liquid injection mechanism 5 injects treatment liquid into the spiral pipe 1002, the treatment liquid is uniformly sprayed in the spiral type channel through the plurality of first nozzles 1003, so that the exhaust gas flowing to each position in the spiral type channel will contact the sprayed treatment liquid to be treated, thereby improving the treatment effect.

[0037] The treatment liquid sprayed in the spiral type channel falls on the spiral partition 1001 after treating the exhaust gas and flows downward along the spiral partition 1001 by gravity and enters the collecting chamber below the exhaust cover 8 through the passage.

[0038] Further, the bottom end of the spiral partition 1001 is bent upwards to form a blocking part (not shown in the figure) for blocking the treatment liquid discharged from the bottom end of the spiral blade, so that a certain amount of treatment liquid can be accumulated on the spiral partition 1001. During the flow of the exhaust gas in the spiral channel, the exhaust gas can be in contact with the accumulated treatment liquid to improve the treatment effect and improve the utilization effect of the treatment liquid.

[0039] It should be noted that the height of the blocking part is much smaller than the pitch of the spiral partition 1001, which does not completely block the treatment liquid. At the same time, an electric control valve is arranged at the bottom of the spiral partition 1001, which is used to discharge the treatment liquid accumulated on the spiral partition 1001 by controlling the opening and closing of the electric control valve.

[0040] As shown in Figure 3 and Figure 5 As a specific technical solution, the top end of the air outlet cover 8 is fixedly connected with an air inlet pipe 4, the air inlet pipe 4 is located at the axis of the partition cylinder 9, and the top end of the air inlet pipe 4 penetrates through the air outlet 3 and extends above the air outlet 3; the air inlet pipe 4 is provided with a third treatment assembly 16. The exhaust gas to be treated enters the air inlet pipe 4, which can be conveyed by a fan, and is input into the air inlet pipe 4 and conveyed to the air outlet cover 8 through the air inlet pipe 4 for discharge; and the exhaust gas is treated by the third treatment assembly 16 in the air inlet pipe 4 to improve the treatment effect.

[0041] As shown in Figure 8 As a specific technical solution, the third treatment assembly 16 includes an inner tube 1601; the top end of the inner tube 1601 is closed, the bottom end is open, and the bottom end of the inner tube 1601 is fixedly connected with a second connecting pipe 15, the bottom end of the second connecting pipe 15 is connected with a liquid delivery mechanism 18; a plurality of uniformly distributed fine holes 1602 are formed in the wall of the inner tube 1601; the outer wall of the inner tube 1601 is fixedly sleeved with a liquid storage sleeve 1603; the top end and the bottom end of the inner tube 1601 are fixedly installed with end frames 17, and the end frames 17 are fixedly connected with the inner wall of the air inlet pipe 4. The liquid storage sleeve 1603 is made of a material that can absorb water, such as melamine sponge, which can resist acid and alkali while absorbing water.

[0042] As shown in Figure 12 As a specific technical solution, the liquid storage sleeve 1603 is provided with a plurality of extension arms 16031 around it.

[0043] When the liquid delivery mechanism 18 inputs the treatment liquid into the inner tube 1601 through the connecting pipe, the treatment liquid is dispersed into the liquid storage sleeve 1603 through the fine holes 1602, so that the liquid storage sleeve 1603 has treatment liquid, and the exhaust gas passing through the air inlet pipe 4 can be in contact with the treatment liquid on the liquid storage sleeve 1603 to treat the exhaust gas. As shown in Figure 12In the shown, the number of extension arms 16031 is six, which is long strip type, the extension arm 16031 is annular array distribution to the four around the liquid storage sleeve 1603, through the setting of extension arm 16031, improve the contact area of waste gas and liquid storage sleeve 1603, facilitate the waste gas to carry on better contact.

[0044] As shown in the specific technical scheme, the infusion mechanism 18 comprises a pressing disc 1801 and a fixed cylinder 1802. Figures 9-10 The bottom of the fixed cylinder 1802 is fixedly installed on the bottom of the tower body 2, and the bottom end of the fixed cylinder 1802 is open and the top end is closed. A piston 1803 is connected with the fixed cylinder 1802. The bottom of the piston 1803 is fixedly installed with a movable rod 1805, and the bottom end of the movable rod 1805 is provided with a spherical surface. The bottom edge of the fixed cylinder 1802 extends inwardly to form an inner ring. The piston 1803 and the inner ring are elastically connected by a spring 1804. The top surface of the pressing disc 1801 is provided with an inclined surface. The bottom end of the movable rod 1805 abuts against the inclined surface of the pressing disc 1801. The top end of the fixed cylinder 1802 is provided with a first one-way valve 1806 and a second one-way valve 1807. The liquid collecting cavity is provided with a stirring mechanism 7. The output part of the stirring mechanism 7 is connected with the pressing disc 1801.

[0045] As shown in the specific technical scheme, the stirring mechanism 7 comprises a bottom cover 701 fixedly installed on the bottom frame 1. Figure 9 The bottom of the bottom cover 701 is fixedly installed with a motor 703. The bottom cover 701 is provided with a first gear 704 and a plurality of second gears 705. The output shaft of the motor 703 is fixedly sleeved with the first gear 704, and the top end of the output shaft of the motor 703 is fixed with the bottom center of the pressing disc 1801. The second gears 705 are engagedly connected with the first gear 704. The second gears 705 are fixedly provided with a stirring shaft 702 at the middle part. The stirring shaft 702 is rotatably connected with the bottom of the tower body 2, and the part of the stirring shaft 702 located in the liquid collecting cavity is provided with stirring blades.

[0046] The stirring mechanism 7 is used for stirring in the liquid collecting cavity to make the liquid inside uniform. Specifically, the motor 703 drives the first gear 704 to rotate, and the first gear 704 and the second gear 705 are engagedly transmitted to make the stirring shaft 702 rotate. The stirring blades on the stirring shaft 702 rotate with it to stir in the liquid collecting cavity.

[0047] At the same time of stirring, the motor 703 drives the pressing disc 1801 to rotate. Through the design of the inclined surface at the top of the pressing disc 1801, Figures 9-10As shown, at this time, the top surface of the pressing disc 1801 is left high and right low, and it rotates 180°, and the top surface of the pressing disc 1801 changes to left low and right high. During the above change process, the pressing disc 1801 pushes the movable rod 1805 upwards, the movable rod 1805 drives the piston 1803 to extrude the liquid in the fixed cylinder 1802, and at the same time, the spring 1804 is stretched, so that the liquid in the fixed cylinder 1802 enters the connecting pipe through the first one-way valve 1806 to input the liquid into the inner tube 1601; then the pressing disc 1801 continues to rotate 180°, and the top surface of the pressing disc 1801 changes to the state of left high and right low. During the above change process, the bottom end of the movable rod 1805 is always attached to the pressing disc 1801 through the elastic force of the spring 1804, the movable rod 1805 drives the piston 1803 to move downwards together, and the fixed cylinder 1802 sucks the treatment liquid in the liquid collection cavity through the second one-way valve 1807.

[0048] When the pressing disc 1801 continues to rotate, the above process is repeatedly performed to realize intermittent and automatic injection of the treatment liquid into the inner tube 1601.

[0049] As shown in the figure, Figures 5-6 As a specific technical solution, the bottom inner side of the separation cylinder 9 is provided with a plurality of strip shells 13, and the plurality of strip shells 13 are arranged in a ring array; the height of the strip shell 13 gradually decreases along the direction away from the axis of the separation cylinder 9, and the end of the strip shell 13 away from the axis of the separation cylinder 9 is provided with a port 1301; the port 1301 penetrates through the bottom side wall of the separation cylinder 9 and extends to the bottom inner side of the processing cavity; the strip shell 13 is connected with a collection assembly 14, the collection assembly 14 is used for collecting the treatment liquid sprayed by the second processing assembly 12; the number of the flow guide pipes 11 is a plurality, and the plurality of flow guide pipes 11 are arranged in a ring array; the gas outlet parts of the plurality of flow guide pipes 11 are respectively arranged at the top openings of the plurality of strip shells 13.

[0050] The collection assembly 14 collects the treatment liquid sprayed by the second processing assembly 12 and discharges it into the strip shell 13. The collected treatment liquid flows along the length direction in the strip shell 13 to the port 1301, is discharged into the bottom of the processing cavity through the port 1301, and then flows into the liquid collection cavity below the gas outlet cover 8.

[0051] After the exhaust gas is treated in the processing cavity, it is transported from the top of the processing cavity to the top opening of the strip shell 13 through the flow guide pipe 11. The treatment liquid flowing through the strip shell 13 can contact the exhaust gas for treatment.

[0052] It should be noted that the strip shell 13 is provided with a port 1301 for discharging the treatment liquid in real time, and the strip shell 13 only serves as a channel for the treatment liquid to flow through, and the inside of the strip shell 13 does not store the treatment liquid, so that overflow does not occur at the top opening, and the treatment liquid sprayed by the second treatment assembly 12 can be completely discharged into the liquid collecting cavity below the air outlet cover 8, and the overflow port 6 is arranged on one side of the top of the liquid collecting cavity and is fixed on the side wall of the tower body 2. The overflow port 6 is used to discharge excess liquid.

[0053] The treatment liquid sprayed by the second treatment assembly 12 still has effective components for treating the exhaust gas after being contacted with the exhaust gas and then entering the strip shell 13. Similarly, the treatment liquid sprayed by the first treatment assembly 10 still has effective components for treating the exhaust gas after being contacted with the exhaust gas.

[0054] Therefore, the treatment liquid in the strip shell 13, the treatment liquid on the spiral partition 1001, and the treatment liquid collected in the liquid collecting cavity can be used to treat the exhaust gas. The exhaust gas is contacted with the treatment liquid in the strip shell 13, the treatment liquid on the spiral partition 1001, and the treatment liquid in the liquid collecting cavity to fully utilize the treatment liquid and improve the utilization effect.

[0055] The top of the air outlet cover 8 is a circular truncated cone, and the plurality of strip shells 13 are fixed on the top of the air outlet cover 8, so that the strip shells 13 are in an inclined state, that is, the height of the strip shell 13 gradually decreases along the direction away from the axis of the partition cylinder 9.

[0056] As shown in Figure 5 As a specific technical solution, the top end of the flow guide pipe 11 is fixedly connected with the top side wall of the partition cylinder 9, and the top end of the flow guide pipe 11 penetrates the top side wall of the partition cylinder 9, so that the flow guide pipe 11 is in communication with the top of the treatment cavity. The air outlet part of the flow guide pipe 11 includes an inclined pipe arranged at the bottom end of the flow guide pipe 11. A plurality of air outlets 1101 are arranged at the bottom of the inclined pipe along the length direction, and the plurality of air outlets 1101 are distributed at the top opening of the strip shell 13 along the length direction of the strip shell 13 at equal intervals.

[0057] The exhaust gas enters the inclined pipe through the flow guide pipe 11 and is discharged from the plurality of air outlets 1101 to the opening of the strip shell 13, so that the exhaust gas is contacted with the treatment liquid in the strip shell 13.

[0058] As shown in Figures 5-6As shown, as a specific technical solution, the collecting assembly 14 comprises a first liquid receiving disc 1401; the first liquid receiving disc 1401 is a circular ring type; the first liquid receiving disc 1401 is located below the second treatment assembly 12, and the outer edge of the first liquid receiving disc 1401 is fixedly connected with the inner wall of the separation cylinder 9, the inner edge of the first liquid receiving disc 1401 extends upward to form a liquid blocking cylinder 1402, and the bottom of the first liquid receiving disc 1401 is fixedly communicated with a liquid discharge port 1403; a second liquid receiving disc 1404 is arranged below the liquid blocking cylinder 1402, the second liquid receiving disc 1404 is fixedly sleeved to the outer wall of the air inlet pipe 4, and the bottom of the second liquid receiving disc 1404 is fixedly communicated with a first connecting pipe 1405, and the bottom end of the first connecting pipe 1405 is fixedly communicated with one end of the strip shell 13 close to the air inlet pipe 4.

[0059] After the treatment liquid sprayed by the second treatment assembly 12 is treated, most of it enters the first liquid receiving disc 1401, and a small part of it falls into the second liquid receiving disc 1404, and the liquid falling into the first liquid receiving disc 1401 is discharged into the second liquid receiving disc 1404 through the liquid discharge port 1403, collected, and then discharged into the strip shell 13 through the first connecting pipe 1405.

[0060] As shown in the figure, Figures 3-4 The second treatment assembly 12 comprises a horizontal pipe 1201 fixedly installed on the tower body 2; a plurality of vertical pipes 1202 are arranged on the horizontal pipe 1201, and a plurality of second nozzles 1203 are arranged on the bottom of the horizontal pipe 1201 and the bottom of the vertical pipe 1202; and the horizontal pipe 1201 is connected with a liquid injection mechanism 5.

[0061] The liquid injection mechanism 5 inputs treatment liquid into the horizontal pipe 1201, and the treatment liquid is dispersed into the vertical pipe 1202 and then sprayed downward from the second nozzle 1203.

[0062] In summary, the treatment process of the exhaust gas is as follows: the exhaust gas enters the air inlet pipe 4, is preliminarily treated by the third treatment assembly 16 in the air inlet pipe 4, and is then discharged from the bottom of the air outlet cover 8 to the lower part of the tower body 2; a liquid collecting cavity is arranged at the lower part of the tower body 2, the exhaust gas contacts the liquid surface of the liquid collecting cavity for re-treatment, and then the exhaust gas enters the spiral channel through the passageway, the strip shell 13 discharges treatment liquid through the port 1301 at the passageway, the exhaust gas passing through the passageway contacts the treatment liquid discharged from the port 1301, the exhaust gas flows in the spiral channel and is treated by the first treatment assembly 10, and the exhaust gas contacts the treatment liquid accumulated on the spiral partition 1001 for treatment, and then is guided to the top opening of the strip shell 13 through the flow guide pipe 11, is treated by contacting the treatment liquid in the strip shell 13, and is then discharged from the top of the separation cylinder 9 to the upper part of the tower body 2, is treated by the second treatment assembly 12, and is finally discharged from the exhaust port 3.

[0063] Through the above processing mode, the flow path of the waste gas in the tower body 2 is improved, and the processing structure is arranged on the path, so that the waste gas is treated on each path, and the processing effect is improved.

[0064] And the processing liquid in the strip shell 13, the processing liquid of the liquid collecting cavity, the processing liquid of the third processing assembly 16, and the processing liquid on the spiral partition 1001 are reused for spraying processing liquid by the first processing assembly 10 and the second processing assembly 12, thereby improving the utilization rate of the processing liquid.

[0065] The processing liquid can be alkaline processing liquid for treating acidic waste gas.

[0066] As shown in Figures 1-2 The liquid injection mechanism 5 includes a liquid storage tank 501 fixedly installed on the chassis 1; the liquid storage tank 501 is connected with two pump bodies 502, the two pump bodies 502 are respectively connected with a first liquid conveying pipe 503 and a second liquid conveying pipe 504, the first liquid conveying pipe 503 is connected with the horizontal pipe 1201 of the second processing assembly 12, and the second liquid conveying pipe 504 is connected with the spiral pipe 1002. The pump body 502 draws liquid in the liquid storage tank 501 and inputs the liquid into the second processing assembly 12 and the first processing assembly 10 through the first liquid conveying pipe 503 and the second liquid conveying pipe 504 respectively.

[0067] As shown in Figure 8 The bottom of the gas outlet cover 8 is provided with a bottom disc 801, and a plurality of gas outlet nozzles 802 are uniformly arranged on the bottom disc 801; the waste gas enters the gas outlet cover 8 and is discharged through the plurality of gas outlet nozzles 802.

[0068] The gas outlet nozzle 802 has a hole diameter of 5 mm and a number of 12, is uniformly distributed along the annular bottom disc 801, and has a spacing of 30°, so as to ensure that the waste gas is uniformly discharged.

[0069] The present application is not limited to the above-mentioned embodiments, and any changes in shape or structure fall within the scope of the present application. The scope of protection of the present application is defined by the appended claims, and those skilled in the art can make various changes or modifications to the embodiments without departing from the principles and essence of the present application, and such changes and modifications fall within the scope of protection of the present application.

Claims

1. A washing tower for semiconductor material processing, comprising a tower body (2); an exhaust port (3) is arranged at the top of the tower body (2); characterized in that, Also include: The gas outlet cover (8) is arranged in the lower part of the tower body (2), and the lower part of the gas outlet cover (8) is provided with a liquid collecting cavity; the outer ring of the gas outlet cover (8) and the inner wall of the tower body (2) form an annular passageway; The partition cylinder (9) is fixedly installed on the top of the gas outlet cover (8), and the partition cylinder (9) is surrounded by the outer wall of the partition cylinder (9) and the inner wall of the tower body (2) to form a processing cavity which is closed at the top and communicated at the bottom with the passageway; The first processing assembly (10) is arranged in the processing cavity, and the first processing assembly (10) is used for spraying treatment liquid into the processing cavity; The top of the processing cavity is communicated with a flow guide pipe (11), and the gas outlet part of the flow guide pipe (11) extends to the inner side of the bottom of the partition cylinder (9); At least one second processing assembly (12) is arranged in the upper part of the tower body (2), and the second processing assembly (12) is used for spraying treatment liquid into the upper part of the tower body (2).

2. The semiconductor material processing scrubber column of claim 1 wherein: The first processing assembly (10) comprises a spiral partition plate (1001); the spiral partition plate (1001) is fixedly installed in the processing cavity, and the processing cavity is a circular annular cavity, which is divided into a spiral channel by the spiral partition plate (1001); the spiral partition plate (1001) is fixedly installed with a spiral pipe (1002) which is open at one end and closed at the other end along the length direction; a plurality of first nozzles (1003) are uniformly arranged on the spiral pipe (1002) along the length direction; and the open end of the first nozzle (1003) is connected with a liquid injection mechanism (5).

3. The semiconductor material processing scrubber column of claim 1 wherein: The second processing assembly (12) comprises a horizontal pipe (1201) fixedly installed on the tower body (2); a plurality of vertical pipes (1202) are arranged on the horizontal pipe (1201), and a plurality of second nozzles (1203) are arranged on the bottom of the horizontal pipe (1201) and the bottom of the vertical pipe (1202); and the horizontal pipe (1201) is connected with the liquid injection mechanism (5).

4. The semiconductor material processing scrubber column of claim 1 wherein: The top end of the gas outlet cover (8) is fixedly communicated with an air inlet pipe (4), the air inlet pipe (4) is located at the axis of the partition cylinder (9), and the top end of the air inlet pipe (4) penetrates through the exhaust port (3) and extends above the exhaust port (3); and a third processing assembly (16) is arranged in the air inlet pipe (4).

5. The semiconductor material processing scrubber column of claim 4 wherein: The third processing assembly (16) comprises an inner pipe (1601); the top end of the inner pipe (1601) is closed, and the bottom end is open; the bottom end of the inner pipe (1601) is fixedly communicated with a second connecting pipe (15), the bottom end of the second connecting pipe (15) is connected with a liquid delivery mechanism (18); a plurality of uniformly distributed fine holes (1602) are arranged on the pipe wall of the inner pipe (1601); a liquid storage sleeve (1603) is fixedly sleeved on the outer wall of the inner pipe (1601); end frames (17) are fixedly installed on the top end and the bottom end of the inner pipe (1601), and the end frames (17) are fixedly connected with the inner wall of the air inlet pipe (4).

6. The semiconductor material processing scrubber column of claim 5 wherein: The infusion mechanism (18) comprises a squeeze disc (1801) and a fixed cylinder (1802); the fixed cylinder (1802) is fixedly installed to the bottom of the tower body (2), and the bottom end of the fixed cylinder (1802) is open and the top end is closed; the piston (1803) is connected in the fixed cylinder (1802), the bottom of the piston (1803) is fixedly installed with a movable rod (1805), and the bottom end of the movable rod (1805) is provided with a spherical surface, the bottom edge of the fixed cylinder (1802) extends inward to form an inner ring, the piston (1803) and the inner ring are elastically connected through the spring (1804), the top surface of the squeeze disc (1801) is provided with an inclined surface, the bottom end of the movable rod (1805) abuts against the inclined surface of the squeeze disc (1801), and the top end of the fixed cylinder (1802) is provided with the first one-way valve (1806) and the second one-way valve (1807); the stirring mechanism (7) is arranged in the liquid collecting cavity, and the output part of the stirring mechanism (7) is connected with the squeeze disc (1801).

7. The semiconductor material processing wash column of claim 6, wherein: The stirring mechanism (7) comprises a bottom cover (701); the bottom of the bottom cover (701) is fixedly installed with a motor (703), the bottom cover (701) is provided with a first gear (704) and a plurality of second gears (705), the output shaft of the motor (703) is fixedly sleeved with the first gear (704), and the top end of the output shaft of the motor (703) is fixed to the bottom center of the squeeze disc (1801); the second gears (705) are meshedly connected with the first gear (704), the middle part of the second gear (705) is fixedly provided with a stirring shaft (702), and the stirring shaft (702) is rotatably connected with the bottom of the tower body (2), and the part of the stirring shaft (702) located in the liquid collecting cavity is provided with stirring blades.

8. The semiconductor material processing wash column of claim 4, wherein: The bottom inner side of the separation cylinder (9) is provided with a plurality of strip shells (13); the height of the strip shell (13) gradually decreases away from the axis of the separation cylinder (9), and the end of the strip shell (13) away from the axis of the separation cylinder (9) is provided with a port (1301); the port (1301) penetrates through the bottom side wall of the separation cylinder (9) and extends to the bottom inner side of the processing cavity; the strip shell (13) is connected with a collection assembly (14), and the collection assembly (14) is used for collecting the processing liquid sprayed by the second processing assembly (12); the number of the flow guide pipes (11) is several, and the gas outlet parts of the several flow guide pipes (11) are respectively arranged at the top openings of the several strip shells (13).

9. The semiconductor material processing scrubber column of claim 8 wherein: The gas outlet part of the flow guide pipe (11) comprises an inclined pipe arranged at the bottom end of the flow guide pipe (11); a plurality of gas outlets (1101) are arranged at the bottom end of the inclined pipe along the length direction, and the plurality of gas outlets (1101) are distributed at the top opening of the strip shell (13) along the length direction of the strip shell (13).

10. The semiconductor material processing scrubber column of claim 8 wherein: The collecting assembly (14) comprises a first liquid receiving disc (1401); the first liquid receiving disc (1401) is in a circular ring type; the first liquid receiving disc (1401) is located below the second processing assembly (12), and an outer edge of the first liquid receiving disc (1401) is fixedly connected with an inner wall of the separation cylinder (9); an inner edge of the first liquid receiving disc (1401) extends upwards to form a liquid blocking cylinder (1402); and a bottom of the first liquid receiving disc (1401) is fixedly connected with a liquid discharge port (1403); a second liquid receiving disc (1404) is arranged below the liquid blocking cylinder (1402); the second liquid receiving disc (1404) is fixedly sleeved to an outer wall of the air inlet pipe (4); a bottom of the second liquid receiving disc (1404) is fixedly connected with a first connecting pipe (1405); and a bottom end of the first connecting pipe (1405) is fixedly connected with one end of the strip shell (13) close to the air inlet pipe (4).

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